JP2012188857A - Seal material for shutter device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a seal material for shutter device capable of reducing slide resistance when a shutter is opened or closed while securing relaxation of a shock accompanying a swing of the shutter.SOLUTION: A seal material 20 is interposed between both side parts 14c of a shutter 14 and a pair of support frames 12 of a shutter device including the respective support frames 12 arranged in parallel at a predetermined distance and the shutter 14 having both the side parts 14c supported by the support frames 12 to reciprocally move along length directions of the respective support frames 12. The seal material 20 includes base materials mounted on opposite surfaces of the respective support frames 12 which face both the side parts 14c of the shutter 14, and a plurality of fluff parts 22 made of pile yarn stood on the base materials. Then the fluff parts 22 each comprise a high pile part 22a and a low pile part 22b differing in height from the base material.

Description

  The present invention relates to a sealing material for a shutter device interposed between a shutter in the shutter device and a support frame that supports the shutter.

  In general, a shutter device has a pair of support frames standing in parallel at a predetermined distance, and a shutter supported by each of the support frames. Guide grooves are recessed in the opposing surfaces of the support frames facing each other so as to extend in the vertical direction. The shutter is configured such that the moving direction when opening and closing is the vertical direction along the longitudinal direction of the support frame, and both side portions thereof are inserted into the respective guide grooves.

  On the inner surface of each guide groove facing the both sides of the shutter, there is provided a seal material for smoothly moving the shutter and reducing the impact caused by the shaking of the shutter due to strong wind or the like. Conventionally, as such a sealing material, a material in which a large number of pile yarns are raised on a belt-like base material has been proposed (for example, Patent Document 1). In the sealing material of Patent Document 1, a relatively thick yarn is used as the pile yarn and crimp processing is applied to the pile yarn in order to ensure the cushioning effect associated with the shaking of the shutter.

JP 2004-116140 A

  By the way, in the sealing material of Patent Document 1, since a relatively thick yarn is used for the pile yarn, it is possible to ensure the cushioning of the shock caused by the shaking of the shutter, but the sliding resistance at the time of opening and closing the shutter is low. There is a problem that it gets bigger.

  The present invention has been made paying attention to such problems existing in the prior art. An object of the present invention is to provide a sealing material for a shutter device capable of reducing sliding resistance at the time of opening and closing the shutter while ensuring ease of impact caused by shaking of the shutter.

  In order to achieve the above object, the invention according to claim 1 relating to a sealing material for a shutter device includes a pair of support frames arranged in parallel at a predetermined distance, and each support frame. In a shutter device comprising a shutter supported on both sides so as to be capable of reciprocating along the longitudinal direction of the frame, a sealing material for the shutter device interposed between the both sides of the shutter and each support frame A base material attached to each of the support frames facing the opposite sides of the shutter, and a plurality of pile yarns erected on the base material. The gist of the invention is that the height of some pile yarns from above the base material is lower than the height of other pile yarns from above the base material.

  According to the above-described configuration, when the shutter swings slightly with the reciprocation when the shutter is opened and closed, only the pile yarn having the higher height from the base material is in sliding contact with the shutter. Dynamic resistance is reduced. On the other hand, when the shutter is closed and receives a very strong external force (for example, a very strong wind due to a typhoon or the like) and shakes greatly, the impact from the large shake of the shutter is less than the height above the substrate. Since it is absorbed and alleviated by both the higher pile yarn and the lower pile yarn, the shaking of the shutter is effectively suppressed. Therefore, it is possible to reduce the sliding resistance when opening and closing the shutter while ensuring the ease of impact caused by the shaking of the shutter.

The gist of the invention of claim 2 is that, in the invention of claim 1, the pile yarns include pile yarns having different thicknesses.
According to the above configuration, it is possible to maintain a good balance between the slidability of the shutter and the mitigation of impact caused by the shaking of the shutter.

  The gist of the invention described in claim 3 is that, in the invention described in claim 1 or claim 2, at least some of the pile yarns are crimped. To do.

According to the above configuration, it is possible to improve the mitigation property of impact caused by the shaking of the shutter.
According to a fourth aspect of the present invention, in the invention according to any one of the first to third aspects, at least one of the pile yarns and the base material is made of a flame retardant material. It is a summary.

According to the said structure, it becomes possible to provide fire resistance to at least one among each pile yarn and the said base material.
Invention of Claim 5 makes the belt | band | zone shape so that the said base material may follow the longitudinal direction of each said support frame in invention as described in any one of Claims 1-4. On the base material, a band-shaped film member extending along the longitudinal direction of the base material is erected with the short direction as an upright direction, and the film member has higher rigidity than each pile yarn, Further, the gist of the invention is that the pile yarn is lower in height than at least the pile yarn having a higher height from the base material.

  According to the said structure, while being able to absorb the impact accompanying a large shake of a shutter by a film member, it becomes possible to suppress intrusion of rainwater, invasion of dust, etc.

  ADVANTAGE OF THE INVENTION According to this invention, the sealing material for shutter devices which can reduce the sliding resistance at the time of opening and closing of a shutter can be provided, ensuring the relaxation property of the impact accompanying the shaking of a shutter.

The partially broken front view of the shutter apparatus of 1st Embodiment. FIG. 2 is a cross-sectional plan view showing a main part of the shutter device of FIG. 1. FIG. 2 is a side sectional view showing a main part of the shutter device of FIG. 1. The perspective view of the sealing material with which the shutter apparatus of FIG. 1 is provided. Sectional drawing along line 5-5 in FIG. Sectional drawing for demonstrating an effect | action of the sealing material of FIG. Sectional drawing for demonstrating an effect | action of the sealing material of FIG. The principal part expanded sectional view of the shutter apparatus of 2nd Embodiment. In the shutter device of the second embodiment, (a) is a schematic cross-sectional view showing a state in which both of the two sealing materials are arranged so that the low pile portion is on the lower side, and (b) is a diagram showing both of the two sealing materials. The cross-sectional schematic diagram which shows the state arrange | positioned so that a low pile part may become an upper side, (c) is arrange | positioned so that a low pile part may become an upper side among two sealing materials, and the other, a low pile part is a lower side The cross-sectional schematic diagram which shows the state arrange | positioned so that it may become. Sectional drawing of the sealing material of the example of a change. Sectional drawing of the sealing material of another modification. Sectional drawing which shows a state when measuring the compression repulsion force of the sealing material of Example 1. FIG. Sectional drawing of the sealing material of the comparative example 1. FIG. The table | surface which shows the measurement result of the compression repulsion force of the sealing material of Example 1 and Comparative Example 1 in each temperature. Sectional drawing which shows a state when measuring the sliding resistance value of the sealing material of Example 1. FIG. FIG. 16 is a sectional view taken along line 16-16 in FIG. 15; The table | surface which shows the measurement result of the sliding resistance value of the sealing material of Example 1 and Comparative Example 1 in each temperature.

(First embodiment)
DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, a first embodiment of the invention will be described with reference to the drawings. Unless otherwise specified, the front-rear direction, the up-down direction, and the left-right direction in the following description correspond to the front-rear direction, the up-down direction, and the left-right direction when the front side is the front side in FIG. To do.

  As shown in FIG. 1, the shutter device 10 includes a pair of support frames 12 erected in parallel on a floor surface 11 at a predetermined distance, and a housing 13 installed between upper end portions of the support frames 12. And a shutter 14 disposed in a space surrounded by the housing 13, the floor surface 11, and the support frames 12. The shutter 14 is composed of a plurality of blade plates 15 extending in the left-right direction. The shutter 14 has a configuration in which the blade plates 15 adjacent in the vertical direction are connected to each other so as to be rotatable, and a configuration in which the shutter 14 is spirally wound and a configuration in which the shutter 14 is expanded in a flat shape as shown in FIG. It is configured to be able to take.

  The housing 13 is formed in a bottomed rectangular box shape having an open bottom, and a cylindrical drum (not shown) is rotatably supported therein. An upper end portion of the shutter 14 is connected to the outer peripheral surface of the drum. The shutter device 10 is in an open state in which the shutter 14 is accommodated in the housing 13 by rotating the drum in the forward direction in the housing 13 and winding the shutter 14 on the outer peripheral surface of the drum. On the other hand, the shutter device 10 rotates the drum in the reverse direction in the opened state, unwinds the shutter 14 from the outer peripheral surface of the drum, and feeds the shutter 13 downward from the inside of the housing 13. During this period, the shutter 14 is in a closed state in which the shutter 14 is deployed.

  As shown in FIGS. 2 and 3, guide grooves 16 extending along the longitudinal direction of the support frames 12 are formed on the mutually opposing inner side surfaces 12 a of a pair of support frames 12 formed in a rectangular tube shape by metal. Are formed respectively. The left and right side portions 14c of the shutter 14 are inserted into the guide grooves 16 of the support frames 12, respectively. The shutter 14 is in a state where movement in the left-right direction and the front-rear direction is restricted by the guide groove 16 of each support frame 12 when performing an opening / closing operation for opening or closing the shutter device 10. It is supported so as to reciprocate in the vertical direction.

  The front and back inner surfaces (opposing surfaces) 16a and 16b of the front and rear guide grooves 16 facing the front surface 14a and the rear surface 14b of the shutter 14 in the front-rear direction are dovetail grooves that open toward the front and rear surfaces 14a and 14b of the shutter 14, respectively. Are formed so as to extend along the longitudinal direction of each support frame 12. Further, in a state where both side portions 14 c of the shutter 14 are inserted into the respective guide grooves 16, there are gaps between the respective inner side surfaces 16 a and 16 b of the respective guide grooves 16 and the front surface 14 a and the rear surface 14 b of the shutter 14. Each is formed. The sealing material 20 is interposed between the front surfaces 14a and the rear surfaces 14b of the side portions 14c of the shutter 14 and the inner side surfaces 16a and 16b of the guide grooves 16 of the support frames 12 so as to close these gaps. Has been.

Next, the configuration of the sealing material 20 will be described in detail.
As shown in FIG.4 and FIG.5, the sealing material 20 is comprised by the polypropylene which is a thermoplastic resin material. That is, the sealing material 20 includes a long band-shaped base material 21 made of a polypropylene molded product, and a fluff portion 22 made of a plurality of polypropylene pile yarns 23 erected on the base material 21. ing. In this embodiment, the flame-retardant prescription is given to both the base material 21 and each pile yarn 23 (fluff part 22). In this case, a method of kneading a flame retardant into the material is adopted as the flame retardant prescription. As this flame retardant, those generally used are used, and for example, organic flame retardants such as bromine compounds and phosphorus compounds, or inorganic flame retardants such as antimony compounds and metal hydroxides are used.

  A pair of ridges 21 a are extended along the longitudinal direction of the base material 21 at positions spaced apart from each other by a predetermined distance in the short direction of the base material 21 on the base material 21. And the area | region inside each protruding item | line 21a on the base material 21 is set as the standing area | region where each pile thread | yarn 23 which comprises the fluff part 22 is erected. The sealing material 20 is formed by ultrasonically welding (thermally welding) the pile yarns 23 bundled in a state bent in a substantially U-shaped cross section onto the base material 21. At this time, each ridge 21a on the base material 21 functions as a positioning means when each pile yarn 23 is ultrasonically welded onto the base material 21.

  Each pile yarn 23 constituting the fluff portion 22 includes a yarn having a diameter of 33 dtex per filament and a yarn having a diameter of 21 dtex per filament subjected to crimping. That is, the fluff portion 22 is composed of two types of pile yarns 23 having different thicknesses. In addition, one half of the base material 21 in the lateral direction of each pile yarn 23 constituting the fluff portion 22 is lower than the height from above the base material 21 than the other half. Therefore, a step extending along the longitudinal direction of the base material 21 is formed at the center of the fluff 22 in the short direction of the base material 21.

  The portion of the fluff portion 22 where the pile yarn 23 is higher from above the base material 21 is the high pile portion 22a, while the height of the pile yarn 23 from above the base material 21 in the fluff portion 22 is high. The lower portion is a low pile portion 22b. In the present embodiment, the height of the high pile portion 22a from the base material 21 is set to about 5 mm, and the height of the low pile portion 22b from the base material 21 is set to about 4 mm. Therefore, the difference in height from the base material 21 between the high pile portion 22a and the low pile portion 22b is about 1 mm.

  As shown in FIGS. 2 and 3, in the state where the base material 21 of the sealing material 20 is mounted in each of the housing concave grooves 17 of the shutter device 10, the inner surfaces 16 a and 16 b of the guide grooves 16 are more Fluff portions 22 (high pile portion 22a and low pile portion 22b) protrude toward the front surface 14a side and the rear surface 14b side of the shutter 14, respectively. In this case, in the fluff portion 22 of each sealing material 20, the front end of the high pile portion 22a lightly contacts the front surface 14a and the rear surface 14b of the shutter 14, respectively, while the front end of the low pile portion 22b is the front surface 14a of the shutter 14 and Each is separated from the rear surface 14b.

Next, the effect | action of the sealing material 20 is demonstrated.
As shown in FIG. 6, when the shutter 14 is reciprocated to perform an opening / closing operation for opening or closing the shutter device 10, the low pile portion 22 b of the sealing material 20 is provided on the shutter 14. Only the high pile portion 22a is slid lightly without contact. For this reason, since the low pile portion 22b does not provide sliding resistance when the shutter 14 reciprocates, the sliding resistance of the shutter 14 is reduced and the sliding noise of the shutter 14 is also reduced.

  Further, as shown in FIG. 7, when the shutter 14 receives a very strong wind due to a typhoon or the like and is shaken largely in the front-rear direction when the shutter device 10 is closed, the high pile portion is caused by an impact caused by the shake of the shutter 14. Although 22a is crushed, the impact is mitigated by both the high pile portion 22a and the low pile portion 22b. That is, the shutter 14 swaying greatly in the front-rear direction is received by both the high pile portion 22a and the low pile portion 22b. As a result, the shaking (rattle) of the shutter 14 is effectively suppressed, and the impact sound caused by the shaking of the shutter 14 is also effectively reduced.

According to the first embodiment described in detail above, the following effects are exhibited.
(1) Since the fluff portion 22 of the sealing material 20 includes the high pile portion 22a and the low pile portion 22b, when the shutter 14 is shaken slightly along with the reciprocation when the shutter 14 is opened and closed, the fluff portion 22 Since only the pile portion 22a is in sliding contact with the shutter 14, the sliding resistance of the shutter 14 can be reduced. On the other hand, in the closed state of the shutter device 10, when the shutter 14 is greatly shaken by receiving a very strong wind such as a typhoon, the impact caused by the large shake of the shutter 14 is applied to both the high pile portion 22a and the low pile portion 22b. Therefore, the shaking (rattle) of the shutter 14 can be effectively suppressed. Accordingly, it is possible to reduce the sliding resistance when the shutter 14 is opened and closed while ensuring the ease of impact caused by the shaking of the shutter 14.

  (2) Since each pile yarn 23 constituting the fluff portion 22 of the sealing material 20 includes two types of pile yarns having different thicknesses, the sliding property of the shutter 14 and the shaking of the shutter 14 are affected. The accompanying shock mitigation can be maintained in a well-balanced manner.

  (3) Usually, if each pile yarn 23 is composed only of a thick yarn, each pile yarn 23 is unlikely to fall down when the shutter 14 is opened and closed, so that the sliding resistance of each pile yarn 23 to the shutter 14 is large. turn into. In this respect, in the present embodiment, among the pile yarns 23 constituting the fluff portion 22 of the sealing material 20, a thick yarn (a yarn having a diameter of 33 dtex per filament) and a thin yarn ( Two types of yarns are included, one having a diameter per filament of 21 dtex. For this reason, when the shutter 14 is opened and closed, the thin thread is bent, so that the thick thread easily falls in the moving direction of the shutter 14, so that the sliding resistance of each pile thread 23 with respect to the shutter 14 can be reduced. In addition, the strength of the fluff portion 22 of the sealing material 20 can be maintained by the thick thread even when the shutter 14 receives a very strong wind due to a typhoon or the like and shakes greatly in the front-rear direction in the closed state of the shutter device 10. Therefore, the shaking (rattle) of the shutter 14 can be sufficiently suppressed. If each pile yarn 23 is composed only of a yarn having an intermediate thickness between a thick yarn and a thin yarn, the effect of reducing the sliding resistance with respect to the shutter 14 and the effect of suppressing the shaking (rattle) of the shutter 14 as described above. It will be halfway.

  (4) Since each pile yarn 23 constituting the fluff portion 22 of the sealing material 20 includes a crimped yarn, the cushioning property of the fluff portion 22 can be enhanced. Accordingly, it is possible to improve the mitigation property of the impact caused by the shaking of the shutter 14 by the sealing material 20.

  (5) Since the pile yarns 23 and the base material 21 constituting the fluff portion 22 of the sealing material 20 are both composed of polypropylene imparted with flame retardancy, the sealing material 20 can be provided with fire resistance. .

(Second Embodiment)
Next, a second embodiment of the present invention will be described focusing on differences from the first embodiment.
In the second embodiment, as shown in FIG. 8, in the shutter device 10 of the first embodiment, two seal members 20 are provided in the opening on the lower side of the housing 13 so as to sandwich the shutter 14 from the front and rear. The gap between the housing 13 and the shutter 14 at the opening (in / out position) of the shutter 14 is sealed.

  As shown in FIG. 8, the housing 13 is disposed so as to extend horizontally in the left-right direction at the upper portion of the shutter device 10 with the upper end portion of each support frame 12 accommodated therein. A support shaft 60 extending in the left-right direction is installed at an upper position in the housing 13. A cylindrical drum 61 is supported on the support shaft 18 so as to be rotatable integrally with the support shaft 18. That is, the drum 61 is supported in a state where the support shaft 60 is inserted into the central through hole 61a. Four plate members 62 having a rectangular plate shape that is long in the left-right direction are fixed to the outer peripheral surface of the drum 61 at equal intervals in the circumferential direction of the drum 61. To one of the plate members 62, the blade plate 15 positioned at the uppermost end of the blade plates 15 constituting the shutter 14 is fixed.

  The shutter device 10 rotates the drum 61 in the forward direction (clockwise in FIG. 8) in the housing 13 and winds the shutter 14 on the outer peripheral surface of the drum 61, so that the shutter 14 is placed in the housing 13. It is made into the accommodated open state. On the other hand, the shutter device 10 rotates the drum 61 in the reverse direction (counterclockwise in FIG. 8) in the opened state, unwinds the shutter 14 from the outer peripheral surface of the drum 61, and feeds it downward from the housing 13. As a result, the shutter 14 is developed between the housing 13 and the floor surface 11 to be in a closed state.

  A pair of front and rear concave grooves 63 extending in the left-right direction that is the width direction of the shutter 14 are formed at the lower end portion in the housing 13 so as to face each other. One of the concave grooves 63 is formed at the inner end portion of the bottom wall extending from the front wall of the housing 13 and opens to the rear side. The other of the concave grooves 63 is provided on a bridge 64 that is installed between the support frames 12 and opens to the front side. And in each concave groove 63, the sealing material 20 extended in the left-right direction is each mounted | worn. In this case, the end portions of the high pile portions 22 a of the sealing materials 20 are in contact with both front and rear surfaces of the shutter 14.

  Further, in this case, the arrangement form of the pair of front and rear sealing materials 20 can be appropriately selected from the three shown in FIGS. 9A to 9C. In this embodiment, FIG. As shown in (2), both the sealing materials 20 are arranged so that the low pile portion 22b is positioned below the high pile portion 22a. For this reason, when the shutter 14 is opened (raised), only the high pile portions 22a of both the sealing materials 20 become resistance, while when the shutter 14 is closed (lowered), the high pile portions 22a of both the sealing materials 20 Since each is supported by the low pile portion 22b, the high pile portion 22a and the low pile portion 22b of both the sealing materials 20 become resistance.

  Therefore, the resistance due to each sealing material 20 when opening the shutter 14 is smaller than the resistance due to each sealing material 20 when closing the shutter 14. By doing in this way, when the shutter apparatus 10 is a manual type, the burden on the user is reduced. This is because the force required to open the shutter 14 is larger by the load of the shutter 14 than the force required to close the shutter 14.

  Further, as shown in FIG. 9B, when both the sealing materials 20 are arranged so that the low pile portion 22b is positioned on the upper side of the high pile portion 22a, both seals are used when the shutter 14 is closed. While only the high pile portion 22a of the material 20 provides resistance, when the shutter 14 is opened, the high pile portion 22a of both the seal materials 20 is supported by the low pile portions 22b, respectively. The portion 22a and the low pile portion 22b become resistors. Therefore, the resistance due to each sealing material 20 when the shutter 14 is closed is smaller than the resistance due to each sealing material 20 when the shutter 14 is opened.

  Furthermore, as shown in FIG. 9 (c), one of the two sealing materials 20 is arranged so that the low pile portion 22b is located on the upper side of the high pile portion 22a, and the other is placed on the high pile portion. If the lower pile portion 22b is positioned below the lower pile portion 22a, the resistance due to each sealing material 20 when the shutter 14 is opened is substantially the same as the resistance due to each sealing material 20 when the shutter 14 is closed. become.

  For example, when the shutter device 10 is of an automatic type, the arrangement of each sealing material 20 is set to any one of FIGS. 9A to 9C in consideration of the motor load and the like. Can be appropriately selected. Even if the shutter device 10 is a manual type, the arrangement mode of each sealing material 20 may be appropriately selected from any one of FIGS. 9A to 9C according to the situation. .

According to 2nd Embodiment explained in full detail above, in addition to the effect of said (1)-(5), the following effects are exhibited.
(6) Since the gap between the lower opening portion of the housing 13 and the shutter 14 can be sealed by the sealing material 20, it is possible to prevent foreign matters from entering the housing 13.

(Example of change)
Each of the above embodiments can be modified and embodied as follows.
As shown in FIG. 10, the sealing material 20 has a short film member 30 extending along the longitudinal direction of the base material 21 between the high pile portion 22 a and the low pile portion 22 b on the base material 21. You may make it stand up by making a hand direction into a standing direction. In this case, the film member 30 is ultrasonically welded together with the fluff portion 22 on the base material 21, and the height of the film member 30 from the base material 21 is lower than the high pile portion 22a and lower than the low pile portion 22b. It is set to be high. The film member 30 is obtained by applying a coating treatment to one side surface of a nonwoven fabric made of polypropylene and reinforcing the film member 30, and has higher rigidity than the fluff portion 22. In this way, the film member 30 can absorb the impact caused by the large shaking of the shutter 14 and can suppress the intrusion of rainwater and the entry of dust.

  In the sealing material 20 shown in FIG. 10, the height of the film member 30 from above the base material 21 may be the same as the low pile portion 22b as long as it is lower than the high pile portion 22a. You may make it lower than the pile part 22b.

-In the sealing material 20 shown in the said FIG. 10, the film member 30 may be arrange | positioned on the outer side of the high pile part 22a, the outer side of the low pile part 22b, or an outer side both surfaces.
-In the sealing material 20 shown in the said FIG. 10, the film member 30 may be comprised by the extrusion molding product of the thermoplastic elastomer to which the softness | flexibility was provided, for example by mix | blending a rubber component.

  As shown in FIG. 11, the sealing material 20 includes a strip-shaped base cloth 31, and a high pile portion 22 a and a low pile portion that are napped on the base cloth 31 so as to extend along the longitudinal direction of the base cloth 31. You may comprise by the velor material which consists of 22b. In this case, the base fabric 31 constituting the velor material is formed using a woven fabric formed by weaving the warp yarn 31a and the weft yarn 31b made of polypropylene fibers, and the fluff portion 22 is formed by the base fabric 31. A plurality of pile yarns 23 are pile-woven on the top. This pile weaving is a method of weaving each pile yarn 23 forming the fluff portion 22 so as to be entangled with the weft yarn 31 b of the base fabric 31. Furthermore, a coating layer 32 made of hard polypropylene is welded to the surface of the base fabric 31 opposite to the surface on which the fluff 22 is formed. And the base of each pile yarn 23 (fluff part 22) and the base fabric 31 are firmly joined by this coating layer 32. In this case, the base material 31 and the coating layer 32 constitute a base material.

  -The material of the sealing material 20 is not limited to polypropylene. For example, the material of the entire sealing material 20 may be polyamide. In this way, the sealing material 20 that is further excellent in durability and buffering property can be provided by the excellent restoring force and wear resistance of the polyamide fiber.

In the sealing material 20, the film member 30 may be intermittently extended on the base material 21 along the longitudinal direction of the base material 21.
The shutter device 10 may be of a type that simply lifts and lowers the shutter at the time of opening and closing, instead of a type that unwinds and winds the shutter 14 at the time of opening and closing.

  -The sealing material 20 does not necessarily need to be comprised with a flame-retardant material. That is, in the sealing material 20, either one of the base material 21 and each pile yarn 23 may not be formed of a flame retardant material, and both the base material 21 and each pile yarn 23 are made of flame retardant. It does not have to be constituted by a material.

The pile yarns 23 constituting the fluff portion 22 of the sealing material 20 may all be the same thickness.
The pile yarns 23 constituting the fluff portion 22 of the sealing material 20 do not necessarily include the pile yarns 23 that have been crimped.

  In each of the above embodiments, the fluff portion 22 of the sealing material 20 is configured by one row of the high pile portion 22a and the low pile portion 22b, but the fluff portion 22 is composed of two rows or more of the high pile portion 22a and the low pile portion 22b. You may comprise by. In this case, the high pile portions 22 a and the low pile portions 22 b may be alternately arranged on the base material 21 along the short direction of the base material 21.

  The fluff portion 22 of the sealing material 20 may be constituted by pile yarns 23 having three different heights. For example, an intermediate pile portion constituted by a plurality of pile yarns 23 that are lower than the high pile portion 22a and higher than the low pile portion 22b may be erected on the base material 21.

  In each of the above embodiments, the fluff portion 22 of the sealing material 20 is configured by the high pile portion 22a and the low pile portion 22b that are erected in half on the base material 21, but the high pile portion 22a and the low pile portion 22b The ratio may be arbitrarily changed.

-The fluff part 22 of the sealing material 20 may arrange | position the high pile part 22a and the low pile part 22b alternately or randomly along the longitudinal direction of the base material 21. FIG.
-The sealing material 20 may be used as, for example, a sealing material for a storage door portion of a shutter, as long as it is an application that requires both slidability and suppression of rattling.

Examples and comparative examples that further embody the above embodiments will be described below.
Example 1
As shown in FIG. 12, the height A of the sealing material 20 of each of the above embodiments is set to 5.0 mm, and the step B between the high pile portion 22a and the low pile portion 22b is set to 0.3 mm. did. Further, the fluff portion 22 of the sealing material 20 of Example 1 is constituted by a mixture of a pile yarn 23 having a thickness of 21 dtex and a pile yarn 23 having a thickness of 33 dtex. In addition, the length of the longitudinal direction of the sealing material 20 of this Example 1 is set to 33 mm.

(Comparative Example 1)
As shown in FIG. 13, Comparative Example 1 was obtained by setting the height A of the sealing material 20 of Example 1 to 5.5 mm and eliminating the step between the high pile portion 22a and the low pile portion 22b. Further, the fluff portion 22 of the sealing material of Comparative Example 1 is constituted only by a pile yarn 23 having a thickness of 23 dtex. The length in the longitudinal direction of the sealing material of Comparative Example 1 is set to 33 mm, similar to the sealing material 20 of Example 1.

<Measurement of compression repulsion>
As shown in FIG. 12, using the compression repulsion force measuring device 40, the compression repulsion force of Example 1 and Comparative Example 1 was measured as follows.

  First, the sealing material 20 of Example 1 is placed on a flat pedestal 41, and the sealing material 20 is increased from the fluff 22 side by the compression repulsion force measuring device 40 at a compression speed of 50 mm per minute. The compression repulsion force when compressed until the thickness A was 2.3 mm (maximum compression amount) was measured when the ambient temperature was −15 ° C., 0 ° C., 20 ° C., 40 ° C., and 60 ° C., respectively. The results are shown in the table of FIG.

Subsequently, as in Example 1, the compression repulsion force of Comparative Example 1 was measured when the ambient temperature was −15 ° C., 0 ° C., 20 ° C., 40 ° C., and 60 ° C., respectively. The results are shown in the table of FIG.
As shown in the table of FIG. 14, the measurement results of the compression repulsion force showed that the compression repulsion force of Example 1 exceeded the compression repulsion force of Comparative Example 1 at all ambient temperatures.

<Measurement of sliding resistance value>
As shown in FIGS. 15 and 16, using the sliding resistance value measuring device 51, the sliding resistance values of Example 1 and Comparative Example 1 were measured as follows.

  First, the rectangular flat plate 50 is suspended from the ceiling by the wire 52 so as to be inserted up to the lower end inside the rectangular cylindrical sliding resistance measuring device 51. Then, the four sealing materials 20 of Example 1 are attached to the sliding resistance value measuring device 51 so as to sandwich both side portions of the flat plate 50, respectively. At this time, the nip amount (sliding allowance) with respect to the flat plate 50 of the fluff portion 22 of each sealing material 20 is set to 0.3 mm. The sliding resistance value when the sliding resistance value measuring device 51 is moved right below at a speed of 50 mm per minute is obtained when the ambient temperature is -15 ° C, 0 ° C, 20 ° C, 40 ° C, 60 ° C. , Respectively. The results are shown in the table of FIG.

  Subsequently, as in Example 1, the sliding resistance value of Comparative Example 1 was measured when the ambient temperature was −15 ° C., 0 ° C., 20 ° C., 40 ° C., and 60 ° C., respectively. In this case, the nip amount (sliding contact allowance) with respect to the flat plate 50 of the fluff portion 22 of each sealing material of Comparative Example 1 was set to 0.8 mm. The results are shown in the table of FIG.

As shown in the table of FIG. 17, the sliding resistance value of Example 1 was lower than the sliding resistance value of Comparative Example 1 at all ambient temperatures, as shown in the table of FIG.
<Discussion>
From the above results, Example 1 has a larger compression repulsive force and a smaller sliding resistance than Comparative Example 1, regardless of the ambient temperature. Therefore, it was shown that Example 1 is superior to Comparative Example 1 in terms of impact relaxation (resilience) and slidability.

  DESCRIPTION OF SYMBOLS 10 ... Shutter apparatus, 12 ... Support frame, 14 ... Shutter, 14c ... Both sides of shutter, 20 ... Sealing material, 21 ... Base material, 23 ... Pile thread, 30 ... Film member.

Claims (5)

The shutter device comprising: a pair of support frames arranged in parallel at a predetermined distance; and a shutter having both sides supported by the support frames so as to reciprocate along the longitudinal direction of the support frames. A sealing material for a shutter device interposed between both sides of the shutter and each of the support frames,
A base material attached to each of the surfaces of the support frames facing the opposite sides of the shutter;
A plurality of pile yarns erected on the substrate;
A sealing material for a shutter device, wherein among the pile yarns, a height of a part of the pile yarns from the base material is made lower than a height of the other pile yarns from the base material.   The seal material for a shutter device according to claim 1, wherein each pile yarn includes pile yarns having different thicknesses.   The sealing material for a shutter device according to claim 1 or 2, wherein at least a part of the pile yarns is crimped.   4. The seal for a shutter device according to claim 1, wherein at least one of the pile yarns and the base material is made of a flame retardant material. 5. Wood. The base material has a strip shape along the longitudinal direction of each support frame,
On the base material, a strip-shaped film member extending along the longitudinal direction of the base material is erected with the short direction as the standing direction,
The film member has higher rigidity than each pile yarn, and has a height lower than that of at least one pile yarn having a higher height from above the base material. The sealing material for shutter devices as described in any one of Claims 1-4.

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