JP2012142342A - Deposition apparatus and method of manufacturing photoelectric conversion element - Google Patents

Deposition apparatus and method of manufacturing photoelectric conversion element Download PDF

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JP2012142342A
JP2012142342A JP2010292260A JP2010292260A JP2012142342A JP 2012142342 A JP2012142342 A JP 2012142342A JP 2010292260 A JP2010292260 A JP 2010292260A JP 2010292260 A JP2010292260 A JP 2010292260A JP 2012142342 A JP2012142342 A JP 2012142342A
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substrate
vapor deposition
film
deposition source
chamber
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Naoki Murakami
直樹 村上
Toshiaki Fukunaga
敏明 福永
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Fujifilm Corp
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Abstract

PROBLEM TO BE SOLVED: To deposit a CIGS film having in-plane uniformity and double graded structure of Ga in the thickness direction efficiently.SOLUTION: A deposition apparatus comprises a substrate transfer mechanism 16 which transfers a substrate for film in one direction. In the uppermost stream in the transfer direction A of a substrate S for deposition, an In-Ga first vapor deposition sources 31, consisting of In vapor deposition sources 21 and Ga vapor deposition sources 22 arranged alternately, is arranged in matrix. A control unit 15 controls the evaporation amount of respective vapor deposition sources 21-23 and 25 so that a region where the ratio Ga/(In+Ga) is minimum and the minimum ratio Ga/(In+Ga) is equal to or smaller than one half of the ratio Ga/(In+Ga) in the uppermost stream or the lowermost stream is present between the uppermost stream and the lowermost stream in the transfer direction A.

Description

本発明は、ＣＩＧＳ系太陽電池等の光電変換素子に用いられるＣＩＧＳ系化合物半導体膜を成膜するための成膜装置およびＣＩＧＳ系化合物半導体膜を備えた光電変換素子の製造方法に関するものである。   The present invention relates to a film forming apparatus for forming a CIGS compound semiconductor film used for a photoelectric conversion element such as a CIGS solar cell, and a method for manufacturing a photoelectric conversion element including a CIGS compound semiconductor film.

太陽電池は、光吸収により起電力（電流）を生じる半導体からなる光電変換層を裏面電極と表面電極（透明電極）とで挟んだ積層構造を有する。従来、バルクの単結晶Ｓｉまたは多結晶Ｓｉ、あるいは薄膜のアモルファスＳｉを用いたＳｉ系太陽電池が主流であったが、次世代の太陽電池として、光電変換層にカルコパイライト系のＣｕＩｎＳｅ2（ＣＩＳ）、Ｃｕ（Ｉｎ，Ｇａ）Ｓｅ2（以下、単に「ＣＩＧＳ」ということがある。）を用いたものが検討されている。このＣＩＧＳを光電変換層に用いた太陽電池は、効率が比較的高く、光吸収率が高いため薄膜化できることから、盛んに研究されている。 A solar cell has a laminated structure in which a photoelectric conversion layer made of a semiconductor that generates an electromotive force (current) by light absorption is sandwiched between a back electrode and a front electrode (transparent electrode). Conventionally, Si-based solar cells using bulk single-crystal Si or polycrystalline Si, or thin-film amorphous Si have been mainstream. However, as a next-generation solar cell, a chalcopyrite-based CuInSe 2 (CIS) is used for a photoelectric conversion layer. ), Cu (In, Ga) Se 2 (hereinafter sometimes simply referred to as “CIGS”) has been studied. Solar cells using this CIGS for the photoelectric conversion layer are actively studied because they are relatively high in efficiency and can be thinned because of their high light absorption rate.

ＣＩＧＳを光電変換層に用いた太陽電池は、例えば、裏面電極上に、光電変換層として、ｐ型のＣＩＧＳ層を形成し、このｐ型のＣＩＧＳ層上にｎ型のＣｄＳ層を形成し、さらにこのＣｄＳ層上に透明電極が形成された積層構造を有している。このような太陽電池構造においては、ｐ型のＣＩＧＳ層とｎ型のＣｄＳ層とによりｐ−ｎ接合が構成されることとなる。   A solar cell using CIGS as a photoelectric conversion layer, for example, forms a p-type CIGS layer as a photoelectric conversion layer on the back electrode, and forms an n-type CdS layer on the p-type CIGS layer, Furthermore, it has a laminated structure in which a transparent electrode is formed on the CdS layer. In such a solar cell structure, a p-n junction is formed by the p-type CIGS layer and the n-type CdS layer.

既に、光電変換層に用いられるＣＩＧＳ層の形成方法や装置について種々提案されている。光電変換層の形成法の主な方法としては、多元蒸着法、セレン化法が知られている。
ここでは、多元蒸着法について検討する。多元蒸着法とは、Ｃｕ、Ｉｎ、Ｇａ、Ｓｅ原料をそれぞれ別々のルツボから蒸発させて成膜する手法である。 Various methods and apparatuses for forming a CIGS layer used for a photoelectric conversion layer have already been proposed. As a main method for forming a photoelectric conversion layer, a multi-source deposition method and a selenization method are known.
Here, the multi-source deposition method is examined. The multi-source deposition method is a method of forming a film by evaporating Cu, In, Ga, and Se raw materials from separate crucibles.

さらに、多元蒸着法としてはバイレイヤー法および３段階法という方法がある。３段階法とは、第１段階では、Ｉｎ、Ｇａ、Ｓｅを供給して(Ｉｎ,Ｇａ)２Ｓｅ３膜を形成し、第２段階では、ＣｕとＳｅのみを供給して膜全体の組成がＣｕ過剰組成になるまで膜形成を行い、第３段階で再びＩｎ、Ｇａ、Ｓｅを供給して、最終的な組成が(Ｉｎ,Ｇａ)過剰組成となるようにする方法である。 Furthermore, as the multi-source deposition method, there are a bilayer method and a three-stage method. In the three-stage method, in the first stage, In, Ga and Se are supplied to form an (In, Ga) 2 Se 3 film, and in the second stage, only Cu and Se are supplied to form the composition of the entire film. In this method, film formation is performed until Cu is in excess of Cu, and In, Ga, and Se are supplied again in the third stage so that the final composition becomes (In, Ga) in excess.

一方、バイレイヤー法とは、Ｃｕ（Ｉｎ，Ｇａ）Ｓｅ2：ＣｕxＳｅからなるＣｕ含量の多い、相分離された化合物混合物を基材上に生成する工程と、この混合物中のＣｕxＳｅを（Ｉｎ，Ｇａ）およびＳｅに曝すことによって、あるいは（Ｉｎ，Ｇａ）yＳｅzに曝すことによって、ＣｕxＳｅをＣｕw（Ｉｎ，Ｇａ）yＳｅzに転化する工程とによりＣｕ（Ｉｎ，Ｇａ）Ｓｅ2薄膜を形成する方法である（特許文献１参照）。 On the other hand, the by-layer method, Cu (In, Ga) Se 2: Cu x lot of Cu content consisting of Se, generating a phase-separated compound mixture onto a substrate, Cu x Se in the mixture the (in, Ga) by exposure to and Se, or (in, Ga) y Se by exposure to z, Cu x Se to Cu w (in, Ga) y Se by the steps of converting the z Cu (an in , Ga) Se 2 thin film forming method (see Patent Document 1).

また、ＣＩＧＳ系太陽電池において、光電変換率を向上させる研究も多々進められており、変換効率の向上には、ＣＩＧＳ光電変換層に、III族元素（Ｉｎ，Ｇａ）の組成傾斜構造としてグレーデッドバンド構造を作り込むことが有効であることが知られている（特許文献２、３参照）。   In addition, in the CIGS-based solar cell, many studies have been made to improve the photoelectric conversion rate. To improve the conversion efficiency, the CIGS photoelectric conversion layer is graded as a composition gradient structure of group III elements (In, Ga). It is known that it is effective to create a band structure (see Patent Documents 2 and 3).

ＣＩＧＳは、ＩｎとＧａの組成比によりバンドギャップを制御することができる。ＣＩＧＳ膜の深さ方向でＩｎとＧａの組成比を変化させてグレーデッドバンドギャップを形成することにより、ＣＩＧＳ膜を用いた薄膜太陽電池の高効率化を図ることができる。例えば、ｐｎ接合側の表面（光入射側の主面）から裏面に向けて、ＧａとＩｎの組成比の指標であるＧａ／（Ｉｎ＋Ｇａ）が徐々に増加する分布とすれば、バンドギャップが表面から裏面に向けて拡大するシングルグレーデッドバンドギャップを形成することができる。バンドギャップの変化によって、ＣＩＧＳ膜内部に電界が生じ、その電界により、光励起されたキャリアがＣＩＧＳ膜の表面に形成されるｐｎ接合へと輸送されるため変換効率が向上すると考えられている。   CIGS can control the band gap by the composition ratio of In and Ga. By forming the graded band gap by changing the composition ratio of In and Ga in the depth direction of the CIGS film, the efficiency of the thin film solar cell using the CIGS film can be increased. For example, assuming that Ga / (In + Ga), which is an index of the composition ratio of Ga and In, gradually increases from the surface on the pn junction side (main surface on the light incident side) to the back surface, the band gap is the surface It is possible to form a single graded band gap that expands toward the back surface. It is considered that the conversion efficiency is improved because an electric field is generated inside the CIGS film due to the change in the band gap, and the photoexcited carriers are transported to the pn junction formed on the surface of the CIGS film.

また、上記のグレーデッドバンドギャップに加えて、ＣＩＧＳ膜の光入射側の表層部にＧａ濃度の高い層を形成することにより、ｐｎ接合界面でのバンドギャップを拡大し、開放端電圧を向上させるダブルグレーデッドバンドギャップを形成できる。ダブルグレーデッドバンドギャップによれば、より高い変換効率を達成することができる。   In addition to the above graded band gap, a high Ga concentration layer is formed on the surface of the CIGS film on the light incident side, thereby expanding the band gap at the pn junction interface and improving the open-circuit voltage. A double graded band gap can be formed. According to the double graded band gap, higher conversion efficiency can be achieved.

他方、ＣＩＧＳ層の成膜の効率化を図るため、基板を移動させつつ成膜する成膜方法および成膜装置などが提案されている（特許文献４、５等）。   On the other hand, in order to increase the efficiency of forming the CIGS layer, a film forming method and a film forming apparatus for forming a film while moving the substrate have been proposed (Patent Documents 4, 5, etc.).

例えば、特許文献４は、ＣＩＧＳ系太陽電池をロール・トゥ・ロール方式で製造する製造装置が提案されており、ＣＩＧＳ膜の成膜装置として、ロール・トゥ・ロール式多元同時蒸着成膜装置が提案されている。   For example, Patent Document 4 proposes a manufacturing apparatus for manufacturing CIGS solar cells by a roll-to-roll method. As a CIGS film forming apparatus, a roll-to-roll multi-component simultaneous vapor deposition film forming apparatus is used. Proposed.

特許文献４に記載の装置では、各元素の蒸着源が元素毎に基板の搬送方向に垂直なライン状に並べられているために、各元素が順番に基板上に堆積することとなり、その結果、各元素の濃度はその蒸着源位置で最大となる。   In the apparatus described in Patent Document 4, since the vapor deposition sources of the respective elements are arranged in a line perpendicular to the substrate transport direction for each element, the respective elements are sequentially deposited on the substrate. The concentration of each element is maximized at the deposition source position.

一方、特許文献５には、ＣＩＧＳ膜の膜厚方向の組成分布、特にIII族元素であるＩｎとＧａの膜厚方向の組成分布を良好なものとするために、Ｉｎ蒸着源と、Ｇａ蒸着源とをマトリクス状に配置した製造装置が提案されている。この装置においては、マトリクス状に配列されたＩｎ，Ｇａの蒸着源と、ライン状に複数配置されたＣｕ蒸着源、ライン状に複数配置されたＳｅ蒸着源を１つの蒸着源群とし、この蒸着源群が搬送方向に複数配置されており、ＩｎとＧａとの組成比を膜厚方向に均一なものとすることができる。   On the other hand, in Patent Document 5, in order to improve the composition distribution in the film thickness direction of the CIGS film, particularly the composition distribution in the film thickness direction of the group III elements In and Ga, an In vapor deposition source and Ga vapor deposition are disclosed. A manufacturing apparatus in which the sources are arranged in a matrix has been proposed. In this apparatus, an In and Ga vapor deposition source arranged in a matrix, a plurality of Cu vapor deposition sources arranged in a line, and a plurality of Se vapor deposition sources arranged in a line form one vapor deposition source group. A plurality of source groups are arranged in the transport direction, and the composition ratio of In and Ga can be made uniform in the film thickness direction.

特表平８−５１０３５９号公報Japanese National Patent Publication No. 8-510359 国際公開第２００４／０９０９９５号パンフレットInternational Publication No. 2004/090995 Pamphlet 特開２００４−１５８５５６号公報JP 2004-158556 A 米国特許第７１９４１９７号明細書US Pat. No. 7,194,197 特開２００５−１１６７５５号公報JP 2005-116755 A

特許文献４のようなロール・トゥ・ロール式多元同時蒸着成膜装置は、大面積の成膜に適しているが、各蒸発源からの蒸発量は、各蒸発源の開口部分で最大となる分布を有しているため、特許文献４の装置のように、各元素の蒸発源がそれぞれライン状に配置された構成においては、面内に均一なＣＩＧＳ層を得ることができず、十分な光電変換効率を達成することができないという問題があることが本発明者らの検討により明らかになった。   A roll-to-roll multi-source co-evaporation film forming apparatus such as Patent Document 4 is suitable for large-area film formation, but the amount of evaporation from each evaporation source is maximized at the opening of each evaporation source. Because of the distribution, in the configuration in which the evaporation sources of the respective elements are arranged in a line as in the apparatus of Patent Document 4, a uniform CIGS layer cannot be obtained in the plane, which is sufficient. The present inventors have revealed that there is a problem that the photoelectric conversion efficiency cannot be achieved.

また、特許文献５の成膜方法および装置では、マトリクス状に配置されたＩｎ，Ｇａの蒸着源、Ｃｕ蒸着源およびＳｅ蒸着源からなる蒸着源群を複数配置することにより膜厚方向におけるＩｎ、Ｇａを均一なものとする効果が得られるが、逆に、III族元素（Ｉｎ，Ｇａ）の組成傾斜構造の形成に対応することができず、ＣＩＧＳ膜にダブルグレーデッド構造を作り込めないために、変換効率を向上させることができないという欠点があった。   Further, in the film forming method and apparatus of Patent Document 5, by arranging a plurality of vapor deposition source groups including In, Ga vapor deposition sources, Cu vapor deposition sources, and Se vapor deposition sources arranged in a matrix, In, Although the effect of making Ga uniform is obtained, conversely, it cannot cope with the formation of a composition gradient structure of group III elements (In, Ga), and a double graded structure cannot be formed in the CIGS film. However, the conversion efficiency cannot be improved.

さらに、ＣＩＧＳ層の高速化に当たっては、特許文献１に記載のバイレイヤー法による成膜が好ましいと考えられるが、現状では、光電変換効率の高い良好なＣＩＧＳ層を形成することが可能なバイレイヤー法に適する成膜装置が実現されていない。   Furthermore, in order to increase the speed of the CIGS layer, it is considered that film formation by the bilayer method described in Patent Document 1 is preferable, but at present, a bilayer capable of forming a good CIGS layer with high photoelectric conversion efficiency. A film forming apparatus suitable for the law has not been realized.

本発明は、上記事情に鑑みてなされたものであって、厚み方向にダブルグレーデッド構造を有し、かつ面内均一性を有するＣＩＧＳ膜を効率的に製造することができる成膜装置および、高い光電変換率を有する光電変換素子を効率的に製造する光電変換素子の製造方法を提供することを目的とするものである。   The present invention has been made in view of the above circumstances, and has a double-graded structure in the thickness direction and a film forming apparatus capable of efficiently producing a CIGS film having in-plane uniformity, and It aims at providing the manufacturing method of the photoelectric conversion element which manufactures the photoelectric conversion element which has a high photoelectric conversion rate efficiently.

本発明の成膜装置は、Ｃｕ、Ｉｎ、Ｇａ、Ｓｅを含む化合物半導体膜を成膜用基板の一面に成膜する成膜装置であって、
蒸着室と、該蒸着室内において、前記成膜用基板を一方向に搬送する基板搬送機構と、前記蒸着室内に配置された、前記Ｃｕ、Ｉｎ，Ｇａ、Ｓｅそれぞれを蒸着させるための複数のＣｕ蒸着源、複数のＩｎ蒸着源、複数のＧａ蒸着源およびＳｅ蒸着源と、前記各蒸着源からの各元素の蒸発量を制御する制御部とを備え、
前記成膜用基板の搬送方向に沿って最上流に、前記Ｉｎ蒸着源と前記Ｇａ蒸着源とが交互に配置されてなる行列状のＩｎ−Ｇａ第１蒸着源群が配置されており、
前記制御部が、前記搬送方向の前記最上流と最下流との間にＧａ／（Ｉｎ＋Ｇａ）比が最小、かつ該最小のＧａ／（Ｉｎ＋Ｇａ）比が前記最上流または前記最下流でのＧａ／（Ｉｎ＋Ｇａ）比の半分以下となる領域が存在するように、前記各蒸着源からの蒸発量を制御するものである。 A film forming apparatus of the present invention is a film forming apparatus for forming a compound semiconductor film containing Cu, In, Ga, and Se on one surface of a film forming substrate,
A deposition chamber, a substrate transport mechanism for transporting the film-forming substrate in one direction in the deposition chamber, and a plurality of Cu for depositing each of the Cu, In, Ga, and Se disposed in the deposition chamber A deposition source, a plurality of In deposition sources, a plurality of Ga deposition sources and a Se deposition source, and a control unit for controlling the evaporation amount of each element from each of the deposition sources;
A matrix In-Ga first vapor deposition source group in which the In vapor deposition source and the Ga vapor deposition source are alternately arranged is arranged in the uppermost stream along the transport direction of the film formation substrate,
The control unit has a minimum Ga / (In + Ga) ratio between the most upstream and the most downstream in the transport direction, and the minimum Ga / (In + Ga) ratio is the most upstream or the most downstream Ga / The evaporation amount from each of the vapor deposition sources is controlled so that there is a region that is less than half of the (In + Ga) ratio.

「前記最上流でのＧａ／（Ｉｎ＋Ｇａ）比」とは、前記Ｉｎ−Ｇａ第１蒸着源群が配置された領域におけるＧａ／（Ｉｎ＋Ｇａ）比である。前記最上流と最下流との間に存在するＧａ／（Ｉｎ＋Ｇａ）比が最小となる領域とは、前記最上流の蒸着源群と前記最下流の蒸着源群の間に存在する領域である。   The “topmost Ga / (In + Ga) ratio” is a Ga / (In + Ga) ratio in a region where the In—Ga first vapor deposition source group is disposed. The region where the Ga / (In + Ga) ratio existing between the most upstream and the most downstream is the minimum is a region existing between the most upstream vapor deposition source group and the most downstream vapor deposition source group.

前記複数のＣｕ蒸着源、前記複数のＩｎ蒸着源および前記複数のＧａ蒸着源が、前記成膜用基板の搬送方向に沿って上流側から順に、
前記Ｉｎ−Ｇａ第１蒸着源群、
前記Ｃｕ蒸着源と前記Ｇａ蒸着源とが交互に配置されてなる行列状のＣｕ−Ｇａ第１蒸着源群、
前記Ｃｕ蒸着源と前記Ｉｎ蒸着源とが交互に配置されてなる行列状のＣｕ−Ｉｎ蒸着源群、
前記Ｃｕ蒸着源と前記Ｇａ蒸着源とが交互に配置されてなる行列状のＣｕ−Ｇａ第２蒸着源群、および
前記Ｉｎ蒸着源と前記Ｇａ蒸着源とが交互に配置されてなる行列状のＩｎ−Ｇａ第２蒸着源群を構成するようにして配置されていることが望ましい。 The plurality of Cu deposition sources, the plurality of In deposition sources, and the plurality of Ga deposition sources are sequentially from the upstream side along the transport direction of the film formation substrate.
The In-Ga first deposition source group,
A matrix Cu-Ga first deposition source group in which the Cu deposition source and the Ga deposition source are alternately arranged;
A matrix Cu-In vapor deposition source group in which the Cu vapor deposition source and the In vapor deposition source are alternately arranged;
A matrix Cu-Ga second deposition source group in which the Cu deposition source and the Ga deposition source are alternately arranged, and a matrix shape in which the In deposition source and the Ga deposition source are alternately arranged. It is desirable to arrange the In—Ga second vapor deposition source group.

本発明の成膜装置においては、前記制御部が、前記最小のＧａ／（Ｉｎ＋Ｇａ）比が０となるように、前記各蒸着源からの蒸発量を制御するものであることが好ましい。   In the film forming apparatus of the present invention, it is preferable that the control unit controls an evaporation amount from each of the evaporation sources so that the minimum Ga / (In + Ga) ratio becomes zero.

また、前記制御部が、下流域におけるＣｕの蒸発量を、上流域におけるＣｕの蒸発量と比較して相対的に抑制させた条件で、前記各元素の上記前記基板の一面に供給するように、前記各蒸着源からの蒸発量を制御するものであることが好ましい。   In addition, the control unit may supply the surface of the substrate with each element under the condition that the amount of Cu evaporation in the downstream region is relatively suppressed as compared with the amount of evaporation of Cu in the upstream region. It is preferable that the amount of evaporation from each of the vapor deposition sources is controlled.

ここで、上流域は、搬送方向の上流側であり前記最上流からＧａ／（Ｉｎ＋Ｇａ）比が最上流または最下流の半分以下となる領域までを含むものとし、下流域は、該上流域に引き続く搬送方向下流側の領域をいうものとする。   Here, the upstream region is upstream in the transport direction and includes from the most upstream to the region where the Ga / (In + Ga) ratio is equal to or less than half of the most upstream or most downstream, and the downstream region continues to the upstream region. An area on the downstream side in the conveyance direction is assumed.

前記各蒸着源群の前記各行列状の各蒸着源の列が前記成膜用基板の前記搬送方向と交差するように配置されていればよいが、特には、前記各蒸着源群の前記各行列状の各蒸着源の列が前記成膜用基板の前記搬送方向と略垂直に交わるように配置されていることが望ましい。   It suffices that the rows of the respective vapor deposition sources in the respective matrix sources of the respective vapor deposition source groups are arranged so as to intersect the transport direction of the film formation substrate, in particular, the respective vapor deposition source groups. It is desirable that the matrix of the vapor deposition sources be arranged so as to intersect substantially perpendicularly with the transport direction of the film formation substrate.

前記Ｃｕ−Ｇａ第２蒸着源群におけるＣｕ蒸着源数を、前記Ｃｕ−Ｇａ第１蒸着源群におけるＣｕ蒸着源数よりも少なく配置してもよい。   The number of Cu vapor deposition sources in the Cu—Ga second vapor deposition source group may be less than the number of Cu vapor deposition sources in the Cu—Ga first vapor deposition source group.

前記Ｓｅ蒸着源は、前記各蒸着源群の前記行列状の各蒸着源の列間に、該列に沿って延びるライン上に複数の開口を有するライン状蒸着源であることが好ましい。   The Se deposition source is preferably a linear deposition source having a plurality of openings on a line extending along the row between the rows of the matrix-like deposition sources of the deposition source groups.

前記蒸着室に、前記成膜用基板を加熱する加熱手段を備えていることが望ましい。   It is desirable that the vapor deposition chamber is provided with a heating means for heating the deposition substrate.

前記蒸着室の下流側に、該蒸着室と連結された、前記化合物半導体膜が成膜された前記成膜用基板を冷却する冷却室を備え、該冷却室に、Ｓｅ蒸着源を備えていることが望ましい。   A cooling chamber for cooling the deposition substrate on which the compound semiconductor film is formed is connected to the deposition chamber on the downstream side of the deposition chamber, and an Se deposition source is provided in the cooling chamber. It is desirable.

前記冷却室に、前記成膜用基板を冷却する冷却手段を備えていることが望ましい。   It is desirable that the cooling chamber is provided with a cooling means for cooling the film formation substrate.

本発明の装置としては、前記蒸着室の上流側に該蒸着室に連結して配置された、前記成膜用基板を収納する処理前基板収納部と、該成膜用基板を加熱する加熱手段とを備えた基板導入室と、
前記冷却室の下流側に該冷却室に連結して配置された、前記化合物半導体膜が成膜された前記成膜用基板が収納される処理済基板収納部を備えた基板排出室とをさらに備え、
前記基板導入室、前記蒸着室、前記冷却室および前記基板排出室が直線状に配置され、
前記基板搬送機構が、前記成膜用基板を前記各室に亘って前記一方向にインライン状に移動させるものであることが望ましい。 The apparatus of the present invention includes a pre-treatment substrate storage portion for storing the film formation substrate, which is connected to the vapor deposition chamber on the upstream side of the vapor deposition chamber, and a heating means for heating the film formation substrate. A substrate introduction chamber comprising:
A substrate discharge chamber provided with a processed substrate storage portion that is disposed downstream of the cooling chamber and is connected to the cooling chamber and that stores the film-forming substrate on which the compound semiconductor film is formed; Prepared,
The substrate introduction chamber, the vapor deposition chamber, the cooling chamber, and the substrate discharge chamber are arranged linearly,
It is desirable that the substrate transport mechanism is configured to move the film formation substrate across the chambers in the one direction in-line.

また、本発明の別の態様の装置としては、前記蒸着室の上流側に該蒸着室に連結して配置された、前記成膜用基板を巻き出す巻出ロールと、該成膜用基板を加熱する加熱手段とを備えた基板導入室と、
前記冷却室の下流側に該冷却室に連結して配置された、前記化合物半導体膜が成膜された前記成膜用基板を巻き取る巻取りロールを備えた基板排出室とをさらに備え、
前記基板導入室、前記蒸着室、前記冷却室および前記基板排出室が直線状に配置され、
前記移動手段が、前記巻出しロールから前記成膜用基板を巻き出させ、前記各室を経た前記成膜用基板を前記巻取りロールで巻き取らせるものであることが望ましい。 Moreover, as an apparatus according to another aspect of the present invention, an unwinding roll for unwinding the film-forming substrate, which is connected to the vapor deposition chamber on the upstream side of the vapor deposition chamber, and the film-forming substrate are provided. A substrate introduction chamber provided with a heating means for heating;
A substrate discharge chamber provided on the downstream side of the cooling chamber and connected to the cooling chamber, the substrate discharge chamber including a winding roll for winding the film-forming substrate on which the compound semiconductor film is formed;
The substrate introduction chamber, the vapor deposition chamber, the cooling chamber, and the substrate discharge chamber are arranged linearly,
It is desirable that the moving means unwinds the film-forming substrate from the unwinding roll, and winds the film-forming substrate that has passed through the chambers with the winding roll.

本発明の光電変換素子の製造方法は、Ｃｕ（Ｉｎ,Ｇａ)Ｓｅ2化合物半導体からなる光電変換層を備えた光電変換素子の製造方法であって、
一面に裏面電極を備えた基板を一方向に搬送させつつ、該搬送方向に沿って配置された複数のＣｕ蒸着源、複数のＩｎ蒸着源、複数のＧａ蒸着源およびＳｅ蒸着源から前記基板の一面側に前記各元素の蒸気を供給して、前記裏面電極上に前記光電変換層を成膜する蒸着成膜工程を有し、
該蒸着成膜工程において、前記基板の搬送方向の最上流において、前記Ｓｅ蒸着源および前記Ｉｎ蒸着源と前記Ｇａ蒸着源とが交互に配置されてなる行列状のＩｎ−Ｇａ第１蒸着源群を用いて、Ｉｎ、ＧａおよびＳｅを前記基板の一面側に供給すると共に、前記搬送方向の前記最上流と最下流との間にＧａ／（Ｉｎ＋Ｇａ）比が最小、かつ該最小のＧａ／（Ｉｎ＋Ｇａ）比が前記最上流または前記最下流でのＧａ／（Ｉｎ＋Ｇａ）比の半分以下となる領域が存在するように、前記各蒸着源からの蒸発量を制御しつつ、
前記最上流を含む上流域において、Ｃｕ（Ｉｎ，Ｇａ）Ｓｅ2、ＣｕxＳｅの互いに相分離された化合物からなる混合物を前記裏面電極上に生成させ、
前記上流域に続く、前記最下流を含む下流域において、前記ＣｕxＳｅをＣｕ（Ｉｎ、Ｇａ）Ｓｅ2に転化させることにより、前記光電変換層を成膜することを特徴とする。 The method for producing a photoelectric conversion element of the present invention is a method for producing a photoelectric conversion element comprising a photoelectric conversion layer made of a Cu (In, Ga) Se 2 compound semiconductor,
While transporting a substrate having a back electrode on one side in one direction, from a plurality of Cu deposition sources, a plurality of In deposition sources, a plurality of Ga deposition sources and a Se deposition source arranged along the transport direction, Supplying a vapor of each element to one surface side, and having a vapor deposition film forming step of forming the photoelectric conversion layer on the back electrode;
In the vapor deposition film forming step, a matrix In-Ga first vapor deposition source group in which the Se vapor deposition source, the In vapor deposition source and the Ga vapor deposition source are alternately arranged in the uppermost stream in the transport direction of the substrate. In, Ga and Se are supplied to one side of the substrate, and the Ga / (In + Ga) ratio is minimum between the most upstream and the most downstream in the transport direction, and the minimum Ga / ( While controlling the amount of evaporation from each deposition source so that there is a region where the In + Ga) ratio is less than half of the Ga / (In + Ga) ratio at the most upstream or the most downstream,
In the upstream region including the uppermost stream, a mixture of Cu (In, Ga) Se 2 and Cu x Se that are phase-separated from each other is generated on the back electrode,
The photoelectric conversion layer is formed by converting the Cu x Se into Cu (In, Ga) Se 2 in the downstream area including the most downstream area following the upstream area.

前記最小のＧａ／（Ｉｎ＋Ｇａ）比を０とすることが好ましい。   The minimum Ga / (In + Ga) ratio is preferably 0.

前記下流域におけるＣｕの蒸発量を、前記上流域におけるＣｕの蒸発量と比較して相対的に抑制させた条件で、前記各元素の上記前記基板の一面に供給することが好ましい。   It is preferable that the Cu evaporation amount in the downstream region is supplied to one surface of the substrate of the elements under a condition that the Cu evaporation amount in the upstream region is relatively suppressed.

なお、本発明の光電変換素子の製造方法における上記蒸着成膜工程には、本発明の成膜装置を好適に用いることができる。   In addition, the film-forming apparatus of this invention can be used suitably for the said vapor deposition film-forming process in the manufacturing method of the photoelectric conversion element of this invention.

本発明の成膜装置によれば、成膜用基板の搬送方向に沿って最上流に、Ｉｎ蒸着源とａ蒸着源とが交互に配置されてなる行列状のＩｎ−Ｇａ第１蒸着源群が配置されているので、面内均一性の高い膜を成膜することができると共に、成膜初期にＩｎとＧａとを混合した成膜がなされるために、良質な結晶のカルコパイライト構造の形成が安定的にできるため膜剥がれが生じず、高い歩留まりで生産できる。   According to the film forming apparatus of the present invention, a matrix In-Ga first vapor deposition source group in which an In vapor deposition source and an a vapor deposition source are alternately arranged in the uppermost stream along the conveyance direction of the film formation substrate. Therefore, a film with high in-plane uniformity can be formed, and a film of In and Ga is mixed at the initial stage of film formation. Since it can be stably formed, film peeling does not occur, and production can be performed with a high yield.

また、蒸着源からの蒸発量を制御する制御部を備え、制御部が搬送方向の最上流と最下流との間にＧａ／（Ｉｎ＋Ｇａ）比が最小、かつ該最小のＧａ／（Ｉｎ＋Ｇａ）比が最上流または最下流でのＧａ／（Ｉｎ＋Ｇａ）比の半分以下となる領域が存在するように、各蒸着源からの蒸発量を制御するので、Ｇａの良好なダブルグレーデッド構造を形成することができる。   In addition, a control unit for controlling the evaporation amount from the evaporation source is provided, and the control unit has a minimum Ga / (In + Ga) ratio between the most upstream and the most downstream in the transport direction, and the minimum Ga / (In + Ga) ratio. Since the amount of evaporation from each evaporation source is controlled so that there is a region where the ratio is less than half of the Ga / (In + Ga) ratio at the most upstream or most downstream, a good double graded structure of Ga should be formed Can do.

本成膜装置を用いれば、良好なＧａのダブルグレーデッド構造を備え、かつ膜剥がれを生じないＣＩＧＳ膜を作製することができるので、光電変換効率の高い光電変換素子を高効率に作製することができる。   By using this film forming apparatus, it is possible to produce a CIGS film having a good Ga double graded structure and without causing film peeling, and thus producing a photoelectric conversion element having high photoelectric conversion efficiency with high efficiency. Can do.

また、基板を一方向に搬送させる搬送機構を備え、基板を一方向に搬送させつつＣＩＧＳ膜を成膜させることができるよう構成されているので、効率的な成膜を行うことができ、スループットの向上を図ることができる。   In addition, since a CIGS film can be formed while transporting the substrate in one direction, and a CIGS film can be formed while transporting the substrate in one direction, efficient film formation can be performed. Can be improved.

第１の実施形態に係る成膜装置の概略構成を示す断面図Sectional drawing which shows schematic structure of the film-forming apparatus which concerns on 1st Embodiment 第１の実施形態の成膜装置における蒸着源の配置例を示す平面図The top view which shows the example of arrangement | positioning of the vapor deposition source in the film-forming apparatus of 1st Embodiment 第２の実施形態に係る成膜装置の概略構成を示す断面図Sectional drawing which shows schematic structure of the film-forming apparatus which concerns on 2nd Embodiment. 光電変換素子（太陽電池セル）の概略構成を示す断面図Sectional drawing which shows schematic structure of a photoelectric conversion element (solar cell) 比較例の成膜装置における蒸着源の配置を示す平面図The top view which shows arrangement | positioning of the vapor deposition source in the film-forming apparatus of a comparative example 実施例の方法で作製した光電変換素子の光電変換素子膜厚方向における二次イオン質量分析結果を示すグラフThe graph which shows the secondary ion mass spectrometry result in the photoelectric conversion element film thickness direction of the photoelectric conversion element produced by the method of the Example

以下、本発明の実施形態について図面を参照して詳細に説明する。なお、視認しやすくするため、各図中、各構成要素の縮尺等は実際のものとは適宜異ならせてある。   Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In addition, in order to make it easy to visually recognize, in each figure, the scale of each component is appropriately changed from the actual one.

「第１の実施形態の成膜装置」
図１は、本発明の第１の実施形態に係る成膜装置の概略構成を模式的に示す図である。
本実施形態の成膜装置１は、成膜用基板Ｓに対してＣＩＧＳ系半導体膜（以下において単に「ＣＩＧＳ膜」と表記する。）を成膜するためのインライン式多元同時蒸着成膜装置であり、直線状に順に連結配置された、基板導入室１０、蒸着室１１、冷却室１３および基板排出室１４からなる４つのチャンバーと、成膜用基板Ｓを導入室１０から排出室１４に直線状に移動させる基板搬送機構１６と、蒸着条件等を制御する制御部１５とを備えている。 “Film Forming Apparatus of First Embodiment”
FIG. 1 is a diagram schematically showing a schematic configuration of a film forming apparatus according to the first embodiment of the present invention.
The film forming apparatus 1 of the present embodiment is an in-line multi-source co-evaporation film forming apparatus for forming a CIGS semiconductor film (hereinafter simply referred to as “CIGS film”) on a film forming substrate S. There are four chambers including a substrate introduction chamber 10, a vapor deposition chamber 11, a cooling chamber 13, and a substrate discharge chamber 14, which are connected and arranged in a straight line, and a film formation substrate S from the introduction chamber 10 to the discharge chamber 14. A substrate transport mechanism 16 that moves in a shape and a control unit 15 that controls vapor deposition conditions and the like are provided.

基板導入室１０および基板排出室１４は、それぞれ成膜用基板Ｓ（Ｓ’）を導入するためのチャンバーおよび排出するためのチャンバーである。基板導入室１０には、ＣＩＧＳ膜蒸着前の成膜用基板Ｓを収納する処理前基板収納部として、複数枚の基板を収納可能な基板収納トレイ１７が備えられ、基板排出室１４には、ＣＩＧＳ膜成膜済みの成膜用基板Ｓ’を収納する処理済基板収納部として、複数枚の基板を収納可能な基板収納トレイ１８が備えられている。   The substrate introduction chamber 10 and the substrate discharge chamber 14 are a chamber for introducing a film forming substrate S (S ′) and a chamber for discharging, respectively. The substrate introduction chamber 10 is provided with a substrate storage tray 17 that can store a plurality of substrates as a pre-processing substrate storage portion that stores the film-forming substrate S before CIGS film deposition, and the substrate discharge chamber 14 includes: A substrate storage tray 18 that can store a plurality of substrates is provided as a processed substrate storage unit that stores the deposition substrate S ′ on which a CIGS film has been formed.

基板導入室１０、蒸着室１１、冷却室１３および基板排出室１４は、必要に応じて排気装置（図示せず）によって略真空に排気される。例えば、基板導入室１０および排出室１４には内部を真空排気する排気ポンプとして、ターボ分子ポンプが備えられ、蒸着室１１および冷却室１３には内部を真空排気する排気ポンプとしての油拡散ポンプが備えられている。   The substrate introduction chamber 10, the vapor deposition chamber 11, the cooling chamber 13, and the substrate discharge chamber 14 are evacuated to a substantially vacuum by an exhaust device (not shown) as necessary. For example, the substrate introduction chamber 10 and the discharge chamber 14 are provided with a turbo molecular pump as an exhaust pump for evacuating the inside, and the vapor deposition chamber 11 and the cooling chamber 13 are provided with an oil diffusion pump as an exhaust pump for evacuating the inside. Is provided.

基板搬送機構１６は、搬送方向Ａの上流側である基板導入室１０から下流側である基板排出室１４に向かって基板Ｓを直線的に移動させるための機構であり、たとえば、ローラなどを備えた構成とすることができる。本実施形態においては、基板搬送機構１６は、基板Ｓの幅方向の両端を支えるべく２列に且つ基板搬送方向に沿って配列された２列式のコンベヤから構成されている。   The substrate transport mechanism 16 is a mechanism for linearly moving the substrate S from the substrate introduction chamber 10 on the upstream side in the transport direction A toward the substrate discharge chamber 14 on the downstream side, and includes a roller, for example. Can be configured. In the present embodiment, the substrate transport mechanism 16 includes a two-row conveyor arranged in two rows and along the substrate transport direction so as to support both ends of the substrate S in the width direction.

基板導入室１０、蒸着室１１の基板搬送機構１６の上方には基板加熱用のヒーター１９ａ、１９ｂがそれぞれ設置されている。この基板加熱用のヒーター１９ａ、１９ｂは、基板の搬送方向Ａに沿って温度を変化させることができ、基板の温度をその移動位置に応じた所定温度に調整する。   Substrate heating heaters 19 a and 19 b are installed above the substrate transport mechanism 16 in the substrate introduction chamber 10 and the vapor deposition chamber 11, respectively. The heaters 19a and 19b for heating the substrate can change the temperature along the transport direction A of the substrate, and adjust the temperature of the substrate to a predetermined temperature corresponding to the movement position.

蒸着室１１の基板搬送機構１６の下方には、Ｉｎ、Ｇａ、Ｃｕの各蒸着源２１〜２３からなる蒸着源群３１〜３５およびＳｅ蒸着源２５が配置されており、冷却室１３にはＳｅ蒸着源２５のみが配置されている。各蒸着源には、たとえば、蒸着用の坩堝を用いることができる。各蒸着源は、蒸気噴出開口を２以上備えるものであってもよい。   Below the substrate transport mechanism 16 in the vapor deposition chamber 11, vapor deposition source groups 31 to 35 including Se vapor deposition sources 21 to 23 and an Se vapor deposition source 25 are arranged. Only the vapor deposition source 25 is arranged. For each vapor deposition source, for example, a crucible for vapor deposition can be used. Each vapor deposition source may include two or more vapor ejection openings.

制御部１５は、蒸着室１１における蒸着条件、基板搬送機構１６による基板の搬送速度等を制御するものであり、具体的にはコンピュータにより構成されるものである。
制御部１５は、蒸着室１１における蒸着条件が、搬送方向Ａの最上流と最下流との間にＧａ／（Ｉｎ＋Ｇａ）比が最小、かつ該最小のＧａ／（Ｉｎ＋Ｇａ）比が最上流または最下流でのＧａ／（Ｉｎ＋Ｇａ）比の半分以下となる領域が存在するように、各蒸着源２１〜２３および２５からの蒸発量を制御する。なお、ここでは、最上流でのＧａ／（Ｉｎ＋Ｇａ）比と最下流でのＧａ／（Ｉｎ＋Ｇａ）比とがほぼ同等となるようにしている。ただし、最上流でのＧａ／（Ｉｎ＋Ｇａ）比、最下流でのＧａ／（Ｉｎ＋Ｇａ）比は同等である必要はない。最小のＧａ／（Ｉｎ＋Ｇａ）比は最上流と最下流の少なくともいずれかＧａ／（Ｉｎ＋Ｇａ）のいずれか一方の半分以下であればよく、他方は、上述の最小のＧａ／（Ｉｎ＋Ｇａ）比よりも大きければよい。
制御部１５は、その他にヒーター１９ａ、１９ｂの温度制御、基板の搬送速度の制御など、成膜条件全般に関わる制御を行う。 The control unit 15 controls vapor deposition conditions in the vapor deposition chamber 11, the substrate conveyance speed by the substrate conveyance mechanism 16, and the like, and is specifically configured by a computer.
The control unit 15 is configured such that the vapor deposition conditions in the vapor deposition chamber 11 are such that the Ga / (In + Ga) ratio is the smallest between the most upstream and the most downstream in the transport direction A, and the smallest Ga / (In + Ga) ratio is the most upstream or most The amount of evaporation from each of the vapor deposition sources 21 to 23 and 25 is controlled so that there is a region that is less than half of the downstream Ga / (In + Ga) ratio. Here, the Ga / (In + Ga) ratio at the most upstream and the Ga / (In + Ga) ratio at the most downstream are substantially equal. However, the Ga / (In + Ga) ratio at the uppermost stream and the Ga / (In + Ga) ratio at the most downstream need not be equal. The minimum Ga / (In + Ga) ratio should be at most half of at least one of the most upstream and the most downstream Ga / (In + Ga), and the other is less than the above-mentioned minimum Ga / (In + Ga) ratio. It only needs to be large.
In addition, the control unit 15 performs control related to the overall film forming conditions such as temperature control of the heaters 19a and 19b and control of the substrate transport speed.

図２は、図１に示す成膜装置１における、蒸着源の配置を模式的に示す平面図である。
蒸着室１１には、基板搬送方向上流側から、Ｉｎ蒸着源２１とＧａ蒸着源２２とが交互に配置されてなる行列状（マトリックス状）のＩｎ−Ｇａ第１蒸着源群３１、Ｇａ蒸着源２２とＣｕ蒸着源２３とが交互に配置されてなる行列状のＧａ−Ｃｕ第１蒸着源群３２、Ｉｎ蒸着源２１とＣｕ蒸着源２３とが交互に配置されてなる行列状のＩｎ−Ｃｕ蒸着源群３３、Ｇａ蒸着源２２とＣｕ蒸着源２３とが交互に配置されてなる行列状のＧａ−Ｃｕ第２蒸着源群３４、Ｉｎ蒸着源２１とＧａ蒸着源２２とが交互に配置されてなる行列状のＩｎ−Ｇａ第２蒸着源群３５が、搬送方向に沿って順次配置されている。 FIG. 2 is a plan view schematically showing the arrangement of vapor deposition sources in the film forming apparatus 1 shown in FIG.
In the vapor deposition chamber 11, a matrix (matrix) In—Ga first vapor deposition source group 31 in which In vapor deposition sources 21 and Ga vapor deposition sources 22 are alternately arranged from the upstream side in the substrate transport direction, a Ga vapor deposition source. Matrix-like Ga-Cu first vapor deposition source group 32 in which 22 and Cu vapor deposition source 23 are alternately arranged, and matrix-like In-Cu in which In vapor deposition source 21 and Cu vapor deposition source 23 are alternately arranged. Deposition source group 33, Ga-Cu second deposition source group 34 in which Ga deposition source 22 and Cu deposition source 23 are alternately disposed, In deposition source 21 and Ga deposition source 22 are alternately disposed. The matrix In-Ga second vapor deposition source group 35 is sequentially arranged along the transport direction.

搬送方向の最上流にＩｎ−Ｇａ第１蒸着源群３１、最下流にＩｎ−Ｇａ第２蒸着源群３５が配置されているので、この最上流および最下流においてＧａ／（Ｉｎ＋Ｇａ）比がほぼ同等となるように容易に制御することができる。また、最上流および最下流の間に、少なくともＩｎを含む領域としてＩｎ−Ｃｕ蒸着源群３３が配置され、このＩｎ−Ｃｕ蒸着源群３３の領域においてはＧａが含まれないため、この領域でのＧａ／（Ｉｎ＋Ｇａ）比を０とすることができる。上記の配置により、制御部１５において各蒸着源の制御は非常に容易なものとなる。なお、上記配置でなくとも、制御部１５により、この最上流と最下流との間にＧａ／（Ｉｎ＋Ｇａ）比が最小、かつその最小のＧａ／（Ｉｎ＋Ｇａ）比が最上流または最下流の比の半分以下となる領域が存在するように制御することが可能な配置であればよい。
なお、上下流間にＧａ／（Ｉｎ＋Ｇａ）比が最小となる領域があれば、Ｇａのダブルグレーデッド構造とすることができるが、成膜の膜厚方向にＧａの濃度を大きく変化させるためには、本実施形態のように上下流間にＧａ／（Ｉｎ＋Ｇａ）比が０となる領域を設けることが好ましい。 Since the In—Ga first vapor deposition source group 31 is arranged on the most upstream side in the transport direction and the In—Ga second vapor deposition source group 35 is arranged on the most downstream side, the Ga / (In + Ga) ratio is almost equal in the most upstream and most downstream sides. It can be easily controlled to be equivalent. In addition, an In—Cu vapor deposition source group 33 is arranged between the uppermost stream and the most downstream as a region containing at least In, and Ga is not contained in the region of the In—Cu vapor deposition source group 33. The Ga / (In + Ga) ratio can be zero. With the above arrangement, it is very easy to control each evaporation source in the control unit 15. Even if the above arrangement is not used, the controller 15 causes the Ga / (In + Ga) ratio to be the smallest between the most upstream and the most downstream, and the smallest Ga / (In + Ga) ratio is the most upstream or most downstream ratio. Any arrangement can be used as long as it can be controlled so that there is a region that is half or less of the above.
If there is a region where the Ga / (In + Ga) ratio is minimum between the upstream and downstream, a Ga double graded structure can be obtained, but in order to greatly change the Ga concentration in the film thickness direction of film formation. It is preferable to provide a region where the Ga / (In + Ga) ratio is 0 between the upstream and downstream as in this embodiment.

図２に示すように、各蒸着源群３１〜３５は、その列方向（行の並び方向）が基板搬送方向Ａと垂直に交差するように配置されている。
また、蒸着源群３１，３２、３３および３５は、いずれもそれぞれ２種の蒸着源が行方向および列方向に交互に配置された４×２行列状配置されてなるものであり、蒸着源群３４は、４×１行列状配置されてなるものである。 As shown in FIG. 2, the vapor deposition source groups 31 to 35 are arranged such that their column direction (row arrangement direction) intersects the substrate transport direction A perpendicularly.
Further, each of the vapor deposition source groups 31, 32, 33 and 35 is a 4 × 2 matrix arrangement in which two types of vapor deposition sources are alternately arranged in the row direction and the column direction. 34 is arranged in a 4 × 1 matrix.

一方、Ｓｅ蒸着源２５は、Ｓｅ蒸気を放出する複数の開口２５ｂを有するライン状の導管２５ａと、この導管２５ａに接続されＳｅ蒸気を供給するＳｅ貯留タンク２５ｃとを備えてなる。本実施形態においては、複数のＳｅ蒸着源２５が、そのライン状の導管２５ａが蒸着源群３１〜３５の各列間に列方向に沿うように配置されている。なお、各開口２５ｂに対応する位置に個別にＳｅ蒸着用坩堝などのＳｅ蒸着源を備えるようにしてもよい。   On the other hand, the Se vapor deposition source 25 includes a line-shaped conduit 25a having a plurality of openings 25b for releasing Se vapor, and a Se storage tank 25c connected to the conduit 25a and supplying Se vapor. In the present embodiment, a plurality of Se vapor deposition sources 25 are arranged such that their line-shaped conduits 25a are along the column direction between the columns of the vapor deposition source groups 31 to 35. In addition, you may make it provide Se vapor deposition sources, such as a crucible for Se vapor deposition, in the position corresponding to each opening 25b.

このように、搬送方向上流側から、Ｉｎ−Ｇａ第１蒸着源群３１、Ｇａ−Ｃｕ第１蒸着源群３２、Ｉｎ−Ｃｕ蒸着源群３３、Ｇａ−Ｃｕ第２蒸着源群３４、Ｉｎ−Ｇａ第２蒸着源群３５の順に配置し、制御部１５により、搬送方向Ａの最上流と最下流との間に、Ｇａ／（Ｉｎ＋Ｇａ）比が最小、かつそのＧａ／（Ｉｎ＋Ｇａ）比が最上流または最下流でのＧａ／（Ｉｎ＋Ｇａ）比の半分以下となるように、各蒸着源２１〜２３および２５からの蒸発量を制御することによって、成膜下面側から膜厚方向にＧａ／（Ｉｎ＋Ｇａ）が徐々に小さくなり、再び成膜表面側に向けて徐々に大きくなるようなプロファイルのIII族（Ｇａ，Ｉｎ）の組成分布を有するダブルグレーデッド構造を有するＣＩＧＳ膜を容易に形成することができる。   Thus, from the upstream side in the transport direction, the In—Ga first vapor deposition source group 31, the Ga—Cu first vapor deposition source group 32, the In—Cu vapor deposition source group 33, the Ga—Cu second vapor deposition source group 34, and the In— Arranged in the order of the Ga second vapor deposition source group 35, the controller 15 causes the Ga / (In + Ga) ratio to be the smallest and the Ga / (In + Ga) ratio to be the smallest between the most upstream and the most downstream in the transport direction A. By controlling the amount of evaporation from each of the vapor deposition sources 21 to 23 and 25 so that the Ga / (In + Ga) ratio in the upstream or the most downstream is less than or equal to the Ga / (In + Ga) ratio, Ga / ( A CIGS film having a double graded structure having a group III (Ga, In) composition distribution with a profile in which (In + Ga) gradually decreases and gradually increases toward the film-forming surface side again. Can do.

また、各蒸着源群において、各元素の蒸着源が交互に配置された行列状配置とされていることにより、面内での組成均一性を高めることができる。
特に、最上流にＩｎ蒸着源２１とＧａ蒸着源２２とを交互に配したＩｎ−Ｇａ第１蒸着源群３１を備え、成膜初期段階でＧａ、ＳｅのみではなくＩｎを同時に蒸着させることにより結晶性の良いカルコパイライト構造が安定に作製されるため、ＣＩＧＳ膜の成膜用基板からの膜剥がれが生じない。ＣＩＧＳ膜の膜剥がれを抑制することができることから、歩留まりの向上効果を得ることができる。 Further, in each vapor deposition source group, the composition uniformity in the plane can be enhanced by arranging the vapor deposition sources of the respective elements in a matrix arrangement.
In particular, by providing an In-Ga first vapor deposition source group 31 in which an In vapor deposition source 21 and a Ga vapor deposition source 22 are alternately arranged on the most upstream side, not only Ga and Se but also In are vapor-deposited at the initial stage of film formation. Since a chalcopyrite structure with good crystallinity is stably produced, film peeling of the CIGS film from the film formation substrate does not occur. Since the peeling of the CIGS film can be suppressed, the yield improvement effect can be obtained.

また、制御部１５はＧａ−Ｃｕ第２蒸着源群３４およびＩｎ−Ｇａ第２蒸着源群３５を含む下流域３７におけるＣｕの蒸発量を、Ｉｎ−Ｇａ第１蒸着源群３１、Ｇａ−Ｃｕ第１蒸着源群３２、Ｉｎ−Ｃｕ蒸着源群３３を含む上流域３６におけるＣｕの蒸発量と比較して相対的に抑制させた条件で、各元素を成膜用基板Ｓの一面に供給するように、各蒸着源からの蒸発量を制御するものであることが好ましく、これにより、バイレイヤー法によるＣＩＧＳ膜の形成により適したものとなる。
なお蒸発量の制御は、蒸着源の温度制御により行うことができる。また、配置するＣｕ蒸着源の数を上流域より下流域を少なくすることにより、下流域でのＣｕ蒸発量を上流域よりも減ずるようにしてもよい。 Further, the control unit 15 determines the amount of Cu evaporation in the downstream region 37 including the Ga—Cu second vapor deposition source group 34 and the In—Ga second vapor deposition source group 35 as the In—Ga first vapor deposition source group 31, Ga—Cu. Each element is supplied to one surface of the film-forming substrate S under a relatively suppressed condition compared to the amount of Cu evaporation in the upstream region 36 including the first vapor deposition source group 32 and the In—Cu vapor deposition source group 33. Thus, it is preferable to control the amount of evaporation from each evaporation source, and this makes it more suitable for forming a CIGS film by the bilayer method.
The evaporation amount can be controlled by controlling the temperature of the vapor deposition source. Moreover, you may make it reduce Cu evaporation amount in a downstream area rather than an upstream area by making downstream the number of Cu vapor deposition sources to arrange | position less than an upstream area.

また、本装置は、インライン方式の成膜装置であることから、非常に効率的な成膜を実現することができる。   In addition, since this apparatus is an in-line film forming apparatus, it is possible to realize very efficient film formation.

以上の構成の成膜装置１において成膜用基板Ｓ上にＣＩＧＳ膜を成膜する方法について説明する。   A method for forming a CIGS film on the film-forming substrate S in the film-forming apparatus 1 having the above configuration will be described.

成膜用基板Ｓは、基板搬送機構１６により搬送可能な基板であれば、特に制限されない。太陽電池用の光電変換層としてＣＩＧＳ膜を成膜する場合には、例えば、一主面上にＭｏ膜を堆積した矩形のガラス基板を成膜用基板Ｓとして用いることができる。   The film forming substrate S is not particularly limited as long as it can be transported by the substrate transport mechanism 16. When forming a CIGS film as a photoelectric conversion layer for a solar cell, for example, a rectangular glass substrate having a Mo film deposited on one main surface can be used as the film-forming substrate S.

図１に示す成膜装置１においては、まず、基板導入室１０において、収納トレイ１７から成膜用基板Ｓが基板搬送機構１６によりヒーター１９ａ下に搬送され、ヒーター１９ａにより基板Ｓが加熱される。この加熱された基板Ｓは基板搬送機構１６により矢印Ａ方向に直線的に搬送される。   In the film forming apparatus 1 shown in FIG. 1, first, in the substrate introduction chamber 10, the film forming substrate S is transferred from the storage tray 17 to the lower side of the heater 19a by the substrate transfer mechanism 16, and the substrate S is heated by the heater 19a. . The heated substrate S is linearly transported in the direction of arrow A by the substrate transport mechanism 16.

蒸着室１１において、基板Ｓはヒーター１９ｂで加熱されると共に、基板Ｓの蒸着源に対向する一面に蒸着源群からＣｕ、Ｉｎ、ＧａおよびＳｅが供給される。基板Ｓの一面には、上流域３６において最上流のＩｎ−Ｇａ第１蒸着源群３１上でＩｎ、ＧａおよびＳｅが主に供給され、その次にＧａ−Ｃｕ第１蒸着源群３２上でＧａ、ＣｕおよびＳｅが主に供給され、さらにＩｎ−Ｃｕ蒸着源群３３上でＩｎ、ＣｕおよびＳｅが主に供給されることとなる。   In the vapor deposition chamber 11, the substrate S is heated by the heater 19 b, and Cu, In, Ga, and Se are supplied from the vapor deposition source group to one surface facing the vapor deposition source of the substrate S. One surface of the substrate S is mainly supplied with In, Ga and Se on the uppermost In—Ga first vapor deposition source group 31 in the upstream region 36, and then on the Ga—Cu first vapor deposition source group 32. Ga, Cu, and Se are mainly supplied, and further, In, Cu, and Se are mainly supplied on the In—Cu vapor deposition source group 33.

さらに、上記上流域３６に引き続く下流域３７において、まずＣｕ−Ｇａ第２蒸着源群３４上においてＣｕ、ＧａおよびＳｅが主に供給され、その次にＩｎ−Ｇａ第２蒸着源群３５上においＩｎ、ＧａおよびＳeが主に供給されることとなる。   Further, in the downstream region 37 following the upstream region 36, first, Cu, Ga and Se are mainly supplied on the Cu—Ga second evaporation source group 34, and then, on the In—Ga second evaporation source group 35. In, Ga, and Se are mainly supplied.

制御部１５は、本実施例においては、Ｉｎ−Ｇａ第１蒸着源群３１とのＩｎ−Ｇａ第２蒸着源群３５におけるＧａ／（Ｉｎ＋Ｇａ）比がほぼ同等となるように制御している。また、本実施形態においては、Ｇａ蒸着源が含まれないＩｎ−Ｃｕ蒸着源群３３が中間領域に配置されており、この領域ではＧａ／（Ｉｎ＋Ｇａ）が０となる。
さらに制御部１５は、上流域３６で、基板Ｓの一面に、Ｃｕ（Ｉｎ，Ｇａ）Ｓｅ2、ＣｕxＳｅの各化合物が互いに相分離された状態で混合されてなる混合物（以下において、Ｃｕ（Ｉｎ，Ｇａ）Ｓｅ2：ＣｕxＳｅと表記する。）であって、Ｃｕ含有量の多い混合物が生成されるように、各蒸着源の温度を制御し、下流域３７で、Ｃｕ蒸着源２３からのＣｕ蒸発量を上流域におけるＣｕ蒸発量よりも抑制し、基板Ｓに堆積するＣｕが微量になるようにし、上流域で先に堆積されているＣｕxＳｅをＣｕ（Ｉｎ，Ｇａ）Ｓｅ2に転化させるように、各蒸着源の温度を制御する。ここで、「Ｃｕ含有量の多い」とは、目的とするＣＩＧＳ膜の化学量論比と比較してＣｕが多いものであることを意味する。 In the present embodiment, the control unit 15 controls the Ga / (In + Ga) ratio in the In—Ga second vapor deposition source group 35 to be substantially equal to the In—Ga first vapor deposition source group 31. In this embodiment, the In—Cu vapor deposition source group 33 that does not include a Ga vapor deposition source is disposed in the intermediate region, and Ga / (In + Ga) is 0 in this region.
Further, the control unit 15 includes a mixture (hereinafter referred to as Cu) in which the compounds of Cu (In, Ga) Se 2 and Cu x Se are mixed in a state separated from each other on one surface of the substrate S in the upstream region 36. (In, Ga) Se 2 : written as Cu x Se), and the temperature of each vapor deposition source is controlled so that a mixture with a high Cu content is generated. 23, the amount of Cu evaporated from the upstream region is suppressed to be less than the amount of Cu evaporated in the upstream region, so that the amount of Cu deposited on the substrate S becomes very small. The Cu x Se previously deposited in the upstream region is Cu (In, Ga). The temperature of each vapor deposition source is controlled so as to convert to Se 2 . Here, “high Cu content” means that the Cu content is high compared to the stoichiometric ratio of the target CIGS film.

なお、ＣＩＧＳ膜においては、Ｓｅが抜けやすいため、蒸着室１１の全域においてＳｅは所望のＣＩＧＳ膜の化学量論比よりも過剰に供給されるように、Ｓｅ蒸着源の温度を制御する。   In the CIGS film, since Se is easy to escape, the temperature of the Se vapor deposition source is controlled so that Se is supplied in excess of the stoichiometric ratio of the desired CIGS film throughout the vapor deposition chamber 11.

ＣＩＧＳ膜が成膜された成膜済基板Ｓ’は、冷却室１３に搬送される。
冷却室１３においては、蒸着室１１を経てＣＩＧＳ膜が蒸着された基板Ｓ’のＣＩＧＳ膜面に、Ｓｅ蒸着源２５によりＳｅを供給させつつ、基板Ｓ’を放射冷却させる。この冷却室１３においては、基板温度を３５０℃程度まで冷却させる。冷却中にＣＩＧＳ膜面にＳｅを供給することにより、ＣＩＧＳ膜からのＳｅの再蒸発を防止して、Ｓｅ欠陥発生を抑制することができる。 The film-formed substrate S ′ on which the CIGS film is formed is transferred to the cooling chamber 13.
In the cooling chamber 13, the substrate S ′ is radiatively cooled while Se is supplied from the Se vapor deposition source 25 to the CIGS film surface of the substrate S ′ on which the CIGS film is deposited through the vapor deposition chamber 11. In the cooling chamber 13, the substrate temperature is cooled to about 350 ° C. By supplying Se to the CIGS film surface during cooling, the re-evaporation of Se from the CIGS film can be prevented, and the occurrence of Se defects can be suppressed.

その後、基板Ｓ’は、基板排出室１４に搬送されてさらに冷却された後、成膜済基板収納トレイ１８に収納される。   Thereafter, the substrate S ′ is transferred to the substrate discharge chamber 14 and further cooled, and then stored in the film-formed substrate storage tray 18.

本実施形態の成膜装置１においては、以上のようにして、成膜用基板上にＣＩＧＳ膜を形成することができる。   In the film forming apparatus 1 of the present embodiment, a CIGS film can be formed on the film forming substrate as described above.

本実施形態の成膜装置１を用いて、上記成膜方法によりＣＩＧＳ膜を成膜すれば、成膜装置１における蒸着源の配置構成により、膜厚方向にIII族（Ｇａ，Ｉｎ）の組成分布を有するダブルグレーデッド構造を有し、かつ面内での組成均一性の高いＣＩＧＳ膜を形成することができる。また、このとき、蒸着室１１において、Ｃｕ含有量の多い混合物（Ｃｕ（Ｉｎ，Ｇａ）Ｓｅ2：ＣｕxＳｅ2)を生成する工程、ＣｕxＳｅ2をＣｕ（Ｉｎ，Ｇａ）Ｓｅ2に転化する工程の２段階の工程を経ることにより、より良好な品質のＣＩＧＳ膜を形成することができる。 If a CIGS film is formed by the film forming method using the film forming apparatus 1 of the present embodiment, the composition of the group III (Ga, In) in the film thickness direction depends on the arrangement configuration of the evaporation source in the film forming apparatus 1. A CIGS film having a distributed double graded structure and high in-plane composition uniformity can be formed. At this time, in the vapor deposition chamber 11, with many mixtures Cu content (Cu (In, Ga) Se 2: Cu x Se 2) to produce a, a Cu x Se 2 Cu (In, Ga) to Se 2 By passing through the two-stage process of converting, a CIGS film with better quality can be formed.

本成膜装置により成膜されるＣＩＧＳ膜は、太陽電池等の光電変換素子の光電変換層として好適である。このようなダブルグレードデッド構造を有し、かつ面内組成均一性が高く、品質の良好なＣＩＧＳ膜を備えた光電変換素子においては、高い光電変換率を達成することが可能となる。
したがって、本成膜装置は、ＣＩＧＳ膜を光電変換層として備える光電変換素子の製造方法に好適に用いることができる。 The CIGS film formed by this film forming apparatus is suitable as a photoelectric conversion layer of a photoelectric conversion element such as a solar cell. In a photoelectric conversion element having such a double grade dead structure, a high in-plane composition uniformity, and a CIGS film with good quality, a high photoelectric conversion rate can be achieved.
Therefore, this film-forming apparatus can be used suitably for the manufacturing method of a photoelectric conversion element provided with a CIGS film | membrane as a photoelectric converting layer.

なお、上記実施形態においては、蒸着室１１および冷却室１３において、複数の開口を有するライン状導管２５ａにＳｅ貯留タンク２５ｃからＳｅが供給される構成のＳｅ蒸着源２５を備えるものとしたが、基板表面に供給されるＳｅの一部または全部は、蒸着時の雰囲気ガスから供給されてもよい。なお、この場合には、雰囲気ガス供給手段がＳｅ蒸着源に相当するものとなる。   In the above embodiment, the vapor deposition chamber 11 and the cooling chamber 13 include the Se vapor deposition source 25 configured such that Se is supplied from the Se storage tank 25c to the line-shaped conduit 25a having a plurality of openings. Part or all of Se supplied to the substrate surface may be supplied from an atmospheric gas during vapor deposition. In this case, the atmospheric gas supply means corresponds to the Se vapor deposition source.

また、上記実施形態においては、Ｃｕ、Ｉｎ、Ｇａ、Ｓｅ蒸着源のみ備えているが、必要に応じて、Ｃｕ、Ｉｎ、Ｇａ、Ｓｅ以外の他の元素をさらに基体上に供給するように他の元素の蒸着源を備えていてもよい。例えば、Ｓｅの一部をＳに置換してＣｕ（Ｉｎ,Ｇａ）ＳｅＳ膜を成膜する構成とすることができる。   Moreover, in the said embodiment, although only Cu, In, Ga, and Se vapor deposition source are provided, other elements other than Cu, In, Ga, and Se may be further supplied on a base | substrate as needed. A vapor deposition source of the element may be provided. For example, a part of Se can be replaced with S to form a Cu (In, Ga) SeS film.

上記実施形態においては、各蒸着源群は各蒸着源を４×２あるいは４×１の行列状配置したものとしたが、各蒸着源群において、各蒸着源により形成される行列の行数、列数は任意であり、必要に応じて設計変更可能である。幅広の基板への成膜に対応する場合には、行数をさらに増やせばよい。面内均一性を高めるためには、各蒸着源群は、蒸着源を３行以上、２列以上とした行列状配置であることが望ましい。   In the above embodiment, each vapor deposition source group is arranged in a matrix of 4 × 2 or 4 × 1 in each vapor deposition source, but in each vapor deposition source group, the number of rows of the matrix formed by each vapor deposition source, The number of columns is arbitrary, and the design can be changed as necessary. In order to deal with film formation on a wide substrate, the number of rows may be further increased. In order to improve the in-plane uniformity, each vapor deposition source group is desirably arranged in a matrix with the vapor deposition sources having three or more rows and two or more columns.

蒸着源からの供給量は、蒸着源の温度制御による制御することができる。光電変換層としては、膜全体としてのＩｎとＧａとが、Ｇａ／（Ｉｎ＋Ｇａ）＝０．３３〜０．４５程度、特には、０．３８前後であることが高光電変換効率を得ることができ好ましい。   The supply amount from the vapor deposition source can be controlled by controlling the temperature of the vapor deposition source. As the photoelectric conversion layer, high photoelectric conversion efficiency can be obtained when In and Ga as a whole film are about Ga / (In + Ga) = 0.33 to 0.45, particularly around 0.38. This is preferable.

「第２の実施形態の成膜装置」
図３は、本発明の第２の実施形態に係る成膜装置の概略構成を模式的に示す図である。
本実施形態の成膜装置２は、可撓性を有する基板に対してＣＩＧＳ膜を成膜するためのロール・トゥ・ロール式多元同時蒸着成膜装置であり、直線状に順に連結配置された、基板導入室１０、蒸着室１１、冷却室１３および基板排出室１４からなる４つのチャンバーと、成膜用基板Ｓを導入室１０から排出室１４に直線状に移動させる基板搬送機構５０とを備えている。第１の実施形態の成膜装置１と同等の構成要素には同一符号を付して詳細な説明は省略し、第１の実施形態の装置と異なる点について主として説明する。 “Film Forming Apparatus of Second Embodiment”
FIG. 3 is a diagram schematically showing a schematic configuration of a film forming apparatus according to the second embodiment of the present invention.
The film forming apparatus 2 of the present embodiment is a roll-to-roll type multi-source co-evaporation film forming apparatus for forming a CIGS film on a flexible substrate, and is linearly connected in sequence. , Four chambers including a substrate introduction chamber 10, a vapor deposition chamber 11, a cooling chamber 13, and a substrate discharge chamber 14, and a substrate transport mechanism 50 that linearly moves the film formation substrate S from the introduction chamber 10 to the discharge chamber 14. I have. Constituent elements equivalent to those of the film forming apparatus 1 of the first embodiment are denoted by the same reference numerals, detailed description thereof is omitted, and differences from the apparatus of the first embodiment are mainly described.

本実施形態の成膜装置２は、長尺な可撓性基板Ｓを巻回した巻出しロール５６が基板導入室１０に設置されており、巻出しロール５６から巻き出され、蒸着室１１において化合物半導体膜が成膜された成膜済み基板Ｓ’を巻き取る巻取りロール５７が基板排出室１４に設置されている。   In the film forming apparatus 2 of the present embodiment, an unwinding roll 56 around which a long flexible substrate S is wound is installed in the substrate introduction chamber 10, and is unwound from the unwinding roll 56. A winding roll 57 for winding the film-formed substrate S ′ on which the compound semiconductor film is formed is installed in the substrate discharge chamber 14.

基板導入室１０、基板排出室１４には、それぞれ基板Ｓをガイドするためのガイドロール５８、５９が備えられている。   The substrate introduction chamber 10 and the substrate discharge chamber 14 are provided with guide rolls 58 and 59 for guiding the substrate S, respectively.

本構成の装置２においては、この巻出しロール５６、巻取りロール５７およびこれらを駆動する図示しない駆動手段、およびガイドロール５８、５９により基板搬送機構５０が構成されている。   In the apparatus 2 of this configuration, the substrate transport mechanism 50 is configured by the unwinding roll 56, the winding roll 57, driving means (not shown) for driving these, and guide rolls 58 and 59.

また、本成膜装置２においては、冷却室１３に、基板を冷却する冷却手段として、冷却ロール５５が備えられている。冷却室１３では、基板温度を３５０℃程度まで冷却することが望ましく、放射冷却のみで冷却する場合２０−３０分要するが、このように冷却手段を備えることにより、この冷却時間を短縮することが可能となり、スループットを向上させることができる。   In the film forming apparatus 2, a cooling roll 55 is provided in the cooling chamber 13 as a cooling means for cooling the substrate. In the cooling chamber 13, it is desirable to cool the substrate temperature to about 350 ° C., and it takes 20-30 minutes to cool by radiative cooling alone. It becomes possible and throughput can be improved.

本実施形態においては、冷却室１３において冷却ロールを１つ備えたものとしたが、冷却室内に複数の冷却ロールを備えていてもよい。
また、本実施形態の装置２においては、さらに、巻取りロール５７が配置された基板排出室１４に備えられているガイドロール５９を、冷却ロールを兼ねるものとしてもよい。 In the present embodiment, one cooling roll is provided in the cooling chamber 13, but a plurality of cooling rolls may be provided in the cooling chamber.
Further, in the apparatus 2 of the present embodiment, the guide roll 59 provided in the substrate discharge chamber 14 in which the winding roll 57 is disposed may also serve as a cooling roll.

なお、上述の第１の実施形態のようなインライン式成膜装置１においても、冷却室１３に冷却手段を備えた構成とすることもできる。しかしながら、急激な冷却により損傷が生じるような基材（例えば、ガラス基材）を成膜用基板として用いている場合には、冷却手段による冷却をするのは適さない。   Note that the in-line film forming apparatus 1 as in the first embodiment described above can also be configured to include a cooling means in the cooling chamber 13. However, when a base material (for example, a glass base material) that is damaged by rapid cooling is used as a film-forming substrate, it is not suitable to cool by a cooling means.

本実施形態の成膜装置２は、処理対象となる成膜用基板が可撓性を有するものであり、基板がロール・トゥ・ロールで搬送されることを除き、第１実施形態の成膜装置１と同様であり、同様の方法でＣＩＧＳ膜を成膜することができる。   The film forming apparatus 2 according to the present embodiment is a film forming substrate according to the first embodiment, except that the film forming substrate to be processed has flexibility, and the substrate is conveyed by roll-to-roll. The CIGS film can be formed by the same method as in the apparatus 1.

本成膜装置２においては、蒸着源の配列方法は、第１実施形態のものと同様とすることができ、第１の実施形態の成膜装置１と同様の効果を得ることができる。   In the film forming apparatus 2, the method of arranging the vapor deposition sources can be the same as that of the first embodiment, and the same effect as the film forming apparatus 1 of the first embodiment can be obtained.

また、本装置２は、可撓性基板に対して、ロール・トゥ・ロール方式でＣＩＧＳ膜を成膜することができるため、非常に効率的な成膜を実現することができる。   Moreover, since this apparatus 2 can form a CIGS film on a flexible substrate by a roll-to-roll method, it is possible to realize very efficient film formation.

次に、本発明の成膜装置を用いてＣＩＧＳ膜を成膜する工程を有する本発明の光電変換素子の製造方法の実施形態について説明する。   Next, an embodiment of a method for manufacturing a photoelectric conversion element of the present invention having a step of forming a CIGS film using the film forming apparatus of the present invention will be described.

図４は、光電変換素子の一実施形態の層構成を模式的に示す断面図である。光電変換素子４０は、基板４１上に、裏面電極４２、光電変換層４３、バッファ層４４、窓層４５、透明電極４６をこの順に積層してなり、光電変換層４３として、ＣＩＧＳ膜を備えている。また、裏面電極４２の一部表面および透明電極４６の一部表面には集電電極４７、４８が形成されている。   FIG. 4 is a cross-sectional view schematically showing a layer configuration of one embodiment of the photoelectric conversion element. The photoelectric conversion element 40 is formed by laminating a back electrode 42, a photoelectric conversion layer 43, a buffer layer 44, a window layer 45, and a transparent electrode 46 in this order on a substrate 41, and includes a CIGS film as the photoelectric conversion layer 43. Yes. In addition, current collecting electrodes 47 and 48 are formed on a partial surface of the back electrode 42 and a partial surface of the transparent electrode 46.

本発明の光電変換素子４０の製造方法の実施形態を説明する。   Embodiment of the manufacturing method of the photoelectric conversion element 40 of this invention is described.

まず、基板４１の一面にスパッタ法等により裏面電極４２を形成する。この一面に裏面電極４２を備えた基板４１を、一方向に搬送させつつ、この搬送方向に沿って配置された複数のＣｕ蒸着源、複数のＩｎ蒸着源、複数のＧａ蒸着源およびＳｅ蒸着源から基板４１の一面側に各元素の蒸気を供給して、裏面電極４２上に光電変換層４３を成膜する。   First, the back electrode 42 is formed on one surface of the substrate 41 by sputtering or the like. A plurality of Cu vapor deposition sources, a plurality of In vapor deposition sources, a plurality of Ga vapor deposition sources, and a Se vapor deposition source arranged along the conveyance direction while conveying the substrate 41 having the back electrode 42 on one surface in one direction. Then, vapor of each element is supplied to one surface side of the substrate 41 to form a photoelectric conversion layer 43 on the back electrode 42.

光電変換層（ＣＩＧＳ膜）４３は、上述の成膜装置１（または２）において、裏面電極４２を備えた基板４１を成膜用基板として、上述の方法にしたがって成膜することができる。   The photoelectric conversion layer (CIGS film) 43 can be formed according to the above-described method in the above-described film forming apparatus 1 (or 2) using the substrate 41 provided with the back electrode 42 as a film forming substrate.

その後、光電変換層４３上に、ＣＢＤ法（化学浴析出法）、スパッタ法等によりバッファ層４４を形成し、さらに、スパッタ等により窓層４５、透明電極４６および集電電極４７、４８を順次形成することにより、光電変換素子４０を製造することができる。   Thereafter, a buffer layer 44 is formed on the photoelectric conversion layer 43 by a CBD method (chemical bath deposition method), a sputtering method or the like, and the window layer 45, the transparent electrode 46 and the collecting electrodes 47 and 48 are sequentially formed by sputtering or the like. The photoelectric conversion element 40 can be manufactured by forming.

以下、光電変換素子４０の基板および各層について説明する。   Hereinafter, the substrate and each layer of the photoelectric conversion element 40 will be described.

（基板）
基板４１としては、ソーダガラス、高歪点ガラス、無アルカリガラスなどのガラス基板、金属基板、絶縁膜付き金属基板、樹脂基板（ポリイミド）などを用いることができる。 (substrate)
As the substrate 41, a glass substrate such as soda glass, high strain point glass, non-alkali glass, a metal substrate, a metal substrate with an insulating film, a resin substrate (polyimide), or the like can be used.

特には、可撓性を有する絶縁膜付き金属基板が好ましく、金属基板上に陽極酸化により複数の微細孔が形成されてなる絶縁性酸化膜付き金属基板が好適である。陽極酸化被膜により高い絶縁性を有し、かつ可撓性を有する金属基板であれば、大面積での素子形成および集積化の実現が容易となる。   In particular, a flexible metal substrate with an insulating film is preferable, and a metal substrate with an insulating oxide film in which a plurality of fine holes are formed on the metal substrate by anodic oxidation is preferable. A metal substrate having high insulating properties and flexibility due to the anodized film can easily realize element formation and integration in a large area.

金属基板として、陽極酸化により金属基板表面上に生成する金属酸化膜が絶縁体であるような材料を用いれば、表面を陽極酸化させることにより、上述の絶縁膜付き金属基板を容易に得ることができる。そのような材料としては、具体的には、アルミニウム（Ａｌ）、ジルコニウム（Ｚｒ）、チタン（Ｔｉ）、マグネシウム（Ｍｇ）、銅（Ｃｕ）、ニオブ（Ｎｂ）及びタンタル（Ｔａ）等、並びにそれらの合金が挙げられる。コストや太陽電池に要求される特性の観点から、アルミニウムが最も好ましい。   By using a material in which the metal oxide film formed on the surface of the metal substrate by anodic oxidation is an insulator as the metal substrate, the above-described metal substrate with an insulating film can be easily obtained by anodizing the surface. it can. Specific examples of such materials include aluminum (Al), zirconium (Zr), titanium (Ti), magnesium (Mg), copper (Cu), niobium (Nb), tantalum (Ta), and the like. These alloys are mentioned. Aluminum is most preferable from the viewpoint of cost and characteristics required for a solar cell.

また、ステンレスや軟鋼にアルミニウム薄膜を圧接した構造のクラッド材を金属基板として用い、アルミニウムの表面に陽極酸化を行うことにより得られる絶縁膜付き金属基板を用いることもできる。   Further, a clad material having a structure in which an aluminum thin film is pressed against stainless steel or mild steel can be used as a metal substrate, and a metal substrate with an insulating film obtained by anodizing the surface of aluminum can also be used.

（裏面電極）
裏面電極４２の主成分としては特に制限されず、Ｍｏ，Ｃｒ，Ｗ，およびこれらの組合せが好ましく、Ｍｏ等が特に好ましい。裏面電極４２の膜厚は制限されず、２００〜１０００ｎｍ程度が好ましい。 (Back electrode)
The main component of the back electrode 42 is not particularly limited, and Mo, Cr, W, and combinations thereof are preferable, and Mo or the like is particularly preferable. The film thickness of the back electrode 42 is not limited and is preferably about 200 to 1000 nm.

（光電変換層）
光電変換層４３の主成分は、Ｃｕ（Ｉｎ、Ｇａ）Ｓｅ2からなるカルコパイライト型の化合物半導体である。Ｓｅを一部Ｓに置換したものであってもよい。
光電変換層４３の膜厚は特に制限されず、１．０〜３．０μｍが好ましく、１．５〜２．５μｍが特に好ましい。 (Photoelectric conversion layer)
The main component of the photoelectric conversion layer 43 is a chalcopyrite type compound semiconductor made of Cu (In, Ga) Se 2 . Se may be partially substituted with S.
The film thickness of the photoelectric conversion layer 43 is not particularly limited, and is preferably 1.0 to 3.0 μm, particularly preferably 1.5 to 2.5 μm.

（バッファ層）
バッファ層４４は、ＣｄＳ、Ｉｎ（Ｓ，ＯＨ）、ＺｎＳ、Ｚｎ（Ｓ，Ｏ）、あるいはＺｎ（Ｓ，Ｏ，ＯＨ）、を主成分とする層からなる。バッファ層４４の膜厚は特に制限されず、１０〜５００ｎｍが好ましく、１５〜２００ｎｍがより好ましい。 (Buffer layer)
The buffer layer 44 is composed of a layer mainly composed of CdS, In (S, OH), ZnS, Zn (S, O), or Zn (S, O, OH). The film thickness of the buffer layer 44 is not particularly limited, and is preferably 10 to 500 nm, and more preferably 15 to 200 nm.

（窓層）
窓層４５は、光を取り込む中間層である。窓層４５の組成としては特に制限されず、ｉ−ＺｎＯ等が好ましい。窓層４５の膜厚は、１５〜２００ｎｍが好ましい。なお、窓層は任意の層であり、窓層４５のない光電変換素子としてもよい。 (Window layer)
The window layer 45 is an intermediate layer that captures light. The composition of the window layer 45 is not particularly limited, and i-ZnO or the like is preferable. The film thickness of the window layer 45 is preferably 15 to 200 nm. Note that the window layer is an arbitrary layer, and may be a photoelectric conversion element without the window layer 45.

（透明電極）
透明電極４６は、光を取り込むと共に、裏面電極４２と対になって、光電変換層４３で生成された電流が流れる電極として機能する層である。透明電極４６の組成は、特に制限されず、ＺｎＯ：Ａｌ等のｎ−ＺｎＯ等が好ましい。また、透明電極４６の膜厚は特に制限されず、５０ｎｍ〜２μｍが好ましい。 (Transparent electrode)
The transparent electrode 46 is a layer that takes in light and functions as an electrode through which a current generated in the photoelectric conversion layer 43 flows, paired with the back electrode 42. The composition of the transparent electrode 46 is not particularly limited, and n-ZnO such as ZnO: Al is preferable. The film thickness of the transparent electrode 46 is not particularly limited, and is preferably 50 nm to 2 μm.

（集電電極）
集電電極４７、４８は、裏面電極４２および透明電極４６間に生じる電力を効率的に外部に取り出すための電極である。集電電極４７、４８の主成分は特に制限されず、Ａｌ等が挙げられる。その膜厚は特に制限されず、０．１〜３μｍが好ましい。 (Collector electrode)
The collector electrodes 47 and 48 are electrodes for efficiently taking out the electric power generated between the back electrode 42 and the transparent electrode 46 to the outside. The main components of the current collecting electrodes 47 and 48 are not particularly limited, and examples thereof include Al. The film thickness is not particularly limited and is preferably 0.1 to 3 μm.

光電変換素子４０は、太陽電池として好ましく使用することができる。
例えば、上記の光電変換素子１を多数集積化し、必要に応じて、カバーガラス、保護フィルム等を取り付けて、太陽電池とすることができる。 The photoelectric conversion element 40 can be preferably used as a solar cell.
For example, a large number of the photoelectric conversion elements 1 can be integrated, and a cover glass, a protective film, or the like can be attached as necessary to form a solar cell.

なお、多数の光電変換素子（セル）が集積化された太陽電池においては、セル毎に取出し電極を設ける必要はない。集積化太陽電池は、例えば、可撓性の長尺基板を用いてロール・トゥ・ロール方式にて、基板上に各層を形成する工程、集積化のためのパターニング（スクライブ）プロセスを含む光電変換素子形成工程、および素子形成された基板を１モジュールに切断する工程等を経て形成される。なお、ロール・トゥ・ロール方式による製造を行う場合には、スクライブ処理や、各処理工程での基板の巻き取り工程を伴うため、導電層と光電変換層との間の剥離の問題がより顕著となるので、導電層と光電変換層との高い密着性を有する本発明の光電変換素子が非常に有効である。   Note that in a solar battery in which a large number of photoelectric conversion elements (cells) are integrated, it is not necessary to provide an extraction electrode for each cell. An integrated solar cell includes, for example, a process of forming each layer on a substrate by a roll-to-roll method using a flexible long substrate, and a patterning (scribing) process for integration. It is formed through an element forming process, a process of cutting the element-formed substrate into one module, and the like. In addition, when manufacturing by the roll-to-roll method, since the scribing process and the winding process of the substrate in each processing process are involved, the problem of peeling between the conductive layer and the photoelectric conversion layer is more remarkable. Therefore, the photoelectric conversion element of the present invention having high adhesion between the conductive layer and the photoelectric conversion layer is very effective.

なお、本発明の製造方法で作製される光電変換素子は、太陽電池のみならずＣＣＤ等の他の用途にも適用可能である。   In addition, the photoelectric conversion element produced with the manufacturing method of this invention is applicable not only to a solar cell but other uses, such as CCD.

実施例および比較例の方法でそれぞれＣＩＧＳ層を成膜する工程を経て、図４に示した構成の太陽電池セルを作製し、各セルについての光電変換率を測定して比較した。   The solar cell of the structure shown in FIG. 4 was produced through the process of forming each CIGS layer by the method of the example and the comparative example, and the photoelectric conversion rate for each cell was measured and compared.

（太陽電池セル形成）
基板４１としてソーダガラス基板を用い、裏面電極４２としてＭｏをスパッタ法により形成した。このときのＭｏ電極４２の膜厚は０．８μｍとした。
Ｍｏ電極４２上に光電変換層４３として、後記実施例および比較例の各条件下でそれぞれＣＩＧＳ膜（２μｍ）を成膜した。 (Solar cell formation)
A soda glass substrate was used as the substrate 41, and Mo was formed as the back electrode 42 by sputtering. The film thickness of the Mo electrode 42 at this time was 0.8 μm.
A CIGS film (2 μm) was formed as a photoelectric conversion layer 43 on the Mo electrode 42 under the conditions of Examples and Comparative Examples described later.

上記ＣＩＧＳ膜成膜後、化学浴析出（ＣＢＤ：Chemical Bath Deposition)法によりバッファ層４４としてＣｄＳ（50ｎｍ）を成膜してｐｎ接合を形成した。
引き続き、窓層４５としてＺｎＯ（10ｎｍ）を、透明電極４６としてＺｎＯ：Ａｌ膜（膜厚0.3μｍ）をスパッタリング法により連続成膜した。
最後に、Ｍｏ電極４２および透明電極４６の表面に、スパッタ法にて、アルミニウムからなる集電電極４７、４８を形成して図４に示す太陽電池を作製した。 After the CIGS film was formed, CdS (50 nm) was formed as the buffer layer 44 by a chemical bath deposition (CBD) method to form a pn junction.
Subsequently, a ZnO (10 nm) as the window layer 45 and a ZnO: Al film (film thickness: 0.3 μm) as the transparent electrode 46 were continuously formed by sputtering.
Finally, current collecting electrodes 47 and 48 made of aluminum were formed on the surfaces of the Mo electrode 42 and the transparent electrode 46 by a sputtering method to produce the solar cell shown in FIG.

（実施例）
図２に示す蒸着源配列構成を有する成膜装置により、Ｍｏ電極４２上にｐ型半導体層としてカルコパイライト構造のＣＩＧＳ膜４３を成膜した。ＣＩＧＳ膜４３成膜時には、基板温度を550℃に加熱するものとし、蒸着室１１の各蒸着源の温度は、上流域３６の蒸着源群３１〜３３においてはＣｕ蒸着源：1360℃、Ｇａ蒸着源：1090℃、Ｉｎ蒸着源：1055℃とし、下流域３７の蒸着源群３４、３５の蒸着源の温度は、Ｃｕ蒸着源：1220℃、Ｇａ蒸着源：1075℃、Ｉｎ蒸着源：1030℃とした。なお、蒸着室１１および冷却室１３における各Ｓｅ蒸着源の温度は280℃とした。 (Example)
A CIGS film 43 having a chalcopyrite structure was formed as a p-type semiconductor layer on the Mo electrode 42 by a film forming apparatus having the vapor deposition source array configuration shown in FIG. When the CIGS film 43 is formed, the substrate temperature is heated to 550 ° C., and the temperature of each vapor deposition source in the vapor deposition chamber 11 is Cu vapor deposition source: 1360 ° C. and Ga vapor deposition in the vapor deposition source groups 31 to 33 in the upstream region 36. Source: 1090 ° C., In vapor deposition source: 1055 ° C., and temperatures of vapor deposition sources 34 and 35 in the downstream region 37 are Cu vapor deposition source: 1220 ° C., Ga vapor deposition source: 1075 ° C., In vapor deposition source: 1030 ° C. It was. In addition, the temperature of each Se vapor deposition source in the vapor deposition chamber 11 and the cooling chamber 13 was 280 degreeC.

（比較例）
図５に示す蒸着源配置構成を有する成膜装置により、Ｍｏ電極４２上にｐ型半導体層としてカルコパイライト構造のＣＩＧＳ膜４３を成膜した。他の条件は実施例と同様とした。
図５に示す蒸着源配置は、同一の蒸着源がそれぞれ１列に配置されてなるＣｕ蒸着源列６１、Ｇａ蒸着源列６２、Ｃｕ蒸着源列６１、Ｉｎ蒸着源列６３、Ｃｕ蒸着源列６１、Ｉｎ蒸着源列６３、Ｃｕ蒸着源列６１、Ｇａ蒸着源列６２が搬送方向上流側からこの順に配置されてなるものである。 (Comparative example)
A CIGS film 43 having a chalcopyrite structure was formed as a p-type semiconductor layer on the Mo electrode 42 by a film forming apparatus having the vapor deposition source arrangement shown in FIG. Other conditions were the same as in the example.
The vapor deposition source arrangement shown in FIG. 5 is a Cu vapor deposition source row 61, a Ga vapor deposition source row 62, a Cu vapor deposition source row 61, an In vapor deposition source row 63, and a Cu vapor deposition source row, each of which is formed by arranging the same vapor deposition source in one row. 61, an In vapor deposition source row 63, a Cu vapor deposition source row 61, and a Ga vapor deposition source row 62 are arranged in this order from the upstream side in the transport direction.

＜変換効率＞
実施例および比較例の方法により成膜されたＣＩＧＳ層を有する各太陽電池セルについて、ソーラーシミュレーターを用いて、Ａｉｒ Ｍａｓｓ（ＡＭ）＝１．５、１００ｍＷ／ｃｍ2の擬似太陽光を用いた条件下で、エネルギー変換効率を測定した。 <Conversion efficiency>
For each solar battery cell having a CIGS layer formed by the method of Example and Comparative Example, using solar simulator, conditions using simulated solar light of Air Mass (AM) = 1.5, 100 mW / cm 2 Below, the energy conversion efficiency was measured.

比較例の太陽電池セルでは、変換効率が１３％であったのに対し、実施例のものは変換効率が１４．５％であり、変換効率が１．５％程度高いという結果が得られた。これは、実施例により成膜された光電変換層の面内組成均一性が比較例のものに比して良好であるためと考えられる。   In the solar cell of the comparative example, the conversion efficiency was 13%, whereas in the example, the conversion efficiency was 14.5%, and the conversion efficiency was about 1.5% higher. . This is presumably because the in-plane composition uniformity of the photoelectric conversion layer formed in the example is better than that of the comparative example.

なお、比較例の方法で、８枚の成膜基板上にＣＩＧＳ層を成膜したところ、成膜終了後に６枚でＣＩＧＳ層の剥離が生じた。一方、実施例の方法で、８枚の成膜基板上にＣＩＧＳ膜を成膜したところ、８枚すべてで剥離は生じなかった。   In addition, when the CIGS layer was formed on eight film formation substrates by the method of the comparative example, peeling of the CIGS layer occurred in six sheets after completion of the film formation. On the other hand, when CIGS films were formed on eight film formation substrates by the method of the example, no peeling occurred on all eight films.

＜二次イオン質量分析＞
実施例の方法で成膜基板上にＣＩＧＳ層を成膜した試料について、膜厚方向の二次イオン質量分析を行った結果を図６に示す。なお、図６は、ＣＩＧＳ標準試料により定量したものである。また、定量値ＣＩＧＳ層内のみ有効である。 <Secondary ion mass spectrometry>
FIG. 6 shows the result of secondary ion mass spectrometry in the film thickness direction for the sample in which the CIGS layer was formed on the film formation substrate by the method of the example. In addition, FIG. 6 is quantified by the CIGS standard sample. Moreover, it is effective only in the quantitative value CIGS layer.

図６に示す通り、本実施例の方法によれば、ＣＩＧＳ層の膜厚方向にＧａの濃度が大小大と変化するダブルグレーデッド構造を形成することができた。なお、Ｇａの濃度は、膜厚方向中央領域のボトム濃度は上下領域のピーク濃度に対して７割程度であった。一方、Ｉｎの濃度は、膜厚方向全域に亘ってほぼ均一となった。図２に示すように、Ｇａ−Ｃｕ第１蒸着源群３２、およびＧａ−Ｃｕ第２蒸着源群３４にはＩｎ蒸着源を含まないが、Ｉｎは拡散速度が速いためにその濃度は膜厚方向にほぼ均一なものとなったと考えられる。他方、ＧａはＩｎと比較して拡散速度が遅く、Ｉｎ−Ｃｕ蒸着源群３３のようにＧａ蒸着源を含まない領域を備えることにより、ダブルグレーデッド構造となるようにＧａの膜厚方向濃度分布を設けることができたと考えられる。   As shown in FIG. 6, according to the method of the present example, a double graded structure in which the Ga concentration varies in the film thickness direction of the CIGS layer can be formed. As for the Ga concentration, the bottom concentration in the central region in the film thickness direction was about 70% of the peak concentration in the upper and lower regions. On the other hand, the concentration of In was almost uniform over the entire region in the film thickness direction. As shown in FIG. 2, the Ga-Cu first vapor deposition source group 32 and the Ga-Cu second vapor deposition source group 34 do not contain an In vapor deposition source, but since In has a high diffusion rate, its concentration is the film thickness. It seems that it became almost uniform in the direction. On the other hand, the diffusion rate of Ga is slower than that of In, and by providing a region that does not include a Ga vapor deposition source, such as the In-Cu vapor deposition source group 33, the concentration of Ga in the direction of the film thickness so as to form a double graded structure. It is thought that distribution could be established.

１、２ 成膜装置
１０ 基板導入室
１１ 蒸着室
１３ 冷却室
１４ 基板排出室
１５ 制御部
１６、５０ 基板搬送機構
１７ 蒸着前基板収納トレイ
１８ 成膜済基板収納トレイ
１９ａ〜１９ｃ 基体加熱機構
２１ Ｉｎ蒸着源
２２ Ｇａ蒸着源
２３ Ｃｕ蒸着源
２５ Ｓｅ蒸着源
２５ａ ライン状導管
２５ｂ 開口
２５ｃ Ｓｅ貯留タンク
３１ Ｉｎ−Ｇａ第１蒸着源群
３２ Ｇａ−Ｃｕ第１蒸着源群
３３ Ｉｎ−Ｃｕ蒸着源群
３４ Ｇａ−Ｃｕ第２蒸着源群
３５ Ｉｎ−Ｇａ第２蒸着源群
３６ 上流域
３７ 下流域
４０ 光電変換素子（太陽電池セル）
４１ ガラス基板
４２ 下部電極（裏面電極）
４３ 光電変換層
４４ バッファ層
４５ 窓層
４６ 透明電極
４７、４８ 集電電極 DESCRIPTION OF SYMBOLS 1, 2 Film forming apparatus 10 Substrate introduction chamber 11 Deposition chamber 13 Cooling chamber 14 Substrate discharge chamber 15 Control unit 16, 50 Substrate transport mechanism 17 Substrate storage tray 18 before deposition Substrate heating trays 19a to 19c Substrate heating mechanism 21 In Deposition source 22 Ga deposition source 23 Cu deposition source 25 Se deposition source 25a Line-shaped conduit 25b Opening 25c Se storage tank 31 In-Ga first deposition source group 32 Ga-Cu first deposition source group 33 In-Cu deposition source group 34 Ga-Cu 2nd vapor deposition source group 35 In-Ga 2nd vapor deposition source group 36 Upstream area 37 Downstream area 40 Photoelectric conversion element (solar cell)
41 Glass substrate 42 Lower electrode (back electrode)
43 Photoelectric conversion layer 44 Buffer layer 45 Window layer 46 Transparent electrodes 47 and 48 Current collecting electrode

Claims (15)

Ｃｕ、Ｉｎ、Ｇａ、Ｓｅを含む化合物半導体膜を成膜用基板の一面に成膜する成膜装置であって、
蒸着室と、該蒸着室内において、前記成膜用基板を一方向に搬送する基板搬送機構と、前記蒸着室内に配置された、前記Ｃｕ、Ｉｎ，Ｇａ、Ｓｅそれぞれを蒸着させるための複数のＣｕ蒸着源、複数のＩｎ蒸着源、複数のＧａ蒸着源およびＳｅ蒸着源と、前記各蒸着源からの各元素の蒸発量を制御する制御部とを備え、
前記成膜用基板の搬送方向に沿って最上流に、前記Ｉｎ蒸着源と前記Ｇａ蒸着源とが交互に配置されてなる行列状のＩｎ−Ｇａ第１蒸着源群が配置されており、
前記制御部が、前記搬送方向の前記最上流と最下流との間にＧａ／（Ｉｎ＋Ｇａ）比が最小、かつ該最小のＧａ／（Ｉｎ＋Ｇａ）比が前記最上流または前記最下流でのＧａ／（Ｉｎ＋Ｇａ）比の半分以下となる領域が存在するように、前記各蒸着源からの蒸発量を制御するものであることを特徴とする成膜装置。 A film forming apparatus for forming a compound semiconductor film containing Cu, In, Ga, and Se on one surface of a film forming substrate,
A deposition chamber, a substrate transport mechanism for transporting the film-forming substrate in one direction in the deposition chamber, and a plurality of Cu for depositing each of the Cu, In, Ga, and Se disposed in the deposition chamber A deposition source, a plurality of In deposition sources, a plurality of Ga deposition sources and a Se deposition source, and a control unit for controlling the evaporation amount of each element from each of the deposition sources;
A matrix In-Ga first vapor deposition source group in which the In vapor deposition source and the Ga vapor deposition source are alternately arranged is arranged in the uppermost stream along the transport direction of the film formation substrate,
The control unit has a minimum Ga / (In + Ga) ratio between the most upstream and the most downstream in the transport direction, and the minimum Ga / (In + Ga) ratio is the most upstream or the most downstream Ga / A film forming apparatus characterized in that the evaporation amount from each of the vapor deposition sources is controlled so that there is a region that is half or less of the (In + Ga) ratio. 前記複数のＣｕ蒸着源、前記複数のＩｎ蒸着源および前記複数のＧａ蒸着源が、前記成膜用基板の搬送方向に沿って上流側から順に、
前記Ｉｎ−Ｇａ第１蒸着源群、
前記Ｃｕ蒸着源と前記Ｇａ蒸着源とが交互に配置されてなる行列状のＣｕ−Ｇａ第１蒸着源群、
前記Ｃｕ蒸着源と前記Ｉｎ蒸着源とが交互に配置されてなる行列状のＣｕ−Ｉｎ蒸着源群、
前記Ｃｕ蒸着源と前記Ｇａ蒸着源とが交互に配置されてなる行列状のＣｕ−Ｇａ第２蒸着源群、および
前記Ｉｎ蒸着源と前記Ｇａ蒸着源とが交互に配置されてなる行列状のＩｎ−Ｇａ第２蒸着源群を構成するようにして配置されていることを特徴とする請求項１記載の成膜装置。 The plurality of Cu deposition sources, the plurality of In deposition sources, and the plurality of Ga deposition sources are sequentially from the upstream side along the transport direction of the film formation substrate.
The In-Ga first deposition source group,
A matrix Cu-Ga first deposition source group in which the Cu deposition source and the Ga deposition source are alternately arranged;
A matrix Cu-In vapor deposition source group in which the Cu vapor deposition source and the In vapor deposition source are alternately arranged;
A matrix Cu-Ga second deposition source group in which the Cu deposition source and the Ga deposition source are alternately arranged, and a matrix shape in which the In deposition source and the Ga deposition source are alternately arranged. The film forming apparatus according to claim 1, wherein the film forming apparatus is arranged so as to constitute an In—Ga second vapor deposition source group. 前記制御部が、前記最小のＧａ／（Ｉｎ＋Ｇａ）比が０となるように、前記各蒸着源からの蒸発量を制御するものであることを特徴とする請求項１または２記載の成膜装置。   The film forming apparatus according to claim 1, wherein the control unit controls an evaporation amount from each of the vapor deposition sources so that the minimum Ga / (In + Ga) ratio becomes zero. . 前記制御部が、下流域におけるＣｕの蒸発量を、上流域におけるＣｕの蒸発量と比較して相対的に抑制させた条件で、前記各元素を前記基板の一面に供給するように、前記各蒸着源からの蒸発量を制御するものであることを特徴とする請求項１から３いずれか１項記載の成膜装置。   The control unit supplies each element to one surface of the substrate under a condition in which the evaporation amount of Cu in the downstream region is relatively suppressed as compared with the evaporation amount of Cu in the upstream region. 4. The film forming apparatus according to claim 1, wherein the evaporation amount from the evaporation source is controlled. 前記各蒸着源群の前記各行列状の各蒸着源の列が前記成膜用基板の前記搬送方向と略垂直に交わるように配置されていることを特徴とする請求項１から４いずれか１項記載の成膜装置。   The row of the respective matrix-like vapor deposition sources of the respective vapor deposition source groups is arranged so as to intersect substantially perpendicularly with the transport direction of the film formation substrate. The film-forming apparatus of description. 前記Ｃｕ−Ｇａ第２蒸着源群におけるＣｕ蒸着源数が、前記Ｃｕ−Ｇａ第１蒸着源群におけるＣｕ蒸着源数よりも少ないことを特徴とする請求項２から５いずれか１項記載の成膜装置。   6. The composition according to claim 2, wherein the number of Cu vapor deposition sources in the Cu—Ga second vapor deposition source group is smaller than the number of Cu vapor deposition sources in the Cu—Ga first vapor deposition source group. Membrane device. 前記Ｓｅ蒸着源が、前記各蒸着源群の前記行列状の各蒸着源の列間に、該列に沿って延びるライン上に複数の開口を有するライン状蒸着源であることを特徴とする請求項１から６いずれか１項記載の成膜装置。   The Se deposition source is a linear deposition source having a plurality of openings on a line extending along the row between the rows of the matrix-like deposition sources of the deposition source groups. Item 7. The film forming apparatus according to any one of Items 1 to 6. 前記蒸着室に、前記成膜用基板を加熱する加熱手段を備えていることを特徴とする請求項１から７いずれか１項記載の成膜装置。   The film deposition apparatus according to claim 1, further comprising a heating unit configured to heat the deposition substrate in the deposition chamber. 前記蒸着室の下流側に、該蒸着室と連結された、前記化合物半導体膜が成膜された前記成膜用基板を冷却する冷却室を備え、
該冷却室に、Ｓｅ蒸着源を備えていることを特徴とする請求項１から８いずれか１項記載の成膜装置。 A cooling chamber connected to the vapor deposition chamber and for cooling the film-forming substrate on which the compound semiconductor film is formed, on the downstream side of the vapor deposition chamber;
The film forming apparatus according to claim 1, wherein the cooling chamber includes a Se vapor deposition source. 前記冷却室に、前記成膜用基板を冷却する冷却手段を備えていることを特徴とする請求項９記載の成膜装置。   The film forming apparatus according to claim 9, further comprising a cooling unit that cools the film forming substrate in the cooling chamber. 前記蒸着室の上流側に該蒸着室に連結して配置された、前記成膜用基板を収納する処理前基板収納部と、該成膜用基板を加熱する加熱手段とを備えた基板導入室と、
前記冷却室の下流側に該冷却室に連結して配置された、前記化合物半導体膜が成膜された前記成膜用基板が収納される処理済基板収納部を備えた基板排出室とをさらに備え、
前記基板導入室、前記蒸着室、前記冷却室および前記基板排出室が直線状に配置され、
前記基板搬送機構が、前記成膜用基板を前記各室に亘って前記一方向にインライン状に移動させるものであることを特徴とする請求項９または１０記載の成膜装置。 A substrate introduction chamber provided with a pre-treatment substrate storage portion for storing the film formation substrate, and a heating means for heating the film formation substrate, which are connected to the vapor deposition chamber on the upstream side of the vapor deposition chamber. When,
A substrate discharge chamber provided with a processed substrate storage portion that is disposed downstream of the cooling chamber and is connected to the cooling chamber and that stores the film-forming substrate on which the compound semiconductor film is formed; Prepared,
The substrate introduction chamber, the vapor deposition chamber, the cooling chamber, and the substrate discharge chamber are arranged linearly,
The film forming apparatus according to claim 9, wherein the substrate transport mechanism moves the film forming substrate in the one direction in the one direction across the chambers. 前記蒸着室の上流側に該蒸着室に連結して配置された、前記成膜用基板を巻き出す巻出ロールと、該成膜用基板を加熱する加熱手段とを備えた基板導入室と、
前記冷却室の下流側に該冷却室に連結して配置された、前記化合物半導体膜が成膜された前記成膜用基板を巻き取る巻取りロールを備えた基板排出室とをさらに備え、
前記基板導入室、前記蒸着室、前記冷却室および前記基板排出室が直線状に配置され、
前記移動手段が、前記巻出しロールから前記成膜用基板を巻き出させ、前記各室を経た前記成膜用基板を前記巻取りロールで巻き取らせるものであることを特徴とする請求項９または１０記載の成膜装置。 A substrate introduction chamber comprising an unwinding roll for unwinding the film-forming substrate, disposed upstream of the vapor-depositing chamber, and a heating means for heating the film-forming substrate;
A substrate discharge chamber provided on the downstream side of the cooling chamber and connected to the cooling chamber, the substrate discharge chamber including a winding roll for winding the film-forming substrate on which the compound semiconductor film is formed;
The substrate introduction chamber, the vapor deposition chamber, the cooling chamber, and the substrate discharge chamber are arranged linearly,
10. The moving means is configured to unwind the film-forming substrate from the unwinding roll, and to wind the film-forming substrate that has passed through the chambers with the winding roll. Or the film-forming apparatus of 10. Ｃｕ（Ｉｎ,Ｇａ)Ｓｅ2化合物半導体からなる光電変換層を備えた光電変換素子の製造方法であって、
一面に裏面電極を備えた基板を一方向に搬送させつつ、該搬送方向に沿って配置された複数のＣｕ蒸着源、複数のＩｎ蒸着源、複数のＧａ蒸着源およびＳｅ蒸着源から前記基板の一面側に前記各元素の蒸気を供給して、前記裏面電極上に前記光電変換層を成膜する蒸着成膜工程を有し、
該蒸着成膜工程において、前記基板の搬送方向の最上流において、前記Ｉｎ蒸着源と前記Ｇａ蒸着源とが交互に配置されてなる行列状のＩｎ−Ｇａ第１蒸着源群および前記Ｓｅ蒸着源を用いて、Ｉｎ、ＧａおよびＳｅを前記基板の一面側に供給すると共に、前記搬送方向の前記最上流と最下流との間にＧａ／（Ｉｎ＋Ｇａ）比が最小、かつ該最小のＧａ／（Ｉｎ＋Ｇａ）比が前記最上流または前記最下流でのＧａ／（Ｉｎ＋Ｇａ）比の半分以下となる領域が存在するように、前記各蒸着源からの蒸発量を制御しつつ、
前記最上流を含む上流域において、Ｃｕ（Ｉｎ，Ｇａ）Ｓｅ2、ＣｕxＳｅの互いに相分離された化合物からなる混合物を前記裏面電極上に生成させ、
前記上流域に続く、前記最下流を含む下流域において、前記ＣｕxＳｅをＣｕ（Ｉｎ、Ｇａ）Ｓｅ2に転化させることにより、前記光電変換層を成膜することを特徴とする光電変換素子の製造方法。 A method for producing a photoelectric conversion element comprising a photoelectric conversion layer made of a Cu (In, Ga) Se 2 compound semiconductor,
While transporting a substrate having a back electrode on one side in one direction, from a plurality of Cu deposition sources, a plurality of In deposition sources, a plurality of Ga deposition sources and a Se deposition source arranged along the transport direction, Supplying a vapor of each element to one surface side, and having a vapor deposition film forming step of forming the photoelectric conversion layer on the back electrode;
In the vapor deposition film forming step, the In-Ga first vapor deposition source group and the Se vapor deposition source in which the In vapor deposition source and the Ga vapor deposition source are alternately arranged in the uppermost stream in the transport direction of the substrate. In, Ga and Se are supplied to one side of the substrate, and the Ga / (In + Ga) ratio is minimum between the most upstream and the most downstream in the transport direction, and the minimum Ga / ( While controlling the amount of evaporation from each deposition source so that there is a region where the In + Ga) ratio is less than half of the Ga / (In + Ga) ratio at the most upstream or the most downstream,
In the upstream region including the uppermost stream, a mixture of Cu (In, Ga) Se 2 and Cu x Se that are phase-separated from each other is generated on the back electrode,
In the downstream area including the most downstream area following the upstream area, the photoelectric conversion layer is formed by converting the Cu x Se into Cu (In, Ga) Se 2. Manufacturing method. 前記最小のＧａ／（Ｉｎ＋Ｇａ）比を０とすることを特徴とする請求項１３記載の光電変換素子の製造方法。   The method for producing a photoelectric conversion element according to claim 13, wherein the minimum Ga / (In + Ga) ratio is set to zero. 前記下流域におけるＣｕの蒸発量を、前記上流域におけるＣｕの蒸発量と比較して相対的に抑制させた条件で、前記各元素の上記前記基板の一面に供給することを特徴とする請求項１３または１４記載の光電変換素子の製造方法。   The amount of evaporation of Cu in the downstream region is supplied to one surface of the substrate of each element under a condition that is relatively suppressed as compared with the amount of evaporation of Cu in the upstream region. The manufacturing method of the photoelectric conversion element of 13 or 14.
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