JP2012057255A - Method for electrolytic synthesis of fluorine-containing substance using anode for electrolysis - Google Patents

Method for electrolytic synthesis of fluorine-containing substance using anode for electrolysis Download PDF

Info

Publication number
JP2012057255A
JP2012057255A JP2011266948A JP2011266948A JP2012057255A JP 2012057255 A JP2012057255 A JP 2012057255A JP 2011266948 A JP2011266948 A JP 2011266948A JP 2011266948 A JP2011266948 A JP 2011266948A JP 2012057255 A JP2012057255 A JP 2012057255A
Authority
JP
Japan
Prior art keywords
electrolysis
anode
electrode
fluorine
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011266948A
Other languages
Japanese (ja)
Other versions
JP5520280B2 (en
Inventor
Akimasa Tasaka
明政 田坂
Masaharu Uno
雅晴 宇野
Yoshinori Nishiki
善則 錦
Tsuneto Furuta
常人 古田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
De Nora Permelec Ltd
Original Assignee
Permelec Electrode Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Permelec Electrode Ltd filed Critical Permelec Electrode Ltd
Priority to JP2011266948A priority Critical patent/JP5520280B2/en
Publication of JP2012057255A publication Critical patent/JP2012057255A/en
Application granted granted Critical
Publication of JP5520280B2 publication Critical patent/JP5520280B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Carbon And Carbon Compounds (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an anode material for electrolysis in an electrolytic bath containing anhydrous hydrofluoric acid, which is free from the occurrence of an anode effect, does not remarkably produce sludge due to the dissolution of an electrode, is capable of suppressing the production of CFand capable of stably continuing electrolysis without causing the breakdown of the electrode.SOLUTION: An electrolytic bath containing anhydrous hydrofluoric acid or anhydrous hydrofluoric acid to which a material to be fluorinated is added is subjected to electrolysis using an electrode for electrolysis formed by coating at least part of a conductive material base including glassy carbon with a conductive diamond film, whereby fluorine or a fluorine-containing compound is electrolytically synthesized.

Description

本発明は、無水フッ化水素を含有する電解浴での電解などに於いて、高電流密度を印加しても陽極効果が発生せず、電極溶解による著しいスラッジの発生がなく、CF4の発生を抑制でき、且つ電極崩壊を起こすことなく安定に電解を継続できる陽極材料を使用する電解方法に関するものである。 In the present invention, in electrolysis in an electrolytic bath containing anhydrous hydrogen fluoride, the anode effect does not occur even when a high current density is applied, no significant sludge is generated due to electrode dissolution, and CF 4 is generated. It is related with the electrolysis method using the anode material which can suppress electrolysis and can continue electrolysis stably without raise | generating electrode collapse.

無水フッ化水素(無水HF)中へ無機、或いは有機化合物を溶解した溶液を電解浴とし、電解によって無機フッ素化合物、有機フッ素化合物、或いはフッ素ガスを合成する電解法は工業的に実用されている。   An electrolytic method for synthesizing an inorganic fluorine compound, an organic fluorine compound, or fluorine gas by electrolysis using a solution in which an inorganic or organic compound is dissolved in anhydrous hydrogen fluoride (anhydrous HF) as an electrolytic bath has been put into practical use industrially. .

また、無水HFは導電率が充分ではないため、高電流密度操業を意図する場合には、しばしば、導電助剤として、フッ化カリウム(KF)などのアルカリ金属フッ化物、またはアルカリ土類金属フッ化物が電解浴に添加される。   In addition, anhydrous HF has insufficient conductivity, so when a high current density operation is intended, an alkali metal fluoride such as potassium fluoride (KF) or an alkaline earth metal fluoride is often used as a conductive aid. Is added to the electrolytic bath.

樹脂合成、化学薬品合成、及び医薬品合成などでフッ素化剤として汎用されるフッ素ガス(F2)は、無水HF中へ導電助剤としてフッ化カリウム(KF)を添加したKF・HF系電解浴を電解することで合成され、半導体分野などでドライエッチャント、或いはクリーニングガスとして汎用される三フッ化窒素ガス(NF3)は、無水HF中へ被フッ素化物としてアンモニアを溶解したNH4F・HF系電解浴を電解することで合成される。 Fluorine gas (F 2 ), which is widely used as a fluorinating agent in resin synthesis, chemical synthesis, and pharmaceutical synthesis, is a KF / HF electrolytic bath in which potassium fluoride (KF) is added to anhydrous HF as a conductive aid. Nitrogen trifluoride gas (NF 3 ), which is synthesized by electrolyzing and is widely used as a dry etchant or cleaning gas in the semiconductor field, etc., is NH 4 F · HF in which ammonia is dissolved in anhydrous HF as a fluorinated product. It is synthesized by electrolyzing a system electrolytic bath.

また、被フッ素化物として無機、或いは有機化合物を無水HFに溶解させた溶液を電解浴とし、フッ素ガスが発生するよりも低い電圧で電解することでペルフルオロ化合物を合成する方法は、シモンズ法として知られている。   In addition, a method of synthesizing a perfluoro compound by using a solution in which an inorganic or organic compound is dissolved in anhydrous HF as an fluorinated substance as an electrolytic bath and performing electrolysis at a voltage lower than the generation of fluorine gas is known as the Simmons method. It has been.

これらのいずれの電解方法でも、無水HFの著しい腐食性によって電解槽、及び電極材料に使用できる材料は限られており、特に陽極材料として使用しうる材料は、ニッケル、或いは炭素に限られる。   In any of these electrolysis methods, the material that can be used for the electrolytic cell and the electrode material is limited due to the remarkable corrosiveness of anhydrous HF, and in particular, the material that can be used as the anode material is limited to nickel or carbon.

ニッケルを陽極に使用した場合はその消耗が著しく加速されるため、陽極には炭素が多用される。   When nickel is used for the anode, its consumption is remarkably accelerated, so carbon is frequently used for the anode.

炭素陽極では、ニッケル陽極に見られる電極の消耗が小さいことが利点として挙げられるが、電極の不動体化現象、いわゆる陽極効果によって電解継続が困難となる問題がしばしば発生する。   The carbon anode has an advantage that the consumption of the electrode seen in the nickel anode is small. However, there is often a problem that it is difficult to continue the electrolysis due to the non-moving phenomenon of the electrode, the so-called anode effect.

炭素陽極による陽極反応では、目的反応であるフッ化物イオンの放電反応と共に、フッ化グラファイト生成反応が進行する。一方、生成したフッ化グラファイトは、電極反応で生じたジュール熱による熱分解、或いは不均化反応により一部分解する。共有結合性のフッ化グラファイトは電解浴との濡れ性が低いため、フッ化グラファイトの生成速度が分解速度より大きい場合には、電極表面がフッ化グラフィイトで被覆され陽極効果が発生する。フッ化グラファイトの生成速度は電流密度に依存するため、電流密度が高い程、陽極効果が発生しやすくなる。   In the anodic reaction by the carbon anode, a graphite fluoride forming reaction proceeds together with a discharge reaction of fluoride ions which is a target reaction. On the other hand, the produced graphite fluoride is partially decomposed by thermal decomposition due to Joule heat generated by the electrode reaction or disproportionation reaction. Since covalently bonded graphite fluoride has low wettability with an electrolytic bath, when the generation rate of graphite fluoride is higher than the decomposition rate, the electrode surface is coated with fluorinated graphite, and an anodic effect is generated. Since the generation rate of graphite fluoride depends on the current density, the higher the current density, the easier the anode effect occurs.

電解浴中に水分が存在する場合、フッ化物イオンの放電反応よりも卑な電位である水の分解反応が優先して起こるが、この時、水と炭素陽極の反応で酸化グラファイトが生成する。この酸化グラファイトが化学的に不安定であるため、フッ素との置換反応が容易に進行し、フッ化グラファイトが生成する。従って、電解浴中の水分濃度が高い程、フッ化グラファイトの生成が促進され、陽極効果が発生しやすくなる。   When water is present in the electrolytic bath, the decomposition reaction of water, which has a base potential, takes precedence over the discharge reaction of fluoride ions. At this time, graphite oxide is generated by the reaction of water and the carbon anode. Since this graphite oxide is chemically unstable, the substitution reaction with fluorine easily proceeds and graphite fluoride is produced. Therefore, the higher the water concentration in the electrolytic bath, the more the generation of graphite fluoride is promoted and the anode effect is more likely to occur.

従って、炭素陽極での陽極効果を抑制するためには、電解浴中水分濃度を極小とすること、および、陽極効果が発生する電流密度(臨界電流密度)以下の電流密度で電解を行うことが必要である。実際の工業電解においては、前者の目的のために脱水電解などの煩雑な操作が実施され、後者の目的のために操業電流密度を制限している。これらによって、目的物の生産速度が制限され、電解合成の採算性向上を阻害している。   Therefore, in order to suppress the anode effect at the carbon anode, it is necessary to minimize the water concentration in the electrolytic bath and to perform electrolysis at a current density equal to or lower than the current density (critical current density) at which the anode effect occurs. is necessary. In actual industrial electrolysis, complicated operations such as dehydration electrolysis are performed for the former purpose, and the operating current density is limited for the latter purpose. As a result, the production rate of the target product is limited, and the profitability improvement of electrolytic synthesis is hindered.

一方、無水HFが炭素電極内部に浸透して電極が膨張するため、この膨張による電極の割れ、崩壊もしばしば発生する。HFの炭素電極内への浸透を防止するために、電極表面を溶射やめっきによってニッケル被覆する方法などが実用されているが、後述のようにニッケルにも問題があるため、本質的な解決策は見出されていない。また、KFなどの電解浴中の導電助剤濃度を上げることによって、無水HFの蒸気圧を下げることも適用されるが、導電助剤濃度の上昇により電解浴の融点が上昇するために操業温度を上げる必要があり、限界がある。   On the other hand, since anhydrous HF permeates into the carbon electrode and the electrode expands, the electrode often breaks or collapses due to this expansion. In order to prevent the penetration of HF into the carbon electrode, a method of coating the surface of the electrode with nickel by thermal spraying or plating has been put into practical use. However, since there is a problem with nickel as described later, an essential solution Has not been found. In addition, the vapor pressure of anhydrous HF can be reduced by increasing the concentration of the conductive assistant in the electrolytic bath such as KF, but the operating temperature is increased because the melting point of the electrolytic bath increases due to the increase of the conductive assistant concentration. There is a limit.

ニッケルは、無水HF中にアンモニア、アルコール、アミンなどの被フッ素化物質を添加した電解浴中での電解において、陽極として汎用される。ニッケル陽極では、炭素陽極に見られる陽極効果が発生しない利点があるが、電解中に消耗が進行する。   Nickel is widely used as an anode in electrolysis in an electrolytic bath in which fluorinated substances such as ammonia, alcohol, and amine are added to anhydrous HF. Nickel anodes have the advantage that the anode effect seen with carbon anodes does not occur, but wear progresses during electrolysis.

ニッケル陽極の消耗量は通電量の3〜5%に達し、消耗したニッケル陽極の交換費用は電解電力費にほぼ匹敵する。また、電解浴中にニッケルが溶解することで電解浴の粘度が増大し、電解浴の温度制御が困難となるため、定期的な電解浴交換も必要となる。このように、ニッケル陽極では、陽極交換と電解浴交換、及びそれに伴う操業停止が不可欠であり、電解合成の採算性向上を阻害する要因となっている。   The consumed amount of the nickel anode reaches 3 to 5% of the energized amount, and the replacement cost of the consumed nickel anode is almost equal to the electrolytic power cost. Further, since nickel dissolves in the electrolytic bath, the viscosity of the electrolytic bath increases and it becomes difficult to control the temperature of the electrolytic bath, so that regular electrolytic bath replacement is also required. As described above, in the nickel anode, it is indispensable to replace the anode, replace the electrolytic bath, and stop the operation, which is a factor that hinders the improvement of electrolytic synthesis profitability.

特許文献1では、シリコン基体表面をホウ素ドープダイヤモンド膜で被覆した電極および該電極を用いた電解フッ素化方法を開示している。また、特許文献2では、導電性炭素材料基体表面を導電性ダイヤモンドで被覆した電極及び該電極を用いたフッ素含有物質の電解合成方法を開示している。特許文献3は、グラファイト板や、ニッケルあるいはステンレスにガラス状炭素を被覆した導電性基板を導電性ダイヤモンドで被覆した電極及び該電極を用いたフッ素含有物質の電解合成方法を開示している。   Patent Document 1 discloses an electrode in which the surface of a silicon substrate is covered with a boron-doped diamond film and an electrolytic fluorination method using the electrode. Patent Document 2 discloses an electrode in which the surface of a conductive carbon material substrate is coated with conductive diamond and a method for electrolytic synthesis of a fluorine-containing substance using the electrode. Patent Document 3 discloses a graphite plate, an electrode obtained by coating a conductive substrate obtained by coating glassy carbon on nickel or stainless steel with conductive diamond, and a method for electrolytic synthesis of a fluorine-containing substance using the electrode.

特開2000−204492号公報JP 2000-204492 A 特開2006−249557号公報JP 2006-249557 A 国際公開第2007/083740号公報(段落0065、0068、実施例1及び2)International Publication No. 2007/083740 (paragraphs 0065 and 0068, Examples 1 and 2)

本発明者らは鋭意検討した結果、特許文献1記載のシリコン基体表面をホウ素ドープダイヤモンド膜で被覆した電極では、ホウ素ドープダイヤモンド膜で不可避的に発生するピンホールから浸透した電解浴中の無水HFによってシリコン基体が腐食されるために電極構造の維持が困難であること、また、特許文献2記載の導電性炭素材料表面を導電性ダイヤモンドで被覆した電極、及び特許文献3記載のグラファイト板を導電性ダイヤモンドで被覆した電極では、電解浴中の無水HF濃度が高い場合、特に電解浴中のHFのモル濃度が、被フッ素化物または導電助剤のモル濃度の3倍以上の場合、導電性炭素材料、及びグラファイト板に無水HFが浸透することによって電極基体が崩壊するという課題を見出した。   As a result of intensive studies, the inventors of the present invention have found that in the electrode in which the surface of the silicon substrate described in Patent Document 1 is coated with a boron-doped diamond film, anhydrous HF in an electrolytic bath permeating through pinholes inevitably generated in the boron-doped diamond film. It is difficult to maintain the electrode structure due to the corrosion of the silicon substrate, and the conductive carbon material surface described in Patent Document 2 is coated with conductive diamond, and the graphite plate described in Patent Document 3 is electrically conductive. When the anhydrous HF concentration in the electrolytic bath is high, particularly when the molar concentration of HF in the electrolytic bath is more than three times the molar concentration of the fluorinated substance or the conductive auxiliary, The subject that the electrode base body collapse | disintegrated by anhydrous HF osmose | permeating material and a graphite board was discovered.

前述の通り、無水HFを含有する電解浴での電解用電極としては、炭素電極の見られる陽極効果や崩壊が発生せず、且つ、ニッケル陽極に見られる消耗が進行しない電極が待ち望まれている。   As described above, as an electrode for electrolysis in an electrolytic bath containing anhydrous HF, there is a demand for an electrode that does not cause the anode effect and collapse seen in the carbon electrode and does not progress the wear seen in the nickel anode. .

本発明は、グラッシーカーボンから成る導電性材料を基体とし、その基体の少なくとも一部を導電性ダイヤモンド膜で被覆した電解用電極を用いて、無水HF、または無水HFに被フッ素化物を添加した電解浴を電解してフッ素またはフッ素含有化合物を電解合成する方法を提供するものである。   In the present invention, an electrolysis material in which a conductive material made of glassy carbon is used as a base and at least a part of the base is covered with a conductive diamond film is used for electrolysis in which fluorinated material is added to anhydrous HF or anhydrous HF. A method for electrolytically synthesizing fluorine or a fluorine-containing compound by electrolyzing a bath is provided.

以下に本発明を詳細に説明する。
本発明者らは、鋭意検討した結果、グラッシーカーボンから成る導電性基体の少なくとも一部を導電性ダイヤモンド膜で被覆した電解用電極は、無水HFを含有する電解浴での電解に於いて、電解浴中の無水HF濃度が高い場合であっても、陽極効果、電極の消耗、電極の崩壊が発生せず、長期の電解継続が可能な電極であることを発見した。
The present invention is described in detail below.
As a result of intensive studies, the present inventors have found that an electrode for electrolysis in which at least a part of a conductive substrate made of glassy carbon is coated with a conductive diamond film is electrolyzed in an electrolysis bath containing anhydrous HF. It was discovered that even when the anhydrous HF concentration in the bath was high, the anode effect, electrode consumption, and electrode collapse did not occur, and the electrode could continue electrolysis for a long time.

グラッシーカーボンは、セルロースやセルロース樹脂、フラン樹脂といった熱硬化性樹脂を前駆体とし、該前駆体を成形後に固相炭化処理することによって製造されるガラス様の外観を持つ炭素材料であり、その特徴としては、高硬度、化学的安定性、耐摩耗性、気体及び液体不透過性などが挙げられる。その構造は均質、且つ結晶形を持たない無定型であり、多数の気孔が存在するが、その大半は閉気孔でるため開気孔が殆ど存在しない。このような特徴を有するグラッシーカーボンを導電性基体とする導電性ダイヤモンド電極では、HF含有濃度が高い電解浴であっても、無水HFが基体内部まで浸透しにくく、電極膨張とそれに続く電極崩壊が発生しない。   Glassy carbon is a carbon material with a glass-like appearance that is produced by using a thermosetting resin such as cellulose, cellulose resin, or furan resin as a precursor and then solid-phase carbonizing the precursor after molding. These include high hardness, chemical stability, abrasion resistance, gas and liquid impermeability, and the like. The structure is homogeneous and amorphous with no crystal form, and there are many pores, but most of them are closed, so there are almost no open pores. In a conductive diamond electrode using glassy carbon having such characteristics as a conductive substrate, anhydrous HF hardly penetrates into the substrate even in an electrolytic bath having a high HF concentration, and electrode expansion and subsequent electrode collapse occur. Does not occur.

また、基体表面の一部を導電性ダイヤモンドで被覆することによって、フッ化グラファイトの生成に起因する陽極効果や、電極消耗が発生しない。   In addition, by covering a part of the substrate surface with conductive diamond, the anode effect and electrode wear due to the generation of graphite fluoride do not occur.

例えば、フッ素含有化合物として、ペルフルオロトリメチルアミンを製造するためには、無水HF及び被フッ素化物として、(CH34NF・5HFなる組成の電解浴を用いることによって効率的に合成することが可能である。ニッケル電極を用いる場合には不動体化の不都合があり、CsF・2HFの添加が必要であるが、CsF・2HFを添加した場合であっても、電極消耗は進行する。炭素を陽極として用いる場合には、陽極効果の発生や、無水HFの基体への浸透による電極の崩壊が発生する。導電性炭素材料基体表面を導電性ダイヤモンドで被覆した電極を用いる場合には無水HFの基体への浸透による電極の崩壊が発生する。 For example, in order to produce perfluorotrimethylamine as a fluorine-containing compound, it can be efficiently synthesized by using an electrolytic bath having a composition of (CH 3 ) 4 NF · 5HF as anhydrous HF and a fluorinated product. is there. When using a nickel electrode, there is an inconvenience of immobilization, and it is necessary to add CsF · 2HF. However, even when CsF · 2HF is added, electrode wear proceeds. When carbon is used as the anode, the anode effect occurs and the electrode collapses due to the penetration of anhydrous HF into the substrate. When an electrode having a conductive carbon material substrate surface coated with conductive diamond is used, the electrode collapses due to permeation of anhydrous HF into the substrate.

これに対し、グラッシーカーボンから成る導電性材料を基体とし、その基体表面の少なくとも一部を導電性ダイヤモンド膜で被覆した電極を用いる場合、陽極効果、電極の消耗、電極の崩壊が発生することなく長期の電解継続が可能となる。   On the other hand, when a conductive material made of glassy carbon is used as a base and an electrode in which at least a part of the base is covered with a conductive diamond film is used, the anode effect, electrode wear, and electrode collapse do not occur. Long-term electrolysis can be continued.

本発明は、無水HFを含有する電解浴の電解による無機フッ素化合物、有機フッ素化合物、及びフッ素ガスの合成などにおいて、グラッシーカーボンからなる導電性材料を基体とし、その表面の少なくとも一部を導電性ダイヤモンド膜で被覆した電極を用いたフッ素またはフッ素含有化合物の電解合成方法を提案するもので、これにより、無水HF含有濃度が高い電解浴であっても、陽極効果、電極消耗、及び電極崩壊が発生せず、長期の電解継続が可能となり、無機フッ素化合物、有機フッ素化合物、及びフッ素ガスの生産性が向上する。   In the present invention, in the synthesis of inorganic fluorine compounds, organic fluorine compounds, and fluorine gas by electrolysis of an electrolytic bath containing anhydrous HF, a conductive material made of glassy carbon is used as a base, and at least a part of the surface is made conductive. A method of electrolytic synthesis of fluorine or a fluorine-containing compound using an electrode coated with a diamond film is proposed, and therefore, even in an electrolytic bath having a high concentration of anhydrous HF, the anode effect, electrode consumption, and electrode collapse are prevented. It does not occur and electrolysis can be continued for a long time, and the productivity of inorganic fluorine compounds, organic fluorine compounds, and fluorine gas is improved.

本発明の提案する電解用電極の詳細を説明する。
本発明からなる電極の導電性基体は、グラッシーカーボンから成り、その形状は特に限定されず、板状、棒状、パイプ状、或いは球状などが使用できる。グラッシーカーボンの気体透過度は、10-7cm2/sec以下であることが好ましく、更に好ましくは10-10cm2/sec以下である。
The details of the electrode for electrolysis proposed by the present invention will be described.
The conductive substrate of the electrode according to the present invention is made of glassy carbon, and its shape is not particularly limited, and a plate shape, a rod shape, a pipe shape, a spherical shape, or the like can be used. The gas permeability of the glassy carbon is preferably 10 −7 cm 2 / sec or less, more preferably 10 −10 cm 2 / sec or less.

前記導電性基体表面の少なくとも一部を被覆する導電性ダイヤモンド膜の被覆方法は特に限定されず、任意のものを使用できる。代表的な製造法としては熱フィラメントCVD(化学蒸着)法、マイクロ波プラズマCVD法、プラズマアークジェット法及び物理蒸着(PVD)法などが選択できる。   The coating method of the conductive diamond film for coating at least a part of the surface of the conductive substrate is not particularly limited, and any method can be used. As typical manufacturing methods, a hot filament CVD (chemical vapor deposition) method, a microwave plasma CVD method, a plasma arc jet method, a physical vapor deposition (PVD) method, and the like can be selected.

導電性ダイヤモンド膜を被覆する場合、いずれの方法でも水素ガス及びダイヤモンド原料である炭素源の混合ガスが用いるが、ダイヤモンドに導電性を付与するために、原子価の異なる元素(以下、ドーパント)を微量添加する。ドーパントとしては、硼素、リンや窒素が好ましく、好ましい含有率は1〜100,000ppm、更に好ましくは100〜10,000ppmである。また、いずれのダイヤモンド膜被覆方法を用いた場合であっても、被覆された導電性ダイヤモンド膜は多結晶であり、ダイヤモンド膜中にアモルファスカーボンやグラファイト成分が残存する。   When coating a conductive diamond film, any method uses a mixed gas of hydrogen gas and a carbon source which is a diamond raw material. In order to impart conductivity to diamond, elements having different valences (hereinafter referred to as dopants) are used. Add a small amount. The dopant is preferably boron, phosphorus or nitrogen, and the preferred content is 1 to 100,000 ppm, more preferably 100 to 10,000 ppm. Further, regardless of which diamond film coating method is used, the coated conductive diamond film is polycrystalline, and amorphous carbon and graphite components remain in the diamond film.

ダイヤモンド膜の安定性の観点からアモルファスカーボンやグラファイト成分は少ない方が好ましく、ラマン分光分析において、ダイヤモンドに帰属する1332cm-1付近(1312〜1352cm-1の範囲)に存在するピーク強度I(D)と、グラファイトのGバンドに帰属する1560cm-1付近(1540〜1580cm-1の範囲)のピーク強度I(G)の比I(D)/I(G)が1以上であり、ダイヤモンドの含有量がグラファイトの含有量より多くなることが好ましい。 Stability amorphous carbon or graphite component in view of the diamond film is preferably lesser, in Raman spectroscopic analysis, a peak intensity existing near 1332 cm -1 attributable to the diamond (range 1312~1352cm -1) I (D) And the ratio I (D) / I (G) of the peak intensity I (G) near 1560 cm −1 (in the range of 1540 to 1580 cm −1 ) attributed to the G band of graphite is 1 or more, and the diamond content Is preferably greater than the graphite content.

代表的な導電性ダイヤモンド膜の被覆方法である熱フィラメントCVD法について説明する。
炭素源となるメタン、アルコール、アセトンなどの有機化合物とドーパントを水素ガスなどと共にフィラメントに供給する。フィラメントを水素ラジカルなどが発生する温度1800−2800℃に加熱し、この雰囲気内にダイヤモンドが析出する温度領域(750〜950℃)になるように導電性基体を配置する。混合ガスの供給速度は反応容器のサイズに依るが、圧力は15〜760Torrであることが好ましい。
A hot filament CVD method, which is a typical conductive diamond film coating method, will be described.
An organic compound such as methane, alcohol, and acetone as a carbon source and a dopant are supplied to the filament together with hydrogen gas. The filament is heated to a temperature of 1800-2800 ° C. at which hydrogen radicals and the like are generated, and the conductive substrate is disposed so as to be in a temperature region (750 to 950 ° C.) where diamond is deposited in this atmosphere. The supply rate of the mixed gas depends on the size of the reaction vessel, but the pressure is preferably 15 to 760 Torr.

導電性基体表面を研磨することは、基体とダイヤモンド層の密着性が向上するため好ましく、算術平均粗さRa0.1〜15μm、最大高さRz1〜100μmが好ましい。また、基体表面にダイヤモンド粉末を核付けすることは、均一なダイヤモンド膜成長に効果がある。基体上には通常0.001〜2μmの粒径のダイヤモンド微粒子層が析出する。該ダイヤモンド膜の厚さは蒸着時間により調節することができるが、経済性の観点から1〜10μmとするのが好ましい。   Polishing the surface of the conductive substrate is preferable because adhesion between the substrate and the diamond layer is improved, and an arithmetic average roughness Ra of 0.1 to 15 μm and a maximum height Rz of 1 to 100 μm are preferable. Also, nucleating diamond powder on the surface of the substrate is effective for uniform diamond film growth. A diamond fine particle layer having a particle size of usually 0.001 to 2 μm is deposited on the substrate. The thickness of the diamond film can be adjusted by the deposition time, but is preferably 1 to 10 μm from the viewpoint of economy.

電解槽の材質は、無水HFに対する耐食性の点から、軟鋼、ニッケル合金、及びフッ素系樹脂などを使用することができる。陽極で合成されたF2またはフッ素化合物と、陰極で発生する水素ガスの混合を防止するため、陽極側と陰極側が、隔壁、隔膜などによって全部、或いは一部が区画されることが好ましい。 As the material of the electrolytic cell, mild steel, nickel alloy, fluorine resin, or the like can be used from the viewpoint of corrosion resistance against anhydrous HF. In order to prevent mixing of F 2 or fluorine compound synthesized at the anode and hydrogen gas generated at the cathode, it is preferable that the anode side and the cathode side are all or partly partitioned by a partition wall, a diaphragm and the like.

陽極で発生した無機、有機フッ素化合物、またはフッ素ガスに同伴する微量の無水HFは、顆粒状のフッ化ナトリウムを充填したカラムを通すことで除去できる。また、微量の窒素、酸素、及び一酸化二窒素などの副生成物が発生するが、このうち一酸化二窒素は水とチオ硫酸ナトリウムを通過させることで除去し、酸素は活性炭により除去することができ、副生成物の混入が少ない無機、有機フッ素化合物、またはフッ素ガスを得ることができる。   A trace amount of anhydrous HF accompanying the inorganic, organic fluorine compound, or fluorine gas generated at the anode can be removed by passing it through a column filled with granular sodium fluoride. Also, by-products such as trace amounts of nitrogen, oxygen, and dinitrogen monoxide are generated. Of these, dinitrogen monoxide is removed by passing water and sodium thiosulfate, and oxygen is removed by activated carbon. Inorganic, organic fluorine compounds, or fluorine gas with little by-product contamination can be obtained.

以下に本発明を実施例に基づき具体的に説明するが、本発明はこれらの実施例に限定されるものではない。   EXAMPLES The present invention will be specifically described below based on examples, but the present invention is not limited to these examples.

(実施例1)
導電性基体としてグラッシーカーボン板を使用し、熱フィラメントCVD装置を用いて、以下の条件で導電性ダイヤモンド電極を作成した。
Example 1
A glassy carbon plate was used as the conductive substrate, and a conductive diamond electrode was prepared using a hot filament CVD apparatus under the following conditions.

まず、粒径1μmのダイヤモンド粒子からなる研磨剤を用いて、基体表面を研磨した。基体表面のRa0.2μm、10点表面粗さRz6μmであった。次いで、平均粒径4nmのダイヤモンド粒子を基体表面に核付けした後、熱フィラメントCVD装置に装着した。水素ガス中に1vol%のメタンガスと0.5ppmのトリメチルボロンガスを添加した混合ガスを、5リットル/minの速度で装置内に流しながら、装置内圧力を75Torrに保持し、フィラメントに電力を印加して温度2400℃に昇温した。このとき基体温度は860℃であった。   First, the surface of the substrate was polished using an abrasive made of diamond particles having a particle diameter of 1 μm. The surface roughness Ra was 0.2 μm, and the surface roughness Rz was 6 μm. Next, diamond particles having an average particle diameter of 4 nm were nucleated on the substrate surface, and then mounted on a hot filament CVD apparatus. While supplying a gas mixture of hydrogen gas with 1 vol% methane gas and 0.5 ppm trimethylboron gas at a rate of 5 liters / min, the internal pressure is maintained at 75 Torr and power is applied to the filament. The temperature was raised to 2400 ° C. At this time, the substrate temperature was 860 ° C.

8時間CVD操作を継続し、CVD操作終了後に基体を分析した。ラマン分光分析及びX線回折分析によりダイヤモンドが析出していることが確認され、ラマン分光分析における1332cm-1のピーク強度と1560cm-1のピーク強度の比は、1対0.4であった。また、基体の一部を破壊してSEM観察したところ、厚さは約4μmであった。 The CVD operation was continued for 8 hours, and the substrate was analyzed after the completion of the CVD operation. It was confirmed that diamond is deposited by Raman spectroscopy and X-ray diffraction analysis, the peak intensity ratio of the peak intensity and 1560 cm -1 in 1332 cm -1 in the Raman spectroscopic analysis was 1: 0.4. Further, when a part of the substrate was broken and observed by SEM, the thickness was about 4 μm.

作製した導電性ダイヤモンド電極を、0℃に保持した無水HF浴に陽極として取付け、陰極にニッケル板、参照極に白金を使用して、定電流クロノポテンショメトリーにより電流−電位曲線の測定を実施した。   The produced conductive diamond electrode was attached as an anode to an anhydrous HF bath maintained at 0 ° C., a nickel plate as a cathode and platinum as a reference electrode, and a current-potential curve was measured by constant current chronopotentiometry. .

測定開始直後、電流密度5mA/cm2印加時の陽極電位は0.6Vであった。その後、電流密度を5mA/cm2ずつ増流しながら陽極電位を測定したところ、電流密度200mA/cm2印加時の陽極電位は3.2Vであった。電解生成物として、フッ素ガスが得られた。 Immediately after the start of the measurement, the anode potential when applying a current density of 5 mA / cm 2 was 0.6V. Thereafter, the anode potential was measured while increasing the current density by 5 mA / cm 2, and the anode potential when the current density was 200 mA / cm 2 was 3.2 V. As an electrolytic product, fluorine gas was obtained.

電解を停止して陽極を取り出し、外観観察したところ、電極崩壊、及び導電性ダイヤモンド膜の剥離は認められなかった。   When the electrolysis was stopped and the anode was taken out and observed for appearance, electrode collapse and peeling of the conductive diamond film were not observed.

(比較例1)
陽極にグラファイト板を用いた以外は実施例1と同様の電解条件で、0℃に保持した無水HF浴中で電流−電位曲線の測定を実施した。
(Comparative Example 1)
The current-potential curve was measured in an anhydrous HF bath maintained at 0 ° C. under the same electrolysis conditions as in Example 1 except that a graphite plate was used as the anode.

測定開始直後、電流密度5mA/cm2印加時の陽極電位は0.7Vであった。その後、電流密度を5mA/cm2ずつ増流しながら陽極電位を測定したところ、電流密度70mA/cm2印加時に急激に陽極電位が上昇するとともに電流が殆ど流れなくなり、電解継続が困難となった。 Immediately after the start of the measurement, the anode potential when a current density of 5 mA / cm 2 was applied was 0.7V. Thereafter, when the anode potential was measured while increasing the current density by 5 mA / cm 2 , the anode potential suddenly increased when the current density was 70 mA / cm 2 and almost no current flowed, making it difficult to continue electrolysis.

電解を停止して陽極を取り出したところ、電解槽内で陽極が粉々に砕けていた。   When the electrolysis was stopped and the anode was taken out, the anode was shattered in the electrolytic cell.

(比較例2)
陽極にニッケル板を用いた以外は実施例1と同様の電解条件で、0℃に保持した無水HF浴中で電流−電位曲線の測定を実施した。
(Comparative Example 2)
The current-potential curve was measured in an anhydrous HF bath maintained at 0 ° C. under the same electrolysis conditions as in Example 1 except that a nickel plate was used as the anode.

測定開始直後、電流密度5mA/cm2印加時の陽極電位は0.6Vであった。その後、電流密度を5mA/cm2ずつ増流しながら陽極電位を測定したところ、電流密度50mA/cm2印加時に陽極電位が経時的に上昇し、ついには電流が殆ど流れなくなり、電解継続が困難となった。 Immediately after the start of the measurement, the anode potential when applying a current density of 5 mA / cm 2 was 0.6V. Thereafter, when the anode potential was measured while increasing the current density by 5 mA / cm 2, the anode potential increased with time when the current density was applied at 50 mA / cm 2 , and eventually the current almost did not flow, making it difficult to continue electrolysis. became.

電解を停止して陽極を取り出したところ、電極崩壊は認められなかった。該電極の表面を分析したところNi−F結合が認められ、電極表面で絶縁性のNiF2被膜の形成が推察された。 When the electrolysis was stopped and the anode was taken out, no electrode collapse was observed. When the surface of the electrode was analyzed, Ni—F bonds were observed, and the formation of an insulating NiF 2 coating was presumed on the electrode surface.

(比較例3)
導電性基体としてシリコン板を使用した以外は実施例1と同様の手順で導電性ダイヤモンド電極を作製した。
(Comparative Example 3)
A conductive diamond electrode was prepared in the same procedure as in Example 1 except that a silicon plate was used as the conductive substrate.

該電極を陽極として使用した以外は実施例1と同様の電解条件で、0℃に保持した無水HF浴中で電流−電位曲線の測定を実施した。   The current-potential curve was measured in an anhydrous HF bath maintained at 0 ° C. under the same electrolysis conditions as in Example 1 except that the electrode was used as the anode.

測定開始直後、電流密度5mA/cm2印加時の陽極電位は0.6Vであった。その後、電流密度を5mA/cm2ずつ増流しながら陽極電位を測定したところ、電流密度200mA/cm2印加時の陽極電位は3.8Vであった。 Immediately after the start of the measurement, the anode potential when applying a current density of 5 mA / cm 2 was 0.6V. Thereafter, the anode potential was measured while increasing the current density by 5 mA / cm 2, and the anode potential when the current density was 200 mA / cm 2 was 3.8 V.

電解を停止して陽極を取り出し、外観観察したところ、電解浴に浸漬された部分のダイヤモンド膜の一部喪失しており、ダイヤモンド膜が喪失した部分のシリコン基体表面の腐食が観察された。   When the electrolysis was stopped and the anode was taken out and the appearance was observed, a portion of the diamond film immersed in the electrolytic bath was partially lost, and corrosion of the silicon substrate surface where the diamond film was lost was observed.

(比較例4)
導電性基体としてグラフィイト板を使用した以外は実施例1と同様の手順で導電性ダイヤモンド電極を作製した。
(Comparative Example 4)
A conductive diamond electrode was prepared in the same procedure as in Example 1 except that a graffiti plate was used as the conductive substrate.

該電極を陽極として用いた以外は実施例1と同様の方法で、0℃に保持した無水HF浴中で電流−電位曲線の測定を実施した。   A current-potential curve was measured in an anhydrous HF bath maintained at 0 ° C. in the same manner as in Example 1 except that the electrode was used as an anode.

測定開始直後、電流密度5mA/cm2印加時の陽極電位は0.6Vであった。その後、電流密度を5mA/cm2ずつ増流しながら陽極電位を測定したところ、電流密度70mA/cm2印加時に急激に陽極電位が上昇するとともに電流が殆ど流れなくなり、電解継続が困難となった。 Immediately after the start of the measurement, the anode potential when applying a current density of 5 mA / cm 2 was 0.6V. Thereafter, when the anode potential was measured while increasing the current density by 5 mA / cm 2 , the anode potential suddenly increased when the current density was 70 mA / cm 2 and almost no current flowed, making it difficult to continue electrolysis.

電解を停止して陽極を取り出したところ、電解槽内で陽極が粉々に砕けていた。   When the electrolysis was stopped and the anode was taken out, the anode was shattered in the electrolytic cell.

(実施例2)
導電性基体としてグラッシーカーボン板を使用し、熱フィラメントCVD装置を用いて、実施例1と同様の方法で導電性ダイヤモンド電極を作成した。
(Example 2)
Using a glassy carbon plate as the conductive substrate, a conductive diamond electrode was prepared in the same manner as in Example 1 using a hot filament CVD apparatus.

この電極を、無水HF及び被フッ素化物よりなる電解浴として、建浴直後の(CH34NF・5HF電解浴に取付け、陰極にニッケル板、参照極にCu/CuF2を使用して、電流密度100mA/cm2で定電流電解を実施した。電解開始直後の陽極電位を測定したところ、4.6Vであり、電解200時間経過後の陽極電位は4.8Vであった。電解生成物として、ペルフルオロトリメチルアミン(CF33Nが合成された。 This electrode is attached to an (CH 3 ) 4 NF · 5HF electrolytic bath immediately after the building bath as an electrolytic bath made of anhydrous HF and a fluorinated substance, using a nickel plate as a cathode and Cu / CuF 2 as a reference electrode, Constant current electrolysis was performed at a current density of 100 mA / cm 2 . When the anode potential immediately after the start of electrolysis was measured, it was 4.6 V, and the anode potential after electrolysis 200 hours was 4.8 V. Perfluorotrimethylamine (CF 3 ) 3 N was synthesized as an electrolytic product.

電解を停止して陽極を取り出し、外観観察したところ、電極崩壊、及び導電性ダイヤモンド膜の剥離は認められなかった。電解200時間経過までに陽極効果の発生もなかった。   When the electrolysis was stopped and the anode was taken out and observed for appearance, electrode collapse and peeling of the conductive diamond film were not observed. There was no occurrence of the anode effect until 200 hours after electrolysis.

(比較例5)
陽極にグラファイト板を用いた以外は実施例2と同様の方法で、建浴直後の(CH34NF・5HF電解浴中で電解を実施した。
(Comparative Example 5)
The electrolysis was performed in a (CH 3 ) 4 NF · 5HF electrolytic bath immediately after the building bath in the same manner as in Example 2 except that a graphite plate was used for the anode.

電解開始直後から陽極電位が急激に上昇するとともに電流が殆ど流れなくなり、電解継続が困難となった。   Immediately after the start of electrolysis, the anode potential rose rapidly and almost no current flowed, making it difficult to continue electrolysis.

電解を停止して陽極を取り出し、電極表面の水との接触角を測定したところ150度であったことから、いわゆる陽極効果の発生が認められた。   Electrolysis was stopped, the anode was taken out, and the contact angle with water on the electrode surface was measured. As a result, it was 150 °, and so-called anodic effect was observed.

(比較例6)
陽極にニッケル板を用いた以外は実施例2と同様の方法で、建浴直後の(CH34NF・5HF電解浴中で電解を実施した。
(Comparative Example 6)
The electrolysis was performed in the (CH 3 ) 4 NF · 5HF electrolytic bath immediately after the building bath in the same manner as in Example 2 except that a nickel plate was used for the anode.

電解開始直後から陽極電位が徐々に上昇し、ついには電流が殆ど流れなくなり、電解継続が困難となった。   Immediately after the start of electrolysis, the anode potential gradually increased, and finally, almost no current flowed, making it difficult to continue electrolysis.

電解を停止して陽極を取り出し、電極表面を分析したところNi−F結合が認められ、電極表面での絶縁性のNiF2被膜の形成が推察された。 When the electrolysis was stopped and the anode was taken out and the electrode surface was analyzed, Ni—F bonds were observed, and the formation of an insulating NiF 2 coating on the electrode surface was presumed.

(比較例7)
導電性基体としてシリコン板を使用した以外は実施例1と同様の手順で導電性ダイヤモンド電極を作製した。
(Comparative Example 7)
A conductive diamond electrode was prepared in the same procedure as in Example 1 except that a silicon plate was used as the conductive substrate.

該電極を陽極として用いた以外は実施例2と同様の方法で、建浴直後の(CH34NF・5HF電解浴中で電解を実施した。 The electrolysis was performed in a (CH 3 ) 4 NF · 5HF electrolytic bath immediately after the building bath in the same manner as in Example 2 except that the electrode was used as the anode.

電解開始直後の陽極電位は4.6Vであったが、電解開始14時間後より陽極電位が徐々に上昇し、ついには電流が殆ど流れなくなり、電解継続が困難となった。   Although the anode potential immediately after the start of electrolysis was 4.6 V, the anode potential gradually increased after 14 hours from the start of electrolysis, and finally no current flowed, making it difficult to continue electrolysis.

電解を停止して陽極を取り出し、外観観察したところ、電解浴に浸漬された部分のダイヤモンド膜は殆ど喪失しており、シリコン基体表面が腐食していることを確認した。   When the electrolysis was stopped and the anode was taken out and the appearance was observed, it was confirmed that the diamond film immersed in the electrolytic bath was almost lost, and the silicon substrate surface was corroded.

(比較例8)
導電性基体としてグラファイト板を使用した以外は実施例1と同様の手順で導電性ダイヤモンド電極を作製した。
(Comparative Example 8)
A conductive diamond electrode was prepared in the same procedure as in Example 1 except that a graphite plate was used as the conductive substrate.

該電極を陽極として用いた以外は実施例2と同様の方法で、建浴直後の(CH34NF・5HF電解浴中で電解を実施した。 The electrolysis was performed in a (CH 3 ) 4 NF · 5HF electrolytic bath immediately after the building bath in the same manner as in Example 2 except that the electrode was used as the anode.

電解開始直後の陽極電位は4.6Vであったが、電解開始70時間後より陽極電位が徐々に上昇し、ついには電流が殆ど流れなくなり、電解継続が困難となった。   The anode potential immediately after the start of electrolysis was 4.6 V. However, the anode potential gradually increased after 70 hours from the start of electrolysis, and finally no current flowed, making it difficult to continue electrolysis.

電解を停止して陽極を取り出したところ、電解槽内で陽極が粉々に砕けていた。   When the electrolysis was stopped and the anode was taken out, the anode was shattered in the electrolytic cell.

Claims (1)

グラッシーカーボンから成る導電性材料を基体とし、その基体の少なくとも一部を導電性ダイヤモンド膜で被覆した電解用電極を用いて、無水フッ化水素、または無水フッ化水素に被フッ素化物を添加した電解浴を電解してフッ素またはフッ素含有化合物を電解合成する方法。 Electrolysis using an electrode for electrolysis in which a conductive material made of glassy carbon is used as a base and at least a part of the base is covered with a conductive diamond film, and fluorinated material is added to anhydrous hydrogen fluoride or anhydrous hydrogen fluoride. A method of electrolytically synthesizing fluorine or a fluorine-containing compound by electrolyzing a bath.
JP2011266948A 2011-12-06 2011-12-06 Method for electrolytic synthesis of fluorine-containing materials using an anode for electrolysis Active JP5520280B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011266948A JP5520280B2 (en) 2011-12-06 2011-12-06 Method for electrolytic synthesis of fluorine-containing materials using an anode for electrolysis

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011266948A JP5520280B2 (en) 2011-12-06 2011-12-06 Method for electrolytic synthesis of fluorine-containing materials using an anode for electrolysis

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2009021157A Division JP2010174358A (en) 2009-02-02 2009-02-02 Anode for electrolysis and method for electrolytically synthesizing fluorine-containing substance using the anode for electrolysis

Publications (2)

Publication Number Publication Date
JP2012057255A true JP2012057255A (en) 2012-03-22
JP5520280B2 JP5520280B2 (en) 2014-06-11

Family

ID=46054694

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011266948A Active JP5520280B2 (en) 2011-12-06 2011-12-06 Method for electrolytic synthesis of fluorine-containing materials using an anode for electrolysis

Country Status (1)

Country Link
JP (1) JP5520280B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2018097134A1 (en) * 2016-11-22 2019-10-17 住友電気工業株式会社 Carbon material and method for producing carbon material
CN114196985A (en) * 2022-01-19 2022-03-18 辽宁大学 BiVO4/NiF2Application of photo-anode in aspect of photocatalytic water splitting

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006097054A (en) * 2004-09-28 2006-04-13 Permelec Electrode Ltd Electroconductive diamond electrode and production method therefor
JP2006249557A (en) * 2005-03-14 2006-09-21 Permelec Electrode Ltd Anode for electrolysis, and method for electrolytically synthesizing fluorine-containing material by using the anode
WO2007083740A1 (en) * 2006-01-20 2007-07-26 Toyo Tanso Co., Ltd. Electrolytic apparatus for producing fluorine or nitrogen trifluoride

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006097054A (en) * 2004-09-28 2006-04-13 Permelec Electrode Ltd Electroconductive diamond electrode and production method therefor
JP2006249557A (en) * 2005-03-14 2006-09-21 Permelec Electrode Ltd Anode for electrolysis, and method for electrolytically synthesizing fluorine-containing material by using the anode
WO2007083740A1 (en) * 2006-01-20 2007-07-26 Toyo Tanso Co., Ltd. Electrolytic apparatus for producing fluorine or nitrogen trifluoride

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2018097134A1 (en) * 2016-11-22 2019-10-17 住友電気工業株式会社 Carbon material and method for producing carbon material
JP7016813B2 (en) 2016-11-22 2022-02-07 住友電気工業株式会社 Carbon material and manufacturing method of carbon material
CN114196985A (en) * 2022-01-19 2022-03-18 辽宁大学 BiVO4/NiF2Application of photo-anode in aspect of photocatalytic water splitting
CN114196985B (en) * 2022-01-19 2023-11-10 辽宁大学 BiVO (binary organic acid) 4 /NiF 2 Application of photo-anode in photocatalytic water splitting

Also Published As

Publication number Publication date
JP5520280B2 (en) 2014-06-11

Similar Documents

Publication Publication Date Title
JP3893397B2 (en) Anode for electrolysis and method for electrolytic synthesis of fluorine-containing material using the anode for electrolysis
US7285194B2 (en) Conductive diamond electrode and process for producing the same
JP5772102B2 (en) Electrode for fluorine compound electrosynthesis
JP4460590B2 (en) Conductive diamond electrode structure and method for electrolytic synthesis of fluorine-containing material
JP2010174358A (en) Anode for electrolysis and method for electrolytically synthesizing fluorine-containing substance using the anode for electrolysis
KR101185817B1 (en) Method of electrolytically synthesizing nitrogen trifluoride
JP5520280B2 (en) Method for electrolytic synthesis of fluorine-containing materials using an anode for electrolysis
JP5123612B2 (en) Method for producing conductive diamond electrode and electrolysis method using conductive diamond electrode

Legal Events

Date Code Title Description
RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20120824

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20121001

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130416

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130423

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20130604

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20130607

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130722

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140401

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20140404

R150 Certificate of patent or registration of utility model

Ref document number: 5520280

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250