JP2012000232A5 - - Google Patents
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- JP2012000232A5 JP2012000232A5 JP2010137243A JP2010137243A JP2012000232A5 JP 2012000232 A5 JP2012000232 A5 JP 2012000232A5 JP 2010137243 A JP2010137243 A JP 2010137243A JP 2010137243 A JP2010137243 A JP 2010137243A JP 2012000232 A5 JP2012000232 A5 JP 2012000232A5
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- Prior art keywords
- particle beam
- irradiation
- charged particle
- therapy system
- electromagnet
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Claims (10)
前記走査電磁石の下流に設置され、前記走査電磁石により走査された荷電粒子ビームが、前記走査電磁石から複数のアイソセンタのそれぞれとの間に設定されたビーム軌道のうち、選択されたひとつのビーム軌道を通るように、前記荷電粒子ビームの軌道を切り替える偏向電磁石と、
を備えたことを特徴とする粒子線治療装置。 A scanning electromagnet comprising two scanning electromagnets that respectively scan and control the charged particle beam in different directions so as to shape the supplied charged particle beam into a three-dimensional irradiation shape based on a treatment plan;
A charged particle beam installed downstream of the scanning electromagnet and scanned by the scanning electromagnet has selected one of the beam trajectories set between the scanning electromagnet and each of a plurality of isocenters. A deflection electromagnet that switches the trajectory of the charged particle beam to pass through;
A particle beam therapy system comprising:
を備えたことを特徴とする請求項1ないし6のいずれか1項に記載の粒子線治療装置。 An irradiation position coordinate forming the three-dimensional irradiation shape is converted using a function set in accordance with the selected beam trajectory, and the scanning electromagnet and the charged particle using a control value obtained by the conversion An irradiation controller that controls the energy of the beam,
The particle beam therapy system according to any one of claims 1 to 6, further comprising:
前記走査電磁石への2次元の制御値および前記荷電粒子ビームのエネルギーの制御値からなる照射制御値と、前記照射制御値を用いて制御された前記荷電粒子ビームの前記選択されたアイソセンタ部における実照射位置座標の測定値とから得られた照射位置座標から照射制御値への逆写像数式モデルを使用することを特徴とする請求項7に記載の粒子線治療装置。 As a function set according to the beam trajectory,
An irradiation control value comprising a two-dimensional control value for the scanning electromagnet and an energy control value for the charged particle beam, and an actual value of the charged particle beam controlled using the irradiation control value in the selected isocenter portion. 8. The particle beam therapy system according to claim 7, wherein an inverse mapping mathematical model from an irradiation position coordinate to an irradiation control value obtained from the measured value of the irradiation position coordinate is used.
前記照射制御部が、
ビーム軌道を設定し、設定したビーム軌道に対応して前記粒子線治療装置から照射された荷電粒子ビームの照射位置座標を測定するビーム測定部を設置するステップと、
それぞれ異なる複数の照射制御値を読込むステップと、
読込んだ照射制御値にしたがって前記ビーム測定部に対して荷電粒子ビームを照射し、前記荷電粒子ビームの照射位置座標を測定するステップと、
測定した照射位置座標の複数の測定結果と前記複数の照射制御値との組合せから、前記逆写像数式モデルの未知パラメータを設定するステップと、
を含む粒子線治療装置の調整方法。 A method for adjusting a particle beam therapy system according to claim 8 ,
The irradiation control unit is
Setting a beam trajectory, and installing a beam measuring unit that measures the irradiation position coordinates of the charged particle beam irradiated from the particle beam therapy apparatus corresponding to the set beam trajectory;
Reading a plurality of different irradiation control values,
Irradiating the beam measuring unit with a charged particle beam according to the read irradiation control value, and measuring the irradiation position coordinates of the charged particle beam;
From the combination of a plurality of measurement results of the measured irradiation position coordinates and the plurality of irradiation control values, setting unknown parameters of the inverse mapping mathematical model,
For adjusting a particle beam therapy system comprising:
読込んだ照射制御値にしたがって実照射された荷電粒子ビームの選択されたアイソセンタ部における実照射位置座標を測定するステップと、
測定した実照射位置座標の複数の測定結果と前記複数の照射制御値との組合せから、前記逆写像数式モデルの未知パラメータを設定するステップと、
を実行する逆写像算出部を備えたことを特徴とする請求項8に記載の粒子線治療装置。 Reading a plurality of different irradiation control values,
Measuring the actual irradiation position coordinates in the selected isocenter of the charged particle beam actually irradiated according to the read irradiation control value;
From a combination of a plurality of measurement results of the measured actual irradiation position coordinates and the plurality of irradiation control values, setting unknown parameters of the inverse mapping mathematical model,
The particle beam therapy apparatus according to claim 8, further comprising a reverse mapping calculation unit that executes the following.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010137243A JP5562133B2 (en) | 2010-06-16 | 2010-06-16 | Particle beam therapy apparatus and method for adjusting particle beam therapy apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010137243A JP5562133B2 (en) | 2010-06-16 | 2010-06-16 | Particle beam therapy apparatus and method for adjusting particle beam therapy apparatus |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2012000232A JP2012000232A (en) | 2012-01-05 |
JP2012000232A5 true JP2012000232A5 (en) | 2013-07-25 |
JP5562133B2 JP5562133B2 (en) | 2014-07-30 |
Family
ID=45532921
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010137243A Expired - Fee Related JP5562133B2 (en) | 2010-06-16 | 2010-06-16 | Particle beam therapy apparatus and method for adjusting particle beam therapy apparatus |
Country Status (1)
Country | Link |
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JP (1) | JP5562133B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5907862B2 (en) * | 2012-04-27 | 2016-04-26 | 三菱電機株式会社 | Particle beam rotation irradiation equipment |
EP3006084B1 (en) * | 2013-06-06 | 2018-11-14 | Mitsubishi Electric Corporation | Particle therapy device and method for setting dose calibration factor |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2824363B2 (en) * | 1992-07-15 | 1998-11-11 | 三菱電機株式会社 | Beam supply device |
JPH08257148A (en) * | 1995-03-24 | 1996-10-08 | Hitachi Ltd | Rotary gantry |
JP3260611B2 (en) * | 1995-12-05 | 2002-02-25 | 株式会社東芝 | Charge beam drawing controller |
JP3178381B2 (en) * | 1997-02-07 | 2001-06-18 | 株式会社日立製作所 | Charged particle irradiation device |
JP3052957B2 (en) * | 1999-03-19 | 2000-06-19 | 株式会社日立製作所 | Charged particle beam extraction method and circular accelerator |
WO2001069643A1 (en) * | 2000-03-13 | 2001-09-20 | Hitachi, Ltd. | Charged particle beam scanning device |
JP3423675B2 (en) * | 2000-07-13 | 2003-07-07 | 住友重機械工業株式会社 | Charged particle beam irradiation device and treatment device using the same |
JP2002141199A (en) * | 2000-10-31 | 2002-05-17 | Sumitomo Heavy Ind Ltd | Electron beam trajectory correcting device and method |
JP4646069B2 (en) * | 2005-11-14 | 2011-03-09 | 株式会社日立製作所 | Particle beam irradiation system |
JP2008085120A (en) * | 2006-09-28 | 2008-04-10 | Nuflare Technology Inc | Position correction coefficient calculating method of charged particle beam drawing apparatus, and position correction coefficient updating method of charged particle beam drawing apparatus |
JP5828610B2 (en) * | 2007-07-12 | 2015-12-09 | 株式会社ニューフレアテクノロジー | Charged particle beam drawing method and charged particle beam drawing apparatus |
US8217364B2 (en) * | 2009-06-09 | 2012-07-10 | Mitsubishi Electric Corporation | Particle beam irradiation apparatus |
-
2010
- 2010-06-16 JP JP2010137243A patent/JP5562133B2/en not_active Expired - Fee Related
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