JP2011203684A - Parallax barrier, image display device, method for manufacturing the parallax barrier, and method for manufacturing photomask - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide: a parallax barrier capable of eliminating a difference in visibility of a stereoscopic image due to a physique difference, and an image display device; a method for manufacturing the parallax barrier; and a method for manufacturing a photomask.SOLUTION: A step barrier 4 is used by being combined with a display unit for displaying an image for a left eye and an image for a right eye, and separates the image for a left eye and the image for a right eye displayed on the display unit. Apertures 43 making light pass and light-shielding parts 42 intercepting the light are alternately provided in a row direction and a column direction on the step barrier 4. The aperture 43 is set so that a pitch on a virtual line A along the row direction is made smaller and smaller toward a lower end 434 from an upper end 433 of the aperture 43 in the column direction.

Description

  The present invention relates to a parallax barrier, an image display device, a method for manufacturing a parallax barrier, and a method for manufacturing a photomask.

Conventionally, in order to make an observer observe a stereoscopic image, it is used in combination with a display means such as a liquid crystal panel having a plurality of pixels, and a left eye image and a right eye image displayed on the display means are separated and observed. There is known a parallax barrier (parallax barrier) that is incident on the left eye and the right eye of a person.
Such a parallax barrier is disposed so as to face the display means, and a light shielding portion that blocks light and an opening that transmits light are formed on a light transmissive substrate having a light transmitting property, thereby forming a light shielding portion. And the openings are alternately arranged in at least one direction corresponding to the arrangement of the pixels of the display means.

  And it is known that the pitch (opening pitch) of each opening part (each light shielding part) of a parallax barrier is prescribed | regulated based on the pixel pitch of a display means, or the distance between eyes of an observer (for example, patent document). 1 paragraphs [0026] to [0029]).

Japanese Patent No. 3096613

Here, when a plurality of persons are targeted as observers of a stereoscopic image, each observer has a physique difference. And generally, those with a large physique, such as high height and sitting height, have a relatively long interocular distance with respect to those with an average physique, and those with a small physique have a relative size with respect to those with an average physique. The interocular distance is relatively short.
However, the parallax barrier described in Patent Document 1 has a problem in that the appearance of a stereoscopic image differs depending on the physique difference because the openings are arranged at a pitch defined based on a single interocular distance. is there.

  An object of the present invention is to provide a parallax barrier, an image display device, a method for manufacturing a parallax barrier, and a method for manufacturing a photomask that can eliminate a difference in visibility of a stereoscopic image due to a difference in physique.

  The parallax barrier of the present invention is a parallax barrier that is used in combination with a display unit that displays a left-eye image and a right-eye image, and that separates the left-eye image and the right-eye image displayed on the display unit. Opening portions that allow light to pass through and light shielding portions that block light are alternately provided in a first direction and a second direction that is orthogonal to the first direction, and the plurality of opening portions are arranged in the first direction. The pitch on the imaginary line is set so as to decrease from one end to the other end of the opening in the second direction.

  In the present invention, the pitch on the phantom line is small from one end of the opening in the second direction toward the other end, so that each opening is based on a long interocular distance on one end and a short interocular distance on the other end. It is comprised by the shape based on. For this reason, for example, when a person with a large physique looks down on the display means, or when a person with a small physique looks up at the display means, the difference in the visibility of the stereoscopic image due to the physique difference can be eliminated.

The image display device of the present invention includes a display unit that displays a left-eye image and a right-eye image, and the above-described parallax barrier.
In the present invention, since the image display device includes the above-described parallax barrier, it can enjoy the same operations and effects as the above-described parallax barrier.

The method for manufacturing a parallax barrier according to the present invention is used in combination with a display unit that displays a left-eye image and a right-eye image, and a parallax barrier manufacturing method that separates a left-eye image and a right-eye image displayed on the display unit. And the opening part which lets light pass, and the light-shielding part which interrupts | blocks light are alternately provided in the 1st direction and the 2nd direction orthogonal to the said 1st direction, and it followed the said 1st direction The openings and the light shielding portions are formed such that a pitch of the plurality of openings on the imaginary line decreases from one end of the opening in the second direction toward the other end.
In the method for manufacturing a parallax barrier according to the present invention, since the above-described parallax barrier can be manufactured, the same effects as the above-described parallax barrier can be obtained.

In the method for manufacturing a parallax barrier according to the present invention, an area configured with an accuracy limit value when the light shielding part is manufactured is defined as a unit area, and a corresponding light shielding part and a corresponding opening corresponding to the light shielding part and the opening are respectively provided. A reference pattern setting step for setting a reference pattern, and a reduction for setting a reduction ratio for reducing the reference pattern for each of the areas in which the formation regions of the corresponding light-shielding portions and the corresponding opening portions are partitioned in the second direction. The reference pattern is reduced by thinning out the unit area in accordance with the reduction rate from the reference setting step, and the light shielding portion is formed on the translucent substrate based on the reduced reference pattern. A drawing step.
In the present invention, the method for manufacturing a parallax barrier includes the above-described reference pattern setting step, reduction rate setting step, and drawing step. For example, in the reduction ratio setting step, a reduction ratio for setting the pitch of the corresponding opening in the reference pattern close to the ideal pitch of the opening defined based on the pixel pitch is set. If the reduction ratio is set in this way, the pitch of the openings is set to the ideal pitch as a whole for each area even if the accuracy limit value in the current pattern formation method is about 1 μm, for example, in the drawing process. An approaching light shielding part can be formed.

  The photomask manufacturing method of the present invention is used in combination with a display unit that displays a left-eye image and a right-eye image, and forms a parallax barrier that separates the left-eye image and the right-eye image displayed on the display unit. A method for manufacturing a photomask for providing an opening for transmitting light and a light blocking portion for blocking light alternately in a first direction and a second direction orthogonal to the first direction, The openings and the light-shielding portions so that a pitch of the openings on the first imaginary line along the first direction decreases from one end to the other end of the openings in the second direction. It is characterized by forming.

The manufacturing method of the photomask of the present invention is a manufacturing method substantially similar to the manufacturing method of the parallax barrier described above, and the positions where the light blocking portions and the openings are formed in the parallax barrier described above are reversed. An opening is formed.
A parallax barrier similar to the above-described parallax barrier manufacturing method can be manufactured by manufacturing a parallax barrier by photolithography using this photomask. Therefore, the same operation and effect as the above-described method for manufacturing a parallax barrier can be enjoyed.

FIG. 3 is a cross-sectional view schematically showing the configuration of the image display device in the first embodiment. The schematic diagram which looked at the arrangement state of the pixel of the liquid crystal panel in 1st Embodiment planarly. The schematic diagram which looked at the arrangement | sequence state of the opening part of the step barrier in 1st Embodiment planarly. The flowchart explaining the manufacturing method of the step barrier in 1st Embodiment. The figure for demonstrating the reference | standard pattern in 1st Embodiment. The figure which shows the outline of the step barrier in 1st Embodiment typically. The schematic diagram for demonstrating the effect of the step barrier in 1st Embodiment. The figure explaining the manufacturing method of the step barrier in 2nd Embodiment.

[First embodiment]
DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, a first embodiment of the invention will be described with reference to the drawings.
[Configuration of image display device]
FIG. 1 is a cross-sectional view schematically showing the configuration of the image display device 1. Specifically, FIG. 1 is a cross-sectional view of the liquid crystal panel 3 and the step barrier 4 as viewed from the column direction (vertical direction: vertical direction in FIGS. 2 and 3).
The image display device 1 generates a stereoscopic image including an image observed by the left eye of the observer (left eye image) and an image observed by the right eye (right eye image), and the left eye image and the right eye image are displayed. The images are incident on the left eye and the right eye, respectively, to display a stereoscopic image that can be stereoscopically viewed by parallax. In the present embodiment, the image display device 1 is configured as a binocular stereoscopic display device having two viewpoints.
As shown in FIG. 1, such an image display device 1 includes a backlight 2 as a light source device, a liquid crystal panel 3 as a display unit, and a step barrier 4 as a parallax barrier.

  The backlight 2 includes a cold cathode tube bent in a substantially W shape and a reflector provided on the back side of the cold cathode tube, and reflects the discharge light generated by applying a voltage to the cold cathode tube with the reflector. Then, the light is emitted to the liquid crystal panel 3 side. The backlight 2 is not limited to such a configuration, but instead of a combination of an L-shaped or U-shaped edge-type cold cathode tube and a light guide plate, a cold cathode tube and a reflector, a plurality of LEDs ( A plurality of solid light sources such as light emitting diodes may be provided.

FIG. 2 is a schematic view of the arrangement state of the pixels 3L and 3R of the liquid crystal panel 3 as seen in a plan view.
In FIG. 1 and FIG. 2, for convenience of explanation, the letter “L” is attached in the pixel 3L, and the letter “R” is attached in the pixel 3R. The same applies to the following figures.
1 and 2 show a configuration in which the pixels 3L and 3R are arranged in 4 rows × 10 columns as the liquid crystal panel 3 in order to simplify the description.
The liquid crystal panel 3 is a fixed pixel type image forming device, and as shown in FIG. 1 or FIG. 2, a plurality of left eye pixels 3L for displaying a left eye image and a plurality of right eye pixels for displaying a right eye image. 3R, and each pixel 3L, 3R is partitioned by a black matrix BL.
These left-eye pixels 3L and right-eye pixels 3R are alternately arranged in all row directions (left-right direction in FIG. 2) and all column directions (up-down direction in FIG. 2), as shown in FIG. Yes.
Each of the pixels 3L and 3R is configured by sub-pixels in which R (red), G (green), and B (blue) color filters are disposed on the light beam emission side, although not specifically illustrated. Has been. Each of the pixels 3L and 3R includes a TFT (Thin Filmed Transistor) that applies a voltage to a liquid crystal sealed and sealed between a pair of transparent substrates as a switching element. By switching the TFT, each pixel 3L and 3R receives an image signal. As a result, the incident light flux is modulated in accordance with the image signal.

[Configuration of step barrier]
FIG. 3 is a schematic view of the arrangement state of the openings 43 of the step barrier 4 as seen in a plan view.
The step barrier 4 is disposed on the light beam emission side (observer side) of the liquid crystal panel 3 (FIG. 1), and has a function of separating a left-eye image and a right-eye image among displayed stereoscopic images, Each image is individually incident on both eyes of the observer.
As shown in FIG. 1, the step barrier 4 includes a translucent substrate 41 as a barrier substrate that transmits light through the liquid crystal panel 3, and a light shielding unit 42.
The light shielding portion 42 is made of a material that blocks light, and is formed on the translucent substrate 41. Then, as shown in FIG. 3, the light-shielding portions 42 correspond to the arrangement of the pixels 3L and 3R of the liquid crystal panel 3 every other column in the row direction (the left-right direction in FIG. 3) as the first direction. Are formed in such a manner that the openings 43 are arranged every other row in the column direction (vertical direction in FIG. 3) as the second direction. That is, the openings 43 are arranged in a staggered manner.

As shown in FIG. 3, each opening 43 has a rectangular width Px and height Py that are the same length. Each of the pixels 3L and 3R described above is configured such that the height Iy is larger than the width Ix, as shown in FIG. It is configured to be larger than Px.
Here, the ideal pitch of the openings 43 will be described.
The ideal pitch Ph in the row direction of the openings 43 is defined by the following equation (1) from the interocular distance E (FIG. 1) and the pixel pitch Ih in the row direction (FIG. 2).

[Equation 1]
Ph = 2 × Ih × E / (Ih + E) (1)

And in this embodiment, the step barrier 4 is formed so that the pitch of the opening part 43 on the virtual line A along a row direction may become equal.
Here, when the line edges that intersect the row direction in the opening 43 are the line edge 431 and the line edge 432, the pitch of the opening 43 on the virtual line A described above is the virtual line A and one line edge 431. And the interval between the intersections (intersection A1 shown in FIG. 3).

  In the step barrier 4, the pitch on the virtual line A is set based on the interocular distance E in a predetermined range. Specifically, the pitch PhA in the row direction at the upper end 433 is set by the above formula (1) based on the maximum interocular distance E, and the pitch PhB in the row direction of the lower end 434 is set to the maximum interocular distance E. Based on the above equation (1), it is set. That is, as shown in FIG. 3, each opening 43 is formed such that the pitch in the row direction is gradually reduced from the upper end 433 toward the lower end 434, and the pitch PhA is larger than the pitch PhB. The pitches of the openings 43 in the column direction are formed to be equal regardless of the positions of the upper end 433, the lower end 434, and the like.

  Each opening 43 is arranged to be line-symmetric with respect to a reference line B that overlaps the center in the row direction in the effective pixel region of the image display device 1. Thereby, as shown in FIG. 3, each opening part 43 is each comprised in parallelogram shape, is the same shape in the same row | line | column, and is a rectangle (shape where all four interior angles are equal) the thing close to the reference line B. The shape is close to. Note that the reference line B along the column direction and the center position coincide with each other are configured in a rectangular shape.

Then, the observer recognizes the three-dimensional image by the above-described step barrier 4 as described below.
That is, as shown in FIG. 1, the light emitted from the left-eye pixel 3 </ b> L is restricted from being incident on the viewer's right eye ER by the light shielding unit 42, and only to the viewer's left eye EL through the opening 43. Incident.
Further, as shown in FIG. 1, the light emitted from the right-eye pixel 3 </ b> R is restricted from entering the observer's left eye EL by the light shielding unit 42, and only to the observer's right eye ER through the opening 43. Incident.
Then, the observer recognizes the stereoscopic image based on the parallax between the left eye image and the right eye image.

[Step Barrier Manufacturing Method]
FIG. 4 is a flowchart illustrating a method for manufacturing the step barrier 4.
Hereinafter, a case where the pixel pitch Ih described above is 0.08 mm will be described.
In the present embodiment, the manufacturer manufactures the step barrier 4 including the light shielding part 42 and the opening 43 by forming the light shielding part 42 on the translucent substrate 41. The manufacturer uses a drawing apparatus to form the light shielding portion 42.
As a drawing device, although not specifically illustrated, a control device including an image processing unit such as a GPU (Graphics Processing Unit), a storage unit such as a memory, and an operation unit such as a keyboard and a mouse, and the control device And a drawing apparatus main body that coats a light-shielding material on which the light-shielding portion 42 is based on the light-transmitting substrate 41 using an inkjet technique used in printing or the like.
The control device described above reads the drawing program stored in the storage unit in response to an input operation to the operation unit by the manufacturer, controls the operation of the drawing device main body according to the drawing program, and transmits the transparent substrate 41. The formation of the light shielding part 42 is started.

In this embodiment, the control device sequentially advances from the rear end portion SF to the front end portion SN (see FIG. 1) for each line extending in the row direction (a line having a width dimension of, for example, about 1 μm in the column direction). 3), a light shielding material is applied from the drawing apparatus main body.
In the drawing apparatus body, the unit (accuracy limit value) that can be controlled when forming the light shielding portion 42 is 1 μm.
As shown in FIG. 4, the step barrier 4 is manufactured by a reference pattern setting step S1, a reduction rate setting step S2, a drawing information acquisition step S3, and a drawing step S4. Below, these processes are demonstrated in order.

[Reference pattern setting process]
FIG. 5 is a diagram for explaining the reference pattern FS. Specifically, FIG. 5A is a diagram schematically showing the reference barrier 5 that is the basis of the reference pattern FS, and FIG. 5B is a diagram showing an image of the reference pattern FS.
First, the manufacturer sets a reference pattern FS to be an original image when forming the light shielding portion 42 in the reference pattern setting step S1.
As shown in FIG. 5A, the reference barrier 5 includes a corresponding light shielding portion 52 (black image) corresponding to the light shielding portion 42 and a corresponding opening 53 (white image) corresponding to the opening 43 in the row direction and the column direction. Are alternately arranged at equal pitches. Specifically, in the present embodiment, the corresponding light shielding portion 52 and the corresponding opening 53 are configured such that the pitch Bh in the row direction is twice the pixel pitch Ih (0.08 × 2 = 0.16 mm).

The reference pattern FS is a pattern obtained by extracting three types of lines from the reference barrier 5 and is composed of unit regions (regions configured with an accuracy limit value of 1 μm).
The reference pattern FS1 is a line that forms the first corresponding opening 53 from above the reference barrier 5 shown in FIG. 5A, and the reference pattern FS2 is a line that forms only the corresponding light shielding part 52. The reference pattern FS3 is a line that forms the corresponding opening in the second stage from the top.

The manufacturer sets these reference patterns FS for each line as follows.
As shown in FIG. 3, the step barrier 4 includes a first group G1 having a configuration in which the line group L1 is sandwiched between the line group L2 and the line group L3 from the back end SF to the front end SN. The second group G2 having a configuration sandwiched between the line groups L2 is alternately arranged.
The manufacturer sets the reference pattern FS1 to each line of the line group L1, sets the reference pattern FS2 to each line of the line group L2, and sets the reference pattern FS3 to each line of the line group L3. The reference pattern FS described above is stored in the storage unit of the drawing apparatus in association with each line number.

[Reduction ratio setting process]
Next, the manufacturer sets a reduction rate for reducing the set reference pattern FS in the reduction rate setting step S2.
In the present embodiment, in each of the groups G1 and G2, a line (section) closest to the back end SF is formed with an ideal pitch Ph based on the maximum interocular distance E, and is closest to the front end SN. The line is formed with an ideal pitch Ph based on the minimum interocular distance E. In the following, a case where the maximum interocular distance E is 70 mm and the minimum interocular distance E is 60 mm will be described.
In this case, the ideal pitch Ph (E) of the openings 43 (light-shielding portions 42) in the row direction is specifically defined as follows from the above-described formula (1), the interocular distance E, and the pixel pitch Ih. Note that Ph (E) represents the ideal pitch Ph at the interocular distance E. The same applies to the following equations.
Ph (70) = 0.159817351598 ... mm
Ph (60) = 0.159786950732 ... mm

As described above, the pitch Bh in the row direction of the corresponding opening 53 in the reference barrier 5 is set to twice the pixel pitch Ih (0.16 mm), and the ideal pitch Ph (E) based on the interocular distance E is Are different. In order to bring this pitch Bh closer to each ideal pitch Ph (E), the reference pattern is expressed by a reduction ratio of E / (Ih + E) obtained by dividing each ideal pitch Ph (E) by 2Ih that is the pitch of the corresponding opening 53. FS needs to be reduced.
In the present embodiment, E / (Ih + E) is set as the reduction ratio in the reduction ratio setting step S2. That is, the reduction ratio Z (E) for bringing the reference pattern FS closer to the ideal pitch Ph (E) is specifically as follows.
Z (70) = 0.9988584 ...
Z (60) = 0.9986684 ...
Specifically, in each of the groups G1 and G2, the reduction rate of the line closest to the back end SF is “0.9988584...” And the reduction rate of the line closest to the front end SN is “0.9986684. Set the reduction rate Z (E) of each line step by step so that The reduction ratio Z (E) described above is stored in the storage unit of the drawing apparatus in association with each line number.

[Drawing information acquisition process]
Next, in the drawing information acquisition step S3, the manufacturer uses the drawing apparatus to acquire each piece of information related to drawing. Specifically, this information is a line number for drawing.
In the present embodiment, the control device sequentially acquires the line number closest to the back end SF and recognizes the line number on which the light shielding material is applied on the translucent substrate 41. That is, as shown in FIG. 3, the line numbers constituting each line group are sequentially recognized in the order of the line groups L2, L1, L2 of the group G1, the line groups L2, L3, L2,. .

[Drawing process]
Next, the manufacturer forms the light shielding part 42 on the translucent substrate 41 using a drawing apparatus in the drawing step S4.
Specifically, the control device reads the reference pattern FS and the reduction rate Z (E) stored in the storage unit based on the recognized line number. Then, the control device thins out the image for each unit area (area constituted by the accuracy limit value of 1 μm) from the read reference pattern FS in accordance with the reduction ratio Z (E), thereby the reference pattern FS. Is reduced, and the reduced reference pattern FS is drawn on the translucent substrate 41.
That is, the control device applies the light shielding material only to the portion corresponding to the corresponding light shielding portion 52 in the reduced reference pattern FS.
When the control device reduces the reference pattern FS according to the reduction ratio Z (E), the control device thins out the image for each unit region from the reference pattern FS so that the center positions in the row direction substantially match before and after the reduction. Go. Specifically, the light shielding material is applied from the left end in FIG. 3 and is calculated and applied so that each opening 43 is line symmetric based on the reference line B.
And a control apparatus performs the application | coating of the light shielding material mentioned above for every line according to the line number acquired sequentially in drawing information acquisition process S3.
The step barrier 4 is manufactured by the above process.

  The pitches PhA and PhB of the openings 43 of the step barrier 4 formed in this way are 0.159 mm at a certain position and 0.160 mm at a certain position, respectively, and an ideal value Ph (E set for each line as a whole. ). Further, the pitch PhA of the openings 43 is larger than the pitch PhB by setting the reduction ratio Z (E) described above.

FIG. 6 is an enlarged view of the contour of the step barrier 4 manufactured as described above.
As described above, the outline of the barrier region of the step barrier 4 manufactured by drawing in units of lines as shown in FIG. Is a hypotenuse part (including the hypotenuse of the opening). That is, the opening 43 is formed in a shape that repeats shrinking toward the reference line B in accordance with the saw-tooth shaped contour.

The first embodiment described above has the following effects.
In the present embodiment, since the pitch of the openings 43 on the imaginary line A is set to be smaller from the upper end 433 toward the lower end 434, each opening 43 has a long interocular distance E on the upper end 433 side. Since the lower end portion 434 side is configured in a shape based on the short interocular distance E, the difference in the visibility of the stereoscopic image due to the physique difference can be eliminated as follows.

FIG. 7 is a diagram for explaining the effect of this embodiment. Specifically, FIG. 7A shows an observation direction of a person having a large physique (high sitting height), and FIG. 7B shows an observation direction of a person having a small physique (low sitting height).
When an observer observes a stereoscopic image displayed on the image display device 1, the direction of the line of sight is different between a person with a large physique and a person with a small physique, as shown in FIG. That is, as shown in FIG. 7A, a person with a large physique looks at the image display device 1 from the upper side as compared with a person with an average physique unless adjustment of posture such as bending his / her waist is performed. It will be. On the other hand, the person with a small physique is the opposite as shown in FIG. Usually, a person with a large physique has a long interocular distance E, and a person with a small physique has a short interocular distance E.
Therefore, the opening 43 has a shape that takes into account the observation direction of the observer, that is, the interocular distance E where the upper end 433 side is the ideal pitch in the row direction is long, and the lower end 434 side is the ideal pitch in the row direction. Since the interocular distance E is a short shape, the difference in the visibility of the stereoscopic image due to the difference in physique can be eliminated. That is, for many people who tend to be proportional to the physique such as height and sitting height and the interocular distance E, it is possible to appropriately adjust the salt plums of the parallax separation by the step barrier 4 while maintaining the same original image image. .

  Further, in the reduction ratio setting step S2, the reduction ratio Z (for bringing the pitch in the row direction of the corresponding opening 53 in the reference pattern FS close to the ideal pitch Ph (E) of the opening 43 defined based on the pixel pitch Ih. E) is set. For this reason, in the drawing step S4, even if the accuracy limit value in the current pattern forming method is about 1 μm, the light shielding portion 42 in which the pitch of the openings 43 as a whole approaches the ideal pitch Ph (E) in line units. Can be formed.

[Second Embodiment]
Next, 2nd Embodiment of this invention is described based on drawing.
In the following description, the same structure and the same member as those in the first embodiment are denoted by the same reference numerals, and detailed description thereof is omitted or simplified.
FIG. 8 is a diagram for explaining a method of manufacturing the step barrier 4 in the second embodiment.
In the first embodiment, when the step barrier 4 is manufactured, the light shielding part 42 and the opening 43 are formed by spraying ink on the light-transmitting substrate 41 at a position corresponding to the light shielding part 42 by the ink jet method. It was.
On the other hand, in the second embodiment, when the step barrier 4 is manufactured, as shown in FIG. 8, a photomask 100 having a light shielding portion 42 ′ and an opening 43 ′ on a light transmitting substrate 41 ′ is used. The only difference is that the light shielding part 42 and the opening 43 of the step barrier 4 are formed by photolithography.

That is, in the photomask 100, the shape of the light shielding part 42 ′ is the same shape as the opening part 43 of the step barrier 4, and the shape of the opening part 43 ′ is the same shape as the light shielding part 42 of the step barrier 4. Is needed.
For this reason, as a method of manufacturing the photomask 100, the formation positions of the light shielding portion 42 and the opening 43 in the description of the manufacturing of the step barrier 4 described above may be reversed to form a plurality of rectangular light shielding portions 42. . That is, in FIG. 3, the opening 43 ′ is formed at the position where the light shielding part 42 is formed on the translucent substrate 41, and the light shielding part 42 ′ is formed at the position where the opening 43 is formed.

Then, using the photomask 100 manufactured as described above, the step barrier 4 is manufactured as described below.
First, as shown in FIG. 8A, the substrate having the light-shielding layer S and the resist R coated on the entire surface of the light-transmitting substrate 41 is exposed through the photomask 100, and the opening 43 of the photomask 100 is exposed. The resist R in the region corresponding to 'is exposed.
Next, as shown in FIG. 8B, the resist R other than the exposed region is removed by development and washing.
Next, as shown in FIG. 8C, the region of the light shielding layer S that is not covered with the exposed resist R is removed by etching.
Then, as shown in FIG. 8D, by removing the exposed resist R, the step barrier 4 similar to that of the first embodiment is manufactured.
Even when the step barrier 4 is manufactured by photolithography using the photomask 100 as in the second embodiment described above, the same operations and effects as in the first embodiment can be enjoyed.

It should be noted that the present invention is not limited to the above-described embodiments, and modifications, improvements, and the like within the scope that can achieve the object of the present invention are included in the present invention.
In each of the above embodiments, the pitch Bh in the row direction of the corresponding light shielding portion 52 and the corresponding opening 53 is not limited to the value (2Ih) illustrated in each of the above embodiments, and may be other values as long as it is larger than the pitch Ph. It doesn't matter.
In each of the above embodiments, the display unit according to the present invention is configured by the liquid crystal panel 3, but the present invention is not limited to this. That is, instead of the backlight 2 and the liquid crystal panel 3, a panel having a self-luminous element such as an organic EL (Electro-Luminescence) or plasma may be adopted, or a CRT (Cathode Ray Tube) may be adopted. I do not care.
In each of the embodiments described above, the image display device 1 can be employed in gaming machines such as pachinko machines and pachislot machines, automobile console panels, video game machines, and the like.

  The present invention is used in combination with a display unit in which left-eye pixels for displaying a left-eye image and right-eye pixels for displaying a right-eye image are alternately arranged in a row direction and a column direction. It can be used for a parallax barrier that separates a left-eye image and a right-eye image.

  DESCRIPTION OF SYMBOLS 1 ... Image display apparatus, 3 ... Liquid crystal panel (display means), 3R, 3L ... Pixel, 4 ... Step barrier (parallax barrier), 41, 41 '... Translucent substrate, 42, 42 '... light-shielding part, 43, 43' ... opening, 433 ... upper end part (one end), 434 ... lower end part (other end), A ... virtual line, E. .. Interocular distance, FS (FS1 to FS3) ... reference pattern, S1 ... reference pattern setting step, S2 ... reduction ratio setting step, S4 ... drawing step.

Claims (5)

A parallax barrier that is used in combination with a display unit that displays a left-eye image and a right-eye image, and that separates the left-eye image and the right-eye image displayed on the display unit,
Openings that allow light to pass through and light-shielding portions that block light are alternately provided in a first direction and a second direction orthogonal to the first direction,
The plurality of openings are
The parallax barrier, wherein a pitch on an imaginary line along the first direction is set so as to decrease from one end to the other end of the opening in the second direction. Display means for displaying a left-eye image and a right-eye image;
An image display device comprising the parallax barrier according to claim 1. A method of manufacturing a parallax barrier that is used in combination with a display unit that displays a left-eye image and a right-eye image, and that separates a left-eye image and a right-eye image displayed on the display unit,
An opening that allows light to pass through and a light-shielding portion that blocks light are alternately provided in a first direction and a second direction orthogonal to the first direction,
The openings and the light-shielding portions are formed so that the pitch of the openings on the imaginary line along the first direction decreases from one end to the other end of the openings in the second direction. A method of manufacturing a parallax barrier, characterized by: In the manufacturing method of the parallax barrier according to claim 3,
A reference pattern setting step for setting a reference pattern having a corresponding light-shielding part and a corresponding opening corresponding to the light-shielding part and the opening, respectively, with a region formed by accuracy limit values when manufacturing the light-shielding part as a unit region When,
A reduction ratio setting step for setting a reduction ratio for reducing the reference pattern for each section obtained by dividing the formation region of the corresponding light shielding portion and the corresponding opening in a plurality in the second direction;
A drawing step of reducing the reference pattern by thinning out the unit area in accordance with the reduction ratio from the reference pattern, and forming the light-shielding portion on the translucent substrate based on the reduced reference pattern. A method of manufacturing a parallax barrier characterized by the above. A method of manufacturing a photomask for forming a parallax barrier that is used in combination with display means for displaying a left-eye image and a right-eye image and separates the left-eye image and right-eye image displayed on the display means. ,
An opening that allows light to pass through and a light-shielding portion that blocks light are alternately provided in a first direction and a second direction orthogonal to the first direction,
The openings and the light shielding so that a pitch of the openings on the first imaginary line along the first direction decreases from one end to the other end of the openings in the second direction. Forming a portion. A method for producing a photomask, comprising: forming a portion.

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