JP2011169927A - Optical scanner - Google Patents

Optical scanner Download PDF

Info

Publication number
JP2011169927A
JP2011169927A JP2010030810A JP2010030810A JP2011169927A JP 2011169927 A JP2011169927 A JP 2011169927A JP 2010030810 A JP2010030810 A JP 2010030810A JP 2010030810 A JP2010030810 A JP 2010030810A JP 2011169927 A JP2011169927 A JP 2011169927A
Authority
JP
Japan
Prior art keywords
substrate
rigidity
mirror
tongue
optical scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010030810A
Other languages
Japanese (ja)
Inventor
Yukio Shinozuka
幸男 篠塚
Jun Aketo
純 明渡
Saikaku Boku
載赫 朴
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinano Kenshi Co Ltd
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Shinano Kenshi Co Ltd
National Institute of Advanced Industrial Science and Technology AIST
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinano Kenshi Co Ltd, National Institute of Advanced Industrial Science and Technology AIST filed Critical Shinano Kenshi Co Ltd
Priority to JP2010030810A priority Critical patent/JP2011169927A/en
Publication of JP2011169927A publication Critical patent/JP2011169927A/en
Pending legal-status Critical Current

Links

Images

Abstract

<P>PROBLEM TO BE SOLVED: To provide an optical scanner capable of obtaining a required amplitude, without changing the position of a beam part supporting a mirror part, when a substrate is vibrated. <P>SOLUTION: Substrate rigidity reduction parts 9 for reducing the rigidity of substrate tongue parts 8 are respectively formed, in positions axially symmetric with respect to an axis line M in the longitudinal direction of the substrate in the vicinity of the connection part of the beam part 3, in a pair of substrate tongue parts 8 to which the beam part 3 of the substrate 1 is connected. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は、光源より照射された光ビームを揺動するミラー部で反射して走査を行う光走査装置に関する。   The present invention relates to an optical scanning apparatus that performs scanning by reflecting a light beam emitted from a light source by a oscillating mirror.

光源より照射されたレーザー光等の光ビームを走査する光走査装置は、バーコードリーダ、レーザープリンタ、ヘッドマウントディスプレー等の光学機器、あるいは赤外線カメラ等撮像装置の光取り入れ装置として用いられている。   An optical scanning device that scans a light beam such as a laser beam emitted from a light source is used as an optical device such as a barcode reader, a laser printer, or a head-mounted display, or a light intake device of an imaging device such as an infrared camera.

例えば、図7(a)(b)において、支持部材51とクランプ部材57とで片持ち状にクランプされて支持された基板52(例えばステンレス基板やシリコン基板など)の自由端側に一対の基板舌部53aが両側に設けられ、該基板舌部53a間に形成された開口部53b内に梁部54により両側が連結されたミラー部55が設けられている。ミラー部55は鏡面仕上げされているか、反射膜が形成されているか、或いは基板にミラーが貼付けられている。   For example, in FIGS. 7A and 7B, a pair of substrates on the free end side of a substrate 52 (for example, a stainless steel substrate or a silicon substrate) clamped and supported by a support member 51 and a clamp member 57 in a cantilever manner. A tongue portion 53a is provided on both sides, and a mirror portion 55 having both sides connected by beam portions 54 is provided in an opening 53b formed between the substrate tongue portions 53a. The mirror unit 55 is mirror-finished, has a reflective film formed, or has a mirror attached to the substrate.

また、基板52に圧電体、磁歪体、または永久磁石のいずれかによる薄膜よりなる振動源56を設け、例えば圧電体の場合、図示しない駆動源より正電圧を印加すると延びが発生し、負電圧を印加すると縮みが発生するため、基板52に撓みが発生する。この基板52の上下方向の撓みに対して梁部54にねじれ振動が発生してミラー部55が揺動する。   Further, the substrate 52 is provided with a vibration source 56 made of a thin film of a piezoelectric body, a magnetostrictive body, or a permanent magnet. For example, in the case of a piezoelectric body, when a positive voltage is applied from a driving source (not shown), an extension occurs and a negative voltage is generated. Since the shrinkage occurs when the voltage is applied, the substrate 52 is bent. Torsional vibration is generated in the beam portion 54 with respect to the vertical deflection of the substrate 52, and the mirror portion 55 swings.

このミラー部55と梁部54との共振周波数付近で駆動周波数を維持して、振動するミラー部55によりレーザー光を反射することで光走査する。これによって、MEMS(Micro Electro Mechanical System)を用いて製造された微小ミラーを揺動させる光走査装置より製造コストがかからず、小型の振動源56でミラー部55に大きな振動を発生させるようになっている。梁部54には変形時に応力集中が起こり易いため、スリットを形成して応力集中を緩和することが行なわれている(特許文献1,2参照)。   The driving frequency is maintained near the resonance frequency between the mirror portion 55 and the beam portion 54, and the laser beam is reflected by the vibrating mirror portion 55 to perform optical scanning. Accordingly, the manufacturing cost is lower than that of an optical scanning device that swings a micro mirror manufactured using MEMS (Micro Electro Mechanical System), and a large vibration is generated in the mirror unit 55 by a small vibration source 56. It has become. Since stress concentration easily occurs in the beam portion 54 during deformation, a slit is formed to reduce the stress concentration (see Patent Documents 1 and 2).

特開2009−109905号公報JP 2009-109905 A 特開2007−268374号公報JP 2007-268374 A

上述した片持ち支持された基板52の自由端に設けられる一対の基板舌部53aは均等な幅で設計されるため、振動源56を作動したときに基板52が振動する自由端で基板舌部53aに形成される節の位置がコントロールし難い。節の位置が梁部54と一致せずに上下へずれると光走査装置の組み付け誤差とあいまって必要な走査精度が得られない。また、一対の基板舌部53aにおいて基板振動方向への剛性が高いため、光走査に必要な振幅が得られ難い。
よって、梁部54の位置と節の位置が一致するように片持ち支持される基板52のクランプ位置の調整を試行錯誤しながら行なう必要がある。
Since the pair of substrate tongues 53a provided at the free ends of the cantilevered substrate 52 described above are designed with an equal width, the substrate tongues at the free ends where the substrate 52 vibrates when the vibration source 56 is operated. The position of the node formed in 53a is difficult to control. If the position of the node does not coincide with the beam portion 54 and shifts up and down, the required scanning accuracy cannot be obtained in combination with the assembly error of the optical scanning device. Further, since the rigidity in the substrate vibration direction is high in the pair of substrate tongue portions 53a, it is difficult to obtain the amplitude necessary for optical scanning.
Therefore, it is necessary to adjust the clamping position of the substrate 52 that is cantilevered so that the position of the beam portion 54 and the position of the node coincide with each other by trial and error.

本発明は、基板を振動させた際にミラー部を支持する梁部の位置が変わらずに必要な振幅が得られる光走査装置を提供することを目的とする。   It is an object of the present invention to provide an optical scanning device that can obtain a necessary amplitude without changing the position of a beam portion that supports a mirror portion when a substrate is vibrated.

長手方向の一方側を片持ち状に支持された基板の他端側に形成された開口部内に両側を梁部により支持されたミラー部が形成され、前記基板上に設けられた振動源を作動させて当該基板を撓ませることにより前記梁部を揺動軸として前記ミラー部を揺動させながら照射光を反射することで走査する光走査装置であって、前記基板の梁部が接続された一対の基板舌部に当該梁部の接続部近傍であって基板長手方向の軸線に対して軸対称となる位置に前記基板舌部の剛性を低下させる基板剛性低下部が各々形成されていることを特徴とする。   A mirror part supported on both sides by a beam part is formed in an opening formed on the other end side of the board supported in a cantilever manner on one side in the longitudinal direction, and the vibration source provided on the board is operated. An optical scanning device that scans by deflecting the substrate and deflecting the irradiation light while oscillating the mirror portion with the beam portion as an oscillating axis, wherein the beam portion of the substrate is connected Substrate rigidity lowering portions for reducing the rigidity of the substrate tongue portion are formed on the pair of substrate tongue portions in the vicinity of the connection portion of the beam portion and symmetrical with respect to the longitudinal axis of the substrate. It is characterized by.

前記基板剛性低下部は、貫通孔、凹み若しくは切欠きのいずれかがプレス加工若しくはエッチング加工により形成されていることを特徴とする。   The substrate rigidity decreasing portion is characterized in that any one of a through hole, a dent, and a notch is formed by pressing or etching.

基板の梁部が接続された一対の基板舌部に当該梁部の接続部近傍であって基板長手方向の軸線に対して軸対称となる位置に基板舌部の剛性を低下させる基板剛性低下部が各々形成されていると、振動源を作動させて基板を振動させた際に基板剛性が低い基板剛性低下部を節として基板が振動し易くなる。
よって、梁部を節としてミラー部が揺動し易くなるため、同じ基板サイズでもミラーの振幅が拡大しかつ梁部の位置が移動し難くなるため走査範囲も安定し、基板のクランプ位置の調整作業も簡略化することができる。
Substrate rigidity lowering portion that reduces the rigidity of the substrate tongue at a position near the connection portion of the beam portion and symmetrical with respect to the longitudinal axis of the substrate to a pair of substrate tongues to which the beam portions of the substrate are connected When each is formed, when the vibration source is operated to vibrate the substrate, the substrate is likely to vibrate with the substrate rigidity lowered portion having low substrate rigidity as a node.
Therefore, since the mirror part is easy to swing with the beam part as a node, the amplitude of the mirror is enlarged and the position of the beam part is difficult to move even with the same substrate size, so that the scanning range is stabilized and the clamp position of the substrate is adjusted. Work can also be simplified.

基板剛性低下部は、貫通孔、凹み若しくは切欠きのいずれかがプレス加工若しくはエッチング加工により手間や工数はかからず形成できるので、簡易な構成で光走査装置の安定した特性を維持することができる。   Since the substrate rigidity reduction part can be formed by pressing or etching any of the through holes, dents or notches without any effort or man-hours, the stable characteristics of the optical scanning device can be maintained with a simple configuration. it can.

光学走査装置の平面図及び矢印A−A断面図である。It is the top view and arrow AA sectional drawing of an optical scanning device. 他例に係る光学走査装置の平面図及び矢印A−A断面図である。It is the top view and arrow AA sectional drawing of the optical scanner which concerns on another example. 他例に係る光学走査装置の平面図及び矢印A−A断面図である。It is the top view and arrow AA sectional drawing of the optical scanner which concerns on another example. 他例に係る光学走査装置の平面図及び矢印A−A断面図である。It is the top view and arrow AA sectional drawing of the optical scanner which concerns on another example. 他例に係る光学走査装置の平面図及び矢印A−A断面図である。It is the top view and arrow AA sectional drawing of the optical scanner which concerns on another example. 他例に係る光学走査装置の平面図及び矢印A−A断面図である。It is the top view and arrow AA sectional drawing of the optical scanner which concerns on another example. 従来の光学走査装置の平面図及び矢印A−A断面図である。It is the top view and arrow AA sectional drawing of the conventional optical scanning device.

以下、本発明に係る光学走査装置の実施形態について図面を参照して説明する。本実施例では、レーザービームプリンタ用に用いられる光走査装置(スキャナー)を例示して説明するものとする。   Embodiments of an optical scanning device according to the present invention will be described below with reference to the drawings. In this embodiment, an optical scanning device (scanner) used for a laser beam printer will be described as an example.

[第1実施例]
第1図1(a)(b)を参照して光走査装置の概略構成について説明する。
基板1は金属板(ステンレススチール;SUS304)若しくはシリコン基板(Si)などの矩形基板が好適に用いられる。基板1は長手方向の一方側を支持部材7とクランプ部材6に挟み込まれて片持ち状に支持されている。
[First embodiment]
A schematic configuration of the optical scanning device will be described with reference to FIGS. 1 (a) and 1 (b).
The substrate 1 is preferably a rectangular substrate such as a metal plate (stainless steel; SUS304) or a silicon substrate (Si). The substrate 1 is sandwiched between a support member 7 and a clamp member 6 on one side in the longitudinal direction and is supported in a cantilever manner.

基板1の他端側(自由端側)には一対の基板舌部8が形成されている。この基板舌部8間に形成された開口部2内に両側を梁部3により支持されたミラー部4が設けられている。   A pair of substrate tongues 8 are formed on the other end side (free end side) of the substrate 1. In the opening 2 formed between the substrate tongues 8, a mirror part 4 supported on both sides by the beam part 3 is provided.

また、基板1の一端側中央部には振動源5として圧電素子(PZT;チタン酸ジルコン酸鉛)が接着等により設けられている。この振動源5を作動させて当該基板1を振動させることにより、梁部3を揺動軸としてミラー部4を揺動させながら照射光を反射することで走査するようになっている。   Further, a piezoelectric element (PZT; lead zirconate titanate) is provided as an oscillation source 5 at the center of one end side of the substrate 1 by adhesion or the like. By operating the vibration source 5 to vibrate the substrate 1, scanning is performed by reflecting the irradiation light while swinging the mirror portion 4 with the beam portion 3 as the swing axis.

図1(a)において、基板1の梁部3が接続された一対の基板舌部8には、当該梁部3の接続部近傍(梁部3の基板短手方向中心軸L上)に、基板長手方向の軸線Mに対して軸対称となる位置に角孔9(貫通孔;基板剛性低下部)が各々穿孔されている。この角孔9の孔形状は、正方形、長方形、平行四辺形、菱形などの矩形孔が形成されている。この角孔9は、基板製造工程において、プレス加工若しくはエッチング加工により形成することができる。   In FIG. 1A, the pair of substrate tongues 8 to which the beam portion 3 of the substrate 1 is connected are in the vicinity of the connection portion of the beam portion 3 (on the central axis L in the substrate short direction of the beam portion 3). Square holes 9 (through-holes; substrate rigidity reduction portions) are respectively drilled at positions that are axially symmetric with respect to the axis M in the substrate longitudinal direction. As the hole shape of the square hole 9, rectangular holes such as a square, a rectangle, a parallelogram, and a rhombus are formed. The square holes 9 can be formed by pressing or etching in the substrate manufacturing process.

かかる角孔9の存在により基板舌部8の振動方向の剛性が低下する。このため、振動源5を作動させて基板1を振動させた際に基板舌部8のうち剛性が低い角孔9の付近を節として基板1が振動し易くなる。よって、梁部3を節としてミラー部4が揺動し易くなるため、同じ基板サイズでもミラー部4の振幅が拡大しかつ梁部3の位置が移動し難くなるため走査範囲も安定し、基板1のクランプ位置の調整作業も簡略化することができる。   Due to the presence of the square holes 9, the rigidity of the substrate tongue 8 in the vibration direction is lowered. For this reason, when the vibration source 5 is operated to vibrate the substrate 1, the substrate 1 is likely to vibrate with the vicinity of the square hole 9 having a low rigidity in the substrate tongue 8 as a node. Therefore, since the mirror part 4 easily swings with the beam part 3 as a node, the amplitude of the mirror part 4 is enlarged and the position of the beam part 3 is difficult to move even with the same substrate size. The adjustment work of the clamp position of 1 can also be simplified.

[第2実施例]
次に光走査装置の他例について図2(a)(b)を参照して説明する。第1実施例と同一部材には同一番号を付して説明を援用するものとする。本実施例では、基板舌部8に対して角孔9(基板剛性低下部)が設けられる位置が異なっている。
[Second Embodiment]
Next, another example of the optical scanning device will be described with reference to FIGS. The same members as those in the first embodiment are denoted by the same reference numerals and the description thereof is incorporated. In the present embodiment, the positions at which the square holes 9 (substrate rigidity lowering portions) are provided differ from the substrate tongue 8.

基板1の自由端側に設けられた一対の基板舌部8には、梁部3の接続部近傍(梁部3の基板短手方向中心軸Lより振動源5側にずれた位置)には、基板長手方向の軸線Mに対して軸対称となる位置に角孔9が各々穿孔されている。
尚、角孔9は、梁部3の基板短手方向中心軸Lより自由端側にずれた位置に形成されていてもよい。この角孔9も、基板製造工程において、プレス加工若しくはエッチング加工により形成することができる。
上記構成によっても、基板1を振動させた際に基板舌部8のうち剛性が低い角孔9の近傍である梁部3を節として基板1が振動し易くなる。
The pair of substrate tongues 8 provided on the free end side of the substrate 1 are adjacent to the connection portion of the beam portion 3 (position shifted to the vibration source 5 side from the central axis L of the beam portion 3 in the substrate short direction). Square holes 9 are drilled at positions that are axially symmetric with respect to the axis M in the longitudinal direction of the substrate.
Note that the square hole 9 may be formed at a position shifted to the free end side from the central axis L of the beam portion 3 in the lateral direction of the substrate. This square hole 9 can also be formed by pressing or etching in the substrate manufacturing process.
Also with the above configuration, when the substrate 1 is vibrated, the substrate 1 is likely to vibrate with the beam portion 3 in the vicinity of the square hole 9 having low rigidity in the substrate tongue 8 as a node.

[第3実施例]
次に光走査装置の他例について図3(a)(b)を参照して説明する。第1実施例と同一部材には同一番号を付して説明を援用するものとする。
本実施例では、基板舌部8に対して設けられる基板剛性低下部の形状が異なっている。即ち、基板1の自由端側に設けられた一対の基板舌部8には、梁部3の接続部近傍(梁部3の基板短手方向中心軸L上)に、基板長手方向の軸線Mに対して軸対称となる位置に丸孔10(貫通孔;基板剛性低下部)が各々穿孔されている。この丸孔10も、基板製造工程において、プレス加工若しくはエッチング加工により形成することができる。尚、丸孔10に替えて楕円孔や長孔等であってもよい。
上記構成によっても、基板1を振動させた際に基板舌部8のうち剛性が低い丸孔10の近傍である梁部3を節として基板1が振動し易くなる。
[Third embodiment]
Next, another example of the optical scanning device will be described with reference to FIGS. The same members as those in the first embodiment are denoted by the same reference numerals and the description thereof is incorporated.
In this embodiment, the shape of the board rigidity reduction portion provided for the board tongue 8 is different. That is, the pair of substrate tongues 8 provided on the free end side of the substrate 1 has a substrate longitudinal axis M in the vicinity of the connection portion of the beam portion 3 (on the substrate lateral direction central axis L of the beam portion 3). Round holes 10 (through-holes; substrate rigidity reduction portions) are respectively drilled at positions that are axially symmetric. The round hole 10 can also be formed by pressing or etching in the substrate manufacturing process. An elliptical hole or a long hole may be used instead of the round hole 10.
Also with the above configuration, when the substrate 1 is vibrated, the substrate 1 is easily vibrated with the beam portion 3 in the vicinity of the round hole 10 having low rigidity in the substrate tongue portion 8 as a node.

[第4実施例]
次に光走査装置の他例について図4(a)(b)を参照して説明する。第1実施例と同一部材には同一番号を付して説明を援用するものとする。
本実施例では、基板舌部8に対して設けられる基板剛性低下部の形状が異なっている。即ち、基板1の自由端側に設けられた一対の基板舌部8には、梁部3の接続部の一方側(自由端側)に隣接して基板舌部8の幅方向に切り欠かれたスリット11(切欠き;基板剛性低下部)が形成されている。スリット11は、基板舌部8に基板長手方向の軸線Mに対して軸対称となる位置に各々形成されている。このスリット11も、基板製造工程において、プレス加工若しくはエッチング加工により形成することができる。尚、スリット11は基板舌部8の対向する内側辺縁部に設けたが、基板舌部8の外側辺縁部に設けられていてもよい。
上記構成によっても、基板1を振動させた際に基板舌部8のうち剛性が低いスリット11に隣接する梁部3を節として基板1が振動し易くなる。
[Fourth embodiment]
Next, another example of the optical scanning device will be described with reference to FIGS. The same members as those in the first embodiment are denoted by the same reference numerals and the description thereof is incorporated.
In this embodiment, the shape of the board rigidity reduction portion provided for the board tongue 8 is different. That is, the pair of substrate tongues 8 provided on the free end side of the substrate 1 are notched in the width direction of the substrate tongue 8 adjacent to one side (free end side) of the connection portion of the beam portion 3. In addition, a slit 11 (notch; substrate rigidity reduction portion) is formed. The slits 11 are formed in the substrate tongue 8 at positions that are axially symmetric with respect to the axis M in the substrate longitudinal direction. The slit 11 can also be formed by pressing or etching in the substrate manufacturing process. In addition, although the slit 11 was provided in the inner side edge part which the board | substrate tongue part 8 opposes, you may be provided in the outer side edge part of the board | substrate tongue part 8. FIG.
Also with the above configuration, when the substrate 1 is vibrated, the substrate 1 is likely to vibrate with the beam portion 3 adjacent to the slit 11 having low rigidity in the substrate tongue 8 as a node.

[第5実施例]
次に光走査装置の他例について図5(a)(b)を参照して説明する。第1実施例と同一部材には同一番号を付して説明を援用するものとする。
本実施例では、基板舌部8に対して設けられる基板剛性低下部の配置が異なっている。即ち、基板1の自由端側に設けられた一対の基板舌部8には、梁部3の接続部の両側(振動源側及び自由端側)に各々隣接して基板舌部8の幅方向に切り欠かれたスリット11(切欠き;基板剛性低下部)が形成されている。これらのスリット11は、基板舌部8に基板長手方向の軸線Mに対して軸対称となる位置に各々形成されている。これらのスリット11も、基板製造工程において、プレス加工若しくはエッチング加工により形成することができる。尚、スリット11は基板舌部8の対向する内側辺縁部に設けたが、基板舌部8の外側辺縁部に設けられていてもよい。
上記構成によっても、基板1を振動させた際に基板舌部8のうち剛性が低いスリット11に隣接する梁部3を節として基板1が振動し易くなる。
[Fifth embodiment]
Next, another example of the optical scanning device will be described with reference to FIGS. The same members as those in the first embodiment are denoted by the same reference numerals and the description thereof is incorporated.
In this embodiment, the arrangement of the board rigidity lowering portion provided for the board tongue 8 is different. In other words, the pair of substrate tongues 8 provided on the free end side of the substrate 1 are adjacent to both sides (vibration source side and free end side) of the connection portion of the beam 3, respectively, in the width direction of the substrate tongue 8. A slit 11 (notch; substrate rigidity reduction portion) is formed. The slits 11 are formed in the substrate tongue 8 at positions that are axially symmetric with respect to the axis M in the substrate longitudinal direction. These slits 11 can also be formed by pressing or etching in the substrate manufacturing process. In addition, although the slit 11 was provided in the inner side edge part which the board | substrate tongue part 8 opposes, you may be provided in the outer side edge part of the board | substrate tongue part 8. FIG.
Also with the above configuration, when the substrate 1 is vibrated, the substrate 1 is likely to vibrate with the beam portion 3 adjacent to the slit 11 having low rigidity in the substrate tongue 8 as a node.

[第6実施例]
次に光走査装置の他例について図6(a)(b)を参照して説明する。第1実施例と同一部材には同一番号を付して説明を援用するものとする。
本実施例では、基板舌部8に対して設けられる基板剛性低下部の形状が異なっている。即ち、基板1の自由端側に設けられた一対の基板舌部8には、当該梁部3の接続部近傍(梁部3の基板短手方向中心軸L上)に、基板長手方向の軸線Mに対して軸対称となる位置に凹み12(基板剛性低下部)が各々刻設されている。この凹み12の形状は、正方形、長方形、平行四辺形、菱形などの矩形若しくは丸、楕円、長円など任意の形状に形成されうる。また、凹み12の底部は平坦状でも湾曲状でもいずれでもよい。この凹み12は、基板製造工程において、プレス加工若しくはエッチング加工により形成することができる。
上記構成によっても、基板1を振動させた際に基板舌部8のうち剛性が低い凹み12に隣接する梁部3を節として基板1が振動し易くなる。
[Sixth embodiment]
Next, another example of the optical scanning device will be described with reference to FIGS. The same members as those in the first embodiment are denoted by the same reference numerals and the description thereof is incorporated.
In this embodiment, the shape of the board rigidity reduction portion provided for the board tongue 8 is different. In other words, the pair of substrate tongues 8 provided on the free end side of the substrate 1 has an axis line in the longitudinal direction of the substrate in the vicinity of the connection portion of the beam portion 3 (on the central axis L in the substrate short direction of the beam portion 3). Recesses 12 (substrate rigidity reduction portions) are respectively carved at positions that are axially symmetric with respect to M. The shape of the recess 12 can be formed in any shape such as a rectangle such as a square, a rectangle, a parallelogram, and a diamond, or a circle, an ellipse, and an ellipse. Further, the bottom of the recess 12 may be flat or curved. The recess 12 can be formed by pressing or etching in the substrate manufacturing process.
Also with the above configuration, when the substrate 1 is vibrated, the substrate 1 is likely to vibrate with the beam portion 3 adjacent to the recess 12 having low rigidity in the substrate tongue portion 8 as a node.

尚、振動源5としては、圧電素子のほかに、圧電体、磁歪体又は永久磁石体のいずれかが基板上に膜状に直接形成されていてもよい。成膜法としては、例えばエアロゾルデポジション法(AD法)、真空蒸着法、スパッタリング法や化学的気相成長法(CVD: Chemical Vapor Deposition)、ゾル−ゲル法などの薄膜形成技術を用いて、圧電体、磁歪体又は永久磁石体のいずれかが基板上に膜状に直接形成されていると、低電圧駆動で低消費電力の光走査装置を提供できる。   As the vibration source 5, in addition to the piezoelectric element, any one of a piezoelectric body, a magnetostrictive body, and a permanent magnet body may be directly formed in a film shape on the substrate. As a film formation method, for example, an aerosol deposition method (AD method), a vacuum deposition method, a sputtering method, a chemical vapor deposition method (CVD: Chemical Vapor Deposition), or a sol-gel method is used. When any one of the piezoelectric body, the magnetostrictive body, and the permanent magnet body is directly formed in a film shape on the substrate, an optical scanning device that is driven at a low voltage and consumes low power can be provided.

磁歪体や永久磁石体を用いる場合、外部から印加する交番磁界は、上記磁歪膜、永久磁石膜が形成された基板部近傍に設けられたコイルに交流電流を流すことで交番磁界を発生させる。尚、磁歪膜や永久磁石膜で基板に形成する場合、基板材料は非磁性材料である方が、より効率的に撓みを発生することができる。   When a magnetostrictive body or a permanent magnet body is used, an alternating magnetic field applied from the outside generates an alternating magnetic field by passing an alternating current through a coil provided near the substrate portion on which the magnetostrictive film and the permanent magnet film are formed. In addition, when forming on a board | substrate with a magnetostriction film | membrane or a permanent magnet film, the direction where a board | substrate material is a nonmagnetic material can generate | occur | produce bending more efficiently.

尚、ミラー部4は、基板1に金属板を使用する場合には鏡面仕上げされた基板1を用いると良い。金属板以外の基板や、金属板においてもより高い反射性能が要求され場合には、真空蒸着、スパッタリング、CVD(化学的気相成長法)等の薄膜形成技術により、ミラー部4へ薄膜を形成するか、或いはミラー部4へ別途ミラー用反射材料を貼付けてもよい。   The mirror unit 4 may be a mirror-finished substrate 1 when a metal plate is used for the substrate 1. When a substrate other than a metal plate or a metal plate is required to have higher reflection performance, a thin film is formed on the mirror portion 4 by a thin film forming technique such as vacuum deposition, sputtering, or CVD (chemical vapor deposition). Alternatively, a mirror reflection material may be separately attached to the mirror unit 4.

また、薄膜を形成する材料には、金(Au)、二酸化ケイ素(SiO2)、アルミニウム(Al)、あるいはフッ化マグネシウム(MgF2)から1つを選択、或いは2つ以上の材料を組み合わせ、さらに前記薄膜成形技術による同一層(=単層)、或いは2層以上の多層構成を適度な膜厚に制御することによって、反射性能を向上する薄膜が形成できる。あるいは、ミラー部4へ別途ミラー用反射材を貼付ける材料には、鏡面仕上げしたシリコン(Si)またはアルミナチタンカーバイト(Al2O3-TiC)のセラミック等へ、前記薄膜成形技術にて薄膜を形成しても良い。 In addition, the material for forming the thin film is selected from gold (Au), silicon dioxide (SiO 2 ), aluminum (Al), or magnesium fluoride (MgF 2 ), or a combination of two or more materials. Furthermore, by controlling the same layer (= single layer) or a multilayer structure of two or more layers by the thin film forming technique to an appropriate film thickness, a thin film that improves reflection performance can be formed. Alternatively, as a material for separately attaching a reflector for mirror to the mirror part 4, a thin film is formed on the mirror-finished silicon (Si) or alumina titanium carbide (Al 2 O 3 -TiC) ceramic by the above-mentioned thin film forming technique. May be formed.

また、基板1の厚みに関しては、動作中のミラー部4の平坦性やプロジェクターデバイスなどへの応用で要求されるミラーサイズを考慮し、シリコン(Si)、ステンレススチール(SUS304等)等の、或いはさらにカーボンナノチューブを前記材料へ成長させた基板を想定すると、少なくとも10μm以上の厚みが望ましい。   Further, regarding the thickness of the substrate 1, considering the flatness of the mirror part 4 in operation and the mirror size required for application to a projector device, silicon (Si), stainless steel (SUS304, etc.), or the like Further, assuming a substrate in which carbon nanotubes are grown on the material, a thickness of at least 10 μm or more is desirable.

1 基板
2 開口部
3 梁部
4 ミラー部
5 振動源
6 クランプ部材
7 支持部材
8 基板舌部
9 角孔
10 丸孔
11 スリット
12 凹み
DESCRIPTION OF SYMBOLS 1 Substrate 2 Opening part 3 Beam part 4 Mirror part 5 Vibration source 6 Clamp member 7 Support member 8 Substrate tongue part 9 Square hole 10 Round hole 11 Slit 12 Recess

Claims (2)

矩形基板の長手方向の一方側を片持ち状に支持された基板の他端側に形成された開口部内に両側を梁部により支持されたミラー部が形成され、前記基板上に設けられた振動源を作動させて当該基板を撓ませることにより前記梁部を揺動軸として前記ミラー部を揺動させながら照射光を反射することで走査する光走査装置であって、
前記基板の梁部が接続された一対の基板舌部に当該梁部の接続部近傍であって基板長手方向の軸線に対して軸対称となる位置に前記基板舌部の剛性を低下させた基板剛性低下部が各々形成されていることを特徴とする光走査装置。
A vibration part provided on the substrate, in which a mirror part supported on both sides by a beam part is formed in an opening part formed on the other end side of the substrate supported in a cantilever manner on one side in the longitudinal direction of the rectangular substrate. An optical scanning device that scans by reflecting irradiation light while oscillating the mirror portion with the beam portion as an oscillating axis by actuating a source and bending the substrate,
A substrate in which the rigidity of the substrate tongue is lowered to a pair of substrate tongues to which the beam portion of the substrate is connected, in the vicinity of the connection portion of the beam portion and in an axially symmetrical position with respect to the axis in the longitudinal direction of the substrate An optical scanning device, wherein each of the rigidity reduction portions is formed.
前記基板剛性低下部は、貫通孔、凹み若しくは切欠きのいずれかがプレス加工若しくはエッチング加工により形成されている請求項1記載の光走査装置。   2. The optical scanning device according to claim 1, wherein the substrate rigidity lowering portion is formed by pressing or etching one of a through hole, a dent, and a notch.
JP2010030810A 2010-02-16 2010-02-16 Optical scanner Pending JP2011169927A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010030810A JP2011169927A (en) 2010-02-16 2010-02-16 Optical scanner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010030810A JP2011169927A (en) 2010-02-16 2010-02-16 Optical scanner

Publications (1)

Publication Number Publication Date
JP2011169927A true JP2011169927A (en) 2011-09-01

Family

ID=44684157

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010030810A Pending JP2011169927A (en) 2010-02-16 2010-02-16 Optical scanner

Country Status (1)

Country Link
JP (1) JP2011169927A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022176587A1 (en) * 2021-02-22 2022-08-25 パナソニックIpマネジメント株式会社 Drive element and light deflection element

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006099045A (en) * 2004-09-06 2006-04-13 Ricoh Co Ltd Scanner element, its adjusting method, optical scanner, and image forming apparatus
JP2006293116A (en) * 2005-04-13 2006-10-26 National Institute Of Advanced Industrial & Technology Optical scanning apparatus
JP2006343482A (en) * 2005-06-08 2006-12-21 Anritsu Corp Optical scanner
WO2010095587A1 (en) * 2009-02-18 2010-08-26 独立行政法人産業技術総合研究所 Light beam scanning device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006099045A (en) * 2004-09-06 2006-04-13 Ricoh Co Ltd Scanner element, its adjusting method, optical scanner, and image forming apparatus
JP2006293116A (en) * 2005-04-13 2006-10-26 National Institute Of Advanced Industrial & Technology Optical scanning apparatus
JP2006343482A (en) * 2005-06-08 2006-12-21 Anritsu Corp Optical scanner
WO2010095587A1 (en) * 2009-02-18 2010-08-26 独立行政法人産業技術総合研究所 Light beam scanning device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022176587A1 (en) * 2021-02-22 2022-08-25 パナソニックIpマネジメント株式会社 Drive element and light deflection element

Similar Documents

Publication Publication Date Title
JP5055832B2 (en) DRIVE DEVICE, OPTICAL SCANNING DEVICE, AND OBJECT INFORMATION DETECTING DEVICE
JP5229704B2 (en) Optical scanning device
JP4691704B2 (en) Optical scanning device
JP5446122B2 (en) Meander type vibrator and optical reflection element using the same
KR101343314B1 (en) light beam scanning device
JP4982814B2 (en) Optical beam scanning device
JP6278130B2 (en) Micro-optical electromechanical device and manufacturing method thereof
JP2005128147A (en) Optical deflector and optical apparatus using the same
JP2010217648A (en) Optical device, optical scanner and image forming apparatus
JP2010148265A (en) Meander type oscillator and optical reflective element using the same
JP2011180294A (en) Drive control device of optical scanning apparatus
JP4569932B1 (en) Assembly method of optical scanning device
JP2011100100A (en) Optical scanning device, image forming device and image projection device
WO2010050495A1 (en) Optical scanning apparatus
JP4794677B1 (en) Mirror amplitude control device for optical scanning device
JP2012163671A (en) Optical scanner
JP2009223115A (en) Optical reflecting element
JP2009210955A (en) Optical scanner
JP2009258339A (en) Optical reflection element
JP2011169927A (en) Optical scanner
JP4620789B1 (en) Optical scanning device
JP5713083B2 (en) Optical device, optical scanner, and image forming apparatus
JP5077139B2 (en) Optical reflection element
JP5239382B2 (en) Optical reflection element
JP2014153703A (en) Optical deflector

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120308

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120403

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20120731