JP2011127143A - Apparatus for generating fluorine gas - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To effectively use hydrogen fluoride condensed in the process of crudely refining of fluorine gas. <P>SOLUTION: An apparatus for generating fluorine gas is provided, including: an electrolytic cell 1, which includes a first gas chamber 11a where a main product gas essentially comprising fluorine gas generated on an anode 7 is introduced and a second gas chamber 12a where a byproduct gas essentially comprising hydrogen gas generated on a cathode 8 is introduced, both chambers segmented on a molten salt liquid surface; a hydrogen fluoride supply source 40 reserving hydrogen fluoride to be supplied to the electrolytic cell 1; and a crudely refining device 50 roughly refining fluorine gas by condensing hydrogen fluoride gas which is vaporized from the molten salt in the electrolytic cell 1 and mixed into the main product gas. The crudely refining device 50 includes: a hydrogen fluoride reservoir 51 capable of reserving hydrogen fluoride condensed while the main product gas passes; a cooling device 52 condensing the hydrogen fluoride gas in the main product gas by cooling the hydrogen fluoride reservoir 51 at a temperature equal to or higher than the melting point of hydrogen fluoride; and a recovering equipment 53 conveying and recovering the hydrogen fluoride reserved in the hydrogen fluoride reservoir 51 to the electrolytic cell 1 or the hydrogen fluoride supply source 40. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a fluorine gas generator.

  As a conventional fluorine gas generation apparatus, an apparatus that uses an electrolytic cell and generates fluorine gas by electrolysis is known.

  Patent Document 1 includes an electrolytic cell that electrolyzes hydrogen fluoride in a molten salt containing hydrogen fluoride, and generates a product gas mainly composed of fluorine gas in the first gas phase portion on the anode side, A fluorine gas generation device that generates a by-product gas mainly containing hydrogen gas in a second gas phase portion on the cathode side is disclosed.

  In this type of fluorine gas generator, hydrogen fluoride gas vaporized from molten salt is mixed into fluorine gas generated from the anode of the electrolytic cell. Therefore, it is necessary to purify the fluorine gas by separating hydrogen fluoride from the gas generated from the anode.

  As a crude purification of fluorine gas, a method is known in which fluorine gas is condensed by passing fluorine gas through a condenser set to about −80 ° C. which is lower than the melting point (−84 ° C.) of hydrogen fluoride.

JP 2004-43885 A

  Conventionally, in an apparatus for roughly refining fluorine gas, hydrogen fluoride condensed in the course of rough refining has been discharged without being used.

  The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a fluorine gas generation apparatus that can effectively use hydrogen fluoride condensed in the course of rough purification of fluorine gas. And

  The present invention relates to a fluorine gas generating device that generates fluorine gas by electrolyzing hydrogen fluoride in a molten salt, the fluorine generated at an anode in which the molten salt is stored and immersed in the molten salt. The first gas chamber in which main gas mainly composed of gas is guided and the second chamber in which by-product gas mainly composed of hydrogen gas generated at the cathode immersed in the molten salt is guided are melted. An electrolytic cell separated on the surface of the salt solution, a hydrogen fluoride supply source storing hydrogen fluoride for replenishing the electrolytic cell, and vaporized from the molten salt of the electrolytic cell and evaporated from the anode A crude refining device that condenses hydrogen fluoride gas mixed in the produced main raw gas to roughly purify fluorine gas, and the rough refining device passes the main raw gas as well as the main raw gas passes therethrough. Hydrogen fluoride storage tank that can store hydrogen fluoride condensed inside, A cooling device that condenses hydrogen fluoride gas mixed in the main raw gas by cooling the hydrogen fluoride storage tank at a temperature equal to or higher than the melting point of hydrogen fluoride, and hydrogen fluoride stored in the hydrogen fluoride storage tank And a recovery facility for transporting and recovering the product to the electrolytic cell or the hydrogen fluoride supply source.

  According to the present invention, the hydrogen fluoride condensed and stored in the rough purification apparatus is recovered in the electrolytic cell and reused to generate fluorine gas. It is possible to effectively use the hydrogen fluoride.

1 is a system diagram showing a fluorine gas generation device according to a first embodiment of the present invention. It is a systematic diagram which shows the other form of the fluorine gas production | generation apparatus which concerns on the 1st Embodiment of this invention. It is a systematic diagram which shows the fluorine gas production | generation apparatus which concerns on the 2nd Embodiment of this invention.

  Embodiments of the present invention will be described below with reference to the drawings.

<First Embodiment>
With reference to FIG. 1, a fluorine gas generation apparatus 100 according to a first embodiment of the present invention will be described.

  The fluorine gas generation device 100 generates fluorine gas by electrolysis and supplies the generated fluorine gas to the external device 4. The external device 4 is, for example, a semiconductor manufacturing device. In this case, fluorine gas is used as a cleaning gas, for example, in a semiconductor manufacturing process.

  The fluorine gas generation device 100 includes an electrolytic cell 1 that generates fluorine gas by electrolysis, a fluorine gas supply system 2 that supplies the fluorine gas generated from the electrolytic cell 1 to the external device 4, and the generation of fluorine gas. And a by-product gas processing system 3 for processing the generated by-product gas.

  First, the electrolytic cell 1 will be described.

  The electrolytic bath 1 stores a molten salt containing hydrogen fluoride (HF). In the present embodiment, a mixture (KF · 2HF) of hydrogen fluoride and potassium fluoride (KF) is used as the molten salt.

The inside of the electrolytic cell 1 is partitioned into an anode chamber 11 and a cathode chamber 12 by a partition wall 6 immersed in the molten salt. In the molten salt of the anode chamber 11 and the cathode chamber 12, the anode 7 and the cathode 8 are immersed, respectively. By supplying a current from the power source 9 between the anode 7 and the cathode 8, a main gas mainly composed of fluorine gas (F ₂ ) is generated at the anode 7, and hydrogen gas (H ₂ ) is generated at the cathode 8. By-product gas as a main component is generated. A carbon electrode is used for the anode 7, and soft iron, monel, or nickel is used for the cathode 8.

  On the surface of the molten salt solution in the electrolytic cell 1, a first gas chamber 11a into which fluorine gas generated at the anode 7 is guided, and a second gas chamber 12a into which hydrogen gas generated at the cathode 8 is guided. Are partitioned by the partition wall 6 so that the mutual gas cannot pass. As described above, the first air chamber 11a and the second air chamber 12a are completely separated by the partition wall 6 in order to prevent a reaction due to the contact of fluorine gas and hydrogen gas. On the other hand, the molten salt in the anode chamber 11 and the cathode chamber 12 is not separated by the partition wall 6 but communicates through the lower portion of the partition wall 6.

  Since the melting point of KF · 2HF is 71.7 ° C., the temperature of the molten salt is adjusted to 91 to 93 ° C. In each of the fluorine gas and the hydrogen gas generated from the anode 7 and the cathode 8 of the electrolytic cell 1, hydrogen fluoride is vaporized from the molten salt by the vapor pressure and mixed. As described above, each of the fluorine gas generated at the anode 7 and guided to the first air chamber 11a and the hydrogen gas generated at the cathode 8 and guided to the second air chamber 12a includes hydrogen fluoride gas. Yes.

  Next, the fluorine gas supply system 2 will be described.

  A first main passage 15 for supplying fluorine gas to the external device 4 is connected to the first air chamber 11a.

  The first main passage 15 is provided with a first pump 17 for deriving and transporting fluorine gas from the first air chamber 11a. As the first pump 17, a positive displacement pump such as a bellows pump or a diaphragm pump is used.

  A purification device 16 for collecting the hydrogen fluoride gas mixed in the fluorine gas and purifying the fluorine gas is provided upstream of the first pump 17 in the first main passage 15. The refining device 16 is a device that cools the fluorine gas at a temperature not lower than the boiling point of fluorine and not higher than the melting point of hydrogen fluoride so that the hydrogen gas mixed in the fluorine gas solidifies while the fluorine gas passes therethrough, or An apparatus is used in which hydrogen fluoride gas mixed in fluorine gas is adsorbed on an adsorbent such as sodium fluoride (NaF).

  Further, a rough purification device 50 for roughly purifying the fluorine gas by condensing the hydrogen fluoride gas mixed in the fluorine gas is provided upstream of the purification device 16 in the first main passage 15. As described above, the crude refining device 50 is a device for roughly refining fluorine gas as a stage before the main purification by the refining device 16. The coarse purification apparatus 50 will be described in detail later.

  Next, the byproduct gas processing system 3 will be described.

  A second main passage 30 for discharging hydrogen gas to the outside is connected to the second air chamber 12a.

  The second main passage 30 is provided with a second pump 31 for deriving and transporting hydrogen gas from the second air chamber 12a.

  An abatement part 34 is provided downstream of the second pump 31 in the second main passage 30, and the hydrogen gas transported by the second pump 31 is rendered harmless by the abatement part 34 and released.

  The fluorine gas generation device 100 also includes a raw material supply system 5 for supplying and replenishing hydrogen fluoride, which is a raw material of fluorine gas, in the molten salt of the electrolytic cell 1. Below, the raw material supply system 5 is demonstrated.

  The electrolytic cell 1 is connected to a hydrogen fluoride supply source 40 in which hydrogen fluoride for replenishing the electrolytic cell 1 is stored through a raw material supply passage 41. Hydrogen fluoride stored in the hydrogen fluoride supply source 40 is supplied into the molten salt of the electrolytic cell 1 through the raw material supply passage 41.

  The raw material supply passage 41 is connected to a carrier gas supply passage 46 that guides the carrier gas supplied from the carrier gas supply source 45 into the raw material supply passage 41. The carrier gas is a gas for introducing hydrogen fluoride into the molten salt, and nitrogen gas which is an inert gas is used. Nitrogen gas is supplied together with hydrogen fluoride into the molten salt in the cathode chamber 12, hardly dissolves in the molten salt, and is discharged from the second air chamber 12 a through the second main passage 30.

  Next, the rough purification apparatus 50 will be described.

  The crude refining apparatus 50 includes a hydrogen fluoride storage tank 51 capable of storing the hydrogen fluoride condensed while the fluorine gas passes, and the hydrogen fluoride storage tank 51 with a melting point (− 84 ° C.), the cooling device 52 that condenses the hydrogen fluoride gas mixed in the fluorine gas and the hydrogen fluoride stored in the hydrogen fluoride storage tank 51 are conveyed to the electrolytic cell 1. And a recovery facility 53 for recovery.

  The hydrogen fluoride storage tank 51 has a gas phase part 51a through which fluorine gas passes, and has a structure in which hydrogen fluoride condensed when fluorine gas passes through the gas phase part 51a is dropped and stored. Yes.

  The cooling device 52 includes a cooling tank 55 that partially stores the hydrogen fluoride storage tank 51, a supply / discharge system 56 that supplies and discharges the refrigerant to and from the cooling tank 55 through the refrigerant inlet pipe 56a and the refrigerant outlet pipe 56b, and supply of the refrigerant And a control device (not shown) for controlling the temperature of the hydrogen fluoride storage tank 51 by controlling the amount.

  The temperature of the hydrogen fluoride storage tank 51 is controlled to a temperature exceeding the melting point of hydrogen fluoride (−84 ° C.) so that the hydrogen fluoride does not solidify. The temperature of the molten salt (KF · 2HF) in the electrolytic cell 1 is 91 to 93 ° C., and the vapor pressure of KF · 2HF at 92 ° C. is 43.5 torr. The saturation temperature of hydrogen fluoride at a vapor pressure of 43.5 torr is −47 ° C. For this reason, since hydrogen fluoride is not liquefied at a temperature higher than −47 ° C., the temperature of the hydrogen fluoride storage tank 51 is controlled to be −47 ° C. or lower. That is, the temperature of the hydrogen fluoride storage tank 51 is such that the hydrogen fluoride gas mixed in the fluorine gas is condensed and the hydrogen fluoride stored in the condensed state is kept in a liquid state by the cooling device 52. It exceeds the melting point and is controlled to −47 ° C. or lower.

  Any refrigerant such as chlorofluorocarbon, ethanol, methanol, silicon, or trichlorethylene may be used as the coolant in the cooling tank 55 as long as it does not solidify at the operating temperature.

  In order to increase the condensation efficiency of hydrogen fluoride gas in the gas phase portion 51a of the hydrogen fluoride storage tank 51, the gas phase portion 51a may be filled with a metal filler such as Raschig ring. By filling the gas phase portion 51a with the metal filler, the metal filler is also cooled by the refrigerant. For this reason, when the fluorine gas passes through the gas phase portion 51a, the fluorine gas is also cooled by coming into contact with the metal filler, so that the hydrogen fluoride gas in the fluorine gas can be efficiently condensed.

  Further, the gas phase portion 51a may have a shell-and-tube configuration. That is, the gas phase part 51 a may be configured by a plurality of tubes, and the tubes may be cooled by the refrigerant in the cooling tank 55. By comprising in this way, since a heat-transfer area can be enlarged in a limited space, hydrogen fluoride can be condensed efficiently.

  The recovery equipment 53 is provided in the transfer passage 60 that connects the liquid phase part of the hydrogen fluoride storage tank 51 and the electrolytic cell 1, and the hydrogen fluoride stored in the hydrogen fluoride storage tank 51 is provided in the transfer passage 60. 1 is provided.

  The transfer pump 61 is activated to transfer hydrogen fluoride to the electrolytic cell 1 when the amount of hydrogen fluoride stored in the hydrogen fluoride storage tank 51 exceeds a predetermined amount. Thus, the hydrogen fluoride condensed in the hydrogen fluoride storage tank 51 is transported to the electrolytic cell 1 by the transport pump 61 and collected.

  The downstream end of the transfer passage 60 is preferably connected to the anode chamber 11 of the electrolytic cell 1, and the hydrogen fluoride transferred by the transfer pump 61 is collected in the anode chamber 11 of the electrolytic cell 1. This is because, in the configuration in which the downstream end of the transport passage 60 is connected to the cathode chamber 12 of the electrolytic cell 1, if the transport pump 61 sucks the fluorine gas in the gas phase part 51 a of the hydrogen fluoride storage tank 51, This is because the fluorine gas is conveyed to the cathode chamber 12 and may react with the hydrogen gas in contact with it.

  Next, the operation of the rough purification apparatus 50 will be described.

  The fluorine gas generated in the anode 7 of the electrolytic cell 1 flows into the rough purification apparatus 50. Since the temperature of the hydrogen fluoride storage tank 51 of the crude refining apparatus 50 is controlled to be −47 ° C. or lower by exceeding the melting point of hydrogen fluoride by the cooling apparatus 52, the fluorine gas is in the gas phase of the hydrogen fluoride storage tank 51. When passing through the part 51 a, the hydrogen fluoride gas in the fluorine gas is condensed and stored in the hydrogen fluoride storage tank 51. As described above, the fluorine gas is roughly purified in the hydrogen fluoride storage tank 51. The fluorine gas that has passed through the hydrogen fluoride storage tank 51 flows into the purifier 16 provided downstream and is purified. The crude refining device 50 roughly purifies fluorine gas as a previous stage of the refining device 16 and has a function of reducing the load on the refining device 16 that performs the main refining.

  The hydrogen fluoride condensed and stored in the hydrogen fluoride storage tank 51 exceeds the melting point of hydrogen fluoride by the cooling device 52 and is held at a temperature of −47 ° C. or lower. Thereby, the vapor pressure of hydrogen fluoride does not increase, and the stored hydrogen fluoride is prevented from being gasified again.

  When the amount of hydrogen fluoride stored in the hydrogen fluoride storage tank 51 exceeds a predetermined amount, the transport pump 61 is activated, and the hydrogen fluoride is transported to the electrolytic tank 1 and collected. As described above, the hydrogen fluoride condensed in the rough purification apparatus 50 is collected in the electrolytic cell 1 and reused to generate fluorine gas.

  According to the above embodiment, there exist the effects shown below.

  Since the hydrogen fluoride condensed and stored in the hydrogen fluoride storage tank 51 is recovered in the electrolytic tank 1 and reused to generate fluorine gas, it is condensed in the course of rough purification of fluorine gas. It becomes possible to use hydrogen fluoride effectively.

  Hereinafter, another embodiment of the first embodiment will be described.

  In the first embodiment, hydrogen fluoride is transported to the electrolytic cell 1 and collected. Instead, as shown in FIG. 2, hydrogen fluoride may be transported to the hydrogen fluoride supply source 40 and recovered. Even with this configuration, it is possible to effectively use the hydrogen fluoride condensed in the process of rough purification of the fluorine gas, as in the first embodiment.

<Second Embodiment>
With reference to FIG. 3, the fluorine gas production | generation apparatus 200 which concerns on the 2nd Embodiment of this invention is demonstrated.

  Below, it demonstrates centering on a different point from the said 1st Embodiment, and attaches | subjects the same code | symbol to the structure similar to 1st Embodiment, and abbreviate | omits description.

  The fluorine gas generation device 200 is different from the first embodiment in the configuration of the recovery facility 53. Hereinafter, the collection facility 53 will be described.

  The recovery equipment 53 temporarily transfers the hydrogen fluoride stored in the hydrogen fluoride storage tank 51 interposed between the transport passage 70 connecting the liquid phase part of the hydrogen fluoride storage tank 51 and the electrolytic cell 1 and the transport path 70. A hydrogen fluoride receiving tank 71 that receives and stores the hydrogen fluoride, and a transfer device 72 that transfers the hydrogen fluoride stored in the hydrogen fluoride receiving tank 71 to the electrolytic cell 1.

  The hydrogen fluoride stored in the hydrogen fluoride storage tank 51 is transferred to the hydrogen fluoride receiving tank 71 by a transfer pump 73 provided in the transfer passage 70. Instead of using the transfer pump 73, the hydrogen fluoride receiving tank 71 is provided below the hydrogen fluoride storing tank 51, and a valve is provided in a passage connecting the two, and the valve is opened, whereby the hydrogen fluoride storing tank The hydrogen fluoride stored in 51 may be transferred to the hydrogen fluoride receiving tank 71.

  The hydrogen fluoride receiving tank 71 is not cooled, and the internal hydrogen fluoride is stored at room temperature. Therefore, since the hydrogen fluoride stored in the hydrogen fluoride receiving tank 71 is higher in temperature than the hydrogen fluoride stored in the hydrogen fluoride storing tank 51, the vapor pressure is high.

  The transfer device 72 includes a carrier gas supply passage 76 that supplies a carrier gas into the hydrogen fluoride liquid stored in the hydrogen fluoride receiving tank 71. The upstream end of the carrier gas supply passage 76 is connected to the carrier gas supply source 75, and the discharge port at the downstream end is inserted into the hydrogen fluoride liquid in the hydrogen fluoride receiving tank 71. The carrier gas is a gas for transporting hydrogen fluoride to the electrolytic cell 1, and nitrogen gas that is an inert gas is used.

  The nitrogen gas supplied into the hydrogen fluoride liquid in the hydrogen fluoride receiving tank 71 through the carrier gas supply passage 76 is discharged from the hydrogen fluoride receiving tank 71 in a state containing hydrogen fluoride corresponding to the vapor pressure, and is transferred to the transfer passage 70. It is conveyed to the electrolytic cell 1 through. In addition, since the hydrogen fluoride stored in the hydrogen fluoride receiving tank 71 is stored at normal temperature and has a high vapor pressure, the amount of hydrogen fluoride contained in the nitrogen gas is relatively large. Thus, the transport device 72 transports hydrogen fluoride to the electrolytic cell 1 by supplying the carrier gas into the hydrogen fluoride liquid stored in the hydrogen fluoride receiving bath 71. That is, the carrier gas is continuously supplied into the hydrogen fluoride liquid in the hydrogen fluoride receiving tank 71, so that the hydrogen fluoride is continuously conveyed to the electrolytic cell 1.

  In this embodiment, since nitrogen gas is used as the carrier gas, the downstream end of the transfer passage 70 is connected to the cathode chamber 12 of the electrolytic cell 1, and the hydrogen fluoride stored in the hydrogen fluoride receiving tank 71 is the electrolytic cell 1. Is collected in the cathode chamber 12. Nitrogen gas is discharged from the second air chamber 12 a through the second main passage 30.

  According to the above embodiment, there exist the effects shown below.

  The hydrogen fluoride condensed and stored in the hydrogen fluoride storage tank 51 is transferred to the hydrogen fluoride receiving tank 71 and then continuously transferred to the electrolytic cell 1 by the carrier gas and collected. Thus, since the hydrogen fluoride condensed and stored in the hydrogen fluoride storage tank 51 is recovered in the electrolytic tank 1 and reused to generate fluorine gas, the process of rough purification of fluorine gas It is possible to effectively use the hydrogen fluoride condensed in the above.

  Hereinafter, another embodiment of the second embodiment will be described.

  In the second embodiment, nitrogen gas, which is an inert gas, is used as the carrier gas. Instead of this, fluorine gas (main gas) or hydrogen gas (by-product gas) may be used as the carrier gas. That is, any of fluorine gas, hydrogen gas, and inert gas is used as the carrier gas.

  When fluorine gas is used as the carrier gas, a buffer tank that stores fluorine gas may be provided downstream of the first pump 17, and the fluorine gas stored in the buffer tank may be used as the carrier gas. In this case, the downstream end of the transfer passage 70 is connected to the anode chamber 11 of the electrolytic cell 1, and the hydrogen fluoride stored in the hydrogen fluoride receiving tank 71 is collected in the anode chamber 11 of the electrolytic cell 1.

  When hydrogen gas is used as the carrier gas, a buffer tank that stores hydrogen gas may be provided downstream of the second pump 31, and the hydrogen gas stored in the buffer tank may be used as the carrier gas. In this case, the downstream end of the transfer passage 70 is connected to the cathode chamber 12 of the electrolytic cell 1, and the hydrogen fluoride stored in the hydrogen fluoride receiving vessel 71 is collected in the cathode chamber 12 of the electrolytic cell 1.

  In the second embodiment, the hydrogen fluoride stored in the hydrogen fluoride receiving tank 71 is recovered in the electrolytic cell 1 using the carrier gas. Instead, the hydrogen fluoride stored in the hydrogen fluoride receiving tank 71 may be recovered in the electrolytic cell 1 using a pump. In this case, since it can convey without using carrier gas, the collection destination of hydrogen fluoride can be made into the hydrogen fluoride supply source 40 instead of the electrolytic cell 1.

  The present invention is not limited to the above-described embodiment, and it is obvious that various modifications can be made within the scope of the technical idea.

  The present invention can be applied to an apparatus that generates fluorine gas.

DESCRIPTION OF SYMBOLS 100,200 Fluorine gas production | generation apparatus 1 Electrolysis tank 2 Fluorine gas supply system 3 By-product gas processing system 4 External apparatus 5 Raw material supply system 7 Anode 8 Cathode 11a 1st air chamber 12a 2nd air chamber 15 1st main channel | path 16 Purification apparatus 40 Hydrogen fluoride supply source 50 Rough purification device 51 Hydrogen fluoride storage tank 51a Gas phase section 52 Cooling device 53 Recovery equipment 55 Cooling tank 56 Supply / exhaust system 60 Transfer path 61 Transfer pump 70 Transfer path 71 Hydrogen fluoride receiving tank 72 Transfer apparatus 73 Transfer pump 75 Carrier gas supply source 76 Carrier gas supply passage

Claims (4)

A fluorine gas generator that generates fluorine gas by electrolyzing hydrogen fluoride in a molten salt,
A first air chamber in which a main gas mainly composed of fluorine gas generated in an anode immersed in the molten salt is introduced and hydrogen generated in the cathode immersed in the molten salt. An electrolytic cell in which a second gas chamber into which a by-product gas containing a gas as a main component is guided is separated on the surface of the molten salt solution;
A hydrogen fluoride supply source storing hydrogen fluoride for replenishing the electrolytic cell;
A crude refining device for condensing the hydrogen fluoride gas vaporized from the molten salt of the electrolytic cell and mixed with the main gas generated from the anode to roughly purify the fluorine gas,
The crude purification apparatus is
A hydrogen fluoride storage tank capable of storing hydrogen fluoride condensed while the main gas passes,
A cooling device for condensing the hydrogen fluoride gas mixed in the main gas by cooling the hydrogen fluoride storage tank at a temperature equal to or higher than the melting point of hydrogen fluoride;
A recovery facility for transporting and recovering hydrogen fluoride stored in the hydrogen fluoride storage tank to the electrolytic tank or the hydrogen fluoride supply source;
A fluorine gas generation device comprising: The recovery equipment is
A hydrogen fluoride receiving tank for temporarily receiving and storing hydrogen fluoride stored in the hydrogen fluoride storing tank;
A transport device for transporting hydrogen fluoride stored in the hydrogen fluoride receiving tank to the electrolytic tank or the hydrogen fluoride supply source;
The fluorine gas generation device according to claim 1, comprising:   3. The fluorine gas according to claim 2, wherein the transport device transports hydrogen fluoride to the electrolytic cell by supplying a carrier gas into a hydrogen fluoride solution stored in the hydrogen fluoride receiving bath. Generator.   The fluorine gas generation device according to claim 3, wherein any one of a main component gas, a by-product gas, and an inert gas is used as the carrier gas.

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