JP2011106915A - Zeta potential measuring instrument and zeta potential measuring method - Google Patents

Zeta potential measuring instrument and zeta potential measuring method Download PDF

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JP2011106915A
JP2011106915A JP2009260937A JP2009260937A JP2011106915A JP 2011106915 A JP2011106915 A JP 2011106915A JP 2009260937 A JP2009260937 A JP 2009260937A JP 2009260937 A JP2009260937 A JP 2009260937A JP 2011106915 A JP2011106915 A JP 2011106915A
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zeta potential
measurement object
reservoir
aperture
measurement
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JP5257900B2 (en
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Atsushi Yasuki
敦士 安喜
Naohiro Takahashi
直寛 高橋
Toru Maekawa
透 前川
Tatsuro Hanajiri
達郎 花尻
Tomofumi Ukai
智文 鵜飼
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Toyo University
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    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
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Abstract

【課題】小型且つ安価で、個々の測定対象物のゼータ電位を測定できるゼータ電位測定装置及びゼータ電位測定方法を提供する。
【解決手段】測定対象物が分散しているサンプル溶液200を収容し、第1のリザーバ11、第2のリザーバ12、及び第1のリザーバ11と第2のリザーバ12間を移動するサンプル溶液200中の測定対象物が通過し、測定対象物が移動する方向と垂直な断面積が第1のリザーバ11及び第2のリザーバ12より小さいアパーチャー13を有するマイクロチャネル10と、第1のリザーバ11と第2のリザーバ12間を流れる電流の電流値を測定する電流測定装置20と、電流値が一時的に減少する電流減少時間で測定対象物が通過するアパーチャー13の経路長を除算して測定対象物の電気泳動速度を算出し、電気泳動速度を用いて測定対象物のゼータ電位を算出する算出装置30とを備える。
【選択図】図1
Provided are a zeta potential measuring device and a zeta potential measuring method which are small and inexpensive and can measure the zeta potential of each measurement object.
A sample solution in which an object to be measured is dispersed is accommodated and moved between a first reservoir, a second reservoir, and between the first reservoir and the second reservoir. A microchannel 10 having an aperture 13 smaller than the first reservoir 11 and the second reservoir 12 in a cross-sectional area perpendicular to the direction in which the measurement object passes and the measurement object moves; The current measurement device 20 that measures the current value of the current flowing between the second reservoirs 12 and the measurement target by dividing the path length of the aperture 13 through which the measurement object passes by the current decrease time during which the current value temporarily decreases. And a calculation device 30 that calculates the electrophoresis speed of the object and calculates the zeta potential of the measurement object using the electrophoresis speed.
[Selection] Figure 1

Description

本発明は、溶液に分散された測定対象物のゼータ電位を測定するゼータ電位測定装置及びゼータ電位測定方法に関する。   The present invention relates to a zeta potential measuring device and a zeta potential measuring method for measuring a zeta potential of a measurement object dispersed in a solution.

溶液に分散した微粒子や細胞等の微小物体の表面が電荷を帯びている場合、これらの微小物体の帯電の度合いを示すのがゼータ電位である。微小物体のゼータ電位を測定するために、超音波や高周波電圧を利用した方法等、様々な測定方法が用いられてきた。代表的な方法として、レーザを用いたレーザドップラー法が挙げられる(例えば、特許文献1参照。)。   When the surface of a minute object such as fine particles or cells dispersed in a solution is charged, the zeta potential indicates the degree of charging of these minute objects. In order to measure the zeta potential of a minute object, various measuring methods such as a method using an ultrasonic wave or a high frequency voltage have been used. As a typical method, there is a laser Doppler method using a laser (for example, see Patent Document 1).

レーザドップラー法は、散乱光の周波数解析によってゼータ電位を測定する方法である。測定対象物が分散している溶液を測定セルに入れ、測定セル内部に電圧を印加し、微小物体を電気泳動させる。そして、測定セルの横からレーザを照射し、電気泳動している微小物体によって散乱された光を検出し、その周波数を解析することでゼータ電位を算出する。   The laser Doppler method is a method of measuring the zeta potential by frequency analysis of scattered light. A solution in which a measurement object is dispersed is placed in a measurement cell, a voltage is applied to the inside of the measurement cell, and a micro object is electrophoresed. Then, a zeta potential is calculated by irradiating a laser from the side of the measurement cell, detecting light scattered by the minute object being electrophoresed, and analyzing the frequency.

特許第2924815号公報Japanese Patent No. 2924815

しかしながら、従来のゼータ電位測定装置は大規模で高価なものが多い。例えば、上記のレーザドップラー法によるゼータ電位測定では、レーザ光源や光電子増倍管等の光学機器が必要であり、ゼータ電位測定装置の小型化や低価格化を困難にしている。また、上記の方法では、レーザを測定セルに照射し、照射された範囲に存在する測定対象物の散乱光を検知し解析することにより、ゼータ電位を算出する。このため、個々の微粒子や細胞のゼータ電位を測定することができないという問題があった。   However, many conventional zeta potential measuring devices are large and expensive. For example, the zeta potential measurement by the laser Doppler method requires optical devices such as a laser light source and a photomultiplier tube, which makes it difficult to reduce the size and cost of the zeta potential measuring device. In the above method, the zeta potential is calculated by irradiating the measurement cell with the laser and detecting and analyzing the scattered light of the measurement object existing in the irradiated range. For this reason, there has been a problem that the zeta potential of individual fine particles and cells cannot be measured.

上記問題点に鑑み、本発明は、小型且つ安価で、個々の測定対象物のゼータ電位を測定できるゼータ電位測定装置及びゼータ電位測定方法を提供することを目的とする。   In view of the above problems, an object of the present invention is to provide a zeta potential measuring apparatus and a zeta potential measuring method that are small and inexpensive and can measure the zeta potential of each measurement object.

本発明の一態様によれば、(イ)測定対象物が分散しているサンプル溶液を収容し、第1のリザーバ、第2のリザーバ、及び第1のリザーバと第2のリザーバ間を移動するサンプル溶液中の測定対象物が通過し、測定対象物が移動する方向と垂直な断面積が第1及び第2のリザーバより小さいアパーチャーを有するマイクロチャネルと、(ロ)第1及び第2のリザーバ間に電圧を印加して、第1及び第2のリザーバ間を流れる電流の電流値を一定時間測定する電流測定装置と、(ハ)一定時間のうちで電流値が一時的に減少する電流減少時間で測定対象物が通過するアパーチャーの経路長を除算して測定対象物の電気泳動速度を算出し、その電気泳動速度を用いて測定対象物のゼータ電位を算出する算出装置とを備えるゼータ電位測定装置が提供される。   According to one aspect of the present invention, (a) a sample solution in which an object to be measured is dispersed is accommodated and moved between a first reservoir, a second reservoir, and between the first reservoir and the second reservoir. A microchannel having an aperture smaller than the first and second reservoirs in cross-sectional area perpendicular to the direction in which the measurement object in the sample solution passes and moves, and (b) the first and second reservoirs A current measuring device that measures a current value of a current flowing between the first and second reservoirs by applying a voltage between them and (c) a current decrease in which the current value temporarily decreases within a certain time A zeta potential comprising a calculation device that calculates the electrophoresis speed of the measurement object by dividing the path length of the aperture through which the measurement object passes by time, and calculates the zeta potential of the measurement object using the electrophoresis speed Measuring device It is subjected.

本発明の他の態様によれば、(イ)測定対象物が分散しているサンプル溶液を収容し、第1のリザーバ、第2のリザーバ、及び第1のリザーバと第2のリザーバ間を移動するサンプル溶液中の測定対象物が通過し、測定対象物が移動する方向と垂直な断面積が第1及び第2のリザーバより小さいアパーチャーを備えたマイクロチャネルを用意するステップと、(ロ)第1及び第2のリザーバ間に電圧を印加して、第1及び第2のリザーバ間を流れる電流の電流値を一定時間測定するステップと、(ハ)一定時間のうちで電流値が一時的に減少する電流減少時間で測定対象物が通過するアパーチャーの経路長を除算して測定対象物の電気泳動速度を算出するステップと、(ニ)電気泳動速度を用いて測定対象物のゼータ電位を算出するステップとを含むゼータ電位測定方法が提供される。   According to another aspect of the present invention, (a) a sample solution in which an object to be measured is dispersed is accommodated and moved between the first reservoir, the second reservoir, and the first reservoir and the second reservoir. Providing a microchannel having an aperture smaller than the first and second reservoirs in cross-sectional area perpendicular to the direction in which the measurement object in the sample solution passes and the measurement object moves; Applying a voltage between the first and second reservoirs to measure a current value of a current flowing between the first and second reservoirs for a certain period of time; Calculate the electrophoresis speed of the measurement object by dividing the path length of the aperture through which the measurement object passes by the decreasing current reduction time, and (d) calculate the zeta potential of the measurement object using the electrophoresis speed. Step to do The zeta potential measuring method comprising is provided.

本発明によれば、小型且つ安価で、個々の測定対象物のゼータ電位を測定できるゼータ電位測定装置及びゼータ電位測定方法を提供できる。   According to the present invention, it is possible to provide a zeta potential measuring device and a zeta potential measuring method which are small and inexpensive and can measure the zeta potential of each measurement object.

本発明の実施形態に係るゼータ電位測定装置の構成を示す模式図である。It is a mimetic diagram showing the composition of the zeta potential measuring device concerning the embodiment of the present invention. 図1のII−II方向に沿った断面図である。It is sectional drawing along the II-II direction of FIG. 本発明の実施形態に係るゼータ電位測定装置のアパーチャーの構造を示す模式図である。It is a schematic diagram which shows the structure of the aperture of the zeta potential measuring device which concerns on embodiment of this invention. ゼータ電位を説明するための模式図である。It is a schematic diagram for demonstrating zeta potential. 微粒子が電場に沿って移動することを説明する模式図である。It is a schematic diagram explaining that microparticles | fine-particles move along an electric field. 本発明の実施形態に係るゼータ電位測定装置のマイクロチャネルを流れる電流を示す模式図である。It is a schematic diagram which shows the electric current which flows through the microchannel of the zeta potential measuring device which concerns on embodiment of this invention. 本発明の実施形態に係るゼータ電位測定装置のアパーチャーを微粒子が通過する例を示す模式図である。It is a schematic diagram which shows the example which microparticles | fine-particles pass through the aperture of the zeta potential measuring device which concerns on embodiment of this invention. 本発明の実施形態に係るゼータ電位測定装置によって測定される電流値の例を示す模式図である。It is a schematic diagram which shows the example of the electric current value measured by the zeta potential measuring device which concerns on embodiment of this invention. 本発明の実施形態に係るゼータ電位測定方法を説明するためのフローチャートである。It is a flowchart for demonstrating the zeta potential measurement method which concerns on embodiment of this invention. 本発明の実施形態に係るゼータ電位測定方法によって測定される電流値と時刻との関係を示すグラフである。It is a graph which shows the relationship between the electric current value measured by the zeta potential measuring method which concerns on embodiment of this invention, and time. 図10に示したグラフの一部を拡大したグラフである。It is the graph which expanded a part of graph shown in FIG. 本発明の実施形態に係るゼータ電位測定装置のマイクロチャネルをパーツ分けした状態を示す模式図である。It is a schematic diagram which shows the state which divided the microchannel of the zeta potential measuring device which concerns on embodiment of this invention. 本発明の実施形態に係るゼータ電位測定装置によって得られる測定対象物の直径と電流減少値の関係を示すグラフである。It is a graph which shows the relationship between the diameter of a measuring object obtained by the zeta potential measuring device concerning the embodiment of the present invention, and a current decrease value.

次に、図面を参照して、本発明の実施形態を説明する。以下の図面の記載において、同一又は類似の部分には同一又は類似の符号を付している。ただし、図面は模式的なものであり、厚みと平面寸法との関係、各層の厚みの比率等は現実のものとは異なることに留意すべきである。したがって、具体的な厚みや寸法は以下の説明を参酌して判断すべきものである。又、図面相互間においても互いの寸法の関係や比率が異なる部分が含まれていることはもちろんである。   Next, an embodiment of the present invention will be described with reference to the drawings. In the following description of the drawings, the same or similar parts are denoted by the same or similar reference numerals. However, it should be noted that the drawings are schematic, and the relationship between the thickness and the planar dimensions, the ratio of the thickness of each layer, and the like are different from the actual ones. Therefore, specific thicknesses and dimensions should be determined in consideration of the following description. Moreover, it is a matter of course that portions having different dimensional relationships and ratios are included between the drawings.

又、以下に示す実施形態は、この発明の技術的思想を具体化するための装置や方法を例示するものであって、この発明の実施形態は、構成部品の材質、形状、構造、配置等を下記のものに特定するものでない。この発明の実施形態は、特許請求の範囲において、種々の変更を加えることができる。   Further, the embodiments described below exemplify apparatuses and methods for embodying the technical idea of the present invention, and the embodiments of the present invention include the material, shape, structure, arrangement, etc. of the component parts. Is not specified as follows. The embodiment of the present invention can be variously modified within the scope of the claims.

(実施形態)
本発明の実施形態に係るゼータ電位測定装置1は、図1に示すように、微粒子や細胞等の測定対象物が分散しているサンプル溶液200を収容し、第1のリザーバ11、第2のリザーバ12、及び第1のリザーバ11と第2のリザーバ12間を移動するサンプル溶液200中の測定対象物が通過し、測定対象物が移動する方向と垂直な断面積が第1のリザーバ11及び第2のリザーバ12より小さいアパーチャー13を有するマイクロチャネル10と、第1のリザーバ11及び第2のリザーバ12間に電圧を印加して、第1のリザーバ11と第2のリザーバ12間を流れる電流の電流値を一定時間測定する電流測定装置20と、一定時間のうちで電流値が一時的に減少する電流減少時間で測定対象物が通過するアパーチャー13の経路長を除算して測定対象物の電気泳動速度を算出し、その電気泳動速度を用いて測定対象物のゼータ電位を算出する算出装置30とを備える。図1では、マイクロチャネル10の平面図を示している。
(Embodiment)
As shown in FIG. 1, a zeta potential measurement device 1 according to an embodiment of the present invention contains a sample solution 200 in which measurement objects such as fine particles and cells are dispersed, and includes a first reservoir 11 and a second reservoir. The cross-sectional area perpendicular to the direction in which the measurement object passes through the reservoir 12 and the sample solution 200 moving between the first reservoir 11 and the second reservoir 12 passes through the first reservoir 11 and A current flowing between the first reservoir 11 and the second reservoir 12 by applying a voltage between the first reservoir 11 and the second reservoir 12 and the microchannel 10 having an aperture 13 smaller than the second reservoir 12. The current measurement device 20 for measuring the current value of the aperture 13 and the path length of the aperture 13 through which the measurement object passes during the current decrease time during which the current value temporarily decreases within a certain time. And calculate the electrophoretic velocity of the measurement object, and a calculating device 30 for calculating the zeta potential of the measurement object by using the electrophoretic velocity. FIG. 1 shows a plan view of the microchannel 10.

マイクロチャネル10は、負電極201が配置された第1のリザーバ11と正電極202が配置された第2のリザーバ12、及び第1のリザーバ11と第2のリザーバ12間に配置されたアパーチャー13を構成する狭隘部からなる。後述するように、電流測定装置20によって負電極201と正電極202間に電圧が印加され、電流測定装置20は負電極201と正電極202間に流れる電流、即ちアパーチャー13を経由して第1のリザーバ11と第2のリザーバ12間を流れる電流の電流値を測定する。   The microchannel 10 includes a first reservoir 11 in which a negative electrode 201 is disposed, a second reservoir 12 in which a positive electrode 202 is disposed, and an aperture 13 disposed between the first reservoir 11 and the second reservoir 12. It consists of the narrow part which constitutes. As will be described later, a voltage is applied between the negative electrode 201 and the positive electrode 202 by the current measuring device 20, and the current measuring device 20 passes through the current flowing between the negative electrode 201 and the positive electrode 202, that is, the first through the aperture 13. The current value of the current flowing between the reservoir 11 and the second reservoir 12 is measured.

マイクロチャネル10は、例えば図2に示すように、表面にマイクロパターンが形成されたシリコンゴム101をガラス基板102に貼り付けた構造である。このシリコンゴム101の製造には、半導体装置の製造に用いられるフォトリソグラフィ技術等が採用可能である。第1のリザーバ11に設けられた開口部111において負電極201が第1のリザーバ11中のサンプル溶液200に接し、第2のリザーバ12に設けられた開口部121において正電極202が第2のリザーバ12中のサンプル溶液200に接する。   For example, as shown in FIG. 2, the microchannel 10 has a structure in which a silicon rubber 101 having a micropattern formed on its surface is attached to a glass substrate 102. The silicon rubber 101 can be manufactured using a photolithography technique or the like used for manufacturing a semiconductor device. The negative electrode 201 is in contact with the sample solution 200 in the first reservoir 11 in the opening 111 provided in the first reservoir 11, and the positive electrode 202 is in the second opening 121 in the second reservoir 12. Contact the sample solution 200 in the reservoir 12.

マイクロチャネル10は、例えば以下のような方法によって形成可能である。即ち、先ずシリコン基板上にフォトレジスト膜を塗布する。このフォトレジスト膜を、フォトリソグラフィ技術によって、第1のリザーバ11、第2のリザーバ12及びアパーチャー13を有するマイクロチャネル10の空洞形状に対応したパターンに形成する。そして、このフォトレジスト膜を金型としてシリコンゴムを流し込み、その後に硬化したシリコンゴムをシリコン基板から剥がす。これにより、第1のリザーバ11と第2のリザーバ12がアパーチャー13を介して接続されたパターンがシリコンゴム101の表面に形成される。第1のリザーバ11と第2のリザーバ12には、負電極201と正電極202を配置する開口部111、121がそれぞれ形成される。このシリコンゴム101をガラス基板102に貼り付けて、図1に示したマイクロチャネル10が形成される。   The microchannel 10 can be formed by the following method, for example. That is, first, a photoresist film is applied on a silicon substrate. This photoresist film is formed into a pattern corresponding to the cavity shape of the microchannel 10 having the first reservoir 11, the second reservoir 12, and the aperture 13 by photolithography. Then, silicon rubber is poured using this photoresist film as a mold, and then the cured silicon rubber is peeled off from the silicon substrate. As a result, a pattern in which the first reservoir 11 and the second reservoir 12 are connected via the aperture 13 is formed on the surface of the silicon rubber 101. In the first reservoir 11 and the second reservoir 12, openings 111 and 121 for disposing the negative electrode 201 and the positive electrode 202 are formed, respectively. The silicon rubber 101 is attached to the glass substrate 102 to form the microchannel 10 shown in FIG.

図3に示すように、アパーチャー13の幅wa、高さh、経路長laとする。なお、図1、図3に示したように、第1のリザーバ11及び第2のリザーバ12のアパーチャー13との接続部は、アパーチャー13に向かってなだらかに幅が狭くなって断面積が徐々に小さくなるように形成されている。これにより、測定対象物100や気泡が第1のリザーバ11及び第2のリザーバ12のアパーチャー13との接続部分に詰まることが防止され、測定精度を向上させることができる。 As shown in FIG. 3, the aperture 13 has a width w a , a height h, and a path length l a . As shown in FIGS. 1 and 3, the connection portion of the first reservoir 11 and the second reservoir 12 with the aperture 13 is gradually narrowed toward the aperture 13, and the cross-sectional area gradually increases. It is formed to be smaller. Thereby, it is prevented that the measurement object 100 and the bubbles are clogged in the connection portion between the first reservoir 11 and the aperture 13 of the second reservoir 12, and the measurement accuracy can be improved.

ゼータ電位は、溶液中の微粒子等の表面の帯電の度合いを示す。通常、溶液中に分散している微粒子等の表面は、正電位又は負電位に帯電している。例えば、図4はサンプル溶液200中の測定対象物100の表面が負電位に帯電している場合を示す。このため、測定対象物100の周囲には陽イオンが集まる。測定対象物100が帯電しているため、図5に示すように、正電極202と負電極201間に電圧を印加すると、測定対象物100は電場に沿ってサンプル溶液200中を移動する。このときの移動速度は、帯電の度合い、即ちゼータ電位に依存する。したがって、測定対象物100の移動速度を測定することによって、ゼータ電位を測定することができる。   The zeta potential indicates the degree of charging of the surface of fine particles or the like in the solution. Usually, the surface of fine particles or the like dispersed in a solution is charged to a positive potential or a negative potential. For example, FIG. 4 shows a case where the surface of the measuring object 100 in the sample solution 200 is charged to a negative potential. For this reason, cations gather around the measurement object 100. Since the measurement object 100 is charged, as shown in FIG. 5, when a voltage is applied between the positive electrode 202 and the negative electrode 201, the measurement object 100 moves in the sample solution 200 along the electric field. The moving speed at this time depends on the degree of charging, that is, the zeta potential. Therefore, the zeta potential can be measured by measuring the moving speed of the measuring object 100.

測定対象物100が分散されるサンプル溶液200には、電解質の溶液が使用される。このため、サンプル溶液200をマイクロチャネル10に収容し、第1のリザーバ11と第2のリザーバ12間に直流電圧を印加すると、図6に矢印で示したように、電流が正電極202からアパーチャー13を通過して負電極201に達し、一定の電流値を示す。図6は、サンプル溶液200に測定対象物100が分散されていない場合を示している。   An electrolyte solution is used as the sample solution 200 in which the measurement object 100 is dispersed. For this reason, when the sample solution 200 is accommodated in the microchannel 10 and a DC voltage is applied between the first reservoir 11 and the second reservoir 12, current flows from the positive electrode 202 to the aperture as shown by arrows in FIG. 13, reaches the negative electrode 201, and shows a constant current value. FIG. 6 shows a case where the measurement object 100 is not dispersed in the sample solution 200.

一方、サンプル溶液200に測定対象物100が分散されている場合には、既に説明したように、第1のリザーバ11と第2のリザーバ12間に電圧を印加すると測定対象物100は電場に沿って移動する。図7は、サンプル溶液200中の測定対象物100の表面が負電位に帯電している場合を示している。アパーチャー13内に測定対象物100が存在していない場合には、電流は図6に示した場合と同様に流れる。しかし、測定対象物100がアパーチャー13を通過する場合には、アパーチャー13を流れる電流の流れが妨げられる。このため、図8に示すように、アパーチャー13内に測定対象物100が存在する時間だけ、電流値が減少する。以下において、測定対象物100がアパーチャー13を通過することに起因する電流値の減少値を「電流減少値ΔI」、電流値が減少している時間を「電流減少時間Δt」という。アパーチャー13の経路長laを電流減少時間Δtで除算することによって、測定対象物100の電気泳動速度を算出できる。 On the other hand, when the measurement object 100 is dispersed in the sample solution 200, as described above, when a voltage is applied between the first reservoir 11 and the second reservoir 12, the measurement object 100 follows the electric field. Move. FIG. 7 shows a case where the surface of the measurement object 100 in the sample solution 200 is charged to a negative potential. When the measurement object 100 does not exist in the aperture 13, the current flows in the same manner as in the case shown in FIG. 6. However, when the measurement object 100 passes through the aperture 13, the flow of current flowing through the aperture 13 is hindered. For this reason, as shown in FIG. 8, the current value decreases for the time during which the measurement object 100 exists in the aperture 13. Hereinafter, the decrease value of the current value resulting from the measurement object 100 passing through the aperture 13 is referred to as “current decrease value ΔI”, and the time during which the current value is decreasing is referred to as “current decrease time Δt”. By dividing the path length l a of the aperture 13 by the current decrease time Δt, the electrophoresis speed of the measurement object 100 can be calculated.

以下に、図1に示したゼータ電位測定装置1によって、サンプル溶液200中に分散している測定対象物100のゼータ電位を測定する方法の例を、図9を参照して説明する。以下では、測定対象物100が直径3μmの微粒子であり、サンプル溶液200中の測定対象物100の表面は負電位に帯電しているとする。   Hereinafter, an example of a method for measuring the zeta potential of the measuring object 100 dispersed in the sample solution 200 by the zeta potential measuring device 1 shown in FIG. 1 will be described with reference to FIG. In the following, it is assumed that the measurement object 100 is a fine particle having a diameter of 3 μm, and the surface of the measurement object 100 in the sample solution 200 is charged to a negative potential.

(イ)ステップS1において、マイクロチャネル10を用意する。ここで、アパーチャー13の幅wa、高さh、経路長laは、それぞれ5μm、10μm、40μmである。 (A) In step S1, the microchannel 10 is prepared. Here, the width w a , height h, and path length l a of the aperture 13 are 5 μm, 10 μm, and 40 μm, respectively.

(ロ)ステップS2において、マイクロチャネル10内に、例えば2−メタクリロイルオキシエチルホスホリルコリン(2-methacryloyloxyethyl phosphorylcholine)をコーティング液として注入し、マイクロチャネル10のサンプル溶液200に接する表面にポリマーコーティングを施す。これにより、ガラス基板102に測定対象物100が付着することを防止でき、更に、マイクロチャネル10表面のサンプル溶液200によるゼータ電位を抑え、測定対象物100のゼータ電位測定の妨げとなる電気浸透流の影響を最小限にできる。ポリマーコーティングを施すために、例えば24時間程度、マイクロチャネル10内にコーティング液を収容する。   (B) In step S2, for example, 2-methacryloyloxyethyl phosphorylcholine is injected into the microchannel 10 as a coating solution, and a polymer coating is applied to the surface of the microchannel 10 that contacts the sample solution 200. As a result, the measurement object 100 can be prevented from adhering to the glass substrate 102, and the zeta potential due to the sample solution 200 on the surface of the microchannel 10 can be suppressed to prevent measurement of the zeta potential of the measurement object 100. Can be minimized. In order to apply the polymer coating, the coating liquid is accommodated in the microchannel 10 for about 24 hours, for example.

(ハ)マイクロチャネル10内のコーティング液をリン酸塩緩衝液等の緩衝液で置換し、マイクロチャネル10内部からコーティング液を排出する。マイクロチャネル10内部から緩衝液を排出後、ステップS3において、測定対象物100が分散しているサンプル溶液200をマイクロチャネル10内に収容する。   (C) The coating solution in the microchannel 10 is replaced with a buffer solution such as a phosphate buffer, and the coating solution is discharged from the inside of the microchannel 10. After discharging the buffer solution from the inside of the microchannel 10, the sample solution 200 in which the measurement object 100 is dispersed is accommodated in the microchannel 10 in step S3.

(ニ)ステップS4において、電流測定装置20が、第1のリザーバ11と第2のリザーバ12間に、例えば30Vの直流電圧を印加する。電流測定装置20は、サンプル溶液200中を負電極201と正電極202間を流れる電流の電流値Iを、一定時間にわたって測定する。サンプル溶液200中に分散している測定対象物100の表面は負電位に帯電しているため、測定対象物100は電気泳動によって、アパーチャー13を通過して、第1のリザーバ11から第2のリザーバ12に移動する。測定された電流値Iの例を、図10に示す。既に説明したように、アパーチャー13内に存在する測定対象物100によってアパーチャー13を流れる電流の流れが妨げられるため、測定対象物100がアパーチャー13を通過するたびに、図10に符号Dで示すように、測定される電流値Iは減少する。図11に、図10の時刻8.18秒前後における電流減少値ΔIを示す。既に説明したように、電流値Iの電流減少時間Δtは、測定対象物100がアパーチャー13内に滞在する時間である。観測された電流減少値ΔIは、算出装置30に送信される。   (D) In step S <b> 4, the current measuring device 20 applies a DC voltage of, for example, 30 V between the first reservoir 11 and the second reservoir 12. The current measuring device 20 measures the current value I of the current flowing between the negative electrode 201 and the positive electrode 202 in the sample solution 200 over a certain period of time. Since the surface of the measurement object 100 dispersed in the sample solution 200 is charged to a negative potential, the measurement object 100 passes through the aperture 13 by electrophoresis and is transferred from the first reservoir 11 to the second reservoir. Move to reservoir 12. An example of the measured current value I is shown in FIG. As already described, since the flow of the current flowing through the aperture 13 is hindered by the measurement object 100 existing in the aperture 13, as the measurement object 100 passes through the aperture 13, as indicated by D in FIG. 10. In addition, the measured current value I decreases. FIG. 11 shows the current decrease value ΔI at around time 8.18 seconds in FIG. As already described, the current decrease time Δt of the current value I is the time during which the measurement object 100 stays in the aperture 13. The observed current decrease value ΔI is transmitted to the calculation device 30.

(ホ)ステップS5において、算出装置30が、電流減少時間Δtでアパーチャー13の経路長laを除算して、測定対象物100の電気泳動速度Sを算出する。即ち、S=la/Δtである。 (E) In step S5, calculation device 30, by dividing the path length l a of the aperture 13 in the current decreasing time Delta] t, to calculate the electrophoretic velocity S of the measuring object 100. That is, S = l a / Δt.

(ヘ)ステップS6において、算出装置30が電気泳動速度Sを用いて、測定対象物100の電気泳動移動度及びゼータ電位を算出する。   (F) In step S6, the calculation device 30 calculates the electrophoretic mobility and the zeta potential of the measurement object 100 using the electrophoresis speed S.

電気泳動移動度Uは、電気泳動速度Sをアパーチャー13内の電場の強さで除算して算出される。また、ゼータ電位ζは、例えば以下の式(1)に示すスモルコフスキーの式を利用した既知の関係式によって、算出される:

U=(ε/η)ζ ・・・(1)

式(1)で、Uは測定対象物100の電気泳動移動度、ε、ηはそれぞれサンプル溶液200の誘電率、粘性係数である。
The electrophoretic mobility U is calculated by dividing the electrophoretic velocity S by the strength of the electric field in the aperture 13. The zeta potential ζ is calculated by a known relational expression using, for example, the Smolkovsky equation shown in the following equation (1):

U = (ε / η) ζ (1)

In Equation (1), U is the electrophoretic mobility of the measurement object 100, and ε and η are the dielectric constant and viscosity coefficient of the sample solution 200, respectively.

上記に説明したゼータ電位測定装置1を使用した実験によって測定されたゼータ電位が−31.09(±3.12)mVであったのに対し、既知のレーザドップラー法で測定したゼータ電位は、−33.35(±2.42)mVであった。このように、本発明の実施形態に係るゼータ電位測定装置1によって得られるゼータ電位は、既知の測定方法による測定結果とよく一致することが確認された。   While the zeta potential measured by the experiment using the zeta potential measuring apparatus 1 described above was −31.09 (± 3.12) mV, the zeta potential measured by the known laser Doppler method is It was −33.35 (± 2.42) mV. Thus, it was confirmed that the zeta potential obtained by the zeta potential measuring device 1 according to the embodiment of the present invention is in good agreement with the measurement result obtained by a known measurement method.

なお、測定対象物100が移動する方向と垂直なアパーチャー13の断面積が測定対象物100の粒径Mより大きくなければならないのはもちろんであるが、ゼータ電位を正確に測定するためには、一度にアパーチャー13を通過する測定対象物100は1個である必要がある。このため、例えばアパーチャー13の幅waは、M<wa<2×M程度であることが好ましい。つまり、アパーチャー13の断面積は、測定対象物100の直径より大きいが、2つの測定対象物100が横に並んで通過できない程度であることが好ましい。 Of course, the cross-sectional area of the aperture 13 perpendicular to the direction in which the measuring object 100 moves must be larger than the particle size M of the measuring object 100. In order to accurately measure the zeta potential, One measurement object 100 needs to pass through the aperture 13 at a time. Thus, for example, the width w a of the aperture 13, M <w a <is preferably about 2 × M. That is, the cross-sectional area of the aperture 13 is larger than the diameter of the measurement object 100, but it is preferable that the two measurement objects 100 cannot pass side by side.

また、アパーチャー13の経路長laが長すぎると、複数の測定対象物100が同時にアパーチャー13内に滞在する確率が高くなる。一方、経路長laが短すぎると、アパーチャー13に測定対象物100が滞在する時間が短くなりすぎて、測定の精度が低下する。例えば測定対象物100の直径が数μmである場合には、経路長laが20μm〜40μm程度であることが好ましいことが実験的に得られている。 In addition, if the path length l a of the aperture 13 is too long, the probability that a plurality of measurement objects 100 stay in the aperture 13 at the same time increases. On the other hand, when the path length l a is too short, the time that the measuring object 100 to the aperture 13 to stay is too short, the accuracy of the measurement is reduced. If for example a diameter of several μm of the measuring object 100, have been obtained experimentally that it is preferable path length l a of about 20Myuemu~40myuemu.

したがって、測定対象物100の粒径やサンプル溶液200の電気伝導率、サンプル溶液200中の測定対象物100の濃度等を考慮して、アパーチャー13の幅wa、高さh、経路長laを適宜設定すればよい。 Therefore, the width w a , height h, and path length l a of the aperture 13 are taken into consideration in consideration of the particle size of the measurement object 100, the electrical conductivity of the sample solution 200, the concentration of the measurement object 100 in the sample solution 200, and the like. May be set as appropriate.

また、以下に説明するように、図1に示したゼータ電位測定装置1によって、測定対象物100の粒径を測定することができる。   Further, as described below, the particle size of the measurement object 100 can be measured by the zeta potential measurement device 1 shown in FIG.

マイクロチャネル10を、図12に示すようにパーツ分けし、サンプル溶液200が収容されたマイクロチャネル10の各パーツにおける電気抵抗を考える。ここで、アパーチャー部分P13における電気抵抗を抵抗Raとする。そして、第1のリザーバ11と第2のリザーバ12の直方体部分P111、P121における電気抵抗を抵抗Rcとし、アパーチャー13との接続部分P112、P122における電気抵抗を抵抗Rbとする。 The microchannel 10 is divided into parts as shown in FIG. 12, and electrical resistance in each part of the microchannel 10 in which the sample solution 200 is accommodated is considered. Here, the electrical resistance in the aperture portion P 13 and the resistor Ra. The electrical resistance at the rectangular parallelepiped portions P 111 and P 121 of the first reservoir 11 and the second reservoir 12 is defined as resistance Rc, and the electrical resistance at the connection portions P 112 and P 122 connected to the aperture 13 is defined as resistance Rb.

アパーチャー13内に測定対象物100が存在していない場合の、抵抗Ra、Rb、Rcは、以下の式(2)〜式(4)で表される:

Ra=la/(σhwa) ・・・(2)
Rb=lb/{σh(wc−wa)}×ln(wc/wa) ・・・(3)
Rc=lc/(σhwc) ・・・(4)

ここで、σはサンプル溶液200の電気伝導率、la、waはアパーチャー部分P13の経路長と幅、lbは接続部分P112、P122の経路長、lc、wcは直方体部分P111、P121の経路長と幅、hはマイクロチャネル10の高さである。
Resistance Ra, Rb, Rc when the measuring object 100 does not exist in the aperture 13 is represented by the following formulas (2) to (4):

Ra = l a / (σhw a ) (2)
Rb = l b / {σh (w c −w a )} × ln (w c / w a ) (3)
Rc = l c / (σhw c ) (4)

Here, σ is the electrical conductivity of the sample solution 200, l a and w a are the path length and width of the aperture part P 13 , l b is the path length of the connection parts P 112 and P 122 , and l c and w c are rectangular parallelepipeds. The path lengths and widths of the portions P 111 and P 121 , h is the height of the microchannel 10.

一方、アパーチャー13に測定対象物100が存在する場合におけるアパーチャー13の電気抵抗を抵抗Raaとすると、抵抗Raaは以下の式(5)で表される:

Raa=2arctan{(φ/2)/(hwa/π−(φ/2)21/2}/[ σ{π(hwa−π(φ/2)2)}1/2]+(la−φ)/(σhwa) ・・・(5)

式(5)で、φは測定対象物100の直径である。
On the other hand, when the electrical resistance of the aperture 13 when the measurement object 100 exists in the aperture 13 is a resistance Raa, the resistance Raa is expressed by the following equation (5):

Raa = 2arctan {(φ / 2) / (hw a / π− (φ / 2) 2 ) 1/2 } / [σ {π (hw a −π (φ / 2) 2 )} 1/2 ] + (L a −φ) / (σhw a ) (5)

In Expression (5), φ is the diameter of the measurement object 100.

アパーチャー13に測定対象物100が存在しない場合のマイクロチャネル10全体の抵抗R1は以下の式(6)で表され、アパーチャー13に測定対象物100が存在する場合のマイクロチャネル10全体の抵抗R2は以下の式(7)で表される:

R1=Ra+2×(Rb+Rc) ・・・(6)
R2=Raa+2×(Rb+Rc) ・・・(7)
The resistance R1 of the entire microchannel 10 when the measurement object 100 is not present in the aperture 13 is expressed by the following equation (6). The resistance R2 of the entire microchannel 10 when the measurement object 100 is present in the aperture 13 is It is represented by the following formula (7):

R1 = Ra + 2 × (Rb + Rc) (6)
R2 = Raa + 2 × (Rb + Rc) (7)

第1のリザーバ11と第2のリザーバ12間に印加される印加電圧V、電流減少値ΔIを用いて、以下の式(8)の関係が成立する:

V/R1−V/R2=ΔI ・・・(8)
Using the applied voltage V and the current decrease value ΔI applied between the first reservoir 11 and the second reservoir 12, the relationship of the following equation (8) is established:

V / R1−V / R2 = ΔI (8)

式(2)〜式(8)を用いて、測定対象物100の直径φを算出することができる。測定対象物100の直径φを算出した例を図13に示す。図13は、測定対象物100の直径φと電流減少値ΔIの関係を示すグラフであり、計算により算出された値を実線で示している。   The diameter φ of the measuring object 100 can be calculated using the equations (2) to (8). An example in which the diameter φ of the measurement object 100 is calculated is shown in FIG. FIG. 13 is a graph showing the relationship between the diameter φ of the measurement object 100 and the current decrease value ΔI, and the value calculated by calculation is shown by a solid line.

また、図13において点で示した値は、直径が2μm及び3μmの微粒子を測定対象物100として使用し、ゼータ電位測定装置1による電流減少値ΔIの測定を行なって得られた測定結果である。図13に示すように、測定結果と計算結果はよく一致する。したがって、図1に示したゼータ電位測定装置1によって、粒径を測定することができることが確認された。   Further, the values indicated by dots in FIG. 13 are measurement results obtained by measuring the current decrease value ΔI by the zeta potential measurement device 1 using fine particles having diameters of 2 μm and 3 μm as the measurement object 100. . As shown in FIG. 13, the measurement result and the calculation result are in good agreement. Therefore, it was confirmed that the particle size can be measured by the zeta potential measuring device 1 shown in FIG.

上記では、測定対象物100が微粒子である場合を説明したが、本発明の実施形態に係るゼータ電位測定装置1は、単一細胞のゼータ電位の測定も行なうことができる。細胞のゼータ電位は、細胞表面の生化学反応と密接に関係している。例えば、羊由来の赤血球をウサギ由来の抗羊赤血球IgGと反応させ、ゼータ電位測定装置1によって電気泳動移動度を測定した。その結果、フローサイトメータにより測定した細胞表面に付着した抗体の数量と電気泳動移動度に相関があることが明らかになった。ここで、電気泳動移動度Uは、上記の式(1)で表される。したがって、図1に示したゼータ電位測定装置1を用いたゼータ電位測定方法により、細胞表面で起こる抗原抗体反応等の生化学反応を評価できることがわかった。   Although the case where the measurement object 100 is a fine particle has been described above, the zeta potential measurement device 1 according to the embodiment of the present invention can also measure the zeta potential of a single cell. The zeta potential of cells is closely related to cell surface biochemical reactions. For example, sheep-derived erythrocytes were reacted with rabbit-derived anti-sheep erythrocytes IgG, and the electrophoretic mobility was measured by the zeta potential measuring device 1. As a result, it was clarified that there was a correlation between the number of antibodies attached to the cell surface measured by a flow cytometer and the electrophoretic mobility. Here, the electrophoretic mobility U is represented by the above formula (1). Therefore, it was found that a biochemical reaction such as an antigen-antibody reaction occurring on the cell surface can be evaluated by the zeta potential measurement method using the zeta potential measurement apparatus 1 shown in FIG.

測定対象物100として赤血球をリン酸緩衝液に分散したサンプル溶液200を使用して、ゼータ電位を測定する実験を行なった。図1に示したゼータ電位測定装置1を用いた測定では、ゼータ電位が−12.83(±1.01)mVであったのに対し、既知のレーザドップラー法で測定したゼータ電位は、−15.39(±0.45)mVであった。このように、ゼータ電位測定装置1によって得られる赤血球のゼータ電位は、既知の測定方法による測定結果とよく一致することが確認された。   Using the sample solution 200 in which red blood cells were dispersed in a phosphate buffer as the measurement object 100, an experiment for measuring the zeta potential was performed. In the measurement using the zeta potential measuring apparatus 1 shown in FIG. 1, the zeta potential was −12.83 (± 1.01) mV, whereas the zeta potential measured by the known laser Doppler method was − It was 15.39 (± 0.45) mV. Thus, it was confirmed that the zeta potential of erythrocytes obtained by the zeta potential measuring device 1 is in good agreement with the measurement result obtained by a known measuring method.

既に説明したゼータ電位測定装置1を用いた測定例では、測定対象物100が直径3μm程度である。このため、アパーチャー13の幅waや高さhは、例えばwa=5μm、h=10μm程度に設定された。しかし、電子線描画法等によって更に微細な加工をガラス基板102に施すことにより、アパーチャー13の幅waや高さhがナノメートルオーダーであるナノチャネルを作成することが可能である。例えば、アパーチャー13の幅waや高さhを100nm以下にすることができる。このナノチャネルにDNAやたんぱく質等の生体分子やナノ粒子を分散したサンプル溶液200を収容し、ゼータ電位測定装置1を用いて、これらのナノ物質の個々の数量、サイズ、ゼータ電位を測定することができる。 In the measurement example using the zeta potential measurement device 1 already described, the measurement object 100 has a diameter of about 3 μm. For this reason, the width w a and the height h of the aperture 13 are set to, for example, about w a = 5 μm and h = 10 μm. However, by performing further fine processing by electron beam lithography or the like on a glass substrate 102, the width w a and the height h of the aperture 13 it is possible to create nanochannels a nanometer order. For example, the width w a and the height h of the aperture 13 can be set to 100 nm or less. A sample solution 200 in which biomolecules such as DNA and protein and nanoparticles are dispersed is accommodated in the nanochannel, and the individual quantity, size, and zeta potential of these nanomaterials are measured using the zeta potential measuring device 1. Can do.

以上に説明したように、本発明の実施形態に係るゼータ電位測定装置1によれば、溶液中に分散している個々の微粒子や細胞等のゼータ電位を測定することができる。また、アパーチャー13を流れる電流の減少値の大きさを用いて、ゼータ電位測定と同時に測定対象の微粒子等の直径を測定することができる。   As described above, according to the zeta potential measuring device 1 according to the embodiment of the present invention, zeta potentials of individual fine particles and cells dispersed in the solution can be measured. In addition, the diameter of the fine particles to be measured can be measured simultaneously with the zeta potential measurement by using the magnitude of the decrease value of the current flowing through the aperture 13.

更に、図1に示したゼータ電位測定装置1に使用されるマイクロチャネル10は構造が単純で材料費も安いため、小型のゼータ電位測定装置を安価に提供することができる。したがって、本発明の実施形態に係るゼータ電位測定装置1によれば、小型且つ安価で、個々の測定対象物100のゼータ電位を測定できるゼータ電位測定装置及びゼータ電位測定方法を提供することができる。   Furthermore, since the microchannel 10 used in the zeta potential measuring device 1 shown in FIG. 1 has a simple structure and low material cost, a small zeta potential measuring device can be provided at low cost. Therefore, according to the zeta potential measuring device 1 according to the embodiment of the present invention, it is possible to provide a zeta potential measuring device and a zeta potential measuring method that are small and inexpensive and can measure the zeta potential of each measurement object 100. .

上記のように、本発明は実施形態によって記載したが、この開示の一部をなす論述及び図面はこの発明を限定するものであると理解すべきではない。この開示から当業者には様々な代替実施形態、実施例及び運用技術が明らかとなろう。つまり、本発明はここでは記載していない様々な実施形態等を含むことは勿論である。したがって、本発明の技術的範囲は上記の説明から妥当な特許請求の範囲に係る発明特定事項によってのみ定められるものである。   As mentioned above, although this invention was described by embodiment, it should not be understood that the description and drawing which form a part of this indication limit this invention. From this disclosure, various alternative embodiments, examples and operational techniques will be apparent to those skilled in the art. In other words, the present invention includes various embodiments and the like not described here. Therefore, the technical scope of the present invention is defined only by the invention specifying matters according to the scope of claims reasonable from the above description.

本発明のゼータ電位測定装置及びゼータ電位測定方法は、溶液中に分散した微粒子や細胞等の微少物体表面の電気的特性を利用する用途に利用可能である。例えば、コロイド溶液の分散性の評価、細胞膜の構造解析、廃水処理法の開発や製紙用添加剤の検証等への応用が可能である。   The zeta potential measuring device and the zeta potential measuring method of the present invention can be used for applications utilizing the electrical characteristics of the surface of a minute object such as fine particles or cells dispersed in a solution. For example, it can be applied to evaluation of dispersibility of colloidal solutions, structural analysis of cell membranes, development of wastewater treatment methods, verification of papermaking additives, and the like.

1…ゼータ電位測定装置
10…マイクロチャネル
11…第1のリザーバ
12…第2のリザーバ
13…アパーチャー
20…電流測定装置
30…算出装置
100…測定対象物
101…シリコンゴム
102…ガラス基板
111、121…開口部
200…サンプル溶液
201…負電極
202…正電極
DESCRIPTION OF SYMBOLS 1 ... Zeta potential measuring device 10 ... Micro channel 11 ... 1st reservoir 12 ... 2nd reservoir 13 ... Aperture 20 ... Current measuring device 30 ... Calculation device 100 ... Measurement object 101 ... Silicon rubber 102 ... Glass substrate 111, 121 ... Opening part 200 ... Sample solution 201 ... Negative electrode 202 ... Positive electrode

Claims (7)

測定対象物が分散しているサンプル溶液を収容し、第1のリザーバ、第2のリザーバ、及び前記第1のリザーバと前記第2のリザーバ間を移動する前記サンプル溶液中の前記測定対象物が通過し、前記測定対象物が移動する方向と垂直な断面積が前記第1及び第2のリザーバより小さいアパーチャーを有するマイクロチャネルと、
前記第1及び第2のリザーバ間に電圧を印加して、前記第1及び第2のリザーバ間を流れる電流の電流値を一定時間測定する電流測定装置と、
前記一定時間のうちで前記電流値が一時的に減少する電流減少時間で前記測定対象物が通過する前記アパーチャーの経路長を除算して前記測定対象物の電気泳動速度を算出し、該電気泳動速度を用いて前記測定対象物のゼータ電位を算出する算出装置と
を備えることを特徴とするゼータ電位測定装置。
The measurement object in the sample solution containing the sample solution in which the measurement object is dispersed and moving between the first reservoir, the second reservoir, and the first reservoir and the second reservoir is provided. A microchannel having an aperture smaller than the first and second reservoirs in a cross-sectional area passing through and perpendicular to a direction in which the measurement object moves,
A current measuring device that applies a voltage between the first and second reservoirs and measures a current value of a current flowing between the first and second reservoirs for a certain period of time;
The electrophoresis speed of the measurement object is calculated by dividing the path length of the aperture through which the measurement object passes by the current decrease time during which the current value temporarily decreases within the fixed time, and the electrophoresis A zeta potential measurement device comprising: a calculation device that calculates a zeta potential of the measurement object using a velocity.
前記第1及び第2のリザーバの前記アパーチャーとの接続部が、前記アパーチャーに向かって徐々に断面積が小さくなる構造であることを特徴とする請求項1に記載のゼータ電位測定装置。   2. The zeta potential measuring device according to claim 1, wherein a connection portion of the first and second reservoirs with the aperture has a structure in which a cross-sectional area gradually decreases toward the aperture. 前記マイクロチャネルの前記サンプル溶液に接する表面にポリマーコーティングが施されていることを特徴とする請求項1又は2に記載のゼータ電位測定装置。   3. The zeta potential measuring device according to claim 1, wherein a polymer coating is applied to a surface of the microchannel that contacts the sample solution. 4. 前記算出装置が、前記電流減少時間における前記電流値の減少値と前記マイクロチャネル中の前記サンプル溶液の電気抵抗を用いて、前記測定対象物の粒径を算出することを特徴とする請求項1乃至3のいずれか1項に記載のゼータ電位測定装置。   The calculation device calculates a particle size of the measurement object using a decrease value of the current value during the current decrease time and an electric resistance of the sample solution in the microchannel. The zeta potential measuring device according to any one of items 1 to 3. 測定対象物が分散しているサンプル溶液を収容し、第1のリザーバ、第2のリザーバ、及び前記第1のリザーバと前記第2のリザーバ間を移動する前記サンプル溶液中の前記測定対象物が通過し、前記測定対象物が移動する方向と垂直な断面積が前記第1及び第2のリザーバより小さいアパーチャーを備えたマイクロチャネルを用意するステップと、
前記第1及び第2のリザーバ間に電圧を印加して、前記第1及び第2のリザーバ間を流れる電流の電流値を一定時間測定するステップと、
前記一定時間のうちで前記電流値が一時的に減少する電流減少時間で前記測定対象物が通過する前記アパーチャーの経路長を除算して前記測定対象物の電気泳動速度を算出するステップと、
前記電気泳動速度を用いて前記測定対象物のゼータ電位を算出するステップと
を含むことを特徴とするゼータ電位測定方法。
The measurement object in the sample solution containing the sample solution in which the measurement object is dispersed and moving between the first reservoir, the second reservoir, and the first reservoir and the second reservoir is provided. Providing a microchannel having an aperture that is smaller than the first and second reservoirs and has a cross-sectional area passing through and perpendicular to a direction in which the measurement object moves;
Applying a voltage between the first and second reservoirs and measuring a current value of a current flowing between the first and second reservoirs for a predetermined time;
Dividing the path length of the aperture through which the measurement object passes by a current decrease time during which the current value temporarily decreases within the predetermined time, and calculating an electrophoresis speed of the measurement object;
Calculating the zeta potential of the measurement object using the electrophoresis speed. The zeta potential measurement method comprising:
前記マイクロチャネルの前記サンプル溶液に接する表面にポリマーコーティングを施すステップを更に含むことを特徴とする請求項5に記載のゼータ電位測定方法。   The zeta potential measurement method according to claim 5, further comprising applying a polymer coating to a surface of the microchannel that contacts the sample solution. 前記電流減少時間における前記電流値の減少値と前記マイクロチャネル中の前記サンプル溶液の電気抵抗を用いて、前記測定対象物の粒径を算出するステップを更に含むことを特徴とする請求項5又は6に記載のゼータ電位測定方法。   6. The method according to claim 5, further comprising the step of calculating a particle size of the measurement object using a decrease value of the current value during the current decrease time and an electric resistance of the sample solution in the microchannel. 6. The zeta potential measurement method according to 6.
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