JP2011047015A - Method for manufacturing thin film having metal-plated layer - Google Patents

Method for manufacturing thin film having metal-plated layer Download PDF

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JP2011047015A
JP2011047015A JP2009197759A JP2009197759A JP2011047015A JP 2011047015 A JP2011047015 A JP 2011047015A JP 2009197759 A JP2009197759 A JP 2009197759A JP 2009197759 A JP2009197759 A JP 2009197759A JP 2011047015 A JP2011047015 A JP 2011047015A
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Shi-Yue Shiu
西嶽 許
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a thin film having a metal plated layer, especially, a thin film having a metal layer not depending on chemical reagent etching in one kind of manufacturing process. <P>SOLUTION: A peeling layer is provided mainly on the surface of a thin film by spray coating, coating or printing in such a manner that a blank part is previously left in the peeling layer. A metal plating layer is formed on the peeling layer and the blank part by plating processing so as to cover the peeling layer and the blank part by the resulting metal plated layer, and then an adhesive layer is provided on the metal plated layer by spray coating, coating and printing. Successively, a base layer is adhered on the adhesive layer or a base layer having an adhesive layer is adhered to the metal plated layer. Finally, the base layer and the adhesive layer are peeled so that an excessive metal plated layer and the peeling layer are simultaneously peeled by the adhesive layer and a metal plated layer comprising only a specific design, line shape, character, symbol or numerical character is left. Thereby, the thin film having the metal plated layer is applied in a radio frequency identification (RFID) system, an antenna of a radio transmitter or a conductive product. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は一種の金属メッキ層を有する薄膜の製造方法に係り、特に一種の製造プロセスに化学薬剤エッチングによらない金属層を有する薄膜の製造方法に関する。 The present invention relates to a method of manufacturing a thin film having a kind of metal plating layer, and more particularly to a method of manufacturing a thin film having a metal layer that does not use chemical agent etching in a kind of manufacturing process.

現在の金属転写膜または金属薄膜は無線周波数識別(Radio Frequency Identification, RFID)システムその他無電伝送技術によるアンテナまたは薄膜回路板などの製品によく使用されている。これらは薄膜の表面にスパッタリング、蒸着または電気メッキ方式により、特殊形状の金属層を形成した後に、RFIDチップその他無線伝送チップを前記金属層の端子に電気接続することにより、RFID信号その他無線信号を検出できる。公知技術の金属転写膜の製造方法は、薄膜の表面に電気メッキ加工することにより、1枚の金属メッキ層を被せた上、酸性溶剤、アルカリ溶剤その他化学溶剤によって余分な金属メッキ層を洗い落とす。そのため、生産プロセスにおいて多くの有害な重金属液体または廃棄の化学溶剤が発生する。その重金属液体と化学溶剤は、特殊設備を用いて清浄化処理してから、河川に放流する必要があり、金属転写膜製品の製造コストの低減が難しい。一方、清浄化をしないまま排出すると、環境に大きいダメージを与える恐れがある。このことから、公知技術の金属転写膜または金属薄膜の生産方法に、大きな欠点が残されていることが分かる。 Current metal transfer films or metal thin films are often used in radio frequency identification (RFID) systems and other products such as antennas or thin film circuit boards with wireless transmission technology. In these methods, a special-shaped metal layer is formed on the surface of the thin film by sputtering, vapor deposition or electroplating, and then an RFID chip or other wireless transmission chip is electrically connected to the terminal of the metal layer, thereby generating an RFID signal or other wireless signal. It can be detected. In a known method for producing a metal transfer film, the surface of a thin film is electroplated to cover a single metal plating layer, and then the excess metal plating layer is washed away with an acidic solvent, an alkaline solvent or other chemical solvent. As a result, many harmful heavy metal liquids or waste chemical solvents are generated in the production process. The heavy metal liquid and the chemical solvent must be cleaned using special equipment and then discharged into a river, and it is difficult to reduce the manufacturing cost of the metal transfer film product. On the other hand, if it is discharged without being cleaned, there is a risk of causing great damage to the environment. From this, it can be seen that there are significant drawbacks in the known methods for producing metal transfer films or metal thin films.

印刷剥離層のコートステップと、金属メッキ層のコートステップと、接着層のコート(または接着層を有する基層を貼り付ける)ステップと、基層の貼り付けステップと、余分な金属メッキ層と接着層を剥がすステップとを含む製造方法によって、化学薬剤によるエッチングを使用せずに、薄膜の表面に特定図案、線形、文字、符号または数字の金属メッキ層を形成でき、生産コストの低減と、環境保護の目的を実現できる、一種の金属メッキ層を有する薄膜の製造方法を提供することを本発明の主な目的とする。 A coating release layer coating step, a metal plating layer coating step, an adhesive layer coating (or a base layer having an adhesive layer attached) step, a base layer attaching step, an extra metal plating layer and an adhesive layer. By using a manufacturing method including a peeling step, it is possible to form a specific design, linear, letter, code or numeric metal plating layer on the surface of the thin film without using chemical etching, thereby reducing production costs and protecting the environment. It is a main object of the present invention to provide a method for producing a thin film having a kind of metal plating layer that can realize the object.

前記目的を達成するため、本発明に係る金属メッキ層を有する薄膜の製造方法は、以下のステップを含む。 In order to achieve the above object, a method of manufacturing a thin film having a metal plating layer according to the present invention includes the following steps.

<イ>薄膜の表面に剥離層を吹き付け塗装、塗布または印刷によってコートし、この剥離層に特定図案、線形、文字、符号または数字の空白部をあらかじめに残す、印刷剥離層のコートステップと、<ロ>前記剥離層の表面に金属メッキ層をメッキ加工して形成し、金属メッキ層によって、剥離層と空白部を被せる、金属メッキ層のコートステップと、<ハ>前記金属メッキ層の上部に、接着層を吹き付け塗装、塗布または印刷し、接着層をこの金属メッキ層に被せる、接着層を被せるステップと、<ニ>前記接着層の上部に基層を貼り付ける、基層の貼り付けステップと、<ホ>最後に、前記基層を剥がし、接着層によって、空白部以外の余分な金属メッキ層と剥離層を同時に剥がし、薄膜の表面に特定形状または線形だけを残す、基層と接着層の剥がしステップとを含む。 <B> A coating release layer coating step that coats the surface of the thin film by spraying, coating or printing, leaving a blank space of a specific design, linear, letter, code or number in advance on the release layer; <B> A metal plating layer is formed by plating a surface of the release layer, and the release layer and the blank portion are covered with the metal plating layer; <c> an upper portion of the metal plating layer A step of spraying, coating or printing the adhesive layer, and covering the metal plating layer with the adhesive layer, covering the adhesive layer, and <d> pasting the base layer on top of the adhesive layer; <E> Finally, the base layer is peeled off, and the extra metal plating layer and the peeling layer other than the blank portion are simultaneously peeled off by the adhesive layer, leaving only a specific shape or line shape on the surface of the thin film. And a peeling step of wearing layer.

本発明の前記した金属メッキ層を有する薄膜の製造方法は、薄膜上に吹き付け塗装、塗布または印刷された剥離層に空白部を有するため、剥離層と空白部に金属メッキ層を被せた後に、金属メッキ層は空白部において、薄膜と緊密に結合する一方、金属メッキ層は剥離層の部分を簡単に剥がすことができ、最後に基層を剥がすときに、接着層によって空白部以外の余分な金属メッキ層と剥離層を同時に剥がせる。このため、薄膜の表面に特定形状または線形の金属メッキ層を残すことができる。金属メッキ層の洗い落としに酸性溶剤またはアルカリ溶剤などを使用しないため、廃水、固体廃棄物など生態学的環境に影響がなく、本発明に係る製造方法は生産コストの低減と、地球にやさしい環境保護の効果がある。 The method for producing a thin film having a metal plating layer according to the present invention has a blank portion on a peeling layer that is spray-coated, applied, or printed on the thin film, and therefore, after covering the peeling layer and the blank portion with the metal plating layer, While the metal plating layer is tightly bonded to the thin film in the blank part, the metal plating layer can easily peel off the part of the peeling layer, and when the base layer is finally peeled off, an extra metal other than the blank part is removed by the adhesive layer. The plating layer and the release layer can be peeled off simultaneously. For this reason, a specific-shaped or linear metal plating layer can be left on the surface of the thin film. Since no acidic or alkaline solvent is used to wash off the metal plating layer, there is no impact on the ecological environment such as waste water and solid waste, and the manufacturing method according to the present invention reduces production costs and protects the environment. There is an effect.

一種の金属メッキ層を有する薄膜の製造方法であって、薄膜の表面に剥離層を吹き付け塗装、塗布または印刷して形成する。前記剥離層に空白部をあらかじめに残して置き、剥離層と空白部上に接着層をメッキ加工することにより、金属メッキ層によって、剥離層と空白部を被せる。この金属メッキ層上に接着層を吹き付け塗装、塗布または印刷して形成する。続いて、接着層上に基層を貼り付けるか、または金属メッキ層上に接着層を有する基層を貼り付ける。最後に、基層と接着層を剥がし、接着層によって空白部以外の余分な金属メッキ層と剥離層を同時に剥がして、特定図案、線形、文字、符号または数字の金属メッキ層を残す。さらに、金属メッキ層を有する薄膜は、無線周波数識別(Radio Frequency Identification, RFID)システムその他無線伝送のアンテナあるいは電気導通製品に利用できる。 A method of manufacturing a thin film having a kind of metal plating layer, which is formed by spraying, coating, or printing a release layer on the surface of the thin film. A blank portion is left in advance on the release layer, and an adhesive layer is plated on the release layer and the blank portion, thereby covering the release layer and the blank portion with a metal plating layer. An adhesive layer is sprayed, applied, or printed on the metal plating layer. Subsequently, a base layer is attached on the adhesive layer, or a base layer having an adhesive layer is attached on the metal plating layer. Finally, the base layer and the adhesive layer are peeled off, and the excess metal plating layer and the peeling layer other than the blank portion are simultaneously peeled off by the adhesive layer to leave the metal plating layer of a specific design, linear, letter, sign or number. Furthermore, a thin film having a metal plating layer can be used for a radio frequency identification (RFID) system or other wireless transmission antennas or electrical conduction products.

本発明を利用すれば、金属メッキ層の洗い落としに酸性溶剤またはアルカリ溶剤などを使用しないため、廃水、固体廃棄物など生態学的環境に影響がなく、本発明に係る製造方法は生産コストの低減と、地球にやさしい環境保護の効果がある。 If the present invention is used, an acidic solvent or an alkaline solvent is not used for washing off the metal plating layer, so there is no influence on the ecological environment such as waste water and solid waste, and the manufacturing method according to the present invention reduces the production cost. And it has the effect of environmental protection that is kind to the earth.

本発明に係る金属層を有する転写膜の製造方法のフロー図である。It is a flowchart of the manufacturing method of the transfer film which has a metal layer concerning the present invention. 本発明に係る金属層を有する転写膜もう一つの実施例の製造方法のフロー図である。It is a flowchart of the manufacturing method of another Example of the transfer film which has a metal layer concerning this invention. 本発明に係る薄膜表面に、剥離層が実施された上面図である。It is the top view by which the peeling layer was implemented on the thin film surface which concerns on this invention. 本発明に係る薄膜表面に、剥離層が実施された断面図である。It is sectional drawing by which the peeling layer was implemented on the thin film surface concerning this invention. 本発明に係る剥離層の表面の被覆金属メッキ層の上面図である。It is a top view of the covering metal plating layer on the surface of the release layer according to the present invention. 本発明に係る剥離層の表面の被覆金属メッキ層の断面図である。It is sectional drawing of the coating metal plating layer of the surface of the peeling layer which concerns on this invention. 本発明に係る金属メッキ層の表面に設けられた接着層の上面図である。It is a top view of the contact bonding layer provided in the surface of the metal plating layer concerning this invention. 本発明に係る金属メッキ層の表面に設けられた接着層の断面図である。It is sectional drawing of the contact bonding layer provided in the surface of the metal plating layer which concerns on this invention. 本発明に係る接着層の上に基層を貼り付けた上面図である。It is the top view which affixed the base layer on the contact bonding layer which concerns on this invention. 本発明に係る接着層の上に基層を貼り付けた断面図である。It is sectional drawing which affixed the base layer on the contact bonding layer which concerns on this invention. 本発明に係る基層の剥がし操作の上面図である。It is a top view of peeling operation of the base layer which concerns on this invention. 本発明に係る基層の剥がし操作の断面図である。It is sectional drawing of peeling operation of the base layer which concerns on this invention. 本発明に係る金属層を有する転写膜の態様図である。It is an aspect figure of the transfer film which has a metal layer concerning the present invention.

図1と図2に、本発明に係る金属メッキ層を有する薄膜の製造方法の一実施例を示す。以下の主なステップを含む。 1 and 2 show an embodiment of a method for producing a thin film having a metal plating layer according to the present invention. Includes the following main steps:

<イ>、図3と図4に示すように、印刷剥離層のコートステップは、薄膜1の表面に吹き付け塗装、塗布または印刷により、剥離層2をコートし、この剥離層2に特定図案、線形、文字、符号または数字の空白部21をあらかじめに残す。そのうち、薄膜1は熱硬化樹脂重合体および/または熱可塑性樹脂重合体の高分子化学反応からなる薄膜、あるいはセンサー薄膜(たとえば、PU、UPとPS等と、その他高分子重合体)を使用する。剥離層2は親水性または親油性、かつ剥離特性を有する透明または有色樹脂層であり、材質はポリビニルアルコール(Polyvinyl alcohol)、ポリビニルアセテート(Polyvinyl acetate)等などを使用する。 <B> As shown in FIGS. 3 and 4, the coating release layer coating step coats the release layer 2 by spray coating, coating or printing on the surface of the thin film 1, and the release layer 2 has a specific design, A linear, letter, code, or number blank 21 is left in advance. Among these, the thin film 1 uses a thin film made of a polymer chemical reaction of a thermosetting resin polymer and / or a thermoplastic resin polymer, or a sensor thin film (for example, PU, UP and PS, and other high molecular polymers). . The release layer 2 is a transparent or colored resin layer having hydrophilicity or lipophilicity and having release properties. The material is polyvinyl alcohol, polyvinyl acetate, or the like.

<ロ>、図5と図6に示すように、金属メッキ層のコートは、剥離層2の表面に1枚の金属メッキ層3をメッキ加工し、この金属メッキ層3を剥離層2と空白部21に被せる。そのうち、金属メッキ層3のコートは、電気メッキ(electroplating)、スパッタリング(spattering)、蒸着(Evaporation)、その他金属イオンを剥離層2と空白部21の表面にコートできるいずれの方式であっても良い。 <B> As shown in FIGS. 5 and 6, the coating of the metal plating layer is performed by plating one metal plating layer 3 on the surface of the release layer 2, and this metal plating layer 3 is blank from the release layer 2. Cover part 21. Among them, the coating of the metal plating layer 3 may be any method capable of coating the surface of the release layer 2 and the blank portion 21 with other metal ions such as electroplating, sputtering, vapor deposition, and evaporation. .

<ハ>、図7と図8に示すように、接着層のコートは、金属メッキ層3上に接着層4を吹き付け塗装、塗布または印刷し、接着層4を金属メッキ層3の表面に被せるか、もしくは図9と図10に示すように、この金属メッキ層3上に接着層4を有する基層5を貼り付け、接着層4と基層5をこの金属メッキ層3に被せる。 <C> As shown in FIGS. 7 and 8, the coating of the adhesive layer is performed by spraying, coating, or printing the adhesive layer 4 on the metal plating layer 3 and covering the surface of the metal plating layer 3 with the adhesive layer 4. Alternatively, as shown in FIGS. 9 and 10, a base layer 5 having an adhesive layer 4 is attached on the metal plating layer 3, and the adhesive layer 4 and the base layer 5 are covered with the metal plating layer 3.

<ニ>、引き続き、図9と図10に示すように、前記接着層4上に基層5を貼り付け、この基層5は紙部材または高分子重合体あるいは有機化合物であっても良い。 <D> Subsequently, as shown in FIGS. 9 and 10, a base layer 5 is stuck on the adhesive layer 4, and the base layer 5 may be a paper member, a polymer, or an organic compound.

<ホ>、図11と図12に示すように、基層5と接着層4を剥がす。最後に、この基層5を剥がし、前記接着層4によって、空白部21以外の余分な金属メッキ層3および剥離層2を剥がして、図13に示すように、薄膜1の表面に特定図案、線形、文字、符号または数字の金属メッキ層31aだけを残す。この薄膜1は無線周波数識別(Radio Frequency Identification, RFID)システムまたはその他無線伝送のアンテナ及び導電あるいは薄膜回路板など、その他製品に応用できる。 <E> As shown in FIGS. 11 and 12, the base layer 5 and the adhesive layer 4 are peeled off. Finally, the base layer 5 is peeled off, and the excess metal plating layer 3 and the peeling layer 2 other than the blank portion 21 are peeled off by the adhesive layer 4, and a specific design, linear shape is formed on the surface of the thin film 1 as shown in FIG. , Leaving only the metal plating layer 31a of letters, symbols or numbers. The thin film 1 can be applied to other products such as a radio frequency identification (RFID) system or other wireless transmission antennas and conductive or thin film circuit boards.

本発明に係る金属メッキ層を有する薄膜の製造方法によれば、薄膜1上に吹き付け塗装、塗布または印刷された剥離層2は空白部21を有するため、この剥離層2と空白部21に金属メッキ層3をコートすることによって、この金属メッキ層3は空白部21において、薄膜1と緊密に結合し、剥離層2にある部分が簡単に剥がされるため、最後の基層5の剥がしステップは、接着層4によって、空白部21以外の余分な金属メッキ層3と剥離層2を一緒に剥がし、薄膜1の表面に特定図案、線形、文字、符号または数字の金属メッキ層31aだけを残すことができる。前記説明から、本発明の製造方法は酸性溶剤、アルカリ溶剤その他化学溶剤による金属メッキ層3のエッチングをなくして、毒性溶剤の発生を防止でき、廃水処理などの設備による清浄化が不要なため、生産コストの低減と環境保護の効果がある。 According to the method for manufacturing a thin film having a metal plating layer according to the present invention, the release layer 2 spray-coated, applied, or printed on the thin film 1 has the blank portion 21, so that the release layer 2 and the blank portion 21 are made of metal. By coating the plating layer 3, the metal plating layer 3 is tightly bonded to the thin film 1 in the blank portion 21, and the portion in the peeling layer 2 is easily peeled off. The excess metal plating layer 3 and the release layer 2 other than the blank portion 21 are peeled off together by the adhesive layer 4, leaving only the specific design, linear, letter, code or number metal plating layer 31 a on the surface of the thin film 1. it can. From the above description, the production method of the present invention eliminates the etching of the metal plating layer 3 with an acidic solvent, an alkaline solvent or other chemical solvent, can prevent the generation of a toxic solvent, and does not require cleaning by facilities such as waste water treatment, It has the effect of reducing production costs and protecting the environment.

1 薄膜
2 剥離層
21 空白部
3 金属メッキ層
31a 金属メッキ層
4 接着層
5 基層
DESCRIPTION OF SYMBOLS 1 Thin film 2 Peeling layer 21 Blank part 3 Metal plating layer 31a Metal plating layer 4 Adhesion layer 5 Base layer

Claims (10)

金属メッキ層を有する薄膜の製造方法であって、
<イ>薄膜の表面に剥離層を吹き付け塗装、塗布または印刷によってコートし、前記剥離層に特定図案、線形、文字、符号または数字の空白部をあらかじめに残す、印刷剥離層のコートステップと、
<ロ>前記剥離層の表面に金属メッキ層をメッキ加工して形成し、金属メッキ層によって、前記剥離層と前記空白部を被せる、金属メッキ層のコートステップと、
<ハ>前記金属メッキ層上に接着層を吹き付け塗装、塗布または印刷によって形成し、前記接着層を前記金属メッキ層に被せる、接着層のコートステップと、
<ニ>前記接着層の上部に基層を貼り付ける、基層の貼り付けステップと、
<ホ>最後に、前記基層を剥がし、前記接着層によって、前記空白部以外の余分な前記金属メッキ層と前記剥離層を同時に剥がし、前記薄膜の表面に特定形状または線形だけを残す、基層と接着層の剥がしステップとを含むことを特徴とする、金属メッキ層を有する薄膜の製造方法。
A method for producing a thin film having a metal plating layer,
<B> A coating release layer coating step that coats the surface of the thin film by spraying, coating, or printing, leaving a specific design, linear, letter, code or number blank in advance in the release layer;
<B> A metal plating layer coating step for forming a metal plating layer on the surface of the release layer, and covering the release layer and the blank portion with the metal plating layer;
<C> A coating step of an adhesive layer, which is formed by spraying, applying or printing an adhesive layer on the metal plating layer, and covering the metal plating layer with the adhesive layer;
<D> A base layer pasting step of pasting the base layer on top of the adhesive layer;
<E> Finally, the base layer is peeled off, and the metal layer and the release layer other than the blank portion are simultaneously peeled off by the adhesive layer, leaving only a specific shape or line on the surface of the thin film, A method for producing a thin film having a metal plating layer, comprising a step of peeling off an adhesive layer.
前記薄膜は熱硬化樹脂重合体または熱可塑性樹脂重合体の高分子化学反応部材からなることを特徴とする、請求項1記載の金属メッキ層を有する薄膜の製造方法。 2. The method for producing a thin film having a metal plating layer according to claim 1, wherein the thin film comprises a polymer chemical reaction member of a thermosetting resin polymer or a thermoplastic resin polymer. 前記薄膜はフィルムまたはセンサーフィルムであることを特徴とする、請求項1記載の金属メッキ層を有する薄膜の製造方法。 The method of manufacturing a thin film having a metal plating layer according to claim 1, wherein the thin film is a film or a sensor film. 前記剥離層は、親水性または親油性、かつ剥離特性を有する透明または有色の樹脂層であることを特徴とする、請求項1記載の金属メッキ層を有する薄膜の製造方法。 The method for producing a thin film having a metal plating layer according to claim 1, wherein the release layer is a transparent or colored resin layer having hydrophilicity or lipophilicity and release properties. 前記金属メッキ層のコート方法は、電気メッキ(electroplating)、スパッタリング(spattering)、蒸着(Evaporation)によって、薄膜の表面に金属メッキ層をコートすることを特徴とする、請求項1記載の金属メッキ層を有する薄膜の製造方法。 The metal plating layer according to claim 1, wherein the method of coating the metal plating layer comprises coating the metal plating layer on the surface of the thin film by electroplating, sputtering, evaporation. The manufacturing method of the thin film which has this. 金属メッキ層を有する薄膜の製造方法であって、
<イ>薄膜の表面に剥離層を吹き付け塗装、塗布または印刷によってコートし、前記剥離層に特定図案、線形、文字、符号または数字の空白部をあらかじめに残す、印刷剥離層のコートステップと、
<ロ>前記剥離層の表面に1枚の金属メッキ層をメッキ加工して形成し、金属メッキ層によって、前記剥離層と前記空白部を被せる、金属メッキ層のコートステップと、
<ハ>前記金属メッキ層上に接着層を有する基層を貼り付け、前記接着層と前記基層によって、前記接着層と前記基層を前記金属メッキ層に被せる、接着層を有する前記基層の貼り付けステップと、
<ニ>最後に、前記基層を剥がし、前記接着層によって、前記空白部以外の余分な前記金属メッキ層と前記剥離層を同時に剥がし、前記薄膜の表面に特定形状または線形だけを残す、基層と接着層の剥がしステップとを含むことを特徴とする、金属メッキ層を有する薄膜の製造方法。
A method for producing a thin film having a metal plating layer,
<B> A coating release layer coating step that coats the surface of the thin film by spraying, coating, or printing, leaving a specific design, linear, letter, code or number blank in advance in the release layer;
<B> A metal plating layer coating step in which a surface of the release layer is formed by plating one metal plating layer, and the metal plating layer covers the release layer and the blank portion;
<C> A step of attaching the base layer having an adhesive layer, wherein a base layer having an adhesive layer is attached onto the metal plating layer, and the adhesive layer and the base layer are covered with the adhesive layer and the base layer by the adhesive layer and the base layer. When,
<D> Finally, the base layer is peeled off, and the metal layer and the peeling layer other than the blank portion are simultaneously peeled off by the adhesive layer, leaving only a specific shape or line on the surface of the thin film, A method for producing a thin film having a metal plating layer, comprising a step of peeling off an adhesive layer.
前記薄膜は熱硬化樹脂重合体または熱可塑性樹脂重合体の高分子化学反応部材からなることを特徴とする、請求項6記載の金属メッキ層を有する薄膜の製造方法。 7. The method for producing a thin film having a metal plating layer according to claim 6, wherein the thin film comprises a polymer chemical reaction member of a thermosetting resin polymer or a thermoplastic resin polymer. 前記薄膜はフィルムまたはセンサーフィルムであることを特徴とする、請求項7記載の金属メッキ層を有する薄膜の製造方法。 The method of manufacturing a thin film having a metal plating layer according to claim 7, wherein the thin film is a film or a sensor film. 前記剥離層は、親水性または親油性、かつ剥離特性を有する透明または有色の樹脂層であることを特徴とする、請求項6記載の金属メッキ層を有する薄膜の製造方法。 The method for producing a thin film having a metal plating layer according to claim 6, wherein the release layer is a transparent or colored resin layer having hydrophilicity or lipophilicity and release properties. 前記金属メッキ層のコート方法は、電気メッキ(electroplating)、スパッタリング(spattering)、蒸着(Evaporation)によって、薄膜の表面に金属メッキ層をコートすることを特徴とする、請求項6記載の金属メッキ層を有する薄膜の製造方法。 The metal plating layer according to claim 6, wherein the method of coating the metal plating layer comprises coating the surface of the thin film with a metal plating layer by electroplating, sputtering, evaporation. The manufacturing method of the thin film which has this.
JP2009197759A 2009-08-28 2009-08-28 Method for manufacturing thin film having metal-plated layer Pending JP2011047015A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9506878B2 (en) 2013-11-29 2016-11-29 Canon Kabushiki Kaisha Structural body and X-ray talbot interferometer including the structural body
CN114075654A (en) * 2020-08-22 2022-02-22 昆山鑫美源电子科技有限公司 Preparation method of conductive film, current collection and transmission material and energy storage device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9506878B2 (en) 2013-11-29 2016-11-29 Canon Kabushiki Kaisha Structural body and X-ray talbot interferometer including the structural body
CN114075654A (en) * 2020-08-22 2022-02-22 昆山鑫美源电子科技有限公司 Preparation method of conductive film, current collection and transmission material and energy storage device
CN114075654B (en) * 2020-08-22 2023-03-17 昆山鑫美源电子科技有限公司 Preparation method of conductive film, current collection and transmission material and energy storage device

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