JP2011028265A - Discharging head unit for processing liquid and processing liquid discharging device including the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a processing liquid discharging head which reduces the installation cost due to increase in the number of heads and is easy to maintain and repair, and to provide a processing liquid discharging device including the same. <P>SOLUTION: A processing liquid discharging unit 200 includes a frame 210, one processing liquid supply module 220 installed on the frame 210, and a plurality of processing liquid discharging heads 270 which are formed in the frame 210 so that fluid communication to one processing liquid supply module 220 is achieved in a center-concentrated system, and discharge the processing liquid onto a substrate S by an inkjet system. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a processing liquid discharge head unit and a processing liquid discharging apparatus including the same, and more particularly to a head unit that discharges processing liquid by an ink jet method and a processing liquid discharging apparatus including the head unit. It is.

  Generally, a liquid crystal display device displays full color by passing light modulated by a liquid crystal layer through a color filter. The color filter is formed by arranging filter elements of each hue on the R (red), G (green), and B (blue) dots on the surface of the glass substrate in a stripe arrangement, a delta arrangement, or a mosaic arrangement. Is done. In the manufacturing process of the liquid crystal display device, a processing liquid is supplied and applied to the surface of the glass substrate in order to manufacture a color filter, an alignment film and the like. As an apparatus for applying a treatment liquid for applying the treatment liquid, an ink jet type application apparatus for discharging and applying the treatment liquid onto the surface of a substrate is known. The processing liquid coating apparatus applies the processing liquid by an inkjet printing method using a plurality of processing liquid supply apparatuses. The processing liquid supply apparatus includes a head provided with a plurality of nozzles for supplying a processing liquid to the substrate, and the head is supplied with the processing liquid from a reservoir located at the top, and passes through the nozzle to the surface of the substrate. Discharge the processing liquid.

Korean Published Patent No. 10-2003-0065347

  However, in the case of the conventional processing liquid coating apparatus, each head has a reservoir and a processing liquid piping system related thereto, so that not only the installation cost increases due to the increase in the number of heads, but also maintenance maintenance. It's not easy. Further, the conventional processing liquid coating apparatus has a problem that noise is generated in transmission of a control signal because a head control unit for controlling the head and the like is provided separately from the head. Further, the conventional treatment liquid coating apparatus has a problem that the moment force acts on the gantry due to the eccentric load applied to the gantry by the head or the like, and the distance between the head and the substrate cannot be maintained constant.

  An object of the present invention is to provide a treatment liquid discharge head unit that can reduce installation costs due to an increase in the number of heads and that is easy to maintain and repair, and a treatment liquid discharge apparatus including the treatment liquid discharge head unit. The present invention also provides a treatment liquid ejection head unit that minimizes noise generation in the transmission of a control signal between a head control unit and a head, and a treatment liquid ejection apparatus including the treatment liquid ejection head unit. The present invention also provides a treatment liquid ejection head unit capable of maintaining a constant distance between the head and the substrate and a substrate, and a treatment liquid ejection apparatus including the treatment liquid ejection head unit.

  The objects of the present invention are not limited to these, and other objects not mentioned will be clear to those skilled in the art from the contents described in the specification.

  As a first aspect of the present invention for solving the above problems, a processing liquid discharge head unit includes a frame, one processing liquid supply module installed in the frame, and one processing liquid supply module. The frame includes a plurality of processing liquid discharge heads configured to discharge a processing liquid by an ink jet method on a substrate so as to be in fluid communication by a centralized method. In the processing liquid discharge head unit, the processing liquid supply module is installed in the frame, the processing liquid tank supplying the processing liquid to a plurality of processing liquid discharging heads, and the processing liquid tank installed in the processing liquid tank. And a bubble removing member for removing bubbles in the processing liquid.

  The treatment liquid tank includes a body having one open face and a first side wall which is coupled to the one open face of the body and includes a treatment liquid inflow port and a first outflow port; A second side wall coupled to the other open surface of the body and having a second outflow port for the processing liquid. The treatment liquid tank further includes a pressure adjustment port configured on the upper wall of the body and connected to a pressure adjustment member for adjusting the inside of the treatment liquid tank to a negative pressure or a positive pressure. The first side wall is formed with a hollow portion so that a step is formed in the peripheral region, and the inflow port is configured on the upper wall of the hollow portion. The processing liquid supply module further includes a particle filtering member that is formed between the body and the first side wall and filters particles of the processing liquid flowing into the body through the inflow port. The bubble removing member has a hollow cylindrical shape with one end clogged, and is configured in the body. The bubble removing member transmits only bubbles except for the liquid component of the processing liquid, and the bubble removing filter is opened. An adapter connected to the other end, installed on the side wall of the fuselage, and connected to a pump for adjusting to negative pressure. The pores of the bubble removal filter become smaller toward the inside along the radial direction of the bubble removal filter. The frame is made of a beam-shaped horizontal member, and the processing liquid discharge head includes first and second discharge heads arranged on the lower stage portion of the frame so as to face each other along the length direction.

  Further, the processing liquid supply module is installed in the upper center portion of the frame. The processing liquid supply module is coupled to the first side wall so as to be in fluid communication with the first outflow port, and is in fluid communication with the first distribution member that distributes the processing liquid to the first discharge head and the second outflow port. And a second distribution member that is coupled to the second side wall and distributes the processing liquid to the second ejection head. The first and second outflow ports include an upper outflow port and a lower outflow port configured to form a pair at positions vertically separated along the length direction of the first and second side walls. The two distribution members are configured on one side of the distributor body so as to communicate with the hollow cylinder-shaped distributor body and the upper and lower outlet ports, and a pair of upper and lower distributor inlet ports, Constructed on the other side of the fuselage to face the upper and lower distributor inflow ports, and includes a pair of upper and lower distributor outflow ports, wherein the upper and lower distributor outflow ports provide fluid to each processing liquid discharge head Communicated. The upper distributor inlet port is configured at a higher position than the upper distributor outlet port, and the lower distributor inlet port is configured at a higher position than the lower distributor outlet port. In addition, the head control unit further includes a head control unit that is installed on a side wall or the like along the length direction of the frame and controls the discharge operation of the first and second discharge heads.

  Next, as a second aspect of the present invention, the processing liquid discharge apparatus is an ink jet type processing liquid discharge apparatus, and includes a substrate support unit on which a substrate is mounted and linearly moves in the first direction, and a substrate support And a processing liquid discharge head unit configured to discharge the processing liquid onto the substrate, the processing liquid discharging head unit including a frame and one processing liquid installed in the frame. A supply module and a plurality of processing liquid discharge heads configured to be in fluid communication with the one processing liquid supply module in a centralized manner and discharging the processing liquid onto the substrate by an ink jet method. Features. In this processing liquid ejection apparatus, the frame is composed of a horizontal member that extends in the second direction whose length direction is perpendicular to the first direction, and the processing liquid ejection heads are arranged along the length direction at the lower stage of the frame. It includes first and second ejection heads arranged to face each other. The processing liquid supply module is installed in the upper center part of the frame. Further, the head control unit further includes a head control unit that is installed on each side wall along the length direction of the frame and controls the ejection operation of the first and second ejection heads. The apparatus further includes a moving unit that linearly moves the treatment liquid discharge head unit in the first direction. Also, a main supply line for connecting a processing liquid supply source and a processing liquid recovery member, a branch line branched from the main supply line and connected to a processing liquid supply module, a branch position of the branch line, and a recovery member And a sensing member that is disposed on the main supply line between the main supply lines and detects the presence or absence of the processing liquid in the main supply line. The processing liquid supply module also includes a processing liquid tank that supplies the processing liquid to the first and second ejection heads, and a bubble removal unit that is installed in the processing liquid tank and removes bubbles of the processing liquid in the processing liquid tank. Includes members. The processing liquid tank includes a body having one open face and a first side wall which is coupled to the one open face of the body and includes a processing liquid inflow port and a first outflow port. And a second side wall coupled to the other open surface of the body and having a second outflow port for the processing liquid. The processing liquid supply module further includes a particle filtering member that is configured between the body and the first side wall and filters particles of the processing liquid flowing into the body through the inflow port.

  The processing liquid supply module is coupled to the first side wall so as to be in fluid communication with the first outflow port, and is in fluid communication with the first distribution member for distributing the processing liquid to the first discharge head and the second outflow port. And a second distribution member coupled to the second side wall to distribute the processing liquid to the second ejection head. The first and second outflow ports include an upper outflow port and a lower outflow port configured to form a pair at positions vertically separated from each other along the length direction of the first and second side walls. The second distribution member is configured on one side of the distributor body so as to communicate with the hollow cylinder-shaped distributor body and the upper and lower outflow ports, and forms a pair of upper and lower distributor inflow ports. A pair of upper and lower distributor outflow ports configured on the other side of the fuselage to face the upper and lower distributor inflow ports, the upper and lower distributor outflow ports fluid to each processing liquid discharge head Communicated. The upper distributor inlet port is configured at a higher position than the upper distributor outlet port, and the lower distributor inlet port is configured at a higher position than the lower distributor outlet port.

  According to the present invention, installation costs due to an increase in the number of heads can be reduced. Further, according to the present invention, the treatment liquid discharge head unit can be easily maintained and repaired. Further, according to the present invention, it is possible to minimize the generation of noise in the transmission of control signals between the head controller and the head. Furthermore, according to the present invention, the distance between the head or the like and the substrate can be kept constant.

It is a top view of the processing liquid application equipment concerning one embodiment of the present invention. FIG. 2 is a perspective view of a processing liquid discharge unit in FIG. 1. FIG. 3 is a perspective view of the treatment liquid discharge head unit of FIG. 2. FIG. 3 is a side view of the treatment liquid discharge head unit of FIG. 2. FIG. 3 is a plan view of the treatment liquid discharge head unit of FIG. 2. It is a perspective view of the process liquid supply module of FIG. It is a disassembled perspective view of the process liquid supply module of FIG. FIG. 8 is an enlarged view of the body of FIG. 7. It is sectional drawing of the bubble removal filter of FIG. It is a perspective view of the distribution member of FIG. It is a perspective view of the distribution member of FIG. FIG. 10b is a cross-sectional view of the distribution member of FIGS. 10a and 10b. It is a figure which shows the piping system which supplies a process liquid to a process liquid supply module. It is a figure which shows the flow of the process liquid supplied to a process liquid supply module. It is a figure which shows the process of removing the bubble in a process liquid using a distribution member. It is a figure which shows the process of removing the bubble in a process liquid using a distribution member. It is a figure which shows the process of removing the bubble in a process liquid using a distribution member.

  Hereinafter, a treatment liquid discharge head unit and a treatment liquid discharge apparatus including the same according to a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings. First, in the reference numerals of the constituent elements in each drawing, the same reference numerals are given to the same constituent elements in different drawings. Further, in the description of the present invention, when it is determined that a specific description of a related known technical configuration or function may interfere with an understanding of the gist of the present invention, a detailed description is omitted. .

  FIG. 1 is a plan view of a treatment liquid coating facility 1 of an ink jet method. The treatment liquid coating facility 1 in FIG. 1 is a facility that applies a treatment liquid to an object by an inkjet method. For example, the object is a color filter substrate of a liquid crystal display panel, and the treatment liquid is ink of red (R), green (G), blue (B) or the like in which pigment particles are mixed in a solvent. Hereinafter, although an example of equipment for applying ink to a color filter substrate will be described, the technical idea of the present invention is not limited to this.

  According to FIG. 1, the processing liquid application facility 1 includes a processing liquid discharge unit 10, a substrate transport unit 20, a bake unit 30, a loading unit 40, an unloading unit 50, a processing liquid supply unit 60, and a main control unit 70. . The processing liquid discharge unit 10 and the substrate transport unit 20 are arranged in a row in the first direction I and are positioned adjacent to each other. A processing liquid supply unit 60 and a main control unit 70 are disposed at a position facing the substrate transport unit 20 with the processing liquid discharge unit 10 as the center, and the processing liquid supply unit 60 and the main control unit 70 are arranged in the second direction II. Arranged in a row. A loading unit 40 and an unloading unit 50 are arranged at a position facing the processing liquid discharge unit 10 with the substrate transport unit 20 as the center, and the loading unit 40 and the unloading unit 50 are arranged in a row in the second direction II. Is done. The bake unit 30 is disposed adjacent to one side of the substrate transport unit 20. Here, the first direction I is an arrangement direction of the processing liquid discharge unit 10 and the substrate transport unit 20, the second direction II is a direction perpendicular to the first direction I on the horizontal plane, and the third direction III is The direction is perpendicular to the first direction I and the second direction II.

  The substrate to which the processing liquid (ink) is applied is carried into the loading unit 40. The substrate transport unit 20 transports the substrate carried into the loading unit 40 to the processing liquid discharge unit 10. The processing liquid discharge unit 10 is supplied with the processing liquid from the processing liquid supply unit 60 and discharges the processing liquid onto the substrate by an inkjet method. The substrate transport unit 20 transports the substrate from the processing liquid discharge unit 10 to the bake unit 30. The baking unit 30 heats the substrate and evaporates the remaining liquid material (solvent) excluding the solid components of the processing liquid discharged onto the substrate. The substrate transport unit 20 transports the substrate from the bake unit 30 to the unloading unit 50. The substrate coated with the treatment liquid is unloaded from the unloading unit 50. The main control unit 70 controls the overall operation of the processing liquid discharge unit 10, the substrate transport unit 20, the bake unit 30, the loading unit 40, the unloading unit 50, and the processing liquid supply unit 60.

  FIG. 2 is a perspective view of the processing liquid discharge unit 10 of FIG. Referring to FIG. 2, the processing liquid discharge unit 10 includes a substrate support unit 100, a processing liquid discharge head unit 200, and a moving unit 300. The substrate support unit 100 includes a support plate 110 on which the substrate S is placed. The support plate 110 is a quadrangular plate. A rotation shaft of the rotation drive motor 120 is connected to the lower surface of the support plate 110. The rotation drive motor 120 rotates the support plate 110 so that the substrate placed on the support plate 110 is aligned to a preset position. The rotational drive motor 120 is configured on the upper surface of the slider 130. The guide member 140 extends in the first direction I at the center of the upper surface of the base B. The slider 130 includes a linear motor (not shown), and the slider 130 linearly moves in the first direction I along the guide member 140.

  The processing liquid discharge head unit 200 is configured on a path along which the substrate support unit 100 moves, and discharges the processing liquid onto the substrate. The discharge head unit 200 has a frame 210. The frame 210 is configured such that its length direction is in a second direction II that is perpendicular to the first direction I. The frame 210 is provided with a processing liquid supply module 220, a processing liquid discharge head 270, and a head controller 280. The processing liquid discharge head 270 is configured at the lower part of the frame 210 and discharges the processing liquid onto the substrate. The processing liquid supply module 220 is configured in the upper part of the frame 210 and supplies the processing liquid to the processing liquid discharge head 270. The head controller 280 controls the discharge operation of the processing liquid discharge head 270. The discharge head unit 200 is fixed on the base B, and the discharge head unit 200 linearly moves in the first direction I by the moving unit 300.

  The moving unit 300 linearly moves the treatment liquid ejection head unit 200 in the first direction I from the upper part of the path along which the support plate 110 moves. The first moving unit 300 includes a guide rail 310 and a slider 320. The guide rails 310 are installed on both sides of the upper surface of the base B so that the length direction is in the first direction I and face each other around the guide member 140 of the substrate support unit 100. The slider 320 is installed on the guide rail 310 and includes a linear motor. The slider 320 linearly moves in the first direction I along the guide rail 310 by driving the linear motor.

  The ejection head unit 200 moves linearly in the first direction I by the first moving unit 300, and the support plate 110 on which the substrate is placed moves linearly in the first direction I by the slider 130 and the guide member 140. When the processing liquid is discharged onto the substrate, the processing liquid discharging step is performed while linearly moving one of the support plate 110 and the discharge head unit 200 in the first direction I. For example, the discharge head unit 200 is fixed at a preset position, the support plate 110 on which the substrate is placed moves in the first direction I, and the support plate 110 is repeatedly subjected to the process liquid discharge process on the substrate. As shown in FIG. In addition, the support plate 110 on which the substrate is placed is fixed at a predetermined position, the ejection head unit 200 moves in the first direction I, and the ejection head unit 200 repeatedly proceeds with the process liquid ejection process on the substrate. Thus, the linear reciprocation may be performed at least twice. The reason for repeating the treatment liquid discharging step twice or more is to make the coating thickness of the treatment liquid applied to the substrate uniform.

  3 is a perspective view of the discharge head unit 200 of FIG. 2, FIG. 4 is a side view of the discharge head unit 200 of FIG. 2, and FIG. 5 is a plan view of the discharge head unit 200 of FIG. . 3 to 5, the discharge head unit 200 includes a frame 210, a processing liquid supply module 220, a processing liquid discharge head 270, and a head controller 280.

  The frame 210 includes a main frame 212 and a head support base 214. The main frame 212 is configured by a beam-shaped horizontal member, and the main frame 212 is configured such that the length direction is directed in a second direction II that is perpendicular to the first direction I. A head support base 214 that supports the processing liquid discharge head 270 is formed below the main frame 212. The head support base 214 includes head support plates 215 a and 215 b that are configured below the main frame 212. The head support plates 215a and 215b are plates whose length direction is directed in the second direction II, and the head support plates 215a and 215b are disposed horizontally below the main frame 212. The head support plates 215a and 215b are coupled to the main frame 212 by a connecting load 217. The connecting load 217 is configured to be perpendicular to the third direction III. One end of the connecting load 217 is coupled to the corner portion of the head support plates 215a and 215b, and the other end of the connecting load 217 is the lower surface of the main frame 212. Combined with One processing liquid supply module 220 is installed in the frame 210. For example, the processing liquid supply module 220 is installed at the center of the upper surface of the main frame 212. The processing liquid discharge head 270 is configured to be in fluid communication with one processing liquid supply module 220 in a centralized manner. That is, the processing liquid discharge head 270 is configured such that the processing liquid is supplied from one processing liquid supply module 200 and the pressure can be adjusted through the one processing liquid supply module 200. Detailed explanation about this will be described later.

  The processing liquid discharge head 270 discharges the processing liquid onto the substrate by an ink jet method. The treatment liquid discharge head 270 includes a first discharge head 272 disposed along the length direction on the first head support plate 215a, and a second disposed along the length direction on the second head support plate 215b. It has a discharge head 274, and the first and second discharge heads 272, 274 are arranged to face each other.

  The first ejection heads 272 are arranged in two rows so as to form a zigzag shape on the first head support plate 215a, and are arranged with their ends overlapped. A plurality of nozzles (not shown) for discharging a processing liquid are formed on the lower surface of the first discharge head 272, and a processing liquid inlet 272-2 and a processing liquid outlet 272 are formed on the upper surface of the first discharge head 272. −1 is formed. The processing liquid inlet 272-2 is connected to a lower distributor outlet port 266a-2 of a first distribution member 260a described later, and the processing liquid outlet 272-1 is an upper distributor outlet of a first distribution member 260a described later. Connected to port 266a-1. A flexible circuit board 273 that is electrically connected to the first head controller 280a is formed on one side of the first ejection head 272.

  The second ejection heads 274 are arranged in two rows so as to form a zigzag shape on the second head support plate 215b, and are arranged with their ends overlapped. A plurality of nozzles (not shown) for discharging processing liquid are formed on the lower surface of the second discharge head 274, and a processing liquid inlet 274-2 and a processing liquid outlet 274 are formed on the upper surface of the second discharge head 274. −1 is formed. The processing liquid inlet 274-2 is connected to a lower distributor outlet port 266b-2 of a second distribution member 260b described later, and the processing liquid outlet 274-1 is an upper distributor outlet of a second distribution member 260b described later. It is connected to port 266b-1. A flexible circuit board (not shown) that is electrically connected to the second head controller 280b is formed on one side of the second ejection head 274.

  As described above, when the ejection heads 272 and 274 are arranged at the lower stage of the frame 210 so as to be symmetric with respect to the frame 210, the moment forces applied to the frame 210 due to the weight of the ejection heads 272 and 274 cancel each other. Therefore, it is possible to easily adjust the distance between the ejection heads 272 and 274 and the substrate.

  The head controller 280 includes a first head controller 280a and a second head controller 280b. The first head control unit 280a is installed on one side wall along the length direction of the main frame 212, that is, on the side wall on the first head support plate 215a side. A first discharge head 272 installed on the first head support plate 215a is electrically connected to the first head control unit 280a through the flexible circuit board 273. The first head control unit 280a is connected to the first discharge head 272. To control the operation. The second head control unit 280b is installed on the other side wall along the length direction of the main frame 212, that is, on the side wall on the second head support plate 215b side. A second ejection head 274 installed on the second head support plate 215b is electrically connected to the second head controller 280b through a flexible circuit board (not shown), and the second head controller 280b The operation of the two-discharge head 274 is controlled.

  As described above, the first and second head controllers 280a and 280b are arranged at positions adjacent to the first and second ejection heads 272 and 274 to be controlled, and the length of the electrical connection portion between them is set. Therefore, the generation of noise can be minimized in the transmission of control signals between the head controllers 280a and 280b and the ejection heads 272 and 274.

  6 is a perspective view of the processing liquid supply module of FIG. 3, and FIG. 7 is an exploded perspective view of the processing liquid supply module of FIG. 8 is an enlarged view of the body of FIG. 7, and FIG. 9 is a cross-sectional view of the bubble removal filter of FIG. 6 to 9, the processing liquid supply module 220 includes a processing liquid tank 230, a particle filtering member 240, a bubble removing member 250, and first and second distribution members 260a and 260b.

  The processing liquid tank 230 supplies a processing liquid discharged to the substrate. The particle filtering member 240 filters particles in the processing liquid supplied to the processing liquid tank 230. The bubble removing member 250 removes bubbles in the processing liquid supplied to the processing liquid tank 230. The first and second distribution members 260a and 260b distribute the processing liquid supplied to the processing liquid tank 230 to the first and second ejection heads (reference numerals 273 and 274 in FIG. 5).

  The treatment liquid tank 230 has a body 232 having a shape in which one of the surfaces facing each other is opened, that is, a “B” shape. Specifically, the body 232 includes an upper wall 232a, a lower wall 232b, and side walls 232c and 232d that connect the upper wall 232a and the lower wall 232b. The upper wall 232a includes a pressure adjustment port 233-1 and a level sensing port 233-2. A pressure adjusting member (not shown) for adjusting the inside of the processing liquid tank 230 to a negative pressure or a positive pressure is connected to the pressure adjusting port 233-1. The level sensing port 233-2 is provided with a level sensor (not shown) that senses the water level of the processing liquid in the processing liquid tank 230. A hole 232d-1 is formed in any one of the side walls 232c and 232d of the processing liquid tank 230, and a bubble removing member 250 is installed in the hole 232d-1. The bubble removing member 250 removes bubbles of the processing liquid in the processing liquid tank 230.

  The bubble removal member 250 includes a bubble removal filter 252 and an adapter 254. The bubble removal filter 252 has a hollow cylindrical shape with one end clogged, and is configured in the body 232 of the processing liquid tank 230. A plurality of pores 253 are formed in the cross section of the bubble removal filter 252 as shown in FIG. The pores 253 are configured to become smaller toward the inside along the radial direction of the bubble removal filter 252. The pore 253 allows only the bubble component excluding the liquid component of the processing liquid to pass therethrough. An adapter 254 is connected to the other open end of the bubble removal filter 252. The adapter 254 is inserted into a hole 232 d-1 formed in the side wall 232 d of the body 232 of the processing liquid tank 230, and a pump (not shown) that adjusts to negative pressure is connected to the adapter 254. When the hollow portion inside the bubble removal filter 252 is set to a negative pressure by the pump, the bubbles in the processing liquid are transmitted through the pores 253 of the bubble removal filter 252 and discharged.

  A first side wall 234 is coupled to one side of the body 232 of the processing liquid tank 230 that is opened, and a second side wall 238 is coupled to the other side of the body 232 that is opened. A hollow portion 234-1 is formed on the inner surface of the first side wall 234 so that a step is formed in the peripheral region. An inflow port 235 is formed in the upper wall of the hollow portion 234-1, and the processing liquid is supplied to the processing liquid tank 230 through the inflow port 235. A particle filtering member 240 is formed between the first side wall 234 and the body 232, and the particle filtering member 240 filters particles of the processing liquid flowing into the processing liquid tank 230 through the inflow port 235. A first outflow port 236 through which the processing liquid flows out is formed in the first side wall 234. The first outflow port 236 includes an upper outflow port 236a and a lower outflow port 236b. The lower outflow ports 236b are formed in a line along the length direction of the first side wall 234 in the lower step portion of the first side wall 234. The upper outlet port 236a is formed in a row at a spaced position above the lower outlet port 236b. The upper outflow port 236a and the lower outflow port 236b configured at positions spaced apart from each other are configured to form a pair. A first distribution member 260a is coupled to the first side wall 234 so as to be in fluid communication with the first outflow port 236, and the first distribution member 260a supplies the processing liquid to the first discharge head (reference numeral 272 in FIG. 5). Distribute. A second outflow port 239 through which the processing liquid flows out is formed in the second side wall 238. The second outflow port 239 includes an upper outflow port 239a and a lower outflow port 239b. The lower outflow ports 239b are formed in a row in the lower step portion of the second side wall 238 along the length direction of the second side wall 238. The upper outlet port 239a is formed in a line at a spaced position on the upper portion of the lower outlet port 239b. The upper outflow port 239a and the lower outflow port 239b configured at positions spaced apart from each other are configured to form a pair. A second distribution member 260b is coupled to the second side wall 238 so as to be in fluid communication with the second outflow port 239, and the second distribution member 260b supplies the processing liquid to the second discharge head (reference numeral 274 in FIG. 5). Distribute.

  10a and 10b are perspective views of the distribution members 260a and 260b of FIG. 6, and FIG. 11 is a cross-sectional view of the distribution members 260a and 260b of FIGS. 10a and 10b. Since the first and second distribution members 260a and 260b have the same structure, the first distribution member 260a will be described as an example. Referring to FIGS. 7 and 10a to 11, the first distribution member 260a includes a distributor body 262a, upper and lower distributor inflow ports 264a-1, 264a-2, upper and lower distributor outflow ports 266a-1. 266a-2. The distributor body 262 a is formed in a hollow cylinder shape having a hollow portion 263 formed therein, and has a length corresponding to the first side wall 234.

  The upper and lower distributor inlet ports 264 a-1 and 264 a-2 are configured on one side of the distributor body 262 a so as to communicate with the hollow portion 263. The lower distributor inflow port 264a-2 is configured in a row at the lower stage along the length direction of the distributor body 262a, and corresponds to the lower outflow port 236b configured on the first side wall 234 of the processing liquid tank 230. The upper distributor inflow port 264a-1 is configured in a row at a spaced position above the lower distributor inflow port 264a-2, and corresponds to the upper outflow port 236a formed on the first side wall 234 of the processing liquid tank 230. To do. The upper and lower distributor outlet ports 266a-1, 266a-2 are in communication with the hollow portion 263 and are on the other side of the distributor body 262a so as to face the upper and lower distributor inlet ports 264a-1, 264a-2. Composed. The upper distributor outlet port 266a-1 is connected to the processing liquid outlet (reference numeral 272-1 in FIG. 5) of the first discharge head (reference numeral 272 in FIG. 5), and the lower distributor outlet port 266a-2 is connected to the first outlet head 266a-1. The one discharge head 272 is connected to the treatment liquid inlet (reference numeral 272-2 in FIG. 5).

  As shown in FIG. 11, the upper distributor inflow port 264a-1 is configured at a position higher in the vertical direction than the upper distributor outflow port 266a-1, and the lower distributor inflow port 264a-2 is configured as a lower distributor outflow port. It is configured at a higher position in the vertical direction. In addition, since the structure of the 2nd distribution member 260b is the same as the structure of the 1st distribution member 260a, the detailed description about this is abbreviate | omitted. However, regarding the second distribution member 260b, reference numeral 266b-1 in FIGS. 4 and 5 is an upper distributor outflow port, and 266b-2 is a lower distributor outflow port. The upper distributor outlet port 266b-1 is connected to the processing liquid outlet (reference numeral 274-1 in FIG. 5) of the second discharge head (reference numeral 274 in FIG. 5), and the lower distributor outlet port 266b-2 is The two discharge heads 274 are connected to the processing liquid inlet (reference numeral 274-2 in FIG. 5).

  Hereinafter, a process of supplying the processing liquid from the processing liquid supply unit (reference numeral 60 in FIG. 1) to the processing liquid discharge head (reference numeral 270 in FIG. 2) at the final end will be described. First, the process of supplying the processing liquid from the processing liquid supply unit 60 to the processing liquid supply module 220 will be described. FIG. 12 shows a processing liquid piping system for supplying a processing liquid to the processing liquid supply module. Referring to FIG. 12, the processing liquid supply unit 60 includes a processing liquid supply source 410 and a processing liquid recovery member 420, and the processing liquid supply source 410 and the processing liquid recovery member 420 are connected by a main supply line 430. Connected. A plurality of branch lines 440a to 440e are branched from the main supply line 430. The treatment liquid supply module 220 is connected to the branch lines 440a to 440e, and a valve 442 is installed on the branch lines 440a to 440e. A valve 432 is installed at the rear end of the branch line 440e, and a sensing member 434 for detecting the presence or absence of the processing liquid in the main supply line 430 is installed between the valve 432 and the processing liquid recovery member 420.

  The processing liquid is supplied from the processing liquid supply source 410 through the main supply line 430 while the valve 442 on the branch lines 440a to 440e is shut off and the valve 432 on the main supply line 430 is opened. The processing liquid is flowed along the main supply line 430 to a place where the sensing member 434 is located. The sensing member 434 detects the flow of the processing liquid and transmits the detection result to a control unit (not shown). The control unit shields the valve 432 on the main supply line 430 and opens the valve on the branch line 440 a for supplying the processing liquid so that the processing liquid is supplied to the processing liquid supply module 220. At this time, the processing liquid that has passed through the sensing member 434 is recovered by the processing liquid recovery member 420.

  As described above, when the processing liquid is supplied through the branch line 440 a after filling the main supply line 430 from the processing liquid in the initial supply of the processing liquid, the air in the main supply line 430 is supplied to the processing liquid supply module 220. The possibility that bubbles are generated in the supplied processing liquid can be minimized.

  A pneumatic pressure line 520 is connected to the processing liquid supply module 220, and a pressure adjusting member 510 that adjusts the inside of the processing liquid supply module 220 to a negative pressure or a positive pressure is connected to the pneumatic pressure line 520. The pressure adjusting member 510 adjusts to a negative pressure in order to prevent leakage of the processing liquid from the discharge head of the processing liquid supply module 220, and positively discharges the processing liquid in the processing liquid supply module 220 to the outside. Adjust to pressure.

  Next, a process liquid flow process from the process liquid supply module 220 will be described. FIG. 13 shows a flow process of the processing liquid supplied to the processing liquid supply module. Referring to FIGS. 12 and 13, the processing liquid supplied through the branch line 440 a flows into the hollow portion 234-1 of the processing liquid tank 230 through the inflow port 235. The processing liquid flowing into the hollow portion 234-1 passes through the particle filtering member 240 and flows into the body 232 of the processing liquid tank 230. At this time, the particle filtering member 240 filters particles in the processing liquid.

  Next, the process liquid flow process from the process liquid tank 230 to the discharge head which is the final end, and the process of removing bubbles in the process liquid in the process will be described. 14a to 14c show a process of removing bubbles in the processing liquid using a distribution member. 14A to 14C, the processing liquid is supplied to the processing liquid tank 230 until the water level reaches level 1 (Level 1). The level 1 water level is higher than the lower outflow port 236b of the processing liquid tank 230.

  When the processing liquid reaches the level 1 level, the processing liquid passes through the lower outlet port 236b and the lower distributor inlet port 264a-2 of the first distributing member 260a communicated with the lower outlet port 236b. Flow into. The processing liquid that has flowed into the hollow portion 263 flows into the processing liquid inlet 272-2 of the first discharge head 272 through the lower distributor outlet port 266a-2. At this time, the air in the first discharge head 272 moves toward the processing liquid outlet 272-1 by the pressure of the processing liquid (FIG. 14a).

  When the processing liquid is continuously supplied to the processing liquid tank 230 and the water level of the processing liquid reaches the level 2 (Level 2), the processing liquid in the first discharge head 272 is supplied to the first discharge head 272 by water pressure. , And then flows into the hollow portion 263 through the upper distributor outlet port 266a-1 of the first distribution member 260a. At this time, the air in the first discharge head 272 moves to the hollow portion 263 of the first distribution member 260a by the pressure of the processing liquid. Further, since the level 2 water level is the level reaching the height of the upper outlet port 236a of the processing liquid tank 230, the processing liquid in the processing liquid tank 230 flows over the upper outlet port 236a and the first distribution member 260a. It flows into the first distribution member 260a through the partial distributor inflow port 264a-1 (FIG. 14b).

  When the processing liquid is continuously supplied to the processing liquid tank 230 and the water level of the processing liquid reaches the level 3 (Level 3) level that exceeds the upper outflow port 236a, the upper layer processing liquid in the first distribution member 260a becomes the water pressure. Is returned to the processing liquid tank 230 and flows again. At this time, bubbles also flow into the processing liquid tank 230 together with the processing liquid. When the air on the first distribution member 260a, the first ejection head 272, and the pipe line connecting them flows into the processing liquid tank 230 through such a process, the bubbles are negative pressure adjusted by the bubble removal member 250. Is discharged to the outside through the bubble removing member 250 (FIG. 14c).

  As described above, the bubbles of the processing liquid are removed through the steps described with reference to FIGS. 12 to 14 c, thereby solving the problem that the nozzles of the discharge head and the like are clogged with the bubbles. Furthermore, by supplying the processing liquid to a plurality of ejection heads using one processing liquid supply module and adjusting the pressure applied to the processing liquid supply module, the installation cost due to the increase in the number of heads can be reduced. Maintenance and repair are also easy.

  The above description is merely an example of the technical idea of the present invention, and various modifications and modifications can be made without departing from the essential characteristics of the present invention as long as they have ordinary knowledge from the technical field to which the present invention belongs. Deformation is possible. Therefore, the embodiments disclosed in the present invention do not limit the technical idea of the present invention. The protection scope of the present invention should be construed by the claims, and all technical ideas similar to the present invention should be construed as being included in the claims of the present invention.

DESCRIPTION OF SYMBOLS 100 Substrate support unit 200 Processing liquid discharge head unit 210 Frame 220 Processing liquid supply module 230 Processing liquid tank 240 Particle filtration member 250 Bubble removal member 260a First distribution member 260b Second distribution member 270 Processing liquid discharge head 280 Head controller

Claims (26)

Frame,
One processing liquid supply module installed in the frame;
A plurality of processing liquid ejection heads configured in the frame so as to be in fluid communication with the one processing liquid supply module in a centralized manner and ejecting the treatment liquid on a substrate by an inkjet method;
A treatment liquid discharge head unit comprising:   The processing liquid supply module is installed in the frame and supplies the processing liquid to the plurality of processing liquid discharge heads. The processing liquid tank is installed in the processing liquid tank, and the processing liquid in the processing liquid tank The processing liquid ejection head unit according to claim 1, further comprising: a bubble removing member that removes the bubbles.   The treatment liquid tank includes a body having one open face and a first side wall coupled to the one open face of the body to form an inflow port and a first outflow port for the treatment liquid. 3. The processing liquid discharge head unit according to claim 2, further comprising: a second side wall coupled to the other open surface of the body and configured as a second outflow port for the processing liquid.   The said processing liquid tank is further comprised by the upper wall of the said fuselage | bore, and further includes the pressure adjustment port to which the pressure adjustment member which adjusts the inside of the said processing liquid tank to a negative pressure or a positive pressure is connected. A discharge head unit for the treatment liquid according to 1. The first side wall has a hollow portion formed therein so that a step is formed in the peripheral region,
The processing liquid ejection head unit according to claim 3, wherein the inflow port is configured on an upper wall of the hollow portion.   The processing liquid supply module further includes a particle filtering member configured between the body and the first side wall and configured to filter particles of the processing liquid flowing into the body through the inflow port. Item 4. A treatment liquid discharge head unit according to Item 3.   The bubble removing member has a hollow cylindrical shape with one end clogged, and is configured in the body. The bubble removing filter transmits only bubbles except the liquid component of the processing liquid, and the bubble removing filter is opened. The treatment liquid discharge head unit according to claim 6, further comprising: an adapter connected to the other end of the body and installed on a side wall of the body and connected to a pump for adjusting to a negative pressure.   8. The processing liquid ejection head unit according to claim 7, wherein the pores of the bubble removal filter become smaller toward the inside along the radial direction of the bubble removal filter. The frame comprises a beam-shaped horizontal member,
4. The treatment liquid ejection according to claim 3, wherein the treatment liquid ejection head includes first and second ejection heads arranged at a lower stage portion of the frame so as to face each other along a length direction. 5. Head unit.   The processing liquid discharge head unit according to claim 9, wherein the processing liquid supply module is installed at an upper center portion of the frame.   The processing liquid supply module is coupled to the first side wall so as to be in fluid communication with the first outflow port, and distributes the processing liquid to the first discharge head, and the second outflow port. The processing liquid discharge head according to claim 9, further comprising a second distribution member coupled to the second side wall so as to be in fluid communication with the second side wall and distributing the processing liquid to the second discharge head. unit. The first and second outflow ports include an upper outflow port and a lower outflow port configured to form a pair at positions vertically spaced along the length direction of the first and second side walls,
The first and second distribution members are configured on one side of the distributor body so as to communicate with an empty cylinder-shaped distributor body, and the upper and lower outflow ports. A lower distributor inlet port and a pair of upper and lower distributor outlet ports configured on the other side of the fuselage to face the upper and lower distributor inlet ports,
12. The processing liquid discharge head unit according to claim 11, wherein the upper and lower distributor outlet ports are in fluid communication with each of the processing liquid discharge heads. The upper distributor inlet port is configured at a position higher than the upper distributor outlet port;
13. The processing liquid discharge head unit according to claim 12, wherein the lower distributor inlet port is configured to be higher than the lower distributor outlet port.   10. The treatment liquid ejection head according to claim 9, further comprising a head control unit that is installed on each side wall along the length direction of the frame and controls ejection operations of the first and second ejection heads. 11. unit. An inkjet processing liquid discharge device,
A substrate support unit on which a substrate is placed and linearly moves in the first direction;
It is configured on a path along which the substrate support unit moves, and includes a processing liquid discharge head unit that discharges the processing liquid onto the substrate.
The treatment liquid discharge head unit comprises:
Frame,
One processing liquid supply module installed in the frame;
A plurality of processing liquid discharge heads configured to be in fluid communication with the one processing liquid supply module in a centralized manner and configured to discharge the processing liquid onto the substrate by an ink jet method; Dispensing device for processing liquid. The frame is composed of a horizontal member whose length direction is in a second direction perpendicular to the first direction,
The process liquid discharge head according to claim 15, wherein the process liquid discharge head includes first and second discharge heads disposed at a lower stage portion of the frame so as to face each other along a length direction. apparatus.   The apparatus for discharging a processing liquid according to claim 16, wherein the processing liquid supply module is installed at an upper center portion of the frame.   17. The treatment liquid discharge apparatus according to claim 16, further comprising a head control unit that is installed on each side wall along the length direction of the frame and controls the discharge operation of the first and second discharge heads. .   19. The processing liquid discharge apparatus according to claim 15, further comprising a moving unit that linearly moves the processing liquid discharge head unit in the first direction. A main supply line connecting the processing liquid supply source and the processing liquid recovery member;
A branch line branched from the main supply line and connected to the processing liquid supply module;
A sensing member that is disposed on the main supply line between the branch position of the branch line and the recovery member, and detects the presence or absence of processing liquid in the main supply line;
The apparatus for discharging a processing liquid according to claim 19, further comprising:   The processing liquid supply module is installed in the processing liquid tank for supplying the processing liquid to the first and second ejection heads, and removes bubbles of the processing liquid in the processing liquid tank. The apparatus for discharging a processing liquid according to claim 19, further comprising a bubble removing member.   The treatment liquid tank includes a body having one open face and a first side wall which is coupled to the one open face of the fuselage and includes a treatment liquid inflow port and a first outflow port. The apparatus for discharging a processing liquid according to claim 21, further comprising a second side wall coupled to the other open surface of the body and configured as a second outflow port for the processing liquid.   The processing liquid supply module further includes a particle filtering member configured between the body and the first sidewall, and filtering particles of the processing liquid flowing into the body through the inflow port. 22. A processing liquid discharge device according to 22.   The processing liquid supply module is coupled to the first side wall so as to be in fluid communication with the first outflow port, and distributes the processing liquid to the first discharge head, and the second outflow port. 23. A processing liquid discharge apparatus according to claim 22, further comprising a second distribution member coupled to the second side wall so as to be in fluid communication with the second side wall and distributing the processing liquid to the second discharge head. . The first and second outflow ports include an upper outflow port and a lower outflow port configured to form a pair at positions vertically separated along the length direction of the first and second side walls,
The first and second distribution members are configured on one side of the distributor body so as to communicate with an empty cylinder-shaped distributor body, and the upper and lower outflow ports. A lower distributor inflow port and a pair of upper and lower distributor outflow ports configured on the other side of the fuselage to face the upper and lower distributor inflow ports;
25. The apparatus for discharging a processing liquid according to claim 24, wherein the upper and lower distributor outlet ports are in fluid communication with each of the processing liquid discharging heads. The upper distributor inlet port is configured at a position higher than the upper distributor outlet port;
The apparatus for discharging a processing liquid according to claim 25, wherein the lower distributor inlet port is configured to be higher than the lower distributor outlet port.

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