JP2011009379A - Vaporizer - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a vaporizer capable of stably subliming particles of solids.SOLUTION: The vaporizer for vaporizing the particles of the solids in a solid state at ordinary temperature includes: a supply section for supplying the particles of the solids; and a vaporization section including a heating section for vaporizing the particles of the solids supplied from the supply section. The problem can be solved by providing the vaporizer where the heating section has an inclination and the particles of the solids roll on the inclination for vaporization.

Description

  The present invention relates to a vaporizer.

  In recent years, the materials used for semiconductor devices are expanding from inorganic materials to organic materials, and the characteristics and manufacturing processes of semiconductor devices can be optimized due to the characteristics of organic materials not found in inorganic materials. .

  One such organic material is polyimide. Polyimide can be used as an insulating film because of its high adhesiveness and low leakage current, and can also be used as an insulating film in a semiconductor device.

  As a method for forming such a polyimide film, vapor deposition using pyromellitic dianhydride (PMDA) and 4,4′-oxydianiline (ODA: ODA: 4,4′-oxydianiline) as raw material monomers. A film forming method by polymerization is known (for example, Patent Document 1).

  This vapor deposition polymerization is a system in which PMDA and ODA used as raw material monomers are sublimated and polymerized in the chamber. In order to obtain a good polyimide film, a constant amount of vaporized PMDA and ODA are continuously chambered. Need to be supplied within. However, PMDA vaporizes at a higher temperature than ODA, and it is difficult to continuously supply a constant amount into the chamber.

  On the other hand, as a film forming method for sublimating an organic compound material having sublimability, a film forming method improved so that a flash vapor deposition method can be applied to film formation of an organic compound material is disclosed (for example, Patent Document 2).

JP 2006-141821 A JP 2004-346371 A

  By the way, when using the formed polyimide film as a part of the semiconductor element, a good polyimide film with high adhesion is required. For this reason, in the method in which PMDA and ODA are vaporized simply by heating and supplied into the chamber, it is difficult to stably supply the vaporized PMDA and ODA in a constant amount. It is difficult to obtain a good polyimide film that can be used as a part.

  In addition, even when the organic compound material is sublimated using the method described in the cited document 2, a constant amount of PMDA that is strictly vaporized is continuously supplied stably without changing the PMDA. It is difficult.

  This invention is made | formed in view of the above, and forms the favorable polyimide film | membrane which can be used also as a material which forms a semiconductor element by vaporizing PMDA stably and supplying in a chamber. Therefore, a vaporizer is provided.

  The present invention relates to a vaporizer that vaporizes solid particles that are in a solid state at room temperature, a supply unit for supplying the solid particles, and heating for vaporizing the solid particles supplied from the supply unit A vaporization section having a section, wherein the heating section is provided with an inclination, and the solid particles are vaporized while rolling the inclination.

  Further, according to the present invention, the vaporizer supplies and reacts the vaporized first substance and the vaporized second substance to the substrate installed in the chamber, whereby the third substance is formed on the substrate. The solid particles are connected to a film forming apparatus for forming a film, and the solid particles are particles of the first substance, and the vaporizer supplies the vaporized first substance into the chamber. It is characterized by that.

  Further, the present invention is characterized in that the heating unit is provided with a plurality of slopes, and the solid particles roll on the lower slope sequentially after rolling the upper slope in the plurality of slopes. It is characterized by

  In the heating unit, the direction in which the plurality of inclinations are arranged is a direction in which gravity acts, and the plurality of inclination directions are arranged alternately. .

  Further, according to the present invention, the interval at which the inclination is arranged is narrow according to the direction in which gravity works, and the carrier gas is introduced below the inclination existing at the lowermost portion of the inclination. Features.

  Further, according to the present invention, the vaporization unit has a vaporization path through which the gas vaporized from the solid particles passes, and the vaporization path includes a downward vaporization path in which an airflow flows in a direction in which gravity works, An upward vaporization path that flows in a direction opposite to the downward vaporization path, and the downward vaporization path and the upward vaporization path are connected at an end of a direction in which gravity acts, and the vaporized The gas flows in from the side opposite to the end of the downward vaporization path and is discharged from the side opposite to the end of the downward vaporization path.

  In the invention, it is preferable that the first substance is PMDA, the second substance is ODA, and the third substance is polyimide.

  ADVANTAGE OF THE INVENTION According to this invention, the vaporizer | carburetor which can form a favorable polyimide film using PMDA and ODA as a raw material monomer can be provided.

Configuration diagram of a film forming apparatus in the first embodiment Configuration diagram of PMDA vaporizer in the first embodiment Explanatory drawing of PMDA vaporizer in 1st Embodiment Configuration diagram of PMDA vaporizer in the second embodiment Explanatory drawing of the PMDA vaporizer in 2nd Embodiment

  The form for implementing this invention is demonstrated below.

[First Embodiment]
The first embodiment relates to a film forming apparatus for forming a polyimide film by vapor deposition polymerization using PMDA and ODA as raw material monomers.

(Deposition system)
Based on FIG. 1, the film forming apparatus in the present embodiment will be described.

  The film forming apparatus in the present embodiment has a wafer boat 12 in which a plurality of wafers W on which a polyimide film is formed can be installed in a chamber 11 that can be evacuated by a vacuum pump (not shown). . In addition, the chamber 11 has injectors 13 and 14 for supplying vaporized PMDA and ODA. Openings are provided in the side surfaces of the injectors 13 and 14, and PMDA and ODA vaporized from the injectors 13 and 14 are supplied to the wafer W as indicated by arrows in the drawing. The supplied vaporized PMDA and ODA react on the wafer W to form a polyimide film by vapor deposition polymerization. Note that vaporized PMDA, ODA, and the like that do not contribute to the formation of the polyimide film flow as they are and are discharged from the chamber 11 through the exhaust port 15. Further, the wafer boat 12 is configured to be rotated by the rotating unit 16 so that the polyimide film is uniformly formed on the wafer W. Further, a heater 17 for heating the wafer W in the chamber 11 to a constant temperature is provided outside the chamber 11.

  The injectors 13 and 14 are connected to the PMDA vaporizer 21 and the ODA vaporizer 22 via the valves 23 and 24 at the introduction unit 25, respectively. The PMDA and ODA vaporized from the PMDA vaporizer 21 and the ODA vaporizer 22 are respectively connected. Is supplied.

  High temperature nitrogen gas is supplied to the PMDA vaporizer 21 as a carrier gas, and the PMDA vaporizer 21 is supplied in a vaporized state by sublimating PMDA. For this reason, the PMDA vaporizer 21 is maintained at a temperature of 260 ° C. In the ODA vaporizer 22, high temperature nitrogen gas is supplied as a carrier gas, and the ODA heated to a high temperature and in a liquid state is bubbled with the supplied nitrogen gas, whereby ODA vapor contained in the nitrogen gas is obtained. Supply in a vaporized state. For this reason, the ODA vaporizer 22 is maintained at a temperature of 220 ° C. Thereafter, the vaporized PMDA and ODA are supplied into the injectors 13 and 14 through the valves 23 and 24 and the introduction unit 25. Further, the PMDA vaporized from the injectors 13 and 14 and the vaporized ODA are contained in the chamber 11. And reacts on the wafer W to form a polyimide film.

  Therefore, in the film forming apparatus in the present embodiment, vaporized PMDA and vaporized ODA are ejected laterally from the injectors 13 and 14, and react on the wafer W to form a polyimide film by vapor deposition polymerization.

(PMDA vaporizer)
Next, the PMDA vaporizer 21 used in the film forming apparatus of the present embodiment will be described with reference to FIG. The PMDA vaporizer 21 includes a PMDA supply unit 31, a throttle 32, and a PMDA vaporization unit 33. The PMDA vaporization unit 33 includes a heating unit 34, a vaporization path 35, and a vaporization PMDA discharge port 36.

  In the PMDA supply unit 31, particulate PMDA particles 30 are accommodated, and the supply amount of the PMDA particles 30 is controlled by adjusting the aperture 32. The supply of PMDA particles 30 may be continuous or intermittent, but is preferably continuous.

  The PMDA vaporization unit 33 is entirely heated at 260 ° C., which is a temperature set for vaporizing PMDA, and a heating unit 34 in which inclined plates are arranged in the direction in which gravity acts is provided inside. . In the heating unit 34, the inclined plates 34a, 34b, 34c, 34d, 34e, and 34f are arranged so that the inclination directions are alternate. That is, the PMDA particles 30 supplied in the direction indicated by the arrow A through the diaphragm 32 from the PMDA supply unit 31 are arranged so as to roll down according to gravity. In this embodiment, the temperature for vaporizing PMDA is set to 260 ° C. However, the temperature may be lower as long as it is a temperature at which PMDA vaporizes and does not resolidify. .

  Specifically, the inclined plate 34a is installed so that the PMDA particles 30 roll in the left direction in the drawing, and the inclined plate 34b is installed so that the PMDA particles 30 roll in the right direction in the drawing, and the inclined plate 34c. Is arranged so that the PMDA particles 30 roll in the left direction in the drawing, the inclined plate 34d is arranged so that the PMDA particles 30 roll in the right direction in the drawing, and the inclined plate 34e is arranged in the left direction in the drawing. 30 is installed to roll, and the inclined plate 34f is installed so that the PMDA particles 30 roll in the right direction in the drawing.

  Further, the PMDA particles 30 that have rolled to the end of the inclined plate 34a, that is, the left end in the drawing, fall from the end of the inclined plate 34a to the inclined plate 34b, and roll to the end of the inclined plate 34b, that is, the right end in the drawing. The PMDA particles 30 fall onto the inclined plate 34c from the end of the inclined plate 34b, and the PMDA particles 30 rolled to the end of the inclined plate 34c, that is, the left end in the drawing, are inclined plate 34d from the end of the inclined plate 34c. The PMDA particles 30 that have fallen to the end of the inclined plate 34d, that is, rolled to the left end in the drawing, fall onto the inclined plate 34e from the end of the inclined plate 34d, and the end of the inclined plate 34e, that is, the left end in the drawing. The PMDA particles 30 that have been rolled up to fall to the inclined plate 34f from the end of the inclined plate 34e.

  As described above, since the entire PMDA vaporization section 33 is heated, the PMDA particles 30 rolling on the surfaces of the respective inclined plates 34a, 34b, 34c, 34d, 34e, 34f are inclined plates 34a, 34b, 34c, By evaporating by heating from 34d, 34e, and 34f, the particle size gradually decreases.

  This will be described with reference to FIG. FIG. 3 is a conceptual diagram showing how the inclined plates 34a, 34b, and 34c of the heating unit 34 roll. Initially, as shown in the figure, the particle size of the PMDA particles 30 rolling on the inclined plate 34a is large. Since the PMDA particles 30 are heated and vaporized by the inclined plates 34a, 34b, and 34c, the particle diameter gradually decreases. Therefore, the particle size of the PMDA particles 30 rolling on the inclined plate 34b provided below the inclined plate 34a is smaller than the particle size of the PMDA particles 30 rolling on the inclined plate 34a, and similarly below the inclined plate 34b. The particle size of the PMDA particles 30 rolling on the provided inclined plate 34c is smaller than the particle size of the PMDA particles 30 rolling on the inclined plate 34b.

  As described above, in the heating unit 34, the PMDA particles 30 become smaller than vaporized as the inclined plates 34a, 34b, 34c, 34d, 34e, and 34f are rolled down in order. Although it is possible to vaporize all the PMDA particles 30 in the region where the heating unit 34 is provided by setting the heating temperature of the heating unit 34, the PMDA particles 30 are completely vaporized in the heating unit 34. May remain as fine particles. In this case, it accumulates on the bottom surface of the PMDA vaporization section below the inclined plate 34f.

Thereafter, the PMDA vaporized in the heating unit 34 flows in the direction indicated by the arrow B1 in the vaporization path 35. In the PMDA vaporizer 21 in the present embodiment, nitrogen (N ₂ ) gas is supplied as a carrier gas from the nitrogen gas supply unit 41 to the PMDA supply unit 31, and the nitrogen gas supply unit 42 restricts it. 32 and the PMDA vaporization unit 33. The vaporized PMDA is guided to the vaporization path 35 by the nitrogen gas supplied as the carrier gas.

  The vaporization path 35 includes a downward vaporization path 35a and an upward vaporization path 35b. The vaporized PMDA guided to the vaporization path 35 first flows downward in the downward vaporization path 35a as indicated by an arrow B2. The direction in which the downward vaporization path 35a is formed is substantially the same as the direction of gravity. The vaporized PMDA that has flown to the end of the downward vaporization path 35a then enters the upward vaporization path 35b as indicated by arrow B3, and flows upward through the upward vaporization path 35b as indicated by arrow B4. A vaporized PMDA discharge port 36 is provided in the vicinity of the end of the upward vaporization path 35b, and the vaporized PMDA flows in the direction indicated by the arrow B5 and is supplied to the injector 13 through the valve 23. The direction in which the vaporized PMDA flows in the upward vaporization path 35b is configured to be opposite to the direction in which the vaporized PMDA flows in the downward vaporization path 35a, that is, the direction opposite to the direction of gravity.

  In the PMDA vaporizer 21 in the present embodiment, the vaporization path 35 is provided with the lower vaporization path 35a and the upper vaporization path 35b, and further, the vaporization PMDA discharge port 36 is provided above the upper vaporization path 35b. It is possible to remove the powdery PMDA fine particles flowing into the vaporization path 35 together with the PMDA. That is, by setting the flow rate in the upward vaporization path 35b to a flow rate at which the powdery PMDA fine particles do not rise, the PMDA fine particles are not discharged from the vaporization PMDA discharge port 36, and the upward vaporization path 35a and the upward direction. PMDA fine particles can be deposited and removed at the bottom 35c, which is a connection region with the vaporization path 35b. Such a flow rate can be controlled by controlling the amount of nitrogen gas supplied from the nitrogen gas supply units 41 and 42.

  Since the PMDA vaporizer 21 in the present embodiment is set to 260 ° C., which is the temperature set for vaporizing the PMDA, or higher, as described above, It does not solidify and adhere to the wall surface in the PMDA vaporization section 33.

  Although the case where nitrogen gas is used as the carrier gas has been described in the description of the present embodiment, the carrier gas may be an inert gas such as argon (Ar).

In the PMDA vaporizer 21 in the present embodiment, the particle diameter of the supplied PMDA particles 30 is 250 μm, and the specific gravity is 1.68 × 10 ³ kg / m ³ . In addition, the inclination angles of the inclined plates 34a, 34b, 34c, 34d, 34e, and 34f of each inclined plate 34 in the present embodiment are 1.5 ° with respect to the horizontal plane, and the length in the inclined direction is 400 mm. is there.

  In the PMDA vaporizer 21 according to the present embodiment, the heating unit 34 is composed of a plurality of inclined plates 34a, 34b, 34c, 34d, 34e, and 34f. Therefore, even if the distance over which the PMDA particles 30 roll is long, the vaporizer The overall size can be reduced. Further, since the PMDA particles 30 are vaporized while rolling, there is no possibility that the PMDA particles 30 stay in a certain place for a long time and are heated for a long time, and the PMDA is not deteriorated by heat.

  That is, if the PMDA is deteriorated by heat after being heated for a long time, not only the vaporized PMDA is stably supplied, but the deteriorated PMDA may be mixed and supplied as a foreign substance in the vaporized PMDA. In this case, the film quality of the polyimide film formed on the wafer W is adversely affected. However, in the PMDA supply device 21 in the present embodiment, PMDA that has been altered by heating is not mixed into the vaporized PMDA, and therefore, only highly purified vaporized PMDA can be supplied.

  The PMDA vaporizer 21 controls the supply amount of the PMDA particles 30 by the throttle 32, but can also be controlled by a control program operating on a computer (not shown). The control program can also be stored in a storage medium that can be read by a computer.

[Second Embodiment]
Next, a second embodiment will be described. The PMDA vaporizer in the present embodiment has a configuration in which a carrier gas is introduced from the vicinity of the bottom of the PMDA vaporizer.

  The PMDA vaporizer in the present embodiment will be described based on FIG. The PMDA vaporizer in the present embodiment includes a PMDA supply unit 51, a throttle 52, and a PMDA vaporization unit 53. The PMDA vaporization unit 53 includes a heating unit 54, a vaporization path 55, and a vaporization PMDA discharge port 56.

  The PMDA supply unit 51 stores particulate PMDA particles 30, and the supply amount of the PMDA particles 30 is controlled by adjusting the diaphragm 52. The supply of PMDA particles 30 may be continuous or intermittent, but is preferably continuous.

  The PMDA vaporization unit 53 is entirely heated to 260 ° C., which is a temperature set for vaporizing PMDA, and a heating unit 54 in which inclined plates are arranged in the direction in which gravity acts is provided inside. . In the heating part 54, it arrange | positions so that the direction of the inclination in each inclination board 54a, 54b, 54c, 54d, 54e, 54f may become alternate. That is, the PMDA particles 30 supplied from the PMDA supply unit 51 through the diaphragm 52 in the direction indicated by the arrow C are positioned so as to roll down according to gravity.

  Specifically, the inclined plate 54a is installed so that the PMDA particles 30 roll in the left direction in the drawing, and the inclined plate 54b is installed so that the PMDA particles 30 roll in the right direction in the drawing, and the inclined plate 54c. Is arranged so that the PMDA particles 30 roll in the left direction in the drawing, the inclined plate 54d is arranged so that the PMDA particles 30 roll in the right direction in the drawing, and the inclined plate 54e is arranged in the left direction in the drawing. 30 is installed to roll, and the inclined plate 54f is installed so that the PMDA particles 30 roll in the right direction in the drawing.

  Further, the PMDA particles 30 that have rolled to the end of the inclined plate 54a, that is, the left end in the drawing, fall from the end of the inclined plate 54a to the inclined plate 54b, and roll to the end of the inclined plate 54b, that is, the right end in the drawing. The PMDA particles 30 fall on the inclined plate 54c from the end of the inclined plate 54b, and the PMDA particles 30 rolled to the end of the inclined plate 54c, that is, the left end in the drawing, are inclined plate 54d from the end of the inclined plate 54c. The PMDA particles 30 that have fallen to the end of the inclined plate 54d, that is, rolled to the left end in the drawing, fall onto the inclined plate 54e from the end of the inclined plate 54d, and the end of the inclined plate 54e, that is, the left end in the drawing. The PMDA particles 30 that have been rolled up are disposed so as to fall onto the inclined plate 54f from the end of the inclined plate 54e.

  Moreover, in this Embodiment, each inclination board 54a, 54b, 54c, 54d, 54e, 54f in the heating part 54 is arrange | positioned so that the space | interval may become narrow sequentially in a gravitational direction. Specifically, when the distance K1 between 54a and 54b, the distance K2 between 54b and 54c, the distance K3 between 54c and 54d, the distance K4 between 54d and 54e, and the distance K5 between 54e and 54f, K1 > K2> K3> K4> K5.

  As in the first embodiment, since the entire PMDA vaporization section 53 is heated, the PMDA particles 30 rolling on the surfaces of the respective inclined plates 54a, 54b, 54c, 54d, 54e, 54f By vaporizing by heating from 54a, 54b, 54c, 54d, 54e, and 34f, the particle size gradually decreases.

In the vicinity of the bottom of the PMDA vaporizer 53 of the PMDA vaporizer in this embodiment, that is, between the bottom of the PMDA vaporizer 53 and the inclined plate 54f, nitrogen (N ₂ ) is supplied as a carrier gas from the nitrogen gas supply unit 60. Has been introduced. The introduced carrier gas causes the PMDA particles 30 to roll in the heating section 54 when the carrier gas is not flowing from the bottom between the inclined plates 54a, 54b, 54c, 54d, 54e, and 54f. Flows in the opposite direction. Therefore, the carrier gas has a high flow velocity when the cross-sectional area of the region through which the carrier gas passes is small, and slows down when the cross-sectional area of the region through which the carrier gas passes is large. Thereby, the PMDA particle | grains 30 with a large particle size can be guide | induced to the lower inclination board.

  This will be described with reference to FIG. As shown in FIG. 5A, when the interval between the inclined plates is wide, that is, when the interval K1 is wide like the inclined plates 54a and 54b in the heating section 54, the flow velocity of the carrier gas is indicated by the arrow D1. Slower as shown. For this reason, all of the PMDA particles 30a having a large particle size, the PMDA particles 30b having a medium particle size, and the PMDA particles 30c having a small particle size roll along the inclination of the inclined plate 54b. However, since the force received from the carrier gas varies depending on the size of the particle size of the PMDA particle 30, the PMDA particle 30a having a large particle size rolls down at a relatively high speed, and the PMDA particle 30c having a small particle size is The slope rolls down at a relatively slow speed, and the medium-sized PMDA particles 30b roll down the slope at an intermediate speed between the large-sized PMDA particles 30a and the small-sized PMDA particles 30c.

  Next, as shown in FIG. 5B, when the interval between the inclined plates is narrow, that is, when the interval K3 is narrow as in the inclined plates 54c and 54d in the heating unit 54, the flow velocity of the carrier gas. Becomes faster as shown by the arrow D2. For this reason, the PMDA particles 30a having a large particle diameter roll down the inclined plate 54d along the inclination, but the PMDA particles 30c having a small particle diameter roll in the opposite direction to the inclination of the inclined plate 54d by the force received by the carrier gas, Conversely, go back up the slope. Further, the medium-sized PMDA particles 30b are decelerated and stopped by the force received by the carrier gas. Therefore, only the PMDA particles 30a having a large particle size roll down along the inclination.

  In this way, large particles of the PMDA particles 30 can be quickly rolled off in the heating unit 54. The inclined plates 54a, 54b, 54c, 54d, 54e, and 54f are heated to a temperature at which PMDA is vaporized, and the PMDA particles 30 are vaporized. As a result, the particle size decreases as it goes to the lower stage, and finally vaporizes completely. And will evaporate. In the upper part of the heating unit 54, the particle size of the PMDA particles 30 is large and supplied to the same place, so that a temperature drop or the like occurs in the inclined plate, and PMDA may not be efficiently vaporized. In the lower part of 54, the particle size of the PMDA particles 30 is small and dispersed, and has an extra capacity for vaporization. Therefore, even large PMDA particles 30 can be efficiently vaporized. For this reason, the PMDA particles 30a having a large particle diameter can be guided to the lower stage of the heating unit 54, and the PMDA particles 30 can be efficiently vaporized.

Next, the PMDA vaporized in the heating unit 54 flows in the direction indicated by the arrow E1 in the vaporization path 55. In the PMDA vaporizer according to the present embodiment, nitrogen (N ₂ ) gas is supplied from the nitrogen gas supply unit 61 to the PMDA supply unit 51 as another carrier gas, and from the nitrogen gas supply unit 62. It is supplied between the diaphragm 52 and the PMDA vaporization unit 53. The vaporized PMDA is guided to the vaporization path 55 by nitrogen gas supplied as another carrier gas. The vaporization path 55 includes a downward vaporization path 55a and an upward vaporization path 55b. The vaporized PMDA guided to the vaporization path 55 first flows downward in the downward vaporization path 55a as indicated by an arrow E2. The direction in which the downward vaporization path 55a is formed is substantially the same as the direction of gravity. The vaporized PMDA that has flowed to the end of the downward vaporization path 55a then enters the upward vaporization path 55b as indicated by arrow E3, and flows upward through the upward vaporization path 55b as indicated by arrow E4. A vaporized PMDA discharge port 56 is provided in the vicinity of the end of the upward vaporization path 55b. The vaporized PMDA flows in the direction indicated by the arrow E5 and is supplied to the injector 13 through the valve 23. The direction in which the vaporized PMDA flows in the upward vaporization path 55b is configured to be opposite to the direction in which the vaporized PMDA flows in the downward vaporization path 55a, that is, the direction opposite to the direction of gravity.

  In the PMDA vaporizer in the present embodiment, the vaporization path 55 is vaporized by providing the lower vaporization path 55a and the upper vaporization path 55b, and further providing the vaporization PMDA discharge port 56 at the upper part of the upper vaporization path 55b. It is possible to remove the non-vaporized PMDA fine particles flowing together with the PMDA. That is, by setting the flow rate in the upward vaporization path 55b to a flow rate at which the powdery PMDA fine particles do not rise, the PMDA fine particles are not discharged from the vaporization PMDA discharge port 56, and the upward vaporization path 55a and the upward direction. PMDA fine particles can be deposited and removed at the bottom 55c of the connection region with the vaporization path 55b. Note that such a flow rate can be controlled by controlling the amount of nitrogen gas supplied from the nitrogen gas supply units 60, 61 and 62.

  As described above, the PMDA vaporizer according to the present embodiment is set to 260 ° C., which is the temperature set for vaporizing PMDA, or higher, as described above. It does not solidify and adhere to the wall surface in the vaporization part 53.

  Although the case where nitrogen gas is used as the carrier gas has been described in the description of the present embodiment, the carrier gas may be an inert gas such as argon (Ar).

In the PMDA vaporizer in the present embodiment, the particle diameter of the supplied PMDA particles 30 is 250 μm, and the specific gravity is 1.68 × 10 ³ kg / m ³ . In addition, the inclination angle of the inclined plates 54a, 54b, 54c, 54d, 54e, 54f in each heating unit 54 in the present embodiment is 1.5 ° with respect to the horizontal direction, and the length in the inclined direction is 400 mm. It is. The flow rate of the carrier gas supplied from the nitrogen gas supply unit 60 is 50 sccm.

  In the vaporizer according to the present embodiment, the heating unit 54 includes a plurality of inclined plates 54a, 54b, 54c, 54d, 54e, and 54f. Therefore, even if the distance over which the PMDA particles 30 roll is long, the entire vaporizer The size can be reduced. Further, since the PMDA particles 30 are vaporized while rolling, there is no possibility that the PMDA particles 30 stay in a certain place for a long time and are heated for a long time, and the PMDA is not deteriorated by heat.

  Moreover, since the larger the particle size of the PMDA particles 30 is, the easier it is to go to the lower stage of the heating unit 54 due to the nitrogen gas supplied from the nitrogen gas supply unit 60, the PMDA particles are more uniformly and efficiently performed in the heating unit 54. 30 can be vaporized. Further, in the vaporizer according to the present embodiment, since the size of the particle size of the PMDA particles 30 does not need to be uniform, pre-processing and pretreatment of the PMDA particles 30 are not required, so that the cost is lower. A polyimide film can be formed.

  The PMDA vaporizer according to the present embodiment can be used in a polyimide film forming apparatus, similarly to the PMDA vaporizer according to the first embodiment. The contents other than those described above are the same as those in the first embodiment.

  As mentioned above, although the form which concerns on implementation of this invention was demonstrated, the said content does not limit the content of invention.

DESCRIPTION OF SYMBOLS 11 Chamber 12 Wafer boat 13 Injector 14 Injector 15 Exhaust port 16 Rotation part 17 Heater 21 PMDA vaporizer 22 ODA vaporizer 23 Valve 24 Valve 25 Introduction part 30 PMDA particle 31 PMDA supply part 32 Restriction 33 PMDA vaporization part 34 Heating part 34a, 34b, 34c, 34d, 34e, 34f Inclined plate 35 Evaporation path 35a Downward evaporation path 35b Upward evaporation path 36 Evaporation PMDA outlet 41 Nitrogen gas supply part 42 Nitrogen gas supply part W Wafer

Claims (7)

In a vaporizer that vaporizes solid particles that are in a solid state at room temperature,
A supply unit for supplying the solid particles;
A vaporization unit having a heating unit for vaporizing the solid particles supplied from the supply unit,
The heating unit is provided with an inclination, and the solid particles are vaporized while rolling the inclination. The vaporizer forms a third material film on the substrate by supplying the vaporized first material and the vaporized second material to a substrate installed in the chamber and reacting them. Connected to the device,
The solid particles are particles of the first substance,
2. The vaporizer according to claim 1, wherein the vaporizer supplies the vaporized first substance into the chamber. The heating unit is provided with a plurality of slopes,
3. The vaporizer according to claim 1, wherein the solid particles sequentially roll on a lower slope after rolling on an upper slope in the plurality of slopes. 4.   4. The heating unit according to claim 3, wherein the direction in which the plurality of inclinations are arranged is a direction in which gravity acts, and the plurality of inclination directions are alternately arranged. 5. Vaporizer. The interval at which the inclination is arranged is narrow according to the direction in which gravity works,
The vaporizer according to claim 3 or 4, wherein a carrier gas is introduced below a slope existing at a lowermost part of the slope. The vaporization part has a vaporization path through which the gas vaporized from the solid particles passes,
The vaporization path includes a downward vaporization path in which an airflow flows in a direction in which gravity works, and an upward vaporization path in a direction opposite to the downward vaporization path,
The downward vaporization path and the upward vaporization path are connected at the end of the direction in which gravity works,
6. The vaporized gas flows in from a side opposite to the end of the downward vaporization path and is discharged from a side opposite to the end of the downward vaporization path. The vaporizer as described in any one of.   The vaporizer according to claim 2, wherein the first material is PMDA, the second material is ODA, and the third material is polyimide.

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