JP2011009263A - Hole processing method of substrate for printed circuit board and substrate for printed circuit board manufactured by the hole processing method - Google Patents

Hole processing method of substrate for printed circuit board and substrate for printed circuit board manufactured by the hole processing method Download PDF

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JP2011009263A
JP2011009263A JP2009148428A JP2009148428A JP2011009263A JP 2011009263 A JP2011009263 A JP 2011009263A JP 2009148428 A JP2009148428 A JP 2009148428A JP 2009148428 A JP2009148428 A JP 2009148428A JP 2011009263 A JP2011009263 A JP 2011009263A
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hole
layer
printed wiring
substrate
wiring board
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Kosuke Miura
宏介 三浦
Shinya Nishikawa
信也 西川
Tadahiro Kaibuki
忠拓 貝吹
Kazuo Nakamae
一男 仲前
Akihisa Hosoe
晃久 細江
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Sumitomo Electric Industries Ltd
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Sumitomo Electric Industries Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a hole processing method of a substrate for a printed circuit board, capable of forming conductive holes on the substrate for the printed circuit board with a smaller number of processes, thereby reducing time and effort of work and cost, and to provide the substrate for the printed circuit board manufactured by using the hole processing method.SOLUTION: The hole processing method of a substrate for a printed circuit board includes forming a hole 50 via an insulating layer 20 in a substrate 10 for the printed circuit board having a multilayer structure in which conductive layers 30, 40 are laminated on both sides of an insulating layer 20. In this method, metals eliminated from the conductive layers 30, 40 in forming the hole 50 are deposited on an inner wall of the hole 50 of the insulating layer 20, thereby integrally forming a hole layer 60 having conductivity on the inner wall of the hole 50 of the insulating layer 20.

Description

本発明は、プリント配線板用基板の穴加工方法とその穴加工方法を用いたプリント配線板用基板に関する。   The present invention relates to a printed wiring board substrate and a printed wiring board substrate using the hole processing method.

従来、プリント配線板用基板には片面基板、両面基板、多層基板がある。両面基板や多層基板においては、絶縁層を介して表裏の導電層を電気接続できるように、貫通穴や非貫通穴からなる通電性のある穴が形成される。
通電性のある穴をプリント配線板用基板に形成する方法として、従来一般に行われている方法の1例を、図4を参照して説明する。この穴加工方法は、両面基板(多層基板)1を用意し(A)、この基板1に絶縁層(基材)2及びその表裏の導電層3、4を貫通する穴5を開ける(B)。穴5はドリル、パンチング等の機械加工やレーザ加工、その他の方法で開けることができる。そして次に穴5内壁を無電解めっき、カーボンペーストの塗布、その他の方法で導電性薄層6を形成し(C)、その後に前記導電性薄層6を下地層として電気めっきによる厚膜のめっき層7を形成する(D)。これによって通電性のある穴が形成される。
上記した穴加工方法において、レーザを用いた穴開け方法として、例えば特開平1−266983号公報(特許文献1)には、基板の銅箔の部分をUV波長のエキシマレーザで穴開けし、樹脂からなる絶縁層の部分は赤外波長の炭酸ガスレーザで穴開けする方法が開示されている。
また米国特許第5593606号公報(特許文献2)にはUV波長のレーザを用いて導電層と絶縁層とを穴開け加工する方法が開示されている。
Conventionally, printed circuit board substrates include single-sided boards, double-sided boards, and multilayer boards. In a double-sided board or a multilayer board, a conductive hole including a through hole and a non-through hole is formed so that the front and back conductive layers can be electrically connected via an insulating layer.
As an example of a method for forming a hole having electrical conductivity on a printed wiring board substrate, an example of a generally performed method will be described with reference to FIG. In this drilling method, a double-sided board (multilayer board) 1 is prepared (A), and holes 5 are formed in the board 1 through the insulating layer (base material) 2 and the conductive layers 3 and 4 on the front and back sides (B). . The hole 5 can be opened by machining such as drilling or punching, laser processing, or other methods. Then, a conductive thin layer 6 is formed on the inner wall of the hole 5 by electroless plating, application of carbon paste, or other methods (C), and then a thick film is formed by electroplating using the conductive thin layer 6 as a base layer. A plating layer 7 is formed (D). As a result, a conductive hole is formed.
In the hole drilling method described above, as a hole drilling method using a laser, for example, in Japanese Patent Laid-Open No. 1-266983 (Patent Document 1), a copper foil portion of a substrate is drilled with an excimer laser of UV wavelength, and resin A method is disclosed in which a portion of the insulating layer made of is drilled with an infrared wavelength carbon dioxide laser.
US Pat. No. 5,593,606 (Patent Document 2) discloses a method of drilling a conductive layer and an insulating layer using a laser having a UV wavelength.

特開平1−266983号公報JP-A-1-266683 米国特許第5593606号公報US Pat. No. 5,593,606

しかしながら、上記特許文献1、2に開示するレーザを用いた基板の穴加工方法においても、また従来の機械加工による穴加工方法においても、何れも穴を開けた後に、別工程として、穴内壁に導電性層を形成する下地処理を必要とするものであった。そしてその下地処理の後に、電気メッキ等の厚膜化処理を施して、通電性のある穴に仕上げていた。
このため、通電性のある穴の作製工程が多く、製造コストが高くなるという問題があった。
また前記導電性層の下地処理は、無電解めっきやカーボンペースト塗布で行っていたが、これらの方法では欠陥をなくすことが難しいという問題があった。
However, in both the hole drilling method of the substrate using the laser disclosed in Patent Documents 1 and 2 and the hole drilling method by the conventional machining, after the hole is drilled, as a separate process, A ground treatment for forming a conductive layer was required. Then, after the base treatment, a thickening process such as electroplating was performed to finish the hole with conductivity.
For this reason, there existed a problem that there existed many preparation processes of a hole with electrical conductivity, and the manufacturing cost became high.
In addition, the ground treatment of the conductive layer has been performed by electroless plating or carbon paste coating, but it has been difficult to eliminate defects by these methods.

そこで本発明は上記従来技術における問題点を解消し、プリント配線板用基板において、より少ない工程で通電性のある穴を形成することができ、よって作業の手間とコストの低減を図ることができるプリント配線板用基板の穴加工方法、その穴加工方法を用いたプリント配線板用基板の提供を課題とする。   Therefore, the present invention solves the above-described problems in the prior art and can form a conductive hole in fewer steps in the printed wiring board substrate, thereby reducing labor and cost. It is an object of the present invention to provide a hole processing method for a printed wiring board substrate and a printed wiring board substrate using the hole processing method.

上記課題を解決する本発明のプリント配線板用基板の穴加工方法は、絶縁層の表裏に導電層が積層された積層構造を備えたプリント配線板用基板において、前記絶縁層を介した穴を形成するプリント配線板用基板の穴加工方法であって、穴を形成する時に、前記導電層から排除される金属を前記絶縁層の穴の内壁に固着させることで、前記絶縁層の穴の内壁に導電性を有する穴層を一括形成することを第1の特徴としている。
また本発明のプリント配線板用基板の穴加工方法は、上記第1の特徴に加えて、穴の形成はレーザを用いて行い、導電層から蒸散又は及び溶融される金属を絶縁層の穴の内壁に蒸着又は及び溶着させて、導電性を有する穴層を形成することを第2の特徴としている。
また本発明のプリント配線板用基板の穴加工方法は、上記第2の特徴に加えて、レーザとして、赤外線波長で20kW以上のパルスピークエネルギをもつパルスレーザを用いることを第3の特徴としている。
また本発明のプリント配線板用基板の穴加工方法は、上記第1〜第3の何れか1つの特徴に加えて、穴を形成した後に、めっき手段を用いて、絶縁層の穴内壁の導電性を有する穴層にめっき層を積層して厚膜化することを第4の特徴としている。
また本発明のプリント配線板用基板は、上記第1〜第4の何れか1つに記載のプリント配線板用基板の穴加工方法を用いてなることを第5の特徴としている。
The printed wiring board substrate drilling method of the present invention that solves the above-described problems is a printed wiring board substrate having a laminated structure in which conductive layers are laminated on the front and back of an insulating layer. A method for drilling a printed wiring board substrate to be formed, wherein when forming a hole, an inner wall of the hole in the insulating layer is formed by fixing a metal excluded from the conductive layer to the inner wall of the hole in the insulating layer. The first feature is that a hole layer having conductivity is collectively formed.
In addition to the first feature, the hole drilling method for a printed wiring board substrate according to the present invention uses a laser to form a hole, and removes the metal evaporated or melted from the conductive layer to the hole of the insulating layer. The second feature is to form a hole layer having conductivity by vapor deposition or welding on the inner wall.
In addition to the second feature described above, the hole drilling method for a printed wiring board substrate of the present invention has a third feature that a pulse laser having a pulse peak energy of 20 kW or more at an infrared wavelength is used as the laser. .
The printed wiring board substrate drilling method according to the present invention includes, in addition to any one of the first to third features described above, after forming the hole, the plating means is used to conduct the conductivity of the inner wall of the insulating layer. The fourth feature is that a plating layer is laminated on a hole layer having a property to increase the thickness.
The printed wiring board substrate of the present invention has a fifth feature that the printed wiring board substrate drilling method described in any one of the first to fourth aspects is used.

上記第1の特徴によるプリント配線板用基板の穴加工方法によれば、穴を形成する時に、導電層から排除される金属を絶縁層の穴の内壁に固着させることで、絶縁層の穴の内壁に導電性層を一括形成することにより、
導電性を有する穴層の形成を、別工程として、穴を形成する工程の後に行う必要がなくなる。よって通電性のある穴を形成する工程を従来よりも1つ減じることができる。これにより作業手間の低減と、それに伴うコスト低減を図ることができる。
上記第2の特徴によるプリント配線板用基板の穴加工方法によれば、上記第1の特徴による作用効果に加えて、穴の形成はレーザを用いて行い、導電層から蒸散又は及び溶融される金属を絶縁層の穴の内壁に蒸着又は及び溶着させて、導電性を有する穴層を形成することにより、
レーザによって蒸散又は及び溶融された導電層の金属を利用して導電性を有する穴層の形成が可能となり、導電性を有する穴層の形成のための原料を別に必要としない。よって原料供給のための設備も必要とせず、勿論、複雑な操作も不要で、コスト低減を促進できる。
また得られる導電性層は導電層の金属と同種となるので、両者間での接合が容易に行われ、良好な電気的接合が達成できる。
また得られる導電性を有する穴層は、蒸着又は及び溶着により形成されるので、穴内壁に広く、均一に付くことが可能となり、欠陥の少ない層を得ることが可能となる。よってその後の厚膜化処理が良好に行える。
上記第3の特徴によるプリント配線板用基板の穴加工方法によれば、上記第2の特徴による作用効果に加えて、レーザとして、赤外線波長で20kW以上のパルスピークエネルギをもつパルスレーザを用いることにより、
ポリイミド樹脂、PET、PC等の絶縁層はもとより、銅、金、銀、その他の光吸収の少ない金属層からなる導電層に対しても、1回の操作(作業)で穴開けが可能となる。そしてその際に、高いパルスピークエネルギをもつ赤外線による光吸収熱によって導電層の金属を蒸散又は及び溶融させると共に、その蒸散又は及び溶融された金属を、絶縁層に開けられた穴の内壁に蒸着又は及び溶着させることが可能となる。これにより穴開け加工と同時に穴内壁に導電性を有する穴層を形成することができる。
赤外線波長のパルスレーザはMOPA型ファイバレーザを用いて構成することができるので、取り扱いが容易である。
上記第4の特徴によるプリント配線板用基板の穴加工方法によれば、上記第1〜第3の何れか1つの特徴による作用効果に加えて、穴を形成した後に、めっき手段を用いて、絶縁層の穴内壁の導電性を有する穴層にめっき層を積層して厚膜化することにより、
絶縁層を介した多層間に形成される穴の通電性を確実に確保することができる。
上記第5の特徴によるプリント配線板用基板によれば、上記第1〜第4の何れか1つに記載のプリント配線板用基板の穴加工方法を用いてなるので、
製造が簡単で、良好な通電性のある穴を持つ多層のプリント配線板用基板を、低コストで提供することができる。
According to the hole drilling method for the printed wiring board substrate according to the first feature, when the hole is formed, the metal removed from the conductive layer is fixed to the inner wall of the hole of the insulating layer, thereby forming the hole of the insulating layer. By collectively forming a conductive layer on the inner wall,
It is not necessary to form the hole layer having conductivity as a separate step after the step of forming the hole. Therefore, it is possible to reduce the number of steps for forming the conductive hole by one. As a result, it is possible to reduce the labor and associated costs.
According to the hole drilling method for the printed wiring board substrate according to the second feature, in addition to the function and effect of the first feature, the hole is formed using a laser and is evaporated or melted from the conductive layer. By depositing or depositing a metal on the inner wall of the hole of the insulating layer to form a hole layer having conductivity,
A hole layer having conductivity can be formed using the metal of the conductive layer evaporated or melted by a laser, and a separate raw material for forming the hole layer having conductivity is not required. Therefore, equipment for supplying raw materials is not required, and, of course, complicated operation is unnecessary, and cost reduction can be promoted.
Further, since the obtained conductive layer is of the same type as the metal of the conductive layer, bonding between the two can be easily performed, and good electrical bonding can be achieved.
Further, since the hole layer having conductivity obtained is formed by vapor deposition or welding, it can be applied to the inner wall of the hole widely and uniformly, and a layer with few defects can be obtained. Therefore, the subsequent thickening process can be performed satisfactorily.
According to the hole drilling method for a printed wiring board substrate according to the third feature, in addition to the function and effect of the second feature, a pulse laser having a pulse peak energy of 20 kW or more at an infrared wavelength is used as the laser. By
Holes can be drilled in a single operation (work) not only for insulating layers such as polyimide resin, PET, PC, but also for conductive layers made of copper, gold, silver, and other metal layers with low light absorption. . At that time, the metal of the conductive layer is evaporated or melted by light absorption heat by infrared rays having high pulse peak energy, and the evaporated or melted metal is deposited on the inner wall of the hole formed in the insulating layer. Or, it can be welded. Thereby, the hole layer which has electroconductivity can be formed in a hole inner wall simultaneously with a drilling process.
An infrared wavelength pulsed laser can be constructed using a MOPA type fiber laser and is therefore easy to handle.
According to the hole drilling method for a printed wiring board substrate according to the fourth feature, in addition to the function and effect of any one of the first to third features, after forming the hole, using a plating means, By laminating a plating layer on the hole layer having conductivity on the inner wall of the hole of the insulating layer to increase the thickness,
It is possible to reliably ensure the conductivity of the holes formed between the multilayers via the insulating layer.
According to the printed wiring board substrate according to the fifth feature, since the hole drilling method for a printed wiring board substrate according to any one of the first to fourth is used,
A multilayer printed wiring board substrate that is easy to manufacture and has holes with good electrical conductivity can be provided at low cost.

本発明のプリント配線板用基板の穴加工方法によれば、穴を形成する時に、導電層から排除される金属を絶縁層の穴の内壁に固着させることで、絶縁層の穴の内壁に導電性を有する穴層を一括形成することにより、導電性を有する穴層の形成を穴開け工程時に同時に行うことができる。よって通電性のある穴を形成する工程を1つ減じて、作業手間の低減とそれに伴うコスト低減を図ることができる。
特に、穴の形成はレーザを用いて行い、導電層から蒸散又は及び溶融される金属を絶縁層の穴の内壁に蒸着又は及び溶着させて、導電性を有する穴層を形成することにより、レーザによる穴の形成と穴内壁への導電性を有する穴層の下地処理を一工程で行うことができる。また良好な通電性を有する穴をプリント配線板用基板に形成することができる。
According to the hole drilling method for a printed wiring board substrate of the present invention, when the hole is formed, the metal removed from the conductive layer is fixed to the inner wall of the hole of the insulating layer, thereby being electrically conductive to the inner wall of the hole of the insulating layer. By forming the hole layer having the properties in a lump, the hole layer having conductivity can be formed simultaneously with the drilling step. Therefore, the number of steps for forming a conductive hole can be reduced by one, and the labor and cost associated therewith can be reduced.
In particular, the hole is formed by using a laser, and a metal which is evaporated or melted from the conductive layer is deposited or deposited on the inner wall of the hole of the insulating layer to form a hole layer having conductivity. The formation of the hole by the step and the ground treatment of the hole layer having conductivity to the inner wall of the hole can be performed in one step. Moreover, the hole which has favorable electroconductivity can be formed in the board | substrate for printed wiring boards.

本発明の実施形態に係るプリント配線板用基板の穴加工方法を説明する図で、(A)、(B)、(C)はそれぞれプリント配線板用基板の断面図を示している。It is a figure explaining the hole drilling method of the board | substrate for printed wiring boards which concerns on embodiment of this invention, (A), (B), (C) has each shown sectional drawing of the board | substrate for printed wiring boards. 本発明の実施形態に係るプリント配線板用基板の穴加工方法の穴を形成する時の詳細を説明する図で、(A)、(B)、(C)、(D)はそれぞれプリント配線板用基板の断面図を示している。It is a figure explaining the detail when forming the hole of the hole processing method of the board | substrate for printed wiring boards which concerns on embodiment of this invention, (A), (B), (C), (D) is a printed wiring board, respectively FIG. 本発明の実施形態に係るプリント配線板用基板の穴加工方法において、導電層で蒸散又は及び溶融された金属が絶縁層の穴内壁に蒸着又は及び溶着される、より現実的な状況を説明する図で、プリント配線板用基板の断面図を示している。In the hole drilling method for a printed wiring board substrate according to the embodiment of the present invention, a more realistic situation will be described in which metal evaporated or melted in the conductive layer is deposited or welded on the inner wall of the hole in the insulating layer. In the figure, a cross-sectional view of a printed wiring board substrate is shown. 従来におけるプリント配線板用基板の穴加工方法を説明する図で、(A)、(B)、(C)、(D)はそれぞれプリント配線板用基板の断面図を示している。It is a figure explaining the hole drilling method of the board | substrate for printed wiring boards in the past, (A), (B), (C), (D) has each shown sectional drawing of the board | substrate for printed wiring boards.

以下の図面を参照して、本発明に係るプリント配線板用基板の穴加工方法と、その穴加工方法を用いたプリント配線板用基板についての実施の形態を説明し、本発明の理解に供する。しかし、以下の説明は本発明の実施形態であって、特許請求の範囲に記載の内容を限定するものではない。   With reference to the drawings, embodiments of a printed wiring board substrate drilling method according to the present invention and a printed wiring board substrate using the hole drilling method will be described for the understanding of the present invention. . However, the following description is an embodiment of the present invention, and does not limit the contents described in the claims.

先ず図1を参照して、本発明の実施形態に係るプリント配線板用基板の穴加工方法を説明する。
図1(A)を参照して、実施形態に係るプリント配線板用基板10は、絶縁層20と、その表裏に積層された導電層30、40を備えた、いわゆる両面基板である。
前記絶縁層20は、本実施形態では、ポリイミド樹脂からなる絶縁基材である。また表裏の導電層30、40は、銅箔を絶縁基材である絶縁層に張り合わせて構成されている。
前記プリント配線板用基板10の穴加工は、例えばMOPA型ファイバレーザからなるレーザLを用いた穴開け作業で行われる。
First, referring to FIG. 1, a method for drilling a printed wiring board substrate according to an embodiment of the present invention will be described.
Referring to FIG. 1A, a printed wiring board substrate 10 according to an embodiment is a so-called double-sided board that includes an insulating layer 20 and conductive layers 30 and 40 laminated on the front and back thereof.
In the present embodiment, the insulating layer 20 is an insulating base material made of a polyimide resin. Moreover, the conductive layers 30 and 40 of the front and back are comprised by bonding copper foil on the insulating layer which is an insulating base material.
The drilling of the printed wiring board substrate 10 is performed by a drilling operation using a laser L made of, for example, a MOPA type fiber laser.

次に図1(B)を参照して、穴を形成する作業は、レーザLにより、導電層30、絶縁層20、導電層40を貫通した穴50を形成することにより行われる。
そしてこの穴50を形成する時に、穴50の内壁に導電性を有する穴層60を一括形成する。ここで一括形成とは、同じ穴形成作業時に、1回の操作で、穴50と導電性を有する穴層60との両者を同時に形成するという意味である。
前記導電性を有する穴層60は、レーザLによる穴50の形成時に導電層30、40から蒸散又は及び溶融された銅が穴50の内壁に蒸着又は及び溶着することにより形成される。
Next, referring to FIG. 1B, the hole forming operation is performed by forming a hole 50 penetrating through the conductive layer 30, the insulating layer 20, and the conductive layer 40 with the laser L.
When the hole 50 is formed, a hole layer 60 having conductivity is collectively formed on the inner wall of the hole 50. Here, the collective formation means that both the hole 50 and the hole layer 60 having conductivity are formed at the same time by one operation during the same hole forming operation.
The hole layer 60 having conductivity is formed by evaporating or welding copper evaporated or melted from the conductive layers 30 and 40 on the inner wall of the hole 50 when the hole 50 is formed by the laser L.

次に図1(C)を参照して、前記導電性を有する穴層60が形成された穴50内壁に対して、電気めっきによるめっき層70を積層し、厚膜化する。導電性を有する穴層60が下地となってめっき層70が積層されることで、安定した通電性を備えた穴50が得られる。
以上の方法によって、通電性のある穴の加工がなり、導電層30と導電層40との間での電気接続が可能なプリント配線板用基板10が得られる。
Next, referring to FIG. 1C, a plating layer 70 by electroplating is laminated on the inner wall of the hole 50 in which the hole layer 60 having conductivity is formed, and the film thickness is increased. The hole 50 having stable conductivity is obtained by laminating the plating layer 70 with the hole layer 60 having conductivity as a base.
By the above method, a hole having a conductive property is formed, and the printed wiring board substrate 10 capable of electrical connection between the conductive layer 30 and the conductive layer 40 is obtained.

図2を参照して、穴を形成する作業時に穴内壁の導電化が同時に行われる原理は、次のように推定される。
今、プリント配線板用基板10に対して、レーザLを照射すると(A)、表面の導電層30の銅が光吸収熱により蒸散又は及び溶融し、導電層30に穴50が形成される(B)。そしてレーザLが絶縁層20に達すると、絶縁層20のポリイミド樹脂に穴50が形成される(C)。更に、レーザLが裏面の導電層40に達することで、該導電層40の銅を蒸散又は及び溶融させ該導電層40に穴50を開ける(D)。その際、前記導電層40から蒸散又は及び溶融した銅が、絶縁層20の穴50の内壁に蒸着又は及び溶着し、導電性薄膜からなる導電性を有する穴層60を形成する。この導電性を有する穴層60は、穴50内において表裏の導電層30、40と導通した状態に形成される。
With reference to FIG. 2, the principle that the inner wall of the hole is made conductive at the time of forming the hole is presumed as follows.
Now, when the printed wiring board substrate 10 is irradiated with the laser L (A), the copper of the conductive layer 30 on the surface is evaporated or melted by light absorption heat, and a hole 50 is formed in the conductive layer 30 ( B). When the laser L reaches the insulating layer 20, a hole 50 is formed in the polyimide resin of the insulating layer 20 (C). Further, when the laser L reaches the conductive layer 40 on the back surface, the copper of the conductive layer 40 is evaporated or melted to make a hole 50 in the conductive layer 40 (D). At that time, the copper evaporated or melted from the conductive layer 40 is deposited or deposited on the inner wall of the hole 50 of the insulating layer 20 to form the hole layer 60 having conductivity made of a conductive thin film. The hole layer 60 having conductivity is formed in a state of being electrically connected to the conductive layers 30 and 40 on the front and back sides in the hole 50.

図3を参照して、蒸散又は及び溶融された金属が絶縁層20の穴50内壁に蒸着又は及び溶着される際の、より現実的な状況例を説明する。
今、レーザLの照射により、表面の導電層30から絶縁層20を介して裏面の導電層40へと穴50を開ける際、絶縁層20そのものに形成される穴部50bは、導電層30、40のストレートな穴部50a、50cとは異なり、絶縁層20の層方向に窪んだ形に形成される。またそのような窪んだ形になるような条件を選ぶのが好ましいと言える。このような窪んだ形に絶縁層20の穴部50bが形成されることで、導電層40で蒸散又は及び溶融された金属の粒子Mが、レーザLの通過領域を外れた穴部50b内で良好に蒸着又は及び溶着される。これによって均一で良好な導電性を有する穴層60が穴部50b内壁に形成される。
With reference to FIG. 3, an example of a more realistic situation when transpiration or melted metal is deposited or deposited on the inner wall of the hole 50 of the insulating layer 20 will be described.
Now, when the hole 50 is opened from the conductive layer 30 on the front surface to the conductive layer 40 on the back surface through the insulating layer 20 by irradiation with the laser L, the hole 50b formed in the insulating layer 20 itself is formed in the conductive layer 30, Unlike the 40 straight holes 50a, 50c, the insulating layer 20 is formed in a recessed shape. In addition, it can be said that it is preferable to select such a condition that the shape becomes concave. By forming the hole 50b of the insulating layer 20 in such a depressed shape, the metal particles M evaporated or melted by the conductive layer 40 are within the hole 50b outside the laser L passing region. Evaporated or welded well. As a result, the hole layer 60 having uniform and good conductivity is formed on the inner wall of the hole 50b.

前記レーザLは、赤外線波長を持つパルスレーザを用いる。この赤外線波長をもつパルスレーザとしては、例えば波長1060nmのMOPA型のファイバレーザを用いることができる。
赤外線波長のレーザLは、そのパルスピークエネルギが20kW以上ものを用いる。が、好ましくは30kW以上のパルスピークエネルギのものを用いる。
赤外線波長のレーザであっても、20kW以上のパルスピークエネルギを持つものを用いることで、赤外線領域での光吸収の少ない銅、金、銀、その他の良導電性金属からなる導電層30、40に対して、光吸収熱による蒸散又は及び溶融、穴開けが可能となる。
赤外線波長のレーザLは、20kW以上のパルスピーク出力のものを用いる。しかし、少なくとも10W以上の平均出力のものを用いる。以上のような平均出力とパルスピーク出力をもつ赤外線パルスレーザにより、絶縁層20及び表裏の導電層30、40に貫通する穴50を、良好に穴開けすると共に、導電化することができる。
従来における赤外線ファイバレーザは、プリント配線板用基板を構成する代表的な材料である銅及びポリミドに対し、ほとんど吸収しないため、この種のプリント配線板用基板の穴開けには用いられていなかった。ところがパルスピーク出力が、20kW以上のパルスピーク出力でプリント配線板用基板にレーザ照射すると、多光子吸収等によりプリント配線板用基板材料に吸収され、穴開けが可能となる。
As the laser L, a pulse laser having an infrared wavelength is used. As a pulse laser having this infrared wavelength, for example, a MOPA type fiber laser having a wavelength of 1060 nm can be used.
The laser L having an infrared wavelength has a pulse peak energy of 20 kW or more. However, those having a pulse peak energy of 30 kW or more are preferably used.
By using an infrared wavelength laser having a pulse peak energy of 20 kW or more, the conductive layers 30 and 40 made of copper, gold, silver, or other highly conductive metals with little light absorption in the infrared region. On the other hand, it is possible to evaporate or melt and perforate by light absorption heat.
An infrared wavelength laser L having a pulse peak output of 20 kW or more is used. However, an average output power of at least 10 W is used. With the infrared pulse laser having the average output and the pulse peak output as described above, the hole 50 penetrating the insulating layer 20 and the conductive layers 30 and 40 on the front and back sides can be formed well and can be made conductive.
Conventional infrared fiber lasers have not been used for drilling this type of printed wiring board substrate because they hardly absorb copper and polyimide, which are typical materials constituting printed wiring board substrates. . However, when the pulse peak output is irradiated to the printed wiring board substrate with a pulse peak output of 20 kW or more, it is absorbed by the printed wiring board substrate material due to multiphoton absorption or the like, and holes can be formed.

赤外線波長のレーザLは、その波長は、1.06μm、パルス幅が5〜20ns、繰り返し周波数50〜100kHzのものを用いることができる。が、これらの値は、絶縁層20、導電層30、40の材質や、厚みに応じて変更調整される。
また照射時間は0.16〜1秒、焦点距離は例えば99.3mmとして実際に照射するが、これらの値もまた絶縁層20、導電層30、40の材質や、厚みに応じて変更調整される。
As the laser L having an infrared wavelength, a laser having a wavelength of 1.06 μm, a pulse width of 5 to 20 ns, and a repetition frequency of 50 to 100 kHz can be used. However, these values are changed and adjusted according to the material and thickness of the insulating layer 20 and the conductive layers 30 and 40.
The irradiation time is 0.16 to 1 second and the focal length is actually 99.3 mm, for example, but these values are also changed and adjusted according to the material and thickness of the insulating layer 20 and the conductive layers 30 and 40. The

前記絶縁層20としては、ポリイミド樹脂の他、ガラスエポキシ樹脂、PET、PCが対象となる。その他、紙フェノール、PASF(ポリアリルサルフォン)、PVA(ポリビニルアルコール)が本加工方法の対象となる。
前記導電層30、40としては、銅、金、銀、アルミニウム、その他の高導電性材料が本加工方法の対象となる。
また前記プリント配線板用基板10としては、両面基板の他、絶縁層の表裏に導電層が積層された多層基板が対象となる。
また穴50としては、貫通穴の他、非貫通穴が対象となる。
As the insulating layer 20, glass epoxy resin, PET, and PC are used in addition to polyimide resin. In addition, paper phenol, PASF (polyallyl sulfone), and PVA (polyvinyl alcohol) are objects of this processing method.
As the conductive layers 30 and 40, copper, gold, silver, aluminum, and other highly conductive materials are objects of this processing method.
In addition to the double-sided board, the printed wiring board substrate 10 is a multilayer board in which conductive layers are laminated on the front and back of an insulating layer.
In addition to the through hole, the hole 50 is a non-through hole.

なお上記においては、プリント配線板用基板の穴加工方法として、レーザを用いて、穴開け加工と絶縁層の穴内壁への導電性層の形成とを一括して行うようにした実施形態を説明した。しかし必ずしもレーザを用いる必要はない。要するに、プリント配線板用基板の穴開けの際に、導電層から排除された導電性物質を絶縁層の穴内に移動させ、その内壁に固着させるようにすればよい。これにより、別に導電性物質を用意することなく、しかも別工程を必要とすることなく、穴開け(穴形成)と導電性を有する穴層60の形成を同時に行える。前記導電性物質の導電層から絶縁層への移動は、穴を形成する作業が機械的に行われ或いは溶融を伴って行われ、或いは蒸散を伴って行われ、更にはそれらの組み合わせによって行われ得る。そしてそれら固相、液相、気相の導電性物質は穴内面に固着し、溶着し、蒸着する。溶着、蒸着したものは結果として固着する。   In the above description, an embodiment in which a hole is drilled and a conductive layer is formed on the inner wall of the insulating layer using a laser as a hole drilling method for a printed wiring board substrate is described. did. However, it is not always necessary to use a laser. In short, the conductive material removed from the conductive layer may be moved into the hole of the insulating layer and fixed to the inner wall when drilling the printed wiring board substrate. This makes it possible to simultaneously form a hole (hole formation) and form the hole layer 60 having conductivity without preparing a separate conductive material and without requiring a separate process. The movement of the conductive material from the conductive layer to the insulating layer is performed by mechanically performing a hole forming operation, accompanied by melting, accompanied by transpiration, or a combination thereof. obtain. The solid phase, liquid phase, and vapor phase conductive materials are fixed to the inner surface of the hole, welded, and deposited. What has been welded and vapor deposited adheres as a result.

本発明によれば、プリント配線板用基板の加工方法、プリント配線板用基板として、プリント配線板用基板の製造分野における産業上の利用性が高い。   ADVANTAGE OF THE INVENTION According to this invention, the industrial utilization in the manufacture field | area of a printed wiring board board | substrate is high as a processing method of a printed wiring board board | substrate, and a printed wiring board board | substrate.

1 基板
2 絶縁層
3 導電層
4 導電層
5 穴
6 導電層薄層
7 めっき層
10 プリント配線板用基板
20 絶縁層
30 導電層
40 導電層
50 穴
50a 導電層の穴部
50b 絶縁層の穴部
50c 導電層の穴部
60 導電性を有する穴層
70 めっき層
L レーザ
M 粒子
DESCRIPTION OF SYMBOLS 1 Substrate 2 Insulating layer 3 Conductive layer 4 Conductive layer 5 Hole 6 Conductive layer thin layer 7 Plating layer 10 Printed wiring board substrate 20 Insulating layer 30 Conductive layer 40 Conductive layer 50 Hole 50a Conductive layer hole 50b Insulating layer hole 50c Hole portion of conductive layer 60 Hole layer having conductivity 70 Plating layer L Laser M Particle

Claims (5)

絶縁層の表裏に導電層が積層された積層構造を備えたプリント配線板用基板において、前記絶縁層を介した穴を形成するプリント配線板用基板の穴加工方法であって、穴を形成する時に、前記導電層から排除される金属を前記絶縁層の穴の内壁に固着させることで、前記絶縁層の穴の内壁に導電性を有する穴層を一括形成することを特徴とするプリント配線板用基板の穴加工方法。   In a printed wiring board substrate having a laminated structure in which conductive layers are laminated on the front and back of an insulating layer, the printed wiring board substrate has a hole processing method for forming a hole through the insulating layer. A printed wiring board characterized in that a hole layer having conductivity is collectively formed on the inner wall of the hole of the insulating layer by fixing the metal excluded from the conductive layer to the inner wall of the hole of the insulating layer. Drilling method for printed circuit boards. 穴の形成はレーザを用いて行い、導電層から蒸散又は及び溶融される金属を絶縁層の穴の内壁に蒸着又は及び溶着させて、導電性を有する穴層を形成することを特徴とする請求項1に記載のプリント配線板用基板の穴加工方法。   The hole is formed using a laser, and a metal that is evaporated or melted from the conductive layer is deposited or deposited on the inner wall of the hole of the insulating layer to form a conductive hole layer. Item 2. A method for drilling holes in a printed wiring board substrate according to Item 1. レーザとして、赤外線波長で20kW以上のパルスピークエネルギをもつパルスレーザを用いることを特徴とする請求項2に記載のプリント配線板用基板の穴加工方法。   The method for drilling a printed wiring board substrate according to claim 2, wherein a pulse laser having a pulse peak energy of 20 kW or more at an infrared wavelength is used as the laser. 穴を形成した後に、めっき手段を用いて、絶縁層の穴内壁の導電性を有する穴層にめっき層を積層して厚膜化することを特徴とする請求項1〜3の何れか1つに記載のプリント配線板用基板の穴加工方法。   4. The method according to claim 1, wherein after forming the hole, a plating layer is used to deposit a plating layer on the hole layer having conductivity on the inner wall of the hole of the insulating layer to increase the thickness. A method for drilling holes in a printed wiring board substrate as described in 1. 請求項1〜4の何れか1つに記載のプリント配線用基板の穴加工方法を用いてなるプリント配線板用基板。   The printed wiring board board | substrate formed using the hole drilling method of the printed wiring board as described in any one of Claims 1-4.
JP2009148428A 2009-06-23 2009-06-23 Hole processing method of substrate for printed circuit board and substrate for printed circuit board manufactured by the hole processing method Pending JP2011009263A (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012074482A (en) * 2010-09-28 2012-04-12 Sekisui Chem Co Ltd Method of forming through hole electrode and electronic component
WO2012098930A1 (en) * 2011-01-18 2012-07-26 Towa株式会社 Laser processing apparatus

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Publication number Priority date Publication date Assignee Title
JPH0241922B2 (en) * 1981-11-17 1990-09-20
JP2002252464A (en) * 2001-02-26 2002-09-06 Hitachi Ltd Multilayer wiring structure, its manufacturing method, electronic circuit device, and electronic part
JP2008000938A (en) * 2006-06-21 2008-01-10 Asahi Kasei Chemicals Corp Manufacturing method of sheetlike or cylindrical printing substrate

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0241922B2 (en) * 1981-11-17 1990-09-20
JP2002252464A (en) * 2001-02-26 2002-09-06 Hitachi Ltd Multilayer wiring structure, its manufacturing method, electronic circuit device, and electronic part
JP2008000938A (en) * 2006-06-21 2008-01-10 Asahi Kasei Chemicals Corp Manufacturing method of sheetlike or cylindrical printing substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012074482A (en) * 2010-09-28 2012-04-12 Sekisui Chem Co Ltd Method of forming through hole electrode and electronic component
WO2012098930A1 (en) * 2011-01-18 2012-07-26 Towa株式会社 Laser processing apparatus
JP2012148299A (en) * 2011-01-18 2012-08-09 Towa Corp Laser processing apparatus

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