JP2010284722A - Alloy for joining - Google Patents

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JP2010284722A
JP2010284722A JP2010037676A JP2010037676A JP2010284722A JP 2010284722 A JP2010284722 A JP 2010284722A JP 2010037676 A JP2010037676 A JP 2010037676A JP 2010037676 A JP2010037676 A JP 2010037676A JP 2010284722 A JP2010284722 A JP 2010284722A
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atomic
alloy
joining
foil
bonding
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JP5212401B2 (en
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Yuichi Sato
有一 佐藤
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Nippon Steel Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide inexpensive alloy for joining with a low melting point by optimizing alloy composition of a joining material. <P>SOLUTION: The alloy for joining contains, in atom%, ≥4% and ≤18% of B, ≥0.1% and ≤10% of P, ≥4% and ≤8% of Si, ≥0.1% and ≤10% of C, and the balance Fe with inevitable impurities. In addition, the alloy for joining contains at least one of ≥0.1% and ≤20% of Cr, ≥0.1% and ≤10% of V, and ≥0.1% and ≤40% of Ni. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は、各種部品、構造物等の材料を接合するための接合用合金に関するものである。   The present invention relates to a bonding alloy for bonding materials such as various parts and structures.

各種部品、構造物等の材料の接合方法として、液相拡散接合が知られている。液相拡散接合とは、被接合材間に融点が被接合材のそれより低い接合材料を介在させて、接合材料の液相線温度以上、被接合材料の液相線温度以下の温度で加熱し、接合材料中の拡散元素を拡散させて接合する方法である。   Liquid phase diffusion bonding is known as a method for bonding materials such as various parts and structures. In liquid phase diffusion bonding, a bonding material having a melting point lower than that of the material to be bonded is interposed between the materials to be bonded and heated at a temperature not lower than the liquidus temperature of the bonding material and not higher than the liquidus temperature of the material to be bonded. In this method, the diffusion element in the bonding material is diffused for bonding.

本発明者らは、酸化雰囲気中での液相拡散接合を実現できる接合用合金箔を発明し、開示した(特許文献1参照)。上記合金箔は、P:1.0〜20原子%、Si:1.0〜10原子%、V:0.1〜20原子%、B:1.0〜20原子%を含有し、さらに、Cr、Ni、Co、W、Nb、Tiを必要に応じて含有し、残部がFe及び不可避的不純物からなる組成を有し、厚さが3.0〜200μmの箔である。   The inventors have invented and disclosed a bonding alloy foil capable of realizing liquid phase diffusion bonding in an oxidizing atmosphere (see Patent Document 1). The alloy foil contains P: 1.0 to 20 atomic%, Si: 1.0 to 10 atomic%, V: 0.1 to 20 atomic%, B: 1.0 to 20 atomic%, A foil having a composition of Cr, Ni, Co, W, Nb, Ti as required, the balance of Fe and inevitable impurities, and a thickness of 3.0 to 200 μm.

また、このような合金箔を製造するための方法として、単ロール法や双ロール法などが知られている。これらの方法は、高速回転する金属製ドラムの外周面に、溶融金属・合金をオリフィスなどから噴出させることにより急速に凝固させて、箔を鋳造するものである。合金組成を適正に選ぶことによって、液体金属に類似した非晶質合金箔を製造することができる。   Moreover, a single roll method, a twin roll method, etc. are known as a method for manufacturing such an alloy foil. In these methods, a foil is cast by rapidly solidifying the outer peripheral surface of a metal drum rotating at high speed by ejecting molten metal / alloy from an orifice or the like. By properly selecting the alloy composition, an amorphous alloy foil similar to a liquid metal can be produced.

本発明者らは、上記特許文献1に開示した液相拡散接合用合金箔を改善した液相拡散接合用合金箔を開示した(特許文献2、3参照)。これら特許文献2、3で開示した液相拡散接合用合金箔は、接合強度の改善を狙ったもので、その特徴は接合用合金箔のSi含有量を低減したことである。   The present inventors have disclosed an alloy foil for liquid phase diffusion bonding, which is an improvement over the alloy foil for liquid phase diffusion bonding disclosed in Patent Document 1 (see Patent Documents 2 and 3). These alloy foils for liquid phase diffusion bonding disclosed in Patent Documents 2 and 3 are aimed at improving the bonding strength, and the feature is that the Si content of the bonding alloy foil is reduced.

本発明者らが接合強度劣化の原因を調査したところ、SiOが強度劣化をもたらす割れの基点となっており、このSiOは接合箔中のSiによるものであることが判明したことによる。 The present inventors have investigated the cause of the bonding strength deterioration, has a base point of cracking SiO 2 results in deterioration of strength, due to the fact that that the SiO 2 is due to Si in the bonding foil was found.

しかしながら、接合後の接合強度の改善は実現したものの、この合金箔の製造性にやや問題があった。具体的には、脆化破断して連続した箔とならなかったり、連続したものとなっても平坦な箔ではなかったり、表面性状が不良となるという問題があった。製造が困難になると製造歩留が低減し、製造コストの上昇を招き問題となる。   However, although improvement in the bonding strength after bonding was realized, there was a slight problem in the manufacturability of this alloy foil. Specifically, there was a problem that the foil did not break and became a continuous foil, or even if it became continuous, it was not a flat foil, or the surface properties were poor. If the production becomes difficult, the production yield is reduced, resulting in an increase in the production cost.

特開平9−323175号公報JP-A-9-323175 特開2004−001065号公報JP 2004-001065 A 特開2004−114157号公報JP 2004-114157 A

本発明は、接合用合金の製造性を改善することにより、製造コストを低減することを課題とする。   This invention makes it a subject to reduce manufacturing cost by improving the manufacturability of the alloy for joining.

本発明では、接合用合金の合金成分を最適化することにより、この合金の製造性の改善を行い、上記課題の実現を図った。   In the present invention, by optimizing the alloy components of the joining alloy, the productivity of this alloy was improved, and the above-described problems were realized.

本発明の要旨は、以下のとおりである。   The gist of the present invention is as follows.

(1)原子%で、
B :4%以上18%以下、
P :1%以上10%以下、
Si:4%以上8%以下、
C :0.1%以上10%以下
を含有し、残部がFe及び不可避的不純物からなることを特徴とする接合用合金。
(1) Atomic%
B: 4% or more and 18% or less,
P: 1% or more and 10% or less,
Si: 4% or more and 8% or less,
C: A joining alloy comprising 0.1% or more and 10% or less, the balance being Fe and inevitable impurities.

(2)さらに原子%で、
Cr:0.1%以上20%以下
を含有することを特徴とする前記(1)に記載の接合用合金。
(2) Furthermore, in atomic%,
Cr: The joining alloy as described in (1) above, containing 0.1% to 20%.

(3)さらに原子%で、
V :0.1%以上10%以下
を含有することを特徴とする前記(1)又は(2)に記載の接合用合金。
(3) Furthermore, in atomic%,
V: The joining alloy according to (1) or (2) above, containing 0.1% or more and 10% or less.

(4)さらに原子%で、
Ni:0.1%以上40%以下
を含有することを特徴とする前記(1)〜(3)のいずれかに記載の接合用の合金。
(4) Furthermore, in atomic%,
Ni: 0.1% or more and 40% or less are contained, The alloy for joining in any one of said (1)-(3) characterized by the above-mentioned.

本発明によれば、脆化による箔の破断が解消し、表面性状良好で平坦な箔が容易に得られるようになり、接合用合金の製造性が向上し、その結果、製造コストの低減を実現でき、安価な接合用合金の提供が可能となる。   According to the present invention, the foil breakage due to embrittlement is eliminated, and a flat foil having a good surface property can be easily obtained, so that the manufacturability of the bonding alloy is improved, and as a result, the manufacturing cost can be reduced. This can be realized and an inexpensive bonding alloy can be provided.

実施例における、接合実験を示す図である。It is a figure which shows the joining experiment in an Example. 実施例における、引張試験片を示す図である。It is a figure which shows the tensile test piece in an Example.

本発明の接合用合金は、箔としての形成能を高めるよう合金成分を最適化することで、製造性を向上させている。箔の形成を容易にするには非晶質相の形成が重要であるが、非晶質相は箔全体に形成されなくてもよい。しかし、非晶質相の形成される割合が小さすぎると箔の形成が困難になるので、非晶質相の形成される割合は、箔全体の50%以上であることが好ましく、さらに好ましくは70%以上である。   The joining alloy of the present invention has improved manufacturability by optimizing the alloy components so as to enhance the forming ability as a foil. The formation of an amorphous phase is important for facilitating the formation of the foil, but the amorphous phase may not be formed on the entire foil. However, since the formation of the foil becomes difficult if the proportion of the amorphous phase formed is too small, the proportion of the amorphous phase formed is preferably 50% or more of the entire foil, more preferably 70% or more.

また、接合用合金は低融点であることも重要な要件である。本発明では特に限定しないが、母材への熱影響を考慮すると融点は低いほど良く、接合用合金の融点は1200℃以下、さらには、1100℃以下が好ましい。   It is also an important requirement that the bonding alloy has a low melting point. Although there is no particular limitation in the present invention, the lower the melting point, the better when considering the thermal effect on the base material, and the melting point of the bonding alloy is preferably 1200 ° C. or lower, more preferably 1100 ° C. or lower.

以下に成分限定理由を述べる。   The reasons for limiting the components will be described below.

Bは、4原子%未満では非晶質形成が困難となり、箔の形成能は劣化するため、4原子%以上とし、好ましくは6原子%以上である。一方、18原子%超では接合部に硼化物を生成し接合強度を低下させるため、18原子%以下とし、好ましくは16原子%以下である。   If B is less than 4 atomic%, amorphous formation becomes difficult, and the foil forming ability deteriorates, so that it is 4 atomic% or more, and preferably 6 atomic% or more. On the other hand, if it exceeds 18 atomic%, a boride is generated at the joint and the bonding strength is lowered, so that it is 18 atomic% or less, preferably 16 atomic% or less.

Pは、その含有量を10原子%超とすると接合層での極端な靱性劣化を抑制することは困難となる。また、Pは合金の非晶質形成能向上や低融点化に効果のある元素であるが、1原子%未満ではそれらの効果が認められなくなる。よって、P含有量を1原子%以上10原子%以下とした。なお、Pの含有量は多い方がその効果を発現しやすく、3原子%以上とするのがより好ましい。   When the content of P exceeds 10 atomic%, it becomes difficult to suppress extreme toughness deterioration in the bonding layer. P is an element effective for improving the amorphous forming ability of the alloy and lowering the melting point. However, if it is less than 1 atomic%, these effects are not recognized. Therefore, the P content is set to 1 atom% or more and 10 atom% or less. In addition, the one where there is much content of P tends to express the effect, and it is more preferable to set it as 3 atomic% or more.

Siは、非晶質相安定化に有益な元素で、この非晶質相の安定化が箔形成能を高めるので、Siは箔の製造性向上に重要な役割を果たす。その効果を発現するには4原子%以上の添加が必要である。一方、8原子%超と過度に添加すると接合層にSiOが多発して接合強度の極端な劣化をもたらすので好ましくない。よって、Si含有量は4原子%以上8原子%以下とし、好ましくは7原子%以下とする。 Si is an element useful for stabilizing the amorphous phase, and stabilization of the amorphous phase increases the foil forming ability, so Si plays an important role in improving the productivity of the foil. In order to exhibit the effect, addition of 4 atomic% or more is necessary. On the other hand, excessive addition of more than 8 atomic% is not preferable because SiO 2 is frequently generated in the bonding layer and the bonding strength is extremely deteriorated. Therefore, the Si content is 4 atomic% or more and 8 atomic% or less, preferably 7 atomic% or less.

CもSi同様、非晶質形成能に重要な元素で、低融点化にも有効な元素である。よって、本発明ではC含有量を高めることで箔形成能を高めることができたが、C量の過度の添加は接合層の特性劣化を招くので10原子%以下とした。一方、0.1原子%未満ではもはや非晶質形成能向上や低融点化への効果が認められなくなる。したがって、C含有量は0.1原子%以上10原子%以下とし、好ましくは0.5原子%以上、8原子%以下である。   C, like Si, is an element important for amorphous forming ability, and is also an element effective for lowering the melting point. Therefore, in the present invention, the foil forming ability could be improved by increasing the C content. However, excessive addition of the C amount causes deterioration of the characteristics of the bonding layer, so the content was made 10 atomic% or less. On the other hand, if it is less than 0.1 atomic%, effects on improving the amorphous forming ability and lowering the melting point are no longer recognized. Accordingly, the C content is 0.1 atomic% or more and 10 atomic% or less, preferably 0.5 atomic% or more and 8 atomic% or less.

Crは、耐食性、耐酸化性を高めるために、必要に応じて添加する。0.1原子%未満ではその効果が不十分であり、20原子%を超えると融点が高くなり好ましくない。したがって、Cr含有量を0.1原子%以上20原子%以下とし、好ましくは1原子%以上18原子%以下である。   Cr is added as necessary to enhance corrosion resistance and oxidation resistance. If it is less than 0.1 atomic%, the effect is insufficient, and if it exceeds 20 atomic%, the melting point becomes high, which is not preferable. Therefore, the Cr content is 0.1 atomic% or more and 20 atomic% or less, preferably 1 atomic% or more and 18 atomic% or less.

Vは、被接合材表面の酸化被膜形成物質を低融点物質にする効果がある。例えば、Feを融点が約800℃の低融点複合酸化物V−Feにする効果があり、通常の接合温度では酸化被膜が溶融する。このような酸化物は溶けると表面張力の差によって球状化するので隙間が生成し、B、P等の拡散元素が自由に拡散できるようになり、酸化雰囲気中でも液相拡散接合を達成できる。 V has the effect of making the oxide film forming substance on the surface of the material to be joined a low melting point substance. For example, has the effect of the Fe 2 O 3 having a low melting point composite oxides having a melting point of about 800 ℃ V 2 O 5 -Fe 2 O 3, in a normal bonding temperature oxidation film is melted. When such an oxide melts, it spheroidizes due to the difference in surface tension, so that a gap is formed, and diffusion elements such as B and P can freely diffuse, and liquid phase diffusion bonding can be achieved even in an oxidizing atmosphere.

V含有量が0.1原子%未満ではこの効果が不十分であり、10原子%超では融点が高くなるので好ましくない。よって、V含有量を0.1原子%以上10原子%以下とし、好ましくは0.5原子%以上8原子%以下である。   If the V content is less than 0.1 atomic%, this effect is insufficient, and if it exceeds 10 atomic%, the melting point becomes high. Therefore, the V content is 0.1 atomic% or more and 10 atomic% or less, preferably 0.5 atomic% or more and 8 atomic% or less.

Niは、低融点化効果があり、さらに箔の形成能を向上させる。Ni含有量が0.1原子%未満ではこの効果が不十分であり、40原子%超ではこの効果が得られなくなるばかりでなく、原料コストが嵩むことになるので好ましくない。よって、Ni含有量を0.1原子%以上40原子%以下とした。なお、Niの含有量は多い方がその効果を発現しやすく、5原子%以上が好ましい。   Ni has an effect of lowering the melting point, and further improves the foil forming ability. If the Ni content is less than 0.1 atomic%, this effect is insufficient, and if it exceeds 40 atomic%, this effect cannot be obtained, and the raw material cost increases. Therefore, the Ni content is set to 0.1 atomic percent or more and 40 atomic percent or less. In addition, the one where content of Ni is large tends to express the effect, and 5 atomic% or more is preferable.

上記元素以外の残部は、Fe及び不可避的不純物からなる。不可避的不純物としては、Mn、S等を0.2原子%程度まで含有しても特段の問題はない。   The balance other than the above elements consists of Fe and inevitable impurities. As an inevitable impurity, there is no particular problem even if Mn, S, etc. are contained up to about 0.2 atomic%.

なお、Vを添加することにより酸化雰囲気中での接合が可能となるが、本発明のV添加合金は、酸化雰囲気用に限定されるものではない。   In addition, joining in an oxidizing atmosphere is possible by adding V, but the V-added alloy of the present invention is not limited to an oxidizing atmosphere.

本発明の接合用合金は、液相拡散接合のみならず、いわゆるロウ付け及びロウ接とよばれる接合法にも使用できる。この接合法は一般的に、接合材が溶融したのち、接合材中の拡散元素が被接合材中に拡散する前に固化して接合する方法である。   The bonding alloy of the present invention can be used not only for liquid phase diffusion bonding but also for bonding methods called so-called brazing and brazing. In general, this bonding method is a method in which, after the bonding material is melted, the diffusion element in the bonding material is solidified and diffused before being diffused into the material to be bonded.

また、本発明の接合用合金は、急冷凝固法として知られている単ロール法や双ロール法等により箔に鋳造し、箔状の接合材として使用することができる。また、形状として箔のほか、用途に応じて粉末等も使用することができる。さらに、非晶質に限らず、結晶質のものでも用途によっては使用可能である。   Further, the joining alloy of the present invention can be cast into a foil by a single roll method or a twin roll method known as a rapid solidification method and used as a foil-like joining material. In addition to foil as a shape, powder or the like can be used depending on the application. Further, not only amorphous but also crystalline ones can be used depending on applications.

本発明を実施例に基づいて、以下に詳細に説明する。表1、2に示す各合金について、単ロール法により下記条件で箔を鋳造した。なお、表1、2において、“−”は、含有量が検出限界未満であることを意味する。表3、4に融点及び接合実験の結果を示す。   The present invention will be described in detail below based on examples. About each alloy shown to Table 1, 2, foil was cast on the following conditions by the single roll method. In Tables 1 and 2, “-” means that the content is less than the detection limit. Tables 3 and 4 show the melting point and the result of the joining experiment.

冷却ロール:材質;Cu−1質量%Cr
直径;300mm
幅;50mm
表面速度(周速):25m/s
ノズル−冷却ロール間のギャップ:250μm
ノズル開口形状:0.6mm×25mm
Cooling roll: Material; Cu-1 mass% Cr
Diameter: 300mm
Width: 50mm
Surface speed (peripheral speed): 25 m / s
Nozzle-cooling roll gap: 250 μm
Nozzle opening shape: 0.6mm x 25mm

各合金は、いずれも、Mn、S等の不純物を0.2原子%程度含んでいる。鋳造時の溶融合金温度は、表3、4に示す融点よりおよそ150℃高い温度とした。各合金の融点はDTA装置により求め表3、4に示した。   Each alloy contains about 0.2 atomic% of impurities such as Mn and S. The temperature of the molten alloy at the time of casting was about 150 ° C. higher than the melting points shown in Tables 3 and 4. The melting point of each alloy was determined by a DTA apparatus and shown in Tables 3 and 4.

鋳造結果として、得られた箔の性状から箔の製造性を評価し、表3、4に示した。実施例のすべてにおいて良好な箔が得られた。   As a result of casting, the productivity of the foil was evaluated from the properties of the obtained foil, and the results are shown in Tables 3 and 4. Good foils were obtained in all of the examples.

比較例で得られた、“△”で表示した箔は、全長に渡って良好とは言えなかった。なお、比較例のNo.35、No.43、No.49では破断して連続した箔が得られず、以後の接合実験を行うことができなかった。表3、4の融点、接合雰囲気、接合強度の“−”は、試験未実施であることを意味する。   The foil indicated by “Δ” obtained in the comparative example was not good over the entire length. The comparative example No. 35, no. 43, no. In No. 49, a continuous foil was not obtained by breaking, and subsequent joining experiments could not be performed. In Tables 3 and 4, “−” in the melting point, the bonding atmosphere, and the bonding strength means that the test has not been performed.

製造性は、製造時に得られた箔の外観観察で評価した。得られた箔が破断なく表面性状良好で平坦な箔であれば製造性は良好、破断が発生したり、平坦な箔ではなかったり、さらには表面性状が悪い箔であれば良好ではないと判定した。   Manufacturability was evaluated by observing the appearance of the foil obtained during production. If the obtained foil is a flat foil with good surface properties without breakage, the manufacturability is good, and it is determined that it is not good if breakage occurs, it is not a flat foil, or even a foil with poor surface properties. did.

次に、得られた箔を用いて接合実験を行った。接合実験に際しては、直径20mmの円盤状にした箔を2枚重ねて接合材とし、直径20mmのSTK490丸鋼(融点1550℃以上)を被接合材とした。   Next, a joining experiment was performed using the obtained foil. In the joining experiment, two pieces of foil having a disk shape with a diameter of 20 mm were overlapped to form a joining material, and STK490 round steel having a diameter of 20 mm (melting point of 1550 ° C. or higher) was used as the joining material.

図1に示すように、2本の被接合材1の間に接合材2を挟み込んで接合した。接合温度は、各接合材2の融点直上から融点+50℃として、雰囲気制御が可能な加熱炉を用いて、表3、4に示すそれぞれの雰囲気で加熱した。加熱中は、被接合材1と接合材2の密着性を高めるため2MPaで加圧した。接合時間はすべて10分とした。   As shown in FIG. 1, a bonding material 2 is sandwiched between two bonded materials 1 and bonded. The bonding temperature was set to a melting point + 50 ° C. immediately above the melting point of each bonding material 2 and heated in respective atmospheres shown in Tables 3 and 4 using a heating furnace capable of controlling the atmosphere. During heating, a pressure of 2 MPa was applied in order to improve the adhesion between the material to be bonded 1 and the bonding material 2. The joining time was all 10 minutes.

接合実験後、接合継手部の引張強度を評価するために引張試験を行った。引張試験に際しては図2に示すように、被接合材1を接合した丸棒3から接合線4を中心としてJIS2号引張試験片5を切り出し、JISA2号引張試験機を用いて引張試験を行った。また、接合実験前の被接合材の母材からも同試験片を切り出して同様に引張試験を行い、接合強度を対母材比(接合部強度/母材強度)で表3、4に示した。   After the joining experiment, a tensile test was performed to evaluate the tensile strength of the joint joint. In the tensile test, as shown in FIG. 2, a JIS No. 2 tensile test piece 5 was cut out from the round bar 3 to which the material to be joined 1 was joined, with the joining line 4 as the center, and a tensile test was performed using a JIS No. 2 tensile tester. . In addition, the same test piece was cut out from the base material of the material to be joined before the joining experiment and the tensile test was performed in the same manner, and the joint strength is shown in Tables 3 and 4 in terms of base material ratio (joint strength / base material strength). It was.

表3、4に示したように、本発明例はいずれも、良好な箔が得られ、かつ、対母材比で1.0を超える引張強度を示した。   As shown in Tables 3 and 4, all of the examples of the present invention gave a good foil and exhibited a tensile strength exceeding 1.0 in terms of the base material ratio.

これに対して、表3、4に示したように、比較例ではすべてにおいて良好な箔は得られなかった。   On the other hand, as shown in Tables 3 and 4, good foils were not obtained in all the comparative examples.

Figure 2010284722
Figure 2010284722

Figure 2010284722
Figure 2010284722

Figure 2010284722
Figure 2010284722

Figure 2010284722
Figure 2010284722

複雑な接合形状を有する各種部品や構造物等の材料の接合において、接合温度の低下や一度に広い接合を可能とする液相拡散接合は産業上有益な接合方法である。本発明の接合用合金箔は低コスト化を実現したことから、この液相拡散接合のコスト低減に大いに貢献できる。   In the joining of materials such as various parts and structures having a complicated joining shape, liquid phase diffusion joining that enables a joining temperature to be lowered and wide joining at once is an industrially useful joining method. Since the bonding alloy foil of the present invention has realized cost reduction, it can greatly contribute to the cost reduction of this liquid phase diffusion bonding.

1 被接合材
2 接合材
3 接合後の丸鋼
4 接合線
5 引張試験片
DESCRIPTION OF SYMBOLS 1 To-be-joined material 2 Joining material 3 Round steel after joining 4 Joining wire 5 Tensile test piece

Claims (4)

原子%で、
B :4%以上18%以下、
P :1%以上10%以下、
Si:4%以上8%以下、
C :0.1%以上10%以下
を含有し、残部がFe及び不可避的不純物からなることを特徴とする接合用合金。
Atomic%
B: 4% or more and 18% or less,
P: 1% or more and 10% or less,
Si: 4% or more and 8% or less,
C: A joining alloy comprising 0.1% or more and 10% or less, the balance being Fe and inevitable impurities.
さらに原子%で、
Cr:0.1%以上20%以下
を含有することを特徴とする請求項1項に記載の接合用合金。
Furthermore, in atomic%,
The alloy for bonding according to claim 1, containing Cr: 0.1% to 20%.
さらに原子%で、
V :0.1%以上10%以下
を含有することを特徴とする請求項1又は2に記載の接合用合金。
Furthermore, in atomic%,
V: 0.1% or more and 10% or less are contained, The alloy for joining of Claim 1 or 2 characterized by the above-mentioned.
さらに原子%で、
Ni:0.1%以上40%以下
を含有することを特徴とする請求項1〜3のいずれか1項に記載の接合用の合金。
Furthermore, in atomic%,
Ni: 0.1% or more and 40% or less are contained, The alloy for joining of any one of Claims 1-3 characterized by the above-mentioned.
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