JP2010267693A5 - - Google Patents

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Publication number
JP2010267693A5
JP2010267693A5 JP2009116254A JP2009116254A JP2010267693A5 JP 2010267693 A5 JP2010267693 A5 JP 2010267693A5 JP 2009116254 A JP2009116254 A JP 2009116254A JP 2009116254 A JP2009116254 A JP 2009116254A JP 2010267693 A5 JP2010267693 A5 JP 2010267693A5
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JP
Japan
Prior art keywords
resist layer
solder resist
soldering
mesh
screen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009116254A
Other languages
Japanese (ja)
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JP2010267693A (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2009116254A priority Critical patent/JP2010267693A/en
Priority claimed from JP2009116254A external-priority patent/JP2010267693A/en
Publication of JP2010267693A publication Critical patent/JP2010267693A/en
Publication of JP2010267693A5 publication Critical patent/JP2010267693A5/ja
Pending legal-status Critical Current

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Description

次に、NPR3300(日本ポリテック(株)製)を上記、第1のソルダーレジスト層の上にスクリーン印刷し、100℃で5分乾燥して第のソルダーレジスト層とした。次いで、120℃で90分間保持して第1のソルダーレジスト層と第2のソルダーレジスト層の両方を熱硬化させた。第2のソルダーレジスト層の形成に用いたスクリーン版は、325メッシュ、線径28μmのステンレスメッシュであって、インナーリード部4辺全てにおいて、第2のソルダーレジスト層の端部を第1のソルダーレジスト層の端部より金属配線が露出している側へ約60μmの位置に形成できるように、開口部を設計したものである(図6のパターン)。 Next, NPR3300 (manufactured by Nippon Polytech Co., Ltd.) was screen-printed on the first solder resist layer and dried at 100 ° C. for 5 minutes to form a second solder resist layer. Subsequently, it hold | maintained at 120 degreeC for 90 minute (s), and both the 1st soldering resist layer and the 2nd soldering resist layer were thermosetted. The screen plate used for forming the second solder resist layer is a stainless steel mesh of 325 mesh and a wire diameter of 28 μm. The opening is designed so that it can be formed at a position of about 60 μm from the end of the resist layer to the side where the metal wiring is exposed (pattern in FIG. 6).

JP2009116254A 2009-05-13 2009-05-13 Method for forming solder resist and circuit board Pending JP2010267693A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009116254A JP2010267693A (en) 2009-05-13 2009-05-13 Method for forming solder resist and circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009116254A JP2010267693A (en) 2009-05-13 2009-05-13 Method for forming solder resist and circuit board

Publications (2)

Publication Number Publication Date
JP2010267693A JP2010267693A (en) 2010-11-25
JP2010267693A5 true JP2010267693A5 (en) 2012-05-17

Family

ID=43364444

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009116254A Pending JP2010267693A (en) 2009-05-13 2009-05-13 Method for forming solder resist and circuit board

Country Status (1)

Country Link
JP (1) JP2010267693A (en)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS614294A (en) * 1984-06-18 1986-01-10 松下電器産業株式会社 Method of producing printed board
JPS61110490A (en) * 1984-11-02 1986-05-28 松下電器産業株式会社 Resist film formation for printed circuit board
JPS63271997A (en) * 1987-04-28 1988-11-09 Ibiden Co Ltd Printed wiring board
JPH04106996A (en) * 1990-08-24 1992-04-08 Seiko Epson Corp Circuit board
JPH05191021A (en) * 1992-01-14 1993-07-30 Matsushita Electric Works Ltd Printed wiring board
JPH06252550A (en) * 1993-02-26 1994-09-09 Matsushita Electric Works Ltd Manufacture of printed wiring board
JP3378297B2 (en) * 1993-04-30 2003-02-17 日本シイエムケイ株式会社 Manufacturing method of printed wiring board
JPH09312463A (en) * 1996-05-22 1997-12-02 Ajinomoto Co Inc Method of forming pattern
JP5106726B2 (en) * 2001-08-10 2012-12-26 イビデン株式会社 Wiring board manufacturing method
TWI288590B (en) * 2005-10-31 2007-10-11 Unimicron Technology Corp Method of forming solder mask and circuit board with solder mask

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