JP2010241831A - Fluorine-containing polyether carboxylic acid ester - Google Patents

Fluorine-containing polyether carboxylic acid ester Download PDF

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JP2010241831A
JP2010241831A JP2010162427A JP2010162427A JP2010241831A JP 2010241831 A JP2010241831 A JP 2010241831A JP 2010162427 A JP2010162427 A JP 2010162427A JP 2010162427 A JP2010162427 A JP 2010162427A JP 2010241831 A JP2010241831 A JP 2010241831A
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integer
acid ester
carboxylic acid
fluorine
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JP5206746B2 (en
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Keisuke Kogane
敬介 小金
Katsuyuki Sato
勝之 佐藤
Kazuhiro Yamamoto
和弘 山本
Takehiro Sonoi
竹比呂 園井
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Unimatec Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a new fluorine-containing polyether carboxylic acid ester having not less than two polymerizable functional groups in a molecule, which is obtained by a one-step reaction of directly reacting an alcohol with an acid halide. <P>SOLUTION: This is a fluorine-containing polyether carboxylic acid ester represented by the general formula: R<SP>1</SP>OCOCF(CF<SB>3</SB>)[OCF<SB>2</SB>CF(CF<SB>3</SB>)]<SB>a</SB>O(CF<SB>2</SB>)<SB>b</SB>O[CF(CF<SB>3</SB>)CF<SB>2</SB>O]<SB>c</SB>CF(CF<SB>3</SB>)COOR<SP>1</SP>, wherein R<SP>1</SP>is a group represented by the general formula: CH<SB>2</SB>=CR<SP>2</SP>COO(CH<SB>2</SB>)<SB>d</SB>CH<SB>2</SB>- (R<SP>2</SP>is a hydrogen atom or methyl group, d is an integer of 1-3), a+c is an integer of not greater than 28 except 0, preferably an integer of 6-28 and b is an integer of not smaller than 2. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は、含フッ素ポリエーテルカルボン酸エステルに関する。更に詳しくは、1分子中に2個以上の重合性官能基を有する含フッ素ポリエーテルカルボン酸エステルに関する。   The present invention relates to a fluorine-containing polyether carboxylic acid ester. More specifically, the present invention relates to a fluorine-containing polyether carboxylic acid ester having two or more polymerizable functional groups in one molecule.

特許文献1には、一般式
R1OCH2CFX1(OCF2CFX2)lO(CF2)mO(CFX3CF2O)nCFX4CH2OR2
R1,R2:ビニル基、アリル基、アクリロイル基、メタアクリロイル基
またはエポキシアルキル基
X1〜X4:パーフルオロアルキル基
l,n:0以上の整数
m:2以上の整数
で表される含フッ素エーテル化合物が記載されている。
Patent Document 1 discloses a general formula.
R 1 OCH 2 CFX 1 (OCF 2 CFX 2 ) l O (CF 2 ) m O (CFX 3 CF 2 O) n CFX 4 CH 2 OR 2
R 1 and R 2 : Vinyl group, allyl group, acryloyl group, methacryloyl group
Or epoxy alkyl group
X 1 to X 4 : perfluoroalkyl group
l, n: An integer greater than or equal to 0
m: A fluorine-containing ether compound represented by an integer of 2 or more is described.

この化合物は、相当する酸フロライドをメチルエステル化した後還元を行い、得られたアルコールに酸ハライドを反応させるという3つの工程がとられている。   This compound is subjected to three steps: methyl esterification of the corresponding acid fluoride, followed by reduction, and reaction of the acid halide with the resulting alcohol.

特許第2,563,959号公報Japanese Patent No. 2,563,959

本発明の目的は、酸ハライドに直接アルコールを反応させるという1段階の反応によって得られる、1分子中に2個以上の重合性官能基を有する新規な含フッ素ポリエーテルカルボン酸エステルを提供することにある。   An object of the present invention is to provide a novel fluorine-containing polyether carboxylic acid ester having two or more polymerizable functional groups in one molecule obtained by a one-step reaction in which an alcohol is directly reacted with an acid halide. It is in.

かかる本発明の目的は、一般式
R1OCOCF(CF3)[OCF2CF(CF3)]aO(CF2)bO[CF(CF3)CF2O]cCF(CF3)COOR1
ここで、R1一般式 CH 2 =CR 2 COO(CH 2 ) d CH 2 - (R 2 は水素原子またはメチル基であり、dは1〜3の整数である)で表わされる基であり、a+cは0を除く28以下の整数であり、bは2以上の整数であるで表わされる含フッ素ポリエーテルカルボン酸エステルによって達成される。
The object of the present invention is to provide a general formula
R 1 OCOCF (CF 3 ) [OCF 2 CF (CF 3 )] a O (CF 2 ) b O [CF (CF 3 ) CF 2 O] c CF (CF 3 ) COOR 1
[Wherein, R 1 is the general formula CH 2 = CR 2 COO (CH 2) d CH 2 - (R 2 is a hydrogen atom or a methyl group, d is an is an integer of 1 to 3) a group represented by There, a + c is 28 an integer except 0, b is thus achieved in the fluorine-containing polyether carboxylic acid ester represented by a is] an integer of 2 or more.

本発明に係る含フッ素ポリエーテルカルボン酸エステルは、1分子中に2個以上の重合性官能基を有し、また1分子中に多数のフッ素原子を有するため、熱的安定性、化学的安定性にすぐれ、その上良好な光学特性や界面活性特性を併せ持っている。   The fluorine-containing polyether carboxylic acid ester according to the present invention has two or more polymerizable functional groups in one molecule and also has a large number of fluorine atoms in one molecule, so that it has thermal stability and chemical stability. In addition, it has excellent optical properties and surface active properties.

さらに、この生成物は可視光、紫外線、電子線などのエネルギー線の照射による硬化が可能であるので、感光性硬化型のインキ、塗料、電子線硬化型の塗料、紫外線硬化型の接着剤などへの応用が可能である。また、多官能性モノマーであるので、3次元構造での架橋が可能となり、各種樹脂の架橋剤、改質剤等として用い、硬度、強度、耐熱性、耐候性、耐薬品性などの物性の向上や改良を可能とする。   Furthermore, this product can be cured by irradiation with energy rays such as visible light, ultraviolet rays, and electron beams, so photosensitive curable inks, paints, electron beam curable paints, ultraviolet curable adhesives, etc. Application to is possible. In addition, since it is a polyfunctional monomer, it can be cross-linked in a three-dimensional structure and used as a cross-linking agent, modifier, etc. for various resins and has physical properties such as hardness, strength, heat resistance, weather resistance, and chemical resistance. Improve and improve.

この生成物はまた、分子中のフッ素含量が多いため低屈折率を示しており、このためディスプレイ等の反射防止膜、光ファイバー等のクラッド材として利用することもできる。さらに、界面活性特性を利用して、各種離型用コーティング剤、各種表面コーティング剤、表面改質剤、撥水撥油剤等にも用いることができる。   This product also exhibits a low refractive index because of the high fluorine content in the molecule, and can therefore be used as an antireflection film for displays and the like, and a cladding material for optical fibers and the like. Furthermore, it can be used for various release coating agents, various surface coating agents, surface modifiers, water- and oil-repellent agents and the like by utilizing surface active properties.

上記含フッ素ポリエーテルカルボン酸エステルは、一般式
XOCCF(CF3)[OCF2CF(CF3)]aO(CF2)bO[CF(CF3)CF2O]cCF(CF3)COX
X:ハロゲン原子
a+c:0を除く28以下の整数、好ましくは6〜28の整数
b:2以上の整数
で表わされるパーフルオロポリエーテルジカルボン酸ジハライドに、一般式R1OHで表わされる水酸基含有化合物を反応させることによって製造される。
The fluorine-containing polyether carboxylic acid ester has the general formula
XOCCF (CF 3 ) [OCF 2 CF (CF 3 )] a O (CF 2 ) b O [CF (CF 3 ) CF 2 O] c CF (CF 3 ) COX
X: Halogen atom
a + c: an integer of 28 or less excluding 0 , preferably an integer of 6 to 28
b: Produced by reacting a perfluoropolyether dicarboxylic acid dihalide represented by an integer of 2 or more with a hydroxyl group-containing compound represented by the general formula R 1 OH.

この反応の主たる原料物質として用いられるパーフルオロポリエーテルジカルボン酸ジハライドにおいて、ハライド基としては原料合成の容易さからフッ素原子であることが好ましく、またbの値は原料入手の容易さから2〜6であることが好ましい。さらに、a+cの値は0を除く28以下の整数、好ましくは6〜28の整数であり、製造の容易さからは20以下であることが特に好ましい。a+cの値の調節は、一般的には対応するパーフルオロアルキルジカルボン酸ジフロライドに触媒の存在下でヘキサフルオロプロペンオキシドを反応させ、分布の生じたパーフルオロポリエーテル化合物を蒸留し、希望するa+cの値を有するジカルボン酸ジハライドを取得することによって行われる。 In the perfluoropolyether dicarboxylic acid dihalide used as the main raw material of this reaction, the halide group is preferably a fluorine atom because of the ease of raw material synthesis, and the value of b is 2 to 6 because of the availability of the raw material. It is preferable that Further, the value of a + c is an integer of 28 or less excluding 0 , preferably an integer of 6 to 28 , and particularly preferably 20 or less from the viewpoint of ease of production. Adjustment of the value of a + c is generally achieved by reacting the corresponding perfluoroalkyldicarboxylic acid difluoride with hexafluoropropene oxide in the presence of a catalyst and distilling the perfluoropolyether compound with the desired distribution. This is done by obtaining a dicarboxylic acid dihalide having a value of a + c.

このようなパーフルオロポリエーテルジカルボン酸ジハライドと反応する水酸基含有化合物R1OHのR1基は、次のような基である。
CH2=CR2COO(CH2)dCH2-
R2:水素原子またはメチル基
d:1〜3の整数
The R 1 group of the hydroxyl group-containing compound R 1 OH that reacts with such a perfluoropolyether dicarboxylic acid dihalide is the following group.
CH 2 = CR 2 COO (CH 2 ) d CH 2-
R 2 : hydrogen atom or methyl group
d: Integer from 1 to 3

水酸基含有化合物の具体例としては、2-ヒドロキシエチルアクリレート、3-ヒドロキシプロピルアクリレート、4-ヒドロキシブチルアクリレート、2-ヒドロキシエチルメタクリレート、3-ヒドロキシプロピルメタクリレート、4-ヒドロキシブチルメタクリレート、2-ヒドロキシブチルメタクリレート等が挙げられる。 Specific examples of the hydroxyl group-containing compound include 2-hydroxyethyl acrylate, 3-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, 2-hydroxyethyl methacrylate, 3-hydroxypropyl methacrylate, 4-hydroxybutyl methacrylate, 2-hydroxybutyl methacrylate. Etc.

これら両者間の反応は、水酸基含有化合物を約2.0〜3.0倍モル、好ましくは2.0〜2.2倍モル用いる脱ハロゲン化水素縮合反応によって行われる。反応溶媒としては、この反応に不活性なものであれば任意のものを使用し得るが、一般にはジアルキルエーテル、好ましくは沸点が低く、除去の容易なジエチルエーテル、ジイソプロピルエーテル、テトラヒドロフラン等が用いられる。   The reaction between them is carried out by a dehydrohalogen condensation reaction using a hydroxyl group-containing compound in an amount of about 2.0 to 3.0 times mol, preferably 2.0 to 2.2 times mol. Any reaction solvent can be used as long as it is inert to this reaction. Generally, dialkyl ethers, preferably diethyl ether, diisopropyl ether, tetrahydrofuran, etc., which have a low boiling point and are easy to remove are used. .

この反応は脱ハロゲン化水素反応であるので、ハロゲン化水素の捕捉剤の存在下で行われることが好ましい。フッ化水素の捕捉剤としてはアルカリ金属フッ化物が一般に用いられ、生じたフッ化水素の保持能力や価格の点からはフッ化ナトリウムが好んで用いられる。それの使用割合は、含フッ素ポリエーテルジカルボン酸ジフロライドに対して約2〜8倍モル、好ましくは2.1〜3.0倍モルの範囲内にある。また、他のハロゲン化水素の場合には、トリアルキルアミン、ピリジン誘導体等が、パーフルオロポリエーテルジカルボン酸ジハライドに対し約2〜6倍モルの割合で用いられ、好ましくはトリエチルアミンが2.0〜3.0倍モルの割合で用いられる。   Since this reaction is a dehydrohalogenation reaction, it is preferably carried out in the presence of a hydrogen halide scavenger. Alkali metal fluoride is generally used as the scavenger for hydrogen fluoride, and sodium fluoride is preferably used from the viewpoint of the ability to retain the generated hydrogen fluoride and the cost. The use ratio thereof is about 2 to 8 times mol, preferably 2.1 to 3.0 times mol for the fluorine-containing polyether dicarboxylic acid difluoride. In the case of other hydrogen halides, trialkylamines, pyridine derivatives and the like are used in a ratio of about 2 to 6 times moles with respect to perfluoropolyether dicarboxylic acid dihalide, preferably triethylamine is 2.0 to 3.0 times. Used in molar proportions.

また、用いられる重合性官能基を有する水酸基含有化合物や生成物の望まない重合を抑制するために、反応系内にフェノチアジン、ハイドロキノン、メトキノン等の重合禁止剤、好ましくはハイドロキノンまたはメトキノンが添加して用いられる。これらの重合禁止剤は、生成が予想される含フッ素ポリエーテルカルボン酸エステルに対し、約0.01〜1重量%の割合で一般に用いられ、生成物が高沸点で蒸留精製などができない場合もあるので、特に好ましくは0.03〜0.1重量%の割合で添加して用いられる。この範囲内での重合禁止剤の添加は、生成物の重合の妨げとなることはない。   In order to suppress unwanted polymerization of the hydroxyl group-containing compound or product having a polymerizable functional group used, a polymerization inhibitor such as phenothiazine, hydroquinone, or methoquinone, preferably hydroquinone or methoquinone is added to the reaction system. Used. These polymerization inhibitors are generally used at a ratio of about 0.01 to 1% by weight with respect to the fluorine-containing polyether carboxylic acid ester expected to be produced, and the product has a high boiling point and may not be purified by distillation. Particularly preferably, it is added and used at a ratio of 0.03 to 0.1% by weight. Addition of the polymerization inhibitor within this range does not hinder the polymerization of the product.

反応温度は、約-80℃から用いられる反応溶媒の沸点迄の幅広い選択が可能であるが、原料や生成物の重合を防ぐためには、可能な限り低温であることが望ましく、反応温度の調節のし易さという点からは約-20〜10℃の範囲が特に好ましい。   The reaction temperature can be selected widely from about -80 ° C to the boiling point of the reaction solvent used. However, in order to prevent polymerization of raw materials and products, it is desirable that the temperature be as low as possible. A range of about −20 to 10 ° C. is particularly preferable from the viewpoint of ease of treatment.

次に、実施例について本発明を説明する。   Next, the present invention will be described with reference to examples.

実施例
窒素ガス雰囲気下に、2-ヒドロキシエチルアクリレート24.5g(ガスクロマトグラフィーによる純度95%;0.2モル)をフッ化ナトリウム16.8g(0.4モル)をけん濁させたジエチルエーテル1500ml中に加え、そこにメトキノン0.1gを加えて、氷浴で冷却した。内温を10℃以下に保ちながら、ゆっくりとパーフルオロポリエーテルジカルボン酸ジフロライド FOCC(CF3)[OCF2CF(CF3)]aO(CF2)2O[CF(CF3)CF2O]cCF(CF3)COF(a+c=6の混合物)139g(ガスクロマトグラフィーによる混合物を合せた純度95%;0.1モル)を滴下した。
Example 24.5 g of 2-hydroxyethyl acrylate (purity 95% by gas chromatography; 0.2 mol) was added to 1500 ml of diethyl ether suspended in 16.8 g (0.4 mol) of sodium fluoride under a nitrogen gas atmosphere. To the solution, 0.1 g of methoquinone was added and cooled in an ice bath. Slowly perfluoropolyether dicarboxylic acid difluoride FOCC (CF 3 ) [OCF 2 CF (CF 3 )] a O (CF 2 ) 2 O [CF (CF 3 ) CF 2 O c 139 g of CF (CF 3 ) COF (mixture of a + c = 6) (purity 95% of the mixture by gas chromatography; 0.1 mol) was added dropwise.

滴下終了後氷浴を外し、室温条件下で8時間以上攪拌した後、結晶をロ別したロ液を飽和炭酸水素ナトリウムおよび飽和食塩水の順で洗浄した。有機層を無水硫酸マグネシウムで乾燥した後、減圧下でジエチルエーテルを除去し、常温で高粘度液体である目的物を154.8g(F-NMRによる純度82.6%;収率79.6%)を得た。   After completion of the dropwise addition, the ice bath was removed, and the mixture was stirred for 8 hours or more at room temperature. After the organic layer was dried over anhydrous magnesium sulfate, diethyl ether was removed under reduced pressure to obtain 154.8 g (purity 82.6% by F-NMR; yield 79.6%) of the target compound which was a high-viscosity liquid at room temperature.

この目的物は、H-NMRおよびF-NMRのデーターから、次のような構造式を有する2-ヒドロキシエチルアクリレート誘導体であると判断される。
CH2=CHCOO(CH)2OCOCF(CF)[OCF2CF(CF3)]aO-
-(CF2)2O[CF(CF3)CF2O]cCF(CF3)COO(CH2)2OCOCH=CH2
H-NMR(CDCl,TMS):δ4.45(4H)
4.61(4H)
5.88(2H)
6.12(2H)
6.44(2H)
F-NMR(neat CFCl);ppm -78.72(CF3)
-80.16(CF2)
-120.10(CF)
This target product is judged to be a 2-hydroxyethyl acrylate derivative having the following structural formula from the data of H-NMR and F-NMR.
CH 2 = CHCOO (CH) 2 OCOCF (CF 3 ) [OCF 2 CF (CF 3 )] a O-
-(CF 2 ) 2 O [CF (CF 3 ) CF 2 O] c CF (CF 3 ) COO (CH 2 ) 2 OCOCH = CH 2
H-NMR (CDCl 3 , TMS): δ4.45 (4H)
4.61 (4H)
5.88 (2H)
6.12 (2H)
6.44 (2H)
F-NMR (neat CFCl 3 ); ppm -78.72 (CF 3 )
-80.16 (CF 2 )
-120.10 (CF)

Claims (5)

一般式
R1OCOCF(CF3)[OCF2CF(CF3)]aO(CF2)bO[CF(CF3)CF2O]cCF(CF3)COOR1
ここで、R1一般式 CH 2 =CR 2 COO(CH 2 ) d CH 2 - (R 2 は水素原子またはメチル基であり、dは1〜3の整数である)で表わされる基であり、a+cは0を除く28以下の整数であり、bは2以上の整数であるで表わされる含フッ素ポリエーテルカルボン酸エステル。
General formula
R 1 OCOCF (CF 3 ) [OCF 2 CF (CF 3 )] a O (CF 2 ) b O [CF (CF 3 ) CF 2 O] c CF (CF 3 ) COOR 1
[Wherein, R 1 is the general formula CH 2 = CR 2 COO (CH 2) d CH 2 - (R 2 is a hydrogen atom or a methyl group, d is an is an integer of 1 to 3) a group represented by And a + c is an integer of 28 or less, excluding 0, and b is an integer of 2 or more ] .
a+cが6〜28の整数である請求項1記載の含フッ素ポリエーテルカルボン酸エステル。The fluorine-containing polyether carboxylic acid ester according to claim 1, wherein a + c is an integer of 6 to 28. 一般式General formula
XOCCF(CFXOCCF (CF 3Three )[OCF) [OCF 22 CF(CFCF (CF 3Three )])] aa O(CFO (CF 22 )) bb O[CF(CFO [CF (CF 3Three )CFCF 22 O]O] cc CF(CFCF (CF 3Three )COXCOX
(ここで、Xはハロゲン原子であり、a+cは0を除く28以下の整数であり、bは2以上の整数である)で表わされるパーフルオロポリエーテルジカルボン酸ジハライドに、一般式 R(Wherein X is a halogen atom, a + c is an integer of 28 or less excluding 0, and b is an integer of 2 or more), a perfluoropolyether dicarboxylic acid dihalide represented by the general formula R 11 OH〔ここで、ROH (where R 11 は一般式 CHIs the general formula CH 22 =CR= CR 22 COO(CHCOO (CH 22 )) dd CHCH 22 - (R-(R 22 は水素原子またはメチル基であり、dは1〜3の整数である)で表わされる基である〕で表わされる水酸基含有化合物を反応させることを特徴とする請求項1記載の含フッ素ポリエーテルカルボン酸エステルの製造法。Is a hydrogen atom or a methyl group, and d is a group represented by the formula (1) to (3)). Production method of acid ester.
a+cが6〜28の整数である請求項3記載の含フッ素ポリエーテルカルボン酸エステルの製造法。The method for producing a fluorinated polyether carboxylic acid ester according to claim 3, wherein a + c is an integer of 6 to 28. ハロゲン化水素捕捉剤の存在下で反応が行われる請求項3または4記載の含フッ素ポリエーテルカルボン酸エステルの製造法。The process for producing a fluorinated polyether carboxylic acid ester according to claim 3 or 4, wherein the reaction is carried out in the presence of a hydrogen halide scavenger.
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WO2018139058A1 (en) * 2017-01-26 2018-08-02 昭和電工株式会社 Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
US11767483B2 (en) 2018-09-12 2023-09-26 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
US11820953B2 (en) 2019-03-12 2023-11-21 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium and magnetic recording medium
US11879109B2 (en) 2019-09-18 2024-01-23 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
US11905365B2 (en) 2019-12-26 2024-02-20 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018139058A1 (en) * 2017-01-26 2018-08-02 昭和電工株式会社 Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
US11220649B2 (en) 2017-01-26 2022-01-11 Showa Denko K.K. Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
US11767483B2 (en) 2018-09-12 2023-09-26 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
US11820953B2 (en) 2019-03-12 2023-11-21 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium and magnetic recording medium
US11879109B2 (en) 2019-09-18 2024-01-23 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
US11905365B2 (en) 2019-12-26 2024-02-20 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium

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