JP2010224348A - Method of manufacturing printing plate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a printing plate with a pattern of a fine silicone layer. <P>SOLUTION: The method of manufacturing a printing is provided for forming a pattern of a silicone layer by exposing or heating a printing original plate having at least a photosensitive layer or a thermosensitive layer and the silicone layer in this order on a support, then selectively removing the silicone layer. The silicone layer is selectively removed by rubbing the surface of the silicone layer with a knitted fabric, a woven fabric or an unwoven fabric whose apparent specific gravity is ≥0.15 under the presence of a developing solution. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a method for producing a printing plate.

  In recent years, in order to cope with cost reduction and miniaturization of electronic components, it has been attempted to form an image pattern for manufacturing electronic components by a printing method. As a printing plate for forming a fine image pattern, a waterless lithographic printing plate having an edge angle of 5 ° or more and 45 ° or less (for example, see Patent Document 1), or an initial elastic modulus of a silicone layer is 0.2 MPa or more. A waterless planographic printing plate precursor having a pressure of 0.8 MPa or less (for example, see Patent Document 2) has been proposed. In waterless offset printing using a waterless printing plate having a silicone layer pattern on the surface, ink adheres to a portion of the printing plate where the silicone layer pattern is not present to form a line portion. This is a printing method in which ink does not adhere and becomes a non-image area. Unlike offset printing using a PS plate, a dampening solution is unnecessary for controlling ink adhesion, so that a fine printed matter without bleeding can be obtained. In order to form a finer pattern, a waterless planographic printing plate precursor (for example, see Patent Document 3) in which the initial elastic modulus of the silicone layer is 0.6 MPa or more and 0.8 MPa or less has been proposed. A fine pattern is required.

  Further, as a printing method for forming a fine image pattern, (1) a resin is applied to an image forming plate having an image area (resin-repellent function) and a non-image area (parent resin function); A step of pressing the image transfer sheet having a resin-repellent function against the image forming plate to transfer the resin on the image line portion to the image transfer sheet; and (3) a step of transferring the resin on the image line portion of the image transfer sheet to the substrate. A method (so-called release printing) has been proposed (see, for example, Patent Document 4). Release printing uses the pattern portion of the silicone layer as the ink transfer portion, and among the ink applied to the entire surface of the printing plate, the ink of the pattern portion of the silicone layer is selectively transferred to the blanket and further transferred to the printing medium. This is a printing method, which eliminates the phenomenon of ink stringing and provides a high-quality printed product that is close to the photolithographic method. Also in this printing method, in order to form a finer pattern, a printing plate having a higher-definition silicone layer pattern is required.

  On the other hand, in order to form a fine silicone layer pattern, a waterless lithographic printing plate developer containing a polyethylene glycol derivative and an alkanediol has been proposed (see, for example, Patent Document 5). In addition, various developing brushes having excellent developability and image reproducibility (see, for example, Patent Documents 6 to 7), and developing methods in which a developing pad and a developing brush are previously treated with a surfactant during development (patents) Document 8) has been proposed. However, even if these methods are used, it has been difficult to form a fine silicone layer pattern required in recent years.

JP 2004-191964 A JP 2007-148386 A JP 2007-219358 A JP 2004-249696 A JP-A-6-148902 Japanese Patent Laid-Open No. 6-2222566 JP 2008-249758 A JP-A-60-140243

  An object of the present invention is to provide a method for producing a printing plate having a fine silicone layer pattern.

  That is, in the present invention, a printing plate precursor having at least a photosensitive layer or a heat-sensitive layer and a silicone layer in this order on a support is exposed or heated, and then the silicone layer is selectively removed to form a pattern of the silicone layer. A method for producing a printing plate, wherein the silicone layer is selectively removed by rubbing the surface of the silicone layer with a knitted fabric, a woven fabric or a non-woven fabric having an apparent specific gravity of 0.15 or more in the presence of a developer. This is a method for producing a printing plate.

  According to the printing plate manufacturing method of the present invention, a printing plate having a fine silicone layer pattern can be obtained.

  The printing plate precursor suitably used in the present invention has at least a photosensitive layer or a heat-sensitive layer and a silicone layer in this order on a support. In order to protect the surface of the silicone layer, a protective film may be provided.

  The support can be a dimensionally stable plate or film. Specifically, metal plates such as aluminum and stainless steel, glass plates such as soda lime and quartz, silicon wafers, polyethylene terephthalate, polyethylene naphthalate, polyphenylene sulfide, polyethersulfone, polyimide, aramid, polycarbonate, cycloolefin polymer, etc. Examples include heat-resistant films.

  The photosensitive layer or the heat-sensitive layer has a property that the adhesiveness with the silicone rubber layer is changed by exposure or heating, or in the presence of a subsequent developer. By selectively removing a portion of the silicone layer having relatively low adhesion by development, a pattern of the silicone layer is formed to obtain a printing plate. The photosensitive layer or heat-sensitive layer is preferably a layer that is at least partially crosslinked or decomposed by the action of light or heat. Examples of the photocrosslinkable photosensitive layer include those described in Japanese Patent Nos. 2739392, 2739387, and 2739383, and photodegradable photosensitive layers. As the photosensitive layer and heat-sensitive layer described in Japanese Patent No. -54222, No. 2507347, etc., for example, the heat-sensitive layer described in Japanese Patent No. 4186278 can be used.

  The photodegradable photosensitive layer is preferably a photoreleasable photosensitive layer. The photoreleasable photosensitive layer as used in the present invention is one in which only the silicone layer thereon is removed without substantial removal of the exposed portion photosensitive layer by development.

  Such a photoreleasable photosensitive layer is obtained by crosslinking a known light-solubilizing photosensitive compound with a polyfunctional compound, or by binding an active group in the light-solubilizing photosensitive compound to a monofunctional compound. It is obtained by modifying and making it insoluble or insoluble in the developer. The photo-solubilizing photosensitive compound here is preferably a compound having a quinonediazide group, such as 1,2-naphthoquinone-2-diazide-5-sulfonic acid or 1,2-naphthoquinone-2-diazide-4-sulfone. An esterified product of an acid and a novolak resin such as a phenol formaldehyde novolak resin or a cresol formaldehyde novolak resin may be used. These photo-solubilizing photosensitive compounds preferably have a reactive group. Examples of the reactive group include a hydroxyl group and an amino group, and a phenolic hydroxyl group is preferable.

  As the polyfunctional compound, polyfunctional isocyanate compounds and polyfunctional epoxy compounds are preferable. Examples of the polyfunctional isocyanate compound include paraphenylene diisocyanate, 2,4- or 2,6-toluene diisocyanate, 4,4′-diphenylmethane diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, diphenylmethane diisocyanate multimer, and phenylisocyanate formalin. Examples thereof include polyvalent aromatic isocyanates such as condensates.

  A catalyst can be used for the purpose of promoting the reaction between the light-solubilizing photosensitive compound and the polyfunctional compound. In addition, a stabilizer can be used in combination to adjust the reaction rate. In the case of isocyanate, known acids such as paratoluenesulfonic acid, formic acid, acetic acid and hydrochloric acid can be used.

  In the present invention, a particularly preferred photosensitive layer is obtained by crosslinking 1,2-naphthoquinone-2-diazide-5-sulfonic acid chloride, a partially esterified product of phenol formaldehyde novolac resin and a polyfunctional isocyanate.

The silicone layer is a layer containing an organopolysiloxane. The film thickness is preferably 0.3 to 20 g / m ² .

  Known organopolysiloxanes can be used in the silicone layer. For example, an organopolysiloxane containing n repeating units represented by the following general formula (1) can be given.

n is an integer of 2 or more. R ¹ and R ² each independently represents a saturated or unsaturated hydrocarbon group having 1 to 50 carbon atoms. These hydrocarbon groups may be substituted and may contain an aromatic ring.

  As specific examples of the printing plate precursor used in the present invention, “Toray Waterless Flat Plate (registered trademark)” analog type positive plate, “Toray Waterless Flat Plate” analog type negative plate, Toray Waterless CTP plate, PEARLdry of Presstech Co., Ltd. Etc.

  In the method for producing a printing plate of the present invention, after exposing or heating the printing plate precursor, the silicone layer is selectively removed to form a pattern of the silicone layer.

  First, a process of exposing or heating the printing plate precursor (exposure or heating process) will be described. The printing plate precursor is exposed to a desired pattern with light from an exposure light source or a laser, or heated to a desired pattern with heat from a heat source. When the printing plate precursor has a protective film, the protective film is peeled off or exposed or heated from above the protective film. Examples of the exposure light source include a low-pressure mercury lamp, a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, a xenon lamp, a metal halide lamp, a tungsten lamp, a halogen lamp, a fluorescent lamp, an ultraviolet laser, a visible laser, and an infrared laser. Examples of the heat source for heating include a thermal head.

  Next, in the presence of the developer, the silicone layer is selectively removed by a step (developing step) in which the surface of the silicone layer is rubbed with a knitted fabric, a woven fabric or a non-woven fabric having an apparent specific gravity of 0.15 or more. The printing plate manufacturing method of the present invention is characterized by using a knitted fabric, a woven fabric or a non-woven fabric having an apparent specific gravity of 0.15 or more as a material for rubbing the surface of the silicone layer. A fine silicone layer pattern can be formed. In the case of a cloth material having an apparent specific gravity of less than 0.15, it is difficult to form a fine pattern. Furthermore, the apparent specific gravity is preferably 0.15 to 0.6, and more preferably 0.20 to 0.45. Of the above-mentioned fabric materials, a knitted fabric is more preferable.

  The apparent specific gravity of the knitted fabric, woven fabric or non-woven fabric is calculated by the following formula.

The mass (g / m ² ) and thickness (mm) per 1 m ² in the standard state are measured according to JIS L 1096: 1999. Here, the thickness is a vertical distance between the reference plate on which the cloth material is placed and the presser foot to which pressure is applied, the size of the presser foot is 2,000 mm ² , and the pressure is 1 kPa.

From the viewpoint of durability, the knitted fabric, the woven fabric or the nonwoven fabric preferably has a mass per 1 m ² of 10 g / m ² or more and a thickness of 0.05 mm or more.

  The knitted fabric, non-woven fabric or woven fabric may be used in a single layer, or may be stacked or folded in multiple layers. Moreover, you may coat | cover and use molded products, such as plate shape, disk shape, and roll shape.

  The material of the knitted fabric, the woven fabric or the nonwoven fabric is not particularly limited. Polyester fibers such as polyethylene terephthalate (PET), polypropylene terephthalate, polybutylene terephthalate (PBT), polylactic acid, polyamide fibers such as nylon 6 and nylon 66, polyethylene, Polyolefin fibers such as polypropylene, synthetic fibers such as polyurethane fibers and acrylic fibers, natural fibers such as cotton, hemp, silk, wool, and bamboo, and recycled fibers such as viscose rayon, solvent-spun cellulose fibers, cupra, and polynosic can be used. Two or more of these may be used. Among these, polyester fiber, polyamide fiber, and cellulose fiber are preferable. A polyester fiber is more preferable, and when it has two or more types of fibers, it is preferable to contain 70% or more of polyester fiber, and more preferably 80% or more.

  The knitted fabric, the woven fabric or the nonwoven fabric preferably contains fibers having a single fiber diameter of 0.1 to 20 μm, and more preferably contains fibers of 1 to 15 μm. The content of these fibers is preferably 50% by weight or more of the total fibers. By including a fiber having a single fiber diameter of 0.1 to 20 μm, the resolution of a fine pattern is further improved.

  The single fiber diameter is the diameter when the cross section of the single fiber is circular, the long diameter when it is elliptical, the maximum width when it is flat, the maximum projected when the cross section is U-shaped, C-shaped, or multi-leafed And measured from a photograph of an optical microscope or an electron microscope.

  Examples of the method of rubbing the surface of the silicone layer with a knitted fabric, woven fabric or non-woven fabric in the presence of a developer include, for example, a method of rubbing the surface of the silicone layer with a knitted fabric, woven fabric or non-woven fabric impregnated with a developing solution, and a printing plate. A method in which the surface of the original plate is pre-wetted with a developing solution and then rubbed with a knitted fabric, a woven fabric or a non-woven fabric, and the surface of the silicone layer is rubbed with a knitted cloth, a woven fabric or a non-woven fabric while supplying the developing solution to the printing plate original plate surface. The method of doing is mentioned. These methods may be combined. Friction can be performed by moving one or both of the knitted fabric, the woven fabric, the nonwoven fabric, and the substrate while pressing the knitted fabric, the woven fabric, or the nonwoven fabric and applying a predetermined pressure from the back side. The pressing pressure is preferably 10 to 1,000 kPa. Friction can be performed by reciprocal motion or rotational motion, and it is preferable to use both in combination. The relative speed between the knitted fabric, the woven fabric or the nonwoven fabric and the printing plate precursor surface is preferably 2 to 500 m / min.

  Developers include, for example, water, those containing water and a surfactant, those containing water and at least one of the following polar solvents, isoparaffin hydrocarbon solvents, aliphatic hydrocarbon solvents, aromatic carbonization. At least one of the following polar solvents is used as at least one hydrocarbon solvent such as a hydrogen solvent, a naphthene hydrocarbon solvent, or a halogen hydrocarbon solvent. As the polar solvent, alcohol solvents, glycol solvents, glycol ether solvents, ester solvents, ketone solvents, ether solvents, carboxylic acids, amines and the like can be used. Isopropyl alcohol, n-butyl alcohol, ethyl alcohol, etc. as alcohol solvents, ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol as glycol solvents, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol as glycol ether solvents Monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, ethylene glycol mono t-butyl ether, propylene glycol monomethyl ether, 3-methoxy-3-methyl-1-butanol, etc. Ethyl acetate, butyl acetate as ester solvents , Normal propyl acetate, propylene Glycol monomethyl ether acetate, ethyl-3-ethoxypropionate, etc., ketone solvents such as methyl ethyl ketone, methyl isobutyl ketone, acetone, etc., ether solvents such as tetrahydrofuran 1,4-dioxane, carboxylic acid, acetic acid, 2-ethylhexane Examples of amines such as acid and 2-ethylbutyric acid include monoethanolamine, diethanolamine, triethanolamine, 2-methylaminoethanol, and diethylene glycolamine.

  Examples of the isoparaffinic hydrocarbon solvent include “Isopar (registered trademark)” E, “Isopar” G, “Isopar” H, “Isopar” L, and “Isopar” M (manufactured by Exxon). Examples of the aliphatic hydrocarbon solvent include hexane, cyclohexane, and heptane. Examples of the aromatic hydrocarbon solvent include benzene, toluene, and xylene. Examples of the halogen-based hydrocarbon solvent include trichloroethene.

  You may contain dye in a developing solution. Although the temperature of a developing solution may be arbitrary, 10 to 50 degreeC is preferable.

  Specific examples of the developer may include WH-3 and HP-7N (both manufactured by Toray Industries, Inc.), which are water and Toray waterless lithographic hand developing developers.

  A pretreatment step may be added before the development step. The pretreatment step is a step of treating the printing plate precursor after exposure or heating in order to facilitate the removal of the silicone layer in the development step, and immersing the printing plate precursor in a treatment liquid (hereinafter referred to as pretreatment liquid). And a method of spreading the pretreatment liquid on the printing plate precursor can be suitably used.

  The pretreatment liquid is preferably composed mainly of a hydrocarbon solvent such as an isoparaffin hydrocarbon solvent, an aliphatic hydrocarbon solvent, an aromatic hydrocarbon solvent, a naphthene hydrocarbon solvent, or a halogen hydrocarbon solvent. As the hydrocarbon solvent, those exemplified as the developer can be used. In addition to hydrocarbon solvents, it may contain water, alcohol solvents, glycol solvents, glycol ether solvents, ester solvents, ketone solvents, ether solvents, carboxylic acids, amines, surfactants and dyes. . Although the temperature of a pre-processing liquid may be arbitrary, 10 to 50 degreeC is preferable.

  Examples of the pretreatment liquid are described in JP-A-63-179361, JP-A-4-163557, JP-A-4-343360, JP-A-9-34132, and JP-A-3716429. Examples of such a waterless lithographic printing plate precursor are disclosed in regard to a pretreatment liquid and a developer. Specific examples of the pretreatment liquid include Toray Water-less planographic pretreatment liquid for automatic developing machines and pretreatment liquid for manual development, PP-1, PP-3, PP-F, PP-FII, PTS-1. CP-1, NP-1, DP-1, PTS-2, and HP-7N (all manufactured by Toray Industries, Inc.).

  A post-treatment step and a water washing step may be added after the development step.

  In the post-processing step, in order to facilitate confirmation of the pattern of the silicone layer formed by development, it may be dyed with a dyeing solution. As the staining solution, water or a solution in which a dye is dissolved in water and at least one of the above polar solvents can be used. As the dye, a basic dye, an acid dye, a direct dye, a disperse dye, and a reactive dye can be used alone or in combination of two or more. Of these, water-soluble basic dyes and acid dyes are preferably used. In addition, dyeing assistants, organic acids, inorganic acids, antifoaming agents, plasticizers, and surfactants may be optionally contained. The temperature of the staining solution may be arbitrary, but is preferably 10 ° C to 50 ° C.

  In the water washing step, the printing plate surface may be washed with water in order to wash off the pretreatment liquid, the developer and the dyeing liquid from the plate surface. The temperature of the washing water may be arbitrary, but is preferably 10 ° C to 50 ° C.

  The present invention will be described below with reference to examples. First, a measurement method in each example will be described.

Thickness (mm) of cloth material used for development process:
The vertical distance between the reference plate on which the sample was placed and the presser foot to which pressure was applied was the thickness. The size of the presser foot was 2,000 mm ² , the pressure was 1 kPa, and other conditions were in accordance with JIS L 1096: 1999.

Mass per 1 m ² (g / m ² ) in the standard state of the cloth material used in the development process:
The sample was adjusted in the standard state, the length, width and weight were measured, and the mass per 1 m ² was calculated. The standard conditions were relative humidity (65 ± 2)%, temperature (20 ± 2) ° C., and other conditions were in accordance with JIS L 1096: 1999.

Apparent specific gravity of the cloth material used in the development process:
It was calculated by the following formula.

Silicone layer pattern resolution:
The pattern of the silicone layer of the printing plate is observed with an optical microscope, and the light shielding part width / exposure part width of the mask pattern is 50 μm / 50 μm, 40 μm / 40 μm, 30 μm / 30 μm, 20 μm / 20 μm, 15 μm / 15 μm, 10 μm / 10 μm. In the portion, the minimum light-shielding part width formed without any missing silicon layer pattern was defined as the resolution of the silicone layer pattern.

(Preparation of printing plate precursor)
A printing plate precursor was prepared by laminating a primer layer, a photosensitive layer and a silicone layer in this order on the following support in the following manner.

<Support>
A 0.24 mm thick degreased aluminum substrate (Mitsubishi Aluminum Co., Ltd.) was used as a support.

<Primer layer>
The following primer layer composition liquid was applied onto a support and dried at 200 ° C. for 90 seconds to provide a primer layer having a thickness of 10 g / m ² .

<Primer layer composition liquid>
(A) Epoxy resin: “Epicoat (registered trademark)”-1010 (manufactured by Japan Epoxy Resin Co., Ltd.): 35 parts by weight (b) Polyurethane: “Samprene (registered trademark)”-LQ-T1331D (Sanyo Chemical Industries, Ltd.) ), Solid content concentration: 20% by weight): 375 parts by weight (c) Aluminum chelate: “Aluminum chelate” -ALCH-TR (manufactured by Kawaken Fine Chemical Co., Ltd.): 10 parts by weight (d) Leveling agent: “Dispalon (Registered trademark) -LC951 (manufactured by Enomoto Kasei Co., Ltd., solid content: 10% by weight): 1 part by weight (e) Titanium oxide: "Typaque (registered trademark)"-CR-50 (Ishihara Sangyo Co., Ltd.) ) N, N-dimethylformamide dispersion (titanium oxide 50% by weight): 60 parts by weight (f) Solvent: N, N-dimethylformamide: 730 parts by weight (g) Solvent: methylethyl Tons: 250 parts by weight.

<Photosensitive layer>
On the primer layer provided on the support, the following photosensitive layer composition solution was applied and heated at 80 ° C. for 90 seconds to provide a heat-sensitive layer having a thickness of 1.5 g / m ² .

<Photosensitive layer composition solution>
(A) Photo-solubilizing photosensitive compound: 1,2-naphthoquinone-2-diazide-5-sulfonic acid chloride and partially esterified product of “Sumilite Resin (registered trademark)” PR50731 (manufactured by Sumitomo Bakelite Co., Ltd.) < Degree of esterification 36%>: 100 parts by weight (b) Polyurethane: “Samprene” -LQ-T1331D: 50 parts by weight (c) 4,4′-bis (diethylamino) benzophenone: 10 parts by weight (d) Polyfunctional isocyanate compound : "Millionate (registered trademark)"-MR200 (manufactured by Nippon Polyurethane Industry Co., Ltd.): 20 parts by weight (d) Catalyst: Dibutyltin diacetate: 0.2 parts by weight (e) Stabilizer: Acetic acid: 2 parts by weight ( f) Solvent: Tetrahydrofuran: 800 parts by weight.

<Silicone layer>
The following silicone layer composition solution was applied onto the photosensitive layer laminated on the support and primer layer, and humidified and heated at 100 ° C. for 60 seconds to provide a silicone layer having a thickness of 2.0 g / m ² . .

<Silicone layer composition liquid>
(A) Organopolysiloxane: hydroxyl group polydimethylsiloxane at both ends (molecular weight of about 35,000): 100 parts by weight (b) Crosslinking agent: vinyltris (methylethylketoxime) silane: 9 parts by weight (c) Catalyst: dibutyltin diacetate: 0.5 parts by weight (d) Solvent: “Isopar” E (exxon): 1200 parts by weight.

Example 1
(Exposure of printing plate precursor)
The obtained printing plate precursor was exposed on the entire surface with an ultra-high pressure mercury lamp exposure machine PEM-6M (manufactured by Union Optical Co., Ltd.) with an irradiation exposure dose of 50 mJ / m ² (in h-line conversion), and then a resolution test mask MULTI- Pattern exposure was performed at an exposure dose of 150 mJ / m ² (in terms of h-line) through DENITY RESOLUTION MASK (manufactured by Optoline).

(Development of printing plate precursor)
Pattern-exposed printing plate precursor is pretreated solution PTS-2 (Toray Industries, Inc., 79% by weight of synthetic isoparaffin hydrocarbon / 12% by weight of diethylene glycol dimethyl ether / 5% by weight of propylene glycol monomethyl ether / 4% by weight of organic base) For 1 minute at 23 ° C. After scraping off the pretreatment liquid with a rubber blade, developer WH-3 (produced by Toray Industries, Inc., 20% by weight of diethylene glycol monobutyl ether / 0.1% by weight of dye / 0.5% by weight of surfactant / organic acid 4) "Toraysee (registered trademark)" ME wiper (made by Toray Industries, Inc., PET knitted fabric) containing 10 g of 10% by weight / diethylene glycol monoethyl ether / 1% by weight / water 74.4% by weight) mass 155 g / ^{m 2} per 1 m ^2, thickness 0.55 mm, the apparent specific gravity 0.28) as the fabric material, and friction with a pressing load 15N under standard conditions, to form a pattern of the silicone layer, to obtain a printing plate It was. When the pattern of the silicone layer of the obtained printing plate was observed with an optical microscope, a pattern with a light shielding part width of 10 μm was resolved.

(Waterless offset printing)
The obtained printing plate was attached to an offset printing machine (Komori Sprint 4-color machine) and printed on coated paper using “Dryo Color” (Dainippon Ink & Chemicals, Inc.) red ink. When the printed pattern was observed with an optical microscope, a pattern with a line width of 10 μm was reproduced.

(Peeling printing)
The obtained printing plate was fixed to a surface plate, and a color filter ink in which a resin and a pigment were mixed on the entire surface of the printing plate was used with a doctor blade, and an aromatic hydrocarbon added as a regulator was applied as an ink. Next, the silicone blanket was pressed to transfer the ink on the silicone layer pattern (image area) of the printing plate onto the silicone blanket surface. Next, the ink pattern on the silicone blanket surface was transferred to a glass substrate to form an image. When the printed pattern was observed with an optical microscope, a pattern with a line width of 10 μm was reproduced.

Example 2
Instead of the fabric material of Example 1, a polyester knitted fabric folded to 5 cm × 4 cm (manufactured by Toray Industries, Inc., PET knitted fabric, mass 221 g / m ² per 1 m ² in a standard state, thickness 0.64 mm, viewing A printing plate was prepared in the same manner as in Example 1 using a cloth coated with a specific gravity of 0.35) as a cloth material. When the pattern of the silicone layer of the obtained printing plate was observed with an optical microscope, a pattern with a light shielding part width of 10 μm was resolved.

Example 3
In place of the fabric material of Example 1, “Toraysee” MK cloth (PET knitted fabric, manufactured by Toray Industries, Inc., mass of 200 g / m ² in a standard state) outside the “Toraysee” ME wiper folded to 5 cm × 4 cm A printing plate was prepared in the same manner as in Example 1 using a cloth coated with m ² , thickness 0.48 mm, and apparent specific gravity 0.42). When the pattern of the silicone layer of the obtained printing plate was observed with an optical microscope, a pattern with a light shielding part width of 10 μm was resolved.

Example 4
In place of the fabric material of Example 1, "Microwiper" (made by Blaston Co., Ltd., 70% polyester and 30% nylon woven fabric, 1 m in the standard state) was folded on 5cm x 4cm "Toraysee" ME wiper ^A printing plate was prepared in the same manner as in Example 1 using a material coated with a mass per ² of 224 g / m ² , a thickness of 0.52 mm, and an apparent specific gravity of 0.43). When the pattern of the silicone layer of the obtained printing plate was observed with an optical microscope, a pattern with a light shielding part width of 15 μm was resolved.

Example 5
Instead fabric material of Example 1, 5 cm × folded outside the "Toraysee" ME wiper 4 cm "Toraysee" CC clean cloth (Toray Industries Co., Ltd., PET woven fabric, weight 70g per 1 m ² under standard conditions / M ² , thickness 0.16 mm, apparent specific gravity 0.44) was used as a cloth material, and a printing plate was prepared in the same manner as in Example 1. When the pattern of the silicone layer of the obtained printing plate was observed with an optical microscope, a pattern with a light shielding part width of 15 μm was resolved.

Example 6
Instead fabric material of Example 1, folded 5 cm × 4 cm "Toraysee" TechniCloth TX609 outside the ME wiper (ITW Texwipe Co., cellulose 55% polyester 45% of the nonwoven fabric, the mass per 1 m ² under standard conditions A printing plate was prepared in the same manner as in Example 1 using a cloth coated with 70 g / m ² , thickness 0.28 mm, and apparent specific gravity 0.25). When the pattern of the silicone layer of the obtained printing plate was observed with an optical microscope, a pattern with a light shielding part width of 10 μm was resolved.

Comparative Example 1
Instead of the fabric material of Example 1, "Sofpad" (made by Dynic Co., Ltd., cotton cotton pad) on the outside of "Toraysee" ME wiper folded to 5 cm x 4 cm, per 1 m ² in the standard state A printing plate was prepared in the same manner as in Example 1 using a material coated with a mass of 110 g / m ² , a thickness of 0.87 mm, and an apparent specific gravity of 0.13) as the cloth material. When the pattern of the silicone layer of the obtained printing plate was observed with an optical microscope, a pattern with a light shielding part width of 20 μm was resolved, but a pattern finer than this could not be resolved.

Comparative Example 2
Instead of the fabric material of Example 1, "Bencot (registered trademark)" M-3 (manufactured by Asahi Kasei Fibers Co., Ltd., cotton cupra nonwoven fabric (gauze)) on the outside of "Toraysee" ME wiper folded to 5 cm x 4 cm, mass 28 g / ^{m 2} per 1 m ² in the standard state, a thickness of 0.42 mm, using a material obtained by coating the apparent specific gravity 0.07) as the fabric material was produced in the same manner as the printing plate as in example 1. When the pattern of the silicone layer of the obtained printing plate was observed with an optical microscope, a pattern with a light shielding portion width of 30 μm was resolved, but a pattern finer than this could not be resolved.

Comparative Example 3
In place of the fabric material of Example 1, "Cappelon" (manufactured by Cambo Create Co., Ltd., electric flocking nylon carpet, single yarn diameter 100 μm, length of hair foot 3.5 to 7 mm) is used as the fabric material. A printing plate was prepared in the same manner as in Example 1. When the pattern of the silicone layer of the obtained printing plate was observed with an optical microscope, a pattern with a light shielding part width of 20 μm was resolved, but a pattern finer than this could not be resolved.

Comparative Example 4 (automatic developing machine)
The exposed printing plate precursor obtained by the method described in Example 1 was developed using a waterless lithographic automatic developing machine TWL-1160K to prepare a printing plate. A pretreatment solution NP-1 for an automatic processor manufactured by Toray (glycol derivative: about 80 wt% / organic base: about 13 wt% / surfactant: about 0.51 wt% / water: about 6.24 wt% / Isopropyl alcohol (about 0.25% by weight), water in the developing tank, post-treatment liquid NA-1 (diethylene glycol derivative 18% by weight / crystal violet 0.1% by weight, manufactured by Toray Industries) in the post-processing tank (dyeing tank) / Surfactant 1.5% by weight / 2-ethylhexanoic acid 1% by weight / water 79.4% by weight), and the liquid temperature was sequentially heated to 45 ° C., 25 ° C., 25 ° C., and the processing speed was 40 cm / Developed in minutes. The developing brush is a roll of 130 mm in outer diameter, in which a single thread with a diameter of 150 μm is implanted with a polybutylene terephthalate (PBT) single thread by a forming method so that the length of the hair is 15 mm. A channel roll brush cut with a lathe at 1160 mm was rotated at 400 revolutions per minute in the same direction as the conveying direction, and oscillated with a width of 30 mm at 120 reciprocations per minute. When the pattern of the silicone layer of the obtained printing plate was observed with an optical microscope, a pattern with a light shielding part width of 20 μm was resolved, but a pattern finer than this could not be resolved.

  The results of each example and comparative example are shown in Table 1.

Claims (2)

A printing plate production method for forming a pattern of a silicone layer by selectively removing a silicone layer after exposing or heating a printing plate precursor having at least a photosensitive layer or a thermosensitive layer and a silicone layer in this order on a support In the presence of a developer, the silicone layer is selectively removed by rubbing the surface of the silicone layer with a knitted fabric, a woven fabric or a non-woven fabric having an apparent specific gravity of 0.15 or more. A method for producing a printing plate. The method for producing a printing plate according to claim 1, wherein the knitted fabric, the woven fabric or the non-woven fabric contains polyester fiber, polyamide fiber or cellulose fiber.