JP2010177133A - Polarized light-emitting element - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a polarized light-emitting element excellent in utilization efficiency of light. <P>SOLUTION: The polarized light-emitting element is provided with: a reflecting electrode; a light-emitting layer; a transparent electrode; and a light polarization element layer including a first lattice structure having a wavelength spectroscopic function to divide visual light into each wavelength, and a second lattice structure having a polarized light separating function to separate visual light by the polarization plane, in this order. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a polarized light emitting device.

An organic electroluminescence (hereinafter sometimes abbreviated as “organic EL”) element is expected to be used as a light source for display devices such as segment display devices, dot matrix display devices, and liquid crystal display devices.
In an organic EL device, holes injected from a hole injection electrode (anode) and electrons injected from an electron injection electrode (cathode) are recombined at the interface between the light emitting layer and the hole (or electron) transport layer. Or by recombination within the light emitting layer. Therefore, compared with an inorganic electroluminescence element whose light emission mechanism is collision erection type light emission, the organic EL element has a feature that it can emit light at a low voltage, and is very promising as a light source in the future. In addition, when the light extracted from the organic EL element is polarized light, there are merits such that application to a backlight of a liquid crystal display can be expected.

  However, when an organic EL element is used as a surface light source, it is a problem to extract useful light from the element with high efficiency. For example, in a polarized light-emitting element including an organic EL element, although the light-emitting layer itself has high luminous efficiency, the interference in the multilayer structure before the light is transmitted through the multilayer structure constituting the polarized light-emitting element and emitted. The amount of light may be reduced due to the above. Therefore, it is required to reduce such light loss as much as possible.

For example, as a method for increasing the light extraction efficiency, Patent Document 1 discloses that the luminance in the front direction (0 °) of the element is suppressed and the luminance at an angle of 50 to 70 ° is increased to increase the overall luminance. It is disclosed to enhance.
However, in the technique described in Patent Document 1, light emitted from the element is unpolarized light. Therefore, since the optical member is separately laminated in order to convert it into polarized light, the light use efficiency is lowered.

In Patent Document 2, a quarter-wave plate, a reflective polarizer, and a linear polarizer are provided in this order on the observation side of the transparent substrate, and a light emitting element is provided on the back side of the substrate. Thus, a technique for absorbing external light and efficiently emitting light emitted by a light emitting element is disclosed.
However, it cannot be said that the technique described in Patent Document 2 fully utilizes the external quantum efficiency of the organic EL element, and further improvement in efficiency has been demanded.

JP 2004-296423 A Japanese Patent Laid-Open No. 11-045058

  An object of the present invention is to provide a light emitting element that emits polarized light with excellent light utilization efficiency.

  As a result of studies conducted by the present inventor to solve the above problems, an organic EL element including a reflective electrode, a light emitting layer, and a transparent electrode, a first grating structure having a wavelength spectroscopic function, and a second grating having a polarization separation function The present invention has been completed by finding that the above problem can be solved by combining a polarizing element layer having a structure and allowing light emitted from the organic EL element to pass through the polarizing element layer. That is, according to the present invention, the following [1] to [8] are provided.

[1] A reflective electrode, a light emitting layer, a transparent electrode, a first grating structure having a wavelength spectroscopic function for dividing visible light by wavelength, and a second grating structure having a polarization separating function for dividing visible light by a polarization plane A polarized light emitting element comprising a polarizing element layer comprising:
[2] The polarized light-emitting element according to [1], wherein the first lattice structure is arranged at a constant period within a lattice interval of 500 nm to 100 μm.
[3] The polarized light-emitting element according to [1] or [2], further including a wavelength correction layer that gives a phase difference to transmitted light between the transparent electrode and the polarizing element layer.
[4] The polarized light emitting device according to [3], wherein the phase difference provided by the wavelength correction layer is a quarter wavelength.
[5] The polarized light emitting device according to [4], wherein the wavelength correction layer is a laminate of a half-wave plate and a quarter-wave plate.
[6] The polarized light-emitting element according to any one of [1] to [5], further including an absorptive polarizing layer on a side opposite to the transparent electrode with respect to the polarizing element layer.
[7] A laminate obtained by cutting out a long laminate obtained by bonding a long wavelength correction layer and a long polarizing element layer into a predetermined size is provided as the wavelength correction layer and the polarizing element layer [3] ] The polarized light-emitting device according to any one of [6] to [6].
[8] A laminate obtained by cutting a long laminate obtained by bonding a long polarizing element layer and a long absorbing polarizing layer into a predetermined size is provided as the polarizing element layer and the absorbing polarizing layer. 6].

  The polarized light emitting device of the present invention can emit polarized light and is excellent in light utilization efficiency.

FIG. 1 is a cross-sectional view schematically showing a polarized light-emitting element according to the first embodiment of the present invention. FIG. 2 is a cross-sectional view schematically showing an example of a polarizing element layer, and shows a polarizing element layer having a blazed grating structure and a second grating structure having a polarization separation function. FIG. 3 is a cross-sectional view schematically showing an example of a polarizing element layer, and shows a polarizing element layer having a laminar grating structure and a second grating structure having a polarization separation function. FIG. 4 is a perspective view schematically showing an example of a second grating structure having a polarization separation function. FIG. 5 is a schematic cross-sectional view of the second grating structure having the polarization separation function shown in FIG. FIG. 6 is a cross-sectional view schematically showing a polarized light-emitting element according to the second embodiment of the present invention. FIG. 7 is a diagram showing an example of a method for manufacturing a laminate in which a long wavelength correction layer and a long polarizing element layer are bonded together in the second embodiment of the present invention. FIG. 8 is a cross-sectional view schematically showing a polarized light-emitting device according to the third embodiment of the present invention. FIG. 9 is a diagram showing an example of a method for manufacturing a laminate in which a long wavelength correction layer, a long polarizing element layer, and a long absorption polarizing layer are bonded together in the third embodiment of the present invention. It is.

  Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.

(First embodiment)
FIG. 1 is a cross-sectional view schematically showing a polarized light-emitting element according to the first embodiment of the present invention. As shown in FIG. 1, the polarized light emitting element 100 includes an organic EL element 110 including at least a reflective electrode 111, a light emitting layer 112, and a transparent electrode 113, and a polarizing element layer 120 provided on the light output side of the organic EL element 110. Prepare in this order.
In the organic EL element 110, when a voltage is applied between the reflective electrode 111 and the transparent electrode 113, light is generated from the light emitting layer 112. The generated light enters the transparent electrode 113 either directly or after being reflected by the reflective electrode 111, and exits from the surface (light exit surface) 113A of the transparent electrode 113. Therefore, in the present embodiment, the upper side of the organic EL element 110 in the figure is the light output side of the organic EL element 110. The light emitted from the light exit surface 113A is converted into polarized light in the polarizing element layer 120 and is emitted from the polarizing element layer 120 as polarized light.

(Organic EL device)
The light emitting layer of the organic EL element is not particularly limited and can be appropriately selected from known ones. However, in order to suit the use as a light source, a single layer or a combination of a plurality of layers includes a predetermined peak wavelength. It can emit light.

  The organic EL element further includes an electrode. The electrodes are not particularly limited, and known ones used for organic EL elements can be appropriately selected. Specifically, it has a pair of a transparent electrode and a reflective electrode, and the transparent electrode side can be the light output side. The organic EL element can further have other layers such as a hole injection layer, a hole transport layer, an electron transport layer, an electron injection layer, and a gas barrier layer in addition to the light emitting layer between the electrodes.

  The specific layer structure of the organic EL device includes an anode / hole transport layer / light emitting layer / cathode structure, an anode / hole transport layer / light emitting layer / electron injection layer / cathode structure, and an anode / hole injection layer. / Emission layer / cathode composition, anode / hole injection layer / hole transport layer / light emission layer / electron transport layer / electron injection layer / cathode composition, anode / hole transport layer / light emission layer / electron injection layer / etc. Structure of potential surface forming layer / hole transport layer / light emitting layer / electron injection layer / cathode, anode / hole transport layer / light emitting layer / electron injection layer / charge generation layer / hole transport layer / light emitting layer / electron injection layer / Cathode configuration and the like.

Further, the polarized light emitting element may have only one organic EL element having the above layer structure, but may have two or more.
Further, in the polarized light emitting element, the organic EL element may have only one kind of light emitting material, but may have two or more kinds of light emitting materials. When the organic EL element has two or more kinds of light emitting materials, a plurality of light emitting layers having different light emission colors may be provided between a pair of anode and cathode, and a dye in a single light emitting layer may be used. Different dyes may be doped.

The material of each layer which comprises an organic EL element is not specifically limited, Arbitrary known materials can be used. For example, examples of the light emitting material include polyparaphenylene vinylene, polyfluorene, and polyvinyl carbazole materials. Examples of the hole injection layer and the hole transport layer include phthalocyanine-based, arylamine-based, and polythiophene-based materials. Examples of the electron injection layer and the electron transport layer include aluminum complexes and lithium fluoride. In addition, examples of the equipotential surface forming layer or the charge generation layer include transparent electrodes such as ITO, IZO, and SnO _2, and metal thin films such as Ag and Al.

The organic EL element can also be formed on a substrate. When the substrate is formed on a substrate, a substrate that can be normally used as a substrate of an organic EL element, such as a glass substrate, quartz glass, or a plastic substrate, can be employed.
The transparent electrode, the light emitting layer, the reflective electrode, and other arbitrary layers constituting the organic EL element can be usually provided by sequentially laminating them on a substrate.

(Polarization element layer)
2 and 3 are cross-sectional views schematically showing examples of the polarizing element layer 120. FIG. As shown in FIGS. 2 and 3, the polarizing element layer 120 includes a first grating structure 121 having a wavelength spectroscopic function for dividing visible light into wavelengths, and a second grating having a polarization separating function for dividing visible light by a polarization plane. In general, the first lattice structure 121 and the second lattice structure 122 are formed on a plate-shaped transparent resin substrate 123. 2 and 3, the symbol P represents a portion where the second lattice structure is formed.

  As the first grating structure having a wavelength spectroscopic function, a grating having a structure in which a large number of parallel slits are arranged at equal intervals, a grating having a sawtooth cross-sectional shape (blazed grating = blazed holographic grating (BHG)), groove And a grating having a cross-sectional shape of a sine wave (holographic grating (HG)) and a groove having a rectangular (square or rectangular) cross-sectional shape of a groove (laminar grating = laminar grating). Of these, a blazed grating (see FIG. 2) and a laminar grating (see FIG. 3) are preferable. Among them, the blazed grating is preferable because it usually causes a disturbance in the reflection angle and / or refraction angle of light, which will be described later, in a wider portion than the laminar grating.

When the first grating structure acts as a prism and / or a diffraction grating, the light incident on the polarizing element layer from the organic EL element is disturbed in its reflection angle and / or refraction angle. For this reason, the light (waveguide light) emitted from the organic EL element but trapped inside the polarized light emitting element due to the incident angle to the interface between the polarized light emitting element and air being too large is reflected between the reflective electrode of the organic EL element and As the reflection with the polarizing element layer is repeated, the incident angle to the interface becomes small, and light can be emitted from the polarized light emitting element. Therefore, in the polarized light emitting device of this embodiment, it is possible to extract more light emitted from the organic EL device, and it is possible to improve the light utilization efficiency.
Furthermore, depending on the shape and size of the first grating structure, the grating of the first grating structure may act as a diffraction grating, and light incident on the polarizing element layer from the organic EL element may be diffracted. In this case, S-polarized light (TM wave) in which the grating direction of the grating is perpendicular to the oscillation direction of the electric field vector causes first-order diffraction, second-order diffraction, and third-order diffraction in the grating, and light is widely dispersed. Therefore, the light is emitted from the polarized light emitting element at a wide angle, so that uneven brightness can be prevented. On the other hand, P-polarized light (TE wave) in which the lattice direction and the vibration direction of the electric field vector are parallel is hardly affected by the lattice.

  The first grating structure having a wavelength spectroscopic function is usually one in which gratings are arranged at a constant period. The lattice spacing d is usually not less than the length of the wavelength in the visible light region (usually 400 to 700 nm), preferably 500 nm or more, more preferably 700 nm or more, and preferably 100 μm or less, more preferably. Is 40 μm or less, particularly preferably 30 μm or less. Note that the lattice interval d indicates the pitch of the slits in a lattice (see FIG. 2) formed of parallel slits, and indicates the pitch of the grooves in the BHG, HG, and laminar lattice (see FIG. 3).

In the blazed grating shown in FIG. 2, the inclination angle (blazed angle) θ _B of the gentle slope is preferably 0.5 to 45 °, more preferably 0.5 to 40 °.

  In the laminar grating shown in FIG. 3, the width of the rectangular groove is preferably 500 nm to 10 μm, and particularly preferably 700 nm to 5 μm. The depth of the rectangular groove is preferably 50 nm to 5 μm, particularly preferably 100 nm to 3 μm. In a laminar lattice, there are trapezoidal portions between rectangular grooves.

  The second grating structure having a polarization separation function is a so-called grid polarizer structure. S-polarized light (TM wave) in which the lattice direction of the grid polarizer and the vibration direction of the electric field vector are perpendicular passes through the grid polarizer, and P-polarized light (TE) in which the lattice direction of the grid polarizer and the vibration direction of the electric field vector are parallel to each other. Wave) is reflected by the grid polarizer. Therefore, in the polarized light emitting device of this embodiment, it is possible to emit light emitted from the organic EL device as polarized light. Furthermore, in the polarized light emitting device of this embodiment, the first grating structure having a wavelength spectroscopic function and the second grating structure having a polarization separation function are provided in the same layer (that is, the polarizing element layer according to the present invention). It is possible to reduce the number of constituent elements of the polarized light-emitting element and increase the utilization efficiency of light emission from the organic EL element as compared with the conventional art.

In the second grating structure having a polarization separation function, a grating is formed by linear metal layers (grid lines) extending substantially in parallel.
The material used for the metal layer (grid line) is preferably a conductive material, and specific examples include metals such as aluminum, indium, magnesium, rhodium, and tin.

In the second grating structure having a polarization separation function, the grating interval is usually a length equal to or shorter than the wavelength value in the ultraviolet region, preferably 60 nm to 400 nm, more preferably 120 to 250 nm.
The lattice spacing indicates the pitch of the metal layer. If there is a metal layer at the top of the ridge or at the bottom of the groove formed between the ridges, the pitch of the metal layer formed at the top of the ridge and the pitch of the metal layer formed at the bottom of the groove And each of them.
The width of the metal layer is preferably 25 to 300 nm, more preferably 50 to 200 nm. The thickness of the metal layer is preferably 30 to 300 nm, more preferably 50 to 200 nm.

  The second grating structure having a polarization separation function is preferably formed between the gratings of the first grating structure having the wavelength spectral function. For example, when the first grating structure having the wavelength spectroscopic function is constituted by sawtooth grooves, the second grating structure having the polarization separation function is formed on the gentle slope of the sawtooth grooves. When the first grating structure having the wavelength spectroscopic function is formed of rectangular grooves, the second grating structure having a polarization separation function is formed on the base surface between the rectangular grooves. Above all, when the second lattice structure is formed on the gentle slope of the first lattice structure formed by sawtooth grooves like a blazed lattice, the base surface of the first lattice structure formed by rectangular grooves like a laminar lattice is formed. Compared to the case where the second lattice structure is formed, the second lattice structure can often be formed in a large area, which is particularly preferable.

On the gradual slope of the blazed grating (see FIG. 2) and the base surface (see FIG. 3) between the rectangular grooves of the laminar grating, ridges extending substantially in parallel with the same interval as the second grating structure having the polarization separation function are formed. Preferably it is formed.
The pitch of the ridges is usually a length equal to or shorter than the wavelength value in the ultraviolet region, preferably 60 nm to 400 nm, more preferably 120 to 250 nm.
The cross-sectional shape of the ridge is not particularly limited, and examples thereof include a rectangle, a trapezoid, a diamond, and a mountain.
The height H of the ridge is preferably 5 to 300 nm, more preferably 20 to 200 nm, and particularly preferably 50 to 100 nm.
The width of the groove formed between the ridges is preferably 200 nm or less, more preferably 20 to 100 nm.
The width of the ridge is preferably 25 to 300 nm, and the length of the ridge (ridge line) is preferably 800 nm or more.
The ratio of the height of the ridge / width of the ridge is preferably 0.1 to 5.0, more preferably 0.4 to 3.0, and particularly preferably 0.8 to 2.0.

When ridges are formed on the base between the slanted slope of the blazed grating or the rectangular grooves of the laminar grating, a metal layer is formed on the top of the ridges or the bottom of the grooves between the ridges, and this is the grid. Become a line.
The shape of the metal layer A (see reference numeral 124 in FIGS. 2 and 3) formed on the top of the ridge in the cross section perpendicular to the longitudinal direction of the ridge is not particularly limited, and is usually rectangular, trapezoidal, circular, chevron, etc. is there. The thickness of the metal layer A is not particularly limited, but is usually 20 to 500 nm, preferably 30 to 300 nm, and more preferably 40 to 200 nm. The width and length of the metal layer A are generally determined according to the shape of the top surface of the ridge.

  The shape of the metal layer B (see reference numeral 125 in FIGS. 2 and 3) formed at the bottom of the groove formed between the ridges in a cross section perpendicular to the longitudinal direction of the ridges is not particularly limited, and is usually rectangular, They are trapezoidal, circular, and mountain-shaped. The thickness of the metal layer B is usually 20 to 500 nm, preferably 30 to 300 nm. The width and length of the metal layer B are generally determined according to the shape of the bottom surface of the groove.

In the polarizing element layer, it is preferable that the grating direction of the second grating structure having the polarization separation function and the grating direction of the first grating structure having the wavelength spectroscopy function are substantially parallel.
When visible light is incident on a polarizing element layer in which the grating directions of both grating structures are substantially parallel, polarized light whose oscillation direction of the electric field vector is perpendicular to both grating directions is transmitted through the polarizing element layer. At this time, when the first grating structure functions as a diffraction grating, the polarized light is widely dispersed. On the other hand, polarized light whose both lattice directions and the vibration direction of the electric field vector are parallel is reflected by the polarizing element layer.

  As the plate-like transparent resin base material on which the first grating structure having a wavelength spectroscopic function and the second grating structure having a polarization separating function are formed, a transparent resin film or plate is usually used.

  The transparent resin base material has a retardation Re (hereinafter sometimes abbreviated as “Re”) measured at a wavelength of 550 nm, preferably 50 nm or less, and more preferably 20 nm or less. Moreover, the difference (retardation unevenness) of the retardation Re at any two points in the plane is preferably 10 nm or less, and more preferably 5 nm or less. When the retardation Re is large and the retardation unevenness is large, the brightness of the display surface tends to vary when used in a liquid crystal display device.

  The transparent resin constituting the transparent resin base material preferably has a glass transition temperature of 60 to 200 ° C, more preferably 100 to 180 ° C from the viewpoint of processability. The glass transition temperature can be measured by differential scanning calorimetry (DSC).

The transparent resin may be a thermoplastic resin or a cured curable resin, but is curable resin from the point that the first lattice structure and the ridges can be easily formed. What hardened | cured is preferable.
Transparent thermoplastic resins include polycarbonate resin, polyethersulfone resin, polyethylene terephthalate resin, polyimide resin, polyacrylate resin, polysulfone resin, polyarylate resin, polyethylene resin, polyvinyl chloride resin, cellulose diacetate, cellulose triacetate, An alicyclic olefin polymer etc. are mentioned. Of these, polycarbonate resin, polyethylene terephthalate resin, and polyacrylate resin are preferable from the viewpoint of cost.

  Examples of the curable resin include a thermosetting resin and an energy ray curable resin. In addition, an energy ray means visible light, an ultraviolet-ray, an electron beam, an X-ray.

  Specific examples of the thermosetting resin include phenol resin, urea resin, diallyl phthalate resin, melamine resin, guanamine resin, unsaturated polyester resin, polyurethane resin, epoxy resin, aminoalkyd resin, melamine-urea cocondensation resin, silicon Examples thereof include resins and polysiloxane resins.

  Examples of the energy ray curable resin include a low molecular weight compound having a radically polymerizable unsaturated group and / or a cationically polymerizable group, or a resin. In addition, the radically polymerizable unsaturated group and / or the cation polymerizable group may contain two or more in one molecule.

  Examples of the low molecular weight compound having a radical polymerizable unsaturated group include α-olefins such as ethylene and propylene; conjugated diene compounds such as butadiene and isoprene; styrene, α-methylstyrene, t-butylstyrene, divinylbenzene, and vinylnaphthalene. Radical-reactive aromatic compounds such as 4-vinylpyridine; acrylic acid, methacrylic acid, fumaric acid, maleic acid, endo-bicyclo [2.2.1] -5-heptene-2,8-dicarboxylic acid (endic Acid), tetrahydrophthalic acid, itaconic acid, citraconic acid, crotonic acid, isocrotonic acid and other unsaturated carboxylic acids; acrylic acid chloride, methacrylic acid chloride, myic acid chloride and other unsaturated carboxylic acid halides; acrylamide, methacrylamide , Maleimide, etc. Amide or imide derivative of saturated carboxylic acid; anhydride of the unsaturated carboxylic acid such as maleic anhydride, endic acid anhydride, citraconic anhydride; monomethyl maleate, dimethyl maleate, (meth) acrylic acid amide, methyl (meta ) Acrylate, ethyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, dimethylaminoethyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, cyclohexyl (meth) acrylate, isobornyl (Meth) acrylate, dicyclopentenyl (meth) acrylate, allyl (meth) acrylate, phenyl (meth) acrylate, benzyl (meth) acrylate, phenoxyethyl (meth) acrylate, hexane All di (meth) acrylate, neopentyl glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, tricyclodecane dimethylol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, propionic acid / dipentaerythritol tri ( Ester derivatives of unsaturated carboxylic acids such as (meth) acrylate, propionic acid / dipentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate; vinyltrichlorosilane, vinyltrimethoxysilane, vinyltriethoxysilane, Radical reaction unsaturated groups such as p-styryltrimethoxysilane, 3- (meth) acryloxypropyltrimethoxysilane, 3- (meth) acryloxytriethoxysilane, etc. Silane compounds; and the like.

  Examples of the low molecular weight compound having a cationic polymerizable group include dicyclopentadiene dioxide, (3,4-epoxycyclohexyl) methyl-3,4-epoxycyclohexanecarboxylate, bis (2,3-epoxycyclopentyl) ether, bis (3,4-epoxycyclohexylmethyl) adipate, bis (3,4-epoxy-6-methylcyclohexylmethyl) adipate, (3,4-epoxy-6-methylcyclohexyl) methyl-3,4-epoxy-6-methyl Cyclohexane carboxylate, bis (3,4-epoxycyclohexylmethyl) acetal, bis (3,4-epoxycyclohexyl) ether of ethylene glycol, 3,4-epoxycyclohexanecarboxylic acid diester of ethylene glycol, etc. Compounds containing a poxy group; ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, 1,4-butanediol diglycidyl ether, neopentyl glycol diglycidyl ether, 1, Epoxy compounds containing a glycidyl group such as 6-hexanediol diglycidyl ether, glycerin diglycidyl ether, diglycerin tetraglycidyl ether, trimethylolpropane triglycidyl ether, spiroglycol diglycidyl ether; 3-ethyl-3-methoxymethyloxetane 3-ethyl-3-ethoxymethyloxetane, 3-ethyl-3-butoxymethyloxetane, 3-ethyl- -Allyloxymethyloxetane, 3-methyl-3-hydroxymethyloxetane, 3-ethyl-3-hydroxymethyloxetane, 3-ethyl-3- (2'-hydroxyethyl) oxymethyloxetane, 3-ethyl-3- ( 2'-hydroxy-3'-phenoxypropyl) oxymethyloxetane, 3-ethyl-3- (2'-hydroxy-3'-butoxypropyl) oxymethyloxetane, 3-ethyl-3- [2 '-(2 " -Ethoxyethyl) oxymethyl] a compound containing an oxetane ring such as oxetane;

  Examples of the resin having a radical polymerizable unsaturated group or a cationic polymerizable group include low molecular weight polyester resins, polyether resins, acrylic resins, methacrylic resins, epoxy resins, urethane resins, alkyd resins, spiroacetal resins, polybutadiene resins, Examples thereof include resins having a radical polymerizable unsaturated group or a cationic polymerizable group in the side chain such as a polythiol polyene resin.

  When ultraviolet rays or visible rays are used as energy rays, a photopolymerization initiator, a photosensitizer, or the like is included in the curable resin. Examples of the photopolymerization initiator include acetophenones, benzophenones, Michler benzoylbenzoate, α-amyloxime ester, tetramethylthiuram monosulfide, thioxanthones, and the like. Examples of the photosensitizer include n-butylamine, triethylamine, and tri-n-butylphosphine.

  The transparent resin may be appropriately mixed with coloring agents such as pigments and dyes, fluorescent brighteners, dispersants, heat stabilizers, light stabilizers, ultraviolet absorbers, antistatic agents, antioxidants, lubricants, solvents, and the like. It may be blended.

  The said transparent resin base material is obtained by shape | molding the said transparent resin by a well-known method. Examples of the molding method include a cast molding method, an extrusion molding method, and an inflation molding method.

  The average thickness of the transparent resin substrate is usually 5 μm to 10 mm, preferably 20 to 500 μm, from the viewpoint of handleability. The transparent resin substrate preferably has a light transmittance of 80% or more in the visible light region (usually a wavelength of 400 to 700 nm).

  When manufacturing a polarizing element layer, a long thing is preferably used as a transparent resin base material. “Long” means a material having a length of at least about 5 times the width, preferably a material having a length of 10 times or more, and specifically wound and stored in a roll shape. Or what has the length of the grade carried.

  The width of the long transparent resin substrate is preferably 500 mm or more, more preferably 1000 mm or more. The transparent resin base material may be arbitrarily cut off (trimming) at both ends in the width direction during the manufacturing process. In this case, the width | variety of the said transparent resin base material can be made into the dimension after cutting off both ends.

The manufacturing method of the polarizing element layer includes a step of forming a first grating structure having a wavelength spectroscopic function for dividing visible light for each wavelength on a plate-like transparent resin base material, and a polarization separating function for dividing visible light by a polarization plane. Forming a second lattice structure (grid polarizer).
Examples of the method for forming the first grating structure having the wavelength spectroscopic function include a method using a combination of a lithography method and a development etching method; a method using transfer using a transfer mold or a transfer roll.
As the former method, for example, an energy beam curable resin is cast to obtain a coating film, and energy is applied in a pattern corresponding to a convex shape for forming a grid polarizer and, if necessary, a grid polarizer on the coating film. And a method including developing the pattern by irradiating a line.
As the latter method, for example, an energy ray curable resin is cast to obtain a coating film, and a first grating structure having a wavelength spectroscopic function is formed on the coating film and, if necessary, a grid polarizer is formed. A method comprising: pressing a mold or a roll having irregularities corresponding to the ridges of the material; irradiating energy rays in the pressed state and curing the energy ray-curable resin; wavelength spectroscopy on a thermoplastic resin film; A first grid structure having a function and a method including pressing and heating a mold or a roll having projections and depressions corresponding to projections for forming a grid polarizer, if necessary.
If a pattern or a mold or a roll having both irregularities corresponding to the first grating structure having the wavelength spectral function and irregularities corresponding to the ridges for forming the grid polarizer is used, the first having the wavelength spectral function A grating structure and a ridge for a second grating (grid polarizer) structure having a polarization separation function can be obtained at the same time.

The manufacturing method of the polarizing element layer is to obtain a cutting tool having a concavo-convex shape corresponding to the cross-sectional shape of the second grating structure having a polarization separating function, and having a width corresponding to the grating interval of the first grating structure having a wavelength spectral function, A sawtooth groove with a first grating structure having a wavelength spectroscopic function in which a cutting tool is inclined at an angle corresponding to a blaze angle and pressed against a mold member or a roll member to cut the groove, and the groove has a sawtooth cross section. A mold or roll in which a plurality of concave and convex shapes corresponding to the cross-sectional shape of the second grating structure having a polarization separation function is formed on a gentle slope of the metal, and the transfer is performed with the mold or roll (FIG. 2) ;
Alternatively, the same cutting tool as described above is pressed perpendicularly to the mold member or roll member to cut a single line, and when cutting the next line, the cutting tool is moved larger than the width of the cutting tool to have a polarization separation function. A non-cutting portion is left between the concave and convex shapes corresponding to the cross-sectional shape of the second lattice structure, and a mold or roll capable of forming a shape corresponding to the cross-sectional shape as shown in FIG. 3 is produced. The method of performing the above transfer is particularly preferable.

  The metal layer can be formed by physical vapor deposition (PVD method) of the material. The PVD method is a method of forming a film by evaporating and ionizing a vapor deposition material. Specifically, it can be appropriately selected from vacuum deposition, sputtering, ion plating (ion plating), ion beam deposition, and the like. Of these, vacuum deposition is preferred. In order to evaporate or ionize the vapor deposition material, methods such as resistance heating, electron beam, high frequency induction, and laser are used.

  When a metal layer is formed on the transparent resin base material having a ridge for forming a grid polarizer by the PVD method, the metal layer is formed on the top of the ridge and / or the bottom of the groove formed between the ridges. Is formed (see FIGS. 4 and 5). In FIGS. 4 and 5, reference numeral 126 represents a space between metal layers.

  A part of the metal layer formed on the uneven surface as described above is preferably removed by wet etching. The part of the metal layer to be removed includes a part formed on the side wall of the ridge, a part protruding from the top width of the ridge, and the like. The wet etching includes at least a step of bringing an etching solution into contact with the metal layer, a step of washing with a rinse solution, and a step of removing the rinse solution.

  Before the step of bringing the etching solution into contact with the metal layer, a mask layer may be provided on a portion of the metal layer that is desired not to be removed. An inorganic compound film is usually used for the mask layer. The mask layer can reduce the thickness of the metal layer by reducing the decrease in the thickness of the metal layer.

  The inorganic compound for the mask layer is not particularly limited as long as it can withstand wet etching described later, and examples thereof include compounds such as silicon oxide, silicon nitride, silicon carbide, and silicon nitride oxide. Of these, silicon oxide is particularly preferable. The thickness of the laminated inorganic compound film is not particularly limited, but is usually 1 to 100 nm, preferably 2 to 50 nm, and more preferably 3 to 20 nm. The inorganic compound film can be formed by a PVD method.

  Before the step of bringing the etching solution into contact with the metal layer, the metal layer can be stretched in a direction orthogonal to the substantially parallel protrusions. By this stretching, the distance between the centers of the ridges increases, the pitch of the metal layer A increases, and as a result, the light transmittance increases. Moreover, the end of the metal layer B formed on the bottom surface of the groove is separated from the base of the ridge by stretching, and a gap is formed. A wet etching solution described later enters this gap, and both ends of the metal layer B are preferentially removed, and both ends can be made thinner than the center.

  The stretching method is not particularly limited, but the stretching ratio in the direction perpendicular to the ridges is preferably 1.05 to 5 times, more preferably 1.1 to 3 times, and the stretching ratio in the direction parallel to the ridges is preferably 0.9 to 1.1 times, more preferably 0.95 to 1.05 times. In order to perform such stretching, continuous transverse uniaxial stretching by a tenter stretching machine is suitable.

  Before the step of bringing the etching solution into contact with the metal layer, it is preferable to perform a surface modification treatment of the metal layer. Suitable examples of the surface modification treatment include at least one treatment selected from the group consisting of plasma treatment, corona discharge treatment, UV irradiation treatment, and organic solvent treatment. By performing the surface modification treatment of the metal layer, variation in optical performance is reduced.

  The etching solution used for the wet etching may be a solution that can remove a part of the metal layer without corroding the transparent resin substrate, and is appropriately selected according to the material of the mask layer, the metal layer, and the transparent resin substrate. Selected. Etching solutions include solutions containing alkali metal compounds such as sodium hydroxide and potassium hydroxide; solutions containing sulfuric acid, phosphoric acid, nitric acid, acetic acid, hydrogen fluoride, hydrochloric acid, etc .; ammonium persulfate, hydrogen peroxide, fluoride Examples include ammonium and the like, and solutions made of a mixture thereof. The etching solution may contain an additive such as a surfactant.

  A method for bringing the etching solution into contact with the metal layer is not particularly limited, but at least one method selected from the group consisting of a dipping method, a spray method, and a coating method is preferable.

The rinsing liquid used for the wet etching is a liquid that removes residues generated when the etching liquid is brought into contact with the metal layer. If the residue remains, the residue may adhere to an unfavorable place on the transparent resin substrate, and the surface of the metal layer may be rough, which may affect the optical performance.
Examples of the rinsing liquid include water (pure water), a solution containing a surfactant, and the like.
The method of cleaning the metal layer with the rinsing liquid is not particularly limited as long as it is a method that can remove the etching liquid and the etching residue that are in contact with the metal layer.

  After washing with the rinse solution, the rinse solution is removed. The method for removing the rinsing liquid is not particularly limited, but an air blow method is preferred.

The polarizing element layer may have a protective layer laminated directly or via another layer on the surface on which the metal layer is formed.
The protective layer is not particularly limited by its material, but is preferably made of a transparent material. Examples of the transparent material include glass, inorganic oxide, inorganic nitride, porous material, and transparent resin. Of these, those made of transparent resin are particularly preferred. The transparent resin can be appropriately selected from those shown as constituting the above-mentioned transparent resin substrate.
The average thickness of the protective layer is usually 5 μm to 1 mm, preferably 20 to 200 μm, from the viewpoint of handleability. The protective layer preferably has a light transmittance of 80% or more in the visible light region (usually a wavelength of 400 to 700 nm).

  The protective layer preferably has a retardation Re measured at a wavelength of 550 nm of 50 nm or less, and more preferably 20 nm or less. Moreover, the difference (retardation unevenness) of the retardation Re at any two points in the plane is preferably 10 nm or less, and more preferably 5 nm or less. When the retardation Re is large and the retardation unevenness is large, the brightness of the display surface tends to vary when used in a liquid crystal display device.

  An adhesive (including an adhesive) can be used for laminating the protective layer. The average thickness of the layer made of an adhesive (adhesive layer) is usually 0.01 μm to 30 μm, preferably 0.1 μm to 15 μm. In the case where the protective layer is attached with an adhesive, it is preferable to prevent the adhesive from entering the space between the metal layers and to leave air in the space between the metal layers from the viewpoint of improving the polarization separation performance.

(Second Embodiment)
In the polarized light emitting device of the present invention, components other than the organic EL device and the polarizing device layer may be provided. For example, as in the second embodiment described below, the polarized light emitting element may include a wavelength correction layer between the transparent electrode of the organic EL element and the polarizing element layer.

FIG. 6 is a cross-sectional view schematically showing a polarized light-emitting element according to the second embodiment of the present invention. As shown in FIG. 6, the polarized light emitting element 200 includes an organic EL element 210 including at least a reflective electrode 211, a light emitting layer 212, and a transparent electrode 213, a wavelength correction layer 230 provided on the light output side of the organic EL element 210, and a polarized light. The element layer 220 is provided in this order.
In the polarized light emitting element 200 of the present embodiment, the organic EL element 210 (and the reflective electrode 211, the light emitting layer 212, and the transparent electrode 213 constituting the organic EL element 210, and the polarizing element layer 220 are each described in the first embodiment. This is the same as the organic EL element 110 (and the reflective electrode 111, the light emitting layer 112, and the transparent electrode 113 constituting the organic EL element 110) and the polarizing element layer 120. Therefore, also in the polarized light emitting element 200 of the present embodiment, light emitted from the organic EL element 210 can be emitted as polarized light while improving the light utilization efficiency as compared with the conventional case, as in the first embodiment. It is possible.

(Wavelength correction layer)
The wavelength correction layer is a layer that gives a phase difference to light transmitted through the wavelength correction layer. At this time, the wavelength of the light that the wavelength correction layer gives a phase difference is preferably in the visible light region (usually a wavelength of 400 to 700 nm). By providing the wavelength correction layer, the polarized light emitting device of this embodiment can further increase the utilization efficiency of the light emitted from the organic EL device 210 in addition to the advantages described in the first embodiment. That is, in the configuration of the first embodiment, a part of the polarized light emitted from the organic EL element 110 is reflected by the polarizing element layer and cannot be transmitted through the polarizing element layer. The reflected polarized light is converted into other polarized light by passing through the wavelength correction layer and reflected by the reflective electrode of the organic EL element. When the other polarized light reflected by the reflective electrode is transmitted through the wavelength correction layer again, it is converted into another polarized light and becomes polarized light that can be transmitted through the polarizing element layer. The light can be emitted outside.

  As the wavelength correction layer, it is preferable to use a layer that gives a quarter-wave phase difference (that is, a quarter-wave plate). If the phase difference provided by the wavelength correction layer is 1/4 wavelength, the light reflected by the polarizing element layer is reflected by the reflective electrode and is transmitted through the wavelength correcting layer twice during one round of re-entering the polarizing element layer. Thus, the polarization direction is twisted by 90 °. For this reason, since the number of reflections required until the light reflected by the polarizing element layer can be transmitted through the polarizing element layer can be reduced, the light utilization efficiency can be further increased.

  The quarter-wave plate has a retardation Re in the front direction that is approximately a quarter wavelength of transmitted light. Here, the wavelength range of the transmitted light can be a desired range required for the polarized light emitting device of the present invention, and specifically, for example, 400 nm to 700 nm. Further, the retardation Re in the front direction is approximately ¼ wavelength of the transmitted light. The Re value is ± 65 nm from the ¼ of the central value in the central value of the wavelength range of the transmitted light, preferably It means ± 30 nm, more preferably ± 10 nm. By having such a retardation value, it becomes possible to twist the polarization direction of light transmitted through the quarter-wave plate twice by 90 °.

  The quarter-wave plate desirably has a thickness direction retardation Rth (hereinafter sometimes abbreviated as “Rth”) of less than 0 nm. The value of retardation Rth in the thickness direction is preferably −30 nm to −1000 nm, more preferably −50 nm to −300 nm, in the central value of the wavelength range of transmitted light. By adopting such a wavelength correction layer having Re value and Rth, it is possible to improve the brightness of the polarized light emitting element and reduce the uneven brightness, and also reduce the uneven color of the light emitted from the polarized light emitting element.

Here, the retardation Re in the front direction is represented by the formula I: Re = (nx−ny) × d (where nx is a direction perpendicular to the thickness direction (in-plane direction)) and gives the maximum refractive index. Ny represents a refractive index in a direction perpendicular to the thickness direction (in-plane direction) and perpendicular to nx, and d represents a film thickness). The retardation Rth in the thickness direction is represented by the formula II: Rth = {(nx + ny) / 2−nz} × d (where nx is a direction perpendicular to the thickness direction (in-plane direction)) and gives the maximum refractive index. Ny is the direction perpendicular to the thickness direction (in-plane direction) and perpendicular to nx, nz is the thickness direction refractive index, and d is the film thickness. )).
In addition, the retardation Re in the front direction and the retardation Rth in the thickness direction are obtained by using a commercially available phase difference measuring device (“KOBRA-21ADH” manufactured by Oji Scientific Instruments Co., Ltd.) and a quarter wavelength plate in the longitudinal direction. Measure in the form of lattice dots over the entire surface at intervals of 100 mm in the width direction (if the length in the longitudinal direction or the lateral direction is less than 200 mm, specify three points at equal intervals in that direction), and the average value And

  The quarter-wave plate used in the present invention includes, for example, a layer (II) made of a resin having a positive intrinsic birefringence value on at least one surface of the layer (I) made of a resin having a negative intrinsic birefringence value. It is obtained by stretching the unstretched laminate (a).

Resin having a negative intrinsic birefringence value is a refractive index of light in a direction in which the refractive index of light in the alignment direction is perpendicular to the alignment direction when light is incident on a layer in which molecules are aligned in a uniaxial order. The smaller one.
Examples of the resin having a negative intrinsic birefringence value include, for example, vinyl aromatic polymers, polyacrylonitrile polymers, polymethyl methacrylate polymers, cellulose ester polymers, and multiples thereof (binary, ternary, etc.). ) Copolymers and the like. These can be used alone or in combination of two or more. Among these, at least one selected from vinyl aromatic polymers, polyacrylonitrile polymers, and polymethyl methacrylate polymers is preferable. Of these, vinyl aromatic polymers are more preferable from the viewpoint of high birefringence.

The vinyl aromatic polymer refers to a polymer of a vinyl aromatic monomer or a copolymer of a monomer copolymerizable with a vinyl aromatic monomer. Examples of the vinyl aromatic monomer include styrene; styrene derivatives such as 4-methylstyrene, 4-chlorostyrene, 3-methylstyrene, 4-methoxystyrene, 4-tert-butoxystyrene, and α-methylstyrene; Is mentioned. Examples of monomers copolymerizable with vinyl aromatic monomers include olefins such as propylene and butene; α, β-ethylenically unsaturated nitrile monomers such as acrylonitrile; acrylic acid, methacrylic acid, and maleic anhydride Α, β-ethylenically unsaturated carboxylic acid such as acid; acrylic acid ester, methacrylic acid ester; maleimide; vinyl acetate; vinyl chloride; These may be used alone or in combination of two or more.
Among vinyl aromatic polymers, a copolymer of styrene or a styrene derivative and maleic anhydride is preferable from the viewpoint of high heat resistance.

In the present invention, the thickness of the layer (I) made of a resin having a negative intrinsic birefringence value is not particularly limited, but is usually 5 to 400 μm, preferably 15 to 250 μm.
In the present invention, the glass transition temperature Tg1 of the resin having a negative intrinsic birefringence value is preferably 90 ° C. or higher, more preferably 100 ° C. or higher, from the viewpoint of excellent heat resistance during use.

  Resin having a positive intrinsic birefringence value means that when light is incident on a layer in which molecules are aligned in a uniaxial order, the refractive index of light in the direction perpendicular to the alignment direction is the refractive index of light in the alignment direction. It means something that gets bigger.

  Examples of resins having a positive intrinsic birefringence value include acetate resins such as triacetylcellulose, polyester resins, polyethersulfone resins, polycarbonate resins, chain polyolefin resins, and heavy resins having an alicyclic structure. Examples include coalesced resins, acrylic resins, polyvinyl alcohol resins, and polyvinyl chloride resins. Among these, a chain polyolefin resin or a polymer resin having an alicyclic structure is preferable, and a polymer resin having an alicyclic structure is particularly preferable from the viewpoints of transparency, low hygroscopicity, dimensional stability, lightness, and the like. preferable.

The polymer resin having an alicyclic structure has an alicyclic structure in the main chain and / or side chain, and contains an alicyclic structure in the main chain from the viewpoint of mechanical strength, heat resistance and the like. Is preferred.
The polymer resin having an alicyclic structure is a polymer resin having an amorphous alicyclic structure having a cycloalkane structure or a cycloalkene structure in the main chain and / or side chain. Examples of the alicyclic structure include a saturated alicyclic hydrocarbon (cycloalkane) structure and an unsaturated alicyclic hydrocarbon (cycloalkene) structure. From the viewpoint of mechanical strength, heat resistance, etc., a cycloalkane structure. And a cycloalkene structure are preferable, and a cycloalkane structure is particularly preferable. The number of carbon atoms constituting the alicyclic structure is not particularly limited, but is usually 4 to 30, preferably 5 to 20, more preferably 5 to 15 in the mechanical strength, The properties of heat resistance and film formability are highly balanced and suitable. The proportion of the repeating unit containing the alicyclic structure in the polymer resin having an alicyclic structure used in the present invention may be appropriately selected according to the purpose of use, but is preferably 30% by weight or more. Further, it is preferably 50% by weight or more, more preferably 70% by weight or more, and particularly preferably 90% by weight or more. When the ratio of the repeating unit having an alicyclic structure in the polymer having an alicyclic structure is in the above range, the transparency and heat resistance of the quarter-wave plate are excellent.

  Specifically, the polymer resin having an alicyclic structure includes (1) a norbornene polymer, (2) a monocyclic olefin polymer, (3) a cyclic conjugated diene polymer, and (4) vinyl. Examples thereof include alicyclic hydrocarbon polymers and hydrides thereof. Among these, norbornene-based polymers are more preferable from the viewpoints of transparency and moldability. Examples of the resin having these alicyclic structures include those described in JP-A No. 05-310845, JP-A No. 05-097978, and US Pat. No. 6,511,756.

  In the present invention, the molecular weight of a resin having a positive intrinsic birefringence value is abbreviated as gel permeation chromatography (hereinafter, “GPC”) using cyclohexane (toluene when the polymer resin is not dissolved) as a solvent. The weight average molecular weight (Mw) in terms of polyisoprene or polystyrene measured in step) is usually 5,000 to 100,000, preferably 8,000 to 80,000, more preferably 10,000 to 50,000. When the weight average molecular weight is in such a range, the mechanical strength and the moldability of the quarter-wave plate are highly balanced and suitable.

  In the present invention, the molecular weight distribution (weight average molecular weight (Mw) / number average molecular weight (Mn)) of a resin having a positive intrinsic birefringence value is not particularly limited, but is usually 1.0 to 10.0, preferably 1. It is in the range of 0 to 4.0, more preferably 1.2 to 3.5.

  The polymer resin having an alicyclic structure suitably used as a resin having a positive intrinsic birefringence value has a resin component (that is, an oligomer component) having a molecular weight of 2,000 or less, preferably 5% by weight or less, preferably It is 3% by weight or less, more preferably 2% by weight or less. When the amount of the oligomer component is large, when the laminate is stretched, fine irregularities may be generated on the surface or unevenness in thickness may occur, resulting in poor surface accuracy. In order to reduce the amount of the oligomer component, the selection of the polymerization catalyst and the hydrogenation catalyst, the reaction conditions such as polymerization and hydrogenation, the temperature conditions in the step of pelletizing the resin as a molding material, etc. may be optimized. . The amount of the oligomer component can be measured by gel permeation chromatography using cyclohexane (toluene if the polymer resin does not dissolve).

In the present invention, the thickness of the layer (II) made of a resin having a positive intrinsic birefringence value is usually 5 to 250 μm, preferably 15 to 150 μm.
In the present invention, the glass transition temperature Tg2 of the resin having a positive intrinsic birefringence value used for the quarter-wave plate is preferably lower than the glass transition temperature Tg1 of the resin having a negative intrinsic birefringence value of 10 ° C. or more. It is more preferably low, and further preferably 20 ° C. or higher.

  The layer (I) made of a resin having a negative intrinsic birefringence value and / or the layer (II) made of a resin having a positive intrinsic birefringence value used in the present invention is a resin having a negative intrinsic birefringence value. And a resin having a positive intrinsic birefringence value, the resin includes, for example, an antioxidant, a heat stabilizer, a light stabilizer, an ultraviolet absorber, an antistatic agent, a dispersant, a chlorine scavenger, if necessary. Agent, flame retardant, crystallization nucleating agent, antiblocking agent, antifogging agent, release agent, pigment, organic or inorganic filler, neutralizing agent, lubricant, decomposition agent, metal deactivator, antifouling agent, Known additives such as antibacterial agents and thermoplastic elastomers can be included as long as the effects of the present invention are not impaired. The amount of these additives is usually 0 to 5 parts by weight, preferably 0 to 3 parts by weight with respect to 100 parts by weight of a resin having a negative intrinsic birefringence value or a resin having a positive intrinsic birefringence value. .

As the quarter wave plate used in the present invention, a layer (II) made of a resin having a positive intrinsic birefringence value is usually laminated on both sides of a layer (I) made of a resin having a negative intrinsic birefringence value. The laminated body formed is used. Here, a laminated body in which an adhesive layer (III) is provided between a layer (I) made of a resin having a negative intrinsic birefringence value and a layer (II) made of a resin having a positive intrinsic birefringence value. It may be used as a quarter wave plate.
The adhesive layer (III) may be formed of a material having an affinity for both a resin having a negative intrinsic birefringence value and a resin having a positive intrinsic birefringence value used for the quarter-wave plate. it can. Examples of the polymer constituting the adhesive layer include ethylene- (meth) acrylic acid ester copolymers such as ethylene- (meth) methyl acrylate copolymer and ethylene- (meth) ethyl acrylate copolymer; Examples thereof include ethylene copolymers such as ethylene-vinyl acetate copolymer and ethylene-styrene copolymer, and other olefin polymers. In addition, modified products obtained by modifying these (co) polymers by oxidation, saponification, chlorination, chlorosulfonation, or the like can also be used. In the present invention, when a modified ethylene copolymer or another modified olefin polymer is used, the handling property at the time of forming the laminated structure and the heat resistance deterioration property of the adhesive force can be improved.

The thickness of the adhesive layer (III) is preferably 1 to 50 μm, more preferably 2 to 30 μm.
In the quarter wavelength plate used in the present invention, when the adhesive layer is included, the glass transition temperature or softening point T3 of the adhesive is the glass transition temperature Tg1 and the intrinsic composite of the resin having a negative intrinsic birefringence value. It is preferably lower than the glass transition temperature Tg2 of the resin having a positive refractive value, and more preferably 20 ° C. or lower than the Tg1 and Tg2.

The quarter-wave plate used in the present invention is obtained by laminating a layer (II) made of a resin having a positive intrinsic birefringence value on both sides of a layer (I) made of a resin having a negative intrinsic birefringence value. It is obtained by making an unstretched laminate (a) and then stretching it.
Methods for obtaining the unstretched laminate (a) include coextrusion T-die method, coextrusion inflation method, coextrusion lamination method and other coextrusion molding methods; dry lamination and other film lamination molding methods; and base resin films For example, a known method such as a coating molding method in which a resin solution is coated can be appropriately used. Among these, a molding method by coextrusion is preferable from the viewpoints of production efficiency and that volatile components such as a solvent do not remain in the film. The extrusion temperature is appropriately selected according to the type of the resin having a negative intrinsic birefringence value, the resin having a positive intrinsic birefringence value, and the adhesive used as necessary.

  The method of stretching the unstretched laminate (a) is not particularly limited, but a method of stretching obliquely is preferable. As a method of oblique stretching, for example, as described in JP-A-2007-90532, a tenter stretching machine that can add a feeding force, a pulling force, or a pulling force at different speeds in the horizontal or vertical direction, The horizontal or vertical direction feed force, pulling force, or pulling force can be added at the same speed so that the moving distance is the same and the stretching angle θ can be fixed, or the moving distance is different. The method of diagonally stretching using a tenter stretching machine is mentioned. According to this oblique stretching method, it is possible to obtain a long wound body of a quarter wavelength plate having a slow axis in a direction of 45 ° ± 7 ° with respect to the width direction.

The stretching temperature of the unstretched laminate (a) is preferably (Tg1-10) ° C. to (Tg1 + 20) ° C. with respect to the glass transition temperature Tg1 of the resin having a negative intrinsic birefringence value used for the quarter-wave plate. More preferably, the range is from (Tg1-5) ° C. to (Tg1 + 15) ° C.
In the quarter wavelength plate, the glass transition temperature Tg2 of the resin having a positive intrinsic birefringence value is set lower than the glass transition temperature Tg1 of the resin having a negative intrinsic birefringence value, and the unstretched laminate (a) By making the stretching temperature of the above range the in-plane retardation Re (I) of the layer (I) made of a resin having a negative intrinsic birefringence value, the layer made of a resin having a positive intrinsic birefringence value (II) ) In-plane retardation Re (II), the relationship of Re (I)> Re (II) can be satisfied.

  The draw ratio of the unstretched laminate (a) is usually 1.05 to 30 times, preferably 1.2 to 10 times. If the draw ratio is out of the above range, the orientation may be insufficient and the refractive index anisotropy and thus the retardation may be insufficiently exhibited, or the unstretched laminate (a) may be broken.

  The content of the residual volatile component of the quarter wave plate used in the present invention is not particularly limited, but is preferably 0.1% by weight or less, more preferably 0.05% by weight or less, and further preferably 0.02% by weight. % Or less. If the content of residual volatile components exceeds 0.1% by weight, the volatile components are released to the outside during use, causing dimensional changes in the quarter-wave plate and generating internal stress. There is a possibility that the phase difference becomes uneven and the optical characteristics become unstable. The volatile component is a substance having a molecular weight of 200 or less contained in a small amount in the quarter-wave plate, and examples thereof include a residual monomer and a solvent. The content of the volatile component can be quantified by analyzing the quarter wavelength plate by gas chromatography as the sum of the substances having a molecular weight of 200 or less contained in the quarter wavelength plate.

  The thickness of the quarter wave plate used in the present invention is usually 10 to 300 μm, preferably 30 to 200 μm.

  In the quarter wavelength plate used in the present invention, when the retardation measured at the peak wavelength emitted from the organic EL element is Re (EL), a value Re (EL) / λ obtained by dividing this by the wavelength λ is: It is preferably 0.23 to 0.27, and more preferably 0.24 to 0.26.

  In the quarter-wave plate used in the present invention, the variation of the slow axis in the in-plane direction is preferably within 5 °, more preferably within 3 °, and even more preferably within 1 °. . By setting the variation of the slow axis in the in-plane direction within the above range, it is possible to provide a polarized light emitting element having no luminance unevenness when the quarter wavelength plate of the present invention is used as a retardation film. Note that the variation of the slow axis is the variation of each measured value with respect to the arithmetic average value of the measured values when the slow axis is measured at several points.

  As a wavelength correction layer that gives a phase difference of ¼ wavelength according to the present invention, a laminate of a ¼ wavelength plate (preferably, a ¼ wavelength plate (A) described later) and a ½ wavelength plate (hereinafter referred to as “a wavelength plate”) May be described as “broadband quarter-wave plate”). This is because this wide-band quarter-wave plate functions as a quarter-wave plate for all light in the visible light region (usually wavelength 400 to 700 nm). For example, a quarter wavelength plate that gives a phase difference of a quarter wavelength (about 137 nm) at a wavelength of 550 nm and a half wavelength plate that gives a phase difference of a half wavelength (about 275 nm) at a wavelength of 550 nm, A wide-band quarter-wave plate is obtained by laminating and pasting so that the slow axes intersect at a predetermined angle.

As the quarter wave plate (A) used in the present invention, if the retardation measured at the wavelength of 550 nm among the quarter wave plates described above is Re (550), this is the wavelength λ (here The value Re (550) / λ divided by (λ = 550 nm) is preferably 0.23 to 0.27, and more preferably 0.24 to 0.26.
As the quarter wave plate (A) used in the present invention, among the quarter wave plates described above, the angle direction of the slow axis is positive in the clockwise direction from the width direction and opposite from the width direction. When the clockwise direction is negative, the slow axis is normally 105 ° ± 7 ° or 75 ° ± 7 °, preferably 105 ° ± 3.5 ° or 75 ° ± 3.5 °. The quarter wave plate which has is used.

  The transparent resin used for the half-wave plate used in the present invention is not particularly limited as long as it has a thickness of 1 mm and a total light transmittance of 80% or more. For example, an acetate-based resin such as triacetyl cellulose, Examples thereof include polyester resins, polyether sulfone resins, polycarbonate resins, chain polyolefin resins, polymer resins having an alicyclic structure, acrylic resins, polyvinyl alcohol resins, polyvinyl chloride resins, and the like. Among these, from the viewpoint of easy matching with the wavelength dispersibility of the layer (I) made of a resin having a negative intrinsic birefringence value of the quarter-wave plate, a polycarbonate resin or a polymer resin having an alicyclic structure is preferable.

  The unstretched film (b) (described later) made of a transparent resin used for the production of the half-wave plate is made of a transparent resin. Stabilizer, light stabilizer, ultraviolet absorber, antistatic agent, dispersant, chlorine scavenger, flame retardant, crystallization nucleating agent, antiblocking agent, antifogging agent, release agent, pigment, organic or inorganic filler Further, known additives such as neutralizing agents, lubricants, decomposing agents, metal deactivators, antifouling materials, antibacterial agents and thermoplastic elastomers can be included as long as the effects of the present invention are not impaired. The amount of these additives is usually 0 to 5 parts by weight, preferably 0 to 3 parts by weight with respect to 100 parts by weight of the transparent resin.

  The half-wave plate used in the present invention is obtained by stretching an unstretched film (b) made of a transparent resin. The method for obtaining the unstretched film (b) made of a transparent resin is not particularly limited, and a known molding method such as a melt extrusion molding method, a press molding method, a hot melt molding method such as an inflation method, or a solution casting method is used. Can be adopted. Each molding condition may be appropriately adjusted according to the glass transition temperature of the transparent resin to be used, the solvent, and the like.

  Examples of the method for stretching the unstretched film (b) include the same methods as those described in the method for stretching the unstretched laminate (a). Of these, the oblique stretching method is preferred. According to this obliquely stretching method, a long-winding body can be obtained by using a half-wave plate having a slow axis in the direction of 15 ° ± 7 ° or −15 ° ± 7 ° with respect to the width direction. .

  The stretching temperature of the unstretched film (b) is from (Tgb-10) ° C. to Tgb when the glass transition temperature of the resin used for the half-wave plate (preferably a resin having a positive intrinsic birefringence value) is Tgb. (Tgb + 20) ° C. is preferable, and a range of (Tgb−5) ° C. to (Tgb + 15) ° C. is more preferable.

  The draw ratio of the unstretched film (b) is usually 1.05 to 30 times, preferably 1.2 to 10 times. If the draw ratio is out of the above range, the orientation may be insufficient, the refractive index anisotropy and thus the retardation may be insufficiently exhibited, or the unstretched film (b) may be broken.

  The content of the residual volatile component of the half-wave plate is not particularly limited, but is preferably 0.1% by weight or less, more preferably 0.05% by weight or less, and further preferably 0.02% by weight or less. If the content of residual volatile components exceeds 0.1% by weight, the volatile components are released to the outside during use, causing a dimensional change in the half-wave plate and generating internal stress. There may be unevenness in the phase difference. Therefore, when the content of the volatile component of the half-wave plate is in the above range, the stability of the optical characteristics is excellent even when used for a long time.

  The thickness of the half-wave plate is usually 10 to 300 μm, preferably 30 to 200 μm.

  In the half-wave plate used in the present invention, when the retardation measured at a wavelength of 550 nm is Re (550), a value Re (550) / λ obtained by dividing this by a wavelength λ (here, λ = 550 nm) is 0. .48 to 0.52 is preferable, and 0.49 to 0.51 is more preferable.

  In the half-wave plate used in the present invention, the variation of the slow axis in the in-plane direction is preferably within 5 °, more preferably within 3 °, and further preferably within 1 °. By setting the variation of the slow axis in the in-plane direction within the above range, it is possible to provide a polarized light emitting element having no luminance unevenness when the broadband quarter-wave plate of the present invention is used as a retardation film. Note that the variation of the slow axis is the variation of each measured value with respect to the arithmetic average value of the measured values when the slow axis is measured at several points.

  The broadband quarter-wave plate of the present invention is a laminate of the quarter-wave plate (preferably the quarter-wave plate (A)) and the half-wave plate. Laminate so as to intersect at 60 ° ± 7 °, preferably 60 ° ± 3.5 °. At this time, an adhesive or a pressure-sensitive adhesive may be applied to the joint surface. Examples of the adhesive or pressure-sensitive adhesive include acrylic, silicone, polyester, polyurethane, polyether, rubber, and the like. Among these, an acrylic type is preferable from the viewpoint of heat resistance and transparency.

The broadband quarter-wave plate of the present invention has a wide wavelength region, for example, a region of λ = 450 to 650 nm, and the value of Re (λ) / λ is in the range of 0.24 to 0.26. preferable. When the value of Re (λ) / λ is within the above range, a polarized light-emitting element can be provided because it can function as a more excellent quarter-wave plate in the visible light region with a wavelength of 450 to 650 nm. be able to.
The thickness of the broadband quarter-wave plate of the present invention is usually 700 μm or less, preferably 200 to 600 μm.

The wide-band quarter-wave plate of the present invention is provided with long quarter-wave plates (A) and half-wave plates, respectively, and the long quarter-wave plate (A) It is preferable to bond a long half-wave plate. As a result, a broadband quarter-wave plate can be efficiently manufactured.
Specifically, a roll-to-roll method is used in which a long winding body of a quarter-wave plate (A) and a long winding body of a half-wave plate are stacked by pressing with a pressing roll. Can be pasted together. When laminating the long winding body of the quarter wave plate (A) and the long winding body of the half wave plate, for example, in the long winding body of the quarter wave plate (A) In the case where the slow axis is in the direction of 105 ° ± 7 ° with respect to the width direction and the long winding body of the half-wave plate, the slow axis is in the direction of 15 ° ± 7 ° with respect to the width direction. In a long surface of a certain surface or a quarter-wave plate (A), a surface having a slow axis in the direction of 75 ° ± 7 ° with respect to the width direction and a long-winding shape of a half-wave plate In the body, a slow axis is bonded to a surface having a direction of −15 ° ± 7 ° with respect to the width direction. By doing so, the slow axis of the quarter-wave plate (A) and the slow axis of the half-wave plate can be crossed at 60 ° ± 7 °.
At this time, an adhesive or a pressure-sensitive adhesive may be applied to the joining surface of the two long wound bodies wound up. Examples of the adhesive or pressure-sensitive adhesive include acrylic, silicone, polyester, polyurethane, polyether, rubber, and the like. Among these, an acrylic type is preferable from the viewpoint of heat resistance and transparency.

(Laminated plate of wavelength correction layer and polarizing element layer)
In the case where the polarized light-emitting element includes a wavelength correction layer, the polarized light-emitting element is produced by laminating at least a long wavelength correction layer and a long polarizing element layer to produce a long laminate, or a long wavelength. A polarizing element layer is formed on the correction layer to produce a long laminate, and a laminate obtained by cutting the obtained long laminate into a predetermined size is provided as the wavelength correction layer and the polarizing element layer. It is preferable. For a method of laminating a wavelength correction layer and a polarizing element layer cut out in advance to a predetermined size, a long laminate manufactured by laminating a long wavelength correction layer and a long polarizing element layer first. In the method of cutting out to a predetermined size, the manufacturing efficiency of the wavelength correction layer and the polarizing element layer is improved, and as a result, the manufacturing efficiency of the polarized light emitting element can be increased.
When the wavelength correction layer is a broadband quarter-wave plate, a polarizing element layer is laminated on the half-wave plate surface of the broadband quarter-wave plate. At this time, the lamination is performed so that the slow axis of the half-wave plate and the transmission axis or the reflection axis of the polarizing element layer intersect each other usually at 15 ° ± 7 °, preferably 15 ° ± 3.5 °.

  When laminating a long wavelength correction layer and a long polarizing element layer, for example, a long wavelength correction layer film and a long polarizing element layer film are prepared, and each of these wound bodies is prepared. The laminated body may be manufactured by drawing out the film of the wavelength correction layer and the film of the polarizing element layer, and laminating them.

  FIG. 7 is a diagram illustrating an example of a method for manufacturing a laminate in which a long wavelength correction layer and a long polarizing element layer are bonded together. In FIG. 7, the wound body 232 of the film 231 of the wavelength correction layer and the wound body 222 of the film 221 of the polarizing element layer are installed with their axes parallel to each other, and from each of the wound bodies 222, 232, the film 221 231 is pulled out. The drawn films 221 and 231 are guided between two rolls 240 and overlapped to obtain a laminated body 250. In addition, an adhesive or a pressure-sensitive adhesive can be applied to fix the film 221 and 231 between the films 221 and 231 before overlapping. By winding the laminated body 250 laminated on the winding core, a wound body 251 of the laminated body 250 in which the long wavelength correction layer and the long polarizing element layer are bonded together is obtained.

  In order to install the direction and position of the winding body 232 of the film 231 of the wavelength correction layer 231 and the winding body 222 of the film 221 of the polarizing element layer without error, in the configuration shown in FIG. In addition, direction identification marks 233 and 223 are respectively provided at the ends of the long side of the film 221 of the polarizing element layer. In the configuration of FIG. 7, if the windings 222 and 232 are attached to the apparatus so that the direction identification marks 223 and 233 are on the same side (front side in FIG. 7), the polarization transmission axes and slow phases of the films 231 and 221 will be described. Even without measuring and confirming the direction of the axis, the crossing angle between the polarization transmission axis and the slow axis can be set to a predetermined angle without error.

  7 shows an example in which a long wavelength correction layer film is prepared in advance and then laminated with a long polarizing element layer film. For example, a long wavelength correction layer film is a long broadband. In the case of a quarter wavelength plate, a laminate of a wavelength correction layer and a polarizing element layer is formed by laminating a long broadband quarter wavelength plate and a long polarizing element layer film in one step. May be obtained.

  After a long laminate is manufactured by laminating a long wavelength correction layer and a long polarizing element layer, the long laminate is cut into a predetermined size to manufacture a laminate. Since the obtained laminated plate functions as a wavelength correction layer and a polarizing element layer, a polarized light emitting element can be easily produced by laminating the laminated board with an organic EL element.

(Third embodiment)
The polarized light-emitting device of the present invention may include an absorptive polarizing layer on the side opposite to the transparent electrode with respect to the polarizing element layer. Thereby, the polarization degree of the polarized light emitted from the polarized light emitting element can be further improved.
FIG. 8 is a cross-sectional view schematically showing a polarized light-emitting device according to the third embodiment of the present invention. As shown in FIG. 8, the polarized light emitting element 300 includes an organic EL element 310 including at least a reflective electrode 311, a light emitting layer 312, and a transparent electrode 313, a wavelength correction layer 330 provided on the light output side of the organic EL element 310, and a polarized light. The element layer 320 and the absorption polarization layer 360 are provided in this order.
In the polarized light emitting element 300 of the present embodiment, the organic EL element 310 (and the reflective electrode 311, the light emitting layer 312 and the transparent electrode 313 constituting the organic EL element 310, the wavelength correction layer 330 and the polarizing element layer 320 are respectively first or The organic EL elements 110 and 210 (and the reflection electrodes 111 and 211, the light emitting layers 112 and 212 and the transparent electrodes 113 and 213 constituting the organic EL elements 110 and 210 described in the second embodiment), the wavelength correction layer 230 and the polarizing element layer 120, The same as 220. Therefore, similarly to the first and second embodiments, the light emitted from the organic EL element 310 is also emitted as polarized light in the polarized light emitting element 300 of the present embodiment while improving the light use efficiency. It is possible to make it.

(Absorptive polarizing layer)
The absorption polarizing layer is a polarizer that transmits predetermined polarized light and absorbs other light. In addition to the advantages described in the first and second embodiments, the polarized light-emitting element of this embodiment can further increase the degree of polarization of light emitted from the polarized light-emitting element by including the absorption-type polarizing layer. it can. In addition, the installation angle of the absorption-type polarizing layer and the polarized light-emitting element is usually 0 ± 4 °, preferably 0 ± 2 °, with respect to each polarization transmission axis.

The absorptive polarizing layer is not particularly limited, and a known one can be appropriately selected.
The degree of polarization of the absorptive polarizing layer is not particularly limited, but is preferably 98% or more, more preferably 99% or more. The average thickness of the absorbing polarizing layer is preferably 5 to 80 μm.

  Examples of the absorbing polarizing layer include those obtained by adsorbing iodine or dichroic dye on a polyvinyl alcohol film and then uniaxially stretching in a boric acid bath, or iodine or dichroic dye on a polyvinyl alcohol film. And the like obtained by adsorbing and stretching and further modifying a part of the polyvinyl alcohol unit in the molecular chain to a polyvinylene unit.

(Laminated plate of polarizing element layer and absorption polarizing layer)
In the case where the polarized light-emitting element includes an absorption-type polarizing layer, the polarized light-emitting element is produced by laminating at least a long polarizing element layer and a long absorption-type polarizing layer to produce a long laminate, It is preferable to provide a laminate obtained by cutting out the laminate of the scale into a predetermined size as the polarizing element layer and the absorption polarizing layer. In particular, in this embodiment, since the polarized light-emitting element includes a wavelength correction layer in addition to the polarization element layer and the absorption polarization layer, a long wavelength correction layer, a long polarization element layer, a long absorption polarization layer, It is more preferable to produce a long laminate by laminating. This makes it possible to increase the manufacturing efficiency of the polarized light-emitting element, as described in the second embodiment.

  When laminating a long wavelength correction layer, a long polarizing element layer, and a long absorption polarizing layer, for example, a long wavelength correction layer film, a long polarizing element layer film, and a long Absorption type polarizing layer film is prepared, and a wavelength correction layer film, a polarizing element layer film, and an absorption type polarizing layer film are drawn out from these rolls and laminated to produce a laminate. do it.

  FIG. 9 is a diagram illustrating an example of a method for manufacturing a laminate in which a long wavelength correction layer, a long polarizing element layer, and a long absorption polarizing layer are bonded together. In FIG. 9, the wound body 332 of the film 331 of the wavelength correction layer, the wound body 322 of the film 321 of the polarizing element layer, and the wound body 362 of the film 361 of the absorption-type polarizing layer are installed in parallel. The films 321, 331, 361 are drawn out from the respective wound bodies 322, 332, 362. The drawn films 321, 331, 361 are guided between two rolls 340 and overlapped to obtain a laminate 350. In addition, an adhesive or a pressure-sensitive adhesive can be applied before the films 321, 331, and 361 are fixed and brought into close contact with each other. By winding the laminated body 350 that is laminated and wound on a winding core, winding the laminated body 350 in which a long wavelength correction layer, a long polarizing element layer, and a long absorption polarizing layer are bonded together. A body 351 is obtained.

  In order to set the direction and position of the wound body 332 of the wavelength correction layer film 331, the wound body 322 of the polarizing element layer film 321 and the wound body 362 of the absorption type polarizing layer film 361 without error, FIG. In the configuration shown in FIG. 9, direction identification marks 333, 323, and 363 are respectively provided at the ends of the film long sides of the wavelength correction layer film 331, the polarizing element layer film 321, and the absorption type polarizing layer film 361. . In the configuration of FIG. 9, if the windings 322, 332, 362 are attached to the apparatus so that the direction identification marks 323, 333, 363 are on the same side (front side in FIG. 9), the films 331, 321, 361 Even if the direction of the polarization transmission axis and the slow axis are not measured and confirmed, the intersection angle between the polarization transmission axis and the slow axis can be set to a predetermined angle without error.

(Applications, liquid crystal display devices)
The application of the polarized light-emitting element of the present invention is not particularly limited, and for example, it can be used as a light source such as a backlight of a liquid crystal display device or a lighting device.
The liquid crystal display device including the polarized light emitting element of the present invention includes, for example, the polarized light emitting element of the present invention as a direct type backlight device, and additionally includes liquid crystal cells of various display modes. The light can be emitted from the display surface through the liquid crystal cell. This liquid crystal display device includes, for example, a twisted nematic (TN) mode, a super twisted nematic (STN) mode, a hybrid alignment nematic (HAN) mode, a vertical alignment (VA) mode, a multi-domain vertical alignment (MVA) mode, an in-plane switching ( IPS) mode, optically compensated birefringence (OCB) mode, and other display modes.

(Other optional components)
The polarized light-emitting device of the present invention is not limited to the above-described embodiment, and can be modified within the scope of the claims of the present application and within an equivalent range thereof. Moreover, other arbitrary components can be further included.
For example, as an optional component, a sealing member that seals the polarized light emitting element, wiring for supplying current to the polarized light emitting element, a housing for holding the polarized light emitting element, a frame member, and the like are required. Can have depending on.

  Hereinafter, the present invention will be described in more detail based on examples. In addition, this invention is not limited to the following Example. In the following, “parts” relating to the amount ratios of the components represent “parts by weight” unless otherwise specified.

<Production Example 1> Production of polymer resin having alicyclic structure To 500 parts of dehydrated cyclohexane, 0.82 part of 1-hexene, 0.15 part of dibutyl ether, and 0.30 part of triisobutylaluminum were added under a nitrogen atmosphere. After mixing in a reactor at room temperature and maintaining at 45 ° C., tricyclo [4.3.0.12,5] deca-3,7-diene (dicyclopentadiene, hereinafter abbreviated as “DCP”). 170 parts, 30 parts of 8-ethylidene-tetracyclo [4.4.0.12,5.17,10] -dodec-3-ene (ethylidenetetracyclododecene, hereinafter abbreviated as “ETD”). A norbornene-based monomer mixture and 40 parts of tungsten hexachloride (0.7% toluene solution) were continuously added over 2 hours for polymerization. To the polymerization solution, 1.06 part of butyl glycidyl ether and 0.52 part of isopropyl alcohol were added to inactivate the polymerization catalyst, and the polymerization reaction was stopped.

Next, 35 parts of cyclohexane is added to 100 parts of the reaction solution containing the obtained ring-opening polymer, and 5 parts of a nickel-alumina catalyst (manufactured by JGC Chemical Co., Ltd.) is added as a hydrogenation catalyst. The mixture was heated to 200 ° C. while being stirred and pressurized to 5 MPa, and then reacted for 4 hours to obtain a reaction solution containing 20% of a DCP / ETD ring-opening copolymer hydride.
When the copolymerization ratio of each norbornene monomer in the obtained ring-opening copolymer hydride was calculated from the composition of residual norbornenes in the solution after polymerization (by gas chromatography method), DCP / ETD = 85/15 (weight ratio), almost equal to the charged composition. The norbornene-based polymer 1 had a weight average molecular weight (Mw) of 35,000, a molecular weight distribution of 2.1, and a content of a resin component having a molecular weight of 2,000 or less was 0.7% by weight. The hydrogenation rate was 99.9% and the glass transition temperature Tg was 105 ° C.

  After removing the hydrogenation catalyst by filtration, an antioxidant (trade name: Irganox 1010, manufactured by Ciba Specialty Chemicals) was added to the resulting solution and dissolved (the amount of the antioxidant added) 0.1 parts per 100 parts polymer). Subsequently, cyclohexane and other volatile components, which are solvents, are removed from the solution at a temperature of 270 ° C. and a pressure of 1 kPa or less by using a cylindrical concentrating dryer (manufactured by Hitachi, Ltd.). A hydrogenated DCP / ETD ring-opening copolymer (hereinafter abbreviated as “norbornene polymer 1”), which is an example of a polymer resin having a structure, was obtained.

<Manufacture example 2> Manufacture of the long wound body A of a quarter wavelength plate The layer (II layer) which consists of the norbornene-type polymer 1 obtained by manufacture example 1, and a styrene-maleic acid copolymer (Nova Chemical) Made by the company, trade name “Daylark D332”, glass transition temperature 130 ° C., oligomer component content 3 wt%) and modified ethylene-vinyl acetate copolymer (Mitsubishi Chemical Corporation, trade name) II layer (30 μm) -III layer (6 μm) -I layer (150 μm) -III layer (6 μm) -II layer having an adhesive layer (III layer) composed of “Modic AP A543”, Vicat softening point 80 ° C. A long rolled body a of an unstretched laminate (30 μm) was obtained by coextrusion molding.

Subsequently, the long wound body a of the unstretched laminated body was −13 ° with respect to the width direction at a stretching temperature of 138 ° C., a stretching ratio of 1.5 times, and a stretching speed of 115% / min, using a tenter stretching machine. Diagonal stretching was performed in the direction, and this was wound up in a roll shape over 3000 m to obtain a long wound body A.
The retardation Re (550) at a wavelength of 550 nm of the obtained long roll A was measured to be 137.2 nm, and Re (550) /λ=0.249. Therefore, this long winding A was used as a long winding of a quarter wave plate. Moreover, the slow axis direction of this long wound body A was 103 ° with respect to the width direction, and the variation of the slow axis was ± 0.1 °. In addition, the surface in which the slow axis of this long winding A was 103 ° ± 0.1 ° with respect to the width direction was defined as the A surface.

<Manufacture example 3> Manufacture of the long winding body B of a half-wave plate The hot air which distribute | circulated the pellet of the norbornene-type polymer ("ZEONOR1420", the Nippon Zeon company make, glass transition temperature is 136 degreeC). It dried for 4 hours at 100 degreeC using the dryer. And this pellet is extruded using a T-die type film melt extrusion molding machine having a resin melt kneader equipped with a 50 mmφ screw, under the conditions of a molten resin temperature of 260 ° C. and a T-die width of 650 mm. An unstretched long wound body b of 100 μm was obtained.

Using a tenter stretching machine, the unstretched long wound body b was stretched at a stretching temperature of 142 ° C., a stretching ratio of 1.5 times, and a stretching speed of 150% / min, with respect to the width direction of the long wound body. The film was obliquely stretched in the direction of °, and this was wound up in a roll shape over 3000 m to obtain a long wound body B.
The retardation Re (550) at a wavelength of 550 nm of the obtained long roll B was measured to be 274.8 nm, and Re (550) /λ=0.500. Therefore, this long winding body B is used as a long winding body of a half-wave plate. Further, the long axis B had a slow axis direction of 16 ° with respect to the width direction and a slow axis variation of ± 0.1 °.
In addition, the surface where the slow axis of this long wound body B is 16 ° ± 0.1 ° with respect to the width direction was defined as the B surface.

<Manufacture example 4> Manufacture of long winding body C of wide-band quarter-wave plate The long winding body A obtained in manufacture example 2 and the long winding body B obtained in manufacture example 3 are each pulled out. And it laminated | stacked by the roll-to-roll method so that A surface and B surface might contact, and obtained the elongate winding body C-1.
This winding C has a retardation value Re (450) at a wavelength λ = 450 nm of 108 nm (Re (λ) /λ=0.24), and a retardation value Re (550) at a wavelength λ = 550 nm of 132 nm. (Re (λ) /λ=0.24), the retardation value Re (650) at a wavelength λ = 650 nm is 169 nm (Re (λ) /λ=0.26), and in a wide wavelength region, 1 A phase difference of / 4 wavelength was given.

<Example 1>
Focused ion beam processing device SMI3050 (manufactured by Seiko Instruments Inc.) from the flank side of a single crystal diamond bite made of a cutting edge angle of 85 °, a flank surface of 0.2 mm × 0.5 mm and a scoop surface of 0.5 mm × 1 mm ) Is irradiated with an argon ion beam at an angle of 93 ° with respect to the scooping surface, and a 5 μm long groove extending from the scooping surface of the diamond tool blade to the flank surface has a width of 500 nm on the flank surface of the cutting edge. The portions formed in a plurality of rows over the entire width (0.5 mm) of the bite were formed with an interval of 300 nm. The shape of the groove forming portion on the scooping surface side was a rectangular shape having a pitch of 200 nm, a width of 100 nm, and a depth of 70 nm. In addition, a rectangular ridge having a width of 300 nm and a shape of the scooping surface side and a height of 100 nm was left between the groove forming portions.
The obtained diamond cutting tool is brazed to the 8 mm x 60 mm surface of an 8 mm x 8 mm x 60 mm SUS shank so that the 0.5 mm side of the diamond bit is perpendicular to the 60 mm side of the shank, A cutting tool was obtained.

The entire surface of the curved surface of a stainless steel SUS430 cylinder having a diameter of 200 mm and a length of 150 mm was subjected to nickel-phosphorus electroless plating having a thickness of 100 μm. Next, using a precision cylindrical grinding machine S30-1 (manufactured by Studer), the cutting tool prepared above was pressed against the nickel-phosphorus electroless plating surface while rotating the cylinder, and the cutting edge of the diamond tool was made smooth. did.
A cylinder made of stainless steel SUS430 having a diameter of 200 mm and a length of 500 mm, plated with copper having a thickness of 100 μm, was prepared. While rotating the cylinder on the curved surface of the cylinder using a precision cylindrical grinder S30-1 (manufactured by Studer), the cutting tool is placed on the copper plating surface and the cutting edge of the cutting tool is set to 0.003 mm on the copper plating surface. It was pressed so as to form an uneven strip that goes around the curved surface.
Next, the cutting tool was released from the copper-plated surface, the cutting tool was translated 0.5 mm in the length direction of the cylinder, and an uneven strip that goes around the curved surface in the same manner as described above was formed. This cutting operation was repeated to form an uneven strip with a width of 450 mm on the cylindrical curved surface to obtain a transfer roll.

  In addition, the production of the cutting tool by focused ion beam machining and the machining of the nickel-phosphorus electroless plating surface and the copper plating surface are performed with a vibration control system (manufactured by Showa Science Co., Ltd.) with a vibration displacement of 0.5 Hz or more of 10 μm or less The temperature was controlled in a constant temperature and low vibration chamber at a temperature of 20.0 ± 0.2 ° C.

A 100 μm cycloolefin polymer film (ZF-14, manufactured by Optes) between a rubber nip roll having a diameter of 70 mm (surface temperature of 100 ° C.) and the transfer roll (surface temperature of 160 ° C.) was fed with a tension of 0.1 kgf / mm ^2. The nip pressure was 0.5 kgf / mm, and the shape of the transfer roll surface was transferred to the film surface. The film with the transferred shape was wound into a roll. A portion (a portion of a lattice structure having a polarization separation function) in which a plurality of ridges having a rectangular cross section having a width of 100 nm and a height of 70 nm are formed in parallel on the surface of the obtained transfer film at a pitch of 200 nm. ) Having a width of 500 nm and an interval of 300 nm is formed in parallel by observation with a transmission electron microscope H-7500 (manufactured by Hitachi Ltd.) and a field emission scanning electron microscope S-4700 (manufactured by Hitachi Ltd.). confirmed. The sample for observation was produced with a microsampling device of a focused ion beam processing observation device FB-2100 (manufactured by Hitachi, Ltd.).

On the concavo-convex surface side of the transfer film, SiO ₂ is sputtered at an output of 400 W from a direction inclined by 70 ° from the normal direction of the film in the presence of argon gas and perpendicular to the film longitudinal direction (longitudinal direction of the ridges). The oblique film was formed. Next, an oblique film was formed by sputtering SiO ₂ at an output of 400 W from a direction inclined 70 ° to the opposite side of the direction and perpendicular to the longitudinal direction of the ridges. Finally, aluminum was vacuum deposited from the normal direction of the film to form a film.

  Next, the film on which the aluminum was vapor-deposited was composed of 5.2% by weight of nitric acid, 73.0% by weight of phosphoric acid, 3.4% by weight of acetic acid, and the balance of water (acid component equivalent concentration: 81.6% by weight). %) In an etching solution having a temperature of 33 ° C. for 30 seconds. It was rinsed with water and dried at 120 ° C. for 5 minutes to produce a long polarizing element.

This polarizing element was observed with a transmission electron microscope H-7500 (manufactured by Hitachi, Ltd.). The sample for cross-sectional observation by the transmission electron microscope was prepared using a microsampling apparatus of a focused ion beam processing observation apparatus FB-2100 (manufactured by Hitachi, Ltd.). In this polarizing element, an aluminum layer having a width of 99 nm and a thickness of 75 nm is laminated on the top of the ridge where the ridge having a rectangular cross section is formed, and the top aluminum layer forms a grid lattice structure with a pitch of 200 nm. It was. In addition, an aluminum layer having a width of 61 nm and a thickness of 52 nm was laminated on the bottom of the groove between the ridges, and the bottom aluminum layer formed a grid lattice structure with a pitch of 200 nm. The aluminum layer formed on the bottom had a shape in which the film thickness at both ends was thinner than the film thickness at the center.
The polarizing element was observed with a field emission scanning electron microscope S-4700 (manufactured by Hitachi, Ltd.). In this polarizing element, the portions where the protrusions having a rectangular section with a width (polarization grating structure width) of 500 nm were formed were formed in parallel with an interval of 300 nm.

  Next, a long absorption polarizer (trade name HLC2-5618S, manufactured by Sanlitz Co., Ltd.) having a transmission axis in the width direction of the film was prepared. Using a laminating apparatus equipped with a nip roll, a long polarizing element (transmission axis is in the width direction of the film) with the adhesive (“SK Dyne 2094”; manufactured by Soken Chemical Co., Ltd.) in the form of dots. 1 of a structural surface (a surface on which aluminum is vapor-deposited) and a long broadband quarter-wave plate produced in Production Example 4 (the slow axis of the half-wave plate is inclined by 15 ° with respect to the film width direction) / 2 wavelength plate surface is bonded, and the film surface of the long polarizing element (surface on which aluminum is not deposited) and the long absorbing polarizer (transmission axis is in the width direction of the film) are bonded together. It was. Thus, an optical laminate 1 was obtained in which a long absorption polarizer, a long polarizing element, and a long broadband quarter-wave plate were stacked.

Using a ITO glass target (In ₂ O ₃ : SnO ₂ = 90% by weight: 10% by weight) on a cleaned glass substrate, a transparent electrode (anode) was formed by laminating ITO having a thickness of 100 nm by sputtering. .
On top of that, copper phthalocyanine was laminated to a thickness of 15 nm by a vacuum deposition method with a deposition rate of 0.3 nm / s to form a hole injection layer.
On top of that, N, N-bis (3-methylphenyl) -N, N′-diphenylbenzidine is laminated to a thickness of 40 nm by a vacuum deposition method with a deposition rate of 0.3 nm / s, and hole transporting blue light emission is achieved. A layer was formed.
On top of this, triazole was laminated to a thickness of 15 nm by a vacuum deposition method with a deposition rate of 0.3 nm / s to form a hole blocking layer.
On top of that, tris (8-quinolinolato) aluminum complex was laminated to a thickness of 90 nm by a vacuum deposition method with a deposition rate of 0.3 nm / s to form an electron transport layer.
On top of that, co-evaporation was performed at a deposition rate of Mg 1 nm / s and Ag 0.1 nm / s, and a Mg / Ag co-evaporation film having a thickness of 100 nm was formed as a reflective electrode (cathode), and an organic EL element as a light-emitting element Produced. As a result of applying a voltage of 10 V to the light emitting element and measuring the luminance using a luminance meter (BM-7, manufactured by Topcon), it was 1500 cd / m ² .

Next, the previously produced long optical laminate 1 is cut out, and the quarter-wave plate surface of the optical laminate 1 is attached to a light emitting element via an adhesive (“SK Dyne 2094”; manufactured by Soken Chemical Co., Ltd.). Thus, a polarized light emitting device 1 was produced.
As a result of measuring the luminance of the produced polarized light-emitting element 1 using a luminance meter, it was 1370 cd / m ² , and it was revealed that the light emission characteristics were good.

<Example 2>
Focused ion beam machining device SMI3050 (manufactured by Seiko Instruments Inc.) from the flank side of a single crystal diamond bite material consisting of a 85 ° edge angle, 0.2 mm × 0.02 mm flank and 0.02 mm × 1 mm scoop surface ) Is irradiated with an argon ion beam at an angle of 93 ° with respect to the scooping surface, and a 5 μm long groove extending from the scooping surface of the diamond tool blade to the flank face is formed on the tool flank surface. Was formed over the entire width (0.02 mm). The shape of the groove forming portion on the scooping surface side was a rectangular shape having a pitch of 200 nm, a width of 100 nm, and a depth of 70 nm.
The obtained diamond tool was brazed to the 8 mm x 60 mm surface of an 8 mm x 8 mm x 60 mm SUS shank so that the 0.02 mm side of the diamond bit was perpendicular to the 60 mm side of the shank, A cutting tool was obtained.

The entire surface of the curved surface of a stainless steel SUS430 cylinder having a diameter of 200 mm and a length of 150 mm was subjected to nickel-phosphorus electroless plating having a thickness of 100 μm. Next, using a precision cylindrical grinding machine S30-1 (manufactured by Studer), the cutting tool prepared above was pressed against the nickel-phosphorus electroless plating surface while rotating the cylinder, and the cutting edge of the diamond tool was made smooth. did.
A cylinder made of stainless steel SUS430 having a diameter of 200 mm and a length of 500 mm, plated with copper having a thickness of 100 μm, was prepared. While rotating the cylinder on the curved surface of the cylinder using a precision cylindrical grinder S30-1 (manufactured by Studer), the cutting tool is placed on the copper plating surface, and the cutting edge of the cutting tool is 0.01 mm on the copper plating surface. It was pressed so as to form an uneven strip that goes around the curved surface.
Next, the cutting tool was released from the copper-plated surface, and the cutting tool was translated by 0.021 mm in the length direction of the cylinder to form an uneven line that goes around the curved surface in the same manner as described above. This cutting operation was repeated to form an uneven strip with a width of 450 mm on a SUS cylindrical curved surface to obtain a transfer roll.

A polarizing element was produced by the same method as in Example 1 using the produced transfer roll. This is called a polarizing element 2. When the shape of the produced polarizing element 2 was observed using a field emission scanning electron microscope, the portions where the polarizing element was formed (polarization grating structure width) 0.02 mm were parallel with an interval of 0.001 mm. Was formed.
Next, an optical laminate and a polarized light-emitting element were produced in the same manner as in Example 1. These are called the optical laminated body 2 and the polarized light emitting element 2, respectively. As a result of measuring the luminance of the produced polarized light-emitting element 2 using a luminance meter, it was found to be 1390 cd / m ² , indicating good light emission characteristics.

<Example 3>
A polarizing element was produced in the same manner as in Example 2 except that the amount of parallel movement of the cutting tool in the process of producing the transfer roll was changed to 0.025 mm. This is called a polarizing element 3. When the shape of the produced polarizing element 3 was observed using a field emission scanning electron microscope, the portions having a width (polarization grating structure width) of 0.02 mm where the polarizing elements were formed were parallel with an interval of 0.005 mm. Was formed.
Next, an optical laminate and a polarized light-emitting element were produced in the same manner as in Example 1. These are called the optical laminated body 3 and the polarized light emitting element 3, respectively. As a result of measuring the luminance of the manufactured polarized light-emitting element 3 using a luminance meter, it was 1440 cd / m ² , and it was revealed that the light emission characteristics were good.

<Example 4>
Focusing ion beam processing device SMI3050 (manufactured by Seiko Instruments Inc.) from the flank side of a single crystal diamond bite material having a cutting edge angle of 85 °, a flank surface of 0.2 mm × 0.1 mm, and a scooping surface of 0.1 mm × 1 mm ) Is irradiated with an argon ion beam at an angle of 93 ° with respect to the scooping surface, and a 5 μm long groove extending from the scooping surface of the diamond tool blade to the flank face is formed on the tool flank surface. Was formed over the entire width (0.1 mm). The shape of the groove forming portion on the scooping surface side was a rectangular shape having a pitch of 200 nm, a width of 100 nm, and a depth of 70 nm.
The obtained diamond cutting tool was brazed to the 8 mm x 60 mm surface of an 8 mm x 8 mm x 60 mm SUS shank so that the 0.1 mm side of the diamond cutting tool was perpendicular to the 60 mm side of the shank, A cutting tool was obtained.
The entire surface of the curved surface of a stainless steel SUS430 cylinder having a diameter of 200 mm and a length of 150 mm was subjected to nickel-phosphorus electroless plating having a thickness of 100 μm. Next, using a precision cylindrical grinding machine S30-1 (manufactured by Studer), the cutting tool prepared above was pressed against the nickel-phosphorus electroless plating surface while rotating the cylinder, and the cutting edge of the diamond tool was made smooth. did.
A cylinder made of stainless steel SUS430 having a diameter of 200 mm and a length of 500 mm, plated with copper having a thickness of 100 μm, was prepared. While rotating the cylinder on the curved surface of the cylinder using a precision cylindrical grinder S30-1 (manufactured by Studer), the cutting tool is placed on the copper plating surface, and the cutting edge of the cutting tool is 0.01 mm on the copper plating surface. It was pressed so as to form an uneven strip that goes around the curved surface.
Next, the cutting tool was released from the copper-plated surface, and the cutting tool was translated 0.11 mm in the length direction of the cylinder to form an uneven strip that goes around the curved surface in the same manner as described above. This cutting operation was repeated to form an uneven strip with a width of 450 mm on a SUS cylindrical curved surface to obtain a transfer roll.

A polarizing element was produced by the same method as in Example 1 using the produced transfer roll. This is called a polarizing element 4. When the shape of the produced polarizing element 4 was observed using a field emission scanning electron microscope, the portions where the polarizing element was formed (width of the polarizing grating structure) of 0.1 mm were parallel with an interval of 0.01 mm. Was formed.
Next, an optical laminate and a polarized light-emitting element were produced in the same manner as in Example 1. These are called the optical laminated body 4 and the polarized light emitting element 4, respectively. As a result of measuring the luminance of the produced polarized light-emitting element 4 using a luminance meter, it was found to be 1430 cd / m ² , indicating good light emission characteristics.

<Example 5>
The cutting tool was fixed by brazing so that the angle between the 0.02 mm side of the diamond tool produced in Example 2 and the 60 mm side of the 8 mm × 8 mm × 60 mm SUS shank was 80 °. .

A cylinder made of stainless steel SUS430 having a diameter of 200 mm and a length of 500 mm, plated with copper having a thickness of 100 μm, was prepared. While rotating the cylinder on the curved surface of the cylinder using a precision cylindrical grinder S30-1 (manufactured by Studer), the cutting tool is placed on the copper plating surface, and the cutting edge of the cutting tool is 0.01 mm on the copper plating surface. It pressed so that the uneven | corrugated stripe | line which goes around a curved surface by width 0.1mm was formed.
Next, the cutting tool was released from the copper-plated surface, and the cutting tool was translated by 0.019 mm in the length direction of the cylinder to form an uneven strip that goes around the curved surface in the same manner as described above. This cutting operation was repeated to form an uneven strip with a width of 450 mm on a SUS cylindrical curved surface to obtain a transfer roll.

A polarizing element was produced by the same method as in Example 1 using the produced transfer roll. This is called a polarizing element 5. An observation cross section of the produced polarizing element 5 was prepared using an ultramicrotome, and the cross sectional shape was observed using a field emission scanning electron microscope. Measure the width of the part where the irregularities are formed (hereinafter sometimes abbreviated as “pattern formation part”) and the height difference of the end part, and calculate the blaze angle angle (reference plane and pattern formation part surface). As a result, the pattern forming portion was inclined at an angle of 10 °.
Next, an optical laminate and a polarized light-emitting element were produced in the same manner as in Example 1. These are referred to as the optical laminate 5 and the polarized light emitting element 5, respectively. As a result of measuring the luminance of the produced polarized light-emitting element 5 using a luminance meter, it was found to be 1390 cd / m ² , indicating good light emission characteristics.

<Example 6>
The diamond tool produced in Example 2 was brazed and fixed so that the angle between the 0.02 mm side of the diamond tool and the 60 mm side of the 8 mm × 8 mm × 60 mm SUS shank was 70 °, thereby obtaining a cutting tool. .

A cylinder made of stainless steel SUS430 having a diameter of 200 mm and a length of 500 mm, plated with copper having a thickness of 100 μm, was prepared. While rotating the cylinder on the curved surface of the cylinder using a precision cylindrical grinder S30-1 (manufactured by Studer), the cutting tool is placed on the copper plating surface, and the cutting edge of the cutting tool is 0.01 mm on the copper plating surface. It pressed so that the uneven | corrugated stripe | line which goes around a curved surface by width 0.1mm was formed.
Next, the cutting tool was released from the copper plating surface, the cutting tool was translated by 0.018 mm in the length direction of the cylinder, and an uneven strip that goes around the curved surface in the same manner as described above was formed. This cutting operation was repeated to form an uneven strip with a width of 450 mm on a SUS cylindrical curved surface to obtain a transfer roll.

A polarizing element was produced by the same method as in Example 1 using the produced transfer roll. This is called a polarizing element 6. An observation cross section of the prepared polarizing element 6 was prepared using an ultramicrotome, and the cross sectional shape was observed using a field emission scanning electron microscope. When the width of the pattern forming portion and the height difference of the end portion were measured and the blaze angle was calculated by calculation, the pattern forming portion was inclined at an angle of 20 °.
Next, an optical laminate and a polarized light-emitting element were produced in the same manner as in Example 1. These are referred to as an optical laminate 6 and a polarized light emitting element 6, respectively. As a result of measuring the luminance of the produced polarized light-emitting element 6 using a luminance meter, it was 1430 cd / m ² , and it was revealed that the light emission characteristics were good.

<Example 7>
The diamond tool produced in Example 2 was brazed and fixed so that the angle between the 0.02 mm side of the diamond tool and the 60 mm side of the 8 mm × 8 mm × 60 mm SUS shank was 50 °, thereby obtaining a cutting tool. .

A cylinder made of stainless steel SUS430 having a diameter of 200 mm and a length of 500 mm, plated with copper having a thickness of 100 μm, was prepared. While rotating the cylinder on the curved surface of the cylinder using a precision cylindrical grinder S30-1 (manufactured by Studer), the cutting tool is placed on the copper plating surface, and the cutting edge of the cutting tool is set to 0.015 mm on the copper plating surface. It pressed so that the uneven | corrugated stripe | line which goes around a curved surface by width 0.1mm was formed.
Next, the cutting tool was released from the copper-plated surface, and the cutting tool was moved in parallel by 0.013 mm in the length direction of the cylinder to form an uneven strip that goes around the curved surface in the same manner as described above. This cutting operation was repeated to form an uneven strip with a width of 450 mm on a SUS cylindrical curved surface to obtain a transfer roll.

A polarizing element was produced by the same method as in Example 1 using the produced transfer roll. This is called a polarizing element 7. An observation cross section of the prepared polarizing element 7 was prepared using an ultramicrotome, and the cross-sectional shape was observed using a field emission scanning electron microscope. When the width of the pattern forming portion and the height difference of the end portion were measured and the blaze angle was calculated by calculation, the pattern forming portion was inclined at an angle of 40 °.
Next, an optical laminate and a polarized light-emitting element were produced in the same manner as in Example 1. These are referred to as an optical laminate 7 and a polarized light emitting element 7, respectively. As a result of measuring the luminance of the produced polarized light-emitting element 7 using a luminance meter, it was found to be 1390 cd / m ² , indicating good light emission characteristics.

<Comparative Example 1>
A polarizer (manufactured by Sanlitz Co., Ltd., HLC2-5618S) is cut into a predetermined size, and is attached to the light emitting device produced in Example 1 via an adhesive (“SK Dyne 2094”; manufactured by Soken Chemical Co., Ltd.). A light emitting element was manufactured. This is referred to as a comparative example polarized light emitting element 1. It was 730 cd / m < ² > as a result of measuring the brightness | luminance of the produced comparative example polarizing light emitting element 1 using the luminance meter.

100, 200, 300 Polarized light emitting element 110, 210, 310 Organic EL element 1111, 211, 311 Reflective electrode 112, 212, 312 Light emitting layer 113, 213.313 Transparent electrode 113A Light emitting surface 120, 220, 320 Polarizing element layer 121 First Single lattice structure 122 Second lattice structure 123 Transparent resin base material 124 Metal layer A
125 Metal layer B
126 Space between metal layers 221, 321 Polarizing element layer film 222, 322 Polarizing element layer film roll 223, 233, 323, 333, 363 Direction identification mark 230, 330 Wavelength correction layer 231, 331 Wavelength correction layer Films 232 and 332 Waveform correction film roll 240,340 Roll 250,350 Lamination 251 351 Lamination roll 360 Absorption-type polarizing layer 361 Absorption-type polarization layer film 362 Absorption-type polarization layer film Winding body P portion where second lattice structure is formed d lattice spacing of first lattice structure θ _B blaze angle

Claims (8)

A reflective electrode;
A light emitting layer;
A transparent electrode;
A polarized light emitting device comprising a first grating structure having a wavelength spectroscopic function for separating visible light for each wavelength, and a polarizing element layer having a second grating structure having a polarization separation function for separating visible light by a polarization plane in this order.   The polarized light-emitting element according to claim 1, wherein the first lattice structure is arranged with a constant period within a lattice interval of 500 nm to 100 μm.   The polarized light-emitting element according to claim 1, further comprising a wavelength correction layer that gives a phase difference to transmitted light between the transparent electrode and the polarizing element layer.   The polarization light-emitting element according to claim 3, wherein the phase difference provided by the wavelength correction layer is a quarter wavelength.   The polarized light-emitting element according to claim 4, wherein the wavelength correction layer is a laminate of a half-wave plate and a quarter-wave plate.   The polarized light-emitting element according to claim 1, further comprising an absorption-type polarizing layer on a side opposite to the transparent electrode with respect to the polarizing element layer.   The laminated plate which cut out the long laminated body which bonded the elongate wavelength correction layer and the elongate polarizing element layer to the predetermined size is provided as the said wavelength correction layer and the said polarizing element layer. The polarized light-emitting device according to any one of the above.   7. A laminate comprising a long laminate obtained by bonding a long polarizing element layer and a long absorbing polarizing layer to a predetermined size is provided as the polarizing element layer and the absorbing polarizing layer. The polarized light-emitting device described.

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