JP2010150156A - Noxious organism-controlling composition - Google Patents

Noxious organism-controlling composition Download PDF

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JP2010150156A
JP2010150156A JP2008327869A JP2008327869A JP2010150156A JP 2010150156 A JP2010150156 A JP 2010150156A JP 2008327869 A JP2008327869 A JP 2008327869A JP 2008327869 A JP2008327869 A JP 2008327869A JP 2010150156 A JP2010150156 A JP 2010150156A
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organic sulfur
sulfur compound
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JP5277948B2 (en
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Hiroshi Okamoto
央 岡本
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Sumitomo Chemical Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a composition exhibiting excellent controlling efficacy on a noxious organism. <P>SOLUTION: The noxious organism-controlling composition comprises an organic sulfur compound represented by formula (I): Cy-(CH<SB>2</SB>)<SB>m</SB>-CR<SP>1</SP>R<SP>2</SP>-S(O)<SB>n</SB>-CH<SB>2</SB>CH<SB>2</SB>-R<SP>3</SP>[wherein R<SP>1</SP>, R<SP>2</SP>, R<SP>3</SP>, R<SP>4</SP>, R<SP>5</SP>, R<SP>6</SP>, m and n each represents a specific meaning] and a neonicotinoid compound selected from the group consisting of imidacloprid, thiacloprid, acetamiprid, nitenpyram, clothianidin and thiamethoxam. The controlling method of a noxious organism comprises applying the composition to the noxious organism or a habitat of the noxious organism. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、下記の式(I)で示される有機硫黄化合物とネオニコチノイド系化合物とを含有する有害生物防除組成物に関する。   The present invention relates to a pest control composition containing an organic sulfur compound represented by the following formula (I) and a neonicotinoid compound.

イミダクロプリド、クロチアニジン等のネオニコチノイド系化合物を含有する組成物が、家庭害虫に対する防除効力を有することが知られている(例えば、特許文献1)。
防除対象によっては、より優れた防除効力を必要とする場合がある。
It is known that a composition containing a neonicotinoid compound such as imidacloprid or clothianidin has a controlling effect against domestic pests (for example, Patent Document 1).
Depending on the control target, a better control effect may be required.

特表2007−518737号公報Special table 2007-518737 gazette

本発明は、有害生物の防除に適する、優れた防除効力を有する組成物を提供することを課題とする。   This invention makes it a subject to provide the composition which has the outstanding control effect suitable for control of a pest.

本発明者は、優れた防除効力を有する組成物を見出すべく鋭意検討した結果、下記式(I)

Figure 2010150156
〔式中、
Cyは群E1〜E2より選ばれる基で置換されていてもよいフェニル基、群E1〜E2より選ばれる基で置換されていてもよい5〜6員のヘテロアリール基、群E1〜E3より選ばれる基で置換されていてもよい3〜7員のシクロアルキル基又は群E1〜E3より選ばれる基で置換されていてもよい5〜7員のシクロアルケニル基を表し、
1はハロゲン原子で置換されていてもよいC1〜C4鎖式炭化水素基、ハロゲン原子又は水素原子を表し、
2はハロゲン原子で置換されていてもよいC1〜C4鎖式炭化水素基、-C(=G)R4、シアノ基、ハロゲン原子又は水素原子を表し、
3は少なくとも1つのフッ素原子を含むC1〜C5ハロアルキル基又はフッ素原子を表し、
Gは酸素原子又は硫黄原子を表し、
4はハロゲン原子で置換されていてもよいC1〜C4アルキル基、ハロゲン原子で置換されていてもよいC1〜C4アルコキシ基、ハロゲン原子で置換されていてもよいC3〜C6アルケニルオキシ基、ハロゲン原子で置換されていてもよいC3〜C6アルキニルオキシ基、ハロゲン原子で置換されていてもよいC1〜C4アルキルアミノ基、ハロゲン原子で置換されていてもよいジ(C1〜C4アルキル)アミノ基、ヒドロキシル基、アミノ基、C2〜C5環状アミノ基又は水素原子を表し、
mは0又は1を表し、nは0、1又は2を表し、
群E1は、群Lから選ばれる基で置換されていてもよいC1〜C6鎖式炭化水素基、ハロゲン原子で置換されていてもよいC3〜C6シクロアルキル基、-OR5、-SR5、-S(=O)R5、-S(=O)25、-C(=O)R6、-OC(=O)R7、シアノ基、ニトロ基、ヒドロキシル基及びハロゲン原子からなる一価基の群を表し、
群E2は、群Lから選ばれる基で置換されていてもよいC2−C6アルカンジイル基、群Lから選ばれる基で置換されていてもよい1,3−ブタジエン−1,4−ジイル基、-G-T-G-及び-T-G-T-からなる二価基の群を表し、
群E3は、=O、=NO-R5、=C=CH2及び=C(R8)R9からなる二価基の群を表し、
Tはメチレン基又はエチレン基を表し、
5は群Lから選ばれる基で置換されていてもよいC1〜C4鎖式炭化水素基又は群Lから選ばれる基で置換されていてもよいC3〜C6シクロアルキル基を表し、
6はハロゲン原子で置換されていてもよいC1〜C4アルコキシ基、ハロゲン原子で置換されていてもよいC3〜C6アルケニルオキシ基、ハロゲン原子で置換されていてもよいC3〜C6アルキニルオキシ基、ハロゲン原子で置換されていてもよいC1〜C4アルキルアミノ基、ハロゲン原子で置換されていてもよいジ(C1〜C4アルキル)アミノ基、ハロゲン原子で置換されていてもよいC1〜C4アルキル基、ヒドロキシル基、アミノ基、C2〜C5環状アミノ基又は水素原子を表し、
7はハロゲン原子で置換されていてもよいC1〜C4アルコキシ基、ハロゲン原子で置換されていてもよいC3〜C6アルケニルオキシ基、ハロゲン原子で置換されていてもよいC3〜C6アルキニルオキシ基、ハロゲン原子で置換されていてもよいC1〜C4アルキルアミノ基、ハロゲン原子で置換されていてもよいジ(C1〜C4アルキル)アミノ基、ハロゲン原子で置換されていてもよいC1〜C4アルキル基、アミノ基、C2〜C5環状アミノ基又は水素原子を表し、
8およびR9は同一または相異なり、ハロゲン原子で置換されていてもよいC1〜C4アルコキシ基、ハロゲン原子で置換されていてもよいC1〜C4鎖式炭化水素基、ハロゲン原子又は水素原子を表し、
群Lは、ヒドロキシル基、ハロゲン原子で置換されていてもよいC1〜C4アルコキシ基、ハロゲン原子で置換されていてもよいC3〜C6アルケニルオキシ基、ハロゲン原子で置換されていてもよいC3〜C6アルキニルオキシ基、アミノ基、ハロゲン原子で置換されていてもよいC1〜C4アルキルアミノ基、ハロゲン原子で置換されていてもよいジ(C1〜C4アルキル)アミノ基、C2〜C5環状アミノ基、-C(=O)R6、-OC(=O)R7及びハロゲン原子からなる群を表す。〕
で示される有機硫黄化合物と、
イミダクロプリド、チアクロプリド、アセタミプリド、ニテンピラム、クロチアニジン及びチアメトキサムからなる群より選ばれるネオニコチノイド系化合物とを含有する組成物が、有害生物に対して優れた防除効力を有することを見出し、本発明に到った。 As a result of intensive studies to find a composition having an excellent control effect, the present inventor has found that the following formula (I)
Figure 2010150156
[Where,
Cy is a phenyl group which may be substituted with a group selected from groups E1 to E2, a 5- to 6-membered heteroaryl group which may be substituted with a group selected from groups E1 to E2, and a group E1 to E3. A 3- to 7-membered cycloalkyl group optionally substituted with a group or a 5- to 7-membered cycloalkenyl group optionally substituted with a group selected from the groups E1 to E3,
R 1 represents a C1-C4 chain hydrocarbon group optionally substituted with a halogen atom, a halogen atom or a hydrogen atom,
R 2 represents a C1-C4 chain hydrocarbon group optionally substituted with a halogen atom, —C (═G) R 4 , a cyano group, a halogen atom or a hydrogen atom;
R 3 represents a C1-C5 haloalkyl group containing at least one fluorine atom or a fluorine atom,
G represents an oxygen atom or a sulfur atom,
R 4 is a C1-C4 alkyl group which may be substituted with a halogen atom, a C1-C4 alkoxy group which may be substituted with a halogen atom, a C3-C6 alkenyloxy group which may be substituted with a halogen atom, halogen A C3-C6 alkynyloxy group optionally substituted with an atom, a C1-C4 alkylamino group optionally substituted with a halogen atom, a di (C1-C4 alkyl) amino group optionally substituted with a halogen atom, Represents a hydroxyl group, an amino group, a C2-C5 cyclic amino group or a hydrogen atom;
m represents 0 or 1, n represents 0, 1 or 2,
Group E1 is group substituted by C1~C6 may chain hydrocarbon group selected from the group L, optionally substituted C3~C6 cycloalkyl group with a halogen atom, -OR 5, -SR 5, -S (= O) R 5 , -S (= O) 2 R 5 , -C (= O) R 6 , -OC (= O) R 7 , cyano group, nitro group, hydroxyl group and halogen atom Represents a group of monovalent groups,
Group E2 is a C2-C6 alkanediyl group optionally substituted with a group selected from Group L, a 1,3-butadiene-1,4-diyl group optionally substituted with a group selected from Group L; Represents a group of divalent groups consisting of -G-T-G- and -T-G-T-;
Group E3 represents a group of divalent groups consisting of ═O, ═NO—R 5 , ═C═CH 2 and ═C (R 8 ) R 9 ;
T represents a methylene group or an ethylene group,
R 5 represents a C1-C4 chain hydrocarbon group which may be substituted with a group selected from Group L or a C3-C6 cycloalkyl group which may be substituted with a group selected from Group L;
R 6 is a C1-C4 alkoxy group which may be substituted with a halogen atom, a C3-C6 alkenyloxy group which may be substituted with a halogen atom, a C3-C6 alkynyloxy group which may be substituted with a halogen atom, A C1-C4 alkylamino group optionally substituted with a halogen atom, a di (C1-C4 alkyl) amino group optionally substituted with a halogen atom, a C1-C4 alkyl group optionally substituted with a halogen atom, Represents a hydroxyl group, an amino group, a C2-C5 cyclic amino group or a hydrogen atom;
R 7 is a C1-C4 alkoxy group which may be substituted with a halogen atom, a C3-C6 alkenyloxy group which may be substituted with a halogen atom, a C3-C6 alkynyloxy group which may be substituted with a halogen atom, A C1-C4 alkylamino group optionally substituted with a halogen atom, a di (C1-C4 alkyl) amino group optionally substituted with a halogen atom, a C1-C4 alkyl group optionally substituted with a halogen atom, Represents an amino group, a C2-C5 cyclic amino group or a hydrogen atom,
R 8 and R 9 are the same or different and represent a C1-C4 alkoxy group which may be substituted with a halogen atom, a C1-C4 chain hydrocarbon group which may be substituted with a halogen atom, a halogen atom or a hydrogen atom. Represent,
Group L is a hydroxyl group, a C1-C4 alkoxy group optionally substituted with a halogen atom, a C3-C6 alkenyloxy group optionally substituted with a halogen atom, or a C3-C6 optionally substituted with a halogen atom. An alkynyloxy group, an amino group, a C1-C4 alkylamino group optionally substituted with a halogen atom, a di (C1-C4 alkyl) amino group optionally substituted with a halogen atom, a C2-C5 cyclic amino group,- It represents a group consisting of C (═O) R 6 , —OC (═O) R 7 and a halogen atom. ]
An organic sulfur compound represented by
The present inventors have found that a composition containing a neonicotinoid compound selected from the group consisting of imidacloprid, thiacloprid, acetamiprid, nitenpyram, clothianidin and thiamethoxam has an excellent control effect against pests. It was.

即ち、本発明は以下の発明を含む。
[発明1]
式(I)で示される有機硫黄化合物と、イミダクロプリド、チアクロプリド、アセタミプリド、ニテンピラム、クロチアニジン及びチアメトキサムからなる群より選ばれるネオニコチノイド系化合物とを含有する有害生物防除組成物。
[発明2]
式(I)において、Cyが群E1〜E2より選ばれる基で置換されていてもよいフェニル基である発明1記載の組成物。
[発明3]
式(I)において、Cyが群E1〜E2より選ばれる基で置換されていてもよい5〜6員のヘテロアリール基である発明1記載の組成物。
[発明4]
式(I)において、Cyが群E1〜E2より選ばれる基で置換されていてもよいピリジル基である発明1記載の組成物。
[発明5]
式(I)において、Cyが群E1〜E3より選ばれる基で置換されていてもよい3〜7員のシクロアルキル基又は群E1〜E3より選ばれる基で置換されていてもよい5〜7員のシクロアルケニル基である請求項1記載の組成物。
[発明6]
式(I)において、Cyが群E1〜E3より選ばれる基で置換されていてもよいシクロヘキシル基又は群E1〜E3より選ばれる基で置換されていてもよいシクロヘキセニル基である発明1記載の組成物。
[発明7]
ネオニコチノイド系化合物がクロチアニジン及びチアメトキサムからなる群より選ばれる化合物である発明1〜6のいずれか1項記載の組成物。
[発明8]
ネオニコチノイド系化合物がクロチアニジンである請求項1〜6のいずれか1項記載の組成物。
[発明9]
式(I)において、Cyが群E1〜E2より選ばれる基で置換されていてもよいフェニル基であり、
ネオニコチノイド系化合物がクロチアニジン及びチアメトキサムからなる群より選ばれる化合物である発明1記載の組成物。
[発明10]
式(I)において、Cyが群E1〜E2より選ばれる基で置換されていてもよい5〜6員のヘテロアリール基であり、
ネオニコチノイド系化合物がクロチアニジン及びチアメトキサムからなる群より選ばれる化合物である発明1記載の組成物。
[発明11]
式(I)において、Cyが群E1〜E2より選ばれる基で置換されていてもよいピリジル基であり、
ネオニコチノイド系化合物がクロチアニジン及びチアメトキサムからなる群より選ばれる化合物である発明1記載の組成物。
[発明12]
式(I)において、Cyが群E1〜E3より選ばれる基で置換されていてもよい3〜7員のシクロアルキル基又は群E1〜E3より選ばれる基で置換されていてもよい5〜7員のシクロアルケニル基であり、
ネオニコチノイド系化合物がクロチアニジン及びチアメトキサムからなる群より選ばれる化合物である発明1記載の組成物。
[発明13]
式(I)において、Cyが群E1〜E3より選ばれる基で置換されていてもよいシクロヘキシル基又は群E1〜E3より選ばれる基で置換されていてもよいシクロヘキセニル基であり、
ネオニコチノイド系化合物がクロチアニジン及びチアメトキサムからなる群より選ばれる化合物である発明1記載の組成物。
[発明14]
式(I)において、Cyが群E1〜E2より選ばれる基で置換されていてもよいフェニル基であり、
ネオニコチノイド系化合物がクロチアニジンである発明1記載の組成物。
[発明15]
式(I)において、Cyが群E1〜E2より選ばれる基で置換されていてもよい5〜6員のヘテロアリール基であり、
ネオニコチノイド系化合物がクロチアニジンである発明1記載の組成物。
[発明16]
式(I)において、Cyが群E1〜E2より選ばれる基で置換されていてもよいピリジル基であり、
ネオニコチノイド系化合物がクロチアニジンである発明1記載の組成物。
[発明17]
式(I)において、Cyが群E1〜E3より選ばれる基で置換されていてもよい3〜7員のシクロアルキル基又は群E1〜E3より選ばれる基で置換されていてもよい5〜7員のシクロアルケニル基であり、
ネオニコチノイド系化合物がクロチアニジンである発明1記載の組成物。
[発明18]
式(I)において、Cyが群E1〜E3より選ばれる基で置換されていてもよいシクロヘキシル基又は群E1〜E3より選ばれる基で置換されていてもよいシクロヘキセニル基であり、
ネオニコチノイド系化合物がクロチアニジンである発明1記載の組成物。
[発明19]
発明1〜18のいずれか記載の組成物を、有害生物又は有害生物の生息場所に施用することを特徴とする有害生物の防除方法。
[発明20]
発明1〜18のいずれか記載の組成物を、有害生物の防除の為の使用。
That is, the present invention includes the following inventions.
[Invention 1]
A pest control composition comprising an organic sulfur compound represented by the formula (I) and a neonicotinoid compound selected from the group consisting of imidacloprid, thiacloprid, acetamiprid, nitenpyram, clothianidin and thiamethoxam.
[Invention 2]
The composition according to invention 1, wherein in formula (I), Cy is a phenyl group which may be substituted with a group selected from groups E1 to E2.
[Invention 3]
The composition according to invention 1, wherein in formula (I), Cy is a 5- to 6-membered heteroaryl group optionally substituted with a group selected from groups E1 to E2.
[Invention 4]
The composition according to invention 1, wherein in formula (I), Cy is a pyridyl group optionally substituted with a group selected from groups E1 to E2.
[Invention 5]
In formula (I), Cy may be substituted with a group selected from 3 to 7-membered cycloalkyl groups or groups selected from groups E1 to E3 which may be substituted with groups selected from groups E1 to E3. The composition of claim 1 which is a membered cycloalkenyl group.
[Invention 6]
According to the invention 1, wherein in the formula (I), Cy is a cyclohexyl group which may be substituted with a group selected from the groups E1 to E3 or a cyclohexenyl group which may be substituted with a group selected from the groups E1 to E3 Composition.
[Invention 7]
The composition according to any one of Inventions 1 to 6, wherein the neonicotinoid compound is a compound selected from the group consisting of clothianidin and thiamethoxam.
[Invention 8]
The composition according to any one of claims 1 to 6, wherein the neonicotinoid compound is clothianidin.
[Invention 9]
In formula (I), Cy is a phenyl group which may be substituted with a group selected from groups E1 to E2,
The composition according to invention 1, wherein the neonicotinoid compound is a compound selected from the group consisting of clothianidin and thiamethoxam.
[Invention 10]
In formula (I), Cy is a 5- to 6-membered heteroaryl group optionally substituted with a group selected from groups E1 to E2.
The composition according to invention 1, wherein the neonicotinoid compound is a compound selected from the group consisting of clothianidin and thiamethoxam.
[Invention 11]
In formula (I), Cy is a pyridyl group optionally substituted with a group selected from the groups E1 to E2.
The composition according to invention 1, wherein the neonicotinoid compound is a compound selected from the group consisting of clothianidin and thiamethoxam.
[Invention 12]
In formula (I), Cy may be substituted with a group selected from 3 to 7-membered cycloalkyl group or group E1 to E3 optionally substituted with a group selected from groups E1 to E3. A membered cycloalkenyl group,
The composition according to invention 1, wherein the neonicotinoid compound is a compound selected from the group consisting of clothianidin and thiamethoxam.
[Invention 13]
In formula (I), Cy is a cyclohexyl group optionally substituted with a group selected from groups E1 to E3 or a cyclohexenyl group optionally substituted with a group selected from groups E1 to E3.
The composition according to invention 1, wherein the neonicotinoid compound is a compound selected from the group consisting of clothianidin and thiamethoxam.
[Invention 14]
In formula (I), Cy is a phenyl group which may be substituted with a group selected from groups E1 to E2,
The composition according to invention 1, wherein the neonicotinoid compound is clothianidin.
[Invention 15]
In formula (I), Cy is a 5- to 6-membered heteroaryl group optionally substituted with a group selected from groups E1 to E2.
The composition according to invention 1, wherein the neonicotinoid compound is clothianidin.
[Invention 16]
In formula (I), Cy is a pyridyl group optionally substituted with a group selected from the groups E1 to E2.
The composition according to invention 1, wherein the neonicotinoid compound is clothianidin.
[Invention 17]
In formula (I), Cy may be substituted with a group selected from 3 to 7-membered cycloalkyl group or group E1 to E3 optionally substituted with a group selected from groups E1 to E3. A membered cycloalkenyl group,
The composition according to invention 1, wherein the neonicotinoid compound is clothianidin.
[Invention 18]
In formula (I), Cy is a cyclohexyl group optionally substituted with a group selected from groups E1 to E3 or a cyclohexenyl group optionally substituted with a group selected from groups E1 to E3.
The composition according to invention 1, wherein the neonicotinoid compound is clothianidin.
[Invention 19]
A pest control method comprising applying the composition according to any one of the inventions 1 to 18 to a pest or a habitat of the pest.
[Invention 20]
Use of the composition according to any one of Inventions 1 to 18 for controlling pests.

本発明の防除組成物は、有害生物の防除において優れた効力を有する。   The control composition of the present invention has excellent efficacy in controlling pests.

本発明の防除組成物において、式(I)で示される有機硫黄化合物(以下、本有機硫黄化合物と記す。)と、イミダクロプリド、チアクロプリド、アセタミプリド、ニテンピラム、クロチアニジン及びチアメトキサムからなる群より選ばれるネオニコチノイド系化合物(以下、本ネオニコチノイド化合物と記す。)との重量比は、好ましくは1000:1〜1:1000、より好ましくは500:1〜1:500、100:1〜1:100、10:1〜1:10の範囲内である。   In the control composition of the present invention, an organic sulfur compound represented by the formula (I) (hereinafter referred to as the present organic sulfur compound) and neonicochi selected from the group consisting of imidacloprid, thiacloprid, acetamiprid, nitenpyram, clothianidin and thiamethoxam. The weight ratio with respect to the noid compound (hereinafter referred to as the present neonicotinoid compound) is preferably 1000: 1 to 1: 1000, more preferably 500: 1 to 1: 500, 100: 1 to 1: 100, It is in the range of 10: 1 to 1:10.

本明細書において、「ハロゲン原子」とはフッ素原子、塩素原子、臭素原子又は沃素原子を意味する。   In the present specification, the “halogen atom” means a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.

「群E1〜E2より選ばれる基で置換されていてもよいフェニル基」としては、例えばフェニル基、4−フルオロフェニル基、3−クロロフェニル基、4−クロロフェニル基、4−ブロモフェニル基、4−ヨードフェニル基、
3,4−ジフルオロフェニル基、3−クロロ−4−フルオロフェニル基、4−クロロ−3−フルオロフェニル基、4−クロロ−2−フルオロフェニル基、3,4−ジクロロフェニル基、4−ブロモ−3−フルオロフェニル基、
3,4,5−トリフルオロフェニル基、4−クロロ−3,5−ジフルオロフェニル基、
2,3,4,5,6−ペンタフルオロフェニル基、
3−シアノフェニル基、4−シアノフェニル基、
3−ニトロフェニル基、4−ニトロフェニル基、
3−メチルフェニル基、4−メチルフェニル基、2−(トリフルオロメチル)フェニル基、3−(トリフルオロメチル)フェニル基、4−(トリフルオロメチル)フェニル基、4−クロロ−3−(トリフルオロメチル)フェニル基、4−(1,1,2,2,2−ペンタフルオロエチル)フェニル基、
4−エチニルフェニル基、4−エチニル−3−フルオロフェニル基、
3−メトキシフェニル基、4−メトキシフェニル基、4−(トリフルオロメトキシ)フェニル基、
3−(メチルチオ)フェニル基、4−(メチルチオ)フェニル基、4−(トリフルオロメチルチオ)フェニル基、
4−(メチルスルホニル)フェニル基が挙げられる。
Examples of the “phenyl group optionally substituted with a group selected from the groups E1 to E2” include a phenyl group, 4-fluorophenyl group, 3-chlorophenyl group, 4-chlorophenyl group, 4-bromophenyl group, 4- An iodophenyl group,
3,4-difluorophenyl group, 3-chloro-4-fluorophenyl group, 4-chloro-3-fluorophenyl group, 4-chloro-2-fluorophenyl group, 3,4-dichlorophenyl group, 4-bromo-3 A fluorophenyl group,
3,4,5-trifluorophenyl group, 4-chloro-3,5-difluorophenyl group,
2,3,4,5,6-pentafluorophenyl group,
3-cyanophenyl group, 4-cyanophenyl group,
3-nitrophenyl group, 4-nitrophenyl group,
3-methylphenyl group, 4-methylphenyl group, 2- (trifluoromethyl) phenyl group, 3- (trifluoromethyl) phenyl group, 4- (trifluoromethyl) phenyl group, 4-chloro-3- (tri Fluoromethyl) phenyl group, 4- (1,1,2,2,2-pentafluoroethyl) phenyl group,
4-ethynylphenyl group, 4-ethynyl-3-fluorophenyl group,
3-methoxyphenyl group, 4-methoxyphenyl group, 4- (trifluoromethoxy) phenyl group,
3- (methylthio) phenyl group, 4- (methylthio) phenyl group, 4- (trifluoromethylthio) phenyl group,
4- (methylsulfonyl) phenyl group is mentioned.

「群E1〜E3より選ばれる基で置換されていてもよい5〜6員のヘテロアリール基」における5〜6員のヘテロアリール基としては、例えば2−ピリジル基、3−ピリジル基および4−ピリジル基のピリジル基;3−ピリダジニル基および4−ピリダジニル基のピリダジニル基;2−ピリミジニル基、4−ピリミジニル基および5−ピリミジニル基のピリミジニル基;2−ピラジニル基のピラジニル基;1,2,4−トリアジン−3−イル基、1,2,4−トリアジン−5−イル基および1,2,4−トリアジン−6−イル基の1,2,4−トリアジニル基;1,3,5−トリアジン−2−イル基の1,2,4−トリアジニル基;1−ピロリル基、2−ピロリル基、3−ピロリル基のピロリル基;2−フラニル基、3−フラニル基のフラニル基;2−チエニル基、3−チエニル基のチエニル基;1−ピラゾリル基、3−ピラゾリル基、4−ピラゾリル基のピラゾリル基;3−イソオキサゾリル基、4−イソオキサゾリル基、5−イソオキサゾリル基のイソオキサゾリル基;3−イソチアゾリル基、4−イソチアゾリル基、5−イソチアゾリル基のイソチアゾリル基;1−イミダゾリル基、2−イミダゾリル基、4−イミダゾリル基のイミダゾリル基;2−オキサゾリル基、4−オキサゾリル基、5−オキサゾリル基のオキサゾリル基;2−チアゾリル基、4−チアゾリル基、5−チアゾリル基のチアゾリル基;1,2,4−トリアゾール−1−イル基、1,2,4−トリアゾール−3−イル基の1,2,4−トリアゾリル基;1,3,4−オキサジアゾール−2−イル基のオキサジアゾリル基;1,3,4−チアジアゾール−2−イル基の1,3,4−チアジアゾリル基;1,2,4−オキサジアゾール−3−イル基、1,2,4−オキサジアゾール−5−イル基の1,2,4−オキサジアゾリル基;1,2,4−チアジアゾール−3−イル基、1,2,4−チアジアゾール−5−イル基の1,2,4−チアジアゾリル基が挙げられる。
「群E1〜E2より選ばれる基で置換されていてもよい5〜6員のヘテロアリール基」の具体例としては、例えば3−ピリジル基、6−クロロ−3−ピリジル基、6−(トリフルオロメチル)−3−ピリジル基、2−ピリジル基、5−クロロ−2−ピリジル基、5−(トリフルオロメチル)−2−ピリジル基、
5−ピリミジル基、2−クロロ−5−ピリミジル基、2−メトキシ−5−ピリミジル基、2−(トリフルオロメチル)−5−ピリミジル基、2−ピラジニル基、
2−ピロリル基、2−フラニル基、2−チエニル基、5−クロロ−2−チエニル基、1−ピラゾリル基、3−イソオキサゾリル基、5−tert−ブチル−3−イソオキサゾリル基、4−チアゾリル基、1−イミダゾリル基、4−(トリフルオロメチル)−1−イミダゾリル基、4−イミダゾリル基、1−tert−ブチル−4−イミダゾリル基が挙げられる。
Examples of the 5- to 6-membered heteroaryl group in the “5- to 6-membered heteroaryl group optionally substituted with a group selected from the groups E1 to E3” include a 2-pyridyl group, a 3-pyridyl group, and 4- Pyridyl group of pyridyl group; pyridazinyl group of 3-pyridazinyl group and 4-pyridazinyl group; pyrimidinyl group of 2-pyrimidinyl group, 4-pyrimidinyl group and 5-pyrimidinyl group; pyrazinyl group of 2-pyrazinyl group; 1,2,4 -1,2,4-triazinyl group of triazin-3-yl group, 1,2,4-triazin-5-yl group and 1,2,4-triazin-6-yl group; -2-yl group 1,2,4-triazinyl group; 1-pyrrolyl group, 2-pyrrolyl group, pyrrolyl group of 3-pyrrolyl group; Group: 2-thienyl group, thienyl group of 3-thienyl group; 1-pyrazolyl group, 3-pyrazolyl group, pyrazolyl group of 4-pyrazolyl group; 3-isoxazolyl group, 4-isoxazolyl group, isoxazolyl group of 5-isoxazolyl group 3-isothiazolyl group, 4-isothiazolyl group, isothiazolyl group of 5-isothiazolyl group; 1-imidazolyl group, 2-imidazolyl group, imidazolyl group of 4-imidazolyl group; 2-oxazolyl group, 4-oxazolyl group, 5-oxazolyl group; Oxazolyl group; 2-thiazolyl group, 4-thiazolyl group, thiazolyl group of 5-thiazolyl group; 1 of 1,2,4-triazol-1-yl group, 1,2,4-triazol-3-yl group , 2,4-triazolyl group; 1,3,4-oxadiazol-2-yl group oxa Azolyl group; 1,3,4-thiadiazolyl group of 1,3,4-thiadiazol-2-yl group; 1,2,4-oxadiazol-3-yl group, 1,2,4-oxadiazole- 1,2-4-diadiazolyl group of 5-yl group; 1,2,4-thiadiazolyl group of 1,2,4-thiadiazol-3-yl group, 1,2,4-thiadiazol-5-yl group It is done.
Specific examples of the “5- to 6-membered heteroaryl group optionally substituted with a group selected from groups E1 to E2” include, for example, 3-pyridyl group, 6-chloro-3-pyridyl group, 6- (tri Fluoromethyl) -3-pyridyl group, 2-pyridyl group, 5-chloro-2-pyridyl group, 5- (trifluoromethyl) -2-pyridyl group,
5-pyrimidyl group, 2-chloro-5-pyrimidyl group, 2-methoxy-5-pyrimidyl group, 2- (trifluoromethyl) -5-pyrimidyl group, 2-pyrazinyl group,
2-pyrrolyl group, 2-furanyl group, 2-thienyl group, 5-chloro-2-thienyl group, 1-pyrazolyl group, 3-isoxazolyl group, 5-tert-butyl-3-isoxazolyl group, 4-thiazolyl group, Examples include 1-imidazolyl group, 4- (trifluoromethyl) -1-imidazolyl group, 4-imidazolyl group, and 1-tert-butyl-4-imidazolyl group.

「群E1〜E3より選ばれる基で置換されていてもよい3〜7員のシクロアルキル基」における3〜7員のシクロアルキル基とは、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基及びシクロオクチル基である。
「群E1〜E3より選ばれる基で置換されていてもよい3〜7員のシクロアルキル基」の具体例としては、例えば
シクロプロピル基、2,2−ジメチルシクロプロピル基、2,2−ジクロロシクロプロピル基、
シクロブチル基、シクロペンチル基、
シクロヘキシル基、3−クロロシクロヘキシル基、4−クロロシクロヘキシル基、3−メチルシクロヘキシル基、4−メチルシクロヘキシル基、4−(ヒドロキシメチル)シクロヘキシル基、4−シアノシクロヘキシル基、4−ホルミルシクロヘキシル基、4−(2,2−ジブロモエテニル)シクロヘキシル基、4−エチニルシクロヘキシル基、4−(4−メトキシカルボニル−1−ブチニル)シクロヘキシル基、
4,4−ジフルオロシクロヘキシル基、4,4−ジメチルシクロヘキシル基、4−エチニル−4−ヒドロキシシクロヘキシル基、4−エチニル−4−フルオロシクロヘキシル基、
4,4−(1,1−ジクロロエチレン)シクロヘキシル基、4,4−(1,1−ジブロモエチレン)シクロヘキシル基、4,4−エチレンジオキシシクロヘキシル基、4,4−エチレンジチオシクロヘキシル基、
3−オキソシクロヘキシル基、4−オキソシクロヘキシル基、4−メチレンシクロヘキシル基、4−(ヒドロキシイミノ)シクロヘキシル基、4−(メトキシイミノ)シクロヘキシル基、4−(エトキシイミノ)シクロヘキシル基、4−(tert−ブトキシイミノ)シクロヘキシル基、4−(アリルオキシイミノ)シクロヘキシル基、4−(ベンジルオキシイミノ)シクロヘキシル基が挙げられる。
The 3- to 7-membered cycloalkyl group in the “3- to 7-membered cycloalkyl group optionally substituted with a group selected from the groups E1 to E3” is a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, A cycloheptyl group and a cyclooctyl group.
Specific examples of the “3- to 7-membered cycloalkyl group optionally substituted with a group selected from groups E1 to E3” include, for example, a cyclopropyl group, a 2,2-dimethylcyclopropyl group, and 2,2-dichloro group. A cyclopropyl group,
Cyclobutyl group, cyclopentyl group,
Cyclohexyl group, 3-chlorocyclohexyl group, 4-chlorocyclohexyl group, 3-methylcyclohexyl group, 4-methylcyclohexyl group, 4- (hydroxymethyl) cyclohexyl group, 4-cyanocyclohexyl group, 4-formylcyclohexyl group, 4- (2,2-dibromoethenyl) cyclohexyl group, 4-ethynylcyclohexyl group, 4- (4-methoxycarbonyl-1-butynyl) cyclohexyl group,
4,4-difluorocyclohexyl group, 4,4-dimethylcyclohexyl group, 4-ethynyl-4-hydroxycyclohexyl group, 4-ethynyl-4-fluorocyclohexyl group,
4,4- (1,1-dichloroethylene) cyclohexyl group, 4,4- (1,1-dibromoethylene) cyclohexyl group, 4,4-ethylenedioxycyclohexyl group, 4,4-ethylenedithiocyclohexyl group,
3-oxocyclohexyl group, 4-oxocyclohexyl group, 4-methylenecyclohexyl group, 4- (hydroxyimino) cyclohexyl group, 4- (methoxyimino) cyclohexyl group, 4- (ethoxyimino) cyclohexyl group, 4- (tert- A butoxyimino) cyclohexyl group, a 4- (allyloxyimino) cyclohexyl group, and a 4- (benzyloxyimino) cyclohexyl group.

「群E1〜E3より選ばれる基で置換されていてもよい5〜7員のシクロアルケニル基」における5〜7員のシクロアルケニル基としては、1−シクロペンチル、2−シクロペンチル基、3−シクロペンチル基のシクロペンチル基;1−シクロヘキセニル基、2−シクロヘキセニル基、3−シクロヘキセニル基のシクロヘキセニル基;1−シクロヘプチル基、2−シクロヘプチル基のシクロヘプチル基が挙げられる。
「群E1〜E3より選ばれる基で置換されていてもよい5〜7員のシクロアルケニル基」の具体例としては、例えば1−シクロペンチル基、1−シクロヘキシル基、4−シクロヘキセニル基、1−フルオロ−4−シクロヘキセニル基及び1−エチニル−4−シクロヘキセニル基が挙げられる。
Examples of the 5- to 7-membered cycloalkenyl group in the “5- to 7-membered cycloalkenyl group optionally substituted with a group selected from the groups E1 to E3” include 1-cyclopentyl, 2-cyclopentyl, and 3-cyclopentyl. 1-cyclohexenyl group, 2-cyclohexenyl group, cyclohexenyl group of 3-cyclohexenyl group; 1-cycloheptyl group, cycloheptyl group of 2-cycloheptyl group.
Specific examples of the “5- to 7-membered cycloalkenyl group optionally substituted with a group selected from the groups E1 to E3” include, for example, a 1-cyclopentyl group, 1-cyclohexyl group, 4-cyclohexenyl group, 1- Examples include a fluoro-4-cyclohexenyl group and a 1-ethynyl-4-cyclohexenyl group.

「ハロゲン原子で置換されていてもよいC1〜C4鎖式炭化水素基」としては、例えばメチル基、エチル基、プロピル基、1−メチルエチル基(イソプロピル基と記載する場合もある。)、2,2−ジメチルプロピル基、クロロメチル基、フルオロメチル基、ジフルオロメチル基、トリフルオロメチル基、2,2,2−トリフルオロエチル基、1,1,2,2−テトラフルオロエチル基、1,1,2,2,2−ペンタフルオロエチル基、1,1−ジメチルエチル基(以下、t−ブチル基と記載する場合もある。)等のハロゲン原子で置換されていてもよいC1〜C4アルキル基;ビニル基、2,2−ジフルオロビニル基、1,2,2−トリフルオロビニル基、1−プロペニル基、2−プロペニル基、3,3−ジフルオロ−2−プロペニル基、1−メチル−2−プロペニル基、2−メチル−2−プロペニル基、1−ブテニル基、2−ブテニル基等のハロゲン原子で置換されていてもよいC2〜C4アルケニル基;エチニル基、1−プロピニル基、3,3,3−トリフルオロ−1−プロピニル基、2−プロピニル基、1−メチル−2−プロピニル基、1−ブチニル基、2−ブチニル基、3−ブチニル基等のハロゲン原子で置換されていてもよいC2〜C4アルキニル基が挙げられる。   Examples of the “C1-C4 chain hydrocarbon group optionally substituted with a halogen atom” include a methyl group, an ethyl group, a propyl group, and a 1-methylethyl group (sometimes referred to as an isopropyl group), 2 , 2-dimethylpropyl group, chloromethyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, 2,2,2-trifluoroethyl group, 1,1,2,2-tetrafluoroethyl group, 1, C1-C4 alkyl optionally substituted by a halogen atom such as 1,2,2,2-pentafluoroethyl group, 1,1-dimethylethyl group (hereinafter sometimes referred to as t-butyl group). Group: vinyl group, 2,2-difluorovinyl group, 1,2,2-trifluorovinyl group, 1-propenyl group, 2-propenyl group, 3,3-difluoro-2-propenyl group, 1 -C2-C4 alkenyl group optionally substituted with a halogen atom such as methyl-2-propenyl group, 2-methyl-2-propenyl group, 1-butenyl group, 2-butenyl group; ethynyl group, 1-propynyl group 3,3,3-trifluoro-1-propynyl group, 2-propynyl group, 1-methyl-2-propynyl group, 1-butynyl group, 2-butynyl group, 3-butynyl group, etc. C2-C4 alkynyl group which may be included is mentioned.

「-C(=G)R4」で示される基としては、例えばアセチル基、プロピオニル基等のGが酸素原子で、R4がハロゲン原子で置換されていてもよいC1〜C4アルキル基である基;メトキシカルボニル基、エトキシカルボニル基等のGが酸素原子で、R4がハロゲン原子で置換されていてもよいC1〜C4アルコキシ基である基;アリルオキシカルボニル基等のGが酸素原子で、R4がハロゲン原子で置換されていてもよいC1〜C4アルケニルオキシ基である基;プロパルギルオキシカルボニル基等のGが酸素原子で、R4がハロゲン原子で置換されていてもよいC1〜C4アルキニルオキシ基である基;N−メチルカルバモイル基、N−エチルカルバモイル基等のGが酸素原子で、R4がハロゲン原子で置換されていてもよいC1〜C4アルキルアミノ基である基;N,N−ジメチルカルバモイル基等のGが酸素原子で、R4がハロゲン原子で置換されていてもよいジ(C1〜C4アルキル)アミノ基である基;カルボキシル基;カルバモイル基;ピペリジノカルボニル基等のGが酸素原子で、R4がC2〜C5環状アミノ基である基;ホルミル基等が挙げられる。 The group represented by “—C (═G) R 4 ” is, for example, a C1-C4 alkyl group in which G is an oxygen atom and R 4 is optionally substituted with a halogen atom, such as an acetyl group or a propionyl group. A group; G such as a methoxycarbonyl group and an ethoxycarbonyl group is an oxygen atom, and R 4 is a C1-C4 alkoxy group optionally substituted with a halogen atom; G such as an allyloxycarbonyl group is an oxygen atom; A group in which R 4 is a C1-C4 alkenyloxy group optionally substituted with a halogen atom; G, such as a propargyloxycarbonyl group, is an oxygen atom, and C 4 -C4 alkynyl in which R 4 is optionally substituted with a halogen atom an oxy group; N- methylcarbamoyl group, N- in G is an oxygen atom ethylcarbamoyl group, R 4 is is C1~C4 may be alkyl substituted by a halogen atom Group is an amino group; N, N-in G is an oxygen atom dimethylcarbamoyl group etc., radical R 4 is optionally substituted di (C1 -C4 alkyl) amino group by a halogen atom; a carboxyl group; a carbamoyl Group; a group such as piperidinocarbonyl group where G is an oxygen atom and R 4 is a C2 to C5 cyclic amino group; a formyl group and the like.

「少なくとも1つのフッ素原子を含むC1〜C5ハロアルキル基」としては、例えばフルオロメチル基、ジフルオロメチル基、トリフルオロメチル基、1,1,2,2,2−ペンタフルオロエチル基、2,2,2−トリフルオロエチル基、1,1−ジフルオロエチル基、1,1,2,2,3,3,3−ヘプタフルオロプロピル基、1,1−ジフルオロプロピル基、2,2−ジフルオロプロピル基、3,3,3−トリフルオロプロピル基、1,1,2,2,3,3,4,4,4−ノナフルオロブチル基、1,1−ジフルオロブチル基、2,2―ジフルオロブチル基、1,1,2,2,3,3,4,4,5,5,5−ウンデカフルオロペンチル基、1,1−ジフルオロペンチル基及び2,2−ジフルオロペンチル基等のフッ素原子のみで置換されたC1〜C5アルキル基;クロロジフルオロメチル基、1,2−ジクロロ−1,2,2−トリフルオロエチル基、1,1−ジクロロ−2,2,2−トリフルオロエチル基、1−クロロ−1,3,3,3−テトラフルオロプロピル基、2,3−ジクロロ−2,3,3−トリフルオロプロピル基及び2,2−ジクロロ−3,3,3−トリフルオロプロピル基等のフッ素原子と塩素原子とで置換されたC1〜C5アルキル基;2,2−ジブロモ−3,3,3−トリフルオロプロピル基、2−ブロモ−3,3,3−トリフルオロプロピル基、2,3−ジブロモ−3,3−ジフルオロプロピル基、3−ブロモ−3,3−ジフルオロプロピル基、1−ブロモ−1,3,3,3−テトラフルオロプロピル基、1−ブロモ−2,2,3,3,3−ペンタフルオロプロピル基、1,3−ジブロモ−2,2,3,3−テトラフルオロプロピル基、3−ブロモ−2,3,3−トリフルオロプロピル基、3−ブロモ−2,2,3,3−テトラフルオロプロピル基、2,3−ジブロモ−2,3,3−トリフルオロプロピル基及び3−ブロモ−3,3−ジフルオロプロピル基等のフッ素原子と臭素原子とで置換されたC1〜C5アルキル基が挙げられる。   Examples of the “C1-C5 haloalkyl group containing at least one fluorine atom” include a fluoromethyl group, a difluoromethyl group, a trifluoromethyl group, a 1,1,2,2,2-pentafluoroethyl group, 2,2, 2-trifluoroethyl group, 1,1-difluoroethyl group, 1,1,2,2,3,3,3-heptafluoropropyl group, 1,1-difluoropropyl group, 2,2-difluoropropyl group, 3,3,3-trifluoropropyl group, 1,1,2,2,3,3,4,4,4-nonafluorobutyl group, 1,1-difluorobutyl group, 2,2-difluorobutyl group, Substituted only with fluorine atoms such as 1,1,2,2,3,3,4,4,5,5,5-undecafluoropentyl, 1,1-difluoropentyl and 2,2-difluoropentyl Is C1-C5 alkyl group; chlorodifluoromethyl group, 1,2-dichloro-1,2,2-trifluoroethyl group, 1,1-dichloro-2,2,2-trifluoroethyl group, 1-chloro-1 , 3,3,3-tetrafluoropropyl group, 2,3-dichloro-2,3,3-trifluoropropyl group and 2,2-dichloro-3,3,3-trifluoropropyl group, C1-C5 alkyl group substituted with a chlorine atom; 2,2-dibromo-3,3,3-trifluoropropyl group, 2-bromo-3,3,3-trifluoropropyl group, 2,3-dibromo -3,3-difluoropropyl group, 3-bromo-3,3-difluoropropyl group, 1-bromo-1,3,3,3-tetrafluoropropyl group, 1-bromo-2,2,3,3 3-pentafluo Propyl group, 1,3-dibromo-2,2,3,3-tetrafluoropropyl group, 3-bromo-2,3,3-trifluoropropyl group, 3-bromo-2,2,3,3-tetra A C1-C5 alkyl group substituted with a fluorine atom and a bromine atom, such as a fluoropropyl group, a 2,3-dibromo-2,3,3-trifluoropropyl group and a 3-bromo-3,3-difluoropropyl group; Can be mentioned.

「ハロゲン原子で置換されていてもよいC1〜C4アルコキシ基」としては、例えばメトキシ基、エトキシ基、トリフルオロメトキシ基等が挙げられる。「ハロゲン原子で置換されていてもよいC3〜C6アルケニルオキシ基」としては、例えばアリルオキシ基等が挙げられる。「ハロゲン原子で置換されていてもよいC3〜C6アルキニルオキシ基」としては、例えばプロパルギルオキシ基等が挙げられる。「ハロゲン原子で置換されていてもよいC1〜C4アルキルアミノ基」としては、例えばメチルアミノ基、エチルアミノ基等が挙げられる。「ハロゲン原子で置換されていてもよいジ(C1〜C4アルキル)アミノ基」としては、例えばジメチルアミノ基、ジエチルアミノ基等が挙げられる。   Examples of the “C1-C4 alkoxy group optionally substituted with a halogen atom” include a methoxy group, an ethoxy group, and a trifluoromethoxy group. Examples of the “C3-C6 alkenyloxy group optionally substituted with a halogen atom” include an allyloxy group. Examples of the “C3-C6 alkynyloxy group optionally substituted with a halogen atom” include a propargyloxy group. Examples of the “C1-C4 alkylamino group optionally substituted with a halogen atom” include a methylamino group and an ethylamino group. Examples of the “di (C1-C4 alkyl) amino group optionally substituted with a halogen atom” include a dimethylamino group and a diethylamino group.

「群Lから選ばれる基で置換されていてもよいC1〜C6鎖式炭化水素基」としては、例えばメチル基、エチル基、プロピル基、1−メチルエチル基、2,2−ジメチルプロピル基、クロロメチル基、フルオロメチル基、ジフルオロメチル基、トリフルオロメチル基、2,2,2−トリフルオロエチル基、1,1,2,2−テトラフルオロエチル基、1,1,2,2,2−ペンタフルオロエチル基、1,1−ジメチルエチル基、メトキシメチル基、エトキシメチル基、1−メトキシエチル基、1−エトキシエチル基、トリフルオロメトキシメチル、(1−プロペニルオキシ)メチル基、(2−プロペニルオキシ)メチル基、(1−メチル−2−プロペニルオキシ)メチル基、(1,1−ジメチル−2−プロペニルオキシ)メチル基、(2,2−ジフルオロ−2−プロペニルオキシ)メチル基、1−(1−プロペニルオキシ)エチル基、1−(2−プロペニルオキシ)エチル基、1−(1−メチル−2−プロペニルオキシ)エチル基、1−(1,1−ジメチル−2−プロペニルオキシ)エチル基、1−(2,2−ジフルオロ−2−プロペニルオキシ)エチル基、2−(1−プロペニルオキシ)エチル基、2−(2−プロペニルオキシ)エチル基、2−(1−メチル−2−プロペニルオキシ)エチル基、2−(1,1−ジメチル−2−プロペニルオキシ)エチル基、2−(2,2−ジフルオロ−2−プロペニルオキシ)エチル基、(2−プロピニルオキシ)メチル基、(1−メチル−2−プロピニルオキシ)メチル基、(1,1−ジメチル−2−プロピニルオキシ)メチル基、(2−ブチニルオキシ)メチル基、(1−メチル−2−ブチニルオキシ)メチル基、(1,1−ジメチル−2−ブチニルオキシ)メチル基、(3,3,3−トリフルオロ−1−プロピニルオキシ)メチル基、1−(2−プロピニルオキシ)エチル基、1−(1−メチル−2−プロピニルオキシ)エチル基、1−(1,1−ジメチル−2−プロピニルオキシ)エチル基、1−(2−ブチニルオキシ)エチル基、1−(1−メチル−2−ブチニルオキシ)エチル基、1−(1,1−ジメチル−2−ブチニルオキシ)エチル基、1−(3,3,3−トリフルオロ−1−プロピニルオキシ)エチル基、2−(2−プロピニルオキシ)エチル基、2−(1−メチル−2−プロピニルオキシ)エチル基、2−(1,1−ジメチル−2−プロピニルオキシ)エチル基、2−(2−ブチニルオキシ)エチル基、2−(1−メチル−2−ブチニルオキシ)エチル基、2−(1,1−ジメチル−2−ブチニルオキシ)エチル基、2−(3,3,3−トリフルオロ−1−プロピニルオキシ)エチル基、ヒドロキシメチル基、1−ヒドロキシエチル基、1−ヒドロキシ−1−メチルエチル基、2−ヒドロキシエチル基、2−ヒドロキシ−1−メチルエチル基等の群Lから選ばれる基で置換されていてもよいC1〜C6アルキル基;
ビニル基、2,2−ジフルオロビニル基、1,2,2−トリフルオロビニル基、1−プロペニル基、2−プロペニル基、3,3−ジフルオロ−2−プロペニル基、1−メチル−2−プロペニル基等の群Lから選ばれる基で置換されていてもよいC2〜C6アルケニル基;
1−エチニル基、2−ブロモエチニル基、2−ヨードエチニル基及び2−(メトキシカルボニル)エチニル基、1−プロピニル基、3−フルオロ−1−プロピニル基、3,3−ジフルオロ−1−プロピニル基、3−(ジメチルアミノ)−1−プロピニル基、3,3,3−トリフルオロ−1−プロピニル基、3−メトキシ−1−プロピニル基、3−(メトキシカルボニル)−1−プロピニル基、2−プロピニル基、1−フルオロ−2−プロピニル基、1,1−ジフルオロ−2−プロピニル基、1−ブチニル基、4−フルオロ−1−ブチニル基、4−メトキシ−1−ブチニル基、4−(ジメチルアミノ)−1−ブチニル基、4−(メトキシカルボニル)−1−ブチニル基、2−ブチニル基、4−フルオロ−2−ブチニル基、4−メトキシ−2−ブチニル基、4−(ジメチルアミノ)−2−ブチニル基、4−(メトキシカルボニル)−2−ブチニル基、3−ブチニル基、1,1−ジフルオロ−3−ブチニル基、1−ペンチニル基、5−フルオロ−1−ペンチニル基、5−メトキシ−1−ペンチニル基、5−(ジメチルアミノ)−1−ペンチニル基、5−(メトキシカルボニル)−1−ペンチニル基、2−ペンチニル基、5−フルオロ−2−ペンチニル基、5−メトキシ−2−ペンチニル基、5−(ジメチルアミノ)−2−ペンチニル基、5−(メトキシカルボニル)−2−ペンチニル基等の群Lから選ばれる基で置換されていてもよいC2〜C5アルケニル基が挙げられる。
Examples of the “C1-C6 chain hydrocarbon group optionally substituted with a group selected from Group L” include a methyl group, an ethyl group, a propyl group, a 1-methylethyl group, a 2,2-dimethylpropyl group, Chloromethyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, 2,2,2-trifluoroethyl group, 1,1,2,2-tetrafluoroethyl group, 1,1,2,2,2 -Pentafluoroethyl group, 1,1-dimethylethyl group, methoxymethyl group, ethoxymethyl group, 1-methoxyethyl group, 1-ethoxyethyl group, trifluoromethoxymethyl, (1-propenyloxy) methyl group, (2 -Propenyloxy) methyl group, (1-methyl-2-propenyloxy) methyl group, (1,1-dimethyl-2-propenyloxy) methyl group, (2,2 Difluoro-2-propenyloxy) methyl group, 1- (1-propenyloxy) ethyl group, 1- (2-propenyloxy) ethyl group, 1- (1-methyl-2-propenyloxy) ethyl group, 1- ( 1,1-dimethyl-2-propenyloxy) ethyl group, 1- (2,2-difluoro-2-propenyloxy) ethyl group, 2- (1-propenyloxy) ethyl group, 2- (2-propenyloxy) Ethyl group, 2- (1-methyl-2-propenyloxy) ethyl group, 2- (1,1-dimethyl-2-propenyloxy) ethyl group, 2- (2,2-difluoro-2-propenyloxy) ethyl Group, (2-propynyloxy) methyl group, (1-methyl-2-propynyloxy) methyl group, (1,1-dimethyl-2-propynyloxy) methyl group, Nyloxy) methyl group, (1-methyl-2-butynyloxy) methyl group, (1,1-dimethyl-2-butynyloxy) methyl group, (3,3,3-trifluoro-1-propynyloxy) methyl group, 1 -(2-propynyloxy) ethyl group, 1- (1-methyl-2-propynyloxy) ethyl group, 1- (1,1-dimethyl-2-propynyloxy) ethyl group, 1- (2-butynyloxy) ethyl Group, 1- (1-methyl-2-butynyloxy) ethyl group, 1- (1,1-dimethyl-2-butynyloxy) ethyl group, 1- (3,3,3-trifluoro-1-propynyloxy) ethyl Group, 2- (2-propynyloxy) ethyl group, 2- (1-methyl-2-propynyloxy) ethyl group, 2- (1,1-dimethyl-2-propynyloxy) ethyl group, 2- (2-butynyloxy) ethyl group, 2- (1-methyl-2-butynyloxy) ethyl group, 2- (1,1-dimethyl-2-butynyloxy) ethyl group, 2- (3,3,3-tri From group L such as fluoro-1-propynyloxy) ethyl group, hydroxymethyl group, 1-hydroxyethyl group, 1-hydroxy-1-methylethyl group, 2-hydroxyethyl group, 2-hydroxy-1-methylethyl group A C1-C6 alkyl group optionally substituted with a selected group;
Vinyl group, 2,2-difluorovinyl group, 1,2,2-trifluorovinyl group, 1-propenyl group, 2-propenyl group, 3,3-difluoro-2-propenyl group, 1-methyl-2-propenyl group A C2-C6 alkenyl group optionally substituted with a group selected from group L such as a group;
1-ethynyl group, 2-bromoethynyl group, 2-iodoethynyl group and 2- (methoxycarbonyl) ethynyl group, 1-propynyl group, 3-fluoro-1-propynyl group, 3,3-difluoro-1-propynyl group 3- (dimethylamino) -1-propynyl group, 3,3,3-trifluoro-1-propynyl group, 3-methoxy-1-propynyl group, 3- (methoxycarbonyl) -1-propynyl group, 2- Propynyl, 1-fluoro-2-propynyl, 1,1-difluoro-2-propynyl, 1-butynyl, 4-fluoro-1-butynyl, 4-methoxy-1-butynyl, 4- (dimethyl Amino) -1-butynyl group, 4- (methoxycarbonyl) -1-butynyl group, 2-butynyl group, 4-fluoro-2-butynyl group, 4-methoxy-2-butynyl group Nyl group, 4- (dimethylamino) -2-butynyl group, 4- (methoxycarbonyl) -2-butynyl group, 3-butynyl group, 1,1-difluoro-3-butynyl group, 1-pentynyl group, 5- Fluoro-1-pentynyl group, 5-methoxy-1-pentynyl group, 5- (dimethylamino) -1-pentynyl group, 5- (methoxycarbonyl) -1-pentynyl group, 2-pentynyl group, 5-fluoro-2 -Substituted with a group selected from the group L such as a pentynyl group, 5-methoxy-2-pentynyl group, 5- (dimethylamino) -2-pentynyl group, 5- (methoxycarbonyl) -2-pentynyl group Good C2-C5 alkenyl groups are mentioned.

「ハロゲン原子で置換されていてもよいC3〜C6シクロアルキル基」としては、例えばシクロプロピル基、シクロヘキシル基、4−クロロシクロヘキシル基等が挙げられる。「-OR5」で示される基としては、例えばメトキシ基、アリルオキシ基、シクロヘキシルオキシ基等が挙げられる。「-SR5」で示される基としては、例えばメチルチオ基、アリルチオ基等が挙げられる。「-S(=O)R5」で示される基としては、例えばメチルスルフェニル基等が挙げられる。「-S(=O)25」で示される基としては、例えばメチルスルホニル基等が挙げられる。「-C(=O)R6」で示される基としては、例えばホルミル基、アセチル基、メトキシカルボニル基、カルバモイル基等が挙げられる。「-OC(=O)R7」で示される基としては、例えばアセチルオキシ基等が挙げられる。 Examples of the “C3-C6 cycloalkyl group optionally substituted with a halogen atom” include a cyclopropyl group, a cyclohexyl group, a 4-chlorocyclohexyl group, and the like. Examples of the group represented by “—OR 5 ” include a methoxy group, an allyloxy group, a cyclohexyloxy group, and the like. Examples of the group represented by “—SR 5 ” include a methylthio group and an allylthio group. Examples of the group represented by “—S (═O) R 5 ” include a methylsulfenyl group. Examples of a group represented by "-S (= O) 2 R 5", for example, methylsulfonyl group and the like. Examples of the group represented by “—C (═O) R 6 ” include a formyl group, an acetyl group, a methoxycarbonyl group, a carbamoyl group, and the like. Examples of the group represented by “—OC (═O) R 7 ” include an acetyloxy group.

「群Lから選ばれる基で置換されていてもよいC2−C6アルカンジイル基」としては、例えばエタン−1,2−ジイル基、ブタン−1,2−ジイル基等が挙げられる。「群Lから選ばれる基で置換されていてもよい1,3−ブタジエン−1,4−ジイル基」としては、例えば1,3−ブタジエン−1,4−ジイル基、2−クロロ−1,3−ブタジエン−1,4−ジイル基、2,3−ジクロロ−1,3−ブタジエン−1,4−ジイル基等が挙げられる。「-G-T-G-」で示される基としては、例えばメチレンジオキシ基、エチレンジオキシ基等が挙げられる。「-T-G-T-」で示される基としては、例えば-CH-O-CH-等が挙げられる。「=NO-R5」で示される基としては、例えばメトキシイミノ基、ヒドロキシイミノ基等が挙げられる。「=C(R8)R9」で示される基としては、例えばビニリデン基等が挙げられる。 Examples of the “C2-C6 alkanediyl group optionally substituted with a group selected from group L” include ethane-1,2-diyl group, butane-1,2-diyl group and the like. Examples of the “1,3-butadiene-1,4-diyl group optionally substituted with a group selected from Group L” include 1,3-butadiene-1,4-diyl group, 2-chloro-1, Examples include 3-butadiene-1,4-diyl group, 2,3-dichloro-1,3-butadiene-1,4-diyl group, and the like. Examples of the group represented by “—G-T-G-” include a methylenedioxy group and an ethylenedioxy group. Examples of the group represented by “—T-G-T—” include —CH 2 —O—CH 2 — and the like. Examples of the group represented by “═NO—R 5 ” include a methoxyimino group and a hydroxyimino group. Examples of the group represented by “═C (R 8 ) R 9 ” include a vinylidene group.

本有機硫黄化合物としては、例えば
式(I)において、Cyが群E1〜E2より選ばれる基で置換されていてもよいフェニル基である有機硫黄化合物;
式(I)において、Cyが群E1〜E2より選ばれる基で置換されていてもよいピリジル基又は群E1〜E2より選ばれる基で置換されていてもよいピリミジル基である有機硫黄化合物;
式(I)において、Cyが群E1〜E2より選ばれる基で置換されていてもよいチエニル基、群E1〜E2より選ばれる基で置換されていてもよいイソオキサゾリル基、群E1〜E2より選ばれる基で置換されていてもよいイミダゾリル基又は群E1〜E2より選ばれる基で置換されていてもよいピラゾリル基である有機硫黄化合物;
式(I)において、Cyが群E1〜E2より選ばれる基で置換されていてもよいシクロヘキシル基又は群E1〜E2より選ばれる基で置換されていてもよいシクロヘキセニル基である有機硫黄化合物
等が挙げられる。
As this organic sulfur compound, for example, in the formula (I), an organic sulfur compound in which Cy is a phenyl group optionally substituted by a group selected from the groups E1 to E2;
In formula (I), an organic sulfur compound in which Cy is a pyridyl group optionally substituted with a group selected from groups E1 to E2 or a pyrimidyl group optionally substituted with a group selected from groups E1 to E2;
In formula (I), Cy is selected from thienyl group optionally substituted with a group selected from groups E1 to E2, isoxazolyl group optionally substituted with a group selected from groups E1 to E2, and selected from groups E1 to E2. An organic sulfur compound which is an imidazolyl group optionally substituted with a group selected from the above, or a pyrazolyl group optionally substituted with a group selected from the group E1 to E2;
In formula (I), an organic sulfur compound in which Cy is a cyclohexyl group optionally substituted with a group selected from groups E1 to E2 or a cyclohexenyl group optionally substituted with a group selected from groups E1 to E2 Is mentioned.

本有機硫黄化合物には、R及びRが相異なる場合にはR及びRが結合する不斉炭素に基く、立体異性体が存在するが、本発明には活性な立体異性体を任意の比率で含有するものを使用することができる。
次いで、本有機硫黄化合物の製造法について説明する。
In the present organic sulfur compound, when R 1 and R 2 are different from each other, a stereoisomer exists based on the asymmetric carbon to which R 1 and R 2 are bonded. What contains in arbitrary ratios can be used.
Subsequently, the manufacturing method of this organic sulfur compound is demonstrated.

本有機硫黄化合物のうち、式(I)においてnが0である式(I-a)で示される化合物は、例えば以下の(製造法1)〜(製造法4)により製造することができる。
(製造法1)
式(I-a)で示される化合物は、例えば下記の化合物(a)と化合物(b)とを反応させることにより製造することができる。

Figure 2010150156
[式中、Cy、R1、R2、R3及びmは前記と同じ意味を表し、Z1は塩素原子、臭素原子、ヨウ素原子、メタンスルホニル基等の脱離基を表す。]
該反応は、通常塩基の存在下、通常溶媒の存在下で行われる。
反応に用いられる溶媒としては、例えばジエチルエーテル、テトラヒドロフラン、ジメトキシエタン等のエーテル類、N,N−ジメチルホルムアミド等の酸アミド類、ジメチルスルホキシド、スルホラン等の有機硫黄類、ヘキサン、ヘプタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、1,2−ジクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、水及びそれらの混合物があげられる。
該反応に用いられる塩基としては、例えば水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、炭酸カリウム等の無機塩基、ナトリウムメトキシド、カリウムtert−ブトキシド等のアルカリ金属アルコキシド及びトリエチルアミン、1,4−ジアザビシクロ[2.2.2]オクタン、1,8−ジアザビシクロ[5.4.0]−7−ウンデセン等の有機塩基あげられる。反応に用いられる塩基の量は、化合物(a)1モルに対して、通常1〜10モルの割合である。
反応に用いられる化合物(b)の量は、化合物(a)1モルに対して、通常1〜10モルの割合である。
該反応の反応温度は通常−50〜100℃の範囲であり、反応時間は通常1〜24時間の範囲である。
反応終了後は、反応混合物を水に注加し、有機溶媒抽出してから、濃縮する等の操作を行うことにより、化合物(I-a)を単離することができる。単離した化合物(I-a)は必要に応じてクロマトグラフィー、再結晶等によりさらに精製することもできる。 Among the organic sulfur compounds, the compound represented by the formula (Ia) in which n is 0 in the formula (I) can be produced by, for example, the following (Production Method 1) to (Production Method 4).
(Production method 1)
The compound represented by the formula (Ia) can be produced, for example, by reacting the following compound (a) and compound (b).
Figure 2010150156
[Wherein, Cy, R 1 , R 2 , R 3 and m represent the same meaning as described above, and Z 1 represents a leaving group such as a chlorine atom, a bromine atom, an iodine atom or a methanesulfonyl group. ]
The reaction is usually performed in the presence of a base and usually in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as diethyl ether, tetrahydrofuran and dimethoxyethane, acid amides such as N, N-dimethylformamide, organic sulfurs such as dimethyl sulfoxide and sulfolane, and aliphatics such as hexane and heptane. Examples thereof include hydrocarbons, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as 1,2-dichloroethane and chlorobenzene, water, and mixtures thereof.
Examples of the base used in the reaction include inorganic bases such as sodium hydride, sodium hydroxide, potassium hydroxide and potassium carbonate, alkali metal alkoxides such as sodium methoxide and potassium tert-butoxide, and triethylamine, 1,4-diazabicyclo And organic bases such as [2.2.2] octane and 1,8-diazabicyclo [5.4.0] -7-undecene. The amount of the base used in the reaction is usually 1 to 10 moles relative to 1 mole of the compound (a).
The amount of the compound (b) used in the reaction is usually 1 to 10 moles relative to 1 mole of the compound (a).
The reaction temperature of the reaction is usually in the range of −50 to 100 ° C., and the reaction time is usually in the range of 1 to 24 hours.
After completion of the reaction, the compound (Ia) can be isolated by performing an operation such as pouring the reaction mixture into water, extracting with an organic solvent, and then concentrating. The isolated compound (Ia) can be further purified by chromatography, recrystallization or the like, if necessary.

(製造法2)
式(I-a)で示される化合物は、例えば下記の化合物(c)と化合物(d)とを反応させることにより製造することもできる。

Figure 2010150156
〔式中、Cy、R1、R2、R3及びmは前記と同じ意味を表し、Z2は塩素原子、臭素原子、ヨウ素原子、メタンスルホニル基等の脱離基を表す。〕
該反応は、通常塩基の存在下、通常溶媒の存在下で行われる。
反応に用いられる溶媒としては、例えばジエチルエーテル、テトラヒドロフラン、ジメトキシエタン等のエーテル類、N,N−ジメチルホルムアミド等の酸アミド類、ジメチルスルホキシド、スルホラン等の有機硫黄類、ヘキサン、ヘプタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、1,2−ジクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、水及びそれらの混合物があげられる。
該反応に用いられる塩基としては、例えば水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、炭酸カリウム等の無機塩基、ナトリウムメトキシド、カリウムtert−ブトキシド等のアルカリ金属アルコキシド及びトリエチルアミン、1,4−ジアザビシクロ[2.2.2]オクタン、1,8−ジアザビシクロ[5.4.0]−7−ウンデセン等の有機塩基あげられる。反応に用いられる塩基の量は、化合物(d)1モルに対して、通常1〜10モルの割合である。
反応に用いられる化合物(c)の量は、化合物(d)1モルに対して、通常1〜10モルの割合である。
該反応の反応温度は通常−50〜100℃の範囲であり、反応時間は通常1〜24時間の範囲である。
反応終了後は、反応混合物を水に注加し、有機溶媒抽出してから、濃縮する等の操作を行うことにより、化合物(I-a)を単離することができる。単離した化合物(I-a)は必要に応じてクロマトグラフィー、再結晶等でさらに精製することもできる。 (Production method 2)
The compound represented by the formula (Ia) can also be produced, for example, by reacting the following compound (c) and compound (d).
Figure 2010150156
[Wherein, Cy, R 1 , R 2 , R 3 and m represent the same meaning as described above, and Z 2 represents a leaving group such as a chlorine atom, a bromine atom, an iodine atom or a methanesulfonyl group. ]
The reaction is usually performed in the presence of a base and usually in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as diethyl ether, tetrahydrofuran and dimethoxyethane, acid amides such as N, N-dimethylformamide, organic sulfurs such as dimethyl sulfoxide and sulfolane, and aliphatics such as hexane and heptane. Examples thereof include hydrocarbons, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as 1,2-dichloroethane and chlorobenzene, water, and mixtures thereof.
Examples of the base used in the reaction include inorganic bases such as sodium hydride, sodium hydroxide, potassium hydroxide and potassium carbonate, alkali metal alkoxides such as sodium methoxide and potassium tert-butoxide, and triethylamine, 1,4-diazabicyclo And organic bases such as [2.2.2] octane and 1,8-diazabicyclo [5.4.0] -7-undecene. The amount of the base used for the reaction is usually 1 to 10 moles relative to 1 mole of the compound (d).
The amount of the compound (c) used in the reaction is usually 1 to 10 moles relative to 1 mole of the compound (d).
The reaction temperature of the reaction is usually in the range of −50 to 100 ° C., and the reaction time is usually in the range of 1 to 24 hours.
After completion of the reaction, the compound (Ia) can be isolated by performing an operation such as pouring the reaction mixture into water, extracting with an organic solvent, and then concentrating. The isolated compound (Ia) can be further purified by chromatography, recrystallization or the like, if necessary.

(製造法3)
式(I-a)で示される化合物は、化合物(c)から以下の方法により製造することもできる。

Figure 2010150156
〔式中、Cy、R1、R2、R3、m、Z1及びZ2は前記と同じ意味を表し、R20はメチル基又はアミノ基を表す。〕
工程(3−1)
化合物(f)は、化合物(c)と化合物(e)とを反応させることにより製造することができる。
該反応は、通常溶媒の存在下で行われる。
反応に用いられる溶媒としては、例えばジクロロメタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール等のアルコール類及びそれらの混合物があげられる。
反応に用いられる化合物(e)の量は、化合物(c)1モルに対して、通常1〜3モルの割合である。
該反応の反応温度は通常20〜200℃の範囲であり、反応時間は通常0.5〜240時間の範囲である。
反応終了後は、反応混合物を濃縮する等の操作を行うことにより、化合物(f)を単離することができる。単離された化合物(f)はそのまま工程(3−2)に用いることができるが、必要により再結晶等によりさらに精製することもできる。 (Production method 3)
The compound represented by the formula (Ia) can also be produced from the compound (c) by the following method.
Figure 2010150156
[Wherein, Cy, R 1 , R 2 , R 3 , m, Z 1 and Z 2 represent the same meaning as described above, and R 20 represents a methyl group or an amino group. ]
Step (3-1)
Compound (f) can be produced by reacting compound (c) with compound (e).
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include halogenated hydrocarbons such as dichloromethane and chloroform, alcohols such as methanol and ethanol, and mixtures thereof.
The amount of the compound (e) used for the reaction is usually 1 to 3 moles relative to 1 mole of the compound (c).
The reaction temperature is usually in the range of 20 to 200 ° C., and the reaction time is usually in the range of 0.5 to 240 hours.
After completion of the reaction, the compound (f) can be isolated by performing an operation such as concentrating the reaction mixture. The isolated compound (f) can be used as it is in the step (3-2), but can be further purified by recrystallization or the like, if necessary.

工程(3−2)
式(I-a)で示される化合物は、化合物(f)と化合物(b)とを塩基の存在下で反応させることにより製造することができる。
該反応は、通常溶媒の存在下、通常塩基の存在下で行われる。
反応に用いられる溶媒としては、例えばジエチルエーテル、テトラヒドロフラン、ジメトキシエタン等のエーテル類、N,N−ジメチルホルムアミド等の酸アミド類、ジメチルスルホキシド、スルホラン等の有機硫黄類、ヘキサン、ヘプタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、1,2−ジクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、水及びそれらの混合物があげられる。
反応に用いられる塩基としては、例えば水酸化ナトリウム、水酸化カリウム等の無機塩基及びナトリウムメトキシド、カリウムtert−ブトキシド等のアルカリ金属アルコキシドあげられる。
反応に用いられる塩基の量は、化合物(f)1モルに対して通常1〜50モルの割合である。
反応に用いられる化合物(b)の量は、化合物(f)1モルに対して、通常1〜10モルの割合である。
該反応は必要に応じて、臭化テトラn−ブチルアンモニウム等の相間移動触媒を用いて行うことができる。その場合に用いられる相間移動触媒の量は、化合物(f)1モルに対して、通常0.05〜1.0モルの割合である。
該反応の反応温度は、通常−50〜100℃の範囲であり、反応時間は通常1〜24時間の範囲である。
反応終了後は、反応混合物を水に注加し、有機溶媒抽出してから、濃縮する等の操作を行うことにより、化合物(I-a)を単離することができる。単離した化合物(I-a)は必要に応じてクロマトグラフィー、再結晶等によりさらに精製することもできる。
Step (3-2)
The compound represented by the formula (Ia) can be produced by reacting the compound (f) and the compound (b) in the presence of a base.
The reaction is usually performed in the presence of a solvent and usually in the presence of a base.
Examples of the solvent used in the reaction include ethers such as diethyl ether, tetrahydrofuran and dimethoxyethane, acid amides such as N, N-dimethylformamide, organic sulfurs such as dimethyl sulfoxide and sulfolane, and aliphatics such as hexane and heptane. Examples thereof include hydrocarbons, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as 1,2-dichloroethane and chlorobenzene, water, and mixtures thereof.
Examples of the base used in the reaction include inorganic bases such as sodium hydroxide and potassium hydroxide, and alkali metal alkoxides such as sodium methoxide and potassium tert-butoxide.
The amount of the base used in the reaction is usually 1 to 50 mol per 1 mol of compound (f).
The amount of the compound (b) used in the reaction is usually 1 to 10 moles relative to 1 mole of the compound (f).
The reaction can be carried out using a phase transfer catalyst such as tetra n-butylammonium bromide as necessary. The amount of the phase transfer catalyst used in that case is usually 0.05 to 1.0 mol with respect to 1 mol of the compound (f).
The reaction temperature of the reaction is usually in the range of −50 to 100 ° C., and the reaction time is usually in the range of 1 to 24 hours.
After completion of the reaction, the compound (Ia) can be isolated by performing an operation such as pouring the reaction mixture into water, extracting with an organic solvent, and then concentrating. The isolated compound (Ia) can be further purified by chromatography, recrystallization or the like, if necessary.

(製造法4)
式(I-a)で示される化合物は、化合物(c)から以下の方法により製造することもできる。

Figure 2010150156
〔式中、Cy、R1、R2、R3、m、Z1及びZ2は前記と同じ意味を表し、R21はメチル基又はフェニル基を表す。〕
工程(4−1)
化合物(h)は、化合物(b)と化合物(g)とを、塩基の存在下で反応させることにより製造することができる。
該反応は通常溶媒の存在下、通常塩基の存在下で行われる。
反応に用いられる溶媒としては、例えばジエチルエーテル、テトラヒドロフラン、ジメトキシエタン等のエーテル類、N,N−ジメチルホルムアミド等の酸アミド類、ジメチルスルホキシド、スルホラン等の有機硫黄類、ヘキサン、ヘプタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、1,2−ジクロロエタン、クロロベンゼン等のハロゲン化炭化水素類及びそれらの混合物があげられる。
反応に用いられる塩基としては、例えば水素化ナトリウム、炭酸カリウム等の無機塩基及びトリエチルアミン、1,4−ジアザビシクロ[2.2.2]オクタン、1,8−ジアザビシクロ[5.4.0]−7−ウンデセン等の有機塩基あげられる。
反応に用いられる塩基の量は、化合物(c)1モルに対して通常1〜10モルの割合である。
反応に用いられる化合物(g)の量は、化合物(b)1モルに対して、通常1〜5モルの割合である。
該反応の反応温度は通常−20〜80℃の範囲であり、反応時間は通常1〜24時間の範囲である。
反応終了後は、反応混合物を酸性水(希塩酸等)に注加し、有機溶媒抽出してから、濃縮する等の操作を行うことにより、化合物(h)を単離することができる。単離した化合物(h)は必要に応じてクロマトグラフィー、再結晶等でさらに精製することもできる。 (Production Method 4)
The compound represented by the formula (Ia) can also be produced from the compound (c) by the following method.
Figure 2010150156
[Wherein, Cy, R 1 , R 2 , R 3 , m, Z 1 and Z 2 represent the same meaning as described above, and R 21 represents a methyl group or a phenyl group. ]
Step (4-1)
Compound (h) can be produced by reacting compound (b) with compound (g) in the presence of a base.
The reaction is usually performed in the presence of a solvent, usually in the presence of a base.
Examples of the solvent used in the reaction include ethers such as diethyl ether, tetrahydrofuran and dimethoxyethane, acid amides such as N, N-dimethylformamide, organic sulfurs such as dimethyl sulfoxide and sulfolane, and aliphatics such as hexane and heptane. Examples thereof include hydrocarbons, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as 1,2-dichloroethane and chlorobenzene, and mixtures thereof.
Examples of the base used in the reaction include inorganic bases such as sodium hydride and potassium carbonate, triethylamine, 1,4-diazabicyclo [2.2.2] octane, 1,8-diazabicyclo [5.4.0] -7. -Organic bases such as undecene.
The amount of the base used for the reaction is usually 1 to 10 moles relative to 1 mole of the compound (c).
The amount of the compound (g) used in the reaction is usually 1 to 5 moles relative to 1 mole of the compound (b).
The reaction temperature of the reaction is usually in the range of -20 to 80 ° C, and the reaction time is usually in the range of 1 to 24 hours.
After completion of the reaction, the compound (h) can be isolated by performing an operation such as pouring the reaction mixture into acidic water (diluted hydrochloric acid or the like), extraction with an organic solvent, and concentration. The isolated compound (h) can be further purified by chromatography, recrystallization or the like, if necessary.

工程(4−2)
式(I-a)で示される化合物は、化合物(c)と化合物(h)とを塩基の存在下で反応させることにより製造することができる。
該反応は通常溶媒の存在下、通常塩基の存在下で行われる。
反応に用いられる溶媒としては、例えばジエチルエーテル、テトラヒドロフラン、ジメトキシエタン等のエーテル類、N,N−ジメチルホルムアミド等の酸アミド類、ジメチルスルホキシド、スルホラン等の有機硫黄類、ヘキサン、ヘプタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、1,2−ジクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、水及びそれらの混合物があげられる。
該反応に用いられる塩基としては、例えば水酸化ナトリウム、水酸化カリウム等の無機塩基、ナトリウムメトキシド、ナトリウムエトキシド、カリウムtert−ブトキシド等のアルカリ金属アルコキシドがあげられる。反応に用いられる塩基の量は、化合物(h)1モルに対して通常1〜10モルの割合である。
反応に用いられる化合物(c)の量は、化合物(h)1モルに対して通常1〜10モルの割合である。
該反応の反応温度は−50〜100℃の範囲であり、反応時間は通常1〜24時間の範囲である。
反応終了後は、反応混合物を水に注加し、有機溶媒抽出してから、濃縮する等の操作を行うことにより、化合物(I-a)を単離することができる。単離した化合物(I-a)は必要に応じてクロマトグラフィー、再結晶等によりさらに精製することもできる。
Step (4-2)
The compound represented by the formula (Ia) can be produced by reacting the compound (c) and the compound (h) in the presence of a base.
The reaction is usually performed in the presence of a solvent, usually in the presence of a base.
Examples of the solvent used in the reaction include ethers such as diethyl ether, tetrahydrofuran and dimethoxyethane, acid amides such as N, N-dimethylformamide, organic sulfurs such as dimethyl sulfoxide and sulfolane, and aliphatics such as hexane and heptane. Examples thereof include hydrocarbons, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as 1,2-dichloroethane and chlorobenzene, water, and mixtures thereof.
Examples of the base used in the reaction include inorganic bases such as sodium hydroxide and potassium hydroxide, and alkali metal alkoxides such as sodium methoxide, sodium ethoxide and potassium tert-butoxide. The amount of the base used for the reaction is usually 1 to 10 moles relative to 1 mole of the compound (h).
The amount of the compound (c) used in the reaction is usually 1 to 10 mol with respect to 1 mol of the compound (h).
The reaction temperature of the reaction is in the range of −50 to 100 ° C., and the reaction time is usually in the range of 1 to 24 hours.
After completion of the reaction, the compound (Ia) can be isolated by performing an operation such as pouring the reaction mixture into water, extracting with an organic solvent, and then concentrating. The isolated compound (Ia) can be further purified by chromatography, recrystallization or the like, if necessary.

(製造法5)
式(I-a)で示される化合物は、化合物(b)から以下の方法により製造することもできる。

Figure 2010150156
〔式中、Cy、R1、R2、R3、R21、m、Z1及びZ2は前記と同じ意味を表す。〕
工程(5−1)
化合物(i)は、化合物(b)と化合物(g)とを、塩基の存在下で反応させることにより製造することができる。
該反応は通常溶媒の存在下、通常塩基の存在下で行われる。
反応に用いられる溶媒としては、例えばジエチルエーテル、テトラヒドロフラン、ジメトキシエタン等のエーテル類、N,N−ジメチルホルムアミド等の酸アミド類、ジメチルスルホキシド、スルホラン等の有機硫黄類、ヘキサン、ヘプタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、1,2−ジクロロエタン、クロロベンゼン等のハロゲン化炭化水素類及びそれらの混合物があげられる。
反応に用いられる塩基としては、例えば水素化ナトリウム、炭酸カリウム等の無機塩基及びトリエチルアミン、1,4−ジアザビシクロ[2.2.2]オクタン、1,8−ジアザビシクロ[5.4.0]−7−ウンデセン等の有機塩基あげられる。
反応に用いられる塩基の量は、化合物(b)1モルに対して通常1〜10モルの割合である。
反応に用いられる化合物(g)の量は、化合物(b)1モルに対して、通常1〜5モルの割合である。
該反応の反応温度は通常−20〜80℃の範囲であり、反応時間は通常1〜24時間の範囲である。
反応終了後は、反応混合物を酸性水(希塩酸等)に注加し、有機溶媒抽出してから、濃縮する等の操作を行うことにより、化合物(h)を単離することができる。単離した化合物(h)は必要に応じてクロマトグラフィー、再結晶等でさらに精製することもできる。 (Production method 5)
The compound represented by the formula (Ia) can also be produced from the compound (b) by the following method.
Figure 2010150156
[Wherein, Cy, R 1 , R 2 , R 3 , R 21 , m, Z 1 and Z 2 represent the same meaning as described above. ]
Step (5-1)
Compound (i) can be produced by reacting compound (b) with compound (g) in the presence of a base.
The reaction is usually performed in the presence of a solvent, usually in the presence of a base.
Examples of the solvent used in the reaction include ethers such as diethyl ether, tetrahydrofuran and dimethoxyethane, acid amides such as N, N-dimethylformamide, organic sulfurs such as dimethyl sulfoxide and sulfolane, and aliphatics such as hexane and heptane. Examples thereof include hydrocarbons, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as 1,2-dichloroethane and chlorobenzene, and mixtures thereof.
Examples of the base used in the reaction include inorganic bases such as sodium hydride and potassium carbonate, triethylamine, 1,4-diazabicyclo [2.2.2] octane, 1,8-diazabicyclo [5.4.0] -7. -Organic bases such as undecene.
The amount of the base used in the reaction is usually 1 to 10 moles relative to 1 mole of the compound (b).
The amount of the compound (g) used in the reaction is usually 1 to 5 moles relative to 1 mole of the compound (b).
The reaction temperature of the reaction is usually in the range of -20 to 80 ° C, and the reaction time is usually in the range of 1 to 24 hours.
After completion of the reaction, the compound (h) can be isolated by performing an operation such as pouring the reaction mixture into acidic water (diluted hydrochloric acid or the like), extraction with an organic solvent, and concentration. The isolated compound (h) can be further purified by chromatography, recrystallization or the like, if necessary.

工程(5−2)
式(I-a)で示される化合物は、化合物(c)と化合物(i)とを塩基の存在下で反応させることにより製造することができる。
該反応は通常溶媒の存在下、通常塩基の存在下で行われる。
反応に用いられる溶媒としては、例えばジエチルエーテル、テトラヒドロフラン、ジメトキシエタン等のエーテル類、N,N−ジメチルホルムアミド等の酸アミド類、ジメチルスルホキシド、スルホラン等の有機硫黄類、ヘキサン、ヘプタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、1,2−ジクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、水及びそれらの混合物があげられる。
該反応に用いられる塩基としては、例えば水酸化ナトリウム、水酸化カリウム等の無機塩基、ナトリウムメトキシド、ナトリウムエトキシド、カリウムtert−ブトキシド等のアルカリ金属アルコキシドがあげられる。反応に用いられる塩基の量は、化合物(i)1モルに対して通常1〜10モルの割合である。
反応に用いられる化合物(c)の量は、化合物(i)1モルに対して通常1〜10モルの割合である。
該反応の反応温度は−50〜100℃の範囲であり、反応時間は通常1〜24時間の範囲である。
反応終了後は、反応混合物を水に注加し、有機溶媒抽出してから、濃縮する等の操作を行うことにより、化合物(I-a)を単離することができる。単離した化合物(I-a)は必要に応じてクロマトグラフィー、再結晶等によりさらに精製することもできる。
Step (5-2)
The compound represented by the formula (Ia) can be produced by reacting the compound (c) with the compound (i) in the presence of a base.
The reaction is usually performed in the presence of a solvent, usually in the presence of a base.
Examples of the solvent used in the reaction include ethers such as diethyl ether, tetrahydrofuran and dimethoxyethane, acid amides such as N, N-dimethylformamide, organic sulfurs such as dimethyl sulfoxide and sulfolane, and aliphatics such as hexane and heptane. Examples thereof include hydrocarbons, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as 1,2-dichloroethane and chlorobenzene, water, and mixtures thereof.
Examples of the base used in the reaction include inorganic bases such as sodium hydroxide and potassium hydroxide, and alkali metal alkoxides such as sodium methoxide, sodium ethoxide and potassium tert-butoxide. The amount of the base used in the reaction is usually 1 to 10 moles per mole of compound (i).
The amount of the compound (c) used in the reaction is usually 1 to 10 moles relative to 1 mole of the compound (i).
The reaction temperature of the reaction is in the range of −50 to 100 ° C., and the reaction time is usually in the range of 1 to 24 hours.
After completion of the reaction, the compound (Ia) can be isolated by performing an operation such as pouring the reaction mixture into water, extracting with an organic solvent, and then concentrating. The isolated compound (Ia) can be further purified by chromatography, recrystallization or the like, if necessary.

(製造法6)
式(I)で示される本有機硫黄化合物のうち、R1がハロゲン原子で置換されていてもよいC1〜C4鎖式炭化水素基または水素原子であり、R2が−C(=O)R5またはシアノ基である化合物(I-b)ならびに(I-c)は、化合物(j)から以下の方法により製造することもできる。

Figure 2010150156
[式中、Cy、R3、n及びmは前記と同じ意味を表し、Z3及びZ4は塩素原子、臭素原子、ヨウ素原子、メタンスルホニル基等の脱離基を表し、R1aはハロゲン原子で置換されていてもよいC1〜C4鎖式炭化水素基を表し、R2aは-C(=O)R5またはシアノ基を表す。]
工程(6−1)
式(I-b)で示される化合物は、化合物(k)と化合物(j)とを塩基の存在下で反応させることにより製造することができる。
該反応は、通常塩基の存在下、通常溶媒の存在下で行われる。
反応に用いられる溶媒としては、例えばジエチルエーテル、テトラヒドロフラン、ジメトキシエタン等のエーテル類、N,N−ジメチルホルムアミド等の酸アミド類、ジメチルスルホキシド、スルホラン等の有機硫黄類、ヘキサン、ヘプタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、1,2−ジクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、水及びそれらの混合物があげられる。
該反応に用いられる塩基としては、例えば水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、炭酸カリウム等の無機塩基、ナトリウムメトキシド、カリウムtert−ブトキシド等のアルカリ金属アルコキシド及びトリエチルアミン、1,4−ジアザビシクロ[2.2.2]オクタン、1,8−ジアザビシクロ[5.4.0]−7−ウンデセン等の有機塩基あげられる。反応に用いられる塩基の量は、化合物(j)1モルに対して、通常1〜10モルの割合である。
反応に用いられる化合物(k)の量は、化合物(j)1モルに対して、通常1〜10モルの割合である。
該反応の反応温度は通常−50〜100℃の範囲であり、反応時間は通常1〜24時間の範囲である。
反応終了後は、反応混合物を水に注加し、有機溶媒抽出してから、濃縮する等の操作を行うことにより、化合物(I-b)を単離することができる。単離した化合物(I-b)は必要に応じてクロマトグラフィー、再結晶等によりさらに精製することもできる。 (Production method 6)
Among the present organic sulfur compounds represented by formula (I), R 1 is a C1-C4 chain hydrocarbon group or hydrogen atom optionally substituted with a halogen atom, and R 2 is —C (═O) R. Compounds (Ib) and (Ic) which are 5 or a cyano group can also be produced from compound (j) by the following method.
Figure 2010150156
[Wherein, Cy, R 3 , n and m represent the same meaning as described above, Z 3 and Z 4 represent a leaving group such as a chlorine atom, a bromine atom, an iodine atom and a methanesulfonyl group, and R 1a represents a halogen atom. A C1-C4 chain hydrocarbon group which may be substituted with an atom is represented, and R 2a represents —C (═O) R 5 or a cyano group. ]
Step (6-1)
The compound represented by the formula (Ib) can be produced by reacting the compound (k) and the compound (j) in the presence of a base.
The reaction is usually performed in the presence of a base and usually in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as diethyl ether, tetrahydrofuran and dimethoxyethane, acid amides such as N, N-dimethylformamide, organic sulfurs such as dimethyl sulfoxide and sulfolane, and aliphatics such as hexane and heptane. Examples thereof include hydrocarbons, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as 1,2-dichloroethane and chlorobenzene, water, and mixtures thereof.
Examples of the base used in the reaction include inorganic bases such as sodium hydride, sodium hydroxide, potassium hydroxide and potassium carbonate, alkali metal alkoxides such as sodium methoxide and potassium tert-butoxide, and triethylamine, 1,4-diazabicyclo And organic bases such as [2.2.2] octane and 1,8-diazabicyclo [5.4.0] -7-undecene. The amount of the base used for the reaction is usually 1 to 10 moles relative to 1 mole of the compound (j).
The amount of the compound (k) used in the reaction is usually 1 to 10 moles relative to 1 mole of the compound (j).
The reaction temperature of the reaction is usually in the range of −50 to 100 ° C., and the reaction time is usually in the range of 1 to 24 hours.
After completion of the reaction, the compound (Ib) can be isolated by performing an operation such as pouring the reaction mixture into water, extracting with an organic solvent, and then concentrating. The isolated compound (Ib) can be further purified by chromatography, recrystallization or the like, if necessary.

工程(6−2)
式(I-c)で示される化合物は、化合物(l)と化合物(I-b)とを塩基の存在下で反応させることにより製造することができる。
該反応は、通常塩基の存在下、通常溶媒の存在下で行われる。
反応に用いられる溶媒としては、例えばジエチルエーテル、テトラヒドロフラン、ジメトキシエタン等のエーテル類、N,N−ジメチルホルムアミド等の酸アミド類、ジメチルスルホキシド、スルホラン等の有機硫黄類、ヘキサン、ヘプタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、1,2−ジクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、水及びそれらの混合物があげられる。
該反応に用いられる塩基としては、例えば水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、炭酸カリウム等の無機塩基、ナトリウムメトキシド、カリウムtert−ブトキシド等のアルカリ金属アルコキシド及びトリエチルアミン、1,4−ジアザビシクロ[2.2.2]オクタン、1,8−ジアザビシクロ[5.4.0]−7−ウンデセン等の有機塩基あげられる。反応に用いられる塩基の量は、化合物(I-b)1モルに対して、通常1〜10モルの割合である。
反応に用いられる化合物(l)の量は、化合物(I-b)1モルに対して、通常1〜10モルの割合である。
該反応の反応温度は通常−50〜100℃の範囲であり、反応時間は通常1〜24時間の範囲である。
反応終了後は、反応混合物を水に注加し、有機溶媒抽出してから、濃縮する等の操作を行うことにより、化合物(I-c)を単離することができる。単離した化合物(I-c)は必要に応じてクロマトグラフィー、再結晶等によりさらに精製することもできる。
Step (6-2)
The compound represented by the formula (Ic) can be produced by reacting the compound (l) with the compound (Ib) in the presence of a base.
The reaction is usually performed in the presence of a base and usually in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as diethyl ether, tetrahydrofuran and dimethoxyethane, acid amides such as N, N-dimethylformamide, organic sulfurs such as dimethyl sulfoxide and sulfolane, and aliphatics such as hexane and heptane. Examples thereof include hydrocarbons, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as 1,2-dichloroethane and chlorobenzene, water, and mixtures thereof.
Examples of the base used in the reaction include inorganic bases such as sodium hydride, sodium hydroxide, potassium hydroxide and potassium carbonate, alkali metal alkoxides such as sodium methoxide and potassium tert-butoxide, and triethylamine, 1,4-diazabicyclo And organic bases such as [2.2.2] octane and 1,8-diazabicyclo [5.4.0] -7-undecene. The amount of the base used in the reaction is usually 1 to 10 moles per 1 mole of compound (Ib).
The amount of the compound (l) used in the reaction is usually 1 to 10 moles relative to 1 mole of the compound (Ib).
The reaction temperature of the reaction is usually in the range of −50 to 100 ° C., and the reaction time is usually in the range of 1 to 24 hours.
After completion of the reaction, the compound (Ic) can be isolated by performing an operation such as pouring the reaction mixture into water, extracting with an organic solvent, and then concentrating. The isolated compound (Ic) can be further purified by chromatography, recrystallization or the like, if necessary.

(製造法7)
式(I)で示される本有機硫黄化合物のうち、R1がハロゲン原子で置換されていてもよいC1〜C4鎖式炭化水素基または水素原子であり、R2が−C(=O)R5またはシアノ基である化合物(I-c)は、化合物(j)から以下の方法により製造することもできる。

Figure 2010150156
[式中、Cy、R1a、R2a、R3、n、m、Z3及びZ4は前記と同じ意味を表す。]
工程(7−1)
化合物(q)は、化合物(k)と化合物(j)とを塩基の存在下で反応させることにより製造することができる。
該反応は、通常塩基の存在下、通常溶媒の存在下で行われる。
反応に用いられる溶媒としては、例えばジエチルエーテル、テトラヒドロフラン、ジメトキシエタン等のエーテル類、N,N−ジメチルホルムアミド等の酸アミド類、ジメチルスルホキシド、スルホラン等の有機硫黄類、ヘキサン、ヘプタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、1,2−ジクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、水及びそれらの混合物があげられる。
該反応に用いられる塩基としては、例えば水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、炭酸カリウム等の無機塩基、ナトリウムメトキシド、カリウムtert−ブトキシド等のアルカリ金属アルコキシド及びトリエチルアミン、1,4−ジアザビシクロ[2.2.2]オクタン、1,8−ジアザビシクロ[5.4.0]−7−ウンデセン等の有機塩基あげられる。反応に用いられる塩基の量は、化合物(j)1モルに対して、通常1〜10モルの割合である。
反応に用いられる化合物(k)の量は、化合物(j)1モルに対して、通常1〜10モルの割合である。
該反応の反応温度は通常−50〜100℃の範囲であり、反応時間は通常1〜24時間の範囲である。
反応終了後は、反応混合物を水に注加し、有機溶媒抽出してから、濃縮する等の操作を行うことにより、化合物(q)を単離することができる。単離した化合物(q)は必要に応じてクロマトグラフィー、再結晶等によりさらに精製することもできる。 (Production method 7)
Among the present organic sulfur compounds represented by the formula (I), R 1 is a C1-C4 chain hydrocarbon group or hydrogen atom optionally substituted with a halogen atom, and R 2 is —C (═O) R. Compound (Ic) which is 5 or a cyano group can also be produced from compound (j) by the following method.
Figure 2010150156
[Wherein, Cy, R 1a , R 2a , R 3 , n, m, Z 3 and Z 4 represent the same meaning as described above. ]
Step (7-1)
Compound (q) can be produced by reacting compound (k) with compound (j) in the presence of a base.
The reaction is usually performed in the presence of a base and usually in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as diethyl ether, tetrahydrofuran and dimethoxyethane, acid amides such as N, N-dimethylformamide, organic sulfurs such as dimethyl sulfoxide and sulfolane, and aliphatics such as hexane and heptane. Examples thereof include hydrocarbons, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as 1,2-dichloroethane and chlorobenzene, water, and mixtures thereof.
Examples of the base used in the reaction include inorganic bases such as sodium hydride, sodium hydroxide, potassium hydroxide and potassium carbonate, alkali metal alkoxides such as sodium methoxide and potassium tert-butoxide, and triethylamine, 1,4-diazabicyclo And organic bases such as [2.2.2] octane and 1,8-diazabicyclo [5.4.0] -7-undecene. The amount of the base used for the reaction is usually 1 to 10 moles relative to 1 mole of the compound (j).
The amount of the compound (k) used in the reaction is usually 1 to 10 moles relative to 1 mole of the compound (j).
The reaction temperature of the reaction is usually in the range of −50 to 100 ° C., and the reaction time is usually in the range of 1 to 24 hours.
After completion of the reaction, the compound (q) can be isolated by performing an operation such as pouring the reaction mixture into water, extracting with an organic solvent, and then concentrating. The isolated compound (q) can be further purified by chromatography, recrystallization or the like, if necessary.

工程(7−2)
式(I-c)で示される化合物は、化合物(l)と化合物(q)とを塩基の存在下で反応させることにより製造することができる。
該反応は、通常塩基の存在下、通常溶媒の存在下で行われる。
反応に用いられる溶媒としては、例えばジエチルエーテル、テトラヒドロフラン、ジメトキシエタン等のエーテル類、N,N−ジメチルホルムアミド等の酸アミド類、ジメチルスルホキシド、スルホラン等の有機硫黄類、ヘキサン、ヘプタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、1,2−ジクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、水及びそれらの混合物があげられる。
該反応に用いられる塩基としては、例えば水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、炭酸カリウム等の無機塩基、ナトリウムメトキシド、カリウムtert−ブトキシド等のアルカリ金属アルコキシド及びトリエチルアミン、1,4−ジアザビシクロ[2.2.2]オクタン、1,8−ジアザビシクロ[5.4.0]−7−ウンデセン等の有機塩基あげられる。反応に用いられる塩基の量は、化合物(I-b)1モルに対して、通常1〜10モルの割合である。
反応に用いられる化合物(l)の量は、化合物(q)1モルに対して、通常1〜10モルの割合である。
該反応の反応温度は通常−50〜100℃の範囲であり、反応時間は通常1〜24時間の範囲である。
反応終了後は、反応混合物を水に注加し、有機溶媒抽出してから、濃縮する等の操作を行うことにより、化合物(I-c)を単離することができる。単離した化合物(I-c)は必要に応じてクロマトグラフィー、再結晶等によりさらに精製することもできる。
Step (7-2)
The compound represented by the formula (Ic) can be produced by reacting the compound (l) and the compound (q) in the presence of a base.
The reaction is usually performed in the presence of a base and usually in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as diethyl ether, tetrahydrofuran and dimethoxyethane, acid amides such as N, N-dimethylformamide, organic sulfurs such as dimethyl sulfoxide and sulfolane, and aliphatics such as hexane and heptane. Examples thereof include hydrocarbons, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as 1,2-dichloroethane and chlorobenzene, water, and mixtures thereof.
Examples of the base used in the reaction include inorganic bases such as sodium hydride, sodium hydroxide, potassium hydroxide and potassium carbonate, alkali metal alkoxides such as sodium methoxide and potassium tert-butoxide, and triethylamine, 1,4-diazabicyclo And organic bases such as [2.2.2] octane and 1,8-diazabicyclo [5.4.0] -7-undecene. The amount of the base used in the reaction is usually 1 to 10 moles per 1 mole of compound (Ib).
The amount of compound (l) used in the reaction is usually 1 to 10 moles per mole of compound (q).
The reaction temperature of the reaction is usually in the range of −50 to 100 ° C., and the reaction time is usually in the range of 1 to 24 hours.
After completion of the reaction, the compound (Ic) can be isolated by performing an operation such as pouring the reaction mixture into water, extracting with an organic solvent, and then concentrating. The isolated compound (Ic) can be further purified by chromatography, recrystallization or the like, if necessary.

(製造法8)
式(I)で示される本有機硫黄化合物のうち、R1がハロゲン原子であり、R2が−C(=O)R5またはシアノ基である化合物は、化合物(I-b)から以下の方法により製造することができる。

Figure 2010150156
[式中、Cy、R2a、R3、n及びmは前記と同じ意味を表し、R1bはハロゲン原子を表す。]
該反応は、通常塩基の存在下、通常溶媒の存在下で行われる。
反応に用いられる溶媒としては、例えばN,N−ジメチルホルムアミド等の酸アミド類、ジエチルエーテル、テトラヒドロフラン等のエーテル類、ジメチルスルホキシド、スルホラン等の有機硫黄、クロロホルム、四塩化炭素、1,2−ジクロロエタン、ジクロロメタン、ジクロロベンゼン等のハロゲン化炭化水素類、アセトニトリル、プロピオニトリル等の脂肪族ニトリル類、トルエン、キシレン等の芳香族炭化水素類、水及びそれらの混合物があげられる。
該反応に用いられる塩基としては、例えば水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、炭酸カリウム等の無機塩基、ナトリウムメトキシド、カリウムtert−ブトキシド等のアルカリ金属アルコキシド、リチウムジイソプロピルアミド等のアルカリ金属アミド及びトリエチルアミン、1,4−ジアザビシクロ[2.2.2]オクタン、1,8−ジアザビシクロ[5.4.0]−7−ウンデセン等の有機塩基あげられる。反応に用いられる塩基の量は、化合物(I-a)1モルに対して、通常1〜10モルの割合である。
該反応に用いられるハロゲン化剤Aとしては、例えば四塩化炭素、ヘキサクロロエタン等のハロゲン化炭化水素、フッ素、塩素、臭素、ヨウ素のハロゲン、N−クロロコハク酸イミド、N−ブロモコハク酸イミド、N−ヨードコハク酸イミド等のN−ハロゲン化コハク酸イミド、1−フルオロ−2,4,6−トリメチルピリジニウム トリフルオロメタンスルホナート、1,1’−ジフルオロ−2,2’−ビピリジニウム ビステトラフルオロボレート等のN−フルオロピリジニウム塩、塩化銅(II)、臭化銅(II)等の無機塩があげられる。反応に用いられるハロゲン化剤の量は、化合物(I-a)1モルに対して、通常1〜10モルの割合である。
該反応の反応温度は通常−100〜100℃の範囲であり、反応時間は通常1〜24時間の範囲である。
反応終了後は、反応混合物を水に注加し、有機溶媒抽出してから、濃縮する等の操作を行うことにより、化合物(I-d)を単離することができる。単離した化合物(I-d)は必要に応じてクロマトグラフィー、再結晶等によりさらに精製することもできる。 (Production method 8)
Among the present organic sulfur compounds represented by formula (I), a compound in which R 1 is a halogen atom and R 2 is —C (═O) R 5 or a cyano group is obtained from compound (Ib) by the following method. Can be manufactured.
Figure 2010150156
[Wherein, Cy, R 2a , R 3 , n and m represent the same meaning as described above, and R 1b represents a halogen atom. ]
The reaction is usually performed in the presence of a base and usually in the presence of a solvent.
Examples of the solvent used in the reaction include acid amides such as N, N-dimethylformamide, ethers such as diethyl ether and tetrahydrofuran, organic sulfur such as dimethyl sulfoxide and sulfolane, chloroform, carbon tetrachloride, and 1,2-dichloroethane. Halogenated hydrocarbons such as dichloromethane and dichlorobenzene, aliphatic nitriles such as acetonitrile and propionitrile, aromatic hydrocarbons such as toluene and xylene, water, and mixtures thereof.
Examples of the base used in the reaction include inorganic bases such as sodium hydride, sodium hydroxide, potassium hydroxide and potassium carbonate, alkali metal alkoxides such as sodium methoxide and potassium tert-butoxide, and alkali metals such as lithium diisopropylamide. And organic bases such as amide and triethylamine, 1,4-diazabicyclo [2.2.2] octane, 1,8-diazabicyclo [5.4.0] -7-undecene. The amount of the base used in the reaction is usually 1 to 10 moles per 1 mole of compound (Ia).
Examples of the halogenating agent A used in the reaction include halogenated hydrocarbons such as carbon tetrachloride and hexachloroethane, halogens of fluorine, chlorine, bromine and iodine, N-chlorosuccinimide, N-bromosuccinimide, N- N such as N-halogenated succinimide such as iodosuccinimide, 1-fluoro-2,4,6-trimethylpyridinium trifluoromethanesulfonate, 1,1′-difluoro-2,2′-bipyridinium bistetrafluoroborate -Inorganic salts such as fluoropyridinium salts, copper (II) chloride, copper (II) bromide. The amount of the halogenating agent used in the reaction is usually 1 to 10 moles per mole of compound (Ia).
The reaction temperature of the reaction is usually in the range of −100 to 100 ° C., and the reaction time is usually in the range of 1 to 24 hours.
After completion of the reaction, the compound (Id) can be isolated by pouring the reaction mixture into water, extracting the mixture with an organic solvent, and concentrating the mixture. The isolated compound (Id) can be further purified by chromatography, recrystallization or the like, if necessary.

(製造法9)
式(I)で示される本有機硫黄化合物のうち、R1がハロゲン原子であり、R2が−C(=O)R5またはシアノ基である化合物は、化合物(I-b)から以下の方法により製造することができる。

Figure 2010150156
[式中、Cy、R1b、R2a、R4、n及びmは前記と同じ意味を表す。]
該反応は、通常溶媒の存在下で行われる。
反応に用いられる溶媒としては、例えばクロロホルム、四塩化炭素、1,2−ジクロロエタン、ジクロロメタン、ジクロロベンゼン等のハロゲン化炭化水素類、アセトニトリル、プロピオニトリル等の脂肪族ニトリル類、トルエン、キシレン等の芳香族炭化水素類、酢酸等の脂肪族カルボン酸類、二硫化炭素、水及びそれらの混合物があげられる。
該反応に用いられるハロゲン化剤Bとしては、例えばフッ素、塩素、臭素、ヨウ素のハロゲン、フッ化水素、塩化水素、臭化水素、ヨウ化水素のハロゲン化水素、塩化チオニル、臭化チオニル、塩化スルフリル等のハロゲン化硫黄化合物、三塩化リン、三臭化リン、五塩化リン、オキシ塩化リン等のハロゲン化リン化合物があげられる。反応に用いられるハロゲン化剤の量は、化合物(I-a)1モルに対して、通常1〜10モルの割合である。
該反応の反応温度は通常−100〜200℃の範囲であり、反応時間は通常1〜24時間の範囲である。
反応終了後は、反応混合物を水に注加し、有機溶媒抽出してから、濃縮する等の操作を行うことにより、化合物(I-d)を単離することができる。単離した化合物(I-d)は必要に応じてクロマトグラフィー、再結晶等によりさらに精製することもできる。 (Production method 9)
Among the present organic sulfur compounds represented by formula (I), a compound in which R 1 is a halogen atom and R 2 is —C (═O) R 5 or a cyano group is obtained from compound (Ib) by the following method. Can be manufactured.
Figure 2010150156
[Wherein, Cy, R 1b , R 2a , R 4 , n and m represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include halogenated hydrocarbons such as chloroform, carbon tetrachloride, 1,2-dichloroethane, dichloromethane and dichlorobenzene, aliphatic nitriles such as acetonitrile and propionitrile, toluene, xylene and the like. Examples thereof include aromatic hydrocarbons, aliphatic carboxylic acids such as acetic acid, carbon disulfide, water, and mixtures thereof.
Examples of the halogenating agent B used in the reaction include fluorine, chlorine, bromine, iodine halogen, hydrogen fluoride, hydrogen chloride, hydrogen bromide, hydrogen iodide hydrogen halide, thionyl chloride, thionyl bromide, chloride. Examples thereof include sulfur halide compounds such as sulfuryl, and phosphorus halide compounds such as phosphorus trichloride, phosphorus tribromide, phosphorus pentachloride, and phosphorus oxychloride. The amount of the halogenating agent used in the reaction is usually 1 to 10 moles per mole of compound (Ia).
The reaction temperature is usually in the range of −100 to 200 ° C., and the reaction time is usually in the range of 1 to 24 hours.
After completion of the reaction, the compound (Id) can be isolated by pouring the reaction mixture into water, extracting the mixture with an organic solvent, and concentrating the mixture. The isolated compound (Id) can be further purified by chromatography, recrystallization or the like, if necessary.

(製造法10)
式(I)で示される本有機硫黄化合物のうち、nが1又は2である式(I-e)で示される化合物は、式(I-a)で示される化合物を酸化させることにより製造することができる。

Figure 2010150156
〔式中、Cy、R1、R2、R3及びmは前記と同じ意味を表し、n'は1又は2を表す。〕
該反応は、通常溶媒の存在下で行われる。
反応に用いられる溶媒としては、例えばメタノール、エタノール等のアルコール類、ジクロロメタン、クロロホルム等のハロゲン化炭化水素類、トルエン、キシレン等の芳香族炭化水素類、酢酸、トリフルオロ酢酸等の脂肪族カルボン酸類、水及びそれらの混合物があげられる。
該反応に用いられる酸化剤としては、例えば過酢酸、トリフルオロ過酢酸、m−クロロ過安息香酸類等の有機過酸化物類、塩素、臭素のハロゲン分子、N−クロロコハク酸イミド等の含ハロゲンイミド類、過塩素酸(若しくはその塩)、過ヨウ素酸(若しくはその塩)等のハロゲン化物類、過マンガン酸カリウム等の過マンガン酸塩類、クロム酸カリウム等のクロム酸塩類、ペルオキシ硫酸カリウム等のペルオキシ硫酸塩類及び過酸化水素があげられる。反応に用いられる酸化剤の量は、化合物(I-a)1モルに対して通常1〜10モルの割合である。
該反応の反応温度は通常−50〜200℃の範囲であり、反応時間は通常1〜72時間の範囲である。
反応終了後は、反応混合物を水に注加し、有機溶媒抽出してから、濃縮する等の操作を行うことにより、化合物(I-e)を単離することができる。単離した有機溶媒抽出してから、濃縮する等の操作を行うことにより、スルフィド誘導体(I-e)を単離することができる。単離したスルフィド誘導体(I-e)は、必要に応じてクロマトグラフィー、再結晶等でさらに精製することもできる。
化合物(I-a)は公知の製造方法に準じて製造することができる。 (Production method 10)
Among the present organic sulfur compounds represented by the formula (I), the compound represented by the formula (Ie) in which n is 1 or 2 can be produced by oxidizing the compound represented by the formula (Ia). it can.

Figure 2010150156
[Wherein, Cy, R 1 , R 2 , R 3 and m represent the same meaning as described above, and n ′ represents 1 or 2. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include alcohols such as methanol and ethanol, halogenated hydrocarbons such as dichloromethane and chloroform, aromatic hydrocarbons such as toluene and xylene, and aliphatic carboxylic acids such as acetic acid and trifluoroacetic acid. , Water and mixtures thereof.
Examples of the oxidizing agent used in the reaction include organic peroxides such as peracetic acid, trifluoroperacetic acid, and m-chloroperbenzoic acids, halogen molecules such as chlorine and bromine, and halogen-containing imides such as N-chlorosuccinimide. , Halides such as perchloric acid (or its salt), periodic acid (or its salt), permanganates such as potassium permanganate, chromates such as potassium chromate, potassium peroxysulfate, etc. Examples include peroxysulfates and hydrogen peroxide. The amount of the oxidizing agent used for the reaction is usually 1 to 10 moles relative to 1 mole of compound (Ia).
The reaction temperature of the reaction is usually in the range of −50 to 200 ° C., and the reaction time is usually in the range of 1 to 72 hours.
After completion of the reaction, the compound (Ie) can be isolated by pouring the reaction mixture into water, extracting the mixture with an organic solvent, and concentrating the mixture. The sulfide derivative (I-e) can be isolated by performing an operation such as extraction after concentration of the isolated organic solvent and concentration. The isolated sulfide derivative (Ie) can be further purified by chromatography, recrystallization or the like, if necessary.
Compound (Ia) can be produced according to a known production method.

本ネオニコチノイド化合物は、イミダクロプリド、チアクロプリド、アセタミプリド、ニテンピラム、クロチアニジン及びチアメトキサムからなる群より選ばれる化合物であるが、イミダクロプリドは下記式(IIa)で示される化合物であり、チアクロプリドは下記式(IIb)で示される化合物であり、アセタミプリドは下記式(IIc)で示される化合物であり、
ニテンピラムは下記式(IId)で示される化合物であり、クロチアニジン下記式(IIe)で示される化合物であり、チアメトキサム下記式(IIf)で示される化合物である。

Figure 2010150156
The neonicotinoid compound is a compound selected from the group consisting of imidacloprid, thiacloprid, acetamiprid, nitenpyram, clothianidin and thiamethoxam, imidacloprid is a compound represented by the following formula (IIa), and thiacloprid is represented by the following formula (IIb) Acetamiprid is a compound represented by the following formula (IIc),
Nitenpyram is a compound represented by the following formula (IId), clothianidin is a compound represented by the following formula (IIe), and thiamethoxam is a compound represented by the following formula (IIf).
Figure 2010150156

本ネオニコチノイド化合物は、例えば特開平7−278094号公報、特開平2−209868号公報、特開平1−70467号公報、特開平3−218354号公報、特開平4−273863号公報等に記載された方法にて製造することができる。また、市販の化合物も使用することができる。   This neonicotinoid compound is described in, for example, JP-A-7-278094, JP-A-2-209868, JP-A-1-70467, JP-A-3-218354, JP-A-4-273863, and the like. Can be manufactured by the method described above. Commercially available compounds can also be used.

本発明の有害生物防除組成物が効力を示す有害生物としては、有害昆虫類並びに有害ダニ類等が挙げられる。より具体的には、下記のものが挙げられる。   Examples of pests for which the pest control composition of the present invention is effective include harmful insects and harmful mites. More specifically, the following are mentioned.

半翅目害虫:ヒメトビウンカ(Laodelphax striatellus),トビイロウンカ(Nilaparvata lugens),セジロウンカ(Sogatella furcifera)等のウンカ類,ツマグロヨコバイ(Nephotettix cincticeps),タイワンツマグロヨコバイ(Nephotettix virescens),チャノミドリヒメヨコバイ(Empoasca onukii)等のヨコバイ類,ワタアブラムシ(Aphis gossypii),モモアカアブラムシ(Myzus persicae),ダイコンアブラムシ(Brevicoryne brassicae),ユキヤナギアブラムシ(Aphis spiraecola),チューリップヒゲナガアブラムシ(Macrosiphum euphorbiae),ジャガイモヒゲナガアブラムシ(Aulacorthum solani),ムギクビレアブラムシ(Rhopalosiphum padi),ミカンクロアブラムシ(Toxoptera citricidus),モモコフキアブラムシ(Hyalopterus pruni)等のアブラムシ類,アオクサカメムシ(Nezara antennata),ホソヘリカメムシ(Riptortus clavetus),クモヘリカメムシ(Leptocorisa chinensis),トゲシラホシカメムシ(Eysarcoris parvus),クサギカメムシ(Halyomorpha mista)等のカメムシ類,オンシツコナジラミ(Trialeurodes vaporariorum),タバココナジラミ(Bemisia tabaci),ミカンコナジラミ(Dialeurodes citri),ミカントゲコナジラミ(Aleurocanthus spiniferus)等のコナジラミ類,アカマルカイガラムシ(Aonidiella aurantii),サンホーゼカイガラムシ(Comstockaspis perniciosa),シトラススノースケール(Unaspis citri),ルビーロウムシ(Ceroplastes rubens),イセリヤカイガラムシ(Icerya purchasi),フジコナカイガラムシ(Planococcus kraunhiae),クワコナカイガラムシ(Pseudococcus longispinis),クワシロカイガラムシ(Pseudaulacaspis pentagona)等のカイガラムシ類,グンバイムシ類,トコジラミ(Cimex lectularius)等のトコジラミ類,キジラミ類等。 Hemiptera: Insects such as Laodelphax striatellus, Nilaparvata lugens, Sogatella furcifera, Nephotettix cincticeps, Nephotettimpca Leafhoppers, cotton aphids (Aphis gossypii), peach aphids (Myzus persicae), radish aphids (Brevicoryne brassicae), snowy aphids (Aphis spiraecola), tulip beetles (Macrosiphum euphorbiae), aphid sols Aphids (Rhopalosiphum padi), citrus aphids (Toxoptera citricidus), peach beetles (Hyalopterus pruni) chinensis), stink bugs (Eysarcoris parvus), stink bugs (Halyomorpha mista), stink bugs (Trialeurodes vaporariorum), tobacco whitefly (Bemisia tabaci), citrus whitefly (Dialeurodes citri), Dialeurodes citri Whitefly, Aonidiella aurantii, Sanchez scale insect (Comstockaspis perniciosa), Citrus snow scale (Unaspis citri), Ruby beetle (Ceroplastes rubens), Icerya purchasi, Fujikonae scale krak Scale insects such as Pseudoococcus longispinis and Pseudaulacaspis pentagona, bedbugs such as Cimex lectularius, bed bugs, etc.

鱗翅目害虫:ニカメイガ(Chilo suppressalis),サンカメイガ(Tryporyza incertulas),コブノメイガ(Cnaphalocrocis medinalis),ワタノメイガ(Notarcha derogata),ノシメマダラメイガ(Plodia interpunctella),アワノメイガ(Ostrinia furnacalis),ハイマダラノメイガ(Hellula undalis),シバツトガ(Pediasia teterrellus)等のメイガ類,ハスモンヨトウ(Spodoptera litura),シロイチモジヨトウ(Spodoptera exigua),アワヨトウ(Pseudaletia separata),ヨトウガ(Mamestra brassicae),タマナヤガ(Agrotis ipsilon),タマナギンウワバ(Plusia nigrisigna),トリコプルシア属,ヘリオティス属,ヘリコベルパ属等のヤガ類,モンシロチョウ(Pieris rapae)等のシロチョウ類,アドキソフィエス属,ナシヒメシンクイ(Grapholita molesta),マメシンクイガ(Leguminivora glycinivorella),アズキサヤムシガ(Matsumuraeses azukivora),リンゴコカクモンハマキ(Adoxophyes orana fasciata),チャノコカクモンハマキ(Adoxophyes honmai. ),チャハマキ(Homona magnanima),ミダレカクモンハマキ(Archips fuscocupreanus),コドリンガ(Cydia pomonella)等のハマキガ類,チャノホソガ(Caloptilia theivora),キンモンホソガ(Phyllonorycter ringoneella)のホソガ類,モモシンクイガ(Carposina niponensis)等のシンクイガ類,リオネティア属等のハモグリガ類,リマントリア属,ユープロクティス属等のドクガ類,コナガ(Plutella xylostella)等のスガ類,ワタアカミムシ(Pectinophora gossypiella)ジャガイモガ(Phthorimaea operculella)等のキバガ類,アメリカシロヒトリ(Hyphantria cunea)等のヒトリガ類,イガ(Tinea translucens),コイガ(Tineola bisselliella)等のヒロズコガ類等。 Lepidoptera: Chilo suppressalis, Tryporyza incertulas, Cnaphalocrocis medinalis, Notarcha derogata, Plodia interpunctella, Ostrinia furiscal (Ostrinia furiscalis) Common moths such as Pediasia teterrellus, Spodoptera litura, Spodoptera exigua, Pseudaletia separata, Mamestra brassicae, Agrotis ipsilon, Agrotis ipsilon, Agrotis ipsilon, Heliotis, Helicoberpa, etc., White butterflies, such as Pieris rapae, Adoxofies, Grapholita molesta, Leguminivora glycinivorella, Azuki beetle (Matsumuraeses azukivora), Apple coca (Adoxophyes orana fasciata), Chanokokumonmonaki (Adoxophyes honmai.), Chamonaki (Homona magnanima), Midlekakumonamaki (Archips fuscocupreanus), Codling moth (Cydia pomonella), etc. ringoneella, Carposina niponensis, etc., Rionetia genus, Scots moth, Limantria, Euplottis, etc., Plutella xylostella, etc., Pectinophora gossypiella Potatoes such as potato moth (Phthorimaea operculella), hitoragers such as Hyphantria cunea, Hirosukoga such as tiger (Tinea translucens), moth (Tineola bisselliella) and the like.

アザミウマ目害虫:ミカンキイロアザミウマ(Frankliniella occidentalis),ミナミキイロアザミウマ(Thrips parmi),チャノキイロアザミウマ(Scirtothrips dorsalis),ネギアザミウマ(Thrips tabaci),ヒラズハナアザミウマ(Frankliniella intonsa)などのアザミウマ類等。 Thrips of the order of thrips: Frankliniella occidentalis, Thrips parmi, Scirtothrips dorsalis, Thrips tabaci, etc.

双翅目害虫:アカイエカ(Culex pipiens pallens),コガタアカイエカ(Culex tritaeniorhynchus),ネッタイイエカ(Culex quinquefasciatus)等のイエカ類,ネッタイシマカ(Aedes aegypti),ヒトスジシマカ(Aedes albopictus)等のエーデス属,シナハマダラカ(Anopheles sinensis)等のアノフェレス属,ユスリカ類,イエバエ(Musca domestica),オオイエバエ(Muscina stabulans)等のイエバエ類,クロバエ類,ニクバエ類,ヒメイエバエ類,タネバエ(Delia platura),タマネギバエ(Delia antiqua)等のハナバエ類,イネハモグリバエ(Agromyza oryzae),イネヒメハモグリバエ(Hydrellia griseola),トマトハモグリバエ,(Liriomyza sativae),マメハモグリバエ(Liriomyza trifolii),ナモグリバエ(Chromatomyia horticola)等のハモグリバエ類,イネキモグリバエ(Chlorops oryzae)等のキモグリバエ類,ウリミバエ(Dacus cucurbitae),チチュウカイミバエ(Ceratitis capitata)等のミバエ類,ショウジョウバエ類,オオキモンノミバエ(Megaselia spiracularis)等のノミバエ類,オオチョウバエ(Clogmia albipunctata)等のチョウバエ類,ブユ類,ウシアブ(Tabanus trigonus)等のアブ類,サシバエ類等。 Diptera: Culex pipiens pallens, Culex tritaeniorhynchus, Culex quinquefasciatus, etc., Aedes aegypti, Aedes albopictus, etc. Genus Anopheles, Chironomidae, Musca domestica, Muscina stabulans, and other houseflies, fly flies, fungi, flies, fly flies such as Delia platura, Delia antiqua, flies (Agromyza oryzae), rice leaf fly (Hydrellia griseola), tomato leaf fly, (Liriomyza sativae), bean leaf fly (Liriomyza trifolii), leafhopper (Chromatomyia horticola) and other leafhoppers (Chromatomyia horticola), Dacus cucurbitae) Fruit flies such as fruit flies (Ceratitis capitata), fruit flies, fruit flies such as Megaselia spiracularis, butterflies such as Clogmia albipunctata, flies such as flies, Tabanus trigonus Etc.

鞘翅目害虫:ウエスタンコーンルートワーム(Diabrotica virgifera virgifera),サザンコーンルートワーム(Diabrotica undecimpunctata howardi)等のコーンルートワーム類,ドウガネブイブイ(Anomala cuprea),ヒメコガネ(Anomala rufocuprea),マメコガネ(Popillia japonica)等のコガネムシ類,メイズウィービル(Sitophilus zeamais),イネミズゾウムシ(Lissorhoptrus oryzophilus),アズキゾウムシ(Callosobruchuys chienensis),イネゾウムシ(Echinocnemus squameus),ワタミゾウムシ(Anthonomus grandis),シバオサゾウムシ(Sphenophorus venatus)等のゾウムシ類,チャイロコメノゴミムシダマシ(Tenebrio molitor),コクヌストモドキ(Tribolium castaneum)等のゴミムシダマシ類,
イネドロオイムシ(Oulema oryzae),ウリハムシ(Aulacophora femoralis),キスジノミハムシ(Phyllotreta striolata),コロラドハムシ(Leptinotarsa decemlineata)等のハムシ類,ヒメマルカツオブシムシ(Anthrenus verbasci),ハラジロカツオブシムシ(Dermestes maculates)等のカツオブシムシ類,タバコシバンムシ(Lasioderma serricorne)等のシバンムシ類,ニジュウヤホシテントウ(Epilachna vigintioctopunctata)等のエピラクナ類,ヒラタキクイムシ(Lyctus brunneus),マツノキクイムシ(Tomicus piniperda)等のキクイムシ類,ナガシンクイムシ類,ヒョウホンムシ類,ゴマダラカミキリ(Anoplophora malasiaca)等のカミキリムシ類,コメツキムシ類(Agriotes spp. )アオバアリガタハネカクシ(Paederus fuscipes)等。
Coleoptera: Western corn root worms (Diabrotica virgifera virgifera), corn root worms such as Southern corn root worms (Diabrotica undecimpunctata howardi), Douganebubui (Anomala cuprea), Japanese beetle (Anomala rufocuprea), Japanese beetle (Popillia japonica) Genus, maize weevil (Sitophilus zeamais), water weevil (Lissorhoptrus oryzophilus), azuki beetle (Callosobruchuys chienensis), weevil (Echinocnemus squameus), cotton weevil (Anthonomus grandis), sweet weevil Grub beetles such as Tenebrio molitor, Tribolium castaneum,
Rice beetles (Oulema oryzae), leaf beetle (Aulacophora femoralis), leaf beetle (Phyllotreta striolata), leaf beetle (Leptinotarsa decemlineata), leaf beetle, Anthrenus verbasci (Lasioderma serricorne) and other species, Epilachna vigintioctopunctata and other epilacunas, Lyctus brunneus, pine beetle (Tomicus piniperda) and other species, and Longhorn beetles such as Anoplophora malasiaca), click beetles (Agriotes spp.), And long-horned beetle (Paederus fuscipes).

直翅目害虫:トノサマバッタ(Locusta migratoria),ケラ(Gryllotalpa africana),コバネイナゴ(Oxya yezoensis),ハネナガイナゴ(Oxya japonica),コオロギ類等。 Pterodoptera: Locusta migratoria, Gryllotalpa africana, Oxya yezoensis, Oxya japonica, crickets, etc.

隠翅目害虫:ネコノミ(Ctenocephalides felis),イヌノミ(Ctenocephalides canis),ヒトノミ(Pulex irritans),ケオプスネズミノミ(Xenopsylla cheopis)等。 Lepidoptera: Cat fleas (Ctenocephalides felis), dog fleas (Ctenocephalides canis), human fleas (Pulex irritans), keops rat fleas (Xenopsylla cheopis), etc.

シラミ目害虫:コロモジラミ(Pediculus humanus corporis),ケジラミ (Phthirus pubis),ウシジラミ(Haematopinus eurysternus),ヒツジジラミ(Dalmalinia ovis),ブタジラミ(Haematopinus suis)等。 Lice insect pests: white lice (Pediculus humanus corporis), white lice (Phthirus pubis), cattle lice (Haematopinus eurysternus), sheep lice (Dalmalinia ovis), pig lice (Haematopinus suis), etc.

膜翅目害虫: イエヒメアリ(Monomorium pharaosis),クロヤマアリ(Formica fusca japonica),ルリアリ(Ochetellus glaber),アミメアリ(Pristomyrmex pungens),オオズアリ(Pheidole noda),ハキリアリ(Acromyrmex spp. ),ファイヤーアント(Solenopsis spp. )等のアリ類,スズメバチ類,アリガタバチ類,カブラハバチ(Athalia rosae),ニホンカブラバチ(Athalia japonica)等のハバチ類等。 Hymenoptera: Monomorium pharaosis, Black ants (Formica fusca japonica), Rugliari (Ochetellus glaber), Amphidia (Pristomyrmex pungens), Giant ants (Pheidole noda), Hachiriari (Acromyrmex spp.), Firesis p Such as ants, wasps, scallops, bees (Athalia rosae), Japanese bees (Athalia japonica), etc.

ゴキブリ目害虫:チャバネゴキブリ(Blattella germanica),クロゴキブリ(Periplaneta fuliginosa),ワモンゴキブリ(Periplaneta americana),トビイロゴキブリ(Periplaneta brunnea),トウヨウゴキブリ(Blatta orientalis)等のゴキブリ類,ヤマトシロアリ(Reticulitermes speratus),イエシロアリ(Coptotermes formosanus),アメリカカンザイシロアリ(Incisitermes minor),ダイコクシロアリ(Cryptotermes domesticus),タイワンシロアリ(Odontotermes formosanus),コウシュンシロアリ(Neotermes koshunensis),サツマシロアリ(Glyptotermes satsumensis),ナカジマシロアリ(Glyptotermes nakajimai),カタンシロアリ(Glyptotermes fuscus),コダマシロアリ(Glyptotermes kodamai),クシモトシロアリ(Glyptotermes kushimensis),オオシロアリ(Hodotermopsis japonica),コウシュウイエシロアリ(Coptotermes guangzhoensis),アマミシロアリ(Reticulitermes miyatakei),キアシシロアリ(Reticulitermes flaviceps amamianus),カンモンシロアリ(Reticulitermes sp. ),タカサゴシロアリ(Nasutitermes takasagoensis),ニトベシロアリ(Pericapritermes nitobei),ムシャシロアリ(Sinocapritermes mushae)等のシロアリ類等。 Cockroaches: cockroaches (Blattella germanica), black cockroach (Periplaneta fuliginosa), cockroach (Periplaneta americana), cockroach (Periplaneta brunnea), cockroaches such as cockroach (Blatta orientalis), ants (Coptotermes formosanus), American ant termite (Incisitermes minor), Daikoku termite (Cryptotermes domesticus), Taiwan termite (Odontotermes formosanus), Koshun termite (Neotermes koshunensis), Satsuma termite (Glyptotermes snakatanto) Termites (Glyptotermes fuscus), white termites (Glyptotermes kodamai), white termites (Glyptotermes kushimensis), termites (Hodotermopsis japonica), white-tailed termites (Coptotermes guangzhoensis), Rami termite Termites (Reticulitermes flaviceps amamianus), Kang Mont termites (Reticulitermes sp.), Takasago termite (Nasutitermes takasagoensis), Nitobe termites (Pericapritermes nitobei), warrior termite (Sinocapritermes mushae) termites such as such.

ダニ目害虫:ナミハダニ(Tetranychus urticae),カンザワハダニ(Tetranychus kanzawai),ミカンハダニ(Panonychus citri)リンゴハダニ(Panonychus ulmi),オリゴニカス属等のハダニ類,ミカンサビダニ(Aculops pelekassi),リュウキュウミカンサビダニ(Phyllocoptruta citri),トマトサビダニ(Aculops lycopersici),チャノサビダニ(Calacarus carinatus),チャノナガサビダニ(Acaphylla theavagrans),ニセナシサビダニ(Eriophyes chibaensis),リンゴサビダニ(Aculus schlechtendali)等のフシダニ類,チャノホコリダニ(Polyphagotarsonemus latus)等のホコリダニ類,ミナミヒメハダニ(Brevipalpus phoenicis)等のヒメハダニ類,ケナガハダニ類,フタトゲチマダニ(Haemaphysalis longicornis),ヤマトチマダニ(Haemaphysalis flava),タイワンカクマダニ(Dermacentor taiwanicus),アメリカンドックチック(Dermacentor variabilis),ヤマトマダニ(Ixodes ovatus),シュルツマダニ(Ixodes persulcatus),ブラックレッグドチック(Ixodes scapularis),ローンスターチック(Amblyomma americanum),オウシマダニ(Boophilus microplus),クリイロコイタマダニ(Rhipicephalus sanguineus)等のマダニ類,ミミヒゼンダニ(Octodectes cynotis)等のキュウヒゼンダニ類,ヒゼンダニ(Sacroptes scabiei)等のヒゼンダニ類,イヌニキビダニ(Demodex canis)等のニキビダニ類,ケナガコナダニ(Tyrophagus putrescentiae),ホウレンソウケナガコナダニ(Tyrophagus similis)等のコナダニ類,コナヒョウヒダニ(Dermatophagoides farinae),ヤケヒョウヒダニ(Dermatophagoides ptrenyssnus)等のヒョウヒダニ類,ホソツメダニ(Cheyletus eruditus),クワガタツメダニ(Cheyletus malaccensis),ミナミツメダニ(Cheyletus moorei)等のツメダニ類,イエダニ(Ornithonyssus bacoti),トリサシダニ(Ornithonyssus sylvairum),ワクモ(Dermanyssus gallinae)等のワクモ類,アオツツガムシ(Leptotrombidium akamushi)等のツツガムシ類等,カバキコマチグモ(Chiracanthium japonicum),セアカゴケグモ(Latrodectus hasseltii)等のクモ類等。 Acarid pests: Spider spider mites (Tetranychus urticae), Spider spider mites (Tetranychus kanzawai), Spider spider mites (Panonychus citri) Ripe spider mites (Panonychus ulmi), Spider mites (Aculops pelekassi), Rick mite Citrus (Aculops) Tomato rustic mites (Aculops lycopersici), Chinese radish mites (Calacarus carinatus), Chinese radish mites (Acaphylla theavagrans), Green rustic mites (Eriophyes chibaensis), apple rustic mites (Aculus schlechtendali), mussels moth, Scarlet mites (Brevipalpus phoenicis) and other spider mites, mosquito spider mites (Haemaphysalis longicornis), Scarlet tick (Haemaphysalis flava), Dermacentor taiwanicus, American dock tick (Dermacentorx varieties) tick such as odes ovatus), shredded tick (Ixodes persulcatus), black legged tick (Ixodes scapularis), lone star tick (Amblyomma americanum), oxid tick (Boophilus microplus), rhipicephalus sanguineus Mushroom mites such as Octodectes cynotis, mite mites such as Sacroptes scabiei, mite mites such as Demodex canis, Tyrophagus putrescentiae, mite mite such as tyrophagus similimato farinae), leopard mites such as Dermatophagoides ptrenyssnus, thorn mites such as Cheyletus malaccensis, tick mites such as nit bait, nits airum), cucumbers such as Dermanyssus gallinae, tsutsugamushi such as Leptotrombidium akamushi, spiders such as Chiracanthium japonicum and Latrodectus hasseltii.

唇脚綱類:ゲジ(Thereuonema hilgendorfi),トビズムカデ(Scolopendra subspinipes)等。
倍脚綱類:ヤケヤスデ(Oxidus gracilis),アカヤスデ(Nedyopus tambanus)等。
等脚目類:オカダンゴムシ(Armadillidium vulgare)等。
腹足綱類:チャコウラナメクジ(Limax marginatus),キイロコウラナメクジ(Limax flavus)等。
Lip and leg class: Gezi (Thereuonema hilgendorfi), Tobismkade (Scolopendra subspinipes), etc.
Double-legged class: zelkova (Oxidus gracilis), red scallop (Nedyopus tambanus), etc.
Isopods: Armadillidium vulgare, etc.
Gastropoda: Limax marginatus, Limax flavus, etc.

本発明の有害生物防除組成物は、本有機硫黄化合物及び本ネオニコチノイド化合物のみでもよいが、通常は固体担体、液体担体及び又はガス状担体と混合し、更に必要に応じて界面活性剤その他の製剤用補助剤を添加して、乳剤、油剤、シャンプー剤、フロアブル剤、粉剤、水和剤、粒剤、ペースト状製剤、マイクロカプセル製剤、泡沫剤、エアゾール製剤、炭酸ガス製剤、錠剤、樹脂製剤等の形態に製剤化されたものである。これらの製剤は、毒餌、蚊取り線香、電気蚊取りマット、燻煙剤、燻蒸剤、シートに加工されて、使用されることもある。
これらの製剤は、本有機硫黄化合物及び本ネオニコチノイド化合物の合計量で通常0.1〜95重量%含有する。
The pest control composition of the present invention may be only the present organic sulfur compound and the present neonicotinoid compound, but is usually mixed with a solid carrier, a liquid carrier and / or a gaseous carrier, and if necessary, a surfactant or the like. Emulsions, oils, shampoos, flowables, powders, wettable powders, granules, pastes, microcapsules, foams, aerosols, carbon dioxide, tablets, resins It is formulated into a form such as a preparation. These preparations may be used after being processed into poison baits, mosquito coils, electric mosquito mats, fumigants, fumigants, and sheets.
These preparations usually contain 0.1 to 95% by weight in the total amount of the present organic sulfur compound and the present neonicotinoid compound.

製剤化の際に用いられる固体担体としては、例えば粘土類(カオリンクレー、珪藻土、ベントナイト、フバサミクレー、酸性白土等)、合成含水酸化珪素、タルク、セラミック、その他の無機鉱物(セリサイト、石英、硫黄、活性炭、炭酸カルシウム、水和シリカ等)、化学肥料(硫安、燐安、硝安、塩安、尿素等)等の微粉末及び粒状物が挙げられる。   Examples of solid carriers used for formulation include clays (kaolin clay, diatomaceous earth, bentonite, fusami clay, acidic clay), synthetic hydrous silicon oxide, talc, ceramics, and other inorganic minerals (sericite, quartz, sulfur). , Activated carbon, calcium carbonate, hydrated silica, etc.), fine powders and granular materials such as chemical fertilizers (ammonium sulfate, phosphorous acid, ammonium nitrate, ammonium chloride, urea, etc.).

液体担体としては、例えば芳香族または脂肪族炭化水素類(キシレン、トルエン、アルキルナフタレン、フェニルキシリルエタン、ケロシン、軽油、ヘキサン、シクロヘキサン等)、ハロゲン化炭化水素類(クロロベンゼン、ジクロロメタン、ジクロロエタン、トリクロロエタン等)、アルコール類(メタノール、エタノール、イソプロピルアルコール、ブタノール、ヘキサノール、エチレングリコール等)、エーテル類(ジエチルエーテル、エチレングリコールジメチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、プロピレングリコールモノメチルエーテル、テトラヒドロフラン、ジオキサン等)、エステル類(酢酸エチル、酢酸ブチル等)、ケトン類(アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等)、ニトリル類(アセトニトリル、イソブチロニトリル等)、スルホキシド類(ジメチルスルホキシド等)、酸アミド類(N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド等)、ピロリドン類(N−メチル−2−ピロリドン、N−オクチル−2−ピロリドン等)、炭酸プロピレン、乳酸エチル、1,3−ジメチル−2−イミダゾリジノン、植物油(大豆油、綿実油等)、植物精油(オレンジ油、ヒソップ油、レモン油等)および水などが挙げられる。   Examples of the liquid carrier include aromatic or aliphatic hydrocarbons (xylene, toluene, alkylnaphthalene, phenylxylylethane, kerosene, light oil, hexane, cyclohexane, etc.), halogenated hydrocarbons (chlorobenzene, dichloromethane, dichloroethane, trichloroethane). Etc.), alcohols (methanol, ethanol, isopropyl alcohol, butanol, hexanol, ethylene glycol, etc.), ethers (diethyl ether, ethylene glycol dimethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol monomethyl ether, tetrahydrofuran, dioxane, etc.) ), Esters (ethyl acetate, butyl acetate, etc.), ketones (acetone, methyl ethyl keto) , Methyl isobutyl ketone, cyclohexanone, etc.), nitriles (acetonitrile, isobutyronitrile, etc.), sulfoxides (dimethyl sulfoxide, etc.), acid amides (N, N-dimethylformamide, N, N-dimethylacetamide, etc.), pyrrolidone (N-methyl-2-pyrrolidone, N-octyl-2-pyrrolidone, etc.), propylene carbonate, ethyl lactate, 1,3-dimethyl-2-imidazolidinone, vegetable oil (soybean oil, cottonseed oil, etc.), plant essential oil ( Orange oil, hyssop oil, lemon oil, etc.) and water.

ガス状担体としては、例えばブタンガス、フロンガス、液化石油ガス(LPG)、ジメチルエーテル、炭酸ガス等を挙げることができる。   Examples of the gaseous carrier include butane gas, chlorofluorocarbon gas, liquefied petroleum gas (LPG), dimethyl ether, carbon dioxide gas, and the like.

界面活性剤としては、例えばアルキル硫酸エステル塩、アルキルスルホン酸塩、アルキルアリールスルホン酸塩、アルキルアリールエーテル類及びそのポリオキシエチレン化物、ポリエチレングリコールエーテル類、多価アルコールエステル類及び糖アルコール誘導体が挙げられる。   Examples of surfactants include alkyl sulfate salts, alkyl sulfonates, alkyl aryl sulfonates, alkyl aryl ethers and polyoxyethylenates thereof, polyethylene glycol ethers, polyhydric alcohol esters, and sugar alcohol derivatives. It is done.

その他の製剤用補助剤としては、固着剤、分散剤及び安定剤等、具体的には例えばカゼイン、ゼラチン、多糖類(澱粉、アラビアガム、セルロース誘導体、アルギン酸等)、リグニン誘導体、ベントナイト、糖類、合成水溶性高分子(ポリビニルアルコール、ポリビニルピロリドン、ポリアクリル酸類等)、PAP(酸性リン酸イソプロピル)、BHT(2,6−ジ−t−ブチル−4−メチルフェノール)、BHA(2−t−ブチル−4−メトキシフェノールと3−t−ブチル−4−メトキシフェノールとの混合物)、植物油、鉱物油、脂肪酸及び脂肪酸エステルが挙げられる。   Other formulation adjuvants include fixing agents, dispersants and stabilizers, such as casein, gelatin, polysaccharides (starch, gum arabic, cellulose derivatives, alginic acid, etc.), lignin derivatives, bentonite, saccharides, Synthetic water-soluble polymers (polyvinyl alcohol, polyvinylpyrrolidone, polyacrylic acids, etc.), PAP (isopropyl acid phosphate), BHT (2,6-di-t-butyl-4-methylphenol), BHA (2-t- Butyl-4-methoxyphenol and 3-t-butyl-4-methoxyphenol), vegetable oils, mineral oils, fatty acids and fatty acid esters.

樹脂製剤の基材としては、例えば塩化ビニル系重合体、ポリウレタン等を挙げることができ、これらの基材には必要によりフタル酸エステル類(フタル酸ジメチル、フタル酸ジオクチル等)、アジピン酸エステル類、ステアリン酸等の可塑剤が添加されていてもよい。樹脂製剤は該基材中に化合物を通常の混練装置を用いて混練した後、射出成型、押出成型、プレス成型等により成型することにより得られ、必要により更に成型、裁断等の工程を経て、板状、フィルム状、テープ状、網状、ひも状等の樹脂製剤に加工できる。これらの樹脂製剤は、例えば動物用首輪、動物用イヤータッグ、シート製剤、誘引ひも、園芸用支柱として加工される。
毒餌の基材としては、例えば穀物粉、植物油、糖、結晶セルロース等が挙げられ、更に必要に応じて、ジブチルヒドロキシトルエン、ノルジヒドログアイアレチン酸等の酸化防止剤、デヒドロ酢酸等の保存料、トウガラシ末等の子供やペットによる誤食防止剤、チーズ香料、タマネギ香料ピーナッツオイル等の害虫誘引性香料等が添加される。
Examples of the base material of the resin preparation include vinyl chloride polymers, polyurethanes, etc., and these base materials include phthalic acid esters (dimethyl phthalate, dioctyl phthalate, etc.), adipic acid esters as necessary. Further, a plasticizer such as stearic acid may be added. The resin formulation is obtained by kneading the compound in the base material using a normal kneading apparatus, and then molding by injection molding, extrusion molding, press molding, etc., and if necessary, through further steps such as molding, cutting, It can be processed into resin preparations such as plate, film, tape, net, and string. These resin preparations are processed, for example, as animal collars, animal ear tags, sheet preparations, attracting strings, or gardening supports.
Examples of the bait base include cereal flour, vegetable oil, sugar, crystalline cellulose and the like, and if necessary, antioxidants such as dibutylhydroxytoluene and nordihydroguaiaretic acid, and preservatives such as dehydroacetic acid. Additives for preventing accidental eating by children and pets such as pepper powder, pests such as cheese flavor, onion flavor, peanut oil and the like are added.

本発明の有害生物防除組成物は、例えば有害節足動物に直接、及び/又は有害節足動物の生息場所(植物体、動物体、土壌等)に施用することにより用いられる。   The pest control composition of the present invention is used, for example, by being applied directly to harmful arthropods and / or by applying to harmful habitats (plants, animal bodies, soil, etc.).

本発明の有害生物防除組成物を農林害虫の防除に用いる場合は、その施用量は本有機硫黄化合物及び本ネオニコチノイド化合物の合計量で通常1〜10000g/ha、好ましくは10〜500g/haである。乳剤、水和剤、フロアブル剤、マイクロカプセル製剤等は通常本有機硫黄化合物及び本ネオニコチノイド化合物の合計が1〜1000ppmとなるように水で希釈して使用し、粉剤、粒剤等は通常そのまま使用する。これらの製剤を有害節足動物から保護すべき植物に対して直接散布してもよい。これらの製剤を土壌に処理することにより土壌に棲息する有害節足動物を防除することもでき、またこれらの製剤を植物を植え付ける前の苗床に処理したり、植付時に植穴や株元に処理することもできる。さらに、本発明の有害節足動物防除剤のシート製剤を植物に巻き付けたり、植物の近傍に設置したり、株元の土壌表面に敷くなどの方法でも施用することができる。   When the pest control composition of the present invention is used for controlling agricultural and forestry pests, the application amount is usually 1 to 10,000 g / ha, preferably 10 to 500 g / ha in terms of the total amount of the organic sulfur compound and the neonicotinoid compound. It is. Emulsions, wettable powders, flowables, microcapsule preparations, etc. are usually diluted with water so that the total of the present organic sulfur compound and the present neonicotinoid compound is 1 to 1000 ppm, and powders, granules, etc. are usually used. Use as is. These formulations may be applied directly to plants that are to be protected from harmful arthropods. By treating these preparations in the soil, harmful arthropods that inhabit the soil can be controlled, and these preparations can be treated on the nursery before planting, It can also be processed. Furthermore, the sheet preparation of the harmful arthropod control agent of the present invention can be applied by a method such as wrapping around a plant, installing in the vicinity of the plant, or laying on the soil surface of the plant source.

本発明の有害節足動物防除剤は、畑、水田、芝生、果樹園等の農耕地において使用することができ、当該農耕地で栽培されている作物に対して薬害を与えることなく、当該農耕地における有害節足動物を防除することができる場合がある。   The harmful arthropod control agent of the present invention can be used in farmland such as fields, paddy fields, lawns, orchards, and without causing phytotoxicity to crops cultivated in the farmland. It may be possible to control harmful arthropods on the ground.

そのような作物としては、具体的には下記の作物が挙げられる。
農作物;トウモロコシ、イネ、コムギ、オオムギ、ライムギ、エンバク、ソルガム、ワタ、ダイズ、ピーナッツ、ソバ、テンサイ、ナタネ、ヒマワリ、サトウキビ、タバコ等、
野菜;ナス科野菜(ナス、トマト、ピーマン、トウガラシ、ジャガイモ等)、ウリ科野菜(キュウリ、カボチャ、ズッキーニ、スイカ、メロン等)、アブラナ科野菜(ダイコン、カブ、セイヨウワサビ、コールラビ、ハクサイ、キャベツ、カラシナ、ブロッコリー、カリフラワー等)、キク科野菜(ゴボウ、シュンギク、アーティチョーク、レタス等)、ユリ科野菜(ネギ、タマネギ、ニンニク、アスパラガス)、セリ科野菜(ニンジン、パセリ、セロリ、アメリカボウフウ等)、アカザ科野菜(ホウレンソウ、フダンソウ等)、シソ科野菜(シソ、ミント、バジル等)、イチゴ、サツマイモ、ヤマノイモ、サトイモ等、
花卉、
観葉植物、
果樹;仁果類(リンゴ、セイヨウナシ、ニホンナシ、カリン、マルメロ等)、核果類(モモ、スモモ、ネクタリン、ウメ、オウトウ、アンズ、プルーン等)、カンキツ類(ウンシュウミカン、オレンジ、レモン、ライム、グレープフルーツ等)、堅果類(クリ、クルミ、ハシバミ、アーモンド、ピスタチオ、カシューナッツ、マカダミアナッツ等)、液果類(ブルーベリー、クランベリー、ブラックベリー、ラズベリー等)、ブドウ、カキ、オリーブ、ビワ、バナナ、コーヒー、ナツメヤシ、ココヤシ等、
果樹以外の樹;チャ、クワ、花木、街路樹(トネリコ、カバノキ、ハナミズキ、ユーカリ、イチョウ、ライラック、カエデ、カシ、ポプラ、ハナズオウ、フウ、プラタナス、ケヤキ、クロベ、モミノキ、ツガ、ネズ、マツ、トウヒ、イチイ)等。
Specific examples of such crops include the following crops.
Agricultural crops: corn, rice, wheat, barley, rye, oat, sorghum, cotton, soybean, peanut, buckwheat, sugar beet, rapeseed, sunflower, sugarcane, tobacco, etc.
Vegetables: Solanum vegetables (eggplants, tomatoes, peppers, peppers, potatoes, etc.), Cucurbitaceae vegetables (cucumbers, pumpkins, zucchini, watermelons, melons, etc.), cruciferous vegetables (radish, turnip, horseradish, kohlrabi, Chinese cabbage, cabbage) , Mustard, broccoli, cauliflower, etc.), asteraceae vegetables (burdock, shungiku, artichoke, lettuce, etc.), liliaceae vegetables (leek, onion, garlic, asparagus), celeryaceae vegetables (carrot, parsley, celery, American scallop, etc.) ), Red crustacean vegetables (spinach, chard, etc.), perilla vegetables (perilla, mint, basil, etc.), strawberries, sweet potatoes, yam, taro, etc.
Bridegroom,
Foliage plant,
Fruit trees; pears (apples, pears, Japanese pears, quince, quince, etc.), nuclear fruits (peaches, plums, nectarines, umes, sweet cherry, apricots, prunes, etc.), citrus (satsuma mandarin, orange, lemon, lime, grapefruit) ), Nuts (chestnut, walnut, hazel, almond, pistachio, cashew nut, macadamia nut, etc.), berries (blueberry, cranberry, blackberry, raspberry, etc.), grape, oyster, olive, loquat, banana, coffee, Date palm, coconut palm, etc.
Trees other than fruit trees: Cha, mulberry, flowering trees, street trees (ash, birch, dogwood, eucalyptus, ginkgo, lilac, maple, oak, poplar, redwood, fu, sycamore, zelkova, black bean, peach tree, Tsuga, rat, pine, Spruce, yew) etc.

上記作物には、イソキサフルトール等のHPPD阻害剤、イマゼタピル、チフェンスルフロンメチル等のALS阻害剤、EPSP合成酵素阻害剤、グルタミン合成酵素阻害剤、アセチルCoAカルボキシラーゼ阻害剤、ブロモキシニル等の除草剤に対する耐性が、古典的な育種法、もしくは遺伝子組換え技術により付与された作物も含まれる。
古典的な育種法により耐性が付与された作物としては、例えば、イマゼタピル等のイミダゾリノン系除草剤耐性のクリアーフィールド(Clearfield)<登録商標>カノーラ、チフェンスルフロンメチル等のスルホニル尿素系ALS阻害型除草剤耐性のSTSダイズ等がある。同様に古典的な育種法によりトリオンオキシム系、アリールオキシフェノキシプロピオン酸系除草剤などのアセチルCoAカルボキシラーゼ阻害剤に耐性が付与された作物の例としてSRコーン等がある。アセチルCoAカルボキシラーゼ阻害剤に耐性が付与された作物はプロシーディングズ・オブ・ザ・ナショナル・アカデミー・オブ・サイエンシーズ・オブ・ザ・ユナイテッド・ステーツ・オブ・アメリカ(Proc.Natl.Acad.Sci.USA)87巻、7175〜7179頁(1990年)等に記載されている。またアセチルCoAカルボキシラーゼ阻害剤に耐性の変異アセチルCoAカルボキシラーゼがウィード・サイエンス(Weed Science)53巻、728〜746頁(2005年)等に報告されており、こうした変異アセチルCoAカルボキシラーゼ遺伝子を遺伝子組換え技術により作物に導入するかもしくは抵抗性付与に関わる変異を作物アセチルCoAカルボキシラーゼに導入する事により、アセチルCoAカルボキシラーゼ阻害剤に耐性の作物を作出することができる。さらに、キメラプラスティ技術(Gura T. 1999. Repairing the Genome’s Spelling Mistakes. Science 285: 316−318.)に代表される塩基置換変異導入核酸を作物細胞内に導入して作物(アセチルCoAカルボキシラーゼ/除草剤標的)遺伝子に部位特異的アミノ酸置換変異を引き起こすことにより、(アセチルCoAカルボキシラーゼ阻害剤/除草剤)に耐性の作物を作出することができる。
The above crops include HPPD inhibitors such as isoxaflutol, ALS inhibitors such as imazetapyr and thifensulfuron methyl, EPSP synthase inhibitors, glutamine synthase inhibitors, acetyl CoA carboxylase inhibitors, herbicides such as bromoxynil Also included are crops that have been rendered resistant to resistance by classical breeding methods or genetic engineering techniques.
Examples of crops to which tolerance has been imparted by classical breeding methods include, for example, imidazolinone herbicide-resistant Clearfield (registered trademark) sulfonylurea-based ALS-inhibiting types such as canola and thifensulfuron-methyl Examples include herbicide-resistant STS soybeans. Similarly, SR corn and the like are examples of crops to which tolerance has been imparted to acetyl CoA carboxylase inhibitors such as trion oxime and aryloxyphenoxypropionic acid herbicides by classical breeding methods. Crops that have been rendered tolerant to acetyl CoA carboxylase inhibitors are Proceedings of the National Academy of Sciences of the United States of America (Proc. Natl. Acad. Sci. USA) 87, 7175-7179 (1990). A mutant acetyl CoA carboxylase resistant to an acetyl CoA carboxylase inhibitor has been reported in Weed Science 53, 728-746 (2005), and the like. By introducing a mutation related to imparting resistance into a crop acetyl-CoA carboxylase, a crop resistant to the acetyl-CoA carboxylase inhibitor can be produced. Furthermore, nucleic acid introduced with a base substitution mutation represented by chimera plastic technology (Gura T. 1999. Repairing the Genome's Spelling Mistakes. Science 285: 316-318.) Is introduced into a crop cell (acetyl CoA carboxylase). By generating site-specific amino acid substitution mutations in the (herbicide target) gene, crops resistant to (acetyl CoA carboxylase inhibitor / herbicide) can be created.

また、遺伝子組換え技術により耐性が付与された作物としては、例えばグリホサートやグルホシネート耐性のトウモロコシ品種があり、ラウンドアップレディ(RoundupReady)<登録商標>及びリバティーリンク(LibertyLink)<登録商標>等の商品名で既に販売されている。   Examples of crops to which tolerance is imparted by genetic recombination technology include glyphosate and glufosinate-resistant corn varieties, such as Roundup Ready (registered trademark) and Liberty Link (registered trademark). Already sold by name.

上記作物には、遺伝子組換え技術を用いて、例えば、バチルス属で知られている選択的毒素等を合成する事が可能となった作物も含まれる。
この様な遺伝子組換え植物で発現される殺虫性毒素としては、例えばバチルス・セレウス(Bacillus cereus)やバチルス・ポピリエ(Bacillus popilliae)由来の殺虫性タンパク;バチルス・チューリンゲンシス(Bacillus thuringiensis)由来のCry1Ab、Cry1Ac、Cry1F、Cry1Fa2、Cry2Ab、Cry3A、Cry3Bb1またはCry9C等のδ−エンドトキシン、VIP1、VIP2、VIP3またはVIP3A等の殺虫性タンパク;線虫由来の殺虫性タンパク;さそり毒素、クモ毒素、ハチ毒素または昆虫特異的神経毒素等の動物によって産生される毒素;糸条菌類毒素;植物レクチン;アグルチニン;トリプシン阻害剤、セリンプロテアーゼ阻害剤、パタチン、シスタチン、パパイン阻害剤等のプロテアーゼ阻害剤;リシン、トウモロコシ−RIP、アブリン、サポリン、ブリオジン等のリボゾーム不活性化タンパク(RIP);3−ヒドロキシステロイドオキシダーゼ、エクジステロイド−UDP−グルコシルトランスフェラーゼ、コレステロールオキシダーゼ等のステロイド代謝酵素;エクダイソン阻害剤;HMG−CoAリダクターゼ;ナトリウムチャネル阻害剤、カルシウムチャネル阻害剤等のイオンチャネル阻害剤;幼若ホルモンエステラーゼ;利尿ホルモン受容体;スチルベンシンターゼ;ビベンジルシンターゼ;キチナーゼ;グルカナーゼ等が挙げられる。
またこの様な遺伝子組換え作物で発現される毒素として、Cry1Ab、Cry1Ac、Cry1F、Cry1Fa2、Cry2Ab、Cry3A、Cry3Bb1またはCry9C等のδ−エンドトキシンタンパク、VIP1、VIP2、VIP3またはVIP3A等の殺虫性タンパクのハイブリッド毒素、一部を欠損した毒素、修飾された毒素も含まれる。ハイブリッド毒素は組換え技術を用いて、これらタンパクの異なるドメインの新しい組み合わせによって作り出される。一部を欠損した毒素としては、アミノ酸配列の一部を欠損したCry1Abが知られている。修飾された毒素としては、天然型の毒素のアミノ酸の1つまたは複数が置換されている。
これら毒素の例およびこれら毒素を合成する事ができる組換え植物は、例えばEP−A−0374753、WO93/07278、WO95/34656、EP−A−0427529、EP−A−451878、WO03/052073等に記載されている。
これらの組換え植物に含まれる毒素は、特に、甲虫目害虫、双翅目害虫、鱗翅目害虫への耐性を植物へ付与する。
Examples of the crops include crops that can synthesize selective toxins known in the genus Bacillus using genetic recombination techniques.
Examples of insecticidal toxins expressed in such genetically modified plants include insecticidal proteins derived from Bacillus cereus and Bacillus popillie; Cry1Ab derived from Bacillus thuringiensis , Cry1Ac, Cry1F, Cry1Fa2, Cry2Ab, Cry3A, Cry3Bb1 or Cry9C, etc., insecticidal proteins such as VIP1, VIP2, VIP3 or VIP3A; nematode-derived insecticidal proteins; Toxins produced by animals such as insect-specific neurotoxins; filamentous fungi toxins; plant lectins; agglutinins; trypsin inhibitors, serine protease inhibitors Agents, protease inhibitors such as patatin, cystatin, papain inhibitor; ribosome inactivating protein (RIP) such as lysine, corn-RIP, abrin, saporin, bryodin; 3-hydroxysteroid oxidase, ecdysteroid-UDP-glucosyl Steroid metabolic enzymes such as transferase and cholesterol oxidase; ecdysone inhibitor; HMG-CoA reductase; ion channel inhibitors such as sodium channel inhibitor and calcium channel inhibitor; juvenile hormone esterase; diuretic hormone receptor; stilbene synthase; Synthase; chitinase; glucanase and the like.
Further, as toxins expressed in such genetically modified crops, insecticidal proteins such as Cry1Ab, Cry1Ac, Cry1F, Cry1Fa2, Cry2Ab, Cry3A, Cry3Bb1 or Cry9C, and other insecticidal proteins such as VIP1, VIP2, VIP3 or VIP3A Also included are hybrid toxins, partially defective toxins, and modified toxins. Hybrid toxins are produced by new combinations of different domains of these proteins using recombinant technology. As a toxin lacking a part, Cry1Ab lacking a part of the amino acid sequence is known. In the modified toxin, one or more amino acids of the natural toxin are substituted.
Examples of these toxins and recombinant plants capable of synthesizing these toxins are disclosed in, for example, EP-A-0374753, WO93 / 07278, WO95 / 34656, EP-A-0427529, EP-A-451878, WO03 / 052073, etc. Are listed.
The toxins contained in these recombinant plants particularly confer resistance to Coleoptera pests, Diptera pests, and Lepidoptera pests.

また、1つもしくは複数の殺虫性の害虫抵抗性遺伝子を含み、1つまたは複数の毒素を発現する遺伝子組換え植物は既に知られており、いくつかのものは市販されている。これら遺伝子組換え植物の例として、イールドガード(YieldGard)<登録商標>(Cry1Ab毒素を発現するトウモロコシ品種)、イールドガードルートワーム(YieldGard Rootworm)<登録商標>(Cry3Bb1毒素を発現するトウモロコシ品種)、イールドガードプラス(YieldGard Plus)<登録商標>(Cry1AbとCry3Bb1毒素を発現するトウモロコシ品種)、ハーキュレックスI(Herculex I)<登録商標>(Cry1Fa2毒素とグルホシネートへの耐性を付与する為のホスフィノトリシン N−アセチルトランスフェラーゼ(PAT)を発現するトウモロコシ品種)、NuCOTN33B<登録商標>(Cry1Ac毒素を発現するワタ品種)、ボルガードI(Bollgard I)<登録商標>(Cry1Ac毒素を発現するワタ品種)、ボルガードII(Bollgard II)<登録商標>(Cry1AcとCry2Ab毒素を発現するワタ品種)、VIPCOT<登録商標>(VIP毒素を発現するワタ品種)、ニューリーフ(NewLeaf)<登録商標>(Cry3A毒素を発現するジャガイモ品種)、ネイチャーガード アグリシュアー GT アドバンテージ(NatureGard<登録商標>Agrisure<登録商標>GT Advantage)(GA21 グリホサート耐性形質)、アグリシュアー CB アドバンテージ(Agrisure<登録商標> CB Advantage)(Bt11コーンボーラー(CB)形質)、プロテクタ(Protecta)<登録商標>等が挙げられる。   In addition, genetically modified plants that contain one or more insecticidal pest resistance genes and express one or more toxins are already known and some are commercially available. Examples of these genetically modified plants include YieldGuard (registered trademark) (a corn variety expressing Cry1Ab toxin), YieldGuard Rootworm (registered trademark) (a corn variety expressing Cry3Bb1 toxin), YieldGuard Plus (registered trademark) (maize variety expressing Cry1Ab and Cry3Bb1 toxin), Herculex I (registered trademark) (phosphino to confer resistance to Cry1Fa2 toxin and glufosinate Corn varieties expressing tricine N-acetyltransferase (PAT)), NuCOTN33B <(registered trademark)> (cotton varieties expressing Cry1Ac toxin), Volgaard I (Bollg) rd I) <registered trademark> (cotton variety expressing Cry1Ac toxin), Volgard II (registered trademark) (cotton variety expressing Cry1Ac and Cry2Ab toxin), VIPCOT <registered trademark> (expressing VIP toxin) Cotton cultivars), NewLeaf <registered trademark> (potato cultivar expressing Cry3A toxin), Natureguard Agurisure GT Advantage (NatureGuard <Agriure <registered trademark> GT Advantage> (GA21 glyphosate resistant trait), Aggresure CB Advantage (Agriure <(R)> CB Advantage) (Bt11 corn borer (CB) trait), Protector (<Trademark>), and the like.

上記作物には、遺伝子組換え技術を用いて、選択的な作用を有する抗病原性物質を産生する能力を付与されたものも含まれる。
抗病原性物質としては、例えばPRタンパク(PRPs、EP−A−0392225に記載されている);ナトリウムチャネル阻害剤、カルシウムチャネル阻害剤(ウイルスが産生するKP1、KP4、KP6毒素等が知られている)等のイオンチャネル阻害剤;スチルベンシンターゼ;ビベンジルシンターゼ;キチナーゼ;グルカナーゼ;ペプチド抗生物質、ヘテロ環を有する抗生物質、植物病害抵抗性に関与するタンパク因子(植物病害抵抗性遺伝子と呼ばれ、WO03/000906に記載されている)等の微生物が産生する物質等が挙げられる。このような抗病原性物質とそれを産生する遺伝子組換え植物は、EP−A−0392225、WO95/33818、EP−A−0353191等に記載されている。
The crops include those given the ability to produce an anti-pathogenic substance having a selective action using genetic recombination technology.
Examples of anti-pathogenic substances include PR proteins (described in PRPs, EP-A-0392225); sodium channel inhibitors, calcium channel inhibitors (virus-produced KP1, KP4, KP6 toxins, etc.) Stilbene synthase; bibenzyl synthase; chitinase; glucanase; peptide antibiotics, heterocyclic antibiotics, protein factors involved in plant disease resistance (called plant disease resistance genes) , Described in WO03 / 000906), and the like. Such anti-pathogenic substances and genetically modified plants that produce them are described in EP-A-0392225, WO95 / 33818, EP-A-0353191, and the like.

本発明の有害生物防除組成物を防疫用として用いる場合は、その施用量は空間に適用するときは本有機硫黄化合物及び本ネオニコチノイド化合物の合計で通常0.001〜10mg/m3であり、平面に適用するときは0.001〜100mg/m2である。乳剤、水和剤、フロアブル剤等は通常は本有機硫黄化合物及び本ネオニコチノイド化合物の合計の濃度が0.01〜10000ppmとなるように水で希釈して施用し、油剤、エアゾール、燻煙剤、毒餌等は通常そのまま施用する。 When the pest control composition of the present invention is used for prevention of epidemics, the application rate is usually 0.001 to 10 mg / m 3 in total for the present organic sulfur compound and the present neonicotinoid compound when applied to space. When applied to a plane, it is 0.001 to 100 mg / m 2 . Emulsions, wettable powders, flowables, etc. are usually diluted with water so that the total concentration of the organic sulfur compound and the neonicotinoid compound is 0.01 to 10000 ppm. Agents, poison baits, etc. are usually applied as they are.

本発明の有害生物防除組成物をウシ、ウマ、ブタ、ヒツジ、ヤギ、ニワトリ用の家畜、イヌ、ネコ、ラット、マウス等の小動物の外部寄生虫防除に用いる場合は、獣医学的に公知な経口的または非経口的な投与方法にて、動物に使用することができる。具体的な使用方法としては、全身抑制を目的にする場合には、例えば錠剤(糖衣錠、フィルムコーティング錠を含む)、丸剤、カプセル剤、顆粒剤、細粒剤、散剤、乳剤、懸濁剤、フィルム剤等の経口剤;および注射剤(例、皮下注射剤、静脈内注射剤、筋肉内注射剤、腹腔内注射剤、点滴剤、徐放性注射剤)、坐剤(例、直腸坐剤、膣坐剤)、埋め込み剤(埋め込み錠、生体内分解性ポリマーを基材として成形されたもの、チタン等の生体適合性金属のカプセルに封入され、一定速度で有効成分を放出するものを含む)等の非経口剤等が挙げられる。なお、経口投与の際には、上記の製剤を飼料に混入して用いることができる。
また、非全身的抑制を目的とする場合には、例えば油剤若しくは水性液剤を噴霧する、外用剤(例、経皮製剤、軟膏剤)をぬる、ポアオン処理若しくはスポットオン処理を行う、シャンプー製剤で動物を洗う又は樹脂製剤を首輪や耳札にして動物に付ける等の方法により用いられる。動物体に投与する場合の本有機硫黄化合物及び本ネオニコチノイド化合物の合計量は、通常動物の体重1kgに対して、0.1〜1000mgの範囲である。
When the pest control composition of the present invention is used to control ectoparasites of cattle, horses, pigs, sheep, goats, chickens, small animals such as dogs, cats, rats, mice, etc., it is well known in veterinary medicine. It can be used for animals by oral or parenteral administration. Specifically, for the purpose of systemic suppression, for example, tablets (including sugar-coated tablets and film-coated tablets), pills, capsules, granules, fine granules, powders, emulsions, suspensions , Oral preparations such as films; and injections (eg, subcutaneous injections, intravenous injections, intramuscular injections, intraperitoneal injections, drops, sustained-release injections), suppositories (eg, rectal seats) Agents, vaginal suppositories), implants (embedded tablets, molded with biodegradable polymers as base materials, encapsulated in capsules of biocompatible metals such as titanium and releasing active ingredients at a constant rate And the like) and the like. In the case of oral administration, the above preparation can be used by mixing with feed.
In the case of non-systemic suppression, for example, spraying an oil or aqueous solution, applying external preparations (eg, transdermal preparations, ointments), pour-on treatment or spot-on treatment, It is used by a method such as washing the animal or attaching the resin preparation to the animal with a collar or ear tag. The total amount of the present organic sulfur compound and the present neonicotinoid compound when administered to an animal body is usually in the range of 0.1 to 1000 mg per 1 kg body weight of the animal.

上記の獣医学的な投与方法にて用いられる製剤剤形には、製剤素材として慣用の各種有機あるいは無機担体物質が用いられ、固形製剤における賦形剤、滑沢剤、結合剤、崩壊剤;液状製剤における溶剤、溶解補助剤、懸濁化剤、等張化剤、緩衝剤、無痛化剤などとして配合される。また必要に応じて、防腐剤、抗酸化剤、着色剤、甘味剤などの製剤添加物を用いることもできる。賦形剤の好適な例としては、乳糖、白糖、D−マンニトール、D−ソルビトール、デンプン、α化デンプン、デキストリン、結晶セルロース、低置換度ヒドロキシプロピルセルロース、カルボキシメチルセルロースナトリウム、アラビアゴム、デキストリン、プルラン、軽質無水ケイ酸、合成ケイ酸アルミニウム、メタケイ酸アルミン酸マグネシウムなどが挙げられる。滑沢剤の好適な例としては、ステアリン酸マグネシウム、ステアリン酸カルシウム、タルク、コロイドシリカなどが挙げられる。結合剤の好適な例としては、α化デンプン、ショ糖、ゼラチン、アラビアゴム、メチルセルロース、カルボキシメチルセルロース、カルボキシメチルセルロースナトリウム、結晶セルロース、白糖、D−マンニトール、トレハロース、デキストリン、プルラン、ヒドロキシプロピルセルロース、ヒドロキシプロピルメチルセルロース、ポリビニルピロリドンなどが挙げられる。崩壊剤の好適な例としては、乳糖、白糖、デンプン、カルボキシメチルセルロース、カルボキシメチルセルロースカルシウム、クロスカルメロースナトリウム、カルボキシメチルスターチナトリウム、軽質無水ケイ酸、低置換度ヒドロキシプロピルセルロースなどが挙げられる。溶剤の好適な例としては、注射用水、生理的食塩水、リンゲル液、アルコール、プロピレングリコール、ポリエチレングリコール、ゴマ油、トウモロコシ油、オリーブ油、綿実油などが挙げられる。溶解補助剤の好適な例としては、ポリエチレングリコール、プロピレングリコール、D−マンニトール、トレハロース、安息香酸ベンジル、エタノール、トリスアミノメタン、コレステロール、トリエタノールアミン、炭酸ナトリウム、クエン酸ナトリウム、サリチル酸ナトリウム、酢酸ナトリウムなどが挙げられる。 懸濁化剤の好適な例としては、ステアリルトリエタノールアミン、ラウリル硫酸ナトリウム、ラウリルアミノプロピオン酸、レシチン、塩化ベンザルコニウム、塩化ベンゼトニウム、モノステアリン酸グリセリンなどの界面活性剤;例えばポリビニルアルコール、ポリビニルピロリドン、カルボキシメチルセルロースナトリウム、メチルセルロース、ヒドロキシメチルセルロース、ヒドロキシエチルセルロース、ヒドロキシプロピルセルロースなどの親水性高分子;ポリソルベート類、ポリオキシエチレン硬化ヒマシ油などが挙げられる。等張化剤の好適な例としては、塩化ナトリウム、グリセリン、D−マンニトール、D−ソルビトール、ブドウ糖などが挙げられる。緩衝剤の好適な例としては、リン酸塩、酢酸塩、炭酸塩、クエン酸塩などの緩衝液などが挙げられる。無痛化剤の好適な例としては、ベンジルアルコールなどが挙げられる。防腐剤の好適な例としては、パラオキシ安息香酸エステル類、クロロブタノール、ベンジルアルコール、フェネチルアルコール、デヒドロ酢酸、ソルビン酸などが挙げられる。抗酸化剤の好適な例としては、亜硫酸塩、アスコルビン酸塩などが挙げられる。着色剤の好適な例としては、水溶性食用タール色素(例、食用赤色2号および3号、食用黄色4号および5号、食用青色1号および2号などの食用色素、水不溶性レーキ色素(例、前記水溶性食用タール色素のアルミニウム塩など)、天然色素(例、β−カロチン、クロロフィル、ベンガラなど)などが挙げられる。
また、注射剤は、有効成分を分散剤(例、ポリソルベート80,ポリオキシエチレン硬化ヒマシ油60など,ポリエチレングリコール,カルボキシメチルセルロース,アルギン酸ナトリウムなど)、保存剤(例、メチルパラベン,プロピルパラベン,ベンジルアルコール,クロロブタノール,フェノールなど)、等張化剤(例、塩化ナトリウム,グリセリン,D−マンニトール,D−ソルビトール,ブドウ糖など)などと共に水性溶剤(例、蒸留水,生理的食塩水,リンゲル液等)あるいは油性溶剤(例、オリーブ油,ゴマ油,綿実油,トウモロコシ油などの植物油、プロピレングリコール等)などに溶解、懸濁あるいは乳化することにより製造される。この際、所望により溶解補助剤(例、サリチル酸ナトリウム,酢酸ナトリウム等)、安定剤(例、ヒト血清アルブミン等)、無痛化剤(例、ベンジルアルコール等)等の添加物を用いてもよい。注射液は、通常、適当なアンプルに充填される。
本発明の有害生物防除組成物は徐放性製剤として用いることもできる。該徐放性製剤としては、例えば水中乾燥法(o/w法、w/o/w法等)、相分離法、噴霧乾燥法あるいはこれらに準ずる方法によって製造されたマイクロカプセル(例えば、マイクロスフェア・マイクロカプセル、マイクロパーティクル等)、生体適合性ポリマーで成形されたもの等がある。
In the pharmaceutical dosage forms used in the above veterinary administration methods, various organic or inorganic carrier substances commonly used as pharmaceutical materials are used, and excipients, lubricants, binders, disintegrants in solid preparations; It is blended as a solvent, a solubilizing agent, a suspending agent, a tonicity agent, a buffering agent, a soothing agent and the like in a liquid preparation. If necessary, preparation additives such as preservatives, antioxidants, colorants, sweeteners and the like can also be used. Preferable examples of the excipient include lactose, sucrose, D-mannitol, D-sorbitol, starch, pregelatinized starch, dextrin, crystalline cellulose, low-substituted hydroxypropylcellulose, sodium carboxymethylcellulose, gum arabic, dextrin, pullulan , Light anhydrous silicic acid, synthetic aluminum silicate, magnesium aluminate metasilicate and the like. Preferable examples of the lubricant include magnesium stearate, calcium stearate, talc, colloidal silica and the like. Preferable examples of the binder include pregelatinized starch, sucrose, gelatin, gum arabic, methylcellulose, carboxymethylcellulose, sodium carboxymethylcellulose, crystalline cellulose, sucrose, D-mannitol, trehalose, dextrin, pullulan, hydroxypropylcellulose, hydroxy Examples thereof include propylmethylcellulose and polyvinylpyrrolidone. Preferable examples of the disintegrant include lactose, sucrose, starch, carboxymethylcellulose, carboxymethylcellulose calcium, croscarmellose sodium, carboxymethylstarch sodium, light anhydrous silicic acid, low substituted hydroxypropylcellulose and the like. Preferable examples of the solvent include water for injection, physiological saline, Ringer's solution, alcohol, propylene glycol, polyethylene glycol, sesame oil, corn oil, olive oil, cottonseed oil and the like. Preferable examples of the solubilizer include polyethylene glycol, propylene glycol, D-mannitol, trehalose, benzyl benzoate, ethanol, trisaminomethane, cholesterol, triethanolamine, sodium carbonate, sodium citrate, sodium salicylate, sodium acetate. Etc. Suitable examples of the suspending agent include surfactants such as stearyltriethanolamine, sodium lauryl sulfate, laurylaminopropionic acid, lecithin, benzalkonium chloride, benzethonium chloride, glyceryl monostearate; for example, polyvinyl alcohol, polyvinyl Examples include hydrophilic polymers such as pyrrolidone, sodium carboxymethylcellulose, methylcellulose, hydroxymethylcellulose, hydroxyethylcellulose, and hydroxypropylcellulose; polysorbates, polyoxyethylene hydrogenated castor oil, and the like. Preferable examples of the tonicity agent include sodium chloride, glycerin, D-mannitol, D-sorbitol, glucose and the like. Preferable examples of the buffer include buffers such as phosphate, acetate, carbonate and citrate. Preferable examples of the soothing agent include benzyl alcohol. Preferable examples of the preservative include p-hydroxybenzoates, chlorobutanol, benzyl alcohol, phenethyl alcohol, dehydroacetic acid, sorbic acid and the like. Preferable examples of the antioxidant include sulfite and ascorbate. Suitable examples of the coloring agent include water-soluble edible tar dyes (eg, edible dyes such as edible red Nos. 2 and 3, edible yellows 4 and 5, edible blue Nos. 1 and 2, and water-insoluble lake dyes ( Examples thereof include aluminum salts of the water-soluble edible tar pigments, natural pigments (eg, β-carotene, chlorophyll, bengara, etc.).
Injectables contain active ingredients as dispersants (eg, polysorbate 80, polyoxyethylene hydrogenated castor oil 60, polyethylene glycol, carboxymethyl cellulose, sodium alginate, etc.), preservatives (eg, methyl paraben, propyl paraben, benzyl alcohol, Chlorobutanol, phenol, etc.), isotonic agents (eg, sodium chloride, glycerin, D-mannitol, D-sorbitol, glucose, etc.) and other aqueous solvents (eg, distilled water, physiological saline, Ringer's solution, etc.) or oily It is produced by dissolving, suspending or emulsifying in a solvent (eg, olive oil, sesame oil, cottonseed oil, vegetable oil such as corn oil, propylene glycol, etc.). At this time, additives such as a solubilizing agent (eg, sodium salicylate, sodium acetate, etc.), a stabilizer (eg, human serum albumin), a soothing agent (eg, benzyl alcohol, etc.) may be used as desired. The injection solution is usually filled in a suitable ampoule.
The pest control composition of the present invention can also be used as a sustained-release preparation. Examples of the sustained-release preparation include microcapsules (for example, microspheres) produced by an underwater drying method (o / w method, w / o / w method, etc.), a phase separation method, a spray drying method, or a method equivalent thereto. -Microcapsules, microparticles, etc.), and those molded with biocompatible polymers.

本発明の有害生物防除組成物は他の殺虫剤、殺線虫剤、殺ダニ剤、殺菌剤、除草剤、植物生長調節剤、共力剤、肥料、土壌改良剤、動物用飼料等と混用又は併用することもできる。   The pest control composition of the present invention is mixed with other insecticides, nematicides, acaricides, fungicides, herbicides, plant growth regulators, synergists, fertilizers, soil improvers, animal feeds, etc. Or it can also use together.

以下、本発明を本有機硫黄化合物の参考製造例、本鎖式有機硫黄化合物の例、本発明の有害生物防除組成物の製剤例及び試験例によりさらに詳しく説明するが、本発明はこれらの例に限定されるものではない。
尚、本明細書において使用している略号は、以下の意味を有する。
Me:メチル基、Et:エチル基、Bn:べンジル基、Ph:フェニル基、Ts:p−トルエンスルホニル基、Ac:アセチル基。
まず、本有機硫黄化合物の製造例を、参考製造例にて示す。
Hereinafter, the present invention will be described in more detail by reference production examples of the present organic sulfur compound, examples of the chain organic sulfur compound, formulation examples and test examples of the pest control composition of the present invention. It is not limited to.
The abbreviations used in this specification have the following meanings.
Me: methyl group, Et: ethyl group, Bn: benzyl group, Ph: phenyl group, Ts: p-toluenesulfonyl group, Ac: acetyl group.
First, the manufacture example of this organic sulfur compound is shown in a reference manufacture example.

参考製造例1
N,N−ジメチルホルムアミド10mlに4−クロロベンジルメルカプタン0.78g及び1−ブロモ−3,3,3−トリフルオロプロパン0.87gを溶解し、室温で炭酸カリウム0.68gを加えて6時間撹拌した。その後、反応混合物に10%塩酸を加え、酢酸エチルで抽出した。有機層を10%塩酸および飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される4−クロロベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(1)と記す。)1.17gを得た。
本有機硫黄化合物(1)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.31(d,2H)、7.23(d,2H)、3.70(s,2H)、2.55−2.59(m,2H)、2.24−2.36(m,2H) Reference production example 1
Dissolve 0.78 g of 4-chlorobenzyl mercaptan and 0.87 g of 1-bromo-3,3,3-trifluoropropane in 10 ml of N, N-dimethylformamide, add 0.68 g of potassium carbonate at room temperature and stir for 6 hours. did. Thereafter, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 10% hydrochloric acid and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 1.17 g of 4-chlorobenzyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the present organic sulfur compound (1)) represented by the following formula. It was.
This organic sulfur compound (1)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.31 (d, 2H), 7.23 (d, 2H), 3.70 (s, 2H), 2.55 to 2.59 ( m, 2H), 2.24-2.36 (m, 2H)

参考製造例2
クロロホルム20mlに3−クロロベンジルブロマイド1.5gを溶解し、ここにチオアセトアミド0.55gを加えた後、2日間加熱還流した。その後、反応混合物を室温付近まで放冷した後、減圧下濃縮した。得られた濃縮物に1−ブロモ−3,3,3−トリフルオロプロパン1.29g、臭化テトラ−n−ブチルアンモニウム0.07g、水酸化ナトリウム11.0g、トルエン20ml及び水10mlを加え、室温で1時間激しく攪拌した。その後、反応混合物に10%塩酸を加え、酢酸エチルで抽出した。有機層を10%塩酸および飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される3−クロロベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(2)と記す。)1.47gを得た。
本有機硫黄化合物(2)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.32−7.39(m,2H)、7.19−7.29(m,2H)、3.86(s,2H)、2.62−2.66(m,2H)、2.28−2.40(m,2H) Reference production example 2
1.5 g of 3-chlorobenzyl bromide was dissolved in 20 ml of chloroform, 0.55 g of thioacetamide was added thereto, and the mixture was heated to reflux for 2 days. Thereafter, the reaction mixture was allowed to cool to near room temperature and then concentrated under reduced pressure. To the obtained concentrate was added 1.29 g of 1-bromo-3,3,3-trifluoropropane, 0.07 g of tetra-n-butylammonium bromide, 11.0 g of sodium hydroxide, 20 ml of toluene and 10 ml of water, Stir vigorously at room temperature for 1 hour. Thereafter, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 10% hydrochloric acid and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 1.47 g of 3-chlorobenzyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the present organic sulfur compound (2)) represented by the following formula. It was.
This organic sulfur compound (2)
Figure 2010150156
1 H-NMR (CDCl 3, TMS): δ (ppm) 7.32-7.39 (m, 2H), 7.19-7.29 (m, 2H), 3.86 (s, 2H), 2.62-2.66 (m, 2H), 2.28-2.40 (m, 2H)

参考製造例3
メタノール10mlに4−フルオロベンジルクロライド1.5g及びS−(3,3,3−トリフルオロプロピル)=ベンゼンチオアート0.30gを溶解し、室温でナトリウムメトキシド(28%メタノール溶液)0.3mlを滴下した。同温で12時間攪拌した後、反応混合物に10%塩酸を加え、酢酸エチルで抽出した。有機層を10%塩酸および飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される4−フルオロベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(3)と記す。)0.27gを得た。
本有機硫黄化合物(3)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.27(dd,2H)、7.02(dd,2H)、3.71(s,2H)、2.55−2.59(m,2H)、2.24−2.36(m,2H) Reference production example 3
Dissolve 1.5 g of 4-fluorobenzyl chloride and 0.30 g of S- (3,3,3-trifluoropropyl) = benzenethioate in 10 ml of methanol and add 0.3 ml of sodium methoxide (28% methanol solution) at room temperature. Was dripped. After stirring at the same temperature for 12 hours, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 10% hydrochloric acid and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 0.27 g of 4-fluorobenzyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the present organic sulfur compound (3)) represented by the following formula. It was.
This organic sulfur compound (3)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.27 (dd, 2H), 7.02 (dd, 2H), 3.71 (s, 2H), 2.55 to 2.59 ( m, 2H), 2.24-2.36 (m, 2H)

参考製造例4
クロロホルム20mlに4−ブロモベンジルブロマイド3.0gを溶解し、ここにチオアセトアミド0.90gを加えた後、10時間加熱還流した。その後、反応混合物を室温付近まで放冷した後、減圧下濃縮した。得られた濃縮物に1−ブロモ−3,3,3−トリフルオロプロパン2.12g、臭化テトラ−n−ブチルアンモニウム0.12g、水酸化ナトリウム18.0g、トルエン20ml及び水20mlを加え、室温で3時間激しく攪拌した。その後、反応混合物に10%塩酸を加え、酢酸エチルで抽出した。有機層を10%塩酸および飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される4−ブロモベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(4)と記す。)2.84gを得た。
本有機硫黄化合物(4)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.45(d,2H)、7.16(d,2H)、3.68(dd,2H)、2.54−2.58(m,2H)、2.24−2.38(m,2H) Reference production example 4
3-Bromobenzyl bromide (3.0 g) was dissolved in chloroform (20 ml), and thioacetamide (0.90 g) was added thereto, followed by heating under reflux for 10 hours. Thereafter, the reaction mixture was allowed to cool to near room temperature and then concentrated under reduced pressure. To the resulting concentrate was added 2.12 g of 1-bromo-3,3,3-trifluoropropane, 0.12 g of tetra-n-butylammonium bromide, 18.0 g of sodium hydroxide, 20 ml of toluene and 20 ml of water, Stir vigorously at room temperature for 3 hours. Thereafter, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 10% hydrochloric acid and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 2.84 g of 4-bromobenzyl = 3,3,3-trifluoropropyl = sulfide (hereinafter referred to as the present organic sulfur compound (4)) represented by the following formula. It was.
This organic sulfur compound (4)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.45 (d, 2H), 7.16 (d, 2H), 3.68 (dd, 2H), 2.54 to 2.58 ( m, 2H), 2.24-2.38 (m, 2H)

参考製造例5
メタノール20ml、4−ヨードベンジルブロマイド0.70g、S−(3,3,3−トリフルオロプロピル)=ベンゼンチオアート0.55g及びナトリウムメトキシド(28%メタノール溶液)0.5mlを用い、参考製造例3記載の方法に準じて、下式に示される4−ヨードベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(5)と記す。)0.75gを得た。
本有機硫黄化合物(5)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.65(d,2H)、7.06(d,2H)、3.68(s,2H)、2.54−2.58(m,2H)、2.24−2.36(m,2H) Reference production example 5
Reference production using 20 ml of methanol, 0.70 g of 4-iodobenzyl bromide, 0.55 g of S- (3,3,3-trifluoropropyl) = benzenethioate and 0.5 ml of sodium methoxide (28% methanol solution) According to the method described in Example 3, 0.75 g of 4-iodobenzyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the present organic sulfur compound (5)) represented by the following formula was obtained. .
This organic sulfur compound (5)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.65 (d, 2H), 7.06 (d, 2H), 3.68 (s, 2H), 2.54 to 2.58 ( m, 2H), 2.24-2.36 (m, 2H)

参考製造例6
クロロホルム20mlに4−シアノベンジルブロマイド2.0gを溶解し、ここにチオアセトアミド0.77gを加えた後、6時間加熱還流した。その後、反応混合物を室温付近まで放冷した後、減圧下濃縮した。得られた濃縮物に1−ブロモ−3,3,3−トリフルオロプロパン1.81g、臭化テトラ−n−ブチルアンモニウム0.10g、水酸化ナトリウム15.3g、トルエン20ml及び水20mlを加え、室温で2時間激しく攪拌した。その後、反応混合物に10%塩酸を加え、酢酸エチルで抽出した。有機層を10%塩酸および飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される4−シアノベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(6)と記す。)1.88gを得た。
本有機硫黄化合物(6)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.63(d,2H)、7.43(d,2H)、3.73(s,2H)、2.56−2.60(m,2H)、2.25−2.40(m,2H) Reference production example 6
In 20 ml of chloroform, 2.0 g of 4-cyanobenzyl bromide was dissolved, 0.77 g of thioacetamide was added thereto, and then the mixture was heated to reflux for 6 hours. Thereafter, the reaction mixture was allowed to cool to near room temperature and then concentrated under reduced pressure. To the resulting concentrate was added 1.81 g of 1-bromo-3,3,3-trifluoropropane, 0.10 g of tetra-n-butylammonium bromide, 15.3 g of sodium hydroxide, 20 ml of toluene and 20 ml of water, Stir vigorously at room temperature for 2 hours. Thereafter, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 10% hydrochloric acid and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 1.88 g of 4-cyanobenzyl = 3,3,3-trifluoropropyl = sulfide (hereinafter referred to as the present organic sulfur compound (6)) represented by the following formula. It was.
This organic sulfur compound (6)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.63 (d, 2H), 7.43 (d, 2H), 3.73 (s, 2H), 2.56-2.60 ( m, 2H), 2.25-2.40 (m, 2H)

参考製造例7
メタノール5ml、4−ニトロベンジルブロマイド0.20g、S−(3,3,3−トリフルオロプロピル)=ベンゼンチオアート0.18g及びナトリウムメトキシド(28%メタノール溶液)0.2mlを用い、反応時間を0.5時間にした以外は参考製造例3記載の方法に準じて、下式に示される4−ニトロベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(7)と記す。)0.19gを得た。
本有機硫黄化合物(7)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)8.22(d,2H)、7.48(d,2H)、3.81(s,2H)、2.57−2.61(m,2H)、2.28−2.39(m,2H) Reference production example 7
Reaction time with 5 ml of methanol, 0.20 g of 4-nitrobenzyl bromide, 0.18 g of S- (3,3,3-trifluoropropyl) = benzenethioate and 0.2 ml of sodium methoxide (28% methanol solution) In accordance with the method described in Reference Production Example 3, except that the time was 0.5 hours, 4-nitrobenzyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the present organic sulfur compound (7 ) 0.19 g was obtained.
This organic sulfur compound (7)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 8.22 (d, 2H), 7.48 (d, 2H), 3.81 (s, 2H), 2.57-2.61 ( m, 2H), 2.28-2.39 (m, 2H)

参考製造例8
メタノール5ml、4−(トリフルオロメチル)ベンジルブロマイド0.10g、S−(3,3,3−トリフルオロプロピル)=ベンゼンチオアート0.10g及びナトリウムメトキシド(28%メタノール溶液)0.1mlを用い、反応時間を10時間にした以外は参考製造例3記載の方法に準じて、下式に示される(4−トリフルオロメチル)ベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(8)と記す。)0.09gを得た。
本有機硫黄化合物(8)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.59(d,2H)、7.43(d,2H)、3.77(s,2H)、2.56−2.60(m,2H)、2.26−2.40(m,2H) Reference production example 8
5 ml of methanol, 0.10 g of 4- (trifluoromethyl) benzyl bromide, 0.10 g of S- (3,3,3-trifluoropropyl) = benzenethioate and 0.1 ml of sodium methoxide (28% methanol solution) (4-trifluoromethyl) benzyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the following formula) according to the method described in Reference Production Example 3 except that the reaction time was 10 hours. 0.09 g of the organic sulfur compound (8) is obtained.
This organic sulfur compound (8)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.59 (d, 2H), 7.43 (d, 2H), 3.77 (s, 2H), 2.56-2.60 ( m, 2H), 2.26-2.40 (m, 2H)

参考製造例9
N,N−ジメチルホルムアミド10ml、(3−トリフルオロメチル)ベンジルメルカプタン0.50g、1−ブロモ−3,3,3−トリフルオロプロパン0.46g及び炭酸カリウム0.36gを用い、反応時間を2時間にした以外は参考製造例1記載の方法に準じて、下式に示される(3−トリフルオロメチル)ベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(9)と記す。)0.60gを得た。
本有機硫黄化合物(9)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.42−7.64(m,4H)、3.78(s,2H)、2.57−2.64(m,2H)、2.26−2.37(m,2H) Reference production example 9
Using 10 ml of N, N-dimethylformamide, 0.50 g of (3-trifluoromethyl) benzyl mercaptan, 0.46 g of 1-bromo-3,3,3-trifluoropropane and 0.36 g of potassium carbonate, the reaction time was 2 Except for the time, (3-trifluoromethyl) benzyl = 3,3,3-trifluoropropyl = sulfide (hereinafter referred to as the present organic sulfur compound (9 ) 0.60 g was obtained.
This organic sulfur compound (9)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.42-7.64 (m, 4H), 3.78 (s, 2H), 2.57-2.64 (m, 2H), 2.26-2.37 (m, 2H)

参考製造例10
メタノール10ml、4−(1,1,2,2,2−ペンタフルオロエチル)ベンジルブロマイド0.30g、S−(3,3,3−トリフルオロプロピル)=ベンゼンチオアート0.24g及びナトリウムメトキシド(28%メタノール溶液)0.2mlを用い、参考製造例3記載の方法に準じて、下式に示される4−(1,1,2,2,2−ペンタフルオロエチル)ベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(10)と記す。)0.24gを得た。
本有機硫黄化合物(10)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.59(d,2H)、7.44(d,2H)、3.78(s,2H)、2.58−2.62(m,2H)、2.21−2.37(m,2H) Reference production example 10
10 ml of methanol, 0.30 g of 4- (1,1,2,2,2-pentafluoroethyl) benzyl bromide, 0.24 g of S- (3,3,3-trifluoropropyl) = benzenethioate and sodium methoxide 4- (1,1,2,2,2-pentafluoroethyl) benzyl represented by the following formula according to the method described in Reference Production Example 3 using 0.2 ml of (28% methanol solution) , 3-trifluoropropyl sulfide (0.24 g) (hereinafter referred to as the present organic sulfur compound (10)) was obtained.
This organic sulfur compound (10)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.59 (d, 2H), 7.44 (d, 2H), 3.78 (s, 2H), 2.58-2.62 ( m, 2H), 2.21-2.37 (m, 2H)

参考製造例11
クロロホルム5mlに4−エチニルベンジルブロマイド0.50gを溶解し、ここにチオアセトアミド0.19gを加えた後、1時間加熱還流した。その後、反応混合物を室温付近まで放冷した後、減圧下濃縮した。得られた濃縮物に1−ブロモ−3,3,3−トリフルオロプロパン0.45g、臭化テトラ−n−ブチルアンモニウム0.02g、水酸化ナトリウム3.84g、トルエン10ml及び水5mlを加え、室温で3時間激しく攪拌した。その後、反応混合物に10%塩酸を加え、酢酸エチルで抽出した。有機層を10%塩酸および飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される4−エチニルベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(11)と記す。)0.41gを得た。
本有機硫黄化合物(11)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.45(d,2H)、7.25(d,2H)、3.72(s,2H)、3.08(s,1H)、2.54−2.58(m,2H)、2.23−2.35(m,2H) Reference production example 11
4-Ethynylbenzyl bromide (0.50 g) was dissolved in chloroform (5 ml), and thioacetamide (0.19 g) was added thereto, followed by heating under reflux for 1 hour. Thereafter, the reaction mixture was allowed to cool to near room temperature and then concentrated under reduced pressure. To the obtained concentrate was added 0.45 g of 1-bromo-3,3,3-trifluoropropane, 0.02 g of tetra-n-butylammonium bromide, 3.84 g of sodium hydroxide, 10 ml of toluene and 5 ml of water, Stir vigorously at room temperature for 3 hours. Thereafter, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 10% hydrochloric acid and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 0.41 g of 4-ethynylbenzyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the present organic sulfur compound (11)) represented by the following formula. It was.
This organic sulfur compound (11)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.45 (d, 2H), 7.25 (d, 2H), 3.72 (s, 2H), 3.08 (s, 1H) 2.54-2.58 (m, 2H), 2.23-2.35 (m, 2H)

参考製造例12
メタノール10ml、4−(トリフルオロメトキシ)ベンジルブロマイド0.33g、S−(3,3,3−トリフルオロプロピル)=ベンゼンチオアート0.30g及びナトリウムメトキシド(28%メタノール溶液)0.3mlを用い、参考製造例3記載の方法に準じて、下式に示される4−(トリフルオロメトキシ)ベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(12)と記す。)0.37gを得た。
本有機硫黄化合物(12)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.34(d,2H)、7.18(d,2H)、3.73(s,2H)、2.57−2.61(m,2H)、2.25−2.37(m,2H) Reference production example 12
10 ml of methanol, 0.33 g of 4- (trifluoromethoxy) benzyl bromide, 0.30 g of S- (3,3,3-trifluoropropyl) = benzenethioate and 0.3 ml of sodium methoxide (28% methanol solution) In accordance with the method described in Reference Production Example 3, 4- (trifluoromethoxy) benzyl = 3,3,3-trifluoropropyl sulfide represented by the following formula (hereinafter referred to as the present organic sulfur compound (12)) .) 0.37 g was obtained.
This organic sulfur compound (12)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.34 (d, 2H), 7.18 (d, 2H), 3.73 (s, 2H), 2.57-2.61 ( m, 2H), 2.25-2.37 (m, 2H)

参考製造例13
メタノール10ml、4−(メチルチオ)ベンジルクロライド0.30g、S−(3,3,3−トリフルオロプロピル)=ベンゼンチオアート0.41g及びナトリウムメトキシド(28%メタノール溶液)0.4mlを用い、反応時間を3日間にした以外は参考製造例3記載の方法に準じて、下式に示される4−(メチルチオ)ベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(13)と記す。)0.39gを得た。
本有機硫黄化合物(13)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.18−7.25(m,4H)、3.70(s,2H)、2.55−2.59(m,2H)、2.50(s,3H)、2.24−2.46(m,2H) Reference production example 13
Using 10 ml of methanol, 0.30 g of 4- (methylthio) benzyl chloride, 0.41 g of S- (3,3,3-trifluoropropyl) = benzenethioate and 0.4 ml of sodium methoxide (28% methanol solution) According to the method described in Reference Production Example 3 except that the reaction time was 3 days, 4- (methylthio) benzyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the present organic sulfur compound) represented by the following formula: (Described as (13).) 0.39 g was obtained.
This organic sulfur compound (13)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.18-7.25 (m, 4H), 3.70 (s, 2H), 2.55 to 2.59 (m, 2H), 2.50 (s, 3H), 2.24-2.46 (m, 2H)

参考製造例14
メタノール10ml、4−(トリフルオロメチルチオ)ベンジルブロマイド0.20g、S−(3,3,3−トリフルオロプロピル)=ベンゼンチオアート0.17g及びナトリウムメトキシド(28%メタノール溶液)0.2mlを用い、反応時間を10時間にした以外は参考製造例3記載の方法に準じて、下式に示される4−(トリフルオロメチルチオ)ベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(14)と記す。)0.22gを得た。
本有機硫黄化合物(14)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.62(d,2H)、7.37(d,2H)、3.75(s,2H)、2.57−2.61(m,2H)、2.24−2.36(m,2H) Reference production example 14
10 ml of methanol, 0.20 g of 4- (trifluoromethylthio) benzyl bromide, 0.17 g of S- (3,3,3-trifluoropropyl) = benzenethioate and 0.2 ml of sodium methoxide (28% methanol solution) In accordance with the method described in Reference Production Example 3 except that the reaction time was 10 hours, 4- (trifluoromethylthio) benzyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the following formula) This organic sulfur compound (14) is described.) 0.22 g was obtained.
This organic sulfur compound (14)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.62 (d, 2H), 7.37 (d, 2H), 3.75 (s, 2H), 2.57-2.61 ( m, 2H), 2.24-2.36 (m, 2H)

参考製造例15
メタノール10ml、4−(メチルスルホニル)ベンジルクロライド0.26g、S−(3,3,3−トリフルオロプロピル)=ベンゼンチオアート0.30g及びナトリウムメトキシド(28%メタノール溶液)0.3mlを用い、反応時間を1時間にした以外は参考製造例3記載の方法に準じて、下式に示される4−(メチルスルホニル)ベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(15)と記す。)0.37gを得た。
本有機硫黄化合物(15)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.92(d,2H)、7.52(d,2H)、3.80(s,2H)、3.07(s,3H)、2.58−2.62(m,2H)、2.28−2.40(m,2H) Reference production example 15
10 ml of methanol, 0.26 g of 4- (methylsulfonyl) benzyl chloride, 0.30 g of S- (3,3,3-trifluoropropyl) = benzenethioate and 0.3 ml of sodium methoxide (28% methanol solution) were used. According to the method described in Reference Production Example 3 except that the reaction time was set to 1 hour, 4- (methylsulfonyl) benzyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as this organic compound) represented by the following formula: 0.37 g of the sulfur compound (15) was obtained.
This organic sulfur compound (15)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.92 (d, 2H), 7.52 (d, 2H), 3.80 (s, 2H), 3.07 (s, 3H) 2.58-2.62 (m, 2H), 2.28-2.40 (m, 2H)

参考製造例16
エタノール10mlに4−クロロ−3−フルオロベンジルクロライド1.20gを溶解し、ここにチオ尿素0.56gを加えた後、6時間加熱還流した。その後、反応混合物を室温付近まで放冷した後、減圧下濃縮した。得られた濃縮物に1−ブロモ−3,3,3−トリフルオロプロパン1.19g、臭化テトラ−n−ブチルアンモニウム0.06g、水酸化カリウム4.89g、トルエン10ml及び水10mlを加え、室温で1時間激しく攪拌した。その後、反応混合物に10%塩酸を加え、酢酸エチルで抽出した。有機層を10%塩酸および飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される4−クロロ−3−フルオロベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(16)と記す。)1.24gを得た。
本有機硫黄化合物(16)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.34(dd,1H)、7.14(d,1H)、7.04(d,1H)、3.72(s,2H)、2.56−2.60(m,2H)、2.26−2.38(m,2H) Reference Production Example 16
1.20 g of 4-chloro-3-fluorobenzyl chloride was dissolved in 10 ml of ethanol, and 0.56 g of thiourea was added thereto, followed by heating under reflux for 6 hours. Thereafter, the reaction mixture was allowed to cool to near room temperature and then concentrated under reduced pressure. To the resulting concentrate was added 1.19 g of 1-bromo-3,3,3-trifluoropropane, 0.06 g of tetra-n-butylammonium bromide, 4.89 g of potassium hydroxide, 10 ml of toluene and 10 ml of water, Stir vigorously at room temperature for 1 hour. Thereafter, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 10% hydrochloric acid and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 4-chloro-3-fluorobenzyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the present organic sulfur compound (16)) represented by the following formula 1 .24 g was obtained.
This organic sulfur compound (16)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.34 (dd, 1H), 7.14 (d, 1H), 7.04 (d, 1H), 3.72 (s, 2H) 2.56-2.60 (m, 2H), 2.26-2.38 (m, 2H)

参考製造例17
メタノール10ml、4−クロロ−2−フルオロベンジルブロマイド0.29g、S−(3,3,3−トリフルオロプロピル)=ベンゼンチオアート0.30g及びナトリウムメトキシド(28%メタノール溶液)0.3mlを用い、反応時間を1時間にした以外は参考製造例3記載の方法に準じて、下式に示される4−クロロ−2−フルオロベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(17)と記す。)0.25gを得た。
本有機硫黄化合物(17)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.25−7.27(m,1H)、7.09−7.14(m,2H)、3.73(s,2H)、2.60−2.64(m,2H)、2.29−2.41(m,2H) Reference Production Example 17
10 ml of methanol, 0.29 g of 4-chloro-2-fluorobenzyl bromide, 0.30 g of S- (3,3,3-trifluoropropyl) = benzenethioate and 0.3 ml of sodium methoxide (28% methanol solution) In accordance with the method described in Reference Production Example 3 except that the reaction time was 1 hour, 4-chloro-2-fluorobenzyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the following formula). 0.25 g of this organic sulfur compound (17) is obtained.
This organic sulfur compound (17)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.25-7.27 (m, 1H), 7.09-7.14 (m, 2H), 3.73 (s, 2H), 2.60-2.64 (m, 2H), 2.29-2.41 (m, 2H)

参考製造例18
エタノール10mlに4−クロロ−3,5−ジフルオロベンジルクロライド0.50gを溶解し、ここにチオ尿素0.21gを加えた後、6時間加熱還流した。その後、反応混合物を室温付近まで放冷した後、減圧下濃縮した。得られた濃縮物に1−ブロモ−3,3,3−トリフルオロプロパン0.45g、臭化テトラ−n−ブチルアンモニウム0.02g、水酸化カリウム1.87g、トルエン10ml及び水5mlを加え、室温で3時間激しく攪拌した。その後、反応混合物に10%塩酸を加え、酢酸エチルで抽出した。有機層を10%塩酸および飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される4−クロロ−3,5−ジフルオロベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(18)と記す。)0.42gを得た。
本有機硫黄化合物(18)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)6.97(d,2H)、3.68(s,2H)、2.57−2.65(m,2H)、2.28−2.40(m,2H) Reference Production Example 18
In 10 ml of ethanol, 0.50 g of 4-chloro-3,5-difluorobenzyl chloride was dissolved, 0.21 g of thiourea was added thereto, and the mixture was heated to reflux for 6 hours. Thereafter, the reaction mixture was allowed to cool to near room temperature and then concentrated under reduced pressure. To the obtained concentrate was added 0.45 g of 1-bromo-3,3,3-trifluoropropane, 0.02 g of tetra-n-butylammonium bromide, 1.87 g of potassium hydroxide, 10 ml of toluene and 5 ml of water, Stir vigorously at room temperature for 3 hours. Thereafter, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 10% hydrochloric acid and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 4-chloro-3,5-difluorobenzyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the present organic sulfur compound (18)) represented by the following formula. ) 0.42 g was obtained.
This organic sulfur compound (18)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 6.97 (d, 2H), 3.68 (s, 2H), 2.57-2.65 (m, 2H), 2.28- 2.40 (m, 2H)

参考製造例19
エタノール10mlに3,4−ジクロロベンジルクロライド1.00gを溶解し、ここにチオ尿素0.43gを加えた後、4時間加熱還流した。その後、反応混合物を室温付近まで放冷した後、減圧下濃縮した。得られた濃縮物に1−ブロモ−3,3,3−トリフルオロプロパン0.91g、臭化テトラ−n−ブチルアンモニウム0.05g、水酸化カリウム3.13g、トルエン10ml及び水15mlを加え、室温で6時間激しく攪拌した。その後、反応混合物に10%塩酸を加え、酢酸エチルで抽出した。有機層を10%塩酸および飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される3,4−ジクロロベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(19)と記す。)1.14gを得た。
本有機硫黄化合物(19)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.39−7.42(m,2H)、7.14(dd,1H)、3.68(s,2H)、2.56−2.60(m,2H)、2.29−2.39(m,2H) Reference Production Example 19
1.00 g of 3,4-dichlorobenzyl chloride was dissolved in 10 ml of ethanol, and 0.43 g of thiourea was added thereto, followed by heating under reflux for 4 hours. Thereafter, the reaction mixture was allowed to cool to near room temperature and then concentrated under reduced pressure. To the obtained concentrate was added 0.91 g of 1-bromo-3,3,3-trifluoropropane, 0.05 g of tetra-n-butylammonium bromide, 3.13 g of potassium hydroxide, 10 ml of toluene and 15 ml of water, Stir vigorously at room temperature for 6 hours. Thereafter, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 10% hydrochloric acid and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 3,4-dichlorobenzyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the present organic sulfur compound (19)) represented by the following formula: 1.14 g Got.
This organic sulfur compound (19)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.39-7.42 (m, 2H), 7.14 (dd, 1H), 3.68 (s, 2H), 2.56- 2.60 (m, 2H), 2.29-2.39 (m, 2H)

参考製造例20
エタノール10mlに4−クロロ−3−(トリフルオロメチル)ベンジルブロマイド0.62gを溶解し、ここにチオ尿素0.19gを加えた後、6時間加熱還流した。その後、反応混合物を室温付近まで放冷した後、減圧下濃縮した。得られた濃縮物に1−ブロモ−3,3,3−トリフルオロプロパン0.40g、臭化テトラ−n−ブチルアンモニウム0.02g、水酸化カリウム1.66g、トルエン10ml及び水10mlを加え、室温で3時間激しく攪拌した。その後、反応混合物に10%塩酸を加え、酢酸エチルで抽出した。有機層を10%塩酸および飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される4−クロロ−3−(トリフルオロメチル)ベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(20)と記す。)0.42gを得た。
本有機硫黄化合物(20)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.63(s,1H)、7.41−7.48(m,2H)、3.74(s,2H)、2.57−2.61(m,2H)、2.28−2.40(m,2H) Reference Production Example 20
In 10 ml of ethanol, 0.62 g of 4-chloro-3- (trifluoromethyl) benzyl bromide was dissolved, 0.19 g of thiourea was added thereto, and then the mixture was heated to reflux for 6 hours. Thereafter, the reaction mixture was allowed to cool to near room temperature and then concentrated under reduced pressure. To the obtained concentrate was added 0.40 g of 1-bromo-3,3,3-trifluoropropane, 0.02 g of tetra-n-butylammonium bromide, 1.66 g of potassium hydroxide, 10 ml of toluene and 10 ml of water, Stir vigorously at room temperature for 3 hours. Thereafter, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 10% hydrochloric acid and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 4-chloro-3- (trifluoromethyl) benzyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the present organic sulfur compound (20)) represented by the following formula: 0.42 g was obtained.
This organic sulfur compound (20)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.63 (s, 1H), 7.41-7.48 (m, 2H), 3.74 (s, 2H), 2.57- 2.61 (m, 2H), 2.28-2.40 (m, 2H)

参考製造例21
クロロホルム5mlに3,4−ジフルオロベンジルブロマイド0.50gを溶解し、ここにチオアセトアミド0.18gを加えた後、10時間加熱還流した。その後、反応混合物を室温付近まで放冷した後、減圧下濃縮した。得られた濃縮物に1−ブロモ−3,3,3−トリフルオロプロパン0.43g、臭化テトラ−n−ブチルアンモニウム0.02g、水酸化ナトリウム3.60g、トルエン20ml及び水10mlを加え、室温で6時間激しく攪拌した。その後、反応混合物に10%塩酸を加え、酢酸エチルで抽出した。有機層を10%塩酸および飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される3,4−ジフルオロベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(21)と記す。)0.46gを得た。
本有機硫黄化合物(21)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.00−7.18(m,3H)、3.66(dd,2H)、2.56−2.60(m,2H)、2.27−2.35(m,2H) Reference Production Example 21
0.50 g of 3,4-difluorobenzyl bromide was dissolved in 5 ml of chloroform, and 0.18 g of thioacetamide was added thereto, followed by heating under reflux for 10 hours. Thereafter, the reaction mixture was allowed to cool to near room temperature and then concentrated under reduced pressure. To the obtained concentrate was added 0.43 g of 1-bromo-3,3,3-trifluoropropane, 0.02 g of tetra-n-butylammonium bromide, 3.60 g of sodium hydroxide, 20 ml of toluene and 10 ml of water, Stir vigorously at room temperature for 6 hours. Thereafter, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 10% hydrochloric acid and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 3,4-difluorobenzyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the present organic sulfur compound (21)) represented by the following formula: 0.46 g Got.
This organic sulfur compound (21)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.00-7.18 (m, 3H), 3.66 (dd, 2H), 2.56-2.60 (m, 2H), 2.27-2.35 (m, 2H)

参考製造例22
エタノール10mlに3−クロロ−4−フルオロベンジルクロライド0.41gを溶解し、ここにチオ尿素0.19gを加えた後、10時間加熱還流した。その後、反応混合物を室温付近まで放冷した後、減圧下濃縮した。得られた濃縮物に1−ブロモ−3,3,3−トリフルオロプロパン0.40g、臭化テトラ−n−ブチルアンモニウム0.02g、水酸化カリウム1.66g、トルエン10ml及び水10mlを加え、室温で6時間激しく攪拌した。その後、反応混合物に10%塩酸を加え、酢酸エチルで抽出した。有機層を10%塩酸および飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される3−クロロ−4−フルオロベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(22)と記す。)0.45gを得た。
本有機硫黄化合物(22)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.37(dd,1H)、7.07−7.19(m,2H)、3.68(s,2H)、2.56−2.60(m,2H)、2.26−2.38(m,2H) Reference Production Example 22
In 10 ml of ethanol, 0.41 g of 3-chloro-4-fluorobenzyl chloride was dissolved, and 0.19 g of thiourea was added thereto, followed by heating under reflux for 10 hours. Thereafter, the reaction mixture was allowed to cool to near room temperature and then concentrated under reduced pressure. To the obtained concentrate was added 0.40 g of 1-bromo-3,3,3-trifluoropropane, 0.02 g of tetra-n-butylammonium bromide, 1.66 g of potassium hydroxide, 10 ml of toluene and 10 ml of water, Stir vigorously at room temperature for 6 hours. Thereafter, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 10% hydrochloric acid and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 3-chloro-4-fluorobenzyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the present organic sulfur compound (22)) represented by the following formula: 0 .45 g was obtained.
This organic sulfur compound (22)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.37 (dd, 1H), 7.07-7.19 (m, 2H), 3.68 (s, 2H), 2.56- 2.60 (m, 2H), 2.26-2.38 (m, 2H)

参考製造例23
クロロホルム10mlに3,4,5−トリフルオロベンジルブロマイド1.54gを溶解し、ここにチオアセトアミド0.45gを加えた後、14時間加熱還流した。その後、反応混合物を室温付近まで放冷した後、減圧下濃縮した。得られた濃縮物に1−ブロモ−3,3,3−トリフルオロプロパン1.07g、臭化テトラ−n−ブチルアンモニウム0.06g、水酸化ナトリウム9.04g、トルエン10ml及び水10mlを加え、室温で6時間激しく攪拌した。その後、反応混合物に10%塩酸を加え、酢酸エチルで抽出した。有機層を10%塩酸および飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される3,4,5−トリフルオロベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(23)と記す。)1.66gを得た。
本有機硫黄化合物(23)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)6.97(ddd,2H)、3.66(s,2H)、2.57−2.61(m,2H)、2.27−2.39(m,2H) Reference Production Example 23
1.54 g of 3,4,5-trifluorobenzyl bromide was dissolved in 10 ml of chloroform, and 0.45 g of thioacetamide was added thereto, followed by heating under reflux for 14 hours. Thereafter, the reaction mixture was allowed to cool to near room temperature and then concentrated under reduced pressure. To the resulting concentrate was added 1.07 g of 1-bromo-3,3,3-trifluoropropane, 0.06 g of tetra-n-butylammonium bromide, 9.04 g of sodium hydroxide, 10 ml of toluene and 10 ml of water, Stir vigorously at room temperature for 6 hours. Thereafter, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 10% hydrochloric acid and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 3,4,5-trifluorobenzyl = 3,3,3-trifluoropropyl sulfide represented by the following formula (hereinafter referred to as the present organic sulfur compound (23)). 1.66 g was obtained.
This organic sulfur compound (23)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 6.97 (ddd, 2H), 3.66 (s, 2H), 2.57-2.61 (m, 2H), 2.27- 2.39 (m, 2H)

参考製造例24
メタノール10ml、2,3,4,5,6−ペンタフルオロベンジルブロマイド0.28g、S−(3,3,3−トリフルオロプロピル)=ベンゼンチオアート0.25g及びナトリウムメトキシド(28%メタノール溶液)0.2mlを用い、参考製造例3記載の方法に準じて、下式に示される2,3,4,5,6−ペンタフルオロベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(24)と記す。)0.29gを得た。
本有機硫黄化合物(24)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)3.79(d,2H)、2.68−2.72(m,2H)、2.35−2.53(m,2H) Reference Production Example 24
10 ml of methanol, 0.28 g of 2,3,4,5,6-pentafluorobenzyl bromide, 0.25 g of S- (3,3,3-trifluoropropyl) = benzenethioate and sodium methoxide (28% methanol solution) ) 0.2 ml, and 2,3,4,5,6-pentafluorobenzyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the following formula) according to the method described in Reference Production Example 3. This is referred to as the present organic sulfur compound (24).) 0.29 g was obtained.
This organic sulfur compound (24)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 3.79 (d, 2H), 2.68-2.72 (m, 2H), 2.35-2.53 (m, 2H)

参考製造例25
クロロホルム20mlに4−ブロモ−3−フルオロベンジルブロマイド1.96gを溶解し、ここにチオアセトアミド0.55gを加えた後、2日間加熱還流した。その後、反応混合物を室温付近まで放冷した後、減圧下濃縮した。得られた濃縮物に1−ブロモ−3,3,3−トリフルオロプロパン1.29g、臭化テトラ−n−ブチルアンモニウム0.07g、水酸化ナトリウム11.0g、トルエン20ml及び水10mlを加え、室温で6時間激しく攪拌した。その後、反応混合物に10%塩酸を加え、酢酸エチルで抽出した。有機層を10%塩酸および飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される4−ブロモ−3−フルオロベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(25)と記す。)1.88gを得た。
本有機硫黄化合物(25)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.50(dd,1H)、7.12(dd,1H)、6.97(dd,1H)、3.68(s,2H)、2.56−2.60(m,2H)、2.23−2.38(m,2H) Reference Production Example 25
4-Bromo-3-fluorobenzyl bromide (1.96 g) was dissolved in 20 ml of chloroform, and 0.55 g of thioacetamide was added thereto, followed by heating under reflux for 2 days. Thereafter, the reaction mixture was allowed to cool to near room temperature and then concentrated under reduced pressure. To the resulting concentrate was added 1.29 g of 1-bromo-3,3,3-trifluoropropane, 0.07 g of tetra-n-butylammonium bromide, 11.0 g of sodium hydroxide, 20 ml of toluene and 10 ml of water, Stir vigorously at room temperature for 6 hours. Thereafter, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 10% hydrochloric acid and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 4-bromo-3-fluorobenzyl = 3,3,3-trifluoropropyl = sulfide (hereinafter referred to as the present organic sulfur compound (25)) represented by the following formula 1 .88 g was obtained.
This organic sulfur compound (25)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.50 (dd, 1H), 7.12 (dd, 1H), 6.97 (dd, 1H), 3.68 (s, 2H) 2.56-2.60 (m, 2H), 2.23-2.38 (m, 2H)

参考製造例26
1−メチル−2−ピロリジノン10mlに4−ブロモ−3−フルオロベンジル=3,3,3−トリフルオロプロピル=スルフィド0.34gを溶解し、得られた濃縮物にシアン化第一銅0.13gを加えた後、160℃で6時間、次いで180℃で2日間加熱攪拌した。その後、反応混合物を室温付近まで放冷した後、10%塩酸を加え、酢酸エチルで抽出した。有機層を10%塩酸および飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される4−シアノ−3−フルオロベンジル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(26)と記す。)0.07gを得た。
本有機硫黄化合物(26)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.60(dd,1H)、7.21−7.26(m,2H)、3.76(s,2H)、2.58−2.65(m,2H)、2.28−2.40(m,2H) Reference Production Example 26
4-Bromo-3-fluorobenzyl = 3,3,3-trifluoropropyl = sulfide 0.34 g was dissolved in 10 ml of 1-methyl-2-pyrrolidinone, and 0.13 g of cuprous cyanide was dissolved in the resulting concentrate. Then, the mixture was heated and stirred at 160 ° C. for 6 hours and then at 180 ° C. for 2 days. Thereafter, the reaction mixture was allowed to cool to near room temperature, 10% hydrochloric acid was added, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 10% hydrochloric acid and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 4-cyano-3-fluorobenzyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the present organic sulfur compound (26)) represented by the following formula: 0 0.07 g was obtained.
This organic sulfur compound (26)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.60 (dd, 1H), 7.21-7.26 (m, 2H), 3.76 (s, 2H), 2.58- 2.65 (m, 2H), 2.28-2.40 (m, 2H)

参考製造例27
ジクロロメタン10mlにジエチルアミノ硫黄トリフルオリド0.45gを溶解し、ここに−78℃で3−(4−クロロベンジルチオ)−1−プロパノール0.50gを添加し、同温度で1時間撹拌した。その後、反応混合物を室温まで昇温しさらに1時間攪拌した。反応混合物を水に注加し、酢酸エチルで抽出した。有機層を飽和食塩水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される4−クロロベンジル=3−フルオロプロピル=スルフィド(以下、本有機硫黄化合物(27)と記す。)0.12gを得た。
本有機硫黄化合物(27)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.28(d,2H)、7.25(d,2H)、4.49(dt,2H)、3.68(s,2H)、2.52(t,2H)、1.85−2.01(m,2H) Reference Production Example 27
0.45 g of diethylaminosulfur trifluoride was dissolved in 10 ml of dichloromethane, 0.50 g of 3- (4-chlorobenzylthio) -1-propanol was added thereto at −78 ° C., and the mixture was stirred at the same temperature for 1 hour. Thereafter, the reaction mixture was warmed to room temperature and further stirred for 1 hour. The reaction mixture was poured into water and extracted with ethyl acetate. The organic layer was washed with saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 0.12 g of 4-chlorobenzyl = 3-fluoropropyl sulfide (hereinafter referred to as the present organic sulfur compound (27)) represented by the following formula.
This organic sulfur compound (27)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.28 (d, 2H), 7.25 (d, 2H), 4.49 (dt, 2H), 3.68 (s, 2H) , 2.52 (t, 2H), 1.85-2.01 (m, 2H)

参考製造例28
ジクロロメタン5mlにジエチルアミノ硫黄トリフルオリド0.08gを溶解し、ここに室温でジクロロメタン5mlに溶解した3−(4−クロロベンジルチオ)プロピオンアルデヒド0.10gを添加し、同温度で2時間撹拌した。反応混合物を水に注加し、酢酸エチルで抽出した。有機層を飽和食塩水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される4−クロロベンジル=3,3−ジフルオロプロピル=スルフィド(以下、本有機硫黄化合物(28)と記す。)0.10gを得た。
本有機硫黄化合物(28)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.29(d,2H)、7.24(d,2H)、5.88(ddt,1H)、3.69(s,2H)、2.52(t,2H)、2.00−2.12(m,2H) Reference Production Example 28
0.08 g of diethylaminosulfur trifluoride was dissolved in 5 ml of dichloromethane, and 0.10 g of 3- (4-chlorobenzylthio) propionaldehyde dissolved in 5 ml of dichloromethane was added thereto at room temperature, followed by stirring at the same temperature for 2 hours. The reaction mixture was poured into water and extracted with ethyl acetate. The organic layer was washed with saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 0.10 g of 4-chlorobenzyl = 3,3-difluoropropyl sulfide (hereinafter referred to as the present organic sulfur compound (28)) represented by the following formula.
This organic sulfur compound (28)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.29 (d, 2H), 7.24 (d, 2H), 5.88 (ddt, 1H), 3.69 (s, 2H) , 2.52 (t, 2H), 2.00-2.12 (m, 2H)

参考製造例29
N,N−ジメチルホルムアミド5ml、4−クロロベンジルメルカプタン0.20g、1−ヨード−4,4,4−トリフルオロブタン0.30g及び炭酸カリウム0.17gを用い、反応時間を10時間にした以外は参考製造例1記載の方法に準じて、下式に示される4−クロロベンジル=4,4,4−トリフルオロブチル=スルフィド(以下、本有機硫黄化合物(29)と記す。)0.31gを得た。
本有機硫黄化合物(29)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.30(d,2H)、7.25(d,2H)、3.67(s,2H)、2.45(t,2H)、2.10−2.22(m,2H)、1.76−1.83(m,2H) Reference Production Example 29
Other than using 5 ml of N, N-dimethylformamide, 0.20 g of 4-chlorobenzyl mercaptan, 0.30 g of 1-iodo-4,4,4-trifluorobutane and 0.17 g of potassium carbonate, and setting the reaction time to 10 hours. According to the method described in Reference Production Example 1, 4-chlorobenzyl = 4,4,4-trifluorobutyl = sulfide (hereinafter referred to as the present organic sulfur compound (29)) represented by the following formula: 0.31 g Got.
This organic sulfur compound (29)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.30 (d, 2H), 7.25 (d, 2H), 3.67 (s, 2H), 2.45 (t, 2H) 2.10-2.22 (m, 2H), 1.76-1.83 (m, 2H)

参考製造例30
N,N−ジメチルホルムアミド10ml、4−クロロベンジルメルカプタン0.30g、1−ヨード−3,3,4,4,4−ペンタフルオロブタン0.52g及び炭酸カリウム0.22gを用い、反応時間を2日間にした以外は参考製造例1記載の方法に準じて、下式に示される4−クロロベンジル=3,3,4,4,4−ペンタフルオロブチル=スルフィド(以下、本有機硫黄化合物(30)と記す。)0.45gを得た。
本有機硫黄化合物(30)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.29(d,2H)、7.27(d,2H)、3.71(s,2H)、2.53−2.63(m,2H)、2.25(ddt,2H) Reference Production Example 30
Using 10 ml of N, N-dimethylformamide, 0.30 g of 4-chlorobenzyl mercaptan, 0.52 g of 1-iodo-3,3,4,4,4-pentafluorobutane and 0.22 g of potassium carbonate, the reaction time was 2 According to the method described in Reference Production Example 1 except that the period was set to 1 day, 4-chlorobenzyl = 3,3,4,4,4-pentafluorobutyl = sulfide (hereinafter referred to as the present organic sulfur compound (30 ) 0.45 g was obtained.
This organic sulfur compound (30)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.29 (d, 2H), 7.27 (d, 2H), 3.71 (s, 2H), 2.53-2.63 ( m, 2H), 2.25 (ddt, 2H)

参考製造例31
N,N−ジメチルホルムアミド5ml、1−(4−クロロフェニル)エチルメルカプタン0.10g、1−ブロモ−3,3,3−トリフルオロプロパン0.10g及び炭酸カリウム0.08gを用い、反応時間を12時間にした以外は参考製造例1記載の方法に準じて、下式に示される1−(4−クロロフェニル)エチル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(31)と記す。)0.12gを得た。
本有機硫黄化合物(31)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.31(d,2H)、7.26(d,2H)、3.93(q,1H)、2.44−2.50(m,2H)、2.17−2.30(m,2H)、1.56(dd,3H) Reference production example 31
Using 5 ml of N, N-dimethylformamide, 0.10 g of 1- (4-chlorophenyl) ethyl mercaptan, 0.10 g of 1-bromo-3,3,3-trifluoropropane and 0.08 g of potassium carbonate, the reaction time was 12 Except for the time, 1- (4-chlorophenyl) ethyl = 3,3,3-trifluoropropyl sulfide represented by the following formula (hereinafter referred to as the present organic sulfur compound (31) is used in accordance with the method described in Reference Production Example 1. ) 0.12 g was obtained.
This organic sulfur compound (31)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.31 (d, 2H), 7.26 (d, 2H), 3.93 (q, 1H), 2.44-2.50 ( m, 2H), 2.17-2.30 (m, 2H), 1.56 (dd, 3H)

参考製造例32
エタノール10mlに1−(3,4,5−トリフルオロフェニル)エチルクロライド0.50gを溶解し、ここにチオ尿素0.22gを加えた後、6時間加熱還流した。その後、反応混合物を室温付近まで放冷した後、減圧下濃縮した。得られた濃縮物に1−ブロモ−3,3,3−トリフルオロプロパン0.45g、臭化テトラ−n−ブチルアンモニウム0.02g、水酸化ナトリウム3.85g、トルエン10ml及び水5mlを加え、室温で6時間激しく攪拌した。その後、反応混合物に10%塩酸を加え、酢酸エチルで抽出した。有機層を10%塩酸および飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される1−(3,4,5−トリフルオロフェニル)エチル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(32)と記す。)0.40gを得た。
本有機硫黄化合物(32)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)6.94−7.02(m,2H)、3.87(q,1H)、2.49(t,2H)、2.20−2.33(m,2H)、1.50(d,3H) Reference Production Example 32
0.50 g of 1- (3,4,5-trifluorophenyl) ethyl chloride was dissolved in 10 ml of ethanol, 0.22 g of thiourea was added thereto, and then the mixture was heated to reflux for 6 hours. Thereafter, the reaction mixture was allowed to cool to near room temperature and then concentrated under reduced pressure. To the obtained concentrate was added 0.45 g of 1-bromo-3,3,3-trifluoropropane, 0.02 g of tetra-n-butylammonium bromide, 3.85 g of sodium hydroxide, 10 ml of toluene and 5 ml of water, Stir vigorously at room temperature for 6 hours. Thereafter, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 10% hydrochloric acid and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 1- (3,4,5-trifluorophenyl) ethyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the present organic sulfur compound (32 ) 0.40 g was obtained.
This organic sulfur compound (32)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 6.94-7.02 (m, 2H), 3.87 (q, 1H), 2.49 (t, 2H), 2.20- 2.33 (m, 2H), 1.50 (d, 3H)

参考製造例33
エタノール10mlに1−(4−クロロフェニル)プロピルブロマイド0.53gを溶解し、ここにチオ尿素0.19gを加えた後、20時間加熱還流した。その後、反応混合物を室温付近まで放冷した後、減圧下濃縮した。得られた濃縮物に1−ブロモ−3,3,3−トリフルオロプロパン0.40g、臭化テトラ−n−ブチルアンモニウム0.02g、水酸化カリウム1.66g、トルエン10ml及び水10mlを加え、室温で3時間激しく攪拌した。その後、反応混合物に10%塩酸を加え、酢酸エチルで抽出した。有機層を10%塩酸および飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される1−(4−クロロフェニル)プロピル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(33)と記す。)0.25gを得た。
本有機硫黄化合物(33)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.30(d,2H)、7.23(d,2H)、3.65(t,1H)、2.39−2.45(m,2H)、2.14−2.27(m,2H)、1.76−1.94(m,2H)、0.89(t,3H) Reference Production Example 33
0.53 g of 1- (4-chlorophenyl) propyl bromide was dissolved in 10 ml of ethanol, and 0.19 g of thiourea was added thereto, followed by heating under reflux for 20 hours. Thereafter, the reaction mixture was allowed to cool to near room temperature and then concentrated under reduced pressure. To the obtained concentrate was added 0.40 g of 1-bromo-3,3,3-trifluoropropane, 0.02 g of tetra-n-butylammonium bromide, 1.66 g of potassium hydroxide, 10 ml of toluene and 10 ml of water, Stir vigorously at room temperature for 3 hours. Thereafter, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 10% hydrochloric acid and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 1- (4-chlorophenyl) propyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the present organic sulfur compound (33)) represented by the following formula: 0 .25 g was obtained.
This organic sulfur compound (33)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.30 (d, 2H), 7.23 (d, 2H), 3.65 (t, 1H), 2.39-2.45 ( m, 2H), 2.14-2.27 (m, 2H), 1.76-1.94 (m, 2H), 0.89 (t, 3H)

参考製造例34
テトラヒドロフラン10mlに4−クロロベンジル=3,3,3−トリフルオロプロピル=スルフィド0.30gを溶解し、ここに−78℃でリチウムジイソプロピルアミド(2M−テトラヒドロフラン/n−へプタン溶液)0.6mlを滴下した。同温度で10分間攪拌した後、1−ヨードプロパン0.20gを加えて反応混合物を室温まで昇温した。さらに3時間攪拌した後、反応混合物に10%塩酸を加え、酢酸エチルで抽出した。有機層を10%塩酸および及び飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される1−(4−クロロフェニル)ブチル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(34)と記す。)0.10gを得た。
本有機硫黄化合物(34)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.31(d,2H)、7.24(d,2H)、3.74(dd,1H)、2.19−2.44(m,4H)、1.78−1.82(m,2H)、1.21−1.41(m,2H)、0.88(t,3H) Reference Production Example 34
4-Chlorobenzyl = 3,3,3-trifluoropropyl sulfide 0.30 g was dissolved in 10 ml of tetrahydrofuran, and 0.6 ml of lithium diisopropylamide (2M-tetrahydrofuran / n-heptane solution) was added thereto at −78 ° C. It was dripped. After stirring at the same temperature for 10 minutes, 0.20 g of 1-iodopropane was added and the reaction mixture was warmed to room temperature. After further stirring for 3 hours, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 10% hydrochloric acid and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 1- (4-chlorophenyl) butyl = 3,3,3-trifluoropropyl sulfide (hereinafter referred to as the present organic sulfur compound (34)) represented by the following formula: 0 .10 g was obtained.
This organic sulfur compound (34)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.31 (d, 2H), 7.24 (d, 2H), 3.74 (dd, 1H), 2.19-2.44 ( m, 4H), 1.78-1.82 (m, 2H), 1.21-1.41 (m, 2H), 0.88 (t, 3H)

参考製造例35
テトラヒドロフラン10ml、4−クロロベンジル=3,3,3−トリフルオロプロピル=スルフィド0.30g、リチウムジイソプロピルアミド(2M−テトラヒドロフラン/n−へプタン溶液)0.6ml及び2−ヨードプロパン0.20gを用い、反応時間を4時間にした以外は参考製造例35記載の方法に準じて、下式に示される(1−(4−クロロフェニル)−2−メチル)プロピル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(35)と記す。)0.12gを得た。
本有機硫黄化合物(35)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.31(d,2H)、7.23(d,2H)、3.51(d,1H)、2.01−2.39(m,5H)、1.07(d,3H)、0.81(d,3H) Reference Production Example 35
Using 10 ml of tetrahydrofuran, 0.30 g of 4-chlorobenzyl = 3,3,3-trifluoropropyl sulfide, 0.6 ml of lithium diisopropylamide (2M-tetrahydrofuran / n-heptane solution) and 0.20 g of 2-iodopropane (1- (4-chlorophenyl) -2-methyl) propyl = 3,3,3-trifluoropropyl represented by the following formula in accordance with the method described in Reference Production Example 35 except that the reaction time was changed to 4 hours. = 0.12 g of sulfide (hereinafter referred to as the present organic sulfur compound (35)) was obtained.
This organic sulfur compound (35)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.31 (d, 2H), 7.23 (d, 2H), 3.51 (d, 1H), 2.01-2.39 ( m, 5H), 1.07 (d, 3H), 0.81 (d, 3H)

参考製造例36
メタノール10mlに2−ブロモ−2−(4−クロロフェニル)アセトニトリル0.30g及びS−(3,3,3−トリフルオロプロピル)=ベンゼンチオアート0.30gを溶解し、−78℃でナトリウムメトキシド(28%メタノール溶液)0.3mlを滴下した。同温で3時間攪拌した後、室温まで昇温しさらに1時間攪拌した。反応混合物に10%塩酸を加え、酢酸エチルで抽出した。有機層を10%塩酸および及び飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(4−クロロフェニル)−2−(3,3,3−トリフルオロプロピルチオ)アセトニトリル(以下、本有機硫黄化合物(36)と記す。)0.04gを得た。
本有機硫黄化合物(36)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.44(d,2H)、7.42(d,2H)、4.82(s,1H)、2.79−2.95(m,2H)、2.39−2.47(m,2H) Reference Production Example 36
Dissolve 0.30 g of 2-bromo-2- (4-chlorophenyl) acetonitrile and 0.30 g of S- (3,3,3-trifluoropropyl) = benzenethioate in 10 ml of methanol, and add sodium methoxide at -78 ° C. (28% methanol solution) 0.3 ml was added dropwise. After stirring at the same temperature for 3 hours, the mixture was warmed to room temperature and further stirred for 1 hour. 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 10% hydrochloric acid and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (4-chlorophenyl) -2- (3,3,3-trifluoropropylthio) acetonitrile (hereinafter referred to as the present organic sulfur compound (36)) represented by the following formula: .) 0.04 g was obtained.
This organic sulfur compound (36)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.44 (d, 2H), 7.42 (d, 2H), 4.82 (s, 1H), 2.79-2.95 ( m, 2H), 2.39-2.47 (m, 2H)

参考製造例37
N,N−ジメチルホルムアミド10ml、(1−(4−クロロフェニル)−1−メチル)エチルメルカプタン0.28g、1−ブロモ−3,3,3−トリフルオロプロパン0.26g及び炭酸カリウム0.06gを用い、反応時間を10時間にした以外は参考製造例1記載の方法に準じて、下式に示される(1−(4−クロロフェニル)−1−メチル)エチル=3,3,3−トリフルオロプロピル=スルフィド(以下、本有機硫黄化合物(37)と記す。)0.20gを得た。
本有機硫黄化合物(37)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.45(d,2H)、7.30(d,2H)、2.36−2.40(m,2H)、2.04−2.13(m,2H)、1.73(s,6H) Reference Production Example 37
10 ml of N, N-dimethylformamide, 0.28 g of (1- (4-chlorophenyl) -1-methyl) ethyl mercaptan, 0.26 g of 1-bromo-3,3,3-trifluoropropane and 0.06 g of potassium carbonate. (1- (4-chlorophenyl) -1-methyl) ethyl = 3,3,3-trifluoro represented by the following formula according to the method described in Reference Production Example 1 except that the reaction time was 10 hours. 0.20 g of propyl sulfide (hereinafter referred to as the present organic sulfur compound (37)) was obtained.
This organic sulfur compound (37)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.45 (d, 2H), 7.30 (d, 2H), 2.36-2.40 (m, 2H), 2.04- 2.13 (m, 2H), 1.73 (s, 6H)

参考製造例38
アセトニトリル20mlに4−クロロベンジル=3,3,3−トリフルオロプロピル=スルフィド0.70gを溶解し、ここに室温で過ヨウ素酸テトラ−n−ブチルアンモニウム1.19g及び塩化アルミニウム0.18gを添加した後10時間加熱還流した。反応混合物を室温付近まで放冷して水に注加し、酢酸エチルで抽出した。有機層を飽和チオ硫酸ナトリウム水溶液及び飽和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される4−クロロベンジル=3,3,3−トリフルオロプロピル=スルホキシド(以下、本有機硫黄化合物(38)と記す。)0.25gを得た。
本有機硫黄化合物(38)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.40(d,2H)、7.24(d,2H)、3.98(dd,2H)、2.52−2.84(m,4H) Reference Production Example 38
Dissolve 0.70 g of 4-chlorobenzyl = 3,3,3-trifluoropropyl sulfide in 20 ml of acetonitrile, and add 1.19 g of tetra-n-butylammonium periodate and 0.18 g of aluminum chloride at room temperature. And then heated to reflux for 10 hours. The reaction mixture was allowed to cool to near room temperature, poured into water, and extracted with ethyl acetate. The organic layer was washed successively with saturated aqueous sodium thiosulfate solution and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 0.25 g of 4-chlorobenzyl = 3,3,3-trifluoropropyl sulfoxide (hereinafter referred to as the present organic sulfur compound (38)) represented by the following formula. It was.
This organic sulfur compound (38)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.40 (d, 2H), 7.24 (d, 2H), 3.98 (dd, 2H), 2.52-2.84 ( m, 4H)

参考製造例39
酢酸10mlに4−クロロベンジル=3,3,3−トリフルオロプロピル=スルフィド0.50gを溶解し、ここに室温で過酢酸溶液10mlを添加した後90℃で2時間攪拌した。反応混合物を室温付近まで放冷して水に注加し、析出した結晶をろ過した。さらに結晶を水で洗浄した後、減圧下1日間乾燥し、下式に示される4−クロロベンジル=3,3,3−トリフルオロプロピル=スルホン(以下、本有機硫黄化合物(39)と記す。)0.55gを得た。
本有機硫黄化合物(39)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.42(d,2H)、7.35(d,2H)、4.26(s,2H)、3.04−3.08(m,2H)、2.53−2.65(m,2H) Reference Production Example 39
In 10 ml of acetic acid, 0.50 g of 4-chlorobenzyl = 3,3,3-trifluoropropyl = sulfide was dissolved, and 10 ml of a peracetic acid solution was added thereto at room temperature, followed by stirring at 90 ° C. for 2 hours. The reaction mixture was allowed to cool to near room temperature and poured into water, and the precipitated crystals were filtered. Further, the crystals were washed with water, dried under reduced pressure for 1 day, and 4-chlorobenzyl = 3,3,3-trifluoropropylsulfone (hereinafter referred to as the present organic sulfur compound (39)) represented by the following formula. ) 0.55 g was obtained.
This organic sulfur compound (39)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.42 (d, 2H), 7.35 (d, 2H), 4.26 (s, 2H), 3.04-3.08 ( m, 2H), 2.53-2.65 (m, 2H)

参考製造例40
酢酸5ml、4−(トリフルオロメチル)ベンジル=3,3,3−トリフルオロプロピル=スルフィド0.10g及び過酢酸溶液5mlを用い、参考製造例40記載の方法に準じて、下式に示される4−(トリフルオロメチル)ベンジル=3,3,3−トリフルオロプロピル=スルホン(以下、本有機硫黄化合物(40)と記す。)0.11gを得た。
本有機硫黄化合物(40)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.71(d,2H)、7.55(d,2H)、4.35(s,2H)、3.08−3.12(m,2H)、2.59−2.66(m,2H) Reference Production Example 40
According to the method described in Reference Production Example 40, 5 ml of acetic acid, 0.10 g of 4- (trifluoromethyl) benzyl = 3,3,3-trifluoropropyl = sulfide and 5 ml of peracetic acid solution are used. 0.11 g of 4- (trifluoromethyl) benzyl = 3,3,3-trifluoropropyl = sulfone (hereinafter referred to as the present organic sulfur compound (40)) was obtained.
This organic sulfur compound (40)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.71 (d, 2H), 7.55 (d, 2H), 4.35 (s, 2H), 3.08-3.12 ( m, 2H), 2.59-2.66 (m, 2H)

参考製造例41
メタノール20mlに2−フルオロ−2−(3,4,5−トリフルオロフェニル)−2−(3,3,3−トリフルオロプロピルスルホニル)酢酸メチル0.5gを溶解し、室温でアンモニア(7M−メタノール溶液)0.6mLを加え、同温で14時間撹拌した。反応混合物を減圧下濃縮し、得られた残渣をカラムクロマトグラフィーに付し、下式に示される2−フルオロ−2−(3,3,3−トリフルオロプロピルスルホニル)−2−(3,4,5−トリフルオロフェニル)アセトアミド(以下、本有機硫黄化合物(41)と記す。)0.35gを得た。
本有機硫黄化合物(41)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.56−7.65(2H,m)、6.57(1H,bs)、5.91(1H,bs)、3.56−3.73(2H,m)、3.23−3.48(2H,m) Reference Production Example 41
Dissolve 0.5 g of methyl 2-fluoro-2- (3,4,5-trifluorophenyl) -2- (3,3,3-trifluoropropylsulfonyl) acetate in 20 ml of methanol and add ammonia (7M- (Methanol solution) 0.6 mL was added and stirred at the same temperature for 14 hours. The reaction mixture was concentrated under reduced pressure, and the resulting residue was subjected to column chromatography to give 2-fluoro-2- (3,3,3-trifluoropropylsulfonyl) -2- (3,4) represented by the following formula. , 5-trifluorophenyl) acetamide (hereinafter referred to as the present organic sulfur compound (41)) 0.35 g was obtained.
This organic sulfur compound (41)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.56-7.65 (2H, m), 6.57 (1H, bs), 5.91 (1H, bs), 3.56- 3.73 (2H, m), 3.23-3.48 (2H, m)

参考製造例42
メタノール2.0mlに2−(3,4,5−トリフルオロフェニル)−2−(3,3,3−トリフルオロプロピルスルホニル)プロパン酸メチル1.0gを溶解し、室温でアンモニア(7M−メタノール溶液)8.0mLを加え、同温で48時間撹拌した。反応混合物を減圧下濃縮し、得られた残渣をカラムクロマトグラフィーに付し、下式に示される2−(3,4,5−トリフルオロフェニル)−2−(3,3,3−トリフルオロプロピルスルホニル)プロパンアミド(以下、本有機硫黄化合物(42)と記す。)0.20gを得た。
本有機硫黄化合物(42)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.36(2H,dd)、6.41(1H,bs)、6.15(1H,bs)、3.26−3.58(2H,m)、2.50−2.74(2H,m)2.08(3H,s) Reference Production Example 42
Dissolve 1.0 g of methyl 2- (3,4,5-trifluorophenyl) -2- (3,3,3-trifluoropropylsulfonyl) propanoate in 2.0 ml of methanol and add ammonia (7M-methanol at room temperature). Solution) 8.0 mL was added and stirred at the same temperature for 48 hours. The reaction mixture was concentrated under reduced pressure, and the resulting residue was subjected to column chromatography to give 2- (3,4,5-trifluorophenyl) -2- (3,3,3-trifluoro represented by the following formula. 0.20 g of propylsulfonyl) propanamide (hereinafter referred to as the present organic sulfur compound (42)) was obtained.
This organic sulfur compound (42)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.36 (2H, dd), 6.41 (1H, bs), 6.15 (1H, bs), 3.26-3.58 ( 2H, m), 2.50-2.74 (2H, m) 2.08 (3H, s)

参考製造例43
メタノール20mlに2−(4−クロロ−3−フルオロフェニル)−2−フルオロ−2−(3,3,3−トリフルオロプロピルスルホニル)酢酸メチル0.8gを溶解し、室温でアンモニア(7M−メタノール溶液)1.5mLを加え、同温で16時間撹拌した。反応混合物を減圧下濃縮し、得られた残渣をカラムクロマトグラフィーに付し、下式に示される2−(4−クロロ−3−フルオロフェニル)−2−フルオロ−2−(3,3,3−トリフルオロプロピルスルホニル)アセトアミド(以下、本有機硫黄化合物(43)と記す。)0.60gを得た。
本有機硫黄化合物(43)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.74(1H,dd)、7.64(1H,dd)、7.55(1H,dd)、6.60(1H、bs)、6.02(1H,bs)、3.21−3.46(2H,m)、2.49−2.69(2H,m) Reference Production Example 43
Dissolve 0.8 g of methyl 2- (4-chloro-3-fluorophenyl) -2-fluoro-2- (3,3,3-trifluoropropylsulfonyl) acetate in 20 ml of methanol and add ammonia (7M-methanol at room temperature). Solution) 1.5 mL was added and stirred at the same temperature for 16 hours. The reaction mixture was concentrated under reduced pressure, and the obtained residue was subjected to column chromatography to give 2- (4-chloro-3-fluorophenyl) -2-fluoro-2- (3, 3, 3 -Trifluoropropylsulfonyl) acetamide (hereinafter referred to as the present organic sulfur compound (43)) 0.60 g was obtained.
This organic sulfur compound (43)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.74 (1H, dd), 7.64 (1H, dd), 7.55 (1H, dd), 6.60 (1H, bs) 6.02 (1H, bs), 3.21-3.46 (2H, m), 2.49-2.69 (2H, m)

参考製造例44
メタノール30mlに2−(4−クロロフェニル)−2−フルオロ−2−(3,3,3−トリフルオロプロピルスルホニル)酢酸メチル0.6gを溶解し、室温でアンモニア(7M−メタノール溶液)0.7mLを加え、同温で10時間撹拌した。反応混合物を減圧下濃縮し、得られた残渣をカラムクロマトグラフィーに付し、下式に示される2−(4−クロロフェニル)−2−フルオロ−2−(3,3,3−トリフルオロプロピルスルホニル)アセトアミド(以下、本有機硫黄化合物(44)と記す。)0.40gを得た。
本有機硫黄化合物(44)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.86(2H,d)、7.49(2H,d)、6.57(1H,bs)、5.92(1H,bs)、3.20−3.45(2H,m)、2.43−2.68(2H,m) Reference Production Example 44
Dissolve 0.6 g of methyl 2- (4-chlorophenyl) -2-fluoro-2- (3,3,3-trifluoropropylsulfonyl) acetate in 30 ml of methanol, and add 0.7 ml of ammonia (7 M methanol solution) at room temperature. And stirred at the same temperature for 10 hours. The reaction mixture was concentrated under reduced pressure, and the resulting residue was subjected to column chromatography to give 2- (4-chlorophenyl) -2-fluoro-2- (3,3,3-trifluoropropylsulfonyl) represented by the following formula. ) Acetamide (hereinafter referred to as the present organic sulfur compound (44)) 0.40 g was obtained.
This organic sulfur compound (44)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.86 (2H, d), 7.49 (2H, d), 6.57 (1H, bs), 5.92 (1H, bs) 3.20-3.45 (2H, m), 2.43-2.68 (2H, m)

参考製造例45
メタノール30mlに2−フルオロ−2−(4−トリフルオロメチルフェニル)−2−(3,3,3−トリフルオロプロピルスルホニル)酢酸メチル0.4gを溶解し、室温でアンモニア(7M−メタノール溶液)0.4mLを加え、同温で4日間撹拌した。反応混合物を減圧下濃縮し、得られた残渣をカラムクロマトグラフィーに付し、下式に示される2−フルオロ−2−(3,3,3−トリフルオロプロピルスルホニル)−2−(4−トリフルオロメチルフェニル)アセトアミド(以下、本有機硫黄化合物(45)と記す。)0.25gを得た。
本有機硫黄化合物(45)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)8.06(2H,d)、7.78(2H,d)6.58(1H,bs)、5.92(1H,bs)、3.22−3.48(2H,m)、2.52−2.68(2H,m) Reference Production Example 45
Dissolve 0.4 g of methyl 2-fluoro-2- (4-trifluoromethylphenyl) -2- (3,3,3-trifluoropropylsulfonyl) acetate in 30 ml of methanol and add ammonia (7M methanol solution) at room temperature. 0.4 mL was added and stirred at the same temperature for 4 days. The reaction mixture was concentrated under reduced pressure, and the resulting residue was subjected to column chromatography to give 2-fluoro-2- (3,3,3-trifluoropropylsulfonyl) -2- (4-trimethyl) represented by the following formula. 0.25 g of fluoromethylphenyl) acetamide (hereinafter referred to as the present organic sulfur compound (45)) was obtained.
This organic sulfur compound (45)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 8.06 (2H, d), 7.78 (2H, d) 6.58 (1H, bs), 5.92 (1H, bs), 3.22-3.48 (2H, m), 2.52-2.68 (2H, m)

参考製造例46
2−(4−クロロフェニル)−2−(3,3,3−トリフルオロプロピルスルファニル)酢酸1.69g及び、塩化チオニル0.81gをトルエン15mLに溶解させ、室温でN,N−ジメチルホルムアミド一滴を加えた後、80℃で1時間撹拌した。該反応混合液を濃縮した後、残渣をテトラヒドロフラン10mLに溶解させ、室温でアンモニア(28%水溶液)4.0mLを加えた。同温で0.5時間撹拌した後、酢酸エチルで抽出した。有機層を無水硫酸ナトリウムで乾燥し、減圧下濃縮した後、得られた残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(4−クロロフェニル)−2−(3,3,3−トリフルオロプロピルスルファニル)アセトアミド(以下、本有機硫黄化合物(46)と記す。)1.52gを得た。
本有機硫黄化合物(46)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.36−7.34 (4H,m), 6.30 (1H, bs), 5.89 (1H, bs), 4.54 (1H,s),2.81−2.69 (2H,m),2.46−2.31 (2H, m). Reference Production Example 46
1.69 g of 2- (4-chlorophenyl) -2- (3,3,3-trifluoropropylsulfanyl) acetic acid and 0.81 g of thionyl chloride are dissolved in 15 mL of toluene, and one drop of N, N-dimethylformamide is added at room temperature. After the addition, the mixture was stirred at 80 ° C. for 1 hour. After concentrating the reaction mixture, the residue was dissolved in 10 mL of tetrahydrofuran, and 4.0 mL of ammonia (28% aqueous solution) was added at room temperature. After stirring at the same temperature for 0.5 hour, the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure, and the obtained residue was subjected to silica gel column chromatography to give 2- (4-chlorophenyl) -2- (3, 3, 3 -Trifluoropropylsulfanyl) acetamide (hereinafter referred to as the present organic sulfur compound (46)) 1.52 g was obtained.
This organic sulfur compound (46)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.36-7.34 (4H, m), 6.30 (1H, bs), 5.89 (1H, bs), 4.54 ( 1H, s), 2.81-2.69 (2H, m), 2.46-2.31 (2H, m).

参考製造例47
2−(4−クロロフェニル)−2−(3,3,3−トリフルオロプロピルスルファニル)アセトアミド0.40gをクロロホルム10mLに溶解させ、室温でメタ−クロロ過安息香酸(67%)0.76gを加える。該混合液を室温で3時間撹拌した後,10時間還流させた。得られた反応混合液を亜硫酸ナトリウム水溶液、飽和炭酸水素ナトリウム水溶液で順次洗浄し、無水硫酸ナトリウムで乾燥した後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(4−クロロフェニル)−2−(3,3,3−トリフルオロプロピルスルホニル)アセトアミド(以下、本有機硫黄化合物(47)と記す。)0.30gを得た。
本有機硫黄化合物(47)

Figure 2010150156
1H−NMR(DMSO−D6,TMS):δ(ppm)7.76 (1H, bs), 7.64−7.61 (2H,m), 7.56−7.53 (2H,m), 5.42 (1H,s), 3.57−3.54 (1H,m), 3.33−3.29 (1H,m),2.81−2.56 (2H, m). Reference Production Example 47
0.40 g of 2- (4-chlorophenyl) -2- (3,3,3-trifluoropropylsulfanyl) acetamide is dissolved in 10 mL of chloroform, and 0.76 g of meta-chloroperbenzoic acid (67%) is added at room temperature. . The mixture was stirred at room temperature for 3 hours and then refluxed for 10 hours. The resulting reaction mixture was washed successively with aqueous sodium sulfite solution and saturated aqueous sodium hydrogen carbonate solution, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography, and 2- (4-chlorophenyl) -2- (3,3,3-trifluoropropylsulfonyl) acetamide (hereinafter referred to as the present organic sulfur compound (47) represented by the following formula: ) 0.30 g was obtained.
This organic sulfur compound (47)
Figure 2010150156
1 H-NMR (DMSO-D 6 , TMS): δ (ppm) 7.76 (1H, bs), 7.64-7.61 (2H, m), 7.56-7.53 (2H, m ), 5.42 (1H, s), 3.57-3.54 (1H, m), 3.33-3.29 (1H, m), 2.81-2.56 (2H, m).

参考製造例48
メタノール3.0mlに2−クロロ−3−(4−トリフルオロメチルフェニル)−2−(3,3,3−トリフルオロプロピルスルホニル)プロパン酸メチル0.33gを溶解し、室温でアンモニア(7M−メタノール溶液)1.0mLを加え、同温で28時間撹拌した。反応混合物を減圧下濃縮し、得られた残渣をカラムクロマトグラフィーに付し、下式に示される2−クロロ−3−(4−トリフルオロメチルフェニル)−2−(3,3,3−トリフルオロプロピルスルホニル)プロパンアミド(以下、本有機硫黄化合物(48)と記す。)0.20gを得た。
本有機硫黄化合物(48)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.61 (2H, d), 7.44 (2H, d), 6.67 (1H, bs), 5.77 (1H, bs), 4.13 (1H, d), 3.93−3.85 (1H,m), 3.56−3.48 (1H,m), 3.41 (1H, d),2.83−2.76 (2H, m) Reference production example 48
Dissolve 0.33 g of methyl 2-chloro-3- (4-trifluoromethylphenyl) -2- (3,3,3-trifluoropropylsulfonyl) propanoate in 3.0 ml of methanol and add ammonia (7M- Methanol solution) 1.0 mL was added and stirred at the same temperature for 28 hours. The reaction mixture was concentrated under reduced pressure, and the resulting residue was subjected to column chromatography to give 2-chloro-3- (4-trifluoromethylphenyl) -2- (3,3,3-trimethyl represented by the following formula. 0.20 g of fluoropropylsulfonyl) propanamide (hereinafter referred to as the present organic sulfur compound (48)) was obtained.
This organic sulfur compound (48)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.61 (2H, d), 7.44 (2H, d), 6.67 (1H, bs), 5.77 (1H, bs) 4.13 (1H, d), 3.93-3.85 (1H, m), 3.56-3.48 (1H, m), 3.41 (1H, d), 2.83-2 .76 (2H, m)

参考製造例49
メタノール3.0mlに2−クロロ−3−(3−トリフルオロメチルフェニル)−2−(3,3,3−トリフルオロプロピルスルホニル)プロパン酸メチル0.23gを溶解し、室温でアンモニア(7M−メタノール溶液)0.8mLを加え、同温で2時間撹拌した。反応混合物を減圧下濃縮し、得られた残渣をカラムクロマトグラフィーに付し、下式に示される2−クロロ−3−(3−トリフルオロメチルフェニル)−2−(3,3,3−トリフルオロプロピルスルホニル)プロパンアミド(以下、本有機硫黄化合物(49)と記す。)0.13gを得た。
本有機硫黄化合物(49)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.61−7.59 (2H,m), 7.52−7.45 (2H,m), 6.67 (1H, bs), 5.89 (1H, bs), 4.13 (1H, d), 3.91−3.87 (1H,m), 3.56−3.48 (1H,m), 3.41 (1H, d),2.81−2.77 (2H, m) Reference Production Example 49
0.23 g of methyl 2-chloro-3- (3-trifluoromethylphenyl) -2- (3,3,3-trifluoropropylsulfonyl) propanoate is dissolved in 3.0 ml of methanol, and ammonia (7M- (Methanol solution) 0.8 mL was added and stirred at the same temperature for 2 hours. The reaction mixture was concentrated under reduced pressure, and the resulting residue was subjected to column chromatography to give 2-chloro-3- (3-trifluoromethylphenyl) -2- (3,3,3-trimethyl represented by the following formula. 0.13 g of fluoropropylsulfonyl) propanamide (hereinafter referred to as the present organic sulfur compound (49)) was obtained.
This organic sulfur compound (49)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.61-7.59 (2H, m), 7.52-7.45 (2H, m), 6.67 (1H, bs), 5.89 (1H, bs), 4.13 (1H, d), 3.91-3.87 (1H, m), 3.56-3.48 (1H, m), 3.41 (1H, d), 2.81-2.77 (2H, m)

参考製造例50
メタノール3.0mlに2−クロロ−3−(2−トリフルオロメチルフェニル)−2−(3,3,3−トリフルオロプロピルスルホニル)プロパン酸メチル0.61gを溶解し、室温でアンモニア(7M−メタノール溶液)5.2mLを加え、同温で2時間撹拌した。反応混合物を減圧下濃縮し、得られた残渣をカラムクロマトグラフィーに付し、下式に示される2−クロロ−3−(2−トリフルオロメチルフェニル)−2−(3,3,3−トリフルオロプロピルスルホニル)プロパンアミド(以下、本有機硫黄化合物(50)と記す。)0.20gを得た。
本有機硫黄化合物(50)

Figure 2010150156

1H−NMR(CDCl3,TMS):δ(ppm)7.72 (1H, d), 7.52−7.50 (1H,m), 7.45−7.43 (2H,m), 6.95 (1H, bs), 6.41 (1H, bs), 4.28 (1H, d), 3.87−3.80 (2H,m), 3.58−3.50 (1H,m),2.82−2.76 (2H, m) Reference production example 50
0.61 g of methyl 2-chloro-3- (2-trifluoromethylphenyl) -2- (3,3,3-trifluoropropylsulfonyl) propanoate is dissolved in 3.0 ml of methanol, and ammonia (7M- (Methanol solution) 5.2 mL was added and stirred at the same temperature for 2 hours. The reaction mixture was concentrated under reduced pressure, and the resulting residue was subjected to column chromatography to give 2-chloro-3- (2-trifluoromethylphenyl) -2- (3,3,3-trimethyl represented by the following formula. 0.20 g of fluoropropylsulfonyl) propanamide (hereinafter referred to as the present organic sulfur compound (50)) was obtained.
This organic sulfur compound (50)
Figure 2010150156

1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.72 (1H, d), 7.52-7.50 (1H, m), 7.45-7.43 (2H, m), 6.95 (1H, bs), 6.41 (1H, bs), 4.28 (1H, d), 3.87-3.80 (2H, m), 3.58-3.50 (1H, m), 2.82-2.76 (2H, m)

参考製造例51
メタノール10mLに5−クロロメチル−2−トリフルオロメチルピリジン200mg及びS−(3,3,3−トリフルオロプロピル)ベンゼンチオアート240mgを溶解させ、室温でナトリウムメトキシド(28%メタノール溶液)0.2mLを滴下した。同温で、2時間撹拌後、反応混合液に10%塩酸を加え、酢酸エチルで抽出した。有機層を無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。得られた残渣をカラムクロマトグラフィーに付し、下式に示される2−トリフルオロメチル−5−(3,3,3−トリフルオロプロピルスルファニルメチル)ピリジン(以下、本有機硫黄化合物(51)と記す。)230mgを得た。
本有機硫黄化合物(51)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)8.66(1H,d),7.85(1H,dd),7.67(1H,d),3.80(2H,s),2.60−2.64(2H,m),2,31−2.43(2H,m) Reference Production Example 51
In 10 mL of methanol, 200 mg of 5-chloromethyl-2-trifluoromethylpyridine and 240 mg of S- (3,3,3-trifluoropropyl) benzenethioate were dissolved, and sodium methoxide (28% methanol solution) 0. 2 mL was added dropwise. After stirring at the same temperature for 2 hours, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to column chromatography, and 2-trifluoromethyl-5- (3,3,3-trifluoropropylsulfanylmethyl) pyridine (hereinafter referred to as the present organic sulfur compound (51)) represented by the following formula: 230 mg was obtained.
This organic sulfur compound (51)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 8.66 (1H, d), 7.85 (1H, dd), 7.67 (1H, d), 3.80 (2H, s) 2.60-2.64 (2H, m), 2, 31-2.43 (2H, m)

参考製造例52
メタノール20mLに5−クロロメチル−2−トリフルオロメチルピリジン300mg及びS−(3,3,3−トリフルオロプロピル)ベンゼンチオアート359mgを溶解させ、室温でナトリウムメトキシド(28%メタノール溶液)0.3mLを滴下した。同温で、18時間撹拌後、反応混合液に10%塩酸を加え、クロロホルムで抽出した。有機層を減圧下濃縮し、得られた残渣をクロロホルム10mLに溶解させ、室温で過酢酸(30%酢酸溶液)5mLを滴下した。同温で4時間撹拌後、飽和炭酸水素ナトリウム溶液を加え、酢酸エチルで抽出した。有機層を無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。得られた残渣をカラムクロマトグラフィーに付し、下式に示される2−トリフルオロメチル−5−(3,3,3−トリフルオロプロパンスルホニルメチル)ピリジン(以下、本有機硫黄化合物(52)と記す。)180mgを得た。
本有機硫黄化合物(52)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)8.75(1H,d),8.03(1H,dd),7.79(1H,d),4.38(2H,s),3.17−3.21(2H,m),2,64−2.76(2H,m) Reference Production Example 52
In 20 mL of methanol, 300 mg of 5-chloromethyl-2-trifluoromethylpyridine and 359 mg of S- (3,3,3-trifluoropropyl) benzenethioate were dissolved, and sodium methoxide (28% methanol solution) 0. 3 mL was added dropwise. After stirring for 18 hours at the same temperature, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with chloroform. The organic layer was concentrated under reduced pressure, and the resulting residue was dissolved in 10 mL of chloroform, and 5 mL of peracetic acid (30% acetic acid solution) was added dropwise at room temperature. After stirring at the same temperature for 4 hours, saturated sodium hydrogen carbonate solution was added, and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to column chromatography, and 2-trifluoromethyl-5- (3,3,3-trifluoropropanesulfonylmethyl) pyridine (hereinafter referred to as the present organic sulfur compound (52)) represented by the following formula: 180 mg was obtained.
This organic sulfur compound (52)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 8.75 (1H, d), 8.03 (1H, dd), 7.79 (1H, d), 4.38 (2H, s) 3.17-3.21 (2H, m), 2,64-2.76 (2H, m)

参考製造例53
メタノール50mLに5−(1−ブロモエチル)−2−トリフルオロメチルピリジン1.12g及びS−(3,3,3−トリフルオロプロピル)ベンゼンチオアート1.03gを溶解させ、室温でナトリウムメトキシド(28%メタノール溶液)0.87mLを滴下した。同温で、10時間撹拌後、反応混合液に10%塩酸を加え、酢酸エチルで抽出した。有機層を無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。得られた残渣をカラムクロマトグラフィーに付し、下式に示される2−トリフルオロメチル−5−[1−(3,3,3−トリフルオロプロピルスルファニル)エチル]ピリジン(以下、本有機硫黄化合物(53)と記す。)1.00gを得た。
本有機硫黄化合物(53)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)8.68(1H,s),7.89(1H,d),7.68(1H,d),4.06(1H,q),2.52(2H,t),2.23−2.37(2H,m),1.63(3H,d) Reference Production Example 53
In 50 mL of methanol, 1.12 g of 5- (1-bromoethyl) -2-trifluoromethylpyridine and 1.03 g of S- (3,3,3-trifluoropropyl) benzenethioate are dissolved, and sodium methoxide ( 28% methanol solution) 0.87 mL was added dropwise. After stirring at the same temperature for 10 hours, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to column chromatography, and 2-trifluoromethyl-5- [1- (3,3,3-trifluoropropylsulfanyl) ethyl] pyridine (hereinafter referred to as the present organic sulfur compound) represented by the following formula: (Indicated as (53).) 1.00 g was obtained.
This organic sulfur compound (53)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 8.68 (1H, s), 7.89 (1H, d), 7.68 (1H, d), 4.06 (1H, q) , 2.52 (2H, t), 2.23-2.37 (2H, m), 1.63 (3H, d)

参考製造例54
本有機硫黄化合物(3)0.8gをクロロホルム30mLに溶解させ、室温で過酢酸(30%酢酸溶液)5mLを滴下した。同温で10時間撹拌後、飽和炭酸水素ナトリウム溶液を加え、酢酸エチルで抽出した。有機層を無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。得られた残渣をカラムクロマトグラフィーに付し、下式に示される2−トリフルオロメチル−5−[1−(3,3,3−トリフルオロプロパンスルホニル)エチル]ピリジン(以下、本有機硫黄化合物(54)と記す。)0.64gを得た。
本有機硫黄化合物(54)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)8.75(1H,s),8.06(1H,dd),7.78(1H,d),4.35(1H,q),2.96−3.13(2H,m),2.55−2.73(2H,m),1.88(3H,d) Reference production example 54
0.8 g of the organic sulfur compound (3) was dissolved in 30 mL of chloroform, and 5 mL of peracetic acid (30% acetic acid solution) was added dropwise at room temperature. After stirring at the same temperature for 10 hours, a saturated sodium hydrogen carbonate solution was added, and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to column chromatography, and 2-trifluoromethyl-5- [1- (3,3,3-trifluoropropanesulfonyl) ethyl] pyridine (hereinafter referred to as the present organic sulfur compound) represented by the following formula: (Described as (54).) 0.64 g was obtained.
This organic sulfur compound (54)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 8.75 (1H, s), 8.06 (1H, dd), 7.78 (1H, d), 4.35 (1H, q) 2.96-3.13 (2H, m), 2.55-2.73 (2H, m), 1.88 (3H, d)

参考製造例55
メタノール20mLに2−ブロモメチル−5−クロロピリジン500mg及びS−(3,3,3−トリフルオロプロピル)ベンゼンチオアート567mgを溶解させ、室温でナトリウムメトキシド(28%メタノール溶液)0.5mLを滴下した。同温で、24時間撹拌後、反応混合液に10%塩酸を加え、酢酸エチルで抽出した。有機層を無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。得られた残渣をカラムクロマトグラフィーに付し、下式に示される5−クロロ−2−(3,3,3−トリフルオロプロピルスルファニルメチル)ピリジン(以下、本有機硫黄化合物(55)と記す。)500mgを得た。
本有機硫黄化合物(55)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)8.49(1H,d),7.66(1H,dd),7.32(1H,d),3.83(2H,s),2.63−2.66(2H,m),2,32−2.43(2H,m) Reference production example 55
In 20 mL of methanol, 500 mg of 2-bromomethyl-5-chloropyridine and 567 mg of S- (3,3,3-trifluoropropyl) benzenethioate are dissolved, and 0.5 mL of sodium methoxide (28% methanol solution) is added dropwise at room temperature. did. After stirring at the same temperature for 24 hours, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue is subjected to column chromatography and described as 5-chloro-2- (3,3,3-trifluoropropylsulfanylmethyl) pyridine (hereinafter referred to as the present organic sulfur compound (55)) represented by the following formula. ) 500 mg was obtained.
This organic sulfur compound (55)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 8.49 (1H, d), 7.66 (1H, dd), 7.32 (1H, d), 3.83 (2H, s) 2.6-2.66 (2H, m), 2, 32-2.43 (2H, m)

参考製造例56
メタノール20mLに2−(1−ブロモエチル)−5−クロロピリジン435mg及びS−(3,3,3−トリフルオロプロピル)ベンゼンチオアート462mgを溶解させ、室温でナトリウムメトキシド(28%メタノール溶液)0.4mLを滴下した。同温で、10時間撹拌後、反応混合液に10%塩酸を加え、酢酸エチルで抽出した。有機層を無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。得られた残渣をカラムクロマトグラフィーに付し、下式に示される5−クロロ−2−[1−(3,3,3−トリフルオロプロピルスルファニル)エチル]ピリジン(以下、本有機硫黄化合物(56)と記す。)300mgを得た。
本有機硫黄化合物(56)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)8.48(1H,d),7.67(1H,dd),7.35(1H,d),4.09(1H,q),2.51−2.57(2H,m),2.19−2.40(2H,m),1.61(3H,d) Reference production example 56
In 20 mL of methanol, 435 mg of 2- (1-bromoethyl) -5-chloropyridine and 462 mg of S- (3,3,3-trifluoropropyl) benzenethioate were dissolved, and sodium methoxide (28% methanol solution) was added at room temperature. 4 mL was added dropwise. After stirring at the same temperature for 10 hours, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to column chromatography, and 5-chloro-2- [1- (3,3,3-trifluoropropylsulfanyl) ethyl] pyridine represented by the following formula (hereinafter, this organic sulfur compound (56 ) 300 mg was obtained.
This organic sulfur compound (56)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 8.48 (1H, d), 7.67 (1H, dd), 7.35 (1H, d), 4.09 (1H, q) 2.51-2.57 (2H, m), 2.19-2.40 (2H, m), 1.61 (3H, d)

参考製造例57
メタノール20mLに2−ブロモメチル−5−トリフルオロメチルピリジン500mg及びS−(3,3,3−トリフルオロプロピル)ベンゼンチオアート488mgを溶解させ、室温でナトリウムメトキシド(28%メタノール溶液)0.4mLを滴下した。同温で、10分間撹拌後、反応混合液に10%塩酸を加え、酢酸エチルで抽出した。有機層を無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。得られた残渣をカラムクロマトグラフィーに付し、下式に示される5−トリフルオロメチル−2−(3,3,3−トリフルオロプロピルスルファニルメチル)ピリジン(以下、本有機硫黄化合物(57)と記す。)400mgを得た。
本有機硫黄化合物(57)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)8.80(1H,s),7.92(1H,dd),7.50(1H,d),3.91(2H,s),2.65−2.69(2H,m),2,34−2.46(2H,m) Reference Production Example 57
Dissolve 500 mg of 2-bromomethyl-5-trifluoromethylpyridine and 488 mg of S- (3,3,3-trifluoropropyl) benzenethioate in 20 mL of methanol, and add 0.4 mL of sodium methoxide (28% methanol solution) at room temperature. Was dripped. After stirring at the same temperature for 10 minutes, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to column chromatography, and 5-trifluoromethyl-2- (3,3,3-trifluoropropylsulfanylmethyl) pyridine (hereinafter referred to as the present organic sulfur compound (57)) represented by the following formula: 400 mg was obtained.
This organic sulfur compound (57)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 8.80 (1H, s), 7.92 (1H, dd), 7.50 (1H, d), 3.91 (2H, s) , 2.65-2.69 (2H, m), 2, 34-2.46 (2H, m)

参考製造例58
メタノール20mLに2−(1−ブロモエチル)−5−トリフルオロメチルピリジン452mg及びS−(3,3,3−トリフルオロプロピル)ベンゼンチオアート417mgを溶解させ、室温でナトリウムメトキシド(28%メタノール溶液)0.4mLを滴下した。同温で、1時間撹拌後、反応混合液に10%塩酸を加え、酢酸エチルで抽出した。有機層を無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。得られた残渣をカラムクロマトグラフィーに付し、下式に示される5−トリフルオロメチル−2−[1−(3,3,3−トリフルオロプロピルスルファニル)エチル]ピリジン(以下、本有機硫黄化合物(58)と記す。)760mgを得た。
本有機硫黄化合物(58)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)8.79(1H,d),7.93(1H,dd),7.54(1H,d),4.17(1H,q),2.55−2.59(2H,m),2.31−2.39(2H,m),1.65(3H,d) Reference Production Example 58
Dissolve 452 mg of 2- (1-bromoethyl) -5-trifluoromethylpyridine and 417 mg of S- (3,3,3-trifluoropropyl) benzenethioate in 20 mL of methanol, and add sodium methoxide (28% methanol solution) at room temperature. ) 0.4 mL was added dropwise. After stirring at the same temperature for 1 hour, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to column chromatography, and 5-trifluoromethyl-2- [1- (3,3,3-trifluoropropylsulfanyl) ethyl] pyridine (hereinafter referred to as the present organic sulfur compound) represented by the following formula: (Indicated as (58).) 760 mg was obtained.
This organic sulfur compound (58)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 8.79 (1H, d), 7.93 (1H, dd), 7.54 (1H, d), 4.17 (1H, q) 2.55-2.59 (2H, m), 2.31-2.39 (2H, m), 1.65 (3H, d)

参考製造例59
本有機硫黄化合物(58)680mgをクロロホルム30mLに溶解させ、室温でメタ−クロロ過安息香酸851mgを加えた。同温で20時間撹拌後、飽和炭酸水素ナトリウム溶液を加え、酢酸エチルで抽出した。有機層を無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。得られた残渣をカラムクロマトグラフィーに付し、下式に示される5−トリフルオロメチル−2−[1−(3,3,3−トリフルオロプロパンスルホニル)エチル]ピリジン(以下、本有機硫黄化合物(59)と記す。)580mgを得た。
本有機硫黄化合物(59)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)8.88(1H,s),8.02(1H,dd),7.64(1H,d),4.52(1H,q),3.11−3.24(2H,m),2.54−2.70(2H,m),1.90(3H,d) Reference Production Example 59
680 mg of this organic sulfur compound (58) was dissolved in 30 mL of chloroform, and 851 mg of meta-chloroperbenzoic acid was added at room temperature. After stirring at the same temperature for 20 hours, a saturated sodium hydrogen carbonate solution was added, and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to column chromatography, and 5-trifluoromethyl-2- [1- (3,3,3-trifluoropropanesulfonyl) ethyl] pyridine (hereinafter referred to as the present organic sulfur compound) represented by the following formula: (Indicated as (59).) 580 mg was obtained.
This organic sulfur compound (59)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 8.88 (1H, s), 8.02 (1H, dd), 7.64 (1H, d), 4.52 (1H, q) 3.11-3.24 (2H, m), 2.54-2.70 (2H, m), 1.90 (3H, d)

参考製造例60
メタノール30mLに5−ブロモメチル−2−トリフルオロメチルピリミジン1.03g及びS−(3,3,3−トリフルオロプロピル)ベンゼンチオアート1.00gを溶解させ、室温でナトリウムメトキシド(28%メタノール溶液)0.8mLを滴下した。同温で、6時間撹拌後、反応混合液に10%塩酸を加え、酢酸エチルで抽出した。有機層を無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。得られた残渣をカラムクロマトグラフィーに付し、下式に示される2−トリフルオロメチル−5−(3,3,3−トリフルオロプロピルスルファニルメチル)ピリミジン(以下、本有機硫黄化合物(60)と記す。)330mgを得た。
本有機硫黄化合物(60)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)8.86(2H,s),3.80(2H,s),2.65−2.69(2H,m),2,34−2.46(2H,m) Reference Production Example 60
Dissolve 1.03 g of 5-bromomethyl-2-trifluoromethylpyrimidine and 1.00 g of S- (3,3,3-trifluoropropyl) benzenethioate in 30 mL of methanol, and add sodium methoxide (28% methanol solution) at room temperature. ) 0.8 mL was added dropwise. After stirring for 6 hours at the same temperature, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to column chromatography, and 2-trifluoromethyl-5- (3,3,3-trifluoropropylsulfanylmethyl) pyrimidine (hereinafter referred to as the present organic sulfur compound (60)) represented by the following formula: ) 330 mg was obtained.
This organic sulfur compound (60)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 8.86 (2H, s), 3.80 (2H, s), 2.65-2.69 (2H, m), 2,34- 2.46 (2H, m)

参考製造例61
メタノール50mLに2−クロロ−5−ブロモメチルピリミジン1.10g及びS−(3,3,3−トリフルオロプロピル)ベンゼンチオアート1.24gを溶解させ、室温でナトリウムメトキシド(28%メタノール溶液)1.0mLを滴下した。同温で、4時間撹拌後、反応混合液に10%塩酸を加え、酢酸エチルで抽出した。有機層を無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。得られた残渣をカラムクロマトグラフィーに付し、下式に示される2−クロロ−5−(3,3,3−トリフルオロプロピルスルファニルメチル)ピリミジン(以下、本有機硫黄化合物(61)と記す。)90mg及び下式に示される2−メトキシ−5−(3,3,3−トリフルオロプロピルスルファニルメチル)ピリミジン(以下、本有機硫黄化合物(62)と記す。)260mgを得た。
本有機硫黄化合物(61)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)8.60(2H,s),3.70(2H,s),2.63−2.67(2H,m),2,32−2.44(2H,m)
本有機硫黄化合物(62)
Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)8.47(2H,s),4.03(3H,s),3.67(2H,s),2.61−2.65(2H,m),2,31−2.43(2H,m) Reference Production Example 61
Dissolve 1.10 g of 2-chloro-5-bromomethylpyrimidine and 1.24 g of S- (3,3,3-trifluoropropyl) benzenethioate in 50 mL of methanol, and add sodium methoxide (28% methanol solution) at room temperature. 1.0 mL was added dropwise. After stirring at the same temperature for 4 hours, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue is subjected to column chromatography and described as 2-chloro-5- (3,3,3-trifluoropropylsulfanylmethyl) pyrimidine (hereinafter referred to as the present organic sulfur compound (61)) represented by the following formula. ) 90 mg, and 260 mg of 2-methoxy-5- (3,3,3-trifluoropropylsulfanylmethyl) pyrimidine (hereinafter referred to as the present organic sulfur compound (62)) represented by the following formula was obtained.
This organic sulfur compound (61)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 8.60 (2H, s), 3.70 (2H, s), 2.63-2.67 (2H, m), 2, 32- 2.44 (2H, m)
This organic sulfur compound (62)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 8.47 (2H, s), 4.03 (3H, s), 3.67 (2H, s), 2.61-2.65 ( 2H, m), 2, 31-2.43 (2H, m)

参考製造例62
2−クロロ−5−トリフルオロメチルピリジン635mg及び(3,3,3−トリフルオロプロピルスルホニル)酢酸メチル703gをジメチルスルホキシド20mLに溶解させ、室温で炭酸セシウム1.14gを加え、110℃で10時間撹拌した。反応混合物に10%塩酸を加え、酢酸エチルで抽出した後、有機層を無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(5−トリフルオロメチルピリジン−2−イル)−2−(3,3,3−トリフルオロプロピルスルホニル)酢酸メチル(以下、本有機硫黄化合物(63)と記す。)360mgを得た。
本有機硫黄化合物(63)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)8.90(1H,m),8.07(1H,dd),7,85(1H,d),5,34(1H,s),3.87(3H,s),3.77(1H,ddd),3.46(1H,ddd),2.79−2.54(2H,m) Reference Production Example 62
635 mg of 2-chloro-5-trifluoromethylpyridine and 703 g of methyl (3,3,3-trifluoropropylsulfonyl) acetate are dissolved in 20 mL of dimethyl sulfoxide, 1.14 g of cesium carbonate is added at room temperature, and the mixture is stirred at 110 ° C. for 10 hours. Stir. After adding 10% hydrochloric acid to the reaction mixture and extracting with ethyl acetate, the organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography, and methyl 2- (5-trifluoromethylpyridin-2-yl) -2- (3,3,3-trifluoropropylsulfonyl) acetate represented by the following formula ( Hereinafter, this organic sulfur compound (63) is described.) 360 mg was obtained.
This organic sulfur compound (63)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 8.90 (1H, m), 8.07 (1H, dd), 7, 85 (1H, d), 5, 34 (1H, s) , 3.87 (3H, s), 3.77 (1H, ddd), 3.46 (1H, ddd), 2.79-2.54 (2H, m)

参考製造例63
本有機硫黄化合物(63)472mgをN,N−ジメチルホルムアミド5.0mLに溶解させ、室温でN−クロロスクシンイミド244mgを加えた。同温で1時間撹拌した後、反応混合物をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−クロロ−2−(5−トリフルオロメチルピリジン−2−イル)−2−(3,3,3−トリフルオロプロピルスルホニル)酢酸メチル(以下、本有機硫黄化合物(64)と記す。)410mgを得た。
本有機硫黄化合物(64)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)8.88(1H,m),8.15−8.12(2H,m),3.99(1H,ddd),3.94(3H,s),3.58(1H,ddd),2.85−2.55(2H,m) Reference Production Example 63
472 mg of this organic sulfur compound (63) was dissolved in 5.0 mL of N, N-dimethylformamide, and 244 mg of N-chlorosuccinimide was added at room temperature. After stirring at the same temperature for 1 hour, the reaction mixture was subjected to silica gel column chromatography, and 2-chloro-2- (5-trifluoromethylpyridin-2-yl) -2- (3,3 , 3-trifluoropropylsulfonyl) methyl acetate (hereinafter referred to as the present organic sulfur compound (64)) (410 mg) was obtained.
This organic sulfur compound (64)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 8.88 (1H, m), 8.15-8.12 (2H, m), 3.99 (1H, ddd), 3.94 ( 3H, s), 3.58 (1H, ddd), 2.85-2.55 (2H, m)

参考製造例64
本有機硫黄化合物(64)をメタノール5.0mLに溶解させ、室温でアンモニア水(28%水溶液)2.0mlを加えた。同温で2時間撹拌した後、減圧下濃縮し、得られた残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−[クロロ−(3,3,3−トリフルオロプロパンスルホニル)メチル]−5−トリフルオロメチルピリジン(以下、本有機硫黄化合物(65)と記す。)352mgを得た。
本有機硫黄化合物(65)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)8.94(1H,s),8.10(1H,dd),7.86(1H,d),5.86(1H,s),3.63−3.55(2H,m),2.84−2.64(2H,m) Reference production example 64
This organic sulfur compound (64) was dissolved in 5.0 mL of methanol, and 2.0 mL of aqueous ammonia (28% aqueous solution) was added at room temperature. After stirring at the same temperature for 2 hours, the mixture was concentrated under reduced pressure, and the resulting residue was subjected to silica gel column chromatography to give 2- [chloro- (3,3,3-trifluoropropanesulfonyl) methyl represented by the following formula. 352 mg of -5-trifluoromethylpyridine (hereinafter referred to as the present organic sulfur compound (65)) was obtained.
This organic sulfur compound (65)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 8.94 (1H, s), 8.10 (1H, dd), 7.86 (1H, d), 5.86 (1H, s) , 3.63-3.55 (2H, m), 2.84-2.64 (2H, m)

参考製造例65
メタノール20mLに水素化ホウ素ナトリウム236mgを溶解させ、室温で2−アセチル−5−クロロチオフェン1.00gを加えた。同温で0.5時間撹拌後、反応混合液に10%塩酸を加え、クロロホルムで抽出した。有機層を無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。得られた残渣をクロロホルム20mLに溶解させ、室温で塩化チオニル0.9mLを加えた。同温で1時間撹拌後、反応混合液を減圧下濃縮した。得られた残渣をテトラヒドロフラン20mLに溶解させ、室温でS−(3,3,3−トリフルオロプロピル)ベンゼンチオアート1.46g加えた。この溶液に室温でナトリウムメトキシド(28%メタノール溶液)1.2mLを滴下した。同温で1時間撹拌後、反応混合液に10%塩酸を加え、酢酸エチルで抽出した。有機層を無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。得られた残渣をカラムクロマトグラフィーに付し、下式に示される2−クロロ−5−[1−(3,3,3−トリフルオロプロピルスルファニル)エチル]チオフェン(以下、本有機硫黄化合物(66)と記す。)300mgを得た。
本有機硫黄化合物(66)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)6.69−6.72(2H,m),4.13(1H,q),2.57−2.64(2H,m),2.26−2.38(2H,m),1.62(3H,d) Reference Production Example 65
236 mg of sodium borohydride was dissolved in 20 mL of methanol, and 1.00 g of 2-acetyl-5-chlorothiophene was added at room temperature. After stirring at the same temperature for 0.5 hour, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with chloroform. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was dissolved in 20 mL of chloroform, and 0.9 mL of thionyl chloride was added at room temperature. After stirring at the same temperature for 1 hour, the reaction mixture was concentrated under reduced pressure. The obtained residue was dissolved in 20 mL of tetrahydrofuran, and 1.46 g of S- (3,3,3-trifluoropropyl) benzenethioate was added at room temperature. To this solution, 1.2 mL of sodium methoxide (28% methanol solution) was added dropwise at room temperature. After stirring at the same temperature for 1 hour, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to column chromatography, and 2-chloro-5- [1- (3,3,3-trifluoropropylsulfanyl) ethyl] thiophene (hereinafter referred to as the present organic sulfur compound (66) represented by the following formula: ) 300 mg was obtained.
This organic sulfur compound (66)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 6.69-6.72 (2H, m), 4.13 (1H, q), 2.57-2.64 (2H, m), 2.26-2.38 (2H, m), 1.62 (3H, d)

参考製造例66
メタノール20mLに3−クロロメチル−5−tert−ブチルイソオキサゾール500mgおよびをS−(3,3,3−トリフルオロプロピル)ベンゼンチオアート537mg溶解させ、室温でナトリウムメトキシド(28%メタノール溶液)0.5mLを滴下した。同温で2時間撹拌後、反応混合液に10%塩酸を加え、酢酸エチルで抽出した。有機層を無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。得られた残渣をカラムクロマトグラフィーに付し、下式に示される5−tert−ブチル−3−[(3,3,3−トリフルオロプロピルスルファニル)メチル]イソオキサゾール(以下、本有機硫黄化合物(67)と記す。)440mgを得た。
本有機硫黄化合物(67)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)5.96(1H,s),3.70(2H,s),2.63−2.67(2H,m),2.29−2.41(2H,m),1.34(9H,d) Reference production example 66
In 20 mL of methanol, 500 mg of 3-chloromethyl-5-tert-butylisoxazole and 537 mg of S- (3,3,3-trifluoropropyl) benzenethioate were dissolved, and sodium methoxide (28% methanol solution) 0 was dissolved at room temperature. .5 mL was added dropwise. After stirring at the same temperature for 2 hours, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to column chromatography, and 5-tert-butyl-3-[(3,3,3-trifluoropropylsulfanyl) methyl] isoxazole represented by the following formula (hereinafter referred to as the present organic sulfur compound ( 67).) 440 mg was obtained.
This organic sulfur compound (67)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 5.96 (1H, s), 3.70 (2H, s), 2.63-2.67 (2H, m), 2.29- 2.41 (2H, m), 1.34 (9H, d)

参考製造例67
テトラヒドロフラン10mLに4−トリフルオロメチルイミダゾール1.00gおよび水酸化テトラ−n−ブチルアンモニウム溶液(10%)0.4mL溶解させ、室温でホルムアルデヒド(36%水溶液)10mLを加えた。同温で14時間撹拌後、反応混合液を減圧下濃縮し、得られた残渣をカラムクロマトグラフィーに付し、クルードの4−トリフルオロメチルイミダゾール−1−イルメタノールを得た。これをクロロホルム20mLに溶解させ、室温で塩化チオニル0.8mLを加えた。還流条件下で16時間撹拌後、反応混合液を室温に戻し、減圧下濃縮した。得られた残渣をテトラヒドロフラン20mLに溶解させ、S−(3,3,3−トリフルオロプロピル)ベンゼンチオアート940mgを加えた。この溶液に室温でナトリウムメトキシド(28%メタノール溶液)2.4mLを滴下した。同温で10時間撹拌後、反応混合液に10%塩酸を加え、酢酸エチルで抽出した。有機層を無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。得られた残渣をカラムクロマトグラフィーに付し、下式に示される4−トリフルオロメチル−1−[(3,3,3−トリフルオロプロピルスルファニル)メチル]−1H−イミダゾール(以下、本有機硫黄化合物(68)と記す。)800mgを得た。
本有機硫黄化合物(68)

Figure 2010150156
1H−NMR(CDCl3,TMS):δ(ppm)7.65(1H,s),7.43(1H,s),5.01(2H,s),2.67−2.71(2H,m),2.27−2.381(2H,m) Reference Production Example 67
To 10 mL of tetrahydrofuran was dissolved 1.00 g of 4-trifluoromethylimidazole and 0.4 mL of tetra-n-butylammonium hydroxide solution (10%), and 10 mL of formaldehyde (36% aqueous solution) was added at room temperature. After stirring at the same temperature for 14 hours, the reaction mixture was concentrated under reduced pressure, and the resulting residue was subjected to column chromatography to obtain crude 4-trifluoromethylimidazol-1-ylmethanol. This was dissolved in 20 mL of chloroform, and 0.8 mL of thionyl chloride was added at room temperature. After stirring for 16 hours under reflux conditions, the reaction mixture was returned to room temperature and concentrated under reduced pressure. The obtained residue was dissolved in 20 mL of tetrahydrofuran, and 940 mg of S- (3,3,3-trifluoropropyl) benzenethioate was added. To this solution, 2.4 mL of sodium methoxide (28% methanol solution) was added dropwise at room temperature. After stirring at the same temperature for 10 hours, 10% hydrochloric acid was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to column chromatography, and 4-trifluoromethyl-1-[(3,3,3-trifluoropropylsulfanyl) methyl] -1H-imidazole (hereinafter referred to as the present organic sulfur) represented by the following formula: Compound (68).) 800 mg was obtained.
This organic sulfur compound (68)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.65 (1H, s), 7.43 (1H, s), 5.01 (2H, s), 2.67-2.71 ( 2H, m), 2.27-2.381 (2H, m)

参考製造例68
メタノール26mlにカリウムチオアセテート1.68g及び1−tert−ブチル−4−(クロロメチル)−1H−ピラゾール2.32gを加え、50℃で4時間加熱した。室温に冷却後、28%ナトリウムメトキシドメタノール溶液2.78g、1−ヨード−3,3,3−トリフルオロプロパン3.54gを加え、50℃で4時間加熱した。室温まで冷却後、水50mlを加え、減圧下50mlまで濃縮した。酢酸エチルで抽出後、有機層を飽和食塩水で洗浄した。有機層を無水硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。得られた残渣をカラムクロマトグラフィーに付し、下式に示される1−tert−ブチル−4−[(3,3,3−トリフルオロプロピルスルファニル)メチル]−1H−ピラゾール(以下、本有機硫黄化合物(69)と記す。)2.73gを得た。
本有機硫黄化合物(69)

Figure 2010150156
1H−NMR(CDCl3、TMS):δ(ppm)7.46(1H,s),7.45(1H,s),3.65(2H,s),2.61−2.65(2H,m),2.26−2.38(2H,m),1.54(9H,s) Reference production example 68
To 26 ml of methanol were added 1.68 g of potassium thioacetate and 2.32 g of 1-tert-butyl-4- (chloromethyl) -1H-pyrazole, and the mixture was heated at 50 ° C. for 4 hours. After cooling to room temperature, 2.78 g of 28% sodium methoxide methanol solution and 3.54 g of 1-iodo-3,3,3-trifluoropropane were added and heated at 50 ° C. for 4 hours. After cooling to room temperature, 50 ml of water was added, and the mixture was concentrated to 50 ml under reduced pressure. After extraction with ethyl acetate, the organic layer was washed with saturated brine. The organic layer was dried over anhydrous sodium sulfate, filtered and concentrated under reduced pressure. The obtained residue was subjected to column chromatography, and 1-tert-butyl-4-[(3,3,3-trifluoropropylsulfanyl) methyl] -1H-pyrazole (hereinafter referred to as the present organic sulfur) represented by the following formula: 2.73 g of compound (69) was obtained.
This organic sulfur compound (69)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.46 (1H, s), 7.45 (1H, s), 3.65 (2H, s), 2.61-2.65 ( 2H, m), 2.26-2.38 (2H, m), 1.54 (9H, s)

参考製造例69
水40mLにモノ過硫酸水素カリウム(オキソン(登録商標)、デュポン株式会社製)24.59gを溶解し、メタノール40mLに溶解した本有機硫黄化合物(4)2.40gを加えた。50℃に加熱し、5時間攪拌後、室温に冷却した。10%亜硫酸ナトリウム水溶液を加え、酢酸エチルで抽出した。有機層を無水硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。得られた残渣をカラムクロマトグラフィーに付し、下式に示される1−tert−ブチル−4−[(3,3,3−トリフルオロプロピルスルホニル)メチル]−1H−ピラゾール(以下、本有機硫黄化合物(70)と記す。)2.61gを得た。
本有機硫黄化合物(70)

Figure 2010150156
1H−NMR(CDCl3、TMS):δ(ppm)7.66(1H,s),7.56(1H,s),4.20(2H,s),3.05−3.09(2H,m),2.51−2.63(2H,m),1.60(9H,s) Reference Production Example 69
In 40 mL of water, 24.59 g of potassium hydrogen persulfate (Oxone (registered trademark), manufactured by DuPont) was dissolved, and 2.40 g of the organic sulfur compound (4) dissolved in 40 mL of methanol was added. The mixture was heated to 50 ° C., stirred for 5 hours, and then cooled to room temperature. A 10% aqueous sodium sulfite solution was added, and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous sodium sulfate, filtered and concentrated under reduced pressure. The obtained residue was subjected to column chromatography, and 1-tert-butyl-4-[(3,3,3-trifluoropropylsulfonyl) methyl] -1H-pyrazole (hereinafter referred to as the present organic sulfur) represented by the following formula: Compound (70).) 2.61 g was obtained.
This organic sulfur compound (70)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.66 (1H, s), 7.56 (1H, s), 4.20 (2H, s), 3.05-3.09 ( 2H, m), 2.51-2.63 (2H, m), 1.60 (9H, s)

参考製造例70
〔工程1〕
テトラヒドロフラン6.0mLにブロモ−(4‐ブロモフェニル)酢酸メチル4.04gを溶解し、室温でチオ酢酸カリウム1.79gおよび水2.0mLを加え、同温で3時間撹拌した。該反応混合物を分液により有機層を分離し、水層をMTBEで抽出した。有機層を合一し、無水硫酸マグネシウムで乾燥後、減圧下濃縮し、アセチルスルファニル−(4‐ブロモフェニル)酢酸メチル4.21gを得た。
アセチルスルファニル−(4‐ブロモフェニル)酢酸メチル
H−NMR(CDCl,TMS):δ(ppm)7.48−7.45(2H,m)、7.28−7.26(2H,m)、5.27(1H,s)、 3.74(3H,s)、2.35(3H, s)
Reference production example 70
[Step 1]
4.06 g of methyl bromo- (4-bromophenyl) acetate was dissolved in 6.0 mL of tetrahydrofuran, and 1.79 g of potassium thioacetate and 2.0 mL of water were added at room temperature, followed by stirring at the same temperature for 3 hours. The organic layer was separated by separating the reaction mixture, and the aqueous layer was extracted with MTBE. The organic layers were combined, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure to obtain 4.21 g of methyl acetylsulfanyl- (4-bromophenyl) acetate.
Methyl acetylsulfanyl- (4-bromophenyl) acetate
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.48-7.45 (2H, m), 7.28-7.26 (2H, m), 5.27 (1H, s), 3.74 (3H, s), 2.35 (3H, s)

〔工程2〕
メタノール25mLにアセチルスルファニル−(4‐クロロフェニル)酢酸メチル4.21gと3−ヨード−1,1,1−トリフルオロプロパン4.12gとを溶解し、室温で28%ナトリウムメトキシド(メタノール溶液)3.54gを30分かけて滴下した。反応混合物を同温で12時間撹拌後、12%の塩酸水溶液で中和し、減圧下濃縮した。濃縮物を酢酸エチル30mLに溶解させ、水10mL、飽和食塩水10mLで洗浄した。有機層を無水硫酸マグネシウムで乾燥後、減圧下濃縮した。残渣をカラムクロマトグラフィーに付し、2−(4‐ブロモフェニル)−2−(3,3,3−トリフルオロプロピルスルファニル)酢酸メチル(以下、本有機硫黄化合物(71)と記す。)2.05gを得た。
本有機硫黄化合物(71)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)7.50−7.49(2H,m)、7.34−7.33(2H,m)、4.55(1H,s)、3.75(3H,s)、 2.75−2.62(2H,m)、2.39−2.27(2H,m) [Step 2]
In 25 mL of methanol, 4.21 g of methyl acetylsulfanyl- (4-chlorophenyl) acetate and 4.12 g of 3-iodo-1,1,1-trifluoropropane were dissolved, and 28% sodium methoxide (methanol solution) 3 at room temperature. .54 g was added dropwise over 30 minutes. The reaction mixture was stirred at the same temperature for 12 hours, neutralized with 12% aqueous hydrochloric acid solution, and concentrated under reduced pressure. The concentrate was dissolved in 30 mL of ethyl acetate and washed with 10 mL of water and 10 mL of saturated brine. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. 1. The residue was subjected to column chromatography to obtain methyl 2- (4-bromophenyl) -2- (3,3,3-trifluoropropylsulfanyl) acetate (hereinafter referred to as the present organic sulfur compound (71)). 05 g was obtained.
This organic sulfur compound (71)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.50-7.49 (2H, m), 7.34-7.33 (2H, m), 4.55 (1H, s), 3.75 (3H, s), 2.75-2.62 (2H, m), 2.39-2.27 (2H, m)

参考製造例71
2−(4‐ブロモフェニル)−2−(3,3,3−トリフルオロプロピルスルファニル)酢酸メチル984mgをクロロホルム10mLに溶解し、m−クロロ過安息香酸(67%)1.70gを40℃でゆっくり加え、同温で4時間撹拌した。反応混合液を飽和炭酸水素ナトリウム溶液で洗浄し、有機層を無水硫酸マグネシウムで乾燥後、減圧下濃縮した。残渣をカラムクロマトグラフィーに付し、2−(4‐ブロモフェニル)−2−(3,3,3−トリフルオロプロピルスルホニル)酢酸メチル(以下、本有機硫黄化合物(72)と記す。)723mgを得た。
本有機硫黄化合物(72)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)7.62−7.59(2H,m)、7.47−7.45(2H,m)、5.01(1H,s)、 3.88 (3H, s)、 3.50 (1H, td, J = 12.9, 4.5 Hz)、 3.19 (1H, td, J = 12.9, 4.5 Hz)、 2.72−2.41 (2H, m) Reference production example 71
984 mg of methyl 2- (4-bromophenyl) -2- (3,3,3-trifluoropropylsulfanyl) acetate was dissolved in 10 mL of chloroform, and 1.70 g of m-chloroperbenzoic acid (67%) was added at 40 ° C. Slowly added and stirred at the same temperature for 4 hours. The reaction mixture was washed with a saturated sodium bicarbonate solution, and the organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The residue was subjected to column chromatography to obtain 723 mg of methyl 2- (4-bromophenyl) -2- (3,3,3-trifluoropropylsulfonyl) acetate (hereinafter referred to as the present organic sulfur compound (72)). Obtained.
This organic sulfur compound (72)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.62-7.59 (2H, m), 7.47-7.45 (2H, m), 5.01 (1H, s), 3.88 (3H, s), 3.50 (1H, td, J = 12.9, 4.5 Hz), 3.19 (1H, td, J = 12.9, 4.5 Hz), 2 .72-2.41 (2H, m)

参考製造例72
水素化ナトリウム(55%油性)91mgをテトラヒドロフラン15mLに懸濁させ、室温にて2−(4‐ブロモフェニル)−2−(3,3,3−トリフルオロプロピルスルホニル)酢酸メチル723mgのテトラヒドロフラン5mL溶液を滴下した。同温で30分撹拌後、N−クロロスクシンイミド279mgを加えた。反応混合液を5時間撹拌後、12%塩酸水溶液で中和した。水層を酢酸エチルで抽出し、有機層を無水硫酸マグネシウムで乾燥後、減圧下濃縮した。残渣をカラムクロマトグラフィーに付し、2−クロロ−2−(4‐ブロモフェニル)−2−(3,3,3−トリフルオロプロピルスルホニル)酢酸メチル(以下、本有機硫黄化合物(73)と記す。)134mgを得た。
本有機硫黄化合物(73)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)7.63−7.60 (4H, m)、 7.56−7.53 (4H, m)、 3.95 (3H, s)、 3.80−3.64 (2H, m)、 2.72−2.67 (2H, m) Reference production example 72
A solution of 91 mg of sodium hydride (55% oily) in 15 mL of tetrahydrofuran and 723 mg of methyl 2- (4-bromophenyl) -2- (3,3,3-trifluoropropylsulfonyl) acetate in 5 mL of tetrahydrofuran at room temperature. Was dripped. After stirring at the same temperature for 30 minutes, 279 mg of N-chlorosuccinimide was added. The reaction mixture was stirred for 5 hours and then neutralized with 12% aqueous hydrochloric acid. The aqueous layer was extracted with ethyl acetate, and the organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The residue was subjected to column chromatography, and methyl 2-chloro-2- (4-bromophenyl) -2- (3,3,3-trifluoropropylsulfonyl) acetate (hereinafter referred to as the present organic sulfur compound (73)). 134 mg was obtained.
This organic sulfur compound (73)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.63-7.60 (4H, m), 7.56-7.53 (4H, m), 3.95 (3H, s), 3.80-3.64 (2H, m), 2.72-2.67 (2H, m)

参考製造例73
2−クロロ−2−(4‐ブロモフェニル)−2−(3,3,3−トリフルオロプロピルスルホニル)酢酸メチル631mgをメタノール5mLに溶解し、室温にてアンモニア水(28%水溶液)3.0mLを加えた。同温で2時間撹拌後、減圧下濃縮し、残渣をカラムクロマトグラフィーに付し、4−ブロモ−α−クロロベンジル=3,3,3−トリフルオロプロピル=スルホン(以下、本有機硫黄化合物(74)と記す。)447mgを得た。
本有機硫黄化合物(74)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)7.62−7.60 (2H, m)、 7.48−7.46 (2H, m)、 5.62 (1H, s)、 3.51−3.35 (2H, m)、 2.73−2.67 (2H, m) Reference production example 73
Dissolve 631 mg of methyl 2-chloro-2- (4-bromophenyl) -2- (3,3,3-trifluoropropylsulfonyl) acetate in 5 mL of methanol, and add 3.0 mL of aqueous ammonia (28% aqueous solution) at room temperature. Was added. After stirring at the same temperature for 2 hours, the mixture was concentrated under reduced pressure, the residue was subjected to column chromatography, and 4-bromo-α-chlorobenzyl = 3,3,3-trifluoropropylsulfone (hereinafter referred to as the present organic sulfur compound ( 74).) 447 mg was obtained.
This organic sulfur compound (74)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 7.62-7.60 (2H, m), 7.48-7.46 (2H, m), 5.62 (1H, s), 3.51-3.35 (2H, m), 2.73-2.67 (2H, m)

参考製造例74
(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル3.72g、1,4−ジオキサン100mlに溶解し、窒素雰囲気下、0℃で60%水素化ナトリウム1.71gを加えた。該溶液を30分攪拌後、3,4,5−トリフルオロブロモベンゼン3.00g、フェニルホスフィン447.6mgおよびトリス(ジベンジリデンアセトン)ジパラジウム(0)クロロホルム錯体294.4mgを加え、80℃で6時間攪拌した。該反応混合物を室温に冷却し、1N塩酸水溶液を加え、酢酸エチルで抽出した。有機層を硫酸ナトリウムで乾燥後、ろ過し、溶媒を減圧留去した。残渣をシリカゲルカラムクロマトグラフィーに付し、2−(3,4,5−トリフルオロベンジル)−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(75)と記す。)1.20gを得た。
本有機硫黄化合物(75)

Figure 2010150156
H−NMR(CDCl、TMS、δ(ppm)):2.75−2.80(2H,m)、3.47−3.51(2H,m)、5.05(1H、s)、7.25−7.28(2H、d) Reference production example 74
(3,3,3-trifluoropropylsulfonyl) acetonitrile (3.72 g) and 1,4-dioxane (100 ml) were dissolved, and 60% sodium hydride (1.71 g) was added at 0 ° C. in a nitrogen atmosphere. After stirring the solution for 30 minutes, 3.04 g of 3,4,5-trifluorobromobenzene, 447.6 mg of phenylphosphine and 294.4 mg of tris (dibenzylideneacetone) dipalladium (0) chloroform complex were added, and the mixture was heated at 80 ° C. Stir for 6 hours. The reaction mixture was cooled to room temperature, 1N aqueous hydrochloric acid solution was added, and the mixture was extracted with ethyl acetate. The organic layer was dried over sodium sulfate and filtered, and the solvent was distilled off under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (3,4,5-trifluorobenzyl) -2- (3,3,3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound (75)) 1.20 g was obtained.
This organic sulfur compound (75)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS, δ (ppm)): 2.75-2.80 (2H, m), 3.47-3.51 (2H, m), 5.05 (1H, s) 7.25-7.28 (2H, d)

参考製造例75
2−(3,4,5−トリフルオロベンジル)−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル500mgをテトラヒドロフラン20mlに溶解し、窒素雰囲気下、0℃で60%水素化ナトリウム60.4mgを加えた。該溶液を15分攪拌後、N−フルオロベンゼンスルホンイミド0.50gを加え、室温で2時間攪拌した。1N塩酸水溶液を加え、酢酸エチルで抽出した。有機層を硫酸ナトリウムで乾燥後、ろ過し、溶媒を減圧留去した。残渣をシリカゲルカラムクロマトグラフィーに付し、2−フルオロ−2−(3,4,5−トリフルオロベンジル)−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(76)と記す。)360mgを得た。
本有機硫黄化合物(76)

Figure 2010150156
H−NMR(CDCl、TMS、δ(ppm)):2.77−2.93(2H,m)、3.67−3.75(2H,m)、7.37−7.40(2H、d) Reference production example 75
500 mg of 2- (3,4,5-trifluorobenzyl) -2- (3,3,3-trifluoropropylsulfonyl) acetonitrile was dissolved in 20 ml of tetrahydrofuran, and 60% sodium hydride 60 at 60C under a nitrogen atmosphere. .4 mg was added. After stirring the solution for 15 minutes, 0.50 g of N-fluorobenzenesulfonimide was added, and the mixture was stirred at room temperature for 2 hours. 1N aqueous hydrochloric acid solution was added, and the mixture was extracted with ethyl acetate. The organic layer was dried over sodium sulfate and filtered, and the solvent was distilled off under reduced pressure. The residue was subjected to silica gel column chromatography, and 2-fluoro-2- (3,4,5-trifluorobenzyl) -2- (3,3,3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound). (Described as (76).) 360 mg was obtained.
This organic sulfur compound (76)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS, δ (ppm)): 2.77-2.93 (2H, m), 3.67-3.75 (2H, m), 7.37-7.40 ( 2H, d)

参考製造例76
(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル2.67g、1,2−ジメトキシエタン26mlに溶解し、窒素雰囲気下、0℃で60%水素化ナトリウム0.58gを加えた。該溶液を30分攪拌後、2−ブロモ−5−クロロピリジン2.55gおよびテトラキストリフェニルホスフィンパラジウム1.50gを加え、15時間、還流条件下で攪拌した。該反応混合物を0℃に冷却し、水50mlを加え、15分攪拌した後、酢酸エチル50mlで3回抽出した。有機層合一し、硫酸ナトリウムで乾燥後、ろ過し、溶媒を減圧留去した。残渣をシリカゲルカラムクロマトグラフィーに付し、2−(5−クロロピリジン−2−イル)−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(77)と記す。)0.51gを得た。
本有機硫黄化合物(77)

Figure 2010150156
H−NMR(CDCl、TMS、δ(ppm)):2.64−2.76(2H,m)、3.42−3.50(1H,m)、3.56−3.63(1H,m)、5.28(1H、s)、7.56(1H、d)、7.87(1H、dd)、8.68(1H、d) Reference production example 76
Dissolved in 2.67 g of (3,3,3-trifluoropropylsulfonyl) acetonitrile and 26 ml of 1,2-dimethoxyethane, 0.58 g of 60% sodium hydride was added at 0 ° C. under a nitrogen atmosphere. After stirring the solution for 30 minutes, 2.55 g of 2-bromo-5-chloropyridine and 1.50 g of tetrakistriphenylphosphine palladium were added, and the mixture was stirred for 15 hours under reflux conditions. The reaction mixture was cooled to 0 ° C., added with 50 ml of water, stirred for 15 minutes, and extracted three times with 50 ml of ethyl acetate. The organic layers were combined, dried over sodium sulfate, filtered, and the solvent was removed under reduced pressure. The residue was subjected to silica gel column chromatography and described as 2- (5-chloropyridin-2-yl) -2- (3,3,3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound (77)). .) 0.51 g was obtained.
This organic sulfur compound (77)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS, δ (ppm)): 2.64-2.76 (2H, m), 3.42-3.50 (1H, m), 3.56-3.63 ( 1H, m), 5.28 (1H, s), 7.56 (1H, d), 7.87 (1H, dd), 8.68 (1H, d)

参考製造例77
2−(5−クロロピリジン−2−イル)−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル0.41gをN,N−ジメチルホルムアミド4mlに溶解し、炭酸カリウム0.32g、ヨウ化メチル0.28gを加え、窒素雰囲気下、室温で一晩攪拌した。該反応混合物に飽和食塩水50mlを加え、酢酸エチル30mlで3回抽出した。有機層合一し、硫酸ナトリウムで乾燥後、ろ過し、溶媒を減圧留去した。残渣をシリカゲルカラムクロマトグラフィーに付し、2−(5−クロロピリジン−2−イル)−2−(3,3,3−トリフルオロプロピルスルホニル)プロピオニトリル(以下、本有機硫黄化合物(78)と記す。)0.32gを得た。
本有機硫黄化合物(78)

Figure 2010150156
H−NMR(CDCl、TMS、δ(ppm)):2.25(3H、s)、2.50−2.66(1H,m)、2.69−2.84(1H,m)、3.29−3.37(1H,m)、3.54−3.62(1H,m)、7.61(1H、d)、7.85(1H、dd)、8.68(1H、d) Reference Production Example 77
0.41 g of 2- (5-chloropyridin-2-yl) -2- (3,3,3-trifluoropropylsulfonyl) acetonitrile is dissolved in 4 ml of N, N-dimethylformamide, 0.32 g of potassium carbonate, iodine 0.28 g of methyl chloride was added, and the mixture was stirred overnight at room temperature under a nitrogen atmosphere. To the reaction mixture was added 50 ml of saturated brine, and the mixture was extracted 3 times with 30 ml of ethyl acetate. The organic layers were combined, dried over sodium sulfate, filtered, and the solvent was removed under reduced pressure. The residue was subjected to silica gel column chromatography to give 2- (5-chloropyridin-2-yl) -2- (3,3,3-trifluoropropylsulfonyl) propionitrile (hereinafter referred to as the present organic sulfur compound (78)). 0.32 g was obtained.
This organic sulfur compound (78)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS, δ (ppm)): 2.25 (3H, s), 2.50-2.66 (1H, m), 2.69-2.84 (1H, m) 3.29-3.37 (1H, m), 3.54-3.62 (1H, m), 7.61 (1H, d), 7.85 (1H, dd), 8.68 (1H) D)

参考製造例78
〔工程1〕
1,4−ジオキサスピロ〔4.5〕デカン−8−メタノール5.45gをピリジン30mlに溶解し、これにp−トルエンスルホニルクロライド6.64gを加え、室温で6時間攪拌した。該反応混合物に水100mlを加え、酢酸エチル100mlで2回抽出した。有機層を1N塩酸水溶液100mlで2回、更に飽和炭酸水素ナトリウム水溶液100mlで1回、飽和食塩水100mlで1回順次洗浄した。有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、1,4−ジオキサスピロ〔4.5〕デカ−8−イルメチル=p−トルエンスルホナート9.86gを得た。
Reference production example 78
[Step 1]
1,4-Dioxaspiro [4.5] decane-8-methanol (5.45 g) was dissolved in 30 ml of pyridine, and 6.64 g of p-toluenesulfonyl chloride was added thereto, followed by stirring at room temperature for 6 hours. 100 ml of water was added to the reaction mixture, and the mixture was extracted twice with 100 ml of ethyl acetate. The organic layer was washed successively with 100 ml of 1N aqueous hydrochloric acid twice, then once with 100 ml of saturated aqueous sodium hydrogen carbonate solution and once with 100 ml of saturated brine. The organic layer was dried over sodium sulfate, filtered and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 9.86 g of 1,4-dioxaspiro [4.5] dec-8-ylmethyl = p-toluenesulfonate.

〔工程2〕
1,4−ジオキサスピロ〔4.5〕デカ−8−イルメチル=p−トルエンスルホナート9.86gをジメチルスルホキシド40mlに溶解し、これにチオ酢酸カリウム4.00gを加え、70℃で8時間攪拌した。室温まで冷却後、該反応混合物に水100mlを加え、酢酸エチル100mlで2回抽出した。有機層を飽和食塩水100mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、1,4−ジオキサスピロ〔4.5〕デカ−8−イルメチル=チオアセテート5.41gを得た。
[Step 2]
1.86 g of 1,4-dioxaspiro [4.5] dec-8-ylmethyl = p-toluenesulfonate was dissolved in 40 ml of dimethyl sulfoxide, 4.00 g of potassium thioacetate was added thereto, and the mixture was stirred at 70 ° C. for 8 hours. . After cooling to room temperature, 100 ml of water was added to the reaction mixture, and the mixture was extracted twice with 100 ml of ethyl acetate. The organic layer was washed with 100 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 5.41 g of 1,4-dioxaspiro [4.5] dec-8-ylmethyl = thioacetate.

〔工程3〕
1,4−ジオキサスピロ〔4.5〕デカ−8−イルメチル=チオアセテート5.41gをメタノール20mlに溶解し、窒素雰囲気下、0℃でこれに28%ナトリウムメトキシド/メタノール溶液6.75gを加えた。該混合物に3,3,3−トリフルオロ−1−ヨードプロパン7.81gを加え、室温で1時間攪拌後、70℃で1時間攪拌した。該反応混合物を室温まで冷却後、水100mlを加え、減圧下濃縮し、水層を酢酸エチル100mlで2回抽出した。有機層を飽和食塩水100mlで洗浄し、有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される8−(3,3,3−トリフルオロプロピルチオメチル)−1,4−ジオキサスピロ〔4.5〕デカン(以下、本有機硫黄化合物(101)と記す。)3.69gを得た。
本有機硫黄化合物(101)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.25−1.35(2H,m),1.48−1.58(3H,m),1.73−1.79(2H,m),1.84−1.88(2H,m),2.33−2.43(2H,m),2.46(2H,d),2.65−2.69(2H,m),3.94(4H,s) [Step 3]
Dissolve 5.41 g of 1,4-dioxaspiro [4.5] dec-8-ylmethyl thioacetate in 20 ml of methanol and add 6.75 g of 28% sodium methoxide / methanol solution to this at 0 ° C. in a nitrogen atmosphere. It was. To the mixture, 7.81 g of 3,3,3-trifluoro-1-iodopropane was added, stirred at room temperature for 1 hour, and then stirred at 70 ° C. for 1 hour. The reaction mixture was cooled to room temperature, 100 ml of water was added, the mixture was concentrated under reduced pressure, and the aqueous layer was extracted twice with 100 ml of ethyl acetate. The organic layer was washed with 100 ml of saturated brine, and the organic layer was dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 8- (3,3,3-trifluoropropylthiomethyl) -1,4-dioxaspiro [4.5] decane (hereinafter referred to as the present organic sulfur compound ( 101).) 3.69 g was obtained.
This organic sulfur compound (101)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.25-1.35 (2H, m), 1.48-1.58 (3H, m), 1.73-1.79 (2H , M), 1.84-1.88 (2H, m), 2.33-2.43 (2H, m), 2.46 (2H, d), 2.65-2.69 (2H, m ), 3.94 (4H, s)

参考製造例79
本有機硫黄化合物(101)3.69gをクロロホルム60mlに溶解し、窒素雰囲気下、0℃でこれにm−クロロ過安息香酸6.56gを加え、室温で1時間攪拌し、更に50℃で3時間攪拌した。該反応混合物を0℃まで冷却し、5%亜硫酸ナトリウム水溶液50mlを加え、1時間攪拌した後に、有機層を分離した。水層をクロロホルム50mlで抽出し、有機層を合一して、飽和炭酸水素ナトリウム水溶液50mlで2回洗浄し、飽和食塩水100mlで洗浄した。得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される8−(3,3,3−トリフルオロプロピルスルホニルメチル)−1,4−ジオキサスピロ〔4.5〕デカン(以下、本有機硫黄化合物(102)と記す。)4.10gを得た。
本有機硫黄化合物(102)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.43−1.53(2H,m),1.58−1.66(2H,m),1.73−1.79(2H,m),1.97−2.01(2H,m),2.15−2.17(1H,m),2.64−2.74(2H,m),2.95(2H,d),3.16−3.20(2H,m),3.92−3.97(4H,m) Reference Production Example 79
The organic sulfur compound (101) (3.69 g) was dissolved in chloroform (60 ml). Under a nitrogen atmosphere, m-chloroperbenzoic acid (6.56 g) was added thereto at 0 ° C., and the mixture was stirred at room temperature for 1 hour. Stir for hours. The reaction mixture was cooled to 0 ° C., 50 ml of 5% aqueous sodium sulfite solution was added and stirred for 1 hour, and then the organic layer was separated. The aqueous layer was extracted with 50 ml of chloroform, and the organic layers were combined, washed twice with 50 ml of saturated aqueous sodium hydrogen carbonate solution, and washed with 100 ml of saturated brine. The obtained organic layer was dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 8- (3,3,3-trifluoropropylsulfonylmethyl) -1,4-dioxaspiro [4.5] decane (hereinafter referred to as the present organic sulfur compound ( 102).) 4.10 g was obtained.
This organic sulfur compound (102)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.43-1.53 (2H, m), 1.58-1.66 (2H, m), 1.73-1.79 (2H M), 1.97-2.01 (2H, m), 2.15-2.17 (1H, m), 2.64-2.74 (2H, m), 2.95 (2H, d). ), 3.16-3.20 (2H, m), 3.92-3.97 (4H, m)

参考製造例80
本有機硫黄化合物(102)4.00gをアセトン30mlに溶解し、これにトルエンスルホン酸0.43gを加え、窒素雰囲気下、50℃で8時間攪拌した。該反応溶液を減圧下濃縮し、残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される4−(3,3,3−トリフルオロプロピルスルホニルメチル)シクロヘキサノン(以下、本有機硫黄化合物(103)と記す。)3.35gを得た。
本有機硫黄化合物(103)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.59−1.70(2H,m),2.33−2.36(2H,m),2.43−2.46(4H,m),2.58−2.67(1H,m),2.2.69−2.73(2H,m),3.03(2H,d),3.20−3.25(2H,m) Reference production example 80
4.00 g of this organic sulfur compound (102) was dissolved in 30 ml of acetone, 0.43 g of toluenesulfonic acid was added thereto, and the mixture was stirred at 50 ° C. for 8 hours in a nitrogen atmosphere. The reaction solution was concentrated under reduced pressure, the residue was subjected to silica gel column chromatography, and 4- (3,3,3-trifluoropropylsulfonylmethyl) cyclohexanone (hereinafter referred to as the present organic sulfur compound (103)) represented by the following formula: 3.35 g was obtained.
This organic sulfur compound (103)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.59-1.70 (2H, m), 2.33-2.36 (2H, m), 2.43-2.46 (4H M), 2.58-2.67 (1H, m), 2.2.69-2.73 (2H, m), 3.03 (2H, d), 3.20-3.25 (2H) , M)

参考製造例81
本有機硫黄化合物(103)0.82gをクロロホルム6mlに溶解し、窒素雰囲気下、0℃でこれにジエチルアミノサルファトリフルオリド1.06gを加え、室温で5時間攪拌した。該反応溶液をクロロホルム30mlで希釈し、水30mlを加え、有機層を分離した。水層をクロロホルム30mlで2回抽出し、有機層を合一して、飽和食塩水50mlで洗浄した。得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される1,1−ジフルオロ−4−(3,3,3−トリフルオロプロピルスルホニルメチル)シクロヘキサン(以下、本有機硫黄化合物(104)と記す。)0.30g及び下式に示される1−フルオロ−4−(3,3,3−トリフルオロプロピルスルホニル)メチル〕シクロヘキセン(以下、本有機硫黄化合物(105)と記す。)0.27gを得た。
本有機硫黄化合物(104)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.45−1.56(2H,m),1.72−1.88(2H,m),2.05−2.23(5H,m),2.63−2.75(2H,m),2.97(2H,d),3.02−3.22(2H,m)
本有機硫黄化合物(105)
Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.65−1.73(1H,m),1.99−2.10(2H,m),2.19−2.25(1H,m),2.33−2.43(3H,m),2.63−2.75(2H,m),3.02(2H,d),3.18−3.22(2H,m),5.11−5.19(1H,m) Reference production example 81
0.82 g of this organic sulfur compound (103) was dissolved in 6 ml of chloroform, and 1.06 g of diethylaminosulfur trifluoride was added thereto at 0 ° C. in a nitrogen atmosphere, followed by stirring at room temperature for 5 hours. The reaction solution was diluted with 30 ml of chloroform, 30 ml of water was added, and the organic layer was separated. The aqueous layer was extracted twice with 30 ml of chloroform, and the organic layers were combined and washed with 50 ml of saturated brine. The obtained organic layer was dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue is subjected to silica gel column chromatography and described as 1,1-difluoro-4- (3,3,3-trifluoropropylsulfonylmethyl) cyclohexane (hereinafter referred to as the present organic sulfur compound (104)) represented by the following formula. ) 0.30 g and 1-fluoro-4- (3,3,3-trifluoropropylsulfonyl) methyl] cyclohexene (hereinafter referred to as the present organic sulfur compound (105)) represented by the following formula: 0.27 g. It was.
This organic sulfur compound (104)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.45-1.56 (2H, m), 1.72-1.88 (2H, m), 2.05-2.23 (5H) M), 2.62-2.75 (2H, m), 2.97 (2H, d), 3.02-3.22 (2H, m)
This organic sulfur compound (105)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.65-1.73 (1H, m), 1.99-2.10 (2H, m), 2.19-2.25 (1H , M), 2.33-2.43 (3H, m), 2.63-2.75 (2H, m), 3.02 (2H, d), 3.18-3.22 (2H, m ), 5.11-5.19 (1H, m)

参考製造例82
本有機硫黄化合物(103)0.83gをテトラヒドロフラン10mlに溶解し、窒素雰囲気下、0℃でこれに0.5Mエチニルマグネシウムブロミド/テトラヒドロフラン溶液7.2mlを加え、0℃で5時間攪拌した。該反応溶液に1N塩酸水溶液30mlを加え、酢酸エチル30mlで2回抽出した。有機層を合一して、飽和炭酸水素ナトリウム水溶液30ml、飽和食塩水30mlで洗浄した。得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される1−エチニル−4−(3,3,3−トリフルオロプロピルスルホニルメチル)シクロヘキサノール(以下、本有機硫黄化合物(106)と記す。)0.43gを得た。
本有機硫黄化合物(106)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.50−1.59(4H,m),2.03−2.11(6H,m),2.53(1H,s),2.63−2.74(2H,m),2.97(2H,d),3.16−3.20(2H,m) Reference production example 82
0.83 g of the organic sulfur compound (103) was dissolved in 10 ml of tetrahydrofuran, and 7.2 ml of a 0.5 M ethynylmagnesium bromide / tetrahydrofuran solution was added thereto at 0 ° C. in a nitrogen atmosphere, followed by stirring at 0 ° C. for 5 hours. To the reaction solution was added 30 ml of 1N aqueous hydrochloric acid solution, and the mixture was extracted twice with 30 ml of ethyl acetate. The organic layers were combined and washed with 30 ml of saturated aqueous sodium hydrogen carbonate solution and 30 ml of saturated brine. The obtained organic layer was dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 1-ethynyl-4- (3,3,3-trifluoropropylsulfonylmethyl) cyclohexanol represented by the following formula (hereinafter referred to as the present organic sulfur compound (106)). 0.43 g was obtained.
This organic sulfur compound (106)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.50-1.59 (4H, m), 2.03-2.11 (6H, m), 2.53 (1H, s), 2.63-2.74 (2H, m), 2.97 (2H, d), 3.16-3.20 (2H, m)

参考製造例83
本有機硫黄化合物(106)0.29gをクロロホルム2mlに溶解し、窒素雰囲気下、0℃でこれにジエチルアミノサルファトリフルオリド0.32gを加え、室温で5時間攪拌した。該反応溶液をクロロホルム20mlで希釈し、水20mlを加えた後に、有機層を分離した。水層をクロロホルム20mlで2回抽出した。有機層を合一して、飽和食塩水50mlで洗浄した。得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される1−エチニル−1−フルオロ−4−(3,3,3−トリフルオロプロピルスルホニルメチル)シクロヘキサン(以下、本有機硫黄化合物(107)と記す。)0.14gを得た。
本有機硫黄化合物(107)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.52−1.59(2H,m),1.72−1.94(4H,m),2.17−2.28(3H,m),2.62−2.72(3H,m),2.95(2H,d),3.17−3.22(2H,m) Reference production example 83
0.29 g of this organic sulfur compound (106) was dissolved in 2 ml of chloroform, 0.32 g of diethylaminosulfur trifluoride was added thereto at 0 ° C. under a nitrogen atmosphere, and the mixture was stirred at room temperature for 5 hours. The reaction solution was diluted with 20 ml of chloroform, 20 ml of water was added, and then the organic layer was separated. The aqueous layer was extracted twice with 20 ml of chloroform. The organic layers were combined and washed with 50 ml of saturated brine. The obtained organic layer was dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 1-ethynyl-1-fluoro-4- (3,3,3-trifluoropropylsulfonylmethyl) cyclohexane (hereinafter referred to as the present organic sulfur compound (107)) represented by the following formula: 0.14 g was obtained.
This organic sulfur compound (107)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.52-1.59 (2H, m), 1.72-1.94 (4H, m), 2.17-2.28 (3H M), 2.62-2.72 (3H, m), 2.95 (2H, d), 3.17-3.22 (2H, m)

参考製造例84
〔工程1〕
ジイソプロピルアミン4.86gをテトラヒドロフラン50mlに溶解し、窒素雰囲気下、−50℃に冷却した。1.6Mのn−ブチルリチウム/n−ヘキサン溶液30mlを該溶液に加え、−50℃で30分間攪拌した。更に、該混合物にテトラヒドロフラン40mlに溶解した2−(1,4−ジオキサスピロ〔4,5〕デシ−8−イル)酢酸メチル9.28gを15分かけて滴下後、0℃で30分間攪拌した。該混合物を−50℃に冷却し、テトラヒドロフラン30mlに溶解したN−ブロモコハクイミド8.54gを加え、0℃で2時間、室温で5時間攪拌した。該反応混合物に水100mlを加えて、有機層を分離した。水層を酢酸エチル100mlで2回抽出した。有機層を合一し、1N塩酸水溶液100mlで2回洗浄し、飽和炭酸水素ナトリウム水溶液100ml、飽和食塩水100mlで洗浄した。有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をジメチルスルホキシド50mlに溶解し、チオ酢酸カリウム5.04gを加え、50℃で4時間攪拌した。室温まで冷却後、該反応混合物に水100mlを加え、酢酸エチル100lで2回抽出した。合わせた有機層を1N塩酸水溶液100ml、飽和炭酸水素ナトリウム水溶液100ml、飽和食塩水100mlで洗浄した。有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、2−(アセチルチオ)−2−(1,4−ジオキサスピロ〔4,5〕デカ−8−イル)酢酸メチル4.27gを得た。
Reference production example 84
[Step 1]
4.86 g of diisopropylamine was dissolved in 50 ml of tetrahydrofuran and cooled to −50 ° C. under a nitrogen atmosphere. 30 ml of 1.6M n-butyllithium / n-hexane solution was added to the solution and stirred at −50 ° C. for 30 minutes. Further, 9.28 g of methyl 2- (1,4-dioxaspiro [4,5] dec-8-yl) acetate dissolved in 40 ml of tetrahydrofuran was added dropwise to the mixture over 15 minutes, followed by stirring at 0 ° C. for 30 minutes. The mixture was cooled to −50 ° C., 8.54 g of N-bromosuccinimide dissolved in 30 ml of tetrahydrofuran was added, and the mixture was stirred at 0 ° C. for 2 hours and at room temperature for 5 hours. 100 ml of water was added to the reaction mixture, and the organic layer was separated. The aqueous layer was extracted twice with 100 ml of ethyl acetate. The organic layers were combined, washed twice with 100 ml of 1N aqueous hydrochloric acid, and washed with 100 ml of saturated aqueous sodium bicarbonate and 100 ml of saturated brine. The organic layer was dried over sodium sulfate, filtered and concentrated under reduced pressure. The residue was dissolved in 50 ml of dimethyl sulfoxide, 5.04 g of potassium thioacetate was added, and the mixture was stirred at 50 ° C. for 4 hours. After cooling to room temperature, 100 ml of water was added to the reaction mixture, and the mixture was extracted twice with 100 l of ethyl acetate. The combined organic layers were washed with 100 ml of 1N aqueous hydrochloric acid solution, 100 ml of saturated aqueous sodium hydrogen carbonate solution and 100 ml of saturated brine. The organic layer was dried over sodium sulfate, filtered and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 4.27 g of methyl 2- (acetylthio) -2- (1,4-dioxaspiro [4,5] dec-8-yl) acetate.

〔工程2〕
2−(アセチルチオ)−2−(1,4−ジオキサスピロ〔4,5〕デカ−8−イル)酢酸メチル4.27gをメタノール30mlに溶解し、窒素雰囲気下、0℃でこれに28%ナトリウムメトキシド/メタノール溶液3.14gを加えた。更に、該混合物に3,3,3−トリフルオロ−1−ヨードプロパン4.31gを加え、室温で1時間攪拌後、70℃で1時間攪拌した。該反応混合物を室温まで冷却後、該反応混合物に水100mlを加えた後、全量が約100mlになるまで減圧下濃縮し、酢酸エチル100mlで2回抽出した。有機層を合一し、飽和食塩水100mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(1,4−ジオキサスピロ〔4,5〕デカ−8−イル)−2−(3,3,3−トリフルオロプロピルチオ)酢酸メチル(以下、本有機硫黄化合物(108)と記す。)3.60gを得た。
本有機硫黄化合物(108)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.31−1.81(8H,m),2.11−2.16(1H,m),2.34−2.41(2H,m),2.71−2.78(2H,m),3.04(1H,d),3.75(3H,s),4.91−4.96(4H,m) [Step 2]
Dissolve 4.27 g of methyl 2- (acetylthio) -2- (1,4-dioxaspiro [4,5] dec-8-yl) acetate in 30 ml of methanol and add it to 28% sodium methoxy at 0 ° C. in a nitrogen atmosphere. 3.14 g of methanol / methanol solution was added. Further, 4.33 g of 3,3,3-trifluoro-1-iodopropane was added to the mixture, and the mixture was stirred at room temperature for 1 hour and then stirred at 70 ° C. for 1 hour. The reaction mixture was cooled to room temperature, 100 ml of water was added to the reaction mixture, concentrated under reduced pressure until the total amount was about 100 ml, and extracted twice with 100 ml of ethyl acetate. The organic layers were combined, washed with 100 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (1,4-dioxaspiro [4,5] dec-8-yl) -2- (3,3,3-trifluoropropylthio) acetic acid represented by the following formula: 3.60 g of methyl (hereinafter referred to as the present organic sulfur compound (108)) was obtained.
This organic sulfur compound (108)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.31-1.81 (8H, m), 2.11-2.16 (1H, m), 2.34-2.41 (2H) M), 2.71-2.78 (2H, m), 3.04 (1H, d), 3.75 (3H, s), 4.91-4.96 (4H, m)

参考製造例85
本有機硫黄化合物(108)3.60gをクロロホルム20mlに溶解し、窒素雰囲気下、0℃でこれにm−クロロ過安息香酸4.75gを加えた。該混合物を室温で1時間攪拌後、50℃で3時間攪拌した。該反応混合物を0℃まで冷却し、5%亜硫酸ナトリウム水溶液50mlを加え、1時間攪拌した後、有機層を分離した。水層をクロロホルム50mlで抽出後、有機層を合一し、飽和炭酸水素ナトリウム水溶液50mlで2回洗浄し、飽和食塩水100mlで洗浄した。得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(1,4−ジオキサスピロ〔4,5〕デカ−8−イル)−2−(3,3,3−トリフルオロプロピルスルホニル)酢酸メチル(以下、本有機硫黄化合物(109)と記す。)2.41gを得た。
本有機硫黄化合物(109)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.50−1.83(7H,m),2.14−2.17(1H,m),2.26−2.29(1H,m),2.66−2.74(2H,m),3.19−3.27(1H,m),3.48−3.53(1H,m),3.75(1H,d),3.84(3H,s),3.91−3.96(4H,m) Reference production example 85
3.60 g of the organic sulfur compound (108) was dissolved in 20 ml of chloroform, and 4.75 g of m-chloroperbenzoic acid was added thereto at 0 ° C. in a nitrogen atmosphere. The mixture was stirred at room temperature for 1 hour and then stirred at 50 ° C. for 3 hours. The reaction mixture was cooled to 0 ° C., 50 ml of 5% aqueous sodium sulfite solution was added and stirred for 1 hour, and then the organic layer was separated. The aqueous layer was extracted with 50 ml of chloroform, and the organic layers were combined, washed twice with 50 ml of saturated aqueous sodium hydrogen carbonate solution, and washed with 100 ml of saturated brine. The obtained organic layer was dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (1,4-dioxaspiro [4,5] dec-8-yl) -2- (3,3,3-trifluoropropylsulfonyl) acetic acid represented by the following formula: 2.41 g of methyl (hereinafter referred to as the present organic sulfur compound (109)) was obtained.
This organic sulfur compound (109)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.50-1.83 (7H, m), 2.14-2.17 (1H, m), 2.6-2.29 (1H) M), 2.66-2.74 (2H, m), 3.19-3.27 (1H, m), 3.48-3.53 (1H, m), 3.75 (1H, d). ), 3.84 (3H, s), 3.91-3.96 (4H, m)

参考製造例86
本有機硫黄化合物(109)2.41gをアセトン25mlに溶解し、これにトルエンスルホン酸0.11gを加え、窒素雰囲気下、50℃で8時間攪拌した。該反応溶液を減圧下濃縮し、残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(4−オキソシクロヘキシル)−2−(3,3,3−トリフルオロプロピルスルホニル)酢酸メチル(以下、本有機硫黄化合物(110)と記す。)1.24gを得た。
本有機硫黄化合物(110)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.73−1.86(2H,m),2.10−2.13(1H,m),2.40−2.49(5H,m),2.68−2.77(3H,m),3.28−3.35(1H,m),3.47−3.53(1H,m),3.85(2H,d),3.87(3H,s) Reference production example 86
2.41 g of the organic sulfur compound (109) was dissolved in 25 ml of acetone, 0.11 g of toluenesulfonic acid was added thereto, and the mixture was stirred at 50 ° C. for 8 hours in a nitrogen atmosphere. The reaction solution was concentrated under reduced pressure, the residue was subjected to silica gel column chromatography, and methyl 2- (4-oxocyclohexyl) -2- (3,3,3-trifluoropropylsulfonyl) acetate represented by the following formula ( Hereinafter referred to as the present organic sulfur compound (110).) 1.24 g was obtained.
This organic sulfur compound (110)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.73-1.86 (2H, m), 2.10-2.13 (1H, m), 2.40-2.49 (5H M), 2.68-2.77 (3H, m), 3.28-3.35 (1H, m), 3.47-3.53 (1H, m), 3.85 (2H, d) ), 3.87 (3H, s)

参考製造例87
本有機硫黄化合物(109)1.24gをクロロホルム17mlに溶解し、窒素雰囲気下、0℃でこれにジエチルアミノサルファトリフルオリド1.37gを加え、室温で5時間攪拌した。該反応溶液をクロロホルム40mlで希釈し、水30mlを加えた後、有機層を分離した。水層をクロロホルム30mlで2回抽出し、有機層を合一し、飽和食塩水50mlで洗浄した。得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(4,4−ジフルオロシクロヘキシル)−2−(3,3,3−トリフルオロプロピルスルホニル)酢酸メチル(以下、本有機硫黄化合物(111))0.87gを得た。
本有機硫黄化合物(111)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.67−1.83(6H,m),2.14−2.37(3H,m),2.66−2.74(2H,m),3.22−3.29(1H,m),3.45−3.52(1H,m),3.77(1H,d),3.86(3H,s) Reference production example 87
1.24 g of this organic sulfur compound (109) was dissolved in 17 ml of chloroform, and 1.37 g of diethylaminosulfur trifluoride was added thereto at 0 ° C. in a nitrogen atmosphere, followed by stirring at room temperature for 5 hours. The reaction solution was diluted with 40 ml of chloroform, 30 ml of water was added, and then the organic layer was separated. The aqueous layer was extracted twice with 30 ml of chloroform, and the organic layers were combined and washed with 50 ml of saturated brine. The obtained organic layer was dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and methyl 2- (4,4-difluorocyclohexyl) -2- (3,3,3-trifluoropropylsulfonyl) acetate represented by the following formula (hereinafter referred to as the present organic sulfur compound ( 111)) 0.87 g was obtained.
This organic sulfur compound (111)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.67-1.83 (6H, m), 2.14-2.37 (3H, m), 2.66-2.74 (2H) M), 3.22-3.29 (1H, m), 3.45-3.52 (1H, m), 3.77 (1H, d), 3.86 (3H, s)

参考製造例88
本有機硫黄化合物(111)0.50gをテトラヒドロフラン5mlに溶解し、窒素雰囲気下、0℃でこれに60%ナトリウムヒドリド0.07gを加えた後、更にN−フルオロベンゼンスルホンイミド0.50gを加え、室温で5時間攪拌した。該反応溶液に水30mlを加え、有機層を分離した。水層を酢酸エチル30mlで2回抽出し、有機層を合一し、飽和食塩水50mlで洗浄した。得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(4,4−ジフルオロシクロヘキシル)−2−フルオロ−2−(3,3,3−トリフルオロプロピルスルホニル)酢酸メチル(以下、本有機硫黄化合物(112)と記す。)0.43gを得た。
本有機硫黄化合物(112)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.67−1.89(5H,m),2.12−2.43(3H,m),2.55−2.74(3H,m),3.21−3.40(2H,m),3.98(3H,s) Reference production example 88
This organic sulfur compound (111) (0.50 g) is dissolved in tetrahydrofuran (5 ml), and after adding 0.07 g of 60% sodium hydride to this at 0 ° C. in a nitrogen atmosphere, N-fluorobenzenesulfonimide (0.50 g) is further added. And stirred at room temperature for 5 hours. 30 ml of water was added to the reaction solution, and the organic layer was separated. The aqueous layer was extracted twice with 30 ml of ethyl acetate, and the organic layers were combined and washed with 50 ml of saturated brine. The obtained organic layer was dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and methyl 2- (4,4-difluorocyclohexyl) -2-fluoro-2- (3,3,3-trifluoropropylsulfonyl) acetate (hereinafter referred to as the present compound) represented by the following formula: 0.43 g of organic sulfur compound (112) is obtained.
This organic sulfur compound (112)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.67-1.89 (5H, m), 2.12-2.43 (3H, m), 2.55-2.74 (3H) , M), 3.21-3.40 (2H, m), 3.98 (3H, s)

参考製造例89
本有機硫黄化合物(112)0.33gをメタノール3mlに溶解し、0℃でこれに2.0Mアンモニア/メタノール溶液3mlを加えた後、室温で18時間攪拌した。該反応溶液に水30mlを加え、酢酸エチル30mlで2回抽出し、有機層を合一し、飽和食塩水50mlで洗浄した。得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(4,4−ジフルオロシクロヘキシル)−2−フルオロ−2−(3,3,3−トリフルオロプロピルスルホニル)アセトアミド(以下、本有機硫黄化合物(113)と記す。)0.43gを得た。
本有機硫黄化合物(113)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.73−1.88(4H,m),2.21−2.61(4H,m),2.61−2.77(3H,m),3.28−3.35(1H,m),3.40−3.48(1H,m),5.90(1H,s),6.53(1H,s) Reference production example 89
The organic sulfur compound (112) (0.33 g) was dissolved in 3 ml of methanol, and 3 ml of a 2.0 M ammonia / methanol solution was added thereto at 0 ° C., followed by stirring at room temperature for 18 hours. 30 ml of water was added to the reaction solution, extracted twice with 30 ml of ethyl acetate, the organic layers were combined and washed with 50 ml of saturated brine. The obtained organic layer was dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (4,4-difluorocyclohexyl) -2-fluoro-2- (3,3,3-trifluoropropylsulfonyl) acetamide (hereinafter referred to as this organic compound) represented by the following formula: 0.43 g of the sulfur compound (113) was obtained.
This organic sulfur compound (113)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.73-1.88 (4H, m), 2.21-2.61 (4H, m), 2.61-2.77 (3H M), 3.28-3.35 (1H, m), 3.40-3.48 (1H, m), 5.90 (1H, s), 6.53 (1H, s)

参考製造例90
シクロヘキサン−1,4−ジメタノールモノトシレート(trans/cis=6/4)22.8g及びジメチルスルホキシド100mlに、チオ酢酸カリウム8.68gを加え、室温で1時間、60℃で6時間攪拌した。該混合物を室温まで冷却後、飽和食塩水100mlを加え、t−ブチルメチルエーテル200mlで2回抽出した。有機層を合一し、飽和食塩水100ml、水100mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣にメタノール100mlを加え、氷浴で冷却下、これに28%ナトリウムメトキシド15.43gをメタノール50mlの希釈液を30分かけて滴下後、30分攪拌した。その後、該混合物に3,3,3−トリフルオロ−1−ヨードプロパン17.92gを加え、60℃で6時間攪拌した。該反応混合物を室温に冷却後、飽和食塩水150mlを加え、メタノールを減圧留去した。得られた濃縮物をt−ブチルメチルエーテル200mlで2回抽出し、シリカゲルカラムクロマトグラフィーに付し、下式に示される4−(3,3,3−トリフルオロプロピルチオメチル)シクロヘキサンメタノール(以下、本有機硫黄化合物(114)と記す。)8.46gを得た。
本有機硫黄化合物(114):trans体/cis体=6/4の混合物

Figure 2010150156
trans体
H−NMR(CDCl,TMS):δ(ppm)0.96−1.01(4H,m),1.40−1.47(4H,m),1.58−1.83(1H,m),1.92−1.94(1H,m),2.34−2.40(2H,m),2.43(2H,d),2.64−2.68(2H,m)3.45(2H,dd)
cis体
H−NMR(CDCl,TMS):δ(ppm)1.22−1.27(4H,m),1.40−1.62(6H,m),2.34−2.40(2H,m),2.52(2H,d),2.64−2.68(2H,m)3.53(2H,dd) Reference production example 90
To 22.8 g of cyclohexane-1,4-dimethanol monotosylate (trans / cis = 6/4) and 100 ml of dimethyl sulfoxide were added 8.68 g of potassium thioacetate, and the mixture was stirred at room temperature for 1 hour and at 60 ° C. for 6 hours. . The mixture was cooled to room temperature, 100 ml of saturated brine was added, and the mixture was extracted twice with 200 ml of t-butyl methyl ether. The organic layers were combined, washed with 100 ml of saturated brine and 100 ml of water, dried over sodium sulfate, filtered, and concentrated under reduced pressure. To the residue, 100 ml of methanol was added, and while cooling in an ice bath, 15.43 g of 28% sodium methoxide was added dropwise to a diluted solution of 50 ml of methanol over 30 minutes, followed by stirring for 30 minutes. Thereafter, 17.92 g of 3,3,3-trifluoro-1-iodopropane was added to the mixture, and the mixture was stirred at 60 ° C. for 6 hours. The reaction mixture was cooled to room temperature, 150 ml of saturated brine was added, and methanol was distilled off under reduced pressure. The obtained concentrate was extracted twice with 200 ml of t-butyl methyl ether, subjected to silica gel column chromatography, and 4- (3,3,3-trifluoropropylthiomethyl) cyclohexanemethanol (hereinafter referred to as the following formula). And this organic sulfur compound (114).) 8.46 g was obtained.
This organic sulfur compound (114): mixture of trans isomer / cis isomer = 6/4
Figure 2010150156
trans body
1 H-NMR (CDCl 3 , TMS): δ (ppm) 0.96-1.01 (4H, m), 1.40-1.47 (4H, m), 1.58-1.83 (1H M), 1.92-1.94 (1H, m), 2.34-2.40 (2H, m), 2.43 (2H, d), 2.64-2.68 (2H, m). 3.45 (2H, dd)
cis body
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.22-1.27 (4H, m), 1.40-1.62 (6H, m), 2.34-2.40 (2H , M), 2.52 (2H, d), 2.64-2.68 (2H, m) 3.53 (2H, dd)

参考製造例91
本有機硫黄化合物(114)(但し、trans体/cis体=6/4)7.4gをクロロホルム60mlに溶解し、窒素雰囲気下、0℃でこれにm−クロロ過安息香酸10.85gを加え、室温で1時間、50℃で3時間攪拌した。該反応混合物を0℃まで冷却し、5%亜硫酸ナトリウム水溶液50mlを加え、1時間攪拌した。有機層を分離し、水層をクロロホルム50mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水溶液50mlで2回洗浄し、飽和食塩水100mlで洗浄した。得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付した後、t−ブチルメチルエーテルで結晶化し、下式に示される4−(3,3,3−トリフルオロプロピルスルホニルメチル)シクロヘキサンメタノール(以下、本有機硫黄化合物(115)と記す。)のtrans体(以下、本有機硫黄化合物(115t)と記す。)4.13g及びcis体(以下、本有機硫黄化合物(115c)と記す。但し、trans体/cis体=1/9)3.38gを得た。
本有機硫黄化合物(115)

Figure 2010150156
本有機硫黄化合物(115t)
H−NMR(CDCl,TMS):δ(ppm)1.04−1.19(4H,m),1.30(1H,t),1.45−1.49(1H,m),1.84−1.89(2H,m),2.04−2.10(3H,m),2.62−2.74(2H,m),2.93(2H,d),3.15−3.19(2H,m),3.45(2H,dd)
本有機硫黄化合物(115c)
H−NMR(CDCl,TMS):δ(ppm)1.04−1.19(4H,m),1.30(1H,t),1.45−1.49(1H,m),1.84−1.89(2H,m),2.04−2.10(3H,m),2.62−2.74(2H,m),2.93(2H,d),3.15−3.19(2H,m),3.45(2H,dd) Reference production example 91
7.4 g of the present organic sulfur compound (114) (where trans form / cis form = 6/4) is dissolved in 60 ml of chloroform, and 10.85 g of m-chloroperbenzoic acid is added thereto at 0 ° C. in a nitrogen atmosphere. The mixture was stirred at room temperature for 1 hour and at 50 ° C. for 3 hours. The reaction mixture was cooled to 0 ° C., 50 ml of 5% aqueous sodium sulfite solution was added, and the mixture was stirred for 1 hour. The organic layer was separated and the aqueous layer was extracted twice with 50 ml of chloroform. The organic layers were combined, washed twice with 50 ml of saturated aqueous sodium hydrogen carbonate solution, and washed with 100 ml of saturated brine. The obtained organic layer was dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, crystallized with t-butyl methyl ether, and 4- (3,3,3-trifluoropropylsulfonylmethyl) cyclohexanemethanol (hereinafter referred to as the present organic sulfur compound ( 115).) Trans isomer (hereinafter referred to as the present organic sulfur compound (115t)) 4.13 g and cis isomer (hereinafter referred to as the present organic sulfur compound (115c), provided that the trans isomer / cis isomer = 1/9) 3.38 g was obtained.
This organic sulfur compound (115)
Figure 2010150156
This organic sulfur compound (115t)
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.04-1.19 (4H, m), 1.30 (1H, t), 1.45 to 1.49 (1H, m), 1.84-1.89 (2H, m), 2.04-2.10 (3H, m), 2.62-2.74 (2H, m), 2.93 (2H, d), 3. 15-3.19 (2H, m), 3.45 (2H, dd)
This organic sulfur compound (115c)
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.04-1.19 (4H, m), 1.30 (1H, t), 1.45 to 1.49 (1H, m), 1.84-1.89 (2H, m), 2.04-2.10 (3H, m), 2.62-2.74 (2H, m), 2.93 (2H, d), 3. 15-3.19 (2H, m), 3.45 (2H, dd)

参考製造例92
オキザリルクロライド7.46gをジクロロメタン50mlに溶解し、窒素雰囲気下、−78℃に冷却した。該溶液にジクロロメタン50mlに溶解したジメチルスルホキシド9.53gを20分間かけて滴下し、−50℃で30分間攪拌した。該反応混合物にジクロロメタン150mlに溶解した本有機硫黄化合物(115t)13.51gを30分間かけて滴下し、−50℃で40分間攪拌し、トリエチルアミン15.70gを40分間かけて滴下した。該反応混合物を室温で18時間攪拌した。反応混合物に水100mlを加え、有機層を分離後、クロロホルム100mlで2回抽出した。有機層を合一し、1N塩酸水溶液150ml、飽和炭酸水素ナトリウム水溶液150ml、水150mlで順に洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される4−(3,3,3−トリフルオロプロパンスルホニルメチル)シクロヘキサンカルバルデヒド(以下、本有機硫黄化合物(116)と記す。)のtrans体(以下、本有機硫黄化合物(116t)と記す。)10.04gを得た。
本有機硫黄化合物(116)

Figure 2010150156
本有機硫黄化合物(116t)
H−NMR(CDCl,TMS):δ(ppm)1.18−1.27(2H,m),1.33−1.43(2H,m),2.06−2.24(6H,m),2.63−2.74(2H,m),2.95(2H,d),3.16−3.21(2H,m),9.62(1H,s) Reference production example 92
7.46 g of oxalyl chloride was dissolved in 50 ml of dichloromethane and cooled to −78 ° C. under a nitrogen atmosphere. To this solution, 9.53 g of dimethyl sulfoxide dissolved in 50 ml of dichloromethane was added dropwise over 20 minutes and stirred at −50 ° C. for 30 minutes. To the reaction mixture, 13.51 g of the present organic sulfur compound (115t) dissolved in 150 ml of dichloromethane was added dropwise over 30 minutes, stirred at −50 ° C. for 40 minutes, and 15.70 g of triethylamine was added dropwise over 40 minutes. The reaction mixture was stirred at room temperature for 18 hours. 100 ml of water was added to the reaction mixture, and the organic layer was separated and extracted twice with 100 ml of chloroform. The organic layers were combined, washed successively with 150 ml of 1N aqueous hydrochloric acid solution, 150 ml of saturated aqueous sodium hydrogen carbonate solution and 150 ml of water, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and the trans isomer of 4- (3,3,3-trifluoropropanesulfonylmethyl) cyclohexanecarbaldehyde (hereinafter referred to as the present organic sulfur compound (116)) represented by the following formula: (Hereinafter referred to as the present organic sulfur compound (116t).) 10.04 g was obtained.
This organic sulfur compound (116)
Figure 2010150156
This organic sulfur compound (116t)
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.18-1.27 (2H, m), 1.33-1.43 (2H, m), 2.06-2.24 (6H) M), 2.63-2.74 (2H, m), 2.95 (2H, d), 3.16-3.21 (2H, m), 9.62 (1H, s)

参考製造例93
四臭化炭素23.21gをジクロロメタン100mlに溶解し、窒素雰囲気下、0℃に冷却し、これにトリフェニルホスフィン36.72gを30分かけて加え、さらに30分攪拌した。該溶液にジクロロメタン50mlに溶解した本有機硫黄化合物(116t)10.4gを30分かけて滴下し、室温にて6時間攪拌した。該反応混合物にt−ブチルメチルエーテル150mlを加え、固体をろ過後、ろ液を減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される1−(2,2−ジブロモビニル)−4−(3,3,3−トリフルオロプロピルスルホニルメチル)シクロヘキサン(以下、本有機硫黄化合物(17)と記す。)のtrans体(以下、本有機硫黄化合物(117t)と記す。)12.9gを得た。
本有機硫黄化合物(117)

Figure 2010150156
本有機硫黄化合物(117t)
H−NMR(CDCl,TMS):δ(ppm)1.16−1.29(4H,m),1.84−1.86(2H,m),2.04−2.08(2H,m),2.21−2.26(1H,m),2.62−2.74(2H,s),2.92(2H,d),3.15−3.22(2H,m),6.19(2H,d) Reference Production Example 93
23.21 g of carbon tetrabromide was dissolved in 100 ml of dichloromethane and cooled to 0 ° C. under a nitrogen atmosphere. To this, 36.72 g of triphenylphosphine was added over 30 minutes, and the mixture was further stirred for 30 minutes. To this solution, 10.4 g of the present organic sulfur compound (116t) dissolved in 50 ml of dichloromethane was added dropwise over 30 minutes, followed by stirring at room temperature for 6 hours. 150 ml of t-butyl methyl ether was added to the reaction mixture, the solid was filtered, and the filtrate was concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 1- (2,2-dibromovinyl) -4- (3,3,3-trifluoropropylsulfonylmethyl) cyclohexane represented by the following formula (hereinafter referred to as the present organic sulfur compound ( 17). 12.9 g of a trans isomer (hereinafter referred to as the present organic sulfur compound (117t)) was obtained.
This organic sulfur compound (117)
Figure 2010150156
This organic sulfur compound (117t)
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.16-1.29 (4H, m), 1.84-1.86 (2H, m), 2.04-2.08 (2H) M), 2.21-2.26 (1H, m), 2.62-2.74 (2H, s), 2.92 (2H, d), 3.15-3.22 (2H, m ), 6.19 (2H, d)

参考製造例94
本有機硫黄化合物(117t)12.90gをテトラヒドロフラン60mlに溶解し、窒素雰囲気下、−78℃に冷却した。該溶液に1.6Mのn−ブチルリチウム/n−ヘキサン溶液を30分間かけて滴下し、−50℃で1時間、0℃で2時間攪拌した。該反応混合物を氷浴で冷却した1N塩酸水溶液100mlに注ぎ、t−ブチルメチルエーテル200mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水溶液100ml、飽和食塩水100mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される1−エチニル−4−(3,3,3−トリフルオロプロピルスルホニルメチル)シクロヘキサン(以下、本有機硫黄化合物(118)と記す。)のtrans体(以下、本有機硫黄化合物(118t)と記す。)5.59gを得た。
本有機硫黄化合物(118)

Figure 2010150156
本有機硫黄化合物(118t)
H−NMR(CDCl,TMS):δ(ppm)1.11−1.20(2H,m),1.43−1.53(2H,m),2.02−2.13(6H,m),2.19−2.23(1H,m),2.62−2.73(2H,m),2.91(2H,d),3.15−3.19(2H,m) Reference production example 94
This organic sulfur compound (117t) 12.90g was melt | dissolved in tetrahydrofuran 60ml, and it cooled to -78 degreeC under nitrogen atmosphere. A 1.6M n-butyllithium / n-hexane solution was added dropwise to the solution over 30 minutes, and the mixture was stirred at -50 ° C for 1 hour and at 0 ° C for 2 hours. The reaction mixture was poured into 100 ml of 1N aqueous hydrochloric acid cooled in an ice bath and extracted twice with 200 ml of t-butyl methyl ether. The organic layers were combined, washed with 100 ml of saturated aqueous sodium hydrogen carbonate solution and 100 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 1-ethynyl-4- (3,3,3-trifluoropropylsulfonylmethyl) cyclohexane (hereinafter referred to as the present organic sulfur compound (118)) represented by the following formula: 5.59 g of trans form (hereinafter referred to as the present organic sulfur compound (118t)) was obtained.
This organic sulfur compound (118)
Figure 2010150156
This organic sulfur compound (118t)
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.11-1.20 (2H, m), 1.43-1.53 (2H, m), 2.02-2.13 (6H) M), 2.19-2.23 (1H, m), 2.62-2.73 (2H, m), 2.91 (2H, d), 3.15-3.19 (2H, m). )

参考製造例95
〔工程1〕
オキザリルクロライド7.87gをジクロロメタン50mlに溶解し、窒素雰囲気下、−78℃に冷却した。該溶液にジクロロメタン50mlに溶解したジメチルスルホキシド4.85gを20分間かけて滴下し、−50℃で30分間攪拌した。該反応混合物にジクロロメタン150mlに溶解した本有機硫黄化合物(15)(但し、trans体/cis体=6/4)9.28gを30分間かけて滴下し、−50℃で40分間攪拌し、トリエチルアミン18.22gを40分間かけて滴下した。該反応混合物を室温で18時間攪拌した。反応混合物に水100mlを加え、有機層を分離後、クロロホルム100mlで2回抽出した。あわせた有機層を1N塩酸水溶液150ml、飽和炭酸水素ナトリウム水溶液150ml、水150mlで順に洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、本有機硫黄化合物(116)8.41gを得た。尚、得られた本有機硫黄化合物(116)はtrans体/cis体=6/4の混合物であった。
Reference production example 95
[Step 1]
7.87 g of oxalyl chloride was dissolved in 50 ml of dichloromethane and cooled to −78 ° C. in a nitrogen atmosphere. To the solution, 4.85 g of dimethyl sulfoxide dissolved in 50 ml of dichloromethane was added dropwise over 20 minutes and stirred at −50 ° C. for 30 minutes. To the reaction mixture, 9.28 g of the present organic sulfur compound (15) (trans form / cis form = 6/4) dissolved in 150 ml of dichloromethane was added dropwise over 30 minutes, and the mixture was stirred at −50 ° C. for 40 minutes. 18.22 g was dripped over 40 minutes. The reaction mixture was stirred at room temperature for 18 hours. 100 ml of water was added to the reaction mixture, and the organic layer was separated and extracted twice with 100 ml of chloroform. The combined organic layers were sequentially washed with 150 ml of 1N hydrochloric acid aqueous solution, 150 ml of saturated aqueous sodium hydrogen carbonate solution and 150 ml of water, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 8.41 g of the present organic sulfur compound (116). The obtained organic sulfur compound (116) was a mixture of trans isomer / cis isomer = 6/4.

〔工程2〕
四臭化炭素19.90gをジクロロメタン100mlに溶解し、窒素雰囲気下、0℃に冷却し、これにトリフェニルホスフィン31.48gを30分かけて加え、さらに30分攪拌した。該溶液にジクロロメタン50mlに溶解した本有機硫黄化合物(116)(但し、trans体/cis体=6/4)8.41gを30分かけて滴下し、室温にて6時間攪拌した。該反応混合物にt−ブチルメチルエーテル150mlを加え、固体をろ過後、ろ液を減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、本有機硫黄化合物(17)12.7gを得た。尚、得られた本有機硫黄化合物(117)はtrans体/cis体=6/4であった。
[Step 2]
19.90 g of carbon tetrabromide was dissolved in 100 ml of dichloromethane and cooled to 0 ° C. under a nitrogen atmosphere. To this was added 31.48 g of triphenylphosphine over 30 minutes, and the mixture was further stirred for 30 minutes. To this solution, 8.41 g of the present organic sulfur compound (116) (where trans isomer / cis isomer = 6/4) dissolved in 50 ml of dichloromethane was added dropwise over 30 minutes, followed by stirring at room temperature for 6 hours. 150 ml of t-butyl methyl ether was added to the reaction mixture, the solid was filtered, and the filtrate was concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 12.7 g of the present organic sulfur compound (17). The obtained organic sulfur compound (117) was trans isomer / cis isomer = 6/4.

〔工程3〕
本有機硫黄化合物(117)(但し、trans/cis=6/4)12.7gをテトラヒドロフラン60mlに溶解し、窒素雰囲気下、−78℃に冷却した。該溶液に1.6Mn−ブチルリチウム/n−ヘキサン溶液40mlを30分間かけて滴下し、−50℃で1時間、0℃で2時間攪拌した。該反応混合物を氷浴で冷却した1N塩酸水溶液100mlに注ぎ、t−ブチルメチルエーテル200mlで2回抽出した。合わせた有機層を飽和炭酸水素ナトリウム水溶液100ml、飽和食塩水100mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、本有機硫黄化合物(118)のcis体(以下、本有機硫黄化合物(118c)と記す。)1.68gを得た。
本有機硫黄化合物(118c)
H−NMR(CDCl,TMS):δ(ppm)1.58−1.67(2H,m),1.82−1.84(3H,m),2.01−2.17(5H,m),2.62−2.74(2H,m),2.78(1H,br.s),2.97(2H,d),3.15−3.19(2H,m)
[Step 3]
12.7 g of this organic sulfur compound (117) (however, trans / cis = 6/4) was dissolved in 60 ml of tetrahydrofuran and cooled to −78 ° C. in a nitrogen atmosphere. To this solution, 40 ml of 1.6Mn-butyllithium / n-hexane solution was added dropwise over 30 minutes, followed by stirring at -50 ° C for 1 hour and at 0 ° C for 2 hours. The reaction mixture was poured into 100 ml of 1N aqueous hydrochloric acid cooled in an ice bath and extracted twice with 200 ml of t-butyl methyl ether. The combined organic layers were washed with 100 ml of saturated aqueous sodium hydrogen carbonate solution and 100 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 1.68 g of a cis form of the present organic sulfur compound (118) (hereinafter referred to as the present organic sulfur compound (118c)).
This organic sulfur compound (118c)
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.58-1.67 (2H, m), 1.82-1.84 (3H, m), 2.01-2.17 (5H) M), 2.62-2.74 (2H, m), 2.78 (1H, br. S), 2.97 (2H, d), 3.15-3.19 (2H, m)

参考製造例96
本有機硫黄化合物(117)1.88gをテトラヒドロフラン10mlに溶解し、窒素雰囲気下、−78℃に冷却した。該溶液に1.6Mのn−ブチルリチウム/n−ヘキサン溶液2.8mlを10分間かけて滴下し、−50℃で1時間攪拌し、アクリル酸メチル0.37gを加え、0℃で2時間攪拌した。該反応混合物を氷浴で冷却した1N塩酸水溶液30mlに注ぎ、t−ブチルメチルエーテル30mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水溶液30ml、飽和食塩水30mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される5−〔4−(3,3,3−トリフルオロプロピルスルホニルメチル)シクロヘキシル〕−4−ペンチン酸メチルエステル(以下、本有機硫黄化合物(119)と記す。)0.70gを得た。
本有機硫黄化合物(119)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.14−1.20(2H,m),1.43−1.56(2H,m),2.02−2.22(8H,m),2.31−2.40(2H,m),2.54−2.60(1H,m),2.60−2.71(1H,m),2.89−2.96(3H,m),3.24−3.26(1H,m),3.70(3H,s) Reference production example 96
1.88 g of this organic sulfur compound (117) was dissolved in 10 ml of tetrahydrofuran, and cooled to −78 ° C. in a nitrogen atmosphere. To the solution, 2.8 ml of 1.6M n-butyllithium / n-hexane solution was added dropwise over 10 minutes, stirred at −50 ° C. for 1 hour, 0.37 g of methyl acrylate was added, and at 0 ° C. for 2 hours. Stir. The reaction mixture was poured into 30 ml of 1N aqueous hydrochloric acid cooled in an ice bath and extracted twice with 30 ml of t-butyl methyl ether. The organic layers were combined, washed with 30 ml of saturated aqueous sodium hydrogen carbonate solution and 30 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 5- [4- (3,3,3-trifluoropropylsulfonylmethyl) cyclohexyl] -4-pentynoic acid methyl ester represented by the following formula (hereinafter referred to as the present organic sulfur compound ( 119).) 0.70 g was obtained.
This organic sulfur compound (119)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.14-1.20 (2H, m), 1.43-1.56 (2H, m), 2.02-2.22 (8H) M), 2.31-2.40 (2H, m), 2.54-2.60 (1H, m), 2.60-2.71 (1H, m), 2.89-2.96. (3H, m), 3.24-3.26 (1H, m), 3.70 (3H, s)

参考製造例97
本有機硫黄化合物(116)0.57gにピリジン0.32g及びヒドロキシルアミン塩酸塩0.14gを加え、1時間攪拌した。該混合物に無水酢酸1mlを加え、100℃で2時間攪拌した。該反応混合物に飽和炭酸水素ナトリウム水溶液30mlを加え、酢酸エチル30mlで2回抽出した。有機層を合一し、飽和食塩水30mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される1−シアノ−4−(3,3,3−トリフルオロプロピルスルホニルメチル)シクロヘキサン(以下、本有機硫黄化合物(120)と記す。)0.32gを得た。
本有機硫黄化合物(120)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.14−1.26(2H,m),1.63−1.73(1H,m),2.03−2.43(7H,m),2.64−2.74(2H,m),2.92(2H,d),3.16−3.20(2H,m) Reference production example 97
To 0.57 g of the organic sulfur compound (116), 0.32 g of pyridine and 0.14 g of hydroxylamine hydrochloride were added and stirred for 1 hour. 1 ml of acetic anhydride was added to the mixture and stirred at 100 ° C. for 2 hours. To the reaction mixture was added 30 ml of saturated aqueous sodium hydrogen carbonate solution, and the mixture was extracted twice with 30 ml of ethyl acetate. The organic layers were combined, washed with 30 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 1-cyano-4- (3,3,3-trifluoropropylsulfonylmethyl) cyclohexane (hereinafter referred to as the present organic sulfur compound (120)) represented by the following formula: 0 .32 g was obtained.
This organic sulfur compound (120)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.14 to 1.26 (2H, m), 1.63-1.73 (1H, m), 2.03 to 2.43 (7H) , M), 2.64-2.74 (2H, m), 2.92 (2H, d), 3.16-3.20 (2H, m)

参考製造例98
本有機硫黄化合物(103)0.19gをピリジン1mlに溶解し、これにO−メチルヒドロキシルアミン塩酸塩0.08gを加え、室温で5時間攪拌した。該反応溶液に水30mlを加え、酢酸エチル30mlで2回抽出した。有機層を合一し、飽和食塩水50mlで洗浄した。得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される4−(3,3,3−トリフルオロプロピルスルホニルメチル)−シクロヘキサノン=O−メチルオキシム(以下、本有機硫黄化合物(121)と記す。)0.19gを得た。
本有機硫黄化合物(121)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.30−1.39(2H,m),1.84−1.92(1H,m),2.12−2.23(3H,m),2.37−2.46(2H,m),2.65−2.72(2H,m),2.96(2H,d),3.17−3.24(2H,m) Reference production example 98
0.19 g of this organic sulfur compound (103) was dissolved in 1 ml of pyridine, 0.08 g of O-methylhydroxylamine hydrochloride was added thereto, and the mixture was stirred at room temperature for 5 hours. 30 ml of water was added to the reaction solution and extracted twice with 30 ml of ethyl acetate. The organic layers were combined and washed with 50 ml of saturated brine. The obtained organic layer was dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue is subjected to silica gel column chromatography, and is represented by 4- (3,3,3-trifluoropropylsulfonylmethyl) -cyclohexanone = O-methyloxime (hereinafter referred to as the present organic sulfur compound (121)) represented by the following formula. ) 0.19 g was obtained.
This organic sulfur compound (121)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.30-1.39 (2H, m), 1.84-1.92 (1H, m), 2.12-2.23 (3H) M), 2.37-2.46 (2H, m), 2.65-2.72 (2H, m), 2.96 (2H, d), 3.17-3.24 (2H, m). )

参考製造例99
本有機硫黄化合物(107)0.58gをテトラヒドロフラン4mlに溶解し、窒素雰囲気下、0℃でこれに0.9M臭化メチルマグネシウム/テトラヒドロフラン溶液2.2mlを加え、室温で5時間攪拌した。該反応溶液に水20mlを加え、酢酸エチル20mlで2回抽出した。有機層を合一し、飽和食塩水50mlで洗浄した。得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される1−エチニル−4−(3,3,3−トリフルオロプロピル−1−スルホニルメチル)シクロヘキセン(以下、本有機硫黄化合物(122)と記す。)0.21gを得た。
本有機硫黄化合物(122)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.47−1.61(1H,m),1.97−2.06(2H,m),2.24−2.30(2H,m),2.42−2.47(2H,m),2.65−2.75(2H,m)2.84(1H,s),3.00−3.03(2H,m),3.17−3.21(2H,m),6.14(1H,br.s) Reference Production Example 99
0.58 g of the organic sulfur compound (107) was dissolved in 4 ml of tetrahydrofuran, and 2.2 ml of a 0.9 M methylmagnesium bromide / tetrahydrofuran solution was added thereto at 0 ° C. in a nitrogen atmosphere, followed by stirring at room temperature for 5 hours. 20 ml of water was added to the reaction solution and extracted twice with 20 ml of ethyl acetate. The organic layers were combined and washed with 50 ml of saturated brine. The obtained organic layer was dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and described as 1-ethynyl-4- (3,3,3-trifluoropropyl-1-sulfonylmethyl) cyclohexene (hereinafter referred to as the present organic sulfur compound (122)) represented by the following formula. .) 0.21 g was obtained.
This organic sulfur compound (122)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.47-1.61 (1H, m), 1.97-2.06 (2H, m), 2.24-2.30 (2H M), 2.42-2.47 (2H, m), 2.65-2.75 (2H, m) 2.84 (1H, s), 3.00-3.03 (2H, m) 3.17-3.21 (2H, m), 6.14 (1H, br.s)

参考製造例100
オキザリルクロライド62.83gをジクロロメタン250mlに溶解し、窒素雰囲気下、−78℃に冷却した。該溶液にジクロロメタン250mlに溶解したジメチルスルホキシド77.35gを60分間かけて滴下し、−50℃で60分間攪拌した。該反応混合物にジクロロメタン250mlに溶解した本有機硫黄化合物(114)(trans体/cis体=6/4の混合物)84.54gを60分間かけて滴下し、−50℃で90分間攪拌し、トリエチルアミン100.18gを90分間かけて滴下した。該反応混合物を室温で18時間攪拌した。反応混合物に水300mlを加え、有機層を分離後、水層をクロロホルム200mlで2回抽出した。有機層を合一し、1N塩酸水溶液300ml、飽和炭酸水素ナトリウム水溶液300ml、水300mlで順に洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される4−(3,3,3−トリフルオロプロピルチオメチル)シクロヘキサンカルバルデヒド(以下、本有機硫黄化合物(123)と記す。)のcis体(以下、本有機硫黄化合物(123c)と記す。)23.03g及びtrans体(以下、本有機硫黄化合物(123t)と記す。)38.51gを得た。
本有機硫黄化合物(123)

Figure 2010150156
本有機硫黄化合物(123c)
H−NMR(CDCl,TMS):δ(ppm)1.05−1.16(2H,m),1.49−1.66(3H,m),1.72−1.80(2H,m),2.07−2.16(2H,m),2.30−2.47(5H,m),2.63−2.67(2H,m),9.62(1H,d)
本有機硫黄化合物(123t)
H−NMR(CDCl,TMS):δ(ppm)0.99−1.10(2H,m),1.24−1.34(2H,m),1.40−1.53(1H,m),1.97−2.08(4H,m),2.13−2.25(1H,m),2.31−2.43(2H,m),2.46(2H,m),2.65−2.69(2H,m),9.69(1H,d) Reference production example 100
62.83 g of oxalyl chloride was dissolved in 250 ml of dichloromethane and cooled to −78 ° C. under a nitrogen atmosphere. To this solution, 77.35 g of dimethyl sulfoxide dissolved in 250 ml of dichloromethane was added dropwise over 60 minutes, followed by stirring at −50 ° C. for 60 minutes. To this reaction mixture, 84.54 g of the present organic sulfur compound (114) (mixture of trans isomer / cis isomer = 6/4) dissolved in 250 ml of dichloromethane was added dropwise over 60 minutes, followed by stirring at −50 ° C. for 90 minutes. 100.18 g was added dropwise over 90 minutes. The reaction mixture was stirred at room temperature for 18 hours. 300 ml of water was added to the reaction mixture, the organic layer was separated, and the aqueous layer was extracted twice with 200 ml of chloroform. The organic layers were combined, washed sequentially with 300 ml of 1N hydrochloric acid aqueous solution, 300 ml of saturated aqueous sodium hydrogen carbonate solution and 300 ml of water, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and the cis form of 4- (3,3,3-trifluoropropylthiomethyl) cyclohexanecarbaldehyde represented by the following formula (hereinafter referred to as the present organic sulfur compound (123)). (Hereinafter referred to as the present organic sulfur compound (123c)) 23.03 g and trans form (hereinafter referred to as the present organic sulfur compound (123t)) 38.51 g were obtained.
This organic sulfur compound (123)
Figure 2010150156
This organic sulfur compound (123c)
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.05-1.16 (2H, m), 1.49-1.66 (3H, m), 1.72-1.80 (2H M), 2.07-2.16 (2H, m), 2.30-2.47 (5H, m), 2.63-2.67 (2H, m), 9.62 (1H, d). )
This organic sulfur compound (123t)
1 H-NMR (CDCl 3 , TMS): δ (ppm) 0.99-1.10 (2H, m), 1.24-1.34 (2H, m), 1.40-1.53 (1H , M), 1.97-2.08 (4H, m), 2.13-2.25 (1H, m), 2.31-2.43 (2H, m), 2.46 (2H, m ), 2.65-2.69 (2H, m), 9.69 (1H, d)

参考製造例101
四臭化炭素100.48gをジクロロメタン300mlに溶解し、窒素雰囲気下、0℃に冷却し、これにトリフェニルホスフィン158.86gを90分かけて加え、さらに30分攪拌した。該溶液にジクロロメタン100mlに溶解した本有機硫黄化合物(123t)38.51gを30分かけて滴下し、室温にて6時間攪拌した。該反応混合物にt−ブチルメチルエーテル500mlを加え、固体をろ過後、ろ液を減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される1−(2,2−ジブロモビニル)−4−(3,3,3−トリフルオロプロピルチオメチル)シクロヘキサン(以下、本有機硫黄化合物(124)と記す。)のtrans体(以下、本有機硫黄化合物(124t)と記す。)66.56gを得た。
本有機硫黄化合物(124)

Figure 2010150156
本有機硫黄化合物(124t)
H−NMR(CDCl,TMS):δ(ppm)0.98−1.08(2H,m),1.10−1.20(2H,m),1.37−1.49(1H,m),1.78−1.85(2H,m),1.88−1.95(2H,m),2.17−2.29(1H,m),2.31−2.41(2H,m),2.43(2H,m),2.64−2.68(2H,m),6.19(1H,d) Reference production example 101
100.48 g of carbon tetrabromide was dissolved in 300 ml of dichloromethane, cooled to 0 ° C. under a nitrogen atmosphere, 158.86 g of triphenylphosphine was added over 90 minutes, and the mixture was further stirred for 30 minutes. The organic sulfur compound (123t) (38.51 g) dissolved in 100 ml of dichloromethane was added dropwise to the solution over 30 minutes, and the mixture was stirred at room temperature for 6 hours. 500 ml of t-butyl methyl ether was added to the reaction mixture, the solid was filtered, and the filtrate was concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 1- (2,2-dibromovinyl) -4- (3,3,3-trifluoropropylthiomethyl) cyclohexane (hereinafter referred to as the present organic sulfur compound ( 124). 66.56 g of a trans isomer (hereinafter referred to as the present organic sulfur compound (124t)) was obtained.
This organic sulfur compound (124)
Figure 2010150156
This organic sulfur compound (124t)
1 H-NMR (CDCl 3 , TMS): δ (ppm) 0.98-1.08 (2H, m), 1.10-1.20 (2H, m), 1.37-1.49 (1H M), 1.78-1.85 (2H, m), 1.88-1.95 (2H, m), 2.17-2.29 (1H, m), 2.31-2.41. (2H, m), 2.43 (2H, m), 2.64-2.68 (2H, m), 6.19 (1H, d)

参考製造例102
本有機硫黄化合物(124t)53.78gをテトラヒドロフラン300mlに溶解し、窒素雰囲気下、−78℃に冷却した。該溶液に1.6Mn−ブチルリチウムヘキサン溶液180mlを60分間かけて滴下し、−50℃で1時間、0℃で2時間攪拌した。該反応混合物を氷浴で冷却した1N塩酸水溶液300mlに注ぎ、t−ブチルメチルエーテル300mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水溶液300ml、飽和食塩水300mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される1−エチニル−4−(3,3,3−トリフルオロプロピル−1−スルホニルメチル)シクロヘキサン(以下、本有機硫黄化合物(125)と記す。)のtrans体(以下、本有機硫黄化合物(125t)と記す。)31.54gを得た。
本有機硫黄化合物(125)

Figure 2010150156
本有機硫黄化合物(125t)
H−NMR(CDCl,TMS):δ(ppm)0.92−1.03(2H,m),1.34−1.53(3H,m),1.86−1.94(2H,m),1.98−2.06(3H,m),2.15−2.24(1H,m),2.30−2.41(2H,m),2.42(2H,d),2.64−2.68(2H,m) Reference production example 102
The organic sulfur compound (124t) (53.78 g) was dissolved in tetrahydrofuran (300 ml) and cooled to -78 ° C under a nitrogen atmosphere. To this solution, 180 ml of 1.6Mn-butyllithium hexane solution was added dropwise over 60 minutes, followed by stirring at −50 ° C. for 1 hour and at 0 ° C. for 2 hours. The reaction mixture was poured into 300 ml of 1N aqueous hydrochloric acid cooled in an ice bath and extracted twice with 300 ml of t-butyl methyl ether. The organic layers were combined, washed with 300 ml of saturated aqueous sodium hydrogen carbonate solution and 300 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography and represented by 1-ethynyl-4- (3,3,3-trifluoropropyl-1-sulfonylmethyl) cyclohexane (hereinafter referred to as the present organic sulfur compound (125)) represented by the following formula. ) Was obtained in an amount of 31.54 g (hereinafter referred to as the present organic sulfur compound (125t)).
This organic sulfur compound (125)
Figure 2010150156
This organic sulfur compound (125t)
1 H-NMR (CDCl 3 , TMS): δ (ppm) 0.92-1.03 (2H, m), 1.34-1.53 (3H, m), 1.86-1.94 (2H) M), 1.98-2.06 (3H, m), 2.15-2.24 (1H, m), 2.30-2.41 (2H, m), 2.42 (2H, d). ), 2.64-2.68 (2H, m)

参考製造例103
本有機硫黄化合物(123t)に代えて、本有機硫黄化合物(123c)を用いて、参考製造例94及び参考製造例95に記載の方法に準じて行い、本有機硫黄化合物25のcis体(以下、本有機硫黄化合物(125c)と記す。)を製造した。
本有機硫黄化合物(125c)
1H−NMR(CDCl3、TMS、δ(ppm)):1.38−1.53(5H、m)、1.67−1.75(2H、m)、1.78−1.86(2H、m)、2.05(1H、d)、2.31−2.44(2H、m)、2.47(2H、d)、2.65−2.69(2H、m)、2.74−2.79(1H、m)
Reference production example 103
It replaces with this organic sulfur compound (123t), uses this organic sulfur compound (123c) according to the method of the reference manufacture example 94 and the reference manufacture example 95, and is the cis body (following and below) of this organic sulfur compound 25 This organic sulfur compound (referred to as 125c) was produced.
This organic sulfur compound (125c)
1 H-NMR (CDCl 3 , TMS, δ (ppm)): 1.38-1.53 (5H, m), 1.67-1.75 (2H, m), 1.78-1.86 ( 2H, m), 2.05 (1H, d), 2.31-2.44 (2H, m), 2.47 (2H, d), 2.65-2.69 (2H, m), 2 .74-2.79 (1H, m)

参考製造例104
2KHSO5・KHSO4・K2SO4の複塩(Oxone、登録商標)20.30gを水60mlに懸濁し、窒素雰囲気下、−20℃で本有機硫黄化合物(124t)7.51gのメタノール60ml溶液を60分かけて滴下し、2時間攪拌した。該反応混合物に10%亜硫酸ナトリウム水溶液50mlを加え、酢酸エチル100mlで2回抽出した。有機層を合一し、10%亜硫酸ナトリウム水溶液50ml、飽和食塩水50mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される1−エチニル−4−(3,3,3−トリフルオロプロピルスルフィニルメチル)シクロヘキサン(以下、本有機硫黄化合物(126)と記す。)のtrans体(以下、本有機硫黄化合物(126t)と記す。)4.88gを得た。
本有機硫黄化合物(126)

Figure 2010150156
本有機硫黄化合物(126t)
H−NMR(CDCl,TMS):δ(ppm)1.02−1.21(2H,m),1.41−1.53(2H,m),1.82−2.00(2H,m),2.00−2.09(4H,m),2.20−2.27(1H,m),2.40−2.46(1H,m),2.57−2.68(2H,m),2.71−2.92(3H,m) Reference production example 104
20.30 g of a double salt of 2KHSO 5 · KHSO 4 · K2SO 4 (Oxone (registered trademark)) is suspended in 60 ml of water, and a solution of 7.51 g of the present organic sulfur compound (124t) in 60 ml of methanol is added at −20 ° C. in a nitrogen atmosphere. The solution was added dropwise over 60 minutes and stirred for 2 hours. 50 ml of 10% aqueous sodium sulfite solution was added to the reaction mixture, and the mixture was extracted twice with 100 ml of ethyl acetate. The organic layers were combined, washed with 50 ml of 10% aqueous sodium sulfite solution and 50 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 1-ethynyl-4- (3,3,3-trifluoropropylsulfinylmethyl) cyclohexane (hereinafter referred to as the present organic sulfur compound (126)) represented by the following formula: 4.88 g of trans form (hereinafter referred to as the present organic sulfur compound (126t)) was obtained.
This organic sulfur compound (126)
Figure 2010150156
This organic sulfur compound (126t)
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.02-1.21 (2H, m), 1.41-1.53 (2H, m), 1.82-2.00 (2H M), 2.00-2.09 (4H, m), 2.20-2.27 (1H, m), 2.40-2.46 (1H, m), 2.57-2.68. (2H, m), 2.71-2.92 (3H, m)

参考製造例105
〔工程1〕
チオ酢酸カリウム7.35gをN−メチル−2−ピロリドン30mlに懸濁し、窒素雰囲気下、0℃で3−ブロモ−1,1,1−トリフルオロプロパン11.39gを15分かけて滴下し、室温で1時間攪拌した。反応混合物を80℃に加熱して、減圧下蒸留して、3,3,3−トリフルオロプロピルチオ酢酸エステル9.99gを得た。
Reference production example 105
[Step 1]
7.35 g of potassium thioacetate was suspended in 30 ml of N-methyl-2-pyrrolidone, and 11.39 g of 3-bromo-1,1,1-trifluoropropane was added dropwise over 15 minutes at 0 ° C. under a nitrogen atmosphere. Stir at room temperature for 1 hour. The reaction mixture was heated to 80 ° C. and distilled under reduced pressure to obtain 9.99 g of 3,3,3-trifluoropropylthioacetic acid ester.

〔工程2〕
3,3,3−トリフルオロプロピルチオ酢酸エステル9.99gをテトラヒドロフラン60mlに溶解し、0℃に冷却した後、28%ナトリウムメトキシド/メタノール溶液11.2gを15分かけて滴下し、室温で1時間攪拌した。該混合物に、0℃でクロロアセトニトリル4.38gを加え、室温で3時間攪拌した。反応容器を氷浴で冷却し、飽和食塩水を加え、t−ブチルメチルエーテル100mlで2回抽出し、合わせた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、(3,3,3−トリフルオロプロピルチオ)アセトニトリル7.56gを得た。
[Step 2]
After 9.99 g of 3,3,3-trifluoropropylthioacetic acid ester was dissolved in 60 ml of tetrahydrofuran and cooled to 0 ° C., 11.2 g of 28% sodium methoxide / methanol solution was added dropwise over 15 minutes. Stir for 1 hour. To the mixture, 4.38 g of chloroacetonitrile was added at 0 ° C., and the mixture was stirred at room temperature for 3 hours. The reaction vessel was cooled in an ice bath, saturated brine was added, and the mixture was extracted twice with 100 ml of t-butyl methyl ether. The combined organic layers were washed with saturated brine, dried over sodium sulfate, filtered, and reduced pressure. Concentrated. The residue was subjected to silica gel column chromatography to obtain 7.56 g of (3,3,3-trifluoropropylthio) acetonitrile.

〔工程3〕
(3,3,3−トリフルオロプロピルチオ)アセトニトリル4.97gとタングステン酸ナトリウム二水和物0.07gを水7mLに混合した懸濁液を撹拌しながら、31%過酸化水素水2.3mlを加えた。反応途中、反応液中に析出する固体を一部採取し、薄層クロマトグラフィーにて精製したところ、(3,3,3−トリフルオロプロピルスルフィニル)アセトニトリル(1H-NMRは下記に記載)が生じていることが確認できた。該混合物を65℃に昇温し、更に31%過酸化水素水2.3mlを加え、70℃で1時間攪拌した。該反応混合物を室温まで冷却し、10%亜硫酸ナトリウム水溶液5mlを加え、酢酸エチル30mlで3回抽出した。有機層を合一し、飽和食塩水で洗浄した後、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をクロロホルム:ヘキサン=1:2で結晶化し、(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル5.44gを得た。
[Step 3]
While stirring a suspension of 4.97 g of (3,3,3-trifluoropropylthio) acetonitrile and 0.07 g of sodium tungstate dihydrate in 7 mL of water, 2.3 ml of 31% hydrogen peroxide solution was stirred. Was added. During the reaction, a portion of the solid precipitated in the reaction solution was collected and purified by thin layer chromatography. As a result, (3,3,3-trifluoropropylsulfinyl) acetonitrile ( 1 H-NMR is described below) It was confirmed that this occurred. The mixture was heated to 65 ° C., and further 2.3 ml of 31% hydrogen peroxide solution was added, followed by stirring at 70 ° C. for 1 hour. The reaction mixture was cooled to room temperature, 5 ml of 10% aqueous sodium sulfite solution was added, and the mixture was extracted 3 times with 30 ml of ethyl acetate. The organic layers were combined, washed with saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was crystallized with chloroform: hexane = 1: 2 to obtain 5.44 g of (3,3,3-trifluoropropylsulfonyl) acetonitrile.

〔工程4〕
(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル4.02g、トルエン100ml、DL-プロリン0.23gおよび1,4−シクロヘキサンジオンモノエチレンケタール3.32gを3時間、還流条件下で加熱攪拌した。該反応混合物よりトルエンを20ml留去した後、室温まで冷却した。該反応混合物にテトラヒドロフラン100mlを加え、0℃に冷却後、水素化ホウ素ナトリウム1.01gを加えた。室温で6時間攪拌後、0℃に冷却し、水100mlおよび酢酸エチル100mlを加えた。該溶液を攪拌しながら、1N塩酸100mlを滴下し、酢酸エチル100mlで2回抽出した。有機層を飽和炭酸水素ナトリウム水100ml、飽和食塩水100ml、水100mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(1,4−ジオキサスピロ〔4,5〕デカ−8−イル)−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(127)と記す。)5.45gを得た。
本有機硫黄化合物(127)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.61−1.90(7H,m),2.13−2.23(1H,m),2.39−2.51(1H,m),2.67−2.86(2H,m),3.39−3.47(1H,m),3.51−3.60(1H,m),3.85(1H,d),3.92−3.99(4H,m) [Step 4]
(3,3,3-trifluoropropylsulfonyl) acetonitrile 4.02 g, toluene 100 ml, DL-proline 0.23 g and 1,4-cyclohexanedione monoethylene ketal 3.32 g were heated and stirred under reflux conditions for 3 hours. . After distilling off 20 ml of toluene from the reaction mixture, it was cooled to room temperature. 100 ml of tetrahydrofuran was added to the reaction mixture, and after cooling to 0 ° C., 1.01 g of sodium borohydride was added. After stirring at room temperature for 6 hours, the mixture was cooled to 0 ° C., and 100 ml of water and 100 ml of ethyl acetate were added. While stirring the solution, 100 ml of 1N hydrochloric acid was added dropwise, and extracted twice with 100 ml of ethyl acetate. The organic layer was washed with 100 ml of saturated aqueous sodium hydrogencarbonate, 100 ml of saturated brine, and 100 ml of water, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (1,4-dioxaspiro [4,5] dec-8-yl) -2- (3,3,3-trifluoropropylsulfonyl) acetonitrile represented by the following formula: (Hereinafter referred to as the present organic sulfur compound (127).) 5.45 g was obtained.
This organic sulfur compound (127)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.61-1.90 (7H, m), 2.13-2.23 (1H, m), 2.39-2.51 (1H M), 2.67-2.86 (2H, m), 3.39-3.47 (1H, m), 3.51-3.60 (1H, m), 3.85 (1H, d) ), 3.92-3.99 (4H, m)

参考製造例106
本有機硫黄化合物(127)3.20gに酢酸7mlおよび水3mlを加え、70℃に加熱し、10時間攪拌した。該反応混合物を室温まで冷却した後、酢酸エチル100mlを加え、飽和炭酸水素ナトリウム水100mlにゆっくりと加えた。該溶液を1時間攪拌し、酢酸エチル100mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水100ml、飽和食塩水100mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(4−オキソシクロヘキシル)−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(128)と記す。)2.59gを得た。
本有機硫黄化合物(128)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.87−1.97(2H,m),2.18−2.25(1H,m),2.42−2.60(5H,m),2.73−2.95(3H,m),3.41−3.51(1H,m),3.55−3.66(1H,m),3.97(1H,d) Reference production example 106
7 ml of acetic acid and 3 ml of water were added to 3.20 g of this organic sulfur compound (127), heated to 70 ° C. and stirred for 10 hours. After the reaction mixture was cooled to room temperature, 100 ml of ethyl acetate was added and slowly added to 100 ml of saturated aqueous sodium bicarbonate. The solution was stirred for 1 hour and extracted twice with 100 ml of ethyl acetate. The organic layers were combined, washed with 100 ml of saturated aqueous sodium bicarbonate and 100 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (4-oxocyclohexyl) -2- (3,3,3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound (128) and 2.59 g was obtained.
This organic sulfur compound (128)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.87-1.97 (2H, m), 2.18-2.25 (1H, m), 2.42-2.60 (5H M), 2.73-2.95 (3H, m), 3.41-3.51 (1H, m), 3.55-3.66 (1H, m), 3.97 (1H, d) )

参考製造例107
本有機硫黄化合物(128)0.15gをジクロロメタン5mlに溶解し、窒素雰囲気下、−20℃でこれにジエチルアミノサルファトリフルオリド0.21gを加え、室温で5時間攪拌した。該反応溶液をクロロホルム30mlで希釈し、水30mlを加え、有機層を分離した。水層をクロロホルム30mlで2回抽出し、有機層を合一して、飽和食塩水50mlで洗浄した。得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(4,4−ジフルオロシクロヘキシル)−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(129)と記す。)0.16を得た。
本有機硫黄化合物(129)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.41−1.99(5H,m),2.16−2.32(3H,m),2.42−2.58(1H,m),2.70−2.86(2H,m),3.38−3.49(1H,m),3.54−3.68(1H,m),3.87(1H,d) Reference production example 107
0.15 g of this organic sulfur compound (128) was dissolved in 5 ml of dichloromethane, 0.21 g of diethylaminosulfur trifluoride was added thereto at −20 ° C. under a nitrogen atmosphere, and the mixture was stirred at room temperature for 5 hours. The reaction solution was diluted with 30 ml of chloroform, 30 ml of water was added, and the organic layer was separated. The aqueous layer was extracted twice with 30 ml of chloroform, and the organic layers were combined and washed with 50 ml of saturated brine. The obtained organic layer was dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (4,4-difluorocyclohexyl) -2- (3,3,3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound (129) represented by the following formula: ) Was obtained.) 0.16 was obtained.
This organic sulfur compound (129)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.41-1.99 (5H, m), 2.16-2.32 (3H, m), 2.42 to 2.58 (1H , M), 2.70-2.86 (2H, m), 3.38-3.49 (1H, m), 3.54-3.68 (1H, m), 3.87 (1H, d) )

参考製造例108
本有機硫黄化合物(128)1.49gをテトラヒドロフラン20mlに溶解し、窒素雰囲気下、0℃でこれに0.5Mエチニルマグネシウムブロミドのテトラヒドロフラン溶液30mlを加え、0℃で5時間攪拌した。該反応溶液に1N塩酸水溶液50mlを加え、酢酸エチル50mlで2回抽出した。有機層を合一して、飽和炭酸水素ナトリウム水溶液50ml、飽和食塩水50mlで洗浄した。得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(4−エチニル−4−ヒドロキシシクロヘキシル)−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(130)と記す。)1.69gを得た。
本有機硫黄化合物(130)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.59−2.28(9H,m),2.28−2.47(1H,m),2.61(1H,s),2.71−2.84(2H,m),3.40−3.48(1H,m),3.52−3.60(1H,m),3.87(1H,d) Reference production example 108
1.49 g of the organic sulfur compound (128) was dissolved in 20 ml of tetrahydrofuran, and 30 ml of a 0.5 M ethynylmagnesium bromide tetrahydrofuran solution was added thereto at 0 ° C. under a nitrogen atmosphere, followed by stirring at 0 ° C. for 5 hours. To the reaction solution was added 50 ml of 1N aqueous hydrochloric acid solution, and the mixture was extracted twice with 50 ml of ethyl acetate. The organic layers were combined and washed with 50 ml of saturated aqueous sodium hydrogen carbonate solution and 50 ml of saturated brine. The obtained organic layer was dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (4-ethynyl-4-hydroxycyclohexyl) -2- (3,3,3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound) represented by the following formula: (Described as (130).) 1.69 g was obtained.
This organic sulfur compound (130)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.59-2.28 (9H, m), 2.28-2.47 (1H, m), 2.61 (1H, s), 2.71-2.84 (2H, m), 3.40-3.48 (1H, m), 3.52-3.60 (1H, m), 3.87 (1H, d)

参考製造例109
本有機硫黄化合物(130)0.65gをジクロロメタン6mlに溶解し、窒素雰囲気下、0℃でこれにジエチルアミノサルファトリフルオリド0.48gを加え、室温で5時間攪拌した。該反応溶液をクロロホルム20mlで希釈し、水20mlを加えた後に、有機層を分離した。水層をクロロホルム20mlで2回抽出した。有機層を合一して、飽和食塩水50mlで洗浄した。得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(4−エチニル−4−フルオロシクロヘキシル)−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(131)と記す。)0.31g及び下式に示される2−(4−エチニル−シクロヘキセン−3−イル)−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(132)と記す。)0.23gを得た。
本有機硫黄化合物(131)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.73−2.15(6H,m),2.25−2.2.39(2H,m),2.44−2.54(1H,m),2.66(1H,d),2.71−2.84(2H,m),3.40−3.48(1H,m),3.53−3.61(1H,m),3.87(1H,d)
本有機硫黄化合物(132):1:1の異性体混合物
Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.68−2.84(9H,m),2.84(1H,d),3.39−3.49(1H,m),3.51−3.66(1H,m),3.89(1H,d),6.10−6.18(2H,m) Reference Production Example 109
0.65 g of this organic sulfur compound (130) was dissolved in 6 ml of dichloromethane, and 0.48 g of diethylaminosulfur trifluoride was added thereto at 0 ° C. under a nitrogen atmosphere, followed by stirring at room temperature for 5 hours. The reaction solution was diluted with 20 ml of chloroform, 20 ml of water was added, and then the organic layer was separated. The aqueous layer was extracted twice with 20 ml of chloroform. The organic layers were combined and washed with 50 ml of saturated brine. The obtained organic layer was dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (4-ethynyl-4-fluorocyclohexyl) -2- (3,3,3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound) represented by the following formula: (Referred to as (131).) 0.31 g and 2- (4-ethynyl-cyclohexen-3-yl) -2- (3,3,3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present organic compound) represented by the following formula: 0.23 g of the sulfur compound (132) was obtained.
This organic sulfur compound (131)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.73-2.15 (6H, m), 2.25-2.2.39 (2H, m), 2.44-2.54 (1H, m), 2.66 (1H, d), 2.71-2.84 (2H, m), 3.40-3.48 (1H, m), 3.53-3.61 (1H , M), 3.87 (1H, d)
The present organic sulfur compound (132): 1: 1 isomer mixture
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.68-2.84 (9H, m), 2.84 (1H, d), 3.39-3.49 (1H, m), 3.51-3.66 (1H, m), 3.89 (1H, d), 6.10-6.18 (2H, m)

参考製造例110
本有機硫黄化合物(128)2.81gをテトラヒドロフラン10mlに溶解し、ピリジン0.75g、メトキシアミン塩酸塩0.79を加え、室温にて3時間攪拌した。該反応液に1N塩酸水溶液30mlを加え、酢酸エチル50mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水溶液50ml、飽和食塩水50mlで洗浄し、得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−〔4−(メトキシイミノ)シクロヘキシル〕−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(133)と記す。)2.86gを得た。
本有機硫黄化合物(133)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.50−1.71(2H,m),1.80−1.91(1H,m),1.95−2.08(1H,m),2.16−2.27(1H,m),2.30−2.44(1H,m),2.49−2.57(1H,m),2.62−2.71(1H,m),2.72−2.86(2H,m),3.32−3.48(2H,m),3.52−3.61(1H,m),3.83(3H,s),3.87(1H,d) Reference production example 110
The organic sulfur compound (128) (2.81 g) was dissolved in tetrahydrofuran (10 ml), pyridine (0.75 g) and methoxyamine hydrochloride (0.79) were added, and the mixture was stirred at room temperature for 3 hours. 30 ml of 1N aqueous hydrochloric acid solution was added to the reaction solution, and the mixture was extracted twice with 50 ml of ethyl acetate. The organic layers were combined and washed with 50 ml of saturated aqueous sodium hydrogen carbonate solution and 50 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- [4- (methoxyimino) cyclohexyl] -2- (3,3,3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound ( 133).) 2.86 g was obtained.
This organic sulfur compound (133)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.50-1.71 (2H, m), 1.80-1.91 (1H, m), 1.95-2.08 (1H M), 2.16-2.27 (1H, m), 2.30-2.44 (1H, m), 2.49-2.57 (1H, m), 2.62-2.71 (1H, m), 2.72-2.86 (2H, m), 3.32-3.48 (2H, m), 3.52-3.61 (1H, m), 3.83 (3H , S), 3.87 (1H, d)

参考製造例111
本有機硫黄化合物(128)0.20gをピリジン2mlに溶解し、ヒドロキシルアミン塩酸塩0.06gを加え、室温にて3時間攪拌した。該反応液にヘキサン50mlを加え、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−〔4−(ヒドロキシイミノ)シクロヘキシル〕−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(134)と記す。)0.093gを得た。
本有機硫黄化合物(134)

Figure 2010150156
H−NMR(CDOD,TMS):δ(ppm)1.29−1.48(2H,m),1.69−1.85(1H,m),1.87−2.01(1H,m),2.07−2.27(2H,m),2.29−2.38(1H,m),2.51−2.59(1H,m),2.67−2.81(2H,m),3.18−3.22(1H,m),3.26−3.34(2H,m),4.47(1H,br.s) Reference Production Example 111
The organic sulfur compound (128) (0.20 g) was dissolved in pyridine (2 ml), hydroxylamine hydrochloride (0.06 g) was added, and the mixture was stirred at room temperature for 3 hours. To the reaction solution, 50 ml of hexane was added and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- [4- (hydroxyimino) cyclohexyl] -2- (3,3,3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound ( 134).) 0.093 g was obtained.
This organic sulfur compound (134)
Figure 2010150156
1 H-NMR (CD 3 OD, TMS): δ (ppm) 1.29-1.48 (2H, m), 1.69-1.85 (1H, m), 1.87-2.01 ( 1H, m), 2.07-2.27 (2H, m), 2.29-2.38 (1H, m), 2.51-2.59 (1H, m), 2.67-2. 81 (2H, m), 3.18-3.22 (1H, m), 3.26-3.34 (2H, m), 4.47 (1H, br.s)

参考製造例112
ヒドロキシルアミン塩酸塩に代えて、エトキシアミン塩酸塩0.008gを用いて、参考製造例102に記載の方法に準じて、下式に示される2−〔4−(エトキシイミノ)シクロヘキシル〕−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(135)と記す。)0.095gを得た。
本有機硫黄化合物(135)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.25(3H,t),1.51−1.72(2H,m),1.79−1.92(1H,m),1.95−2.07(1H,m),2.17−2.27(1H,m),2.31−2.43(1H,m),2.49−2.59(1H,m),2.61−2.71(1H,m),2.72−2.86(2H,m),3.35−3.49(2H,m),3.51−3.61(1H,m),3.85(1H,d),4.05(2H,q) Reference production example 112
In place of hydroxylamine hydrochloride, 0.008 g of ethoxyamine hydrochloride is used, and 2- [4- (ethoxyimino) cyclohexyl] -2- (2) represented by the following formula is used according to the method described in Reference Production Example 102. 0.095 g of (3,3,3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound (135)) was obtained.
This organic sulfur compound (135)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.25 (3H, t), 1.51-1.72 (2H, m), 1.79-1.92 (1H, m), 1.95-2.07 (1H, m), 2.17-2.27 (1H, m), 2.31-2.43 (1H, m), 2.49-2.59 (1H, m ), 2.61-2.71 (1H, m), 2.62-2.86 (2H, m), 3.35-3.49 (2H, m), 3.51-3.61 (1H) M), 3.85 (1H, d), 4.05 (2H, q)

参考製造例113
ヒドロキシルアミン塩酸塩に代えて、t−ブトキシアミン塩酸塩0.01gを用いて、参考製造例102に記載の方法に準じて、下式に示される2−〔4−(t−ブトキシイミノ)シクロヘキシル〕−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(136)と記す。)0.19gを得た。
本有機硫黄化合物(136)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.26(9H,s),1.49−1.70(2H,m),1.75−1.88(1H,m),1.91−2.06(1H,m),2.14−2.25(1H,m),2.27−2.42(1H,m),2.51−2.59(1H,m),2.59−2.70(1H,m),2.71−2.88(2H,m),3.35−3.48(2H,m),3.52−3.68(1H,m),3.86−3.88(1H,m) Reference production example 113
In place of hydroxylamine hydrochloride, 0.01 g of t-butoxyamine hydrochloride was used and 2- [4- (t-butoxyimino) cyclohexyl represented by the following formula was prepared according to the method described in Reference Production Example 102. ] 0.19 g of 2- (3,3,3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound (136)) was obtained.
This organic sulfur compound (136)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.26 (9H, s), 1.49-1.70 (2H, m), 1.75-1.88 (1H, m), 1.91-2.06 (1H, m), 2.14-2.25 (1H, m), 2.27-2.42 (1H, m), 2.51-2.59 (1H, m ), 2.59-2.70 (1H, m), 2.71-2.88 (2H, m), 3.35-3.48 (2H, m), 3.52-3.68 (1H) , M), 3.86-3.88 (1H, m)

参考製造例114
ヒドロキシルアミン塩酸塩に代えて、O−アリルヒドロキシルアミン塩酸塩0.009gを用いて、参考製造例102に記載の方法に準じて、下式に示される2−〔4−(O−アリルオキシイミノ)シクロヘキシル〕−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(137)と記す。)0.061gを得た。
本有機硫黄化合物(137)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.52−1.72(2H,m),1.79−1.94(1H,m),1.96−2.09(1H,m),2.16−2.28(1H,m),2.31−2.42(1H,m),2.50−2.59(1H,m),2.61−2.72(1H,m),2.72−2.86(2H,m),3.38−3.48(2H,m),3.52−3.61(1H,m),3.85−3.88(1H,m),4.52−4.55(2H,m),5.19−5.33(2H,m),5.92−6.04(2H,m) Reference production example 114
In place of hydroxylamine hydrochloride, 0.009 g of O-allylhydroxylamine hydrochloride was used and 2- [4- (O-allyloxyimino) represented by the following formula was prepared according to the method described in Reference Production Example 102. ) Cyclohexyl] -2- (3,3,3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound (137)) was obtained in an amount of 0.061 g.
This organic sulfur compound (137)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.52-1.72 (2H, m), 1.79-1.94 (1H, m), 1.96-2.09 (1H M), 2.16-2.28 (1H, m), 2.31-2.42 (1H, m), 2.50-2.59 (1H, m), 2.61-2.72. (1H, m), 2.72-2.86 (2H, m), 3.38-3.48 (2H, m), 3.52-3.61 (1H, m), 3.85-3 .88 (1H, m), 4.52-4.55 (2H, m), 5.19-5.33 (2H, m), 5.92-6.04 (2H, m)

参考製造例115
ヒドロキシルアミン塩酸塩に代えて、O−ベンジルヒドロキシルアミン塩酸塩0.009gを用いて、参考製造例102に記載の方法に準じて、下式に示される2−〔4−(O−ベンジルオキシイミノ)シクロヘキシル〕−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(138)と記す。)0.10gを得た。
本有機硫黄化合物(138)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.49−1.72(2H,m),1.81−2.08(2H,m),2.16−2.27(1H,m),2.30−2.43(1H,m),2.50−2.58(1H,m),2.61−2.70(1H,m),2.72−2.83(2H,m),3.38−3.48(2H,m),3.51−3.61(1H,m),3.84−3.87(1H,m),5.07(2H,s),7.28−7.34(1H,m),7.35−7.36(4H,m) Reference production example 115
In place of hydroxylamine hydrochloride, 0.009 g of O-benzylhydroxylamine hydrochloride was used and 2- [4- (O-benzyloxyimino) represented by the following formula was prepared according to the method described in Reference Production Example 102. ) Cyclohexyl] -2- (3,3,3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound (138)) was obtained in an amount of 0.10 g.
This organic sulfur compound (138)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.49-1.72 (2H, m), 1.81-2.08 (2H, m), 2.16-2.27 (1H) M), 2.30-2.43 (1H, m), 2.50-2.58 (1H, m), 2.61-2.70 (1H, m), 2.72-2.83. (2H, m), 3.38-3.48 (2H, m), 3.51-3.61 (1H, m), 3.84-3.87 (1H, m), 5.07 (2H , S), 7.28-7.34 (1H, m), 7.35-7.36 (4H, m)

参考製造例116
本有機硫黄化合物(128)0.20gをピリジン2mlに溶解し、O−カルボキシメチルヒドロキシルアミン塩酸塩0.06gを加え、室温にて3時間攪拌した。該反応液に1N塩酸水溶液30mlを加え、酢酸エチル30mlで2回抽出した。得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−〔4−(O−カルボキシメチルオキシイミノ)シクロヘキシル〕−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(139)と記す。)0.094gを得た。
本有機硫黄化合物(139)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.56−1.72(2H,m),1.88−2.11(2H,m),2.17−2.29(1H,m),2.31−2.43(1H,m),2.47−2.56(1H,m),2.60−2.70(1H,m),2.73−2.84(2H,m),3.38−3.43(4H,m),4.57(2H,s) Reference production example 116
The organic sulfur compound (128) (0.20 g) was dissolved in pyridine (2 ml), O-carboxymethylhydroxylamine hydrochloride (0.06 g) was added, and the mixture was stirred at room temperature for 3 hours. 30 ml of 1N aqueous hydrochloric acid was added to the reaction solution, and the mixture was extracted twice with 30 ml of ethyl acetate. The obtained organic layer was dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- [4- (O-carboxymethyloxyimino) cyclohexyl] -2- (3,3,3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present compound) represented by the following formula: 0.094 g of organic sulfur compound (described as 139) was obtained.
This organic sulfur compound (139)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.56-1.72 (2H, m), 1.88-2.11 (2H, m), 2.17-2.29 (1H M), 2.31-2.43 (1H, m), 2.47-2.56 (1H, m), 2.60-2.70 (1H, m), 2.73-2.84. (2H, m), 3.38-3.43 (4H, m), 4.57 (2H, s)

参考製造例117
本有機硫黄化合物(133)0.16gをジメチルスルホキシド3mlに溶解し、窒素雰囲気下、0℃に冷却した。該混合物に60%水素化ナトリウム0.05gを加え、30分間攪拌した後、ヨウ化メチル0.11gを加え、室温にて一晩攪拌した。該反応液に1N塩酸水溶液10mlを加え、酢酸エチル30mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水溶液10ml、飽和食塩水10mlで洗浄し、得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−〔4−(メトキシイミノ)シクロヘキシル〕−2−(3,3,3−トリフルオロプロピルスルホニル)プロピオニトリル(以下、本有機硫黄化合物(140)と記す。)0.13gを得た。
本有機硫黄化合物(140)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.31−1.64(2H,m),1.75(3H,s),1.76−1.91(1H,m),2.13−2.32(3H,m),2.48−2.62(2H,m),2.69−2.87(2H,m),3.32−3.47(2H,m),3.55−3.64(1H,m),3.83(3H,s) Reference Production Example 117
0.16 g of the organic sulfur compound (133) was dissolved in 3 ml of dimethyl sulfoxide and cooled to 0 ° C. in a nitrogen atmosphere. To the mixture, 0.05 g of 60% sodium hydride was added and stirred for 30 minutes, then 0.11 g of methyl iodide was added and stirred overnight at room temperature. To the reaction solution was added 10 ml of 1N aqueous hydrochloric acid solution, and the mixture was extracted twice with 30 ml of ethyl acetate. The organic layers were combined, washed with 10 ml of saturated aqueous sodium hydrogen carbonate solution and 10 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- [4- (methoxyimino) cyclohexyl] -2- (3,3,3-trifluoropropylsulfonyl) propionitrile (hereinafter referred to as the present organic sulfur) represented by the following formula: 0.13 g of compound (140) was obtained.
This organic sulfur compound (140)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.31-1.64 (2H, m), 1.75 (3H, s), 1.76-1.91 (1H, m), 2.13-2.32 (3H, m), 2.48-2.62 (2H, m), 2.69-2.87 (2H, m), 3.32-3.47 (2H, m ), 3.55-3.64 (1H, m), 3.83 (3H, s)

参考製造例118
ヨウ化メチルに代えて、ヨウ化エチル0.13gを用いて、参考製造例108に記載の方法に準じて、下式に示される2−〔4−(メトキシイミノ)シクロヘキシル〕−2−(3,3,3−トリフルオロプロピルスルホニル)ブチロニトリル(以下、本有機硫黄化合物(141)と記す。)0.13gを得た。
本有機硫黄化合物(141)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm):1.27(3H,t),1.43−1.69(2H,m),1.73−1.87(1H,m),2.10−2.31(5H,m),2.49−2.61(2H,m),2.71−2.87(2H,m),3.33−3.47(2H,m),3.55−3.66(1H,m),3.83(3H,s) Reference production example 118
Instead of methyl iodide, 0.13 g of ethyl iodide was used and 2- [4- (methoxyimino) cyclohexyl] -2- (3 represented by the following formula according to the method described in Reference Production Example 108 , 3,3-trifluoropropylsulfonyl) butyronitrile (hereinafter referred to as the present organic sulfur compound (141)) (0.13 g) was obtained.
This organic sulfur compound (141)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm): 1.27 (3H, t), 1.43-1.69 (2H, m), 1.73-1.87 (1H, m) , 2.10-2.31 (5H, m), 2.49-2.61 (2H, m), 2.71-2.87 (2H, m), 3.33-3.47 (2H, m), 3.55-3.66 (1H, m), 3.83 (3H, s)

参考製造例119
ヨウ化メチルに代えて、1-ヨードプロパン0.14gを用い、参考製造例108に記載の方法に準じて、下式に示される2−〔4−(メトキシイミノ)シクロヘキシル〕−2−(3,3,3−トリフルオロプロピルスルホニル)ペンタンニトリル(以下、本有機硫黄化合物(142)と記す。)0.055gを得た。
本有機硫黄化合物(142)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.06(3H,t),1.44−1.71(4H,m),1.73−1.86(1H,m),1.94−2.13(2H,m),2.15−2.31(3H,m),2.48−2.61(2H,m),2.73−2.83(2H,m),3.32−3.46(2H,m),3.55−3.65(1H,m),3.83(3H,s) Reference Production Example 119
In place of methyl iodide, 0.14 g of 1-iodopropane was used, and according to the method described in Reference Production Example 108, 2- [4- (methoxyimino) cyclohexyl] -2- (3 , 3,3-trifluoropropylsulfonyl) pentanenitrile (hereinafter referred to as the present organic sulfur compound (142)) was obtained in an amount of 0.055 g.
This organic sulfur compound (142)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.06 (3H, t), 1.44-1.71 (4H, m), 1.73-1.86 (1H, m), 1.94-2.13 (2H, m), 2.15-2.31 (3H, m), 2.48-2.61 (2H, m), 2.73-2.83 (2H, m ), 3.32-3.46 (2H, m), 3.55-3.65 (1H, m), 3.83 (3H, s)

参考製造例120
ヨウ化メチルに代えて、3−ブロモプロペン0.10gを用いて、参考製造例108に記載の方法に準じて、下式に示される2−〔4−(メトキシイミノ)シクロヘキシル〕−3−メチル−2−(3,3,3−トリフルオロプロピルスルホニル)−4−ペンテンニトリル(以下、本有機硫黄化合物(143)と記す。)0.14gを得た。
本有機硫黄化合物(143)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.41−1.68(2H,m),1.73−1.87(1H,m),2.12−2.33(3H,m),2.47−2.82(5H,m),2.86−2.91(1H,m),3.31−3.48(2H,m),3.61−3.68(1H,m),3.83(3H,s),5.40−5.49(2H,m),5.87−6.02(1H,m) Reference production example 120
2- [4- (methoxyimino) cyclohexyl] -3-methyl represented by the following formula, using 0.10 g of 3-bromopropene instead of methyl iodide, according to the method described in Reference Production Example 108 0.14 g of -2- (3,3,3-trifluoropropylsulfonyl) -4-pentenenitrile (hereinafter referred to as the present organic sulfur compound (143)) was obtained.
This organic sulfur compound (143)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.41-1.68 (2H, m), 1.73-1.87 (1H, m), 2.12-2.33 (3H M), 2.47-2.82 (5H, m), 2.86-2.91 (1H, m), 3.31-3.48 (2H, m), 3.61-3.68. (1H, m), 3.83 (3H, s), 5.40-5.49 (2H, m), 5.87-6.02 (1H, m)

参考製造例121
ヨウ化メチルに代えて、3−ブロモプロピン0.10gを用いて、参考製造例108に記載の方法に準じて、下式に示される2−〔4−(メトキシイミノ)シクロヘキシル〕−3−メチル−2−(3,3,3−トリフルオロプロピルスルホニル)−4−ペンチンニトリル(以下、本有機硫黄化合物(144)と記す。)0.14gを得た。
本有機硫黄化合物(144)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.29−1.47(1H,m),1.50−1.68(1H,m),1.74−1.91(1H,m),2.13−2.35(3H,m),2.43−2.45(1H,m),2.49−2.61(1H,m),2.73−2.86(3H,m),2.91−3.11(2H,m),3.32−3.47(1H,m),3.73−3.89(2H,m),3.83(3H,s) Reference production example 121
2- [4- (methoxyimino) cyclohexyl] -3-methyl- represented by the following formula, using 0.10 g of 3-bromopropyne instead of methyl iodide, according to the method described in Reference Production Example 108 0.14 g of 2- (3,3,3-trifluoropropylsulfonyl) -4-pentynenitrile (hereinafter referred to as the present organic sulfur compound (144)) was obtained.
This organic sulfur compound (144)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.29-1.47 (1H, m), 1.50-1.68 (1H, m), 1.74-1.91 (1H M), 2.13-2.35 (3H, m), 2.43-2.45 (1H, m), 2.49-2.61 (1H, m), 2.73-2.86. (3H, m), 2.91-3.11 (2H, m), 3.32-3.47 (1H, m), 3.73-3.89 (2H, m), 3.83 (3H , S)

参考製造例122
本有機硫黄化合物(133)0.45gをテトラヒドロフラン5mlに溶解し、窒素雰囲気下、0℃に冷却した。60%水素化ナトリウム0.10gを加え、30分間攪拌した後、N−クロロこはく酸イミド0.20gを加え、室温にて一晩攪拌した。該反応液に1N塩酸水溶液10mlを加え、酢酸エチル30mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水溶液10ml、飽和食塩水10mlで洗浄し、得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−クロロ−2−〔4−(メトキシイミノ)シクロヘキシル〕−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(145)と記す。)0.39gを得た。
本有機硫黄化合物(145)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.52−1.91(3H,m),2.16−2.29(1H,m),2.34−2.48(2H,m),2.52−2.63(1H,m),2.74−2.89(3H,m),3.36−3.46(1H,m),3.64−3.82(2H,m),3.84(3H,s) Reference Production Example 122
0.45 g of the organic sulfur compound (133) was dissolved in 5 ml of tetrahydrofuran and cooled to 0 ° C. under a nitrogen atmosphere. After adding 0.10 g of 60% sodium hydride and stirring for 30 minutes, 0.20 g of N-chlorosuccinimide was added and stirred overnight at room temperature. To the reaction solution was added 10 ml of 1N aqueous hydrochloric acid solution, and the mixture was extracted twice with 30 ml of ethyl acetate. The organic layers were combined, washed with 10 ml of saturated aqueous sodium hydrogen carbonate solution and 10 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2-chloro-2- [4- (methoxyimino) cyclohexyl] -2- (3,3,3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present) represented by the following formula: 0.39 g of organic sulfur compound (145) is obtained.
This organic sulfur compound (145)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.52-1.91 (3H, m), 2.16-2.29 (1H, m), 2.34-2.48 (2H M), 2.52-2.63 (1H, m), 2.74-2.89 (3H, m), 3.36-3.46 (1H, m), 3.64-3.82. (2H, m), 3.84 (3H, s)

参考製造例123
(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル1.00g、テトラヒドロフラン30ml、DL-プロリン0.12gおよびシクロペンタノン1.01gを6時間、還流条件下で加熱攪拌した。該反応混合物を0℃に冷却した後、水素化ホウ素ナトリウム0.42gを加え、室温で6時間攪拌した。該反応混合物を0℃に冷却した後、水10mlおよび酢酸エチル30mlを加えた。該混合物を攪拌しながら1N塩酸50mlを滴下した後、酢酸エチル30mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水30ml、飽和食塩水30mlで順次洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−シクロペンチル−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(146)と記す。)1.01gを得た。
本有機硫黄化合物(146)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.46−1.56(1H,m),1.59−1.71(3H,m),1.73−1.85(2H,m),2.02−2.17(2H,m),2.66−2.86(3H,m),3.38−3.56(2H,m),4.03(1H,d) Reference Production Example 123
1.00 g of (3,3,3-trifluoropropylsulfonyl) acetonitrile, 30 ml of tetrahydrofuran, 0.12 g of DL-proline and 1.01 g of cyclopentanone were heated and stirred for 6 hours under reflux conditions. The reaction mixture was cooled to 0 ° C., 0.42 g of sodium borohydride was added, and the mixture was stirred at room temperature for 6 hours. After the reaction mixture was cooled to 0 ° C., 10 ml of water and 30 ml of ethyl acetate were added. While stirring the mixture, 50 ml of 1N hydrochloric acid was added dropwise, and then extracted twice with 30 ml of ethyl acetate. The organic layers were combined, washed successively with 30 ml of saturated aqueous sodium bicarbonate and 30 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2-cyclopentyl-2- (3,3,3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound (146)) represented by the following formula: 1. 01 g was obtained.
This organic sulfur compound (146)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.46-1.56 (1H, m), 1.59-1.71 (3H, m), 1.73-1.85 (2H M), 2.02-2.17 (2H, m), 2.66-2.86 (3H, m), 3.38-3.56 (2H, m), 4.03 (1H, d) )

参考製造例124
シクロペンタノンに代えて、シクロヘキサノン1.14gを用いて、参考製造例114に記載の方法に準じて、下式に示される2−シクロヘキシル−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(147)と記す。)1.01gを得た。
本有機硫黄化合物(147)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.16−1.28(1H,m),1.30−1.47(4H,m),1.69−1.77(1H,m),1.79−1.88(3H,m),2.15−2.22(1H,m),2.39−2.49(1H,m),2.70−2.84(2H,m),3.37−3.46(1H,m),3.48−3.56(1H,m),3.80(1H,d) Reference production example 124
In place of cyclopentanone, 1.14 g of cyclohexanone was used and 2-cyclohexyl-2- (3,3,3-trifluoropropylsulfonyl) represented by the following formula was prepared according to the method described in Reference Production Example 114. 1.01 g of acetonitrile (hereinafter referred to as the present organic sulfur compound (147)) was obtained.
This organic sulfur compound (147)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.16-1.28 (1H, m), 1.30-1.47 (4H, m), 1.69-1.77 (1H) M), 1.79-1.88 (3H, m), 2.15-2.22 (1H, m), 2.39-2.49 (1H, m), 2.70-2.84. (2H, m), 3.37-3.46 (1H, m), 3.48-3.56 (1H, m), 3.80 (1H, d)

参考製造例125
シクロペンタノンに代えて、シクロヘプタノン1.23gを用いて、参考製造例114に記載の方法に準じて、下式に示される2−シクロヘキシル−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(148)と記す。)1.24gを得た。
本有機硫黄化合物(148)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.50−1.86(11H,m),2.14−2.22(1H,m),2.56−2.62(1H,m),2.70−2.83(2H,m),3.36−3.44(1H,m),3.48−3.56(1H,m),3.84(1H,d) Reference production example 125
In place of cyclopentanone, 1.23 g of cycloheptanone was used and 2-cyclohexyl-2- (3,3,3-trifluoropropyl) represented by the following formula was prepared according to the method described in Reference Production Example 114. 1.24 g of sulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound (148)) was obtained.
This organic sulfur compound (148)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.50-1.86 (11H, m), 2.14-2.22 (1H, m), 2.56-2.62 (1H) M), 2.70-2.83 (2H, m), 3.36-3.44 (1H, m), 3.48-3.56 (1H, m), 3.84 (1H, d) )

参考製造例126
シクロペンタノンに代えて、4−メチルシクロヘキサノン1.34gを用いて、参考製造例114に記載の方法に準じて、下式に示される2−(4−メチルシクロヘキシル)−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(149)と記す。)1.12gを得た。
本有機硫黄化合物(149):6/4の異性体混合物

Figure 2010150156
本有機硫黄化合物(149)の主異性体
H−NMR(CDCl,TMS):δ(ppm)0.98(3H,d),1.00−1.12(1H,m),1.32−1.97(8H,m),2.45−2.54(1H,m),2.71−2.87(2H,m),3.37−3.59(2H,m),3.92(1H,d)
本有機硫黄化合物(149)の副異性体
H−NMR(CDCl,TMS):δ(ppm)0.91(3H,d),1.32−1.97(8H,m),2.14−2.23(1H,m),2.33−2.43(1H,m),2.71−2.87(2H,m),3.37−3.59(2H,m),3.82(1H,d) Reference Production Example 126
In place of cyclopentanone, 1.34 g of 4-methylcyclohexanone was used and 2- (4-methylcyclohexyl) -2- (3,3) represented by the following formula was prepared according to the method described in Reference Production Example 114. , 3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound (149)) 1.12 g was obtained.
This organic sulfur compound (149): 6/4 isomer mixture
Figure 2010150156
Main isomer of the present organic sulfur compound (149)
1 H-NMR (CDCl 3 , TMS): δ (ppm) 0.98 (3H, d), 1.00-1.12 (1H, m), 1.32-1.97 (8H, m), 2.45-2.54 (1H, m), 2.71-2.87 (2H, m), 3.37-3.59 (2H, m), 3.92 (1H, d)
Sub-isomer of the present organic sulfur compound (149)
1 H-NMR (CDCl 3 , TMS): δ (ppm) 0.91 (3H, d), 1.32-1.97 (8H, m), 2.14-2.23 (1H, m), 2.33-2.43 (1H, m), 2.71-2.87 (2H, m), 3.37-3.59 (2H, m), 3.82 (1H, d)

参考製造例127
シクロペンタノンに代えて、4,4−ジメチルシクロヘキサノン1.24gを用いて、参考製造例114に記載の方法に準じて、下式に示される2−(4,4−ジメチルシクロヘキシル)−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(150)と記す。)0.98gを得た。
本有機硫黄化合物(150)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)0.93(3H,s),0.94(3H,s),1.25−1.36(2H,m),1.45−1.69(5H,m),1.94−2.03(1H,m),2.30−2.39(1H,m),2.69−2.83(2H,m),3.37−3.46(1H,m),3.48−3.56(1H,m),3.84(1H,d) Reference Production Example 127
In place of cyclopentanone, 1.24 g of 4,4-dimethylcyclohexanone was used and 2- (4,4-dimethylcyclohexyl) -2-2 represented by the following formula was prepared according to the method described in Reference Production Example 114. 0.98 g of (3,3,3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound (150)) was obtained.
This organic sulfur compound (150)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 0.93 (3H, s), 0.94 (3H, s), 1.25-1.36 (2H, m), 1.45 1.69 (5H, m), 1.94-2.03 (1H, m), 2.30-2.39 (1H, m), 2.69-2.83 (2H, m), 3. 37-3.46 (1H, m), 3.48-3.56 (1H, m), 3.84 (1H, d)

参考製造例128
(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル3.31g、テトラヒドロフラン60ml、DL-プロリン0.19gおよび4−シアノシクロヘキサノン2.03gを6時間、還流条件下で加熱攪拌した。該反応混合物を0℃に冷却した後、水素化ホウ素ナトリウム0.62gを加え、室温で6時間攪拌した。該反応混合物を0℃に冷却した後、水30mlおよび酢酸エチル50mlを加えた。該混合物を攪拌しながら、1N塩酸90mlを滴下した後、酢酸エチル50mlで3回抽出した。有機層を飽和炭酸水素ナトリウム水50ml、飽和食塩水50mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(4−シアノシクロヘキシル)−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(151)と記す。)のtrans体(以下、本有機硫黄化合物(151t)と記す。)0.51g及びcis体(以下、本有機硫黄化合物(151c)と記す。)0.59gを得た。
本有機硫黄化合物(151)

Figure 2010150156
本有機硫黄化合物(150c)
H−NMR(CDCl,TMS):δ(ppm)1.40−1.54(2H,m),1.64−1.79(2H,m),1.89−1.99(1H,m),2.21−2.30(2H,m),2.30−2.38(1H,m),2.41−2.54(2H,m),2.69−2.84(2H,m),3.37−3.47(1H,m),3.51−3.59(1H,m),3.83(1H,d)
本有機硫黄化合物(150t)
H−NMR(CDCl,TMS):δ(ppm)1.64−1.88(4H,m),1.95−2.02(1H,m),2.09−2.19(2H,m),2.19−2.29(1H,m),2.41−2.51(1H,m),2.51−2.69(2H,m),3.00−3.05(1H,m),3.41−3.50(1H,m),3.54−3.63(1H,m),3.83(1H,d) Reference production example 128
3.33 g of (3,3,3-trifluoropropylsulfonyl) acetonitrile, 60 ml of tetrahydrofuran, 0.19 g of DL-proline and 2.03 g of 4-cyanocyclohexanone were heated and stirred for 6 hours under reflux conditions. The reaction mixture was cooled to 0 ° C., 0.62 g of sodium borohydride was added, and the mixture was stirred at room temperature for 6 hours. After the reaction mixture was cooled to 0 ° C., 30 ml of water and 50 ml of ethyl acetate were added. While stirring the mixture, 90 ml of 1N hydrochloric acid was added dropwise, followed by extraction three times with 50 ml of ethyl acetate. The organic layer was washed with 50 ml of saturated aqueous sodium hydrogen carbonate and 50 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (4-cyanocyclohexyl) -2- (3,3,3-trifluoropropylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound (151)) represented by the following formula: 0.51 g of trans form (hereinafter referred to as the present organic sulfur compound (151t)) and 0.59 g of cis form (hereinafter referred to as the present organic sulfur compound (151c)) were obtained.
This organic sulfur compound (151)
Figure 2010150156
This organic sulfur compound (150c)
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.40-1.54 (2H, m), 1.64-1.79 (2H, m), 1.89-1.99 (1H M), 2.21-2.30 (2H, m), 2.30-2.38 (1H, m), 2.41-2.54 (2H, m), 2.69-2.84. (2H, m), 3.37-3.47 (1H, m), 3.51-3.59 (1H, m), 3.83 (1H, d)
This organic sulfur compound (150t)
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.64-1.88 (4H, m), 1.95-2.02 (1H, m), 2.09-2.19 (2H M), 2.19-2.29 (1H, m), 2.41-2.51 (1H, m), 2.51-2.69 (2H, m), 3.00-3.05 (1H, m), 3.41-3.50 (1H, m), 3.54-3.63 (1H, m), 3.83 (1H, d)

参考製造例129
本有機硫黄化合物(127)0.34gをアセトニトリル10mlに溶解し、1,2−エタンジチオール0.21g、テトラブチルアンモニウムトリブロミド0.05gを加え、室温で1時間攪拌した。該反応混合物に酢酸エチル100mlを加え、飽和炭酸水素ナトリウム水50mlを加えた。該溶液を1時間攪拌し、酢酸エチル50mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水50ml、飽和食塩水50mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(1,4−ジチアスピロ〔4,5〕デカ−8−イル)−2−(3,3,3−トリフルオロプロピルスルホニル)アセトニトリル(以下、本有機硫黄化合物(152)と記す。)0.36gを得た。
本有機硫黄化合物(152)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.67−1.83(2H,m),1.88−1.97(1H,m),1.98−2.09(2H,m),2.17−2.30(3H,m),2.36−2.48(1H,m),2.67−2.85(2H,m),3.24−3.36(4H,m),3.48−3.50(1H,m),3.60−3.83(1H,m),3.86(1H,d) Reference Production Example 129
The organic sulfur compound (127) (0.34 g) was dissolved in acetonitrile (10 ml), 1,2-ethanedithiol (0.21 g) and tetrabutylammonium tribromide (0.05 g) were added, and the mixture was stirred at room temperature for 1 hour. 100 ml of ethyl acetate was added to the reaction mixture, and 50 ml of saturated aqueous sodium hydrogen carbonate solution was added. The solution was stirred for 1 hour and extracted twice with 50 ml of ethyl acetate. The organic layers were combined, washed with 50 ml of saturated aqueous sodium bicarbonate and 50 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (1,4-dithiaspiro [4,5] dec-8-yl) -2- (3,3,3-trifluoropropylsulfonyl) acetonitrile represented by the following formula: (Hereinafter referred to as the present organic sulfur compound (152).) 0.36 g was obtained.
This organic sulfur compound (152)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.67-1.83 (2H, m), 1.88-1.97 (1H, m), 1.98-2.09 (2H M), 2.17-2.30 (3H, m), 2.36-2.48 (1H, m), 2.67-2.85 (2H, m), 3.24-3.36. (4H, m), 3.48-3.50 (1H, m), 3.60-3.83 (1H, m), 3.86 (1H, d)

参考製造例130
〔工程1〕
チオ酢酸カリウム22.85gをメタノール200mlに懸濁し、窒素雰囲気下、0℃で1−ヨード−3,3,4,4,4−ペンタフルオロブタン54.79gを30分かけて滴下し、室温で1時間攪拌した。この際、反応溶液をTLC(薄層クロマトグラフィー)で分析し、3,3,4,4,4−ペンタフルオロブチルチオアセテートの生成を確認した。該混合物を0℃に冷却した後、28%ナトリウムメトキシド/メタノール溶液40.52gを15分かけて滴下し、室温で1時間攪拌した。該混合物に、0℃でクロロアセトニトリル16.61gを加え、室温で3時間攪拌した。反応容器を氷浴で冷却し、1N塩酸水溶液を加え、メタノールを減圧留去した。t−ブチルメチルエーテル200mlで2回抽出し、合わせた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥後、ろ過し、溶媒を減圧留去した。残渣をシリカゲルカラムクロマトグラフィーに付し、(3,3,4,4,4−ペンタフルオロブチルチオ)アセトニトリル17.81gを得た。
Reference Production Example 130
[Step 1]
22.85 g of potassium thioacetate was suspended in 200 ml of methanol, and 54.79 g of 1-iodo-3,3,4,4,4-pentafluorobutane was added dropwise over 30 minutes at 0 ° C. under a nitrogen atmosphere. Stir for 1 hour. At this time, the reaction solution was analyzed by TLC (thin layer chromatography) to confirm the formation of 3,3,4,4,4-pentafluorobutylthioacetate. After the mixture was cooled to 0 ° C., 40.52 g of 28% sodium methoxide / methanol solution was added dropwise over 15 minutes and stirred at room temperature for 1 hour. To the mixture, 16.61 g of chloroacetonitrile was added at 0 ° C., and the mixture was stirred at room temperature for 3 hours. The reaction vessel was cooled in an ice bath, 1N aqueous hydrochloric acid solution was added, and methanol was distilled off under reduced pressure. Extraction was performed twice with 200 ml of t-butyl methyl ether, and the combined organic layer was washed with saturated brine, dried over sodium sulfate, filtered, and the solvent was distilled off under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 17.81 g of (3,3,4,4,4-pentafluorobutylthio) acetonitrile.

〔工程2〕
(3,3,4,4,4−ペンタフルオロブチルチオ)アセトニトリル17.81gとタングステン酸ナトリウム二水和物0.28gを水30mLに混合した懸濁液を撹拌しながら、31%過酸化水素水8.94mlを加えた後、65℃に昇温し、31%過酸化水素水8.94mlを加え、70℃で1時間攪拌した。反応途中、スルホキシド体と推測される化合物の生成がTLC(薄層クロマトグラフィー)分析にて確認された。該反応混合物を室温まで冷却し、亜硫酸ナトリウム水溶液30mlを加え、酢酸エチル150mlで3回抽出した。有機層を合一し、飽和食塩水で洗浄した後、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をクロロホルム:ヘキサン=1:2で結晶化し、(3,3,4,4,4−ペンタフルオロブチルスルホニル)アセトニトリル17.84gを得た。
[Step 2]
While stirring a suspension of 17.81 g of (3,3,4,4,4-pentafluorobutylthio) acetonitrile and 0.28 g of sodium tungstate dihydrate in 30 mL of water, 31% hydrogen peroxide After adding 8.94 ml of water, the temperature was raised to 65 ° C., 8.94 ml of 31% hydrogen peroxide was added, and the mixture was stirred at 70 ° C. for 1 hour. During the reaction, the formation of a compound presumed to be a sulfoxide form was confirmed by TLC (thin layer chromatography) analysis. The reaction mixture was cooled to room temperature, 30 ml of aqueous sodium sulfite solution was added, and the mixture was extracted 3 times with 150 ml of ethyl acetate. The organic layers were combined, washed with saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was crystallized with chloroform: hexane = 1: 2 to obtain 17.84 g of (3,3,4,4,4-pentafluorobutylsulfonyl) acetonitrile.

〔工程3〕
(3,3,4,4,4−ペンタフルオロブチルスルホニル)アセトニトリル7.74g、トルエン100ml、DL-プロリン0.23gおよび1,4−シクロヘキサンジオンモノエチレンケタール4.81gを3時間、還流条件下で加熱攪拌した。該反応混合物よりトルエンを20ml留去した後、室温まで冷却した。該反応混合物にテトラヒドロフラン100mlを加え、0℃に冷却後、水素化ホウ素ナトリウム1.17gを加えた。室温で6時間攪拌後、0℃に冷却し、水100mlおよび酢酸エチル100mlを加えた。該溶液を攪拌しながら、1N塩酸100mlを滴下し、酢酸エチル100mlで2回抽出した。有機層を飽和炭酸水素ナトリウム水100ml、飽和食塩水100ml、水100mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(1,4−ジオキサスピロ〔4,5〕デカ−8−イル)−2−(3,3,4,4,4−ペンタフルオロブチルスルホニル)アセトニトリル(以下、本有機硫黄化合物(153)と記す。)5.00gを得た。
本有機硫黄化合物(153)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.58−1.91(7H,m),2.13−2.22(1H,m),2.39−2.51(1H,m),2.58−2.82(2H,m),3.40−3.50(1H,m),3.53−3.63(1H,m),3.87(1H,d),3.93−3.98(4H,m) [Step 3]
(3,3,4,4,4-pentafluorobutylsulfonyl) 7.74 g of acetonitrile, 100 ml of toluene, 0.23 g of DL-proline and 4.81 g of 1,4-cyclohexanedione monoethylene ketal for 3 hours under reflux conditions And stirred with heating. After distilling off 20 ml of toluene from the reaction mixture, it was cooled to room temperature. 100 ml of tetrahydrofuran was added to the reaction mixture, and after cooling to 0 ° C., 1.17 g of sodium borohydride was added. After stirring at room temperature for 6 hours, the mixture was cooled to 0 ° C., and 100 ml of water and 100 ml of ethyl acetate were added. While stirring the solution, 100 ml of 1N hydrochloric acid was added dropwise, and extracted twice with 100 ml of ethyl acetate. The organic layer was washed with 100 ml of saturated aqueous sodium hydrogencarbonate, 100 ml of saturated brine, and 100 ml of water, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (1,4-dioxaspiro [4,5] dec-8-yl) -2- (3,3,4,4,4-pentafluoro represented by the following formula: Butylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound (153)) (5.00 g) was obtained.
This organic sulfur compound (153)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.58-1.91 (7H, m), 2.13-2.22 (1H, m), 2.39-2.51 (1H M), 2.58-2.82 (2H, m), 3.40-3.50 (1H, m), 3.53-3.63 (1H, m), 3.87 (1H, d) ), 3.93-3.98 (4H, m)

参考製造例131
本有機硫黄化合物(153)5.00gに酢酸14mlおよび水6mlを加え、70℃に加熱し、10時間攪拌した。該反応混合物を室温まで冷却した後、酢酸エチル100mlを加え、飽和炭酸水素ナトリウム水100mlにゆっくりと加えた。該溶液を1時間攪拌し、酢酸エチル100mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水100ml、飽和食塩水100mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(4−オキソシクロヘキシル)−2−(3,3,4,4,4−ペンタフルオロブチルスルホニル)アセトニトリル(以下、本有機硫黄化合物(154)と記す。)3.56gを得た。
本有機硫黄化合物(154)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.84−1.97(2H,m),2.17−2.26(1H,m),2.40−2.61(5H,m),2.81−2.85(2H,m),3.44−3.54(1H,m),3.59−3.70(1H,m),3.99(1H,d) Reference Production Example 131
To 5.00 g of this organic sulfur compound (153), 14 ml of acetic acid and 6 ml of water were added, heated to 70 ° C. and stirred for 10 hours. After the reaction mixture was cooled to room temperature, 100 ml of ethyl acetate was added and slowly added to 100 ml of saturated aqueous sodium bicarbonate. The solution was stirred for 1 hour and extracted twice with 100 ml of ethyl acetate. The organic layers were combined, washed with 100 ml of saturated aqueous sodium bicarbonate and 100 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (4-oxocyclohexyl) -2- (3,3,4,4,4-pentafluorobutylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound) represented by the following formula: (Described as (154).) 3.56 g was obtained.
This organic sulfur compound (154)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.84-1.97 (2H, m), 2.17-2.26 (1H, m), 2.40-2.61 (5H) , M), 2.81-2.85 (2H, m), 3.44-3.54 (1H, m), 3.59-3.70 (1H, m), 3.99 (1H, d) )

参考製造例132
本有機硫黄化合物(154)0.35gをテトラヒドロフラン10mlに溶解し、ピリジン0.75g、メトキシアミン塩酸塩0.79gを加え、室温にて3時間攪拌した。該反応液に1N塩酸水溶液30mlを加え、酢酸エチル50mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水溶液50ml、飽和食塩水50mlで洗浄し、得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−〔4−(メトキシイミノ)シクロヘキシル〕−2−(3,3,4,4,4−ペンタフルオロブチルスルホニル)アセトニトリル(以下、本有機硫黄化合物(155)と記す。)0.34gを得た。
本有機硫黄化合物(155)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.55−1.72(2H,m),1.80−1.92(1H,m),1.95−2.11(1H,m),2.17−2.28(1H,m),2.31−2.45(1H,m),2.48−2.58(1H,m),2.61−2.80(3H,m),3.33−3.40(1H,m),3.42−3.50(1H,m),3.55−3.65(1H,m),3.83(3H,s),3.89(1H,d) Reference production example 132
0.35 g of this organic sulfur compound (154) was dissolved in 10 ml of tetrahydrofuran, 0.75 g of pyridine and 0.79 g of methoxyamine hydrochloride were added, and the mixture was stirred at room temperature for 3 hours. 30 ml of 1N aqueous hydrochloric acid solution was added to the reaction solution, and the mixture was extracted twice with 50 ml of ethyl acetate. The organic layers were combined and washed with 50 ml of saturated aqueous sodium hydrogen carbonate solution and 50 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography. 0.34 g of organic sulfur compound (described as 155) was obtained.
This organic sulfur compound (155)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.55-1.72 (2H, m), 1.80-1.92 (1H, m), 1.95-2.11 (1H M), 2.17-2.28 (1H, m), 2.31-2.45 (1H, m), 2.48-2.58 (1H, m), 2.61-2.80. (3H, m), 3.33-3.40 (1H, m), 3.42-3.50 (1H, m), 3.55-3.65 (1H, m), 3.83 (3H , S), 3.89 (1H, d)

参考製造例133
本有機硫黄化合物(115)2.88gをピリジン10mlに溶解し、p−トルエンスルホニルクロライド1.91を加え、室温にて3時間攪拌した。該反応液に1N塩酸水溶液30mlを加え、酢酸エチル50mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水溶液50ml、飽和食塩水50mlで洗浄し、得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をトルエン20mlに溶解し、ヨウ化ナトリウム1.50g、1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エン1.52gを加え、110℃に加熱し、10時間攪拌した。該反応液に1N塩酸水溶液30mlを加え、酢酸エチル50mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水溶液50ml、飽和食塩水50mlで順次洗浄し、得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される1−メチレン−4−(3,3,3−トリフルオロプロピルスルホニルメチル)−シクロヘキサン(以下、本有機硫黄化合物(156)と記す。)1.01gを得た。
本有機硫黄化合物(156)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.20−1.31(2H,m),2.03−2.17(4H,m),2.22−2.36(3H,m),2.62−2.74(2H,m),2.95(2H,d),3.16−3.21(2H,m),4.66(2H,s) Reference Production Example 133
2.88 g of this organic sulfur compound (115) was dissolved in 10 ml of pyridine, p-toluenesulfonyl chloride 1.91 was added, and the mixture was stirred at room temperature for 3 hours. 30 ml of 1N aqueous hydrochloric acid solution was added to the reaction solution, and the mixture was extracted twice with 50 ml of ethyl acetate. The organic layers were combined and washed with 50 ml of saturated aqueous sodium hydrogen carbonate solution and 50 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was dissolved in 20 ml of toluene, 1.50 g of sodium iodide and 1.52 g of 1,8-diazabicyclo [5.4.0] undec-7-ene were added, heated to 110 ° C., and stirred for 10 hours. 30 ml of 1N aqueous hydrochloric acid solution was added to the reaction solution, and the mixture was extracted twice with 50 ml of ethyl acetate. The organic layers were combined, washed successively with 50 ml of saturated aqueous sodium hydrogen carbonate solution and 50 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 1-methylene-4- (3,3,3-trifluoropropylsulfonylmethyl) -cyclohexane (hereinafter referred to as the present organic sulfur compound (156)) represented by the following formula. 1.01 g was obtained.
This organic sulfur compound (156)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.20-1.31 (2H, m), 2.03-2.17 (4H, m), 2.22-2.36 (3H) M), 2.62-2.74 (2H, m), 2.95 (2H, d), 3.16-3.21 (2H, m), 4.66 (2H, s)

参考製造例134
本有機硫黄化合物(156)0.60gをジクロロメタン4mlに溶解し、ブロモホルム0.86g、水酸化ナトリウム0.44g、ベンジルトリエチルアンモニウムクロライド0.02gを加え、超音波照射条件下に30℃で4時間攪拌した。該反応混合物に2N塩酸水溶液20mlを加え、酢酸エチル30mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水溶液30ml、飽和食塩水30mlで順次洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される1,1−ジブロモ−6−(3,3,3−トリフルオロプロピルスルホニルメチル)−スピロ〔2.5〕オクタン(以下、本有機硫黄化合物(157)と記す。)0.31gを得た。
本有機硫黄化合物(157)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.23−1.34(2H,m),1.39(2H,s),1.59−1.67(2H,m),1.85−1.95(2H,m),2.07−2.15(2H,m),2.16−2.25(1H,m),2.63−2.75(2H,m),2.99(2H,d),3.17−3.21(2H,m) Reference Production Example 134
0.60 g of this organic sulfur compound (156) is dissolved in 4 ml of dichloromethane, 0.86 g of bromoform, 0.44 g of sodium hydroxide and 0.02 g of benzyltriethylammonium chloride are added, and the mixture is subjected to ultrasonic irradiation conditions at 30 ° C. for 4 hours. Stir. 20 ml of 2N aqueous hydrochloric acid was added to the reaction mixture, and the mixture was extracted twice with 30 ml of ethyl acetate. The organic layers were combined, washed successively with 30 ml of saturated aqueous sodium hydrogen carbonate solution and 30 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 1,1-dibromo-6- (3,3,3-trifluoropropylsulfonylmethyl) -spiro [2.5] octane (hereinafter referred to as the present organic sulfur) represented by the following formula: Compound (157).) 0.31 g was obtained.
This organic sulfur compound (157)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.23-1.34 (2H, m), 1.39 (2H, s), 1.59-1.67 (2H, m), 1.85-1.95 (2H, m), 2.07-2.15 (2H, m), 2.16-2.25 (1H, m), 2.63-2.75 (2H, m ), 2.99 (2H, d), 3.17-3.21 (2H, m)

参考製造例135
ブロモホルムに代えて、クロロホルム0.71gを用いて、参考製造例125に記載の方法に準じて、下式に示される1,1−ジクロロ−6−(3,3,3−トリフルオロプロピルスルホニルメチル)−スピロ〔2.5〕オクタン(以下、本有機硫黄化合物(158)と記す。)0.41gを得た。
本有機硫黄化合物(158)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.24−1.35(2H,m),1.53−1.62(4H,m),1.84−1.93(2H,m),2.08−2.15(2H,m),2.16−2.26(1H,m),2.63−2.75(2H,m),2.99(2H,d),3.18−3.22(2H,m) Reference Production Example 135
1,1-dichloro-6- (3,3,3-trifluoropropylsulfonylmethyl represented by the following formula was used in accordance with the method described in Reference Production Example 125, using 0.71 g of chloroform instead of bromoform. ) -Spiro [2.5] octane (hereinafter referred to as the present organic sulfur compound (158)) 0.41 g was obtained.
This organic sulfur compound (158)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.24-1.35 (2H, m), 1.53-1.62 (4H, m), 1.84-1.93 (2H) M), 2.08-2.15 (2H, m), 2.16-2.26 (1H, m), 2.62-2.75 (2H, m), 2.99 (2H, d) ), 3.18-3.22 (2H, m)

参考製造例136
本有機硫黄化合物(154)0.46gをテトラヒドロフラン10mlに溶解し、ピリジン0.86g、30%エトキシアミン塩酸塩水溶液0.86gを加え、室温にて3時間攪拌した。該反応液に1N塩酸水溶液30mlを加え、酢酸エチル50mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水溶液50ml、飽和食塩水50mlで洗浄し、得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−〔4−(メトキシイミノ)シクロヘキシル〕−2−(3,3,4,4,4−ペンタフルオロブチルスルホニル)アセトニトリル(以下、本有機硫黄化合物(159)と記す。)0.34gを得た。
本有機硫黄化合物(159)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.25(3H,t),1.55−1.73(2H,m),1.76−1.92(1H,m),1.94−2.09(1H,m),2.16−2.29(1H,m),2.31−2.44(1H,m),2.48−2.57(1H,m),2.62−2.79(3H,m),3.36−3.51(2H,m),3.54−3.65(1H,m),3.88(1H,d),4.08(2H,q) Reference Production Example 136
0.46 g of this organic sulfur compound (154) was dissolved in 10 ml of tetrahydrofuran, 0.86 g of pyridine and 0.86 g of 30% ethoxyamine hydrochloride aqueous solution were added, and the mixture was stirred at room temperature for 3 hours. 30 ml of 1N aqueous hydrochloric acid solution was added to the reaction solution, and the mixture was extracted twice with 50 ml of ethyl acetate. The organic layers were combined and washed with 50 ml of saturated aqueous sodium hydrogen carbonate solution and 50 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- [4- (methoxyimino) cyclohexyl] -2- (3,3,4,4,4-pentafluorobutylsulfonyl) acetonitrile (hereinafter referred to as the present compound) represented by the following formula: 0.34 g of organic sulfur compound (159) is obtained.
This organic sulfur compound (159)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.25 (3H, t), 1.55-1.73 (2H, m), 1.76-1.92 (1H, m), 1.94-2.09 (1H, m), 2.16-2.29 (1H, m), 2.31-2.44 (1H, m), 2.48-2.57 (1H, m ), 2.62-2.79 (3H, m), 3.36-3.51 (2H, m), 3.54-3.65 (1H, m), 3.88 (1H, d), 4.08 (2H, q)

参考製造例137
〔工程1〕
1−ヨード−3,3,4,4,4−ペンタフルオロブタンに代えて、1−ヨード−3−(トリフルオロメチル)−3,4,4,4−テトラフルオロブタン4.19gを用いて、参考製造例121の〔工程1〕に記載の方法に準じて、(3−(トリフルオロメチル)−3,4,4,4−ペンタフルオロブチルチオ)アセトニトリル4.77gを得た。
Reference Production Example 137
[Step 1]
Instead of 1-iodo-3,3,4,4,4-pentafluorobutane, 4.19 g of 1-iodo-3- (trifluoromethyl) -3,4,4,4-tetrafluorobutane was used. According to the method described in [Step 1] of Reference Production Example 121, 4.77 g of (3- (trifluoromethyl) -3,4,4,4-pentafluorobutylthio) acetonitrile was obtained.

〔工程2〕
2KHSO5・KHSO4・K2SO4の複塩(Oxone、登録商標)16.14gを水50mlに懸濁し、窒素雰囲気下、(3−(トリフルオロメチル)−3,4,4,4−ペンタフルオロブチルチオ)アセトニトリル4.77gのメタノール50ml溶液を60分かけて滴下し、2時間攪拌した。該反応混合物に10%亜硫酸ナトリウム水溶液50mlを加え、酢酸エチル100mlで2回抽出した。有機層を合一し、10%亜硫酸ナトリウム水溶液50ml、飽和食塩水50mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、(3−(トリフルオロメチル)−3,4,4,4−ペンタフルオロブチルスルホニル)アセトニトリル4.00gを得た。
[Step 2]
16.14 g of a double salt of 2KHSO 5 · KHSO 4 · K2SO 4 (Oxone (registered trademark)) was suspended in 50 ml of water, and (3- (trifluoromethyl) -3,4,4,4-pentafluoro was suspended in a nitrogen atmosphere. A solution of 4.77 g of butylthio) acetonitrile in 50 ml of methanol was added dropwise over 60 minutes and stirred for 2 hours. 50 ml of 10% aqueous sodium sulfite solution was added to the reaction mixture, and the mixture was extracted twice with 100 ml of ethyl acetate. The organic layers were combined, washed with 50 ml of 10% aqueous sodium sulfite solution and 50 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 4.00 g of (3- (trifluoromethyl) -3,4,4,4-pentafluorobutylsulfonyl) acetonitrile.

〔工程3〕
(3−(トリフルオロメチル)−3,4,4,4−ペンタフルオロブチルスルホニル)アセトニトリル4.00g、トルエン50ml、DL-プロリン0.15gおよび1,4−シクロヘキサンジオンモノエチレンケタール2.28gを3時間、還流条件下で加熱攪拌した。該反応混合物よりトルエンを30ml留去した後、0℃に冷却した。水素化ホウ素ナトリウム0.25g、N,N−ジメチルホルムアミド2mlを加えた。室温で6時間攪拌後、0℃に冷却し、水50mlおよび酢酸エチル50mlを加えた。該溶液を攪拌しながら、1N塩酸20mlを滴下し、酢酸エチル100mlで2回抽出した。有機層を飽和炭酸水素ナトリウム水100ml、飽和食塩水100mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(1,4−ジオキサスピロ〔4,5〕デカ−8−イル)−2−(3−(トリフルオロメチル)−3,4,4,4−ペンタフルオロブチルスルホニル)アセトニトリル(以下、本有機硫黄化合物(160)と記す。)4.41gを得た。
本有機硫黄化合物(160)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.51−2.22(8H,m),2.40−2.51(1H,m),2.64−2.83(2H,m),3.37−3.48(1H,m),3.49−3.61(1H,m),3.86−3.89(1H,m),3.90−3.99(4H,m) [Step 3]
4.00 g of (3- (trifluoromethyl) -3,4,4,4-pentafluorobutylsulfonyl) acetonitrile, 50 ml of toluene, 0.15 g of DL-proline and 2.28 g of 1,4-cyclohexanedione monoethylene ketal The mixture was heated and stirred under reflux conditions for 3 hours. 30 ml of toluene was distilled off from the reaction mixture, and then cooled to 0 ° C. 0.25 g of sodium borohydride and 2 ml of N, N-dimethylformamide were added. After stirring at room temperature for 6 hours, the mixture was cooled to 0 ° C., and 50 ml of water and 50 ml of ethyl acetate were added. While stirring the solution, 20 ml of 1N hydrochloric acid was added dropwise and extracted twice with 100 ml of ethyl acetate. The organic layer was washed with 100 ml of saturated aqueous sodium hydrogencarbonate and 100 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (1,4-dioxaspiro [4,5] dec-8-yl) -2- (3- (trifluoromethyl) -3,4, represented by the following formula: 4.41 g of 4,4-pentafluorobutylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound (160)) was obtained.
This organic sulfur compound (160)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.51-2.22 (8H, m), 2.40-2.51 (1H, m), 2.64-2.83 (2H M), 3.37-3.48 (1H, m), 3.49-3.61 (1H, m), 3.86-3.89 (1H, m), 3.90-3.99. (4H, m)

参考製造例138
本有機硫黄化合物(160)4.41gに酢酸14mlおよび水6ml、メトキシアミン塩酸塩1.50g、酢酸ナトリウム1.47gを加え、100℃に加熱し、10時間攪拌した。該反応混合物を室温まで冷却した後、酢酸エチル100mlを加え、飽和炭酸水素ナトリウム水100mlにゆっくりと加えた。該溶液を1時間攪拌し、酢酸エチル100mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水100ml、飽和食塩水100mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(4−メトキシイミノシクロヘキシル)−2−(3−(トリフルオロメチル)−3,4,4,4−ペンタフルオロブチルスルホニル)アセトニトリル(以下、本有機硫黄化合物(161)と記す。)3.61gを得た。
本有機硫黄化合物(161)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.52−1.72(2H,m),1.81−1.91(1H,m),1.96−2.08(1H,m),2.16−2.28(1H,m),2.31−2.44(1H,m),2.50−2.57(1H,m),2.62−2.82(3H,m),3.33−3.48(2H,m),3.53−3.63(1H,m),3.83(3H,s),3.89(1H,d) Reference Production Example 138
To 4.41 g of the organic sulfur compound (160), 14 ml of acetic acid and 6 ml of water, 1.50 g of methoxyamine hydrochloride and 1.47 g of sodium acetate were added, heated to 100 ° C. and stirred for 10 hours. After the reaction mixture was cooled to room temperature, 100 ml of ethyl acetate was added and slowly added to 100 ml of saturated aqueous sodium bicarbonate. The solution was stirred for 1 hour and extracted twice with 100 ml of ethyl acetate. The organic layers were combined, washed with 100 ml of saturated aqueous sodium bicarbonate and 100 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (4-methoxyiminocyclohexyl) -2- (3- (trifluoromethyl) -3,4,4,4-pentafluorobutylsulfonyl) acetonitrile represented by the following formula (Hereinafter referred to as the present organic sulfur compound (161).) 3.61 g was obtained.
This organic sulfur compound (161)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.52-1.72 (2H, m), 1.81-1.91 (1H, m), 1.96-2.08 (1H M), 2.16-2.28 (1H, m), 2.31-2.44 (1H, m), 2.50-2.57 (1H, m), 2.62-2.82. (3H, m), 3.33-3.48 (2H, m), 3.53-3.63 (1H, m), 3.83 (3H, s), 3.89 (1H, d)

参考製造例139
〔工程1〕
3,3,4,4,5,5,6,6,6−ノナフルオロヘキシル−1−トルエンスルホナート42.65g、チオ酢酸カリウム11.65g及びN,N−ジメチルホルムアミド100mlの混合物を窒素雰囲気下、80℃で4時間攪拌した。反応容器を氷浴で冷却し、1N塩酸水溶液を加え、酢酸エチル200mlで2回抽出し、合わせた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥後、ろ過し、溶媒を減圧留去した。残渣をシリカゲルカラムクロマトグラフィーに付し、3,3,4,4,5,5,6,6,6−ノナフルオロヘキシルチオ酢酸エステル18.91gを得た。
Reference Production Example 139
[Step 1]
A mixture of 42,65 g of 3,3,4,4,5,5,6,6,6-nonafluorohexyl-1-toluenesulfonate, 11.65 g of potassium thioacetate and 100 ml of N, N-dimethylformamide in a nitrogen atmosphere Under stirring at 80 ° C. for 4 hours. The reaction vessel is cooled in an ice bath, 1N aqueous hydrochloric acid solution is added, and the mixture is extracted twice with 200 ml of ethyl acetate. The combined organic layers are washed with saturated brine, dried over sodium sulfate, filtered, and the solvent is distilled off under reduced pressure. did. The residue was subjected to silica gel column chromatography to obtain 18.91 g of 3,3,4,4,5,5,6,6,6-nonafluorohexylthioacetate.

〔工程2〕
3,3,4,4,5,5,6,6,6−ノナフルオロヘキシルチオ酢酸エステル18.91gをテトラヒドロフラン60mlに溶解し、0℃に冷却した後、28%ナトリウムメトキシド/メタノール溶液11.32gを15分かけて滴下し、室温で1時間攪拌した。該混合物に、0℃でクロロアセトニトリル4.40gを加え、室温で3時間攪拌した。反応容器を氷浴で冷却し、飽和食塩水を加え、t−ブチルメチルエーテル100mlで2回抽出し、合わせた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシルチオ)アセトニトリル15.70gを得た。
[Step 2]
After 3,91,4,4,5,5,6,6,6-nonafluorohexylthioacetate (18.91 g) was dissolved in 60 ml of tetrahydrofuran and cooled to 0 ° C., 28% sodium methoxide / methanol solution 11 .32 g was added dropwise over 15 minutes and stirred at room temperature for 1 hour. To the mixture, 4.40 g of chloroacetonitrile was added at 0 ° C., and the mixture was stirred at room temperature for 3 hours. The reaction vessel was cooled in an ice bath, saturated brine was added, and the mixture was extracted twice with 100 ml of t-butyl methyl ether. The combined organic layers were washed with saturated brine, dried over sodium sulfate, filtered, and reduced pressure. Concentrated. The residue was subjected to silica gel column chromatography to obtain 15.70 g of (3,3,4,4,5,5,6,6,6-nonafluorohexylthio) acetonitrile.

〔工程3〕
2KHSO5・KHSO4・K2SO4の複塩(Oxone、登録商標)15.10gを水100mlに懸濁し、窒素雰囲気下、−20℃で(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシルチオ)アセトニトリル15.70gのメタノール100ml溶液を60分かけて滴下し、2時間攪拌した。該反応混合物に10%亜硫酸ナトリウム水溶液50mlを加え、酢酸エチル100mlで2回抽出した。有機層を合一し、10%亜硫酸ナトリウム水溶液50ml、飽和食塩水50mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシルスルフィニル)アセトニトリル12.56gを得た。
[Step 3]
15.10 g of a double salt of 2KHSO 5 · KHSO 4 · K2SO 4 (Oxone (registered trademark)) was suspended in 100 ml of water, and suspended at −20 ° C. under a nitrogen atmosphere ( 3 , 3 , 4 , 4 , 5 , 5 , 6, (6,6-nonafluorohexylthio) A solution of 15.70 g of acetonitrile in 100 ml of methanol was added dropwise over 60 minutes and stirred for 2 hours. 50 ml of 10% aqueous sodium sulfite solution was added to the reaction mixture, and the mixture was extracted twice with 100 ml of ethyl acetate. The organic layers were combined, washed with 50 ml of 10% aqueous sodium sulfite solution and 50 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 12.56 g of (3,3,4,4,5,5,6,6,6-nonafluorohexylsulfinyl) acetonitrile.

〔工程4〕
2KHSO5・KHSO4・K2SO4の複塩(Oxone、登録商標)9.21gを水50mlに懸濁し、窒素雰囲気下、((3,3,4,4,5,5,6,6,6−ノナフルオロヘキシルスルフィニル)アセトニトリル6.80gのメタノール50ml溶液を60分かけて滴下し、一晩攪拌した。該反応混合物に10%亜硫酸ナトリウム水溶液25mlを加え、酢酸エチル100mlで2回抽出した。有機層を合一し、10%亜硫酸ナトリウム水溶液25ml、飽和食塩水50mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシルスルホニル)アセトニトリル5.40gを得た。
[Step 4]
9.21 g of a double salt of 2KHSO 5 · KHSO 4 · K2SO 4 (Oxone (registered trademark)) was suspended in 50 ml of water, and ((3,3,4,4,5,5,6,6,6) was suspended in a nitrogen atmosphere. -Nonafluorohexylsulfinyl) A solution of 6.80 g of acetonitrile in 50 ml of methanol was added dropwise over 60 minutes and stirred overnight, 25 ml of 10% aqueous sodium sulfite was added to the reaction mixture, and the mixture was extracted twice with 100 ml of ethyl acetate. The layers were combined, washed with 25 ml of 10% aqueous sodium sulfite solution and 50 ml of saturated brine, dried over sodium sulfate, filtered and concentrated under reduced pressure, and the residue was subjected to silica gel column chromatography (3, 3, There was obtained 5.40 g of 4,4,5,5,6,6,6-nonafluorohexylsulfonyl) acetonitrile.

〔工程5〕
(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシルスルホニル)アセトニトリル5.40g、トルエン60ml、DL-プロリン0.18gおよび1,4−シクロヘキサンジオンモノエチレンケタール2.77gを3時間、還流条件下で加熱攪拌した。該反応混合物よりトルエンを40ml留去した後、0℃に冷却した。水素化ホウ素ナトリウム0.61g、N,N−ジメチルホルムアミド3mlを加えた。室温で6時間攪拌後、0℃に冷却し、水50mlおよび酢酸エチル50mlを加えた。該溶液を攪拌しながら、1N塩酸20mlを滴下し、酢酸エチル100mlで2回抽出した。有機層を飽和炭酸水素ナトリウム水100ml、飽和食塩水100mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣に酢酸14mlおよび水6mlを加え、100℃に加熱し、8時間攪拌した。該反応混合物を室温まで冷却した後、酢酸エチル100mlを加え、飽和炭酸水素ナトリウム水100mlにゆっくりと加えた。該溶液を1時間攪拌し、酢酸エチル100mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水100ml、飽和食塩水100mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(4−オキソシクロヘキシル)−2−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシルスルホニル)アセトニトリル(以下、本有機硫黄化合物(162)と記す。)2.94gを得た。
本有機硫黄化合物(162)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.83−1.98(2H,m),2.17−2.26(1H,m),2.38−2.59(5H,m),2.67−2.97(3H,m),3.44−3.54(1H,m),3.60−3.70(1H,m),4.00(1H,d) [Step 5]
(3,3,4,4,5,5,6,6,6-nonafluorohexylsulfonyl) acetonitrile 5.40 g, toluene 60 ml, DL-proline 0.18 g and 1,4-cyclohexanedione monoethylene ketal 77 g was heated and stirred under reflux conditions for 3 hours. After 40 ml of toluene was distilled off from the reaction mixture, it was cooled to 0 ° C. 0.61 g of sodium borohydride and 3 ml of N, N-dimethylformamide were added. After stirring at room temperature for 6 hours, the mixture was cooled to 0 ° C., and 50 ml of water and 50 ml of ethyl acetate were added. While stirring the solution, 20 ml of 1N hydrochloric acid was added dropwise and extracted twice with 100 ml of ethyl acetate. The organic layer was washed with 100 ml of saturated aqueous sodium hydrogen carbonate and 100 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. 14 ml of acetic acid and 6 ml of water were added to the residue, heated to 100 ° C. and stirred for 8 hours. After the reaction mixture was cooled to room temperature, 100 ml of ethyl acetate was added and slowly added to 100 ml of saturated aqueous sodium bicarbonate. The solution was stirred for 1 hour and extracted twice with 100 ml of ethyl acetate. The organic layers were combined, washed with 100 ml of saturated aqueous sodium bicarbonate and 100 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (4-oxocyclohexyl) -2- (3,3,4,4,5,5,6,6,6-nonafluorohexylsulfonyl) represented by the following formula: 2.94 g of acetonitrile (hereinafter referred to as the present organic sulfur compound (162)) was obtained.
This organic sulfur compound (162)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.83-1.98 (2H, m), 2.17-2.26 (1H, m), 2.38-2.59 (5H) M), 2.67-2.97 (3H, m), 3.44-3.54 (1H, m), 3.60-3.70 (1H, m), 4.00 (1H, d) )

参考製造例140
本有機硫黄化合物(162)2.69gをテトラヒドロフラン12mlに溶解し、ピリジン0.52g、メトキシアミン塩酸塩0.55を加え、室温にて3時間攪拌した。該反応液に1N塩酸水溶液30mlを加え、酢酸エチル50mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水溶液50ml、飽和食塩水50mlで洗浄し、得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−〔4−(メトキシイミノ)シクロヘキシル〕−2−(3,3,4,4,5,5,6,6,6−ノナフルオロヘキシルスルホニル)アセトニトリル(以下、本有機硫黄化合物(163)と記す。)2.86gを得た。
本有機硫黄化合物(163)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.49−1.73(2H,m),1.77−1.91(1H,m),1.95−2.09(1H,m),2.17−2.27(1H,m),2.31−2.43(1H,m),2.49−2.57(1H,m),2.62−2.86(3H,m),3.32−3.39(1H,m),3.42−3.53(1H,m),3.55−3.66(1H,m),3.84(3H,s),3.90(1H,d) Reference production example 140
2.69 g of this organic sulfur compound (162) was dissolved in 12 ml of tetrahydrofuran, 0.52 g of pyridine and 0.55 of methoxyamine hydrochloride were added, and the mixture was stirred at room temperature for 3 hours. 30 ml of 1N aqueous hydrochloric acid solution was added to the reaction solution, and the mixture was extracted twice with 50 ml of ethyl acetate. The organic layers were combined and washed with 50 ml of saturated aqueous sodium hydrogen carbonate solution and 50 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- [4- (methoxyimino) cyclohexyl] -2- (3,3,4,4,5,5,6,6,6-nonafluoro represented by the following formula: 2.86 g of hexylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound (163)) was obtained.
This organic sulfur compound (163)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.49-1.73 (2H, m), 1.77-1.91 (1H, m), 1.95-2.09 (1H M), 2.17-2.27 (1H, m), 2.31-2.43 (1H, m), 2.49-2.57 (1H, m), 2.62-2.86. (3H, m), 3.32-3.39 (1H, m), 3.42-3.53 (1H, m), 3.55-3.66 (1H, m), 3.84 (3H , S), 3.90 (1H, d)

参考製造例141
〔工程1〕
1−ヨード−4,4,4−トリフルオロブタン23.8g、N,N−ジメチルホルムアミド100ml、チオ酢酸カリウム11.42gの混合物を窒素雰囲気下、80℃で4時間攪拌した。反応容器を氷浴で冷却し、1N塩酸を滴下し、t−ブチルメチルエーテル100mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水100ml、飽和食塩水100mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される4,4,4−トリフルオロブチルチオ酢酸エステル18.20gを得た。
Reference Production Example 141
[Step 1]
A mixture of 23.8 g of 1-iodo-4,4,4-trifluorobutane, 100 ml of N, N-dimethylformamide and 11.42 g of potassium thioacetate was stirred at 80 ° C. for 4 hours under a nitrogen atmosphere. The reaction vessel was cooled in an ice bath, 1N hydrochloric acid was added dropwise, and the mixture was extracted twice with 100 ml of t-butyl methyl ether. The organic layers were combined, washed with 100 ml of saturated aqueous sodium bicarbonate and 100 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 18.20 g of 4,4,4-trifluorobutylthioacetate represented by the following formula.

〔工程2〕
4,4,4−トリフルオロブチルチオ酢酸エステル18.20gをテトラヒドロフラン60mlに溶解し、0℃に冷却した後、28%ナトリウムメトキシド/メタノール溶液19.29gを15分かけて滴下し、室温で1時間攪拌した。該混合物に、0℃でクロロアセトニトリル7.50gを加え、室温で3時間攪拌した。反応容器を氷浴で冷却し、飽和食塩水を加え、t−ブチルメチルエーテル200mlで2回抽出し、合わせた有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、(4,4,4−トリフルオロブチルチオ)アセトニトリル17.82gを得た。
[Step 2]
After dissolving 18.20 g of 4,4,4-trifluorobutylthioacetic acid ester in 60 ml of tetrahydrofuran and cooling to 0 ° C., 19.29 g of a 28% sodium methoxide / methanol solution was added dropwise over 15 minutes. Stir for 1 hour. To the mixture, 7.50 g of chloroacetonitrile was added at 0 ° C., and the mixture was stirred at room temperature for 3 hours. The reaction vessel was cooled in an ice bath, saturated brine was added, and the mixture was extracted twice with 200 ml of t-butyl methyl ether. The combined organic layer was washed with saturated brine, dried over sodium sulfate, filtered, and reduced pressure. Concentrated. The residue was subjected to silica gel column chromatography to obtain 17.82 g of (4,4,4-trifluorobutylthio) acetonitrile.

〔工程3〕
2KHSO5・KHSO4・K2SO4の複塩(Oxone、登録商標)67.50gを水100mlに懸濁し、窒素雰囲気下、(4,4,4−トリフルオロブチルチオ)アセトニトリル17.82gのメタノール100ml溶液を60分かけて滴下し、一晩間攪拌した。該反応混合物に10%亜硫酸ナトリウム水溶液50mlを加え、酢酸エチル200mlで2回抽出した。有機層を合一し、10%亜硫酸ナトリウム水溶液50ml、飽和食塩水50mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、(4,4,4−トリフルオロブチルスルホニル)アセトニトリル22.34gを得た。
[Step 3]
67.50 g of double salt of 2KHSO 5 · KHSO 4 · K2SO 4 (Oxone (registered trademark)) is suspended in 100 ml of water, and under nitrogen atmosphere, (4,4,4-trifluorobutylthio) acetonitrile 17.82 g of methanol 100 ml The solution was added dropwise over 60 minutes and stirred overnight. 50 ml of 10% aqueous sodium sulfite solution was added to the reaction mixture, and the mixture was extracted twice with 200 ml of ethyl acetate. The organic layers were combined, washed with 50 ml of 10% aqueous sodium sulfite solution and 50 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 22.34 g of (4,4,4-trifluorobutylsulfonyl) acetonitrile.

〔工程4〕
(4,4,4−トリフルオロブチルスルホニル)アセトニトリル24.10g、トルエン200ml、DL-プロリン1.11gおよび1,4−シクロヘキサンジオンモノエチレンケタール16.58gを5時間、還流条件下で加熱攪拌した。該反応混合物よりトルエンを100ml留去した後、0℃に冷却した。水素化ホウ素ナトリウム1.89g、N,N−ジメチルホルムアミド5mlを加えた。室温で12時間攪拌後、0℃に冷却し、水200mlおよび酢酸エチル200mlを加えた。該溶液を攪拌しながら、1N塩酸100mlを滴下し、酢酸エチル200mlで2回抽出した。有機層を飽和炭酸水素ナトリウム水100ml、飽和食塩水100mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(1,4−ジオキサスピロ〔4,5〕デカ−8−イル)−2−(4,4,4−トリオロブチルスルホニル)アセトニトリル(以下、本有機硫黄化合物(164)と記す。)22.03gを得た。
本有機硫黄化合物(164)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.56−2.49(13H,m),3.27−3.43(2H,m),3.81(1H,d),3.90−4.00(4H,m) [Step 4]
(4,4,4-trifluorobutylsulfonyl) acetonitrile 24.10 g, toluene 200 ml, DL-proline 1.11 g and 1,4-cyclohexanedione monoethylene ketal 16.58 g were heated and stirred under reflux conditions for 5 hours. . After 100 ml of toluene was distilled off from the reaction mixture, it was cooled to 0 ° C. 1.89 g of sodium borohydride and 5 ml of N, N-dimethylformamide were added. After stirring at room temperature for 12 hours, the mixture was cooled to 0 ° C., and 200 ml of water and 200 ml of ethyl acetate were added. While stirring the solution, 100 ml of 1N hydrochloric acid was added dropwise and extracted twice with 200 ml of ethyl acetate. The organic layer was washed with 100 ml of saturated aqueous sodium hydrogencarbonate and 100 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (1,4-dioxaspiro [4,5] dec-8-yl) -2- (4,4,4-triobutylsulfonyl) acetonitrile represented by the following formula: (Hereinafter referred to as the present organic sulfur compound (164).) 22.03 g was obtained.
This organic sulfur compound (164)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.56-2.49 (13H, m), 3.27-3.43 (2H, m), 3.81 (1H, d), 3.90-4.00 (4H, m)

参考製造例142
本有機硫黄化合物(164)20.03gに酢酸70mlおよび水30mlを加え、100℃に加熱し、8時間攪拌した。該反応混合物を室温まで冷却した後、酢酸エチル300mlを加え、飽和炭酸水素ナトリウム水300mlにゆっくりと加えた。該溶液を1時間攪拌し、酢酸エチル200mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水300ml、飽和食塩水300mlで洗浄し、硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−(4−オキソシクロヘキシル)−2−(4,4,4−トリオロブチルスルホニル)アセトニトリル(以下、本有機硫黄化合物(165)と記す。)15.82gを得た。
本有機硫黄化合物(165)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.81−1.99(2H,m),2.17−2.64(10H,m),2.82−2.95(1H,m),3.30−3.89(2H,m),3.93(1H,d) Reference Production Example 142
70 ml of acetic acid and 30 ml of water were added to 20.03 g of this organic sulfur compound (164), heated to 100 ° C. and stirred for 8 hours. After cooling the reaction mixture to room temperature, 300 ml of ethyl acetate was added and slowly added to 300 ml of saturated aqueous sodium bicarbonate. The solution was stirred for 1 hour and extracted twice with 200 ml of ethyl acetate. The organic layers were combined, washed with 300 ml of saturated aqueous sodium hydrogen carbonate and 300 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (4-oxocyclohexyl) -2- (4,4,4-triobutylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound (165)) represented by the following formula: 15.82 g was obtained.
This organic sulfur compound (165)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.81-1.99 (2H, m), 2.17-2.64 (10H, m), 2.82-2.95 (1H M), 3.30-3.89 (2H, m), 3.93 (1H, d)

参考製造例143
本有機硫黄化合物(165)3.11gをテトラヒドロフラン10mlに溶解し、ピリジン0.87g、メトキシアミン塩酸塩0.92gを加え、室温にて3時間攪拌した。該反応液に1N塩酸水溶液30mlを加え、酢酸エチル50mlで2回抽出した。有機層を合一し、飽和炭酸水素ナトリウム水溶液50ml、飽和食塩水50mlで洗浄し、得られた有機層を硫酸ナトリウムで乾燥後、ろ過し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、下式に示される2−〔4−(メトキシイミノ)シクロヘキシル〕−2−(4,4,4−トリオロブチルスルホニル)アセトニトリル(以下、本有機硫黄化合物(166)と記す。)3.26gを得た。
本有機硫黄化合物(166)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.49−2.08(4H,m),2.14−2.44(6H,m),2.47−2.57(1H,m),2.59−2.70(1H,m),3.28−3.45(3H,m),3.80−3.85(4H,m) Reference Production Example 143
The organic sulfur compound (165) (3.11 g) was dissolved in tetrahydrofuran (10 ml), pyridine (0.87 g) and methoxyamine hydrochloride (0.92 g) were added, and the mixture was stirred at room temperature for 3 hours. 30 ml of 1N aqueous hydrochloric acid solution was added to the reaction solution, and the mixture was extracted twice with 50 ml of ethyl acetate. The organic layers were combined and washed with 50 ml of saturated aqueous sodium hydrogen carbonate solution and 50 ml of saturated brine, dried over sodium sulfate, filtered, and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- [4- (methoxyimino) cyclohexyl] -2- (4,4,4-triobutylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound ( 166).) 3.26 g was obtained.
This organic sulfur compound (166)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.49-2.08 (4H, m), 2.14-2.44 (6H, m), 2.47-2.57 (1H M), 2.59-2.70 (1H, m), 3.28-3.45 (3H, m), 3.80-3.85 (4H, m)

参考製造例144
ヒドロキシルアミン塩酸塩に代えて、エトキシアミン塩酸塩1.72gを用いて、参考製造例104に記載の方法に準じて、2−〔4−(エトキシイミノ)シクロヘキシル〕−2−(4,4,4−トリオロブチルスルホニル)アセトニトリル(以下、本有機硫黄化合物(167)と記す。)2.87gを得た。
本有機硫黄化合物(167)

Figure 2010150156
H−NMR(CDCl,TMS):δ(ppm)1.25(3H,t),1.46−2.07(4H,m),2.14−2.43(6H,m),2.48−2.56(1H,m),2.59−2.70(1H,m),3.28−3.44(3H,m),3.83(1H,d),4.05(2H,q) Reference Production Example 144
In place of hydroxylamine hydrochloride, 1.72 g of ethoxyamine hydrochloride was used and 2- [4- (ethoxyimino) cyclohexyl] -2- (4,4,4) was prepared according to the method described in Reference Production Example 104. 4-87 g of 4-tributylbutylsulfonyl) acetonitrile (hereinafter referred to as the present organic sulfur compound (167)) was obtained.
This organic sulfur compound (167)
Figure 2010150156
1 H-NMR (CDCl 3 , TMS): δ (ppm) 1.25 (3H, t), 1.46-2.07 (4H, m), 2.14-2.43 (6H, m), 2.48-2.56 (1H, m), 2.59-2.70 (1H, m), 3.28-3.44 (3H, m), 3.83 (1H, d), 4. 05 (2H, q)

次に、本発明の有害生物防除組成物の製剤例を示す。なお、部は重量部を示す。   Next, formulation examples of the pest control composition of the present invention are shown. In addition, a part shows a weight part.

製剤例1
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物2部、並びにチアメトキサム7部を、キシレン37.5部およびN,N−ジメチルホルムアミド37.5部に溶解し、これにポリオキシエチレンスチリルフェニルエーテル10部およびドデシルベンゼンスルホン酸カルシウム6部を加え、よく撹拌混合して乳剤を得る。
Formulation Example 1
2 parts of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), and 7 parts of thiamethoxam are mixed with 37.5 parts of xylene and N, N- Dissolve in 37.5 parts of dimethylformamide, add 10 parts of polyoxyethylene styryl phenyl ether and 6 parts of calcium dodecylbenzenesulfonate and mix well with stirring to obtain an emulsion.

製剤例2
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物5部、並びにチアメトキサム4部を、キシレン37.5部およびN,N−ジメチルホルムアミド37.5部に溶解し、これにポリオキシエチレンスチリルフェニルエーテル10部およびドデシルベンゼンスルホン酸カルシウム6部を加え、よく撹拌混合して乳剤を得る。
Formulation Example 2
57.5 parts of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167) and 4 parts of thiamethoxam are mixed with 37.5 parts of xylene and N, N- Dissolve in 37.5 parts of dimethylformamide, add 10 parts of polyoxyethylene styryl phenyl ether and 6 parts of calcium dodecylbenzenesulfonate and mix well with stirring to obtain an emulsion.

製剤例3
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物20部、並びにチアメトキサム20部の混合物に、ソルポール5060(東邦化学登録商標名)5部を加え、よく混合して、カープレックス#80(塩野義製薬登録商標名、合成含水酸化ケイ素微粉末)32部、300メッシュ珪藻土23部を加え、ジュースミキサーで混合して、水和剤を得る。
Formulation Example 3
Solpol 5060 (registered trademark of Toho Chemical Co., Ltd.) was added to a mixture of 20 parts of one organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167) and 20 parts of thiamethoxam. ) Add 5 parts, mix well, add 32 parts of Carplex # 80 (registered trademark of Shionogi Pharmaceutical Co., Ltd., synthetic silicon hydroxide fine powder), 23 parts of 300 mesh diatomaceous earth, mix with juice mixer and hydrate Get the agent.

製剤例4
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物1部、チアメトキサム2部、合成含水酸化珪素微粉末5部、ドデシルベンゼンスルホン酸ナトリウム5部、ベントナイト30部およびクレー57部を加え、よく撹拌混合し、ついでこれらの混合物に適当量の水を加え、さらに撹拌し、増粒機で製粒し、通風乾燥して粒剤を得る。
Formulation Example 4
1 part of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 2 parts of thiamethoxam, 5 parts of synthetic silicon hydroxide fine powder, dodecylbenzenesulfone Add 5 parts of sodium acid, 30 parts of bentonite and 57 parts of clay, mix well with stirring, then add an appropriate amount of water to these mixtures, stir further, granulate with a granulator, dry by ventilation and granulate Get.

製剤例5
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物1.5部、チアメトキサム3部、合成含水酸化珪素微粉末1部、凝集剤としてドリレスB(三共社製)1部、クレー7部を乳鉢でよく混合した後にジュースミキサーで撹拌混合する。得られた混合物にカットクレー86.5部を加えて、充分撹拌混合し、粉剤を得る。
Formulation Example 5
1.5 parts of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 3 parts of thiamethoxam, 1 part of synthetic hydrous silicon oxide fine powder, agglomeration 1 part of Doreles B (manufactured by Sankyo Co., Ltd.) and 7 parts of clay are mixed well in a mortar and mixed with a juice mixer. 86.5 parts of cut clay is added to the resulting mixture and mixed thoroughly with stirring to obtain a powder.

製剤例6
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物5部;チアメトキサム5部;ポリオキシエチレンアルキルエーテルサルフェートアンモニウム塩50部を含むホワイトカーボン35部;並びに水55部を混合し、湿式粉砕法で微粉砕することにより、製剤を得る。
Formulation Example 6
5 parts of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167); 5 parts of thiamethoxam; and 50 parts of polyoxyethylene alkyl ether sulfate ammonium salt White carbon (35 parts) and water (55 parts) are mixed and finely pulverized by a wet pulverization method to obtain a preparation.

製剤例7
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物0.2部、並びにチアメトキサム0.3部の混合物をジクロロメタン10部に溶解し、これをアイソパーM(イソパラフィン:エクソン化学登録商標名)89.5部に混合して油剤を得る。
Formulation Example 7
A mixture of 0.2 part of one organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167) and 0.3 part of thiamethoxam is dissolved in 10 parts of dichloromethane. This is mixed with 89.5 parts of Isopar M (Isoparaffin: Exxon Chemical Registration) to obtain an oil.

製剤例8
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物0.05部、チアメトキサム0.05部、並びにネオチオゾール(中央化成株式会社)49.9部をエアゾール缶に入れ、エアゾールバルブを装着した後、25部のジメチルエーテル及び25部のLPGを充填し、アクチュエータを装着することにより油性エアゾールを得る。
Formulation Example 8
One organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 0.05 part of thiamethoxam, and neothiozole (Chuo Kasei Co., Ltd.) After putting 49.9 parts in an aerosol can and mounting an aerosol valve, 25 parts of dimethyl ether and 25 parts of LPG are filled, and an actuator is attached to obtain an oily aerosol.

製剤例9
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物0.2部、チアメトキサム0.4部、BHT0.01部、キシレン5部、脱臭灯油3.39部、並びに乳化剤{アトモス300(アトモスケミカル社登録商標名)}1部を混合溶解したものと、蒸留水50部とをエアゾール容器に充填し、バルブ部分を取り付け、該バルブを通じて噴射剤(LPG)40部を加圧充填して、水性エアゾールを得る。
Formulation Example 9
One part of organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 0.4 part of thiamethoxam, 0.01 part of BHT, 5 parts of xylene , 3.39 parts of deodorized kerosene and 1 part of an emulsifier {Atmos 300 (registered trademark name of Atmos Chemical Co., Ltd.)} and 50 parts of distilled water are filled in an aerosol container, and a valve part is attached. Through pressure, 40 parts of propellant (LPG) is pressure-filled to obtain an aqueous aerosol.

製剤例10
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物2部、並びにチアメトキサム3部をジエチレングリコールモノエチルエーテル80部に溶解し、これに炭酸プロピレン15部を混合して、スポットオン液剤を得る。
Formulation Example 10
1 part of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167) and 3 parts of thiamethoxam are dissolved in 80 parts of diethylene glycol monoethyl ether. Is mixed with 15 parts of propylene carbonate to obtain a spot-on solution.

製剤例11
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物5部、並びにチアメトキサム5部をジエチレングリコールモノエチルエーテル70部に溶解し、これに2−オクチルドデカノール20部を混合して、ポアオン液剤を得る。
Formulation Example 11
5 parts of one organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167) and 5 parts of thiamethoxam are dissolved in 70 parts of diethylene glycol monoethyl ether, And 20 parts of 2-octyldodecanol are mixed to obtain a pour-on solution.

製剤例12
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物0.25部、並びにチアメトキサム0.25部の混合物に、ニッコールTEALS-42(日光ケミカルズ・ラウリル硫酸トリエタノールアミンの42%水溶液)60部、プロピレングリコール20部を添加し、均一溶液になるまで充分撹拌混合した後、水19.5部を加えてさらに充分撹拌混合し、均一溶液のシャンプー剤を得る。
Formulation Example 12
A mixture of 0.25 part of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167) and 0.25 part of thiamethoxam is added to Nikkor TEALS-42. (42% aqueous solution of Nikko Chemicals lauryl sulfate triethanolamine) 60 parts, 20 parts of propylene glycol were added and stirred and mixed until a homogeneous solution was obtained, and then 19.5 parts of water was added and further stirred and mixed. A uniform solution shampoo is obtained.

製剤例13
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物0.05g、並びにチアメトキサム0.05gの混合物を、プロピレングリコール2mlに溶解させ、4.0×4.0cm、厚さ1.2cmの多孔セラミック板に含浸させて、加熱式くん煙剤を得る。
Formulation Example 13
A mixture of 0.05 g of one organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167) and 0.05 g of thiamethoxam is dissolved in 2 ml of propylene glycol. Impregnation into a porous ceramic plate of 4.0 × 4.0 cm and a thickness of 1.2 cm to obtain a heating smoke.

製剤例14
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物2.5部と、チアメトキサム2.5部と、エチレンーメタクリル酸メチル共重合体(共重合体中のメタクリル酸メチルの割合:10重量%、アクリフトWD301、住友化学製)95部とを密閉式加圧ニーダー(森山製作所製)で溶融混練し、得られた混練物を押出し成型機から成型ダイスを介して押出し、長さ15cm、直径3mmの棒状成型体を得る。
Formulation Example 14
2.5 parts of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 2.5 parts of thiamethoxam, and ethylene-methyl methacrylate 95 parts of a polymer (ratio of methyl methacrylate in the copolymer: 10% by weight, ACRlift WD301, manufactured by Sumitomo Chemical Co., Ltd.) was melt-kneaded with a closed pressure kneader (manufactured by Moriyama Seisakusho), and the resulting kneaded product was Extrusion is performed from an extrusion molding machine through a molding die to obtain a rod-shaped molded body having a length of 15 cm and a diameter of 3 mm.

製剤例15
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物2.5部とチアメトキサム2.5部と軟質塩化ビニル樹脂95部とを密閉式加圧ニーダー(森山製作所製)で溶融混練し、得られた混練物を押出し成型機から成型ダイスを介して押出し、長さ15cm、直径3mmの棒状成型体を得る。
Formulation Example 15
2.5 parts of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 2.5 parts of thiamethoxam, and 95 parts of a soft vinyl chloride resin. The mixture is melt-kneaded with a closed pressure kneader (manufactured by Moriyama Seisakusho), and the resulting kneaded product is extruded from an extrusion molding machine through a molding die to obtain a rod-shaped molded body having a length of 15 cm and a diameter of 3 mm.

製剤例16
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物2部、並びにクロチアニジン7部を、キシレン37.5部およびN,N−ジメチルホルムアミド37.5部に溶解し、これにポリオキシエチレンスチリルフェニルエーテル10部およびドデシルベンゼンスルホン酸カルシウム6部を加え、よく撹拌混合して乳剤を得る。
Formulation Example 16
2 parts of one organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), and 7 parts of clothianidin, 37.5 parts of xylene and N, N- Dissolve in 37.5 parts of dimethylformamide, add 10 parts of polyoxyethylene styryl phenyl ether and 6 parts of calcium dodecylbenzenesulfonate and mix well with stirring to obtain an emulsion.

製剤例17
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物5部、並びにクロチアニジン4部を、キシレン37.5部およびN,N−ジメチルホルムアミド37.5部に溶解し、これにポリオキシエチレンスチリルフェニルエーテル10部およびドデシルベンゼンスルホン酸カルシウム6部を加え、よく撹拌混合して乳剤を得る。
Formulation Example 17
5 parts of one organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), and 4 parts of clothianidin, 37.5 parts of xylene and N, N- Dissolve in 37.5 parts of dimethylformamide, add 10 parts of polyoxyethylene styryl phenyl ether and 6 parts of calcium dodecylbenzenesulfonate and mix well with stirring to obtain an emulsion.

製剤例18
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物20部、並びにクロチアニジン20部の混合物に、ソルポール5060(東邦化学登録商標名)5部を加え、よく混合して、カープレックス#80(塩野義製薬登録商標名、合成含水酸化ケイ素微粉末)32部、300メッシュ珪藻土23部を加え、ジュースミキサーで混合して、水和剤を得る。
Formulation Example 18
Solpol 5060 (registered trademark of Toho Chemical Co., Ltd) ) Add 5 parts, mix well, add 32 parts of Carplex # 80 (registered trademark of Shionogi Pharmaceutical Co., Ltd., synthetic silicon hydroxide fine powder), 23 parts of 300 mesh diatomaceous earth, mix with juice mixer and hydrate Get the agent.

製剤例19
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物1部、クロチアニジン2部、合成含水酸化珪素微粉末5部、ドデシルベンゼンスルホン酸ナトリウム5部、ベントナイト30部およびクレー57部を加え、よく撹拌混合し、ついでこれらの混合物に適当量の水を加え、さらに撹拌し、増粒機で製粒し、通風乾燥して粒剤を得る。
Formulation Example 19
1 part of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 2 parts of clothianidin, 5 parts of synthetic silicon hydroxide-containing fine powder, dodecylbenzenesulfone Add 5 parts of sodium acid, 30 parts of bentonite and 57 parts of clay, mix well with stirring, then add an appropriate amount of water to these mixtures, further stir, granulate with a granulator, dry by ventilation and granulate Get.

製剤例20
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物1.5部、クロチアニジン3部、合成含水酸化珪素微粉末1部、凝集剤としてドリレスB(三共社製)1部、クレー7部を乳鉢でよく混合した後にジュースミキサーで撹拌混合する。得られた混合物にカットクレー86.5部を加えて、充分撹拌混合し、粉剤を得る。
Formulation Example 20
1.5 parts of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 3 parts of clothianidin, 1 part of synthetic hydrous silicon oxide fine powder, agglomeration As a preparation, 1 part of Doriles B (manufactured by Sankyo Co., Ltd.) and 7 parts of clay are mixed well in a mortar and then stirred and mixed with a juice mixer. 86.5 parts of cut clay is added to the resulting mixture and mixed thoroughly with stirring to obtain a powder.

製剤例21
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物5部;クロチアニジン5部;ポリオキシエチレンアルキルエーテルサルフェートアンモニウム塩50部を含むホワイトカーボン35部;並びに水55部を混合し、湿式粉砕法で微粉砕することにより、製剤を得る。
Formulation Example 21
5 parts of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167); 5 parts of clothianidin; 50 parts of polyoxyethylene alkyl ether sulfate ammonium salt White carbon (35 parts) and water (55 parts) are mixed and finely pulverized by a wet pulverization method to obtain a preparation.

製剤例22
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物0.2部、並びにクロチアニジン0.3部の混合物をジクロロメタン10部に溶解し、これをアイソパーM(イソパラフィン:エクソン化学登録商標名)89.5部に混合して油剤を得る。
Formulation Example 22
A mixture of 0.2 part of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167) and 0.3 part of clothianidin is dissolved in 10 parts of dichloromethane. This is mixed with 89.5 parts of Isopar M (Isoparaffin: Exxon Chemical Registration) to obtain an oil.

製剤例23
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物0.05部、クロチアニジン0.05部、並びにネオチオゾール(中央化成株式会社)49.9部をエアゾール缶に入れ、エアゾールバルブを装着した後、25部のジメチルエーテル及び25部のLPGを充填し、アクチュエータを装着することにより油性エアゾールを得る。
Formulation Example 23
One organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 0.05 part of clothianidin, and neothiozole (Chuo Kasei Co., Ltd.) After putting 49.9 parts in an aerosol can and mounting an aerosol valve, 25 parts of dimethyl ether and 25 parts of LPG are filled, and an actuator is attached to obtain an oily aerosol.

製剤例24
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物0.2部、クロチアニジン0.4部、BHT0.01部、キシレン5部、脱臭灯油3.39部、並びに乳化剤{アトモス300(アトモスケミカル社登録商標名)}1部を混合溶解したものと、蒸留水50部とをエアゾール容器に充填し、バルブ部分を取り付け、該バルブを通じて噴射剤(LPG)40部を加圧充填して、水性エアゾールを得る。
Formulation Example 24
0.2 part of organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 0.4 part of clothianidin, 0.01 part of BHT, 5 parts of xylene , 3.39 parts of deodorized kerosene and 1 part of an emulsifier {Atmos 300 (registered trademark name of Atmos Chemical Co., Ltd.)} and 50 parts of distilled water are filled in an aerosol container, and a valve part is attached. Through pressure, 40 parts of propellant (LPG) is pressure-filled to obtain an aqueous aerosol.

製剤例25
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物2部、並びにクロチアニジン3部をジエチレングリコールモノエチルエーテル80部に溶解し、これに炭酸プロピレン15部を混合して、スポットオン液剤を得る。
Formulation Example 25
1 part of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167) and 3 parts of clothianidin are dissolved in 80 parts of diethylene glycol monoethyl ether. Is mixed with 15 parts of propylene carbonate to obtain a spot-on solution.

製剤例26
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物5部、並びにクロチアニジン5部をジエチレングリコールモノエチルエーテル70部に溶解し、これに2−オクチルドデカノール20部を混合して、ポアオン液剤を得る。
Formulation Example 26
5 parts of one organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167) and 5 parts of clothianidin are dissolved in 70 parts of diethylene glycol monoethyl ether. And 20 parts of 2-octyldodecanol are mixed to obtain a pour-on solution.

製剤例27
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物0.25部、並びにクロチアニジン0.25部の混合物に、ニッコールTEALS-42(日光ケミカルズ・ラウリル硫酸トリエタノールアミンの42%水溶液)60部、プロピレングリコール20部を添加し、均一溶液になるまで充分撹拌混合した後、水19.5部を加えてさらに充分撹拌混合し、均一溶液のシャンプー剤を得る。
Formulation Example 27
Nikkor TEALS-42 is added to a mixture of 0.25 part of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167) and 0.25 part of clothianidin. (42% aqueous solution of Nikko Chemicals lauryl sulfate triethanolamine) 60 parts, 20 parts of propylene glycol were added and stirred and mixed until a homogeneous solution was obtained, and then 19.5 parts of water was added and further stirred and mixed. A uniform solution shampoo is obtained.

製剤例28
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物0.05g、並びにクロチアニジン0.05gの混合物を、プロピレングリコール2mlに溶解させ、4.0×4.0cm、厚さ1.2cmの多孔セラミック板に含浸させて、加熱式くん煙剤を得る。
Formulation Example 28
A mixture of 0.05 g of one organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167) and 0.05 g of clothianidin is dissolved in 2 ml of propylene glycol. Impregnation into a porous ceramic plate of 4.0 × 4.0 cm and a thickness of 1.2 cm to obtain a heating smoke.

製剤例29
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物2.5部と、クロチアニジン2.5部と、エチレンーメタクリル酸メチル共重合体(共重合体中のメタクリル酸メチルの割合:10重量%、アクリフトWD301、住友化学製)95部とを密閉式加圧ニーダー(森山製作所製)で溶融混練し、得られた混練物を押出し成型機から成型ダイスを介して押出し、長さ15cm、直径3mmの棒状成型体を得る。
Formulation Example 29
2.5 parts of one organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 2.5 parts of clothianidin, and ethylene-methyl methacrylate copolymer 95 parts of a polymer (ratio of methyl methacrylate in the copolymer: 10% by weight, ACRlift WD301, manufactured by Sumitomo Chemical Co., Ltd.) was melt-kneaded with a closed pressure kneader (manufactured by Moriyama Seisakusho), and the resulting kneaded product was Extrusion is performed from an extrusion molding machine through a molding die to obtain a rod-shaped molded body having a length of 15 cm and a diameter of 3 mm.

製剤例30
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物2.5部とクロチアニジン2.5部と軟質塩化ビニル樹脂95部とを密閉式加圧ニーダー(森山製作所製)で溶融混練し、得られた混練物を押出し成型機から成型ダイスを介して押出し、長さ15cm、直径3mmの棒状成型体を得る。
Formulation Example 30
2.5 parts of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 2.5 parts of clothianidin, and 95 parts of a soft vinyl chloride resin. The mixture is melt-kneaded with a closed pressure kneader (manufactured by Moriyama Seisakusho), and the resulting kneaded product is extruded from an extrusion molding machine through a molding die to obtain a rod-shaped molded body having a length of 15 cm and a diameter of 3 mm.

製剤例31
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物2部、2−(2,6−ジフルオロフェニル)−4−[4−tert−ブチル−2−エトキシフェニル]−4,5−ジヒドロオキサゾール2部、並びにクロチアニジン5部を、キシレン37.5部およびN,N−ジメチルホルムアミド37.5部に溶解し、これにポリオキシエチレンスチリルフェニルエーテル10部およびドデシルベンゼンスルホン酸カルシウム6部を加え、よく撹拌混合して乳剤を得る。
Formulation Example 31
2 parts of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 2- (2,6-difluorophenyl) -4- [4- tert-butyl-2-ethoxyphenyl] -4,5-dihydrooxazole and 5 parts clothianidin are dissolved in 37.5 parts of xylene and 37.5 parts of N, N-dimethylformamide. Add 10 parts of styryl phenyl ether and 6 parts of calcium dodecylbenzenesulfonate and mix well with stirring to obtain an emulsion.

製剤例32
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物5部、2−(2,6−ジフルオロフェニル)−4−[4−tert−ブチル−2−エトキシフェニル]−4,5−ジヒドロオキサゾール2部、並びにクロチアニジン2部を、キシレン37.5部およびN,N−ジメチルホルムアミド37.5部に溶解し、これにポリオキシエチレンスチリルフェニルエーテル10部およびドデシルベンゼンスルホン酸カルシウム6部を加え、よく撹拌混合して乳剤を得る。
Formulation Example 32
5 parts of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 2- (2,6-difluorophenyl) -4- [4- tert-butyl-2-ethoxyphenyl] -4,5-dihydrooxazole and 2 parts clothianidin are dissolved in 37.5 parts of xylene and 37.5 parts of N, N-dimethylformamide. Add 10 parts of styryl phenyl ether and 6 parts of calcium dodecylbenzenesulfonate and mix well with stirring to obtain an emulsion.

製剤例33
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物20部、2−(2,6−ジフルオロフェニル)−4−[4−tert−ブチル−2−エトキシフェニル]−4,5−ジヒドロオキサゾール10部、並びにクロチアニジン10部の混合物に、ソルポール5060(東邦化学登録商標名)5部を加え、よく混合して、カープレックス#80(塩野義製薬登録商標名、合成含水酸化ケイ素微粉末)32部、300メッシュ珪藻土23部を加え、ジュースミキサーで混合して、水和剤を得る。
Formulation Example 33
20 parts of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 2- (2,6-difluorophenyl) -4- [4- tert-butyl-2-ethoxyphenyl] -4,5-dihydrooxazole and 10 parts of clothianidin, 5 parts of Solpol 5060 (trade name of Toho Chemical) are added and mixed well to obtain Carplex # 80. (Shionogi Pharmaceutical registered trade name, synthetic hydrous silicon oxide fine powder) 32 parts and 300 mesh diatomaceous earth 23 parts are added and mixed with a juice mixer to obtain a wettable powder.

製剤例34
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物1部、2−(2,6−ジフルオロフェニル)−4−[4−tert−ブチル−2−エトキシフェニル]−4,5−ジヒドロオキサゾール1部、並びにクロチアニジン1部、合成含水酸化珪素微粉末5部、ドデシルベンゼンスルホン酸ナトリウム5部、ベントナイト30部およびクレー57部を加え、よく撹拌混合し、ついでこれらの混合物に適当量の水を加え、さらに撹拌し、増粒機で製粒し、通風乾燥して粒剤を得る。
Formulation Example 34
1 part of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 2- (2,6-difluorophenyl) -4- [4- tert-Butyl-2-ethoxyphenyl] -4,5-dihydrooxazole, 1 part of clothianidin, 5 parts of synthetic silicon hydroxide fine powder, 5 parts of sodium dodecylbenzenesulfonate, 30 parts of bentonite and 57 parts of clay were added. Mix well, then add an appropriate amount of water to these mixtures, further stir, granulate with a granulator, and dry by ventilation to obtain granules.

製剤例35
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物1.5部、2−(2,6−ジフルオロフェニル)−4−[4−tert−ブチル−2−エトキシフェニル]−4,5−ジヒドロオキサゾール1部、クロチアニジン2部、合成含水酸化珪素微粉末1部、凝集剤としてドリレスB(三共社製)1部、クレー7部を乳鉢でよく混合した後にジュースミキサーで撹拌混合する。得られた混合物にカットクレー86.5部を加えて、充分撹拌混合し、粉剤を得る。
Formulation Example 35
1.5 parts of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 2- (2,6-difluorophenyl) -4- [ 4-tert-butyl-2-ethoxyphenyl] -4,5-dihydrooxazole 1 part, clothianidin 2 parts, synthetic silicon hydroxide fine powder 1 part, Doreles B (manufactured by Sankyo) as a flocculant, 7 parts clay After mixing well in a mortar, stir and mix with a juice mixer. 86.5 parts of cut clay is added to the resulting mixture and mixed thoroughly with stirring to obtain a powder.

製剤例36
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物5部;2−(2,6−ジフルオロフェニル)−4−[4−tert−ブチル−2−エトキシフェニル]−4,5−ジヒドロオキサゾール2部;クロチアニジン3部;ポリオキシエチレンアルキルエーテルサルフェートアンモニウム塩50部を含むホワイトカーボン35部;並びに水55部を混合し、湿式粉砕法で微粉砕することにより、製剤を得る。
Formulation Example 36
5 parts of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167); 2- (2,6-difluorophenyl) -4- [4- tert-butyl-2-ethoxyphenyl] -4,5-dihydrooxazole; 3 parts clothianidin; 35 parts white carbon containing 50 parts polyoxyethylene alkyl ether sulfate ammonium salt; The formulation is obtained by pulverization by the method.

製剤例37
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物0.2部、2−(2,6−ジフルオロフェニル)−4−[4−tert−ブチル−2−エトキシフェニル]−4,5−ジヒドロオキサゾール0.2部、並びにクロチアニジン0.1部の混合物をジクロロメタン10部に溶解し、これをアイソパーM(イソパラフィン:エクソン化学登録商標名)89.5部に混合して油剤を得る。
Formulation Example 37
0.2 part of one kind of organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 2- (2,6-difluorophenyl) -4- [ 4-tert-Butyl-2-ethoxyphenyl] -4,5-dihydrooxazole and a mixture of 0.1 part of clothianidin were dissolved in 10 parts of dichloromethane and dissolved in Isopar M (isoparaffin: Exxon Chemical Registration). Name) Mix to 89.5 parts to obtain oil.

製剤例38
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物0.05部、2−(2,6−ジフルオロフェニル)−4−[4−tert−ブチル−2−エトキシフェニル]−4,5−ジヒドロオキサゾール0.02部、クロチアニジン0.03部、並びにネオチオゾール(中央化成株式会社)49.9部をエアゾール缶に入れ、エアゾールバルブを装着した後、25部のジメチルエーテル及び25部のLPGを充填し、アクチュエータを装着することにより油性エアゾールを得る。
Formulation Example 38
0.05 part of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 2- (2,6-difluorophenyl) -4- [ 4-tert-butyl-2-ethoxyphenyl] -4,5-dihydrooxazole 0.02 part, clothianidin 0.03 part, and neothiozole (Chuo Kasei Co., Ltd.) 49.9 parts are put into an aerosol can, and an aerosol valve is set. After mounting, 25 parts of dimethyl ether and 25 parts of LPG are filled, and an oily aerosol is obtained by mounting the actuator.

製剤例39
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物0.2部、2−(2,6−ジフルオロフェニル)−4−[4−tert−ブチル−2−エトキシフェニル]−4,5−ジヒドロオキサゾール0.2部、並びにクロチアニジン0.2部、BHT0.01部、キシレン5部、脱臭灯油3.39部、並びに乳化剤{アトモス300(アトモスケミカル社登録商標名)}1部を混合溶解したものと、蒸留水50部とをエアゾール容器に充填し、バルブ部分を取り付け、該バルブを通じて噴射剤(LPG)40部を加圧充填して、水性エアゾールを得る。
Formulation Example 39
0.2 part of one kind of organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 2- (2,6-difluorophenyl) -4- [ 4-tert-butyl-2-ethoxyphenyl] -4,5-dihydrooxazole, 0.2 part of clothianidin, 0.01 part of BHT, 5 parts of xylene, 3.39 parts of deodorized kerosene, and an emulsifier {Atmos 300 (registered trade name of Atmos Chemical Co., Ltd.)} 1 part mixed and dissolved and 50 parts distilled water are filled into an aerosol container, a valve part is attached, and 40 parts propellant (LPG) is pressurized and filled through the valve. Thus, an aqueous aerosol is obtained.

製剤例40
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物2部、2−(2,6−ジフルオロフェニル)−4−[4−tert−ブチル−2−エトキシフェニル]−4,5−ジヒドロオキサゾール2部、並びにクロチアニジン1部をジエチレングリコールモノエチルエーテル80部に溶解し、これに炭酸プロピレン15部を混合して、スポットオン液剤を得る。
Formulation Example 40
2 parts of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 2- (2,6-difluorophenyl) -4- [4- tert-butyl-2-ethoxyphenyl] -4,5-dihydrooxazole and 1 part of clothianidin are dissolved in 80 parts of diethylene glycol monoethyl ether, and 15 parts of propylene carbonate are mixed with this to obtain a spot-on solution. .

製剤例41
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物5部、2−(2,6−ジフルオロフェニル)−4−[4−tert−ブチル−2−エトキシフェニル]−4,5−ジヒドロオキサゾール2部、並びにクロチアニジン3部をジエチレングリコールモノエチルエーテル70部に溶解し、これに2−オクチルドデカノール20部を混合して、ポアオン液剤を得る。
Formulation Example 41
5 parts of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 2- (2,6-difluorophenyl) -4- [4- 2 parts of tert-butyl-2-ethoxyphenyl] -4,5-dihydrooxazole and 3 parts of clothianidin are dissolved in 70 parts of diethylene glycol monoethyl ether, and 20 parts of 2-octyldodecanol is mixed therewith to prepare a pour-on solution. Get.

製剤例42
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物0.25部、2−(2,6−ジフルオロフェニル)−4−[4−tert−ブチル−2−エトキシフェニル]−4,5−ジヒドロオキサゾール0.1部、並びにクロチアニジン0.15部の混合物に、ニッコールTEALS-42(日光ケミカルズ・ラウリル硫酸トリエタノールアミンの42%水溶液)60部、プロピレングリコール20部を添加し、均一溶液になるまで充分撹拌混合した後、水19.5部を加えてさらに充分撹拌混合し、均一溶液のシャンプー剤を得る。
Formulation Example 42
0.25 part of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 2- (2,6-difluorophenyl) -4- [ 4-tert-butyl-2-ethoxyphenyl] -4,5-dihydrooxazole and a mixture of 0.15 part of clothianidin were added to a 42% aqueous solution of Nikkor TEALS-42 (Nikko Chemicals, lauryl sulfate triethanolamine). ) 60 parts and 20 parts of propylene glycol are added and stirred and mixed until a uniform solution is obtained. Then 19.5 parts of water is added and further stirred and mixed to obtain a shampoo agent of a uniform solution.

製剤例43
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物0.05g、2−(2,6−ジフルオロフェニル)−4−[4−tert−ブチル−2−エトキシフェニル]−4,5−ジヒドロオキサゾール0.02g、並びにクロチアニジン0.03gの混合物を、プロピレングリコール2mlに溶解させ、4.0×4.0cm、厚さ1.2cmの多孔セラミック板に含浸させて、加熱式くん煙剤を得る。
Formulation Example 43
0.05 g of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), 2- (2,6-difluorophenyl) -4- [4 -Tert-Butyl-2-ethoxyphenyl] -4,5-dihydrooxazole 0.02 g and clothianidin 0.03 g were dissolved in 2 ml of propylene glycol, 4.0 × 4.0 cm, thickness 1.2 cm. The porous ceramic plate is impregnated to obtain a heating smoke.

製剤例44
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物2.5部と、2−(2,6−ジフルオロフェニル)−4−[4−tert−ブチル−2−エトキシフェニル]−4,5−ジヒドロオキサゾール1部、並びにクロチアニジン1.5部と、エチレンーメタクリル酸メチル共重合体(共重合体中のメタクリル酸メチルの割合:10重量%、アクリフトWD301、住友化学製)95部とを密閉式加圧ニーダー(森山製作所製)で溶融混練し、得られた混練物を押出し成型機から成型ダイスを介して押出し、長さ15cm、直径3mmの棒状成型体を得る。
Formulation Example 44
2.5 parts of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167), and 2- (2,6-difluorophenyl) -4- 1 part of [4-tert-butyl-2-ethoxyphenyl] -4,5-dihydrooxazole and 1.5 parts of clothianidin and ethylene-methyl methacrylate copolymer (ratio of methyl methacrylate in the copolymer: 10 parts by weight, 95 parts by weight of ACLIFT WD301 (manufactured by Sumitomo Chemical Co., Ltd.) are melt-kneaded with a closed pressure kneader (manufactured by Moriyama Seisakusho), and the resulting kneaded product is extruded from an extrusion molding machine through a molding die, and has a length of 15 cm. A rod-shaped molded body having a diameter of 3 mm is obtained.

製剤例45
本有機硫黄化合物(1)〜(78)及び(101)〜(167)からなる群より選ばれる1種の有機硫黄化合物2.5部と2−(2,6−ジフルオロフェニル)−4−[4−tert−ブチル−2−エトキシフェニル]−4,5−ジヒドロオキサゾール1部とクロチアニジン1.5部と軟質塩化ビニル樹脂95部とを密閉式加圧ニーダー(森山製作所製)で溶融混練し、得られた混練物を押出し成型機から成型ダイスを介して押出し、長さ15cm、直径3mmの棒状成型体を得る。
Formulation Example 45
2.5 parts of an organic sulfur compound selected from the group consisting of the present organic sulfur compounds (1) to (78) and (101) to (167) and 2- (2,6-difluorophenyl) -4- [ 4-tert-butyl-2-ethoxyphenyl] -4,5-dihydrooxazole 1 part, clothianidin 1.5 parts and soft vinyl chloride resin 95 parts are melt-kneaded in a closed pressure kneader (Moriyama Seisakusho), The obtained kneaded product is extruded from an extrusion molding machine through a molding die to obtain a rod-shaped molded body having a length of 15 cm and a diameter of 3 mm.

次に、本発明の有害生物防除組成物が有害生物に対して優れた防除効力を有することをを試験例として示す。   Next, it is shown as a test example that the pest control composition of the present invention has an excellent control effect against pests.

試験例1
本有機硫黄化合物および本ネオニコチノイド化合物の所定濃度のアセトン溶液を調製した。該アセトン溶液1μlをチャバネゴキブリ雌成虫(Blattella germanica)の胸部腹面側に滴下処理した後、供試虫を直径約9cm、高さ約4.5cmのプラスチックカップへ移し、餌及び水と共に25℃で放置した。7日後に供試虫の生死を観察し死虫率を求めた。供試したチャバネゴキブリは、1つの試験に対して10頭とし、1つのカップの移した。
結果を、下記表1に示す。
Test example 1
Acetone solutions having a predetermined concentration of the organic sulfur compound and the neonicotinoid compound were prepared. After 1 μl of the acetone solution was dropped on the ventral side of the chest of a female German cockroach (Blattella germanica), the test insect was transferred to a plastic cup with a diameter of about 9 cm and a height of about 4.5 cm, and left at 25 ° C. with food and water. did. Seven days later, the life and death of the test insects were observed to determine the death rate. The German cockroaches tested were 10 in one test, and one cup was transferred.
The results are shown in Table 1 below.

Figure 2010150156
Figure 2010150156

その結果、本発明の有害生物防除組成物は、高い防除効力を示した。   As a result, the pest control composition of the present invention showed high control efficacy.

本発明の有害生物防除組成物は、有害生物に対し優れた防除効力を有しており、有用である。   The pest control composition of the present invention has an excellent control effect against pests and is useful.

Claims (10)

下記式(I)
Figure 2010150156
〔式中、
Cyは群E1〜E2より選ばれる基で置換されていてもよいフェニル基、群E1〜E2より選ばれる基で置換されていてもよい5〜6員のヘテロアリール基、群E1〜E3より選ばれる基で置換されていてもよい3〜7員のシクロアルキル基又は群E1〜E3より選ばれる基で置換されていてもよい5〜7員のシクロアルケニル基を表し、
1はハロゲン原子で置換されていてもよいC1〜C4鎖式炭化水素基、ハロゲン原子又は水素原子を表し、
2はハロゲン原子で置換されていてもよいC1〜C4鎖式炭化水素基、-C(=G)R4、シアノ基、ハロゲン原子又は水素原子を表し、
3は少なくとも1つのフッ素原子を含むC1〜C5ハロアルキル基又はフッ素原子を表し、
Gは酸素原子又は硫黄原子を表し、
4はハロゲン原子で置換されていてもよいC1〜C4アルキル基、ハロゲン原子で置換されていてもよいC1〜C4アルコキシ基、ハロゲン原子で置換されていてもよいC3〜C6アルケニルオキシ基、ハロゲン原子で置換されていてもよいC3〜C6アルキニルオキシ基、ハロゲン原子で置換されていてもよいC1〜C4アルキルアミノ基、ハロゲン原子で置換されていてもよいジ(C1〜C4アルキル)アミノ基、ヒドロキシル基、アミノ基、C2〜C5環状アミノ基又は水素原子を表し、
mは0又は1を表し、nは0、1又は2を表し、
群E1は、群Lから選ばれる基で置換されていてもよいC1〜C6鎖式炭化水素基、ハロゲン原子で置換されていてもよいC3〜C6シクロアルキル基、-OR5、-SR5、-S(=O)R5、-S(=O)25、-C(=O)R6、-OC(=O)R7、シアノ基、ニトロ基、ヒドロキシル基及びハロゲン原子からなる一価基の群を表し、
群E2は、群Lから選ばれる基で置換されていてもよいC2−C6アルカンジイル基、群Lから選ばれる基で置換されていてもよい1,3−ブタジエン−1,4−ジイル基、-G-T-G-及び-T-G-T-からなる二価基の群を表し、
群E3は、=O、=NO-R5、=C=CH2及び=C(R8)R9からなる二価基の群を表し、
Tはメチレン基又はエチレン基を表し、
5は群Lから選ばれる基で置換されていてもよいC1〜C4鎖式炭化水素基又は群Lから選ばれる基で置換されていてもよいC3〜C6シクロアルキル基を表し、
6はハロゲン原子で置換されていてもよいC1〜C4アルコキシ基、ハロゲン原子で置換されていてもよいC3〜C6アルケニルオキシ基、ハロゲン原子で置換されていてもよいC3〜C6アルキニルオキシ基、ハロゲン原子で置換されていてもよいC1〜C4アルキルアミノ基、ハロゲン原子で置換されていてもよいジ(C1〜C4アルキル)アミノ基、ハロゲン原子で置換されていてもよいC1〜C4アルキル基、ヒドロキシル基、アミノ基、C2〜C5環状アミノ基又は水素原子を表し、
7はハロゲン原子で置換されていてもよいC1〜C4アルコキシ基、ハロゲン原子で置換されていてもよいC3〜C6アルケニルオキシ基、ハロゲン原子で置換されていてもよいC3〜C6アルキニルオキシ基、ハロゲン原子で置換されていてもよいC1〜C4アルキルアミノ基、ハロゲン原子で置換されていてもよいジ(C1〜C4アルキル)アミノ基、ハロゲン原子で置換されていてもよいC1〜C4アルキル基、アミノ基、C2〜C5環状アミノ基又は水素原子を表し、
8およびR9は同一または相異なり、ハロゲン原子で置換されていてもよいC1〜C4アルコキシ基、ハロゲン原子で置換されていてもよいC1〜C4鎖式炭化水素基、ハロゲン原子又は水素原子を表し、
群Lは、ヒドロキシル基、ハロゲン原子で置換されていてもよいC1〜C4アルコキシ基、ハロゲン原子で置換されていてもよいC3〜C6アルケニルオキシ基、ハロゲン原子で置換されていてもよいC3〜C6アルキニルオキシ基、アミノ基、ハロゲン原子で置換されていてもよいC1〜C4アルキルアミノ基、ハロゲン原子で置換されていてもよいジ(C1〜C4アルキル)アミノ基、C2〜C5環状アミノ基、-C(=O)R6、-OC(=O)R7及びハロゲン原子からなる群を表す。〕
で示される有機硫黄化合物と、
イミダクロプリド、チアクロプリド、アセタミプリド、ニテンピラム、クロチアニジン及びチアメトキサムからなる群より選ばれるネオニコチノイド系化合物とを含有する有害生物防除組成物。
Formula (I) below
Figure 2010150156
[Where,
Cy is a phenyl group which may be substituted with a group selected from groups E1 to E2, a 5- to 6-membered heteroaryl group which may be substituted with a group selected from groups E1 to E2, and a group E1 to E3. A 3- to 7-membered cycloalkyl group optionally substituted with a group or a 5- to 7-membered cycloalkenyl group optionally substituted with a group selected from the groups E1 to E3,
R 1 represents a C1-C4 chain hydrocarbon group optionally substituted with a halogen atom, a halogen atom or a hydrogen atom,
R 2 represents a C1-C4 chain hydrocarbon group optionally substituted with a halogen atom, —C (═G) R 4 , a cyano group, a halogen atom or a hydrogen atom;
R 3 represents a C1-C5 haloalkyl group containing at least one fluorine atom or a fluorine atom,
G represents an oxygen atom or a sulfur atom,
R 4 is a C1-C4 alkyl group which may be substituted with a halogen atom, a C1-C4 alkoxy group which may be substituted with a halogen atom, a C3-C6 alkenyloxy group which may be substituted with a halogen atom, halogen A C3-C6 alkynyloxy group optionally substituted with an atom, a C1-C4 alkylamino group optionally substituted with a halogen atom, a di (C1-C4 alkyl) amino group optionally substituted with a halogen atom, Represents a hydroxyl group, an amino group, a C2-C5 cyclic amino group or a hydrogen atom;
m represents 0 or 1, n represents 0, 1 or 2,
Group E1 is group substituted by C1~C6 may chain hydrocarbon group selected from the group L, optionally substituted C3~C6 cycloalkyl group with a halogen atom, -OR 5, -SR 5, -S (= O) R 5 , -S (= O) 2 R 5 , -C (= O) R 6 , -OC (= O) R 7 , cyano group, nitro group, hydroxyl group and halogen atom Represents a group of monovalent groups,
Group E2 is a C2-C6 alkanediyl group optionally substituted with a group selected from Group L, a 1,3-butadiene-1,4-diyl group optionally substituted with a group selected from Group L; Represents a group of divalent groups consisting of -G-T-G- and -T-G-T-;
Group E3 represents a group of divalent groups consisting of ═O, ═NO—R 5 , ═C═CH 2 and ═C (R 8 ) R 9 ;
T represents a methylene group or an ethylene group,
R 5 represents a C1-C4 chain hydrocarbon group which may be substituted with a group selected from Group L or a C3-C6 cycloalkyl group which may be substituted with a group selected from Group L;
R 6 is a C1-C4 alkoxy group which may be substituted with a halogen atom, a C3-C6 alkenyloxy group which may be substituted with a halogen atom, a C3-C6 alkynyloxy group which may be substituted with a halogen atom, A C1-C4 alkylamino group optionally substituted with a halogen atom, a di (C1-C4 alkyl) amino group optionally substituted with a halogen atom, a C1-C4 alkyl group optionally substituted with a halogen atom, Represents a hydroxyl group, an amino group, a C2-C5 cyclic amino group or a hydrogen atom;
R 7 is a C1-C4 alkoxy group which may be substituted with a halogen atom, a C3-C6 alkenyloxy group which may be substituted with a halogen atom, a C3-C6 alkynyloxy group which may be substituted with a halogen atom, A C1-C4 alkylamino group optionally substituted with a halogen atom, a di (C1-C4 alkyl) amino group optionally substituted with a halogen atom, a C1-C4 alkyl group optionally substituted with a halogen atom, Represents an amino group, a C2-C5 cyclic amino group or a hydrogen atom,
R 8 and R 9 are the same or different and represent a C1-C4 alkoxy group which may be substituted with a halogen atom, a C1-C4 chain hydrocarbon group which may be substituted with a halogen atom, a halogen atom or a hydrogen atom. Represent,
Group L is a hydroxyl group, a C1-C4 alkoxy group optionally substituted with a halogen atom, a C3-C6 alkenyloxy group optionally substituted with a halogen atom, or a C3-C6 optionally substituted with a halogen atom. An alkynyloxy group, an amino group, a C1-C4 alkylamino group optionally substituted with a halogen atom, a di (C1-C4 alkyl) amino group optionally substituted with a halogen atom, a C2-C5 cyclic amino group,- It represents a group consisting of C (═O) R 6 , —OC (═O) R 7 and a halogen atom. ]
An organic sulfur compound represented by
A pest control composition comprising a neonicotinoid compound selected from the group consisting of imidacloprid, thiacloprid, acetamiprid, nitenpyram, clothianidin and thiamethoxam.
式(I)において、Cyが群E1〜E2より選ばれる基で置換されていてもよいフェニル基である請求項1記載の組成物。 The composition according to claim 1, wherein in formula (I), Cy is a phenyl group optionally substituted with a group selected from groups E1 to E2. 式(I)において、Cyが群E1〜E2より選ばれる基で置換されていてもよい5〜6員のヘテロアリール基である請求項1記載の組成物。 The composition according to claim 1, wherein in formula (I), Cy is a 5- to 6-membered heteroaryl group optionally substituted with a group selected from groups E1 to E2. 式(I)において、Cyが群E1〜E2より選ばれる基で置換されていてもよいピリジル基である請求項1記載の組成物。 The composition according to claim 1, wherein in formula (I), Cy is a pyridyl group optionally substituted with a group selected from groups E1 to E2. 式(I)において、Cyが群E1〜E3より選ばれる基で置換されていてもよい3〜7員のシクロアルキル基又は群E1〜E3より選ばれる基で置換されていてもよい5〜7員のシクロアルケニル基である請求項1記載の組成物。 In formula (I), Cy may be substituted with a group selected from 3 to 7-membered cycloalkyl groups or groups selected from groups E1 to E3 which may be substituted with groups selected from groups E1 to E3. The composition of claim 1 which is a membered cycloalkenyl group. 式(I)において、Cyが群E1〜E3より選ばれる基で置換されていてもよいシクロヘキシル基又は群E1〜E3より選ばれる基で置換されていてもよいシクロヘキセニル基である請求項1記載の組成物。 2. The formula (I), wherein Cy is a cyclohexyl group optionally substituted with a group selected from groups E1 to E3 or a cyclohexenyl group optionally substituted with a group selected from groups E1 to E3. Composition. ネオニコチノイド系化合物がクロチアニジン及びチアメトキサムからなる群より選ばれる化合物である請求項1〜6のいずれか1項記載の組成物。 The composition according to any one of claims 1 to 6, wherein the neonicotinoid compound is a compound selected from the group consisting of clothianidin and thiamethoxam. ネオニコチノイド系化合物がクロチアニジンである請求項1〜6のいずれか1項記載の組成物。 The composition according to any one of claims 1 to 6, wherein the neonicotinoid compound is clothianidin. 請求項1〜8のいずれか記載の組成物を、有害生物又は有害生物の生息場所に施用することを特徴とする有害生物の防除方法。 A method for controlling pests, which comprises applying the composition according to any one of claims 1 to 8 to pests or habitats of pests. 請求項1〜8のいずれか記載の組成物を、有害生物の防除の為の使用。 Use of the composition according to any one of claims 1 to 8 for controlling pests.
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