JP2010117293A

JP2010117293A - Angular velocity sensor

Info

Publication number: JP2010117293A
Application number: JP2008291844A
Authority: JP
Inventors: Eiji Umetsu; 英治梅津; Kazusato Igarashi; 一聡五十嵐; Kenichi Tanaka; 健一田中; Masahiko Ishizone; 昌彦石曽根
Original assignee: Alps Electric Co Ltd
Current assignee: Alps Alpine Co Ltd
Priority date: 2008-11-14
Filing date: 2008-11-14
Publication date: 2010-05-27

Abstract

<P>PROBLEM TO BE SOLVED: To provide an angular velocity sensor which can stably drive a mass part, by giving elastic deformation parts supporting the mass part a structure to be bent easily in the normal direction of deformation and to be hardly deformed in directions other than the normal direction of deformation. <P>SOLUTION: Inside a detecting rotary part 26, a drive mass part 29a is so supported as to be movable in the direction of X, by the medium of second elastic deformation parts 30a, 30b, 30c and 30d, and the drive mass part 29a is made to vibrate in the direction of X by piezoelectric elements provided in the second elastic deformation parts 30a, 30b, 30c and 30d. When the angular velocity sensor 1 is made to have an angular velocity around the vertical axis Z, Coriolis force in the direction of Y acts on the drive mass part 29a. Then the detecting rotary part 26 operates and the angular velocity is detected. The second elastic deformation parts 30a, 30b, 30c and 30d have beams 33 and 34 stretching parallel to the direction of Y, and therefore they are hardly deformed by the force working in the direction of Y. Thus, the drive mass part 29a is supported stably in the direction of X. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、シリコン（Silicon）層を加工するなどして形成された微細な構造の角速度センサに係り、特に、質量部を安定して往復振動させることができるとともに、振動方向と直交する力による運動を正確に検知することができる角速度センサに関する。 The present invention relates to an angular velocity sensor having a fine structure formed by processing a silicon layer, and in particular, can stably oscillate a mass part in a reciprocating manner and also uses a force orthogonal to a vibration direction. The present invention relates to an angular velocity sensor that can accurately detect movement.

ＭＥＭＳ（Micro-Electro-Mechanical Systems）素子は、２枚のシリコン（Ｓｉ）ウエハがＳｉＯ₂などの絶縁層を介して接合されたＳＯＩ（Silicon on Insulator）層を微細加工することで形成される。ＭＥＭＳ素子は、ＳＯＩ層の一方のシリコンウエハが支持基板として使用され、他方のシリコンウエハが機能層として使用される。機能層は、エッチングにより分離されて、質量部と、この質量部を動作できるように支持する弾性変形部と、質量部の移動量を検知する可動電極部と固定電極部などが形成される。 A MEMS (Micro-Electro-Mechanical Systems) element is formed by finely processing an SOI (Silicon on Insulator) layer in which _two silicon (Si) wafers are joined via an insulating layer such as SiO ₂ . In the MEMS element, one silicon wafer of the SOI layer is used as a support substrate, and the other silicon wafer is used as a functional layer. The functional layer is separated by etching to form a mass part, an elastically deformable part that supports the mass part so that it can operate, a movable electrode part that detects the amount of movement of the mass part, a fixed electrode part, and the like.

ＳＯＩ層を加工する際に、ＳｉＯ₂などの前記絶縁層の一部が残されて、この絶縁層によって機能層の一部と支持基板とが接合されており、また質量部と弾性変形部および可動電極部などと支持基板との間の前記絶縁層が除去されて、質量部と弾性変形部および可動電極部などが、支持基板上の空間内で動作可能となる。 When processing the SOI layer, a part of the insulating layer such as SiO ₂ is left, and a part of the functional layer and the supporting substrate are joined by the insulating layer, and the mass part, the elastically deforming part, and The insulating layer between the movable electrode portion and the support substrate is removed, and the mass portion, the elastic deformation portion, the movable electrode portion, and the like can be operated in the space on the support substrate.

以下の特許文献１と特許文献２には、角速度センサとして機能するＭＥＭＳ素子が開示されている。 The following Patent Document 1 and Patent Document 2 disclose MEMS elements that function as angular velocity sensors.

特許文献１に記載された角速度センサは、基板の面と平行な向き（Ｘ方向）に移動自在に支持された一対の第１の振動体と、それぞれの第１の振動体に支持されて、基板の面に垂直な向き（Ｚ方向）に移動自在に支持された第２の振動体が設けられている。一対の第１の振動体が前記面と平行な向き（Ｘ方向）で互いに逆位相となるように駆動されているときに、一対の第２の振動体の前記面と垂直な向き（Ｚ方向）の振動を検知することで、Ｚ方向のコリオリ力成分を検出でき、これにより、基板の面と平行なＹ軸回りの角速度、すなわちＹ軸と直交する面内にベクトルが向く角速度を知ることができる。 The angular velocity sensor described in Patent Document 1 is supported by a pair of first vibrating bodies supported movably in a direction parallel to the surface of the substrate (X direction), and the respective first vibrating bodies, A second vibrating body is provided that is movably supported in a direction (Z direction) perpendicular to the surface of the substrate. When the pair of first vibrating bodies are driven so as to be in opposite phases to each other in the direction parallel to the plane (X direction), the direction perpendicular to the plane of the pair of second vibrating bodies (Z direction) ), The Coriolis force component in the Z direction can be detected, so that the angular velocity around the Y axis parallel to the surface of the substrate, that is, the angular velocity at which the vector faces in the plane perpendicular to the Y axis is known. Can do.

特許文献２に記載された角速度センサであるジャイロスコープは、リング状のベースの内側にリング状のフレームが角振動できるように支持されており、このフレーム内に、角振動方向と直交する垂直方向（Ｚ方向）へ振動できる２つの質量が設けられている。２つの前記質量をＺ方向へ互いに逆向きに振動させ、コリオリ力で励起されるフレームの角振動を測定することで、前記角振動を含む面と平行なＹ軸周りの角速度、すなわちＹ軸と直交する面内にベクトルが向く角速度を知ることができる。
特開２００１−２１３６０号公報特表２００７−５０９３４６号公報 A gyroscope that is an angular velocity sensor described in Patent Document 2 is supported inside a ring-shaped base so that the ring-shaped frame can be angularly vibrated, and a vertical direction perpendicular to the angular vibration direction is supported in the frame. Two masses that can vibrate in the (Z direction) are provided. By oscillating the two masses in opposite directions in the Z direction and measuring the angular vibration of the frame excited by the Coriolis force, the angular velocity around the Y axis parallel to the plane including the angular vibration, that is, the Y axis It is possible to know the angular velocity at which the vector faces in an orthogonal plane.
Japanese Patent Laid-Open No. 2001-21360 Special table 2007-509346 gazette

前記特許文献１に記載された角速度センサは、一対の第１の振動体がＸ方向へ互いに逆位相となるように駆動され、この第１の振動体に支持されている第２の振動体がコリオリの力でＺ方向へ動作させられる。ただし、前記第１の振動体を支持しているバネが単純な平板形状であり、平板形状のバネの撓み変形によって、第１の振動体がＸ方向へ振動自在に支持されている。そのため、コリオリ力によって第２の振動体にＺ方向の移動力が与えられたときに、前記バネがＸ方向へ撓み変形するのみならず、Ｚ方向へも変形しやすくなって、第１の振動体に本来のＸ方向への振動以外の不要な振動が重畳しやすい。 The angular velocity sensor described in Patent Document 1 is driven so that a pair of first vibrating bodies have opposite phases in the X direction, and a second vibrating body supported by the first vibrating body includes: Operated in the Z direction by Coriolis force. However, the spring supporting the first vibrating body has a simple flat plate shape, and the first vibrating body is supported so as to freely vibrate in the X direction by bending deformation of the flat plate spring. Therefore, when a moving force in the Z direction is applied to the second vibrating body by the Coriolis force, the spring not only bends and deforms in the X direction, but is also easily deformed in the Z direction. Unnecessary vibrations other than the vibration in the original X direction tend to be superimposed on the body.

また、前記第２の振動体を支持しているバネも平板状であるため、第２の振動体がＺ方向へのコリオリ力を受けてＺ方向へ動作するときに、第１の振動体へ与えられているＸ方向への振動によって、バネが本来の撓み方向以外の向きに変形しやすくなり、第２の振動体にコリオリ力以外の外乱の振動が重畳する心配がある。 Further, since the spring supporting the second vibrating body is also plate-shaped, when the second vibrating body receives the Coriolis force in the Z direction and operates in the Z direction, the spring is moved to the first vibrating body. Due to the applied vibration in the X direction, the spring is likely to be deformed in a direction other than the original bending direction, and there is a concern that disturbance vibration other than Coriolis force is superimposed on the second vibrating body.

これは、特許文献２に記載された角速度センサにおいても同じであり、一対の質量部がＺ方向へ振動駆動されているときに、質量部を支持している撓み部分がコリオリ力の影響などで本来の振動方向以外の方向へ変形し、コリオリ力を検出するためのリング状のフレームにノイズとなる振動が重畳するおそれがある。 This is also the case with the angular velocity sensor described in Patent Document 2. When the pair of mass parts are driven to vibrate in the Z direction, the bending part supporting the mass parts is influenced by the Coriolis force or the like. There is a possibility that the vibration that becomes noise is superimposed on the ring-shaped frame for detecting the Coriolis force by deforming in a direction other than the original vibration direction.

本発明は上記従来の課題を解決するものであり、質量部を振動自在に支持している弾性変形部を、質量部の本来の方向へ撓み変形しやすく且つそれ以外の方向へ変形しにくくして、質量部やその他の駆動部に余分なノイズ振動が重畳するのを防止しやすい角速度センサを提供することを目的としている。 The present invention solves the above-described conventional problems, and makes an elastically deformable portion that supports the mass portion oscillating freely and easily deforms in the original direction of the mass portion and makes it difficult to deform in other directions. Thus, an object of the present invention is to provide an angular velocity sensor that can easily prevent excessive noise vibration from being superimposed on a mass part or other driving part.

本発明は、質量部と、前記質量部を第１の方向へ往復移動自在に支持する弾性変形部と、前記質量部を前記第１の方向へ往復振動させる駆動部材と、質量部が角速度を持って運動したときに前記第１の方向と直交する第２の方向に作用する力を検出する検出部とを有する角速度センサにおいて、
前記弾性変形部は、支持部に固定される基端連結部と、前記質量部に連結される先端連結部と、前記先端連結部と前記基端連結部との間で前記第２の方向に沿って平行に延びる少なくとも２つの梁とを有しており、
前記駆動部材によって前記質量部が前記第１の方向へ往復振動させられるときに、それぞれの前記梁が前記質量部の振動方向に向けて曲げ変形することを特徴とするものである。 The present invention includes a mass portion, an elastic deformation portion that supports the mass portion in a reciprocating manner in a first direction, a drive member that reciprocally vibrates the mass portion in the first direction, and the mass portion has an angular velocity. In an angular velocity sensor having a detection unit that detects a force acting in a second direction orthogonal to the first direction when moving with holding,
The elastic deformation portion includes a proximal end coupling portion fixed to the support portion, a distal end coupling portion coupled to the mass portion, and the second direction between the distal end coupling portion and the proximal end coupling portion. And at least two beams extending in parallel along
When the mass part is reciprocally vibrated in the first direction by the driving member, each of the beams is bent and deformed in the vibration direction of the mass part.

本発明の角速度センサに設けられた弾性変形部は、平行な２本の梁または３本以上の梁を有しており、これら梁が質量部の駆動方向である第１の方向へ向けて撓み変形する。前記梁はコリオリ力の検出方向である第２の方向へ延びているため、弾性変形部がコリオリ力の力の影響を受けにくくなり、検出部に本来の検出方向の振動以外の振動ノイズが重畳しにくくなる。 The elastically deforming portion provided in the angular velocity sensor of the present invention has two parallel beams or three or more beams, and these beams bend toward the first direction which is the driving direction of the mass portion. Deform. Since the beam extends in the second direction, which is the direction in which the Coriolis force is detected, the elastically deforming portion is less susceptible to the Coriolis force force, and vibration noise other than vibration in the original detection direction is superimposed on the detecting portion. It becomes difficult to do.

本発明は、前記基端連結部と前記先端連結部との間に、隣り合う梁どうしを連結する連結梁が設けられていることが好ましい。 In the present invention, it is preferable that a connecting beam for connecting adjacent beams is provided between the base end connecting portion and the distal end connecting portion.

上記連結梁が設けられていると、隣り合う梁が互いの間隔を保って撓み変形するため、梁の変形が安定し、弾性変形部に捩じり変形などが生じにくくなる。 When the connecting beam is provided, the adjacent beams are bent and deformed while maintaining a distance from each other. Therefore, the deformation of the beams is stabilized, and the elastic deformation portion is less likely to be twisted.

本発明は、前記駆動部材が、少なくとも１つの梁に設けられた圧電素子であり、この圧電素子の電歪効果によって複数の梁が曲げ変形させられて、前記質量部が往復振動させられるものである。 In the present invention, the driving member is a piezoelectric element provided on at least one beam, and a plurality of beams are bent and deformed by an electrostrictive effect of the piezoelectric element, and the mass portion is reciprocally oscillated. is there.

圧電素子を用いて梁に直接に振動駆動力を与えることで、質量部を効率よく振動させることができる。なお、本発明は弾性変形部とは別個に駆動電極を設け、質量部に設けられた電極と支持部に設けられた電極との間の静電力によって質量部が駆動されるものであってもよい。 By applying a vibration driving force directly to the beam using a piezoelectric element, the mass part can be vibrated efficiently. In the present invention, a drive electrode is provided separately from the elastically deformable portion, and the mass portion is driven by an electrostatic force between the electrode provided on the mass portion and the electrode provided on the support portion. Good.

本発明は、前記質量部に対し前記第２の方向へ作用する力によって前記支持部が移動させられ、前記支持部の移動が前記検出部で検出されるものである。 In the present invention, the support part is moved by a force acting in the second direction with respect to the mass part, and the movement of the support part is detected by the detection part.

例えば、本発明は、前記支持部に対して２つの前記質量部が前記弾性変形部を介して支持されているとともに、前記駆動部材によって２つの前記質量部が互いに逆の位相で振動駆動され、前記質量部に対し前記第２の方向へ作用する力によって、前記支持部が回動し、前記検出部で前記支持部の回動が検出されるものである。 For example, in the present invention, the two mass parts are supported by the support part via the elastic deformation part, and the two mass parts are driven to vibrate in opposite phases by the driving member, The support part is rotated by a force acting on the mass part in the second direction, and the detection part detects the rotation of the support part.

本発明は、２つのＳｉ層が絶縁層を介して接合されたＳＯＩ層が使用され、一方のＳｉ層が前記支持基板として使用され、他方のＳｉ層が機能層として使用されて、前記機能層から、前記質量部および前記弾性変形部が形成されており、前記質量部と前記支持基板との間および前記弾性変形部と前記支持基板との間で、前記絶縁層が除去されているものが好ましい。 In the present invention, an SOI layer in which two Si layers are bonded via an insulating layer is used, one Si layer is used as the support substrate, and the other Si layer is used as a functional layer. The mass portion and the elastic deformation portion are formed, and the insulating layer is removed between the mass portion and the support substrate and between the elastic deformation portion and the support substrate. preferable.

ＳＯＩ層の一方のシリコンウエハから各動作部分を形成することで、薄型で小型の角速度センサを得ることができる。 By forming each operating part from one silicon wafer of the SOI layer, a thin and small angular velocity sensor can be obtained.

本発明の角速度センサは、質量部を支持している弾性変形部に複数の梁が設けられているため、この梁の撓みで質量部を安定して振動させることが可能である。また梁が検出方向である第２の方向へ延びているため、質量部に作用するコリオリ力によって梁にたわみが生じにくい。そのために、弾性変形部に対して質量部を駆動する振動以外の振動が重畳しにくくなり、検出出力にノイズが加わりにくくなる。 In the angular velocity sensor of the present invention, since the plurality of beams are provided in the elastic deformation portion supporting the mass portion, the mass portion can be stably vibrated by the bending of the beam. In addition, since the beam extends in the second direction, which is the detection direction, it is difficult for the beam to be deflected by the Coriolis force acting on the mass portion. For this reason, vibrations other than the vibrations that drive the mass part are less likely to be superimposed on the elastically deforming part, and noise is hardly added to the detection output.

図１は本発明の実施の形態の角速度センサの機能層の構造を示す平面図、図２は図１に示す角速度センサをＩＩ−ＩＩ線で切断した断面図である。図３（Ａ）は機能層に設けられた検出回動部と駆動質量部を部分的に示す平面図、図３（Ｂ）は図３（Ａ）のＢ−Ｂ線の断面図である。図４ないし図６は、第２の弾性変形部および面内駆動部材を実施の形態別に示す部分平面図である。図７（Ａ）（Ｂ）は、角速度センサの動作説明図である。 FIG. 1 is a plan view showing the structure of the functional layer of the angular velocity sensor according to the embodiment of the present invention, and FIG. 2 is a sectional view of the angular velocity sensor shown in FIG. FIG. 3A is a plan view partially showing a detection rotating portion and a driving mass portion provided in the functional layer, and FIG. 3B is a cross-sectional view taken along the line BB in FIG. 4 to 6 are partial plan views showing the second elastic deformation portion and the in-plane driving member according to the embodiment. 7A and 7B are explanatory diagrams of the operation of the angular velocity sensor.

図１と図２に示す角速度センサ１はＭＥＭＳ（Micro-Electro-Mechanical Systems）素子であり、図１に示すようにその平面形状は四角形である。 An angular velocity sensor 1 shown in FIGS. 1 and 2 is a MEMS (Micro-Electro-Mechanical Systems) element, and its planar shape is a quadrangle as shown in FIG.

図２に示すように、角速度センサ１は、支持基板２に機能層２０が積層され、機能層２０の一部分と支持基板２とが第１の絶縁層３を介して接合されている。支持基板２と機能層２０および第１の絶縁層３は、ＳＯＩ（Silicon on Insulator）層を微細加工して形成されている。ここで使用するＳＯＩ層は、２つのシリコンウエハが、絶縁層（Insulator）であるＳｉＯ₂層を挟んで一体に接合されたものである。ＳＯＩ層の一方のシリコンウエハが、支持基板２として使用され、他方のシリコンウエハが機能層２０として使用されて、この機能層２０が微細加工されてそれぞれの機能部が分離されて形成される。また、ＳｉＯ₂層の一部が残されて第１の絶縁層３となる。 As shown in FIG. 2, in the angular velocity sensor 1, a functional layer 20 is laminated on a support substrate 2, and a part of the functional layer 20 and the support substrate 2 are bonded via a first insulating layer 3. The support substrate 2, the functional layer 20, and the first insulating layer 3 are formed by finely processing an SOI (Silicon on Insulator) layer. The SOI layer used here is obtained by integrally bonding two silicon wafers with an SiO ₂ layer as an insulating layer (Insulator) interposed therebetween. One silicon wafer of the SOI layer is used as the support substrate 2, and the other silicon wafer is used as the functional layer 20, and the functional layer 20 is finely processed to separate the respective functional portions. Further, a part of the SiO ₂ layer is left to become the first insulating layer 3.

図２に示すように、機能層２０には閉鎖部材４が重ねられて、機能層２０は支持基板２と閉鎖部材４との間で挟まれた構造となっている。閉鎖部材４は単独のＳｉ基板である。閉鎖部材４は、機能層２０との対向面に第２の絶縁層５が形成されている。 As shown in FIG. 2, the functional layer 20 is overlaid with the closing member 4, and the functional layer 20 is sandwiched between the support substrate 2 and the closing member 4. The closing member 4 is a single Si substrate. The closing member 4 has a second insulating layer 5 formed on the surface facing the functional layer 20.

前記第２の絶縁層５の内部に導電体のパターンが埋設されてリード層が形成されている。また、前記第２の絶縁層５の表面と、機能層２０のうちのそれぞれの通電部とが金属接合層を介して導通しており、それぞれの金属接合層が、第２の絶縁層５内に埋設されているリード層と導通している。 A conductive layer is embedded in the second insulating layer 5 to form a lead layer. Further, the surface of the second insulating layer 5 and each energization portion of the functional layer 20 are electrically connected through the metal bonding layer, and each metal bonding layer is in the second insulating layer 5. It is electrically connected to the lead layer embedded in.

図１には、第２の絶縁層５の内部に配線されているリード層が実線で示されている。第２の弾性変形部３０ａ，３０ｂ，３０ｃ，３０ｄ，３０ｅ，３０ｆ，３０ｇ，３０ｈに設けられた面内駆動部材の圧電素子が１相駆動である場合には、圧電素子の一方の電極層に通電する１つの駆動リード層１１が設けられて、駆動リード層１１が駆動電極パッド１１ａに接続される。前記圧電素子が２相駆動である場合は、前記駆動リード層１１に加えて他の駆動リード層１２によって圧電素子の電極層に通電され、前記駆動リード層１２が駆動電極パッド１２ａに接続される。圧電素子の他方の電極層は、接地リード層１３を介して接地電極パッド１３ａに導通されている。 In FIG. 1, the lead layer wired inside the second insulating layer 5 is shown by a solid line. When the piezoelectric element of the in-plane driving member provided in the second elastically deforming portions 30a, 30b, 30c, 30d, 30e, 30f, 30g, and 30h is one-phase driving, it is applied to one electrode layer of the piezoelectric element. One drive lead layer 11 to be energized is provided, and the drive lead layer 11 is connected to the drive electrode pad 11a. When the piezoelectric element is driven in two phases, the electrode layer of the piezoelectric element is energized by another driving lead layer 12 in addition to the driving lead layer 11, and the driving lead layer 12 is connected to the driving electrode pad 12a. . The other electrode layer of the piezoelectric element is electrically connected to the ground electrode pad 13 a through the ground lead layer 13.

この実施の形態ではコリオリ力を検出する検出部が可動電極２８部と第１の固定電極部２３および第２の固定電極部２４で構成されている。検出部では、可動電極部２８と第１の固定電極部２３との間の静電容量の変化、および可動電極部２８と第２の固定電極部２４との間の静電容量の変化が検出される。可動電極部２８には所定の電位を間欠的に供給する通電リード層１４が導通しており、この通電リード層１４は通電電極パッド１４ａに接続されている。複数設けられているそれぞれの第１の固定電極部２３は第１の検出リード層１５に導通しており、第１の検出リード層１５は第１の検出電極パッド１５ａに接続されている。同じく複数設けられている第２の固定電極部２４は第２の検出リード層１６に導通し、第２の検出リード層１６は第２の検出電極パッド１６ａに接続されている。 In this embodiment, the detection unit for detecting the Coriolis force is composed of the movable electrode 28, the first fixed electrode unit 23, and the second fixed electrode unit 24. In the detection unit, a change in capacitance between the movable electrode unit 28 and the first fixed electrode unit 23 and a change in capacitance between the movable electrode unit 28 and the second fixed electrode unit 24 are detected. Is done. An energization lead layer 14 for intermittently supplying a predetermined potential is electrically connected to the movable electrode portion 28, and this energization lead layer 14 is connected to the energization electrode pad 14a. Each of the plurality of first fixed electrode portions 23 provided in conduction is connected to the first detection lead layer 15, and the first detection lead layer 15 is connected to the first detection electrode pad 15a. Similarly, a plurality of second fixed electrode portions 24 are electrically connected to the second detection lead layer 16, and the second detection lead layer 16 is connected to the second detection electrode pad 16a.

図１に示すＹ方向の両側では、閉鎖部材４が、支持基板２よりも突出しており、閉鎖部材４の突出部分において、第２の絶縁層５の表面に、前記電極パッド１１ａ，１２ａ，１３ａ，１４ａ，１５ａ，１６ａが形成されて、外部回路との接続が可能となっている。 On both sides in the Y direction shown in FIG. 1, the closing member 4 protrudes from the support substrate 2, and the electrode pads 11 a, 12 a, 13 a are formed on the surface of the second insulating layer 5 at the protruding portion of the closing member 4. , 14a, 15a, 16a are formed and can be connected to an external circuit.

なお、閉鎖部材４は、Ｓｉの単独の基板に限られるものではなく、ガラス基板などであってもよい。あるいは駆動回路や検出回路などの各種回路が収納されたＩＣパッケージの表面が閉鎖部材４として使用され、ＩＣパッケージの表面の絶縁層が第２の絶縁層５の代わりに使用されて、その上に機能層２０および支持基板２が順に積層されて接合されているものであってもよい。この場合、前記各リード層１１，１２，１３，１４，１５，１６は、ＩＣパッケージの上面に設けられた電極バンプなどに接続されて、ＩＣパッケージの内部回路に接続される。 The closing member 4 is not limited to a single Si substrate, and may be a glass substrate or the like. Alternatively, the surface of the IC package in which various circuits such as a drive circuit and a detection circuit are accommodated is used as the closing member 4, and the insulating layer on the surface of the IC package is used instead of the second insulating layer 5. The functional layer 20 and the support substrate 2 may be laminated and bonded in order. In this case, each of the lead layers 11, 12, 13, 14, 15, 16 is connected to an electrode bump or the like provided on the upper surface of the IC package and connected to an internal circuit of the IC package.

図１と図２に示すように、機能層２０では、シリコンウエハの一部が分離されて枠体層２１が形成されている。図１には枠体層２１が形成されている領域がハッチングを付して示されている。四角枠形状の枠体層２１は角速度センサ１の周囲において額縁状に形成されている。枠体層２１と支持基板２はＳＯＩ層のＳｉＯ₂層の一部が残された第１の絶縁層３を介して接合され、枠体層２１と第２の絶縁層５とが金属接合層を介して接合されて、枠体層２１で囲まれた動作空間７が外気から遮断されている。 As shown in FIGS. 1 and 2, in the functional layer 20, a frame body layer 21 is formed by separating a part of the silicon wafer. In FIG. 1, a region where the frame body layer 21 is formed is shown with hatching. The rectangular frame-shaped frame body layer 21 is formed in a frame shape around the angular velocity sensor 1. The frame layer 21 and the support substrate 2 are bonded via the first insulating layer 3 in which a part of the SiO ₂ layer of the SOI layer is left, and the frame layer 21 and the second insulating layer 5 are bonded to the metal bonding layer. The operation space 7 surrounded by the frame layer 21 is shielded from the outside air.

動作空間７内には、機能層２０のシリコンウエハから分離された固定支持部２２ａ，２２ｂ，２２ｃ，２２ｄ、検出回動部２６、第１の弾性変形部２５ａ，２５ｂ，２５ｃ，２５ｄ、駆動質量部２９ａ，２９ｂ、第２の弾性変形部３０ａ，３０ｂ，３０ｃ，３０ｄ，３０ｅ，３０ｆ，３０ｇ，３０ｈ、可動電極部２８、第１の固定電極部２３および第２の固定電極部２４が形成されている。図２に示すように、これら各部は同じシリコンウエハから分離されて形成されているため、Ｚ方向の厚さ寸法が同じである。 In the operation space 7, the fixed support portions 22a, 22b, 22c and 22d separated from the silicon wafer of the functional layer 20, the detection rotation portion 26, the first elastic deformation portions 25a, 25b, 25c and 25d, the driving mass The portions 29a and 29b, the second elastic deformation portions 30a, 30b, 30c, 30d, 30e, 30f, 30g, and 30h, the movable electrode portion 28, the first fixed electrode portion 23, and the second fixed electrode portion 24 are formed. ing. As shown in FIG. 2, these parts are formed separately from the same silicon wafer, and therefore the thickness dimension in the Z direction is the same.

４個の固定支持部２２ａ，２２ｂ，２２ｃ，２２ｄは、枠体層２１の内側の四隅のそれぞれに設けられている。固定支持部２２ａ，２２ｂ，２２ｃ，２２ｄの一方の面は、ＳＯＩ層のＳｉＯ₂層の一部が残された第１の絶縁層３を介して支持基板２に接合されており、固定支持部２２ａ，２２ｂ，２２ｃ，２２ｄの他方の面は、前記接合金属層を介して第２の絶縁層５に固定されている。固定支持部２２ａ，２２ｂ，２２ｃ，２２ｄを接合している接合金属層は、それぞれのリード層１１，１２，１３，１４に導通している。 The four fixed support portions 22 a, 22 b, 22 c, and 22 d are provided at each of the four corners inside the frame body layer 21. One surface of each of the fixed support portions 22a, 22b, 22c, and 22d is joined to the support substrate 2 via the first insulating layer 3 in which a part of the SiO ₂ layer of the SOI layer is left. The other surfaces of 22a, 22b, 22c, and 22d are fixed to the second insulating layer 5 through the bonding metal layer. The joining metal layers joining the fixed support portions 22a, 22b, 22c, and 22d are electrically connected to the respective lead layers 11, 12, 13, and 14.

枠体層２１のそれぞれの内辺の内側には、第１の電極固定部２３ａと第２の電極固定部２４ａとが交互に配置されている。第１の電極固定部２３ａと第２の電極固定部２４ａは、枠体層２１のそれぞれの内辺の内側に沿って一列に配列されている。各内辺の内側において、反時計方向へ向かって、第１の電極固定部２３ａの次に第２の電極固定部２４ａが位置するように交互に配列されている。 The first electrode fixing portions 23a and the second electrode fixing portions 24a are alternately arranged inside the inner sides of the frame body layer 21. The first electrode fixing portion 23 a and the second electrode fixing portion 24 a are arranged in a line along the inner side of each inner side of the frame body layer 21. On the inner side of each inner side, the second electrode fixing portions 24a are alternately arranged next to the first electrode fixing portions 23a in the counterclockwise direction.

それぞれの第１の電極固定部２３ａは、その一方の面がＳＯＩ層のＳｉＯ₂層の一部が残された第１の絶縁層３を介して支持基板２に接合されている。それぞれの第１の電極固定部２３ａの他方の面は、金属接合層を介して第２の絶縁層５に接合されており、それぞれの金属接合層は前記第１の検出リード層１５に導通している。それぞれの第２の電極固定部２４ａは、その一方の面がＳＯＩ層のＳｉＯ₂層の一部が残された第１の絶縁層３を介して支持基板２に接合されている。それぞれの第２の電極固定部２４ａの他方の面は、金属接合層を介して第２の絶縁層５に接合されており、それぞれの金属接合層は前記第２の検出リード層１６に導通している。 Each of the first electrode fixing portions 23a is bonded to the support substrate 2 via the first insulating layer 3 in which one surface of the SiO ₂ layer of the SOI layer is left. The other surface of each first electrode fixing portion 23a is bonded to the second insulating layer 5 via a metal bonding layer, and each metal bonding layer is electrically connected to the first detection lead layer 15. ing. Each of the second electrode fixing portions 24a is bonded to the support substrate 2 via the first insulating layer 3 in which one surface of the second electrode fixing portion 24a is left with a part of the SiO ₂ layer of the SOI layer. The other surface of each second electrode fixing portion 24a is bonded to the second insulating layer 5 via a metal bonding layer, and each metal bonding layer is electrically connected to the second detection lead layer 16. ing.

動作空間７内において機能層２０から分離されて形成された各機能部のうちの前記固定支持部２２ａ，２２ｂ，２２ｃ，２２ｄと第１の電極固定部２３ａおよび第２の電極固定部２４ａ以外の部分は、支持基板２および閉鎖部材４の双方に固定されていない。図２に示すように、動作空間７内では、支持基板２の内面に、機能層２０の前記各部分に対向する凹部２ａが形成されている。同様に閉鎖部材４の内面にも前記各部分に対向する部分に凹部４ａが形成されている。 Among the functional parts formed separately from the functional layer 20 in the operation space 7, the fixed support parts 22a, 22b, 22c, 22d, other than the first electrode fixing part 23a and the second electrode fixing part 24a. The portion is not fixed to both the support substrate 2 and the closing member 4. As shown in FIG. 2, in the operation space 7, recesses 2 a facing the respective portions of the functional layer 20 are formed on the inner surface of the support substrate 2. Similarly, a recess 4 a is formed on the inner surface of the closing member 4 at a portion facing each of the above portions.

機能層２０では、前記固定支持部２２ａから第１の弾性変形部２５ａが延びており、同様に、固定支持部２２ｂ，２２ｃ，２２ｄから第１の弾性変形部２５ｂ，２５ｃ，２５ｄがそれぞれ延びている。第１の弾性変形部２５ａ，２５ｂ，２５ｃ，２５ｄは、動作空間７の中心に向かって放射状に延びている。動作空間７の中心部には四角い枠状の検出回動部２６が設けられている。第１の弾性変形部２５ａは、リンク支点部２７ａを介して、検出回動部２６の右上の角部に連結されている。同様に、第１の弾性変形部２５ｂ，２５ｃ，２５ｄは、それぞれリンク支点部２７ｂ，２７ｃ，２７ｄを介して検出回動部２６の角部に連結されている。 In the functional layer 20, a first elastic deformation portion 25a extends from the fixed support portion 22a, and similarly, the first elastic deformation portions 25b, 25c, and 25d extend from the fixed support portions 22b, 22c, and 22d, respectively. Yes. The first elastic deformation portions 25 a, 25 b, 25 c, 25 d extend radially toward the center of the operation space 7. A square frame-shaped detection rotation unit 26 is provided at the center of the operation space 7. The first elastic deformation portion 25a is connected to the upper right corner of the detection rotation portion 26 via a link fulcrum portion 27a. Similarly, the first elastic deformation portions 25b, 25c, and 25d are connected to corner portions of the detection rotation portion 26 through link fulcrum portions 27b, 27c, and 27d, respectively.

第１の弾性変形部２５ａ，２５ｂ，２５ｃ，２５ｄが曲げ変形し、且つリンク支点部２７ａ，２７ｂ，２７ｃ，２７ｄが変形することで、検出回動部２６は、支持基板２の面と平行な面内で時計方向および反時計方向へ回動することが可能である。 When the first elastic deformation portions 25a, 25b, 25c, and 25d are bent and deformed, and the link fulcrum portions 27a, 27b, 27c, and 27d are deformed, the detection rotation portion 26 is parallel to the surface of the support substrate 2. It is possible to rotate clockwise and counterclockwise in the plane.

検出回動部２６の４つの外辺には、外側へ延びる複数の可動電極部２８が一体に形成されている。それぞれの可動電極部２８は、検出回動部２６の中心（図１１の平面図での図心）から離れるにしたがって間隔が広がるように放射状に形成されている。 A plurality of movable electrode portions 28 extending outward are integrally formed on the four outer sides of the detection rotating portion 26. Each of the movable electrode portions 28 is formed in a radial pattern so that the interval increases as the distance from the center of the detection rotation portion 26 (centroid in the plan view of FIG. 11) increases.

複数の前記第１の電極固定部２３ａには、検出回動部２６の中心に向けて放射状に延びる第１の固定電極部２３が一体に形成されており、複数の前記第２の電極固定部２４ａには、検出回動部２６の中心に向けて放射状に延びる第２の固定電極部２４が一体に形成されている。それぞれの可動電極部２８は、第１の固定電極部２３と第２の固定電極部２４との間に挟まれている。全ての第１の固定電極部２３は、可動電極部２８に対して時計方向に対向しており、全ての第２の固定電極部２４は、可動電極部２８に対して反時計方向に対向している。 The plurality of first electrode fixing portions 23a are integrally formed with a first fixed electrode portion 23 extending radially toward the center of the detection rotating portion 26, and the plurality of second electrode fixing portions 23a. The second fixed electrode portion 24 that extends radially toward the center of the detection rotating portion 26 is integrally formed with the 24 a. Each movable electrode portion 28 is sandwiched between the first fixed electrode portion 23 and the second fixed electrode portion 24. All the first fixed electrode portions 23 are opposed to the movable electrode portion 28 in the clockwise direction, and all the second fixed electrode portions 24 are opposed to the movable electrode portion 28 in the counterclockwise direction. ing.

検出回動部２６が時計方向へ回動すると、それぞれの可動電極部２８と第１の固定電極部２３との対向間隔が狭くなって、可動電極部２８と第１の固定電極部２３との間の静電容量が大きくなる。逆に可動電極部２８と第２の固定電極部２４との間の間隔が広くなって静電容量が低下する。検出回動部２６が反時計方向へ回動すると、可動電極部２８と第１の固定電極部２３との間の静電容量が低下し、可動電極部２８と第２の固定電極部２４との間の静電容量が大きくなる。第１の固定電極部２３から得られる静電容量の変化による検出出力と、第２の固定電極部２４から得られる静電容量の変化による検出出力との差を求めることで、検出回動部２６の時計方向および反時計方向への回動量を検出することが可能である。 When the detection rotation unit 26 rotates in the clockwise direction, the interval between the movable electrode unit 28 and the first fixed electrode unit 23 becomes narrower, and the movable electrode unit 28 and the first fixed electrode unit 23 are separated from each other. The capacitance between them increases. Conversely, the gap between the movable electrode portion 28 and the second fixed electrode portion 24 is widened, and the capacitance is reduced. When the detection rotation unit 26 rotates counterclockwise, the capacitance between the movable electrode unit 28 and the first fixed electrode unit 23 decreases, and the movable electrode unit 28 and the second fixed electrode unit 24 The capacitance between the two increases. By obtaining the difference between the detection output due to the change in capacitance obtained from the first fixed electrode portion 23 and the detection output due to the change in capacitance obtained from the second fixed electrode portion 24, the detection rotation portion It is possible to detect the amount of rotation of 26 in the clockwise direction and the counterclockwise direction.

また、検出回動部２６が、回動方向以外の方向であるＸ方向やＹ方向へ直線的に移動し、または支持基板２の面と垂直な方向であるＺ方向へ動いたときは、１つの可動電極部２８と第１の固定電極部２３との対向面積の変化と、前記可動電極部２８と第２の固定電極部２４との対向面積の変化とが同じになり、第１の固定電極部２３からの検出出力と第２の固定電極部２４からの検出出力との差を求めることで、検出出力が相殺される。したがって、検出回動部２６の本来の検出方向である回動方向以外の動作による外乱ノイズが検出出力に重畳することがない。 Further, when the detection rotation unit 26 linearly moves in the X direction and the Y direction which are directions other than the rotation direction, or moves in the Z direction which is a direction perpendicular to the surface of the support substrate 2, 1 The change in the facing area between the two movable electrode portions 28 and the first fixed electrode portion 23 is the same as the change in the facing area between the movable electrode portion 28 and the second fixed electrode portion 24, so that the first fixed By obtaining the difference between the detection output from the electrode unit 23 and the detection output from the second fixed electrode unit 24, the detection output is canceled out. Therefore, disturbance noise due to an operation other than the rotation direction that is the original detection direction of the detection rotation unit 26 is not superimposed on the detection output.

検出回動部２６は、図示右側でＹ方向に延びる右側支持部２６ａと、図示左側でＹ方向に延びる左側支持部２６ｂと、左右の両支持部２６ａ，２６ｂの中間においてＹ方向に延びる中間支持部２６ｃとを有している。 The detection rotation unit 26 includes a right support 26a extending in the Y direction on the right side in the figure, a left support part 26b extending in the Y direction on the left side in the figure, and an intermediate support extending in the Y direction between the left and right support parts 26a and 26b. Part 26c.

右側支持部２６ａと中間支持部２６ｃとの間に、第１の駆動質量部２９ａが設けられ、左側支持部２６ｂと中間支持部２６ｃとの間に、第２の駆動質量部２９ｂが設けられている。すなわち、検出回動部２６は一対の駆動質量部２９ａ，２９ｂを支持する支持部として機能している。 A first drive mass unit 29a is provided between the right support part 26a and the intermediate support part 26c, and a second drive mass part 29b is provided between the left support part 26b and the intermediate support part 26c. Yes. That is, the detection rotation unit 26 functions as a support unit that supports the pair of drive mass units 29a and 29b.

図７にも示すように、第１の駆動質量部２９ａの右側部はＹ方向に間隔を空けて設けられた２つの第２の弾性変形部３０ａ，３０ｂを介して右側支持部２６ａに支持されているとともに、左側部はＹ方向に間隔を空けて設けられた２つの第２の弾性変形部３０ｃ，３０ｄを介して中間支持部２６ｃに支持されている。第２の駆動質量部２９ｂの右側部はＹ方向に間隔を空けて設けられた２つの第２の弾性変形部３０ｅ，３０ｆを介して中間支持部２６ｃに支持されているとともに、左側部はＹ方向に間隔を空けて設けられた２つの第２の弾性変形部３０ｇ，３０ｈを介して左側支持部２６ｂに支持されている。 As shown also in FIG. 7, the right side portion of the first drive mass portion 29a is supported by the right side support portion 26a via two second elastic deformation portions 30a and 30b provided at intervals in the Y direction. In addition, the left side portion is supported by the intermediate support portion 26c via two second elastically deformable portions 30c and 30d provided at an interval in the Y direction. The right side portion of the second drive mass portion 29b is supported by the intermediate support portion 26c via two second elastic deformation portions 30e and 30f provided at intervals in the Y direction, and the left side portion is Y It is supported by the left support part 26b via two second elastically deforming parts 30g, 30h provided with a gap in the direction.

左右の合計４箇所で第２の弾性変形部３０ａ，３０ｂ，３０ｃ，３０ｄで支持された第１の駆動質量部２９ａは、検出回動部２６の内部において、支持基板２の面と平行なＸ方向（第１の方向）へ往復移動自在である。同様に、左右の合計４箇所で第２の弾性変形部３０ｅ，３０ｆ，３０ｇ，３０ｈで支持された第２の駆動質量部２９ｂも、検出回動部２６の内部において、支持基板２の面と平行なＸ方向（第１の方向）へ往復移動自在である。 The first drive mass unit 29a supported by the second elastic deformation portions 30a, 30b, 30c, and 30d at a total of four locations on the left and right sides is parallel to the surface of the support substrate 2 inside the detection rotation unit 26. It can freely reciprocate in the direction (first direction). Similarly, the second drive mass unit 29b supported by the second elastically deforming portions 30e, 30f, 30g, and 30h at a total of four locations on the left and right sides is also connected to the surface of the support substrate 2 inside the detection rotating unit 26. It can freely reciprocate in the parallel X direction (first direction).

図３は、第１の駆動質量部２９ａが４個の第２の弾性変形部３０ａ，３０ｂ，３０ｃ，３０ｄで支持されている状態を示す部分拡大図である。 FIG. 3 is a partially enlarged view showing a state in which the first driving mass portion 29a is supported by the four second elastic deformation portions 30a, 30b, 30c, and 30d.

図３（Ａ）に示すように、第１の駆動質量部２９ａは長辺がＹ方向に向けられた長方形状である。第１の駆動質量部２９ａの右側部にはＺ方向に貫通してＹ方向に長い長穴３６ａが形成されているとともに、この長穴３６ａの右側に連結弾性変形部３５ａが一体に形成されている。連結弾性変形部３５ａは、Ｙ側の両端部３５ｃ，３５ｄが第１の駆動質量部２９ａと一体化されており、両端部３５ｃ，３５ｄを支点としてＸ方向へ湾曲変形可能である。第１の駆動質量部２９ａの左側部には長穴３６ｂを介して連結弾性変形部３５ｂが一体に形成されている。連結弾性変形部３５ｂは、Ｙ方向の両端部３５ｅ，３５ｆを介して第１の駆動質量部２９ａに一体に連結されているとともに、両端部３５ｅ，３５ｆを支点としてＸ方向へ湾曲変形可能である。 As shown in FIG. 3A, the first drive mass unit 29a has a rectangular shape whose long side is oriented in the Y direction. A long hole 36a that penetrates in the Z direction and is long in the Y direction is formed in the right side portion of the first drive mass portion 29a, and a connecting elastic deformation portion 35a is integrally formed on the right side of the long hole 36a. Yes. The connecting elastic deformation portion 35a has both Y-side end portions 35c and 35d integrated with the first drive mass portion 29a, and can be bent and deformed in the X direction with the both end portions 35c and 35d as fulcrums. A connecting elastic deformation portion 35b is integrally formed on the left side portion of the first drive mass portion 29a through a long hole 36b. The connected elastic deformation portion 35b is integrally connected to the first drive mass portion 29a via both end portions 35e and 35f in the Y direction, and can be bent and deformed in the X direction using the both end portions 35e and 35f as fulcrums. .

第２の弾性変形部３０ａ，３０ｂは、検出回動部２６の右側支持部２６ａと連結弾性変形部３５ａとを連結している。第２の弾性変形部３０ａと第２の弾性変形部３０ｂは、Ｘ方向に延びる線を挟んで線対称形状である。第２の弾性変形部３０ｃ，３０ｄは、検出回動部２６の中間支持部２６ｃと連結弾性変形部３５ａとを連結している。第２の弾性変形部３０ｃと第２の弾性変形部３０ｄは、Ｘ方向に延びる線を挟んで線対称形状である。また、第２の弾性変形部３０ａと第２の弾性変形部３０ｃとがＹ方向に延びる線を挟んで線対称形状であり、第２の弾性変形部３０ｂと第２の弾性変形部３０ｄもＹ方向に延びる線を挟んで線対称形状である。 The second elastic deformation portions 30a and 30b connect the right support portion 26a of the detection rotation portion 26 and the connection elastic deformation portion 35a. The 2nd elastic deformation part 30a and the 2nd elastic deformation part 30b are line symmetrical shapes on both sides of the line extended in a X direction. The second elastic deformation portions 30c and 30d connect the intermediate support portion 26c of the detection rotation portion 26 and the connection elastic deformation portion 35a. The second elastic deformation portion 30c and the second elastic deformation portion 30d have a line-symmetric shape across a line extending in the X direction. Further, the second elastic deformation portion 30a and the second elastic deformation portion 30c are line symmetrical with respect to a line extending in the Y direction, and the second elastic deformation portion 30b and the second elastic deformation portion 30d are also Y It has a line-symmetric shape across a line extending in the direction.

図４（Ａ）に、第２の弾性変形部３０ａが拡大されて示されている。第２の弾性変形部３０ａの基端連結部３１は、検出回動部２６の右側支持部２６ａに一体に連結されており、基端連結部３１には質量を低減させるための穴３１ａがＺ方向に貫通して形成されている。第２の弾性変形部３０ａの先端連結部３２は連結弾性変形部３５ａに一体に連結されており、先端連結部３２には質量を低減させるための穴３２ａがＺ方向に貫通して形成されている。 FIG. 4A shows the second elastic deformation portion 30a in an enlarged manner. The base end connecting portion 31 of the second elastic deformation portion 30a is integrally connected to the right support portion 26a of the detection rotating portion 26, and the base end connecting portion 31 has a hole 31a for reducing the mass Z. It is formed to penetrate in the direction. The distal end coupling portion 32 of the second elastic deformation portion 30a is integrally coupled to the coupling elastic deformation portion 35a, and a hole 32a for reducing mass is formed in the distal end coupling portion 32 so as to penetrate in the Z direction. Yes.

基端連結部３１と先端連結部３２との間には、第１の梁３３と第２の梁３４とが設けられている。第１の梁３３のＹ１側の端部３３ａは基端連結部３１に一体に連結され、Ｙ２側の端部３３ｂは先端連結部３２に一体に連結されている。同様に、第２の梁３４のＹ１側の端部３４ａは基端連結部３１に一体に連結され、Ｙ２側の端部３４ｂは先端連結部３２に一体に連結されている。 A first beam 33 and a second beam 34 are provided between the proximal end coupling portion 31 and the distal end coupling portion 32. An end portion 33 a on the Y1 side of the first beam 33 is integrally connected to the proximal end connection portion 31, and an end portion 33 b on the Y2 side is integrally connected to the distal end connection portion 32. Similarly, the end portion 34a on the Y1 side of the second beam 34 is integrally connected to the base end connecting portion 31, and the end portion 34b on the Y2 side is integrally connected to the distal end connecting portion 32.

第１の梁３３と第２の梁３４は、Ｚ方向に貫通する空間部３８を挟んで互いに平行に形成され、共にＹ方向（第２の方向）へ直線的に延びている。そして、空間部３８をＹ方向に二分する中央部において、第１の梁３３と第２の梁３４を連結する連結梁３７が一体に形成されている。第１の梁３３は、端部３３ａから端部３３ｂまで幅寸法および断面積が均一であり、第２の梁３４も、端部３４ａから端部３４ｂまで幅寸法および断面積が均一である。 The first beam 33 and the second beam 34 are formed in parallel with each other with a space 38 penetrating in the Z direction, and both extend linearly in the Y direction (second direction). A connecting beam 37 that connects the first beam 33 and the second beam 34 is integrally formed at a central portion that bisects the space 38 in the Y direction. The first beam 33 has a uniform width dimension and cross-sectional area from the end portion 33a to the end portion 33b, and the second beam 34 also has a uniform width size and cross-sectional area from the end portion 34a to the end portion 34b.

第１の梁３３と第２の梁３４は、幅寸法および断面積が同一であってもよいし、異なっていてもよい。図４（Ａ）に示すように、第１の梁３３には面内駆動部材４１が取り付けられ、第１の梁３３に変形力が与えられるため、第１の梁３３の幅寸法および断面積が第２の梁３４よりも大きいことが好ましい。 The first beam 33 and the second beam 34 may have the same width dimension and cross-sectional area, or may be different. As shown in FIG. 4A, since the in-plane driving member 41 is attached to the first beam 33 and a deformation force is applied to the first beam 33, the width dimension and cross-sectional area of the first beam 33 are increased. Is preferably larger than the second beam 34.

面内駆動部材４１は、圧電素子であり、第１の梁３３のＺ方向に向く上面と下面の双方に設けられている。第１の梁３３はシリコンウエハから分離されたものであって導電性である。よって、第１の梁３３の上面と下面に絶縁層が形成され、この絶縁層の上に下部電極層と圧電素子層と上部電極層とが順に積層されて前記面内駆動部材４１が形成されている。 The in-plane driving member 41 is a piezoelectric element, and is provided on both the upper surface and the lower surface of the first beam 33 facing the Z direction. The first beam 33 is separated from the silicon wafer and is conductive. Therefore, an insulating layer is formed on the upper surface and the lower surface of the first beam 33, and the lower electrode layer, the piezoelectric element layer, and the upper electrode layer are sequentially stacked on the insulating layer to form the in-plane driving member 41. ing.

上部電極層と下部電極層との間に、交流電圧を印加すると、第１の梁３３の上下両面に設けられた面内駆動部材４１が一緒に伸びまた一緒に縮み、その結果、図４（Ｂ）に示すように、第１の梁３３は基端連結部３１が支持端となって、先端連結部３２がＸ１−Ｘ２方向(第１の方向)へ移動するように曲げ変形振動を生じる。 When an AC voltage is applied between the upper electrode layer and the lower electrode layer, the in-plane driving members 41 provided on the upper and lower surfaces of the first beam 33 extend and contract together, and as a result, FIG. As shown in B), the first beam 33 generates bending deformation vibration so that the proximal end coupling portion 31 serves as a support end and the distal end coupling portion 32 moves in the X1-X2 direction (first direction). .

第１の駆動質量部２９ａを支持している他の第２の弾性変形部３０ｂ，３０ｃ，３０ｄは、図４（Ａ）に示す第２の弾性変形部３０ａとは向きが相違し、または対称形状であるが、その構造は実質的に同じである。すなわち、第２の弾性変形部３０ｂ，３０ｃ，３０ｄも、第１の駆動質量部２９ａから離れる側に第１の梁３３が設けられ、第１の駆動質量部２９ａに接近する側に第２の梁３４が設けられている。そして、第１の梁３３の上下両面に面内駆動部材４１が設けられている。 The other second elastic deformation portions 30b, 30c, and 30d supporting the first drive mass portion 29a have different directions or are symmetric with respect to the second elastic deformation portion 30a shown in FIG. Although it is a shape, its structure is substantially the same. That is, the second elastic deformation portions 30b, 30c, and 30d are also provided with the first beam 33 on the side away from the first drive mass portion 29a, and on the side closer to the first drive mass portion 29a. A beam 34 is provided. In-plane drive members 41 are provided on the upper and lower surfaces of the first beam 33.

なお、前記面内駆動部材４１は、第１の梁３３の上面と下面のいずれか一方の面のみに設けられていてもよい。これは以下の他の実施の形態においても同じである。 The in-plane driving member 41 may be provided only on one of the upper surface and the lower surface of the first beam 33. The same applies to other embodiments described below.

図７（Ａ）に示すように、左側の第２の駆動質量部２９ｂの右側部には連結弾性変形部３５ｇが形成され、左側部に連結弾性変形部３５ｈが形成されている。連結弾性変形部３５ｇ，３５ｈの構造は、第１の駆動質量部２９ａに設けられた連結弾性変形部３５ａ，３５ｂと同じである。第２の弾性変形部３０ｅ，３０ｆは、中間支持部２６ｃと連結弾性変形部３５ｇとを連結しており、第２の弾性変形部３０ｇ，３０ｈは、左側支持部２６ｂと連結弾性変形部３５ｈとを連結している。 As shown in FIG. 7A, a connecting elastic deformation part 35g is formed on the right side of the left second driving mass part 29b, and a connecting elastic deformation part 35h is formed on the left side. The structure of the connection elastic deformation portions 35g and 35h is the same as that of the connection elastic deformation portions 35a and 35b provided in the first drive mass portion 29a. The second elastic deformation portions 30e and 30f connect the intermediate support portion 26c and the connection elastic deformation portion 35g, and the second elastic deformation portions 30g and 30h include the left support portion 26b and the connection elastic deformation portion 35h. Are connected.

第２の駆動質量部２９ｂを４箇所で支持している第２の弾性変形部３０ｅ，３０ｆ，３０ｇ，３０ｈは、図４（Ａ）に示す第２の弾性変形部３０ａ，３０ｂ，３０ｃ，３０ｄと構造が実質的に同じであり、それぞれが、第２の駆動質量部２９ｂから離れる側に第１の梁３３を有し、第２の駆動質量部２９ｂに接近する側に第２の梁３４が設けられ、第１の梁３３の上下両面に面内駆動部材４１が設けられている。 The second elastic deformation portions 30e, 30f, 30g, and 30h that support the second drive mass portion 29b at four locations are the second elastic deformation portions 30a, 30b, 30c, and 30d shown in FIG. Are substantially the same in structure, and each has a first beam 33 on the side away from the second driving mass unit 29b and a second beam 34 on the side approaching the second driving mass unit 29b. And in-plane drive members 41 are provided on both upper and lower surfaces of the first beam 33.

枠状の検出回動部２６と第１の弾性変形部２５ａおよび固定支持部２２ａのそれぞれの下面には絶縁層を介してリードパターンが形成されている。合計８箇所に設けられた第２の弾性変形部３０ａないし３０ｈの第１の梁３３に設けられた面内駆動手段４１の一方の電極層が、前記リードパターンに接続されている。さらに、前記リードパターンは、駆動リード層１１を介して駆動電極パッド１１ａに接合されている。 A lead pattern is formed on the lower surface of each of the frame-shaped detection rotation portion 26, the first elastic deformation portion 25a, and the fixed support portion 22a via an insulating layer. One electrode layer of the in-plane driving means 41 provided on the first beam 33 of the second elastically deforming portions 30a to 30h provided at a total of eight locations is connected to the lead pattern. Further, the lead pattern is bonded to the drive electrode pad 11 a via the drive lead layer 11.

枠状の検出回動部２６と第１の弾性変形部２５ａおよび固定支持部２２ａのそれぞれの下面には、絶縁層を介してさらに他のリードパターンが形成されている。合計８箇所に設けられた面内駆動手段４１の他方の電極層は、前記リードパターンに接続されている。さらに、前記リードパターンは、接地リード層１３を介して接地電極パッド１３ａに導通されている。 Still another lead pattern is formed on the lower surface of each of the frame-shaped detection rotation portion 26, the first elastic deformation portion 25a, and the fixed support portion 22a via an insulating layer. The other electrode layer of the in-plane driving means 41 provided in a total of eight locations is connected to the lead pattern. Further, the lead pattern is electrically connected to the ground electrode pad 13 a through the ground lead layer 13.

第２の弾性変形部３０ａ，３０ｂ，３０ｇ，３０ｈに設けられた面内駆動部材４１がＹ方向へ伸び変形するときに、弾性変形部３０ｃ，３０ｄ，３０ｅ，３０ｆに設けられた面内駆動部材４１がＹ方向に縮み変化し、逆に、第２の弾性変形部３０ａ，３０ｂ，３０ｇ，３０ｈに設けられた面内駆動部材４１がＹ方向へ縮み変形するときに、弾性変形部３０ｃ，３０ｄ，３０ｅ，３０ｆに設けられた面内駆動部材４１がＹ方向に延び変形するように、それぞれの面内駆動部材４１の分極方向が設定され、または上下の電極層の駆動リード層１１と接地リード層１３への接続状態が選択されている。よって、右側の第１の駆動質量部２９ａがＸ１方向へ駆動されたときに第２の駆動質量部２９ｂがＸ２方向へ駆動され、右側の第１の駆動質量部２９ａがＸ２方向へ駆動されたときに第２の駆動質量部２９ｂがＸ１方向へ駆動されるように、第１の駆動質量部２９ａと第２の駆動質量部２９ｂが、Ｘ方向へ互いに逆の位相で振動するように駆動される。 When the in-plane driving member 41 provided in the second elastically deforming portions 30a, 30b, 30g, and 30h extends and deforms in the Y direction, the in-plane driving member provided in the elastically deforming portions 30c, 30d, 30e, and 30f. When the in-plane driving member 41 provided in the second elastically deforming portions 30a, 30b, 30g, and 30h contracts and deforms in the Y direction, the elastically deforming portions 30c and 30d are changed. , 30e and 30f, the polarization direction of each in-plane drive member 41 is set so that the in-plane drive member 41 extends in the Y direction and deforms, or the drive lead layer 11 and the ground lead of the upper and lower electrode layers The connection state to the layer 13 is selected. Therefore, when the right first driving mass unit 29a is driven in the X1 direction, the second driving mass unit 29b is driven in the X2 direction, and the right first driving mass unit 29a is driven in the X2 direction. Sometimes the first drive mass unit 29a and the second drive mass unit 29b are driven to vibrate in opposite phases in the X direction so that the second drive mass unit 29b is driven in the X1 direction. The

図５と図６は、前記第１の梁３３に取り付けられる面内駆動部材の他の例を示している。 5 and 6 show another example of the in-plane driving member attached to the first beam 33. FIG.

図５（Ａ）に示す実施の形態では、第１の弾性変形部の第１の梁３３の上下両面に面内駆動部材４１が、第２の梁３４の上下両面に面内駆動部材４２が設けられている。これら面内駆動部材４１，４２は、いずれも第１の梁３３と第２の梁３４の上下面に絶縁層を形成し、その表面に下部電極層と圧電素子層および上部電極層を順に重ねて積層することで形成されている。 In the embodiment shown in FIG. 5A, the in-plane drive members 41 are provided on the upper and lower surfaces of the first beam 33 of the first elastic deformation portion, and the in-plane drive members 42 are provided on the upper and lower surfaces of the second beam 34. Is provided. Each of these in-plane driving members 41 and 42 forms an insulating layer on the upper and lower surfaces of the first beam 33 and the second beam 34, and a lower electrode layer, a piezoelectric element layer, and an upper electrode layer are sequentially stacked on the surface. And are laminated.

第１の梁３３に設けられた面内駆動部材４１がＹ方向に伸びるときに、第２の梁３４に設けられた面内駆動部材４２がＹ方向へ縮むように、面内駆動部材４１，４２を構成する圧電素子層の分極方向や上下の電極層の駆動リード層１１と接地リード層１３への接続状態が選択されている。その結果、図５（Ｂ）に示すように、基端連結部３１を支持端として、先端連結部３２がＸ１−Ｘ２方向へ触れるように曲げ変形振動する。 When the in-plane drive member 41 provided on the first beam 33 extends in the Y direction, the in-plane drive members 41 and 42 are arranged such that the in-plane drive member 42 provided on the second beam 34 contracts in the Y direction. The polarization direction of the piezoelectric element layer that constitutes and the connection state of the upper and lower electrode layers to the drive lead layer 11 and the ground lead layer 13 are selected. As a result, as shown in FIG. 5 (B), the base end coupling portion 31 is used as a support end, and bending deformation is vibrated so that the front end coupling portion 32 touches in the X1-X2 direction.

図６（Ａ）に示す実施の形態では、第１の梁３３の連結梁３７よりもＹ２側の上下面と、第２の梁３４の連結梁３７よりもＹ１側の上下面に、同じ面内駆動部材４３が設けられており、第２の梁３４の連結梁３７よりもＹ１側の上下面と、第２の梁３４の連結梁３７よりもＹ２側の上下面に、同じ面内駆動部材４４が設けられている。面内駆動部材４３，４４は、いずれも第１の梁３３と第２の梁３４の上下面に絶縁層を形成し、その表面に下部電極層と圧電素子層および上部電極層を順に重ねて積層することで形成されている。 In the embodiment shown in FIG. 6A, the upper and lower surfaces of the first beam 33 on the Y2 side of the connecting beam 37 and the upper and lower surfaces of the second beam 34 on the Y1 side of the connecting beam 37 are the same surface. The inner drive member 43 is provided, and the same in-plane drive is provided on the upper and lower surfaces of the second beam 34 on the Y1 side of the connecting beam 37 and on the upper and lower surfaces of the second beam 34 on the Y2 side of the connecting beam 37. A member 44 is provided. Each of the in-plane driving members 43 and 44 has an insulating layer formed on the upper and lower surfaces of the first beam 33 and the second beam 34, and a lower electrode layer, a piezoelectric element layer, and an upper electrode layer are sequentially stacked on the surface. It is formed by stacking.

２つの面内駆動部材４３，４３がＹ方向に伸びるときに、２つの面内駆動部材４４，４４がＹ方向へ縮み、面内駆動部材４３，４３がＹ方向に縮むときに、２つの面内駆動部材４４，４４がＹ方向へ伸びるように、面内駆動部材４３，４４を構成する圧電素子層の分極方向や上下の電極層の駆動リード層１１と接地リード層１３への接続状態が選択されている。その結果、図６（Ｂ）に示すように、基端連結部３１を支持端として、先端連結部３２がＸ１−Ｘ２方向へ触れるように、第１の梁３３と第２の梁３４の双方がＳ字状に曲げ変形振動する。このとき、先端連結部３２が、Ｘ−Ｙ平面内であまり回動することなくＸ１−Ｘ２方向へ振動するため、第２の弾性変形部３０ａないし３０ｈと、連結弾性変形部３５ａ，３５ｂ，３５ｇ，３５ｈとの連結部に捩じり応力が作用しにくくなる。 When the two in-plane drive members 43, 43 extend in the Y direction, the two in-plane drive members 44, 44 contract in the Y direction, and when the in-plane drive members 43, 43 contract in the Y direction, two surfaces The polarization direction of the piezoelectric element layers constituting the in-plane driving members 43 and 44 and the connection state of the upper and lower electrode layers to the driving lead layer 11 and the ground lead layer 13 are set so that the inner driving members 44 and 44 extend in the Y direction. Is selected. As a result, as shown in FIG. 6B, both the first beam 33 and the second beam 34 are used so that the distal end coupling portion 32 touches in the X1-X2 direction with the proximal end coupling portion 31 as a support end. Bends and vibrates in an S-shape. At this time, since the tip connecting portion 32 vibrates in the X1-X2 direction without much rotation in the XY plane, the second elastic deformation portions 30a to 30h and the connection elastic deformation portions 35a, 35b, 35g , 35h, torsional stress is less likely to act.

図５または図６に示すように、１つの第２の弾性変形部に２種類の面内駆動部材が設けられ、２種類の面内駆動部材を別々に駆動する必要が有る場合、それぞれの面内駆動部材の一方の電極層は、接地リード層１３に接続されるが、他方の電極層は、駆動リード層１１と駆動リード層１２に別々に接続される。 As shown in FIG. 5 or FIG. 6, when two types of in-plane driving members are provided in one second elastically deformable portion and the two types of in-plane driving members need to be driven separately, the respective surfaces One electrode layer of the inner drive member is connected to the ground lead layer 13, while the other electrode layer is separately connected to the drive lead layer 11 and the drive lead layer 12.

図４ないし図６に示すように、第２の弾性変形部３０ａないし３０ｈは、基端連結部３１と先端連結部３２との間に、２つの梁３３，３４が互いに平行に設けられたいわゆるラーメン構造であるため、２つの梁３３，３４がＸ−Ｙ平面内でＸ１方向とＸ２方向へ撓む際に、２つの梁３３，３４がＸ−Ｙ平面と平行に動きやすく、Ｘ−Ｙ平面に対して捻れ方向に変形しにくい。また、基端連結部３１と先端連結部３２が、図４（Ａ）に示す変形前の平行状態を保ったまま、先端連結部３２がＸ１−Ｘ２方向へ移動するので、先端連結部３２と連結弾性変形部３５ａとの連結部にＸ−Ｙ平面内での捩じりが生じにくい。また、この連結部で若干の捻れが生じても、この捩れは、連結弾性変形部３５ａの撓み変形で吸収される。 As shown in FIGS. 4 to 6, the second elastically deformable portions 30 a to 30 h are so-called two beams 33 and 34 provided in parallel with each other between the proximal end connecting portion 31 and the distal end connecting portion 32. Since it has a ramen structure, when the two beams 33 and 34 are bent in the X1 direction and the X2 direction in the XY plane, the two beams 33 and 34 are easy to move in parallel with the XY plane. Difficult to deform in a twisted direction with respect to a plane. Further, since the distal end coupling portion 32 moves in the X1-X2 direction while the proximal end coupling portion 31 and the distal end coupling portion 32 maintain the parallel state before the deformation shown in FIG. Twist in the XY plane is unlikely to occur at the connecting portion with the connecting elastic deformation portion 35a. Even if a slight twist occurs in the connecting portion, the twist is absorbed by the bending deformation of the connecting elastic deformation portion 35a.

また、第２の弾性変形部３０ａないし３０ｈは、図４ないし図６に示すように、第１の梁３３と第２の梁３４の中間点が連結梁３７で連結されているため、第１の梁３３と第２の梁３４が、Ｘ方向の間隔を保ったまま変形できるようになる。よって、面内駆動部材４１ないし４４で発せられる駆動力が、第１の駆動質量部２９ａと第２の駆動質量部２９ｂに対して、損失があまり無い状態で伝達される。 Further, as shown in FIGS. 4 to 6, the second elastic deformation portions 30 a to 30 h are connected to each other at the midpoint between the first beam 33 and the second beam 34 by the connecting beam 37. The second beam 34 and the second beam 34 can be deformed while maintaining an interval in the X direction. Therefore, the driving force generated by the in-plane driving members 41 to 44 is transmitted to the first driving mass unit 29a and the second driving mass unit 29b with little loss.

第１の駆動質量部２９ａと第２の駆動質量部２９ｂは、機能層２０であるシリコンウエハから分離されて形成されている。そこで、図３（Ｂ）に示すように、第１の駆動質量部２９ａと第２の駆動質量部２９ｂの上に、シリコンよりも比重の大きい錘層３９が形成されている。錘層３９は、Ｍｏ、Ｈｆ、Ｔａ、Ｗ、Ｒｕ、Ｒｈ、Ｐｄ、Ａｇ、Ｒｅ、Ｏｓ、Ｉｒ、Ｐｔ、Ａｕなどのいずれかまたはこれらの合金で形成される。 The first driving mass unit 29 a and the second driving mass unit 29 b are formed separately from the silicon wafer that is the functional layer 20. Therefore, as shown in FIG. 3B, a weight layer 39 having a specific gravity larger than that of silicon is formed on the first drive mass unit 29a and the second drive mass unit 29b. The weight layer 39 is formed of any one of Mo, Hf, Ta, W, Ru, Rh, Pd, Ag, Re, Os, Ir, Pt, Au, or an alloy thereof.

次に、前記角速度センサ１の動作を説明する。
図１に示す接地電極パッド１３ａを接地電位とし、駆動電極パッド１１ａに交流の駆動電圧を与え、または駆動電極パッド１１ａと駆動電極パッド１２ａに交流の駆動電圧を与えると、それぞれの第２の弾性変形部３０ａないし３０ｈに設けられた面内駆動部材４１（図４参照）または面内駆動部材４１，４２（図５参照）あるいは面内駆動部材４３，４４（図６参照）が、駆動される。このときの駆動力で、第１の駆動質量部２９ａと第２の駆動質量部２９ｂが、支持基板２の面と平行なＸ−Ｙ平面内においてＸ１−Ｘ２方向（第１の方向）へ駆動される。図７（Ｂ）において矢印（ｉ）（ｉｉ）で示すように、第１の駆動質量部２９ａがＸ１方向へ駆動されるときに第２の駆動質量部２９ｂがＸ２方向へ駆動され、第１の駆動質量部２９ａがＸ２方向へ駆動されるときに第２の駆動質量部２９ｂがＸ１方向へ駆動される。このように、第１の駆動質量部２９ａと第２の駆動質量部２９ｂは、位相が逆となるように振動駆動される。 Next, the operation of the angular velocity sensor 1 will be described.
When the ground electrode pad 13a shown in FIG. 1 is set to the ground potential, an alternating drive voltage is applied to the drive electrode pad 11a, or an alternating drive voltage is applied to the drive electrode pad 11a and the drive electrode pad 12a, each second elasticity The in-plane driving member 41 (see FIG. 4), the in-plane driving members 41 and 42 (see FIG. 5) or the in-plane driving members 43 and 44 (see FIG. 6) provided in the deformable portions 30a to 30h are driven. . With this driving force, the first driving mass unit 29a and the second driving mass unit 29b are driven in the X1-X2 direction (first direction) in the XY plane parallel to the surface of the support substrate 2. Is done. As shown by arrows (i) and (ii) in FIG. 7B, when the first driving mass unit 29a is driven in the X1 direction, the second driving mass unit 29b is driven in the X2 direction, and the first driving mass unit 29a is driven in the X2 direction. When the driving mass unit 29a is driven in the X2 direction, the second driving mass unit 29b is driven in the X1 direction. Thus, the first drive mass unit 29a and the second drive mass unit 29b are driven to vibrate so that the phases are reversed.

駆動中の角速度センサ１が角速度を有して運動し、その角速度のベクトルがＸ−Ｙ平面内に位置しているとき、すなわち、角速度センサ１が、Ｘ−Ｙ平面に垂直なＯｚ軸回りの角速度を有して運動しているとき、第１の駆動質量部２９ａと第２の駆動質量部２９ｂに対して、その駆動時の速度ベクトルと直交する向き（Ｙ１−Ｙ２方向：第２の方向）のコリオリの力が作用する。第１の駆動質量部２９ａと第２の駆動質量部２９ｂが互いに逆向きの速度ベクトルを有して運動するため、第１の駆動質量部２９ａと第２の駆動質量部２９ｂに対してＹ１−Ｙ２方向への互いに逆向きのコリオリ力が作用する。 When the angular velocity sensor 1 being driven moves with an angular velocity and the vector of the angular velocity is located in the XY plane, that is, the angular velocity sensor 1 moves around the Oz axis perpendicular to the XY plane. When moving at an angular velocity, the first drive mass unit 29a and the second drive mass unit 29b are oriented in the direction perpendicular to the velocity vector at the time of driving (Y1-Y2 direction: second direction). ) Coriolis force acts. Since the first driving mass unit 29a and the second driving mass unit 29b move with velocity vectors opposite to each other, they are Y1- with respect to the first driving mass unit 29a and the second driving mass unit 29b. Coriolis forces opposite to each other in the Y2 direction act.

第１の駆動質量部２９ａと第２の駆動質量部２９ｂに作用するコリオリ力は、第２の弾性変形部３０ａないし３０ｈを介して検出回動部２６に作用する。第１の駆動質量部２９ａに作用するコリオリ力と、第２の駆動質量部２９ｂに作用するコリオリ力は、Ｙ方向において互いに逆向きである。そのため、検出回動部２６に偶力が作用し、検出回動部２６が、図７（Ｂ）において（ｉｉｉ）（ｉｖ）で示すように、垂直軸Ｏｚ回りに回動振動を生じる。この回動振動により、それぞれの可動電極部２８と第１の固定電極部２３との対向距離および静電容量が変化し、可動電極部２８と第２の固定電極部２４との対向距離および静電容量が変化する。 The Coriolis force acting on the first drive mass unit 29a and the second drive mass unit 29b acts on the detection rotation unit 26 via the second elastic deformation units 30a to 30h. The Coriolis force acting on the first drive mass unit 29a and the Coriolis force acting on the second drive mass unit 29b are opposite to each other in the Y direction. Therefore, a couple of forces acts on the detection rotation unit 26, and the detection rotation unit 26 generates a rotation vibration about the vertical axis Oz as shown by (iii) and (iv) in FIG. 7B. Due to this rotational vibration, the opposing distance and electrostatic capacity of each movable electrode portion 28 and the first fixed electrode portion 23 change, and the opposing distance and static electricity between the movable electrode portion 28 and the second fixed electrode portion 24 change. The capacitance changes.

図１に示す通電電極パッド１４ａには、パルス状の電圧が与えられ、この電圧は、通電シード層１４からシリコンの固定支持部２２ｃに与えられる。パルス状の電圧は、第１の弾性変形部２５ｃを通じて、シリコン製の検出回動部２６に与えられ、さらに可動電極部２８に与えられる。電圧のパルスの立ち上がり時に第１の固定電極部２３に短時間に流れる電流の電流値は、可動電極部２８と第１の固定電極部２３との間の静電容量の変化に応じて変動し、これは第２の固定電極部２４に流れる電流においても同じである。第１の固定電極部２３の検知出力と第２の固定電極部２４の検知出力との差を求めることで、検出回動部２６の回動時の振幅を検知でき、これにより角速度を換算することが可能になる。 A pulse voltage is applied to the energizing electrode pad 14a shown in FIG. 1, and this voltage is applied from the energizing seed layer 14 to the silicon fixed support portion 22c. The pulse voltage is applied to the silicon detection rotation unit 26 through the first elastic deformation unit 25 c and further to the movable electrode unit 28. The current value of the current that flows in the first fixed electrode portion 23 in a short time at the rising edge of the voltage pulse fluctuates in accordance with the change in the capacitance between the movable electrode portion 28 and the first fixed electrode portion 23. This also applies to the current flowing through the second fixed electrode portion 24. By obtaining the difference between the detection output of the first fixed electrode portion 23 and the detection output of the second fixed electrode portion 24, the amplitude at the time of rotation of the detection rotation portion 26 can be detected, thereby converting the angular velocity. It becomes possible.

第２の弾性変形部３０ａないし３０ｈは、図４ないし図６に示すいわゆるラーメン構造であり、Ｙ方向の剛性が高い。そのため、第１の駆動質量部２９ａと第２の駆動質量部２９ｂにＹ１−Ｙ２方向のコリオリ力が作用したときに、第２の弾性変形部３０ａないし３０ｈが座屈することなく、その力が検出回動部２６に与えられる。よって、第１の駆動質量部２９ａと第２の駆動質量部２９ｂおよび検出回動部２６が一体となって（ｉｉｉ）（ｉｖ）方向へ回動できるようになる。 The second elastic deformation portions 30a to 30h have a so-called ramen structure shown in FIGS. 4 to 6 and have high Y-direction rigidity. Therefore, when Coriolis force in the Y1-Y2 direction is applied to the first driving mass unit 29a and the second driving mass unit 29b, the second elastic deformation units 30a to 30h are detected without buckling. The rotation unit 26 is given. Therefore, the first drive mass unit 29a, the second drive mass unit 29b, and the detection rotation unit 26 can be integrally rotated in the (iii) and (iv) directions.

本発明の実施の形態の角速度センサの全体構造を示す平面図、The top view which shows the whole structure of the angular velocity sensor of embodiment of this invention, 図１に示す角速度センサをＩＩ−ＩＩ線で切断した断面図、Sectional drawing which cut | disconnected the angular velocity sensor shown in FIG. 1 by the II-II line | wire, （Ａ）は、検出回動部における駆動質量部の支持構造を拡大して示す平面図、（Ｂ）は（Ａ）をＢ−Ｂ線で切断した断面図、(A) is a plan view showing an enlarged support structure of the drive mass unit in the detection rotation unit, (B) is a cross-sectional view taken along line BB of (A), （Ａ）は、第２の弾性変形部と面内駆動手段を拡大して示す平面図、（Ｂ）は前記第２の弾性変形部の変形動作を示す説明図、(A) is a plan view showing the second elastic deformation portion and the in-plane driving means in an enlarged manner, (B) is an explanatory view showing the deformation operation of the second elastic deformation portion, （Ａ）は、他の実施の形態の第２の弾性変形部と面内駆動手段を拡大して示す平面図、（Ｂ）は前記第２の弾性変形部の変形動作を示す説明図、(A) is an enlarged plan view showing a second elastic deformation part and in-plane driving means of another embodiment, (B) is an explanatory view showing the deformation operation of the second elastic deformation part, （Ａ）は、さらに他の実施の形態の第２の弾性変形部と面内駆動手段を拡大して示す平面図、（Ｂ）は前記第２の弾性変形部の変形動作を示す説明図、(A) is an enlarged plan view showing a second elastic deformation portion and in-plane driving means of still another embodiment, (B) is an explanatory view showing the deformation operation of the second elastic deformation portion, （Ａ）は駆動質量部と検出回動部および可動電極部を示す平面図、（Ｂ）は動作説明図、(A) is a plan view showing a drive mass unit, a detection rotation unit, and a movable electrode unit, (B) is an operation explanatory diagram,

Explanation of symbols

１角速度センサ
２支持基板
３第１の絶縁層
４閉鎖部材
５第２の絶縁層
７動作空間
１１，１２，１３，１４，１５，１６リード層
１１ａ，１２ａ，１３ａ，１４ａ，１５ａ，１６ａ電極パッド
２０機能層
２２ａ，２２ｂ，２２ｃ，２２ｄ固定支持部
２３第１の固定電極部
２４第２の固定電極部
２５ａ，２５ｂ，２５ｃ，２５ｄ第１の弾性変形部
２６検出回動部（支持部）
２８可動電極部
２９ａ第１の駆動質量部
２９ｂ第２の駆動質量部
３０ａ，３０ｂ，３０ｃ，３０ｄ，３０ｅ，３０ｆ，３０ｇ，３０ｈ第２の弾性変形部
３１基端連結部
３２先端連結部
３３第１の梁
３４第２の梁
４１，４２，４３，４４面内駆動部材 DESCRIPTION OF SYMBOLS 1 Angular velocity sensor 2 Support substrate 3 1st insulating layer 4 Closing member 5 2nd insulating layer 7 Operation | movement space 11, 12, 13, 14, 15, 16 Lead layer 11a, 12a, 13a, 14a, 15a, 16a Electrode pad 20 functional layers 22a, 22b, 22c, 22d fixed support portion 23 first fixed electrode portion 24 second fixed electrode portions 25a, 25b, 25c, 25d first elastic deformation portion 26 detection rotation portion (support portion)
28 Movable electrode part 29a 1st drive mass part 29b 2nd drive mass part 30a, 30b, 30c, 30d, 30e, 30f, 30g, 30h 2nd elastic deformation part 31 Base end connection part 32 Tip connection part 33 1st One beam 34 Second beam 41, 42, 43, 44 In-plane drive member

Claims

A mass part, an elastically deformable part that supports the mass part so as to be reciprocally movable in a first direction, a drive member that reciprocally vibrates the mass part in the first direction, and the mass part moved with an angular velocity. An angular velocity sensor having a detection unit that detects a force acting in a second direction that is sometimes orthogonal to the first direction,
The elastic deformation portion includes a proximal end coupling portion fixed to the support portion, a distal end coupling portion coupled to the mass portion, and the second direction between the distal end coupling portion and the proximal end coupling portion. And at least two beams extending in parallel along
The angular velocity sensor according to claim 1, wherein when the mass portion is reciprocally vibrated in the first direction by the driving member, each of the beams is bent and deformed in a vibration direction of the mass portion.

The angular velocity sensor according to claim 1, wherein a connecting beam for connecting adjacent beams is provided between the base end connecting portion and the tip connecting portion.

3. The driving member is a piezoelectric element provided on at least one beam, and the plurality of beams are bent and deformed by an electrostrictive effect of the piezoelectric element, and the mass portion is reciprocally oscillated. Angular velocity sensor.

The angular velocity sensor according to claim 1, wherein the support portion is moved by a force acting in the second direction with respect to the mass portion, and the movement of the support portion is detected by the detection portion.

Two mass parts are supported by the support part via the elastic deformation part, and the two mass parts are driven to vibrate in opposite phases by the driving member, and the mass part is The angular velocity sensor according to claim 4, wherein the support portion is rotated by a force acting in the second direction, and the rotation of the support portion is detected by the detection portion.

An SOI layer in which two Si layers are bonded via an insulating layer is used, one Si layer is used as the support substrate, and the other Si layer is used as a functional layer, from the functional layer, the mass The insulating layer is removed between the mass portion and the support substrate and between the elastic deformation portion and the support substrate. The angular velocity sensor according to any one of the above.