JP2010095695A - Curable composition for forming layer with low reflective index - Google Patents
Curable composition for forming layer with low reflective index Download PDFInfo
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- JP2010095695A JP2010095695A JP2009028290A JP2009028290A JP2010095695A JP 2010095695 A JP2010095695 A JP 2010095695A JP 2009028290 A JP2009028290 A JP 2009028290A JP 2009028290 A JP2009028290 A JP 2009028290A JP 2010095695 A JP2010095695 A JP 2010095695A
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- compound
- meth
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- curable composition
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 88
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- 239000011737 fluorine Substances 0.000 claims abstract description 32
- 125000000962 organic group Chemical group 0.000 claims abstract description 8
- 125000005842 heteroatom Chemical group 0.000 claims abstract description 7
- 125000001424 substituent group Chemical group 0.000 claims abstract description 7
- 125000002723 alicyclic group Chemical group 0.000 claims abstract description 6
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 6
- 125000003118 aryl group Chemical group 0.000 claims abstract description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 52
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims description 23
- 239000002904 solvent Substances 0.000 claims description 23
- 230000015572 biosynthetic process Effects 0.000 claims description 17
- 229920000642 polymer Polymers 0.000 claims description 9
- RWRIWBAIICGTTQ-UHFFFAOYSA-N difluoromethane Chemical group FCF RWRIWBAIICGTTQ-UHFFFAOYSA-N 0.000 claims description 8
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 claims description 6
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 6
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- 238000005227 gel permeation chromatography Methods 0.000 claims description 4
- 230000003373 anti-fouling effect Effects 0.000 abstract description 18
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- 125000000217 alkyl group Chemical group 0.000 abstract description 11
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 abstract 2
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- 239000007787 solid Substances 0.000 description 30
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- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 10
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- 238000005481 NMR spectroscopy Methods 0.000 description 10
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 10
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- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 8
- 239000012975 dibutyltin dilaurate Substances 0.000 description 8
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 8
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 7
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- 150000002009 diols Chemical class 0.000 description 7
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- 239000003505 polymerization initiator Substances 0.000 description 7
- 150000003254 radicals Chemical class 0.000 description 7
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 7
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 6
- 229920006294 polydialkylsiloxane Polymers 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 229940126214 compound 3 Drugs 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 239000012847 fine chemical Substances 0.000 description 5
- 229920002635 polyurethane Polymers 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- 238000010992 reflux Methods 0.000 description 5
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
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- 229940125904 compound 1 Drugs 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 4
- 230000001771 impaired effect Effects 0.000 description 4
- 239000010954 inorganic particle Substances 0.000 description 4
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 4
- 239000003550 marker Substances 0.000 description 4
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- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 3
- PCKZAVNWRLEHIP-UHFFFAOYSA-N 2-hydroxy-1-[4-[[4-(2-hydroxy-2-methylpropanoyl)phenyl]methyl]phenyl]-2-methylpropan-1-one Chemical compound C1=CC(C(=O)C(C)(O)C)=CC=C1CC1=CC=C(C(=O)C(C)(C)O)C=C1 PCKZAVNWRLEHIP-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
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- 125000005442 diisocyanate group Chemical group 0.000 description 3
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- 125000001153 fluoro group Chemical group F* 0.000 description 3
- 125000003709 fluoroalkyl group Chemical group 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
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- 239000012948 isocyanate Substances 0.000 description 3
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 description 3
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- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 description 2
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- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
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- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
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- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
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- 239000002023 wood Substances 0.000 description 1
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Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Description
本発明は、低屈折率層形成用硬化性組成物に関する。さらに詳しくは、特定の構造を有するスリップ剤を含有する低屈折率層形成用硬化性組成物に関する。 The present invention relates to a curable composition for forming a low refractive index layer. More specifically, the present invention relates to a curable composition for forming a low refractive index layer containing a slip agent having a specific structure.
近年、プラスチック(ポリカーボネート、ポリメチルメタクリレート、ポリスチレン、ポリエステル、ポリオレフィン、エポキシ樹脂、メラミン樹脂、トリアセチルセルロース樹脂、ABS樹脂、AS樹脂、ノルボルネン系樹脂等)、金属、木材、紙、ガラス、スレート等の各種基材表面の傷付き(擦傷)防止や汚染防止のための保護コ−ティング材及び反射防止膜用コート材として、優れた塗工性を有し、かつ各種基材の表面に、硬度、耐擦傷性、防汚性、耐摩耗性、表面滑り性、低カール性、密着性、透明性、耐薬品性及び塗膜面の外観のいずれにも優れた硬化膜を形成し得る硬化性組成物が要請されている。 In recent years, plastics (polycarbonate, polymethyl methacrylate, polystyrene, polyester, polyolefin, epoxy resin, melamine resin, triacetyl cellulose resin, ABS resin, AS resin, norbornene resin, etc.), metal, wood, paper, glass, slate, etc. As a protective coating material and anti-reflection coating material for preventing scratches (abrasion) on various substrate surfaces and preventing contamination, it has excellent coating properties, and the surface of each substrate has hardness, Curing composition capable of forming a cured film excellent in any of scratch resistance, antifouling property, abrasion resistance, surface slipperiness, low curling property, adhesion, transparency, chemical resistance and appearance of coating surface Things are requested.
このような要請を満たすため、種々の組成物が提案されているが、硬化性組成物として優れた塗工性を有し、硬化膜とした場合に、高硬度及び耐擦傷性を有し、透明性に優れ、さらに防汚性にも優れるという特性を備えたものはまだ得られていないのが現状である。
防汚性を付与する方法として、例えば、特許文献1に、(メタ)アクリロイル基を有するポリシロキサンを配合した硬化性組成物記載されているが、油性マーカーの拭き取り性の観点からはさらに改良の余地があった。
In order to satisfy such a request, various compositions have been proposed, but have excellent coating properties as a curable composition, and when it is a cured film, has high hardness and scratch resistance, At present, no product with the characteristics of excellent transparency and antifouling properties has been obtained.
As a method for imparting antifouling properties, for example, Patent Document 1 describes a curable composition containing a polysiloxane having a (meth) acryloyl group, but it is further improved from the viewpoint of the wipeability of oily markers. There was room.
特許文献2は、反射防止膜表面の滑り性を改善でき、かつ非フッ素系の汎用溶剤に可溶で、薄膜形成の容易な反射防止膜形成用組成物を開示している。この反射防止膜形成用組成物は、反応性表面改質剤(I)及び反射防止膜材料(II)からなる組成物であって、そのうち、反応性表面改質剤(I)が、(A)ジイソシアネートを3量体化させたトリイソシアネートと(B)少なくとも2種の活性水素含有化合物との反応生成物からなる反応性基含有組成物であり、成分(B)が、(B−1)少なくとも1つの活性水素を有するパーフルオロポリエーテル、及び(B−2)活性水素と自己架橋性官能基を有するモノマーを含んでなる組成物からなっている。このような反応性表面改質剤(I)を添加することにより、反射防止膜の表面性状、特に表面滑り性(低摩擦係数化)、表面硬度、耐磨耗性、耐薬品性、汚染拭き取り性、撥水性、撥油性、耐溶剤性等を改善し、本来の塗膜の表面に改質された表面性状を付与することができると記載されている。 Patent Document 2 discloses a composition for forming an antireflection film that can improve the slipperiness of the surface of the antireflection film, is soluble in a non-fluorine general-purpose solvent, and is easy to form a thin film. This composition for forming an antireflection film is a composition comprising a reactive surface modifier (I) and an antireflection film material (II), of which the reactive surface modifier (I) is (A A reactive group-containing composition comprising a reaction product of a triisocyanate trimerized from a diisocyanate and (B) at least two active hydrogen-containing compounds, wherein the component (B) is (B-1) The composition comprises a perfluoropolyether having at least one active hydrogen and (B-2) a monomer having an active hydrogen and a self-crosslinkable functional group. By adding such a reactive surface modifier (I), the surface properties of the antireflection film, especially surface slipperiness (lower coefficient of friction), surface hardness, wear resistance, chemical resistance, contamination wiping It is described that the surface property improved by improving the property, water repellency, oil repellency, solvent resistance, etc. can be imparted to the surface of the original coating film.
しかしながら、従来の反射防止膜形成用組成物では、耐摩耗性が十分ではなく、さらに耐擦傷性、防汚性についてもさらなる改良が必要であった。
本発明は上述の問題に鑑みなされたものであり、屈折率が低く、優れた耐擦傷性、防汚性のみでなく、優れた耐摩耗性をも同時に有する硬化膜を与える硬化性組成物を提供することを目的とする。
However, the conventional antireflection film-forming composition does not have sufficient abrasion resistance, and further improvements in scratch resistance and antifouling properties are necessary.
The present invention has been made in view of the above-mentioned problems, and provides a curable composition that provides a cured film having a low refractive index and not only excellent scratch resistance and antifouling properties but also excellent wear resistance at the same time. The purpose is to provide.
上記目的を達成するため本発明者らは鋭意研究を行い、得られる硬化膜のマトリクスを形成する(メタ)アクリロイル基を有する化合物、滑り性を改善するための含フッ素化合物及び/又は硬度を改善するための中空シリカ粒子を含有する低屈折率層形成用硬化性組成物に、分子内にパーフルオロポリエーテル基及びジアルキルシロキサン基を有する化合物を配合することにより、上記目的を達成しうることを見出し、本発明を完成させた。 In order to achieve the above object, the present inventors have intensively studied and improved the compound having a (meth) acryloyl group forming a matrix of the resulting cured film, a fluorine-containing compound and / or hardness for improving slipperiness. It is possible to achieve the above-mentioned object by blending a compound having a perfluoropolyether group and a dialkylsiloxane group in the molecule with a curable composition for forming a low refractive index layer containing hollow silica particles. The headline and the present invention were completed.
即ち、本発明は下記の低屈折率層形成用硬化性組成物、硬化膜及び反射防止膜を提供する。
1.下記成分(A)及び(B)を含有する低屈折率層形成用硬化性組成物。(A)下記一般式(A−1)で示される化合物
(B)エチレン性不飽和基を2個以上含有しフッ素含量が20質量%以上の、前記(A)以外の化合物
2.下記成分(A)と、成分(B)及び(C)からなる群から選ばれる少なくとも1種と、成分(D)とを含有する低屈折率層形成用硬化性組成物。(A)下記一般式(A−1)で示される化合物、
(B)エチレン性不飽和基を2個以上含有しフッ素含量が20質量%以上の、前記(A)以外の化合物
(C)エチレン性不飽和基を2個以上有しフッ素を含まない化合物
(D)空洞を有するシリカ粒子
3.前記(B)が、エチレン性不飽和基を2個以上含有し、ゲルパーミエーションクロマトグラフィーで測定した数平均分子量が5000以上であり、フッ素含量が30質量%以上の重合体を含有する上記1又は2に記載の低屈折率層形成用硬化性組成物。4.上記成分(A)の配合量が、溶剤を除く成分の合計を100質量%としたとき、1〜10質量%である上記1〜3のいずれかに記載の低屈折率層形成用硬化性組成物。5.上記1〜4のいずれかに記載の低屈折率層形成用硬化性組成物を硬化させてなる硬化膜。6.上記5に記載の硬化膜を低屈折率層として含む反射防止膜。
That is, the present invention provides the following curable composition for forming a low refractive index layer, a cured film and an antireflection film.
1. A curable composition for forming a low refractive index layer containing the following components (A) and (B). (A) Compound represented by the following general formula (A-1)
(B) A compound other than the above (A) having two or more ethylenically unsaturated groups and a fluorine content of 20% by mass or more. A curable composition for forming a low refractive index layer, comprising at least one selected from the group consisting of the following component (A), components (B) and (C), and component (D). (A) a compound represented by the following general formula (A-1),
(B) Compound other than (A) containing two or more ethylenically unsaturated groups and having a fluorine content of 20% by mass or more (C) Compound having two or more ethylenically unsaturated groups and containing no fluorine ( D) Silica particles having cavities3. The above (B) contains 2 or more ethylenically unsaturated groups, a polymer having a number average molecular weight measured by gel permeation chromatography of 5000 or more and a fluorine content of 30% by mass or more. Or the curable composition for low-refractive-index layer formation of 2. 4). The curable composition for forming a low refractive index layer according to any one of 1 to 3 above, wherein the amount of the component (A) is 1 to 10% by mass when the total amount of components excluding the solvent is 100% by mass. object. 5). The cured film formed by hardening | curing the curable composition for low-refractive-index layer formation in any one of said 1-4. 6). 6. An antireflection film comprising the cured film as described in 5 above as a low refractive index layer.
本発明の低屈折率層形成用硬化性組成物は、屈折率が低く、優れた耐擦傷性、防汚性のみでなく、優れた耐摩耗性をも同時に有する硬化膜を製造することができる。 The curable composition for forming a low refractive index layer of the present invention has a low refractive index, and can produce a cured film having not only excellent scratch resistance and antifouling properties but also excellent wear resistance at the same time. .
以下、本発明の低屈折率層形成用硬化性組成物及びそれを硬化してなる硬化膜について具体的に説明する。 Hereinafter, the curable composition for forming a low refractive index layer of the present invention and the cured film obtained by curing the same will be described in detail.
I.低屈折率層形成用硬化性組成物
本発明の低屈折率層形成用硬化性組成物(以下、本発明の組成物という)は、(A)パーフルオロポリエーテル基、ポリジアルキルシロキサン基及び2個以上の(メタ)アクリロイル基を含有する化合物を含有することを特徴とする。
低屈折率層を形成するための組成物として、空洞を有するシリカ粒子と硬化性成分、又は、フッ素を含有する硬化成分、或いはこれらの両方で形成することができる。
I. Curable composition for forming a low refractive index layer The curable composition for forming a low refractive index layer of the present invention (hereinafter referred to as the composition of the present invention) comprises (A) a perfluoropolyether group, a polydialkylsiloxane group, and 2 It contains a compound containing one or more (meth) acryloyl groups.
The composition for forming the low refractive index layer can be formed with silica particles having cavities and a curable component, or a curable component containing fluorine, or both.
従って、本発明の組成物は、具体的には次の構成(態様)を有する。
(1)成分(A)+(B)(実施例1〜9、11〜15に相当)(以下、態様(1)という)
(2)成分(A)+成分(B)及び(C)からなる群から選ばれる少なくとも1種+成分(D)(実施例1〜12に相当)(以下、態様(2)という)
各成分は、以下の通りである。
(A)パーフルオロポリエーテル基、ポリジアルキルシロキサン基及び2個以上の(メタ)アクリロイル基を含有する化合物
(B)エチレン性不飽和基を2個以上含有しフッ素含量が20質量%以上の、前記(A)以外の化合物
(C)(メタ)アクリロイル基を2個以上含有するフッ素を含有しない化合物
(D)空洞を有するシリカ粒子
Therefore, the composition of the present invention specifically has the following constitution (embodiment).
(1) Component (A) + (B) (corresponding to Examples 1 to 9, 11 to 15) (hereinafter referred to as embodiment (1))
(2) At least one selected from the group consisting of component (A) + component (B) and (C) + component (D) (corresponding to Examples 1 to 12) (hereinafter referred to as embodiment (2))
Each component is as follows.
(A) a compound containing a perfluoropolyether group, a polydialkylsiloxane group and two or more (meth) acryloyl groups (B) containing two or more ethylenically unsaturated groups and having a fluorine content of 20% by mass or more, Compound other than (A) (C) A compound containing two or more (meth) acryloyl groups and containing no fluorine (D) A silica particle having a cavity
本発明の組成物は、上記成分(A)〜(D)の他、さらに目的に応じて下記成分(E)〜(H)を含み得る。
(E)ラジカル重合開始剤
(F)有機溶剤
(G)中実シリカ粒子
(H)添加剤
以下、各成分について説明するが、先ず本発明の特徴である成分(A)について説明した後、残りの成分を順次説明する。
The composition of the present invention may further contain the following components (E) to (H) depending on the purpose in addition to the components (A) to (D).
(E) Radical polymerization initiator (F) Organic solvent (G) Solid silica particle (H) additive Hereinafter, each component will be described. First, the component (A) which is a feature of the present invention will be described, and then the rest These components will be described sequentially.
(A)パーフルオロポリエーテル基、ポリジアルキルシロキサン基及び2個以上の(メタ)アクリロイル基を含有する化合物
本発明の組成物における成分(A)は、パーフルオロポリエーテル基、ポリジアルキルシロキサン基及び2個以上の(メタ)アクリロイル基を有する化合物である。成分(A)を配合することにより、得られる硬化膜の耐擦傷性、防汚性、さらに耐摩耗性を改善することができる。
(A) Compound containing perfluoropolyether group, polydialkylsiloxane group and two or more (meth) acryloyl groups Component (A) in the composition of the present invention comprises perfluoropolyether group, polydialkylsiloxane group and It is a compound having two or more (meth) acryloyl groups. By mix | blending a component (A), the abrasion resistance of a cured film obtained, antifouling property, and also abrasion resistance can be improved.
成分(A)は、パーフルオロポリエーテル基、ポリジアルキルシロキサン基及び2個以上の(メタ)アクリロイル基を有する化合物であれば特に限定されないが、下記一般式(1)で示される構造を有するものであることが好ましい。
[式(1)中、R11はそれぞれ独立に炭素数1〜3のアルキル基であり、R12は置換基を有していてもよい2価の脂肪族基、脂環族基又は芳香族基であり、R13はそれぞれ独立に単結合、メチレン基又はエチレン基であり、R14及びR15はそれぞれ独立にフッ化メチレン基又は炭素数2〜4のパーフルオロアルキレン基であり、R17は(メタ)アクリロイル基を有する基であり、R18はヘテロ原子を含んでいてもよい3価の有機基であり、mは10〜100の整数であり、nは5〜50の整数である。] [In Formula (1), R < 11 > is a C1-C3 alkyl group each independently, and R < 12 > is the bivalent aliphatic group, alicyclic group, or aromatic which may have a substituent. R 13 is each independently a single bond, a methylene group or an ethylene group, R 14 and R 15 are each independently a methylene fluoride group or a C 2-4 perfluoroalkylene group, R 17 Is a group having a (meth) acryloyl group, R 18 is a trivalent organic group which may contain a hetero atom, m is an integer of 10 to 100, and n is an integer of 5 to 50. . ]
R11はそれぞれ独立に炭素数1〜3のアルキル基であり、メチル基であることが好ましい。
mは10〜100の整数であり、好ましくは10〜80の整数である。mが10より小さいと、塗膜を形成した際に十分な耐擦傷性が得られないおそれがあり、100より大きいと、溶剤への溶解性が損なわれるおそれがある。
nは5〜50の整数であり、好ましくは10〜30の整数である。nが5より小さいと、十分な防汚性能が得られないおそれがあり、50より大きいと、溶剤への溶解性が損なわれるおそれがある。
R13はそれぞれ独立に単結合、メチレン基又はエチレン基である。
R14及びR15はそれぞれ独立にフッ化メチレン基又は炭素数2〜4のパーフルオロアルキレン基であり、好ましくは、パーフルオロエチレン基、パーフルオロプロピレン基である。
R17は、(メタ)アクリロイル基を有する基であり、好ましくは、2個以上の(メタ)アクリロイル基を有する基であり、より具体的には、ペンタエリスリトールトリ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート又はトリペンタエリスリトールヘプタアクリレート等から水酸基を除いた構造に由来する基である。
R 11 is each independently an alkyl group having 1 to 3 carbon atoms, and is preferably a methyl group.
m is an integer of 10 to 100, preferably an integer of 10 to 80. If m is smaller than 10, sufficient scratch resistance may not be obtained when a coating film is formed, and if it is larger than 100, solubility in a solvent may be impaired.
n is an integer of 5 to 50, preferably an integer of 10 to 30. If n is smaller than 5, sufficient antifouling performance may not be obtained, and if it is larger than 50, solubility in a solvent may be impaired.
R 13 is each independently a single bond, a methylene group or an ethylene group.
R 14 and R 15 are each independently a methylene fluoride group or a C 2-4 perfluoroalkylene group, preferably a perfluoroethylene group or a perfluoropropylene group.
R 17 is a group having a (meth) acryloyl group, preferably a group having two or more (meth) acryloyl groups, and more specifically, pentaerythritol tri (meth) acrylate, dipentaerythritol. It is a group derived from a structure in which a hydroxyl group is removed from penta (meth) acrylate or tripentaerythritol heptaacrylate.
pは1又は2である。R18はヘテロ原子を含んでいてもよいp+1価の有機基であり、具体的には、ジイソシアネート化合物又はトリイソシアネート化合物のイソシアネート基を除いた構造に由来する基である。 p is 1 or 2. R 18 is a p + 1 valent organic group which may contain a hetero atom, and specifically, a group derived from a structure excluding an isocyanate group of a diisocyanate compound or a triisocyanate compound.
成分(A)の化合物の質量平均分子量は、通常2,500〜10,000の範囲内であり、2,500〜9,000の範囲内であることが好ましい。ここで、分子量はゲルパーミエーションクロマトグラフ法によって測定する。 The mass average molecular weight of the component (A) compound is usually in the range of 2,500 to 10,000, and preferably in the range of 2,500 to 9,000. Here, the molecular weight is measured by gel permeation chromatography.
成分(A)の化合物は、例えば下記(a)〜(d)の製造工程を経ることで製造することができる。
(a)下記一般式(Aa)
OCN−R12−NCO (Ab)
[式(Ab)中、R12は式(1)で定義した通りである。]
とを反応させる工程。
(b)上記(a)で得られた化合物と下記一般式(Ac)
HO−R13−R14−O−(R15O)n−R14−R13−OH (Ac)
[式(Ac)中、R13、R14、R15及びnは式(1)で定義した通りである。]で示されるパーフルオロポリエーテルジオールを反応させる工程。
(c)上記(b)で得られた化合物とジイソシアネート化合物(Ad1)又はトリイソシアネート化合物(Ad2)を反応させる工程。
(d)上記(c)で反応させる化合物がジイソシアネート化合物(Ad1)の場合は、ペンタエリスリトールトリ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート等の、水酸基及び2個以上の(メタ)アクリロイル基を有する化合物(De1)を、上記(c)で反応させる化合物がトリイソシアネート化合物(Ad2)である場合は、ヒドロキシエチル(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート等の、水酸基及1個以上の(メタ)アクリロイル基を有する化合物(Ae2)を反応させる工程。
The compound of component (A) can be produced, for example, through the following production steps (a) to (d).
(A) The following general formula (Aa)
[In formula (Ab), R 12 is as defined in formula (1). ]
And the step of reacting.
(B) The compound obtained in (a) above and the following general formula (Ac)
HO-R 13 -R 14 -O- ( R 15 O) n -R 14 -R 13 -OH (Ac)
[In the formula (Ac), R 13 , R 14 , R 15 and n are as defined in the formula (1). ] The process with which perfluoropolyetherdiol shown by this is made to react.
(C) A step of reacting the compound obtained in (b) above with a diisocyanate compound (Ad1) or a triisocyanate compound (Ad2).
(D) When the compound to be reacted in (c) is a diisocyanate compound (Ad1), a hydroxyl group and two or more (meth) acryloyl such as pentaerythritol tri (meth) acrylate and dipentaerythritol penta (meth) acrylate When the compound (De1) having a group is reacted in (c) above is a triisocyanate compound (Ad2), hydroxyethyl (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol penta (meth) ) A step of reacting a compound (Ae2) having a hydroxyl group and one or more (meth) acryloyl groups, such as acrylate.
より具体的には、ポリジメチルシロキサン基を有するアルコール化合物(Aa)をメチルエチルケトン等の溶剤で希釈し、又は無溶剤にて、ジイソシアネート化合物(Ab)と混合する。水浴にて10〜20℃に冷却したのち、ジラウリル酸ジブチル錫等のルイス酸触媒を添加し、15〜30℃で1〜3時間撹拌する。その後水浴にて10〜20℃に冷却し、パーフルオロポリエーテルを有するジオール化合物(Ac)のメチルエチルケトン溶液、又は無溶剤にて添加し、40〜65℃で1〜3時間撹拌する。反応器を水浴にて10〜20℃に冷却し、ジイソシアネート化合物(Ad1)又はトリイソシアネート化合物(Ad2)を添加し、15〜30℃で1〜3時間攪拌する。水浴にて10〜20℃に冷却し、(メタ)アクリロイル基と1つの水酸基を有する化合物(Ae1)又は(Ae2)を混合し、45〜65℃で3〜6時間反応させることで製造することができる。 More specifically, the alcohol compound (Aa) having a polydimethylsiloxane group is diluted with a solvent such as methyl ethyl ketone, or mixed with the diisocyanate compound (Ab) without solvent. After cooling to 10 to 20 ° C. in a water bath, a Lewis acid catalyst such as dibutyltin dilaurate is added and stirred at 15 to 30 ° C. for 1 to 3 hours. Thereafter, the mixture is cooled to 10 to 20 ° C. in a water bath, added with a methyl ethyl ketone solution of the diol compound (Ac) having perfluoropolyether or without solvent, and stirred at 40 to 65 ° C. for 1 to 3 hours. The reactor is cooled to 10 to 20 ° C. in a water bath, a diisocyanate compound (Ad1) or a triisocyanate compound (Ad2) is added, and the mixture is stirred at 15 to 30 ° C. for 1 to 3 hours. Manufacture by cooling to 10 to 20 ° C. in a water bath, mixing a compound (Ae1) or (Ae2) having a (meth) acryloyl group and one hydroxyl group, and reacting at 45 to 65 ° C. for 3 to 6 hours. Can do.
上記一般式(Aa)で示されるポリジアルキルシロキサンモノアルコールとしては、公知の化合物を使用することができ、市販品の例としては、サイラプレーンFM0411(m=10〜15)、FM0421(m=65〜75)(チッソ社製)等が挙げられる。 As the polydialkylsiloxane monoalcohol represented by the general formula (Aa), a known compound can be used. Examples of commercially available products include Silaplane FM0411 (m = 10 to 15), FM0421 (m = 65). -75) (made by Chisso Corporation) and the like.
上記一般式(Ab)又は(Ad1)で示されるジイソシアネート化合物としては、脂肪族ジイソシアネートとしては、ヘキサメチレンジイソシアネート等が挙げられ、脂環族ジイソシアネートとしては、イソホロンジイソシアネート等が挙げられ、芳香族ジイソシアネートとしては、トリレンジイソシアネート、フェニレンジイソシアネート等が挙げられる。好ましくは、芳香族ジイソシアネートである。(Ab)と(Ad1)は同一の化合物を使用してもよいし、異なる化合物を使用してもよい。 Examples of the diisocyanate compound represented by the general formula (Ab) or (Ad1) include hexamethylene diisocyanate as the aliphatic diisocyanate, and isophorone diisocyanate as the alicyclic diisocyanate. Includes tolylene diisocyanate, phenylene diisocyanate, and the like. Aromatic diisocyanates are preferred. (Ab) and (Ad1) may use the same compound or different compounds.
上記一般式(Ac)で示されるパーフルオロポリエーテルジオールとしては、パーフルオロポリアルキレンオキシドの両末端に水酸基を有する化合物であれば特に限定されないが、パーフルオロポリエチレンオキシドの末端ジオール化合物、パーフルオロポリプロピレンオキシドの末端ジオール化合物が好ましい。
また、上記一般式(Ac)で示されるパーフルオロポリエーテルジオールの市販品の例としては、Fluorolink D10H、Fluorolink D10H(ソルベイソレクシス社製)等が挙げられる。
The perfluoropolyether diol represented by the general formula (Ac) is not particularly limited as long as it is a compound having hydroxyl groups at both ends of the perfluoropolyalkylene oxide, but the terminal diol compound of perfluoropolyethylene oxide, perfluoropolypropylene Oxide terminal diol compounds are preferred.
Examples of commercially available perfluoropolyether diols represented by the above general formula (Ac) include Fluorolink D10H, Fluorolink D10H (manufactured by Solvay Solexis) and the like.
上記(Ad2)のトリイソシアネート化合物としては、リジンエステルトリイソシアネート、1,4,8−トリイソジアネートオクタン、1,6,11−トリイソシアネートウンデカン、1,8−ジイソシアネート−4−イソシアネートメチルオクタン、1,3,6−トリイソシアネートへキサン、2,5,7−トリメチル−1,8−ジイソシアネート−5−イソシアネートメチルオクタン、1,3,5−トリイソシアネートシクロヘキサン、1,3,5−トリメチルイソシアネートシクロヘキサン、2−(3−イソシアネートプロピル)−2,5−ジ(イソシアネートメチル)−ビシクロ(2,2,1)ヘプタン、2−(3−イソシアネートプロピル)−2,6−ジ(イソシアネートメチル)−ビシクロ(2,2,1)ヘプタン、3−(3−イソシアネートプロピル)−2,5−ジ(イソシアネートメチル)−ビシクロ(2,2,1)ヘプタン、5−(2−イソシアネートエチル)−2−イソシアネートメチル−3−(3−イソシアネートプロピル)−ビシクロ(2,2,1)ヘプタン、6−(2−イソシアネートエチル)−2−イソシアネートメチル−3−(3−イソシアネートプロピル)−ビシクロ(2,2,1)ヘプタン、5−(2−イソシアネートエチル)−2−イソシアネートメチル−2−(3−イソシアネートプロピル)−ビシクロ(2,2,1)−ヘプタン、6−(2−イソシアネートエチル)−2−イソシアネートメチル−2−(3−イソシアネートプロピル)−ビシクロ(2,2,1)ヘプタン、トリフェニルメタン−4,4’,4”−トリイソシアネート、1,3,5−トリイソシアネートメチルベンゼン、トリス(イソシアネートアルキル)イソシアヌレート等が挙げられる。 Examples of the triisocyanate compound (Ad2) include lysine ester triisocyanate, 1,4,8-triisocyanate octane, 1,6,11-triisocyanate undecane, 1,8-diisocyanate-4-isocyanate methyloctane, 1,3,6-triisocyanate hexane, 2,5,7-trimethyl-1,8-diisocyanate-5-isocyanate methyloctane, 1,3,5-triisocyanate cyclohexane, 1,3,5-trimethyl isocyanate cyclohexane 2- (3-isocyanatopropyl) -2,5-di (isocyanatomethyl) -bicyclo (2,2,1) heptane, 2- (3-isocyanatopropyl) -2,6-di (isocyanatomethyl) -bicyclo (2,2,1) heptane, 3- (3 Isocyanatopropyl) -2,5-di (isocyanatomethyl) -bicyclo (2,2,1) heptane, 5- (2-isocyanatoethyl) -2-isocyanatomethyl-3- (3-isocyanatopropyl) -bicyclo (2 , 2,1) heptane, 6- (2-isocyanatoethyl) -2-isocyanatomethyl-3- (3-isocyanatopropyl) -bicyclo (2,2,1) heptane, 5- (2-isocyanatoethyl) -2 -Isocyanatomethyl-2- (3-isocyanatopropyl) -bicyclo (2,2,1) -heptane, 6- (2-isocyanatoethyl) -2-isocyanatomethyl-2- (3-isocyanatopropyl) -bicyclo (2 , 2, 1) heptane, triphenylmethane-4,4 ', 4 "-triisocyanate, 3,5 triisocyanate methylbenzene, tris (isocyanate alkyl) isocyanurate.
本発明の組成物中における成分(A)の配合量は、溶剤を除く成分の合計を100質量%としたときに、通常1〜10質量%の範囲内、好ましくは3〜7質量%の範囲内である。1質量%未満であると、耐擦傷性や防汚性が低下するおそれがあり、10質量%を超えると、耐摩耗性が低下するおそれがある。
尚、成分(D)空洞を有するシリカ粒子を配合しない場合(上記態様(1)に相当)には、成分(A)の配合量は少な目でよい。
The compounding amount of the component (A) in the composition of the present invention is usually in the range of 1 to 10% by mass, preferably in the range of 3 to 7% by mass when the total of the components excluding the solvent is 100% by mass. Is within. If it is less than 1% by mass, the scratch resistance and antifouling property may be lowered, and if it exceeds 10% by mass, the wear resistance may be lowered.
In addition, when the silica particle which has a component (D) cavity is not mix | blended (equivalent to the said aspect (1)), the compounding quantity of a component (A) may be small.
(B)エチレン性不飽和基を2個以上含有し、フッ素含量が20質量%以上の、前記(A)以外の化合物
本発明の組成物における成分(B)は、分子内にフッ素原子を有することにより、硬化膜を低屈折率にし、得られる硬化膜の防汚性を向上させることができる。
分子内にラジカル重合可能なエチレン性不飽和基を有していることにより、組成物中の他のラジカル重合性化合物と架橋することができ、より耐擦傷性に優れた硬化膜が得られる。
成分(B)中のフッ素含量が20質量%に満たないと得られる硬化膜の屈折率が高くなるおそれがある。なお、フッ素含量の上限は70質量%である。フッ素含量が70質量%を超えると溶剤に対する溶解性が低下し、組成物の塗布性が悪化するおそれがある。この様な理由で、フッ素含量の上限は60質量%以下であることが好ましい。
成分(B)としては、(B−1)フッ素含有(メタ)アクリルエステル類及び(B−2)エチレン性不飽和基含有含フッ素重合体が挙げられる。
(B) A compound other than (A), which contains two or more ethylenically unsaturated groups and has a fluorine content of 20% by mass or more. Component (B) in the composition of the present invention has a fluorine atom in the molecule. Thereby, a cured film can be made into a low refractive index and the antifouling property of the obtained cured film can be improved.
By having an ethylenically unsaturated group capable of radical polymerization in the molecule, it can be cross-linked with other radical polymerizable compounds in the composition, and a cured film having better scratch resistance can be obtained.
If the fluorine content in the component (B) is less than 20% by mass, the resulting cured film may have a high refractive index. The upper limit of the fluorine content is 70% by mass. When the fluorine content exceeds 70% by mass, the solubility in a solvent is lowered, and the applicability of the composition may be deteriorated. For this reason, the upper limit of the fluorine content is preferably 60% by mass or less.
Examples of the component (B) include (B-1) fluorine-containing (meth) acrylic esters and (B-2) an ethylenically unsaturated group-containing fluorine-containing polymer.
(B−1)フッ素含有(メタ)アクリルエステル類
フッ素含有(メタ)アクリルエステル類(B−1)の具体例としては、パーフルオロ−1,6−ヘキサンジオールジ(メタ)アクリレート、トリ(メタ)アクリロイルヘプタデカフルオロノネニルペンタエリスリトール、オクタフルオロオクタン−1,6−ジ(メタ)アクリレート、オクタフルオロオクタンジオールと2−(メタ)アクリロイルオキシエチルイソシアネート、2−(メタ)アクリロイルオキシプロピルイソシアネート、1,1−(ビスアクリロイルオキシメチル)エチルイソシアネートとの付加物等が挙げられる。これらは一種単独又は二種以上の組み合わせで使用することができる。
(B-1) Fluorine-containing (meth) acrylic esters Specific examples of the fluorine-containing (meth) acrylic esters (B-1) include perfluoro-1,6-hexanediol di (meth) acrylate, tri (meta) ) Acrylyl heptadecafluorononenyl pentaerythritol, octafluorooctane-1,6-di (meth) acrylate, octafluorooctanediol and 2- (meth) acryloyloxyethyl isocyanate, 2- (meth) acryloyloxypropyl isocyanate, 1 , 1- (Bisacryloyloxymethyl) ethyl isocyanate and the like. These can be used alone or in combination of two or more.
(B−2)エチレン性不飽和基含有含フッ素重合体
エチレン性不飽和基含有含フッ素重合体(B−2)は、フッ素系オレフィンの重合物である。成分(B−2)により本発明の組成物は反射防止膜用低屈折率材料としての基本性能を発現する。
成分(B−2)は、例えば、水酸基含有含フッ素重合体に、水酸基と反応可能な基及びエチレン性不飽和基を有する化合物を反応させることによって得ることができる。成分(B−2)の添加により、ラジカル重合性(メタ)アクリル化合物と共架橋化することができ、耐擦傷性が向上する。
(B-2) Ethylenically unsaturated group-containing fluorine-containing polymer The ethylenically unsaturated group-containing fluorine-containing polymer (B-2) is a polymer of a fluorine-based olefin. By the component (B-2), the composition of the present invention exhibits basic performance as a low refractive index material for an antireflection film.
Component (B-2) can be obtained, for example, by reacting a hydroxyl group-containing fluoropolymer with a compound having a group capable of reacting with a hydroxyl group and an ethylenically unsaturated group. By adding the component (B-2), it can be co-crosslinked with the radically polymerizable (meth) acrylic compound, and the scratch resistance is improved.
(1)水酸基と反応可能な基及びエチレン性不飽和基を含有する化合物
水酸基と反応可能な基及びエチレン性不飽和基を含有する化合物としては、分子内にエチレン性不飽和基を含有している化合物で、フッ素重合体の水酸基と反応しうる官能基を持っていれば特に制限されるものではない。
また、上記エチレン性不飽和基として、後述する硬化性組成物をより容易に硬化させることができることから、(メタ)アクリロイル基を有する化合物がより好ましい。
このような化合物としては、(メタ)アクリル酸、(メタ)アクリロイルクロライド、無水(メタ)アクリル酸、2−(メタ)アクリロイルオキシエチルイソシアネート、2−(メタ)アクリロイルオキシプロピルイソシアネート、1,1−(ビスアクリロイルオキシメチル)エチルイソシアネートの一種単独又は二種以上の組み合わせが挙げられる。
尚、イソシアネート基を有する(メタ)アクリレートの市販品としては、例えば昭和電工(株)製 商品名 カレンズMOI、AOI、BEI等が挙げられる。
(1) A compound containing a group capable of reacting with a hydroxyl group and an ethylenically unsaturated group As a compound containing a group capable of reacting with a hydroxyl group and an ethylenically unsaturated group, the compound contains an ethylenically unsaturated group in the molecule. The compound is not particularly limited as long as it has a functional group capable of reacting with the hydroxyl group of the fluoropolymer.
Moreover, since the curable composition mentioned later can be hardened more easily as said ethylenically unsaturated group, the compound which has a (meth) acryloyl group is more preferable.
Such compounds include (meth) acrylic acid, (meth) acryloyl chloride, anhydrous (meth) acrylic acid, 2- (meth) acryloyloxyethyl isocyanate, 2- (meth) acryloyloxypropyl isocyanate, 1,1- One kind of (bisacryloyloxymethyl) ethyl isocyanate or a combination of two or more kinds may be mentioned.
In addition, as a commercial item of (meth) acrylate which has an isocyanate group, Showa Denko Co., Ltd. brand name Karenz MOI, AOI, BEI etc. are mentioned, for example.
尚、このような化合物は、ジイソシアネート及び水酸基含有(メタ)アクリレートを反応させて合成することもできる。
ジイソシアネートの例としては、2,4−トリレンジイソシアネ−ト、イソホロンジイソシアネート、キシリレンジイソシアネート、メチレンビス(4−シクロヘキシルイソシアネア−ト)、1,3−ビス(イソシアネートメチル)シクロヘキサンが好ましい。
Such a compound can also be synthesized by reacting diisocyanate and a hydroxyl group-containing (meth) acrylate.
As examples of diisocyanates, 2,4-tolylene diisocyanate, isophorone diisocyanate, xylylene diisocyanate, methylene bis (4-cyclohexyl isocyanate), and 1,3-bis (isocyanate methyl) cyclohexane are preferred.
水酸基含有(メタ)アクリレートの例としては、2−ヒドロキシエチル(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレートが好ましい。
尚、水酸基含有多官能(メタ)アクリレートの市販品としては、例えば、大阪有機化学(株)製 商品名 HEA、日本化薬(株)製 商品名 KAYARAD DPHA、PET−30、東亞合成(株)製 商品名 アロニックス M−215、M−233、M−305、M−400等として入手することができる。
As examples of the hydroxyl group-containing (meth) acrylate, 2-hydroxyethyl (meth) acrylate and pentaerythritol tri (meth) acrylate are preferable.
In addition, as a commercial item of a hydroxyl-containing polyfunctional (meth) acrylate, for example, Osaka Organic Chemical Co., Ltd. product name HEA, Nippon Kayaku Co., Ltd. product name KAYARAD DPHA, PET-30, Toagosei Co., Ltd. Product name Aronix M-215, M-233, M-305, M-400 and the like can be obtained.
(2)水酸基含有含フッ素重合体
水酸基含有含フッ素重合体は、好ましくは、下記構造単位(a)、(b)及び(c)を含んでなる。
(a)下記式(1)で表される構造単位。
(b)下記式(2)で表される構造単位。
(c)下記式(3)で表される構造単位。
(2) Hydroxyl group-containing fluoropolymer The hydroxyl group-containing fluoropolymer preferably comprises the following structural units (a), (b) and (c).
(A) A structural unit represented by the following formula (1).
(B) A structural unit represented by the following formula (2).
(C) A structural unit represented by the following formula (3).
(i)構造単位(a)
上記式(1)において、R1及びR2のフルオロアルキル基としては、トリフルオロメチル基、パーフルオロエチル基、パーフルオロプロピル基、パーフルオロブチル基、パーフルオロヘキシル基、パーフルオロシクロヘキシル基等の炭素数1〜6のフルオロアルキル基が挙げられる。また、R2のアルキル基としては、メチル基、エチル基、プロピル基、ブチル基、ヘキシル基、シクロヘキシル基等の炭素数1〜6のアルキル基が挙げられる。
(I) Structural unit (a)
In the above formula (1), examples of the fluoroalkyl group represented by R 1 and R 2 include a trifluoromethyl group, a perfluoroethyl group, a perfluoropropyl group, a perfluorobutyl group, a perfluorohexyl group, a perfluorocyclohexyl group, and the like. A C1-C6 fluoroalkyl group is mentioned. The alkyl group R 2, a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, an alkyl group having 1 to 6 carbon atoms such as a cyclohexyl group.
構造単位(a)は、含フッ素ビニル単量体を重合成分として用いることにより導入することができる。このような含フッ素ビニル単量体としては、少なくとも1個の重合性不飽和二重結合と、少なくとも1個のフッ素原子とを有する化合物であれば特に制限されるものではない。このような例としてはテトラフルオロエチレン、ヘキサフルオロプロピレン、3,3,3−トリフルオロプロピレン等のフルオロレフィン類;アルキルパーフルオロビニルエーテル又はアルコキシアルキルパーフルオロビニルエーテル類;パーフルオロ(メチルビニルエーテル)、パーフルオロ(エチルビニルエーテル)、(プロピルビニルエーテル)、パーフルオロ(ブチルビニルエーテル)、パーフルオロ(イソブチルビニルエーテル)等のパーフルオロ(アルキルビニルエーテル)類;パーフルオロ(プロポキシプロピルビニルエーテル)等のパーフルオロ(アルコキシアルキルビニルエーテル)類の一種単独又は二種以上の組み合わせが挙げられる。
これらの中でも、ヘキサフルオロプロピレンとパーフルオロ(アルキルビニルエーテル)又はパーフルオロ(アルコキシアルキルビニルエーテル)がより好ましく、これらを組み合わせて用いることがさらに好ましい。
The structural unit (a) can be introduced by using a fluorine-containing vinyl monomer as a polymerization component. Such a fluorine-containing vinyl monomer is not particularly limited as long as it is a compound having at least one polymerizable unsaturated double bond and at least one fluorine atom. Examples thereof include fluororefines such as tetrafluoroethylene, hexafluoropropylene and 3,3,3-trifluoropropylene; alkyl perfluorovinyl ethers or alkoxyalkyl perfluorovinyl ethers; perfluoro (methyl vinyl ether), perfluoro Perfluoro (alkyl vinyl ethers) such as (ethyl vinyl ether), (propyl vinyl ether), perfluoro (butyl vinyl ether), perfluoro (isobutyl vinyl ether); Perfluoro (alkoxyalkyl vinyl ether) s such as perfluoro (propoxypropyl vinyl ether) These may be used alone or in combination of two or more.
Among these, hexafluoropropylene and perfluoro (alkyl vinyl ether) or perfluoro (alkoxyalkyl vinyl ether) are more preferable, and it is more preferable to use these in combination.
尚、構造単位(a)の含有率は、水酸基含有含フッ素重合体中の構造単位(a)〜(c)の合計量を100モル%としたときに、20〜70モル%である。この理由は、含有率が20モル%未満になると、本発明が意図するところの光学的にフッ素含有材料の特徴である、低屈折率の発現が困難となる場合があるためであり、一方、含有率が70モル%を超えると、水酸基含有含フッ素重合体の有機溶剤への溶解性、透明性、又は基材への密着性が低下する場合があるためである。
また、このような理由により、構造単位(a)の含有率を、水酸基含有含フッ素重合体の全体量に対して、25〜65モル%とするのがより好ましく、30〜60モル%とするのがさらに好ましい。
In addition, the content rate of a structural unit (a) is 20-70 mol% when the total amount of structural unit (a)-(c) in a hydroxyl-containing fluoropolymer is 100 mol%. The reason for this is that when the content rate is less than 20 mol%, it is sometimes difficult to develop a low refractive index, which is the characteristic of the optically fluorine-containing material as intended by the present invention, This is because if the content exceeds 70 mol%, the solubility of the hydroxyl group-containing fluoropolymer in an organic solvent, transparency, or adhesion to a substrate may be lowered.
For these reasons, the content of the structural unit (a) is more preferably 25 to 65 mol%, and more preferably 30 to 60 mol%, based on the total amount of the hydroxyl group-containing fluoropolymer. Is more preferable.
(ii)構造単位(b)
式(2)において、R4又はR5のアルキル基としては、メチル基、エチル基、プロピル基、ヘキシル基、シクロヘキシル基、ラウリル基等の炭素数1〜12のアルキル基が挙げられ、アルコキシカルボニル基としては、メトキシカルボニル基、エトキシカルボニル基等が挙げられる。
(Ii) Structural unit (b)
In the formula (2), examples of the alkyl group represented by R 4 or R 5 include alkyl groups having 1 to 12 carbon atoms such as methyl group, ethyl group, propyl group, hexyl group, cyclohexyl group, and lauryl group. Examples of the group include a methoxycarbonyl group and an ethoxycarbonyl group.
構造単位(b)は、上述の置換基を有するビニル単量体を重合成分として用いることにより導入することができる。このようなビニル単量体の例としては、メチルビニルエーテル、エチルビニルエーテル、n−プロピルビニルエーテル、イソプロピルビニルエーテル、n−ブチルビニルエーテル、イソブチルビニルエーテル、tert−ブチルビニルエーテル、n−ペンチルビニルエーテル、n−ヘキシルビニルエーテル、n−オクチルビニルエーテル、n−ドデシルビニルエーテル、2−エチルヘキシルビニルエーテル、シクロヘキシルビニルエーテル等のアルキルビニルエーテルもしくはシクロアルキルビニルエーテル類;エチルアリルエーテル、ブチルアリルエーテル等のアリルエーテル類;酢酸ビニル、プロピオン酸ビニル、酪酸ビニル、ピバリン酸ビニル、カプロン酸ビニル、バーサチック酸ビニル、ステアリン酸ビニル等のカルボン酸ビニルエステル類;メチル(メタ)アクリレート、エチル(メタ)アクリレート、n−ブチル(メタ)アクリレート、イソブチル(メタ)アクリレート、2−メトキシエチル(メタ)アクリレート、2−エトキシエチル(メタ)アクリレート、2−(n−プロポキシ)エチル(メタ)アクリレート等の(メタ)アクリル酸エステル類;(メタ)アクリル酸、クロトン酸、マレイン酸、フマル酸、イタコン酸等の不飽和カルボン酸類等の一種単独又は二種以上の組み合わせが挙げられる。 The structural unit (b) can be introduced by using the above-mentioned vinyl monomer having a substituent as a polymerization component. Examples of such vinyl monomers include methyl vinyl ether, ethyl vinyl ether, n-propyl vinyl ether, isopropyl vinyl ether, n-butyl vinyl ether, isobutyl vinyl ether, tert-butyl vinyl ether, n-pentyl vinyl ether, n-hexyl vinyl ether, n -Alkyl vinyl ethers or cycloalkyl vinyl ethers such as octyl vinyl ether, n-dodecyl vinyl ether, 2-ethylhexyl vinyl ether, cyclohexyl vinyl ether; allyl ethers such as ethyl allyl ether, butyl allyl ether; vinyl acetate, vinyl propionate, vinyl butyrate, pivalin Carboxylic acid vinyl ester such as vinyl acid vinyl, vinyl caproate, vinyl vinyl versatate, vinyl stearate Tellurium; methyl (meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, 2-methoxyethyl (meth) acrylate, 2-ethoxyethyl (meth) acrylate, 2- ( (Meth) acrylic acid esters such as n-propoxy) ethyl (meth) acrylate; (meth) acrylic acid, crotonic acid, maleic acid, fumaric acid, itaconic acid and other unsaturated carboxylic acids, etc. The combination of is mentioned.
尚、構造単位(b)の含有率は、水酸基含有含フッ素重合体中の構造単位(a)〜(c)の合計量を100モル%としたときに、10〜70モル%である。この理由は、含有率が10モル%未満になると、水酸基含有含フッ素重合体の有機溶剤への溶解性が低下する場合があるためであり、一方、含有率が70モル%を超えると、水酸基含有含フッ素重合体の透明性、及び低反射率性等の光学特性が低下する場合があるためである。
また、このような理由により、構造単位(b)の含有率を、水酸基含有含フッ素重合体の全体量に対して、20〜60モル%とするのがより好ましく、30〜60モル%とするのがさらに好ましい。
In addition, the content rate of a structural unit (b) is 10-70 mol% when the total amount of the structural units (a)-(c) in a hydroxyl-containing fluoropolymer is 100 mol%. This is because if the content is less than 10 mol%, the solubility of the hydroxyl group-containing fluoropolymer in the organic solvent may be reduced. On the other hand, if the content exceeds 70 mol%, the hydroxyl group This is because optical properties such as transparency and low reflectivity of the fluorinated polymer may be deteriorated.
For such reasons, the content of the structural unit (b) is more preferably 20 to 60 mol%, and more preferably 30 to 60 mol%, based on the total amount of the hydroxyl group-containing fluoropolymer. Is more preferable.
(iii)構造単位(c)
式(3)において、R7のヒドロキシアルキル基としては、2−ヒドロキシエチル基、2−ヒドロキシプロピル基、3−ヒドロキシプロピル基、4−ヒドロキシブチル基、3−ヒドロキシブチル基、5−ヒドロキシペンチル基、6−ヒドロキシヘキシル基が挙げられる。
(Iii) Structural unit (c)
In the formula (3), as the hydroxyalkyl group of R 7 , 2-hydroxyethyl group, 2-hydroxypropyl group, 3-hydroxypropyl group, 4-hydroxybutyl group, 3-hydroxybutyl group, 5-hydroxypentyl group , 6-hydroxyhexyl group.
構造単位(c)は、水酸基含有ビニル単量体を重合成分として用いることにより導入することができる。このような水酸基含有ビニル単量体の例としては、2−ヒドロキシエチルビニルエーテル、3−ヒドロキシプロピルビニルエーテル、2−ヒドロキシプロピルビニルエーテル、4−ヒドロキシブチルビニルエーテル、3−ヒドロキシブチルビニルエーテル、5−ヒドロキシペンチルビニルエーテル、6−ヒドロキシヘキシルビニルエーテル等の水酸基含有ビニルエーテル類、2−ヒドロキシエチルアリルエーテル、4−ヒドロキシブチルアリルエーテル、グリセロールモノアリルエーテル等の水酸基含有アリルエーテル類、アリルアルコール等が挙げられる。
また、水酸基含有ビニル単量体としては、上記以外にも、2−ヒドロキシエチル(メタ)アクリレート、2−ヒドロキシブチル(メタ)アクリレート、2−ヒドロキシプロピル(メタ)アクリレート、カプロラクトン(メタ)アクリレート、ポリプロピレングリコール(メタ)アクリレート等を用いることができる。
The structural unit (c) can be introduced by using a hydroxyl group-containing vinyl monomer as a polymerization component. Examples of such hydroxyl group-containing vinyl monomers include 2-hydroxyethyl vinyl ether, 3-hydroxypropyl vinyl ether, 2-hydroxypropyl vinyl ether, 4-hydroxybutyl vinyl ether, 3-hydroxybutyl vinyl ether, 5-hydroxypentyl vinyl ether, Examples include hydroxyl group-containing vinyl ethers such as 6-hydroxyhexyl vinyl ether, hydroxyl group-containing allyl ethers such as 2-hydroxyethyl allyl ether, 4-hydroxybutyl allyl ether, and glycerol monoallyl ether, allyl alcohol, and the like.
Moreover, as a hydroxyl-containing vinyl monomer, in addition to the above, 2-hydroxyethyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, caprolactone (meth) acrylate, polypropylene Glycol (meth) acrylate or the like can be used.
尚、構造単位(c)の含有率を、水酸基含有含フッ素重合体中の構造単位(a)〜(c)の合計量を100モル%としたときに、5〜70モル%とすることが好ましい。この理由は、含有率が5モル%未満になると、水酸基含有含フッ素重合体の有機溶剤への溶解性が低下する場合があるためであり、一方、含有率が70モル%を超えると、水酸基含有含フッ素重合体の透明性、及び低反射率性等の光学特性が低下する場合があるためである。
また、このような理由により、構造単位(c)の含有率を、水酸基含有含フッ素重合体の全体量に対して、5〜40モル%とするのがより好ましく、5〜30モル%とするのがさらに好ましい。
The content of the structural unit (c) is 5 to 70 mol% when the total amount of the structural units (a) to (c) in the hydroxyl group-containing fluoropolymer is 100 mol%. preferable. This is because if the content is less than 5 mol%, the solubility of the hydroxyl group-containing fluoropolymer in the organic solvent may be reduced. On the other hand, if the content exceeds 70 mol%, the hydroxyl group This is because optical properties such as transparency and low reflectivity of the fluorinated polymer may be deteriorated.
For such reasons, the content of the structural unit (c) is more preferably 5 to 40 mol%, and more preferably 5 to 30 mol%, based on the total amount of the hydroxyl group-containing fluoropolymer. Is more preferable.
(iv)その他の構造単位
水酸基含有含フッ素重合体は、本発明の効果を損なわない範囲で、ポリシロキサン構造や、乳化作用を有するモノマーに由来する構造等を含んで構成することもできる。
(Iv) Other Structural Units The hydroxyl group-containing fluoropolymer can be configured to include a polysiloxane structure, a structure derived from a monomer having an emulsifying action, or the like as long as the effects of the present invention are not impaired.
(vi)分子量
水酸基含有含フッ素重合体は、ゲルパーミエーションクロマトグラフィーで、テトラヒドロフランを溶剤として測定したポリスチレン換算数平均分子量が5,000〜500,000であることが好ましい。この理由は、数平均分子量が5,000未満になると、水酸基含有含フッ素重合体の機械的強度が低下する場合があるためであり、一方、数平均分子量が500,000を超えると、後述する硬化性組成物の粘度が高くなり、薄膜コーティングが困難となる場合があるためである。
また、このような理由により、水酸基含有含フッ素重合体のポリスチレン換算数平均分子量を10,000〜300,000とするのがより好ましく、10,000〜100,000とするのがさらに好ましい。
(Vi) Molecular Weight The hydroxyl group-containing fluoropolymer preferably has a polystyrene-equivalent number average molecular weight of 5,000 to 500,000 measured by gel permeation chromatography using tetrahydrofuran as a solvent. The reason for this is that when the number average molecular weight is less than 5,000, the mechanical strength of the hydroxyl group-containing fluoropolymer may be lowered. On the other hand, when the number average molecular weight exceeds 500,000, it will be described later. This is because the viscosity of the curable composition becomes high and thin film coating may be difficult.
For these reasons, the number average molecular weight in terms of polystyrene of the hydroxyl group-containing fluoropolymer is more preferably 10,000 to 300,000, and even more preferably 10,000 to 100,000.
上記態様(1)の本発明の組成物中における成分(B)の配合量は、溶剤を除く成分の合計を100質量%としたときに、5〜80質量%の範囲内であることが好ましく、10〜80質量%の範囲内であることがより好ましい。5質量%未満であると、屈折率が高いおそれがあり、80質量%を超えると、膜強度が下がるおそれがある。 The blending amount of the component (B) in the composition of the present invention of the above aspect (1) is preferably in the range of 5 to 80% by mass when the total of components excluding the solvent is 100% by mass. More preferably, it is in the range of 10 to 80% by mass. If it is less than 5% by mass, the refractive index may be high, and if it exceeds 80% by mass, the film strength may be lowered.
尚、上記態様(2)の本発明の組成物中において、成分(B)が配合される場合の成分(B)の配合量は、溶剤を除く成分の合計を100質量%としたときに、5〜80質量%の範囲内であることが好ましく、10〜80質量%の範囲内であることがより好ましい。5質量%未満であると、屈折率が高いおそれがあり、80質量%を超えると、膜強度が下がるおそれがある。 In the composition of the present invention of the above aspect (2), when the component (B) is blended, the amount of the component (B) is 100% by mass when the total of the components excluding the solvent is 100% by mass. It is preferably in the range of 5 to 80% by mass, and more preferably in the range of 10 to 80% by mass. If it is less than 5% by mass, the refractive index may be high, and if it exceeds 80% by mass, the film strength may be lowered.
(C)エチレン性不飽和基を2個以上有しフッ素を含まない化合物
本発明の組成物における成分(C)エチレン性不飽和基を2個以上有しフッ素を含まない化合物は、得られる硬化膜におけるマトリクスを構成する成分であり、成膜性を高め、優れた耐擦傷性、有機溶剤耐性を有する硬化膜を与える。成分(C)は、上記態様(1)の本発明の組成物では任意添加成分であり、上記態様(2)では成分(B)及び(C)からなる群から選択される成分のうちの一つである。
成分(C)は、エチレン性不飽和基を2個以上有しフッ素を含まない化合物であれば特に限定されないが、(メタ)アクリロイル基を2個以上有する多官能(メタ)アクリルエステル類であることが好ましい。
(C) Compound having two or more ethylenically unsaturated groups and not containing fluorine Component (C) Compound in the composition of the present invention (C) A compound containing two or more ethylenically unsaturated groups and containing no fluorine is obtained by curing. It is a component constituting the matrix in the film, and improves the film forming property, and gives a cured film having excellent scratch resistance and organic solvent resistance. The component (C) is an optional additive component in the composition of the present invention of the above aspect (1), and is one of the components selected from the group consisting of the components (B) and (C) in the above aspect (2). One.
Component (C) is not particularly limited as long as it is a compound having two or more ethylenically unsaturated groups and no fluorine, but is a polyfunctional (meth) acrylic ester having two or more (meth) acryloyl groups. It is preferable.
多官能(メタ)アクリルエステル類としては、エチレングリコールジ(メタ)アクリレート、1,3−ブタンジオールジ(メタ)アクリレート、1,4−ブタンジオールジ(メタ)アクリレート、1,6−ヘキサンジオールジ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、ジエチレングルコールジ(メタ)アクリレート、トリエチレングルコールジ(メタ)アクリレート、ジプロピレングルコールジ(メタ)アクリレート、ビス(2−ヒドロキシエチル)イソシアヌレートジ(メタ)アクリレート、ビス((メタ)アクリロイルオキシメチル)トリシクロ[5.2.1.02,6]デカン、トリメチロールプロパントリ(メタ)アクリレート、ジトリメチロールプロパンテトラ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、グリセリントリ(メタ)アクリレート、トリス(2−ヒドロキシエチル)イソシアヌレートトリ(メタ)アクリレート、等の水酸基含有(メタ)アクリレート類、及びこれらの水酸基へのエチレンオキシド又はプロピレンオキシド付加物のポリ(メタ)アクリレート類、分子内に2以上の(メタ)アクリロイル基を有するオリゴエステル(メタ)アクリレート類、オリゴエーテル(メタ)アクリレート類、及びオリゴエポキシ(メタ)アクリレート類等を挙げることができる。この中では、ジペンタエリスリトールヘキサ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ジトリメチロールプロパンテトラ(メタ)アクリレート等が好ましい。 Polyfunctional (meth) acrylic esters include ethylene glycol di (meth) acrylate, 1,3-butanediol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (Meth) acrylate, neopentyl glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, bis (2-hydroxyethyl) Isocyanurate di (meth) acrylate, bis ((meth) acryloyloxymethyl) tricyclo [5.2.1.0 2,6 ] decane, trimethylolpropane tri (meth) acrylate, ditrimethylolpropane tetra (meth) acrylate, Pentae Thritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, glycerin tri (meth) acrylate, tris (2-hydroxyethyl) isocyanurate tri ( Hydroxyl group-containing (meth) acrylates such as (meth) acrylate, and poly (meth) acrylates of ethylene oxide or propylene oxide adducts to these hydroxyl groups, oligoesters having two or more (meth) acryloyl groups in the molecule ( Mention may be made of (meth) acrylates, oligoether (meth) acrylates, oligoepoxy (meth) acrylates and the like. Among these, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, pentaerythritol tetra (meth) acrylate, ditrimethylolpropane tetra (meth) acrylate and the like are preferable.
このような多官能(メタ)アクリルエステル類の市販品としては、例えば、東亞合成(株)製アロニックスM−400、M−404、M−408、M−450、M−305、M−309、M−310、M−315、M−320、M−350、M−360、M−208、M−210、M−215、M−220、M−225、M−233、M−240、M−245、M−260、M−270、M−1100、M−1200、M−1210、M−1310、M−1600、M−221、M−203、TO−924、TO−1270、TO−1231、TO−595、TO−756、TO−1343、TO−902、TO−904、TO−905、TO−1330、日本化薬(株)製KAYARAD D−310、D−330、DPHA、DPCA−20、DPCA−30、DPCA−60、DPCA−120、DN−0075、DN−2475、SR−295、SR−355、SR−399E、SR−494、SR−9041、SR−368、SR−415、SR−444、SR−454、SR−492、SR−499、SR−502、SR−9020、SR−9035、SR−111、SR−212、SR−213、SR−230、SR−259、SR−268、SR−272、SR−344、SR−349、SR−601、SR−602、SR−610、SR−9003、PET−30、T−1420、GPO−303、TC−120S、HDDA、NPGDA、TPGDA、PEG400DA、MANDA、HX−220、HX−620、R−551、R−712、R−167、R−526、R−551、R−712、R−604、R−684、TMPTA、THE−330、TPA−320、TPA−330、KS−HDDA、KS−TPGDA、KS−TMPTA、共栄社化学(株)製ライトアクリレート PE−4A、DPE−6A、DTMP−4A等を挙げることができる。 Examples of commercially available products of such polyfunctional (meth) acrylic esters include ARONIX M-400, M-404, M-408, M-450, M-305, M-309, manufactured by Toagosei Co., Ltd. M-310, M-315, M-320, M-350, M-360, M-208, M-210, M-215, M-220, M-225, M-233, M-240, M- 245, M-260, M-270, M-1100, M-1200, M-1210, M-1310, M-1600, M-221, M-203, TO-924, TO-1270, TO-1231, TO-595, TO-756, TO-1343, TO-902, TO-904, TO-905, TO-1330, KAYARAD D-310, D-330, DPHA, DPCA- manufactured by Nippon Kayaku Co., Ltd. 0, DPCA-30, DPCA-60, DPCA-120, DN-0075, DN-2475, SR-295, SR-355, SR-399E, SR-494, SR-9041, SR-368, SR-415, SR-444, SR-454, SR-492, SR-499, SR-502, SR-9020, SR-9035, SR-111, SR-212, SR-213, SR-230, SR-259, SR- 268, SR-272, SR-344, SR-349, SR-601, SR-602, SR-610, SR-9003, PET-30, T-1420, GPO-303, TC-120S, HDDA, NPGDA, TPGDA, PEG400DA, MANDA, HX-220, HX-620, R-551, R-712, R-167, R- 526, R-551, R-712, R-604, R-684, TMPTA, THE-330, TPA-320, TPA-330, KS-HDDA, KS-TPGDA, KS-TMPTA, manufactured by Kyoeisha Chemical Co., Ltd. Light acrylate PE-4A, DPE-6A, DTMP-4A, etc. can be mentioned.
本発明の組成物中において成分(C)が配合される場合の配合量は、上記態様(1)及び(2)のいずれであっても、溶剤を除く成分の合計を100質量%としたときに、5〜70質量%の範囲内であることが好ましく、10〜60質量%の範囲内であることがより好ましい。5質量%未満であると、塗膜の硬化性が不十分になるおそれがあり、70質量%を超えると、屈折率が高くなる。 When the component (C) is blended in the composition of the present invention, the blending amount is any of the above-described embodiments (1) and (2), and the total amount of the components excluding the solvent is 100% by mass. In the range of 5 to 70% by mass, the range of 10 to 60% by mass is more preferable. If it is less than 5% by mass, the curability of the coating film may be insufficient, and if it exceeds 70% by mass, the refractive index becomes high.
(D)空洞を有するシリカ粒子
本発明の組成物における成分(D)は中空シリカ粒子及び多孔質シリカ粒子等の粒子内に空洞を有するシリカ粒子である。シリカ粒子が空洞を有することにより得られる硬化膜の屈折率を低く抑えることができる。耐擦傷性に優れることから成分(D)としては、中空シリカ粒子が好ましい。成分(D)は、上記態様(2)の本発明の組成物では必須成分であるが、上記態様(1)では任意添加成分である。
中空シリカ粒子の数平均粒径は、1〜100nmの範囲内であることが好ましく、5〜80nmの範囲内であることがより好ましい。粒径は、透過型電子顕微鏡により測定する。1nm未満では、屈折率が高くなるおそれがあり、100nmを超えると硬化膜の透明性が低下するおそれがある。
(D) Silica particles having cavities Component (D) in the composition of the present invention is silica particles having cavities in particles such as hollow silica particles and porous silica particles. The refractive index of the cured film obtained when the silica particles have cavities can be kept low. As the component (D), hollow silica particles are preferable because of excellent scratch resistance. The component (D) is an essential component in the composition of the present invention of the above aspect (2), but is an optional additive component in the above aspect (1).
The number average particle diameter of the hollow silica particles is preferably in the range of 1 to 100 nm, and more preferably in the range of 5 to 80 nm. The particle size is measured with a transmission electron microscope. If it is less than 1 nm, the refractive index may be high, and if it exceeds 100 nm, the transparency of the cured film may be reduced.
中空シリカ粒子としては、公知のものを使用することができ、また、その形状も球状に限らず不定形であってもよい。また、固形分が5〜40質量%のコロイダルシリカが好ましい。分散媒は、水あるいは有機溶媒が好ましい。有機溶媒としては、メタノール、イソプロピルアルコール、エチレングリコール、ブタノール、エチレングリコールモノプロピルエーテル等のアルコール類;メチルエチルケトン、メチルイソブチルケトン等のケトン類;トルエン、キシレン等の芳香族炭化水素類;ジメチルホルムアミド、ジメチルアセトアミド、N−メチルピロリドン等のアミド類;酢酸エチル、酢酸ブチル、γ−ブチロラクトン等のエステル類;テトラヒドロフラン、1,4−ジオキサン等のエ−テル類等の有機溶剤を挙げることができ、これらの中で、アルコール類及びケトン類が好ましい。これら有機溶剤は、単独で、又は2種以上混合して分散媒として使用することができる。 As the hollow silica particles, known particles can be used, and the shape thereof is not limited to spherical but may be indefinite. Further, colloidal silica having a solid content of 5 to 40% by mass is preferable. The dispersion medium is preferably water or an organic solvent. Examples of organic solvents include alcohols such as methanol, isopropyl alcohol, ethylene glycol, butanol and ethylene glycol monopropyl ether; ketones such as methyl ethyl ketone and methyl isobutyl ketone; aromatic hydrocarbons such as toluene and xylene; dimethylformamide and dimethyl Examples include amides such as acetamide and N-methylpyrrolidone; esters such as ethyl acetate, butyl acetate and γ-butyrolactone; and organic solvents such as ethers such as tetrahydrofuran and 1,4-dioxane. Of these, alcohols and ketones are preferred. These organic solvents can be used alone or in combination of two or more as a dispersion medium.
中空シリカ粒子の市販品としては、ELCOM JX−1009SIV、ELCOM JX−1012SIV(触媒化成製)等が挙げられる。 Examples of commercially available hollow silica particles include ELCOM JX-1009SIV, ELCOM JX-1012SIV (manufactured by Catalysts and Chemicals), and the like.
また、中空シリカ粒子の表面に化学修飾等の表面処理を行ったものを使用することができ、例えば分子中に1以上のアルキル基を有する加水分解性ケイ素化合物又はその加水分解物を含有するもの等を反応させることができる。このような加水分解性ケイ素化合物としては、トリメチルメトキシシラン、トリブチルメトキシシラン、ジメチルジメトキシシラン、ジブチルジメトキシシラン、メチルトリメトキシシラン、ブチルトリメトキシシラン、オクチルトリメトキシシラン、ドデシルトリメトキシシラン、1,1,1−トリメトキシ−2,2,2−トリメチル−ジシラン、ヘキサメチル−1,3−ジシロキサン、1,1,1−トリメトキシ−3,3,3−トリメチル−1,3−ジシロキサン、α−トリメチルシリル−ω−ジメチルメトキシシリル−ポリジメチルシロキサン、α−トリメチルシリル−ω−トリメトキシシリル−ポリジメチルシロキサンヘキサメチル−1,3−ジシラザン等を挙げることができる。また、分子中に1以上の反応性基を有する加水分解性ケイ素化合物を使用することもできる。分子中に1以上の反応性基を有する加水分解性ケイ素化合物は、例えば反応性基としてNH2基を有するものとして、尿素プロピルトリメトキシシラン、N−(2−アミノエチル)−3−アミノプロピルトリメトキシシラン等、OH基を有するものとして、ビス(2−ヒドロキシエチル)−3アミノトリプロピルメトキシシラン等、イソシアネート基を有するものとして3−イソシアネートプロピルトリメトキシシラン等、チオシアネート基を有するものとして3−チオシアネートプロピルトリメトキシシラン等、エポキシ基を有するものとして(3−グリシドキシプロピル)トリメトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン等、チオール基を有するものとして、3−メルカプトプロピルトリメトキシシラン等を挙げることができる。好ましい化合物として、3−メルカプトプロピルトリメトキシシランを挙げることができる。また、特開平9−100111号公報に記載の化合物で変性することも好ましい。 Moreover, what carried out surface treatments, such as chemical modification, on the surface of a hollow silica particle can be used, for example, the hydrolyzable silicon compound which has one or more alkyl groups in a molecule | numerator, or its hydrolyzate Etc. can be reacted. Such hydrolyzable silicon compounds include trimethylmethoxysilane, tributylmethoxysilane, dimethyldimethoxysilane, dibutyldimethoxysilane, methyltrimethoxysilane, butyltrimethoxysilane, octyltrimethoxysilane, dodecyltrimethoxysilane, 1,1. , 1-trimethoxy-2,2,2-trimethyl-disilane, hexamethyl-1,3-disiloxane, 1,1,1-trimethoxy-3,3,3-trimethyl-1,3-disiloxane, α-trimethylsilyl -Ω-dimethylmethoxysilyl-polydimethylsiloxane, α-trimethylsilyl-ω-trimethoxysilyl-polydimethylsiloxane hexamethyl-1,3-disilazane, and the like. A hydrolyzable silicon compound having one or more reactive groups in the molecule can also be used. Hydrolyzable silicon compounds having one or more reactive groups in the molecule are, for example, urea propyltrimethoxysilane, N- (2-aminoethyl) -3-aminopropyl having NH 2 groups as reactive groups. Trimethoxysilane and the like having an OH group, bis (2-hydroxyethyl) -3aminotripropylmethoxysilane and the like having an isocyanate group, 3-isocyanatopropyltrimethoxysilane and the like having a thiocyanate group 3 As thiocyanate propyltrimethoxysilane and the like having an epoxy group (3-glycidoxypropyl) trimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane and the like having a thiol group 3 -Mercaptopropyltrimethoxy Sisilane etc. can be mentioned. A preferred compound is 3-mercaptopropyltrimethoxysilane. It is also preferable to modify with a compound described in JP-A-9-100111.
本発明の組成物中において成分(D)が配合される場合(上記態様(1)及び(2)のいずれの場合においても)の配合量は、溶剤を除く成分の合計を100質量%としたときに、5〜80質量%の範囲内であることが好ましく、5〜70質量%の範囲内であることがより好ましい。5質量%未満であると、屈折率が高いおそれがあり、80質量%を超えると、膜が脆くなるおそれがある。尚、成分(D)の粒子の量は、固形分量を意味し、粒子が溶剤分散ゾルの形態で用いられるときは、その配合量には溶剤の量を含まない。 When component (D) is blended in the composition of the present invention (in any of the above embodiments (1) and (2)), the total amount of the components excluding the solvent is 100% by mass. Sometimes it is preferably in the range of 5 to 80% by mass, more preferably in the range of 5 to 70% by mass. If it is less than 5% by mass, the refractive index may be high, and if it exceeds 80% by mass, the film may be brittle. In addition, the quantity of the particle | grains of a component (D) means the amount of solid content, and when the particle | grains are used with the form of solvent dispersion | distribution sol, the quantity of a solvent is not included in the compounding quantity.
(E)ラジカル重合開始剤
本発明に用いられるラジカル重合開始剤(E)としては、例えば、熱的に活性ラジカル種を発生させる化合物(熱重合開始剤)、及び放射線(光)照射により活性ラジカル種を発生させる化合物(放射線(光)重合開始剤)等の、汎用されているものを挙げることができ、放射線(光)重合開始剤が好ましい。
(E) Radical polymerization initiator Examples of the radical polymerization initiator (E) used in the present invention include a compound that thermally generates active radical species (thermal polymerization initiator), and an active radical upon irradiation with radiation (light). Commonly used compounds such as seed generating compounds (radiation (light) polymerization initiators) can be mentioned, and radiation (light) polymerization initiators are preferred.
放射線(光)重合開始剤としては、光照射により分解してラジカルを発生して重合を開始せしめるものであれば特に制限はなく、例えば、2−ヒドロキシ−1−{4−[4−(2−ヒドロキシ−2−メチル−プロピオニル)−ベンジル]−フェニル}−2−メチル−プロパン−1−オンアセトフェノン、アセトフェノンベンジルケタール、1−ヒドロキシシクロヘキシルフェニルケトン、2,2−ジメトキシ−1,2−ジフェニルエタン−1−オン、キサントン、フルオレノン、ベンズアルデヒド、フルオレン、アントラキノン、トリフェニルアミン、カルバゾール、3−メチルアセトフェノン、4−クロロベンゾフェノン、4,4’−ジメトキシベンゾフェノン、4,4’−ジアミノベンゾフェノン、ベンゾインプロピルエーテル、ベンゾインエチルエーテル、ベンジルジメチルケタール、1−(4−イソプロピルフェニル)−2−ヒドロキシ−2−メチルプロパン−1−オン、2−ヒドロキシ−2−メチル−1−フェニルプロパン−1−オン、チオキサントン、ジエチルチオキサントン、2−イソプロピルチオキサントン、2−クロロチオキサントン、2−メチル−1−[4−(メチルチオ)フェニル]−2−モルホリノ−プロパン−1−オン、2−ベンジル−2−ジメチルアミノ−1−(4−モルホリノフェニル)−ブタノン−1,4−(2−ヒドロキシエトキシ)フェニル−(2−ヒドロキシ−2−プロピル)ケトン、2,4,6−トリメチルベンゾイルジフェニルホスフィンオキサイド、ビス−(2,6−ジメトキシベンゾイル)−2,4,4−トリメチルペンチルホスフィンオキシド、オリゴ(2−ヒドロキシ−2−メチル−1−(4−(1−メチルビニル)フェニル)プロパノン)等を挙げることができる。 The radiation (photo) polymerization initiator is not particularly limited as long as it can be decomposed by light irradiation to generate radicals to initiate polymerization. For example, 2-hydroxy-1- {4- [4- (2 -Hydroxy-2-methyl-propionyl) -benzyl] -phenyl} -2-methyl-propan-1-one acetophenone, acetophenone benzyl ketal, 1-hydroxycyclohexyl phenyl ketone, 2,2-dimethoxy-1,2-diphenylethane -1-one, xanthone, fluorenone, benzaldehyde, fluorene, anthraquinone, triphenylamine, carbazole, 3-methylacetophenone, 4-chlorobenzophenone, 4,4'-dimethoxybenzophenone, 4,4'-diaminobenzophenone, benzoinpropyl ether , Benzoy Ethyl ether, benzyldimethyl ketal, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 2-hydroxy-2-methyl-1-phenylpropan-1-one, thioxanthone, diethylthioxanthone 2-isopropylthioxanthone, 2-chlorothioxanthone, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholino-propan-1-one, 2-benzyl-2-dimethylamino-1- (4- Morpholinophenyl) -butanone-1,4- (2-hydroxyethoxy) phenyl- (2-hydroxy-2-propyl) ketone, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis- (2,6-dimethoxybenzoyl) ) -2,4,4-trimethylpentylphosphie Oxide, oligo (2-hydroxy-2-methyl-1- (4- (1-methylvinyl) phenyl) propanone) and the like.
放射線(光)重合開始剤の市販品としては、例えば、チバ・スペシャルティ・ケミカルズ(株)製イルガキュア 127、184、369、651、500、819、907、784、2959、CGI1700、CGI1750、CGI1850、CG24−61、ダロキュア 1116、1173、BASF社製ルシリン TPO、8893UCB社製ユベクリル P36、フラテツリ・ランベルティ社製エザキュアーKIP150、KIP65LT、KIP100F、KT37、KT55、KTO46、KIP75/B等を挙げることができる。 Examples of commercially available radiation (photo) polymerization initiators include Irgacure 127, 184, 369, 651, 500, 819, 907, 784, 2959, CGI 1700, CGI 1750, CGI 1850, and CG24 manufactured by Ciba Specialty Chemicals. -61, Darocur 1116, 1173, Lucylin TPO manufactured by BASF, Ubekrill P36 manufactured by 8893UCB, Ezacure KIP150, KIP65LT, KIP100F manufactured by Fratelli Lamberti, KT37, KT55, KTO46, KIP75 / B, and the like.
本発明の組成物中における成分(F)の配合量は、溶剤を除く成分の合計を100質量%としたときに、0.01〜20質量%の範囲内とすることが好ましく、0.1〜10質量%の範囲内とすることがさらに好ましい。0.01質量%未満であると、硬化物としたときの硬度が不十分となるおそれがあり、20質量%を超えると、塗膜の硬度が損なわれるおそれがある。 The blending amount of the component (F) in the composition of the present invention is preferably in the range of 0.01 to 20% by mass when the total of the components excluding the solvent is 100% by mass. More preferably, it is in the range of -10 mass%. If it is less than 0.01% by mass, the hardness of the cured product may be insufficient, and if it exceeds 20% by mass, the hardness of the coating film may be impaired.
(F)有機溶剤
本発明の組成物は、塗膜の厚さを調節するために、有機溶剤で希釈して用いることが通常である。例えば、反射防止膜や被覆材として用いる場合の粘度は、通常0.1〜50,000mPa・秒/25℃であり、好ましくは、0.5〜10,000mPa・秒/25℃である。
(F) Organic solvent The composition of the present invention is usually diluted with an organic solvent to adjust the thickness of the coating film. For example, the viscosity when used as an antireflection film or a coating material is usually 0.1 to 50,000 mPa · sec / 25 ° C., and preferably 0.5 to 10,000 mPa · sec / 25 ° C.
有機溶剤(F)としては、例えば、メタノール、エタノール、イソプロパノール、ブタノール、オクタノール等のアルコール類;アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン類;酢酸エチル、酢酸ブチル、乳酸エチル、γ−ブチロラクトン、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート等のエステル類;エチレングリコールモノメチルエーテル、ジエチレングリコールモノブチルエーテル等のエーテル類;ベンゼン、トルエン、キシレン等の芳香族炭化水素類;ジメチルホルムアミド、ジメチルアセトアミド、N−メチルピロリドン等のアミド類等が挙げられる。これらの有機溶剤は1種単独又は2種以上を組み合わせて用いることができる。 Examples of the organic solvent (F) include alcohols such as methanol, ethanol, isopropanol, butanol and octanol; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone; ethyl acetate, butyl acetate, ethyl lactate and γ-butyrolactone , Esters such as propylene glycol monomethyl ether acetate and propylene glycol monoethyl ether acetate; ethers such as ethylene glycol monomethyl ether and diethylene glycol monobutyl ether; aromatic hydrocarbons such as benzene, toluene and xylene; dimethylformamide, dimethylacetamide, Examples include amides such as N-methylpyrrolidone. These organic solvents can be used alone or in combination of two or more.
本発明の組成物中における有機溶剤(F)の合計の配合量は、溶剤を除く成分の合計を100質量部としたときに、50〜10,000質量部の範囲内であることが好ましい。尚、前記空洞を有するシリカ粒子(D)及び後記する(G)中実シリカ粒子の分散液中の有機溶剤も本発明の組成物中に持ち込まれ得る。溶剤の配合量は、この成分(D)及び/又は(G)由来の有機溶剤も勘案の上、塗布膜厚、組成物の粘度等を考慮して適宜決定することができる。 The total amount of the organic solvent (F) in the composition of the present invention is preferably in the range of 50 to 10,000 parts by mass when the total of components excluding the solvent is 100 parts by mass. In addition, the organic solvent in the dispersion liquid of the silica particle (D) which has the said cavity, and the below-mentioned (G) solid silica particle can also be brought in in the composition of this invention. The blending amount of the solvent can be appropriately determined in consideration of the coating film thickness, the viscosity of the composition, etc. in consideration of the organic solvent derived from component (D) and / or (G).
(G)中実シリカ粒子
本発明の組成物には、上記(D)空洞を有するシリカ粒子と共に(上記態様(1)及び(2)の場合)、又は単独で(態様(1)の場合)(G)中実シリカ粒子を配合してもよい。中実シリカ粒子は屈折率において中実シリカ粒子に劣るが、得られる硬化膜に耐擦傷性を付与することができる。
中実シリカ粒子は、公知のものを用いることができ、上記(D)空洞を有するシリカ粒子と同様の数平均粒径を有しているものが好ましく、また、その形状も球状に限らず不定形であってもよい。また、固形分が5〜40質量%のコロイダルシリカが好ましい。
(G) Solid silica particles In the composition of the present invention, together with the silica particles having the above (D) cavities (in the case of the above aspects (1) and (2)) or alone (in the case of the aspect (1)) (G) Solid silica particles may be blended. Although solid silica particles are inferior to solid silica particles in refractive index, they can impart scratch resistance to the resulting cured film.
As the solid silica particles, known ones can be used, and those having the same number average particle diameter as the silica particles having the above-mentioned (D) cavities are preferable. It may be a fixed form. Further, colloidal silica having a solid content of 5 to 40% by mass is preferable.
中実シリカ粒子の市販品の具体例としては、例えば、コロイダルシリカとして、日産化学工業(株)製 商品名:メタノールシリカゾル、IPA−ST、MEK−ST、MEK−ST−S、MEK−ST−L、IPA−ZL、NBA−ST、XBA−ST、DMAC−ST、ST−UP、ST−OUP、ST−20、ST−40、ST−C、ST−N、ST−O、ST−50、ST−OL等が挙げられる。 Specific examples of commercially available solid silica particles include, for example, colloidal silica manufactured by Nissan Chemical Industries, Ltd. Trade names: methanol silica sol, IPA-ST, MEK-ST, MEK-ST-S, MEK-ST- L, IPA-ZL, NBA-ST, XBA-ST, DMAC-ST, ST-UP, ST-OUP, ST-20, ST-40, ST-C, ST-N, ST-O, ST-50, ST-OL etc. are mentioned.
(G)中実シリカ粒子は、(D)中空シリカ粒子と同様に、表面変性されていてもよい。 (G) The solid silica particles may be surface-modified similarly to the (D) hollow silica particles.
本発明の組成物中における成分(G)の配合量は、溶剤を除く成分の合計を100質量%としたときに、5〜80質量%の範囲内であることが好ましく、5〜70質量%の範囲内であることがより好ましい。5質量%未満であると、膜硬度が低いおそれがあり、80質量%を超えると、膜が脆くなるおそれがある尚、成分(G)の粒子の量は、固形分を意味し、粒子が溶剤分散ゾルの形態で用いられるときは、その配合量には溶剤の量を含まない。 The blending amount of the component (G) in the composition of the present invention is preferably within the range of 5 to 80% by mass, and is preferably 5 to 70% by mass when the total of the components excluding the solvent is 100% by mass. It is more preferable to be within the range. If it is less than 5% by mass, the film hardness may be low, and if it exceeds 80% by mass, the film may be brittle. The amount of the component (G) particles means solid content, When used in the form of a solvent-dispersed sol, the blending amount does not include the amount of solvent.
(H)添加剤
本発明の組成物には、本発明の目的や効果を損なわない範囲において、シリカ粒子以外の無機粒子、光増感剤、熱重合開始剤、重合禁止剤、重合開始助剤、レベリング剤、濡れ性改良剤、界面活性剤、可塑剤、紫外線吸収剤、酸化防止剤、帯電防止剤、シランカップリング剤、顔料、染料、スリップ剤等の添加剤をさらに含有させることも好ましい。
特に無機粒子は塗膜強度を改善するために有効であり、添加する場合は数平均粒径1〜100nmの範囲であることが好ましく、球形、数珠状、不定形粒子を用いることができ、かつ内部構造に空隙を有する多孔質、中空粒子も用いることができる。用いることができる無機粒子としては、無機酸化物又はフッ化物が好ましく、例えばアルミナ、チタニア、ジルコニア、フッ化マグネシウム等が挙げられる。また、これらの無機粒子の表面は任意の有機基で表面変性されていてもよく、(メタ)アクリル基で変性することにより、硬化性組成物との相溶性が向上し、かつ硬化時に他の硬化性組成物と共架橋することが可能となり、硬化膜の耐擦傷性を改良することが可能である。
(H) Additive In the composition of the present invention, inorganic particles other than silica particles, a photosensitizer, a thermal polymerization initiator, a polymerization inhibitor, and a polymerization initiation aid are within the range that does not impair the purpose and effect of the present invention. , Leveling agents, wettability improvers, surfactants, plasticizers, UV absorbers, antioxidants, antistatic agents, silane coupling agents, pigments, dyes, slip agents, etc. .
In particular, the inorganic particles are effective for improving the coating strength, and when added, the number average particle size is preferably in the range of 1 to 100 nm, and spherical, beaded, amorphous particles can be used, and Porous and hollow particles having voids in the internal structure can also be used. As the inorganic particles that can be used, inorganic oxides or fluorides are preferable, and examples thereof include alumina, titania, zirconia, and magnesium fluoride. Moreover, the surface of these inorganic particles may be surface-modified with an arbitrary organic group, and by being modified with a (meth) acrylic group, compatibility with the curable composition is improved, and other properties at the time of curing It becomes possible to co-crosslink with the curable composition, and it is possible to improve the scratch resistance of the cured film.
熱重合開始剤は、熱により活性種を発生する化合物であり、活性種としてラジカルを発生する熱ラジカル発生剤等が挙げられる。熱ラジカル発生剤の例としては、ベンゾイルパーオキサイド、tert−ブチル−オキシベンゾエート、アゾビスイソブチロニトリル、アセチルパーオキサイド、ラウリルパーオキサイド、tert−ブチルパーアセテート、クミルパーオキサイド、tert−ブチルパーオキサイド、tert−ブチルハイドロパーオキサイド、2,2’−アゾビス(2,4−ジメチルバレロニトリル)、2,2’−アゾビス(4−メトキシ−2,4−ジメチルバレロニトリル)等の一種単独又は二種以上の組み合わせを挙げることができる。 The thermal polymerization initiator is a compound that generates active species by heat, and examples thereof include a thermal radical generator that generates radicals as active species. Examples of thermal radical generators include benzoyl peroxide, tert-butyl-oxybenzoate, azobisisobutyronitrile, acetyl peroxide, lauryl peroxide, tert-butyl peracetate, cumyl peroxide, tert-butyl peroxide , Tert-butyl hydroperoxide, 2,2′-azobis (2,4-dimethylvaleronitrile), 2,2′-azobis (4-methoxy-2,4-dimethylvaleronitrile), etc. The combination of the above can be mentioned.
本発明の組成物の硬化条件についても特に制限されるものではないが、例えば、活性エネルギー線を用いた場合、照射光量を0.01〜10J/cm2の範囲内の値とするのが好ましい。
この理由は、照射光量が0.01J/cm2未満となると、硬化不良が生じる場合があるためであり、一方、照射光量が10J/cm2を超えると、硬化時間が過度に長くなる場合があるためである。
The curing conditions of the composition of the present invention are not particularly limited. For example, when active energy rays are used, it is preferable to set the irradiation light amount to a value within the range of 0.01 to 10 J / cm 2. .
This is because when the irradiation light quantity is less than 0.01 J / cm 2 , curing failure may occur. On the other hand, when the irradiation light quantity exceeds 10 J / cm 2 , the curing time may become excessively long. Because there is.
II.硬化膜及び反射防止膜
本発明の硬化膜は、上記本発明の組成物を硬化させてなることを特徴とする。
本発明の硬化膜は、屈折率が低く、耐擦傷性及び防汚性に優れると同時に耐摩耗性にも優れ、反射防止膜の最外層となる低屈折率層として有用である。
II. Cured film and antireflection film The cured film of the present invention is characterized by curing the composition of the present invention.
The cured film of the present invention has a low refractive index, is excellent in abrasion resistance and antifouling properties, and is also excellent in abrasion resistance, and is useful as a low refractive index layer which is the outermost layer of the antireflection film.
本発明の硬化膜の屈折率は、通常1.44以下であり、好ましくは1.40以下であり、より好ましくは1.38以下である。 The refractive index of the cured film of the present invention is usually 1.44 or less, preferably 1.40 or less, more preferably 1.38 or less.
本発明の硬化膜を反射防止膜の低屈折率層として用いる場合の、反射防止積層体の構成、即ち、基材、層構成、各層の材料、作製方法、膜厚等は公知の通りであるためここでは詳しい説明は省略する。 When the cured film of the present invention is used as the low refractive index layer of the antireflection film, the structure of the antireflection laminate, that is, the base material, the layer structure, the material of each layer, the production method, the film thickness, and the like are known. Therefore, detailed description is omitted here.
以下、本発明を実施例によってさらに具体的に説明するが、本発明は実施例によって何ら限定されるものではない。 EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited to the examples.
合成例1:化合物1の合成
撹拌機、還流管及び乾燥空気導入管を備えた反応容器に、2,6−ジ−t−ブチル−p−クレゾール(吉富ファインケミカル社製、ヨシノックスBHT)(0.024g、0.1mmol)、ポリジメチルシロキサンモノオール(チッソ株式会社製、サイラプレーンFM0411)(23.80g)、2,4−トリレンジイソシアナート(三井化学ポリウレタン社製、TOLDY−100)(4.14g、23.8mmol)及びメチルエチルケトン(丸善石油化学株式会社製)(27.94g)を加え、水浴にて冷却した。10℃±5℃にてジラウリル酸ジブチル錫(共同薬品社製、CASTIN−D)(0.080g、0.1mmol)を添加した後、室温にて1.5〜2.0時間攪拌した。次いで、反応混合物を水浴にて冷却し、ここに、メチルエチルケトン(35.70g)、パーフルオロポリエーテルジオール(ソルベイソレクシス製、Fluorolink D10H)(35.70g)を添加した後、60℃まで昇温し、同温度で2時間加熱する。反応混合物を水浴にて冷却し、ここに、メチルエチルケトンで固形分濃度50質量%に希釈したトリイソシアナ−ト(住化バイエルウレタン株式会社製、スミジュールN3300)(12.01g、23.8mmol)を添加し、室温で2時間攪拌した。次いで、反応混合物を水浴にて冷却し、ここに、メチルエチルケトンで固形分濃度50質量%に希釈したペンタエリスリトールトリアクリレート(新中村化学株式会社製)(24.35g)を添加し、60℃に昇温し、同温度で4時間加熱を行い、上記構造式で表される化合物1のメチルエチルケトン溶液を得た(200g)。 In a reaction vessel equipped with a stirrer, a reflux pipe and a dry air introduction pipe, 2,6-di-t-butyl-p-cresol (Yoshinox Fine Chemicals, Yoshinox BHT) (0.024 g, 0.1 mmol), poly Dimethylsiloxane monool (manufactured by Chisso Corporation, Silaplane FM0411) (23.80 g), 2,4-tolylene diisocyanate (manufactured by Mitsui Chemicals Polyurethanes Co., Ltd., TOLDY-100) (4.14 g, 23.8 mmol) and methyl ethyl ketone (Maruzen Petrochemical Co., Ltd.) (27.94 g) was added and cooled in a water bath. After adding dibutyltin dilaurate (manufactured by Kyodo Pharmaceutical Co., Ltd., CASTIN-D) (0.080 g, 0.1 mmol) at 10 ° C. ± 5 ° C., the mixture was stirred at room temperature for 1.5 to 2.0 hours. Next, the reaction mixture was cooled in a water bath, and methyl ethyl ketone (35.70 g) and perfluoropolyether diol (manufactured by Solvay Solexis, Fluorolink D10H) (35.70 g) were added thereto, and then the temperature was raised to 60 ° C. And heated at the same temperature for 2 hours. The reaction mixture was cooled in a water bath, and triisocyanate (Sumidule N3300, manufactured by Sumika Bayer Urethane Co., Ltd.) (12.01 g, 23.8 mmol) diluted with methyl ethyl ketone to a solid content concentration of 50% by mass was added thereto. And stirred at room temperature for 2 hours. Next, the reaction mixture was cooled in a water bath, and pentaerythritol triacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd.) (24.35 g) diluted with methyl ethyl ketone to a solid content concentration of 50% by mass was added and the temperature was raised to 60 ° C. The mixture was heated and heated at the same temperature for 4 hours to obtain a methyl ethyl ketone solution of Compound 1 represented by the above structural formula (200 g).
得られた化合物1のIRチャート、1H NMRチャート、13C{1H} NMRチャートをそれぞれ図1〜3に示す。 The resulting IR chart of Compound 1, 1 H NMR chart, showing the 13 C {1 H} NMR chart in FIGS 1-3.
合成例2:化合物2の合成
撹拌機、還流管及び乾燥空気導入管を備えた反応容器に、2,6−ジ−t−ブチル−p−クレゾール(吉富ファインケミカル社製、ヨシノックスBHT)(0.024g、0.1mmol)、ポリジメチルシロキサンモノオール(チッソ株式会社製、サイラプレーンFM0411)(18.57g)、2,4−トリレンジイソシアナート(三井化学ポリウレタン社製、TOLDY−100)(3.23g、18.6mmol)及びメチルエチルケトン(丸善石油化学株式会社製)(21.80g)を加え、水浴にて冷却した。10℃±5℃にてジラウリル酸ジブチル錫(共同薬品社製、CASTIN−D)(0.080g、0.1mmol)を添加した後、室温にて1.5〜2.0時間攪拌した。次いで、反応混合物を水浴にて冷却し、ここに、メチルエチルケトン(27.86g)、パーフルオロポリエーテルジオール(ソルベイソレクシス製、Fluorolink D10H)(27.86g)を添加した後、60℃まで昇温し、同温度で2時間加熱した。反応混合物を水浴にて冷却し、ここに、メチルエチルケトンで固形分濃度50質量%に希釈したトリイソシアナ−ト(住化バイエルウレタン株式会社製、スミジュールN3300)(9.37g、18.6mmol)を添加し、室温で2時間攪拌した。次いで、反応混合物を水浴にて冷却し、ここに、メチルエチルケトンで固形分濃度50質量%に希釈したジペンタエリスリトールペンタ/ヘキサアクリレート(東亜合成株式会社製:アロニックスM403)(40.97g)を添加し、60℃に昇温し、同温度で4時間加熱を行い、上記構造式で表される化合物2のメチルエチルケトン溶液を得た(200g)。 In a reaction vessel equipped with a stirrer, a reflux pipe and a dry air introduction pipe, 2,6-di-t-butyl-p-cresol (Yoshinox Fine Chemicals, Yoshinox BHT) (0.024 g, 0.1 mmol), poly Dimethylsiloxane monool (manufactured by Chisso Corporation, Silaplane FM0411) (18.57 g), 2,4-tolylene diisocyanate (manufactured by Mitsui Chemicals Polyurethanes Co., Ltd., TOLDY-100) (3.23 g, 18.6 mmol) and methyl ethyl ketone (Maruzen Petrochemical Co., Ltd.) (21.80 g) was added and cooled in a water bath. After adding dibutyltin dilaurate (manufactured by Kyodo Pharmaceutical Co., Ltd., CASTIN-D) (0.080 g, 0.1 mmol) at 10 ° C. ± 5 ° C., the mixture was stirred at room temperature for 1.5 to 2.0 hours. Next, the reaction mixture was cooled in a water bath, and methyl ethyl ketone (27.86 g) and perfluoropolyether diol (manufactured by Solvay Solexis, Fluorolink D10H) (27.86 g) were added thereto, and the temperature was raised to 60 ° C. And heated at the same temperature for 2 hours. The reaction mixture was cooled in a water bath, and triisocyanate (Sumidule N3300, manufactured by Sumika Bayer Urethane Co., Ltd.) (9.37 g, 18.6 mmol) diluted with methyl ethyl ketone to a solid concentration of 50% by mass was added thereto. And stirred at room temperature for 2 hours. Next, the reaction mixture was cooled in a water bath, and dipentaerythritol penta / hexaacrylate (manufactured by Toagosei Co., Ltd .: Aronix M403) (40.97 g) diluted with methyl ethyl ketone to a solid content concentration of 50% by mass was added thereto. The mixture was heated to 60 ° C. and heated at the same temperature for 4 hours to obtain a methyl ethyl ketone solution of compound 2 represented by the above structural formula (200 g).
得られた化合物2のIRチャート、1H NMRチャート、13C{1H} NMRチャートをそれぞれ図4〜6に示す。 The IR chart, 1 H NMR chart, and 13 C { 1 H} NMR chart of the obtained compound 2 are shown in FIGS.
合成例3:化合物3の合成
撹拌機、還流管及び乾燥空気導入管を備えた反応容器に、2,6−ジ−t−ブチル−p−クレゾール(吉富ファインケミカル社製、ヨシノックスBHT)(0.024g、0.1mmol)、ポリジメチルシロキサンモノオール(チッソ株式会社製、サイラプレーンFM0421)(60.96g)、2,4−トリレンジイソシアナート(三井化学ポリウレタン社製、TOLDY−100)(2.12g、11.9mmol)及びメチルエチルケトン(丸善石油化学株式会社製)(63.08g)を加え、水浴にて冷却した。10℃±5℃にてジラウリル酸ジブチル錫(共同薬品社製、CASTIN−D)(0.080g、0.1mmol)を添加した後、室温にて1.5〜2.0時間攪拌した。次いで、反応混合物を水浴にて冷却し、ここに、メチルエチルケトン(18.29g)、パーフルオロポリエーテルジオール(ソルベイソレクシス製、Fluorolink D10H)(18.29g)を添加した後、60℃まで昇温し、同温度で2時間加熱した。反応混合物を水浴にて冷却し、ここに、メチルエチルケトンで固形分濃度50質量%に希釈したトリイソシアナ−ト(住化バイエルウレタン株式会社製、スミジュールN3300)(6.15g、12.2mmol)を添加し、室温で2時間攪拌した。次いで、反応混合物を水浴にて冷却し、ここに、メチルエチルケトンで固形分濃度50質量%に希釈したペンタエリスリトールトリアクリレート(新中村化学株式会社製)(12.47g)を添加し、60℃に昇温し、同温度で4時間加熱を行い、上記構造式で表される化合物3のメチルエチルケトン溶液を得た(200g)。 In a reaction vessel equipped with a stirrer, a reflux pipe and a dry air introduction pipe, 2,6-di-t-butyl-p-cresol (Yoshinox Fine Chemicals, Yoshinox BHT) (0.024 g, 0.1 mmol), poly Dimethylsiloxane monool (manufactured by Chisso Corporation, Silaplane FM0421) (60.96 g), 2,4-tolylene diisocyanate (manufactured by Mitsui Chemicals Polyurethanes Co., Ltd., TOLDY-100) (2.12 g, 11.9 mmol) and methyl ethyl ketone (Maruzen Petrochemical Co., Ltd.) (63.08 g) was added and cooled in a water bath. After adding dibutyltin dilaurate (manufactured by Kyodo Pharmaceutical Co., Ltd., CASTIN-D) (0.080 g, 0.1 mmol) at 10 ° C. ± 5 ° C., the mixture was stirred at room temperature for 1.5 to 2.0 hours. Next, the reaction mixture was cooled in a water bath, and methyl ethyl ketone (18.29 g) and perfluoropolyether diol (manufactured by Solvay Solexis, Fluorolink D10H) (18.29 g) were added thereto, and the temperature was raised to 60 ° C. And heated at the same temperature for 2 hours. The reaction mixture was cooled in a water bath, and triisocyanate (Sumidule N3300, manufactured by Sumika Bayer Urethane Co., Ltd.) (6.15 g, 12.2 mmol) diluted with methyl ethyl ketone to a solid content concentration of 50% by mass was added thereto. And stirred at room temperature for 2 hours. Next, the reaction mixture was cooled in a water bath, and pentaerythritol triacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd.) (12.47 g) diluted with methyl ethyl ketone to a solid content concentration of 50% by mass was added and the temperature was raised to 60 ° C. The mixture was heated and heated at the same temperature for 4 hours to obtain a methyl ethyl ketone solution of compound 3 represented by the above structural formula (200 g).
得られた化合物2のIRチャート、1H NMRチャート、13C{1H} NMRチャートをそれぞれ図7〜9に示す。 The IR chart, 1 H NMR chart, and 13 C { 1 H} NMR chart of the obtained Compound 2 are shown in FIGS.
合成例4:化合物4の合成
撹拌機、還流管及び乾燥空気導入管を備えた反応容器に、2,6−ジ−t−ブチル−p−クレゾール(吉富ファインケミカル社製、ヨシノックスBHT)(0.024g、0.1mmol)、ポリジメチルシロキサンモノオール(チッソ株式会社製、サイラプレーンFM0421)(53.28g)、2,4−トリレンジイソシアナート(三井化学ポリウレタン社製、TOLDY−100)(1.85g、10.6mmol)及びメチルエチルケトン(丸善石油化学株式会社製)(55.13g)を加え、水浴にて冷却した。10℃±5℃にてジラウリル酸ジブチル錫(共同薬品社製、CASTIN−D)(0.080g、0.1mmol)を添加した後、室温にて1.5〜2.0時間攪拌した。次いで、反応混合物を水浴にて冷却し、ここに、メチルエチルケトン(15.98g)、パーフルオロポリエーテルジオール(ソルベイソレクシス製、Fluorolink D10H)(15.98g)を添加した後、60℃まで昇温し、同温度で2時間加熱した。反応混合物を水浴にて冷却し、ここに、メチルエチルケトンで固形分濃度50質量%に希釈したトリイソシアナ−ト(住化バイエルウレタン株式会社製、スミジュールN3300)(5.38g、10.7mmol)を添加し、室温で2時間攪拌した。次いで、反応混合物を水浴にて冷却し、ここに、メチルエチルケトンで固形分濃度50質量%に希釈したジペンタエリスリトールペンタ/ヘキサアクリレート(東亜合成株式会社製:アロニックスM403)(23.51g)を添加し、60℃に昇温し、同温度で4時間加熱を行い、上記構造式で表される化合物4のメチルエチルケトン溶液を得た(200g)。 In a reaction vessel equipped with a stirrer, a reflux pipe and a dry air introduction pipe, 2,6-di-t-butyl-p-cresol (Yoshinox Fine Chemicals, Yoshinox BHT) (0.024 g, 0.1 mmol), poly Dimethylsiloxane monool (manufactured by Chisso Corporation, Silaplane FM0421) (53.28 g), 2,4-tolylene diisocyanate (manufactured by Mitsui Chemicals Polyurethanes Co., Ltd., TOLDY-100) (1.85 g, 10.6 mmol) and methyl ethyl ketone (Maruzen Petrochemical Co., Ltd.) (55.13 g) was added and cooled in a water bath. After adding dibutyltin dilaurate (manufactured by Kyodo Pharmaceutical Co., Ltd., CASTIN-D) (0.080 g, 0.1 mmol) at 10 ° C. ± 5 ° C., the mixture was stirred at room temperature for 1.5 to 2.0 hours. Next, the reaction mixture was cooled in a water bath, and methyl ethyl ketone (15.98 g) and perfluoropolyether diol (manufactured by Solvay Solexis, Fluorolink D10H) (15.98 g) were added thereto, and then the temperature was raised to 60 ° C. And heated at the same temperature for 2 hours. The reaction mixture was cooled in a water bath, and triisocyanate (Sumidule N3300, manufactured by Sumika Bayer Urethane Co., Ltd.) (5.38 g, 10.7 mmol) diluted with methyl ethyl ketone to a solid concentration of 50% by mass was added thereto. And stirred at room temperature for 2 hours. Next, the reaction mixture was cooled in a water bath, and dipentaerythritol penta / hexaacrylate (Aronix M403, manufactured by Toagosei Co., Ltd.) (23.51 g) diluted with methyl ethyl ketone to a solid content concentration of 50% by mass was added thereto. The mixture was heated to 60 ° C. and heated at the same temperature for 4 hours to obtain a methyl ethyl ketone solution of compound 4 represented by the above structural formula (200 g).
得られた化合物4のIRチャート、1H NMRチャート、13C{1H} NMRチャートをそれぞれ図10〜12に示す。 The IR chart, 1 H NMR chart, and 13 C { 1 H} NMR chart of the obtained compound 4 are shown in FIGS.
合成例5:化合物5の合成
撹拌機、還流管及び乾燥空気導入管を備えた反応容器に、2,6−ジ−t−ブチル−p−クレゾール(吉富ファインケミカル、ヨシノックスBHT)(0.024g、0.1mmol)、パーフルオロポリエーテルジオール(ソルベイソレクシス社製、Fluorolink D10H)(18.87g)、2,4−トリレンジイソシアナート(三井化学ポリウレタン社製、TOLDY−100)(4.38g、25.2mmol)及びメチルエチルケトン(丸善石油化学株式会社製)(23.25g)を加え、水浴にて冷却した。10℃±5℃にてジラウリル酸ジブチル錫(共同薬品社製、CASTIN−D)(0.080g、0.1mmol)を添加した後、60℃まで昇温し、1.5時間加熱した。次いで、反応混合物を水浴にて冷却し、ここに、メチルエチルケトンで固形分濃度50質量%に希釈したポリジメチルシロキサンモノアルコール(チッソ株式会社、サイラプレーンFM0421)(62.88g)を滴下漏斗を用いて添加した。これを60℃まで昇温し、2時間加熱した。次いで、ジペンタエリスリトールペンタアクリレート(東亞合成株式会社製、アロトニックスM403)(13.87g)を滴下漏斗を用いて添加した。これを60℃まで昇温し、4時間加熱した。このようにして上記化学構造式で示される化合物2のメチルエチルケトン溶液(200g)を得た。 In a reaction vessel equipped with a stirrer, a reflux pipe and a dry air introduction pipe, 2,6-di-t-butyl-p-cresol (Yoshitomi Fine Chemical, Yoshinox BHT) (0.024 g, 0.1 mmol), perfluoropoly Ether diol (manufactured by Solvay Solexis, Fluorolink D10H) (18.87 g), 2,4-tolylene diisocyanate (manufactured by Mitsui Chemicals Polyurethane, TOLDY-100) (4.38 g, 25.2 mmol) and methyl ethyl ketone (Maruzen) Petrochemical Co., Ltd.) (23.25 g) was added and cooled in a water bath. After adding dibutyltin dilaurate (manufactured by Kyodo Yakuhin Co., Ltd., CASTIN-D) (0.080 g, 0.1 mmol) at 10 ° C. ± 5 ° C., the temperature was raised to 60 ° C. and heated for 1.5 hours. Next, the reaction mixture was cooled in a water bath, and polydimethylsiloxane monoalcohol (Chisso Corp., Silaplane FM0421) (62.88 g) diluted with methyl ethyl ketone to a solid content concentration of 50% by mass was added thereto using a dropping funnel. Added. This was heated up to 60 degreeC and heated for 2 hours. Next, dipentaerythritol pentaacrylate (manufactured by Toagosei Co., Ltd., Allotonics M403) (13.87 g) was added using a dropping funnel. This was heated to 60 ° C. and heated for 4 hours. Thus, a methyl ethyl ketone solution (200 g) of compound 2 represented by the above chemical structural formula was obtained.
得られた化合物2のIRチャート、1H NMRチャート、13C{1H} NMRチャートをそれぞれ図13〜15に示す。 An IR chart, 1 H NMR chart, and 13 C { 1 H} NMR chart of the obtained compound 2 are shown in FIGS.
製造例1:エチレン性不飽和基含有含フッ素重合体の製造
水酸基含有含フッ素重合体の合成
内容積1.0リットルの電磁攪拌機付きステンレス製オートクレーブを窒素ガスで十分置換した後、酢酸エチル600g、パーフルオロ(プロピルビニルエーテル)138.5g、エチルビニルエーテル37.5g、ヒドロキシエチルビニルエーテル45.9g、過酸化ラウロイル1.5g、アゾ基含有ポリジメチルシロキサン(VPS1001(商品名)、和光純薬工業(株)製)9.0g及びノニオン性反応性乳化剤(ER−30(商品名)、旭電化工業(株)製)45gを仕込み、ドライアイス−メタノールで−50℃まで冷却した後、再度窒素ガスで系内の酸素を除去した。
Production Example 1 Production of Ethylenically Unsaturated Group-Containing Fluoropolymer Synthesis of Hydroxyl-Containing Fluoropolymer A stainless steel autoclave with an internal volume of 1.0 liter with a magnetic stirrer was sufficiently substituted with nitrogen gas, and then 600 g of ethyl acetate 138.5 g perfluoro (propyl vinyl ether), 37.5 g ethyl vinyl ether, 45.9 g hydroxyethyl vinyl ether, 1.5 g lauroyl peroxide, azo group-containing polydimethylsiloxane (VPS1001 (trade name), Wako Pure Chemical Industries, Ltd.) 9.0 g) and 45 g of a nonionic reactive emulsifier (ER-30 (trade name), manufactured by Asahi Denka Kogyo Co., Ltd.), cooled to -50 ° C. with dry ice-methanol, and then again with nitrogen gas The oxygen inside was removed.
次いでヘキサフルオロプロピレン85.9gを仕込み、昇温を開始した。オートクレーブ内の温度が55℃に達した時点での圧力は4.1×105Paを示した。その後、70℃で20時間攪拌下に反応を継続し、圧力が2.0×105Paに低下した時点でオートクレーブを水冷し、反応を停止させた。室温に達した後、未反応モノマーを放出してオートクレーブを開放し、固形分濃度30.0%のポリマー溶液を得た。得られたポリマー溶液をメタノールに投入しポリマーを析出させた後、メタノールにて洗浄し、50℃にて真空乾燥を行い250gの水酸基含有含フッ素重合体を得た。これを水酸基含有含フッ素重合体とする。 Next, 85.9 g of hexafluoropropylene was charged and the temperature increase was started. The pressure when the temperature in the autoclave reached 55 ° C. was 4.1 × 10 5 Pa. Thereafter, the reaction was continued with stirring at 70 ° C. for 20 hours. When the pressure dropped to 2.0 × 10 5 Pa, the autoclave was cooled with water to stop the reaction. After reaching room temperature, unreacted monomers were released and the autoclave was opened to obtain a polymer solution having a solid content concentration of 30.0%. The obtained polymer solution was put into methanol to precipitate a polymer, washed with methanol, and vacuum dried at 50 ° C. to obtain 250 g of a hydroxyl group-containing fluoropolymer. This is referred to as a hydroxyl group-containing fluoropolymer.
電磁攪拌機、ガラス製冷却管及び温度計を備えた容量1リットルのセパラブルフラスコに、上記で得られた水酸基含有含フッ素重合体を50.0g、重合禁止剤として2,6−ジ−t−ブチルメチルフェノール0.01g及びメチルイソブチルケトン(MIBK)359gを仕込み、20℃で水酸基含有含フッ素重合体1がMIBKに溶解して、溶液が透明、均一になるまで攪拌を行った。
次いで、この系に、2−メタクリロイルオキシエチルイソシアネート13.4gを添加し、溶液が均一になるまで攪拌した後、ジブチルチンジラウレート0.1gを添加して反応を開始し、系の温度を55〜65℃に保持し5時間攪拌を継続することにより、エチレン性不飽和基含有含フッ素重合体のMIBK溶液を得た。
この溶液をアルミ皿に2g秤量後、150℃のホットプレート上で5分間乾燥、秤量して固形分含量を求めたところ、15.0質量%であった。
In a 1-liter separable flask equipped with a magnetic stirrer, a glass condenser and a thermometer, 50.0 g of the hydroxyl group-containing fluoropolymer obtained above and 2,6-di-t- 0.01 g of butylmethylphenol and 359 g of methyl isobutyl ketone (MIBK) were charged and stirred at 20 ° C. until the hydroxyl group-containing fluoropolymer 1 was dissolved in MIBK and the solution became transparent and uniform.
Next, 13.4 g of 2-methacryloyloxyethyl isocyanate was added to this system and stirred until the solution became homogeneous, then 0.1 g of dibutyltin dilaurate was added to start the reaction, and the temperature of the system was changed to 55 to 55. A MIBK solution of an ethylenically unsaturated group-containing fluoropolymer was obtained by maintaining the temperature at 65 ° C. and continuing stirring for 5 hours.
2 g of this solution was weighed in an aluminum dish, dried on a hot plate at 150 ° C. for 5 minutes, and weighed to determine the solid content, which was 15.0% by mass.
製造例2:
特定有機化合物(S1)(シリカ粒子の表面変性剤)の製造
乾燥空気中、メルカプトプロピルトリメトキシシラン23.0部、ジブチルスズジラウレート0.5部からなる溶液に対し、イソホロンジイソシアネート60.0部を攪拌しながら50℃で1時間かけて滴下後、70℃で3時間攪拌した。これに新中村化学製NKエステルA−TMM−3LM−N(ペンタエリスリトールトリアクリレート60質量%とペンタエリスリトールテトラアクリレート40質量%とからなる。このうち、反応に関与するのは、水酸基を有するペンタエリスリトールトリアクリレートのみである。)202.0部を30℃で1時間かけて滴下後、60℃で3時間加熱攪拌することで特定有機化合物(S1)を得た。
生成物の赤外吸収スペクトルは原料中のメルカプト基に特徴的な2550cm−1の吸収ピーク及びイソシアネート基に特徴的な2260cm−1の吸収ピークが消失し、新たに、[−O−C(=O)−NH−]基及び[−S−C(=O)−NH−]基中のカルボニルに特徴的な1660cm−1のピーク及びアクリロイル基に特徴的な1720cm−1のピ−クが観察され、重合性不飽和基としてのアクリロイル基と[−S−C(=O)−NH−]基、[−O−C(=O)−NH−]基を共に有する特定有機化合物が生成していることを示した。
Production Example 2:
Manufacture of specific organic compound (S1) (Silica particle surface modifier) In dry air, 60.0 parts of isophorone diisocyanate is stirred in a solution consisting of 23.0 parts of mercaptopropyltrimethoxysilane and 0.5 parts of dibutyltin dilaurate. While dropping at 50 ° C. over 1 hour, the mixture was stirred at 70 ° C. for 3 hours. This is composed of NK ester A-TMM-3LM-N (manufactured by Shin-Nakamura Chemical Co., Ltd.) comprising 60% by mass of pentaerythritol triacrylate and 40% by mass of pentaerythritol tetraacrylate. Of these, it is pentaerythritol having a hydroxyl group that is involved in the reaction. (Only triacrylate.) After adding 202.0 parts dropwise at 30 ° C. over 1 hour, specific organic compound (S1) was obtained by heating and stirring at 60 ° C. for 3 hours.
In the infrared absorption spectrum of the product, the absorption peak at 2550 cm −1 characteristic for the mercapto group in the raw material and the absorption peak at 2260 cm −1 characteristic for the isocyanate group disappear, and [−O—C (= O) -NH-] group and [-S-C (= O) -NH-] peak characteristic 1720 cm -1 to the carbonyl in the group the peak and acryloyl groups characteristic 1660 cm -1 - click is observed And a specific organic compound having both an acryloyl group as a polymerizable unsaturated group, a [—S—C (═O) —NH—] group, and a [—O—C (═O) —NH—] group is formed. Showed that.
製造例3:
アクリル変性中空シリカ粒子の製造
製造例2で合成した特定有機化合物(S1)3.0部、中空シリカ粒子(JX1009SIV、メチルイソブチルケトンゾル、触媒化成工業製)137部(固形分30.1部)、イオン交換水0.1部、0.05mol/Lの希硫酸0.01部の混合液を、80℃、3時間攪拌後、オルト蟻酸メチルエステル1.4部を用いて粒子分散液D−1を得た。D−1の固形分含量を求めたところ、25質量%であった。
このシリカ系粒子の平均粒子径は、50nmであった。ここで、平均粒子径は透過型電子顕微鏡により測定した。
Production Example 3:
Production of acrylic modified hollow silica particles 3.0 parts of the specific organic compound (S1) synthesized in Production Example 2, 137 parts of hollow silica particles (JX1009SIV, methyl isobutyl ketone sol, manufactured by Catalyst Chemical Industries) (solid content 30.1 parts) A mixture of 0.1 part of ion-exchanged water and 0.01 part of 0.05 mol / L dilute sulfuric acid was stirred at 80 ° C. for 3 hours, and then the particle dispersion D- was obtained using 1.4 parts of orthoformate methyl ester. 1 was obtained. It was 25 mass% when solid content of D-1 was calculated | required.
The average particle diameter of the silica-based particles was 50 nm. Here, the average particle diameter was measured with a transmission electron microscope.
<硬化性組成物の製造>
実施例1
製造例1で製造したエチレン性不飽和基含有含フッ素重合体のMIBK溶液を100g(成分(B−2)の固形分として15g)、ペンタエリスリトールトリアクリレート(PET−30、日本化薬製)(成分(C))を7g、中空シリカ粒子のMIBKゾル(ELCOM JX1009SIV、触媒化成製)を200g(成分(D)の固形分として50g)、トリアクリロイルヘプタデカフルオロノネニルペンタエリスリトール(LINC−3A、共栄社化学製)((成分(B−1))20g、光重合開始剤として、2−ヒドロキシ−1−{4−[4−(2−ヒドロキシ−2−メチル−プロピオニル)−ベンジル]−フェニル}−2−メチル−プロパン−1−オン(イルガキュア127、チバ・スペシャルティ・ケミカルズ製)(成分(E))3g、合成例1で合成した化合物1(成分(A))を3g及びMIBK2117gを、攪拌機をつけたガラス製セパラブルフラスコに仕込み、室温にて1時間攪拌し均一な硬化性組成物を得た。また、製造例1の方法により固形分濃度を求めたところ4.0質量%であった。
<Manufacture of curable composition>
Example 1
100 g of MIBK solution of the ethylenically unsaturated group-containing fluoropolymer produced in Production Example 1 (15 g as the solid content of component (B-2)), pentaerythritol triacrylate (PET-30, manufactured by Nippon Kayaku) ( Component (C)) 7 g, hollow silica particle MIBK sol (ELCOM JX1009SIV, produced by catalytic conversion) 200 g (50 g as the solid content of component (D)), triacryloylheptadecafluorononenyl pentaerythritol (LINC-3A, Manufactured by Kyoeisha Chemical Co., Ltd.) ((Component (B-1)) 20 g, as a photopolymerization initiator, 2-hydroxy-1- {4- [2- (2-hydroxy-2-methyl-propionyl) -benzyl] -phenyl} 2-methyl-propan-1-one (Irgacure 127, manufactured by Ciba Specialty Chemicals) (component (E)) 3 g, 3 g of Compound 1 (component (A)) synthesized in Synthesis Example 1 and 2117 g of MIBK were charged into a glass separable flask equipped with a stirrer and stirred at room temperature for 1 hour to obtain a uniform curable composition. The solid content concentration determined by the method of Production Example 1 was 4.0% by mass.
実施例2〜16及び比較例1〜7
下記表1−1〜1−3に示す組成とした以外は実施例1と同様にして各硬化性組成物を得た。
Examples 2-16 and Comparative Examples 1-7
Each curable composition was obtained like Example 1 except having set it as the composition shown to the following Table 1-1 to 1-3.
<硬化膜の作製>
(1)硬化性組成物塗工用基材の作製
TACフィルム(厚さ50μm)に、調製したハードコート層用組成物をワイヤーバーコータで膜厚6μmとなるように塗工し、オーブン中、80℃で1分間乾燥し、塗膜を形成した。次いで、空気下、高圧水銀ランプを用いて、300mJ/cm2の光照射条件で紫外線を照射し、硬化性組成物塗工用基材を作製した。
<Production of cured film>
(1) Preparation of base material for curable composition coating On the TAC film (thickness 50 μm), the prepared composition for hard coat layer was applied with a wire bar coater to a film thickness of 6 μm. The film was dried at 80 ° C. for 1 minute to form a coating film. Next, ultraviolet rays were irradiated under a light irradiation condition of 300 mJ / cm 2 using a high-pressure mercury lamp in the air to prepare a curable composition coating substrate.
(2)低屈折率材の作製
上記実施例及び比較例で得られた各硬化性組成物を、ワイヤーバーコータを用いて上記で得られた硬化性組成物塗工用基材のハードコート上に膜厚0.1μmとなるように塗工し、80℃で1分間乾燥し、塗膜を形成した。次いで、窒素気流下、高圧水銀ランプを用いて、600mJ/cm2の光照射条件で紫外線を照射し、反射防止膜を作製した。
(2) Production of Low Refractive Index Material Each curable composition obtained in the above examples and comparative examples was hard coated on a curable composition coating substrate obtained above using a wire bar coater. The film was coated to a thickness of 0.1 μm and dried at 80 ° C. for 1 minute to form a coating film. Next, ultraviolet rays were irradiated under a light irradiation condition of 600 mJ / cm 2 using a high-pressure mercury lamp under a nitrogen stream to produce an antireflection film.
<硬化膜の物性評価>
上記で得られた各硬化膜について、屈折率、耐擦傷性、耐摩耗性及び防汚性を測定又は評価した。結果を表1−1〜1−3に示す。
<Evaluation of physical properties of cured film>
Each cured film obtained above was measured or evaluated for refractive index, scratch resistance, abrasion resistance and antifouling property. The results are shown in Tables 1-1 to 1-3.
(1)屈折率
反射防止膜の裏面を黒色スプレーで塗装し、分光反射率測定装置(大型試料室積分球付属装置150−09090を組み込んだ自記分光光度計U−3410、日立製作所(株)製)により、波長340〜700nmの範囲で反射率を基材側から測定して評価した。具体的には、アルミの蒸着膜における反射率を基準(100%)として、各波長における反射防止用積層体(反射防止膜)の反射率を測定し、そのうち波長550nmにおける光の反射率から、屈折率を算出した。
(1) Refractive index The back surface of the antireflection film is coated with black spray, and a spectral reflectance measuring device (a self-recording spectrophotometer U-3410 incorporating a large sample chamber integrating sphere attachment device 150-09090, manufactured by Hitachi, Ltd.) ), The reflectance was measured and evaluated from the substrate side in the wavelength range of 340 to 700 nm. Specifically, the reflectance of the antireflection laminate (antireflection film) at each wavelength is measured using the reflectance of the aluminum deposited film as a reference (100%), and from the reflectance of light at a wavelength of 550 nm, The refractive index was calculated.
(2)耐擦傷性(耐スチールウール性)
得られた硬化膜を、スチールウール(ボンスターNo.0000、日本スチールウール(株)製)を学振型摩擦堅牢度試験機(AB-301、テスター産業(株)製)に取りつけ、硬化膜の表面を荷重200gの条件で10回繰り返し擦過し、当該硬化膜の表面における傷の発生の有無を目視で確認し、下記評価基準に従って評価した。結果を表1−1〜1−3に示す。
◎:硬化膜に傷が発生しない。
○:硬化膜の剥離や傷の発生がほとんど認められないか、あるいは硬化膜にわずかな細い傷が認められる。
△:硬化膜全面に筋状の傷が認められる。
×:硬化膜の剥離が生じる。
(2) Scratch resistance (steel wool resistance)
The obtained cured film was attached with steel wool (Bonster No. 0000, manufactured by Nippon Steel Wool Co., Ltd.) to a Gakushin type friction fastness tester (AB-301, manufactured by Tester Sangyo Co., Ltd.). The surface was repeatedly rubbed 10 times under a load of 200 g, the presence or absence of scratches on the surface of the cured film was visually confirmed, and evaluated according to the following evaluation criteria. The results are shown in Tables 1-1 to 1-3.
A: The cured film is not damaged.
◯: Almost no peeling or scratching of the cured film is observed, or slight thin scratches are observed on the cured film.
Δ: Streaky scratches are observed on the entire surface of the cured film.
X: Peeling of the cured film occurs.
(3)耐摩耗性(布)
得られた硬化膜を、ベンコットM−3(旭化成製)を学振型摩擦堅牢度試験機(AB-301、テスター産業(株)製)に取りつけ、硬化膜の表面を荷重500gの条件で50回繰り返し擦過し、当該硬化膜の表面における傷の発生の有無を、目視で確認し、下記評価基準に従って評価した。結果を表1−1〜1−3に示す。
◎:硬化膜に傷が発生しない。
○:硬化膜にわずかな色目変化が認められる。
△:硬化膜に強い色目変化が認められる。
×:硬化膜に傷、剥離が生じる。
(3) Abrasion resistance (cloth)
The obtained cured film was attached with Bencot M-3 (manufactured by Asahi Kasei) to a Gakushin type friction fastness tester (AB-301, manufactured by Tester Sangyo Co., Ltd.), and the surface of the cured film was loaded under the condition of a load of 500 g. By rubbing repeatedly, the presence or absence of scratches on the surface of the cured film was visually confirmed and evaluated according to the following evaluation criteria. The results are shown in Tables 1-1 to 1-3.
A: The cured film is not damaged.
○: A slight color change is observed in the cured film.
Δ: A strong color change is observed in the cured film.
X: Scratches and peeling occur in the cured film.
(4)耐摩耗性(イソプロパノール+布)
得られた硬化膜を、イソプロパノールを染込ませたベンコットM−3(旭化成製)を学振型摩擦堅牢度試験機(AB-301、テスター産業(株)製)に取りつけ、硬化膜の表面を荷重500gの条件で50回繰り返し擦過し、当該硬化膜の表面における傷の発生の有無を目視で確認し、下記評価基準に従って評価した。結果を表1−1〜1−3に示す。
◎:硬化膜に傷が発生しない。
○:硬化膜にわずかな色目変化が認められる。
△:硬化膜に強い色目変化が認められる。
×:硬化膜に傷、剥離が生じる。
(4) Abrasion resistance (isopropanol + cloth)
The obtained cured film was attached to a Gakushin friction fastness tester (AB-301, manufactured by Tester Sangyo Co., Ltd.) with Bencot M-3 (Asahi Kasei Co., Ltd.) impregnated with isopropanol. Scratching was repeated 50 times under the condition of a load of 500 g, and the presence or absence of scratches on the surface of the cured film was visually confirmed and evaluated according to the following evaluation criteria. The results are shown in Tables 1-1 to 1-3.
A: The cured film is not damaged.
○: A slight color change is observed in the cured film.
Δ: A strong color change is observed in the cured film.
X: Scratches and peeling occur in the cured film.
(5)防汚性(油性マーカー拭き取り性)
得られた反射防止膜表面の約0.25cm2(0.5cm×0.5cm)を油性染料インキタイプのマーキングペン(ゼブラ(株)製、商品名:マッキー)で隙間なく塗りこむ。30秒間自然乾燥させた後、マーカーで塗りこんだ箇所を不織布(ベンコット)で拭き取る。さらに同じ箇所を油性マーカーで塗り込み、同様に拭き取りを繰り返し行い、油性インキが拭き取れなくなるまで行った。油性インキを拭き取ることができた繰り返し回数を数え、下記評価基準に従って評価した。結果を表1−1〜1−3に示す。
◎:5回以上繰返し拭取れる
○:3〜4回拭取れる
△:1〜2回拭取れる
×:1回も拭取れない
(5) Antifouling (oil marker wiping)
About 0.25 cm 2 (0.5 cm × 0.5 cm) of the surface of the obtained antireflection film is coated with an oil-based dye ink type marking pen (manufactured by Zebra Co., Ltd., trade name: McKee) without any gaps. After naturally drying for 30 seconds, the portion coated with the marker is wiped with a non-woven fabric (Bencot). Further, the same portion was coated with an oil marker, and wiping was repeated in the same manner until the oil ink could not be wiped off. The number of repetitions in which the oil-based ink could be wiped was counted and evaluated according to the following evaluation criteria. The results are shown in Tables 1-1 to 1-3.
◎: Can be wiped repeatedly 5 times or more ○: Can be wiped 3 to 4 times △: Can be wiped 1 to 2 times ×: Can not be wiped once
上記表1−1〜1−3中における各成分は下記のものを表す。
ペンタエリスリトールトリアクリレート:PET−30、日本化薬(株)
エチレン性不飽和基含有含フッ素重合体:製造例1で製造
フッ素アクリレート:トリアクリロイルヘプタデカフルオロノネニルペンタエリスリトール、製品名:LINC−3A、共栄社化学(株)
中空シリカ粒子:ELCOM JX−1009SIV、触媒化成工業(株)、平均粒子径50nm、製造例3でアクリル変性させたもの
中実シリカ粒子:MEK−ST−L、日産化学(株)、平均粒子径40nm
化合物1:合成例1で合成
化合物2:合成例2で合成
化合物3:合成例3で合成
化合物4:合成例4で合成
イルガキュア127:チバ・スペシャルティ・ケミカルズ社製
サイラプレーンFM0721:チッソ株式会社製、メタクリロキシ基含有ポリジメチルシロキサン
TEGO Rad2500:Tego社製、ポリエーテルアルキル基含有シリコーンアクリレート
オプツールDAC:ダイキン株式会社製、パーフルオロポリエーテル基含有ウレタンアクリレート
Each component in the above Tables 1-1 to 1-3 represents the following.
Pentaerythritol triacrylate: PET-30, Nippon Kayaku Co., Ltd.
Ethylenically unsaturated group-containing fluoropolymer: produced in Production Example 1 Fluorine acrylate: triacryloylheptadecafluorononenylpentaerythritol, product name: LINC-3A, Kyoeisha Chemical Co., Ltd.
Hollow silica particles: ELCOM JX-1009 SIV, Catalyst Chemical Industry Co., Ltd., average particle size 50 nm, those modified with acrylic in Production Example 3 Solid silica particles: MEK-ST-L, Nissan Chemical Co., Ltd., average particle size 40nm
Compound 1: synthesized in Synthesis Example 1 Compound 2: synthesized in Synthesis Example 2 Compound 3: synthesized in Synthesis Example 3 Compound 4: synthesized in Synthesis Example 4 Irgacure 127: manufactured by Ciba Specialty Chemicals
表1−1〜1−3の結果から、パーフルオロポリエーテル基及びジアルキルシロキサン基を有する化合物を含有する実施例の硬化性組成物からは、耐擦傷性、耐摩耗性、防汚性のいずれにも優れた硬化膜が得られることがわかる。
これに対し、従来のスリップ剤化合物を含有する比較例では、屈折率は実施例と同等であるが、耐擦傷性、耐摩耗性、防汚性のいずれにも劣っている。また、比較例5では、シロキサン基を有さずパーフルオロポリエーテル基を有する化合物(オプツールDAC)と、ポリジメチルシロキサンモノオールである化合物(サイラプレーンFM0421)とを配合したが、耐擦傷性、耐摩耗性、防汚性共に実施例より劣っていることがわかる。
From the results of Tables 1-1 to 1-3, from the curable compositions of Examples containing a compound having a perfluoropolyether group and a dialkylsiloxane group, any of scratch resistance, abrasion resistance, and antifouling property can be obtained. It can be seen that an excellent cured film can be obtained.
On the other hand, in the comparative example containing a conventional slip agent compound, the refractive index is the same as that of the example, but it is inferior in all of scratch resistance, abrasion resistance and antifouling property. In Comparative Example 5, a compound having no siloxane group and having a perfluoropolyether group (Optool DAC) and a compound having a polydimethylsiloxane monool (Silaplane FM0421) were blended. It can be seen that both the wear resistance and antifouling property are inferior to those of the examples.
本発明によれば、屈折率が低く、耐擦傷性(耐スチールウール性)、防汚性(油性マーカー拭き取り性)に優れ、さらに耐摩耗性にも優れた硬化膜を製造することができる。
本発明で得られる硬化膜は、反射防止膜の低屈折率層として有用である。
According to the present invention, a cured film having a low refractive index, excellent scratch resistance (steel wool resistance), antifouling property (oil-based marker wiping property), and excellent wear resistance can be produced.
The cured film obtained by the present invention is useful as a low refractive index layer of an antireflection film.
Claims (6)
(A)下記一般式(1)で示される化合物
(B)エチレン性不飽和基を2個以上含有しフッ素含量が20質量%以上の、前記(A)以外の化合物 A curable composition for forming a low refractive index layer containing the following components (A) and (B).
(A) Compound represented by the following general formula (1)
(B) Compounds other than the above (A), containing two or more ethylenically unsaturated groups and having a fluorine content of 20% by mass or more
(A)下記一般式(1)で示される化合物、
(B)エチレン性不飽和基を2個以上含有しフッ素含量が20質量%以上の、前記(A)以外の化合物
(C)エチレン性不飽和基を2個以上有しフッ素を含まない化合物
(D)空洞を有するシリカ粒子 A curable composition for forming a low refractive index layer, comprising at least one selected from the group consisting of the following component (A), components (B) and (C), and component (D).
(A) a compound represented by the following general formula (1),
(B) Compound other than (A) containing two or more ethylenically unsaturated groups and having a fluorine content of 20% by mass or more (C) Compound having two or more ethylenically unsaturated groups and containing no fluorine ( D) Silica particles having cavities
An antireflection film comprising the cured film according to claim 5 as a low refractive index layer.
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