JP2010077263A - Epoxy resin composition for prepreg, prepreg, and multilayer printed wiring board - Google Patents

Epoxy resin composition for prepreg, prepreg, and multilayer printed wiring board Download PDF

Info

Publication number
JP2010077263A
JP2010077263A JP2008246778A JP2008246778A JP2010077263A JP 2010077263 A JP2010077263 A JP 2010077263A JP 2008246778 A JP2008246778 A JP 2008246778A JP 2008246778 A JP2008246778 A JP 2008246778A JP 2010077263 A JP2010077263 A JP 2010077263A
Authority
JP
Japan
Prior art keywords
epoxy resin
phosphorus
prepreg
resin composition
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008246778A
Other languages
Japanese (ja)
Other versions
JP5547386B2 (en
Inventor
Tomoaki Iwami
知明 岩見
Yasuo Fukuhara
康雄 福原
Kamio Yonemoto
神夫 米本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Panasonic Electric Works Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Electric Works Co Ltd filed Critical Panasonic Electric Works Co Ltd
Priority to JP2008246778A priority Critical patent/JP5547386B2/en
Publication of JP2010077263A publication Critical patent/JP2010077263A/en
Application granted granted Critical
Publication of JP5547386B2 publication Critical patent/JP5547386B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Epoxy Resins (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Reinforced Plastic Materials (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a halogen-free epoxy resin composition for prepregs excellent in flame retardancy and heat resistance, a prepreg, and a multilayer printed wiring board. <P>SOLUTION: The epoxy resin composition for pregregs includes an epoxy resin (A) containing two or more phenyl skeletons in the molecule, a phosphorus-containing epoxy resin (B) obtained by reacting an organic phosphorus compound of a reaction product of at least one selected from phosphorus compounds represented by formula (I) and formula (II) and a quinone compound with an epoxy resin, a phosphorus-containing phenoxy resin (C), and a phenolic curing agent (D) with a phosphorus content of 0.5-1.5 mass% based on the solid content of the epoxy resin composition for prepregs. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、プリプレグ用エポキシ樹脂組成物、プリプレグ、および多層プリント配線板に関するものである。   The present invention relates to an epoxy resin composition for prepreg, a prepreg, and a multilayer printed wiring board.

近年、多層プリント配線板として、内層回路板の導体上に有機絶縁層を交互に積み上げていくビルドアップ配線板が注目されている。中でも、特許文献1、2に記載されているように、回路形成された内層回路板にエポキシ樹脂組成物を塗布、加熱硬化後、酸化剤等を含む粗化溶液により凹凸を有する粗化面を表面に形成し、この粗化面に導体層をめっきにより形成する技術を用いたビルドアップ配線板は、微細回路の形成が可能であることから特に注目されている。   In recent years, a build-up wiring board in which organic insulating layers are alternately stacked on a conductor of an inner circuit board has attracted attention as a multilayer printed wiring board. Among them, as described in Patent Documents 1 and 2, an epoxy resin composition is applied to an inner circuit board on which a circuit has been formed, and after heating and curing, a roughened surface having irregularities with a roughening solution containing an oxidizing agent or the like is provided. A build-up wiring board that is formed on the surface and uses a technique of forming a conductor layer on the roughened surface by plating is particularly attracting attention because a fine circuit can be formed.

一方、近年、環境への負荷を低減させるために、ポリ臭素化されたジベンゾダイオキシン等の人体に悪影響を及ぼす化合物が燃焼時に生じる可能性があるハロゲン系難燃剤を含有しないことや、鉛フリー半田の利用が可能な耐熱性を有することが有機絶縁層に求められている。
特許第3290295号明細書 特許第3290296号明細書
On the other hand, in recent years, in order to reduce the burden on the environment, it does not contain halogen-based flame retardants that may occur during combustion of compounds that adversely affect the human body, such as polybrominated dibenzodioxin, and lead-free solder The organic insulating layer is required to have heat resistance that can be utilized.
Japanese Patent No. 3290295 Japanese Patent No. 3290296

しかしながら、酸化剤等を含む粗化溶液により凹凸を有する粗化面を表面に形成可能な上記したような有機絶縁層においては、ハロゲンフリーでの難燃性と鉛フリー半田の利用が可能な耐熱性との両方を満足するものが得られていないという問題点があった。   However, in the organic insulating layer as described above which can form a rough surface with irregularities on the surface with a roughening solution containing an oxidizing agent, etc., halogen-free flame resistance and heat resistance that can use lead-free solder There was a problem that a product satisfying both of the characteristics was not obtained.

本発明は、以上の通りの事情に鑑みてなされたものであり、酸化剤等を含む粗化溶液による表面への凹凸形成性とめっき密着性が良好であり、さらに難燃性と耐熱性にも優れているハロゲンフリーのプリプレグ用エポキシ樹脂組成物、プリプレグ、およびこれらを用いた多層プリント配線板を提供することを課題としている。   The present invention has been made in view of the circumstances as described above, and has excellent irregularity formation and plating adhesion to the surface by a roughening solution containing an oxidizer and the like, and further has flame retardancy and heat resistance. Another object of the present invention is to provide a halogen-free epoxy resin composition for prepreg, a prepreg, and a multilayer printed wiring board using these.

本発明は、上記の課題を解決するために、以下のことを特徴としている。   The present invention is characterized by the following in order to solve the above problems.

第1に、本発明のプリプレグ用エポキシ樹脂組成物は、1分子中にフェニル骨格を2個以上含むエポキシ樹脂(A)と、下記式(I)または式(II):   1stly, the epoxy resin composition for prepregs of this invention is the epoxy resin (A) which contains two or more phenyl frame | skeletons in 1 molecule, and following formula (I) or Formula (II):

Figure 2010077263
Figure 2010077263

(式中、Rはそれぞれ独立に炭素数1〜6の炭化水素基を示し、nは0〜4の整数を示す。)で表されるリン化合物から選ばれる少なくとも1種およびキノン化合物の反応生成物である有機リン化合物とエポキシ樹脂とを反応させて得られるリン含有エポキシ樹脂(B)と、重量平均分子量30000〜80000のリン含有フェノキシ樹脂(C)と、フェノール系硬化剤(D)とを含有し、リン含有量がプリプレグ用エポキシ樹脂組成物の固形分に対して0.5〜1.5質量%であることを特徴とする。 (In the formula, each R independently represents a hydrocarbon group having 1 to 6 carbon atoms, and n represents an integer of 0 to 4). A reaction product of at least one selected from phosphorus compounds represented by A phosphorus-containing epoxy resin (B) obtained by reacting an organic phosphorus compound and an epoxy resin, a phosphorus-containing phenoxy resin (C) having a weight average molecular weight of 30,000 to 80,000, and a phenol-based curing agent (D) And the phosphorus content is 0.5 to 1.5% by mass with respect to the solid content of the epoxy resin composition for prepreg.

第2に、上記第1のプリプレグ用エポキシ樹脂組成物において、1分子中にフェニル骨格を2個以上含むエポキシ樹脂(A)は、その硬化物が、酸化剤および酸の一方または両方を含む粗化溶液に対して、リン含有エポキシ樹脂(B)の硬化物およびリン含有フェノキシ樹脂(C)の硬化物よりも分解または溶解されにくいものであることを特徴とする。   Second, in the first epoxy resin composition for a prepreg, the epoxy resin (A) containing two or more phenyl skeletons in one molecule is a crude product containing one or both of an oxidizing agent and an acid. It is characterized by being harder to decompose or dissolve than the cured product of the phosphorus-containing epoxy resin (B) and the cured product of the phosphorus-containing phenoxy resin (C).

第3に、上記第1または第2のプリプレグ用エポキシ樹脂組成物において、リン含有フェノキシ樹脂(C)は、ビスフェノールAと、エポキシ樹脂と、下記式(III)または式(IV):   Thirdly, in the first or second prepreg epoxy resin composition, the phosphorus-containing phenoxy resin (C) includes bisphenol A, an epoxy resin, and the following formula (III) or formula (IV):

Figure 2010077263
Figure 2010077263

で表されるリン化合物とを反応させて得られたものであることを特徴とする。 It is obtained by reacting with a phosphorus compound represented by the formula:

第4に、本発明のプリプレグは、上記第1ないし第3のいずれかのプリプレグ用エポキシ樹脂組成物を基材に含浸し乾燥して得られたものであることを特徴とする。   Fourthly, the prepreg of the present invention is obtained by impregnating a substrate with one of the first to third epoxy resin compositions for prepreg and drying it.

第5に、本発明の多層プリント配線板は、上記第4のプリプレグを予め回路が形成された内層回路板に積層成形することによりプリプレグで絶縁層を形成し、この絶縁層の表面を酸化剤および酸の一方または両方を含む粗化溶液で粗化した後に粗化面に対してめっきにより導体層を形成し、この導体層により外層回路を形成したものであることを特徴とする。   Fifth, in the multilayer printed wiring board of the present invention, an insulating layer is formed by prepreg by laminating the fourth prepreg on an inner circuit board on which a circuit has been previously formed, and the surface of the insulating layer is oxidized with an oxidant. In addition, a conductor layer is formed by plating on the roughened surface after roughening with a roughening solution containing one or both of acid and acid, and an outer layer circuit is formed by this conductor layer.

上記第1の発明によれば、リン含有フェノキシ樹脂(C)を必須成分として含有している。リン含有フェノキシ樹脂(C)は、1分子中にフェニル骨格を2個以上含むエポキシ樹脂(A)およびリン含有エポキシ樹脂(B)と相溶しにくく、硬化物の状態では均一に分散される。そしてリン含有フェノキシ樹脂(C)は1分子中にフェニル骨格を2個以上含むエポキシ樹脂(A)およびリン含有エポキシ樹脂(B)よりも酸化剤等を含む粗化溶液に対して分解または溶解され易いため、均一かつ緻密な凹凸を有する粗化面をプリプレグの表面に形成することができ、その結果としてめっき密着性も良好なものとすることができる。   According to the first invention, the phosphorus-containing phenoxy resin (C) is contained as an essential component. The phosphorus-containing phenoxy resin (C) is hardly compatible with the epoxy resin (A) containing two or more phenyl skeletons in one molecule and the phosphorus-containing epoxy resin (B), and is uniformly dispersed in the cured state. And phosphorus containing phenoxy resin (C) is decomposed | disassembled or melt | dissolved with respect to the roughening solution containing an oxidizing agent etc. rather than the epoxy resin (A) and phosphorus containing epoxy resin (B) which contain two or more phenyl frame | skeletons in 1 molecule. Since it is easy, the roughened surface which has a uniform and precise unevenness | corrugation can be formed in the surface of a prepreg, and as a result, metal-plating adhesiveness can also be made favorable.

さらに、1分子中にフェニル骨格を2個以上含むエポキシ樹脂(A)、リン含有エポキシ樹脂(B)、リン含有フェノキシ樹脂(C)、およびフェノール系硬化剤(D)を必須成分として含有すると共に、リン含有量を上記の特定範囲内としているので、難燃性と耐熱性にも優れている。   In addition, it contains an epoxy resin (A) containing two or more phenyl skeletons in one molecule, a phosphorus-containing epoxy resin (B), a phosphorus-containing phenoxy resin (C), and a phenol-based curing agent (D) as essential components. In addition, since the phosphorus content is within the above specific range, it is excellent in flame retardancy and heat resistance.

上記第2の発明によれば、1分子中にフェニル骨格を2個以上含むエポキシ樹脂(A)として、その硬化物が酸化剤等を含む粗化溶液に対して、リン含有エポキシ樹脂(B)の硬化物およびリン含有フェノキシ樹脂(C)の硬化物よりも分解または溶解されにくいものを用いている。そのため、リン含有フェノキシ樹脂(C)と1分子中にフェニル骨格を2個以上含むエポキシ樹脂(A)およびリン含有エポキシ樹脂(B)との間における粗化溶液に対する分解・溶解性の相違と、1分子中にフェニル骨格を2個以上含むエポキシ樹脂(A)とリン含有エポキシ樹脂(B)およびリン含有フェノキシ樹脂(C)との間における粗化溶液に対する分解・溶解性の相違との両方がプリプレグの表面の均一かつ緻密な凹凸形成に有効に作用する。従って、上記第1の発明の効果に加え、めっき密着性をさらに良好なものとすることができる。   According to the second aspect of the present invention, as an epoxy resin (A) containing two or more phenyl skeletons in one molecule, a phosphorus-containing epoxy resin (B) with respect to a roughening solution whose cured product contains an oxidizing agent or the like The hardened | cured material and the thing harder to decompose | disassemble or melt | dissolve than the hardened | cured material of phosphorus containing phenoxy resin (C) are used. Therefore, the difference in decomposition and solubility in the roughening solution between the phosphorus-containing phenoxy resin (C) and the epoxy resin (A) containing two or more phenyl skeletons in one molecule and the phosphorus-containing epoxy resin (B), Both the difference in decomposition and solubility in the roughening solution between the epoxy resin (A) containing two or more phenyl skeletons in one molecule and the phosphorus-containing epoxy resin (B) and the phosphorus-containing phenoxy resin (C) It works effectively to form uniform and dense irregularities on the surface of the prepreg. Therefore, in addition to the effect of the first invention, the plating adhesion can be further improved.

上記第3の発明によれば、リン含有フェノキシ樹脂(C)として上記した特定のものを用いているので、上記第1および第2の発明の効果に加え、より均一な凹凸を有する粗化面をプリプレグの表面に形成することができ、その結果としてめっき密着性もさらに良好なものとすることができる。   According to the third aspect of the invention, since the specific one described above is used as the phosphorus-containing phenoxy resin (C), in addition to the effects of the first and second aspects, a roughened surface having more uniform unevenness. Can be formed on the surface of the prepreg, and as a result, the plating adhesion can be further improved.

上記第4の発明によれば、上記第1ないし第3の発明のプリプレグ用エポキシ樹脂組成物を用いているので、均一かつ緻密な凹凸を有する粗化面をプリプレグの表面に形成することができ、その結果としてめっき密着性もさらに良好なものとすることができる。また、難燃性と耐熱性にも優れている。   According to the fourth aspect of the invention, since the epoxy resin composition for prepreg of the first to third aspects of the invention is used, a roughened surface having uniform and precise irregularities can be formed on the surface of the prepreg. As a result, the plating adhesion can be further improved. It also has excellent flame resistance and heat resistance.

上記第5の発明によれば、上記第4の発明のプリプレグを用いて絶縁層を形成しているので、この絶縁層の表面にめっきを施して形成した外層回路の密着性が良好であり、さらに難燃性と耐熱性にも優れている。   According to the fifth invention, since the insulating layer is formed using the prepreg of the fourth invention, the adhesion of the outer layer circuit formed by plating the surface of the insulating layer is good, It also has excellent flame resistance and heat resistance.

以下、本発明を詳細に説明する。   Hereinafter, the present invention will be described in detail.

本発明に用いられる1分子中にフェニル骨格を2個以上含むエポキシ樹脂(A)は、2官能エポキシ樹脂または1分子中に3個以上のエポキシ基を持つ多官能エポキシ樹脂であり、その具体例としては、ナフタレン型エポキシ樹脂、ビフェニル型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、アルキルフェノールノボラック型エポキシ樹脂、ジシクロペンタジエン型エポキシ樹脂等が挙げられる。これらは1種単独で用いてもよく2種以上を併用してもよい。   The epoxy resin (A) containing two or more phenyl skeletons in one molecule used in the present invention is a bifunctional epoxy resin or a polyfunctional epoxy resin having three or more epoxy groups in one molecule. As naphthalene type epoxy resin, biphenyl type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, phenol novolac type epoxy resin, alkylphenol novolac type epoxy resin, dicyclopentadiene type epoxy resin, etc. Is mentioned. These may be used alone or in combination of two or more.

中でも、その硬化物が酸化剤等を含む粗化溶液に対してリン含有エポキシ樹脂(B)の硬化物およびリン含有フェノキシ樹脂(C)の硬化物よりも分解または溶解されにくいものを用いるのが好ましく、このようなエポキシ樹脂(A)としては、例えば、エポキシ当量が200以下のもの、特に、分子中のフェニル骨格比率が高いナフタレン型エポキシ樹脂、ビフェニル型エポキシ樹脂を挙げることができる。このようなエポキシ樹脂(A)を用いることで、エポキシ樹脂(A)とリン含有エポキシ樹脂(B)およびリン含有フェノキシ樹脂(C)との間における粗化溶液に対する分解・溶解性の相違がプリプレグの表面の凹凸形成性に有効に作用し、めっき密着性を良好なものとすることができる。   Among them, it is preferable to use a cured product that is less decomposed or dissolved than a cured product of a phosphorus-containing epoxy resin (B) and a cured product of a phosphorus-containing phenoxy resin (C) with respect to a roughening solution containing an oxidizing agent or the like. Preferably, examples of such an epoxy resin (A) include those having an epoxy equivalent of 200 or less, particularly naphthalene type epoxy resins and biphenyl type epoxy resins having a high phenyl skeleton ratio in the molecule. By using such an epoxy resin (A), the difference in decomposition / solubility in the roughening solution between the epoxy resin (A), the phosphorus-containing epoxy resin (B), and the phosphorus-containing phenoxy resin (C) is prepreg. This effectively acts on the surface irregularity-forming property of the surface and can improve the plating adhesion.

本発明に用いられるリン含有エポキシ樹脂(B)は、上記式(I)または式(II)で表されるリン化合物から選ばれる少なくとも1種およびキノン化合物の反応生成物である有機リン化合物と、エポキシ樹脂とを反応させて得られるものである。   The phosphorus-containing epoxy resin (B) used in the present invention is an organic phosphorus compound that is a reaction product of at least one selected from the phosphorus compounds represented by the formula (I) or the formula (II) and a quinone compound, It is obtained by reacting with an epoxy resin.

上記式(I)、(II)において、Rはそれぞれ独立に炭素数1〜6の炭化水素基、好ましくは炭素数1〜6の直鎖または分岐のアルキル基を示す。nは0〜4の整数を示す。   In the above formulas (I) and (II), each R independently represents a hydrocarbon group having 1 to 6 carbon atoms, preferably a linear or branched alkyl group having 1 to 6 carbon atoms. n shows the integer of 0-4.

有機リン化合物の原料となるリン化合物として、リン原子に結合した活性水素を有する上記式(I)、(II)のリン化合物を用いることで、臭素元素などを含むハロゲン系化合物を用いずとも難燃性を向上させることができる。さらに、これをキノン化合物と反応させて合成した有機リン化合物は、エポキシ樹脂と反応して確実にリン含有エポキシ樹脂(B)を生成することができる。   By using phosphorus compounds of the above formulas (I) and (II) having active hydrogen bonded to a phosphorus atom as the phosphorus compound used as a raw material of the organic phosphorus compound, it is difficult to use a halogen compound containing bromine element or the like. Flammability can be improved. Furthermore, the organophosphorus compound synthesized by reacting this with a quinone compound can react with an epoxy resin to reliably produce a phosphorus-containing epoxy resin (B).

有機リン化合物の原料となるキノン化合物の具体例としては、1,4−ベンゾキノン、1,2−ベンゾキノン、トルキノン、1,4−ナフトキノン等が挙げられる。これらは1種単独で用いてもよく2種以上を併用してもよい。   Specific examples of the quinone compound that is a raw material for the organic phosphorus compound include 1,4-benzoquinone, 1,2-benzoquinone, tolquinone, 1,4-naphthoquinone, and the like. These may be used alone or in combination of two or more.

リン含有エポキシ樹脂(B)の原料となるエポキシ樹脂として、好ましくはノボラック型エポキシ樹脂が用いられる。ノボラック型エポキシ樹脂は、好ましくは、エポキシ樹脂全量の20質量%以上(上限は100質量%)の割合で配合される。ノボラック型エポキシ樹脂の配合量が20質量%よりも少ないと、難燃性の付与が困難となるだけでなく耐熱性が悪化する場合がある。エポキシ樹脂が全体としてノボラック型エポキシ樹脂を含む混合物である場合、ノボラック型エポキシ樹脂以外のエポキシ樹脂の具体例としては、1分子中に2個以上のエポキシ基を持つもの、例えばビスフェノール型エポキシ樹脂、レゾルシン型エポキシ樹脂、ポリグリコール型エポキシ樹脂、フルオレン型エポキシ樹脂等が挙げられる。   As an epoxy resin used as a raw material for the phosphorus-containing epoxy resin (B), a novolac type epoxy resin is preferably used. The novolac type epoxy resin is preferably blended at a ratio of 20% by mass or more (upper limit is 100% by mass) of the total amount of the epoxy resin. When the amount of the novolac type epoxy resin is less than 20% by mass, it may be difficult to impart flame retardancy, and heat resistance may be deteriorated. When the epoxy resin is a mixture containing a novolac type epoxy resin as a whole, specific examples of the epoxy resin other than the novolac type epoxy resin include those having two or more epoxy groups in one molecule, for example, a bisphenol type epoxy resin, Resorcinol type epoxy resin, polyglycol type epoxy resin, fluorene type epoxy resin and the like can be mentioned.

リン含有エポキシ樹脂(B)は、例えば、トルエンなどの溶媒中において上記式(I)または式(II)のリン化合物およびキノン化合物を反応させて有機リン化合物を得た後、エポキシ樹脂と混合し、トリフェニルホスフィンなどの硬化促進剤を添加して有機リン化合物とエポキシ樹脂とを反応させることにより得ることができる。   The phosphorus-containing epoxy resin (B) is obtained by, for example, reacting the phosphorus compound and quinone compound of the above formula (I) or formula (II) in a solvent such as toluene to obtain an organic phosphorus compound, and then mixing with the epoxy resin. It can be obtained by adding a curing accelerator such as triphenylphosphine and reacting the organophosphorus compound with the epoxy resin.

本発明に用いられるリン含有フェノキシ樹脂(C)は、重量平均分子量が30000〜80000の範囲にある。重量平均分子量が30000未満であると1分子中にフェニル骨格を2個以上含むエポキシ樹脂(A)またはリン含有エポキシ樹脂(B)と相溶し易くなり、硬化物の状態でリン含有フェノキシ樹脂(C)が均一に分散されずめっき密着性が低下する場合がある。一方、重量平均分子量が80000を超えると1分子中にフェニル骨格を2個以上含むエポキシ樹脂(A)またはリン含有エポキシ樹脂(B)とほとんど相溶しなくなり、不均一に分散されるためにめっき密着性が低下する場合がある。   The phosphorus-containing phenoxy resin (C) used in the present invention has a weight average molecular weight in the range of 30,000 to 80,000. When the weight average molecular weight is less than 30,000, it is easily compatible with the epoxy resin (A) or the phosphorus-containing epoxy resin (B) containing two or more phenyl skeletons in one molecule, and in the cured state, the phosphorus-containing phenoxy resin ( C) may not be uniformly dispersed and plating adhesion may be reduced. On the other hand, when the weight average molecular weight exceeds 80,000, it is almost incompatible with the epoxy resin (A) or the phosphorus-containing epoxy resin (B) containing two or more phenyl skeletons in one molecule, and is plated because it is dispersed unevenly. Adhesion may be reduced.

リン含有フェノキシ樹脂(C)としては、フェノキシ樹脂にリン化合物を導入したものを用いることができる。リン含有フェノキシ樹脂(C)の原料となるフェノキシ樹脂はビスフェノール類とエピハロヒドリンとから合成することができる。あるいは、フェノール類エポキシ樹脂とビスフェノール類との付加重合反応により合成することができる。フェノキシ樹脂の原料として用いられるビスフェノール類の具体例としては、ビスフェノールA、ビスフェノールF、3,4,5,6−ジベンゾ−1,2−オキサホスファン−2−オキサイドヒドロキノン等が挙げられる。これらは1種単独で用いても2種以上を併用してもよく、共重合フェノキシ樹脂とすることもできる。なお、フェノキシ樹脂の原料としてビスフェノールSを用いた場合、S元素を含有しているため腐食磨耗を発生させ易くドリル加工の点からはS元素を含有しないビスフェノールA等を用いることが好ましい。   As phosphorus containing phenoxy resin (C), what introduce | transduced the phosphorus compound into phenoxy resin can be used. The phenoxy resin used as the raw material for the phosphorus-containing phenoxy resin (C) can be synthesized from bisphenols and epihalohydrin. Alternatively, it can be synthesized by an addition polymerization reaction between a phenolic epoxy resin and a bisphenol. Specific examples of the bisphenols used as the raw material for the phenoxy resin include bisphenol A, bisphenol F, 3,4,5,6-dibenzo-1,2-oxaphosphan-2-oxide hydroquinone, and the like. These may be used alone or in combination of two or more, and may be a copolymerized phenoxy resin. In addition, when bisphenol S is used as a raw material for the phenoxy resin, it is preferable to use bisphenol A or the like that does not contain an S element from the viewpoint of drilling because it contains an S element and easily causes corrosion wear.

フェノキシ樹脂にリン化合物を導入する方法としては、末端残存のエポキシ基にリン化合物を反応させて導入する方法と、主鎖にリン化合物を共重合により導入する方法が挙げられる。   Examples of the method for introducing the phosphorus compound into the phenoxy resin include a method in which the phosphorus compound is reacted with the remaining epoxy group and a method in which the phosphorus compound is introduced into the main chain by copolymerization.

末端残存のエポキシ基にリン化合物を導入する方法で用いるリン化合物としては、リン含有量が高くなり難燃性を付与することができる点からは、式(III)で表される3,4,5,6−ジベンゾ−1,2−オキサホスファン−2−オキサイドが好ましい。   As the phosphorus compound used in the method of introducing the phosphorus compound into the terminal residual epoxy group, from the point that the phosphorus content becomes high and flame retardancy can be imparted, 3, 4, and 4 represented by the formula (III) 5,6-dibenzo-1,2-oxaphosphane-2-oxide is preferred.

主鎖にリン化合物を共重合により導入する方法で用いるリン化合物としては、リン含有量が高くなり難燃性を付与することができる点からは、式(IV)で表される3,4,5,6−ジベンゾ−1,2−オキサホスファン−2−オキサイドヒドロキノンが好ましい。   As the phosphorus compound used in the method of introducing the phosphorus compound into the main chain by copolymerization, from the point that the phosphorus content becomes high and flame retardancy can be imparted, 3, 4, and 4 represented by the formula (IV) 5,6-dibenzo-1,2-oxaphosphan-2-oxide hydroquinone is preferred.

本発明に用いられるフェノール系硬化剤(D)の具体例としては、フェノールノボラック樹脂、アルキルフェノールノボラック樹脂、ビスフェノールAノボラック樹脂、ジシクロペンタジエン型フェノール樹脂等が挙げられる。これらは1種単独で用いてもよく、2種以上を併用してもよい。エポキシ樹脂の硬化剤としてジシアンジアミドが用いられることが多いが、硬化物の耐熱性が低く、鉛フリー半田の利用を考慮した場合、フェノール系硬化剤(D)を用いるのが適切である。   Specific examples of the phenolic curing agent (D) used in the present invention include phenol novolac resins, alkylphenol novolac resins, bisphenol A novolac resins, dicyclopentadiene type phenol resins and the like. These may be used alone or in combination of two or more. Dicyandiamide is often used as the curing agent for the epoxy resin, but the heat resistance of the cured product is low, and in consideration of the use of lead-free solder, it is appropriate to use the phenolic curing agent (D).

本発明のプリプレグ用エポキシ樹脂組成物には、本発明の効果を損なわない範囲内において、他の成分を配合することができる。このような他の成分の具体例としては、三級アミン類やイミダゾール類等の硬化促進剤等が挙げられる。また、本発明のプリプレグ用エポキシ樹脂組成物は、溶媒で希釈することによりワニスとして調製してもよい。   The epoxy resin composition for prepreg of the present invention can be blended with other components within the range not impairing the effects of the present invention. Specific examples of such other components include curing accelerators such as tertiary amines and imidazoles. Moreover, you may prepare the epoxy resin composition for prepregs of this invention as a varnish by diluting with a solvent.

本発明のプリプレグ用エポキシ樹脂組成物は、リン含有量がプリプレグ用エポキシ樹脂組成物の固形分に対して0.5〜1.5質量%である。リン含有量を当該範囲内とすることで、ハロゲン系化合物を用いずとも十分な難燃性を確保することができると共に、吸湿性を抑えて耐熱性を向上させることができる。リン含有量が0.5質量%未満であると、十分な難燃性を得ることができない場合がある。一方、リン含有量が1.5質量%を超えると、成形物の吸湿性の低下や耐熱性の低下が起こる場合がある。   The epoxy resin composition for prepregs of the present invention has a phosphorus content of 0.5 to 1.5% by mass with respect to the solid content of the epoxy resin composition for prepregs. By setting the phosphorus content within the range, sufficient flame retardancy can be ensured without using a halogen compound, and heat resistance can be improved by suppressing hygroscopicity. If the phosphorus content is less than 0.5% by mass, sufficient flame retardancy may not be obtained. On the other hand, if the phosphorus content exceeds 1.5% by mass, the hygroscopicity or heat resistance of the molded product may be lowered.

本発明のプリプレグを作製する際には、上記のプリプレグ用エポキシ樹脂組成物をワニスとして調製し、このワニスを基材に含浸し、例えば、乾燥機中で120〜190℃程度の温度で3〜15分間程度この基材を乾燥させることにより、半硬化状態(B−ステージ)にしたプリプレグを作製することができる。   When producing the prepreg of the present invention, the above prepreg epoxy resin composition is prepared as a varnish, and this varnish is impregnated into a base material, for example, at a temperature of about 120 to 190 ° C. in a drier. By drying this substrate for about 15 minutes, a prepreg in a semi-cured state (B-stage) can be produced.

基材としては、ガラスクロス、ガラスペーパー、ガラスマット等のガラス繊維布の他、クラフト紙、天然繊維布、有機合成繊維布等も用いることができる。   As the base material, craft paper, natural fiber cloth, organic synthetic fiber cloth and the like can be used in addition to glass fiber cloth such as glass cloth, glass paper and glass mat.

上記のようにして得られたプリプレグを所要枚数重ね、例えば、140〜200℃、0.98〜4.9MPaの条件下で加熱加圧して積層成形することによって、積層板を作製することができる。   A required number of the prepregs obtained as described above are stacked, for example, by heating and pressing under conditions of 140 to 200 ° C. and 0.98 to 4.9 MPa, and a laminate can be produced. .

この際、所要枚数重ねたプリプレグの片面または両面に金属箔を重ね、プリプレグと金属箔とを共に加熱加圧して積層成形することによって、金属張積層板を製造することができる。金属箔としては、銅箔、銀箔、アルミニウム箔、ステンレス箔等を用いることができる。   At this time, a metal-clad laminate can be produced by stacking a metal foil on one side or both sides of a required number of prepregs and laminating the prepreg and the metal foil together by heating and pressing. As the metal foil, copper foil, silver foil, aluminum foil, stainless steel foil or the like can be used.

次に、上記のようにして作製されたプリプレグと金属箔張積層板を用いてプリント配線板を作製する方法について図1を参照しながら説明する。   Next, a method for producing a printed wiring board using the prepreg produced as described above and a metal foil-clad laminate will be described with reference to FIG.

図1はプリント配線板を作製する方法の一例を工程順に示したものであり、この方法では、まず、図1(a)に示すように、金属張積層板に対して内層回路を予め形成した内層回路板1の表面にプリプレグ2の一方の面を重ね合わせると共にこのプリプレグ2の他方の面に離型材料3を重ね合わせ、多段真空プレス等を用いて積層成形する。   FIG. 1 shows an example of a method for producing a printed wiring board in the order of steps. In this method, first, as shown in FIG. 1A, an inner layer circuit is formed in advance on a metal-clad laminate. One surface of the prepreg 2 is superposed on the surface of the inner layer circuit board 1 and the release material 3 is superposed on the other surface of the prepreg 2 and laminated and formed using a multistage vacuum press or the like.

なお、図1(a)では内層回路板1の両面にプリプレグ2を重ね合わせて積層成形しているが、内層回路板1の片面にのみプリプレグ2を重ね合わせて積層成形してもよい。また、プリプレグ2を重ね合わせる前に内層回路板1の内層回路に黒色酸化処理(黒化処理)等の内層粗化処理を行ってもよい。   In FIG. 1A, the prepreg 2 is laminated and molded on both sides of the inner layer circuit board 1, but the prepreg 2 may be laminated and molded only on one side of the inner layer circuit board 1. Further, before the prepreg 2 is overlaid, the inner layer circuit of the inner layer circuit board 1 may be subjected to inner layer roughening treatment such as black oxidation treatment (blackening treatment).

内層回路板1に用いる金属張積層板を構成する積層板としては、例えば、本発明のプリプレグを所要枚数重ね合わせて積層成形した積層板や、市販されているガラスエポキシ積層板、ポリイミド積層板、熱硬化型ポリフェニレンエーテル積層板等を用いることができる。   As a laminate constituting the metal-clad laminate used for the inner layer circuit board 1, for example, a laminate obtained by laminating a required number of the prepregs of the present invention, a commercially available glass epoxy laminate, a polyimide laminate, A thermosetting polyphenylene ether laminate or the like can be used.

離型材料3としては、例えば、銅箔、銀箔、アルミニウム箔、ステンレス箔、ポリエチレンやポリ塩化ビニル等のポリオレフィンフィルム、ポリエチレンテレフタレート等のポリエステルフィルム等を用いることができる。   As the mold release material 3, for example, a copper foil, a silver foil, an aluminum foil, a stainless steel foil, a polyolefin film such as polyethylene or polyvinyl chloride, a polyester film such as polyethylene terephthalate, or the like can be used.

そして、積層成形後の図1(b)の状態から、図1(c)に示すように離型材料3を除去することにより、次に粗化処理を行う絶縁層4を露出させる。   Then, from the state of FIG. 1B after the lamination molding, the release material 3 is removed as shown in FIG. 1C, thereby exposing the insulating layer 4 to be subjected to the next roughening treatment.

次に、図1(d)に示すように、絶縁層4の粗化処理を行う。なお、必要に応じて、積層成形品にはレーザビア加工等によりビアホール7を形成する等の必要な加工が施される。   Next, as shown in FIG. 1D, the insulating layer 4 is roughened. If necessary, the laminated molded product is subjected to necessary processing such as forming via holes 7 by laser via processing or the like.

絶縁層4の粗化処理は粗化溶液により行う。粗化溶液としては、酸化剤および酸の一方または両方を含むものであれば、特に限定されるものではない。例えば、ロームアンドハース社製「サーキュポジットMLBコンディショナー」、ロームアンドハース社製「サーキュポジットMLBプロモーター」、ロームアンドハース社製「サーキュポジットMLBニュートラライザー」の3種類からなるものをセットで粗化溶液として用いることもできる。   The roughening treatment of the insulating layer 4 is performed with a roughening solution. The roughening solution is not particularly limited as long as it contains one or both of an oxidizing agent and an acid. For example, Rohm and Haas “Circuposit MLB Conditioner”, Rohm and Haas “Circuposit MLB Promoter”, Rohm and Haas “Circuposit MLB Neutralizer” as a set roughening solution Can also be used.

上記「サーキュポジットMLBコンディショナー」は、樹脂を活性化して後続のサーキュポジットMLBプロモーター工程に最適な状態とする溶液である。   The “circuposit MLB conditioner” is a solution that activates a resin to bring it into an optimum state for the subsequent circular deposit MLB promoter process.

上記「サーキュポジットMLBプロモーター」は、樹脂、中でもリン含有エポキシ樹脂(B)とリン含有フェノキシ樹脂(C)を溶解させる機能を持つ溶液であり、過マンガン酸カリウム水溶液(酸化剤)と水酸化カリウム水溶液を主成分とするものである。   The above "circuposit MLB promoter" is a solution having a function of dissolving a resin, particularly a phosphorus-containing epoxy resin (B) and a phosphorus-containing phenoxy resin (C). A potassium permanganate aqueous solution (oxidant) and potassium hydroxide It is mainly composed of an aqueous solution.

過マンガン酸カリウム等の過マンガン酸塩は塩基性下において強い酸化剤として作用する。樹脂を溶解させる機能を持つ溶液の他の具体例としては、過マンガン酸ナトリウム水溶液(酸化剤)と水酸化ナトリウム水溶液を主成分とするものを挙げることができる。   Permanganates such as potassium permanganate act as strong oxidants under basic conditions. As another specific example of the solution having a function of dissolving the resin, a solution containing sodium permanganate aqueous solution (oxidant) and sodium hydroxide aqueous solution as main components can be given.

上記「サーキュポジットMLBニュートラライザー」は、塩基性の状態を中和するための機能を持つ溶液であり、硫酸水溶液(酸)と過酸化水素水溶液を主成分とするものである。   The above-mentioned “circuposit MLB neutralizer” is a solution having a function for neutralizing a basic state, and is mainly composed of a sulfuric acid aqueous solution (acid) and a hydrogen peroxide aqueous solution.

粗化溶液による粗化処理は、図1(c)に示す積層成形品を粗化溶液に浸漬させることによって行うことができ、また、粗化溶液の種類を変えて複数回行うことができる。例えば、粗化溶液の温度は35〜90℃、浸漬時間は1〜30分間に設定することができる。   The roughening treatment with the roughening solution can be performed by immersing the laminated molded product shown in FIG. 1C in the roughening solution, and can be performed a plurality of times by changing the type of the roughening solution. For example, the temperature of the roughening solution can be set to 35 to 90 ° C., and the immersion time can be set to 1 to 30 minutes.

プリプレグ2で形成された絶縁層4には粗化溶液に溶解し易い成分と溶解しにくい成分が含まれているので、粗化処理を行うと、溶解し易い成分が粗化溶液に溶解し、これにより図1(d)に示すように絶縁層4の表面に緻密な凹凸を形成することができる。   Since the insulating layer 4 formed of the prepreg 2 includes a component that is easily dissolved in the roughening solution and a component that is difficult to dissolve, when the roughening treatment is performed, the easily soluble component is dissolved in the roughening solution, Thereby, dense irregularities can be formed on the surface of the insulating layer 4 as shown in FIG.

その後、図1(e)に示すように、粗化処理された絶縁層4の表面にめっき5を施し、次いで図1(f)に示すように外層回路6を形成することによって、多層プリント配線板を得ることができる。   Thereafter, as shown in FIG. 1 (e), the surface of the roughened insulating layer 4 is plated 5, and then an outer layer circuit 6 is formed as shown in FIG. A board can be obtained.

めっき5により外層回路6を形成する方法としては、絶縁層4の表面にパネルめっきを施した後にサブトラクティブ法で回路を形成する方法、セミアディティブ法で回路を形成する方法、フルアディティブ法で回路を形成する方法等が挙げられる。   As a method of forming the outer layer circuit 6 by the plating 5, a method of forming a circuit by a subtractive method after panel plating is performed on the surface of the insulating layer 4, a method of forming a circuit by a semi-additive method, and a circuit by a full additive method And the like.

以下、実施例により本発明をさらに詳しく説明するが、本発明はこれらの実施例に何ら限定されるものではない。なお、表1の配合量は質量部を示す。   EXAMPLES Hereinafter, although an Example demonstrates this invention further in detail, this invention is not limited to these Examples at all. In addition, the compounding quantity of Table 1 shows a mass part.

プリプレグ用エポキシ樹脂組成物の配合成分として以下のものを用いた。
(1) 1分子中にフェニル骨格を2個以上含むエポキシ樹脂(A)
ナフタレン型エポキシ樹脂(DIC(株)製、HP−4032)、ビフェニル型エポキシ樹脂(ジャパンエポキシレジン(株)製、YX−4000H)、フェノールノボラック型エポキシ樹脂(DIC(株)製、EPICRON N−770)を用いた。
(2) リン含有エポキシ樹脂(B)
攪拌装置、温度計、冷却管、窒素ガス導入装置を備えた4つ口のガラス製セパラブルフラスコに、3,4,5,6−ジベンゾ−1,2−オキサホスファン−2−オキサイド(三光(株)製、HCA、式(III)で表されるリン化合物、リン含有量約14.3質量%)155質量部とトルエン330質量部を仕込み、加熱して溶解させた。
The following were used as a compounding component of the epoxy resin composition for prepregs.
(1) Epoxy resin containing two or more phenyl skeletons in one molecule (A)
Naphthalene type epoxy resin (manufactured by DIC Corporation, HP-4032), biphenyl type epoxy resin (manufactured by Japan Epoxy Resin Corporation, YX-4000H), phenol novolac type epoxy resin (manufactured by DIC Corporation, EPICRON N-770) ) Was used.
(2) Phosphorus-containing epoxy resin (B)
To a four-necked glass separable flask equipped with a stirrer, thermometer, condenser, and nitrogen gas inlet, 3,4,5,6-dibenzo-1,2-oxaphosphane-2-oxide (Sanko) 155 parts by mass of HCA, phosphorus compound represented by formula (III), phosphorus content of about 14.3% by mass) and 330 parts by mass of toluene were prepared and heated to dissolve.

その後、1,4−ナフトキノン(川崎化成工業(株)製)99.0質量部を分割投入し、有機リン化合物を合成した。このとき、モル比は1,4−ナフトキノン/式(III)のリン化合物=0.87であった。   Thereafter, 99.0 parts by mass of 1,4-naphthoquinone (manufactured by Kawasaki Kasei Kogyo Co., Ltd.) was dividedly added to synthesize an organic phosphorus compound. At this time, the molar ratio was 1,4-naphthoquinone / phosphorus compound of formula (III) = 0.87.

反応終了後、フェノールノボラック型エポキシ樹脂(東都化成(株)製、エポトートYDPN−638)746.0質量部を仕込み、窒素ガスを導入しながら攪拌を行い、120℃まで加熱して溶解させた。さらにトリフェニルホスフィンを添加して150℃で4時間反応させた。これにより得られたリン含有エポキシ樹脂(B)のエポキシ当量は360.3g/eq、リン含有量は2.2質量%であった。
(3-1) リン含有フェノキシ樹脂(C)
攪拌装置、温度計、冷却管、窒素ガス導入装置を備えた4つ口のガラス製セパラブルフラスコにビスフェノールA型エポキシ樹脂(東都化成(株)製、エポトートYD−128)251.7質量部とビスフェノールA 142.3質量部を加えてシクロヘキサノンに溶解し、窒素ガスを導入しながら攪拌を行った。
After completion of the reaction, 746.0 parts by mass of a phenol novolac type epoxy resin (Etoto YDPN-638, manufactured by Toto Kasei Co., Ltd.) was charged, stirred while introducing nitrogen gas, and heated to 120 ° C. for dissolution. Further, triphenylphosphine was added and reacted at 150 ° C. for 4 hours. The phosphorus-containing epoxy resin (B) thus obtained had an epoxy equivalent of 360.3 g / eq and a phosphorus content of 2.2% by mass.
(3-1) Phosphorus-containing phenoxy resin (C)
251.7 parts by mass of bisphenol A type epoxy resin (Etototo YD-128, manufactured by Toto Kasei Co., Ltd.) in a four-necked glass separable flask equipped with a stirrer, thermometer, condenser, and nitrogen gas introduction device Bisphenol A (142.3 parts by mass) was added, dissolved in cyclohexanone, and stirred while introducing nitrogen gas.

触媒としてトリフェニルホスフィンを添加して160℃で5時間反応させた後、3,4,5,6−ジベンゾ−1,2−オキサホスファン−2−オキサイドヒドロキノン(三光(株)製、HCA−HQ、式(IV)で表されるリン化合物、リン含有量約9.5質量%)354.0質量部を加え、さらに4時間反応させた後にトルエンとMEKで希釈した。これにより得られたリン含有フェノキシ樹脂の重量平均分子量は約55000、リン含有量は4.5質量%であった。   After adding triphenylphosphine as a catalyst and reacting at 160 ° C. for 5 hours, 3,4,5,6-dibenzo-1,2-oxaphosphan-2-oxide hydroquinone (manufactured by Sanko Co., Ltd., HCA- HQ, phosphorus compound represented by formula (IV), phosphorus content of about 9.5% by mass) (354.0 parts by mass) was added, and the mixture was further reacted for 4 hours, and then diluted with toluene and MEK. The phosphorus-containing phenoxy resin thus obtained had a weight average molecular weight of about 55000 and a phosphorus content of 4.5% by mass.

なお、重量平均分子量は浸透クロマトグラフ法(GPC)により次の条件にて測定した。   The weight average molecular weight was measured by the permeation chromatograph method (GPC) under the following conditions.

装置: 東ソー(株)製 HLC-8120GPC
カラム: guredcolomnSuperH-H+SuperHM-H×2本
溶離液: クロロホルム 0.6 ml/min
検出器: 示差屈折計(RI)
温度: 40℃
分子量計算: ポリスチレン換算
(3-2) リン含有フェノキシ樹脂1
攪拌装置、温度計、冷却管、窒素ガス導入装置を備えた4つ口のガラス製セパラブルフラスコにビスフェノールA型エポキシ樹脂(東都化成(株)製、エポトートYD−128)251.7質量部とビスフェノールA 142.3質量部を加えてシクロヘキサノンに溶解し、窒素ガスを導入しながら攪拌を行った。
Equipment: HLC-8120GPC manufactured by Tosoh Corporation
Column: guredcolomnSuperH-H + SuperHM-H x 2 Eluent: Chloroform 0.6 ml / min
Detector: Differential refractometer (RI)
Temperature: 40 ℃
Molecular weight calculation: Polystyrene conversion
(3-2) Phosphorus-containing phenoxy resin 1
251.7 parts by mass of bisphenol A type epoxy resin (Etototo YD-128, manufactured by Toto Kasei Co., Ltd.) in a four-necked glass separable flask equipped with a stirrer, thermometer, condenser, and nitrogen gas introduction device Bisphenol A (142.3 parts by mass) was added, dissolved in cyclohexanone, and stirred while introducing nitrogen gas.

触媒としてトリフェニルホスフィンを添加して160℃で1時間反応させた後、3,4,5,6−ジベンゾ−1,2−オキサホスファン−2−オキサイドヒドロキノン(三光(株)製、HCA−HQ、式(IV)で表されるリン化合物、リン含有量約9.5質量%)354.0質量部を加え、さらに4時間反応させた後にトルエンとMEKで希釈した。これにより得られたリン含有フェノキシ樹脂の重量平均分子量は約10000、リン含有量は4.5質量%であった。
(3-3) リン含有フェノキシ樹脂2
攪拌装置、温度計、冷却管、窒素ガス導入装置を備えた4つ口のガラス製セパラブルフラスコにビスフェノールA型エポキシ樹脂(東都化成(株)製、エポトートYD−128)251.7質量部とビスフェノールA 142.3質量部を加えてシクロヘキサノンに溶解し、窒素ガスを導入しながら攪拌を行った。
After adding triphenylphosphine as a catalyst and reacting at 160 ° C. for 1 hour, 3,4,5,6-dibenzo-1,2-oxaphosphan-2-oxide hydroquinone (manufactured by Sanko Co., Ltd., HCA- HQ, phosphorus compound represented by formula (IV), phosphorus content of about 9.5% by mass) (354.0 parts by mass) was added, and the mixture was further reacted for 4 hours, and then diluted with toluene and MEK. The phosphorus-containing phenoxy resin thus obtained had a weight average molecular weight of about 10,000 and a phosphorus content of 4.5% by mass.
(3-3) Phosphorus-containing phenoxy resin 2
251.7 parts by mass of bisphenol A type epoxy resin (Etototo YD-128, manufactured by Toto Kasei Co., Ltd.) in a four-necked glass separable flask equipped with a stirrer, thermometer, condenser, and nitrogen gas introduction device Bisphenol A (142.3 parts by mass) was added, dissolved in cyclohexanone, and stirred while introducing nitrogen gas.

触媒としてトリフェニルホスフィンを添加して160℃で10時間反応させた後、3,4,5,6−ジベンゾ−1,2−オキサホスファン−2−オキサイドヒドロキノン(三光(株)製、HCA−HQ、式(IV)で表されるリン化合物、リン含有量約9.5質量%)354.0質量部を加え、さらに4時間反応させた後にトルエンとMEKで希釈した。これにより得られたリン含有フェノキシ樹脂の重量平均分子量は約110000、リン含有量は4.5質量%であった。
(3-4) フェノキシ樹脂
東都化成(株)製、YP−55を用いた。
(4) フェノール系硬化剤
ノボラック型フェノール樹脂(郡栄化学工業(株)製、PSM−4357、フェノール性水酸基当量 105)を用いた。
(5) 硬化促進剤
四国化成工業(株)製、2−エチル−4−メチルイミダゾールを用いた。
(6) 溶媒
メチルエチルケトン、メトキシプロパノール、トルエンの3種類を用いた。
(プリプレグの作製)
プリプレグの材料となる繊維状基材として、厚さ約0.042mmのガラスクロス(日東紡績(株)製、WEA1078)を用いた。
After adding triphenylphosphine as a catalyst and reacting at 160 ° C. for 10 hours, 3,4,5,6-dibenzo-1,2-oxaphosphan-2-oxide hydroquinone (manufactured by Sanko Co., Ltd., HCA- HQ, phosphorus compound represented by formula (IV), phosphorus content of about 9.5% by mass) (354.0 parts by mass) was added, and the mixture was further reacted for 4 hours, and then diluted with toluene and MEK. The phosphorus-containing phenoxy resin thus obtained had a weight average molecular weight of about 110,000 and a phosphorus content of 4.5% by mass.
(3-4) Phenoxy resin YP-55 manufactured by Toto Kasei Co., Ltd. was used.
(4) Phenolic curing agent A novolak type phenol resin (manufactured by Koriei Chemical Industry Co., Ltd., PSM-4357, phenolic hydroxyl group equivalent 105) was used.
(5) Curing accelerator 2-ethyl-4-methylimidazole manufactured by Shikoku Kasei Kogyo Co., Ltd. was used.
(6) Solvent Three kinds of solvents, methyl ethyl ketone, methoxypropanol, and toluene were used.
(Preparation of prepreg)
A glass cloth (manufactured by Nitto Boseki Co., Ltd., WEA1078) having a thickness of about 0.042 mm was used as a fibrous base material used as a material for the prepreg.

上記の配合成分を表1に示す割合で配合し、溶媒を用いてワニス固形分濃度が40〜70質量%になるよう調整したプリプレグ用エポキシ樹脂組成物(ワニス)をガラスクロスに含浸させた後、これを乾燥機で120〜190℃の範囲で3〜15分程度加熱して乾燥させることにより、半硬化のBステージ状態にしたプリプレグを作製した。
(銅張積層板の作製)
上記のようにして得られたプリプレグを用いて銅張積層板を作製した。1枚のプリプレグの両面に銅箔を重ね、これを140〜200℃、0.98〜4.9MPaの条件下で加熱加圧して積層成形することにより、厚さ約0.06mmの銅張積層板を作製した。加熱時間はプリプレグ全体が180℃以上となる時間が少なくとも60分間以上となるように設定した。
(多層プリント配線板の作製)
上記のようにして作製したプリプレグを用いてプリント配線板を作製した。まず、図1(a)に示すように、内層回路が予め形成された内層回路板1の表面にプリプレグ2の一方の面を重ね合わせると共にプリプレグ2の他方の面に離型材料3の粗面を重ね合わせ、積層成形した。
After blending the above blending components in the ratio shown in Table 1 and impregnating a glass cloth with an epoxy resin composition for prepreg (varnish) adjusted to a varnish solid content concentration of 40 to 70% by mass using a solvent. The prepreg in a semi-cured B-stage state was prepared by heating and drying for about 3 to 15 minutes in the range of 120 to 190 ° C. with a dryer.
(Preparation of copper-clad laminate)
A copper clad laminate was prepared using the prepreg obtained as described above. A copper-clad laminate with a thickness of about 0.06 mm is obtained by laminating copper foil on both sides of one prepreg and laminating it by heating and pressing under conditions of 140 to 200 ° C. and 0.98 to 4.9 MPa. A plate was made. The heating time was set so that the time for the entire prepreg to be 180 ° C. or higher was at least 60 minutes.
(Production of multilayer printed wiring board)
A printed wiring board was produced using the prepreg produced as described above. First, as shown in FIG. 1 (a), one surface of the prepreg 2 is superimposed on the surface of the inner layer circuit board 1 on which the inner layer circuit has been formed in advance, and the rough surface of the release material 3 is disposed on the other surface of the prepreg 2. Were stacked and laminated.

ここで、内層回路板1の作製には、上記のプリプレグを用いて作製した銅張積層板を用いた。また、離型材料3としては、電解銅箔(三井金属鉱業(株)製、3EC−VLP、厚さ12μm)を用いた。また、積層成形は140〜200℃、0.98〜4.9MPaの条件下で加熱加圧し、加熱時間をプリプレグ2の全体が180℃以上となる時間が少なくとも60分間以上となるよう設定して行った。   Here, the copper-clad laminate produced using said prepreg was used for production of the inner layer circuit board 1. Moreover, as the mold release material 3, electrolytic copper foil (manufactured by Mitsui Metal Mining Co., Ltd., 3EC-VLP, thickness 12 μm) was used. In addition, lamination molding is performed by heating and pressing under conditions of 140 to 200 ° C. and 0.98 to 4.9 MPa, and the heating time is set so that the time when the entire prepreg 2 is 180 ° C. or more is at least 60 minutes or more. went.

そして、積層成形後の図1(b)の状態から、図1(c)に示すように離型材料3をエッチングにより除去して絶縁層4を露出させた。   Then, the release material 3 was removed by etching from the state shown in FIG. 1B after the lamination molding to expose the insulating layer 4 as shown in FIG.

次に、積層成形品にレーザビア加工等の必要な加工を施した後、絶縁層4に粗化処理を施し、図1(d)に示すように絶縁層4の表面に緻密な凹凸を形成した。この粗化処理は次の手順で行った。まず、図1(c)の積層成形品をロームアンドハース社製「サーキュポジットMLB211」液中に70℃で5分間浸漬させた。次に「サーキュポジットMLB213」液中に80℃で10分間浸漬させた。最後に「サーキュポジットMLB216-2」液中に40℃で5分間浸漬させた。   Next, the laminated molded product was subjected to necessary processing such as laser via processing, and then the insulating layer 4 was roughened to form dense irregularities on the surface of the insulating layer 4 as shown in FIG. . This roughening treatment was performed according to the following procedure. First, the laminated molded product of FIG. 1C was immersed in a “Circuposit MLB211” solution manufactured by Rohm and Haas for 5 minutes at 70 ° C. Next, it was immersed in “Circuposit MLB213” solution at 80 ° C. for 10 minutes. Finally, it was immersed in the “Circuposit MLB216-2” solution at 40 ° C. for 5 minutes.

その後、図1(e)に示すように粗化処理された絶縁層4の表面に、無電解銅めっき処理と電解銅めっき処理との工程を経てめっき5を形成した。最後に180℃で60分間乾燥機にてベーキングを行った後、外層回路6を形成し、図1(f)に示すような4層の多層プリント配線板を作製した。ここで、めっき5におけるめっき銅の厚さは20±2μmとした。   Then, as shown in FIG.1 (e), the plating 5 was formed in the surface of the roughened insulating layer 4 through the process of an electroless copper plating process and an electrolytic copper plating process. Finally, after baking with a dryer at 180 ° C. for 60 minutes, the outer layer circuit 6 was formed, and a four-layer multilayer printed wiring board as shown in FIG. Here, the thickness of the plated copper in the plating 5 was 20 ± 2 μm.

上記において作製した多層プリント配線板等について下記の物性評価を行った。
[めっきピール強度]
実施例1〜5および比較例1〜5の多層プリント配線板について、外層回路(めっき銅幅10mm)のピール強度をJIS−C6481に準じて90度ピール試験方法により25℃で測定した。
[難燃性]
内層回路のない4層のプリント配線板を上記の多層プリント配線板に準じて作製し、外層回路をエッチングにより除去し、これを長さ125mm、幅13mmに切断し、Underwriters Laboratoriesの「Test for Flammability of Plasticmaterials-UL94」に準じて燃焼挙動の試験を行った。
[半田耐熱性]
内層回路のない4層のプリント配線板を上記の多層プリント配線板に準じて作製し、これを25mm角に切断したサンプルを準備した。このサンプルを260℃の半田浴に10秒浸漬し、フクレのなかったものを「○」、フクレの生じたものを「×」として評価した。
The following physical properties of the multilayer printed wiring board produced above were evaluated.
[Plating peel strength]
About the multilayer printed wiring board of Examples 1-5 and Comparative Examples 1-5, the peel strength of the outer layer circuit (plated copper width 10mm) was measured at 25 degreeC by the 90 degree | times peel test method according to JIS-C6481.
[Flame retardance]
A four-layer printed wiring board without an inner layer circuit is manufactured in accordance with the above multilayer printed wiring board, and the outer layer circuit is removed by etching, and this is cut into a length of 125 mm and a width of 13 mm. Under Testers of Tester for Flammability of Underwriters Laboratories The combustion behavior was tested in accordance with “of Plasticmaterials-UL94”.
[Solder heat resistance]
A four-layer printed wiring board without an inner layer circuit was prepared according to the above multilayer printed wiring board, and a sample was prepared by cutting the printed wiring board into 25 mm squares. This sample was immersed in a solder bath at 260 ° C. for 10 seconds, and a sample having no swelling was evaluated as “◯” and a sample having swelling was evaluated as “x”.

物性評価の結果を表1に示す。   The results of physical property evaluation are shown in Table 1.

Figure 2010077263
Figure 2010077263

表1より、1分子中にフェニル骨格を2個以上含むエポキシ樹脂(A)、リン含有エポキシ樹脂(B)、重量平均分子量30000〜80000のリン含有フェノキシ樹脂(C)、およびフェノール系硬化剤(D)を配合し、リン含有量をプリプレグ用エポキシ樹脂組成物の固形分に対して0.5〜1.5質量%の範囲内とした実施例1〜3では、めっきピール強度が高く、V−0の難燃性を有しており、半田耐熱性にも優れていた。   From Table 1, an epoxy resin (A) containing two or more phenyl skeletons in one molecule, a phosphorus-containing epoxy resin (B), a phosphorus-containing phenoxy resin (C) having a weight average molecular weight of 30,000 to 80,000, and a phenolic curing agent ( In Examples 1 to 3 in which D) is blended and the phosphorus content is in the range of 0.5 to 1.5 mass% with respect to the solid content of the epoxy resin composition for prepreg, the plating peel strength is high, and V It had a flame resistance of −0 and was excellent in solder heat resistance.

実施例4では、1分子中にフェニル骨格を2個以上含むエポキシ樹脂(A)として、その硬化物の粗化溶液に対する分解・溶解性が実施例1のナフタレン型エポキシ樹脂と同様にリン含有エポキシ樹脂(B)よりも低いビフェニル型エポキシ樹脂を用いたが、実施例1〜3と同様にめっきピール強度が高く、V−0の難燃性を有しており、半田耐熱性にも優れていた。   In Example 4, as an epoxy resin (A) containing two or more phenyl skeletons in one molecule, the decomposition / solubility of the cured product in a roughening solution is a phosphorus-containing epoxy as in the naphthalene type epoxy resin of Example 1. A biphenyl type epoxy resin lower than that of the resin (B) was used, but the plating peel strength was high as in Examples 1 to 3, the flame retardancy was V-0, and the solder heat resistance was also excellent. It was.

実施例5では、1分子中にフェニル骨格を2個以上含むエポキシ樹脂(A)として、その硬化物の粗化溶液に対する分解・溶解性がリン含有エポキシ樹脂(B)と同程度またはそれ以上であるフェノールノボラック型エポキシ樹脂を用いた。この場合、V−0の難燃性を有しており、半田耐熱性にも優れている一方で、1分子中にフェニル骨格を2個以上含むエポキシ樹脂(A)としてナフタレン型エポキシ樹脂やビフェニル型エポキシ樹脂を用いた実施例1〜4の場合に比べるとめっきピール強度が低下した。   In Example 5, as an epoxy resin (A) containing two or more phenyl skeletons in one molecule, the decomposition / solubility of the cured product in the roughening solution is the same as or higher than that of the phosphorus-containing epoxy resin (B). A certain phenol novolac type epoxy resin was used. In this case, it has V-0 flame retardancy and excellent solder heat resistance, while naphthalene type epoxy resin or biphenyl as epoxy resin (A) containing two or more phenyl skeletons in one molecule. Compared with the case of Examples 1-4 using a type epoxy resin, the plating peel strength decreased.

一方、比較例1では、リン含有量が高いため、半田耐熱性が低下した。   On the other hand, in Comparative Example 1, since the phosphorus content was high, the solder heat resistance was lowered.

比較例2では、リン含有量が低いため、V−0の難燃性が得られなかった。   In Comparative Example 2, since the phosphorus content was low, V-0 flame retardancy was not obtained.

比較例3では、リンを含有しないフェノキシ樹脂を用いたため、めっきピール強度が低下し、V−0の難燃性が得られず、半田耐熱性も低下した。   In Comparative Example 3, since a phenoxy resin containing no phosphorus was used, the plating peel strength was reduced, V-0 flame retardancy was not obtained, and solder heat resistance was also reduced.

比較例4では、リン含有フェノキシ樹脂の重量平均分子量が小さいため、めっきピール強度と半田耐熱性が低下した。   In Comparative Example 4, since the weight average molecular weight of the phosphorus-containing phenoxy resin was small, the plating peel strength and the solder heat resistance were reduced.

比較例5では、リン含有フェノキシ樹脂の重量平均分子量が大きいため、めっきピール強度と半田耐熱性が低下した。   In Comparative Example 5, since the weight average molecular weight of the phosphorus-containing phenoxy resin was large, the plating peel strength and the solder heat resistance were lowered.

本発明のプリプレグを用いてプリント配線板を作製する方法の一例を工程順に示した図である。It is the figure which showed an example of the method of producing a printed wiring board using the prepreg of this invention in process order.

符号の説明Explanation of symbols

1 内層回路板
2 プリプレグ
4 絶縁層
5 めっき
6 外層回路
1 inner layer circuit board 2 prepreg 4 insulating layer 5 plating 6 outer layer circuit

Claims (5)

1分子中にフェニル骨格を2個以上含むエポキシ樹脂(A)と、下記式(I)または式(II):
Figure 2010077263
(式中、Rはそれぞれ独立に炭素数1〜6の炭化水素基を示し、nは0〜4の整数を示す。)で表されるリン化合物から選ばれる少なくとも1種およびキノン化合物の反応生成物である有機リン化合物とエポキシ樹脂とを反応させて得られるリン含有エポキシ樹脂(B)と、重量平均分子量30000〜80000のリン含有フェノキシ樹脂(C)と、フェノール系硬化剤(D)とを含有し、リン含有量がプリプレグ用エポキシ樹脂組成物の固形分に対して0.5〜1.5質量%であることを特徴とするプリプレグ用エポキシ樹脂組成物。
An epoxy resin (A) containing two or more phenyl skeletons in one molecule and the following formula (I) or formula (II):
Figure 2010077263
(In the formula, each R independently represents a hydrocarbon group having 1 to 6 carbon atoms, and n represents an integer of 0 to 4). A reaction product of at least one selected from phosphorus compounds represented by A phosphorus-containing epoxy resin (B) obtained by reacting an organic phosphorus compound and an epoxy resin, a phosphorus-containing phenoxy resin (C) having a weight average molecular weight of 30,000 to 80,000, and a phenol-based curing agent (D) An epoxy resin composition for prepreg, which is contained and has a phosphorus content of 0.5 to 1.5% by mass relative to the solid content of the epoxy resin composition for prepreg.
1分子中にフェニル骨格を2個以上含むエポキシ樹脂(A)は、その硬化物が、酸化剤および酸の一方または両方を含む粗化溶液に対して、リン含有エポキシ樹脂(B)の硬化物およびリン含有フェノキシ樹脂(C)の硬化物よりも分解または溶解されにくいものであることを特徴とする請求項1に記載のプリプレグ用エポキシ樹脂組成物。   The epoxy resin (A) containing two or more phenyl skeletons in one molecule is a cured product of a phosphorus-containing epoxy resin (B) with respect to a roughening solution in which the cured product contains one or both of an oxidizing agent and an acid. The epoxy resin composition for prepreg according to claim 1, wherein the epoxy resin composition is less decomposed or dissolved than a cured product of the phosphorus-containing phenoxy resin (C). リン含有フェノキシ樹脂(C)は、ビスフェノールAと、エポキシ樹脂と、下記式(III)または式(IV):
Figure 2010077263
で表されるリン化合物とを反応させて得られたものであることを特徴とする請求項1または2に記載のプリプレグ用エポキシ樹脂組成物。
The phosphorus-containing phenoxy resin (C) includes bisphenol A, an epoxy resin, and the following formula (III) or formula (IV):
Figure 2010077263
The epoxy resin composition for prepreg according to claim 1, wherein the epoxy resin composition is obtained by reacting with a phosphorus compound represented by the formula:
請求項1ないし3いずれか一項に記載のプリプレグ用エポキシ樹脂組成物を基材に含浸し乾燥して得られたものであることを特徴とするプリプレグ。   A prepreg obtained by impregnating a base material with the epoxy resin composition for prepreg according to any one of claims 1 to 3 and drying it. 請求項4に記載のプリプレグを予め回路が形成された内層回路板に積層成形することによりプリプレグで絶縁層を形成し、この絶縁層の表面を酸化剤および酸の一方または両方を含む粗化溶液で粗化した後に粗化面に対してめっきにより導体層を形成し、この導体層により外層回路を形成したものであることを特徴とする多層プリント配線板。   An insulating layer is formed by prepreg by laminating the prepreg according to claim 4 on an inner circuit board on which a circuit has been formed in advance, and the surface of the insulating layer is a roughening solution containing one or both of an oxidizing agent and an acid. A multilayer printed wiring board, wherein a conductor layer is formed by plating on the roughened surface after roughening and an outer layer circuit is formed by the conductor layer.
JP2008246778A 2008-09-25 2008-09-25 Epoxy resin composition for prepreg, prepreg, and multilayer printed wiring board Active JP5547386B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008246778A JP5547386B2 (en) 2008-09-25 2008-09-25 Epoxy resin composition for prepreg, prepreg, and multilayer printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008246778A JP5547386B2 (en) 2008-09-25 2008-09-25 Epoxy resin composition for prepreg, prepreg, and multilayer printed wiring board

Publications (2)

Publication Number Publication Date
JP2010077263A true JP2010077263A (en) 2010-04-08
JP5547386B2 JP5547386B2 (en) 2014-07-09

Family

ID=42208071

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008246778A Active JP5547386B2 (en) 2008-09-25 2008-09-25 Epoxy resin composition for prepreg, prepreg, and multilayer printed wiring board

Country Status (1)

Country Link
JP (1) JP5547386B2 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010150363A (en) * 2008-12-25 2010-07-08 Sumitomo Bakelite Co Ltd Resin composition, prepreg and laminate plate
EP2375313A1 (en) 2010-03-30 2011-10-12 Sony Corporation Electronic apparatus, input signal control method, program, and recording medium
JP2012111866A (en) * 2010-11-25 2012-06-14 Nippon Steel Chem Co Ltd Phosphorous-containing phenol resin, resin composition thereof, and cured product
CN103102471A (en) * 2011-11-11 2013-05-15 新日铁住金化学株式会社 Phosphorus-containing phenolic resin and the producing method, phenolic resin composition and cured product thereof
WO2013187184A1 (en) * 2012-06-15 2013-12-19 新日鉄住金化学株式会社 Phosphorus-containing epoxy resin, composition containing phosphorus-containing epoxy resin as essential component, and cured product
CN104245775A (en) * 2012-04-16 2014-12-24 新日铁住金化学株式会社 Epoxy resin composition and cured product
KR101844073B1 (en) * 2010-11-25 2018-03-30 신닛테츠 수미킨 가가쿠 가부시키가이샤 Phosphorus-containing phenol resin, phenol resin compositions and cured products using same
CN108276538A (en) * 2018-02-11 2018-07-13 南京远淑医药科技有限公司 A kind of preparation process of phosphorus containing phenolic resin and its application

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001278950A (en) * 2000-03-31 2001-10-10 Dainippon Ink & Chem Inc Epoxy resin composition
JP3268498B2 (en) * 1990-05-01 2002-03-25 東都化成株式会社 Phosphorus-containing flame-retardant epoxy resin
JP2007291227A (en) * 2006-04-25 2007-11-08 Toto Kasei Co Ltd Flame-retardant carbon fiber reinforced composite
JP2008074929A (en) * 2006-09-20 2008-04-03 Matsushita Electric Works Ltd Flame retardant epoxy resin composition, resin film, prepreg and multilayered printed circuit board
WO2008090614A1 (en) * 2007-01-25 2008-07-31 Panasonic Electric Works Co., Ltd. Prepreg, printed wiring board, multilayer circuit board and process for manufacturing printed wiring board
JP2009161578A (en) * 2007-12-28 2009-07-23 Sekisui Chem Co Ltd Insulating sheet and laminated structure

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3268498B2 (en) * 1990-05-01 2002-03-25 東都化成株式会社 Phosphorus-containing flame-retardant epoxy resin
JP2001278950A (en) * 2000-03-31 2001-10-10 Dainippon Ink & Chem Inc Epoxy resin composition
JP2007291227A (en) * 2006-04-25 2007-11-08 Toto Kasei Co Ltd Flame-retardant carbon fiber reinforced composite
JP2008074929A (en) * 2006-09-20 2008-04-03 Matsushita Electric Works Ltd Flame retardant epoxy resin composition, resin film, prepreg and multilayered printed circuit board
WO2008090614A1 (en) * 2007-01-25 2008-07-31 Panasonic Electric Works Co., Ltd. Prepreg, printed wiring board, multilayer circuit board and process for manufacturing printed wiring board
JP2009161578A (en) * 2007-12-28 2009-07-23 Sekisui Chem Co Ltd Insulating sheet and laminated structure

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010150363A (en) * 2008-12-25 2010-07-08 Sumitomo Bakelite Co Ltd Resin composition, prepreg and laminate plate
EP2375313A1 (en) 2010-03-30 2011-10-12 Sony Corporation Electronic apparatus, input signal control method, program, and recording medium
JP2012111866A (en) * 2010-11-25 2012-06-14 Nippon Steel Chem Co Ltd Phosphorous-containing phenol resin, resin composition thereof, and cured product
CN102532490A (en) * 2010-11-25 2012-07-04 新日铁化学株式会社 Phosphorus phenolic resin, resin composition and condensate
KR101844073B1 (en) * 2010-11-25 2018-03-30 신닛테츠 수미킨 가가쿠 가부시키가이샤 Phosphorus-containing phenol resin, phenol resin compositions and cured products using same
CN103102471A (en) * 2011-11-11 2013-05-15 新日铁住金化学株式会社 Phosphorus-containing phenolic resin and the producing method, phenolic resin composition and cured product thereof
CN104245775A (en) * 2012-04-16 2014-12-24 新日铁住金化学株式会社 Epoxy resin composition and cured product
WO2013187184A1 (en) * 2012-06-15 2013-12-19 新日鉄住金化学株式会社 Phosphorus-containing epoxy resin, composition containing phosphorus-containing epoxy resin as essential component, and cured product
JPWO2013187184A1 (en) * 2012-06-15 2016-02-04 新日鉄住金化学株式会社 Phosphorus-containing epoxy resin, composition containing epoxy resin as essential component, and cured product
CN108276538A (en) * 2018-02-11 2018-07-13 南京远淑医药科技有限公司 A kind of preparation process of phosphorus containing phenolic resin and its application

Also Published As

Publication number Publication date
JP5547386B2 (en) 2014-07-09

Similar Documents

Publication Publication Date Title
JP5547386B2 (en) Epoxy resin composition for prepreg, prepreg, and multilayer printed wiring board
JP4588834B2 (en) Phosphorus-containing epoxy resin composition, flame-retardant resin sheet using the phosphorus-containing epoxy resin, metal foil with resin, prepreg and laminate, multilayer board
KR100228047B1 (en) Halogen-free flame-retardant epoxy resin composition as well as prepreg and laminate containing the same
EP2562195B1 (en) Epoxy resin composition, prepreg, metal-clad laminate, and printed wiring board
JP5264133B2 (en) Epoxy resin composition, prepreg and metal-clad laminate using the epoxy resin composition
JP6234143B2 (en) Curable resin composition, cured product thereof, electrical / electronic component and circuit board
EP2412740A1 (en) Epoxy resin composition, prepreg, metal foil with resin, resin sheet, laminate and multi-layer board
JP2006131743A (en) Thermosetting resin composition and prepreg and metal-clad laminate and printed wiring board using the same
JP2005272722A (en) Thermosetting resin composition, resin film and product
JP3434808B2 (en) Copper foil with resin and printed wiring board using the copper foil with resin
JP5165639B2 (en) Polyphenylene ether resin composition, prepreg, metal-clad laminate, and printed wiring board
JP2002249552A (en) Phosphorus-containing epoxy resin composition, resin sheet, metal foil having resin, prepreg, laminate, and multilayer board
JP2010077262A (en) Epoxy resin composition, prepreg, metal foil with resin, resin sheet, laminate, and multilayer board
JPWO2008105563A1 (en) Flame retardant adhesive resin composition and flexible printed circuit board material using the same
JP2001114867A (en) Halogen free flame retardant epoxy resin composition
JP4923862B2 (en) Method for producing epoxy-modified guanamine compound solution, thermosetting resin composition, and prepreg and laminate using the same
JP2003128928A (en) Flame-retardant thermosetting resin composition, prepreg, laminate board, insulation film, resin-coated metal foil and multilayered wiring board, and method for manufacturing the same
JP2004182816A (en) Flame-retardant thermosetting resin composition, use thereof and manufacturing method therefor
JP2003128784A (en) Flame-retardant thermosetting resin composition, prepreg, electrical insulation film, laminated board, resin-coated metallic foil and multilayer wiring board, and method for producing them
JP2008208315A (en) Non-halogen flame retardant adhesive and material for flexible printed wiring board using the same
KR100887923B1 (en) Non-halogenated flame-retarding epoxy resin composition, resin coated copper foil produced with the same, and copper clad laminate
JP4479079B2 (en) Prepreg and laminate
JP5246744B2 (en) Flame retardant adhesive resin composition and flexible printed circuit board material using the same
JP4725347B2 (en) Phosphorus-containing guanamine resin, thermosetting resin composition using the same, and prepreg and laminate using the same
JP2003128785A (en) Flame-retardant thermosetting resin composition, and prepreg, electrical insulation film, laminated board, resin-coated metallic foil and multilayer wiring board each using the same, and method for producing them

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20110121

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A712

Effective date: 20120111

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120607

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120612

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120810

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130514

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140422

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20140515

R151 Written notification of patent or utility model registration

Ref document number: 5547386

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151