JP2010065502A - Structure - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a structure having a fail-safe mechanism for excessive deformation while resisting pull-out force associated with rocking and overturning moment without impeding the base isolating effect of a base isolating apparatus. <P>SOLUTION: A building 10 has supporting means 18 whose horizontal rigidity in general deformation is equivalent to or lower than the horizontal rigidity of the base isolating apparatus 16 and whose horizontal rigidity in excessive deformation is higher than the horizontal rigidity of the base isolating apparatus 16. When horizontal force is applied to the building 10, since the horizontal rigidity of the supporting means 18 is equivalent to or lower than the horizontal rigidity of the base isolating apparatus 16 in general deformation, the horizontal shearing deformation of the base isolating apparatus 16 is not impeded by the supporting means 18 to obtain a sufficient base isolating effect. Even if pull-out force is generated to the building 10, since the supporting means 18 resist the pull-out force (tensile force), collapse of the building 10 can be prevented. In excessive deformation, the horizontal rigidity of the supporting means 18 is increased to suppress deformation. <P>COPYRIGHT: (C)2010,JPO&amp;INPIT

Description

  The present invention relates to a structure in which a seismic isolation device is provided between an upper structure and a lower structure.

  Conventionally, there is a structure in which a seismic isolation device is provided between an upper structure and a lower structure. Seismic isolation devices usually have a bearing (such as a laminated rubber bearing) that supports the long-term load of the superstructure, a damping part (such as an oil damper) that absorbs seismic energy, and the superstructure in its original horizontal position. It is composed of a restoring part (for example, a laminated rubber bearing) that returns, and exhibits a seismic isolation effect by reducing the response acceleration by lengthening the shaking of the upper structure during an earthquake. As an example in which an additional material is provided in addition to the seismic isolation device in such a structure, there are the following (for example, see Patent Documents 1 and 2).

  The structure of Patent Document 1 has a seismic isolation device (laminated rubber) arranged on a column inside the structure, and a column having higher toughness than a general column as an additional material on the column outside the structure (outer peripheral side). Is used. In the structure of Patent Document 1, the seismic isolation device absorbs the rolling energy of the earthquake, and the damper effect is exhibited by the high toughness column to reduce the horizontal displacement.

  On the other hand, the structure of Patent Document 2 is provided with a seismic isolation device (laminated rubber) on a plurality of pillars of the structure, and further provided with a cable material connecting the upper structure and the lower structure outside these pillars. Yes. In the structure of Patent Document 2, it is possible to prevent a large tensile force from acting on the laminated rubber, and to allow relative movement in the horizontal direction between the upper structure and the lower structure so as not to hinder the long period due to the laminated rubber. I have to. Both the structure of Patent Document 1 and the structure of Patent Document 2 are rocking (a phenomenon in which the entire upper structure rotates when the base-isolated building vibrates due to earthquake motion), and a tipping moment (of the upper structure). It has a structure that can resist the pulling force that accompanies the seismic isolation device due to horizontal force.

  However, the structure of Patent Document 1 is provided only with a column having higher toughness than a general column, and does not consider the horizontal rigidity of the seismic isolation device. For this reason, the horizontal rigidity of a seismic isolation apparatus becomes high, and the seismic isolation effect is inhibited.

Moreover, since the cable material does not bear a vertical load in the structure of Patent Document 2, a cable member must be provided in addition to the pillar.
JP 2000-64653 A JP2002-138706

  An object of the present invention is to obtain a structure having a mechanism capable of resisting the pulling force accompanying rocking and overturning moments without inhibiting the seismic isolation effect of the seismic isolation device and suppressing excessive deformation of the seismic isolation device. And

  The structure according to claim 1 of the present invention includes a lower structure, an upper structure constructed on the upper side of the lower structure, and a seismic isolation device provided between the lower structure and the upper structure. And the lower structure and the upper structure are coupled to resist deformation in the compression and tensile directions between the connections, and the horizontal rigidity is equal to the horizontal rigidity of the seismic isolation device during general deformation. Or a support means that is less than that and has a rigidity greater than the horizontal rigidity of the seismic isolation device when excessively deformed.

  According to the above configuration, when a horizontal force is not acting on the structure, the vertical load of the upper structure is borne and supported by the seismic isolation device and the support means.

  On the other hand, when a horizontal force acts on the structure due to an earthquake or the like, the seismic isolation device lengthens the natural period of the upper structure and exhibits the seismic isolation effect. Here, in the initial state of the vibration of the structure, since the horizontal rigidity of the support means is equal to or less than the horizontal rigidity of the seismic isolation apparatus, the horizontal shear deformation of the seismic isolation apparatus is not hindered by the support means. As a result, the seismic isolation device is sufficiently shear deformed to obtain a seismic isolation effect.

  Subsequently, if the seismic motion continues, pulling force due to rocking and overturning moment is generated in the structure, but the support means connected to the upper structure and the lower structure resists the pulling force (tensile force). The pulling force of the device can be suppressed. Furthermore, when excessive deformation occurs, the support means has a horizontal rigidity larger than the horizontal rigidity of the seismic isolation device, so that the horizontal deformation can be suppressed.

  In the structure according to claim 2 of the present invention, the seismic isolation device is disposed on the inner side, and the support means is disposed on the outermost periphery. According to this configuration, the pulling force can be effectively resisted.

  In the structure according to claim 3 of the present invention, the support means is a support column connected to at least one of the lower structure and the upper structure by a pin. According to this configuration, since it is only necessary to connect the support column to at least one of the lower structure and the upper structure with a pin, construction of the structure is facilitated.

  In the structure according to claim 4 of the present invention, one end of the support column is connected to the lower structure with a first pin, and the other end is connected to the upper structure with a second pin. The second pins are arranged orthogonally in plan view.

  According to the above configuration, as an example, the support pillar can be rotated in the Y direction by the first pin, and the horizontal rigidity of the support pillar in the Y direction is low. Further, the support pin can be rotated in the X direction by the second pin, and the horizontal rigidity of the support column in the X direction is low. Thereby, it becomes possible to deal with vibrations in either the X direction or the Y direction.

  The structure according to claim 5 of the present invention is provided with a plurality of support means for one column of the upper structure. According to this configuration, since the number of support means can be changed, the support means can be provided in accordance with the size of the upper structure. In addition, an increase in the horizontal rigidity of the support column can be suppressed to a low level without using pins for general deformation.

  In the structure according to claim 6 of the present invention, damping means for damping horizontal vibration of the upper structure is provided between the support column and the column of the upper structure. According to this configuration, the vibration of the structure can be suppressed by the damping means.

  Since this invention was set as the said structure, it can resist the pulling-out force accompanying rocking and a fall moment, without inhibiting the seismic isolation effect of a seismic isolation apparatus. Moreover, an excessive deformation | transformation can be suppressed with respect to the excessive earthquake which exceeds the limit deformation | transformation of a seismic isolation apparatus.

  A first embodiment of the structure of the present invention will be described with reference to the drawings. FIG. 1 shows a part of a building 10 constructed on the ground (not shown). The building 10 includes a lower structure 12 constructed on the ground, an upper structure 14 constructed on the upper side of the lower structure 12, and a seismic isolation device provided between the lower structure 12 and the upper structure 14. 16 and support means 18 (18A, 18B) for connecting the lower structure 12 and the upper structure 14 to each other.

  The lower structure 12 is constructed by assembling and fixing a plurality of column walls 20 and a plurality of beams 22 on a pile (not shown) formed on the ground. Similarly, the upper structure 14 is constructed by assembling and fixing a plurality of columns 24 and a plurality of beams 26.

  Between the lower structure 12 and the upper structure 14 is a seismic isolation layer L in which the building 10 is isolated. In this seismic isolation layer L, a pedestal portion 34 having a predetermined size protrudes upward from the upper surface of the lower structure 12. A plurality of seismic isolation devices 16 are mounted on the pedestal portion 34.

  The seismic isolation device 16 includes a disk-shaped lower flange steel plate 16A and a disk-shaped upper flange steel plate 16C, and a configuration in which a laminated rubber 16B is provided between the lower flange steel plate 16A and the upper flange steel plate 16C. It has become. The lower flange steel plate 16A is fixed to the pedestal portion 34 by bolt fastening or the like.

  On the other hand, above the upper flange steel plate 16C, a concrete floor slab 30 is provided that extends in a substantially horizontal direction at the center in the plane section of the building 10, and the pedestal 34 and the lower part of the floor slab 30 face downward. A plurality of attachment portions 32 are provided so as to protrude at opposing positions. Here, the upper flange steel plate 16C is fixed to the attachment portion 32 by bolt fastening or the like. A plurality of pillars 28 are provided upright on the upper surface of the floor slab 30, and the upper ends of the pillars 28 are joined to the beams 26 of the upper structure 14. Note that the pillar 28, the floor slab 30, and the mounting portion 32 constitute a part of the upper structure 14.

  A plurality of support means 18 are erected on the beam 22 of the lower structure 12 outside the floor slab 30 and at the outermost peripheral position of the flat cross section of the building 10. Here, among the plurality of support means 18, the support means 18A and 18B will be described.

  The support means 18A is located at the left end portion in the front view of the building 10, and has a pillar portion 36A. A first connection portion 36B that is pin-connected to the lower structure 12 is provided at the lower end of the column portion 36A, and a second connection portion 36C that is pin-connected to the upper structure 14 at the upper end of the column portion 36A. Is provided.

  As shown in FIG. 2, two plate members 40 </ b> A and 40 </ b> B are erected on the beam 22 at the top of the lower structure 12 with a predetermined gap. The plate members 40A and 40B are arranged in parallel (opposite arrangement) on the front side and the back side in FIG. 2, and through holes of the same size are formed in each. In addition, two plate members 42A and 42B are erected on the bottom surface of the column portion 36A with a predetermined gap narrower than the gap between the plate members 40A and 40B. The plate materials 42A and 42B are arranged in parallel (opposite arrangement) on the front side and the back side in FIG. 2, and through-holes of the same size are formed in each.

  Here, the plate members 42A and 42B are inserted between the plate members 40A and 40B, and the pillars 36A are connected to the lower structure 12 by connecting the pins 44 by aligning the positions of the through holes formed in the plate members 42A and 42B. Are rotatably connected. The rotation direction of the column portion 36A is the in-plane direction (+ R, −R direction) of the plate materials 40A, 40B, 42A, 42B.

  On the other hand, two plate members 46A and 46B are erected on the lower surface of the beam 26 at the lowermost part of the upper structure 14 with a predetermined gap. The plate members 46A and 46B are arranged in parallel (opposite arrangement) on the front side and the rear side in FIG. 2, and through holes of the same size are formed in each. In addition, two plate members 48A and 48B are erected on the upper surface of the column portion 36A with a predetermined gap narrower than the gap between the plate members 46A and 46B. The plate members 48A and 48B are arranged in parallel (opposite arrangement) on the front side and the rear side in FIG. 2, and through holes of the same size are formed in each.

  Here, the plate members 48A and 48B are inserted between the plate members 46A and 46B, and the positions of the through holes formed in the plate members 46A and 46B are aligned so that the pins 50 communicate with each other. Are rotatably connected. The rotation direction of the column portion 36A is the in-plane direction (+ R, −R direction) of the plate materials 46A, 46B, 48A, 48B.

  As shown in FIG. 1, the support means 18B is located at the right end when the building 10 is viewed from the front, and has a column portion 36A as with the support means 18A. A first connection portion 36B that is pin-connected to the lower structure 12 is provided at the lower end of the column portion 36A, and a second connection portion 36C that is pin-connected to the upper structure 14 at the upper end of the column portion 36A. Is provided.

  With the above configuration, the upper structure 14 can be moved relative to the lower structure 12 by rotating the column portions 36A of the support means 18A and 18B. The support means 18A and 18B are set in advance so that the initial horizontal stiffness (the stiffness until the seismic isolation device 16 starts shearing deformation) is equal to or less than the horizontal stiffness of the seismic isolation device 16. Is built.

  Next, the operation of the first embodiment of the present invention will be described.

  As shown in FIG. 3 (a), the support means 18A, 18B and the plurality of seismic isolation devices 16 are in normal times when horizontal force (force in the direction of the arrow X) due to an earthquake, wind, or the like is not acting on the building 10. The vertical load by the upper structure 14 is supported.

  Subsequently, as shown in FIG. 3B, when a horizontal force acts on the building 10 due to an earthquake, a wind, or the like, and a sway (sliding movement of the upper structure 14) occurs, the lower structure of the upper structure 14 The horizontal displacement u with respect to 12 increases. At this time, the seismic isolation device 16 undergoes shear deformation.

  Here, in the building 10, since the initial horizontal rigidity of the support means 18A, 18B is equal to or less than the horizontal rigidity of the seismic isolation device 16, the horizontal shear deformation of the seismic isolation device 16 causes the support means 18A, 18B. Is not disturbed. As a result, the seismic isolation device 16 is sufficiently sheared and a seismic isolation effect is obtained.

  Further, when the earthquake motion continues, the building 10 generates a pulling force due to rocking (pulling operation) and a falling moment. Here, the supporting means 18A and 18B resist the pulling force (tensile force / compressive force) due to the locking and overturning moment while following the sway by the rotation of the first connecting portion 36B and the second connecting portion 36C.

  When the building 10 is subjected to a maximum earthquake or a long-period ground motion, an excessive horizontal displacement of the building 10 is suppressed by the horizontal resistance due to the tensile force of the inclined support means 18A and 18B.

  Thus, in the building 10, since the support means 18A and 18B hardly contribute to the initial horizontal rigidity, the seismic isolation effect of the seismic isolation device 16 is hardly inhibited. Further, since the supporting means 18A and 18B that support the vertical force serve as the pulling resistance element of the building 10 as they are, they can endure a large pulling force. Furthermore, when the horizontal displacement u of the building 10 becomes excessively large, the horizontal component of the axial force of the support means 18A and 18B also increases, so that excessive horizontal displacement is suppressed.

  Moreover, in the building 10, since the support means 18A and 18B are arrange | positioned in the outermost periphery, compared with what provided the support means in the center, it can resist extraction force effectively.

  FIG. 4 shows the seismic isolation layer of a building having a normal base isolation (the base isolation device 16 or a column without the supporting means 18A, 18B) and the base isolation layer L of the building 10 of this configuration. This is a schematic graph of the relationship between the horizontal force F and the horizontal displacement u of the seismic isolation layer obtained by loading the vertical force on top and gradually increasing the horizontal force. In addition, the graph A (solid line) is the result about the seismic isolation layer L of the building 10 of this structure, and the graph B (broken line) is the result about the seismic isolation layer of the normal seismic isolation building.

  As shown in FIG. 4, in the region where the horizontal displacement u is up to u1, the average stiffness of this configuration is about the same as the horizontal stiffness F1 / u1 of normal seismic isolation, and the seismic isolation effect equivalent to normal seismic isolation is demonstrated. I understand that In addition, the support means 18A and 18B have little initial horizontal rigidity and contribute to the negative rigidity side by the inclination in a state where the compressive force is generated, and the vertical load applied to the support means 18A and 18B is seismically isolated. Transition to device 16.

  Here, if the horizontal displacement at the limit of the seismic isolation device 16 is u2, it can be seen that the supporting means 18A and 18B are subjected to a tensile force and suppress the horizontal displacement due to the large horizontal rigidity.

  In the region of a maximum earthquake or long-period earthquake in which the horizontal displacement u is larger than u2, the normal seismic isolation configuration cannot cope with excessive deformation. On the other hand, in this configuration, since it has high horizontal rigidity due to the tensile force of the inclined support means 18A, 18B, excessive deformation can be suppressed at the time of a maximum earthquake or long-period earthquake, and a so-called fail-safe function is provided. is doing.

  Next, a second embodiment of the structure of the present invention will be described. Note that the same reference numerals as those in the first embodiment are given to the members that are basically the same as those in the first embodiment described above, and the description thereof is omitted.

  5A and 5B show a part of a building 60 constructed on the ground (not shown) in two directions, the X direction and the Y direction. The building 10 connects the lower structure 12, the upper structure 14, the seismic isolation device 16 provided between the lower structure 12 and the upper structure 14, and the lower structure 12 and the upper structure 14. And a plurality of support means 62.

  A plurality of support means 62 are erected on the beam 22 of the lower structure 12 outside the floor slab 30 of the seismic isolation layer L and at the outermost peripheral position of the flat cross section of the building 60. 5A and 5B, among the plurality of support means 62, the X direction indicates the support means 62A and 62B, the Y direction indicates the support means 62B and 62C, and the display of the other support means. Is omitted. Since the support means 62A, 62B, and 62C have the same configuration, the support means 62A will be described below, and the description of the support means 62B and 62C will be omitted.

  The support means 62A is located at the left end portion in the front view (XZ plane) of the building 60 and has a column portion 64A. A first connection portion 64B that is pin-connected to the lower structure 12 is provided at the lower end of the column portion 64A, and a second connection portion 64C that is pin-connected to the upper structure 14 at the upper end of the column portion 64A. Is provided.

  As shown in FIG. 6, plate materials 66 </ b> A and 66 </ b> B are erected with a predetermined gap on the uppermost beam 22 of the lower structure 12. The plate members 66A and 66B are arranged in parallel (oppositely arranged) on the front side and the back side in the direction of the arrow X, and through-holes of the same size are formed in each. In addition, two plate members 68A and 68B are erected on the bottom surface of the column portion 64A with a predetermined gap narrower than the gap between the plate members 66A and 66B. The plate materials 68A and 68B are arranged in parallel (opposite arrangement) on the front side and the back side in the direction of the arrow X, and through-holes of the same size are formed in each.

  Here, the plate members 68A and 68B are inserted between the plate members 66A and 66B, and the first pin 63 is made to communicate with each other by aligning the positions of the through holes formed in the plate members 68A and 68B. The part 64A is connected to be rotatable in the arrow Y direction.

  On the other hand, on the lower surface of the beam 26 at the lowermost part of the upper structure 14, plate materials 66C and 66D are erected with a predetermined gap. The plate members 66C and 66D are arranged in parallel (opposite arrangement) on the front side and the back side in the arrow Y direction, and through holes of the same size are formed in each. In addition, two plate members 68C and 68D are erected on the upper surface of the column portion 64A with a predetermined gap narrower than the gap between the plate members 66C and 66D. The plate materials 68C and 68D are arranged in parallel (oppositely arranged) on the front side and the back side in the direction of arrow Y, and through holes of the same size are formed in each.

  Here, the plate members 68C and 68D are inserted between the plate members 66C and 66D, and the positions of the through holes formed in the respective members are aligned so that the second pins 65 communicate with each other. The part 64A is connected so as to be rotatable in the arrow X direction. The first pins 63 and the second pins 65 are arranged so that their central axes are orthogonal to each other in plan view.

  Thus, in the arrow X direction, the first connecting part 64B of the support means 62A to 62C is not rotatable, and the second connecting part 64C is rotatable. On the other hand, in the arrow Y direction, the first connecting portion 64B of the support means 62A to 62C is rotatable, and the second connecting portion 64C is not rotatable.

  5A and 5B, the support means 62A to 62C are set and constructed in advance so that the initial stiffness in the horizontal direction is equal to or less than the horizontal stiffness of the seismic isolation device 16. .

  Next, the operation of the second embodiment of the present invention will be described.

  As shown in FIGS. 5A and 5B, the support means 62 </ b> A to 62 </ b> C and the plurality of support means 62 </ b> A to 62 </ b> C and a plurality of horizontal forces (forces in the directions of arrows X and Y) due to earthquake, wind, and the like are not acting on the building 60. The seismic isolation device 16 supports the vertical load by the upper structure 14.

  Subsequently, as shown in FIG. 7A, it is assumed that a horizontal force is applied to the building 60 due to an earthquake, a wind, or the like, and a sway in the arrow X direction (sliding movement of the upper structure 14) occurs. Here, since the column portion 64A cannot rotate in the X direction by the first connecting portion 64B and can rotate in the X direction by the second connecting portion 64C, the column portion 64A rotates in the second connecting portion 64C. Become. As a result, the horizontal displacement in the X direction of the upper structure 14 relative to the lower structure 12 becomes u3. At this time, the laminated rubber 16B of the seismic isolation device 16 undergoes shear deformation.

  Similarly, as shown in FIG. 7B, it is assumed that a horizontal force acts on the building 60 due to the earthquake, and a sway in the arrow Y direction (sliding movement of the upper structure 14) occurs. Here, since the column portion 64A is not rotatable in the Y direction by the second connecting portion 64C and is rotatable in the Y direction by the first connecting portion 64B, the column portion 64A is rotated and moved in the Y direction by the first connecting portion 64B. Will do. Thereby, the horizontal displacement of the upper structure 14 with respect to the lower structure 12 in the Y direction becomes u4. At this time, the laminated rubber 16B of the seismic isolation device 16 undergoes shear deformation.

  Here, in the building 60, since the initial horizontal rigidity of the support means 62A to 62C is equal to the horizontal rigidity of the seismic isolation device 16, shear deformation in the horizontal direction (arrow X direction or arrow Y direction) of the seismic isolation device 16 is achieved. However, it is not inhibited by the supporting means 62A to 62C. As a result, the seismic isolation device 16 is sufficiently sheared and a seismic isolation effect is obtained.

  In the state shown in FIGS. 7A and 7B, if the seismic motion continues, the building 60 generates a pulling force due to locking (pulling operation) and a falling moment. Here, since the supporting means 62A to 62C follow the sway by the rotation of the first connecting part 64B or the second connecting part 64C, they resist the pulling force (tensile force / compressive force) due to the locking and overturning moment, 60 collapses can be prevented.

  In addition, when the building 60 receives the maximum earthquake or long-period ground motion, the excessive horizontal displacement of the building 60 is suppressed by the horizontal resistance due to the tensile force of the inclined support means 62A to 62C.

  Thus, since the support means 62A-62C hardly contributes to initial horizontal rigidity, the seismic isolation effect of the seismic isolation device 16 is hardly inhibited. Moreover, since the support means 62A-62C which supports vertical force becomes the pulling-out resistance element of the building 60 as it is, it can endure a big pulling-out force. Furthermore, when the horizontal displacement u of the building 60 increases, the horizontal component of the axial force of the support means 62A to 62C also increases, so that excessive horizontal displacement is suppressed.

  Moreover, the support pillar can be rotated in the Y direction by the first pin 63, and the horizontal rigidity of the support pillar in the Y direction is low. The support pillar can be rotated in the X direction by the second pin 65, and the horizontal rigidity of the support pillar in the X direction is low. Thereby, it is possible to deal with vibrations in either the X direction or the Y direction.

  As described above, since the seismic isolation effect can be obtained even if the supporting means 62A to 62C are connected to one of the lower structure 12 and the upper structure 14 by the first pin 63 or the second pin 65, the building 60 It becomes easy to install.

  Next, a third embodiment of the structure of the present invention will be described. Note that the same reference numerals as those in the first embodiment are given to the members that are basically the same as those in the first embodiment described above, and the description thereof is omitted.

  FIG. 1 shows a part of a building 70 constructed on the ground (not shown). The building 70 is provided with a plurality of support means 74A and 74B instead of the support means 18 of the building 10 of the first embodiment (see FIG. 1).

  The support means 74A and 74B are pillars, and on the beam 22 on the upper surface of the lower structure 12 and the beam 26 on the lower surface of the upper structure 14 at the outermost position of the flat cross section of the building 70 outside the floor slab 30. It is joined and standing up (not pin connection). Further, the support means 74 is composed of a column that is thinner than the column portion 36A of the first embodiment (if there is a possibility of buckling, the periphery of the support means 74 is buckled and stiffened). The rigidity is equal to or less than the horizontal rigidity of the seismic isolation device 16, does not hinder the seismic isolation effect of the seismic isolation device 16, and the vertical load of the upper structure 14 is a column with a small bending rigidity to support.

  Here, two support means 74A and 74B are provided for one of the pillars 24 of the upper structure 14, and the support portions 72 (72A, 72A, 74B) supporting the upper structure 14 by the support means 74A and 74B. 72B) is configured. Although a plurality of support portions 72 are provided in the building 70, only the support portions 72A (left side) and 72B (right side) are displayed.

  Next, the operation of the third embodiment of the present invention will be described.

  As shown in FIG. 9 (a), the support means 74A, 74B and the plurality of seismic isolation devices 16 are provided in the upper structure when the horizontal force (the force in the arrow X direction) due to the earthquake is not acting on the building 70 at normal times. The vertical load by 14 is supported.

  Subsequently, as shown in FIG. 9B, when a horizontal force acts on the building 70 due to the earthquake and a sway (sliding movement of the upper structure 14) occurs, the upper structure 14 is horizontal with respect to the lower structure 12. The displacement u5 increases. At this time, the laminated rubber 16B of the seismic isolation device 16 undergoes shear deformation.

  Here, in the building 70, since the horizontal rigidity of the support means 74A, 74B is equal to or less than the horizontal rigidity of the seismic isolation device 16, the horizontal shear deformation of the seismic isolation device 16 is caused by the support means 74A, 74B. Not disturbed. As a result, the seismic isolation device 16 is sufficiently sheared and a seismic isolation effect is obtained.

  Further, if the earthquake motion continues, the building 70 generates a pulling force due to rocking (pulling operation) and a falling moment. Here, since the supporting means 74A and 74B follow the sway and resist the pulling force (tensile force / compressing force) due to the locking and overturning moment, the building 70 can be prevented from collapsing. When the building 70 is subjected to a maximum earthquake or a long-period ground motion, an excessive horizontal displacement of the building 70 is suppressed by the horizontal resistance due to the tensile force of the inclined support means 74A and 74B.

  Thus, since the support means 74A, 74B hardly contributes to the initial horizontal rigidity, the seismic isolation effect of the seismic isolation device 16 is hardly inhibited. Further, since the supporting means 74A and 74B that support the vertical force serve as the pulling resistance element of the building 70 as they are, they can withstand a large pulling force. Furthermore, when the horizontal displacement u5 of the building 70 is increased, the horizontal component of the axial force of the support means 74A and 74B is also increased, so that excessive horizontal displacement is suppressed. Since the number of the support means 74 can be changed, a plurality of support means can be provided in accordance with the size of the upper structure 14.

  Next, a fourth embodiment of the structure of the present invention will be described. Note that the same reference numerals as those in the first embodiment are given to the members that are basically the same as those in the first embodiment described above, and the description thereof is omitted.

  FIG. 10 shows a part of a building 80 constructed on the ground (not shown). The building 80 includes a lower structure 12 constructed on the ground, an upper structure 82 constructed on the upper side of the lower structure 12, and a seismic isolation device provided between the lower structure 12 and the upper structure 82. 16 and support means 90 (90A, 90B) for connecting the lower structure 12 and the upper structure 82 to each other. Further, an oil damper 96 (96A, 96B, 96C, 96D) as a damping means is installed between the support means 90 and the upper structure 82.

  The upper structure 82 is constructed by assembling and fixing a plurality of columns 84 and a plurality of beams 86. Moreover, on the lower structure 12, a seismic isolation device 16 and a floor slab 30 with the seismic isolation device 16 attached to the lower surface are disposed. Here, a plurality of columns 88 are erected on the floor slab 30, and the upper ends of the columns 88 are joined to the beams 86 of the upper structure 82. Further, a beam 92 is joined to the column 88 in the horizontal direction, and three layers including the floor slab 30 are formed between the lower structure 12 and the upper structure 82. The column 88, the beam 92, the floor slab 30, and the attachment portion 32 constitute a part of the upper structure 82.

  A plurality of support means 90 are erected on the beam 22 of the lower structure 12 outside the floor slab 30 and at the outermost peripheral position of the flat section of the building 80. Here, among the plurality of support means 90, support means 90A and 90B will be described.

  The support means 90 </ b> A is located at the left end portion in the front view of the building 80 and has a pillar portion 94. A first connection portion 36B that is pin-connected to the lower structure 12 is provided at the lower end of the column portion 94, and a second connection portion 36C that is pin-connected to the upper structure 82 at the upper end of the column portion 94. Is provided.

  Further, the support means 90B is located at the right end portion in the front view of the building 80, and has a pillar portion 94 as in the support means 90A. A first connection portion 36B that is pin-connected to the lower structure 12 is provided at the lower end of the column portion 94, and a second connection portion 36C that is pin-connected to the upper structure 82 at the upper end of the column portion 94. Is provided.

  With the above configuration, the upper structure 82 can be moved relative to the lower structure 12 by rotating the column portions 94 of the support means 90A and 90B. The support means 90A and 90B are set and constructed in advance so that the horizontal initial stiffness is equal to or less than the horizontal stiffness of the seismic isolation device 16.

  Next, the operation of the fourth exemplary embodiment of the present invention will be described.

  As shown in FIG. 11 (a), the support means 90A, 90B and the plurality of seismic isolation devices 16 are provided in the upper structure at the normal time when the horizontal force (force in the direction of the arrow X) due to the earthquake does not act on the building 80. The vertical load by 82 is supported.

  Subsequently, as shown in FIG. 11B, when a sway (sliding movement of the upper structure 82) occurs due to a horizontal force acting on the building 80 due to an earthquake, wind, or the like, the lower structure of the upper structure 82 is generated. The horizontal displacement u6 with respect to 12 increases. At this time, the laminated rubber 16B of the seismic isolation device 16 undergoes shear deformation, and the vibration of the building 80 is reduced by increasing the natural period of the upper structure 82.

  Further, since the distance (distance) between the column 88 of the upper structure 82 and the column portion 94 of the support means 90A, 90B changes with the displacement of the upper structure 82, the oil damper 96 operates and the vibration of the building 80 Can be suppressed.

  Here, in the building 80, since the initial horizontal stiffness of the support means 90A, 90B is equal to or less than the horizontal stiffness of the seismic isolation device 16, the horizontal shear deformation of the seismic isolation device 16 causes the support means 90A, 90B. Is not disturbed. As a result, the seismic isolation device 16 is sufficiently sheared and a seismic isolation effect is obtained.

  Further, if the earthquake motion continues, the building 80 generates a pulling force due to rocking (pulling operation) and a falling moment. Here, since the supporting means 90A, 90B follow the sway by the rotation of the first connecting portion 36B and the second connecting portion 36C, and resist the pulling force (tensile force / compressive force) due to the locking and overturning moment, the building 80 collapses can be prevented.

  When the building 80 is subjected to a maximum earthquake or a long-period ground motion, an excessive horizontal displacement of the building 80 is suppressed by the horizontal resistance due to the tensile force of the inclined support means 90A and 90B.

  Thus, since the support means 90A, 90B hardly contributes to the initial horizontal rigidity, the seismic isolation effect of the seismic isolation device 16 is hardly inhibited. Further, since the supporting means 90A and 90B that support the vertical force serve as the pulling resistance element of the building 80 as they are, they can withstand a large pulling force. Further, when the horizontal displacement u6 of the building 80 is increased, the horizontal component of the axial force of the support means 90A and 90B is also increased, so that excessive horizontal displacement is suppressed.

  In addition, this invention is not limited to said embodiment.

  The seismic isolation device 16 is not limited to a laminated rubber bearing, and may be, for example, a sliding bearing or a rail-type bearing that is disposed in the horizontal direction and has one end attached to the upper structure 14 and the other end attached to the lower structure 12. . Further, the base isolation layer L may be either base isolation or intermediate layer isolation.

  The number of support means 74 in the support part 72 is not limited to two of the support means 74A and 74B, and three or more support means 74 may be provided based on the required bending rigidity in the support part 72. Further, the support means 90 is not limited to the three layers of the upper structure 82, but may be one, two layers, or four layers or more.

It is a schematic diagram of the building which concerns on 1st Embodiment of this invention. It is a schematic diagram of the support means which concerns on 1st Embodiment of this invention. (A), (b) It is a schematic diagram which shows the displacement state of the seismic isolation layer of the building which concerns on 1st Embodiment of this invention. It is a graph of the horizontal force with respect to the horizontal displacement of the seismic isolation layer of the building which concerns on 1st Embodiment of this invention. (A), (b) It is a schematic diagram of the building which concerns on 2nd Embodiment of this invention. It is a schematic diagram of the support means which concerns on 2nd Embodiment of this invention. (A), (b) It is a schematic diagram which shows the displacement state of the seismic isolation layer of the building which concerns on 2nd Embodiment of this invention. (A), (b) It is a schematic diagram of the building which concerns on 3rd Embodiment of this invention. (A), (b) It is a schematic diagram which shows the displacement state of the seismic isolation layer of the building which concerns on 3rd Embodiment of this invention. (A), (b) It is a schematic diagram of the building which concerns on 4th Embodiment of this invention. (A), (b) It is a schematic diagram which shows the displacement state of the seismic isolation layer of the building which concerns on 4th Embodiment of this invention.

Explanation of symbols

10 Building (structure)
12 Lower structure (lower structure)
14 Superstructure (superstructure)
16 Seismic isolation device (Seismic isolation device)
18 Support means (support means)
36A pillar (support pillar)
44 pins
50 pins
60 Building (structure)
62 Support means (support means)
63 1st pin (1st pin)
64A pillar (support pillar)
65 Second pin (second pin)
70 Building (structure)
74 Support means (support means)
80 Building (structure)
82 Superstructure (superstructure)
90 Support means (support means)
94 Column (support column)
96 Oil damper (damping means)

Claims (6)

A substructure,
An upper structure constructed above the lower structure;
A seismic isolation device provided between the lower structure and the upper structure;
The lower structure and the upper structure are connected to resist the deformation in the compression and tension directions between the connections, and the horizontal rigidity is equal to or equal to the horizontal rigidity of the seismic isolation device during general deformation. Support means that has a rigidity greater than the horizontal rigidity of the seismic isolation device at the time of excessive deformation;
A structure having   The structure according to claim 1, wherein the seismic isolation device is disposed on the inner side and the support means is disposed on the outermost periphery.   The structure according to claim 1, wherein the support means is a support column connected to at least one of the lower structure and the upper structure by a pin.   The support pillar has one end connected to the lower structure with a first pin, the other end connected to the upper structure with a second pin, and the first pin and the second pin are arranged orthogonally in a plan view. The structure according to claim 3.   The structure according to any one of claims 1 to 4, wherein a plurality of the support means are provided for one column of the upper structure.   The structure according to claim 3 or 4, wherein a damping means for damping a vibration in a horizontal direction of the upper structure is provided between the support column and the column of the upper structure.

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