JP2010061919A - Surface plasma generation device - Google Patents

Surface plasma generation device Download PDF

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JP2010061919A
JP2010061919A JP2008225001A JP2008225001A JP2010061919A JP 2010061919 A JP2010061919 A JP 2010061919A JP 2008225001 A JP2008225001 A JP 2008225001A JP 2008225001 A JP2008225001 A JP 2008225001A JP 2010061919 A JP2010061919 A JP 2010061919A
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surface plasma
voltage
plasma
applied voltage
rising speed
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JP5360800B2 (en
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Takehiko Segawa
武彦 瀬川
Hiroo Yoshida
博夫 吉田
Shinya Takegawa
信也 武川
Kwing So Choi
チョイ クィンソー
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National Institute of Advanced Industrial Science and Technology AIST
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a surface plasma generation device for stably generating high-speed surface plasma by properly setting the rising speed of voltage to be applied between electrodes. <P>SOLUTION: The surface plasma generation device includes the surface side electrode and the back side electrode with an insulting material therebetween, wherein a voltage is applied between both electrodes to generate surface plasma. The rising speed of the voltage to be applied between the electrodes is 3-7 μs/kV, preferably 4-5 μs/kV. Preferably, this applied voltage is pulsed to set the rising speed of the applied voltage to be a predetermined value. It can be triangle-waveformed to rise at the predetermined value. At this point, the waveform lowering on the negative side can be set to be smaller. Additionally, when the surface side electrode is doughnut-shaped, surface plasma jet rises vertically from the surface, and so the rising speed of the applied voltage is easily and properly set. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

この発明は絶縁体を挟んで表裏両面に設けた電極に対して高電圧高周波電流を印加することにより、絶縁体表面に沿ってプラズマを発生させる表面プラズマ発生装置に関し、特に印加する高周波電流の立ち上がり電圧の速度を適切に設定することにより、高効率で高速のプラズマを発生することができるようにした表面プラズマ発生装置に関する。   The present invention relates to a surface plasma generator that generates plasma along the surface of an insulator by applying a high-voltage, high-frequency current to electrodes provided on both the front and back sides of the insulator, and in particular, the rising of the applied high-frequency current. The present invention relates to a surface plasma generator capable of generating high-efficiency and high-speed plasma by appropriately setting the voltage speed.

従来より各種アクチュエータが開発されているが、近年表面プラズマを用いたアクチュエータが注目されている。表面プラズマアクチュエータは、例えば図7(a)に示すように、樹脂、セラミック等の絶縁体71を挟んで表面側電極72と裏面側電極73を設け、両電極に交流電源74によって交流電界を発生させると、表面側電極72の端縁75から絶縁体71の表面に沿って表面プラズマとしてのプラズマジェット76が発生することを利用するものである。このような表面プラズマはDBD(dielectric barrier discharge)プラズマアクチュエータとも呼ばれている。特にこのような表面プラズマは周囲の気体を誘導し誘導気流77も発生するため、この作用を有効に利用する研究もなされている。   Various actuators have been developed so far, but in recent years, actuators using surface plasma have attracted attention. For example, as shown in FIG. 7A, the surface plasma actuator is provided with a front-side electrode 72 and a back-side electrode 73 with an insulator 71 made of resin, ceramic or the like interposed therebetween, and an AC electric field is generated by an AC power source 74 on both electrodes. Then, the fact that a plasma jet 76 as surface plasma is generated from the edge 75 of the surface-side electrode 72 along the surface of the insulator 71 is utilized. Such surface plasma is also called a DBD (dielectric barrier discharge) plasma actuator. In particular, since such surface plasma induces ambient gas and generates an induced airflow 77, studies have been made to effectively use this action.

特に図7(a)に示すように、交流電源74を制御装置80によって制御可能とし、且つセンサ81によって気体速度や温度を検出し、或いは実際の電極印加電圧を検出して、その信号によって制御装置80が交流電源74を制御可能となっている。このときの電極に印加する交流電源からの電流は、例えば図6(b)に示すような正弦波、或いは同図(c)に示すような所定の狭い幅の交流パルス波を出力する。このような制御状態からより強いプラズマジェットを発生させようとするときには、正弦波の場合は周波数を高くし、パルス波の場合は供給時間を多くするデューティー比制御を行うことにより対応することができる。   In particular, as shown in FIG. 7A, the AC power supply 74 can be controlled by the control device 80, and the gas velocity and temperature are detected by the sensor 81, or the actual electrode applied voltage is detected and controlled by the signal. The device 80 can control the AC power source 74. The current from the AC power source applied to the electrode at this time outputs, for example, a sine wave as shown in FIG. 6B or an AC pulse wave having a predetermined narrow width as shown in FIG. When trying to generate a stronger plasma jet from such a controlled state, it can be dealt with by performing duty ratio control that increases the frequency in the case of a sine wave and increases the supply time in the case of a pulse wave. .

表面プラズマは現在各種用途への適用が検討されており、飛行機や風車の翼、タービンのブレード等において、渦流の発生等による翼からの気流の剥がれ防止等に用いる研究もなされている。このようなアクチュエータの研究の過程で表面プラズマの特性が更に明らかになり、この表面プラズマアクチュエータは、電極の形状や配置により特有のプラズマジェットを発生させることができ、また、そのプラズマの発生特性に合わせてより広い分野のアクチュエータとして利用することが可能であることが明らかとなってきた。   The application of surface plasma to various applications is currently under study, and research is being conducted on the use of airflow from the blades due to the generation of eddy currents in airplanes, windmill blades, turbine blades, and the like. The characteristics of surface plasma are further clarified in the course of research on such actuators, and this surface plasma actuator can generate a specific plasma jet depending on the shape and arrangement of electrodes, In addition, it has become clear that it can be used as a wider range of actuators.

即ち、表面プラズマを発生させる表面側電極の形状と配置によって種々のプラズマジェットを発生させることができ、例えば図7(a)(b)のように絶縁体91の表面に互いに間隔をもって平行に第1表面側電極92と第2表面側電極93とを対向して配置し、裏面に設けた裏面側電極94との間に高電界を発生させると、表面側電極と裏面側電極の配置関係により、各表面側電極の互いに対向する端縁から表面に平行に前記と同様の表面プラズマが発生する。これらのプラズマジェットは各電極の中間部で衝突し、図8(b)に示すように絶縁体91の表面から立ち上がるプラズマジェット95が形成される。その際には周囲の気体は図示するように表面にほぼ直角に誘導される誘導気流96が発生する。   That is, various plasma jets can be generated depending on the shape and arrangement of the surface-side electrode that generates the surface plasma. For example, as shown in FIGS. When the first surface side electrode 92 and the second surface side electrode 93 are arranged to face each other and a high electric field is generated between the back surface side electrode 94 provided on the back surface, the arrangement relationship between the front surface side electrode and the back surface side electrode Then, surface plasma similar to the above is generated in parallel to the surface from the edge of each surface side electrode facing each other. These plasma jets collide at the middle part of each electrode, and as shown in FIG. 8B, a plasma jet 95 rising from the surface of the insulator 91 is formed. At that time, an induced air flow 96 is generated in which the surrounding gas is guided substantially perpendicularly to the surface as shown in the figure.

その他例えば図9(a)に示すように表面側電極98を、中心開口97を備えたドーナツ型、或いは図8(b)に示すように円形中心開口97を備えた矩形に形成し、絶縁体99の裏面に設けた裏面側電極100との間に高電界を発生させると、表面側電極98と裏面側電極102の配置関係により、表面側電極98の中心開口97側の端縁から中心に向けて表面プラズマ99が表面に平行に発生する。この表面プラズマ99は中心部において互いに衝突し、表面から立ち上がるプラズマジェット100が形成される。また、そのプラズマジェット100に誘導されて誘導気流101が表面に直角に発生する。   In addition, for example, as shown in FIG. 9A, the surface-side electrode 98 is formed in a donut shape having a central opening 97 or a rectangle having a circular central opening 97 as shown in FIG. 99, when a high electric field is generated between the back surface side electrode 100 provided on the back surface of 99 and the center side from the edge of the front surface side electrode 98 on the side of the central opening 97 due to the arrangement relationship between the front surface side electrode 98 and the back surface side electrode 102. A surface plasma 99 is generated parallel to the surface. The surface plasmas 99 collide with each other at the center, and a plasma jet 100 rising from the surface is formed. In addition, an induced airflow 101 is generated at a right angle to the surface by being induced by the plasma jet 100.

このように、電極の形状や配置により、種々のプラズマジェットを発生させることができ、これを前記のような翼の渦流発生制御による剥離防止作用を行わせるほか、更に各種のアクチュエータとして利用することが考えられる。   As described above, various plasma jets can be generated depending on the shape and arrangement of the electrodes, and this can be used as various actuators in addition to performing the anti-separation action by controlling the vortex generation of the blade as described above. Can be considered.

なお、プラズマアクチュエータについては下記文献に詳細に記載されている。
Roth, J. R., Sherman, D. M., and Wilkinson, S. P. (1998). Boundary layer flow control with a one atmosphere uniform glow discharge. AIAA Paper 98-0328, 36th Aerospace Sciences Meeting and Exhibit, Reno, Nevada. Corke, T. C., Jumper, E. J., Post, M. L., Orlov, D., and McLaughlin, T. E. (2002). Application of weakly-ionized plasmas as wing flow-control devices. AIAA paper 2002-0350, 40th Aerospace Sciences Meeting & Exhibit, Reno, Nevada. Santhanakrishnan, A. and Jacob, J. D. (2006). On plasma synthetic jet actuators. AIAA paper 2006-0317, 44th Aerospace Sciences Meeting, Reno, Nevada.
The plasma actuator is described in detail in the following document.
Roth, JR, Sherman, DM, and Wilkinson, SP (1998) .Boundary layer flow control with a one atmosphere uniform glow discharge.AIAA Paper 98-0328, 36th Aerospace Sciences Meeting and Exhibit, Reno, Nevada. Corke, TC, Jumper, EJ, Post, ML, Orlov, D., and McLaughlin, TE (2002) .Application of weakly-ionized plasmas as wing flow-control devices.AIAA paper 2002-0350, 40th Aerospace Sciences Meeting & Exhibit , Reno, Nevada. Santhanakrishnan, A. and Jacob, JD (2006) .On plasma synthetic jet actuators.AIAA paper 2006-0317, 44th Aerospace Sciences Meeting, Reno, Nevada.

上記のような表面プラズマを用いるプラズマアクチュエータにおいて、前記のように種々のプラズマを発生させることができ、多様な用途に適用できるようになったものであるが、このプラズマをより効率よく、且つ高速で発生させる手法を研究開発することは、この表面プラズマ発生装置を広く利用するに際して最も基本的なこととである。そのため、従来より表面プラズマの発生特性を詳細に研究しながら、より高速の表面プラズマを発生させる研究がなされている。しかしながら、現在までの研究成果によると、未だ必ずしも効果的な手法が開発されていない。更に近年はDBDプラズマをいかに低電圧で発生することができるか、という点が大きな課題となっているが、現在では必ずしも十分な手法が開発されているとはいえない。   In the plasma actuator using the surface plasma as described above, various plasmas can be generated as described above and can be applied to various applications. However, this plasma can be used more efficiently and at high speed. Research and development of the method of generating the surface plasma is the most basic thing when this surface plasma generator is widely used. For this reason, research has been conducted to generate higher-speed surface plasma while studying the generation characteristics of surface plasma in detail. However, according to the research results to date, effective methods have not yet been developed. Further, in recent years, how to generate DBD plasma at a low voltage has become a big problem, but it cannot be said that a sufficient method has been developed at present.

したがって本発明は、高速の表面プラズマを低電圧で安定して発生させることができるようにした表面プラズマ発生装置を提供することを主たる目的とする。   Therefore, a main object of the present invention is to provide a surface plasma generator capable of stably generating a high-speed surface plasma at a low voltage.

本発明者等は前記のようなDBD(dielectric barrier discharge)プラズマアクチュエータとも呼ばれる表面プラズマアクチュエータについて多くの実験を行い、研究を重ねた結果、電極への印加電流の態様を異ならせることにより表面プラズマの発生態様、特にプラズマの速度が変化することが系統立てて明らかになると共に、単に図7に示すような表面に平行に発生するプラズマの様子を観察するのでは明瞭に把握することができないことから、特に図9に示すようなドーナツ型電極によるプラズマを発生させると、プラズマの発生の程度を、表面から垂直に立ち上がるプラズマの状態で観察することができることに着目して各種の実験を試みた。   The present inventors have conducted many experiments on the surface plasma actuator, also referred to as a DBD (dielectric barrier discharge) plasma actuator as described above, and as a result of repeated research, the inventors have studied the surface plasma by varying the mode of current applied to the electrodes. It is systematically revealed that the generation mode, in particular, the plasma velocity changes, and it is not possible to clearly grasp by simply observing the state of the plasma generated parallel to the surface as shown in FIG. In particular, various experiments were attempted focusing on the fact that when plasma is generated by a donut-shaped electrode as shown in FIG. 9, the degree of plasma generation can be observed in the state of plasma rising vertically from the surface.

更に、このようにして垂直に立ち上がる表面プラズマの様子を明瞭に把握するため、レーザーによってプラズマを可視化し、更に可視化粒子を試験部の周囲に供給することにより、個々の可視化粒子の速度を測定することによって、垂直に立ち上がる表面プラズマの挙動を観察することを考えた。実際に実験行うために製作した装置を図3に示す。同図に示す実験装置においては、図9(d)に示すように、厚さ130μmのポリエステルからなる絶縁体の両面に、35μm程度の銅箔からなる電極パターンを接着し、エッチングにより表面側電極は、内径diが50mmで幅が10mmのドーナツ型に形成し、裏面側電極はドーナツ型の内径と同径で同位置の外周を備えた円形に形成している。   Furthermore, in order to clearly grasp the state of the surface plasma rising vertically in this way, the velocity of each visualized particle is measured by visualizing the plasma with a laser and supplying the visualized particles around the test section. We thought to observe the behavior of the surface plasma rising vertically. FIG. 3 shows an apparatus manufactured for an actual experiment. In the experimental apparatus shown in FIG. 9, as shown in FIG. 9 (d), an electrode pattern made of a copper foil of about 35 μm is adhered to both surfaces of an insulator made of polyester having a thickness of 130 μm, and the surface side electrode is etched. Is formed in a donut shape having an inner diameter di of 50 mm and a width of 10 mm, and the back side electrode is formed in a circular shape having the same diameter and the same outer periphery as the inner diameter of the donut shape.

このようなドーナツ型電極を用い、図3に示すようなアクリル製の透明な容器C内の底面上にセットし、信号発生器HV−RFにより所定の波形の電圧を印加した。通常の表面プラズマの観察には多くの場合は図7(b)に示すような正弦波を用いることが多いが、その場合はプラズマ発生速度の周波数依存性を調べるに際して、入力周波数(fp)の変化と共に電圧立ち上がり速度(dV/dt)も変化してしまうため、プラズマジェット発生速度に対する影響を両者の面から論ずる必要が生じる。   Using such a donut-shaped electrode, it was set on the bottom surface in an acrylic transparent container C as shown in FIG. 3, and a voltage having a predetermined waveform was applied by a signal generator HV-RF. In many cases, a normal surface plasma is observed by using a sine wave as shown in FIG. 7B. In this case, when investigating the frequency dependence of the plasma generation speed, the input frequency (fp) Since the voltage rising speed (dV / dt) also changes with the change, it is necessary to discuss the influence on the plasma jet generation speed from both aspects.

それに対して印加電圧波形を矩形波とすると、仮にdV/dtを一定にできれば、プラズマジェットの速度の入力周波数(fp)依存性、或いは逆に印加電圧波形の依存性を直接調べることが可能となる。そのため図3に示す実験装置では、図2(a)に示すようなパルス波を発生させている。このパルス波の例では、振幅が±3.5kVで、周波数Fpを2.5、5.0、7.5、10.0kHに変化可能とし、一連の印加電圧波形の幅Tbを0.1secとし、一連の印加電圧波形が発生する時間間隔Tr、即ち1/frを2.0secとし、それにより一連の印加電圧波形の時間間隔Tsを1.9secとした例を示している。   On the other hand, if the applied voltage waveform is a rectangular wave, if dV / dt can be made constant, it is possible to directly investigate the dependency of the plasma jet velocity on the input frequency (fp), or conversely, the dependency of the applied voltage waveform. Become. Therefore, the experimental apparatus shown in FIG. 3 generates a pulse wave as shown in FIG. In this pulse wave example, the amplitude is ± 3.5 kV, the frequency Fp can be changed to 2.5, 5.0, 7.5, 10.0 kH, and the width Tb of a series of applied voltage waveforms is 0.1 sec. In this example, the time interval Tr where a series of applied voltage waveforms is generated, that is, 1 / fr is 2.0 sec, and the time interval Ts of the series of applied voltage waveforms is 1.9 sec.

但し、このパルス波は一見矩形波のようであるが、これを拡大した同図(b)から明らかなように、一般的な台形波となっている。本発明者等はプラズマジェットの速度の印加電圧波形の依存性について、特にこの台形波について印加電圧の立ち上がり速度dV/dt、即ち波形の立ち上がり部分の速度を変化させて観察することを考え、この印加電圧の立ち上がり速度を変化させる制御により電圧の立上り速度を図2(c)のようにaから、b、c、d、e、f、g、hと同図に波形模式図として示すような、印加電圧の立ち上がり速度dV/dtが変化する波形を形成して印加した。   However, although this pulse wave appears to be a rectangular wave, it is a general trapezoidal wave as is apparent from FIG. The inventors consider the dependence of the plasma jet velocity on the applied voltage waveform, in particular, to observe this trapezoidal wave by changing the rising speed dV / dt of the applied voltage, that is, changing the speed of the rising portion of the waveform. As shown in FIG. 2C, the rising speed of the voltage is controlled by changing the rising speed of the applied voltage from a to b, c, d, e, f, g, and h as shown in the waveform schematic diagram in FIG. A waveform in which the rising speed dV / dt of the applied voltage changes was formed and applied.

図3に示す実験装置においては、上記のような印加電圧によってドーナツ型電極の中心から立ち上がるプラズマジェットに対して、容器Cの外部から2重パルスYAGレーザーで発生したレーザーを照射することにより可視化し、更に可視化粒子として数μmに微粒化したプロピレングリコールを用いて、空気圧縮機Dにより容器C内に供給する。微粒化したプロピレングリコールは空気よりも重いため、大気状態の容器Cの下部に設置したプラズマ発生装置の周囲に一定時間滞在させることができる。このような可視化粒子の供給により、前記のように照射したレーザーによってプラズマジェットを明瞭に可視化することができる。また、この可視化粒子の挙動を計測することにより、プラズマジェット各部、及びその周囲での気流の方向、速度を計測することができる。その計測に際しては、CCDカメラとして示しているデジタルビデオカメラによりレーザー光で可視化した部分をレーザー光とは直角方向から、0.04秒間隔程度で撮影する。   In the experimental apparatus shown in FIG. 3, the plasma jet rising from the center of the donut-shaped electrode by the applied voltage as described above is visualized by irradiating a laser generated by a double pulse YAG laser from the outside of the container C. Further, propylene glycol atomized to several μm is used as the visualization particle, and is supplied into the container C by the air compressor D. Since the atomized propylene glycol is heavier than air, the propylene glycol can stay around the plasma generator installed in the lower part of the atmospheric container C for a certain period of time. By supplying such visualization particles, the plasma jet can be clearly visualized by the laser irradiated as described above. Further, by measuring the behavior of the visualized particles, it is possible to measure the direction and velocity of each part of the plasma jet and the airflow around it. In the measurement, a portion visualized with a laser beam by a digital video camera shown as a CCD camera is photographed at intervals of about 0.04 seconds from a direction perpendicular to the laser beam.

この実験装置による観察によって、プラズマジェットの発生の様子を観察し、各部分での速度解析を行った結果、例えばdについては図4に示すような速度線図が得られた。同図において画面内の矢印は気流の方向と大きさを示している。また図中では白黒で示している画像は実際には速度の大きさにしたがって着色して表示され、図中赤、黄、緑、青として示している。その結果一見してプラズマジェットとその周辺の速度分布がわかるものであるが、特に垂直に立ち上がるプラズマジェットの両側に渦が発生し、この渦の中心の高さhvが、プラズマジェットの気流の大きさに直接関連していることがわかった。図4に示す例においては渦中心高さhvはほぼ42mmで、後述するように可変抵抗値R=80としたときの印加電圧の立ち上がり速度dV/dtが、最も大きなプラズマジェットの速度となることがわかり、それよりも大きくても、また少なくてもプラズマジェットの速度は低下することがわかり、本発明に至ったものである。   As a result of observing the state of generation of the plasma jet and analyzing the velocity at each part by observation with this experimental apparatus, for example, a velocity diagram as shown in FIG. 4 was obtained for d. In the figure, arrows in the screen indicate the direction and size of the airflow. In the figure, images shown in black and white are actually colored and displayed according to the magnitude of the speed, and are shown as red, yellow, green, and blue in the figure. As a result, the velocity distribution around the plasma jet and its surroundings can be seen at first glance. In particular, vortices are generated on both sides of the vertically rising plasma jet, and the height hv of the center of the vortex is the magnitude of the air flow of the plasma jet. It turned out to be directly related. In the example shown in FIG. 4, the vortex center height hv is approximately 42 mm, and the rising speed dV / dt of the applied voltage when the variable resistance value R = 80, as will be described later, is the largest plasma jet speed. It can be seen that the speed of the plasma jet decreases even if it is larger or smaller than that, and the present invention has been achieved.

上記のような本発明について、より具体的には次のようなものである。即ち、本発明に係る表面プラズマ発生装置は、前記課題を解決するため、絶縁材を挟んで表面側電極と裏面側電極を設け、両電極間に電圧を印加することにより表面プラズマを発生する表面プラズマ発生装置において、前記電極に印加する電圧の立ち上がり速度を3μs/kV以上7μs/kV以下の範囲の所定値としたことを特徴とする。   More specifically, the present invention as described above is as follows. That is, the surface plasma generator according to the present invention provides a surface plasma that generates a surface plasma by providing a surface side electrode and a back side electrode with an insulating material sandwiched between them and applying a voltage between both electrodes in order to solve the above-mentioned problem. In the plasma generator, a rising speed of a voltage applied to the electrode is set to a predetermined value in a range of 3 μs / kV to 7 μs / kV.

また、本発明に係る他の表面プラズマ発生装置は、前記表面プラズマ発生装置において、前記電極に印加する電圧の立ち上がり速度を4μs/kV以上5μs/kV以下としたことを特徴とし、また、前記印加電圧をパルス波形とする。   Another surface plasma generation apparatus according to the present invention is characterized in that, in the surface plasma generation apparatus, a rising speed of a voltage applied to the electrode is 4 μs / kV or more and 5 μs / kV or less. The voltage is a pulse waveform.

また、本発明に係る他の表面プラズマ発生装置は、前記表面プラズマ発生装置において、前記印加電圧のパルス波形が、前記所定値の立ち上がり速度で立ち上がる三角形状波と、その波形に連続するマイナス側に同様に立ち下がる三角形状波からなる波形とし、また、前記マイナス側に同様に立ち下がる三角形状波は、前記立ち上がる三角形状波より小さくしたことを特徴とし、また、前記表面側電極がドーナツ状であることを特徴とする。   Further, in another surface plasma generator according to the present invention, in the surface plasma generator, the pulse waveform of the applied voltage has a triangular wave rising at the rising speed of the predetermined value and a negative side continuous with the waveform. Similarly, the waveform is composed of a triangular wave that falls, and the triangular wave that similarly falls on the minus side is smaller than the triangular wave that rises, and the surface-side electrode has a donut shape. It is characterized by being.

上記のような本発明によって、印加電圧の立ち上がり速度を適切な値に設定することにより、低電圧で高速の表面プラズマを安定して発生させることができる。   According to the present invention as described above, by setting the rising speed of the applied voltage to an appropriate value, it is possible to stably generate a high-speed surface plasma at a low voltage.

本発明は、高速の表面プラズマを安定して発生させることができるようにするという課題を、絶縁材を挟んで表面側電極と裏面側電極を設け、両電極間に電圧を印加することにより表面プラズマを発生する表面プラズマ発生装置において、前記電極に印加する電圧の立ち上がり速度を3μs/kV以上7μs/kV以下の範囲の所定値とすることによって実現した。   The present invention provides a problem that a high-speed surface plasma can be stably generated by providing a surface-side electrode and a back-side electrode with an insulating material interposed therebetween, and applying a voltage between the two surfaces. In the surface plasma generator for generating plasma, the rising speed of the voltage applied to the electrode is set to a predetermined value in the range of 3 μs / kV to 7 μs / kV.

本発明の実施例を図面に沿って説明する。本発明は前記のように図3に示す実験装置により、印加電圧の立ち上がり速度を変えることによって発生するプラズマジェット流の速度変化の関係を測定したものであるが、その際の印加電圧の立ち上がり速度変更は、前記のように、また図2(c)に示すように立上り電圧制御によりaから、b、c、d、e:、f、g、hと変化させることにより、同図に波形模式図として示すような、印加電圧の立ち上がり速度dV/dtが変化する波形を形成して印加したものである。このような印加電圧の立ち上がり速度については、図1(e)にも別の態様で示している。即ち図1に示す例においては、同図(b)に示すようなドーナツ型表面電極を用いた表面プラズマジェット発生装置に対して、同図(c)に示すようなパルス状の印加電圧を加えるものとする。このパルス状の印加電圧の一部を拡大して示す図1(d)のように、この印加電圧は矩形波形状をなし、この波形の印加電圧の立ち上がり速度を前記図2(c)のように変化させたパルス電圧を印加する。それにより図1(e)に示すように、パルス印加時点t=0から1kVに立ち上がるまでの時間をa〜hのように変化させた。   Embodiments of the present invention will be described with reference to the drawings. In the present invention, as described above, the experimental apparatus shown in FIG. 3 is used to measure the relation of the change in the speed of the plasma jet flow generated by changing the rising speed of the applied voltage. The rising speed of the applied voltage at that time is measured. As shown in FIG. 2C, the change is made by changing the voltage from a to b, c, d, e :, f, g, h by the rising voltage control as shown in FIG. As shown in the figure, a waveform in which the rising speed dV / dt of the applied voltage changes is formed and applied. Such rising speed of the applied voltage is also shown in another manner in FIG. That is, in the example shown in FIG. 1, a pulsed applied voltage as shown in FIG. 1C is applied to a surface plasma jet generator using a donut-shaped surface electrode as shown in FIG. Shall. As shown in FIG. 1 (d) showing a part of the pulse-like applied voltage in an enlarged manner, this applied voltage has a rectangular wave shape, and the rising speed of the applied voltage of this waveform is as shown in FIG. 2 (c). A pulse voltage changed to is applied. As a result, as shown in FIG. 1E, the time from the pulse application time t = 0 to the rise to 1 kV was changed as a to h.

その結果、各々について前記実験装置により図4に示すようなデータが得られた。それをまとめたものが図5の(a)〜(h)である。同図には特に渦中心位置を各図の左側に示しており、dのときの渦中心高さを全ての図に示すと共に、それぞれの条件における渦中心高さを示して比較を容易にしている。なお、これらの図はそれぞれ50回実験を行った平均値を示したものである。この図からも明らかなように、(dV/dt)-1=4 μsec/kVの時の渦中心高さが最も高く、したがってその他は全て低いことがわかり、このことから(dV/dt)-1=4 μsec/kVの時の印加電圧の立ち上がり速度dV/dtが最もプラズマジェットの速度が速いことがわかった。 As a result, data as shown in FIG. 4 was obtained by the experimental apparatus for each. These are summarized in (a) to (h) of FIG. In the figure, the vortex center position is shown on the left side of each figure, and the height of the vortex center at d is shown in all figures, and the vortex center height under each condition is shown for easy comparison. Yes. In addition, these figures each show an average value obtained by performing the experiment 50 times. As is clear from this figure, it can be seen that the height of the vortex center is the highest when (dV / dt) −1 = 4 μsec / kV, and therefore all others are low. From this, (dV / dt) It was found that the rising speed dV / dt of the applied voltage when 1 = 4 μsec / kV was the fastest plasma jet.

これをグラフ化したものが図1(a)である。即ち図1(a)は、前記のような同図(e)に示す印加電圧の立ち上がり速度変化、即ち前記図5(a)〜(h)に対応する印加電圧の立ち上がり速度の変化a〜hについて、更に同様の各種の多くの実験を行った結果をまとめ、これをグラフ化したものである。   A graph of this is shown in FIG. That is, FIG. 1A shows a change in the rising speed of the applied voltage shown in FIG. 1E, that is, a change in the rising speed of the applied voltage corresponding to FIGS. 5A to 5H. Further, the results of many similar experiments are summarized and graphed.

この図から明らかなように、印加電圧の立ち上がり速度を所定電圧に上昇するまでの時間[μs/kV]として表したとき、3〜7μs/kVの範囲で効果的な円環噴流高さ(hv)mmが得られることがわかる。更に、4〜5μs/kVの範囲では特に好適な範囲であることがわかる。本発明により、DVDプラズマ発生装置において、このような範囲に設定すると、電圧には特に関係なく、低電圧であっても所定の流速をうることができることがわかる。逆に電圧や周波数を上昇させても、最適条件に近い印加電圧の立ち上がり速度変化がなければ流速は低下することも示唆している。   As is apparent from this figure, when the rising speed of the applied voltage is expressed as time [μs / kV] until it rises to a predetermined voltage, an effective annular jet height (hv) in the range of 3 to 7 μs / kV. ) Mm can be obtained. Further, it can be seen that the range of 4 to 5 μs / kV is particularly suitable. According to the present invention, when the DVD plasma generator is set within such a range, it can be seen that a predetermined flow rate can be obtained even at a low voltage regardless of the voltage. Conversely, even if the voltage or frequency is increased, it is suggested that the flow rate decreases if there is no change in the rising speed of the applied voltage close to the optimum condition.

上記のような印加電圧の立ち上がり速度において特に好適な範囲であることがわかったものであるが、そのときの印加電圧は前記のような台形パルス以外に、図6(a)に示すような三角波形としてもよい。即ち図6(a)に示す例においては、印加電圧の立ち上がり速度をほぼ最適値である4μs/kVとしており、所定電圧であるVa(kV)になったとき0kV迄立ち下がり、次は−側に同様の波形を発生し、更にその後はこの+と−の波形を1周期として連続して供給するものである。このときには三角波は4Va×10-6でプラスとマイナス側に繰り返す波となり、V=3(kV)の場合はfp(max)がほぼ41kHzとなる。また、最大効率はfpは125,000/EHzであることが推定される。このことから、周波数を上げれば最大電圧を下げることができることも意味している。 Although it has been found that the rising speed of the applied voltage as described above is in a particularly preferable range, the applied voltage at that time is triangular as shown in FIG. 6A in addition to the trapezoidal pulse as described above. It may be a waveform. That is, in the example shown in FIG. 6A, the rising speed of the applied voltage is approximately 4 μs / kV which is an optimum value, and when it reaches Va (kV) which is a predetermined voltage, it falls to 0 kV. The same waveform is generated, and thereafter, the + and-waveforms are continuously supplied as one cycle. At this time, the triangular wave is 4Va × 10 −6 and repeats to the plus and minus sides. When V = 3 (kV), fp (max) is approximately 41 kHz. The maximum efficiency is estimated to be 125,000 / EHz for fp. This also means that the maximum voltage can be lowered by increasing the frequency.

更に図6(b)のように、前記図6(a)と同様に印加電圧の立ち上がり速度を4μs/kVとしており、所定電圧であるV(kV)で0kV迄立ち下がり、次は−側に同様の波形で短時間だけ印加し、その後これらの波形を1周期として連続して供給するものである。このときには−側の駆動量が少なくなるので、最大効率は250,000/VaHzと、同図(a)の例よりもほぼ2倍の効率とすることが可能となる。   Further, as shown in FIG. 6 (b), the rising speed of the applied voltage is 4 μs / kV as in FIG. 6 (a), the voltage falls to 0 kV at the predetermined voltage V (kV), and then the negative side. A similar waveform is applied for a short time, and then these waveforms are continuously supplied as one cycle. At this time, since the amount of driving on the minus side is reduced, the maximum efficiency can be 250,000 / VaHz, which is almost twice the efficiency of the example of FIG.

前記のように本発明においては、発明者等による多くの実験の結果、電極への印加電圧の立ち上がり速度には最適値を中心とした最適範囲があることが推定され、それを確かめるためには単なる表面に沿ったプラズマでは不適切であり、特にドーナツ型の電極を用いて発生するプラズマを表面から垂直方向に立ち上げるとプラズマジェットの速度の状態を観察しやすいことを見出し、また可視化する手法を検討すると共に、発生するプラズマジェットを観察する中で渦の発生の状態において特に渦の中心の高さがプラズマジェットの速度と直接関連することを見出し、更に、印加電圧の波形は正弦波では不適切であり、パルス波とすると共に、このパルス波について印加電圧の立ち上がり速度を変更する手法を採用し、その変更と渦中心の高さの変化の関係を測定することによって、表面プラズマジェットの速度は印加電圧の立ち上がり速度の特定の値で最高値となり、所定の幅で特に効果的な範囲が存在することを見出し、その値を特定して本発明に至ったものある。   As described above, in the present invention, as a result of many experiments by the inventors, it has been estimated that the rising speed of the voltage applied to the electrode has an optimum range centered on the optimum value. It is not appropriate to use plasma along the surface. In particular, it is easy to observe and visualize the state of the plasma jet velocity when the plasma generated using a donut-shaped electrode is raised vertically from the surface. In the observation of the generated plasma jet, it was found that the height of the center of the vortex is directly related to the velocity of the plasma jet, especially in the state of vortex generation. Inappropriate and adopting a method to change the rising speed of the applied voltage for this pulse wave, and the change and the height of the vortex center By measuring the relationship between changes in the surface voltage, the surface plasma jet velocity reaches its maximum value at a specific value of the rising speed of the applied voltage, and a particularly effective range exists within a predetermined width. Thus, the present invention has been achieved.

したがって本発明については、表面プラズマ発生装置がドーナツ型である必要はなく、従来から提案されている電極形状の表面プラズマ発生装置に提供可能であることは明らかである。また、前記のようにパルス波によって前記表面プラズマ発生の特性を見出したものであるが、その特性はパルス波に限らず、正弦波でも同様の特性を生じることは明らかであり、特に疑似正弦波において実質的に本発明による印加電圧の立ち上がり速度の条件を満たすように設定するときには、同様の作用効果が期待される。   Therefore, the present invention does not need to be a donut-shaped surface plasma generator, and it is apparent that the present invention can be provided for a conventionally proposed electrode-shaped surface plasma generator. Further, as described above, the characteristics of the surface plasma generation by the pulse wave have been found. However, the characteristics are not limited to the pulse wave, and it is clear that the same characteristic is generated even by the sine wave. In this case, the same effect can be expected when setting so as to substantially satisfy the condition of the rising speed of the applied voltage according to the present invention.

本発明の実施例を示す図であり、(a)は表面プラズマ発生用印加電圧の立ち上がり速度最適範囲を示す図であり、(b)は表面プラズマジェットの速度を観察するために用いたドーナツ型電極を備えた表面プラズマ発生装置の例であり、(c)はこの表面プラズマ発生用電極への印加電圧波形の例を示し、(d)はその波形の一部拡大図であり、(e)は印加電圧の立ち上がり速度変化例を示す図であって、同図中のa〜hは(a)の指示点に対応している。It is a figure which shows the Example of this invention, (a) is a figure which shows the rising speed optimal range of the applied voltage for surface plasma generation, (b) is a donut type used in order to observe the speed of a surface plasma jet It is an example of the surface plasma generator provided with the electrode, (c) shows the example of the voltage waveform applied to this surface plasma generation electrode, (d) is a partially enlarged view of the waveform, (e) Is a diagram showing an example of change in rising speed of the applied voltage, in which a to h correspond to the indicated points of (a). 電極印加電圧の例を示す図であり、(a)は印加電圧パルスの全体を示す図であり、(b)はその印加電圧の一部拡大図であり、(c)は印加電圧を可変抵抗で変更するに際して、可変抵抗と印加電圧の変化を示す波形模式図である。It is a figure which shows the example of an electrode applied voltage, (a) is a figure which shows the whole applied voltage pulse, (b) is the one part enlarged view of the applied voltage, (c) is a variable resistance FIG. 6 is a waveform schematic diagram showing changes in the variable resistance and applied voltage when changing in FIG. 印加電圧の立ち上がり速度とプラズマジェット速度の関係を測定する実験装置の例である。It is an example of the experimental apparatus which measures the relationship between the rising speed of an applied voltage, and a plasma jet velocity. 同実験装置で得られる表面から垂直に立ち上がるプラズマジェットの各部の方向と速度を、dとしたときの例を示す速度分布図である。FIG. 3 is a velocity distribution diagram showing an example where d is the direction and velocity of each part of a plasma jet that rises vertically from the surface obtained by the experimental apparatus. 同実験装置で得られた、印加電圧の立ち上がり速度を変化させたときにおける、それぞれ図4と同様の速度線図を示す図である。It is a figure which shows the velocity diagram similar to FIG. 4, respectively when changing the rising speed of the applied voltage obtained with the same experimental device. 印加電圧の立ち上がり速度を最適にした状態で三角波状の印加電圧波形例を示す図であり、(a)はプラスとマイナス側に同等の波形を形成した例、(b)はマイナス側には小さな波形を形成した例を示す図である。It is a figure which shows the example of a triangular wave-like applied voltage waveform in the state which optimized the rising speed of the applied voltage, (a) is an example which formed the same waveform on the plus and minus side, (b) is small on the minus side. It is a figure which shows the example which formed the waveform. (a)は表面プラズマの発生装置の例を示す図であり、(b)は電極への印加電圧が正弦波であるときの波形図であり、(c)は電極への印加電圧がパルス波であるときの波形図である。(A) is a figure which shows the example of the generator of surface plasma, (b) is a wave form diagram when the applied voltage to an electrode is a sine wave, (c) is a pulse wave when the applied voltage to an electrode is a pulse wave. It is a wave form diagram when it is. 従来から提案されている互いに対向する平行な縁を形成した表面電極を備えた表面プラズマ発生装置の例を示す図である。It is a figure which shows the example of the surface plasma generator provided with the surface electrode which formed the parallel edge mutually opposed conventionally proposed. 従来から提案されているドーナツ型の表面電極を備えた表面プラズマ発生装置の例を示す図である。It is a figure which shows the example of the surface plasma generator provided with the donut type surface electrode proposed conventionally.

Claims (6)

絶縁材を挟んで表面側電極と裏面側電極を設け、両電極間に電圧を印加することにより表面プラズマを発生する表面プラズマ発生装置において、
前記電極に印加する電圧の立ち上がり速度を3μs/kV以上7μs/kV以下の範囲の所定値としたことを特徴とする表面プラズマ発生装置。
In a surface plasma generator for generating a surface plasma by providing a surface side electrode and a back side electrode across an insulating material, and applying a voltage between both electrodes,
2. A surface plasma generator according to claim 1, wherein a rising speed of a voltage applied to the electrode is a predetermined value in a range of 3 μs / kV to 7 μs / kV.
前記電極に印加する電圧の立ち上がり速度を4μs/kV以上5μs/kV以下としたことを特徴とする請求項1記載の表面プラズマ発生装置。   2. The surface plasma generator according to claim 1, wherein a rising speed of a voltage applied to the electrode is 4 μs / kV or more and 5 μs / kV or less. 前記印加電圧はパルス波形であることを特徴とする請求項1記載の表面プラズマ発生装置。   2. The surface plasma generation apparatus according to claim 1, wherein the applied voltage is a pulse waveform. 前記印加電圧のパルス波形が、前記所定値の立ち上がり速度で立ち上がる三角形状波と、その波形に連続するマイナス側に同様に立ち下がる三角形状波からなる波形であることを特徴とする請求項3記載の表面プラズマ発生装置。   4. The pulse waveform of the applied voltage is a waveform composed of a triangular wave that rises at the rising speed of the predetermined value and a triangular wave that similarly falls on the negative side continuous with the waveform. Surface plasma generator. 前記マイナス側に同様に立ち下がる三角形状波は、前記立ち上がる三角形状波より小さくしたことを特徴とする請求項4記載の表面プラズマ発生装置。   The surface plasma generator according to claim 4, wherein the triangular wave falling similarly to the minus side is made smaller than the rising triangular wave. 前記表面側電極がドーナツ状であることを特徴とする請求項1記載の表面プラズマ発生装置。   2. The surface plasma generation apparatus according to claim 1, wherein the surface side electrode has a donut shape.
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