JP2010010355A - Semiconductor manufacturing process management system - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing process management system capable of preventing a decrease in rate of operation of photo process facilities and an increase in the working hours of workers. <P>SOLUTION: The semiconductor manufacturing process management system has: a host computer 2; a cell computer 3a; and a conveyance management computer 4. A control information generation means 10 of the host computer 2 selects lots based on lot information data and device information data stored in a storage means 9, compares processing condition data of the lot information data of the lot concerned with the reticle state data and reticle current position data of reticle information data, extracts device information data of a device that can be received, selects an optimum device, and generates control information data to transmit it to the cell computer 3a. A reticle dust inspection control means 14 of the cell computer 3a generates reticle dust inspection instruction data from the selected device name and reticle name of the control information data, and instructs the photo process facilities 5a to perform inspection of the reticle dust before lots are carried into the photo process facilities 5a. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a semiconductor manufacturing process management system that manages processes such as oxide film formation, thin film deposition, photolithography, etching, and impurity doping. More specifically, the present invention relates to reticle management and improvement of the photo process using a reticle. The present invention relates to a semiconductor manufacturing process management system made possible.

  In the conventional semiconductor manufacturing process management system, the lot supply control to the photo process facility first selects the lot, manages the reticle storage information and the use limit after carrying in the photo process facility, and optimizes the distribution of the reticle. . As a conventional example for appropriately controlling the supply of a lot and a reticle to a photo process facility, there are disclosures in Patent Document 1 and Patent Document 2 below.

JP 2005-136295 A JP 2005-209780 A

  However, in the conventional semiconductor manufacturing process management system, the lot supply control to the photo process equipment first selects the lot, manages the reticle storage information and the use limit after carrying in the photo process equipment, and optimizes the distribution of the reticle. As a result, the reticle status data cannot be checked before the lot is brought in, so there is a possibility that a lot that cannot be exposed may be carried into the photo process equipment. There was a problem that the man-hours of the worker increased. On the other hand, the conventional example described above is merely a method for optimizing the arrangement of reticles. In the in-process control of lots, the reticle current position data and reticle state data are managed by the semiconductor manufacturing process management system, and the reticle dust is added to the photo process equipment. A technique for giving an inspection instruction is not disclosed.

  The present invention was devised in view of the above-mentioned problems in the photo process equipment of the semiconductor manufacturing process management system, and its purpose is a semiconductor capable of preventing a reduction in the operating rate of the photo process equipment and an increase in the man-hours of workers The manufacturing process management system is provided.

  A semiconductor manufacturing process management system for achieving the above object includes a host computer for managing the entire semiconductor manufacturing process and one or a plurality of cells for individually managing each process facility for processing a plurality of manufacturing processes including a photo process. A semiconductor manufacturing management system comprising: a computer; and a transport management computer that manages a transport device that transports a workpiece between the process facilities. The host computer manages a plurality of lot information. Storage means for storing lot information data for managing apparatus information data for managing a plurality of apparatus information, reticle current position data for a plurality of reticles, and reticle information data for managing reticle state data; The lot supply is controlled from the stored lot information data and the device information data. Lot selection or batch set selection for simultaneous processing of multiple lots, processing condition data of the lot information data of the selected lot, reticle current position data of the reticle information data and reticle status data are collated and received Extracting the device information data of possible devices, selecting an optimum device from among them, control information generating means for generating control information data and transport information data, the lot information data stored in the storage means, Update means for automatically updating the apparatus information data and the reticle information data based on event report data generated in the photo process equipment, and the cell computer generates the control information generation means Receiving the control information data as dispatch information data from the host computer, The processing information data is instructed to the photo process equipment in the equipment, and the control information generation means is generated via the communication means for receiving the event report data generated in the photo process equipment. Port information generating means for receiving the control information data as the dispatch information data from the host computer, collating the device information data of the dispatch information data, and generating port information data for carrying a carrier, and the communication And receiving the control information data generated by the control information generation means as the dispatch information data from the host computer, and generating reticle dust inspection instruction data from the selected device name and reticle name of the dispatch information data. Before the lot is brought into the photo process equipment, Reticle dust inspection control means for instructing the photo process equipment to inspect the reticle dust inspection data via the communication means, and the photo process equipment includes a coating device, an exposure device, a developing device, a reticle dust inspection device, and a reticle. A storage shelf and an inline controller that controls and manages these devices and reports an event occurring in the photo process facility to the host computer as the event report data via the communication means of the cell computer. And the conveyance management computer executes conveyance control of the lot to the photo process equipment based on the conveyance information data generated by the control information generation means.

  In addition to the first feature, the semiconductor manufacturing process management system for achieving the above object further includes the inline controller when a reticle capable of processing a lot scheduled to be loaded is loaded into the photo process facility. The reticle loading is reported as event report data to the host computer via the communication means of the cell computer, and the host computer is updated by the updating means based on the received event report data. The second feature is that the apparatus information data and the reticle current position data of the reticle information data are updated, and the control information generating means extracts the photo process equipment as an apparatus capable of receiving a lot.

  In addition to the first or second feature, the semiconductor manufacturing process management system for achieving the above object further includes the photo process equipment, wherein the in-line controller is configured so that the reticle dust inspection control unit of the cell computer Upon receipt of the inspection instruction, the reticle dust inspection command is issued to the reticle dust inspection device, and the reticle dust inspection device transports the reticle to be inspected from the reticle storage shelf according to the reticle dust inspection command, performs reticle dust inspection processing, and performs reticle dust inspection. A result is reported to the inline controller, and the inline controller reports the reticle dust inspection result as the event report data to the host computer via the communication means of the cell computer. .

  In addition to the third feature, the semiconductor manufacturing process management system for achieving the above object further provides that the cell computer outputs the processing condition data of the control information data when the reticle dust inspection result is acceptable. Instructs the inline controller of the photo process equipment as dispatch information data via the communication means, and the host computer sends the transport information data generated by the control information generation means via the transport management computer. A fourth feature is that a transmission instruction is sent to the transfer device, the transfer instruction of the lot is performed, and the transfer device carries the lot into the photo process equipment based on the transfer instruction.

  In addition to the third or fourth feature, the semiconductor manufacturing process management system for achieving the above object further includes: if the reticle dust inspection result fails, the cell computer sends a reticle dust inspection result to the host computer. Is not accepted, and the dispatch information data is canceled, and the host computer disables the reticle status data of the reticle information data by the updating means, and the lot information data The apparatus information data is updated, and the lot selection or the batch set selection is newly performed by the control information generation unit.

  In addition to any one of the third to fifth features, the semiconductor manufacturing process management system for achieving the above object further includes the inline controller of the photo process equipment, wherein the reticle dust inspection control means of the cell computer When the inspection instruction is received, it is determined whether or not the inspection cycle has been reached based on the cycle management related to the reticle inspection instruction. If the inspection cycle has been reached, a reticle dust inspection command is issued to the reticle dust inspection device, and an inspection cycle is performed. If not, the reticle dust inspection result is passed without performing a reticle dust inspection command to the reticle dust inspection apparatus, and the reticle dust inspection result is used as the event report data via the communication means of the cell computer. The sixth feature is reporting to the host computer.

  In addition to any of the above features, the semiconductor manufacturing process management system for achieving the above object further includes the inline controller, wherein an operator performs an online operation from an operation terminal of the inline controller of the photo process facility. The online state is reported to the host computer as the event report data via the communication means of the cell computer, and the host computer updates the communication status data of the device information data by the updating means. Updating to an online state is a seventh feature.

  In addition to any of the above features, the semiconductor manufacturing process management system for achieving the above object further includes the inline controller of the photo process equipment being connected to the reticle storage shelf via the communication means of the cell computer. An existing reticle is reported to the host computer as the event report data, and the host computer updates the apparatus information data and the reticle current position data of the reticle information data by the updating means. Features.

  In addition to any of the above features, the semiconductor manufacturing process management system for achieving the above object further includes the in-line controller of the photo process equipment for carrying in and out of the reticle from the reticle storage shelf. And updates the reticle storage information of the reticle storage shelf, reports the reticle storage information as the event report data to the host computer via the communication means of the cell computer, and the host computer updates the update information. According to a ninth feature, the means updates the reticle current position data of the reticle information data.

  According to the semiconductor manufacturing process management system of any of the above features, the semiconductor manufacturing process management system is connected to the photo process equipment so as to be able to transmit and receive data via the communication means, and the reticle current position data and the reticle status data are transmitted. It is possible to automatically manage, and the reticle dust inspection control means of the cell computer transmits the control information data generated by the control information generation means via the communication means as the dispatch information data from the host computer. Receiving and generating reticle dust inspection instruction data from the selected device name and reticle name of the dispatch information data, and before the lot is carried into the photo process equipment, via the communication means to the photo process equipment It is configured to issue an inspection instruction based on the reticle dust inspection data. Therefore, it is possible to determine whether or not lots can be carried into the photo process equipment based on the inspection result, and it is possible to eliminate the case where lots that cannot be exposed are carried into the photo process equipment. The problem of lowering the operating rate and the problem of increasing the number of workers can be solved.

  Next, an embodiment of a semiconductor manufacturing process management system according to the present invention will be described with reference to the drawings.

  FIG. 1 shows a system configuration example of a semiconductor manufacturing process management system 1 according to an embodiment of the present invention. As shown in FIG. 1, the semiconductor manufacturing process management system 1 includes a host computer 2, one or a plurality of cell computers 3, and a transfer management computer 4. Here, the host computer 2 performs overall management of the semiconductor manufacturing process, the cell computer 3 individually manages each process equipment 5 for processing a plurality of manufacturing processes, and the transfer management computer 4 performs each process equipment 5. The conveyance device 6 that conveys the product to be manufactured is managed. Further, the process equipment 5 includes a photo process equipment 5a for processing a photo process.

  The host computer 2, each cell computer 3, the transfer management computer 4, each process facility 5, the transfer device 6, and the reticle storage 7 are connected to a data communication network 8, respectively. Thus, the host computer 2 and each cell computer 3, each cell computer 3 and each process equipment 5, the host computer 2 and the transfer management computer 4, and the transfer management computer and the transfer device 6 are online with each other. Data communication is possible. In particular, the cell computer 3a, the photo process facility 5a, and the reticle storage 7 that manage the photo process facility 5a in one or a plurality of cell computers 3 can communicate data online with each other.

  The host computer 2 includes storage means 9, control information generation means 10, and update means 11. The storage means 9 includes lot information data for managing a plurality of lot information, apparatus information data for managing a plurality of apparatus information, reticle current position data of a plurality of reticles, and reticle information for managing reticle state data. Store the data. The control information generation means 10 performs lot selection for controlling lot supply or batch set selection for simultaneous processing of a plurality of lots from the lot information data and device information data stored in the storage means 9, and selects the selected lot. The processing condition data of the lot information data, the reticle current position data of the reticle information data, and the reticle status data are collated to extract the device information data of the devices that can be accepted, and the optimum device is selected from among them, and the control information Data and transport information data are generated. The updating unit 11 generates the lot information data, the device information data, and the reticle information data stored in the storage unit 9 in the event report data from each cell computer 3 and the transfer management computer 4, for example, the photo process equipment. It is automatically updated based on event report data.

  The cell computer 3a includes communication means 12, port information generation means 13, and reticle dust inspection control means 14. The communication unit 12 receives the control information data generated by the control information generation unit 10 from the host computer 2 as dispatch information data, instructs the photo process equipment 5a on the processing condition data, and reports the event generated in the photo process equipment 5a. Receive data. The port information generating unit 13 receives the control information data generated by the control information generating unit 10 as dispatch information data from the host computer 2 via the communication unit 12 and collates the device information data of the dispatch information data with the carrier information. Port information data for selecting a port to carry in is generated. The reticle dust inspection control unit 14 receives the control information data generated by the control information generation unit 10 as dispatch information data from the host computer 2 via the communication unit 12, and uses the selected device name and reticle name of the dispatch information data. Reticle dust inspection instruction data is generated, and before the lot is carried into the photo process facility 5a, an inspection instruction based on the reticle dust inspection data is given to the photo process facility 5a via the communication means 12.

  Similarly, the cell computers 3 other than the cell computer 3a are also provided with the communication means 12, and are connected online with the plurality of process equipments 5 via the network 8, and instructed by the control information generating means 10 of the host computer 2. The processing condition data is generated from the lot information data and the device information data of the dispatch information data, and the processing conditions can be instructed to the device computer (inline controller) of each process equipment 5. In addition, the apparatus computer of each process facility 5 instructs the apparatus of each process facility 5 to perform processing based on the processing information from the cell computer 3, and the event report data as the processing result is transmitted to the communication means of the cell computer 3. 12 is configured to be able to report to the host computer 2 via 12.

  The transfer management computer 4 executes the transfer control of the lot to each process facility 5 with respect to the transfer device 6 based on the transfer information data generated by the control information generating means 10.

  FIG. 2 shows a relationship between the semiconductor manufacturing process management system 1 and the photo process equipment 5a and a configuration example of the photo process equipment 5a. As shown in FIG. 2, in this embodiment, the photo process equipment 5a includes a coating device 15, an exposure device 16, a developing device 17, a reticle dust inspection device 18, a reticle storage shelf 19, an inline controller 20, and lot storage and A plurality of ports 21 through which carriers used for conveyance are carried in and out are provided. Therefore, as the equipment for storing the reticle, there are a reticle storage shelf 19 in the photo process equipment 5a and a reticle storage 7 outside the photo process equipment 5a.

  The inline controller 20 controls and manages each of the devices 15 to 19 in the photo process equipment 5a, and an event occurring in the photo process equipment 5a is converted into event report data via the communication means 12 of the cell computer 3a. Send to.

  Next, for each process executed in the host computer 2, the cell computer 3a, the transfer management computer 4, the photo process equipment 5a, etc. until the lot to be exposed in the photo process is carried into the photo process equipment 5a, This will be described with reference to FIG.

  First, when an operator performs an online operation for online connection to the network 8 from the operation terminal of the inline controller 20 of the photo process equipment 5a, the inline controller 20 is brought online via the communication means 12 of the cell computer 3a. This is reported to the host computer 2 as event report data (step # 1). The host computer 2 updates the communication state data of the device information data stored in the storage unit 9 to the online state based on the reported event report data by the updating unit 11 (step # 2).

  Subsequently, the inline controller 20 reports the reticle stock stored in the reticle storage shelf 19 to the host computer 2 as event report data via the communication means 12 of the cell computer 3a (step # 3). The host computer 2 updates the reticle current position data of the device information data and the reticle information data stored in the storage unit 9 based on the reported event report data by the updating unit 11 (step # 4).

  Further, when the reticle is transferred from the reticle storage 7 to the reticle storage shelf 19 or the reticle is transferred from the reticle storage shelf 19 to the reticle storage 7, the in-line controller 20 moves the reticle storage shelf 19. The reticle storage information is updated, and the updated reticle storage information is reported to the host computer 2 as event report data via the communication means 12 of the cell computer 3a (steps # 5 / # 7). The host computer 2 updates the reticle current position data of the apparatus information data and the reticle information data stored in the storage unit 9 based on the reported event report data by the updating unit 11 (steps # 6 / # 8). . Here, as for the reticle to be carried into the reticle storage shelf 19, the reticle name stored in the reticle storage 7 is read online by the operator's operation from the operation terminal of the inline controller 20, and the production lot can be processed. The reticle is selected in consideration of the use limit and reticle state and the fact that the photo process equipment 5a is selected as an apparatus. The reticle to be carried out from the reticle storage shelf 19 is selected from the reticles stored in the reticle storage shelf 19 by an operator's operation from the operation terminal of the inline controller 20.

  When the apparatus information data stored in the storage unit 9 and the reticle current position data of the reticle information data are updated as described above, the control information generation unit 10 of the host computer 2 performs the process flow of the manufacturing process illustrated in FIG. From the lot information data and the device information data stored in the storage means 9, the lot selection for controlling the lot supply or the batch set selection for simultaneous processing of a plurality of lots is performed from the lot information data stored in the storage means 9, and the lot information of the selected lot The data processing condition data and the reticle current position data of the reticle information data of the reticle instructed in the table are compared with the reticle status data, and the apparatus information data of the acceptable apparatus is extracted, and the optimum apparatus is extracted from the extracted data. Makes selection, generates control information data, and sends the generated control information data to the cell computer 3a. Instructing as Supatchi information data (step # 9). Specifically, when extracting the photo process equipment 5a as an apparatus capable of receiving lots, it is stored in the reticle storage shelf 19 of the photo process equipment 5a that a reticle capable of processing a lot to be loaded is stored. The control information generation means 10 confirms the reticle current position data and reticle state data of the reticle information data stored in the storage means 9.

  When the cell computer 3a receives the control information data generated by the control information generation unit 10 from the host computer 2 via the communication unit 12 as dispatch information data, the reticle dust inspection control unit 14 selects the device for which the dispatch information data is selected. The reticle dust inspection instruction data is generated from the name and the reticle name, and the inspection instruction based on the reticle dust inspection data is transmitted to the photo process equipment 5a via the communication means 12 before the lot is loaded into the photo process equipment 5a which is the selected apparatus. (Step # 10).

  When the inline controller 20 of the photo process equipment 5a receives the inspection instruction from the reticle dust inspection control means 14 of the cell computer 3a via the communication means 12, it is determined whether or not the inspection period has been reached based on the period management related to the reticle inspection instruction. Is determined (step # 11). If the inspection cycle has been reached, the inline controller 20 issues a reticle dust inspection command to the reticle dust inspection device 18 (step # 12). If the inspection cycle has not been reached, the inline controller 20 does not issue a reticle dust inspection command to the reticle dust inspection device. The reticle dust inspection result is accepted (step # 13).

  When the reticle dust inspection device 18 receives a reticle dust inspection command from the inline controller 20, in accordance with the reticle dust inspection command, the reticle to be inspected is transported from the reticle storage shelf 19, and the reticle dust inspection process is started. The start of the inspection process is reported (step # 14). Reticle dust inspection device 18 reports the result of reticle dust inspection to inline controller 20 when the reticle dust inspection process is completed (step # 15).

  The inline controller 20 reports the reticle dust inspection results of step # 13 and step # 15 as event report data to the cell computer 3a, and the cell computer 3a reports the event report data to the host computer 2 (step # 16). . If the reticle dust inspection result is acceptable, the cell computer 3a reports event report data indicating that the reticle dust inspection result is acceptable to the host computer 2 (step # 17). The processing condition data of the instructed control information data is instructed as dispatch information data to the inline controller 20 of the photo process equipment 5a via the communication means 12 (step # 18). Further, the port information generating means 13 of the cell computer 3a collates the device information data of the control information data to generate port information data for selecting a port for carrying the carrier, and via the communication means 12, The data is transmitted to the inline controller 20 (step # 19). The host computer 2 instructs the transfer management computer 4 to transfer the lot to the photo process facility 5a using the control information data generated in step # 9 as transfer information data (step # 20). The conveyance management computer 4 instructs the conveyance device 6 to convey the lot to the photo process equipment 5a based on the conveyance information data generated by the control information generation means 10. Based on the transport instruction, the transport device 6 loads the carrier storing the lot to be subjected to the exposure process into the port selected by the port information data of the photo process equipment 5a (step # 21). Thereby, the exposure process can be performed in the exposure device 16 of the photo process equipment 5a.

  On the other hand, if the reticle dust inspection result fails, the cell computer 3a discards the control information data instructed as dispatch information data from the host computer 2 in step # 9 (step # 22), and the reticle dust inspection result fails. Event report data indicating that there is a message and canceling the dispatch information data is reported to the host computer 2 (step # 23). The host computer 2 discards the control information data generated by the control information generation means 10 in step # 9, temporarily cancels the lot supply, and sets the reticle state of the reticle corresponding to the reticle information data stored in the storage means 9. The data is disabled, and the lot information data and the device information data stored in the storage means 9 are updated (step # 24). As a result, when the processing step returns to step # 9, the control information generation means 10 of the host computer 2 repeats the processing of step # 9 to select another lot or batch group and accept another photo that can be received. Process equipment can be selected. As a result, the selected lot or batch set can be supplied to another photo process equipment. The reticle that has failed the reticle dust inspection is unloaded from the photo process equipment 5a and subjected to cleaning processing (step # 25).

  As described above, according to the processing procedure shown in FIG. 3, the reticle dust inspection control means 14 gives a reticle dust inspection instruction to the photo process equipment 5a before supplying a lot, so that lot control according to the reticle dust inspection result is possible. Thus, the operating rate of the photo process equipment 5a is improved.

  Incidentally, in step # 9 of the processing procedure shown in FIG. 3, the control information data is generated and the generated control information data is instructed to the cell computer 3a as dispatch information data. However, the dispatch information data is sent to the cell computer 3a. In step # 17, after receiving the event report data indicating that the reticle dust inspection result is acceptable from the cell computer 3a, the cell computer 3a may be instructed as dispatch information data.

  Further, in step # 5 or # 7, when the reticle is loaded or unloaded between the reticle storage shelf 19 and the reticle storage 7 by online operation, the inline controller 20 displays the updated reticle storage information. Although it is reported to the host computer 2 as event report data, instead of or in addition to this, the inline controller provided in the reticle storage 7 updates the reticle storage information of the reticle storage 7. The updated reticle storage information may be reported to the host computer 2 as event report data via the communication means 12 of the cell computer 3a.

  INDUSTRIAL APPLICABILITY The present invention can be used for a semiconductor manufacturing process management system, and is particularly effective for reticle management and improvement of a photo process using a reticle.

The block diagram which shows the system structural example of the semiconductor manufacturing process management system which concerns on this invention FIG. 1 is a block diagram showing a relationship between a semiconductor manufacturing process management system and a photo process facility, and a system configuration example of the photo process facility. The flowchart which shows the process sequence until the lot processed in the photo process by the semiconductor manufacturing process management system concerning this invention is carried in to photo process equipment. The figure which shows an example of the table which shows the processing flow of a manufacturing process

Explanation of symbols

1: Semiconductor manufacturing process management system 2: Host computer 3, 3a: Cell computer 4: Transfer management computer 5: Process facility 5a: Photo process facility 6: Transfer device 7: Reticle storage 8: Network 9: Storage means 10: Control Information generation means 11: Update means 12: Communication means 13: Port information generation means 14: Reticle dust inspection control means 15: Coating device 16: Exposure device 17: Development device 18: Reticle dust inspection device 19: Reticle storage shelf 20: Inline controller 21 : Port

Claims (9)

A host computer that manages the entire semiconductor manufacturing process, one or a plurality of cell computers that individually manage each process facility that processes a plurality of manufacturing processes including a photo process, and transportation of a workpiece between the process facilities A semiconductor manufacturing management system comprising a transport management computer for managing a transport device for performing
The host computer
Memory for storing lot information data for managing a plurality of lot information, apparatus information data for managing a plurality of apparatus information, reticle current position data of a plurality of reticles, and reticle information data for managing reticle state data Means,
From the lot information data and the device information data stored in the storage means, perform lot selection for controlling lot supply or batch set selection for simultaneous processing of a plurality of lots, and the lot information data of the selected lot The processing condition data, the reticle current position data of the reticle information data, and the reticle status data are collated, the device information data of an acceptable device is extracted, the optimum device is selected from among the device information data, and control information data and Control information generating means for generating conveyance information data;
Update means for automatically updating the lot information data, the device information data, and the reticle information data stored in the storage means based on event report data generated in the photo process equipment;
The cell computer
The control information data generated by the control information generator is received as dispatch information data from the host computer, and the processing condition data is instructed to the photo process equipment in the process equipment, and is generated in the photo process equipment. Communication means for receiving the event report data;
Via the communication means, the control information data generated by the control information generation means is received as the dispatch information data from the host computer, the device information data of the dispatch information data is collated, and a carrier is carried in Port information generating means for generating port information data;
Receiving the control information data generated by the control information generation means as the dispatch information data from the host computer via the communication means, and reticle dust inspection instruction data from the selected device name and reticle name of the dispatch information data A reticle dust inspection control means for instructing the photo process equipment to inspect with the reticle dust inspection data via the communication means before the lot is carried into the photo process equipment.
The photo process equipment controls and manages a coating apparatus, an exposure apparatus, a developing apparatus, a reticle dust inspection apparatus, a reticle storage shelf, and a group of these apparatuses, and an event occurring in the photo process equipment is used as the event report data. An in-line controller that reports to the host computer via the communication means of the cell computer,
The transfer management computer executes transfer control of the lot to the photo process equipment based on the transfer information data generated by the control information generating means.
A semiconductor manufacturing process management system. When a reticle capable of processing a lot scheduled to be loaded is loaded into the photo process facility, the inline controller uses the reticle loading as the event report data via the communication means of the cell computer. To report to
The host computer updates the device information data and the reticle current position data of the reticle information data based on the received event report data, and updates the photo process facility by the control information generation means. The semiconductor manufacturing process management system according to claim 1, wherein the system is extracted as an apparatus capable of receiving a lot.   In the photo process facility, when the inline controller receives the inspection instruction from the reticle dust inspection control unit of the cell computer, the inline controller issues a reticle dust inspection command to the reticle dust inspection device, and the reticle dust inspection device follows the reticle dust inspection command. Transporting the reticle to be inspected from the reticle storage shelf, performing reticle dust inspection processing, reporting the reticle dust inspection result to the inline controller, and the inline controller using the reticle dust inspection result as the event report data as the event report data. 3. The semiconductor manufacturing process management system according to claim 1, wherein a report is made to the host computer via a communication means of the computer. If the reticle dust inspection result is acceptable,
The cell computer instructs the processing condition data of the control information data to the inline controller of the photo process equipment via the communication means as the dispatch information data,
The host computer transmits the conveyance information data generated by the control information generation means to the conveyance device via the conveyance management computer, and instructs conveyance of the lot.
4. The semiconductor manufacturing process management system according to claim 3, wherein the transfer device carries the lot into the photo process facility based on the transfer instruction. If the reticle dust inspection result is rejected,
The cell computer reports to the host computer that the reticle dust inspection result has failed, and that the dispatch information data has been canceled,
The host computer disables the reticle state data of the reticle information data by the updating means, updates the lot information data and the apparatus information data, and again selects the lot by the control information generating means. 5. The semiconductor manufacturing process management system according to claim 3, wherein batch set selection is performed.   When the inline controller of the photo process equipment receives the inspection instruction from the reticle dust inspection control means of the cell computer, the inline controller determines whether or not the inspection period has been reached based on the period management related to the reticle inspection instruction, and the inspection period If it has reached, the reticle dust inspection command is issued to the reticle dust inspection device, and if the inspection cycle has not been reached, the reticle dust inspection result is passed without performing the reticle dust inspection command to the reticle dust inspection device, and the reticle dust inspection result. 6. The semiconductor manufacturing process management system according to claim 3, wherein the event report data is reported to the host computer via the communication means of the cell computer. When the operator performs an online operation from the operation terminal of the inline controller of the photo process equipment, the inline controller indicates that the online state is established through the communication means of the cell computer as the event report data. Report to the host computer,
7. The semiconductor manufacturing process management system according to claim 1, wherein the host computer updates the communication state data of the device information data to an online state by the updating unit. The in-line controller of the photo process equipment reports the reticle existing in the reticle storage shelf to the host computer as the event report data via the communication means of the cell computer,
The semiconductor manufacturing process management according to claim 1, wherein the host computer updates the reticle current position data of the device information data and the reticle information data by the updating unit. system. The inline controller of the photo process equipment updates the reticle storage information of the reticle storage shelf when the reticle is carried into or out of the reticle storage shelf, via the communication means of the cell computer, Reporting the reticle storage information to the host computer as the event report data;
The semiconductor manufacturing process management system according to claim 1, wherein the host computer updates the reticle current position data of the reticle information data by the update unit.

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