JP2009242734A - Apparatus for manufacturing gas hydrate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing gas hydrate capable of sensing the gas hydrate concentration in a slurry in real time for reducing the risk of choking by the gas hydrate in a heat exchanger. <P>SOLUTION: The apparatus for manufacturing gas hydrate comprises a reaction producing part 1 for producing a gas hydrate by reaction of a raw material gas and water in a low temperature and high pressure environment, a liquid cooling device 2 for cooling down the liquid phase in the reaction producing part 1, and a control part 14 for controlling the operation of the reaction producing part 1 and/or the liquid cooling device 2. The liquid cooling device 2 comprises a circulation line 7 for taking out a liquid from the reaction producing part 1 and returning the same thereto, and a heat exchanger 9 provided in the circulation line 7. The reaction producing part 1 comprises a conductivity meter 13 for measuring the conductivity of the liquid in the inside. The control part 14 controls the operation of the liquid cooling device 2 and/or the reaction producing part 1 following the measurement result by the conductivity meter 13. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention includes a reaction generating unit that reacts a raw material gas and water under low temperature and high pressure to generate a gas hydrate, a liquid cooling unit that cools a liquid phase in the reaction generating unit, the reaction generating unit, and The present invention relates to a gas hydrate manufacturing apparatus including a control unit that controls operation of a liquid cooling unit.

  In gas hydrate, gas molecules such as hydrocarbons such as methane, ethane, propane, and butane, which are components of natural gas, and carbon dioxide are taken into the interior of the cubic structure formed by combining water molecules. It is a general term for clathrate hydrates (hydrates) formed in this way. That is, a gas hydrate is an ice-like solid substance composed of source gas molecules and water molecules, and is a stable inclusion compound in which source gas molecules are included inside a three-dimensional cage structure formed by water molecules. It is a kind. This gas hydrate has a relatively large gas storage capacity, and has characteristic properties such as large production / decomposition energy and selectivity of hydrated gas. For example, transportation / storage of natural gas, etc. Various applications such as means, heat storage systems, actuators, and separation and recovery of specific component gases are possible, and research is actively conducted.

  Gas hydrate is usually generated under high pressure and low temperature conditions. The following methods are well known as generation methods. By spraying cooled water from the top of the reaction vessel filled with raw material gas at high pressure, so-called "water spray method", in which gas hydrate is generated on the surface of the water droplet when the water droplet falls in the raw material gas, reaction A so-called “bubbling method” or the like is performed such that gas hydrate is generated on the surface of the bubbles when the bubbles of the source gas rise in the water by introducing the source gas into the water in the container as bubbles.

  In the bubbling method, the gas hydrate generated in the water in the reaction vessel floats in the water because the specific gravity is smaller than that of water. Then, the amount of gas hydrate increases with the progress of the production reaction and is slurried by stirring. Usually, when the content of gas hydrate in the slurry becomes about 10 wt% to 20 wt%, the generated gas hydrate is extracted out of the reaction vessel in a slurry state.

  The extracted gas hydrate in the slurry state is passed through a dehydrator to be dehydrated and the gas hydrate content is increased to about 40 wt% to 50 wt%. In this state, it is sent to the next generation step for further increasing the gas hydrate content to about 90 wt%.

  FIG. 7 shows a schematic configuration diagram of a conventional gas hydrate manufacturing apparatus (for example, Patent Document 1). A reaction generator 1 that generates a primary gas hydrate 6 by reacting a raw material gas and water under low temperature and high pressure, a liquid cooling device 2 that cools a liquid in the reaction generator 1, and the reaction generator The slurry of the primary gas hydrate 6 generated in 1 is sent through the slurry pump 10, and the dehydrating device 3 for concentrating the slurry, the concentrated slurry dehydrated by the dehydrating device 3 and the raw material gas are reacted again. And a second reaction generation unit 5 that generates a high concentration secondary gas hydrate 4.

The liquid cooling device 2 is provided to suppress an increase in the liquid temperature in the reaction generation unit 1 because the gas hydrate generation reaction is an exothermic reaction. As shown in FIG. 7, the liquid cooling device 2 includes a circulation line 7 that draws liquid from the first reaction generation unit 1 and returns the liquid, a circulation pump 8 provided in the circulation line 7, The heat exchanger 9 is provided downstream from the circulation pump 8 in the circulation direction.
JP 2006-111746 A

  However, when the slurry of the primary gas hydrate 6 generated in the reaction generation unit 1 is extracted and cooled in the heat exchanger 9, the liquid temperature of the slurry can be lowered, but the liquid temperature decrease is caused by the gas hydrate generation reaction. Acts in the forward direction. As a result, there is a problem that gas hydrate is generated and adhered in the heat exchanger 9 and the flow path is blocked.

  This clogging problem is related to the concentration of the slurry. That is, the higher the gas hydrate concentration in the slurry, the higher the risk of clogging.

  However, until now, no technology has been provided for detecting the concentration of gas hydrate in the slurry in real time. A concentration measurement technique using a mass flow meter is provided, but the error is large due to the influence of bubbles, and the reliability is poor. Therefore, the actual situation is that it is difficult to sufficiently reduce the possibility of the occurrence of the blockage.

  An object of the present invention is to provide a gas hydrate manufacturing apparatus that can detect the concentration of gas hydrate in a slurry in real time and can reduce the possibility of clogging due to gas hydrate in a heat exchanger. There is.

  In order to achieve the above object, a gas hydrate production apparatus according to the first aspect of the present invention includes a reaction generator that reacts a raw material gas and water under low temperature and high pressure to generate gas hydrate. An apparatus for producing a gas hydrate comprising: a liquid cooling unit that cools the liquid phase in the reaction generation unit; and a control unit that controls the operation of the reaction generation unit and / or the liquid cooling unit. The unit includes a circulation line for extracting the liquid from the reaction generation unit and returning it again, and a heat exchanger provided in the circulation line, and the reaction generation unit measures the conductivity of the liquid inside. The control unit is configured to be able to control the operation of the liquid cooling unit and / or the reaction generation unit in response to a measurement result by the conductivity measuring unit.

Gas hydrate has the property of taking up water exclusively when it is produced. That is, although the conductive water is originally contained in the raw material water, the conductive impurity is not taken in when the gas hydrate is generated, so that the impurity is concentrated in the water. As a result, the conductivity of the gas hydrate slurry gradually increases with the generation of the gas hydrate.
Therefore, the electrical conductivity of the raw material water and the electrical conductivity of each gas hydrate slurry at different known concentrations of gas hydrate are measured in advance, and the relationship between the electrical conductivity of the gas hydrate slurry and the concentration of gas hydrate (calibration) By determining the line, it is possible to determine the concentration of the gas hydrate by measuring the electrical conductivity of the slurry in the reaction product section. The conductivity can be measured in real time by using a conductivity meter.
Since the conductivity is the reciprocal of the resistivity, it can be easily understood that the concentration of the gas hydrate can be similarly obtained by measuring the resistivity of the gas hydrate slurry. Therefore, in the present specification, “conductivity” is used to include a resistivity having a reciprocal relationship. That is, the concentration of gas hydrate may be obtained by measuring the resistivity of the slurry.

  According to this aspect, the concentration of the gas hydrate in the slurry can be detected in real time, so that the possibility of clogging due to gas hydrate in the heat exchanger can be reduced.

  According to a second aspect of the present invention, in the gas hydrate manufacturing apparatus according to the first aspect, the heat exchanger includes a refrigerant flow rate adjusting valve in a refrigerant supply line, and the control unit is based on the conductivity measuring unit. When the measured value is equal to or larger than the first set value X1, the control for adjusting the refrigerant flow rate control valve in a direction to reduce the supply amount of the refrigerant is configured to be executable.

  Here, the first set value X1 is the concentration of the gas hydrate slurry circulating through the heat exchanger through the circulation line. If the circulation is continued as it is, the occurrence and growth of gas hydrate clogging in the heat exchanger. It is the value of the electrical conductivity of the slurry corresponding to the concentration at which there is a risk of this. This value X1 is preferably measured in advance and determined in consideration of the safety factor, but may be determined by theoretical calculation.

  According to this aspect, the control unit is configured to be able to execute control for adjusting the refrigerant flow rate control valve in a direction to reduce the supply amount of the refrigerant when the measured value by the conductivity measuring unit is equal to or greater than the first set value X1. Has been. Accordingly, since the heat exchanger is replaced with a cooling capacity lower than that during normal operation, generation and adhesion of gas hydrates in the heat exchanger are less likely to occur, and the possibility of occurrence of clogging can be reduced. .

  According to a third aspect of the present invention, in the gas hydrate manufacturing apparatus according to the second aspect, the control unit has a measured value measured by the conductivity measuring unit equal to or lower than a second set value X2 (where X2 < In the case of X1), the control for adjusting the refrigerant flow rate control valve in a direction to increase the supply amount of the refrigerant is configured to be executable.

  Here, the second set value X2 indicates that there is no risk of the clogging when the gas hydrate concentration of the circulating slurry is low, and that the circulating slurry is more actively cooled by a heat exchanger to generate gas gas hydrate. The conductivity corresponds to a concentration low enough to cause the reaction to occur easily. At the start of operation of the gas hydrate production apparatus, the circulating slurry is in the low concentration state. This value X2 is also preferably measured in advance and determined in consideration of the safety factor, but may be determined by theoretical calculation.

  According to this aspect, the control unit is configured to be able to execute control for adjusting the refrigerant flow rate control valve in a direction to increase the supply amount of the refrigerant when the measured value by the conductivity measuring unit is equal to or less than the second set value X2. Therefore, for example, the effect that the rise time at the start of operation of the gas hydrate production apparatus can be shortened can be obtained.

  According to a fourth aspect of the present invention, in the gas hydrate manufacturing apparatus according to the second aspect or the third aspect, the control unit performs measurement by the conductivity measurement unit after reducing the supply amount of the refrigerant. When the value becomes equal to or smaller than the third set value X3, the refrigerant flow rate control valve is controlled to return the refrigerant supply amount to the initial state.

  Here, the third set value X3 corresponds to such a low concentration that the gas hydrate concentration of the circulating slurry is changed to a low state and there is no risk of the blockage even when the heat exchanger is returned to the cooling capacity during normal operation. Conductivity. This value X3 is also preferably measured in advance and determined in consideration of the safety factor, but may be determined by theoretical calculation.

  According to this aspect, after reducing the supply amount of the refrigerant, the control unit returns the supply amount of the refrigerant to the initial state when the measured value by the conductivity measuring unit becomes equal to or less than the third set value X3. Since the refrigerant flow rate control valve is controlled in the direction, it is possible to generate the gas hydrate by returning the heat exchanger to the cooling capacity during the normal operation with less possibility of blockage.

  According to a fifth aspect of the present invention, in the gas hydrate manufacturing apparatus according to the first aspect, the reaction generation unit includes a source gas flow rate adjustment valve in a source gas supply line, and the control unit measures the conductivity. When the measured value by the unit is equal to or greater than the first set value X1, the control for adjusting the source gas flow rate control valve in a direction to reduce the supply amount of the source gas is configured to be executable.

  If the supply amount of the raw material gas to the reaction generation unit is reduced to be smaller than that during normal operation, the gas hydrate generation rate in the reaction generation unit is lowered. Therefore, the concentration of the gas hydrate is lowered by supplying the raw material water to the reaction generation unit without changing from the normal operation state. Due to this decrease in concentration, the risk of clogging is reduced when the circulating slurry is cooled by the heat exchanger.

  According to this aspect, the control unit can execute control for adjusting the source gas flow rate control valve in a direction to reduce the supply amount of the source gas when the measured value by the conductivity measuring unit is equal to or greater than the first set value X1. Therefore, even if the heat exchanger is operated with the cooling capacity during normal operation, the gas hydrate is generated in the heat exchanger. Adhesion is less likely to occur and the risk of blockage can be reduced.

  According to a sixth aspect of the present invention, in the gas hydrate manufacturing apparatus according to the fifth aspect, the control unit reduces the supply amount of the source gas, and then the measured value by the conductivity measuring unit is the fourth. Is less than the set value X4, the raw material gas flow rate adjustment valve is controlled to return the supply amount of the raw material gas to the initial state.

  Here, the fourth set value X4 is changed to a state in which the gas hydrate concentration of the circulating slurry is changed to a low state, so that there is no risk of the blockage even if the supply amount of the raw material gas is returned to the amount during normal operation. Corresponding conductivity. This value X4 is also preferably measured in advance and determined in consideration of the safety factor, but may be determined by theoretical calculation. It can be said that the fourth set value X4 is normally close to the third set value X3.

  According to this aspect, after reducing the supply amount of the raw material gas, the control unit sets the supply amount of the raw material gas to the initial state when the measured value by the conductivity measuring unit becomes the fourth set value X4 or less. Since the raw material gas flow rate control valve is controlled in the direction to return to the normal state, the supply amount of the raw material gas can be returned to the amount during normal operation with little risk of clogging, and gas hydrate can be generated.

  According to a seventh aspect of the present invention, in the gas hydrate manufacturing apparatus according to the second aspect or the third aspect, the reaction generation unit includes a source gas flow rate control valve in a source gas supply line, and the control unit includes: When the measured value by the conductivity measuring unit is equal to or higher than the first set value X1, in addition to the control to reduce the refrigerant supply amount, the raw material gas flow rate adjustment valve is adjusted in a direction to reduce the raw material gas supply amount. The present invention is characterized in that the control can be executed.

  According to this aspect, when the concentration of the circulating slurry is increased and the possibility of clogging is increased in the heat exchanger, it is grasped by measuring the conductivity of the circulating slurry that the risk is high, and the refrigerant is supplied. In addition to the control for reducing the amount, the control for reducing the supply amount of the raw material gas is executed, so that the concentration of the circulating slurry can be lowered to a level where there is no possibility of the occurrence of the clogging in a short time. That is, the heat exchanger is switched to a cooling capacity lower than the cooling capacity during normal operation, and the supply of the raw material gas is throttled to directly reduce the concentration of the circulating slurry itself. The formation and adhesion of gas hydrates in the gas are less likely to occur, and the risk of clogging can be further reduced.

  According to an eighth aspect of the present invention, in the gas hydrate manufacturing apparatus according to the seventh aspect, the controller is configured to reduce the supply amount of the refrigerant and the supply amount of the raw material gas, and then the conductivity measurement unit. When the measured value is less than or equal to the fifth set value X5, the refrigerant flow rate control valve and the source gas flow rate control valve are controlled to return the refrigerant supply amount and the raw material gas supply amount to the initial state. It is characterized by that.

  Here, the fifth set value X5 is changed to a state where the gas hydrate concentration of the circulating slurry is low, the heat exchanger is returned to the cooling capacity during the normal operation, and further the supply amount of the raw material gas is changed to the amount during the normal operation. The conductivity corresponds to such a low concentration that there is no risk of clogging even when returned. This value X5 is also preferably measured in advance and determined in consideration of the safety factor, but may be determined by theoretical calculation. It can be said that the fifth set value X5 is normally close to the third set value X3.

  According to this aspect, the control unit reduces the supply amount of the refrigerant and the supply amount of the raw material gas, and then supplies the refrigerant when the measured value by the conductivity measurement unit becomes the fifth set value X5 or less. Since the refrigerant flow rate control valve and the raw material gas flow rate control valve are controlled to return the amount and the supply amount of the raw material gas to the initial state, the cooling capacity of the heat exchanger during normal operation is less likely to be blocked. In addition, the gas hydrate can be generated by returning the supply amount of the raw material gas to the amount during normal operation.

  According to the present invention, the concentration of the gas hydrate in the slurry can be detected in real time from the conductivity of the gas hydrate slurry, so that the risk of clogging due to gas hydrate in the heat exchanger can be reduced. .

[Embodiment 1]
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic configuration diagram showing a gas hydrate manufacturing apparatus according to Embodiment 1 of the present invention, and FIG. 2 is a control section for controlling the operation of a liquid cooling device in the gas hydrate manufacturing apparatus of FIG. It is a flowchart explaining the control content.

  The apparatus for producing a gas hydrate according to the present embodiment generates a primary gas hydrate 6 by reacting a raw material gas and water under a low temperature (about 3 ° C.) and a high pressure (about 5.5 MPa). 1, a liquid cooling device 2 that cools the liquid in the reaction generation unit 1, a control unit 14 that controls the operation of the liquid cooling device 2, and a primary gas hydrate 6 generated in the reaction generation unit 1. The slurry is fed through the slurry pump 10 and the dehydrating device 3 for concentrating the slurry, and the concentrated slurry dehydrated by the dehydrating device 3 and the raw material gas are reacted again to produce a high concentration secondary gas hydrate 4. And a second reaction generation unit 5 to be generated.

  Although the liquid cooling device 2 will be described repeatedly, since the gas hydrate production reaction is an exothermic reaction, the liquid cooling device 2 is provided to suppress an increase in the liquid temperature in the reaction production unit 1. As shown in FIG. 1, the liquid cooling device 2 includes a circulation line 7 that draws liquid from the first reaction generation unit 1 and returns the liquid, a circulation pump 8 provided in the circulation line 7, The heat exchanger 9 is provided on the downstream side in the circulation direction F from the circulation pump 8. The heat exchanger 9 includes a refrigerant flow rate adjustment valve 12 in the refrigerant supply line 11.

  The reaction generator 1 is supplied with a source gas from a source gas supply line 15 and with water from a source water supply line 16. And the conductivity meter 13 which measures the electrical conductivity of internal gas hydrate slurry is provided.

  The control unit 14 is configured to be able to control the operation of the liquid cooling device 2 in response to the measurement result of the conductivity of the slurry by the conductivity meter 13. The control unit 14 obtains in advance a relationship (calibration curve) between the conductivity of the gas hydrate slurry and the concentration of the gas hydrate and stores it in the storage unit, and determines the conductivity of the slurry in the reaction generation unit 1. By measuring, the concentration of gas hydrate can be obtained.

Next, the control content of the control part 14 in this Embodiment is demonstrated based on the flowchart of FIG.
When the measured value by the conductivity meter 13 is equal to or greater than the first set value X1 (step S1), the control unit 14 moves the refrigerant flow rate adjustment valve 12 in a direction to reduce the amount of refrigerant supplied from the refrigerant supply line 11. The control to adjust is executed (step S2). Here, as described above, the first set value X1 is the concentration of the gas hydrate slurry that circulates through the heat exchanger 9 through the circulation line 7, and if the circulation is continued as it is, the gas in the heat exchanger 9 It is the value of the conductivity of the slurry corresponding to the concentration at which there is a risk of hydrate clogging and growth.

  By this step S2, the heat exchanger 9 is replaced with a cooling capacity lower than the cooling capacity during normal operation. Therefore, generation and adhesion of gas hydrates in the heat exchanger 9 are less likely to occur and there is a risk of clogging. Can be reduced.

  When the measured value by the conductivity meter 13 is equal to or less than the second set value X2 (here, X2 <X1) (step S1), the refrigerant is supplied in a direction to increase the supply amount of the refrigerant sent from the refrigerant supply line 11. Control for adjusting the flow rate control valve 12 is executed (step S3). Here, as described above, the second set value X2 is less likely to be clogged when the gas hydrate concentration of the slurry circulating in the circulation line 7 is low, and the heat exchanger 9 is more active than that. The conductivity corresponds to such a low concentration that the circulating slurry should be cooled to easily cause a gas gas hydrate formation reaction.

  By this step S3, the refrigerant flow rate adjustment valve 12 is adjusted in a direction to increase the supply amount of the refrigerant sent from the refrigerant supply line 11, so that, for example, an effect of shortening the start-up time at the start of operation of the gas hydrate manufacturing apparatus is obtained. It is done.

Then, after the supply amount of the refrigerant is reduced in step S2, when the measured value by the conductivity meter 13 becomes equal to or lower than the third set value X3 (step S4), the refrigerant sent from the refrigerant supply line 11 is supplied. The refrigerant flow rate adjustment valve 12 is controlled to return the supply amount to the initial state (step S5). Here, as described above, the third set value X3 changes to a state in which the gas hydrate concentration of the circulating slurry is low, and there is no possibility of the blockage even if the heat exchanger 9 is returned to the cooling capacity during normal operation. The conductivity corresponding to a low concentration. By this step S5, it is possible to generate the gas hydrate by returning the heat exchanger 9 to the cooling capacity during the normal operation with less possibility of blockage.
In the present embodiment, in step S4, if the measured value by the conductivity meter 13 does not become the third set value X3 or less even after a lapse of a certain time, the process returns to step S2 to further reduce the refrigerant supply amount. It can be reduced.

  After the supply amount of the refrigerant is increased in step S3, when the measured value by the conductivity meter 13 becomes equal to or higher than the sixth set value X6 (step S6), the process proceeds to step S5, and the heat exchanger 9 The gas hydrate is generated by returning to the cooling capacity during normal operation.

[Embodiment 2]
FIG. 3 is a schematic configuration diagram showing a gas hydrate production apparatus according to Embodiment 2 of the present invention, and FIG. 4 is a diagram of a control unit for controlling the operation of the reaction generation unit in the gas hydrate production apparatus of FIG. It is a flowchart explaining the control content.

  In the present embodiment, the reaction generation unit 1 includes a source gas flow control valve 17 in the source gas supply line 15. When the measured value by the conductivity meter 13 is equal to or higher than the first set value X1 (step S11), the control unit 14 adjusts the raw material gas flow rate in a direction to reduce the supply amount of the raw material gas sent from the raw material gas supply line 15. The valve 17 is adjusted (step S12).

  If the supply amount of the raw material gas to the reaction generation unit 1 is reduced to be smaller than that during normal operation, the gas hydrate production rate in the reaction generation unit 1 is lowered. Therefore, the raw material water sent from the water supply line 16 is supplied to the reaction generator 1 without changing from the normal operation state, so that the concentration of the gas hydrate is lowered. Thus, when the density | concentration of a circulating slurry falls, when this circulating slurry is cooled with the heat exchanger 9, the possibility of clogging will fall.

  Since the concentration of the circulating slurry itself in the reaction generation unit 1 can be directly reduced by step S12, the gas hydride in the heat exchanger 9 can be operated even if the heat exchanger 9 is operated with the cooling capacity during normal operation. Rate generation and adhesion are less likely to occur, and the risk of clogging can be reduced.

After reducing the supply amount of the source gas (step S12), when the measured value by the conductivity meter 13 becomes equal to or lower than the fourth set value X4 (step S13), the direction of returning the supply amount of the source gas to the initial state The source gas flow rate adjusting valve 17 is controlled (step S14). Here, as described above, the fourth set value X4 changes to a state in which the gas hydrate concentration of the circulating slurry is low, and there is no possibility of the blockage even if the supply amount of the raw material gas is returned to the normal operation amount. The conductivity corresponding to a low concentration.
By step S14, the gas hydrate can be generated by returning the supply amount of the raw material gas to the amount at the time of normal operation with little risk of blockage.

[Embodiment 3]
FIG. 5 is a schematic configuration diagram showing a gas hydrate manufacturing apparatus according to Embodiment 3 of the present invention, and FIG. 6 is a diagram of a control unit that controls the operation of the reaction generation unit in the gas hydrate manufacturing apparatus of FIG. It is a flowchart explaining the control content.

  In the present embodiment, the heat exchanger 9 includes a refrigerant flow rate adjustment valve 12 in the refrigerant supply line 11, and the reaction generation unit 1 includes a source gas flow rate adjustment valve 17 in the source gas supply line 15. When the value measured by the conductivity meter 13 is equal to or greater than the first set value X1 (step S21), the control unit 14 turns the refrigerant flow rate adjustment valve 12 in a direction to reduce the amount of refrigerant supplied from the refrigerant supply line 11. In addition to the adjustment, the source gas flow rate adjusting valve 17 is further adjusted to reduce the supply amount of the source gas (step S22).

  By this step S22, when the concentration of the circulating slurry is increased and the possibility of the occurrence of clogging in the heat exchanger 9 is increased, the fact that the possibility is high is determined by measuring the conductivity of the circulating slurry by the conductivity meter 13. In addition to grasping and reducing the supply amount of the refrigerant, the supply amount of the raw material gas is also reduced, so that the concentration of the circulating slurry can be lowered to a level where there is no possibility of the occurrence of the clogging in a short time. That is, the heat exchanger 9 is switched to a cooling capacity lower than the cooling capacity during normal operation, and the supply of the raw material gas is throttled to directly reduce the concentration of the circulating slurry itself. The generation and adhesion of the gas hydrate in the inside 9 is less likely to occur, and the possibility of occurrence of clogging can be further reduced.

  After reducing the supply amount of the refrigerant and the supply amount of the source gas (step S22), when the measured value by the conductivity meter 13 becomes equal to or lower than the fifth set value X5 (step S23), the supply amount of the refrigerant and The refrigerant flow rate control valve 12 and the source gas flow rate control valve 17 are controlled in a direction to return the supply amount of the source gas to the initial state (step S24). Here, as described above, the fifth set value X5 is changed to a state in which the gas hydrate concentration of the circulating slurry is low, the heat exchanger 9 is returned to the cooling capacity during normal operation, and the supply amount of the raw material gas is further increased. The conductivity corresponds to such a low concentration that there is no risk of clogging even when the amount is restored to the amount during normal operation.

  In step S24, the refrigerant flow rate control valve 12 and the source gas flow rate control valve 17 are controlled in a direction to return the refrigerant supply amount and the raw material gas supply amount to the initial state. It is possible to generate the gas hydrate by returning to the cooling capacity and returning the supply amount of the raw material gas to the amount during normal operation.

It is a schematic block diagram which shows the manufacturing apparatus of the gas hydrate which concerns on Embodiment 1 of this invention. 4 is a flowchart for explaining the control contents of a control unit of the liquid cooling apparatus according to the first embodiment. It is a schematic block diagram which shows the manufacturing apparatus of the gas hydrate which concerns on Embodiment 2 of this invention. 6 is a flowchart for explaining control contents of a control unit of a reaction generation unit according to Embodiment 2. It is a schematic block diagram which shows the manufacturing apparatus of the gas hydrate which concerns on Embodiment 3 of this invention. 10 is a flowchart for explaining control contents of a liquid cooling device and a control unit of a reaction generation unit according to Embodiment 3. It is a schematic block diagram which shows the manufacturing apparatus of the gas hydrate provided with the conventional liquid cooling device.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 Reaction production | generation part, 2 Liquid cooling device, 3 Dehydration apparatus, 4 High concentration secondary gas hydrate, 5 Second reaction production | generation part, 6 Primary gas hydrate, 7 Circulation line, 8 Circulation pump, 9 Heat exchanger , 10 Slurry pump, 11 Refrigerant supply line, 12 Refrigerant flow rate adjustment valve, 13 Conductivity meter, 14 Control unit, 15 Raw material gas supply line, 16 Raw material water supply line, 17 Raw material gas flow rate adjustment valve

Claims (8)

A reaction generating unit that generates a gas hydrate by reacting a raw material gas and water under low temperature and high pressure;
A liquid cooling section for cooling the liquid phase in the reaction generation section;
A control unit for controlling the operation of the reaction generation unit and / or the liquid cooling unit, and a gas hydrate manufacturing apparatus comprising:
The liquid cooling unit includes a circulation line that extracts liquid from the reaction generation unit and returns the liquid, and a heat exchanger provided in the circulation line,
The reaction generation unit includes a conductivity measurement unit that measures the conductivity of an internal liquid,
The said control part is comprised so that execution control of the said liquid cooling part and / or reaction production | generation part can be performed in response to the measurement result by the said electrical conductivity measurement part, The manufacturing apparatus of the gas hydrate characterized by the above-mentioned. In the gas hydrate manufacturing apparatus according to claim 1,
The heat exchanger includes a refrigerant flow rate adjustment valve in a refrigerant supply line,
The control unit is configured to be able to execute control for adjusting the refrigerant flow rate control valve in a direction to reduce the supply amount of the refrigerant when the measured value by the conductivity measuring unit is equal to or greater than the first set value X1. A gas hydrate manufacturing apparatus. In the gas hydrate manufacturing apparatus according to claim 2,
The control unit executes control to adjust the refrigerant flow rate adjustment valve in a direction to increase the supply amount of the refrigerant when the measured value by the conductivity measuring unit is equal to or less than a second set value X2 (where X2 <X1). An apparatus for producing a gas hydrate, characterized by being configured. In the gas hydrate manufacturing apparatus according to claim 2 or 3,
After reducing the supply amount of the refrigerant, the control unit reduces the flow rate of the refrigerant in a direction to return the supply amount of the refrigerant to an initial state when a measured value by the conductivity measurement unit becomes a third set value X3 or less. An apparatus for producing a gas hydrate, characterized by being configured to control a control valve. In the gas hydrate manufacturing apparatus according to claim 1,
The reaction generator is provided with a source gas flow control valve in a source gas supply line,
The control unit is configured to be able to execute control to adjust the source gas flow rate control valve in a direction to reduce the supply amount of the source gas when the measured value by the conductivity measuring unit is equal to or greater than the first set value X1. An apparatus for producing a gas hydrate characterized by the above. In the gas hydrate manufacturing apparatus according to claim 5,
The control unit reduces the supply amount of the source gas in a direction to return the supply amount of the source gas to the initial state when the measured value by the conductivity measuring unit becomes a fourth set value X4 or less after reducing the supply amount of the source gas. A gas hydrate manufacturing apparatus configured to control a raw material gas flow rate control valve. In the gas hydrate manufacturing apparatus according to claim 2 or 3,
The reaction generator is provided with a source gas flow control valve in a source gas supply line,
The control unit adjusts the source gas flow rate in a direction to reduce the supply amount of the source gas in addition to the control to reduce the supply amount of the refrigerant when the measured value by the conductivity measuring unit is equal to or greater than the first set value X1. An apparatus for producing a gas hydrate, characterized in that control for adjusting a valve can be executed. In the gas hydrate manufacturing apparatus according to claim 7,
The control unit reduces the supply amount of the refrigerant and the supply amount of the raw material gas when the measured value by the conductivity measuring unit becomes the fifth set value X5 or less after reducing the supply amount of the refrigerant and the supply amount of the raw material gas. An apparatus for producing a gas hydrate, wherein the apparatus is configured to control the refrigerant flow rate control valve and the raw material gas flow rate control valve in a direction to return the supply amount to an initial state.

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