JP2009238810A - Vertical heat treatment device, and heat treating method - Google Patents

Vertical heat treatment device, and heat treating method Download PDF

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JP2009238810A
JP2009238810A JP2008079812A JP2008079812A JP2009238810A JP 2009238810 A JP2009238810 A JP 2009238810A JP 2008079812 A JP2008079812 A JP 2008079812A JP 2008079812 A JP2008079812 A JP 2008079812A JP 2009238810 A JP2009238810 A JP 2009238810A
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heat treatment
inner shaft
shaft
vertical heat
processing container
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JP5336099B2 (en
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Katsunao Kasatsugu
克尚 笠次
Kiyohiko Morikawa
清彦 森川
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JTEKT Thermo Systems Corp
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Koyo Thermo Systems Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a vertical heat treatment device can prevent deterioration of a magnetic seal arranged in an outer periphery of an inner shaft by suppressing heat conduction to the inner shaft, in the case where a biaxial structure is employed in order to agitating a gas in a treatment container of the vertical heat treatment device. <P>SOLUTION: This vertical heat treatment device 1 is used for applying a heat treatment to a treatment object 2 stored in a vertical treatment vessel 3. The vertical heat treatment device is provided with: a tubular outer shaft 10 extended in the treatment vessel 3 through a through-hole of a lid 8 arranged at one end of the treatment vessel 3; the inner shaft 11 arranged in the outer shaft 10 concentrically with the outer shaft 10; and drive means 32 and 35 rotating the outer shaft 10 and the inner shaft 11, respectively. The vertical heat treatment device is structured such that one side of the inner shaft 11 and the outer shaft 10 rotates a boat for storing the treatment object 2 therein, and the other side rotates an agitation means arranged in the treatment vessel 3. Magnetic seals 19 and 22 are arranged between the outer periphery of the inner shaft 11 and the inner periphery of the outer shaft 10 and on the outer peripheral surface of the outer shaft 10, respectively, and the inner shaft 11 includes a hollow cylindrical body with an end on the side extended in the treatment vessel 3 closed. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は縦型熱処理装置及び熱処理方法に関する。さらに詳しくは、半導体ウェハなどの被処理物に熱処理を施す縦型熱処理装置及び熱処理方法に関する。   The present invention relates to a vertical heat treatment apparatus and a heat treatment method. More specifically, the present invention relates to a vertical heat treatment apparatus and a heat treatment method for performing heat treatment on an object to be processed such as a semiconductor wafer.

半導体ウェハなどの被処理物に、酸化、拡散、成膜、アニールなどの熱処理を行う装置として、複数枚の被処理物を縦型の処理容器内に収容して一括処理する縦型熱処理装置が知られている。   As a device for performing heat treatment such as oxidation, diffusion, film formation, and annealing on an object to be processed such as a semiconductor wafer, a vertical heat treatment apparatus that accommodates a plurality of objects to be processed in a vertical processing container and collectively processes them. Are known.

かかる縦型熱処理装置では、処理容器内に配設された熱処理用ボートに被処理物を収容し、蓋体により気密封止された当該処理容器内に所定の反応ガスを供給して、前記酸化や成膜などの熱処理を行っている。その際、複数枚の被処理物を均一に加熱するとともに、例えば、成膜処理の場合においては均一な膜を生成するために、前記熱処理用ボートに連結され且つ前記蓋体を貫通する回転軸に連結されたモータなどの駆動手段によって当該熱処理用ボートを回転させている(例えば、特許文献1参照)。   In such a vertical heat treatment apparatus, an object to be processed is accommodated in a heat treatment boat disposed in a processing vessel, a predetermined reaction gas is supplied into the processing vessel hermetically sealed by a lid, and the oxidation is performed. And heat treatment such as film formation. At that time, in order to uniformly heat a plurality of objects to be processed and to form a uniform film in the case of a film forming process, for example, a rotating shaft connected to the heat treatment boat and penetrating the lid body The heat treatment boat is rotated by a driving means such as a motor connected to (see, for example, Patent Document 1).

特開平6−204157号公報JP-A-6-204157

特許文献1記載の装置のように熱処理用ボートを回転させることである程度の均一な加熱処理を行うことができるが、処理容器内の反応ガスないしは雰囲気ガスは、対流していないので、加熱の均一性には限界があった。
また、内部のガスが対流しないことから、処理容器内のガスを他のガスと置換させるのに時間がかかっていた。
Although a certain degree of uniform heat treatment can be performed by rotating the heat treatment boat as in the apparatus described in Patent Document 1, the reaction gas or the atmosphere gas in the treatment container is not convected, so the heating is uniform. There was a limit to sex.
In addition, since the internal gas does not convect, it takes time to replace the gas in the processing container with another gas.

そこで、前記熱処理用ボート用の回転軸を中空にし、その内部に当該回転軸と同心の内軸を配設し、この内軸先端にファン又は攪拌板などの攪拌手段を接続することが考えられる。この構成によれば、内軸を回転駆動させることで処理容器内の攪拌手段を回転させることができ、これにより、処理容器内のガスを対流させて、加熱の均一性やガスの流れの均一性を向上させるとともに容器内ガスの置換を迅速に行うことができる。   Therefore, it is conceivable that the rotary shaft for the heat treatment boat is made hollow, an inner shaft concentric with the rotary shaft is disposed therein, and a stirring means such as a fan or a stirring plate is connected to the tip of the inner shaft. . According to this configuration, the stirring means in the processing container can be rotated by driving the inner shaft to rotate, thereby allowing the gas in the processing container to be convected so that the heating is uniform and the gas flow is uniform. In addition, the gas in the container can be replaced quickly.

しかしながら、縦型熱処理装置に回転機構を設けた場合、被処理物を加熱した熱が回転軸に伝わり当該回転軸を高温にするという問題がある。熱処理用ボート用の回転軸(外軸)の外周と当該外軸が貫通する部材の貫通孔の周縁との間、及び外軸の内周と内軸の外周との間には、処理容器内を密封状態に保つために、通常の軸受装置とともに磁気シールが用いられるが、この磁気シールは、例えば80℃程度以上の高温になると磁性体を含んだオイルが蒸発していまい、シール機能が損なわれるという問題がある。   However, when a rotary mechanism is provided in the vertical heat treatment apparatus, there is a problem that heat generated by heating the workpiece is transmitted to the rotary shaft and the rotary shaft is heated to a high temperature. Between the outer periphery of the rotating shaft (outer shaft) for the heat treatment boat and the peripheral edge of the through hole of the member through which the outer shaft passes, and between the inner periphery of the outer shaft and the outer periphery of the inner shaft, In order to keep the seal in a sealed state, a magnetic seal is used together with a normal bearing device. However, when the magnetic seal reaches a high temperature of, for example, about 80 ° C., the oil containing the magnetic material evaporates and the sealing function is impaired. There is a problem of being.

本発明は、このような事情に鑑みてなされたものであり、縦型熱処理装置の処理容器内のガスを攪拌するために2軸構造を採用する場合において、内軸への熱伝導を抑制して当該内軸の外周に配設される磁気シールの劣化を防ぐことができる縦型熱処理装置及び熱処理方法を提供することを目的としている。   The present invention has been made in view of such circumstances, and suppresses heat conduction to the inner shaft when a biaxial structure is employed to stir the gas in the processing vessel of the vertical heat treatment apparatus. An object of the present invention is to provide a vertical heat treatment apparatus and a heat treatment method capable of preventing deterioration of a magnetic seal disposed on the outer periphery of the inner shaft.

本発明の縦型熱処理装置は、縦型の処理容器内に収容された被処理物に熱処理を施す縦型熱処理装置であって、
前記処理容器の一端に設けられた蓋体の貫通孔を通って当該処理容器内に延設された筒状の外軸と、
この外軸内に当該外軸と同心に配設された内軸と、
前記外軸及び内軸をそれぞれ回転させる駆動手段と
を備えており、
前記内軸及び外軸の一方は、前記被処理物を収容するボートを回転させ、他方は、前記処理容器内に配設された攪拌手段を回転させるように構成されており、
前記内軸の外周と外軸の内周との間、及び外軸の外周面には磁気シールが設けられており、且つ、
前記内軸は、前記処理容器内に延設された側の端部が閉止された中空の筒体からなることを特徴としている。
The vertical heat treatment apparatus of the present invention is a vertical heat treatment apparatus that performs heat treatment on an object to be processed contained in a vertical processing container,
A cylindrical outer shaft extending into the processing container through a through-hole of a lid provided at one end of the processing container;
An inner shaft disposed concentrically with the outer shaft in the outer shaft;
Driving means for rotating the outer shaft and the inner shaft, respectively.
One of the inner shaft and the outer shaft is configured to rotate a boat that accommodates the object to be processed, and the other is configured to rotate a stirring means disposed in the processing container,
Magnetic seals are provided between the outer periphery of the inner shaft and the inner periphery of the outer shaft, and on the outer peripheral surface of the outer shaft, and
The inner shaft is characterized by comprising a hollow cylinder whose end on the side extending into the processing container is closed.

本発明の縦型熱処理装置では、処理容器内に配設された攪拌手段又は被処理物を収容するボートを回転させる内軸を中空の筒体で作製し、処理容器内に延設された側の端部を閉止した構成にしている。これにより、処理容器内の熱が内軸に伝わる伝熱面積を減らすことができ、当該内軸への熱伝達又は熱伝導を抑制することができる。その結果、内軸の外周と外軸の内周との間に配設される磁気シールへの熱伝導を抑制して、高温により当該磁気シールのシール機能が損なわれるのを防ぐことができる。   In the vertical heat treatment apparatus of the present invention, the inner shaft for rotating the stirring means arranged in the processing vessel or the boat for storing the object to be processed is made of a hollow cylindrical body, and the side extended in the processing vessel The end is closed. Thereby, the heat transfer area where the heat in the processing container is transmitted to the inner shaft can be reduced, and heat transfer or heat conduction to the inner shaft can be suppressed. As a result, the heat conduction to the magnetic seal disposed between the outer periphery of the inner shaft and the inner periphery of the outer shaft can be suppressed, and the sealing function of the magnetic seal can be prevented from being impaired by a high temperature.

前記内軸内に冷却用のガスを供給し得るガス供給手段をさらに備えているのが好ましい。この場合、ドライエア、チッ素ガスなどの冷却ガスを内軸内に供給することにより、当該内軸を冷却することができ、これにより、内軸外周に配設された磁気シールの温度が上昇するのをさらに確実に抑制することができる。   It is preferable to further include a gas supply means capable of supplying a cooling gas into the inner shaft. In this case, the inner shaft can be cooled by supplying a cooling gas such as dry air or nitrogen gas into the inner shaft, thereby increasing the temperature of the magnetic seal disposed on the outer periphery of the inner shaft. Can be further reliably suppressed.

前記ガス供給手段が、前記内軸内において当該内軸の軸方向に沿って配設されたガス供給管を備えており、このガス供給管のガス吐出口が、処理容器内に延設された内軸の閉止端近傍に配置されているのが好ましい。この場合、処理容器内に延設された内軸の閉止端近傍に配置したガス吐出口から冷却ガスを吐出することで、この冷却ガスを内軸の内周面に沿わせて当該内軸の開放端側に移動させることができる。その結果、冷却ガスと内軸の内周面との熱伝達を効率よく行わせることができ、当該内軸の冷却効果を高めることができる。   The gas supply means includes a gas supply pipe disposed in the inner shaft along the axial direction of the inner shaft, and a gas discharge port of the gas supply pipe extends into the processing container. It is preferable to arrange in the vicinity of the closed end of the inner shaft. In this case, the cooling gas is discharged from a gas discharge port disposed in the vicinity of the closed end of the inner shaft extending into the processing container, so that the cooling gas flows along the inner peripheral surface of the inner shaft. It can be moved to the open end side. As a result, heat transfer between the cooling gas and the inner peripheral surface of the inner shaft can be performed efficiently, and the cooling effect of the inner shaft can be enhanced.

また、本発明の熱処理方法は、前記縦型熱処理装置を用いた熱処理方法であって、前記ボート及び攪拌手段を同時に回転させることを特徴としている。   The heat treatment method of the present invention is a heat treatment method using the vertical heat treatment apparatus, and is characterized in that the boat and the stirring means are simultaneously rotated.

本発明の縦型熱処理装置及び熱処理方法によれば、縦型熱処理装置の処理容器内のガスを攪拌するために2軸構造を採用する場合において、内軸への熱伝導を抑制して当該内軸の外周に配設される磁気シールの劣化を防ぐことができる。   According to the vertical heat treatment apparatus and the heat treatment method of the present invention, in the case of adopting a biaxial structure for stirring the gas in the processing container of the vertical heat treatment apparatus, the heat conduction to the inner shaft is suppressed and the inner Degradation of the magnetic seal disposed on the outer periphery of the shaft can be prevented.

以下、添付図面を参照しつつ、本発明の縦型熱処理装置及び熱処理方法の実施の形態を詳細に説明する。
図1は、本発明の一実施の形態に係る縦型熱処理装置1の部分断面説明図であり、図2は、図1に示される縦型熱処理装置1の要部説明図である。
Hereinafter, embodiments of a vertical heat treatment apparatus and a heat treatment method of the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a partial cross-sectional explanatory view of a vertical heat treatment apparatus 1 according to an embodiment of the present invention, and FIG. 2 is a main part explanatory view of the vertical heat treatment apparatus 1 shown in FIG.

縦型熱処理装置1は、被処理物である複数の円板状の半導体ウェハ2を収容し、当該半導体ウェハ2に酸化、拡散、成膜(CVDなど)、アニールなどの熱処理を施す筒状の処理容器3を備えている。この処理容器3は、両端(図1では、簡単のため、上端付近の図示は省略されている)が閉止されており、上端付近には、当該処理容器3内に反応ガスやクリーニング用のガスを供給するためのガス供給管(図示せず)が接続されており、下端付近には、処理容器3内のガスを排出するためのガス排出管4が接続されている。   The vertical heat treatment apparatus 1 accommodates a plurality of disk-shaped semiconductor wafers 2 that are objects to be processed, and has a cylindrical shape that performs heat treatment such as oxidation, diffusion, film formation (CVD, etc.), annealing on the semiconductor wafer 2. A processing container 3 is provided. The processing container 3 is closed at both ends (in FIG. 1, the illustration of the vicinity of the upper end is omitted for the sake of simplicity). In the vicinity of the upper end, the reaction gas and the cleaning gas are contained in the processing container 3. A gas supply pipe (not shown) for supplying gas is connected, and a gas discharge pipe 4 for discharging the gas in the processing container 3 is connected near the lower end.

処理容器3の外周には、導体からなる発熱体5が配設されており、この発熱体5の外周には断熱材6を介して筒状の外殻体7が配設されている。前記発熱体5には、図示しない電源から電流が供給され、導体の抵抗により発生するジュール熱により処理容器3が加熱される。   A heating element 5 made of a conductor is disposed on the outer periphery of the processing container 3, and a cylindrical outer shell body 7 is disposed on the outer periphery of the heating element 5 via a heat insulating material 6. A current is supplied to the heating element 5 from a power source (not shown), and the processing container 3 is heated by Joule heat generated by the resistance of the conductor.

処理容器3の下端は、蓋体8により閉止されており、この蓋体8の中央には、後述する外軸及び内軸を貫通させるための貫通孔9が形成されている。   The lower end of the processing container 3 is closed by a lid body 8, and a through hole 9 for penetrating an outer shaft and an inner shaft described later is formed in the center of the lid body 8.

本実施の形態では、前記蓋体8の外側面8a(図1〜2において、下側に位置する面)に、ハウジング40が配設されている。このハウジング40は、円板状のベース部41と、短円筒状の突出部42とからなっており、蓋体8の外側面8aにおいて、前記貫通孔9と円筒状の突出部42とが同心になるように配設されている。突出部42を構成する壁体内には、水などの冷媒が流通可能な冷却路43が形成されている。この冷却路43には、図示しないポンプにより水などの冷媒が供給され、ハウジング40の冷却が行われる。   In the present embodiment, a housing 40 is disposed on the outer side surface 8a of the lid 8 (a surface located on the lower side in FIGS. 1 and 2). The housing 40 includes a disk-shaped base portion 41 and a short cylindrical protrusion 42, and the through-hole 9 and the cylindrical protrusion 42 are concentric on the outer surface 8 a of the lid 8. It is arranged to become. A cooling path 43 through which a coolant such as water can flow is formed in the wall constituting the protrusion 42. A coolant such as water is supplied to the cooling path 43 by a pump (not shown), and the housing 40 is cooled.

前記縦型熱処理装置1は2軸構造であり、前記貫通孔9を貫通して外軸10及び内軸11が配設されており、当該外軸10及び内軸11は、貫通孔9と同心になるように配置されている。   The vertical heat treatment apparatus 1 has a biaxial structure, and an outer shaft 10 and an inner shaft 11 are disposed through the through hole 9. The outer shaft 10 and the inner shaft 11 are concentric with the through hole 9. It is arranged to be.

外軸10は、例えばステンレス鋼で作製された円筒状部材からなっており、処理容器3内に延設された側の端部には径方向外方に突出したフランジ部12が形成されている。本実施の形態では、このフランジ部12のフランジ面12aに、複数の半導体ウェハ2を積層した状態で収容することができるボート13を回転させるためのボート回転用筒体14の下端部が当接し固定されている。また、図2に示されるように、外軸10の下端部外周面にはプーリ30が固設されており、このプーリ30外周面にはベルト31が巻回されている。外軸10は、モータ32などの駆動手段により前記ベルト31を介して回転駆動される。外軸10の回転数は、例えば1〜10rpm程度の範囲内において適宜選定することができる。   The outer shaft 10 is made of, for example, a cylindrical member made of stainless steel, and a flange portion 12 protruding outward in the radial direction is formed at an end portion on the side extended in the processing container 3. . In the present embodiment, the lower end portion of the boat rotating cylinder 14 for rotating the boat 13 that can accommodate the plurality of semiconductor wafers 2 in a stacked state is in contact with the flange surface 12a of the flange portion 12. It is fixed. As shown in FIG. 2, a pulley 30 is fixed to the outer peripheral surface of the lower end portion of the outer shaft 10, and a belt 31 is wound around the outer peripheral surface of the pulley 30. The outer shaft 10 is rotationally driven via the belt 31 by driving means such as a motor 32. The rotation speed of the outer shaft 10 can be appropriately selected within a range of about 1 to 10 rpm, for example.

一方、内軸11は、例えばステンレス鋼で作製された円筒状部材からなっており、処理容器3内に延設された側の端部は、閉止板15により閉止されており、反対側の端部は開放されている。そして、この閉止板15の上面には、処理容器3内のガスを攪拌させるファン又は攪拌板(攪拌手段)16の回転軸16aが固定されている。また、内軸11の下端付近の外周面にもプーリ33が固設されており、このプーリ33外周面にはベルト34が巻回されている。内軸11は、モータ35などの駆動手段により前記ベルト34を介して回転駆動される。内軸11の回転数も、例えば100〜1000rpm程度の範囲内において適宜選定することができる。   On the other hand, the inner shaft 11 is made of, for example, a cylindrical member made of stainless steel, and the end portion on the side extended in the processing container 3 is closed by a closing plate 15, and the opposite end The part is open. A rotating shaft 16 a of a fan or stirring plate (stirring means) 16 for stirring the gas in the processing container 3 is fixed to the upper surface of the closing plate 15. A pulley 33 is also fixed on the outer peripheral surface near the lower end of the inner shaft 11, and a belt 34 is wound around the outer peripheral surface of the pulley 33. The inner shaft 11 is rotationally driven via the belt 34 by driving means such as a motor 35. The number of rotations of the inner shaft 11 can also be selected as appropriate within a range of about 100 to 1000 rpm, for example.

前記突出部42の内周42aと、外軸10の外周10aとの間には、一対の転がり軸受17、18が所定距離だけ離間して配設されており、この上下の転がり軸受17、18間には、磁気シール19が配設されている。また、外軸10の内周10bと、内軸11の外周11aとの間には、同様にして、一対の転がり軸受20、21が所定距離だけ離間して配設されており、この上下の転がり軸受20、21間には、磁気シール22が配設されている。   A pair of rolling bearings 17, 18 are disposed at a predetermined distance between the inner periphery 42 a of the protrusion 42 and the outer periphery 10 a of the outer shaft 10, and the upper and lower rolling bearings 17, 18 are disposed. A magnetic seal 19 is disposed between them. Similarly, a pair of rolling bearings 20 and 21 are spaced apart by a predetermined distance between the inner periphery 10b of the outer shaft 10 and the outer periphery 11a of the inner shaft 11. A magnetic seal 22 is disposed between the rolling bearings 20 and 21.

本実施の形態では、前記中空の内軸11内に当該内軸11の軸方向に沿ってガス供給管44が配設されている。このガス供給管44の先端のガス吐出口45は、内軸11の閉止板15の内面近傍、具体的には、閉止板15の内面15aから1cm程度離間した位置に配置されている。前記ガス供給管44には、図示しないガス供給源よりドライエア、チッ素などの冷却用ガスが供給される。ガス供給管44、ガス供給源、及びガスを供給するファンによりガス供給手段が主に構成される。   In the present embodiment, a gas supply pipe 44 is disposed in the hollow inner shaft 11 along the axial direction of the inner shaft 11. The gas discharge port 45 at the tip of the gas supply pipe 44 is disposed in the vicinity of the inner surface of the closing plate 15 of the inner shaft 11, specifically, at a position spaced about 1 cm from the inner surface 15 a of the closing plate 15. The gas supply pipe 44 is supplied with a cooling gas such as dry air or nitrogen from a gas supply source (not shown). The gas supply means is mainly constituted by the gas supply pipe 44, the gas supply source, and the fan for supplying the gas.

本実施の形態では、処理容器3内に配設されたファン又は攪拌板16を回転させる内軸11を中空の筒体で作製しているので、処理容器3内の熱が内軸11に伝わる伝熱面積を減らすことができ、当該内軸11への熱伝達又は熱伝導を抑制することができる。その結果、内軸11の外周と外軸10の内周との間に配設される磁気シール22への熱伝導を抑制して、高温により当該磁気シール22のシール機能が損なわれるのを防ぐことができる。   In the present embodiment, since the inner shaft 11 that rotates the fan or the stirring plate 16 disposed in the processing container 3 is made of a hollow cylinder, the heat in the processing container 3 is transmitted to the inner shaft 11. The heat transfer area can be reduced, and heat transfer or heat conduction to the inner shaft 11 can be suppressed. As a result, heat conduction to the magnetic seal 22 disposed between the outer periphery of the inner shaft 11 and the inner periphery of the outer shaft 10 is suppressed, and the sealing function of the magnetic seal 22 is prevented from being impaired by high temperatures. be able to.

また、ハウジング40の突出部42を水などの冷媒により冷却しているので、突出部42の内周42aと、外軸10の外周10aとの間に配設された磁気シール19を冷却することができる。これにより、磁気シール19についても、高温により当該磁気シール19のシール機能が損なわれるのを防ぐことができる。   Further, since the protruding portion 42 of the housing 40 is cooled by a coolant such as water, the magnetic seal 19 disposed between the inner periphery 42a of the protruding portion 42 and the outer periphery 10a of the outer shaft 10 is cooled. Can do. Thereby, also about the magnetic seal 19, it can prevent that the sealing function of the said magnetic seal 19 is impaired by high temperature.

さらに、本実施の形態では、処理容器3内に延設された内軸11の閉止端近傍に配置したガス吐出口45から冷却ガスを吐出することで、この冷却ガスを内軸11の内周面に沿わせて当該内軸11の開放端側に移動させることができる。その結果、冷却ガスと内軸11の内周面との熱伝達を効率よく行わせることができ、当該内軸11の冷却効果を高めることができる。   Further, in the present embodiment, the cooling gas is discharged from the gas discharge port 45 disposed in the vicinity of the closed end of the inner shaft 11 extending in the processing container 3, so that the cooling gas is discharged from the inner periphery of the inner shaft 11. It can be moved along the surface to the open end side of the inner shaft 11. As a result, heat transfer between the cooling gas and the inner peripheral surface of the inner shaft 11 can be performed efficiently, and the cooling effect of the inner shaft 11 can be enhanced.

なお、本実施の形態では、外軸にボート、内軸にファン又は攪拌板を取り付けているが、本発明はこれに限定されるものではなく、外軸にファン又は攪拌板を取り付け、内軸にボートを取り付けた構造とすることもできる。   In this embodiment, the boat is attached to the outer shaft and the fan or the stirring plate is attached to the inner shaft. However, the present invention is not limited to this, and the fan or the stirring plate is attached to the outer shaft and the inner shaft is attached. It is also possible to use a structure in which a boat is attached.

本発明の熱処理方法では、前述した縦型熱処理装置を用いて半導体ウェハなどの被処理物に対して熱処理が施されるが、その際、被処理物を収容するボート、及び処理容器内のガスを攪拌させる攪拌手段を同時に回転させるので、被処理物を均一に加熱及び処理することができる。   In the heat treatment method of the present invention, heat treatment is performed on an object to be processed such as a semiconductor wafer by using the above-described vertical heat treatment apparatus. At that time, a boat for storing the object to be processed, and a gas in the processing container Since the agitating means for agitating the materials is simultaneously rotated, the object to be treated can be heated and treated uniformly.

本発明の縦型熱処理装置の一実施の形態の部分断面説明図である。It is a fragmentary sectional view of one embodiment of the vertical heat treatment apparatus of the present invention. 図1に示される縦型熱処理装置の要部説明図である。It is principal part explanatory drawing of the vertical heat processing apparatus shown by FIG.

符号の説明Explanation of symbols

1 縦型熱処理装置
2 半導体ウェハ(被処理物)
3 処理容器
8 蓋体
9 貫通孔
10 外軸
11 内軸
13 ボート
14 ボート回転用筒体
16 ファン又は攪拌板(攪拌手段)
17 転がり軸受
18 転がり軸受
19 磁気シール
20 転がり軸受
21 転がり軸受
22 磁気シール
32 モータ(駆動手段)
35 モータ(駆動手段)
40 ハウジング
41 ベース部
42 突出部
43 冷却路
44 ガス供給管
45 ガス吐出口
1 Vertical heat treatment equipment 2 Semiconductor wafer (object to be processed)
DESCRIPTION OF SYMBOLS 3 Processing container 8 Cover body 9 Through-hole 10 Outer shaft 11 Inner shaft 13 Boat 14 Boat rotation cylinder 16 Fan or stirring plate (stirring means)
17 Rolling bearing 18 Rolling bearing 19 Magnetic seal 20 Rolling bearing 21 Rolling bearing 22 Magnetic seal 32 Motor (drive means)
35 Motor (drive means)
40 Housing 41 Base part 42 Projection part 43 Cooling path 44 Gas supply pipe 45 Gas outlet

Claims (4)

縦型の処理容器内に収容された被処理物に熱処理を施す縦型熱処理装置であって、
前記処理容器の一端に設けられた蓋体の貫通孔を通って当該処理容器内に延設された筒状の外軸と、
この外軸内に当該外軸と同心に配設された内軸と、
前記外軸及び内軸をそれぞれ回転させる駆動手段と
を備えており、
前記内軸及び外軸の一方は、前記被処理物を収容するボートを回転させ、他方は、前記処理容器内に配設された攪拌手段を回転させるように構成されており、
前記内軸の外周と外軸の内周との間、及び外軸の外周面には磁気シールが設けられており、且つ、
前記内軸は、前記処理容器内に延設された側の端部が閉止された中空の筒体からなることを特徴とする縦型熱処理装置。
A vertical heat treatment apparatus for performing heat treatment on an object to be processed contained in a vertical processing container,
A cylindrical outer shaft extending into the processing container through a through-hole of a lid provided at one end of the processing container;
An inner shaft disposed concentrically with the outer shaft in the outer shaft;
Driving means for rotating the outer shaft and the inner shaft, respectively.
One of the inner shaft and the outer shaft is configured to rotate a boat that accommodates the object to be processed, and the other is configured to rotate stirring means disposed in the processing container,
Magnetic seals are provided between the outer periphery of the inner shaft and the inner periphery of the outer shaft, and on the outer peripheral surface of the outer shaft, and
The vertical heat treatment apparatus is characterized in that the inner shaft is formed of a hollow cylindrical body whose end portion on the side extending in the processing container is closed.
前記内軸内に冷却用のガスを供給し得るガス供給手段をさらに備えている請求項1に記載の縦型熱処理装置。   The vertical heat treatment apparatus according to claim 1, further comprising a gas supply unit capable of supplying a cooling gas into the inner shaft. 前記ガス供給手段が、前記内軸内において当該内軸の軸方向に沿って配設されたガス供給管を備えており、このガス供給管のガス吐出口が、処理容器内に延設された内軸の閉止端近傍に配置されている請求項2記載の縦型熱処理装置。   The gas supply means includes a gas supply pipe disposed in the inner shaft along the axial direction of the inner shaft, and a gas discharge port of the gas supply pipe extends into the processing container. The vertical heat treatment apparatus according to claim 2, wherein the vertical heat treatment apparatus is disposed in the vicinity of the closed end of the inner shaft. 請求項1〜3のいずれかに記載の縦型熱処理装置を用いた熱処理方法であって、前記ボート及び攪拌手段を同時に回転させることを特徴とする熱処理方法。   The heat processing method using the vertical heat processing apparatus in any one of Claims 1-3, Comprising: The said boat and stirring means are rotated simultaneously, The heat processing method characterized by the above-mentioned.
JP2008079812A 2008-03-26 2008-03-26 Vertical heat treatment apparatus and heat treatment method Expired - Fee Related JP5336099B2 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103774237A (en) * 2014-02-20 2014-05-07 北京七星华创电子股份有限公司 Heat treatment device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06204157A (en) * 1992-12-25 1994-07-22 Tokyo Electron Tohoku Ltd Vertical heat treatment equipment
JP2000311866A (en) * 1999-04-27 2000-11-07 Toshiba Ceramics Co Ltd Vertical heat treatment furnace and method for heat treating semiconductor wafer using it
JP2001250821A (en) * 2000-03-06 2001-09-14 Kobe Steel Ltd High-temperature high-pressure treatment device for semiconductor
JP2004022884A (en) * 2002-06-18 2004-01-22 Toshiba Corp Low pressure cvd system

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06204157A (en) * 1992-12-25 1994-07-22 Tokyo Electron Tohoku Ltd Vertical heat treatment equipment
JP2000311866A (en) * 1999-04-27 2000-11-07 Toshiba Ceramics Co Ltd Vertical heat treatment furnace and method for heat treating semiconductor wafer using it
JP2001250821A (en) * 2000-03-06 2001-09-14 Kobe Steel Ltd High-temperature high-pressure treatment device for semiconductor
JP2004022884A (en) * 2002-06-18 2004-01-22 Toshiba Corp Low pressure cvd system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103774237A (en) * 2014-02-20 2014-05-07 北京七星华创电子股份有限公司 Heat treatment device
CN103774237B (en) * 2014-02-20 2016-09-07 北京七星华创电子股份有限公司 Annealing device

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