JP2009161846A5 - - Google Patents

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JP2009161846A5
JP2009161846A5 JP2008028546A JP2008028546A JP2009161846A5 JP 2009161846 A5 JP2009161846 A5 JP 2009161846A5 JP 2008028546 A JP2008028546 A JP 2008028546A JP 2008028546 A JP2008028546 A JP 2008028546A JP 2009161846 A5 JP2009161846 A5 JP 2009161846A5
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Japan
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porosity
substrate
producing
coating
plasma processing
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Pending
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JP2008028546A
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Japanese (ja)
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JP2009161846A (en
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Priority to JP2008028546A priority Critical patent/JP2009161846A/en
Priority claimed from JP2008028546A external-priority patent/JP2009161846A/en
Publication of JP2009161846A publication Critical patent/JP2009161846A/en
Publication of JP2009161846A5 publication Critical patent/JP2009161846A5/ja
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Description

上記の目的を達成するために本発明のプラズマ処理容器内部材の製造方法は、基材の表面に大気プラズマ溶射により気孔率が５％以上のＹ２Ｏ３溶射皮膜を形成し、該溶射皮膜の上に、気孔率が５％未満のＹ２Ｏ３溶射皮膜を重ねて形成することを特徴としている。 Method of manufacturing a plasma processing chamber member of the present invention to achieve the above object, the porosity forms more than 5% of Y 2 O 3 sprayed coating by air plasma spraying onto the surface of the base material, solution morphism film A Y 2 O 3 sprayed coating having a porosity of less than 5% is overlaid on the substrate.

基材の表面に大気プラズマ溶射によりＡｌ２Ｏ３の溶射皮膜を形成し、該溶射皮膜の上に、気孔率が５％未満のＹ２Ｏ３溶射皮膜を重ねて形成する構成としたり、前記気孔率が５％以上のＹ２Ｏ３の溶射膜と前記基材表面との間に、中間層を形成してもよい。 An Al 2 O 3 sprayed coating is formed on the surface of the substrate by atmospheric plasma spraying, and a Y 2 O 3 sprayed coating having a porosity of less than 5% is formed on the sprayed coating. An intermediate layer may be formed between the sprayed film of Y 2 O 3 having a porosity of 5% or more and the substrate surface.

また、基材の表面に、気孔率５％以上で、厚さが５０〜１７０μｍのＹ２Ｏ３の溶射皮膜を形成した後、１組のアノードとカソード間で放電し、作動ガスを供給して発生するプラズマに、粒径が１０〜４５μｍのＹ２Ｏ３の粉末状素材を供給し、大気圧の下で基材の表面に気孔率５％未満で、厚さが１０〜７０μｍのＹ２Ｏ３の溶射皮膜を形成することを特徴としている。 In addition , after forming a sprayed coating of Y 2 O 3 having a porosity of 5% or more and a thickness of 50 to 170 μm on the surface of the base material, discharge is performed between a pair of anode and cathode, and a working gas is supplied. The Y 2 O 3 powdery material having a particle size of 10 to 45 μm is supplied to the plasma generated in this way, and the surface of the base material has a porosity of less than 5% and a thickness of 10 to 70 μm under atmospheric pressure. It is characterized by forming a sprayed coating of 2 O 3 .

Claims (4)

基材の表面に大気プラズマ溶射により気孔率が５％以上のＹ２Ｏ３溶射皮膜を形成し、該溶射皮膜の上に、気孔率が５％未満のＹ２Ｏ３溶射皮膜を重ねて形成することを特徴とするプラズマ処理容器内部材の製造方法。 Porosity to form a 5% or more of Y 2 O 3 sprayed coating by air plasma spraying onto the surface of the substrate, on the solution morphism coating porosity is repeated Y 2 O 3 sprayed coating of less than 5% formed A method for producing an inner member of a plasma processing container. 基材の表面に大気プラズマ溶射によりＡｌ２Ｏ３の溶射皮膜を形成し、該溶射皮膜の上に、気孔率が５％未満のＹ２Ｏ３溶射皮膜を重ねて形成することを特徴とするプラズマ処理容器内部材の製造方法。 Forming a thermal spray coating of Al 2 O 3 by air plasma spraying onto the surface of the substrate, on the solution morphism film, characterized in that the porosity is formed overlapping a Y 2 O 3 sprayed coating of less than 5% A method for producing a member in a plasma processing container. 前記気孔率が５％以上のＹ２Ｏ３の溶射膜と前記基材表面との間に、中間層を形成することを特徴とする請求項１に記載のプラズマ処理容器内部材の製造方法。 The method for producing an inner member of a plasma processing container according to claim 1, wherein an intermediate layer is formed between the sprayed film of Y 2 O 3 having a porosity of 5% or more and the substrate surface. 基材の表面に、気孔率５％以上で、厚さが５０〜１７０μｍのＹ２Ｏ３の溶射皮膜を形成した後、１組のアノードとカソード間で放電し、作動ガスを供給して発生するプラズマに、粒径が１０〜４５μｍのＹ２Ｏ３の粉末状素材を供給し、大気圧の下で基材の表面に気孔率５％未満で、厚さが１０〜７０μｍのＹ２Ｏ３の溶射皮膜を形成することを特徴とするプラズマ処理容器内部材の製造方法。 On the surface of the substrate, with porosity of 5% or more, after the thickness was formed thermal spray coating of Y 2 O 3 of 50～170Myuemu, discharge between a pair of anode and cathode, generated by supplying a working gas Is supplied with a powdery material of Y 2 O 3 having a particle size of 10 to 45 μm, and the surface of the base material is Y 2 O having a porosity of less than 5% and a thickness of 10 to 70 μm under atmospheric pressure. 3. A method for producing an inner member of a plasma processing vessel, wherein the thermal spray coating of No. 3 is formed.
JP2008028546A 2007-12-10 2008-02-08 Method for manufacturing inner member of plasma treatment vessel Pending JP2009161846A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008028546A JP2009161846A (en) 2007-12-10 2008-02-08 Method for manufacturing inner member of plasma treatment vessel

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007317841 2007-12-10
JP2008028546A JP2009161846A (en) 2007-12-10 2008-02-08 Method for manufacturing inner member of plasma treatment vessel

Related Child Applications (1)

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JP2008077896A Division JP2009161848A (en) 2007-12-10 2008-03-25 Method for manufacturing inner member of plasma treatment vessel

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JP2009161846A JP2009161846A (en) 2009-07-23
JP2009161846A5 true JP2009161846A5 (en) 2009-11-12

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Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009176787A (en) * 2008-01-22 2009-08-06 Hitachi High-Technologies Corp Etching device and member for etching chamber
US20120183790A1 (en) * 2010-07-14 2012-07-19 Christopher Petorak Thermal spray composite coatings for semiconductor applications
JP5879069B2 (en) * 2011-08-11 2016-03-08 東京エレクトロン株式会社 Method for manufacturing upper electrode of plasma processing apparatus
JP5496992B2 (en) * 2011-12-13 2014-05-21 中国電力株式会社 Plasma spraying apparatus and control method thereof
JP6246567B2 (en) * 2012-11-22 2017-12-13 群馬県 Multi-layer coated substrate and method for producing the same
US10468235B2 (en) 2013-09-18 2019-11-05 Applied Materials, Inc. Plasma spray coating enhancement using plasma flame heat treatment
US9869013B2 (en) * 2014-04-25 2018-01-16 Applied Materials, Inc. Ion assisted deposition top coat of rare-earth oxide
US9790581B2 (en) * 2014-06-25 2017-10-17 Fm Industries, Inc. Emissivity controlled coatings for semiconductor chamber components
JP7169077B2 (en) * 2018-03-26 2022-11-10 三菱重工業株式会社 Thermal barrier coating, turbine component, gas turbine, and method for producing thermal barrier coating
TWI704843B (en) 2018-04-03 2020-09-11 日商京瓷股份有限公司 Member for plasma processing device and plasma processing device with same

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JPS602659A (en) * 1983-06-20 1985-01-08 Toyota Motor Corp Thermally sprayed member for high temperature
JPH0967662A (en) * 1995-08-30 1997-03-11 Toshiba Corp Ceramic-coated member
JP3510993B2 (en) * 1999-12-10 2004-03-29 トーカロ株式会社 Plasma processing container inner member and method for manufacturing the same

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