JP2009139458A - Method of forming black matrix in flat panel display, and method of manufacturing flat panel display - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a flat panel display achieving a black matrix reduced in pixel deviation, at a low cost and achieving a color filter reduced in pixel deviation, at a low cost. <P>SOLUTION: The method is provided for forming the black matrix in a flat panel display 100 of full color display using a filter method and having a self-luminous panel device A serving as a light emitting element matrix, color filters 32r, 32g, 32b serving as pixel parts provided on the light extraction side of the self-luminous panel device, and the black matrixes 33 provided at the boundary parts of the respective pixel parts. The method includes processes of (1) forming the self-luminous panel device provided with a photosensitive layer 31 on the light extraction side, and (2) forming the black matrixes 33 of colorants on the photosensitive layer of the self-luminous panel device formed in the process (1), by an electrophotographic method using light from the light emitting elements of the self-luminous panel device. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a method of forming a black matrix in a flat panel display of a full color display using a color filter method (white method), and a method of manufacturing a flat panel display of a full color display using a color filter method.

  Color control in a flat panel display using a self-luminous element such as an organic EL includes a separate coating method and a color filter method. The painting method is a method in which red, green, and blue light emitting materials are separately applied to dot-like pixels. The color filter method uses a white material for the light emitting element itself and is controlled by red, green, and blue color filters.

  In the case of a color filter system, it can be manufactured by the same technique as a flat panel display that is not a self-luminous element such as a liquid crystal panel. For example, there are a dyeing method for dyeing a pattern formed from a photosensitive resin using a photolithography technique on a transparent substrate, and a pigment dispersion method comprising a photosensitive resin in which pigment dyes are dispersed. In addition, an electrodeposition method and a printing method are known.

  However, since these methods involve complicated photolithography, there have been problems such as time required for production and great restrictions on the shape and arrangement of the color filters.

  On the other hand, Patent Document 1 discloses an electrophotographic method in which an electrostatic latent image is formed on a transparent photoconductive layer provided on a glass substrate, and a toner is applied to the electrostatic latent image to produce a color filter.

  In this electrophotographic method, a color filter having a desired cell shape and arrangement can be produced in a short time because there is no complicated process such as application of a photosensitive material and almost no waste material is produced. Can do.

  Moreover, as shown in Patent Document 2, a method of manufacturing a color filter by an ink jet method has been proposed. If this method is used, it can be manufactured at low cost, and color mixing, color unevenness, and white spots can be reduced.

  In addition, regardless of which method is used, in order to improve the performance of the color filter, a light-shielding thin line is provided at the boundary portion of each color pixel. This light-shielding fine line pattern is called a black matrix, and is formed for the purpose of improving display contrast by preventing adverse effects of color mixing and colorless portions (white spots).

  As a method for forming this black matrix, a method of manufacturing a vapor-deposited chromium thin film by photoetching is frequently used.

As a method for simplifying the manufacturing process and reducing the cost, there is a method of forming a black matrix using the electrophotographic method or the inkjet method.
Japanese Patent Laid-Open No. 5-323112 JP-A-8-227010

  However, even if a color filter is manufactured by the method of Patent Document 1, the manufactured color filter must be transferred to a flat panel display. For this reason, there has been a problem in that the toner formed as a color filter is displaced from the pixel on the flat panel display side during transfer (pixel displacement).

  Also, the method of Patent Document 2 does not solve the problem of pixel misalignment between pixels on the flat panel display panel side and ink formed as a color filter.

  Further, as a method for forming a black matrix, a black matrix obtained by photoetching a vapor-deposited chrome thin film has a problem that the manufacturing process is complicated and the chrome thin film is expensive, leading to an increase in cost as a whole.

  Also, in the case of a method of forming a black matrix using the electrophotographic method or the ink jet method, the problem of pixel shift cannot be solved as in the case of a color filter.

  Accordingly, an object of the present invention is to provide a flat panel display manufacturing method that realizes a black matrix with reduced pixel shift at low cost and further realizes a color filter with reduced pixel shift at low cost.

In order to achieve the above object, a typical configuration of a black matrix forming method in a flat panel display according to the present invention includes a self-luminous panel device as a light-emitting element matrix and a light extraction side of the self-luminous panel device. A method of forming a black matrix in a flat panel display of a full color display using a filter method, having a color filter to be a pixel portion provided in and a black matrix provided at a boundary portion of each pixel portion,
1) creating a self-luminous panel device having a photosensitive layer on the light extraction side;
2) A step of forming a black matrix with a colorant by electrophotography using light of a light emitting element of the self light emitting panel device on the photosensitive layer of the self light emitting panel device prepared in the step 1);
It is characterized by having.

Moreover, the typical structure of the manufacturing method of the flat panel display which concerns on this invention for achieving said objective is the self-light-emitting panel device as a light emitting element matrix, and the light extraction side of this self-light-emitting panel device. A manufacturing method of a flat panel display of a full color display using a filter method, having a color filter to be provided pixel portion and a black matrix provided at a boundary portion of each pixel portion,
1) creating a self-luminous panel device having a photosensitive layer on the light extraction side;
2) A step of forming a black matrix with a colorant by electrophotography using light of a light-emitting element of the self-luminous panel device on the photosensitive layer of the self-luminous panel device created in the step 1);
3) Using the black matrix created in the step 2) as a bank, forming a color filter by pouring the color filter ink into the bank by an inkjet method;
It is characterized by having.

In order to achieve the above object, another typical configuration of the flat panel display manufacturing method according to the present invention includes a self-luminous panel device as a light-emitting element matrix and light extraction of the self-luminous panel device. A method of manufacturing a full-color flat panel display using a filter method, having a color filter serving as a pixel portion provided on the side and a black matrix provided at a boundary portion of each pixel portion,
1) creating a self-luminous panel device having a photosensitive layer on the light extraction side;
2) a step of forming a color filter on the photosensitive layer of the self-luminous panel device prepared in the step 1);
3) On the photosensitive layer of the self-luminous panel device having a color filter prepared in the above step 2), black with a colorant by electrophotography using light of the light-emitting element of the self-luminous panel device. The process of creating a matrix;
It is characterized by having.

  ADVANTAGE OF THE INVENTION According to this invention, the manufacturing method of the flat panel display which implement | achieves the color filter which reduced the pixel shift at low cost and implement | achieved the color filter which reduced the pixel shift at low cost can be provided.

  The best mode for carrying out the present invention will be exemplarily described in detail below with reference to the drawings. However, the size, material, shape, relative arrangement, order of steps, etc. of the components described in this embodiment limit the scope of the present invention only to those unless otherwise specified. It is not intended.

[Example 1]
(1) Configuration of Flat Panel Display FIG. 1 is a partial cross-sectional model diagram showing a layer configuration of an example of a flat panel display 100 manufactured by the manufacturing method according to the present invention. The flat panel display 100 includes a self-luminous panel device as a light-emitting element matrix, a color filter serving as a pixel portion provided on the light extraction side of the self-luminous panel device, and a black matrix provided at the boundary of the pixel portion. And have. FIG. 1 shows one pixel (1 pixel) composed of three sub-pixels of this display 100: an R light-emitting subpixel that outputs red light, a G light-emitting subpixel that outputs green light, and a B light-emitting subpixel that outputs blue light. This represents a cross section of a (pixel) portion.

  Here, in the following description, TFT is a thin-film transistor. EL is electroluminescence (electroluminescence). SOI is a silicon-on-insulator. ITO is a transparent conductive oxide.

  The flat panel display 100 of FIG. 1 has a self-luminous panel device part A (light emitting array module) as a light emitting element matrix layer and a color filter part D stacked on the light emitting element matrix layer, as functional layers. .

  In this embodiment, the self-luminous panel device unit A is a top emission type white light-emitting array TFT module, and has a single-color light-emitting TFT array unit B and a photosensitive layer unit C stacked thereon.

  The monochromatic light emitting TFT array part B is a white light emitting active matrix driving organic EL display module (AM-OLED), and a control circuit part 13 having a pixel driving TFT 11 is formed on an SOI substrate 10. Then, a metal cathode 12 connected to the drain of the TFT 11, an organic EL layer 20, a transparent conductive layer (transparent conductive layer) 21, and a barrier layer (thin film barrier layer) 22 are laminated on the control circuit unit 13 in this order. Thus, a monochromatic light emitting TFT array portion B is configured. At the time of light emission, the TFT 11 is driven, carriers are injected from the metal cathode 12 and the transparent conductive layer 21 into the organic EL layer 20, and fluorescent light emission is generated by singlet excitation.

  Here, MgCu alloy is used as the metal cathode 12, and ITO is used as the anode material for the transparent conductive layer 21. In addition, the organic EL layer 20 realizes white light emission by using a multi-stack configuration in which an electron injection layer / a light emitting layer / a hole transport layer are used as one functional layer and a plurality of layers are stacked via a PN junction layer. The barrier layer 22 is a thin film sealing layer formed by CVD deposition of SiONx, and the layer thickness is about 6 μm.

  The photosensitive layer portion C includes a transparent conductive layer 30 and a photosensitive layer 31 that are sequentially stacked on top of the monochromatic light emitting TFT array portion B. The transparent conductive layer 30 is an ITO thin film formed by sputtering, and has a film thickness of 1000 mm and a surface resistance value of 1 KΩ / □ or less. The photosensitive layer 31 is a negatively charged organic photoreceptor layer having a two-layer structure of a carrier generation layer (CGL) and a carrier transport layer (CTL).

  Here, the photosensitive layer portion C is controlled in its optical characteristics by controlling the composition, film thickness, and film forming conditions so as to maintain a light transmittance of 80% or more in the visible light region (wavelength of 400 nm to 780 nm). Yes.

  The filter part D is formed above the photosensitive layer part C (on the photosensitive layer 31), and an R filter coloring pattern 32r having light transmittance is formed on the light emitting element in the R light emitting subpixel. A light-transmitting G filter coloring pattern 32g is formed on the light emitting elements in the G light emitting subpixel. Then, a light-transmitting B filter coloring pattern 32b is formed on the light emitting element in the B light emitting subpixel. The R filter coloring pattern 32r, the G filter coloring pattern 32g, and the B filter coloring pattern 32b are RGB color filters.

  Further, a light-shielding black matrix pattern 33 is formed outside the subpixel area (non-light emitting area) on the display screen. Further, the upper layer of the filter layer is covered with a transparent protective layer 34 mainly composed of polycarbonate.

(2) Manufacturing Method of Display 100 FIG. 2 is a process block diagram of the manufacturing method of the flat panel display 100 described above. The manufacturing process is roughly divided into a first process 50, a second process 60, and a third process 70. Have.

  The first step 50 is a step of creating a self-luminous panel device portion (hereinafter referred to as a light emitting array TFT module) A having a photosensitive layer 31 on the surface (light extraction side).

  The second step 60 is a step of forming the color filter portion D on the surface of the photosensitive layer 31 of the light emitting array TFT module A.

  The third step is a step of inspecting the flat panel display 100 manufactured by the first step 50 and the second step 60.

1) First step 50
The light emitting array TFT module A having the photosensitive layer 31 on the surface is formed by steps 51 to 55.

  Step 51 is a TFT array forming step of forming the control circuit unit 13 having the array of pixel driving TFTs 11 on the SOI substrate 10. For example, a TFT array circuit formed on a glass substrate by a poly-Si process is transferred onto the substrate 10 by a so-called device transfer method. A driver for driving the TFT 11 (constant current circuit, lighting time control circuit, shift register, buffer, etc.) is formed on the same device.

  Step 52 is an EL layer / electrode formation in which the metal cathode 12 connected to the drain of the TFT 11, the organic EL layer (light emitting layer) 20, and the transparent conductive layer 21 are stacked in this order on the TFT array formed as described above. It is a process.

  Step 53 is a barrier layer forming step for forming the barrier layer 22 on the transparent conductive layer 21.

  Step 54 is a conductive layer / photosensitive layer forming step of laminating the transparent conductive layer 30 and the photosensitive layer 31 in this order on the barrier layer 22. That is, the photosensitive layer 31 is laminated via the transparent conductive layer 30 on the light extraction side of the self-luminous panel device.

  Through the above steps 51 to 54, the light emitting array TFT module A having the photosensitive layer 31 on the surface is produced.

  Step 55 is an OLB step of mounting a driver IC for driving a pixel on the light emitting array TFT module A. In this embodiment, in order to reduce the number of IO contacts with the external device for driving the pixel, a driver IC for driving the pixel is mounted in the OLB process 55.

2) Second step 60
Formation of the color filter portion D on the surface of the photosensitive layer 31 of the light emitting array TFT module A produced as described above is performed in steps 61 and 62.

  Step 61 is a step of forming a filter layer on the surface of the photosensitive layer 31. In this step 61, after the black matrix 33 is formed in the black matrix forming step, the color filters 32r, 32g, and 32b are formed with the color filter ink in the inkjet discharging step. The filter layer forming step 61 will be described in detail in the next section 3).

  Step 62 is a protective layer forming step of covering the filter layer formed in step 61 with the transparent protective layer 34 mainly composed of polycarbonate.

3) Details of Filter Layer Formation Step 61 FIG. 3 is a more detailed process diagram of the filter layer formation step 61. The filter layer forming step 61 is roughly divided into a first step 61A and a second step 61B.

  In the first step 61A, the black matrix 33 is formed on the surface of the photosensitive layer 31 of the light emitting array TFT module A by the electrophotographic method (electrophotographic image forming method) using the light of the light emitting layer 20 of the light emitting array TFT module A. This is a black matrix forming step.

  The second step 61B is a color filter forming step in which, after the black matrix 33 is formed in the first step 61A, the color filters 32r, 32g, and 32b are formed with a light transmissive color filter ink in an ink jet discharge step. .

  The first step 61A includes steps I, II, III, and IV.

  Step I (FIG. 4): a charging step in which the surface of the photosensitive layer 31 of the light emitting array TFT module A manufactured in the first step 50 is uniformly charged to a predetermined polarity and potential by the charging means 45 under light shielding. is there.

  In this embodiment, a corona charger is used as the charging means 45. Then, the transparent conductive layer 30 is grounded, a voltage of −700 V is applied to the grid 45 a of the corona charger 45, and the current of the wire 45 b is controlled at a constant current of 600 μA so that the surface of the photosensitive layer 31 is uniformly negative. Charging was performed to obtain a surface potential of -500V. In this embodiment, since the light emitting array TFT module A is moved relative to the corona charger 45 to charge the surface of the photosensitive layer 31, the wire current value for obtaining the above charged state is as follows. It is necessary to determine based on the charging width and relative speed.

  Step II (FIG. 5): An exposure step in which the photosensitive layer 31 is exposed to light from the organic EL layer 20 that is the light emitting layer of the light emitting array TFT module A to form an electrostatic latent image corresponding to the black matrix 33. . That is, it is an exposure process in which the light-emitting element of the self-luminous panel device emits light after the charging to expose the photosensitive layer from the inside.

  Specifically, the light emitting array TFT module A is mounted with a driver for driving pixels in the OLB process 55 (FIG. 2). Therefore, all the light emitting elements corresponding to the sub pixels of the light emitting subpixel, the G light emitting subpixel, and the B light emitting subpixel of all the pixels are driven by this driver. Then, all the light emitting elements emit white light 40, and the carrier generation layer (CGL) in the photosensitive layer 31 immediately above each light emitting element is exposed in the layer structure. In the carrier generation layer, carriers composed of electrons and holes are excited by light absorption. The generated holes move toward the surface of the carrier transport layer (CTL) by the electric field generated by the negative charge formed on the surface of the photosensitive layer 31, and cancel the surface charge in that region. As a result, with respect to the surface potential of −500 V that is uniformly charged in Step I, the surface potential of the photosensitive layer portion corresponding to the portion immediately above all the exposed light emitting elements is approximately 0 V. Since the photosensitive layer portion corresponding to the black matrix 33 is not exposed between the subpixels, that is, the black matrix 33, the surface potential is kept at -500V. Thereby, a charge density distribution pattern having a contrast of about 500 V corresponding to the black matrix pattern, that is, an electrostatic latent image of the black matrix pattern 41 is obtained.

  Step III (FIG. 6): The electrostatic latent image 41 formed by the exposure process of Step II is normally developed as a black matrix 33 with a light-shielding colorant (black toner: positive toner) t by a developing device (developing means). Development process. That is, it is a step of developing the non-exposed portion of the photosensitive layer by regular development of the surface of the photosensitive layer 31 after the exposure with a colorant charged in the opposite polarity to the polarity of the charge charged in the charging step.

  In this embodiment, the developing system is a two-component dry developing system generally used in laser beam printers, copiers and the like. The black toner t has an average particle diameter of 5 μm and is positively charged by an external additive containing a nitrogen-containing coupling agent. The black toner t is charged by mixing with the carrier in the two-component developing device, and is conveyed along with the rotation of the developing sleeve 500. While applying a rectangular alternating voltage to the developing sleeve 500, the developing sleeve 500 and the surface of the light emitting array TFT module A are relatively moved while maintaining a certain distance. Then, the negative charge due to charging and the positively charged black toner t are attracted only to the photosensitive layer portions corresponding to the non-exposed portions between the sub-pixels, and the toner t adheres. That is, the electrostatic latent image 41 having the black matrix pattern is normally developed as the black matrix 33 with the black toner t.

  In this embodiment, density fluctuations and fogging are prevented by controlling the developing bias value 46a and the alternating current value 46b applied to the developing sleeve 500.

  Step IV (FIG. 7): The black matrix 33 which is the developed image formed in Step III is in an unfixed state at this stage. Step IV is a fixing step in which the unfixed black matrix 33 is heated and pressed by a fixing unit to fix it on the surface of the photosensitive layer 31.

  For example, under heating at 130 ° C., the unfixed black matrix 33 is pressed and melted on the surface of the photosensitive layer 31 and smoothed by a fixing roller 600 such as a rubber roller having a release layer on the surface, and the surface of the photosensitive layer 31 is smoothed. To settle.

  In the second step 61B, after forming the black matrix 33 by the first step 61A as described above, as shown in FIG. It is a process. That is, the color filter is formed by using the black matrix 33 fixed in the fixing step as a bank and pouring the color filter ink into the bank 33 by an ink jet method.

  Specifically, an inkjet apparatus including the RGB nozzle head 700 discharges red ink to the R light emitting subpixel, green ink to the G light emitting subpixel, and blue ink to the B light emitting subpixel. Thereby, RGB color filters 32r, 32g, and 32b are formed.

  When ink is ejected, the black matrix 33 previously formed in the first step 61B functions as a bank, so that the ink can be accurately placed without interfering with other pixels.

  Then, as a final step, the transparent protective layer 34 mainly composed of polycarbonate is formed on the upper layer of the filter layer subjected to the fixing process, and the flat panel device 100 is completed.

  Thus, it is possible to provide a method for manufacturing a flat panel display that realizes a black matrix with reduced pixel shift at low cost and further realizes a color filter with reduced pixel shift at low cost.

  The formation of the black matrix 33 in this embodiment needs to use so-called regular development in which toner adheres to the non-exposed portion of the photosensitive layer 31. Therefore, in this embodiment, the negatively charged photosensitive layer 31 is used, and the system of uniform charging polarity-negative and toner charging polarity-positive is used. On the contrary, a system in which the positively charged photosensitive layer 31 is used and the polarity of the uniform charge is positive and the charge polarity of the toner is negative may be used.

[Example 2]
In this embodiment, RGB color filters 32r, 32g, and 32b are first formed on the surface of the photosensitive layer 31 of the light emitting array TFT module A. Thereafter, the black matrix 33 is formed by the same process as in the first embodiment.

  FIG. 9 is a schematic diagram of an example of a color filter forming apparatus 800 for the surface of the photosensitive layer 31 of the light emitting array TFT module A. The color filter forming apparatus 800 is an electrophotographic apparatus using an intermediate transfer member. Reference numeral 801 denotes a rotating drum type electrophotographic photosensitive member (hereinafter referred to as a photosensitive drum), which is driven to rotate at a predetermined speed in a counterclockwise direction indicated by an arrow. The photosensitive drum 801 is uniformly charged to a predetermined polarity and potential by the charging device 802 in the rotating state. Next, the exposure device 803 exposes the charged surface to a pattern corresponding to, for example, the R filter of all the pixels of the color filter layer. Thereby, an electrostatic latent image corresponding to the R filter pattern of all pixels is formed on the surface of the photosensitive drum. Next, the electrostatic latent image is reversely developed as a red toner image by a red developing device 804R containing a light-transmitting R colorant (red toner). Then, the red toner image is primarily transferred by the electric field of the primary transfer device 806 to the surface of the intermediate transfer drum 805 as a rotating intermediate transfer member. The primary transfer residual toner remaining on the surface of the photosensitive drum 801 after the primary transfer is removed from the surface of the photosensitive drum 801 by the cleaning device 807.

  Then, the formation of the color filter by the above-described electrophotographic process of charging, exposure, development, primary transfer, and cleaning is executed for the G filter pattern and the B filter pattern. In the case of forming a G filter pattern, a green developing device 804G that contains a light-transmitting G colorant (green toner) operates. In the case of forming a B filter pattern, a blue developing device 804B that contains a light-transmitting B colorant (blue toner) operates.

  As a result, a red toner image, a green toner image, and a blue toner image corresponding to the RGB color filter patterns of all pixels are formed on the surface of the intermediate transfer drum 805.

  Then, a red toner image tr, a green toner image tg, and a blue toner image tb are applied to the transparent conductive layer 30 from the intermediate transfer drum 805 to the photosensitive layer 31 of the light emitting array TFT module A as shown in FIG. Secondary transfer is performed by the electric field of the applied voltage. This secondary transfer is registered so that the red toner image tr, the green toner image tg, and the blue toner image tb correspond to the light emitting elements of the light emitting subpixel, the G light emitting subpixel, and the B light emitting subpixel of all pixels. It is done.

  Then, the red toner image tr, the green toner image tg, and the blue toner image tb that are secondarily transferred onto the surface of the photosensitive layer 31 of the light emitting array TFT module A are fixed by a fixing unit. Fixing is performed by the same method as the fixing of the black matrix 33 in the first embodiment (FIG. 7). That is, for example, under heating at 130 ° C., the toner image is pressed and melted on the surface of the photosensitive layer 31 by a fixing roller such as a rubber roller having a release layer on the surface, and is smoothed and fixed on the surface of the photosensitive layer 31. . Filter optical characteristics are maintained by smoothing the toner surface. The smoothed and fixed red toner image tr, green toner image tg, and blue toner image tb become RGB color filters 32r, 32g, and 32b, respectively.

  Next, as described above, the black matrix 33 is formed on the surface of the photosensitive layer 31 of the light emitting array TFT module A in which the color filters 32r, 32g, and 32b have been previously formed. The formation method is the same as steps I to IV of the black matrix formation method shown in the first embodiment.

  That is, as shown in FIG. 11 (step I), the surface of the photosensitive layer 31 of the light-emitting array TFT module A in which the color filters 32r, 32g, and 32b are previously formed is uniformly charged.

  Next, as shown in FIG. 12 (process II), all the light emitting elements corresponding to the light emitting subpixels, G light emitting subpixels, and B light emitting subpixels of all pixels are driven. As a result, the surface potentials of the color filters 32r, 32g, and 32b become approximately 0V. Since the photosensitive layer portion corresponding to the black matrix 33 is not exposed between the subpixels, that is, the black matrix 33, the surface potential is kept at -500V. As a result, a charge density distribution pattern having a contrast of about 500 V corresponding to the black matrix pattern, that is, the electrostatic latent image 41 of the black matrix pattern is obtained.

  Next, as shown in FIG. 12 (step III), the electrostatic latent image 41 formed by the exposure process of step II is regularly formed as a black matrix 33 with black toner t as a light-shielding colorant by a developing device. develop.

  Next, as shown in FIG. 14 (step IV), the unfixed black matrix 33 formed in step III is heated and pressurized by the fixing means to be fixed on the surface of the photosensitive layer 31.

  Then, as a final step, the transparent protective layer 34 mainly composed of polycarbonate is formed on the upper layer of the filter layer (color filters 32r, 32g, 32b and the black matrix 33) subjected to the fixing process, and the flat panel device 100 is completed. .

  By forming the black matrix by the method of Example 2 described above, there are the following effects a) and b).

  a) At least the black matrix is not misaligned.

  b) Even if the color filter is slightly misaligned, the color matrix misalignment can be corrected to some extent because the black matrix is accurately formed.

  In this embodiment, although the transfer type electrophotographic method using the intermediate transfer member is used for the RGB color filters 32r, 32g, and 32b formed on the surface of the photosensitive layer 31 of the light emitting array TFT module A, It is not limited to this.

Cross-sectional schematic diagram illustrating the layer configuration of the flat panel display in Example 1 Process block diagram of the manufacturing method of the flat panel display in Example 1 Process block diagram explaining the formation order of the filter layer in Example 1 Schematic diagram illustrating step I (uniform charging step) of the black matrix forming method in the first embodiment. Schematic diagram illustrating Step II (exposure step) of the black matrix forming method in Example 1 Schematic diagram illustrating Step III (regular development step) of the black matrix forming method in Example 1 Schematic diagram illustrating Step IV (fixing step) of the black matrix forming method in Example 1 Schematic diagram illustrating a method of forming a color filter in Example 1 Schematic of the color filter forming apparatus in Example 2 Schematic diagram illustrating secondary transfer of red toner image, green toner image, and blue toner image from the intermediate transfer drum to the photosensitive layer surface of the light emitting array TFT module Schematic diagram illustrating Step I (Uniform Charging Step) of the black matrix forming method in Example 2 Schematic explaining Step II (exposure step) of the black matrix forming method in Example 2 Schematic diagram illustrating step III (regular development step) of the black matrix forming method in Example 2 Schematic diagram illustrating Step IV (fixing step) of the black matrix forming method in Example 2

Explanation of symbols

  A ... Light emitting array TFT module, B ... Monochromatic light emitting TFT array part, C ... Photosensitive layer part, D ... Filter part, 32r ... R filter coloring pattern, 32g ... G filter coloring pattern, 32b ... B Filter coloring pattern, 33 ... Black matrix pattern, 31 ... Photosensitive layer, 45 ... Corona charger, 20 ... Organic EL layer, 500 ... Development sleeve, 600 ... Fixing roller, 700 ... RGB nozzle head

Claims (7)

A filter having a self-luminous panel device as a light-emitting element matrix, a color filter serving as a pixel portion provided on the light extraction side of the self-luminous panel device, and a black matrix provided at a boundary portion of each pixel portion A method of forming a black matrix in a full-color flat panel display using a method,
1) creating a self-luminous panel device having a photosensitive layer on the light extraction side;
2) A step of forming a black matrix with a colorant by electrophotography using light of a light emitting element of the self light emitting panel device on the photosensitive layer of the self light emitting panel device prepared in the step 1),
A method for forming a black matrix, comprising:   The electrophotographic method includes a charging step for uniformly charging the surface of the photosensitive layer, an exposure step for exposing the photosensitive layer from the inside by emitting light from a light emitting element of the self-luminous panel device after the charging, and a post-exposure step. A development process in which the surface of the photosensitive layer is normally developed with a colorant charged to a polarity opposite to the polarity of the charge charged in the charging process to develop a non-exposed portion of the photosensitive layer, and a developed image by the colorant is fixed. The method for forming a black matrix according to claim 1, further comprising: a fixing step. A filter having a self-luminous panel device as a light-emitting element matrix, a color filter serving as a pixel portion provided on the light extraction side of the self-luminous panel device, and a black matrix provided at a boundary portion of each pixel portion A method for manufacturing a full-color flat panel display using a method,
1) creating a self-luminous panel device having a photosensitive layer on the light extraction side;
2) A step of forming a black matrix with a colorant by electrophotography using light of a light-emitting element of the self-luminous panel device on the photosensitive layer of the self-luminous panel device created in the step 1);
3) Using the black matrix created in the step 2) as a bank, forming a color filter by pouring the color filter ink into the bank by an inkjet method;
A method for producing a flat panel display, comprising:   The electrophotographic method includes a charging step for uniformly charging the surface of the photosensitive layer, an exposure step for exposing the photosensitive layer from the inside by emitting light from a light emitting element of the self-luminous panel device after the charging, and a post-exposure step. A development process in which the surface of the photosensitive layer is normally developed with a colorant charged to a polarity opposite to the polarity of the charge charged in the charging process to develop a non-exposed portion of the photosensitive layer, and a developed image by the colorant is fixed. The black matrix forming method according to claim 1, further comprising a fixing step. A filter having a self-luminous panel device as a light-emitting element matrix, a color filter serving as a pixel portion provided on the light extraction side of the self-luminous panel device, and a black matrix provided at a boundary portion of each pixel portion A method for manufacturing a full-color flat panel display using a method,
1) creating a self-luminous panel device having a photosensitive layer on the light extraction side;
2) a step of forming a color filter on the photosensitive layer of the self-luminous panel device prepared in the step 1);
3) On the photosensitive layer of the self-luminous panel device having a color filter prepared in the above step 2), black with a colorant by electrophotography using light of the light-emitting element of the self-luminous panel device. The process of creating a matrix;
A method for producing a flat panel display, comprising:   6. The method of manufacturing a flat panel display according to claim 5, wherein the color filter is formed by a transfer type electrophotographic system.   An electrophotographic method for forming a black matrix on a photosensitive layer of a self-luminous panel device having the color filter includes a charging step for uniformly charging the surface of the photosensitive layer, and a light-emitting element of the self-luminous panel device after the charging And exposing the surface of the photosensitive layer from the inside, and the surface of the photosensitive layer after the exposure is normally developed with a colorant charged to a polarity opposite to the polarity of the charge charged in the charging step. The method for producing a flat panel display according to claim 5, further comprising: a developing step for developing the non-exposed portion of the film, and a fixing step for fixing the developed image with the colorant.