JP2009122409A - Liquid crystal device, electronic equipment, method for manufacturing the liquid crystal device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a liquid crystal device in which reverse transition to a splay alignment tends not to occur, because alignment controlling force is imparted, even in a region in the shadow of irregularities, and to provide electronic equipment and the liquid crystal device. <P>SOLUTION: The liquid crystal device is equipped with an element substrate 10, a counter substrate 30, and a liquid crystal layer 40, which is disposed between the element substrate 10 and the counter substrate 30 and in which either of alignment states of the splay alignment and the bend alignment can be developed. An alignment control force in the direction of an arrow 5A has been imparted to the liquid crystal layer 40 side surface of the element substrate 10, and subsequently, an alignment control force in the direction of an arrow 5B different from that of the arrow 5A is imparted thereto. An alignment control force in the direction of an arrow 5D, coinciding with that of the arrow 5B, is imparted to the liquid crystal layer 40 side surface of the counter substrate 30. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  One embodiment of the present invention relates to a liquid crystal device, an electronic device, and a method for manufacturing the liquid crystal device.

  Generally, a liquid crystal device includes a pair of substrates and a liquid crystal layer sealed between the substrates. Here, an alignment regulating force is applied to the opposing surface of the substrate, and the liquid crystal molecules of the liquid crystal layer are aligned along the direction of the alignment regulating force. For example, as shown in FIG. 17A, the alignment regulating force is given by rubbing the surface of the alignment film 19 formed on the surface of the substrate with a rubbing roller 70.

  During the rubbing process, if there is a step b on the surface of the alignment film 19, there may be a region u where the rubbing roller 70 does not touch and the alignment regulation force is insufficiently applied. As a method for making such a region u less likely to be generated, Patent Document 1 discloses a method of performing a second rubbing process in the opposite direction to the first after the first rubbing process.

  By the way, an OCB (Optically Compensated Birefringence) mode liquid crystal device is known as an example of a liquid crystal device. The OCB mode liquid crystal device has a configuration in which a liquid crystal layer 40 is sealed between an element substrate 10 and a counter substrate 30 as shown in a cross-sectional view of FIG. In addition, it is configured to be able to take any orientation state of splay orientation or bend orientation. The liquid crystal layer 40 has a splay alignment in an initial state, and is used by being transferred to a bend alignment by applying a transfer voltage when performing display. Further, once the liquid crystal layer 40 is transferred to the bend alignment, it is necessary to devise a method not to reversely transfer to the splay alignment. This is because even if a part of the liquid crystal layer 40 reversely transitions to the splay alignment, light leakage occurs at that portion, resulting in a luminescent spot defect. From the above, it is preferable that the OCB mode liquid crystal device has a configuration in which transition to bend alignment is easy and reverse transition to splay alignment hardly occurs.

  As a method for preventing the reverse transition to the splay alignment, Patent Document 2 discloses that a TFT (Thin Film Transistor) element or the like is arranged in a non-viewing area on the outer periphery of the liquid crystal display element, and a liquid crystal layer in the non-viewing area is driven. A method of maintaining a bend alignment state is disclosed. As a result, the liquid crystal layer in the viewing region can easily maintain the bend alignment state.

JP-A-10-274770 JP 2002-31456 A

  In the OCB mode liquid crystal device, when a region u in which the alignment regulating force is insufficiently applied is generated behind the step b (FIG. 17B) caused by wiring or the like, the transition to bend alignment occurs in this region u. There is a problem that it is difficult to occur and reverse transition to the splay alignment is likely to occur. This is because the pre-tilt angle of the liquid crystal molecules 40a cannot be obtained as a result of insufficient alignment regulating force in the region u, and the liquid crystal molecules 40a are difficult to stand against the substrate surface even when an electric field is applied.

  At this time, if a new TFT element or the like is formed in the non-viewing region in order to prevent reverse transition to the splay alignment, the manufacturing process becomes longer, and the configuration of the driver becomes more complicated to drive these elements. There is a problem.

  SUMMARY An advantage of some aspects of the invention is to solve at least a part of the problems described above, and the invention can be implemented as the following forms or application examples.

  [Application Example 1] A pair of substrates disposed opposite to each other, and a liquid crystal layer disposed between the pair of substrates and capable of taking either a splay alignment or a bend alignment. The surface on the liquid crystal layer side of one of the substrates is provided with an alignment regulating force in the first direction, and the surface to which the alignment regulating force in the first direction is applied is defined as the first direction. Are provided with alignment regulating forces in different second directions, and the liquid crystal molecules of the liquid crystal layer are aligned in the first direction on the surface of the one of the pair of substrates on the liquid crystal layer side. A liquid crystal device provided with a region to be aligned and a region to be aligned in the second direction.

  According to such a configuration, since the direction (first direction and second direction) of applying the orientation regulating force twice with respect to the surface of the substrate is different, when the orientation regulating force is given, the protrusion-like shape Even if there is a region where the application of the orientation regulating force is incomplete due to the shadow of the component, etc., the region is not shaded when the other orientation regulating force is applied, and the orientation regulation is appropriately performed. Giving power. For this reason, even if the application of the second alignment regulating force is incomplete in some areas, the alignment regulating force is applied to the area when the first alignment regulating force is applied prior to this area. Is done. Therefore, in the liquid crystal device having the above-described configuration, the alignment regulating force is applied to substantially the entire surface on one substrate. Thereby, since the alignment regulation force is weak, it is possible to suppress a problem that a reverse transition from the bend alignment to the splay alignment occurs.

  Application Example 2 In the above liquid crystal device, the second orientation is 180 degrees different from the first orientation.

  According to such a configuration, it is possible to effectively apply the orientation regulating force on the other side to the region that is shaded on one side of the two orientation regulating force impartations.

  Application Example 3 In the above-described liquid crystal device, an alignment film is formed on the surface of the one substrate on the liquid crystal layer side, and at least imparting an alignment regulating force in the first direction and the second. One of the provisions of the alignment regulating force in the direction is a liquid crystal device in which the alignment regulating force is applied by rubbing the alignment film.

  According to such a configuration, an alignment regulating force in the direction along the direction of the rubbing process can be applied to the surface of one substrate by making a fine scratch on the surface of the alignment film by the rubbing process.

  Application Example 4 In the above-described liquid crystal device, at least one of the application of the alignment regulating force in the first direction and the application of the alignment regulating force in the second direction is performed on the one substrate. A liquid crystal device in which an alignment regulating force is imparted by obliquely depositing an inorganic substance on the surface on the liquid crystal layer side.

  According to such a configuration, it is possible to apply an orientation regulating force in the direction along the arrangement direction of the obliquely vapor-deposited inorganic substance to the surface of one substrate.

  Application Example 5 In the liquid crystal device, the region in which the liquid crystal molecules of the liquid crystal layer are aligned in the first direction is provided with an alignment regulating force in the first direction, and in the second direction. A liquid crystal device in which a light shielding layer is formed in a region that is not provided with an alignment regulating force and overlaps a region in which liquid crystal molecules of the liquid crystal layer are aligned in the first direction.

  The region in which the alignment regulating force is applied in the first direction and the alignment regulating force is not applied in the second direction is different in the alignment state of the liquid crystal molecules from the region in which the alignment regulating force is applied in the second direction. Therefore, it is difficult to obtain good optical characteristics. According to the above configuration, the light emitted from the region can be shielded by the light shielding layer, so that deterioration of the optical characteristics can be suppressed.

  Application Example 6 In the above-described liquid crystal device, the surface of the other of the pair of substrates on the liquid crystal layer side is provided with an alignment regulating force in the second direction.

  According to such a configuration, the region in which the alignment regulating force in the second direction is applied to both of the pair of substrates becomes parallel alignment, and an alignment state suitable for the OCB mode can be obtained.

  Application Example 7 In the above-described liquid crystal device, an alignment regulating force is applied in the first direction in the plan view of at least one liquid crystal layer side of the pair of substrates, and the second direction A liquid crystal device comprising an initial alignment transition structure in a region where the alignment regulating force is not applied to the region, or a region overlapping with a region along the region.

  A region of one substrate in which the alignment regulating force is applied in the first direction and the alignment regulating force is not applied in the second direction is anti-parallel in relation to the alignment regulating force in the second direction on the other substrate. Orientation. In anti-parallel alignment, liquid crystal molecules are likely to stand by application of an electric field as compared with parallel alignment, and thus transition to bend alignment is likely to occur. For this reason, by providing an initial alignment transition structure in the region or a region along the region, bend alignment transition nuclei can be easily generated around the initial alignment transition structure.

  Application Example 8 In the above-described liquid crystal device, the surface of the other substrate on the liquid crystal layer side has a direction different from the second direction before the alignment regulating force is applied in the second direction. A liquid crystal device to which an alignment regulating force is applied.

  According to such a configuration, even if the application of the alignment regulating force in the second direction on the other substrate is incomplete in a part of the region, the second region is prior to the second region. It is possible to apply an orientation regulating force in a direction different from the direction. For this reason, the alignment regulating force is applied to almost the entire surface of the other substrate, and the defect that reverse transition from the bend alignment to the splay alignment can be suppressed because the alignment regulating force is weak. In addition, the direction of the orientation regulating force applied twice on the other substrate may be 180 degrees different from each other. In addition, after the alignment film is formed on the surface of the other substrate on the liquid crystal layer side, the above-mentioned two alignment regulating forces may be applied by rubbing the alignment film. Moreover, you may perform said 2 times alignment control force provision by carrying out oblique vapor deposition of an inorganic substance on the surface by the side of the liquid crystal layer of the other board | substrate.

  Application Example 9 In the above-described liquid crystal device, at least part of a region of the one substrate in which the alignment regulating force is applied in the first direction and the alignment regulating force is not applied in the second direction. And at least a part of a region of the other substrate to which the orientation regulating force is applied in a direction different from the second direction and where the orientation regulating force is not applied in the second direction is a plan view. Overlapping liquid crystal device.

  In one of the substrates, the region in which the alignment regulating force is applied in the first direction and the alignment regulating force is not applied in the second direction, and in the other substrate, the alignment is controlled in a direction different from the second direction. The region where the force is applied and the alignment regulating force is not applied in the second direction has a different alignment direction from the other regions, and thus the optical characteristics are likely to deteriorate. According to the above configuration, since a part of these regions is overlapped, the area of the region in which the optical characteristics are likely to be reduced can be reduced, and consequently the reduction in the optical properties of the entire liquid crystal device can be suppressed. .

  Application Example 10 Electronic equipment including the liquid crystal device in a display portion.

  According to such a configuration, it is possible to obtain an electronic apparatus that can easily maintain the liquid crystal device of the display unit in bend alignment.

  Application Example 11 A manufacturing method of a liquid crystal device having a pair of substrates disposed opposite to each other, the step of applying an alignment regulating force in a first direction to the surface of one of the pair of substrates. A and a step B of applying an orientation regulating force in a second direction different from the first orientation to the surface of the one substrate to which the orientation regulating force is imparted in the step A after the step A. And bonding the one substrate to the other substrate of the pair of substrates via a sealing material so that the surfaces to which the orientation regulating force is applied face each other, and forming the pair of substrates And a step of enclosing a liquid crystal layer capable of taking either a splay alignment or a bend alignment between the pair of substrates.

  According to such a method, the direction in which the orientation regulating force is applied in the process A (first direction) is different from the direction in which the orientation regulating force is applied in the process B (second direction). In this process, even if there is a region where the application of the orientation regulating force is incomplete due to the shadow of the projecting component, the region is not shaded in the other process, An orientation regulating force is applied. For this reason, even if the application of the alignment regulating force in the process B is incomplete in a part of the region, the alignment regulating force is applied to the region in the process A prior to this. Therefore, according to the above method, the alignment regulating force can be applied to almost the entire surface of one substrate, and the disadvantage that the reverse transition from the bend alignment to the splay alignment is suppressed due to the weak alignment regulating force. Can do.

  Application Example 12 In the method for manufacturing the liquid crystal device, the second direction is a direction different from the first direction by 180 degrees.

  According to such a method, the alignment regulating force can be effectively applied to the region which is shaded in one of the processes A and B in the other process.

  Application Example 13 In the method of manufacturing the liquid crystal device, the method includes a step of forming an alignment film on the surface of the one substrate before the step A, and the step A and the step B are the alignment steps. A method for manufacturing a liquid crystal device, which is a step of rubbing a film.

  According to such a method, an alignment regulating force in the direction along the direction of the rubbing treatment can be applied to the surface of one of the substrates by making fine scratches on the surface of the alignment film by rubbing treatment.

  Application Example 14 In the method for manufacturing a liquid crystal device, the steps A and B are a step of obliquely depositing an inorganic substance on the surface of the one substrate.

  According to such a method, the orientation regulating force in the direction along the arrangement direction of the obliquely deposited inorganic substance can be applied to the surface of one substrate.

  Hereinafter, embodiments of a liquid crystal device, a method for manufacturing the liquid crystal device, and an electronic apparatus will be described with reference to the drawings. In the drawings shown below, the dimensions and ratios of the components are appropriately different from the actual ones in order to make the components large enough to be recognized on the drawings.

(First embodiment)
<A. Configuration of liquid crystal device>
1A and 1B show a configuration of the liquid crystal device 1, in which FIG. 1A is a perspective view, and FIG. 1B is a cross-sectional view taken along line AA in FIG. The liquid crystal device 1 is an active matrix type liquid crystal device using a TFT element 20 (FIG. 4) as a switching element, and is an OCB mode liquid crystal device. The liquid crystal device 1 includes an element substrate 10 and a counter substrate 30 as a pair of substrates bonded to each other with a frame-shaped sealing material 41 therebetween. In the present embodiment, the element substrate 10 corresponds to one substrate, and the counter substrate 30 corresponds to the other substrate. In a space surrounded by the element substrate 10, the counter substrate 30, and the sealing material 41, a liquid crystal layer 40 that can take either an alignment state of splay alignment or bend alignment is enclosed. A polarizing plate 51 is disposed on the surface of the element substrate 10 opposite to the liquid crystal layer 40, and a polarizing plate 53 is disposed on the surface of the counter substrate 30 opposite to the liquid crystal layer 40. The element substrate 10 is larger than the counter substrate 30 and is bonded in a state where a part of the element substrate 10 protrudes from the counter substrate 30. A driver IC 42 for driving the liquid crystal layer 40 is mounted on the protruding portion.

  The liquid crystal device 1 performs display in the display area 43 in which the liquid crystal layer 40 is enclosed. The liquid crystal layer 40 initially has a splay alignment as shown in FIG. 2A, and is used by changing to a bend alignment as shown in FIG. The transition from the splay alignment to the bend alignment is performed by applying a transition voltage to the liquid crystal layer 40. In the bend alignment, the liquid crystal molecules 40a included in the liquid crystal layer 40 are arranged in a bow shape, and display is performed by modulating the transmittance by changing the degree of bending of the bow shape.

  FIG. 3 is an enlarged plan view of the display area 43. As shown in this figure, the liquid crystal device 1 has a large number of pixels 4R, 4G, and 4B corresponding to red, green, and blue (hereinafter, simply referred to as pixels 4 when the corresponding colors are not distinguished). Yes. The pixels 4 are arranged in a matrix, and all the colors of the pixels 4 arranged in a certain column are the same. That is, the pixels 4 are arranged so that corresponding colors are arranged in a stripe pattern. A light shielding layer 34 is formed in a region between adjacent pixels 4. In other words, a region surrounded by the light shielding layer 34 is a region occupied by one pixel 4. In addition, a pixel group composed of three adjacent pixels 4R, 4G, and 4B arranged in the row direction is the minimum display unit (pixel). The liquid crystal device 1 can display various colors by adjusting the luminance balance of the pixels 4R, 4G, and 4B in each pixel group.

<B. Equivalent circuit>
FIG. 4 is an equivalent circuit diagram of various elements and wirings in the display area 43 of the liquid crystal device 1. In the display region 43, the plurality of gate lines 12 and the plurality of source lines 14 are formed so as to intersect with each other. The pixel 4 is provided corresponding to the intersection of the gate line 12 and the source line 14, and a pixel electrode 16 is formed for each pixel 4. A capacitor line 15 is formed along the gate line 12, and an auxiliary capacitor 15 a is formed between the pixel electrode 16 and the capacitor line 15.

  A TFT element 20 as a switching element for controlling energization to the pixel electrode 16 is formed for each pixel 4 at a position corresponding to the intersection of the gate line 12 and the source line 14. A source line 14 is electrically connected to the source terminal of the TFT element 20. The gate line 12 is electrically connected to the gate terminal of the TFT element 20. The pixel electrode 16 is electrically connected to the drain terminal of the TFT element 20.

<C. Pixel structure>
FIG. 5A is a plan view showing the configuration of the pixel 4. This figure is a view of the pixel 4 as viewed from the counter substrate 30 side, more specifically from the normal direction of the counter substrate 30. In this specification, viewing from the normal direction of the counter substrate 30 is also referred to as “plan view”. Further, in FIG. 5A, for convenience of explanation, the source line 14 is drawn so as to extend in the left-right direction. In this specification, the extending direction of the source line 14 is defined as the Y axis, the extending direction of the gate line 12 is defined as the X axis, and the direction orthogonal to the XY plane is defined as the Z axis. Moreover, FIG.5 (b) is sectional drawing in the BB line in Fig.5 (a). Below, the structure of the pixel 4 and its peripheral part is demonstrated using FIG. 5 (a), (b).

As shown in FIG. 5B, the element substrate 10 is configured with the substrate 11 as a base. As the substrate 11, a glass substrate, a quartz substrate, or the like can be used. A gate line 12 and a capacitor line 15 are formed on the substrate 11 on the liquid crystal layer 40 side. An insulating layer made of silicon oxide (SiO ₂ ) or the like may be further provided between the substrate 11 and the gate line 12 and the capacitor line 15. A semiconductor layer 20a is formed on the gate line 12 with an interlayer insulating layer 23 made of silicon oxide (SiO ₂ ) or the like interposed therebetween. The semiconductor layer 20a can be composed of, for example, amorphous silicon or polysilicon. In addition, a source electrode 20s and a drain electrode 20d are formed so as to partially overlap the semiconductor layer 20a. The source electrode 20s can be formed integrally with the source line 14 (FIG. 5A). The TFT element 20 is composed of the semiconductor layer 20a, the source electrode 20s, the drain electrode 20d, the gate line 12, and the like. The gate line 12 also serves as a gate electrode of the TFT element 20. For example, titanium (Ti), chromium (Cr), tungsten (W), tantalum (Ta), molybdenum (Mo) is used for the gate line 12 (gate electrode), the source electrode 20s, the drain electrode 20d, the source line 14, and the capacitor line 15. ) Or the like containing at least one of refractory metals such as metal, alloy, metal silicide, polysilicide, a laminate of these, or conductive polysilicon.

A pixel electrode 16 is formed on the TFT element 20 with an interlayer insulating layer 24 made of silicon oxide (SiO ₂ ) or the like interposed therebetween. The pixel electrode 16 can be formed using, for example, light-transmitting ITO (Indium Tin Oxide). The pixel electrode 16 is electrically connected to the drain electrode 20 d through a contact hole 21 provided in the interlayer insulating layer 24. A part of the pixel electrode 16 is opposed to the capacitor line 15, and forms an auxiliary capacitor 15 a (FIG. 4) with the capacitor line 15. An alignment film 19 made of polyimide is formed on the pixel electrode 16. The element substrate 10 includes elements from the substrate 11 to the alignment film 19.

  The counter substrate 30 is configured with the substrate 31 as a base. As the substrate 31, a glass substrate, a quartz substrate, or the like can be used. A color filter 32 is formed on the liquid crystal layer 40 side of the substrate 31. The color filter 32 includes three types of color elements corresponding to red, green, and blue colors, and these color elements are arranged in the pixels 4R, 4G, and 4B, respectively. A light shielding layer 34 made of a resin having a light shielding property is formed on the same layer as the color filter 32. The light shielding layer 34 is formed at a position covering a region between the adjacent pixel electrodes 16 in a plan view, and plays a role of preventing light leakage from the region and improving display contrast.

  A common electrode 36 made of ITO is formed on the color filter 32. The common electrode 36 is formed over substantially the entire display area 43 (FIG. 1). On the common electrode 36, an alignment film 39 made of polyimide is formed. The counter substrate 30 is composed of elements from the substrate 31 to the alignment film 39.

  The element substrate 10 and the counter substrate 30 are bonded to each other with a sealant 41 (FIG. 1B) facing each other. Here, the element substrate 10 and the counter substrate 30 are supported by the photo spacers 26 arranged on the counter substrate 30 so that the distance between the element substrate 10 and the counter substrate 30 is kept constant. Yes. The photo spacer 26 is obtained, for example, by patterning a resin layer formed on the counter substrate 30 with a certain thickness by photolithography. The photo spacer 26 may be formed on the element substrate 10 side as necessary.

  The liquid crystal layer 40 is disposed between the element substrate 10 and the counter substrate 30 as described above. A nematic liquid crystal can be used for the liquid crystal layer 40. As an example, the thickness of the liquid crystal layer 40 can be 5 μm, and the Δn (refractive index anisotropy) of the liquid crystal molecules 40 a included in the liquid crystal layer 40 can be 0.15.

  An alignment regulating force is applied to the surface of the element substrate 10 on the liquid crystal layer 40 side and the surface of the counter substrate 30 on the liquid crystal layer 40 side. The liquid crystal molecules 40a are aligned with a predetermined pretilt angle in the vicinity of the surfaces of the element substrate 10 and the counter substrate 30 along the direction of the alignment regulating force. In this specification, the direction of the orientation regulating force is defined as follows. That is, of the extending directions of the major axis of the liquid crystal molecules 40a on the substrate surface, the direction in which the liquid crystal molecules 40a rise at a predetermined pretilt angle (that is, the both ends of the major axis direction of the liquid crystal molecules 40a are closer to the substrate surface. The direction in which the direction from the end toward the other end is viewed in plan view is defined as the direction of the orientation regulating force.

  More specifically, the surface of the element substrate 10 on the liquid crystal layer 40 side has a process A that imparts an alignment regulating force in the −Y direction and a direction different from the −Y direction by 180 degrees after the process A (that is, the + Y direction). The alignment regulating force is applied by the process B for applying the alignment regulating force. Arrows 5A and 5B in FIGS. 5 (a) and 5 (b) indicate the directions of applying the orientation regulating force in step A and step B, respectively. In the present embodiment, the −Y direction corresponds to the first direction, and the + Y direction corresponds to the second direction. In addition, the surface of the counter substrate 30 on the liquid crystal layer 40 side is given an alignment regulating force by the process D for applying an alignment regulating force in the + Y direction. An arrow 5D in FIG. 5B indicates the direction in which the orientation regulating force is applied in the process D.

  In this embodiment, the alignment films 19 and 39 are formed on the surface of the element substrate 10 and the counter substrate 30 on the liquid crystal layer 40 side, and the alignment regulation force is applied in the process A, the process B, and the process D. 19 and 39 are performed by rubbing processing. In the rubbing process, the rubbing roller 70 (FIG. 17A) wound with a cloth or the like is brought into contact with the alignment films 19 and 39 while rotating, and the rubbing roller 70 and the alignment films 19 and 39 are moved relative to each other. Done. According to this rubbing treatment, an alignment regulating force is applied to the alignment films 19 and 39 along the direction of relative movement between the rubbing roller 70 and the alignment films 19 and 39. That is, the direction of the relative movement is the direction in which the orientation regulating force is applied.

  The alignment film 19 of the element substrate 10 is rubbed for the first time in the direction of the arrow 5A and then rubbed for the second time in the direction of the arrow 5B in the opposite direction. Here, the alignment film 19 has a step b caused by the thickness of the gate line 12 and the TFT element 20. At this time, according to the first rubbing process along the direction of the arrow 5A, the process is performed in the direction from the lower stage to the upper stage of the step b, so that the rubbing process can be performed without gaps before and after the step b. On the other hand, since the second rubbing process along the direction of the arrow 5B is a process in the direction from the upper stage to the lower stage of the step b, a certain region u in the vicinity of the step b in the lower stage (that is, behind the step b). In this region, the rubbing roller 70 and the alignment film 19 do not come into contact with each other, and the application of the alignment regulating force becomes insufficient. If the first rubbing process is not performed, the region u is in a state where the alignment regulating force is not sufficient. In this embodiment, the region u is aligned in the direction of the arrow 5A by the first rubbing process. Regulatory power is given in advance. Therefore, even if the step b exists, the alignment regulating force can be applied to substantially the entire surface of the alignment film 19 by at least one of the first and second rubbing processes. Here, by making the first and second rubbing directions different by 180 degrees, the region that is shaded in one of the processes A and B is effectively regulated in the other process. Giving power.

  When the rubbing process is performed a plurality of times, the orientation regulating force is applied in the direction of the last rubbing process. In the region u, since the orientation regulating force is applied only by the first rubbing process, the direction of the orientation regulating force is the direction of the arrow 5A (−Y direction). In the other region v, since the second rubbing process in the direction of the arrow 5B is the last process, the direction of the orientation regulating force is the direction of the arrow 5B (+ Y direction). Thus, the surface u of the alignment film 19 of the element substrate 10 is provided with the region u for aligning the liquid crystal molecules 40a of the liquid crystal layer 40 in the direction of the arrow 5A and the region v for aligning in the direction of the arrow 5B. . On the other hand, since the rubbing process in the direction of the arrow 5D is performed only once on the alignment film 39 of the counter substrate 30, the direction of the alignment regulating force is the direction of the arrow 5D (+ Y direction). From the above, in the region u, the directions of the orientation regulating forces on the surfaces of both substrates are 180 degrees different from each other, and in the region v, the directions of the orientation regulating forces on the surfaces of both substrates are parallel to each other. Yes.

  A polarizing plate 51 is disposed outside the element substrate 10, and a polarizing plate 53 is disposed outside the counter substrate 30. The transmission axes of the polarizing plates 51 and 53 are arranged so as to be substantially orthogonal to each other and at an angle of about 45 degrees with the direction of rubbing treatment (+ Y direction) in the region v of the alignment films 19 and 39. . If necessary, an optical compensation film may be disposed between the polarizing plate 51 and the element substrate 10 and between the polarizing plate 53 and the counter substrate 30. As an optical compensation film, a film obtained by hybrid alignment of discotic liquid crystal molecules having negative refractive index anisotropy (for example, WV film manufactured by Fuji Photo Film), nematic liquid crystal molecules having positive refractive index anisotropy, etc. And a biaxial medium having a refractive index of nx> ny> nz in each direction can be used.

  Further, a backlight (not shown) having a light source, a reflector, a light guide plate, and the like is installed outside the polarizing plate 51.

  The polarizing plates 51 and 53 and the optical compensation film are adjusted so that suitable optical characteristics can be obtained for the region where the liquid crystal layer 40 is in parallel alignment. For this reason, although good optical characteristics can be obtained in the region v, there are cases where sufficient optical properties cannot be obtained in the region u having an alignment state different from that of the region v. For this reason, as shown in FIG.5 (b), it is preferable that the light shielding layer 34 is arrange | positioned also in the area | region which overlaps with the area | region u by planar view. According to such a configuration, since the light emitted from the region u can be blocked by the light blocking layer 34, it is possible to suppress a decrease in optical characteristics. In addition, the light shielding layer should just be arrange | positioned at the at least one liquid crystal layer 40 side of the element substrate 10 and the opposing board | substrate 30, for example, a light shielding layer can also be provided in the liquid crystal layer 40 side of the element substrate 10.

<D. Transfer operation>
The liquid crystal device 1 having the above configuration can be transferred from the splay alignment to the bend alignment by operating as follows.

  First, in the first step, a transition voltage is applied between the gate line 12 and the pixel electrode 16. The transition voltage can be an alternating rectangular wave of about 10 to 15 V, for example, and the application time is 0.5 seconds, for example. In this process, a signal for transition is applied to the gate line 12 and a signal for transition is applied to the source line 14 in a state where the TFT element 20 is turned on to supply the signal to the pixel electrode 16. Is done.

  When the transition voltage is applied between the gate line 12 and the pixel electrode 16, an electric field is generated between the gate line 12 and the pixel electrode 16. The liquid crystal molecules 40a of the liquid crystal layer 40 change the alignment direction along the direction of the electric field, and a part thereof is transferred to bend alignment. Thus, bend alignment transition nuclei are generated in the region between or in the vicinity of the gate line 12 and the pixel electrode 16.

  In the subsequent second step, a transition voltage is applied between the pixel electrode 16 and the common electrode 36. This transition voltage can be, for example, an alternating rectangular wave of 5V. In this step, an electric field (vertical electric field) having a component in the normal direction of the substrate 11 is generated in the liquid crystal layer 40 on the pixel electrode 16. The liquid crystal molecules 40a are driven over a wide range on the pixel electrode 16 by this electric field. As a result, the bend alignment region spreads on the pixel electrode 16 with the transition nucleus generated in the first step as a starting point. Through the above steps, the liquid crystal layer 40 can be transferred from the splay alignment to the bend alignment.

  In the transition operation, if there is a region with insufficient alignment regulating force, transition to bend alignment is unlikely to occur in the region. This is because in a region where the alignment regulation force is insufficient, the liquid crystal molecules 40a have almost no pretilt angle and the alignment azimuth is not stable, so that the liquid crystal molecules 40a hardly stand against the substrate surface even when an electric field is applied.

  On the other hand, in the present embodiment, since the alignment regulating force is applied to the alignment films 19 and 39 over almost the entire surface including the region u that is likely to be shaded by the step b, the liquid crystal molecules 40 a However, it is oriented with a predetermined pretilt angle and is likely to transition to bend orientation. In particular, the liquid crystal layer 40 is anti-parallel aligned in the region u. In the anti-parallel alignment, since the liquid crystal molecules 40a in the vicinity of the intermediate layer of the liquid crystal layer 40 tend to stand up as compared with the parallel alignment, bend alignment transition nuclei are more likely to occur. Furthermore, in this embodiment, since the region u is located in the vicinity of the gate line 12 where an electric field is generated in the first step, transition nuclei are likely to be generated in the vicinity of the region u.

  As described above, according to the configuration of this embodiment in which the rubbing process is performed twice with respect to the alignment film 19 in a direction different by 180 degrees, the liquid crystal layer 40 in all regions including the region u in the vicinity of the step b. Are in a state of being easily transferred to bend alignment. For this reason, transition to bend alignment can be performed in a short time. Alternatively, transition to bend alignment can be performed with a lower transition voltage.

<E. Display operation>
Subsequently, a display operation after the liquid crystal layer 40 is transferred to bend alignment will be described.

  As shown in FIG. 4, scanning signals G1, G2,..., Gn are supplied to each gate line 12. Further, image signals S1, S2,..., Sm are supplied to each source line. When the gate line 12 becomes a selection potential, the TFT element 20 connected to the gate line 12 is turned on. During the period in which the TFT element 20 is in the on state, the image signals S1, S2,..., Sm supplied to the source line 14 are applied to the pixel electrode 16 via the TFT element 20. A voltage determined by a predetermined level of the image signals S1, S2,..., Sm applied to the pixel electrode 16 and the common potential of the common electrode 36 (FIG. 5B) becomes a drive voltage and is applied to the liquid crystal layer 40. The The drive voltage is held for a certain period of time by the capacitance of the liquid crystal layer 40 and the auxiliary capacitor 15a. When a driving voltage is applied to the liquid crystal layer 40, the alignment state of the liquid crystal molecules 40a changes according to the applied voltage level. As a result, the light incident on the liquid crystal layer 40 is modulated to enable gradation display.

  Here, the effective value of the drive voltage is set to be larger than the critical voltage for maintaining the bend alignment in the liquid crystal layer 40. This is because when the effective value of the driving voltage is smaller than the critical voltage, a part of the liquid crystal layer 40 is reversely transferred to the splay alignment, and the display of the portion is disturbed to cause a bright spot defect.

  At this time, if there is a region with insufficient alignment regulating force, reverse transition to the splay alignment is more likely to occur in the region. This is because, as described above, in the region where the alignment regulation force is insufficient, the liquid crystal molecules 40a hardly stand on the substrate surface because the pretilt angle of the liquid crystal molecules 40a is scarce and the alignment orientation is not stable.

  On the other hand, in the present embodiment, since the alignment regulating force is applied to the alignment films 19 and 39 over almost the entire surface including the region u in the vicinity of the step b, the liquid crystal molecules 40a are predetermined in any region. Therefore, it is easy to maintain the bend alignment. For this reason, reverse transition to splay alignment hardly occurs. For this reason, a critical voltage becomes small and a lower voltage can be used for a display. For example, in the normally white mode, a higher luminance display can be performed by lowering the white display voltage. In addition, when the “pseudo impulse display method” for inserting a black display in order to maintain bend orientation is employed, the frequency of black display insertion can be reduced, and the display quality can be improved. .

<F. Manufacturing method of liquid crystal device>
Next, a method for manufacturing the liquid crystal device 1 will be described with reference to FIG. FIG. 6 is a flowchart showing a method for manufacturing the liquid crystal device 1 of the present embodiment. In FIG. 6, processes P <b> 11 to P <b> 14 are processes for forming the element substrate 10, and processes P <b> 21 to P <b> 23 are processes for forming the counter substrate 30. Process P31 to process P33 are processes for completing the liquid crystal device 1 by combining the element substrate 10 and the counter substrate 30. Steps P11 to P14 and Steps P21 to P23 are performed independently.

  In step P11, a circuit element layer including a gate line 12, a source line 14, a capacitor line 15, a TFT element 20, interlayer insulating layers 23 and 24, a pixel electrode 16 and the like is formed on the substrate 11 constituting the element substrate 10. . This step is performed using various film forming techniques such as atmospheric pressure or reduced pressure CVD, sputtering, and photolithography.

  In step P12, an alignment film 19 made of polyimide is formed on the circuit element layer formed in step P11 by spin coating or flexographic printing.

  In the process P13, the first rubbing process is performed on the surface of the element substrate 10, that is, the alignment film 19 formed in the process P12. More specifically, a rubbing process in the −Y direction is performed on the surface of the alignment film 19 as indicated by an arrow 5A (FIGS. 5A and 5B). The process P13 corresponds to the process A in which the orientation regulating force is applied in the first direction, and the −Y direction corresponds to the first direction. By this process P13, an orientation regulating force is applied to a region including the region u in the vicinity of the step b in the surface of the element substrate 10.

  In Step P14, a second rubbing process is performed on the surface of the element substrate 10 (alignment film 19). More specifically, a rubbing process in the + Y direction is performed on the surface of the alignment film 19 as indicated by an arrow 5B (FIGS. 5A and 5B). The process P14 corresponds to the process B for applying the orientation regulating force in the second direction, and the + Y direction corresponds to the second direction. By the process P14, the orientation regulating force is applied to the region including the region v in the surface of the element substrate 10.

  As a result, in the surface u of the element substrate 10 (that is, the surface of the alignment film 19), the region u that is behind the step b is given the alignment regulating force in the process P13, and the other regions v are processed in the processes P13, P13, The orientation regulating force is applied by 14. The element substrate 10 is completed through the process P11 to the process P14.

  In step P21, a color filter 32, a light shielding layer 34, a common electrode 36, a photo spacer 26, and the like are formed on a substrate 31 that constitutes the counter substrate 30. This step is performed using various film forming methods such as a spin coating method, a sputtering method, and a photolithography method.

  In step P22, an alignment film 39 made of polyimide is formed on the common electrode 36 formed in step P21 by spin coating or flexographic printing.

  In the process P23, a rubbing process is performed on the surface of the counter substrate 30, that is, the alignment film 39 formed in the process P22. More specifically, a rubbing process in the + Y direction is performed on the surface of the alignment film 39 as shown by an arrow 5D (FIG. 5B). Process P23 corresponds to process D. By this process P23, the alignment regulating force in the + Y direction is applied to the entire surface of the counter substrate 30. The counter substrate 30 is completed through the process P21 to the process P23.

  In step P31, the element substrate 10 and the counter substrate 30 are opposed to each other through the sealing material 41 (FIG. 1B) with the surface to which the alignment regulating force is applied (that is, the surface on which the alignment films 19 and 39 are formed). Paste them together. More specifically, the sealing material 41 is applied in a frame shape to the surface of the element substrate 10 or the counter substrate 30 by a dispenser coating method or a screen printing method, and alignment (positioning) is performed between the element substrate 10 and the counter substrate 30. In this state, contact and pressure bonding are performed, and then the sealing material 41 is dried to bond the two substrates together.

  In Step P32, liquid crystal is injected into a region surrounded by the element substrate 10, the counter substrate 30, and the sealing material 41 to form a liquid crystal layer 40 that can take either a splay alignment or a bend alignment. This step is performed by introducing liquid crystal into the region by capillary action from an inlet provided in the sealing material 41 under vacuum and sealing the inlet with an ultraviolet curable resin or the like. As a method for encapsulating the liquid crystal layer 40 between the element substrate 10 and the counter substrate 30, a method of performing bonding (process P31) in a state where liquid crystal is dropped on the surface of the element substrate 10 or the counter substrate 30 is employed. You can also

  In step P33, polarizing plates 51 and 53 are attached to the outside of the element substrate 10 and the counter substrate 30, respectively. When the element substrate 10 and the counter substrate 30 are formed on a mother substrate including a plurality of these, the mother substrate is appropriately broken (cut) before the process P33 or the process P32. The liquid crystal device 1 is manufactured through the above steps.

  According to the method for manufacturing the liquid crystal device 1 as described above, even if the step b is formed on the surface of the element substrate 10 on the liquid crystal layer 40 side, the alignment regulating force is applied to the entire surface of the element substrate 10. Can do. For this reason, the liquid crystal device 1 with less inconvenience in which reverse transition from bend alignment to splay alignment occurs due to weak alignment regulating force can be obtained.

(Second Embodiment)
Next, the second embodiment will be described. This embodiment is different from the first embodiment in the configuration and forming method of the alignment films 19 and 39, and the other points are the same as those in the first embodiment.

<A. Configuration of liquid crystal device>
The configuration of the pixel 4 and its peripheral portion of the liquid crystal device 1 of the present embodiment is the same as that of the first embodiment, and the plan view and cross-sectional view thereof are shown in FIGS. . The liquid crystal device 1 of the present embodiment is characterized in that the alignment films 19 and 39 are made of an inorganic material 55 (FIGS. 7B and 7C) formed by oblique deposition. For example, SiO ₂ can be used as the inorganic material 55.

  FIG. 7A is a diagram showing a method of forming the alignment films 19 and 39 by oblique vapor deposition. The element substrate 10 (or the counter substrate 30) is disposed inside the vapor deposition apparatus 60, and a vapor deposition source 61 that generates a vapor flow of the inorganic substance 55 is disposed vertically below the element substrate 10. In the vapor deposition apparatus 60, the element substrate 10 is held such that a normal direction thereof forms a predetermined angle θ with respect to a line connecting the vapor deposition source 61 and the position of the center of gravity of the substrate surface of the element substrate 10. In other words, the angle θ is an angle at which the vapor flow of the inorganic substance 55 generated in the vapor deposition source 61 is incident on the surface of the element substrate 10.

  FIGS. 7B and 7C are cross-sectional views of the surface on which the inorganic substance 55 is deposited by the deposition apparatus 60. The arrow in the figure indicates the direction in which the inorganic substance 55 is incident, and the incident angle is an angle θ with respect to the normal direction of the substrate. FIGS. 7B and 7C correspond to the case where the absolute values of the angles θ are equal and the signs are reversed. A large number of columnar inorganic substances 55 are formed on the substrate surface in an inclined state by an angle θ from the normal direction of the substrate. As can be seen by comparing FIGS. 7B and 7C, the direction of the inorganic material 55 deposited on the element substrate 10 can be controlled by changing the angle θ.

  The alignment films 19 and 39 are made of this inorganic material 55. The liquid crystal molecules 40a located in the vicinity of the alignment films 19 and 39 are aligned along the direction in which the longitudinal direction of the columnar inorganic material 55 extends. Therefore, the alignment films 19 and 39 made of the inorganic material 55 have an alignment regulating force, and the step of obliquely depositing the inorganic material 55 corresponds to the step of applying the alignment regulating force. Further, the direction in which the direction in which oblique deposition is performed (the direction of the arrow in FIGS. 7B and 7C) is projected on the substrate surface is defined as the direction of the orientation regulating force. Therefore, in FIG. 7B, the directions of the arrows 5B and 5D are directions of the orientation regulating force, and in FIG. 7C, the direction of the arrows 5A is the orientation regulating force.

  When there is a step b on the substrate surface (FIGS. 5B, 7B, and 7C), as shown in FIG. 7B, the orientation regulating force is applied in the direction from the upper stage to the lower stage of the step b. When applied (that is, when the inorganic material 55 is obliquely vapor-deposited), the inorganic material 55 is not formed in the region u that is behind the step b, and the orientation regulating force of the region u becomes insufficient. On the other hand, as shown in FIG. 7C, when the orientation regulating force is applied in the direction from the lower stage to the upper stage of the step b, the inorganic substance 55 is also formed in the region u, and the orientation regulating force is imparted.

  In this embodiment, when forming the alignment film 19 of the element substrate 10, first oblique deposition is performed in the direction of the arrow 5A in FIG. 5B, and then the direction of the arrow A is 180 degrees. A second oblique deposition is performed in the direction of the different arrow 5B. As a result, an alignment regulating force is applied by the first oblique deposition on the region u that is behind the step b, and an alignment regulating force is also applied by the second oblique deposition on the other region v. In the region v, the inorganic material 55 is formed by either the first or second oblique deposition, but the inorganic material formed by the second oblique deposition contributes to the orientation of the liquid crystal layer 40. Substance 55. As a result, as in the first embodiment, since the alignment regulating force is imparted to almost the entire surface of the element substrate 10, the orientation regulating force is weak, so that the reverse transition from the bend alignment to the splay alignment occurs. Can be suppressed.

<B. Manufacturing method of liquid crystal device>
Next, a method for manufacturing the liquid crystal device 1 according to the second embodiment will be described with reference to FIG. FIG. 8 is a flowchart showing a method for manufacturing the liquid crystal device of the present embodiment. In FIG. 8, steps S <b> 11 to S <b> 13 are steps for forming the element substrate 10, and steps S <b> 21 and S <b> 22 are steps for forming the counter substrate 30. Steps S <b> 31 to S <b> 33 are steps for completing the liquid crystal device 1 by combining the element substrate 10 and the counter substrate 30. Steps S11 to S13, and steps S21 and S22 are performed independently.

  In step S <b> 11, a circuit element layer is formed on the element substrate 10. This process is the same as the process P11 of the first embodiment.

In step S <b> 12, oblique deposition of the first inorganic substance 55 (FIGS. 7B and 7C) is performed on the surface of the element substrate 10. Here, the surface of the element substrate 10 refers to the surface of the circuit element layer formed in step S11, particularly the surface of the pixel electrode 16. More specifically, in this step, the inorganic substance 55 (for example, SiO ₂ ) is obliquely inclined along the direction of the arrow 5A (FIG. 5 (a), (b)) (ie, the −Y direction) with respect to the surface of the element substrate 10. Vapor deposition. The method of oblique deposition has been already described in detail and will be omitted. Step S12 corresponds to step A in which the orientation regulating force is applied in the first direction, and the −Y direction corresponds to the first direction. By this step S <b> 12, an orientation regulating force is applied to the region including the region u in the vicinity of the step b in the surface of the element substrate 10.

In step S <b> 13, the second oblique deposition of the inorganic material 55 is performed on the surface of the element substrate 10. More specifically, an inorganic material 55 (for example, SiO ₂ ) is obliquely deposited on the surface of the element substrate 10 along the direction of the arrow 5B (FIGS. 5A and 5B) (that is, the + Y direction). Step S13 corresponds to step B in which the orientation regulating force in the second direction is applied, and the + Y direction corresponds to the second direction. By the step S13, the orientation regulating force is applied to the region including the region v in the surface of the element substrate 10.

  As a result, in the surface u of the element substrate 10, the region u that is behind the step b is given an orientation regulating force in step S12, and the other region v is given an orientation regulating force in steps S12 and S13. The The element substrate 10 is completed through the above steps S11 to S13.

  In step S <b> 21, a color filter 32, a light shielding layer 34, a common electrode 36, a photo spacer 26, and the like are formed on the substrate 31 that constitutes the counter substrate 30. This process is the same process as the process P21 of the first embodiment.

In step S <b> 22, oblique deposition of the inorganic material 55 is performed on the surface of the counter substrate 30. Here, the surface of the counter substrate 30 refers to the surface of the common electrode 36 formed in step S21. More specifically, an inorganic material 55 (for example, SiO ₂ ) is obliquely deposited on the surface of the counter substrate 30 along the direction of the arrow 5D (FIG. 5B) (ie, the + Y direction). Step S22 corresponds to step D. By this step S22, the alignment regulating force in the + Y direction is applied to the entire surface of the counter substrate 30. The counter substrate 30 is completed through steps S21 and S22.

  Since steps S31 to S33 are the same steps as steps P31 to P33 of the first embodiment, description thereof will be omitted. The liquid crystal device 1 is manufactured through the above steps.

  According to such a manufacturing method of the liquid crystal device 1, the alignment regulating force can be imparted on substantially the entire surface of the element substrate 10. For this reason, the liquid crystal device 1 with less inconvenience in which reverse transition from bend alignment to splay alignment occurs due to weak alignment regulating force can be obtained.

(Electronics)
The liquid crystal device 1 described above can be used by being mounted on an electronic device such as a mobile phone. FIG. 16 is a perspective view of a mobile phone 100 as an electronic device. The mobile phone 100 has a display unit 110 and operation buttons 120. The display unit 110 can display various information including information input by the operation buttons 120 and incoming information by the liquid crystal device 1 incorporated therein. The mobile phone 100 can perform high-quality display due to the fact that the liquid crystal device 1 to be mounted does not easily undergo reverse transition to the splay alignment.

  The liquid crystal device 1 can be used for various electronic devices such as a mobile computer, a digital camera, a digital video camera, an in-vehicle device, and an audio device in addition to the mobile phone 100 described above. The liquid crystal device 1 can be used as a light valve incorporated in a projection display device such as a projector.

  Although various embodiments have been described above, for example, the following modifications can be made to the above embodiments. In the following description, the region where the alignment regulating force is applied in the first alignment regulating force application step (step A) and the alignment regulating force is not applied in the second alignment regulating force applying step (step B). This is called region u.

(Modification 1)
The initial alignment transition structure may be arranged in a region u overlapping at least one of the element substrate 10 and the counter substrate 30 on the liquid crystal layer 40 side in a plan view or a region along the region u.

  FIG. 9 is a plan view of the pixel 4 of the liquid crystal device 1 having a bent portion as an initial alignment transition structure. In this figure, the sides along the gate line 12 of the gate line 12 and the pixel electrode 16 both have a dogleg-shaped bent portion as an initial alignment transition structure. According to such a configuration, electric fields having different directions are generated in the vicinity of the bending point of the bent portion during the transfer operation. Due to these electric fields, the liquid crystal layer 40 is partially twisted in different directions, and disclination occurs at the boundary. By twisting the splay alignment liquid crystal layer 40 in this manner, the energy barrier for transition to bend alignment is lowered, and bend alignment transition nuclei are generated as a result of the disclination. Thus, the bent portions of the gate line 12 and the pixel electrode 16 are a kind of initial alignment transition structure that induces transition nuclei of bend alignment.

  The bent portion is disposed in a region along the region u. As described above, the region u is in antiparallel orientation. In the anti-parallel alignment, compared to the parallel alignment, the liquid crystal molecules 40a located in the intermediate layer region of the liquid crystal layer 40 are likely to stand by application of an electric field, so that transition to bend alignment is likely to occur. For this reason, by providing a bent portion in a region along the region u, bend alignment transition nuclei can be easily generated around the bent portion (particularly, the region u).

  FIG. 10A is a plan view of the pixel 4 of the liquid crystal device 1 having the pixel electrode 16 having the slit 16a as the initial alignment transition structure. More specifically, the pixel electrode 16 has a rectangular wave-shaped slit 16a in the region u. Even with such a configuration, electric fields having different directions are generated in the vicinity of the bending point of the slit 16a during the transfer operation, so that bend-oriented transfer nuclei are easily generated in the vicinity of the bending point. The slit 16a is provided in the region u, and the transition to the bend alignment easily occurs in the region u as described above. Therefore, according to the configuration of FIG. 10A, the bend alignment is easily performed in the vicinity of the slit 16a. The transition nuclei can be generated.

  The shape of the slit 16a formed in the pixel electrode 16 is not limited to that shown in FIG. 10A. For example, as shown in FIG. It is good also as a polygonal line shape which has a bending part repeatedly like FIG.10 (c), (d). The slits 16a having these shapes can easily generate bend-oriented transition nuclei by the same action as in FIG.

  FIG. 11 is a plan view of the pixel 4 of the liquid crystal device 1 having the double-source TFT element 20 as the initial alignment transition structure, where (a) is an overall view of the pixel 4 and (b) is an enlarged view of the TFT element 20. FIG. In this TFT element 20, the tip of the source electrode 20s extending from the source line 14 is divided into two U-shapes, and a part of the drain electrode 20d is the tip of the two source electrodes 20s. It is arrange | positioned in the position pinched | interposed between. According to such a configuration, two types of electric fields in opposite directions are generated between the source electrode 20s and the drain electrode 20d, as indicated by arrows in FIG. 11B. Due to these electric fields, the liquid crystal layer 40 is partially twisted in different directions, and disclination occurs at the boundary. The disclination triggers a bend-oriented transition nucleus. Thus, the double-source TFT element 20 is a kind of initial alignment transition structure that induces bend alignment transition nuclei.

  The double-source TFT element 20 is arranged in a region along the region u. As described above, since transition to bend alignment is likely to occur in the region u, by providing the TFT element 20 in a region along the region u, bend alignment can be easily performed around the TFT element 20 (particularly in the region u). Transition nuclei can be generated.

  In addition to the above, for example, a structure such as a projecting structure, a hollow structure, a transfer electrode, a twist alignment region, a vertical alignment region, or the like is used as the initial alignment transition structure along the region u or the region u. You may arrange in an area.

(Modification 2)
The first direction in which the orientation regulating force is imparted in step A (rubbing or oblique vapor deposition; the same applies to the following modifications) may be a direction different from the -Y direction. Similarly, the second direction in which the orientation regulating force is applied in the process B may be a direction different from the + Y direction. For example, as shown in FIG. 12, in the process A, an orientation regulating force in the −X direction is applied along the direction of the arrow 5A, and in the process B, an orientation regulating force in the + X direction is applied along the direction of the arrow 5B. May be. In this case, when the alignment regulating force is applied in the process B, the region u along the source line 14 is shaded and the alignment regulating force is not sufficiently applied. However, the alignment regulating force is applied to the region in the process A. Can be granted. Therefore, the region u and the other region v are given an alignment regulating force by the alignment regulating force applying step of at least one of the process A and the process B. As a result, the alignment regulating force is applied to substantially the entire surface of the substrate, and since the alignment regulating force is weak, it is possible to suppress the problem that reverse transition from bend alignment to splay alignment occurs.

  In addition, the direction of applying the orientation regulating force in step A and step B may be changed by an angle different from 180 degrees. For example, in FIG. 13, the direction of applying the orientation regulating force in step A is the direction that forms an angle of about 45 degrees with respect to the X axis as indicated by the arrow 5A. Is the direction along the + Y direction as shown by the arrow 5B. Also by such a method, the alignment regulating force can be applied to the region u in the process A. In addition, when the direction of applying the alignment regulating force of the counter substrate 30 is the + Y direction, the liquid crystal layer 40 in the region u is twisted. Such an alignment state has a lower energy barrier for transition to bend alignment as compared to splay alignment, so that transition to bend alignment can be performed more easily in region u. When the liquid crystal layer 40 is twisted, it is difficult to obtain optical characteristics. Therefore, it is preferable to shield the light with the light shielding layer 34 (FIG. 5B) or the like.

  In addition, you may make the direction of orientation regulation force provision of the process A and the process B differ by 90 degree | times. In this case, since any orientation regulating force is applied in a direction along the gate line 12 or the source line 14, a region where the orientation regulating force is insufficient due to the shadow of the gate line 12 or the source line 14 is formed. Can be minimized. Further, the twist angle in the region u can be maximized (90 degrees), and the energy barrier for transition to bend alignment can be further reduced.

(Modification 3)
As with the element substrate 10 (one substrate) side, the first alignment regulation force is applied to the surface of the counter substrate 30 (the other substrate) on the liquid crystal layer 40 side (step C). You may make it give the orientation control force of the 2nd time (process D). Here, the direction in which the orientation regulating force is applied in the process D is different from that in the process C, and preferably 180 degrees different. FIG. 14 is a cross-sectional view showing the configuration of the pixel 4 according to this modification. The position of the cross section corresponds to the position of line BB in FIG. For example, as shown in FIG. 14, in step C, the orientation regulating force is applied along the direction of the arrow 5C (−Y direction), and then in step D, the orientation regulating force is applied in the direction of the arrow 5D (+ Y direction). . As an example, when the photo-spacer 26 is formed on the element substrate 10, the region w that is behind the photo-spacer 26 is not rubbed or inorganic when the alignment regulating force is applied in the process D. Since the oblique deposition of the substance is not performed, the alignment regulating force becomes insufficient, but the alignment regulating force can be applied in the step of applying the alignment regulating force in the process C prior to this. For this reason, even when unevenness such as the photo spacer 26 exists on the surface of the counter substrate 30, the alignment regulating force can be applied to almost the entire surface, and since the alignment regulating force is weak, the bend alignment is changed to the splay alignment. It is possible to suppress problems that cause reverse transition.

  Further, as shown in FIG. 14, in the element substrate 10, at least a part of the region u to which the alignment regulating force is applied in the process A and the alignment regulating force is not applied in the process B, and the process of the counter substrate 30. It is preferable that at least a part of the region w to which the alignment regulating force is applied in C and the alignment regulating force is not applied in Step D overlaps with each other in plan view. The regions u and w are different from the other regions in the alignment state and become domains, and the optical characteristics are likely to deteriorate. However, according to the above configuration, the regions u and w are partially overlapped with each other. It is possible to reduce the area of the region where the resistance is likely to decrease. Thereby, it is possible to suppress a reduction in optical characteristics of the entire liquid crystal device 1. Note that the region where the regions u and w overlap in a plan view can be in parallel orientation as in the normal OCB mode.

(Modification 4)
The liquid crystal device 1 may be a transflective type. FIG. 15A is a plan view of the pixel 4 when the transflective type is adopted, and FIG. 15B is a cross-sectional view taken along the line CC in FIG. The pixel 4 has a reflective display region R and a transmissive display region T. In the reflective display region R, as shown in FIG. 15B, a reflective film 18 made of aluminum or the like is formed between the interlayer insulating layer 24 and the pixel electrode 16. In the reflective display region R, display is performed by reflecting the external light incident from the counter substrate 30 side by the reflective film 18. Concavities and convexities are formed on the surface of the interlayer insulating layer 24, and the concavities and convexities are also reflected in the reflective film 18. Alternatively, a structure in which a resin having an uneven shape is further laminated between the interlayer insulating layer 24 and the reflective film 18 may be employed. By providing irregularities on the surface of the reflective film 18 in this way, the reflected light from the reflective film 18 can be scattered over a wide range, and the visibility of the display can be improved. In the reflective display region R, a liquid crystal layer thickness adjusting layer 35 is formed between the color filter 32 and the common electrode 36 of the counter substrate 30. The liquid crystal layer thickness adjusting layer 35 can be made of a translucent resin or the like. The thickness of the liquid crystal layer 40 can be changed between the reflective display region R and the transmissive display region T by adjusting the thickness of the liquid crystal layer thickness adjusting layer 35. The thickness of the liquid crystal layer 40 in this modification is 2.5 μm in the reflective display region R and 5 μm in the transmissive display region T. By doing in this way, the optical path length of the light which permeate | transmits the liquid crystal layer 40 can be made substantially equal between the reflective display area | region R and the transmissive display area | region T, and a display quality can be improved. Further, quarter-wave plates 52 and 54 are disposed between the element substrate 10 and the polarizing plate 51 and between the counter substrate 30 and the polarizing plate 53, respectively.

  When applying the alignment regulating force to the surface of the counter substrate 30, as shown in FIG. 15B, after applying the -Y direction alignment regulating force along the direction of the arrow 5C for the first time (step C). For the second time, an orientation regulating force in the + Y direction is applied along the direction of the arrow 5D (step D). A step d is produced on the surface of the counter substrate 30 due to the influence of the liquid crystal layer thickness adjusting layer 35. However, according to the method for applying the alignment regulating force as described above, in step D, the alignment regulation is hidden behind the step d. Even if the region w to which no force is applied is generated, the orientation regulating force can be applied to the region w in the process C preceding this. As a result, the alignment regulating force is applied to substantially the entire surface of the counter substrate 30 and the alignment regulating force is weak, so that it is possible to suppress a problem that reverse transition from bend alignment to splay alignment occurs.

(Modification 5)
In the embodiment and the modification, the element substrate 10 is described as one substrate and the counter substrate 30 is described as the other substrate. However, the counter substrate 30 may be used as one substrate and the element substrate 10 may be the other substrate. Therefore, for example, the alignment regulating force may be applied a plurality of times only on the counter substrate 30 side, and the alignment regulating force on the element substrate 10 side may be applied only once.

(Modification 6)
In the above embodiment and modification, the process A and the process B, or the process C and the process D are performed by the same kind of orientation regulating force applying method (rubbing process or oblique vapor deposition of an inorganic substance). The process A and the process B, or the process C and the process D may be performed by different types of orientation regulating force application methods.

  In addition, each said modification can be implemented in combination with arbitrary other modifications.

It is a figure which shows the structure of a liquid crystal device, (a) is a perspective view, (b) is sectional drawing in the AA in (a). The schematic diagram which shows the orientation state of the liquid crystal molecule in a splay alignment and a bend alignment. The enlarged plan view of a display area. FIG. 6 is an equivalent circuit diagram of various elements and wirings in a display area of the liquid crystal device. It is a figure which shows the structure of a pixel, (a) is a top view, (b) is sectional drawing in the BB line in (a). 3 is a flowchart showing a method for manufacturing the liquid crystal device of the first embodiment. (A) is a figure which shows the formation method of the orientation film by oblique vapor deposition, (b), (c) is sectional drawing of the surface where the inorganic substance was vapor-deposited with the vapor deposition apparatus. 6 is a flowchart showing a method for manufacturing the liquid crystal device of the second embodiment. The top view of the pixel of the liquid crystal device which has a bending part as an initial alignment transition structure. (A) is a top view of the pixel of the liquid crystal device which has a slit as an initial alignment transition structure in a pixel electrode, (b) to (d) is a top view which shows the shape of a slit. It is a top view of the pixel of the liquid crystal device which has the TFT element of the double source structure as an initial alignment transition structure, (a) is a whole figure of a pixel, (b) is an enlarged view of a TFT element. The top view which shows the variation of direction of orientation control force provision. The top view which shows the variation of direction of orientation control force provision. Sectional drawing of the pixel which concerns on the modification 3. FIG. (A) is a top view of the pixel at the time of employ | adopting a transflective type, (b) is sectional drawing in CC line in (a). The perspective view of the mobile telephone as an electronic device. (A) is sectional drawing which shows the rubbing processing method, (b) is sectional drawing of the liquid crystal device of OCB mode of the conventional structure.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Liquid crystal device, 4 ... Pixel, 5A ... Direction of 1st orientation regulation force provision (1st direction), 5B ... Direction of 2nd orientation regulation force provision (2nd direction), 5C, 5D ... Direction of orientation regulation force provision, DESCRIPTION OF SYMBOLS 10 ... Element substrate, 11 ... Substrate, 12 ... Gate line, 14 ... Source line, 15 ... Capacitor line, 15a ... Auxiliary capacitor, 16 ... Pixel electrode, 16a ... Slit, 18 ... Reflective film, 19, 39 ... Alignment film, DESCRIPTION OF SYMBOLS 20 ... TFT element, 23, 24 ... Interlayer insulation layer, 26 ... Photo spacer, 30 ... Opposite substrate, 31 ... Substrate, 32 ... Color filter, 34 ... Light shielding layer, 35 ... Liquid crystal layer thickness adjustment layer, 36 ... Common electrode, DESCRIPTION OF SYMBOLS 40 ... Liquid crystal layer, 40a ... Liquid crystal molecule, 41 ... Sealing material, 42 ... Driver IC, 43 ... Display area, 51, 53 ... Polarizing plate, 55 ... Inorganic substance, 60 ... Deposition apparatus, 61 ... Deposition source, 70 ... Rubbing Roller, 100 ... mobile phone.

Claims (14)

A pair of substrates disposed opposite to each other;
A liquid crystal layer disposed between the pair of substrates and capable of taking either a splay alignment or a bend alignment; and
The surface on the liquid crystal layer side of one of the pair of substrates is provided with an alignment regulating force in the first direction, and then the surface to which the alignment regulating force in the first direction is applied is the first surface. The orientation regulating force is given to the second direction different from the direction of
On the surface of one of the pair of substrates on the liquid crystal layer side, a region for aligning liquid crystal molecules of the liquid crystal layer in the first direction and a region for aligning in the second direction are provided. A liquid crystal device characterized by being provided. The liquid crystal device according to claim 1,
The liquid crystal device according to claim 1, wherein the second direction is 180 degrees different from the first direction. The liquid crystal device according to claim 1, wherein
An alignment film is formed on the surface of the one substrate on the liquid crystal layer side,
At least one of the application of the alignment regulating force in the first direction and the application of the alignment regulating force in the second direction is given an alignment regulating force by performing a rubbing treatment on the alignment film. A liquid crystal device characterized by that. The liquid crystal device according to claim 1, wherein
At least one of the application of the alignment control force in the first direction and the application of the alignment control force in the second direction is an oblique deposition of an inorganic substance on the surface of the one substrate on the liquid crystal layer side. A liquid crystal device characterized in that an alignment regulating force is imparted by doing so. The liquid crystal device according to any one of claims 1 to 4,
The region in which the liquid crystal molecules of the liquid crystal layer are aligned in the first direction is a region in which an alignment regulating force is applied in the first direction and no alignment regulating force is applied in the second direction, A liquid crystal device, wherein a light shielding layer is formed in a region overlapping a region in which liquid crystal molecules of the liquid crystal layer are aligned in the first direction. A liquid crystal device according to any one of claims 1 to 5,
The liquid crystal device according to claim 1, wherein an alignment regulating force is applied to the surface of the other substrate of the pair of substrates on the liquid crystal layer side in the second direction. The liquid crystal device according to claim 6,
Of the at least one liquid crystal layer side of the pair of substrates, a region in which the alignment regulating force is applied in the first direction and the alignment regulating force is not applied in the second direction in a plan view, or the region A liquid crystal device comprising an initial alignment transition structure in a region overlapping with a region extending along the line. The liquid crystal device according to claim 6 or 7,
The surface on the liquid crystal layer side of the other substrate is provided with an alignment regulating force in a direction different from the second direction before applying an alignment regulating force in the second direction. Liquid crystal device. The liquid crystal device according to claim 7 or 8,
Of the one substrate, at least a part of a region where the alignment regulating force is applied in the first direction and the alignment regulating force is not applied in the second direction;
Among the other substrate, at least a part of a region where the alignment regulating force is applied in a direction different from the second direction and the alignment regulating force is not applied in the second direction overlaps in a plan view. A liquid crystal device.   An electronic device comprising the liquid crystal device according to claim 1 in a display unit. A method of manufacturing a liquid crystal device having a pair of substrates disposed opposite to each other,
Step A for applying an orientation regulating force in the first direction to the surface of one of the pair of substrates;
After the step A, the step B of applying an orientation regulating force in a second direction different from the first direction on the surface of the one substrate to which the orientation regulating force is given in the step A;
Bonding the one substrate to the other substrate of the pair of substrates via a sealing material so that the surfaces to which the orientation regulating force is applied face each other, and forming the pair of substrates;
And a step of encapsulating a liquid crystal layer capable of taking either a splay alignment or a bend alignment between the pair of substrates. It is a manufacturing method of the liquid crystal device according to claim 11,
The method for manufacturing a liquid crystal device, wherein the second direction is a direction different from the first direction by 180 degrees. It is a manufacturing method of the liquid crystal device according to claim 11 or 12,
Before the step A, the step of forming an alignment film on the surface of the one substrate,
The process A and the process B are processes for performing a rubbing process on the alignment film. It is a manufacturing method of the liquid crystal device according to claim 11 or 12,
The process A and the process B are processes for obliquely vapor-depositing an inorganic substance on the surface of the one substrate.

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