JP2009098207A - Alignment layer and method for manufacturing the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an alignment layer for achieving high-quality image display having uniform characteristics, and to provide a liquid crystal element and a liquid crystal display device using the alignment layer. <P>SOLUTION: The alignment layer for a liquid crystal comprises an inorganic substance, and the alignment layer is an oblique vapor deposition film formed on a substrate by using at least two kinds of inorganic materials, in which the composition of at least two kinds of inorganic materials differs along the oblique vapor deposition direction. A liquid crystal element and a liquid crystal display device using the above alignment layer are also disclosed. The two kinds of inorganic materials are alumina and silica. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to an alignment film, a method for producing the alignment film, a liquid crystal element using the alignment film, and a liquid crystal display device.

  At present, liquid crystal display devices are widely put into practical use, and it is considered that their use will be further promoted in the future. Such a liquid crystal display device can be classified into a projection type in which an image larger than the size of the liquid crystal element can be observed using a magnifying optical system, and a direct view type in which the liquid crystal element is observed with the same size. .

  Here, since the projection type liquid crystal display device can easily realize a large screen display, it is widely used as a front projector that projects from the front of the screen or a rear projector that projects from the back of the screen. In this projection type liquid crystal display device, a transmissive liquid crystal element or a reflective liquid crystal element is used as the liquid crystal element.

  By the way, in such a projection type liquid crystal display device, a practical brightness can be obtained when projected onto a screen by irradiating the liquid crystal element with extremely strong light. However, when such strong light is irradiated, there is a problem that the liquid crystal element is deteriorated and the life is shortened.

  That is, in the projection type liquid crystal display device, when intense light is continuously irradiated, a deterioration phenomenon such as a voltage holding ratio of the liquid crystal element gradually decreasing occurs, and accordingly, the display quality obtained at the initial stage gradually decreases. Subsequently, it has been clarified that there is a problem that normal display cannot be performed when continuous irradiation with stronger light continues.

  Therefore, as a method for solving such a problem, it is disclosed to use an alignment film made of an inorganic material instead of an organic polymer such as polyimide, which has been widely used conventionally, as an alignment film (for example, (See Patent Document 1). Here, according to Patent Document 1, since the organic alignment film is inherently poor in light resistance, light resistance can be ensured by using an inorganic alignment film instead of the organic alignment film. As a result, strong light is irradiated. This can suppress the phenomenon of deterioration of display quality.

  On the other hand, glass substrates have been used in direct view liquid crystal displays. However, there is a problem that the glass substrate is heavy and easily broken. In response to this problem, a technique for forming a TFT circuit on a plastic substrate is being developed recently. This technique is a technique for manufacturing a process for forming amorphous silicon, polysilicon, or an oxide semiconductor at a temperature (for example, 150 ° C.) or less that a plastic can withstand.

  A liquid crystal display using a plastic TFT substrate made of this low temperature process has also been prototyped. However, in order to put a liquid crystal display into practical use, an alignment film for aligning liquid crystal molecules must also be formed at a low temperature. Here, a polyimide material is generally widely used as the alignment film, but most of the polyimide alignment film requires a high temperature treatment at a firing temperature of about 200 ° C. Therefore, when such a polyimide material is applied at such a low temperature that the plastic substrate can withstand, there is a concern that the reliability of the liquid crystal display may be lowered.

  Therefore, any of the above problems can be solved by using an alignment film made of an inorganic material instead of an organic polymer such as polyimide, which has been widely used conventionally, as the alignment film. That is, regarding the former, for example, according to Patent Document 1, since the organic alignment film has inherently poor light resistance, light resistance can be ensured by using an inorganic alignment film instead of the organic alignment film. As a result, it is possible to suppress the display quality deterioration phenomenon caused by the irradiation of intense light. Moreover, since this inorganic alignment film can be formed at room temperature, it can solve the problem relating to the latter.

  A typical film formation method for the inorganic alignment film is a method called oblique vapor deposition, which is a liquid crystal molecule alignment control method that has been widely known since the 1970s. In this oblique vapor deposition method, silicon oxide is used as an inorganic vapor deposition material. In this oblique vapor deposition method, silicon oxide as a vapor deposition source (hereinafter referred to as SiOx; x is 1 or 2) is vacuum atmosphere. Below, SiOx molecules evaporate when heated to a high temperature or irradiated with an electron beam, and the SiOx molecules reach the deposition target substrate and deposit to form a columnar SiOx (hereinafter referred to as a column). Grows diagonally.

  As another film forming method of the inorganic alignment film, there is a method by ion beam irradiation described in Patent Document 2. This method irradiates ions from a predetermined angle to diamond-like carbon (DLC), amorphous silicon (a-Si), or a film made of SiC by adding carbon to a-Si, or Si2N3. Discloses a method for obtaining the alignment of liquid crystals. According to this, it is disclosed that the pretilt angle when the liquid crystal is aligned by ion irradiation can have different values depending on the material of the alignment film used.

  Here, this oblique deposition process is shown in FIG. In this process, since the deposited material is emitted from the point source as if it were emitted from the point light source, the column grows toward the point source. Thereby, the growth direction of the column is not constant in the plane on the deposition target substrate having a finite area, and the direction is continuously changed as shown in FIG.

Therefore, Patent Document 3 describes a means for suppressing the distribution in the vapor deposition direction. According to this, as shown in FIG. 3, the slit 8 is disposed between the deposition source and the substrate, and the oblique deposition having a certain deposition direction by moving the substrate at a constant speed in the direction indicated by the arrow in the figure. It is described that a film can be formed.
JP 08-136932 A US Pat. No. 6,660,341 B2 JP-A-53-84750

  However, although the orientation of vapor deposition is made constant by the method described in Patent Document 3, there remains a problem that the vapor deposition angle is different between a portion near the vapor deposition source on the substrate surface and a portion far from the vapor deposition source. In order to suppress this difference in angle, the distance between the vapor deposition source and the substrate may be arranged as far as possible. However, this method causes an increase in the size of the apparatus, which increases the cost of the apparatus and may cause a deterioration in productivity, such as a decrease in the throughput of the vacuum process.

  Such a difference in vapor deposition angle appears as a difference in pretilt angle when the liquid crystal is aligned (where the pretilt angle represents the alignment angle of liquid crystal molecules in the vicinity of the substrate-liquid crystal interface). When a difference in pretilt exists, a difference occurs in the threshold voltage when a voltage is applied to the liquid crystal. For example, in the case of the normally black vertical alignment (VA) mode, the display voltage reproducibility on the low gradation side is remarkably deteriorated due to the different threshold voltages, and it is impossible to obtain a high-quality image. .

  Therefore, the present invention has been made in view of such circumstances, and in a liquid crystal element using an alignment film made of an inorganic material obtained by oblique deposition, a high-quality image display capable of obtaining uniform characteristics can be obtained. The present invention provides an alignment film, a manufacturing method thereof, a liquid crystal element using the alignment film, and a liquid crystal display device.

  An alignment film that solves the above problem is a liquid crystal alignment film made of an inorganic material, and the alignment film is an obliquely deposited film formed on a substrate using at least two kinds of inorganic materials, and The composition of the at least two kinds of inorganic materials is different along the direction of the oblique vapor deposition on the substrate.

A reflective liquid crystal element that solves the above-described problems uses the alignment film described above.
A transmissive liquid crystal element that solves the above-described problems uses the alignment film described above.
A projection-type liquid crystal device that solves the above-described problems uses the above-described liquid crystal element.

A liquid crystal element that solves the above-described problems is characterized in that the alignment film is formed on a plastic substrate.
An alignment film manufacturing method that solves the above-described problems is an alignment film manufacturing method in which an alignment liquid crystal film made of an inorganic material is formed on a substrate, and a horizontal alignment with an inorganic material that aligns the liquid crystal vertically to the substrate. Using at least two kinds of inorganic materials including an inorganic material oriented in the above, vapor deposition is performed at different vapor deposition angles with respect to a substrate from two vapor deposition sources in which the inorganic materials having different compositions are arranged.

  The alignment film of the present invention has a pretilt angle when the liquid crystal is aligned even if the distribution of the deposition angle is caused by providing a distribution in the composition of the inorganic material used during oblique deposition. A uniform alignment state without distribution can be obtained. This makes it possible to obtain an inorganic alignment film that can obtain uniform characteristics without increasing the size of the apparatus.

  Further, the present invention can provide a reflective liquid crystal element, a transmissive liquid crystal element, and a projection liquid crystal device using the alignment film.

Hereinafter, the present invention will be described in detail.
The alignment film according to the present invention is an alignment film of a liquid crystal made of an inorganic material, and the alignment film is an obliquely deposited film formed on a substrate using at least two kinds of inorganic materials, and on the substrate The composition of the at least two kinds of inorganic materials is different along the direction of oblique deposition.

  One of the two types of inorganic materials is an inorganic material that orients liquid crystal vertically to the substrate, and the other is an inorganic material that orients liquid crystal horizontally to the substrate, and is an inorganic material that orients vertically. It is preferable that the composition ratio of the horizontally oriented inorganic material with respect to the material becomes larger near the oblique deposition source.

It is preferable that at least any two of alumina, silica, silicon carbide, and silicon nitride is used as the inorganic material.
A reflective liquid crystal element according to the present invention is characterized by using the alignment film.

The transmissive liquid crystal element according to the present invention is characterized by using the alignment film.
A projection type liquid crystal device according to the present invention is characterized by using the above liquid crystal element.
The liquid crystal element according to the present invention is characterized in that the alignment film is formed on a plastic substrate.

  The method for manufacturing an alignment film according to the present invention is a method for manufacturing an alignment film in which an alignment film made of an inorganic liquid crystal is formed on a substrate, and is aligned horizontally with an inorganic material that aligns the liquid crystal vertically with respect to the substrate. Using at least two kinds of inorganic materials including an inorganic material to be deposited, vapor deposition is performed at different vapor deposition angles with respect to a substrate from two vapor deposition sources in which the inorganic materials having different compositions are arranged.

  It is preferable that the vapor deposition angle of the vapor deposition source having the larger composition ratio of the inorganic material horizontally aligning the liquid crystal with respect to the inorganic material aligning the liquid crystal vertically is larger than the vapor deposition angle of the vapor deposition source having the smaller composition ratio. .

Hereinafter, the best mode for carrying out the present invention will be described in detail with reference to the drawings.
As described above, the deposition angle in the deposition from the point source has an in-plane distribution. The distribution angle can be calculated as follows. Here, for simplicity, the substrate is circular.

  Regarding the vapor deposition angle at the substrate center, when the substrate center is the origin as shown in FIGS. 4A and 4B, the angle formed between the line connecting the origin and the vapor deposition source (point source) and the substrate normal is Θ. And Further, an orthogonal projection of a line connecting the origin and the evaporation source to the substrate surface is taken as the y axis, and a direction on the substrate surface and orthogonal to the y axis is taken as the x axis. When an arbitrary point on the substrate is (x, y) and the length between the vapor deposition source and the substrate center is h, the vapor deposition direction φ at (x, y) is expressed by the following equation (1).

  That is, it can be seen that the deposition direction, that is, the column forming direction has a distribution depending on the position where the substrate is disposed. This causes a distribution of display characteristics. Here, if a slit parallel to the y-axis is applied, the value of x can always be zero. Therefore, the vapor deposition direction φ is always zero, and the distribution of the azimuth angle does not occur.

  On the other hand, with respect to the vapor deposition angle, a difference occurs in the vapor deposition angle between a portion near the vapor deposition source on the substrate surface and a portion far from the vapor deposition source. The maximum value and the minimum value of the deposition angle are expressed by the following formula 2, and a distribution within this range occurs.

  Therefore, the larger the distance h between the evaporation source and the substrate, the smaller the amount of distribution. However, this causes the problem of enlarging the device as described above. On the other hand, the distribution can also be suppressed by reducing the distance r from the center of the substrate. However, in this case, since only a small area can be deposited, productivity is remarkably deteriorated.

  Therefore, the present inventors consider that the vapor deposition angle is inevitably generated according to the above formula, and adopt means that does not affect the display characteristics of the liquid crystal even if the distribution of the vapor deposition angle occurs. I thought it was effective. In other words, in the present invention, by providing a distribution in the composition of the alignment film in the substrate, it is possible to adopt a configuration that does not depend on the distribution of the vapor deposition angle. Thereby, even if it has distribution in a vapor deposition angle, the stable display state in which the dispersion | variation in the pretilt angle was suppressed can be obtained.

  As described above, it has been conventionally difficult to obtain a stable characteristic with a large area by oblique deposition, but there is variation in the deposition angle, but by using the alignment film of the present invention. Since the distribution of the pretilt angle can be reduced, a large area process by oblique deposition is possible.

 This makes it possible to realize an element with extremely small variation in characteristics in a liquid crystal element using an inorganic alignment film material that can ensure durability against strong light irradiation. In addition, since the alignment film can be formed at a low temperature such as around room temperature, it is easy to form a highly reliable alignment film on the plastic substrate.

  Table 1 is a table showing the results of observing the alignment state under crossed Nicols after injecting liquid crystal after forming a parallel cell by forming two films of alumina and silica by sputtering and combining the two substrates. Note that the sputtering at this time has a positional relationship in which the target and the substrate face each other, and no oblique film formation is performed. As shown in Table 1, alumina has the property of aligning the liquid crystal horizontally with respect to the substrate, and silica has the property of aligning the liquid crystal vertically with respect to the substrate. It can be seen that the alignment state is completely different depending on the material of the inorganic film used as the alignment film.

  FIG. 5 shows a film formed by sputtering using a target made of alumina, silica, and a mixture thereof in the same manner as described above. After two anti-parallel cells were formed by combining two substrates formed under the same conditions, the liquid crystal was It is a result which shows the result of having injected and observing the molecular inclination angle (pretilt angle) under crossed Nicols. Note that the material sputtered at this time is oblique sputtering that reaches the substrate in an oblique direction, and all materials have the same film formation angle conditions. At this time, when the pretilt angle of the liquid crystal was measured, the silica ratio was substantially constant while maintaining parallel alignment up to about 20%, whereas it was close to vertical alignment by increasing the silica ratio to about 30% or more. The result is obtained. Further, when the silica ratio is further increased to 100% silica, almost complete vertical alignment is obtained. That is, when the silica ratio exceeds a predetermined value, a slightly tilted vertical alignment state is obtained, and when the silica ratio is further increased, the inclination angle gradually changes.

  In other words, the above fact represents a result that the pretilt angle varies depending on the mixing ratio of the vertically oriented material and the horizontally oriented material even when the same film forming conditions are used. Although this result is similar to the experimental fact disclosed in Patent Document 2, the method of the present invention can provide a new pretilt that varies depending on the material even in the film forming method in which orientation is imparted simultaneously with film formation. Based on knowledge.

  Here, when the oblique deposition process is considered again, the distribution shown by the above equation [2] is generated, and the amount can be expressed by geometric calculation. Further, the pretilt angle distribution caused by this is also uniquely determined.

  Therefore, it is possible to improve the uniformity of the pretilt angle by providing the material used during oblique deposition so as not to depend on the uniquely determined pretilt distribution. In other words, during oblique deposition, the side closer to the deposition source on the substrate surface is closer to the vertical orientation, that is, the pretilt angle from the substrate normal is deposited at a small angle, and conversely on the side far from the deposition source on the substrate surface. Vapor deposition is carried out at an angle close to parallel orientation, that is, with a large pretilt angle from the substrate normal. Therefore, for example, when a mixture of alumina and silica is used as a deposition source, a component distribution that does not depend on the distribution of vapor may be applied. Therefore, a uniform pretilt angle can be obtained by providing a distribution in which the alumina component is increased on the side closer to the vapor deposition source and the silica component is increased on the side far from the vapor deposition source.

  Here, the method of giving the distribution cannot be uniquely defined because the value of the pretilt angle changes depending on the type of the liquid crystal material. In the present invention, the composition of the alignment film is appropriately adjusted and used so that the pretilt angle distribution is minimized according to the liquid crystal material used at that time.

  As described above, the alignment film of the liquid crystal element is an inorganic alignment film, and the material and film formation method used for the alignment film are performed based on the above method, whereby a high-quality image with high durability can be displayed.

  Note that the liquid crystal element according to this embodiment described above can be applied to a reflective liquid crystal element and a transmissive liquid crystal element. Further, as a configuration of the liquid crystal display device, a projection type configuration using an enlargement optical system may be employed, or a direct view type configuration in which an image of the size of the liquid crystal element itself is observed may be employed. . At this time, the liquid crystal element used for the projection type can obtain high reliability, and if it is used for the direct view type, it is possible to obtain a high-quality image with no in-plane distribution of display characteristics.

  In the above, examples of the vertical alignment mode have been shown as the liquid crystal mode. However, various alignment modes such as a parallel alignment mode, a HAN (hybrid alignment with different vertical pretilt) mode, an OCB mode, and a TN mode can be used. .

In the above description, the accuracy of the molecular orientation is improved by providing a slit between the vapor deposition source and the substrate. However, the present invention is effective even if the slit is not necessarily provided.
Furthermore, a color filter may be used as a colorization method for a display device using the present liquid crystal element, or a color display method by time division may be used. In particular, for example, when used as a projection type liquid crystal display device using a plurality of liquid crystal elements corresponding to each color of RGB, a characteristic with little variation is obtained in all the liquid crystal elements, so that a color display with good reproducibility is obtained. Therefore, the adoption of this method is effective. That is, for example, in the case of configuring the above-described three-plate projection type liquid crystal display device, stable display can be realized by using the substrate in the present invention, so that the same optical characteristics can always be obtained. As a result, the composite color of the three plates can be stably reproduced. As a result, it is possible to obtain a projection type liquid crystal display device that is effective in reducing the manufacturing process load and thus cost reduction, and having good color reproducibility.

  In addition, although the oblique deposition method has been described as an example of the alignment film forming method of the liquid crystal element, the ion irradiation method, the oblique sputtering method, the alignment control by the photo alignment film using the ultraviolet point light source, the sand blasting, etc. The present invention can be applied to various orientation control methods such as a method for controlling the surface shape. In the present invention, the point source has been mainly described. However, even if it is a surface source, when the deposition surface source is smaller than the substrate size, it may have a radial distribution in the irradiation direction. Even in that case, it is effective to perform the calculation based on the above-mentioned concept and form the element substrate according to the distribution.

Next, the present invention will be described in detail using examples.
In this embodiment, the liquid crystal element 120 shown in FIG. 6 is manufactured. Note that a liquid crystal material having a negative dielectric anisotropy Δε (Merck, model name: MLC-6608) is used as the liquid crystal material, and the cell thickness of the liquid crystal layer 124 is 3.5 microns. The substrates 121 and 127 have a diameter of 200 mm (8 inches). Note that a method for manufacturing the liquid crystal element 120 is as follows.

  When forming the alignment films 123 and 125, the alignment film is formed on the entire surface of the substrate while moving the substrate through the slits shown in FIG. The deposition angle at this time is changed according to the embodiment. Next, after cutting into each element size, a sealing material (not shown) is formed on the two substrates 121 and 127 and overlapped. Here, the orientation processing direction is the direction indicated by the arrow 128, and the upper and lower substrates are combined so that they are in an antiparallel relationship. Next, liquid crystal is injected into the obtained cell, sealed, and then connected to a predetermined peripheral circuit to manufacture the liquid crystal element 120. Note that the liquid crystal element 120 thus manufactured is incorporated into the optical system shown in FIG. 7 to form a projection type liquid crystal display device. Reference numeral 50 denotes an ultra-high pressure mercury lamp, 55 denotes a polarization beam splitter, L1 denotes a trajectory indicating incident light rays, and L2 denotes a trajectory indicating reflected light rays.

Example 1
In this embodiment, an electron beam (EB) type vapor deposition device having two vapor deposition sources is used. As shown in FIG. 8, the first vapor deposition source is disposed at a position close to the substrate, and the second vapor deposition source is disposed obliquely with respect to the substrate. . The two vapor deposition sources are in the same plane (in the paper of FIG. 8), that is, in the same vapor deposition direction as viewed from the substrate. The respective vapor deposition angles are arranged such that the first vapor deposition source is 40 degrees and the second vapor deposition source is 80 degrees. The distance between the deposition source and the center of the substrate is 50 cm. .

  Here, silica is used as the first vapor deposition source, and film formation is simultaneously performed using a mixture of silica and alumina in a ratio of 1: 1 as the second vapor deposition source. Since the film formation rate is high on the side close to the substrate and more films are formed, by taking the arrangement as in this example, the vapor deposition emitted from the second vapor deposition source on the side close to the vapor deposition source The deposition rate of objects increases. As a result, the alumina ratio is relatively high on the side close to the second deposition source (lower side in the drawing) within the substrate surface, and the silica ratio is relatively high on the far side (upper side in the drawing). A film state can be obtained.

  When the composition ratio at this time is measured by XPS (X-ray Photoelectron Spectroscopy), the silica / alumina ratio is approximately 80/20 on the side closer to the deposition source, and the silica / alumina ratio is approximately 95/5 on the side far from the deposition source. As a result, an alignment film having a continuous distribution of components can be obtained.

When a liquid crystal element is manufactured using the substrate thus obtained, a uniform film in which the pretilt angle is constant at about 5 degrees in the plane and the pretilt distribution is suppressed can be obtained.
When an image is observed in the projection type display device using the liquid crystal element obtained here, it is displayed with the same characteristics regardless of the element in any place, and the display image is highly uniform and excellent in display. A quality projection type liquid crystal display device can be obtained.

Example 2
In the same experiment as in Example 1, the same effect can be obtained by using Si ₂ N ₃ instead of alumina.

Example 3
In the same experiment as in Example 1, the same effect can be obtained even if SiC is used instead of alumina.

Comparative Example 1
In this comparative example, the composition has no distribution at all, a uniform substrate is used, and an evaporation source made of a uniform material is used. Silica was used as the material.

  When a liquid crystal element is manufactured using the substrate thus obtained, it becomes an element having a pretilt angle having a distribution in the plane of about 0 to 10 degrees, which is not suitable for practical use.

  The alignment film of the present invention has a pretilt angle when the liquid crystal is aligned even if the distribution of the deposition angle is caused by providing a distribution in the composition of the inorganic material used during oblique deposition. Since a uniform alignment state without distribution can be obtained, it can be used for a reflective liquid crystal element, a transmissive liquid crystal element, and a projection liquid crystal device.

It is a figure which shows the oblique vapor deposition method used for this invention. It is a figure which shows distribution of a vapor deposition direction. It is a figure which shows the moving direction of a slit and a board | substrate. It is a figure which defines the coordinate system showing the in-plane distribution of the vapor deposition angle in vapor deposition from a point source. It is a figure which shows the correlation of the composition of an alignment film, and a pretilt angle. It is a figure which shows the cross-section of the liquid crystal element of this invention. It is a figure which shows the optical system used for the liquid crystal display device of this invention. It is a figure which shows the vapor deposition apparatus used for the Example of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Substrate 5 Deposition source 6 Bell jar 7 Deposition direction 8 Slit 120 Liquid crystal element 121, 127 Substrate 122, 126 Electrode 123, 125 Alignment film 124 Liquid crystal layer 128 Alignment processing direction

Claims (9)

  A liquid crystal alignment film made of an inorganic material, wherein the alignment film is an oblique vapor deposition film formed on a substrate using at least two kinds of inorganic materials, and the oblique vapor deposition direction on the substrate. The alignment film is characterized in that the composition of the at least two kinds of inorganic materials differs along.   One of the two types of inorganic materials is an inorganic material that orients liquid crystal vertically to the substrate, and the other is an inorganic material that orients liquid crystal horizontally to the substrate, and is an inorganic material that orients vertically. The alignment film according to claim 1, wherein a composition ratio of the horizontally oriented inorganic material with respect to the material increases in a direction closer to the oblique deposition source.   The alignment film according to claim 1 or 2, wherein at least any two of alumina, silica, silicon carbide, and silicon nitride is used as the inorganic material.   A reflective liquid crystal element, comprising the alignment film according to claim 1.   A transmissive liquid crystal element comprising the alignment film according to claim 1.   A projection type liquid crystal device using the liquid crystal element according to claim 4.   4. A liquid crystal element, wherein the alignment film according to claim 1 is formed on a plastic substrate.   An alignment film manufacturing method for forming an alignment film of a liquid crystal composed of an inorganic material on a substrate, comprising at least two kinds of inorganic materials including an inorganic material for aligning a liquid crystal vertically to the substrate and an inorganic material for aligning the liquid crystal horizontally A method for producing an alignment film, characterized in that vapor deposition is performed at different vapor deposition angles with respect to a substrate from two vapor deposition sources in which the inorganic materials having different compositions are arranged.  The deposition angle of the deposition source having the larger composition ratio of the inorganic material to horizontally align the liquid crystal to the inorganic material to vertically align the liquid crystal is larger than the deposition angle of the deposition source having the smaller composition ratio. The method for producing an alignment film according to claim 8.

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