JP2009045754A - Low resistivity light attenuation reflection preventing coating layer structure having transmitting surface conductive layer and method of making the same - Google Patents
Low resistivity light attenuation reflection preventing coating layer structure having transmitting surface conductive layer and method of making the same Download PDFInfo
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本発明は、塗布層構造及びその作製方法に関し、特に、透過可能な表面導電層を有する低抵抗光減衰反射防止塗布層構造及びその作製方法に関する。 The present invention relates to a coating layer structure and a manufacturing method thereof, and more particularly, to a low resistance light attenuation antireflection coating layer structure having a transmissive surface conductive layer and a manufacturing method thereof.
従来の反射防止光学塗布層の多層構造は、いずれも、光学塗布層の表層の物質が低屈折率を有するという通則を利用しており、例えば、ＳｉＯ2は屈折率が１．４６、また、ＭｇＦ2は屈折率が１．３８である。
しかしながら、該反射防止塗布層を、ディスプレイ工業、例えば、静電気防止効果のあるパソコンスクリーン、液晶ディスプレイまたはプラズマディスプレイに用いられる低反射ガラスに適用する場合、大量生産の工程では、前記光学塗布層構造の導電層が、絶縁層（例えば、ＳｉＯ2またはＭｇＦ2）で焼結するという課題を有していた。
The conventional multilayer structure of the antireflection optical coating layer uses the general rule that the surface material of the optical coating layer has a low refractive index. For example, SiO 2 has a refractive index of 1.46, MgF 2 has a refractive index of 1.38.
However, when the antireflection coating layer is applied to a low reflection glass used in the display industry, for example, a personal computer screen, a liquid crystal display or a plasma display having an antistatic effect, in the mass production process, The conductive layer has a problem of sintering with an insulating layer (for example, SiO 2 or MgF 2 ).
反射防止塗布層の基本的な設計ルールは、基板表面に形成される第１層が高屈折率（Ｈと表記する）の物質からなり、その上に、低屈折率（Ｌと表記する）の物質からなる第２層を形成するというものである。
したがって、従来の反射防止塗布層の多層構造の設計ルールは、ＨＬＨＬまたはＨＬＨＬＨＬであり、例えば、高屈折率（Ｈ）の物質をＩＴＯ、低屈折率（Ｌ）の物質をＳｉＯ2とすると、前記４層構造の場合は、ガラス／ＩＴＯ／ＳｉＯ2／ＩＴＯ／ＳｉＯ2となる。
前記ＩＴＯは、透明な導電物質であるため、該多層構造の塗布層は１００Ω／ｍ2未満であり、該導電塗布層が接地される際に、電磁干渉（ＥＭＩ）遮蔽または静電気放電に用いることができる。
The basic design rule for the antireflection coating layer is that the first layer formed on the substrate surface is made of a material having a high refractive index (denoted as H), and further, has a low refractive index (denoted as L). A second layer made of a substance is formed.
Accordingly, the conventional design rule for the multilayer structure of the antireflection coating layer is HLHL or HLHLHL. For example, when the material having a high refractive index (H) is ITO and the material having a low refractive index (L) is SiO 2 , In the case of a four-layer structure, it is glass / ITO / SiO 2 / ITO / SiO 2 .
Since the ITO is a transparent conductive material, the coating layer of the multilayer structure is less than 100 Ω / m 2 and is used for electromagnetic interference (EMI) shielding or electrostatic discharge when the conductive coating layer is grounded. Can do.
しかしながら、上記のような従来の光学多層構造は、表面物質がＳｉＯ2であり、かつ、その厚さが１０００Åであり、該ＳｉＯ2は、高密度で不活性で、電気絶縁性に優れていることから、反射防止塗布層をディスプレイ工業に適用する過程において、外層のＳｉＯ2層を、隔てられている焼結ＩＴＯ層に電気的に接続することは困難である。 However, the conventional optical multilayer structure as described above has a surface material of SiO 2 and a thickness of 1000 mm. The SiO 2 is dense and inert, and has excellent electrical insulation. Therefore, in the process of applying the antireflection coating layer to the display industry, it is difficult to electrically connect the outer SiO 2 layer to the separated sintered ITO layer.
このため、金属を前記ＩＴＯ層に接続する接地工程においては、超音波溶接プロセスにより、該ＳｉＯ2層を破って、ハンダボールと前記ＩＴＯ層との良好な接触を確保する必要がある。 For this reason, in the grounding step for connecting metal to the ITO layer, it is necessary to break the SiO 2 layer by an ultrasonic welding process to ensure good contact between the solder ball and the ITO layer.
しかしながら、このプロセスは、反射防止塗布層の大量生産には適しているとは言えない。
しかも、前記超音波溶接プロセスでは、液体錫及び超音波の出力エネルギーにより、微細の汚染物が生じ、また、該超音波溶接プロセスでは、前記該絶縁層を均一な深さで破り、均一な接触抵抗を得られるとは限らないため、バスライン毎に非持久性の接触抵抗を発生する場合がある。
However, this process is not suitable for mass production of antireflection coating layers.
In addition, in the ultrasonic welding process, fine contaminants are generated by the output energy of liquid tin and ultrasonic waves, and in the ultrasonic welding process, the insulating layer is broken at a uniform depth to achieve uniform contact. Since resistance cannot always be obtained, permanent contact resistance may be generated for each bus line.
このような問題点は、従来の電磁干渉防止及び反射防止塗布層を用いるプロセスでの歩留まり及び信頼性を低下させる。 Such problems reduce the yield and reliability of conventional processes using anti-electromagnetic interference and anti-reflection coating layers.
本発明は上記技術的課題を解決するためになされたものであり、半導体や、光学ヘッド、液晶ディスプレイ、陰極線管、建築用ガラス、タッチセンサ、スクリーンフィルタ、プラスチックスクリーン板塗布層等に好適に用いることができる透過可能な表面導電層を有する低抵抗光減衰反射防止塗布層構造を提供することを目的とするものである。 The present invention has been made to solve the above technical problem, and is suitably used for semiconductors, optical heads, liquid crystal displays, cathode ray tubes, architectural glass, touch sensors, screen filters, plastic screen plate coating layers, and the like. An object of the present invention is to provide a low-resistance light-attenuating antireflection coating layer structure having a transmissive surface conductive layer.
上記目的を達成するため、本発明は、基板と、前記基板の表面に形成される塗布層モジュールとを含み、前記塗布層モジュールは、複数のチタン含有酸化物及び炭素の混合物塗布層と、複数の金属塗布層とが交互に積層して構成されていることを特徴とする透過可能な表面導電層を有する低抵抗光減衰反射防止塗布層構造を提供する。 To achieve the above object, the present invention includes a substrate and a coating layer module formed on the surface of the substrate, wherein the coating layer module includes a plurality of titanium-containing oxide and carbon mixture coating layers, and a plurality of coating layers. The present invention provides a low-resistance light-attenuating antireflection coating layer structure having a transmissive surface conductive layer, wherein the metal coating layers are alternately laminated.
前記塗布層モジュールは、前記基板の表面に形成された第１塗布層と、前記第１塗布層上に形成された第２塗布層と、前記第２塗布層上に形成された第３塗布層と、前記第３塗布層上に形成された第４塗布層と、前記第４塗布層上に形成された第５塗布層と、前記第５塗布層上に形成された第６塗布層と、前記第６塗布層上に形成された第７塗布層と、前記第７塗布層上に形成された第８塗布層と、前記第８塗布層上に形成された第９塗布層とを含み、前記第１塗布層、前記第３塗布層、前記第５塗布層、前記第７塗布層及び前記第９塗布層は、いずれも、チタン含有酸化物及び炭素の混合物塗布層であり、前記第２塗布層、前記第４塗布層、前記第６塗布層及び前記第８塗布層は、いずれも、金属塗布層であることが好ましい。 The coating layer module includes a first coating layer formed on the surface of the substrate, a second coating layer formed on the first coating layer, and a third coating layer formed on the second coating layer. A fourth coating layer formed on the third coating layer, a fifth coating layer formed on the fourth coating layer, a sixth coating layer formed on the fifth coating layer, A seventh coating layer formed on the sixth coating layer; an eighth coating layer formed on the seventh coating layer; and a ninth coating layer formed on the eighth coating layer; Each of the first coating layer, the third coating layer, the fifth coating layer, the seventh coating layer, and the ninth coating layer is a mixture coating layer of a titanium-containing oxide and carbon, and the second coating layer. The coating layer, the fourth coating layer, the sixth coating layer, and the eighth coating layer are preferably all metal coating layers.
また、前記チタン含有酸化物は二酸化チタン、前記金属塗布層は銀であり、かつ、前記チタン含有酸化物及び炭素の混合物塗布層の屈折率は、前記金属塗布層の屈折率よりも高いことが好ましい。 The titanium-containing oxide is titanium dioxide, the metal coating layer is silver, and the refractive index of the titanium-containing oxide and carbon mixture coating layer is higher than the refractive index of the metal coating layer. preferable.
さらに、前記第１塗布層、前記第３塗布層、前記第５塗布層、前記第７塗布層及び前記第９塗布層は、いずれも、屈折率が２．４５であり、前記第２塗布層、前記第４塗布層、前記第６塗布層及び前記第８塗布層は、いずれも、屈折率が０．１〜０．５であることが好ましい。 Further, the first coating layer, the third coating layer, the fifth coating layer, the seventh coating layer, and the ninth coating layer all have a refractive index of 2.45, and the second coating layer The fourth coating layer, the sixth coating layer, and the eighth coating layer all preferably have a refractive index of 0.1 to 0.5.
また、前記第１塗布層は厚さ３０ｎｍ、前記第２塗布層は厚さ１５ｎｍ、前記第３塗布層は厚さ６６ｎｍ、前記第４塗布層は厚さ１５ｎｍ、前記第５塗布層は厚さ６０ｎｍ、前記第６塗布層は厚さ１５ｎｍ、前記第７塗布層は厚さ７０ｎｍ、前記第８塗布層は厚さ１５ｎｍ、前記第９塗布層は厚さ４０ｎｍであることが好ましい。 The first coating layer is 30 nm thick, the second coating layer is 15 nm thick, the third coating layer is 66 nm thick, the fourth coating layer is 15 nm thick, and the fifth coating layer is thick. Preferably, the sixth coating layer has a thickness of 15 nm, the seventh coating layer has a thickness of 70 nm, the eighth coating layer has a thickness of 15 nm, and the ninth coating layer has a thickness of 40 nm.
さらに、前記塗布層モジュールの上面の周縁に塗布された接地するための導電層を備えていることが好ましい。 Furthermore, it is preferable that a conductive layer for grounding is provided on the periphery of the upper surface of the coating layer module.
また、本発明は、基板を提供する工程と、前記基板の表面に塗布層モジュールを形成する工程とを含み、前記塗布層モジュールは、複数のチタン含有酸化物及び炭素の混合物塗布層と、複数の金属塗布層とが交互に積層されて構成されることを特徴とする透過可能な表面導電層を有する低抵抗光減衰反射防止塗布層構造の作製方法を提供する。 In addition, the present invention includes a step of providing a substrate and a step of forming a coating layer module on the surface of the substrate, the coating layer module including a plurality of titanium-containing oxide and carbon mixture coating layers, and a plurality of coating layers. The present invention provides a method for producing a low-resistance light-attenuating antireflection coating layer structure having a transmissive surface conductive layer, wherein the metal coating layers are alternately laminated.
本発明に係る透過可能な表面導電層を有する低抵抗光減衰反射防止塗布層構造は、半導体や、光学ヘッド、液晶ディスプレイ、陰極線管、建築用ガラス、タッチセンサ、スクリーンフィルタ、プラスチックスクリーン板塗布層等に好適に適用することができる。
前記低抵抗光減衰反射防止塗布層構造は、特に、その塗布層構造の表層が、良好な導電特性を有するため、接地プロセスにおける稼動負荷が軽減され、大量生産の歩留まり及び信頼性を向上することができ、液晶ディスプレイまたはプラズマディスプレイのガラス基板またはプラスチック基板に好適に適用することができる。
The low-resistance light-attenuating antireflection coating layer structure having a transparent surface conductive layer according to the present invention includes a semiconductor, an optical head, a liquid crystal display, a cathode ray tube, architectural glass, a touch sensor, a screen filter, and a plastic screen plate coating layer. It can apply suitably to.
The low resistance light attenuation antireflection coating layer structure has a good conductive property, in particular, the surface layer of the coating layer structure reduces the operating load in the grounding process, and improves the yield and reliability of mass production. And can be suitably applied to a glass substrate or a plastic substrate of a liquid crystal display or a plasma display.
以下、添付図面を参照して、上記目的を達成するための本発明の技術、手段及び効果を、より詳細に説明するが、本発明は、添付図面及び実施例によって、制限されるものではない。 Hereinafter, the technology, means and effects of the present invention for achieving the above object will be described in more detail with reference to the accompanying drawings, but the present invention is not limited by the accompanying drawings and examples. .
図１は、本発明に係る透過可能な表面導電層を有する低抵抗光減衰反射防止塗布層構造を示す構成図である。図１から分かるように、本発明に係る低抵抗光減衰反射防止塗布層構造は、基板Ｓ及び塗布層モジュールＭを含むものである。
図１において、基板Ｓはプラスチックフィルムまたはガラスである。また、塗布層モジュールＭは、プラズマディスプレイまたは液晶ディスプレイの基本塗布層である。
FIG. 1 is a configuration diagram showing a structure of a low resistance light attenuation antireflection coating layer having a transmissive surface conductive layer according to the present invention. As can be seen from FIG. 1, the low resistance optical attenuation antireflection coating layer structure according to the present invention includes a substrate S and a coating layer module M.
In FIG. 1, the substrate S is a plastic film or glass. The coating layer module M is a basic coating layer of a plasma display or a liquid crystal display.
前記塗布層モジュールＭは、前記基板Ｓの表面に形成された第１塗布層１と、該第１塗布層１上に形成された第２塗布層２と、該第２塗布層２上に形成された第３塗布層３と、該第３塗布層３上に形成された第４塗布層４と、該第４塗布層４上に形成された第５塗布層５と、該第５塗布層５上に形成された第６塗布層６と、該第６塗布層６上に形成された第７塗布層７と、該第７塗布層７上に形成された第８塗布層８と、該第８塗布層８上に形成された第９塗布層９とを含む。 The coating layer module M is formed on the first coating layer 1 formed on the surface of the substrate S, the second coating layer 2 formed on the first coating layer 1, and the second coating layer 2. Third coating layer 3 formed, fourth coating layer 4 formed on third coating layer 3, fifth coating layer 5 formed on fourth coating layer 4, and fifth coating layer A sixth coating layer 6 formed on 5, a seventh coating layer 7 formed on the sixth coating layer 6, an eighth coating layer 8 formed on the seventh coating layer 7, And a ninth coating layer 9 formed on the eighth coating layer 8.
前記第１塗布層１、前記第３塗布層３、前記第５塗布層５、前記第７塗布層７及び前記第９塗布層９は、いずれも、チタン含有酸化物及び炭素の混合物塗布層である。また、前記第２塗布層２、前記第４塗布層４、前記第６塗布層６及び前記第８塗布層８は、いずれも、金属塗布層である。
前記チタン含有酸化物は二酸化チタン（ＴｉＯ2）であり、また、これらの金属塗布層は銀（Ａｇ）である。前記チタン含有酸化物及び炭素の混合物塗布層の屈折率は、前記金属塗布層よりも高い。
The first coating layer 1, the third coating layer 3, the fifth coating layer 5, the seventh coating layer 7, and the ninth coating layer 9 are all a mixture coating layer of a titanium-containing oxide and carbon. is there. The second coating layer 2, the fourth coating layer 4, the sixth coating layer 6 and the eighth coating layer 8 are all metal coating layers.
The titanium-containing oxide is titanium dioxide (TiO 2 ), and these metal coating layers are silver (Ag). The refractive index of the titanium-containing oxide and carbon mixture coating layer is higher than that of the metal coating layer.
上記のように、塗布層モジュールＭは、基板Ｓの表面に形成され、前記塗布層モジュールＭは、複数のチタン含有酸化物及び炭素の混合物塗布層と、複数の金属塗布層とが交互に積層されて構成される。 As described above, the coating layer module M is formed on the surface of the substrate S, and the coating layer module M has a plurality of titanium-containing oxide and carbon mixture coating layers and a plurality of metal coating layers stacked alternately. Configured.
また、好ましくは、前記第１塗布層、前記第３塗布層、前記第５塗布層、前記第７塗布層及び前記第９塗布層の屈折率は、いずれも、２．４５であり、前記第２塗布層、前記第４塗布層、前記第６塗布層及び前記第８塗布層の屈折率は、いずれも、０．１〜０．５である。 Preferably, the refractive indexes of the first coating layer, the third coating layer, the fifth coating layer, the seventh coating layer, and the ninth coating layer are all 2.45, The refractive indexes of the two coating layers, the fourth coating layer, the sixth coating layer, and the eighth coating layer are all 0.1 to 0.5.
このように、本発明に係る透過可能な表面導電層を有する低抵抗光減衰反射防止塗布層構造の一実施態様としては、第１塗布層、第２塗布層、第３塗布層、第４塗布層、第５塗布層、第６塗布層、第７塗布層、第８塗布層及び第９塗布層の９層を有し、基板に順次配列するように、物理厚さまたは光学厚さで１層毎に形成する。
光学厚さは、膜厚と屈折率との乗積で、設計波長の分数であり、本発明においては、前記設計波長は５２０ｎｍとする。
Thus, as one embodiment of the low resistance light attenuation antireflection coating layer structure having a transmissive surface conductive layer according to the present invention, the first coating layer, the second coating layer, the third coating layer, and the fourth coating layer are used. There are nine layers of a layer, a fifth coating layer, a sixth coating layer, a seventh coating layer, an eighth coating layer, and a ninth coating layer, and the physical thickness or optical thickness is 1 so as to be sequentially arranged on the substrate. Each layer is formed.
The optical thickness is a product of the film thickness and the refractive index, and is a fraction of the design wavelength. In the present invention, the design wavelength is 520 nm.
第１塗布層（基材表面層）は、透過可能なチタン含有酸化物及び炭素の混合物塗布層であり、前記チタン含有酸化物は二酸化チタン（ＴｉＯ2）で、わずかな可視光のみを吸収できるように、設計波長を５２０ｎｍとすると、その屈折率は２．４５であり、その物理厚さは３０ｎｍとなる。 The first coating layer (base material surface layer) is a permeable titanium-containing oxide and carbon mixture coating layer, and the titanium-containing oxide is titanium dioxide (TiO 2 ) and can absorb only a small amount of visible light. Thus, when the design wavelength is 520 nm, the refractive index is 2.45 and the physical thickness is 30 nm.
第２塗布層は、金属塗布層であり、前記金属塗布層は銀（Ａｇ）で、わずかな可視光のみを吸収できるように、設計波長を５２０ｎｍとすると、その屈折率は０．１〜０．５であり、その物理厚さは１５ｎｍとなる。 The second coating layer is a metal coating layer, and the metal coating layer is silver (Ag). When the design wavelength is 520 nm so that only a small amount of visible light can be absorbed, the refractive index is 0.1 to 0. .5, and its physical thickness is 15 nm.
第３塗布層は、透過可能なチタン含有酸化物及び炭素の混合物塗布層であり、前記チタン含有酸化物は二酸化チタン（ＴｉＯ2）で、わずかな可視光のみを吸収でき、設計波長を５２０ｎｍとすると、その屈折率は２．４５であり、その物理厚さは６６ｎｍとなる。 The third coating layer is a mixture coating layer of transmissive titanium-containing oxide and carbon, and the titanium-containing oxide is titanium dioxide (TiO 2 ) and can absorb only a small amount of visible light, and the design wavelength is 520 nm. Then, its refractive index is 2.45, and its physical thickness is 66 nm.
第４塗布層は、金属塗布層であり、前記金属塗布層は銀（Ａｇ）で、わずかな可視光のみを吸収できるように、設計波長を５２０ｎｍとすると、その屈折率は０．１〜０．５であり、その物理厚さは１５ｎｍとなる。 The fourth coating layer is a metal coating layer, and the metal coating layer is silver (Ag). When the design wavelength is 520 nm so that only a small amount of visible light can be absorbed, the refractive index is 0.1 to 0. .5, and its physical thickness is 15 nm.
第５塗布層は、透過可能なチタン含有酸化物及び炭素の混合物塗布層であり、前記チタン含有酸化物は二酸化チタン（ＴｉＯ2）で、わずかな可視光のみを吸収できるように、設計波長を５２０ｎｍとすると、その屈折率は２．４５であり、その物理厚さは６０ｎｍとなる。 The fifth coating layer is a mixture coating layer of transmissive titanium-containing oxide and carbon, and the titanium-containing oxide is titanium dioxide (TiO 2 ) and has a design wavelength so that only a small amount of visible light can be absorbed. If it is 520 nm, its refractive index is 2.45 and its physical thickness is 60 nm.
第６塗布層は、金属塗布層であり、前記金属塗布層は銀（Ａｇ）で、わずかな可視光のみを吸収できるように、設計波長を５２０ｎｍとすると、その屈折率は０．１〜０．５であり、その物理厚さは１５ｎｍとなる。 The sixth coating layer is a metal coating layer, and the metal coating layer is silver (Ag). When the design wavelength is 520 nm so that only a small amount of visible light can be absorbed, the refractive index is 0.1 to 0. .5, and its physical thickness is 15 nm.
第７塗布層は、透過可能なチタン含有酸化物及び炭素の混合物塗布層であり、前記チタン含有酸化物は二酸化チタン（ＴｉＯ2）で、わずかな可視光のみを吸収できるように、設計波長を５２０ｎｍとすると、その屈折率は２．４５で、その物理厚さは７０ｎｍとなる。 The seventh coating layer is a mixture coating layer of transmissive titanium-containing oxide and carbon, and the titanium-containing oxide is titanium dioxide (TiO 2 ) and has a design wavelength so that only a small amount of visible light can be absorbed. If it is 520 nm, its refractive index is 2.45 and its physical thickness is 70 nm.
第８塗布層は、金属塗布層であり、前記金属塗布層は銀（Ａｇ）で、わずかな可視光のみを吸収できるように、設計波長を５２０ｎｍとすると、その屈折率は０．１〜０．５であり、その物理厚さは１５ｎｍとなる。 The eighth coating layer is a metal coating layer, and the metal coating layer is silver (Ag). When the design wavelength is 520 nm so that only a small amount of visible light can be absorbed, the refractive index is 0.1 to 0. .5, and its physical thickness is 15 nm.
第９塗布層は、透過可能なチタン含有酸化物及び炭素の混合物塗布層であり、前記チタン含有酸化物は二酸化チタン（ＴｉＯ2）で、わずかな可視光のみを吸収できるように、設計波長を５２０ｎｍとすると、その屈折率は２．４５であり、その物理厚さは４０ｎｍとなる。 The ninth coating layer is a mixture coating layer of transmissive titanium-containing oxide and carbon, and the titanium-containing oxide is titanium dioxide (TiO 2 ) and has a design wavelength so that only a small amount of visible light can be absorbed. If it is 520 nm, its refractive index is 2.45, and its physical thickness is 40 nm.
前記第１塗布層１、前記第３塗布層３、前記第５塗布層５、前記第７塗布層７及び前記第９塗布層９のチタン含有酸化物及び炭素の混合物塗布層は、いずれも、直流または交流マグネトロンスパッタリング法により形成される。前記第２塗布層２、前記第４塗布層４、前記第６塗布層６及び前記第８塗布層８の金属塗布層も、いずれも、直流または交流マグネトロンスパッタリング法により形成される。また、前記第１塗布層１〜前記第９塗布層９は、インライン方式またはロール・ツー・ロール方式による真空蒸着またはスパッタリングで形成される。 The first coating layer 1, the third coating layer 3, the fifth coating layer 5, the seventh coating layer 7, and the ninth coating layer 9 are all titanium-containing oxide and carbon mixture coating layers, It is formed by a direct current or alternating current magnetron sputtering method. The metal coating layers of the second coating layer 2, the fourth coating layer 4, the sixth coating layer 6 and the eighth coating layer 8 are all formed by direct current or alternating current magnetron sputtering. The first coating layer 1 to the ninth coating layer 9 are formed by vacuum deposition or sputtering by an inline method or a roll-to-roll method.
図２は、本発明に係る透過可能な表面導電層を有する低抵抗光減衰反射防止塗布層構造を示す上面図である。図２から分かるように、本発明に係る低抵抗光減衰反射防止塗布層構造は、さらに、前記塗布層モジュールＭの上面の周縁に塗布された接地するための導電層Ｃを備えている。 FIG. 2 is a top view showing a structure of a low-resistance light-attenuating antireflection coating layer having a transmissive surface conductive layer according to the present invention. As can be seen from FIG. 2, the low-resistance optical attenuation antireflection coating layer structure according to the present invention further includes a conductive layer C for grounding applied to the periphery of the upper surface of the coating layer module M.
このように、該接地するための導電層Ｃは、前記塗布層モジュールＭの第９塗布層の上面の周縁に塗布される。
具体的には、前記塗布層モジュールＭの作製後、該塗布層モジュールＭの上面に、シャッターＢを前記塗布層モジュールＭより小さいサイズとして設置し、前記塗布層モジュールＭの上面の周縁を露出させ、該塗布層モジュールＭの上面の周縁に、導電層Ｃを塗布し、接地させて良好な電気接触状態を得る。その後、前記シャッターＢを除去する。ここで、導電層Ｃには銀ペーストを用いることができる。
Thus, the conductive layer C for grounding is applied to the periphery of the upper surface of the ninth coating layer of the coating layer module M.
Specifically, after the coating layer module M is manufactured, the shutter B is installed on the upper surface of the coating layer module M so as to be smaller than the coating layer module M, and the periphery of the upper surface of the coating layer module M is exposed. The conductive layer C is applied to the periphery of the upper surface of the coating layer module M and grounded to obtain a good electrical contact state. Thereafter, the shutter B is removed. Here, a silver paste can be used for the conductive layer C.
図３は、本発明に係る透過可能な表面導電層を有する低抵抗光減衰反射防止塗布層構造の作製方法のフローチャートである。図３に示すフローチャートから分かるように、本発明に係る低抵抗光減衰反射防止塗布層構造の作製方法は、以下の工程を含む。
Ｓ４００：基板Ｓを用意する工程と、Ｓ４０２：基板Ｓの表面にチタン含有酸化物及び炭素の混合物塗布層である第１塗布層１を形成する工程と、Ｓ４０４：第１塗布層１上に金属塗布層である第２塗布層２を形成する工程と、Ｓ４０６：第２塗布層２上にチタン含有酸化物及び炭素の混合物塗布層である第３塗布層３を形成する工程と、Ｓ４０８：第３塗布層３上に金属塗布層である第４塗布層４を形成する工程と、Ｓ４１０：第４塗布層４上にチタン含有酸化物及び炭素の混合物塗布層である第５塗布層５を形成する工程と、Ｓ４１２：第５塗布層５上に金属塗布層である第６塗布層６を形成する工程と、Ｓ４１４：第６塗布層６上にチタン含有酸化物及び炭素の混合物塗布層である第７塗布層７を形成する工程と、Ｓ４１６：第７塗布層７上に金属塗布層である第８塗布層８を形成する工程と、Ｓ４１８：第８塗布層８上にチタン含有酸化物及び炭素の混合物塗布層である第９塗布層９を形成する工程とを含む。
FIG. 3 is a flowchart of a method for producing a low-resistance light-attenuating antireflection coating layer structure having a transparent surface conductive layer according to the present invention. As can be seen from the flowchart shown in FIG. 3, the method for producing the low-resistance light-attenuating antireflection coating layer structure according to the present invention includes the following steps.
S400: a step of preparing the substrate S, S402: a step of forming the first coating layer 1 which is a mixture coating layer of titanium-containing oxide and carbon on the surface of the substrate S, and S404: a metal on the first coating layer 1 A step of forming a second coating layer 2 that is a coating layer; a step S406: a step of forming a third coating layer 3 that is a mixture coating layer of a titanium-containing oxide and carbon on the second coating layer 2; A step of forming a fourth coating layer 4 which is a metal coating layer on the three coating layer 3; and S410: a fifth coating layer 5 which is a mixture coating layer of a titanium-containing oxide and carbon is formed on the fourth coating layer 4 S412: a step of forming a sixth coating layer 6 that is a metal coating layer on the fifth coating layer 5, and S414: a titanium-containing oxide and carbon mixture coating layer on the sixth coating layer 6 Step of forming the seventh coating layer 7, and S416: seventh coating A step of forming an eighth coating layer 8 that is a metal coating layer on S7, and a step of forming a ninth coating layer 9 that is a mixture coating layer of a titanium-containing oxide and carbon on the eighth coating layer 8 at S418. including.
上記のような低抵抗光減衰反射防止塗布層は、半導体や、光学ヘッド、液晶ディスプレイ、陰極線管、建築用ガラス、タッチセンサ、スクリーンフィルタ、プラスチックスクリーン板塗布層等の工業用途に適用することができる。 The low resistance light attenuation antireflection coating layer as described above can be applied to industrial applications such as semiconductors, optical heads, liquid crystal displays, cathode ray tubes, architectural glass, touch sensors, screen filters, plastic screen plate coating layers, etc. it can.
また、該低抵抗光減衰反射防止塗布層の表層の物質は、透過可能な表面導電層であり、該透過可能な表面導電層の光反射率は０．５％未満であり、前記低抵抗光減衰反射防止塗布層の抵抗は、０．５〜０．７Ω／ｍ2であり、その透過率は５５〜７０％である。 Further, the surface layer material of the low resistance light attenuation antireflection coating layer is a transmissive surface conductive layer, and the transmissive surface conductive layer has a light reflectance of less than 0.5%, and the low resistance light The resistance of the attenuated antireflection coating layer is 0.5 to 0.7 Ω / m 2 , and its transmittance is 55 to 70%.
さらに、本発明に係る塗布層構造は、高導電性であり、プラズマディスプレイに適用される際に、電磁干渉遮蔽、光学的視野角低反射、高表面硬度耐スクラッチ性、適度な光減衰効果等の利点を有している。
例えば、本発明の塗布層構造の表面抵抗は、０．５〜０．７Ω／ｍ2であり、かつ、軍事標準ＭＩＬ−Ｃ−４８４９７の耐スクラッチテストを十分に満たす硬度を有している。
Furthermore, the coating layer structure according to the present invention is highly conductive, and when applied to a plasma display, electromagnetic interference shielding, low optical viewing angle reflection, high surface hardness scratch resistance, moderate light attenuation effect, etc. Has the advantage of
For example, the surface resistance of the coating layer structure of the present invention is 0.5 to 0.7 Ω / m 2 and has a hardness that sufficiently satisfies the scratch resistance test of the military standard MIL-C-48497.
また、前記塗布層構造の表層は、良好な導電特性を有しているため、該透過可能な表面導電層を有する低抵抗光減衰反射防止塗布層構造は、接地プロセスにおける稼動負荷が軽減され、大量生産の歩留まり及び信頼性を向上することができ、液晶ディスプレイまたはプラズマディスプレイのガラス基板またはプラスチック基板に好適に適用することができる。 Further, since the surface layer of the coating layer structure has good conductive properties, the low resistance light attenuation antireflection coating layer structure having the transmissive surface conductive layer reduces the operating load in the grounding process, The yield and reliability of mass production can be improved, and it can be suitably applied to a glass substrate or a plastic substrate of a liquid crystal display or a plasma display.
以上は、本発明の好ましい実施例に過ぎず、本発明を制限するものではない。本発明に係る特許請求の範囲や明細書の記載に基づいて、当業者が適宜なし得る変更や修飾等を加えた実施も、本発明の特許請求の範囲内に包含される。 The above are only preferred embodiments of the present invention and do not limit the present invention. Based on the description of the scope of the claims and the description of the present invention, implementations to which changes and modifications that can be appropriately made by those skilled in the art are included within the scope of the claims of the present invention.
Ｓ 基板
Ｍ 塗布層モジュール
１ 第１塗布層
２ 第２塗布層
３ 第３塗布層
４ 第４塗布層
５ 第５塗布層
６ 第６塗布層
７ 第７塗布層
８ 第８塗布層
９ 第９塗布層
Ｂ シャッター
Ｃ 導電層
S substrate M coating layer module 1 first coating layer 2 second coating layer 3 third coating layer 4 fourth coating layer 5 fifth coating layer 6 sixth coating layer 7 seventh coating layer 8 eighth coating layer 9 ninth coating Layer B Shutter C Conductive layer
Claims (7)
前記第１塗布層、前記第３塗布層、前記第５塗布層、前記第７塗布層及び前記第９塗布層は、いずれも、チタン含有酸化物及び炭素の混合物塗布層であり、
前記第２塗布層、前記第４塗布層、前記第６塗布層及び前記第８塗布層は、いずれも、金属塗布層であることを特徴とする請求項１記載の透過可能な表面導電層を有する低抵抗光減衰反射防止塗布層構造。 The coating layer module includes a first coating layer formed on the surface of the substrate, a second coating layer formed on the first coating layer, and a third coating layer formed on the second coating layer. A fourth coating layer formed on the third coating layer, a fifth coating layer formed on the fourth coating layer, a sixth coating layer formed on the fifth coating layer, A seventh coating layer formed on the sixth coating layer; an eighth coating layer formed on the seventh coating layer; and a ninth coating layer formed on the eighth coating layer;
The first coating layer, the third coating layer, the fifth coating layer, the seventh coating layer, and the ninth coating layer are all a titanium-containing oxide and carbon mixture coating layer,
2. The permeable surface conductive layer according to claim 1, wherein each of the second coating layer, the fourth coating layer, the sixth coating layer, and the eighth coating layer is a metal coating layer. A low-resistance light-attenuating antireflection coating layer structure.
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