JP2009031373A - Liquid crystal display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a liquid crystal display device, capable of preventing light leak by reflection on a side wall of a conductive pattern in a configuration in which the conductive pattern is disposed obliquely to the transmitting axis of a deflecting plate. <P>SOLUTION: The liquid crystal display device 1 comprises a liquid crystal layer LC held between a drive-side substrate 3 and a counter substrate 21, a pixel circuit including a conductive pattern of a signal line 7 or the like and a pixel electrode provided on the liquid crystal layer LC side of the drive-side substrate 3, and deflecting plates 31 and 33 disposed on the outside of the substrates 3 and 21. The conductive pattern of the signal line 7 or the like includes an inclined wiring part p disposed obliquely to the transmitting axis of the deflecting plates 31 and 33, and the inclined wiring part p is formed in a reversed tapered shape increased in the line width toward the liquid crystal layer LC. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a liquid crystal display device, and more particularly to a liquid crystal display device capable of preventing light leakage.

  In recent years, active matrix liquid crystal display devices have been applied not only to OA devices such as personal computers but also to flat TVs, and demands for larger size and higher image quality are increasing. In order to improve the image quality of liquid crystal display devices, improving contrast is one of the most important factors, and improvements are made by improving color filter resin materials and properties of optical films such as polarizing plates. ing. On the other hand, the luminance and viewing angle characteristics are indispensable for improving the image quality along with the contrast, and various display modes have been proposed to improve these characteristics.

  For example, in a vertical alignment type liquid crystal display device, a patterned vertical that disperses the tilting direction of liquid crystal molecules by providing slits in electric field forming electrodes such as pixel electrodes and common electrodes, or providing protrusions on the electric field forming electrodes. An aligned mode (Patterned Vertically Aligned: PVA mode) and a multi-domain vertical aligned mode (Multi Vertically Aligned: MVA mode) have been proposed and are attracting attention as display modes having excellent viewing angle characteristics.

  FIG. 10 shows a schematic configuration diagram of the main part of the liquid crystal display device in these display modes. In the liquid crystal display device shown in this figure, a liquid crystal layer LC is sandwiched between a driving side substrate 201 and a counter substrate 301. On the driving-side substrate 201, a gate insulating film 202, a signal line 203, a scanning line (not shown), and a pixel circuit provided with a thin film transistor are formed. Is provided. On the interlayer insulating film 205, a pixel electrode 207 having a slit 207a is provided for each sub-picture element (herein referred to as a pixel), and a vertical alignment film (not shown) is provided so as to cover the pixel electrode. . On the other hand, a common electrode 303 is provided on the liquid crystal layer LC side on the counter substrate 301, and a vertical alignment film (not shown) is provided so as to cover the common electrode 303. A pair of deflecting plates 209 and 309 are arranged on the outer surfaces of the driving side substrate 201 and the counter substrate 301 with their transmission axes orthogonal to each other, and a backlight is provided outside the deflecting plate 209 of the driving side substrate 201. Has been placed.

  In the liquid crystal display device having the above configuration, in order to improve visibility from an oblique direction, the planar shape of the pixel electrode 207 is bent with respect to the extending direction of the signal line 203, or one pixel electrode is provided. There has been proposed a configuration in which side visibility is further improved by dividing the pixel electrode into two or by making each divided pixel electrode into a planar shape combining parallelograms (see, for example, Patent Document 1 below).

JP 2007-72466 A

  Recently, a low dielectric constant material has been applied to an interlayer insulating film such as an overcoat layer or a flattening layer as a base of the pixel electrode, and the parasitic capacitance between the pixel electrode provided on the interlayer insulating film is reduced. Is planned. As a result, a design in which scanning lines and signal lines are arranged so as to overlap the pixel electrodes can be seen.

  In particular, as described above, in the configuration in which the planar shape of the pixel electrode is bent or the pixel electrode is divided, the layout of electrodes and wirings in the pixel is complicated. For this reason, scanning lines, signal lines, and electrodes formed in the same layer as the scanning lines and signal lines are arranged inside the pixel openings so as to overlap the pixel electrodes.

  For example, when the planar shape of the pixel electrode is a bent shape, or when the divided pixel electrode is a planar shape combining parallelograms, in order to reduce the wiring length, a signal line is formed in the pixel opening. Be placed.

  In addition, in the configuration in which one pixel electrode is divided into a plurality, a structure in which each divided pixel electrode is driven by a separate thin film transistor (TFT) has appeared. In this case, it is necessary to extend the wiring from the TFT to the contact portion between each divided pixel electrode and the TFT, and this extended wiring portion is wired in the pixel opening.

  In general, as shown in FIG. 10 as well, the wiring and electrodes such as the signal line 203 are formed in a cross-sectionally tapered shape that becomes wider from the liquid crystal layer LC side toward the driving side substrate 201. . This is because the interlayer insulating film 205 laminated on the upper layer is formed to have a flat surface, and this interlayer insulating film 205 can sufficiently achieve insulation with the upper conductive layer (for example, the pixel electrode 207) which is the original purpose. It is for doing so. In this case, the backlight light h that has entered through the deflecting plate 209 of the drive-side substrate 201 is reflected on the side wall of the wiring in the pixel opening (here, the signal line 203) and enters the liquid crystal layer LC.

  In general, the optical configuration of the liquid crystal display device is such that when displaying black, the light h from the backlight passes through the polarizing plate 209 so that the polarization direction is aligned with the transmission axis direction of the deflecting plate 209 and the liquid crystal layer LC is formed. By passing the light, the deflection direction is rotated by 90 °, and the light is absorbed by the deflection plate 309 on the counter substrate 301 side.

  In this case, if the direction of the side wall of the signal line 203 with the above-described cross-sectionally tapered shape matches or is orthogonal to the direction of deflection at the deflecting plate 209, the direction of deflection of the light reflected by this side wall does not change. . Therefore, during black display, the light h reflected by the side wall of the signal line 203 is absorbed by the deflection plate 309 on the counter substrate 301 side.

  However, when the signal line 207 is arranged obliquely with respect to the transmission axis of the deflection plate 209, the deflection direction of the light h is changed by reflection on the side wall of the signal line 207. As a result, during black display, the light reflected by the side wall of the signal line 207 passes through the deflecting plate 309 and light leakage occurs, resulting in an increase in black display luminance and a decrease in contrast.

  Therefore, according to the present invention, in a configuration in which the conductive pattern is disposed obliquely with respect to the transmission axis of the deflecting plate, light leakage due to reflection on the side wall of the conductive pattern can be prevented, thereby improving the contrast. An object of the present invention is to provide a liquid crystal display device.

  In order to achieve such an object, a liquid crystal display device of the present invention includes a liquid crystal layer sandwiched between a pair of substrates, a pixel circuit and a pixel electrode on the liquid crystal layer side of at least one of the pair of substrates, and a substrate. In the liquid crystal display device in which the deflecting plate is disposed outside, the conductive pattern constituting the pixel circuit includes a pattern portion disposed obliquely with respect to the transmission axis of the deflecting plate. In particular, the pattern portion arranged obliquely is formed into a reverse-tapered cross-sectional shape whose line width increases toward the liquid crystal layer side.

  In the liquid crystal display device having such a configuration, when light deflected in a predetermined direction by passing through the deflecting plate is incident on the side wall of the conductive pattern portion arranged obliquely with respect to the transmission axis of the deflecting plate, The reflected light is reflected to the incident side on the side wall of the conductive pattern portion formed in a reverse taper shape in cross section. For this reason, it is possible to prevent light having a deflection direction changed by being reflected by the side wall of the conductive pattern portion disposed obliquely with respect to the transmission axis of the deflection plate from entering the liquid crystal layer side.

  As described above, according to the present invention, it is possible to prevent light whose deflection direction has changed with respect to the transmission axis of the incident-side deflection plate from entering the liquid crystal layer side. In a liquid crystal display device having a configuration in which a conductive pattern is arranged, light leakage due to reflection on the side wall of the conductive pattern can be prevented, thereby making it possible to improve contrast.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. Here, an embodiment in which the present invention is applied to an MVA mode or PVA mode liquid crystal display device will be described. First, prior to describing the cross-sectional shape of a specific wiring part, which is a characteristic part of the present invention, a circuit configuration and layout of a liquid crystal display device to which the present invention is applied will be described.

<Circuit configuration of liquid crystal display device>
FIG. 1 is a diagram illustrating an example of a circuit configuration of a liquid crystal display device 1 according to an embodiment. First, the circuit configuration of the liquid crystal display device 1 will be described with reference to FIG.

  In the liquid crystal display device 1 shown in FIG. 1, a display area 3 a and its peripheral area 3 b are set on the drive side substrate 3. In the display region 3a, a plurality of scanning lines 5 and a plurality of signal lines 7 are wired vertically and horizontally, and one pixel corresponding to the intersection of the two scanning lines 5 and one signal line 7 is arranged. It is configured as a pixel array section provided with a. In the display area 3a, a common wiring 9 is wired at a position sandwiched between two scanning lines 5-5. On the other hand, a scanning line driving circuit 5b that scans and drives the scanning lines 5 and a signal line driving circuit 7b that supplies a video signal (that is, an input signal) corresponding to luminance information to the signal lines 7 are disposed in the peripheral region 3b. ing.

  Each pixel a is provided with, for example, two pixel circuits including a thin film transistor Tr as a switching element and a storage capacitor Cs, and further, a pixel electrode 11 including two subpixel electrodes 11a and 11b respectively connected to these pixel circuits. Is provided. It is assumed that the pixel electrode 11 is provided on an interlayer insulating film that covers the pixel circuit, as will be described in detail later using a plan view and a cross-sectional view.

  In each thin film transistor Tr, the gate electrode is connected to the scanning line 5, one of the source / drain electrodes is connected to the signal line 7, and the other of the source / drain electrodes is connected to the storage capacitor Cs and the sub-pixel electrodes 11a and 11b. ing. The other electrode of the capacitive element Cs is connected to the common wiring 9. The common wiring 9 is connected to a common electrode on the counter substrate side which is not shown here.

  The video signal written from the signal line 7 through the thin film transistor Tr is held in the holding capacitor Cs, and a voltage corresponding to the held signal amount is supplied to each subpixel electrode 11a, 11b. .

  The configuration of the pixel circuit as described above is merely an example, and a capacitor element may be provided in the pixel circuit as necessary, or a plurality of transistors may be provided to configure the pixel circuit. In addition, a necessary drive circuit may be added to the peripheral region 2b according to the change of the pixel circuit.

<Liquid crystal display layout>
FIG. 2 is a diagram showing an example of a layout of a liquid crystal display device to which the present invention is applied, and shows three pixels (sub-picture elements) adjacent in the horizontal direction. In the drawing, the transmission axis is indicated by an arrow. Further, FIG. 3 is a schematic cross-sectional configuration diagram showing a characteristic portion of the present embodiment to be described later, and corresponds to the AA ′ cross section of the inclined wiring portion p in FIG. In addition, the same code | symbol is attached | subjected to the component same as FIG.

  As shown in these figures, the first layer on the driving side substrate 3 made of a glass substrate or the like has a scanning line 5 and a common wiring 9 configured using a material having excellent conductivity such as aluminum. Wiring is performed in the first direction (here, the horizontal direction). A plurality of sets of these wirings 5, 9 are arranged, with one set including three common wirings 9 arranged between the two scanning lines 5.

  Each scanning line 5 extends in the horizontal direction, and is broadly patterned as a gate electrode 5g of the thin film transistor Tr in each pixel portion. Each common line 9 extends in the horizontal direction, and is broadly patterned as a lower electrode 9c of the capacitor element Cs in each pixel portion.

  The scanning line 5 and the common wiring 9 as described above are covered with the gate insulating film 13 shown only in the sectional view.

  In the second layer on the gate insulating film, a semiconductor layer 15 serving as an active region of the thin film transistor Tr is provided at a position where it is stacked on the gate electrode 9g.

  On the gate insulating film on which the semiconductor layer 15 is provided, the signal line 7 and the source / drain electrode 7sd of the thin film transistor Tr are provided. Each signal line 7 is made of a material having excellent conductivity such as aluminum, and the source / drain electrode 7sd is also made of the same layer. From the signal line 7, one source / drain electrode 7 sd of the thin film transistor Tr is extended at a position overlapping the semiconductor layer 15 in each pixel portion. The other source / drain electrode sd is wired from the position overlapping the semiconductor layer 15 toward the inside of the pixel.

  In a state of covering the semiconductor layer 15, the signal line 7, and the source / drain electrode 7 sd as described above, an edge film interlayer insulating film composed of the overcoat layer 17 and the planarizing film 19 shown only in the sectional view is provided. .

  In the third layer on the interlayer insulating film, pixel electrodes 11 made of a transparent conductive material such as ITO are arranged. Each pixel electrode 11 includes a first subpixel electrode 11a and a second subpixel electrode 11b which are divided into two in one pixel. These sub-pixel electrodes 11a and 11b are connected to source / drain electrodes 7sd wired in the pixels through connection holes provided in the interlayer insulating film. Further, a portion where the lower electrode 9c formed by widening the intermediate portion of the common wiring 9 and the sub-pixel electrodes 11a and 11b overlap with each other is configured as a capacitive element Cs.

  Here, each of the subpixel electrodes 11a and 11b is formed in a planar shape combining parallelograms inclined to the left and right in the horizontal direction, and is arranged adjacent to the horizontal direction. The inclination angle is, for example, approximately 45 ° with respect to the horizontal direction that is the extending direction of the scanning line 5.

  Among these, the first sub-pixel electrode 11a forms a continuous pattern by arranging four parallelograms inclined in the left direction and four parallelograms inclined in the right direction alternately in the vertical direction. The parallelograms are arranged adjacent to each other in the horizontal direction and inclined in the same direction, and a part of the parallelogram is connected to the continuous pattern. In addition, the second subpixel electrode 11b forms a continuous pattern by arranging parallelograms inclined rightward and parallelograms inclined leftward in the vertical direction, and the first subpixel electrode 11a has 3 The first subpixel electrode 11a is disposed at a position surrounded by the first subpixel electrode 11a.

  In the pixel electrode 11 constituted by the subpixel electrodes 11a and 11b as described above, the inclination of the outer shape of the subpixel electrodes 11a and 11b and the slit between the subpixel electrodes 11a and 11b constitute the liquid crystal molecules m constituting the liquid crystal layer LC. It becomes an orientation-dispersed nucleus.

  It is assumed that such a pixel electrode 11 is covered with a vertical alignment film not shown here.

  In addition, the counter substrate 21 illustrated only in the cross-sectional view is provided on the surface on which the pixel electrode 11 is formed on the driving side substrate 3 as described above. A common electrode 23 common to all the pixels is provided on the surface of the counter substrate 21 facing the pixel electrode 11. The common electrode 23 is provided with slits 23a patterned in accordance with the shape of the pixel electrode 11 as orientation dispersion nuclei.

  Such a common electrode 23 is assumed to be covered with a vertical alignment film not shown here.

  As shown only in the cross-sectional view, the liquid crystal layer LC is sandwiched between the electrodes 11 and 23 on the driving side substrate 3 and the counter substrate 21, and a pair of deflection plates 31 and 33 are disposed outside the substrates 3 and 21. Is arranged. These deflecting plates 31 and 33 are arranged with their transmission axes p1 and p3 orthogonal to each other. For example, the transmission axis of the drive side substrate 3 is set to be substantially parallel to the extending direction of the scanning line 5. .

  Further, a backlight not shown here is arranged outside the deflection plate 31 of the driving side substrate 3 to constitute the liquid crystal display device 1.

  In the above configuration, the scanning line 5, the signal line 7, and the pixel electrode 11 made of a transparent conductive material such as ITO are formed using a material having excellent conductivity such as aluminum, and The source / drain electrodes 7sd are stacked, and these wirings and electrodes are arranged in the pixel openings.

  In particular, it is assumed here that a part of the signal line 7 is wired obliquely with respect to the transmission axes p1 and p3 of the deflection plates 31 and 33. Such an inclined wiring portion p of the signal line 7 is wired, for example, along the inclination direction of the pixel electrode 11, and is approximately 45 ° with respect to the horizontal direction that is the extending direction of the scanning line 5. It is assumed that the wiring is made at approximately 45 ° with respect to p1 and p3.

  As described above, when the inclined wiring portion p is disposed in the pixel opening, as described above, the incident light deflected by the deflecting plate 31 is deflected by being reflected by the side wall of the inclined wiring portion p. Change direction. In particular, the change in the deflection direction is greatest when the inclined wiring portion p is wired at an angle of approximately 45 ° with respect to the transmission axes p1 and p3. The reflected light whose direction of change has changed in this way passes through the deflection plate 33 during black display and causes light leakage.

  Therefore, in the present embodiment, as described in detail below, it is characteristic that the inclined wiring portion p is formed in a reverse taper shape.

<Cross-sectional shape of wiring part>
As shown in the cross-sectional view of FIG. 3, the inclined wiring portion p, which is a part of the signal line 7, is a portion wired obliquely with respect to the transmission axes of the deflection plates 31 and 33, and is disposed in the pixel opening. Is done. Such an inclined wiring portion p is formed in a reverse taper shape, and is inclined so that the side walls on both sides are directed to the driving side substrate 3. This is not limited to the inclined wiring portion p of the signal line 7, but is a conductive pattern made of a reflective material disposed in the pixel opening, that is, the scanning line 5, the common wiring 9, and a part thereof. The same applies to the inclined wiring portion of the lower electrode 9c of the capacitive element Cs.

  On the other hand, of the conductive pattern made of a reflective material such as the scanning line 5, the common wiring 9, and the lower electrode 9c of the capacitive element Cs that is a part of the scanning line 5, the cross-sectional shape of the portion other than the inclined wiring portion p described above is A similar reverse taper shape or a forward taper shape may be used.

  Note that, in the conductive pattern made of a reflective material, if the portion other than the inclined wiring portion p has an inverse taper shape similar to that of the inclined wiring portion p, the conductive pattern having the inclined alignment portion p (here, the signal line) ) Is advantageous in terms of the process. In addition, since all of the conductive pattern portion arranged in the pixel opening has an inversely tapered shape, light leakage due to reflection on the side wall of the conductive pattern can be reliably prevented.

  On the other hand, if the portion other than the inclined wiring portion p in the conductive pattern made of a reflective material has a forward taper shape, the coverage of the interlayer insulating film covering the conductive pattern is improved, and the lower ground of the pixel electrode 11 is flat. Improves. For this reason, the reliability is improved.

<Manufacturing method>
Next, as a method for manufacturing the liquid crystal display device 1, a procedure for forming a wiring (here, the signal line 7) in which the inclined wiring portion p is formed in a reverse-tapered cross-sectional shape will be described based on the cross-sectional process diagram of FIG. . 4 corresponds to the AA ′ cross section and the BB ′ cross section in the plan view of FIG. 2.

  First, as shown in FIG. 4A, after the scanning lines and the common wiring are formed on the driving side substrate 3 made of a glass substrate, the gate insulating film 13 made of silicon nitride is formed so as to cover them. .

  Next, a material whose etching rate is slower than that of the main material film of the signal line to be formed next [for example, molybdenum nitride (MoN) corresponding to the wiring part of the signal line other than the inclined wiring part p on the gate insulating film 13. ] Is formed as a pattern. Here, first, a MoN film is formed by, for example, sputtering molybdenum (Mo) in a nitrogen atmosphere, and then the MoN film is pattern-etched into a desired shape using a resist pattern formed by lithography as an etching stopper. Layer 41 is formed.

  Further, the pattern width of the etching stopper layer 41 is set to be slightly larger than the pattern width of the layer that is the main material of the signal line. For example, in consideration of a process margin for etching or lithography, it may be about 2 to 3 μm or larger on one side.

  Thereafter, as shown in FIG. 4B, an aluminum (Al) film 42 is formed as a main material film of the signal line in a state of covering the etching stopper layer 41. On the Al film 42, a Mo film 43 is formed as a material film layer having a slower etching rate than the Al layer, and a MoN film 44 is formed as a material layer having a slower etching rate. These films 42 to 44 are formed by sputtering, for example.

  Next, as shown in FIG. 4C, a signal line resist pattern 45 is formed on the MoN film 44 by lithography.

  Thereafter, as shown in FIG. 4D, the MoN film 44, the Mo film 43, and the Al film 42 are patterned by etching using the resist pattern 45 as a mask. In this etching, the etching rate is slow in the order of the MoN film 44, the Mo film 43, and the Al42. For this reason, until the etching stopper layer 41 made of the lowermost MoN film is exposed, the line width is patterned narrower toward the lower layer in the order of the MoN film 44, the Mo film 43, and the Al film 42.

  On the other hand, in portions other than the inclined wiring portion p (cross section BB ′), the etching stopper layer 41 is exposed, and the etching rate is decreased under the influence of the etching stopper layer 41 in order from the layer closest to the etching stopper layer 41. . As a result, the molding progresses with the line width increasing toward the lower layer in the order of the MoN film 44, the Mo film 43, the Al film 42, and the etching stopper layer 41.

  Thereby, in the inclined wiring part p (AA ′ cross section) where the etching stopper layer 41 is not provided, the line width is patterned narrower toward the lower layer in the order of the MoN film 44, the Mo film 43, and the Al film 42. An inversely tapered signal line 7 is formed.

  On the other hand, the other portion (BB ′ cross section) provided with the etching stopper layer 41 has a line width toward the lower layer in the order of the MoN film 44, the Mo film 43, the Al film 42, and the etching stopper layer 41. A signal line 7 having a forward tapered shape in which is widely patterned is formed.

  Note that the source / drain electrodes formed in the same layer as the signal line 7 are formed in the same process as described above so as to have a forward tapered shape. Further, after this etching, the resist pattern 45 is removed.

  In the above-described steps, the cross-sectional shape of the signal line 7 can be controlled by adjusting the nitriding rate in the etching stopper layer 41 and the MoN film 44 made of MoN film and the film thickness of the Mo film 43. .

  Next, as shown in FIG. 4 (5), an overcoat layer 17 and a planarizing film 19 are formed in this order so as to cover the signal line 7 and the source / drain electrodes, thereby forming an interlayer insulating film.

  The subsequent steps are performed in the same manner as in a normal method for manufacturing a liquid crystal display device. That is, a connection hole is formed in the interlayer insulating film, a pixel electrode connected to the source / drain electrode through the connection hole is formed on the interlayer insulating film, and a vertical alignment film is formed to cover the pixel electrode. Process.

  According to the liquid crystal display device 1 of the embodiment described above, the inclined wiring portion p in which the light h deflected in a predetermined direction by passing through the deflection plate 31 is disposed obliquely with respect to the transmission axis of the deflection plate 31. Even when the light is incident on the side wall, the light h reflected by the side wall can be prevented from entering the liquid crystal layer LC side.

  Thereby, it is possible to prevent light leakage due to reflection on the side wall of the conductive pattern in the liquid crystal display device 1 having a configuration in which the conductive pattern is disposed obliquely with respect to the transmission axes p1 and p3 of the deflection plates 31 and 33. It is possible to improve the contrast.

  In the above-described embodiment, the configuration in which the present invention is applied to the PVA mode and MVA mode liquid crystal display devices has been described. However, the present invention can be applied to a liquid crystal display device having a conductive pattern that is wired obliquely with respect to the transmission axis of the deflection plate, and the same effect can be obtained.

<Application example>
The display device according to the present invention described above is input to various electronic devices shown in FIGS. 5 to 9 such as digital cameras, notebook personal computers, mobile terminal devices such as mobile phones, video cameras, and the like. The present invention can be applied to display devices for electronic devices in various fields that display a video signal or a video signal generated in the electronic device as an image or video. An example of an electronic device to which the present invention is applied will be described below.

  FIG. 5 is a perspective view showing a television to which the present invention is applied. The television according to this application example includes a video display screen unit 101 including a front panel 102, a filter glass 103, and the like, and is created by using the display device according to the present invention as the video display screen unit 101.

  6A and 6B are diagrams showing a digital camera to which the present invention is applied. FIG. 6A is a perspective view seen from the front side, and FIG. 6B is a perspective view seen from the back side. The digital camera according to this application example includes a light emitting unit 111 for flash, a display unit 112, a menu switch 113, a shutter button 114, and the like, and is manufactured by using the display device according to the present invention as the display unit 112.

  FIG. 7 is a perspective view showing a notebook personal computer to which the present invention is applied. A notebook personal computer according to this application example includes a main body 121 including a keyboard 122 that is operated when characters and the like are input, a display unit 123 that displays an image, and the like. It is produced by using.

  FIG. 8 is a perspective view showing a video camera to which the present invention is applied. The video camera according to this application example includes a main body 131, a lens 132 for shooting an object on a side facing forward, a start / stop switch 133 at the time of shooting, a display unit 134, and the like. It is manufactured by using such a display device.

  FIG. 9 is a diagram showing a portable terminal device to which the present invention is applied, for example, a cellular phone, in which (A) is a front view in an opened state, (B) is a side view thereof, and (C) is in a closed state. (D) is a left side view, (E) is a right side view, (F) is a top view, and (G) is a bottom view. The mobile phone according to this application example includes an upper housing 141, a lower housing 142, a connecting portion (here, a hinge portion) 143, a display 144, a sub display 145, a picture light 146, a camera 147, and the like. And the sub display 145 is manufactured by using the display device according to the present invention.

It is a figure which shows an example of the circuit structure of the liquid crystal display device of embodiment. It is a figure which shows an example of the layout of the liquid crystal display device to which this invention is applied. It is a general | schematic cross-section block diagram which shows the characteristic part of this embodiment. It is sectional process drawing explaining the formation procedure of the signal line in the liquid crystal display device of embodiment. It is a perspective view which shows the television to which this invention is applied. It is a figure which shows the digital camera to which this invention is applied, (A) is the perspective view seen from the front side, (B) is the perspective view seen from the back side. 1 is a perspective view showing a notebook personal computer to which the present invention is applied. It is a perspective view which shows the video camera to which this invention is applied. BRIEF DESCRIPTION OF THE DRAWINGS It is a figure which shows the portable terminal device to which this invention is applied, for example, a mobile telephone, (A) is the front view in the open state, (B) is the side view, (C) is the front view in the closed state , (D) is a left side view, (E) is a right side view, (F) is a top view, and (G) is a bottom view. It is a schematic block diagram of the liquid crystal display device of the conventional MVA mode and PVA mode.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Liquid crystal display device, 3 ... Drive side substrate, 5 ... Scan line (conductive pattern), 5g ... Gate electrode (conductive pattern), 7 ... Signal line (conductive pattern), 7sd ... Source / drain electrode (conductive) ), 9... Common wiring (conductive pattern), 9 c... Lower electrode (conductive pattern), 11... Pixel electrode, 11 a... First subpixel electrode, 11 b. , 31, 33 ... Deflection plate, LC ... Liquid crystal layer, p1, p3 ... Transmission axis, p ... Inclined wiring part (pattern part arranged diagonally)

Claims (5)

A pair of substrates; a liquid crystal layer sandwiched between the substrates; a pixel circuit provided on the liquid crystal layer side of at least one of the pair of substrates; a pixel electrode connected to the pixel circuit; In a liquid crystal display device comprising a deflection plate disposed outside the substrate,
The conductive pattern constituting the pixel circuit includes a pattern portion arranged obliquely with respect to the transmission axis of the deflection plate,
The obliquely arranged pattern portion is formed in a cross-section inverse taper shape whose line width increases toward the liquid crystal layer side. The liquid crystal display device according to claim 1.
The liquid crystal display device, wherein the pattern portion formed in the reverse tapered shape in cross section is disposed at a position overlapping the pixel electrode. The liquid crystal display device according to claim 1.
The conductive pattern includes a pattern portion that is formed into a taper shape in a cross-sectional order together with a pattern portion that is formed into a reverse-tapered cross-sectional shape. The liquid crystal display device according to claim 1.
The liquid crystal display device, wherein the pixel electrode is made of a transparent conductive material, and the conductive pattern is formed by using a reflective material. The liquid crystal display device according to claim 1.
The liquid crystal display device, wherein the pattern portion formed in the reverse taper shape of the cross section is configured to protrude side by side toward the liquid crystal layer.

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