JP2009031023A - Production method of substrate for surface enhanced raman spectroscopic analysis, manufacturing method of micro-tas, and the micro-tas - Google Patents
Production method of substrate for surface enhanced raman spectroscopic analysis, manufacturing method of micro-tas, and the micro-tas Download PDFInfo
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Description
本発明は、表面増強ラマン分光分析に用いるのに好適な表面増強ラマン分光分析用基板の作成方法、この方法を利用したマイクロTAS(Total Analysis System)の製造方法、及び、この製造方法により製造されたマイクロTASに関する。 The present invention relates to a method for producing a substrate for surface-enhanced Raman spectroscopy suitable for use in surface-enhanced Raman spectroscopy, a method for producing a micro TAS (Total Analysis System) using this method, and a method produced by this method. It relates to micro TAS.
ラマン分光分析は、試料にレーザを照射することにより発生するラマン散乱光を検出する分析法で、ウイルス、蛋白質等の生化学物質や環境化学物質の同定、バイオセンサ等に極めて有効な分析技術である。しかし問題点として、ラマン散乱光がレーザの反射光(レイリー散乱)と比較し、極めて微弱なことが挙げられる。これを解決するのが、金属ナノ粒子表面における電場増強効果を利用した表面増強ラマン分光法(SERS)である。このSERSは、金、銀等の金属ナノ粒子表面に生じる電場増強効果を利用して、超高感度な生化学物質の同定を行なうことができる極めて有効な分析技術である。 Raman spectroscopic analysis is an analysis method that detects Raman scattered light generated by irradiating a sample with a laser. It is an extremely effective analytical technique for identification of biochemical substances such as viruses and proteins, environmental chemical substances, biosensors, etc. is there. However, the problem is that the Raman scattered light is extremely weak compared to the reflected light of the laser (Rayleigh scattering). This is solved by surface enhanced Raman spectroscopy (SERS) using the electric field enhancement effect on the surface of the metal nanoparticles. This SERS is an extremely effective analytical technique capable of identifying biochemical substances with extremely high sensitivity by utilizing the electric field enhancement effect generated on the surface of metal nanoparticles such as gold and silver.
このSERSでは、金属ナノ粒子を持つ基板の作成が鍵となる。従来技術として、(1)銀コロイドを溶液中に分散させるもの(特許文献1、2、非特許文献1、2、3)、(2)銀ナノ粒子をガラス基板上に吸着させるもの(特許文献3)、(3)銀を電子ビームリソグラフィによりパターニングする等の方法が挙げられる。 In SERS, the creation of a substrate having metal nanoparticles is a key. As conventional techniques, (1) one in which silver colloid is dispersed in a solution (patent documents 1, 2, non-patent documents 1, 2, 3), (2) silver nanoparticles are adsorbed on a glass substrate (patent documents) 3), (3) A method such as patterning silver by electron beam lithography may be used.
又、銀微粒子の析出方法として、銀薄膜の製作のために、分散剤を加えた上で銀鏡反応を行なった例が報告されている(非特許文献4)。 In addition, as a method for depositing silver fine particles, an example in which a silver mirror reaction is performed after adding a dispersant for the production of a silver thin film has been reported (Non-patent Document 4).
又、発明者は、非特許文献5で、高感度、高再現性、作成が容易で安価なSERS用銀ナノ粒子基板の作成方法を確立している。 Further, the inventor has established a method for producing a silver nanoparticle substrate for SERS that is highly sensitive, highly reproducible, easy to produce and inexpensive in Non-Patent Document 5.
一方、自己組織化単分子膜(SAM)は、シラン等の反応性感応基を親水基として持つ化合物が、固体基板上に吸着することで形成された単分子の膜であり、基板表面の性質を変化させるために有効な手段である。従来技術として、SAMをマスクとして利用し、選択的な皮膜の析出や、エッチングを行なう方法がある(非特許文献6、7)。又、SAMのパターニング方法として、UV照射による方法や、微細なパターンを持つスタンプ表面にSAMを成膜し、基板に転写するマイクロコンタクトプリント法がある(非特許文献8)。 On the other hand, a self-assembled monomolecular film (SAM) is a monomolecular film formed by adsorption of a compound having a reactive sensitive group such as silane as a hydrophilic group onto a solid substrate. It is an effective means for changing. As a conventional technique, there is a method of selectively depositing a film or etching using a SAM as a mask (Non-Patent Documents 6 and 7). As a SAM patterning method, there are a UV irradiation method and a microcontact printing method in which a SAM is formed on a stamp surface having a fine pattern and transferred to a substrate (Non-patent Document 8).
又、非特許文献9には、ポリジメチルシロキサン(PDMS)をSERS基板の作成に用いることが記載されている。 Non-Patent Document 9 describes the use of polydimethylsiloxane (PDMS) for producing a SERS substrate.
発明者が提案した従来のSERS用基板作成方法では、ガラス基板全体に銀ナノ粒子を析出させることが可能であるが、局所的な析出は困難であった。 In the conventional SERS substrate preparation method proposed by the inventors, silver nanoparticles can be deposited on the entire glass substrate, but local deposition is difficult.
SERS用基板にマイクロ流路等を組み合わせ、高感度分析チップとして実用化するためには、局所的に銀ナノ粒子を析出させる技術が不可欠である。しかしながら、自己析出型基板にSAMを用いたものは無かった。 In order to combine a microchannel or the like with a SERS substrate and put it to practical use as a highly sensitive analysis chip, a technique for locally depositing silver nanoparticles is indispensable. However, there is no self-deposition type substrate using SAM.
一方、銀ナノ粒子を、光によりパターニング可能な感光性レジストをマスクとして、エッチングすると、エッチングした後に、レジストを剥がすと、レジストと共に銀の微粒子も剥がれてしまう。また基板上にもレジストやレジスト剥離用の有機溶媒が残留し、基板が汚れてしまうという問題点が有った。 On the other hand, when silver nanoparticles are etched using a photosensitive resist that can be patterned by light as a mask, if the resist is peeled off after etching, silver fine particles are also peeled off together with the resist. Further, there is a problem that the resist and the organic solvent for removing the resist remain on the substrate, and the substrate becomes dirty.
本発明は、前記従来の問題点を解消するべくなされたもので、局所的に銀ナノ粒子を析出可能とすることを課題とする。 The present invention has been made to solve the above-mentioned conventional problems, and an object thereof is to enable silver nanoparticles to be deposited locally.
本発明は、自己析出型基板にSAMで基板表面修飾を施せば、銀ナノ粒子での析出を制御でき、銀ナノ粒子にダメージを与えることなく基板上に残せることに着目してなされたものである。 The present invention has been made by paying attention to the fact that the deposition on the silver nanoparticles can be controlled by applying the substrate surface modification with SAM to the self-deposition type substrate and can be left on the substrate without damaging the silver nanoparticles. is there.
本発明は、表面増強ラマン分光分析用基板の作成に際して、マイクロコンタクトプリント法により自己組織化単分子膜を基板上にパターニングした後、銀の錯イオンを含む溶液に分散剤を加えた銀鏡反応により基板上に銀ナノ粒子を局所的に析出させるようにして、前記課題を解決したものである。 In the production of a substrate for surface-enhanced Raman spectroscopic analysis, the present invention comprises a silver mirror reaction in which a self-assembled monolayer is patterned on a substrate by a microcontact printing method, and then a dispersant is added to a solution containing silver complex ions. The present invention solves the above problem by locally depositing silver nanoparticles on a substrate.
前記自己組織化単分子膜はシラン系とすることができる。 The self-assembled monolayer can be silane-based.
本発明は、又、前記の方法で基板上に銀ナノ粒子の活性サイトを生成した後、該活性サイト及び流路に対応する部分に凹所を形成したカバーを固着することを特徴とするマイクロTASの製造方法を提供するものである。 According to another aspect of the present invention, an active site of silver nanoparticles is generated on a substrate by the above-described method, and then a cover having a recess formed in a portion corresponding to the active site and the channel is fixed. A method for producing TAS is provided.
前記固着前に、酸素プラズマにより、基板表面から自己組織単分子膜を除去し、かつ基板表面を洗浄することができる。 Prior to the fixing, the self-assembled monolayer can be removed from the substrate surface and the substrate surface can be cleaned by oxygen plasma.
本発明は、又、前記の方法で製造されたことを特徴とするマイクロTASを提供するものである。 The present invention also provides a micro TAS manufactured by the above method.
本発明によれば、基板上に銀ナノ粒子を局所的に析出させることができ、例えば局所的なSERS活性サイトを有するマイクロチップの製作が可能となる。又、高精度な銀ナノ粒子パターンを持つ基板を、簡易な操作で大量に生産でき、安価で大量生産性に優れている。更に、本発明によって得られる、どの局所サイトからも、高いラマン信号感度、再現性が得られる。 According to the present invention, silver nanoparticles can be locally deposited on a substrate, and for example, a microchip having a local SERS active site can be manufactured. In addition, a substrate having a highly accurate silver nanoparticle pattern can be produced in a large amount by a simple operation, and is inexpensive and excellent in mass productivity. Furthermore, high Raman signal sensitivity and reproducibility can be obtained from any local site obtained by the present invention.
以下図面を参照して、本発明の実施形態を詳細に説明する。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
本実施形態は、マイクロコンタクトプリント法を用いた、シラン系SAMのガラス基板上へのパターニングによって、局所的にSERS活性サイトを持つ基板製作を実現したものである。 In the present embodiment, a substrate having a SERS active site locally is realized by patterning a silane-based SAM on a glass substrate using a microcontact printing method.
以下、図1を参照して具体的な手順を説明する。 Hereinafter, a specific procedure will be described with reference to FIG.
まず、例えばフォトリソグラフィでパターニングしたレジストを鋳型に、ポリマーを製作するソフトリソグラフィ技術を用いて、図1(A)に示すような、微細なパターンを持つPDMSスタンプ10を作成する。次いで、シラン系SAMであるオクタデシルトリクロロシラン(OTS)を無水トルエンに溶解させ、1%OTS−SAM溶液を作成し、溶液中にPDMSスタンプ10を例えば5分間浸漬させ、ソフトコンタクトさせる。次いで、SAM12が塗布されたPDMSスタンプ10を取出し、図1(A)に示す如く、ガラス基板14にコンタクトプリントする。 First, a PDMS stamp 10 having a fine pattern as shown in FIG. 1A is created by using a soft lithography technique for producing a polymer using a resist patterned by photolithography as a mold, for example. Next, octadecyltrichlorosilane (OTS), which is a silane-based SAM, is dissolved in anhydrous toluene to prepare a 1% OTS-SAM solution, and the PDMS stamp 10 is immersed in the solution for 5 minutes, for example, to make soft contact. Next, the PDMS stamp 10 coated with the SAM 12 is taken out and contact printed on the glass substrate 14 as shown in FIG.
その後、直ちに、例えばヒータ上で加熱処理を施すことにより、図1(B)に示す如く、ガラス基板14上にSAMパターンが形成されたパターン基板16を得る。 Immediately thereafter, for example, a heat treatment is performed on a heater to obtain a pattern substrate 16 having a SAM pattern formed on the glass substrate 14 as shown in FIG.
このパターン基板16に対して、銀鏡反応により銀ナノ粒子24を析出させる。具体的には、図1(C)に示す如く、銀の錯イオンを含む溶液(例えば硝酸銀水溶液にアンモニア水を加えたもの)に分散剤を加えて攪拌した銀微粒子液20に、還元剤22を加えると同時に、パターン基板16を浸す。これにより、SAM12以外の場所にのみ銀ナノ粒子24が析出するため、図1(D)に示す如く、局所的に銀ナノ粒子24が析出したSERS活性サイトを持つSERS基板18を作成することができる。 Silver nanoparticles 24 are deposited on the pattern substrate 16 by a silver mirror reaction. Specifically, as shown in FIG. 1C, a reducing agent 22 is added to a silver fine particle liquid 20 in which a dispersing agent is added and stirred in a solution containing silver complex ions (for example, an aqueous solution of silver nitrate added with aqueous ammonia). At the same time, the pattern substrate 16 is immersed. As a result, since the silver nanoparticles 24 are deposited only at locations other than the SAM 12, as shown in FIG. 1D, the SERS substrate 18 having the SERS active site where the silver nanoparticles 24 are locally deposited can be formed. it can.
前記分散剤としては、例えば酸性基を有するコポリマー、前記還元剤22としては、例えばヒドラジンを用いることができる。 As the dispersant, for example, a copolymer having an acidic group can be used, and as the reducing agent 22, for example, hydrazine can be used.
OTS−SAM溶液へのPDMSの浸漬時間及びソフトコンタクト後の加熱処理時間を変えた時の銀ナノ粒子を有するガラス基板のSEM像を図2に示す。図中の白色部分が析出した銀ナノ粒子である。(a)は浸漬時間30秒で非加熱、(b)は浸漬時間5分で非加熱、(c)は浸漬時間30秒で5分加熱、(d)は浸漬時間5分で加熱時間5分の例である。このように、コンタクトプリント時の条件(SAM溶液への浸漬時間や基板の加熱処理時間)を制御することで、良好な銀ナノ粒子パターンを得ることができる。 The SEM image of the glass substrate which has a silver nanoparticle when the immersion time of PDMS in an OTS-SAM solution and the heat processing time after soft contact are changed is shown in FIG. It is the silver nanoparticle which the white part in the figure deposited. (A) No heating at immersion time of 30 seconds, (b) No heating at immersion time of 5 minutes, (c) Heating at immersion time of 30 seconds for 5 minutes, (d) Heating time of 5 minutes at immersion time of 5 minutes It is an example. Thus, a favorable silver nanoparticle pattern can be obtained by controlling the conditions at the time of contact printing (immersion time in the SAM solution and heat treatment time of the substrate).
本発明を用いて作成したマイクロTASの一例を図3に示す。図3において、31〜33は、本発明により作成されたSERS活性サイト、34はマイクロ流路、36は流路入口、38は流路出口である。 An example of a micro TAS created using the present invention is shown in FIG. In FIG. 3, 31 to 33 are SERS active sites prepared according to the present invention, 34 is a microchannel, 36 is a channel inlet, and 38 is a channel outlet.
このマイクロTAS30は、図4に示すような手順で作成される。 The micro TAS 30 is created in the procedure as shown in FIG.
まず、図1に示したような方法で、図4(A)に示す如く、SERS活性サイト31〜33(図4は31と32を図示)の部分に銀ナノ粒子24が局所的に析出されたSERS基板18を作成する。 First, as shown in FIG. 4 (A), silver nanoparticles 24 are locally deposited on the SERS active sites 31 to 33 (FIG. 4 shows 31 and 32) by the method shown in FIG. A SERS substrate 18 is prepared.
次いで、図4(B)に示す如く、SERS基板18の表面に、例えば50Wの酸素プラズマを0.5秒照射して、SAM12を除くと共に、表面を洗浄、活性化する。 Next, as shown in FIG. 4B, the surface of the SERS substrate 18 is irradiated with, for example, 50 W of oxygen plasma for 0.5 seconds to remove the SAM 12 and clean and activate the surface.
一方、図4(C)に示す如く、マイクロ流路34部分及びSERS活性サイト31〜33(図4は31と32を図示)部分に凹所を形成し、流路入口36及び流路出口38を例えばポンチで穴開けしたPDMSのカバー40を作成する。 On the other hand, as shown in FIG. 4 (C), recesses are formed in the microchannel 34 portion and the SERS active sites 31 to 33 (31 and 32 are shown in FIG. 4), and the channel inlet 36 and the channel outlet 38 are formed. For example, a PDMS cover 40 having a hole punched with a punch is prepared.
このPDMSカバー40の表面にも、図4(D)に示す如く、例えば50Wの酸素プラズマを0.5秒照射し、活性化する。 As shown in FIG. 4D, the surface of the PDMS cover 40 is activated by irradiation with, for example, 50 W oxygen plasma for 0.5 seconds.
次いで図4(E)に示す如く、SERS基板18の表面にPDMSカバー40を反転して接着することにより、マイクロTAS30が製造される。 Next, as shown in FIG. 4E, the micro TAS 30 is manufactured by reversing and bonding the PDMS cover 40 to the surface of the SERS substrate 18.
図5に、0.5秒間の酸素プラズマ処理を行なった時と行わなかった時のSERS活性サイト、及び、ガラス基板からの10mM/lローダミン6Gのラマン信号を示す。酸素プラズマがSERS活性サイトを傷めていないことが分かる。 FIG. 5 shows the SERS active site when oxygen plasma treatment is performed for 0.5 seconds and the Raman signal of 10 mM / l rhodamine 6G from the glass substrate. It can be seen that the oxygen plasma does not damage the SERS active site.
図6に、図3に示したマイクロTASの各SERS活性サイトからの10mM/lローダミン6Gのラマン信号を示す。本発明により作成された局所的なSERS活性サイトは、それぞれ感度、再現性とも非常に高いことがわかる。 FIG. 6 shows a Raman signal of 10 mM / l rhodamine 6G from each SERS active site of the micro TAS shown in FIG. It can be seen that the local SERS active sites prepared by the present invention are very high in both sensitivity and reproducibility.
本実施形態で用いたPDMSスタンプ10は、繰返し使用することができ、低コストな基板製作が可能である。 The PDMS stamp 10 used in this embodiment can be used repeatedly, and a low-cost substrate can be manufactured.
なお、前記実施形態においては、スタンプやカバーがPDMS製とされ、SAMとしてOTSが用いられていたが、スタンプ、カバー、SAMの種類は、これらに限定されない。 In the embodiment, the stamp and the cover are made of PDMS, and the OTS is used as the SAM. However, the types of the stamp, the cover, and the SAM are not limited to these.
又、前記実施形態においては、分散剤として酸性基を有するコポリマーを用い、還元剤としてヒドラジンを用いたが、分散剤や還元剤の種類はこれに限定されない。銀イオンを含む溶液も硝酸銀溶液に限定されず、基板もガラス基板に限定されない。 Moreover, in the said embodiment, the copolymer which has an acidic group was used as a dispersing agent, and the hydrazine was used as a reducing agent, However, The kind of dispersing agent and a reducing agent is not limited to this. The solution containing silver ions is not limited to the silver nitrate solution, and the substrate is not limited to the glass substrate.
10…PDMSスタンプ
12…SAMパターン
14…ガラス基板
16…パターン基板
18…SERS基板
20…銀微粒子液
22…還元剤
24…銀ナノ粒子
30…マイクロTAS
31〜33…SERS活性サイト
34…マイクロ流路
36…流路入口
38…流路出口
40…PDMSカバー
DESCRIPTION OF SYMBOLS 10 ... PDMS stamp 12 ... SAM pattern 14 ... Glass substrate 16 ... Pattern substrate 18 ... SERS substrate 20 ... Silver fine particle liquid 22 ... Reducing agent 24 ... Silver nanoparticle 30 ... Micro TAS
31-33 ... SERS active site 34 ... micro flow path 36 ... flow path inlet 38 ... flow path outlet 40 ... PDMS cover
Claims (5)
銀の錯イオンを含む溶液に分散剤を加えた銀鏡反応により基板上に銀ナノ粒子を局所的に析出させることを特徴とする表面増強ラマン分光(SERS)分析用基板の作成方法。 After patterning the self-assembled monolayer on the substrate by micro contact printing method,
A method for producing a substrate for surface enhanced Raman spectroscopy (SERS) analysis, wherein silver nanoparticles are locally deposited on a substrate by a silver mirror reaction in which a dispersant is added to a solution containing silver complex ions.
該SERS活性サイト及び流路に対応する部分に凹所を形成したカバーを固着することを特徴とするマイクロTASの製造方法。 After generating SERS active sites of silver nanoparticles on a substrate by the method of claim 1,
A method for producing a micro TAS, comprising fixing a cover having a recess in a portion corresponding to the SERS active site and the flow path.
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