JP2009000617A - Device for removing dust on surface of substrate - Google Patents

Device for removing dust on surface of substrate Download PDF

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JP2009000617A
JP2009000617A JP2007163473A JP2007163473A JP2009000617A JP 2009000617 A JP2009000617 A JP 2009000617A JP 2007163473 A JP2007163473 A JP 2007163473A JP 2007163473 A JP2007163473 A JP 2007163473A JP 2009000617 A JP2009000617 A JP 2009000617A
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roll
wiping
peripheral surface
substrate
driven
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JP4716226B2 (en
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Hiroshi Nishiwaki
宏 西脇
Eiji Asao
栄次 浅尾
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Techno Roll Co Ltd
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Techno Roll Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To shorten a stopping time of a device for removing dust on the surface of a substrate accompanying inspecting and repairing by efficiently performing the inspecting and repairing of a wiping-off roll 13, a driving roll 14 and a roll to be driven 16. <P>SOLUTION: In a device for removing dust on the surface of a substrate provided with the wiping-off roll 13 having a sticky peripheral surface sticking and wiping off dust sticking to a substrate flat surface 11, a cleaning pad 21 wiping off dust from the sticky peripheral surface 12 of the wiping-off roll 13, a transfer device 22 for the wiping-off roll reciprocally moving the wiping-off roll 13 between the substrate flat surface 11 and the cleaning pad 21, and a driving roll 14 rotating and driving the wiping-off roll 13 at a position in contact with the cleaning pad 21 apart from the substrate flat surface 11, the roll to be driven 16 in rolling contact with the driving roll 14 is journaled by the rotary shaft 15 of the wiping-off roll 13. The peripheral surface 19 of the roll to be driven 16 is constituted of a softer polymer in rubber hardness compared with the peripheral surface 20 of the roll to be driven 14. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、搬送される平板な基材の平面に接して回転し、基材の平面に付着している塵埃を粘着させて拭き取る基材表面塵埃拭取装置に関するものである。   The present invention relates to a substrate surface dust wiping device that rotates in contact with a plane of a flat substrate to be conveyed and adheres and wipes off dust adhering to the plane of the substrate.

基材表面ゴミ取り装置に清掃パッドを付設し、基材平面から拭き取られて拭取ロールの粘着周面に粘着している塵埃を清掃パッドによって拭き取って粘着周面を無塵状態に保つことは公知である(例えば、特許文献1、2、3参照)。   A cleaning pad is attached to the substrate surface dust removal device, and dust that is wiped off from the substrate surface and adheres to the adhesive peripheral surface of the wiping roll is wiped off with the cleaning pad to keep the adhesive peripheral surface dust-free. Is known (see, for example, Patent Documents 1, 2, and 3).

清掃パッドを具備する基材表面ゴミ取り装置には、拭取ロール移動装置と粘着周面に粘着している塵埃を感知する塵埃感知センサーを付設し、粘着周面に粘着している塵埃が所定量に達したことを塵埃感知センサーが感知して拭取ロール移動装置を起動させ、基材平面から清掃パッドへと拭取ロールを移動させることも公知である(例えば、特許文献4参照)。   The substrate surface dust removal device having a cleaning pad is provided with a wiping roll moving device and a dust detection sensor for detecting dust adhering to the adhesive peripheral surface, and dust adhering to the adhesive peripheral surface is located. It is also known that the dust detection sensor senses that a fixed amount has been reached, activates the wiping roll moving device, and moves the wiping roll from the substrate surface to the cleaning pad (see, for example, Patent Document 4).

基材表面ゴミ取り装置には清掃パッド駆動装置を付設し、拭取ロールの回転軸に平行に清掃パッドを往復移動させて、拭取ロールの粘着周面に粘着している塵埃を清掃パッドによって拭き取って粘着周面を無塵状態に保つことも公知である(例えば、特許文献1、2、3、4参照)。   The substrate surface dust removal device is equipped with a cleaning pad drive, and the cleaning pad is moved back and forth in parallel with the rotation axis of the wiping roll to remove dust adhering to the adhesive peripheral surface of the wiping roll with the cleaning pad. It is also known to wipe off and maintain the adhesive peripheral surface in a dust-free state (see, for example, Patent Documents 1, 2, 3, and 4).

清掃パッドは、その粘着周面との接触面を変えて絶えず無塵状態に保つために、ロール状に巻き取って保持されている。清掃パッドには、粘着周面からの塵埃の離脱を促す洗浄液が付与される。   The cleaning pad is wound and held in a roll shape in order to constantly keep the dust-free state by changing the contact surface with the adhesive peripheral surface. A cleaning liquid is applied to the cleaning pad to promote detachment of dust from the adhesive peripheral surface.

基材表面ゴミ取り装置には、複数本の拭取ロールを設け、それらを交互に清掃パッドへと移動して清掃し、その清掃時には他の拭取ロールが基材平面に接して塵埃除去作用を営むようにすることも公知である(例えば、特許文献1、2、5参照)。   The substrate surface dust removal device is provided with a plurality of wiping rolls, which are alternately moved to a cleaning pad for cleaning, and at the time of cleaning, the other wiping rolls are in contact with the substrate plane to remove dust. It is also publicly known to operate (see, for example, Patent Documents 1, 2, and 5).

拭取ロールは、粘着周面を有するので搬送される基材の平面に接すると、その搬送されて移動する基材に回転駆動されることになる。従って、その基材に付着している塵埃を拭き取る拭取ロールには、それを回転駆動するための駆動ロールを付設する必要はない。
しかし、拭取ロールの粘着周面に粘着している塵埃を清掃パッドによって拭き取る場合には、拭取ロールが基材平面から引き離されているので、拭取ロールを回転駆動するための駆動ロールが必要になる。
Since the wiping roll has an adhesive peripheral surface, when it comes into contact with the plane of the substrate to be conveyed, the wiping roll is rotationally driven by the substrate that is conveyed and moved. Therefore, it is not necessary to attach a driving roll for rotating the wiping roll for wiping off dust adhering to the substrate.
However, when the dust adhering to the adhesive peripheral surface of the wiping roll is wiped off by the cleaning pad, the wiping roll is pulled away from the base material plane, so a drive roll for rotating the wiping roll is provided. I need it.

特開平08−187457号公報(特許第2687118号)Japanese Patent Laid-Open No. 08-187457 (Japanese Patent No. 2687118) 特開平08−281178号公報(特許第3160795号)JP 08-281178 A (Patent No. 3160795) 特開平02−227177号公報(特公平05−79395号)Japanese Patent Laid-Open No. 02-227177 (Japanese Patent Publication No. 05-79395) 特開平08−047674号公報(特許第300705号)JP 08-047674 A (Patent No. 300705) 特開平01−25891号公報(特公平06−47284号)Japanese Patent Laid-Open No. 01-25891 (Japanese Patent Publication No. 06-47284)

拭取ロールの粘着周面12に粘着している塵埃を清掃パッド21によって拭き取る拭取ロール清掃装置については、基材表面ゴミ取り装置から離れた部位に拭取ロール13を回転駆動する駆動ロール14と、その駆動ロール14を回転駆動する駆動モーター33を設ける一方、駆動ロール14にコロガリ接触して回転駆動される被動ロール16を拭取ロール13の回転軸15に軸支することにした。   About the wiping roll cleaning apparatus which wipes off the dust adhering to the adhesive peripheral surface 12 of the wiping roll with the cleaning pad 21, the driving roll 14 that rotationally drives the wiping roll 13 to a part away from the substrate surface dust removing apparatus. And a drive motor 33 that rotationally drives the drive roll 14, while the driven roll 16 that is rotationally driven in contact with the drive roll 14 is supported on the rotary shaft 15 of the wiping roll 13.

しかし、駆動ロール14による被動ロール16の回転駆動は摩擦伝動であり、それらのロールの周面に耐摩耗性に優れた材料を使用するとは言え、定期的に駆動ロール14と被動ロール16を点検し、必要に応じて修理し、場合によっては取替も必要になる。
又、拭取ロールによる基材平面からの塵埃拭取過程において、基材平面11とのスリップによる拭取ロール13の摩耗がないとしても、その粘着周面12に粘着した塵埃を拭き取る洗浄液による粘着周面12の変質や経時的劣化は不可避であり、拭取ロール13を取り外し、定期的に粘着周面12を点検し、必要に応じて粘着周面12を構成している粘着表皮の張替修理も必要となる。
However, the rotational drive of the driven roll 16 by the drive roll 14 is frictional transmission, and although the material having excellent wear resistance is used on the peripheral surface of these rolls, the drive roll 14 and the driven roll 16 are regularly inspected. However, it is repaired as necessary, and in some cases replacement is also necessary.
Further, in the dust wiping process from the base material plane by the wiping roll, even if there is no wear of the wiping roll 13 due to slippage with the base material flat surface 11, the adhesive by the cleaning liquid that wipes off the dust adhered to the adhesive peripheral surface 12. Deterioration and deterioration over time of the peripheral surface 12 are unavoidable, the wiping roll 13 is removed, the adhesive peripheral surface 12 is periodically inspected, and the adhesive skin constituting the adhesive peripheral surface 12 is replaced as necessary. Repair is also required.

そこで、本発明は、拭取ロール13と駆動ロール14と被動ロール16の点検修理を効率的に行い、その点検修理に伴う基材表面ゴミ取り装置の停台時間を短縮化することを目的とする。   Therefore, the present invention aims to efficiently perform inspection and repair of the wiping roll 13, the driving roll 14, and the driven roll 16, and to shorten the stop time of the substrate surface dust removal device accompanying the inspection and repair. To do.

本発明に係る基材表面塵埃拭取装置は、(a) 搬送される平板な基材11の平面に接して回転し、基材11の平面に付着している塵埃を粘着させて拭き取る粘着周面を有する拭取ロール13と、(b) 拭取ロール13の粘着周面12に接触して粘着周面12に粘着している塵埃を拭き取る清掃パッド21と、(c) 基材11の平面と清掃パッド21の間で拭取ロールを往復移動させる拭取ロール移動装置22と、(d) 拭取ロール移動装置22に駆動されて基材平面11から離れて清掃パッド21に接触する部位において拭取ロール13を回転駆動する駆動ロール14とを具備し、(e) 拭取ロール13が清掃パッド21に接触する部位において駆動ロール14にコロガリ接触して回転駆動される被動ロール16が拭取ロール13の回転軸15に軸支されており、(f) その被動ロール16の周面19が駆動ロール14の周面20に比してゴム硬度の柔らかい高分子物質で構成されていることを特徴とする。   The substrate surface dust wiping device according to the present invention is (a) an adhesive circumference that rotates in contact with the plane of the flat substrate 11 to be conveyed and adheres and wipes off dust adhering to the plane of the substrate 11. A wiping roll 13 having a surface, (b) a cleaning pad 21 that contacts the adhesive peripheral surface 12 of the wiping roll 13 and wipes off dust adhering to the adhesive peripheral surface 12, and (c) a flat surface of the substrate 11 A wiping roll moving device 22 that reciprocally moves the wiping roll between the cleaning pad 21 and (d) a portion that is driven by the wiping roll moving device 22 and contacts the cleaning pad 21 away from the substrate plane 11. And (e) a driven roll 16 that is driven to rotate in contact with the driving roll 14 at a portion where the wiping roll 13 contacts the cleaning pad 21. Roll 13 times (F) The peripheral surface 19 of the driven roll 16 is made of a polymer material having a softer rubber hardness than the peripheral surface 20 of the drive roll 14. .

拭取ロールの粘着周面12が摩耗し難くなるとは言え、その粘着周面12に粘着した塵埃を拭き取る洗浄液による粘着周面12の変質や経時的劣化は不可避であり、拭取ロール13を取り外し、粘着周面12を点検し、必要に応じて粘着周面12を構成している粘着表皮を張り替える定期的点検修理が必要となる。しかし、本発明では、駆動ロール14と拭取ロール13との伝動機構を、駆動ロール14と被動ロール16がコロガリ接触する摩擦伝動としたので、定期的点検修理に際して拭取ロール13が取り外し易い。その際、被動ロール16は、拭取ロール13の回転軸15に軸支されているので、拭取ロール13と一緒に取り外すことが出来、従って、被動ロール16だけを取り外す手間が省かれ、粘着周面12の点検修理と同時に被動ロール16の周面19も点検修理することが出来る。   Although the adhesive peripheral surface 12 of the wiping roll is less likely to be worn, it is inevitable that the adhesive peripheral surface 12 is deteriorated or deteriorated over time by the cleaning liquid that wipes off dust adhered to the adhesive peripheral surface 12, and the wiping roll 13 is removed. A periodic inspection and repair is required in which the adhesive peripheral surface 12 is inspected, and the adhesive skin constituting the adhesive peripheral surface 12 is replaced as necessary. However, in the present invention, the transmission mechanism between the driving roll 14 and the wiping roll 13 is a friction transmission in which the driving roll 14 and the driven roll 16 are in contact with each other, so that the wiping roll 13 is easily removed during periodic inspection and repair. At that time, since the driven roll 16 is pivotally supported by the rotating shaft 15 of the wiping roll 13, it can be removed together with the wiping roll 13. Simultaneously with the inspection and repair of the peripheral surface 12, the peripheral surface 19 of the driven roll 16 can be inspected and repaired.

特に、本発明では、駆動ロール14の周面20を被動ロール16の周面19に比してゴム硬度の硬い高分子物質で構成し、駆動ロールの周面20のゴム硬度を被動ロールの周面19に比して硬くしたので、駆動ロール14の耐用性が高まって長期にわたる使用に耐え、従って、長期にわたって駆動ロール14を取り替えずに済み、又、駆動ロール14の点検修理をせずに済む。
このように本発明の基材表面塵埃拭取装置は、拭取ロール13の取り外しが容易であり、粘着周面12と被動ロール16を同時に点検修理することが出来る一方、駆動ロール14の周面20については点検修理が不要となり、又、駆動ロール14を取り外す手間も省かれ、点検修理に伴う停台時間も短縮される等の点で頗る好都合である。
In particular, according to the present invention, the peripheral surface 20 of the drive roll 14 is made of a polymer material having a rubber hardness higher than that of the peripheral surface 19 of the driven roll 16, and the rubber hardness of the peripheral surface 20 of the drive roll is set to the circumference of the driven roll. Since it is harder than the surface 19, the durability of the drive roll 14 is increased and it can withstand long-term use. Therefore, it is not necessary to replace the drive roll 14 over a long period of time, and the drive roll 14 is not inspected and repaired. That's it.
Thus, the substrate surface dust wiping device of the present invention is easy to remove the wiping roll 13 and can simultaneously inspect and repair the adhesive peripheral surface 12 and the driven roll 16, while the peripheral surface of the drive roll 14. As for No. 20, inspection and repair are unnecessary, and the trouble of removing the drive roll 14 is saved, and the stop time associated with inspection and repair is shortened.

被動ロール16の周面19と駆動ロール14の周面20には、高分子物質として、ブチル・ゴム(イソプレン・イソブチレン・ラバー)、ニトリル・ブタジエン・ゴム、水添ニトリル・ブタジエン・ゴム、ポリウレタン、エチレン・プロピレン・ゴム等を含むゴムが使用され、それらの周面のゴム硬度は、その適用するブチル・ゴム(イソプレン・イソブチレン・ラバー)、ニトリル・ブタジエン・ゴム、水添ニトリル・ブタジエン・ゴム、ポリウレタン、エチレン・プロピレン・ゴム等の種類と材質、加硫(架橋)剤や加硫(架橋)促進剤、充填剤、可塑剤等の副資材の種類や配合量等によって調整される。   On the peripheral surface 19 of the driven roll 16 and the peripheral surface 20 of the driving roll 14, butyl rubber (isoprene / isobutylene / rubber), nitrile / butadiene / rubber, hydrogenated nitrile / butadiene / rubber, polyurethane, Rubber containing ethylene, propylene, rubber, etc. is used, and the rubber hardness of those peripheral surfaces is applicable to butyl rubber (isoprene, isobutylene, rubber), nitrile butadiene rubber, hydrogenated nitrile butadiene rubber, It is adjusted according to the type and amount of auxiliary materials such as polyurethane, ethylene, propylene, rubber, and the like, vulcanization (crosslinking) agent, vulcanization (crosslinking) accelerator, filler, plasticizer and the like.

本発明の基材表面塵埃拭取装置を伸縮性のある基材、例えば膜厚が30μm以下の薄手のブラスチックフイルム11の平面に付着している塵埃を粘着させて拭き取るために使用する場合、ブラスチックフイルム11に連れ回りする拭取ロール13の回転が遅れ、ブラスチックフイルム11の走行速度と拭取ロール13の周速との差に起因してブラスチックフイルム11に余分なテンションが掛かり、拭取ロール13から受ける抵抗によって薄手のブラスチックフイルム11が破断したり、皺が発生したり、内部歪みが発生したりしてブラスチックフイルム11の特性が損なわれ易くなる。
そのような場合には、薄手のブラスチックフイルム11から塵埃を粘着させて拭き取る過程で、搬送される薄手のブラスチックフイルム11によってではなく、拭取ロール13を駆動モーターによって積極的に回転駆動し、拭取ロール13の粘着周面での回転速度と薄手のブラスチックフイルム11の搬送速度が常に同じ一定速度になるようにすることが望ましい。
When the substrate surface dust wiping device of the present invention is used for adhering and wiping dust adhering to the surface of a stretchable substrate, for example, a thin plastic film 11 having a film thickness of 30 μm or less, The rotation of the wiping roll 13 that rotates with the plastic film 11 is delayed, and extra tension is applied to the plastic film 11 due to the difference between the running speed of the plastic film 11 and the peripheral speed of the wiping roll 13. Due to the resistance received from the wiping roll 13, the thin plastic film 11 breaks, wrinkles, or internal distortion occurs, and the characteristics of the plastic film 11 are easily impaired.
In such a case, in the process of adhering dust from the thin plastic film 11 and wiping it, the wiping roll 13 is actively rotated by the drive motor, not by the thin plastic film 11 being conveyed. It is desirable that the rotational speed on the adhesive peripheral surface of the wiping roll 13 and the transport speed of the thin plastic film 11 are always the same constant speed.

図2は、拭取ロール13を積極的に回転駆動する基材表面塵埃拭取装置を図示し、拭取ロール13の回転軸15に軸支された被動ロール16にコロガリ接触する駆動ロール14’と、その駆動ロール14’を回転駆動する駆動モーター33’と、基材11の搬送速度を読み取る速度読取装置31と、その速度読取装置31の読み取った速度信号32を駆動モーター33’に伝達する信号伝達手段34を具備し、その基材11から読み取った速度信号32によって拭取ロール13の粘着周面での回転速度と基材11の搬送速度が同速に同調するようになっている。速度読取装置31には、基材11を送り出す送出ロールや基材11を引き出す引出ロール、その送出ロールと引出ロールの間に配置されるガイドロール等の搬送ロールに付設したエンコーダーが適用される。駆動モーター33’には、インダクションモーターやサーボモーター、ステッピングモーター等が適用される。   FIG. 2 illustrates a substrate surface dust wiping device that actively drives the wiping roll 13 to rotate, and a driving roll 14 ′ that contacts the driven roll 16 pivotally supported by the rotating shaft 15 of the wiping roll 13. Then, a drive motor 33 ′ that rotationally drives the drive roll 14 ′, a speed reading device 31 that reads the conveyance speed of the substrate 11, and a speed signal 32 read by the speed reading device 31 are transmitted to the drive motor 33 ′. A signal transmission means 34 is provided, and the rotational speed on the adhesive peripheral surface of the wiping roll 13 and the transport speed of the base material 11 are synchronized with each other by the speed signal 32 read from the base material 11. The speed reader 31 is applied with an encoder attached to a transport roll such as a feed roll that feeds out the base material 11, a pull-out roll that pulls out the base material 11, and a guide roll that is arranged between the feed roll and the pull-out roll. As the drive motor 33 ', an induction motor, a servo motor, a stepping motor, or the like is applied.

この基材11の搬送速度に同調させて拭取ロール13を回転駆動する駆動ロール14’と被動ロール16についても、被動ロール16の周面19を駆動ロール14’の周面20’に比してゴム硬度の柔らかい高分子物質で構成し、定期的点検修理において、拭取ロール13を取り外し易くし、駆動ロール14’の周面20’については点検修理をせずに済むようにする。   For the drive roll 14 ′ and the driven roll 16 that rotate and drive the wiping roll 13 in synchronization with the transport speed of the base material 11, the peripheral surface 19 of the driven roll 16 is also compared with the peripheral surface 20 ′ of the drive roll 14 ′. In the periodic inspection and repair, the wiping roll 13 is easily removed and the peripheral surface 20 ′ of the drive roll 14 ′ is not required to be inspected and repaired.

清掃パッド21は巻取式にし、順次繰り出してクリーンな新しい部分が拭取ロールに触れるようにし、蒸発性の洗浄液を付与して濡らせて拭取ロールの粘着周面12の塵埃を拭き取り易くし、拭取ロールの拭取・清掃を効率的に行う。
基材平面11と清掃パッド21の間で拭取ロールを往復移動させる拭取ロール移動装置22、および、拭取ロール13の回転軸15に平行に清掃パッド21を往復移動させる清掃パッド移動装置については、前記の特許文献1、2、3、4、5等に開示されている従来技術を適用することが出来る。
The cleaning pad 21 is made to be a winding type, and is sequentially drawn out so that a clean new part touches the wiping roll, wetted by applying an evaporative cleaning liquid, and easily wipes off dust on the adhesive peripheral surface 12 of the wiping roll, Efficiently wipes and cleans the wiping roll.
About the wiping roll moving device 22 for moving the wiping roll back and forth between the substrate flat surface 11 and the cleaning pad 21, and the cleaning pad moving device for moving the cleaning pad 21 back and forth parallel to the rotating shaft 15 of the wiping roll 13 The conventional techniques disclosed in the aforementioned Patent Documents 1, 2, 3, 4, 5, etc. can be applied.

本発明に係る基材表面塵埃拭取装置の要部斜視図である。It is a principal part perspective view of the base-material surface dust wiping apparatus which concerns on this invention. 本発明に係る基材表面塵埃拭取装置の要部斜視図である。It is a principal part perspective view of the base-material surface dust wiping apparatus which concerns on this invention.

符号の説明Explanation of symbols

11:基材(平面)
12:粘着周面
13:拭取ロール
14:駆動ロール
15:回転軸
16:被動ロール
19・20:周面
21:清掃パッド
22:拭取ロール移動装置
31:速度読取装置
32:速度信号
33:駆動モーター
34:信号伝達手段
11: Base material (plane)
12: Adhesive peripheral surface 13: Wiping roll 14: Drive roll 15: Rotating shaft 16: Driven roll 19, 20: Peripheral surface 21: Cleaning pad 22: Wiping roll moving device 31: Speed reading device 32: Speed signal 33: Drive motor 34: signal transmission means

Claims (1)

(a) 搬送される平板な基材(11)の平面に接して回転し、基材(11)の平面に付着している塵埃を粘着させて拭き取る粘着周面を有する拭取ロール(13)と、
(b) 拭取ロール(13)の粘着周面(12)に接触して粘着周面(12)に粘着している塵埃を拭き取る清掃パッド(21)と、
(c) 基材(11)の平面と清掃パッド(21)の間で拭取ロールを往復移動させる拭取ロール移動装置(22)と、
(d) 拭取ロール移動装置(22)に駆動されて基材平面(11)から離れて清掃パッド(21)に接触する部位において拭取ロール(13)を回転駆動する駆動ロール(14)とを具備し、
(e) 拭取ロール(13)が清掃パッド(21)に接触する部位において駆動ロール(14)にコロガリ接触して回転駆動される被動ロール(16)が拭取ロール(13)の回転軸(15)に軸支されており、
(f) その被動ロール(16)の周面(19)が駆動ロール(14)の周面(20)に比してゴム硬度の柔らかい高分子物質で構成されている基材表面塵埃拭取装置。
(A) A wiping roll (13) having an adhesive peripheral surface that rotates in contact with the plane of the flat substrate (11) to be conveyed and adheres and wipes off dust adhering to the plane of the substrate (11). When,
(B) a cleaning pad (21) that contacts the adhesive peripheral surface (12) of the wiping roll (13) and wipes off dust adhering to the adhesive peripheral surface (12);
(C) a wiping roll moving device (22) for reciprocating the wiping roll between the flat surface of the substrate (11) and the cleaning pad (21);
(D) a drive roll (14) that is driven by the wiping roll moving device (22) to rotate the wiping roll (13) at a site that is separated from the substrate plane (11) and contacts the cleaning pad (21); Comprising
(E) The driven roll (16) that is rotationally driven in contact with the driving roll (14) at the portion where the wiping roll (13) is in contact with the cleaning pad (21) is the rotating shaft of the wiping roll (13) ( 15)
(F) Substrate surface dust wiping device in which the peripheral surface (19) of the driven roll (16) is made of a polymer material having a softer rubber hardness than the peripheral surface (20) of the drive roll (14). .
JP2007163473A 2007-06-21 2007-06-21 Substrate surface dust wiping device Active JP4716226B2 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113145526A (en) * 2018-07-25 2021-07-23 聂武胜 Summer sleeping mat wiping equipment suitable for families and using method
CN116543642A (en) * 2023-05-06 2023-08-04 唐川 Building engineering safety management system based on BIM

Citations (4)

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Publication number Priority date Publication date Assignee Title
JPS60120863U (en) * 1984-01-24 1985-08-15 キヤノン株式会社 Roller for automatic stamping machine
JPH0647284B2 (en) * 1988-04-09 1994-06-22 テクノロール株式会社 Printer
JP2005179058A (en) * 2003-11-27 2005-07-07 Fuji Xerox Co Ltd Sheet treatment device, automatic document feeder, and image forming device
JP2005318830A (en) * 2004-05-07 2005-11-17 Mutsu Kaden Tokki:Kk Shell surface-cleaning machine

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60120863U (en) * 1984-01-24 1985-08-15 キヤノン株式会社 Roller for automatic stamping machine
JPH0647284B2 (en) * 1988-04-09 1994-06-22 テクノロール株式会社 Printer
JP2005179058A (en) * 2003-11-27 2005-07-07 Fuji Xerox Co Ltd Sheet treatment device, automatic document feeder, and image forming device
JP2005318830A (en) * 2004-05-07 2005-11-17 Mutsu Kaden Tokki:Kk Shell surface-cleaning machine

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113145526A (en) * 2018-07-25 2021-07-23 聂武胜 Summer sleeping mat wiping equipment suitable for families and using method
CN116543642A (en) * 2023-05-06 2023-08-04 唐川 Building engineering safety management system based on BIM
CN116543642B (en) * 2023-05-06 2024-01-05 广东鼎耀工程技术有限公司 Building engineering safety management system based on BIM

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