JP2008293773A - Charged particle beam apparatus - Google Patents

Charged particle beam apparatus Download PDF

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JP2008293773A
JP2008293773A JP2007137564A JP2007137564A JP2008293773A JP 2008293773 A JP2008293773 A JP 2008293773A JP 2007137564 A JP2007137564 A JP 2007137564A JP 2007137564 A JP2007137564 A JP 2007137564A JP 2008293773 A JP2008293773 A JP 2008293773A
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wall
valve plate
hole
charged particle
particle beam
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JP4980794B2 (en
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Sadao Matsumoto
貞夫 松本
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Jeol Ltd
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Jeol Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus in which an O ring of a vacuum partition valve is hardly deteriorated in the charged particle beam apparatus which has a first wall in which a first hole to emit a charged particle beam generated in a charged particle beam generating source is formed and a valve plate which is arranged outside the first wall and on which the O ring capable of contacting with the outside face of the first wall is installed, and has a vacuum sluice valve which holds the inside of the first hole in a vacuum when the O ring contacts with the surrounding of the opening of the first hole outside the first wall and the valve plate closes the first hole of the first wall. <P>SOLUTION: A shielding means (case 211, shield plate 221) 200 to shield scattering electrons, reflecting electrons, X-rays by charged particle beam B is installed between a first hole 103 of the first wall 101 and a valve plate 113 of the vacuum sluice valve 111 in an open state. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、電子顕微鏡、電子ビーム露光装置等の荷電粒子ビーム装置に関し、更に詳しくは、荷電粒子ビーム発生源で発生した荷電粒子ビームが出射する第1の穴が形成された第1の壁と、該第1の壁の外側に配設され、前記第1の壁の外面に当接可能なOリングが設けられた弁板を有し、前記Oリングが前記第1の壁の外面の前記第1の穴の開口の周りに押接し、前記弁板が前記第1の壁の第1の穴を塞ぐ閉状態は、前記第1の穴内を真空に保持する真空仕切弁と、を有する荷電粒子ビーム装置に関する。   The present invention relates to a charged particle beam apparatus such as an electron microscope and an electron beam exposure apparatus, and more specifically, a first wall in which a first hole from which a charged particle beam generated by a charged particle beam generation source is emitted is formed. A valve plate disposed outside the first wall and provided with an O-ring capable of contacting the outer surface of the first wall, wherein the O-ring is formed on the outer surface of the first wall. A closed state in which the valve plate is pressed around the opening of the first hole and the valve plate closes the first hole of the first wall has a vacuum gate valve that holds the inside of the first hole in a vacuum. The present invention relates to a particle beam apparatus.

電子顕微鏡、電子ビーム露光装置等の荷電粒子ビーム装置においては、荷電粒子ビーム発生源から出射された荷電粒子ビーム(以下、電子ビームという)を縮小、偏向する鏡筒には、電子ビームの通路上に、真空仕切弁が組み込まれている。そして、メンテナンス時には、この真空仕切弁を閉じて、荷電粒子ビーム発生源側を真空状態に保持するようにしている(例えば、特許文献1,2、3参照)。 In a charged particle beam apparatus such as an electron microscope or an electron beam exposure apparatus, a charged particle beam (hereinafter referred to as an electron beam) emitted from a charged particle beam generation source is reduced and deflected on an electron beam path. In addition, a vacuum gate valve is incorporated. During maintenance, the vacuum gate valve is closed to keep the charged particle beam generation source side in a vacuum state (see, for example, Patent Documents 1, 2, and 3).

このような真空仕切弁の一例を図5、図6を用いて説明する。図5は真空仕切弁が開状態、図6は真空仕切弁が閉状態を示している。
これらの図において、1は鏡筒内に設けられ、荷電粒子ビーム発生源で発生した電子ビームBが出射する第1の穴3が形成された第1の壁である。第1の壁1と空間を介して第2の壁5が対向するように設けられている。この第2の壁5には、第1の穴3と対向し、第1の穴3から出射する電子ビームBが入射する第2の穴7が形成されている。
An example of such a vacuum gate valve will be described with reference to FIGS. FIG. 5 shows the vacuum gate valve in an open state, and FIG. 6 shows the vacuum gate valve in a closed state.
In these drawings, reference numeral 1 denotes a first wall provided in a lens barrel and formed with a first hole 3 from which an electron beam B generated by a charged particle beam generation source is emitted. The first wall 1 and the second wall 5 are provided so as to face each other through a space. A second hole 7 is formed in the second wall 5 so as to face the first hole 3 and into which the electron beam B emitted from the first hole 3 is incident.

第1の壁1と第2の壁5との間の空間に真空仕切弁11が設けられる。
真空仕切弁11は、第2の壁5の第1の壁1との対向面上を移動可能なベース15を有している。ベース15の第1の壁1との対向面の一方の端部側には弁板13が配設されている。弁板13の第1の壁1との対向面には、第1の壁1の外面に当接可能なOリング18が設けられている。このOリング18の径は、第1の壁1の外面の第1の穴3の開口の周りに押接可能なように、第1の穴3の径より大きく設定されている。
A vacuum gate valve 11 is provided in the space between the first wall 1 and the second wall 5.
The vacuum gate valve 11 has a base 15 that can move on the surface of the second wall 5 facing the first wall 1. A valve plate 13 is disposed on one end side of the surface of the base 15 facing the first wall 1. An O-ring 18 that can contact the outer surface of the first wall 1 is provided on the surface of the valve plate 13 that faces the first wall 1. The diameter of the O-ring 18 is set larger than the diameter of the first hole 3 so as to be able to press around the opening of the first hole 3 on the outer surface of the first wall 1.

ベース15の第1の壁1との対向面の他方の端部側には、ブラケット14が設けられている。このブラケット14には、図示しないエアシリンダのスピンドル等の駆動軸17がピン16を用いて接続されている。従って、駆動源を駆動することにより、真空仕切弁11が開状態である図5では、駆動軸17が矢印A方向に移動し、真空仕切弁11は図6に示す閉状態まで移動し、真空仕切弁11が閉状態である図6では、駆動軸17が矢印C方向に移動し、真空仕切弁11を図5に示す開状態まで移動する。   A bracket 14 is provided on the other end side of the surface of the base 15 facing the first wall 1. A drive shaft 17 such as a spindle of an air cylinder (not shown) is connected to the bracket 14 using a pin 16. Accordingly, by driving the drive source, in FIG. 5 where the vacuum gate valve 11 is in the open state, the drive shaft 17 moves in the direction of arrow A, and the vacuum gate valve 11 moves to the closed state shown in FIG. In FIG. 6 in which the gate valve 11 is closed, the drive shaft 17 moves in the direction of arrow C, and the vacuum gate valve 11 is moved to the open state shown in FIG.

ベース15には、第1のリンク19の一端部が回転可能に取り付けられ、このリンク19の他端部は、弁板13の一方の端部に回転可能に取り付けられている。又、ベース15には、第2のリンク21の一端部が回転可能に取り付けられ、このリンク21の他端部は、弁板13の他方の端部に回転可能に取り付けられている。このため、ベース15と、第1のリンク19と、弁板13と、第2のリンク21とで、4節回転機構が構成され、弁板13は、ベース15に対して昇降可能となっている。即ち、弁板13は、第1の壁1に対して接近/離反可能となっている。そして、一端部がブラケット14に当接し、他端部が弁板13に当接する付勢手段としてのスプリング23により、弁板13はベース15に積層される方向に付勢されている。   One end of the first link 19 is rotatably attached to the base 15, and the other end of the link 19 is rotatably attached to one end of the valve plate 13. Further, one end of the second link 21 is rotatably attached to the base 15, and the other end of the link 21 is rotatably attached to the other end of the valve plate 13. Therefore, the base 15, the first link 19, the valve plate 13, and the second link 21 constitute a four-bar rotation mechanism, and the valve plate 13 can be moved up and down with respect to the base 15. Yes. That is, the valve plate 13 can approach / separate from the first wall 1. The valve plate 13 is urged in the direction in which it is stacked on the base 15 by a spring 23 as an urging means whose one end abuts on the bracket 14 and whose other end abuts on the valve plate 13.

第2の壁5側には、開状態へ向かって移動する真空仕切弁1の弁板13に当接するストッパ25が設けられている。
ここで、上記構成の真空仕切弁1の作動を説明する。
On the second wall 5 side, a stopper 25 that abuts on the valve plate 13 of the vacuum gate valve 1 that moves toward the open state is provided.
Here, the operation of the vacuum gate valve 1 configured as described above will be described.

図5に示す真空仕切弁1が開状態において、駆動軸17が矢印A方向に駆動され、ベース15が矢印A方向、即ち、閉状態へ向かって移動すると、弁板13がストッパ25に当接する。すると、図6に示すように、スプリング23の付勢力に抗して、弁板13が上昇し、弁板13のOリング18が第1の壁1の外面の第1の穴3の開口の周りに押接し、弁板13が第1の壁1の第1の穴3を塞ぐ閉状態となる。
実開昭62−33157号公報 特開平8−195180号公報 実開昭62−15761号公報
When the vacuum gate valve 1 shown in FIG. 5 is in the open state, the drive shaft 17 is driven in the direction of arrow A, and the base 15 moves in the direction of arrow A, that is, in the closed state, the valve plate 13 contacts the stopper 25. . Then, as shown in FIG. 6, the valve plate 13 rises against the urging force of the spring 23, and the O-ring 18 of the valve plate 13 is open to the opening of the first hole 3 on the outer surface of the first wall 1. The valve plate 13 is in a closed state in which the valve plate 13 closes the first hole 3 of the first wall 1 by pressing around.
Japanese Utility Model Publication No. 62-33157 JP-A-8-195180 Japanese Utility Model Publication No. 62-15761

図5に示す真空仕切弁11が開状態では、弁板13のOリング18は、図5に示すように電子ビームBから少し離れた位置で真空に晒されている。電子ビームBの通路には、散乱電子、反射電子、X線等があり、これらがOリング18に当たるとOリング18が劣化し、ひび割れにより真空がシールできなくなる問題点がある。   When the vacuum gate valve 11 shown in FIG. 5 is in the open state, the O-ring 18 of the valve plate 13 is exposed to vacuum at a position slightly away from the electron beam B as shown in FIG. There are scattered electrons, reflected electrons, X-rays, and the like in the path of the electron beam B. When these hit the O-ring 18, the O-ring 18 deteriorates, and there is a problem that the vacuum cannot be sealed due to cracks.

本発明は上記問題点に鑑みてなされたもので、その課題は、真空仕切弁のOリングが劣化しにくい荷電粒子ビーム装置を提供することにある。   The present invention has been made in view of the above problems, and an object thereof is to provide a charged particle beam apparatus in which an O-ring of a vacuum gate valve is unlikely to deteriorate.

上記課題を解決する請求項1に係る発明は、荷電粒子ビーム発生源で発生した荷電粒子ビームが出射する第1の穴が形成された第1の壁と、該第1の壁の外側に配設され、前記第1の壁の外面に当接可能なOリングが設けられた弁板を有し、前記Oリングが前記第1の壁の外面の前記第1の穴の開口の周りに押接し、前記弁板が前記第1の壁の第1の穴を塞ぐ閉状態は、前記第1の穴内を真空に保持する真空仕切弁と、を有する荷電粒子ビーム装置において、前記第1の壁の第1の穴と、開状態の前記真空仕切弁の弁板との間に、前記荷電粒子ビームによる散乱電子、反射電子、X線を遮る遮蔽手段を設けたことを特徴とする荷電粒子ビーム装置である。   According to a first aspect of the present invention for solving the above-mentioned problems, a first wall in which a first hole from which a charged particle beam generated by a charged particle beam generation source is emitted is formed, and the first wall is disposed outside the first wall. And a valve plate provided with an O-ring capable of coming into contact with the outer surface of the first wall, the O-ring being pushed around the opening of the first hole on the outer surface of the first wall. In the charged particle beam apparatus, the closed state in which the valve plate is in contact with and closes the first hole of the first wall is a vacuum gate valve that holds the inside of the first hole in a vacuum state. A charged particle beam characterized in that shielding means for blocking scattered electrons, reflected electrons, and X-rays due to the charged particle beam is provided between the first hole of the vacuum valve and the valve plate of the vacuum gate valve in the open state. Device.

請求項2に係る発明は、前記真空仕切弁の弁板は、前記第1の壁の外面に沿って移動し、前記遮蔽手段は、開状態の前記弁板を収容可能で、前記第1の穴側に開口が形成されたケースと、前記開口に設けられ、前記開口を開閉する遮蔽板と、前記開口を閉じる方向に前記遮蔽板を付勢する第1の付勢手段と、からなることを特徴とする請求項1記載の荷電粒子ビーム装置である。   According to a second aspect of the present invention, the valve plate of the vacuum gate valve moves along the outer surface of the first wall, and the shielding means can accommodate the valve plate in the open state. A case in which an opening is formed on the hole side; a shielding plate that is provided in the opening and opens and closes the opening; and a first urging unit that urges the shielding plate in a direction to close the opening. The charged particle beam apparatus according to claim 1.

請求項3に係る発明は、前記真空仕切弁の弁板は、前記第1の壁の外面に沿って移動し、前記遮蔽手段は、前記第1の壁の第1の穴と、開状態の前記真空仕切弁の弁板との間に配置され、前記弁板の前記第1の穴方向への移動を規制しない開放位置と、閉状態の前記弁板の前面に対向する遮蔽位置との間で移動可能な遮蔽板と、該遮蔽板を開状態の前記弁板の前面に当接する方向に付勢する第2の付勢手段と、からなることを特徴とする請求項1記載の荷電粒子ビーム装置である。   According to a third aspect of the present invention, the valve plate of the vacuum gate valve moves along the outer surface of the first wall, and the shielding means is in an open state with the first hole of the first wall. Between the valve plate of the vacuum gate valve and between the open position where the movement of the valve plate in the direction of the first hole is not restricted and the shielding position facing the front surface of the valve plate in the closed state The charged particle according to claim 1, further comprising: a shielding plate that can be moved at a time, and a second urging means that urges the shielding plate in a direction to contact the front surface of the valve plate in the open state. It is a beam device.

請求項4に係る発明は、前記第1の壁と空間を介して対向し、前記第1の穴と対向し、前記第1の穴から出射する前記荷電粒子ビームが入射する第2の穴が形成された第2の壁を設け、前記真空仕切弁は、前記第2の壁の前記第1の壁との対向面上を移動可能で、前記第1の壁との対向面上に前記弁板が配設されたベースと、該ベースに一端部が回転可能に取り付けられ、他端部が前記弁板の一方の端部に回転可能に取り付けられた第1のリンクと、前記ベースに一端部が回転可能に取り付けられ、他端部が前記弁板の他方の端部に回転可能に取り付けられた第2のリンクと、前記ベースに積層される方向に前記弁体を付勢する付勢手段と、前記第2の壁側に設けられ、前記閉状態へ向かって移動する弁板に当接するストッパと、からなることを特徴とする請求項1乃至3のいずれかに記載の荷電粒子ビーム装置である。   According to a fourth aspect of the present invention, there is provided a second hole that faces the first wall through a space, faces the first hole, and enters the charged particle beam emitted from the first hole. A second wall formed; and the vacuum gate valve is movable on a surface of the second wall facing the first wall, and the valve is disposed on the surface facing the first wall. A base on which a plate is disposed, a first link having one end rotatably attached to the base and the other end rotatably attached to one end of the valve plate; and one end attached to the base And a second link having the other end rotatably attached to the other end of the valve plate, and a bias for biasing the valve body in the direction of being stacked on the base. And a stopper provided on the second wall side and abutting against the valve plate moving toward the closed state. A charged particle beam device according to any one of claims 1 to 3, wherein.

請求項1−4に係る発明によれば、前記第1の壁の第1の穴と、開状態の前記真空仕切弁の弁板との間に、前記荷電粒子ビームによる散乱電子、反射電子、X線を遮る遮蔽手段を設けたことにより、Oリングが劣化しにくくなる。   According to the invention according to claim 1-4, between the first hole of the first wall and the valve plate of the vacuum gate valve in the open state, scattered electrons, reflected electrons by the charged particle beam, By providing the shielding means for blocking X-rays, the O-ring is unlikely to deteriorate.

図1−図4を用いて、本発明の形態例の荷電粒子ビーム装置を説明する。図1は本形態例の荷電粒子ビーム装置の開状態の真空仕切弁周りを説明する図、図2は閉状態の図1の真空仕切弁周りを説明する図、図3は図2の第1の壁を取り除いたE方向矢視図、図4は図1の切断線D−Dでの断面図である。   A charged particle beam apparatus according to an embodiment of the present invention will be described with reference to FIGS. FIG. 1 is a view for explaining the periphery of the vacuum gate valve in the open state of the charged particle beam apparatus of this embodiment, FIG. 2 is a view for explaining the periphery of the vacuum gate valve of FIG. 1 in the closed state, and FIG. FIG. 4 is a cross-sectional view taken along a cutting line DD in FIG. 1.

図1、図2において、101は鏡筒内に設けられ、荷電粒子ビーム発生源で発生した電子ビームBが出射する第1の穴103が形成された第1の壁である。第1の壁101と空間を介して第2の壁105が対向するように設けられている。この第2の壁105には、第1の穴103と対向し、第1の穴103から出射する電子ビームBが入射する第2の穴107が形成されている。   In FIGS. 1 and 2, reference numeral 101 denotes a first wall provided in a lens barrel and having a first hole 103 through which an electron beam B generated by a charged particle beam generation source is emitted. The first wall 101 and the second wall 105 are provided so as to face each other through a space. A second hole 107 is formed in the second wall 105 so as to face the first hole 103 and into which the electron beam B emitted from the first hole 103 is incident.

第1の壁101と第2の壁105との間の空間に真空仕切弁111が設けられる。
図1−図3に示すように、真空仕切弁111は、5つのローラ102を用いて第2の壁105の第1の壁101との対向面上を移動可能なベース115を有している。ベース115の第1の壁101との対向面の一方の端部側には弁板113が配設されている。弁板113の第1の壁101との対向面には、第1の壁101の外面に当接可能なOリング118が設けられている。このOリング118の径は、第1の壁101の外面の第1の穴103の開口の周りに押接可能なように、第1の穴103の径より大きく設定されている。
A vacuum gate valve 111 is provided in the space between the first wall 101 and the second wall 105.
As shown in FIGS. 1 to 3, the vacuum gate valve 111 has a base 115 that can move on the surface of the second wall 105 facing the first wall 101 using five rollers 102. . A valve plate 113 is disposed on one end side of the surface of the base 115 facing the first wall 101. An O-ring 118 that can contact the outer surface of the first wall 101 is provided on the surface of the valve plate 113 that faces the first wall 101. The diameter of the O-ring 118 is set larger than the diameter of the first hole 103 so that it can be pressed around the opening of the first hole 103 on the outer surface of the first wall 101.

ベース115の第1の壁101との対向面の他方の端部側には、ブラケット114が設けられている。このブラケット114には、図示しないエアシリンダのスピンドル等の駆動軸117がピン116を用いて接続されている。従って、駆動源を駆動することにより、真空仕切弁111が開状態である図1では、駆動軸117が矢印A’方向に移動し、真空仕切弁111は図2に示す閉状態まで移動し、真空仕切弁111が閉状態である図2では、駆動軸117が矢印C’方向に移動し、真空仕切弁111を図1に示す開状態まで移動する。   A bracket 114 is provided on the other end side of the surface of the base 115 facing the first wall 101. A drive shaft 117 such as a spindle of an air cylinder (not shown) is connected to the bracket 114 using a pin 116. Therefore, by driving the drive source, in FIG. 1 in which the vacuum gate valve 111 is in the open state, the drive shaft 117 moves in the direction of the arrow A ′, and the vacuum gate valve 111 moves to the closed state shown in FIG. In FIG. 2 where the vacuum gate valve 111 is in the closed state, the drive shaft 117 moves in the direction of the arrow C ′, and the vacuum gate valve 111 moves to the open state shown in FIG.

図1、図2に示すように、ベース115には、第1のリンク119の一端部が回転可能に取り付けられ、このリンク119の他端部は、弁板113の一方の端部に回転可能に取り付けられている。又、ベース115には、第2のリンク121の一端部が回転可能に取り付けられ、このリンク121の他端部は、弁板113の他方の端部に回転可能に取り付けられている。このためベース115と、第1のリンク119と、弁板113と、第2のリンク121とで、4節回転機構が構成され、弁板113は、ベース15に対して昇降可能となっている。即ち、弁板113は、第1の壁101に対して接近/離反可能となっている。そして、一端部がブラケット114に当接し、他端部が弁板113に当接する付勢手段としてのスプリング123により、弁板113はベース115に積層される方向に付勢されている。   As shown in FIGS. 1 and 2, one end of the first link 119 is rotatably attached to the base 115, and the other end of the link 119 is rotatable to one end of the valve plate 113. Is attached. One end of the second link 121 is rotatably attached to the base 115, and the other end of the link 121 is rotatably attached to the other end of the valve plate 113. Therefore, the base 115, the first link 119, the valve plate 113, and the second link 121 constitute a four-bar rotation mechanism, and the valve plate 113 can be moved up and down with respect to the base 15. . That is, the valve plate 113 can approach / separate from the first wall 101. The valve plate 113 is urged in the direction in which it is laminated on the base 115 by a spring 123 as an urging means whose one end abuts on the bracket 114 and the other end abuts on the valve plate 113.

第2の壁105側には、開状態へ向かって移動する真空仕切弁111の弁板113に当接するストッパ125が設けられている。このストッパ125は、図3に示すように、弁板113の先端面が当接可能な当接部125aが形成されている。   On the second wall 105 side, a stopper 125 that abuts on the valve plate 113 of the vacuum gate valve 111 that moves toward the open state is provided. As shown in FIG. 3, the stopper 125 is formed with an abutting portion 125 a with which the tip surface of the valve plate 113 can abut.

そして、図1、図2、図4に示すように、第1の壁101の第1の穴103と、開状態の真空仕切弁111の弁板113との間に、荷電粒子ビームBによる散乱電子、反射電子、X線を遮る遮蔽手段200が設けられている。   1, 2, and 4, scattering by the charged particle beam B between the first hole 103 of the first wall 101 and the valve plate 113 of the vacuum gate valve 111 in the opened state. Shielding means 200 for blocking electrons, reflected electrons, and X-rays is provided.

本形態例の遮蔽手段200は、開状態のベース115,弁板113を収容可能で、第1の穴103側に開口201が形成されたケース211と、開口201を開閉する遮蔽板221とからなっている。   The shielding means 200 of this embodiment can accommodate the base 115 and the valve plate 113 in an open state, and includes a case 211 having an opening 201 formed on the first hole 103 side, and a shielding plate 221 that opens and closes the opening 201. It has become.

ケース211は、図4に示すように、断面形状が略小判形で、アッパケース213とロアケース215とからなっている。又、遮蔽板221は、蝶番223を用いてロアケース215に開閉可能に設けられ、蝶番223のヒンジに中間部が巻回され、一方の端部がロアケース215に、他方の端部が遮蔽板221に係止された図示しないスプリング(第1の付勢手段)により、開口201を閉じる方向に付勢されている。   As shown in FIG. 4, the case 211 has an approximately oval cross-sectional shape, and includes an upper case 213 and a lower case 215. The shielding plate 221 is provided on the lower case 215 using a hinge 223 so that the shielding plate 221 can be opened and closed. It is urged in a direction to close the opening 201 by a spring (first urging means) (not shown) that is locked to the ring.

ここで、上記構成の真空仕切弁111の作動を説明する。
図1に示す開状態の真空仕切弁111において、真空仕切弁111はケース211内に収納され、ケース211の開口201は、遮蔽板221により閉じられている。
Here, the operation of the vacuum gate valve 111 configured as described above will be described.
In the opened vacuum gate valve 111 shown in FIG. 1, the vacuum gate valve 111 is housed in a case 211, and the opening 201 of the case 211 is closed by a shielding plate 221.

ここで、駆動軸117が矢印A’方向に駆動され、ベース115が矢印’A方向、即ち、閉状態へ向かって移動すると、真空仕切弁111は、遮蔽板221を開方向に押し、開口201からケース211の外部に出る。   Here, when the drive shaft 117 is driven in the direction of the arrow A ′ and the base 115 moves in the direction of the arrow “A”, that is, in the closed state, the vacuum gate valve 111 pushes the shielding plate 221 in the opening direction and opens the opening 201. To the outside of the case 211.

そして、弁板113がストッパ125の当接部125aに当接する。すると、図2に示すように、スプリング123の付勢力に抗して、弁板113が上昇し、弁板113のOリング118が第1の壁101の外面の第1の穴103の開口の周りに押接し、弁板113が第1の壁101の第1の穴103を塞ぐ閉状態となる。この状態時においても、ベース115の最後部のローラ102が遮蔽板221上に乗っており、遮蔽板221は開いた状態にある。   Then, the valve plate 113 comes into contact with the contact portion 125 a of the stopper 125. Then, as shown in FIG. 2, the valve plate 113 rises against the urging force of the spring 123, and the O-ring 118 of the valve plate 113 is opened to the opening of the first hole 103 on the outer surface of the first wall 101. The valve plate 113 is in a closed state in which the valve plate 113 closes the first hole 103 of the first wall 101 by pressing around. Even in this state, the roller 102 at the end of the base 115 is on the shielding plate 221 and the shielding plate 221 is in an open state.

次に、図2に示す閉状態の真空仕切弁111を図1に示す開状態にするには、駆動軸117を矢印A’と反対方向に駆動する。すると、真空仕切弁111がケース211内に収納され、ケース211の開口201は、遮蔽板221により閉じられる。   Next, in order to open the closed vacuum gate valve 111 shown in FIG. 2 to the open state shown in FIG. 1, the drive shaft 117 is driven in the direction opposite to the arrow A ′. Then, the vacuum gate valve 111 is accommodated in the case 211, and the opening 201 of the case 211 is closed by the shielding plate 221.

このような構成によれば、第1の壁101の第1の穴103と、開状態の真空仕切弁111の弁板113との間に、電子ビームBによる散乱電子、反射電子、X線を遮る遮蔽手段を設けたことにより、Oリング118が劣化しにくくなる。   According to such a configuration, scattered electrons, reflected electrons, and X-rays generated by the electron beam B are generated between the first hole 103 of the first wall 101 and the valve plate 113 of the opened vacuum gate valve 111. By providing the shielding means for shielding, the O-ring 118 is hardly deteriorated.

尚、本発明は、上記形態例に限定するものではない。上記形態例では、遮蔽手段として、ケース211と、ケース211の開口201を開閉する遮蔽板221とで構成したが、ケースはなくてもよい。即ち、第1の壁101の第1の穴103と、開状態の真空仕切弁111の弁板113との間に配置され、弁板113の第1の穴103方向への移動を規制しない開状態と、開状態の弁板113の前面に対向する遮蔽位置との間で移動可能な遮蔽板と、遮蔽板を開状態の弁板113の前面に当接する方向に付勢する第2の付勢手段とで構成してもよい。   The present invention is not limited to the above embodiment. In the above-described embodiment, the case 211 and the shielding plate 221 that opens and closes the opening 201 of the case 211 are configured as the shielding means, but the case may not be provided. That is, an opening that is disposed between the first hole 103 of the first wall 101 and the valve plate 113 of the opened vacuum gate valve 111 and does not restrict movement of the valve plate 113 in the direction of the first hole 103. A shield plate that is movable between the open state and the shield position facing the front surface of the opened valve plate 113, and a second attachment that biases the shield plate in a direction to contact the front surface of the open valve plate 113. You may comprise with a force means.

形態例の荷電粒子ビーム装置の開状態の真空仕切弁周りを説明する図である。It is a figure explaining the vacuum gate valve periphery of the open state of the charged particle beam apparatus of a form example. 閉状態の図1の真空仕切弁周りを説明する図である。It is a figure explaining the vacuum gate valve periphery of FIG. 1 of a closed state. 図2の第1の壁を取り除いたE方向矢視図である。FIG. 3 is a view in the direction of arrow E with the first wall of FIG. 2 removed. 切断線D−Dでの断面図である。It is sectional drawing in the cutting line DD. 従来の電子ビーム装置の開状態の真空仕切弁周りを説明する図である。It is a figure explaining the surroundings of the vacuum gate valve of the open state of the conventional electron beam apparatus. 閉状態の図5の真空仕切弁周りを説明する図である。It is a figure explaining the vacuum gate valve periphery of FIG. 5 of a closed state.

符号の説明Explanation of symbols

101 第1の壁
103 第1の穴
111 真空仕切弁
200 遮蔽手段
211 ケース
221 遮蔽板
101 first wall 103 first hole 111 vacuum gate valve 200 shielding means 211 case 221 shielding plate

Claims (4)

荷電粒子ビーム発生源で発生した荷電粒子ビームが出射する第1の穴が形成された第1の壁と、
該第1の壁の外側に配設され、前記第1の壁の外面に当接可能なOリングが設けられた弁板を有し、前記Oリングが前記第1の壁の外面の前記第1の穴の開口の周りに押接し、前記弁板が前記第1の壁の第1の穴を塞ぐ閉状態は、前記第1の穴内を真空に保持する真空仕切弁と、
を有する荷電粒子ビーム装置において、
前記第1の壁の第1の穴と、開状態の前記真空仕切弁の弁板との間に、前記荷電粒子ビームによる散乱電子、反射電子、X線を遮る遮蔽手段を設けたことを特徴とする荷電粒子ビーム装置。
A first wall formed with a first hole from which a charged particle beam generated by a charged particle beam generation source is emitted;
A valve plate disposed outside the first wall and provided with an O-ring capable of contacting the outer surface of the first wall, the O-ring being the first of the outer surface of the first wall; A closed state in which the valve plate is pressed around the opening of the first hole and the valve plate closes the first hole of the first wall, and a vacuum gate valve that holds the inside of the first hole in a vacuum;
In a charged particle beam device having
A shielding means for blocking scattered electrons, reflected electrons, and X-rays by the charged particle beam is provided between the first hole of the first wall and the valve plate of the vacuum gate valve in the open state. A charged particle beam device.
前記真空仕切弁の弁板は、前記第1の壁の外面に沿って移動し、
前記遮蔽手段は、
開状態の前記弁板を収容可能で、前記第1の穴側に開口が形成されたケースと、
前記開口に設けられ、前記開口を開閉する遮蔽板と、
前記開口を閉じる方向に前記遮蔽板を付勢する第1の付勢手段と、
からなることを特徴とする請求項1記載の荷電粒子ビーム装置。
A valve plate of the vacuum gate valve moves along an outer surface of the first wall;
The shielding means is
A case in which the valve plate in an open state can be accommodated and an opening is formed on the first hole side;
A shielding plate provided at the opening and opening and closing the opening;
First urging means for urging the shielding plate in a direction to close the opening;
The charged particle beam apparatus according to claim 1, comprising:
前記真空仕切弁の弁板は、前記第1の壁の外面に沿って移動し、
前記遮蔽手段は、
前記第1の壁の第1の穴と、開状態の前記真空仕切弁の弁板との間に配置され、前記弁板の前記第1の穴方向への移動を規制しない開放位置と、閉状態の前記弁板の前面に対向する遮蔽位置との間で移動可能な遮蔽板と、
該遮蔽板を開状態の前記弁板の前面に当接する方向に付勢する第2の付勢手段と、
からなることを特徴とする請求項1記載の荷電粒子ビーム装置。
A valve plate of the vacuum gate valve moves along an outer surface of the first wall;
The shielding means is
An open position that is disposed between the first hole of the first wall and the valve plate of the vacuum gate valve in an open state and does not restrict movement of the valve plate in the direction of the first hole; A shielding plate movable between a shielding position facing the front surface of the valve plate in a state;
Second urging means for urging the shielding plate in a direction to contact the front surface of the valve plate in the open state;
The charged particle beam apparatus according to claim 1, comprising:
前記第1の壁と空間を介して対向し、前記第1の穴と対向し、前記第1の穴から出射する前記荷電粒子ビームが入射する第2の穴が形成された第2の壁を設け、
前記真空仕切弁は、
前記第2の壁の前記第1の壁との対向面上を移動可能で、前記第1の壁との対向面上に前記弁板が配設されたベースと、
該ベースに一端部が回転可能に取り付けられ、他端部が前記弁板の一方の端部に回転可能に取り付けられた第1のリンクと、
前記ベースに一端部が回転可能に取り付けられ、他端部が前記弁板の他方の端部に回転可能に取り付けられた第2のリンクと、
前記ベースに積層される方向に前記弁体を付勢する付勢手段と、
前記第2の壁側に設けられ、前記閉状態へ向かって移動する弁板に当接するストッパと、
からなることを特徴とする請求項1乃至3のいずれかに記載の荷電粒子ビーム装置。
A second wall that is opposed to the first wall through a space, is opposed to the first hole, and is formed with a second hole on which the charged particle beam emitted from the first hole is incident; Provided,
The vacuum gate valve is
A base that is movable on a surface of the second wall facing the first wall, and on which the valve plate is disposed on the surface facing the first wall;
A first link having one end rotatably attached to the base and the other end rotatably attached to one end of the valve plate;
A second link having one end rotatably attached to the base and the other end rotatably attached to the other end of the valve plate;
An urging means for urging the valve body in a direction of being stacked on the base;
A stopper provided on the second wall side and abutting on a valve plate moving toward the closed state;
The charged particle beam apparatus according to claim 1, comprising:
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JP2014022359A (en) * 2012-07-23 2014-02-03 Snu Precision Co Ltd Vacuum retention valve and scanning electron microscope employing the same
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JP2013182863A (en) * 2012-03-05 2013-09-12 Toshiba Corp Ion source
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