JP2008288146A - Image display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an FED (field emission display) in which a desired white color temperature is attained without impairing white uniformity nor degrading luminance. <P>SOLUTION: A plurality of stripes 241 formed by the same material and process as those of a black matrix are arranged in each of a red phosphor 21 and a blue phosphor 23 to relatively lower the transmittance of the red phosphor 21 and that of the blue phosphor 23 with respect to that of a green phosphor 22. The transmittance of the red phosphor 21 is set lower than that of the blue phosphor 23. Thereby, a white color temperature of 9,300 K is achieved. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a flat display device in which the inside is evacuated, the electron sources are arranged in a matrix on the rear substrate, and the phosphors corresponding to the front substrate are arranged, and in particular, the color temperature when white is displayed and the white Related to uniformity.

  Conventionally, a color cathode ray tube has been widely used as a display device excellent in high luminance and high definition. However, the demand for flat image display devices is increasing from the viewpoint of space saving and light weight. The demand for liquid crystal display devices, plasma display devices, etc. is increasing in the field of large display devices such as TVs because they do not become so heavy even if they have a large screen of 30 inches or more.

  On the other hand, development of a so-called field emission display (hereinafter referred to as FED) in which the inside between two glass substrates is evacuated, electron sources are arranged in a matrix on one substrate, and phosphors are arranged on the opposite substrate. Is progressing. An FED forms an image when electrons from an electron source impinge on a phosphor and emit light, and it can obtain excellent performance similar to a cathode ray tube in terms of brightness, contrast, moving image characteristics, etc. It is expected as a display for TV.

  One of the problems with FED is the problem of color temperature when white is displayed. In the FED phosphor screen structure, red, green and blue phosphors are formed in a matrix, and the red, green and blue phosphors are filled or shielded by a black matrix (BM). Conversely, a black matrix is formed on the entire phosphor surface, and the holes of the black matrix are filled with red, green, and blue phosphors, or red, green, and blue phosphors are straddled over the black matrix pattern. Patterned. In the prior art, the sizes of the red, green and blue phosphors are the same.

  However, with such a phosphor screen structure, it is difficult to produce an NTSC standard white color temperature of 9300K. That is, since the luminous efficiency of the red, green, and blue phosphors is different, if a color temperature of 9300K is output, the green emission is relatively insufficient. Therefore, when red, green, and blue phosphors are formed in the same size, the overall color becomes magenta white. The color temperature at this time is, for example, 4500K.

  As a conventional technique for solving this problem, “Patent Document 1” can be cited. Patent Document 1 describes that the area of red and blue phosphors is made smaller than the area of green phosphors in order to obtain a predetermined color balance. Specifically, the red and blue phosphors are made smaller by making the major axis of the red and blue phosphors smaller than the major axis of the green phosphor, or by dividing the red and blue phosphors and providing a shielding portion. Is described as being relatively smaller than the area of the green phosphor.

JP 2006-73386 A

  However, in the technique described in “Patent Document 1”, it is necessary to increase the area of the green phosphor in order to set the color temperature to a predetermined temperature. Therefore, the width of the black matrix between the phosphors is different. Therefore, there is a problem that the color purity is deteriorated. In another technique described in “Patent Document 1”, for example, the red phosphor is divided at the center to form two phosphors having the same right and left area, and the color temperature is reduced by reducing the area of the red phosphor. Techniques for matching are described. However, this technique forms a black matrix that is a shield near the center of the phosphor with the highest electron beam density, which reduces the efficiency of use of the electron beam and reduces the color purity as well as the brightness of the display device. It becomes a problem.

  As described above, in the FED, when a predetermined color temperature is obtained by the conventional technique, the problem of deterioration of color purity and the problem of reduction of screen brightness occur.

  The present invention has been made to solve the above-described conventional problems, and forms a black matrix shielding object in the red or blue phosphor region to minimize the decrease in brightness while maintaining the color temperature. The adjustment is performed. Specific means are as follows.

(1) A cathode substrate in which an electron source is formed in a matrix, an anode substrate facing the cathode substrate, an anode voltage is applied, and a phosphor is formed in a location corresponding to the electron source. A display device maintained in a vacuum, wherein a black matrix is formed on the anode substrate, and red phosphor, green phosphor and blue phosphor are arranged side by side in an opening of the black matrix, and the red phosphor A display device, wherein a plurality of black matrix stripes are formed in an opening of a black matrix.
(2) The display device according to (1), wherein a stripe by the black matrix is not formed in the center of the opening of the black matrix in which the red phosphor is formed.
(3) The display device according to (1), wherein a plurality of black matrix stripes are formed in an opening of the black matrix where the blue phosphor is formed.
(4) The display according to (1), wherein the transmittance of the opening of the black matrix in which the red phosphor is formed is smaller than the transmittance of the opening of the black matrix in which the blue phosphor is formed. apparatus.
(5) The display device according to (1), wherein the transmittance of the opening portion of the black matrix in which the red phosphor is formed is larger in the central portion of the opening portion than in the peripheral portion of the opening portion. .

(6) A cathode substrate in which an electron source is formed in a matrix, an anode substrate facing the cathode substrate, an anode voltage is applied, and a phosphor is formed at a location corresponding to the electron source. A display device maintained in a vacuum, wherein a black matrix is formed on the anode substrate, and red phosphor, green phosphor and blue phosphor are arranged side by side in an opening of the black matrix, and the red phosphor The display device is characterized in that a black matrix shielding object is formed in an opening of the black matrix, and the pattern of the shielding object is different between the opening center and the periphery of the opening.
(7) A plurality of black matrix stripes are formed around the black matrix opening where the red phosphor is formed as a shield, and at the center of the black matrix opening where the red phosphor is formed. The display device according to (6), wherein a mosaic pattern using a black matrix is formed as a shield.
(8) A black matrix shield is formed in the opening of the black matrix where the blue phosphor is formed, and the pattern of the shield differs between the center of the opening and the periphery of the opening. The display device according to (6), wherein the transmittance is higher in the center of the opening than in the periphery of the opening.
(9) The display according to (6), wherein the transmittance of the opening of the black matrix in which the red phosphor is formed is smaller than the transmittance of the opening of the black matrix in which the blue phosphor is formed. apparatus.
(10) The display device according to (6), wherein the transmittance of the opening of the black matrix in which the red phosphor is formed is larger at the center of the opening than at the periphery of the opening.

(11) A cathode substrate in which an electron source is formed in a matrix, an anode substrate facing the cathode substrate, an anode voltage is applied, and a phosphor is formed at a location corresponding to the electron source. A display device maintained in a vacuum, wherein a black matrix is formed on the anode substrate, and red phosphor, green phosphor and blue phosphor are arranged side by side in an opening of the black matrix, and the red phosphor A black matrix shield is formed in the opening of the black matrix formed, and the transmittance of the black matrix opening for the red phosphor is equal in the central portion and the peripheral portion of the opening portion or in the central portion. A display device characterized by being larger than the peripheral portion.
(12) A black matrix shield is formed in the opening of the black matrix where the blue phosphor is formed, and the transmittance of the black matrix opening for the blue phosphor is equal at the center and the periphery of the opening. Or the center part is larger than a peripheral part, The display apparatus as described in (11) characterized by the above-mentioned.
(13) The display according to (11), wherein the transmittance of the opening of the black matrix in which the red phosphor is formed is smaller than the transmittance of the opening of the black matrix in which the blue phosphor is formed. apparatus.
(14) The pattern of the shielding object formed at the center of the opening of the black matrix where the red phosphor is formed and the pattern of the shielding object formed at the periphery of the opening are the same pattern. (11) The display device according to (11).

  (15) A cathode substrate in which an electron source is formed in a matrix, an anode substrate facing the cathode substrate, an anode voltage being applied, and a phosphor formed in a location corresponding to the electron source, A display device maintained in a vacuum, wherein a black matrix is formed on the anode substrate, and red phosphor, green phosphor and blue phosphor are arranged side by side in an opening of the black matrix, and the red phosphor A display device, wherein a plurality of black matrix shielding objects are formed in an opening of a black matrix.

  According to the present invention, a predetermined color temperature can be obtained without decreasing the color purity and minimizing the decrease in brightness of the screen luminance. The effects of each means of the present invention are as follows.

  According to the means (1), since the plurality of stripes are formed in the BM hole of the red phosphor, the white color temperature can be adjusted without deteriorating the color purity by controlling the transmittance in the BM hole. it can.

  According to the means (2), since no BM stripe is formed at the center of the BM hole of the red phosphor, the transmittance at the center of the BM hole can be made larger than that at the periphery of the BM hole. . Therefore, it is possible to control the white color temperature while keeping the color purity deterioration to a minimum.

  According to the means (3), since a plurality of BM stripes are also formed in the BM hole of the blue phosphor, it is easy to set the white color temperature to 9300K.

  According to the means (4), since the transmittance of the BM hole of the red phosphor is smaller than the transmittance of the BM hole of the blue phosphor, it is easy to set the white color temperature to 9300K.

  According to the means (5), since the BM hole of the red phosphor has a high transmittance in the central part of the BM hole and a low transmittance in the peripheral part of the BM hole, the white color temperature is kept while minimizing the deterioration of the color purity. Can be close to 9300K.

  According to the means (6), the BM hole of the red phosphor is formed with different shielding patterns at the peripheral part and the central part, so that the transmittance of the BM hole can be easily changed between the central part and the peripheral part of the BM hole. You can make a difference.

  According to the means (7), a plurality of stripes are formed around the BM hole of the red phosphor, and a mosaic pattern is formed at the center, so that a difference in transmittance can be provided between the center and the periphery of the BM hole. It becomes easy.

  According to the means (8), since the shielding pattern of the blue phosphor BM hole is made different between the center of the hole and the periphery of the hole, a difference in transmittance can be easily made between the center and the periphery of the BM hole. I can do it.

  According to the means (9), since the transmittance of the BM hole of the red phosphor is smaller than the transmittance of the BM hole of the blue phosphor, it is easy to set the white color temperature to 9300K.

  According to the means (10), the shielding pattern of the BM hole of the red phosphor is made different between the central part and the peripheral part of the BM hole, and the transmittance of the central part of the BM hole of the red phosphor is the transmission of the peripheral part of the BM hole. In order to make it larger than the rate, the white color temperature can be controlled while minimizing the deterioration of color purity.

  According to the means (11), since the transmittance of the BM hole in which the red phosphor is formed is large at the central portion of the BM hole and small at the peripheral portion of the BM hole, the deterioration of the color purity is minimized. The white color temperature can be controlled.

  According to the means (12), the transmittance of the BM hole in which the red phosphor is formed is increased at the central part of the BM hole and decreased at the peripheral part of the BM hole. The white color temperature can be brought close to 9300K.

  According to the means (13), since the transmittance of the BM hole of the red phosphor is smaller than the transmittance of the BM hole of the blue phosphor, the white color temperature can be easily brought close to 9300K.

  According to the means (14), since the shield of the same pattern is formed in the BM hole of the red phosphor, the formation of the shield in the BM hole can be simplified.

  The best mode of the present invention will be described below in detail with reference to the drawings of the embodiments.

  FIG. 1 is a plan view showing a first embodiment of the present invention. In FIG. 1, an anode substrate 2 is installed on a cathode substrate 1 via a sealing portion 3. On the cathode substrate, scanning lines 11 extend in the horizontal direction and data signal lines 12 extend in the vertical direction. A signal is supplied from the outside to the scanning line 11 from the scanning line terminal 51 and to the data signal line 12 through the data signal line terminal 52. An electron source is arranged near the intersection of the scanning line 11 and the data signal line 12. Therefore, a large number of electron sources are arranged in a matrix. Various electron sources such as a so-called MIM system, SID system, and Spindt system have been developed, and any electron source can be applied to the present invention. In this embodiment, an MIM type electron source is used as an example of the electron source.

  The inside of the sealing part 3 surrounding the cathode substrate 1 and the anode substrate 2 and the periphery is kept in a vacuum. Therefore, the anode substrate 2 and the cathode substrate 1 are bent by the atmospheric pressure, and the interval between the cathode substrate 1 and the anode substrate 2 cannot be secured. Alternatively, the cathode substrate 1 or the anode substrate 2 is destroyed. In order to avoid this, a spacer 4 is provided between the cathode substrate 1 and the anode substrate 2. The spacer 4 is formed of ceramics or glass and is generally installed on the scanning line so as not to hinder image formation.

  On the anode substrate, red, green, and blue phosphors that emit light by the impact of the electron beam 15 are formed corresponding to the electron source. A black matrix (BM) is formed around the phosphor to improve image contrast. A metal backing made of Al is formed so as to cover the black matrix 24. A high voltage is applied to the metal back 25, and the electron beam 15 emitted from the cathode is accelerated so as to strike the red phosphor 21, the green phosphor 22, and the blue phosphor 23.

  In order to generate light from the phosphor by the electron beam 15, the electron beam 15 must have a certain amount of energy. Therefore, a high voltage of 8 KV to 10 KV is applied to the metal back 25 of the anode substrate 2. In this embodiment, a high voltage introduction terminal for supplying a high voltage from the outside is provided on the cathode substrate side, and a high voltage is supplied to the anode substrate 2 through a contact spring. In FIG. 1, an anode terminal where the contact spring contacts the anode substrate 2 is formed at a corner portion of the display device. Since the inside of the display device must be kept in a vacuum, exhaust holes 81 for exhaust are formed at the corners of the display device in FIG.

  FIG. 2 is a side view of FIG. 1 viewed from the D direction. In FIG. 2, the cathode substrate 1 and the anode substrate 2 face each other with a predetermined distance through the sealing portion 3. The cathode substrate 1 is formed larger as the terminals 5 and the like are installed. Under the cathode substrate 1, an exhaust substrate 6 for attaching the exhaust pipe 8 and the high voltage introduction button 60 is attached. The exhaust substrate 6 is attached to the cathode substrate 1 via an exhaust substrate sealing portion 7. In FIG. 2, an exhaust pipe 8 for evacuating the inside of the display device is drawn on the exhaust substrate 6 in a state where the chip is turned off. A high voltage introduction button 60 is attached near the exhaust pipe 8.

3 is a cross-sectional view taken along the line AA in FIG. In FIG. 3, the data signal line 12 extends in a direction perpendicular to the paper surface. In this embodiment, an electron source 14 is formed on the data signal line 12. The scanning line 11 is formed in a direction perpendicular to the data signal line 12 through the insulating film 13. In FIG. 3, the scanning line 11 extends outside the sealing portion 3. A spacer 4 for maintaining the distance between the cathode substrate 1 and the anode substrate 2 is provided on the scanning line 11. The spacer 4 is fixed to the scanning line on the cathode substrate side by the fixing material 41 and to the metal back 25 on the anode substrate side. The spacer 4 has a conductivity of about 10 ⁸ to 10 ⁹ Ω, and the spacer 4 is prevented from being charged by passing a slight current between the cathode and the anode.

  On the anode substrate side, a red phosphor 21, a green phosphor 22, and a blue phosphor 23 are disposed at a location corresponding to the electron source 14, and the red phosphor 21, the green phosphor 22, and the blue phosphor 23 are electrons. Light is emitted by being projected onto the beam 15 to form an image. The space between the red phosphor 21, the green phosphor 22, and the blue phosphor 23 is filled with BM 24, which contributes to improving the contrast of the image. For example, the BM 24 has a two-layer structure of chromium and chromium oxide. A metal back 25 made of Al is formed so as to cover the red phosphor 21, the green phosphor 22, the blue phosphor 23 and the BM 24. A high voltage of about 8 KV to 10 KV is applied to the metal back 25 to accelerate the electron beam 15. The accelerated electron beam 15 penetrates the metal back 25 and strikes the red phosphor 21, the green phosphor 22, and the blue phosphor 23, and causes the red phosphor 21, the green phosphor 22, and the blue phosphor 23 to emit light.

  In order to keep the inside of the display device in a vacuum, the cathode substrate 1 and the anode substrate 2 are sealed by the frame member 31 and the sealing material 32. The thickness of the cathode substrate 1 and the thickness of the anode substrate 2 are about 3 mm. The distance between the cathode substrate 1 and the anode substrate 2 is about 2.8 mm, and the inside of the display device has a high electric field.

  4 is a cross-sectional view taken along the line BB of FIG. In FIG. 4, a through hole 10 is formed in the cathode substrate 1, and the display device is exhausted or a high voltage is supplied through the through hole 10. An exhaust substrate 6 is installed through the exhaust substrate sealing portion 7 so as to cover the through hole 10 of the cathode substrate 1, and the inside of the display device is kept in vacuum. The exhaust substrate sealing portion 7 has the same basic configuration as the cathode substrate 1 and the anode substrate 2 sealing portion 3. That is, the exhaust substrate frame 71 is sealed to the cathode substrate 1 and the anode substrate 2 via the sealing material 32.

  The high voltage introduction button 60 is attached to the cathode substrate 1 by the sealing material 32, and is kept airtight from the outside. The sealing material 32 is made of frit glass. An Fe—Ni alloy is used for the high voltage introduction button. The component ratio of the Fe—Ni alloy is selected so as to match the thermal expansion coefficient with the sealing material 32. A contact spring 50 is spot welded to the high voltage introduction button 60. The contact spring 50 is made of Inconel, which can be easily spot welded with the Fe—Ni alloy.

  The contact spring 50 is formed of a base portion connected to the high voltage introduction button 60, an arm portion, and a contact portion. The contact portion of the contact spring 50 comes into contact with the metal back 25 formed on the anode substrate 2 by an appropriate force due to bending stress caused by the bending of the arm portion of the contact spring 50. The contact pressure of the contact spring 50 in this embodiment is about 10 g. The contact portion of the contact spring 50 has an appropriate curved surface such as a spherical surface, and is formed so as to be able to stably contact the metal back 25. Inconel is used for the material of the contact spring 50 in consideration of heat resistance and the thickness is 0.1 mm.

  An anode terminal 26 for contacting the contact spring 50 is formed on the anode substrate 2. Since a relatively large current flows through the anode terminal 26, reliability is important. In the present embodiment, the structure of the anode terminal 26 portion is as follows. A BM 24 of chromium and chromium oxide is formed on the anode substrate, and a metal back 25 made of Al is formed covering the BM 24. This is the same configuration as the effective surface of the screen. In this embodiment, a conductive film having a thickness of 10 μm to 30 μm is formed on the metal back 25 as the anode terminal 26. In this embodiment, the conductive film is formed by applying a silver paste by printing and then baking. There is no need to provide a special process for firing the conductive film. For example, it may be performed simultaneously with the firing process for fixing the spacer 4.

  The silver paste is obtained by dispersing silver particles having a diameter of 1 μm to several μm in an organic solvent having a high viscosity. After firing, the silver particles are connected to each other to have conductivity. In some cases, the conductive film should have some resistance. In such a case, the resistance can be adjusted by further mixing a paste for frit glass with a normal silver paste. Note that the material of the conductive film is not limited to silver paste, and Ni paste in which Ni particles are dispersed, Al paste in which Al particles are dispersed, and the like can also be used. A graphite film bonded with a binder can also be used. The graphite in this case is preferably graphite. The resistance of the graphite film can be adjusted, for example, by mixing bengara (iron oxide) with graphite.

  By forming the conductive film as thick as 10 μm to 30 μm, the contact spring 50 and the conductive film can be stably contacted. That is, in the case of a metal film, the contact spring 50 and the metal film are in point contact, and there is a great risk that current concentrates on this point contact portion and the conductive film is destroyed. The conductive film and the contact spring 50 can have a large contact area as compared with the case of a metal film, become a state close to surface contact, and stabilize the contact. In addition, since the conductive film as in this embodiment has a higher resistance than metal, it can be prevented that a large current flows through the contact portion. Also from this point, the stability of conduction by contact can be improved.

  An exhaust hole 81 is formed in the exhaust substrate 6, and an exhaust pipe 8 is installed in the exhaust hole 81 through frit glass as a sealing material 32. The inside of the display device is evacuated through the exhaust pipe 8, and then the exhaust pipe 8 is chipped off and the inside of the display device is kept in vacuum. FIG. 4 shows a state in which the exhaust pipe 8 is chipped off.

  FIG. 5 is a schematic view showing a CC cross section of FIG. In FIG. 5, data signal lines 12 extend in the horizontal direction on the cathode substrate. A scanning line 11 extends in the normal direction of the paper surface at right angles to the data signal line 12. The scanning line 11 has a two-layer structure. This is to reduce the wiring resistance. An electron source 14 is disposed on the data signal line 12 between the scanning lines. The electron source 14 includes a data signal line 12 serving as a lower electrode and an upper electrode that is electrically connected to the scanning line 11 via a tunnel insulating film.

  On the anode substrate 2, a red phosphor 21, a green phosphor 22, and a blue phosphor 23 are formed. In FIG. 5, only the green phosphor 22 is displayed. The space between the phosphor and the phosphor is covered with BM24. A metal back 25 is formed by sputtering Al over the phosphor and the BM 24. An anode voltage which is a high voltage of about 8 KV to 10 KV is applied to the metal back 25. The electron beam 15 emitted from the electron source 14 is accelerated by the anode voltage. The electron beam 15 emitted from the electron source 14 penetrates the metal back 25 and strikes the red phosphor 21, the green phosphor 22, and the blue phosphor 23, thereby forming a color image. The electron beam 15 spreads when emitted from the electron source 14, but is designed to be slightly larger than each phosphor on the phosphor screen.

  In order to maintain the distance between the anode substrate 2 and the cathode substrate 1, the spacer 4 is installed as described with reference to FIG. The spacer 4 is disposed between the scanning line 11 on the cathode substrate and the metal back 25 on the anode substrate. At this position, the spacer 4 does not interfere with image formation.

  FIG. 6 shows an example in which the electron beam 15 strikes the phosphor screen, and FIG. 7 is a schematic diagram showing how electrons from the electron source 14 strike the phosphor screen. In FIG. 6, holes are formed in the black matrix 24, and a red phosphor 21, a green phosphor 22, and a blue phosphor 23 are formed in the hole portion. The electron beam 15 emitted from the electron source 14 has an elliptical shape on the phosphor screen and strikes the phosphor. 6 and 7, the minor axis of the elliptical electron beam 15 is larger than the minor axis of the phosphor. In FIG. 6, the pitch from the red phosphor 21 to the red phosphor 21 is, for example, 0.519 mm. The width of the BM 24 is equally 0.024 mm. On the other hand, the longitudinal pitch in the major axis direction of the phosphor is 0.519 mm. Therefore, the horizontal pitch and the vertical pitch of the three color phosphors are equal to 0.519 mm.

  FIG. 6 shows an example in which the centers of the phosphor and the electron beam 15 coincide. Actually, since there is an alignment error between the anode substrate 2 and the cathode substrate, the centers of the phosphor and the electron beam 15 are off. An example in which the center of the phosphor is displaced from the center of the electron beam 15 is shown in FIGS. 8 and 9 show an example in which the center of the electron beam 15 for the green phosphor is shifted from the stop of the green phosphor 22 toward the red phosphor. As a result, a part of the electron beam 15 for the green phosphor strikes the other colored portion 151 of the red phosphor 21 that should not project. On the other hand, the green phosphor 22 has a chipped region 152 where the electron beam 15 does not strike. 8 and 9 have been described by taking the case of the green phosphor 22 as an example, but the same applies to the case of the red phosphor 21 and the blue phosphor 23.

  As shown in FIG. 6, normally, the red phosphor 21, the green phosphor 22, and the blue phosphor 23 have the same dimensions. Moreover, the interval of BM24 between each fluorescent substance is also the same. Thus, the color temperature when the areas of the respective phosphors are the same is about 4500K, which is white shifted in the red direction from NTSC white 9300K. In order to bring this close to the NTSC white color temperature, the green emission intensity must be increased. As a method for increasing the green emission intensity, there is a method of increasing the hole area of the green phosphor BM, that is, the area of the green phosphor 22. However, as shown in FIGS. 8 and 9, this method causes deterioration of color purity due to other color strikes or the like. In other words, if the area of the phosphor is increased, the width of the BM 24 between the phosphors becomes narrower, and it becomes easier to strike other colors.

  In this embodiment, in order to prevent the deterioration of color purity, the area of the green phosphor 22 is not increased, but a shielding portion by BM is formed inside the red or blue phosphor, and the emission intensity of red or blue is increased. The white color temperature is brought close to 9300K by lowering. FIG. 10 is a schematic diagram showing a configuration of a phosphor screen as one form of the present embodiment. A black matrix is formed around the phosphors of red, green, and blue, which is originally black, but the drawing is difficult to understand, so it is white. The widths of the red, green, and blue phosphors are equal, and the BM width between the red, green, and blue phosphors is also constant. Therefore, the pitch between each phosphor is equal. If the pitches between the phosphors are equal, the corresponding pitches of the electron sources 14, and the pitches of the data signal lines are also equal.

  In FIG. 10, a BM stripe 241 which is a stripe-shaped shield is formed in the BM hole where the red phosphor 21 is formed. In practice, this is formed simultaneously with the formation of BM holes with the same material as BM24. The red phosphor 21 is attached to the portion where the BM is formed in the stripe shape. BM holes and stripes are generally formed as follows. That is, chromium oxide and chromium are deposited on the entire anode substrate by sputtering. This laminated film of chromium oxide and chromium is formed by photoetching. Since it is formed by photoetching, the process is the same whether only the BM hole is formed or the stripe is formed in the BM hole.

  The light emission area from the red phosphor 21 to the outside is reduced by the BM stripe 241 formed in the BM hole. Conversely, the red phosphor 21 is divided by the BM stripe 241 in the BM hole, and the number of the divisions is three or more. In other words, it is necessary to have two or more BM stripes 241 in the BM hole. The BM stripe 241 should not be formed at the center of the BM hole. As shown in FIGS. 8 and 9, the periphery of the BM hole is easily hit with another color by the adjacent electron beam 15. Therefore, the smaller the light emitting area of the phosphor around the BM hole, the smaller the deterioration of color purity when other colors are hit. On the other hand, the density of the electron beam 15 is not constant, and has a Gaussian distribution, for example. The density of the electron beam 15 is the highest at the center. Therefore, if there is no BM stripe 241 as a shield in the center of the BM hole, the influence on the brightness reduction is small. By arranging the stripes in the BM hole in this way, the white color temperature can be brought close to 9300K while the color temperature is adjusted and the deterioration of the color purity is minimized.

  In FIG. 10, the BM stripe 241 that is a shield is not formed on the green phosphor 22. This is because the light emitting area of the green phosphor 22 is desired to be relatively larger than that of other phosphors. A BM stripe 241 as a shielding pair is formed on the blue phosphor 23. However, the width of the BM stripe 241 is smaller than the width of the BM stripe 241 in the red phosphor 21. This is because in order to bring the white color temperature close to 9300 K, it is necessary to suppress the light emission of the red phosphor 21 most, and then suppress the light emission of the blue phosphor 23. Accordingly, the green phosphor 22 has the largest emission area, the blue phosphor 23, and the red phosphor 21 have the smallest emission area.

  As described above, according to the present embodiment, it is possible to bring the white color temperature close to 9300 K, which is the NTSC standard, while suppressing the deterioration of color purity due to other colors. Further, the pitches between the phosphors of the red phosphor 21, the green phosphor 22, and the blue phosphor 23 are also constant. If the pitch between the phosphors is constant, the pitch between the electron sources 14 can be made constant, and the signal line pitch can be made the same, so that the characteristics of the FED can be secured, the FED can be manufactured, etc. Becomes easier.

  In the above example, shielding by BM is formed on both the red phosphor 21 and the blue phosphor 23. However, in some cases, the white color temperature is not necessarily 9300K, but may be close to 9300K. In such a case, a shield may be provided only on the red phosphor 21 without providing a shield on the blue phosphor portion. The same applies to other forms of the present embodiment described below.

  FIG. 11 is a schematic diagram showing the configuration of the phosphor screen according to the second embodiment of the present embodiment. The widths of the red, green, and blue phosphors are equal, and the BM width between the red, green, and blue phosphors is also constant. Therefore, the pitch between each phosphor is equal. In FIG. 11, the red phosphor 21 is provided with a BM stripe 241 which is a stripe-shaped shield. In practice, this is formed simultaneously with the formation of BM holes with the same material as BM. The difference from FIG. 10 is that the BM stripe 241 is not a vertical line but an oblique line. Since the BM stripe 241 is inclined, the influence on the color purity can be smoothly changed when the adjacent electron beam 15 strikes another color. The number of BM stripes 241 in the BM hole is two or more.

  In this embodiment, the width of the oblique BM stripe 241 is also large in the red phosphor 21, small in the blue phosphor 23, and no oblique stripe is formed in the green phosphor 22. This is to match the NTSC standard white color temperature. The oblique BM stripe 241 in this embodiment can be formed in the same manner as described in the first embodiment. Therefore, according to the present embodiment, it is possible to bring the white color temperature close to the NTSC standard 9330K while minimizing the deterioration of the color purity.

  FIG. 12 is a schematic diagram showing the configuration of the phosphor screen according to the third embodiment of the present embodiment. The widths of the red, green, and blue phosphors are equal, and the BM width between the red, green, and blue phosphors is also constant. Therefore, the pitch between each phosphor is equal. In FIG. 12, a BM stripe 241 that is a stripe-shaped shield is formed on the red phosphor 21. In practice, this is formed simultaneously with the formation of BM holes with the same material as BM. The difference from FIG. 10 is that the BM stripe 241 in the BM hole is not a vertical line but a horizontal line.

  Other color strikes occur not in the longitudinal direction of the phosphor but in the lateral direction. Therefore, another color strike by the adjacent electron beam 15 from the lateral direction is a problem. As in the present embodiment, if the BM stripe 241 in the BM hole is a horizontal line, even when other color strikes occur, the effect of multi-color strikes is not stepwise but can be a continuous effect. Also in this embodiment, the number of BM stripes 241 in the BM hole is two or more. And it is better that the BM stripe 241 does not exist in the central part of the BM hole.

  In this embodiment, the width of the BM stripe 241 in the horizontal direction in the BM hole is also large in the red phosphor 21, small in the blue phosphor 23, and no BM stripe 241 is formed in the green phosphor 22. This is to match the NTSC standard white color temperature. Formation of the BM stripe 241 in the lateral direction in the BM hole in this embodiment can be performed in the same manner as described in the first embodiment. Therefore, according to this embodiment, the white color temperature can be brought close to the NTSC standard 9300K while minimizing the deterioration of color purity.

  FIG. 13 is a schematic diagram showing the configuration of the phosphor screen according to the fourth embodiment of the present embodiment. The widths of the red, green, and blue phosphors are equal, and the BM width between the red, green, and blue phosphors is also constant. Therefore, the pitch between each phosphor is equal. In FIG. 13, the red phosphor 21 has a mosaic shield. Unlike the case of Embodiments 1 to 3, the shield in this embodiment has a mosaic shape. The mosaic shield (BM mosaic) in the present embodiment is also formed of the same material and the same process as BM. The formation method is the same as that described in the first embodiment, and only the photomask is different from that of the first embodiment.

  By making the shield in the BM hole into a mosaic shape, even when the adjacent electron beam 15 strikes another color, the influence of the other color strike is not stepwise but can be continuous. The total area of the BM mosaic 242 in the BM hole is determined by how much the white color temperature is set. If the total area of the BM mosaic 242 is the same, it is advantageous to reduce the mosaic pitch by reducing the area of each mosaic so that the influence when other color strikes can be made continuously.

  In this embodiment, the area of the BM mosaic 242 in the BM hole is also large in the red phosphor 21, small in the blue phosphor 23, and no BM mosaic 242 is formed in the green phosphor 22. This is to match the NTSC standard white color temperature. Therefore, according to the present embodiment, it is possible to bring the white color temperature close to the NTSC standard 9330K while minimizing the deterioration of the color purity.

  FIG. 14 is a schematic view of a phosphor screen showing a second embodiment of the present invention. In this embodiment, in order to prevent the deterioration of the color purity, the area of the green phosphor 22 is not increased, but a shielding portion by BM is formed inside the red or blue phosphor, so that the emission intensity of red or blue is increased. The white color temperature is brought close to 9300K by lowering. In FIG. 14, the red, green, and blue phosphors have the same width, and the BM width between the red, green, and blue phosphors is also constant. Therefore, the pitch between each phosphor is equal. If the pitch between the phosphors is equal, the pitch of the electron sources 14 of the corresponding cathode substrate 1 and the pitch of the data signal lines are also equal.

  In FIG. 14, a BM stripe 241 that is a stripe-shaped shield and a BM mosaic 242 that is a mosaic-shaped shield are formed in the BM hole where the red phosphor 21 is formed. A BM mosaic 242 is formed at the center of the BM hole, and a BM stripe 241 is formed around the BM hole. The transmittance of the BM mosaic 242 is larger than that of the BM stripe 241. That is, the transmittance of the central part of the BM hole is larger than that of the peripheral part of the BM hole. This is due to the following reason.

  As shown in FIGS. 8 and 9, the periphery of the BM hole is easily hit with another color by the adjacent electron beam 15. Therefore, the smaller the BM transmittance in the vicinity of the BM hole, the smaller the deterioration of the color purity when other colors are hit. On the other hand, the density of the electron beam 15 is not constant, and has a Gaussian distribution, for example. The density of the electron beam 15 is the highest at the center. Therefore, even when other color strikes occur, deterioration in color purity due to other color strikes can be reduced if the BM transmittance is small at the periphery of the BM hole. On the other hand, shielding for suppressing light emission from the red phosphor 21 may be performed anywhere in the BM hole. Therefore, by increasing the transmittance of the BM at the central portion of the BM hole as compared with the periphery of the BM hole as in the present embodiment, the color temperature can be adjusted effectively without causing deterioration in color purity due to multicoloring. Can be done.

  In FIG. 14, a BM stripe 241 that is a stripe-shaped shield and a BM mosaic 242 that is a mosaic-shaped shield are also formed in the BM hole where the blue phosphor 23 is formed. The BM mosaic 242 is formed at the center of the BM hole, and the BM stripe 241 is formed around the BM hole. As in the case of the red phosphor 21, the central part of the BM hole has a higher transmittance than the peripheral part of the BM hole. However, the shielding rate for the blue phosphor 23 is smaller than the shielding rate for the red phosphor 21. That is, the blue phosphor 23 has a higher transmittance than the red phosphor 21. In the BM hole where the green phosphor 22 is formed, neither the BM stripe 241 nor the BM mosaic 242 is formed. By adopting such a configuration, the white color temperature can be brought close to 9300 K without any deterioration in color purity.

  In this embodiment, a BM mosaic 242 is provided at the center of the BM hole, and a BM stripe 241 is provided around the BM hole. However, it goes without saying that it is not necessary to be limited to such a configuration in order to achieve the object of the present invention. That is, in this embodiment, the purpose is to increase the transmittance in the central portion of the BM hole rather than the periphery of the BM hole. For this purpose, a BM mosaic 242 is formed at the center of the BM hole, and a BM stripe 241 is formed at the periphery. When the transmittance of the BM stripe 241 is larger than that of the BM mosaic 242, the BM stripe 241 may be disposed at the center of the BM hole and the BM mosaic 242 may be disposed at the periphery. Furthermore, without changing the pattern at the center and the periphery of the BM hole, for example, only the BM stripe 241 may be used, and the width or pitch of the BM stripe 241 may be changed between the center and the periphery of the BM hole. Further, the BM mosaic 242 may be formed at the center and the periphery of the BM hole, and the density of the mosaic may be changed between the center and the periphery of the BM hole.

  The case where the shielding object is formed in both the BM hole for the red phosphor and the BM hole for the blue phosphor has been described above. Depending on the desired white color temperature, it may not always be necessary to provide a shield in the BM hole in the red phosphor 21 and blue phosphor 23 portions. In this case, a BM shield may be formed only on the red phosphor 21 and no shield may be provided in the BM holes of the blue phosphor 23 and the green phosphor 22.

  FIG. 15 is a schematic view of a phosphor screen showing a second embodiment of the present example. In FIG. 15, the widths of the red, green, and blue phosphors are equal, and the BM width between the red, green, and blue phosphors is also constant. Therefore, the pitch between each phosphor is equal. If the pitches between the phosphors are equal, the pitches of the electron sources 14 of the corresponding cathode substrate 1 and the pitches of the data signal lines are also equal.

  In FIG. 15, a BM stripe 241 that is a stripe-shaped shield and a BM mosaic 242 that is a mosaic-shaped shield are formed in the BM hole where the red phosphor 21 is formed. Also in this embodiment, the transmittance of the central part of the BM hole is large and the transmittance of the peripheral part of the BM hole is small as in the first embodiment. The method for forming the BM shield is the same as that in the first embodiment. This embodiment is different from the first embodiment in that BM stripes 241 formed around the BM hole are formed in the horizontal direction.

  Other color strikes occur not in the longitudinal direction of the phosphor but in the lateral direction. Therefore, another color strike is a problem due to the adjacent electron beam 15 from the lateral direction. If the BM stripe 241 in the BM hole is a horizontal line as in this embodiment, even if other color strikes occur, the effect of multi-color strikes does not occur abruptly but may be a continuous effect. I can do it.

  In FIG. 15, a BM stripe 241 is formed in the periphery of the BM hole of the blue phosphor 23, and a BM mosaic 242 is formed in the center. The central portion of the BM hole has a higher transmittance than that of the periphery, as in the case of the red phosphor 21. The shielding rate of the BM hole of the blue phosphor 23 is smaller than the shielding rate of the BM hole of the red phosphor 21. Conversely, the transmittance of the BM hole of the red phosphor 21 is smaller than the transmittance of the BM hole of the blue phosphor 23. Further, the BM hole of the green phosphor 22 is not provided with a shield. As a result, the white color temperature can be set to 9300K. If the color temperature should be close to 9300K even if the color temperature is not accurately set to 9300k, the shielding material is not formed on the BM hole of the blue phosphor 23, and the shielding material is formed only on the BM hole of the red phosphor 21. May be.

  In the above description, the lateral BM stripe 241 is formed around the BM hole, the BM mosaic 242 is formed at the center of the BM hole, and the transmittance at the center of the BM hole is made larger than the transmittance around the BM hole. However, as described in the first embodiment, it is needless to say that it is not necessary to be limited to such a configuration in order to achieve the object of the present invention. That is, in this embodiment, the purpose is to increase the transmittance in the central portion of the BM hole rather than the periphery of the BM hole. For this purpose, a BM mosaic 242 is formed at the center of the BM hole, and a BM stripe 241 is formed at the periphery. When the transmittance of the BM stripe 241 is larger than that of the BM mosaic 242, the BM stripe 241 may be disposed at the center of the BM hole and the BM mosaic 242 may be disposed at the periphery. Furthermore, without changing the pattern at the center and the periphery of the BM hole, for example, only the BM stripe 241 may be used, and the width or pitch of the BM stripe 241 may be changed between the center and the periphery of the BM hole. Further, the BM mosaic 242 may be formed at the center and the periphery of the BM hole, and the density of the mosaic may be changed between the center and the periphery of the BM hole.

  As described above, according to the present invention, NTSC standard white color temperature of 9300K or a desired white color temperature can be obtained while suppressing deterioration of color purity.

It is a top view which shows Example 1 of this invention. It is a side view of FIG. It is AA sectional drawing of FIG. It is BB sectional drawing of FIG. It is CC sectional drawing of FIG. It is a plane schematic diagram of a fluorescent screen. It is a cross-sectional schematic diagram of FED. It is a plane schematic diagram which shows other color strikes. It is a cross-sectional schematic diagram which shows other color strikes. 2 is a schematic plan view of a phosphor screen of Example 1. FIG. 6 is a schematic plan view of a phosphor screen according to a second form of Example 1. FIG. 6 is a schematic plan view of a phosphor screen according to a third mode of Example 1. FIG. 6 is a schematic plan view of a phosphor screen according to a fourth mode of Example 1. FIG. 6 is a schematic plan view of a phosphor screen of Example 2. FIG. 6 is a schematic plan view of a phosphor screen according to a second form of Example 2. FIG.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Cathode substrate, 2 ... Anode substrate, 3 ... Sealing part, 4 ... Spacer, 5 ... Terminal, 6 ... Exhaust board, 7 ... Exhaust board sealing part , 8 ... exhaust pipe, 11 ... scanning line, 12 ... data signal line, 13 ... insulating film, 14 ... electron source, 15 ... electron beam, 21 ... red fluorescence 22 ... Green phosphor, 23 ... Blue phosphor, 24 ... Black matrix (BM), 25 ... Metal back, 26 ... Anode terminal, 50 ... Contact spring, 60 ... High voltage introduction button, 81 ... Exhaust hole, 241 ... BM stripe, 242 ... BM mosaic

Claims (15)

A cathode substrate in which an electron source is formed in a matrix and an anode substrate facing the cathode substrate, to which an anode voltage is applied, and a phosphor formed in a location corresponding to the electron source, are maintained in a vacuum. A display device,
A black matrix is formed on the anode substrate, and a red phosphor, a green phosphor, and a blue phosphor are arranged side by side in the opening of the black matrix, and in the opening of the black matrix in which the red phosphor is formed. A display device comprising a plurality of stripes formed of a black matrix.   2. The display device according to claim 1, wherein a stripe due to the black matrix is not formed in the center of the opening of the black matrix where the red phosphor is formed.   The display device according to claim 1, wherein a plurality of stripes formed of a black matrix are formed in openings of the black matrix where the blue phosphor is formed.   2. The display device according to claim 1, wherein the transmittance of the opening of the black matrix in which the red phosphor is formed is smaller than the transmittance of the opening of the black matrix in which the blue phosphor is formed.   2. The display device according to claim 1, wherein the transmittance of the opening of the black matrix in which the red phosphor is formed is larger at the center of the opening than at the periphery of the opening. A cathode substrate in which an electron source is formed in a matrix and an anode substrate facing the cathode substrate, to which an anode voltage is applied, and a phosphor formed in a location corresponding to the electron source, are maintained in a vacuum. A display device,
A black matrix is formed on the anode substrate, and a red phosphor, a green phosphor, and a blue phosphor are arranged side by side in the opening of the black matrix, and in the opening of the black matrix in which the red phosphor is formed. A display device, wherein a shielding object is formed by a black matrix, and the pattern of the shielding object is different between the center of the opening and the periphery of the opening.   A plurality of black matrix stripes are formed as a shield around the black matrix opening where the red phosphor is formed, and a shield is provided at the center of the black matrix opening where the red phosphor is formed. The display device according to claim 6, wherein a mosaic pattern using a black matrix is formed.   A black matrix shielding material is formed in the opening of the black matrix where the blue phosphor is formed. The pattern of the shielding material is different between the center of the opening and the periphery of the opening. The display device according to claim 6, wherein a transmittance is greater at a center of the opening than at a periphery of the opening.   7. The display device according to claim 6, wherein the transmittance of the opening portion of the black matrix in which the red phosphor is formed is smaller than the transmittance of the opening portion of the black matrix in which the blue phosphor is formed.   The display device according to claim 6, wherein the transmittance of the opening of the black matrix in which the red phosphor is formed is larger at the center of the opening than at the periphery of the opening. A cathode substrate in which an electron source is formed in a matrix and an anode substrate facing the cathode substrate, to which an anode voltage is applied, and a phosphor formed in a location corresponding to the electron source, are maintained in a vacuum. A display device,
A black matrix is formed on the anode substrate, and a red phosphor, a green phosphor, and a blue phosphor are arranged side by side in the opening of the black matrix, and in the opening of the black matrix in which the red phosphor is formed. A display device characterized in that a black matrix shield is formed, and the transmittance of the black matrix opening for the red phosphor is equal in the central portion and the peripheral portion of the opening portion, or the central portion is larger than the peripheral portion. .   A black matrix shield is formed in the black matrix opening in which the blue phosphor is formed, and the transmittance of the black matrix opening for the blue phosphor is equal to or in the center of the opening. The display device according to claim 11, wherein the portion is larger than the peripheral portion.   12. The display device according to claim 11, wherein the transmittance of the opening of the black matrix where the red phosphor is formed is smaller than the transmittance of the opening of the black matrix where the blue phosphor is formed.   The pattern of the shielding object formed in the central part of the opening part of the black matrix where the red phosphor is formed and the pattern of the shielding object formed in the peripheral part of the opening part are the same pattern, The display device according to claim 11. A cathode substrate in which an electron source is formed in a matrix and an anode substrate facing the cathode substrate, to which an anode voltage is applied, and a phosphor formed in a location corresponding to the electron source, are maintained in a vacuum. A display device,
A black matrix is formed on the anode substrate, and a red phosphor, a green phosphor, and a blue phosphor are arranged side by side in the opening of the black matrix, and in the opening of the black matrix in which the red phosphor is formed. A display device comprising a plurality of shields formed of a black matrix.

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