JP2008251927A - Heat treatment container - Google Patents

Heat treatment container Download PDF

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Publication number
JP2008251927A
JP2008251927A JP2007092718A JP2007092718A JP2008251927A JP 2008251927 A JP2008251927 A JP 2008251927A JP 2007092718 A JP2007092718 A JP 2007092718A JP 2007092718 A JP2007092718 A JP 2007092718A JP 2008251927 A JP2008251927 A JP 2008251927A
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Japan
Prior art keywords
heat treatment
flange portion
recesses
pairs
outer peripheral
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JP4914270B2 (en
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Katsunao Kasatsugu
克尚 笠次
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JTEKT Thermo Systems Corp
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Koyo Thermo Systems Co Ltd
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Priority to JP2007092718A priority Critical patent/JP4914270B2/en
Priority to KR1020070077917A priority patent/KR101306761B1/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any preceding group
    • F27B17/0016—Chamber type furnaces
    • F27B17/0025—Especially adapted for treating semiconductor wafers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like

Abstract

<P>PROBLEM TO BE SOLVED: To easily perform carrying into a furnace without using an exclusive apparatus or the like by providing two or more pairs of recessed parts opened only on the outer peripheral surface of a flange part and enabling an operator to insert fingers to the respective recessed parts. <P>SOLUTION: On the outer peripheral surface of the flange part 20 formed at the bottom part of a quartz process tube 2, the two or more pairs of recessed parts 21 are formed. To the respective recessed parts 21, the fingers of the plurality of operators are inserted. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、底部に開口部を有する熱処理容器であって、運搬時の操作性を向上できる熱処理容器に関する。   The present invention relates to a heat treatment container having an opening at the bottom, which can improve operability during transportation.

半導体製造等に用いられる縦型の熱処理装置では、高温でガラス基板を処理するために金属製のチャンバを用いることができず、石英製の熱処理容器が用いられる。熱処理容器は、底面に開口部を備えている。開口部の周囲には全周にわたってフランジ部が形成されており、このフランジ部を上下から挟持することで保持し、これを熱処理装置内のホルダに固定する。   In a vertical heat treatment apparatus used for semiconductor manufacturing or the like, a metal chamber cannot be used to process a glass substrate at a high temperature, and a quartz heat treatment container is used. The heat treatment container has an opening on the bottom surface. A flange portion is formed around the entire periphery of the opening, and the flange portion is held by being sandwiched from above and below, and is fixed to a holder in the heat treatment apparatus.

この固定構造には、従来から、フランジ部の挟持部と、これを保持するホルダ部材がフランジ部の周囲に全周に渡って設けられ、容器内の密封を十分な強度で確実に行い、且つ熱によるＯリングの劣化等を防ぐよう、水冷構造（Water Jacket)等が採用されている(例えば、特許文献１参照）。
特開平６−２１６０５４号公報 Conventionally, in this fixing structure, a sandwiching portion of the flange portion and a holder member for holding the flange portion are provided over the entire circumference of the flange portion, and the inside of the container is reliably sealed with sufficient strength, and A water cooling structure (Water Jacket) or the like is employed to prevent deterioration of the O-ring due to heat (for example, see Patent Document 1).
Japanese Patent Laid-Open No. 6-216054

しかしながら、近年の縦型の熱処理装置では、処理対象物であるガラス基板の大型化に伴って１２００ｍｍ程度の直径の熱処理容器が用いられるようになっている。このため、熱処理装置の設置時やメンテナンス時に熱処理容器を運搬する際には、他の部材等との当接によって熱処理装置が破損することのないように、吊り帯やホイスト等の専用の器具等を用いて慎重に取り扱う必要があり、熱処理容器の運搬作業が煩雑になる問題があった。   However, in a recent vertical heat treatment apparatus, a heat treatment container having a diameter of about 1200 mm is used with an increase in the size of a glass substrate which is a processing target. For this reason, when transporting the heat treatment container during installation or maintenance of the heat treatment apparatus, a dedicated device such as a hanger or hoist should be used so that the heat treatment apparatus will not be damaged by contact with other members. There is a problem that the handling work of the heat treatment container becomes complicated.

この発明の目的は、フランジ部の外周面にのみ開口した複数の凹部を設け、各凹部に作業者が手指を挿入できるようにし、専用の器具等を用いることなく運搬を容易に行うことができる熱処理容器を提供することにある。   An object of the present invention is to provide a plurality of recesses that are opened only on the outer peripheral surface of the flange portion, so that an operator can insert a finger into each recess and can be easily transported without using a dedicated instrument or the like. It is to provide a heat treatment container.

本発明は、底面に開口部を備える熱処理容器であって、開口部の周囲の全周にわたって固定用のフランジ部を備えた熱処理容器において、複数対の凹部を備えている。複数対の凹部は、フランジ部の外周面にのみ開口し、それぞれに手指が挿入される。   The present invention is a heat treatment container having an opening on the bottom surface, and is provided with a plurality of pairs of recesses in a heat treatment container having a fixing flange portion around the entire periphery of the opening. The plurality of pairs of recesses open only on the outer peripheral surface of the flange portion, and fingers are inserted into each of the recesses.

複数の作業者が複数対の凹部のそれぞれに両手の手指を挿入すると、熱処理容器が容易に持ち上がる。   When a plurality of workers insert fingers of both hands into each of a plurality of pairs of recesses, the heat treatment container is easily lifted.

例えば、フランジ部の外周面に、各対の中点が等間隔となるように、４対合計８個の凹部を形成すると、４人の作業者がそれぞれの凹部に手指を挿入することで、熱処理装置が安定した状態で持ち上げられ、熱処理装置を容易に運搬できる。   For example, on the outer peripheral surface of the flange portion, when four pairs of eight concave portions are formed so that the midpoints of each pair are equally spaced, four workers insert fingers into the respective concave portions, The heat treatment apparatus is lifted in a stable state, and the heat treatment apparatus can be easily transported.

フランジ部は熱処理容器を炉内の所定の位置に固定するために挟持部によって上下方向に挟持されるが、各凹部はフランジ部の外周面にのみ開口しているため、挟持部による挟持の妨げとなることはなく、内部の気密性も維持される。   The flange part is vertically clamped by the clamping part in order to fix the heat treatment container at a predetermined position in the furnace, but each concave part is opened only on the outer peripheral surface of the flange part. The internal airtightness is maintained.

本発明によれば、フランジ部の外周面にのみ開口した複数対の凹部に複数の作業者が手指を挿入することで、専用の器具等を用いることなく運搬作業を容易に行うことができる。また、複数の凹部は、フランジ部の外周面にのみ開口しており、挟持部による上下方向の挟持の妨げとなることはなく、内部の気密性も維持することができる。   According to the present invention, when a plurality of workers insert fingers into a plurality of pairs of recesses that are opened only on the outer peripheral surface of the flange portion, the carrying work can be easily performed without using a dedicated instrument or the like. Further, the plurality of recesses are opened only on the outer peripheral surface of the flange portion, and do not hinder vertical clamping by the clamping portion, and the internal airtightness can be maintained.

図１は、本発明の実施形態である熱処理装置の概略構成図である。本実施形態の熱処理装置は、全体として縦型に構成されるいわゆる縦型熱処理装置である。熱処理装置の炉体内には石英製の熱処理容器が配置され、この中に多数枚の大型基板を収納して熱処理を行うように構成されている。   FIG. 1 is a schematic configuration diagram of a heat treatment apparatus according to an embodiment of the present invention. The heat treatment apparatus of the present embodiment is a so-called vertical heat treatment apparatus configured as a vertical type as a whole. A heat treatment vessel made of quartz is disposed in the furnace of the heat treatment apparatus, and a large number of large substrates are accommodated therein to perform heat treatment.

図１において、熱処理装置の炉体１は、ヒータを内蔵した側部断熱ブロック１０と、上部断熱ブロック１１と、で構成される。この炉体１内には後述の炉口構造物に保持され、頂部がドーム状、水平断面が円形となっている石英製の熱処理容器（以下、石英プロセスチューブという。）２が固定され、この容器内に、基板保持治具３と、同基板保持治具３の架台４と、熱を下部に逃がさないための遮熱板構造（ヒートバリア）５とが配置されて熱処理が行われる。基板保持治具３、架台４、ヒートバリア５は、エレベータ装置６によりモータ駆動される昇降装置６０を介して昇降自在であり、下降させた状態で多数の被処理物である基板７を基板保持治具３に並設させ、その後全体を上昇させて石英プロセスチューブ２内に収納させる。   In FIG. 1, a furnace body 1 of a heat treatment apparatus includes a side heat insulating block 10 incorporating a heater and an upper heat insulating block 11. A quartz heat treatment vessel (hereinafter referred to as a quartz process tube) 2 is fixed in the furnace body 1 and held in a furnace opening structure, which will be described later. In the container, a substrate holding jig 3, a gantry 4 of the substrate holding jig 3, and a heat shield plate structure (heat barrier) 5 for preventing heat from escaping to the lower part are arranged and heat treatment is performed. The substrate holding jig 3, the gantry 4, and the heat barrier 5 can be moved up and down via a lifting device 60 that is motor-driven by the elevator device 6, and the substrate 7 that is a large number of objects to be processed is held in the lowered state. The jig 3 is juxtaposed, and then the whole is raised and accommodated in the quartz process tube 2.

上記のように、炉体１に対して、基板７を並設させるための基板保持治具３をエレベータ装置６で昇降できるようにすることで、基板保持治具３内の被処理物である基板７を取り替えながら、それらの熱処理を順次行うことができる。なお、吸引口８からは処理の前後に容器内を真空引きし、図外のガス導入口から不活性ガスや処理ガスを導入する。   As described above, the substrate holding jig 3 for juxtaposing the substrate 7 with respect to the furnace body 1 can be moved up and down by the elevator device 6, thereby being an object to be processed in the substrate holding jig 3. These heat treatments can be performed sequentially while replacing the substrate 7. Note that the inside of the container is evacuated from the suction port 8 before and after the treatment, and an inert gas and a treatment gas are introduced from a gas introduction port outside the figure.

図２は、上記熱処理装置の要部の断面図である。図３は、石英プロセスチューブの外観図である。   FIG. 2 is a cross-sectional view of a main part of the heat treatment apparatus. FIG. 3 is an external view of the quartz process tube.

側部断熱ブロック１０は、ヒータ１２を内蔵し、石英プロセスチューブ２の側面周囲を覆っている。その側部断熱ブロック１０の底面断熱部１５と石英プロセスチューブ２間には、断熱リング１３が設けられ、その下部には、ヒータベース１４が設けられている。   The side heat insulating block 10 incorporates a heater 12 and covers the periphery of the side surface of the quartz process tube 2. A heat insulating ring 13 is provided between the bottom heat insulating portion 15 of the side heat insulating block 10 and the quartz process tube 2, and a heater base 14 is provided below the heat insulating ring 13.

石英プロセスチューブ２は底面に開口した炉口を備え、炉口の周囲に全周に渡ってフランジ部２０が形成されている。フランジ部２０には、外周面にのみ開口した凹部２１が、フランジ部２０の全周にわたって等間隔の８箇所に形成されている。   The quartz process tube 2 is provided with a furnace port opened at the bottom, and a flange portion 20 is formed around the furnace port over the entire circumference. In the flange portion 20, recesses 21 that are opened only on the outer peripheral surface are formed at eight equal intervals over the entire circumference of the flange portion 20.

熱処理装置の炉体１の組立時やメンテナンス時に石英プロセスチューブ２を炉内に搬入出する際には、４人の作業者の両手の手指を各凹部２１に挿入し、石英プロセスチューブ２を４人の作業者で持ち上げて運搬することができる。   When the quartz process tube 2 is carried into and out of the furnace during assembly or maintenance of the furnace body 1 of the heat treatment apparatus, the fingers of both hands of four workers are inserted into the recesses 21 and the quartz process tube 2 is inserted into the furnace. It can be lifted and transported by a human operator.

石英プロセスチューブ２の運搬時に専用の器具等を用いる必要がなく、運搬作業を４人の作業者によって安定した状態で行うことができる。複数対の凹部２１を各対の中点が等間隔となるように形成することで、石英プロセスチューブ２における力点が均等に配置され、石英プロセスチューブ２を安定して運搬できると考えられる。   It is not necessary to use a dedicated instrument or the like when transporting the quartz process tube 2, and the transport operation can be performed stably by four workers. By forming a plurality of pairs of recesses 21 so that the midpoints of each pair are equally spaced, the force points in the quartz process tube 2 are evenly arranged, and the quartz process tube 2 can be transported stably.

フランジ部２０は、フランジ挟持部３００、３０１によって上下から挟持される。フランジ挟持部３００、３０１は、ホルダリング３０２、チューブホルダ３０３によって上下から保持される。凹部２１は、フランジ部２０の外周面にのみ開口しているため、フランジ挟持部３００、３０１によるフランジ部２０挟持に妨げとなることがない。また、石英プロセスチューブ２内の気密性はＯリング３０４，３０７等によって維持される。   The flange portion 20 is sandwiched from above and below by the flange sandwiching portions 300 and 301. The flange clamping parts 300 and 301 are held from above and below by a holder ring 302 and a tube holder 303. Since the concave portion 21 is opened only on the outer peripheral surface of the flange portion 20, it does not hinder the flange portion 20 from being sandwiched by the flange sandwiching portions 300 and 301. Further, the airtightness in the quartz process tube 2 is maintained by the O-rings 304 and 307 and the like.

なお、石英プロセスチューブ２の直径によっては、複数の凹部２１のそれぞれを等間隔に配置しない方が作業性を高くできる可能性もある。一人の作業者が運搬時に両手の手指を挿入するために適した間隔で１対の凹部２１の配置間隔を決定し、石英プロセスチューブ２の重量に適した人数と同数対の凹部２１を形成した場合に、各対の間の間隔が１対の凹部２１の間隔と等しくならない場合があり得る。この場合にも、各対の中点が等間隔となるように複数の凹部２１を配置することで、安定して運搬できる。   Depending on the diameter of the quartz process tube 2, there is a possibility that workability can be improved if the plurality of recesses 21 are not arranged at equal intervals. An arrangement interval of the pair of recesses 21 is determined at an interval suitable for one operator to insert fingers of both hands during transportation, and the same number of pairs of recesses 21 as the number of persons suitable for the weight of the quartz process tube 2 are formed. In some cases, the distance between each pair may not be equal to the distance between the pair of recesses 21. Also in this case, the plurality of recesses 21 are arranged so that the midpoints of each pair are equally spaced, so that the transport can be stably performed.

１対の凹部２１を２個の同一形状の凹部で形成することもできるが、左右それぞれの手指を挿入するために適した対称形状の２個の凹部を１対の凹部として複数対形成してもよい。この場合に、作業者が左右何れの手指を挿入すべきかを認識できる表示を各凹部に設けておくともできる。   A pair of concave portions 21 can be formed by two concave portions having the same shape, but a plurality of pairs of symmetrical concave portions suitable for inserting the left and right fingers are formed as a pair of concave portions. Also good. In this case, it is also possible to provide a display in each recess so that the operator can recognize which finger is to be inserted to the left or right.

なお、上述の実施形態の説明は、すべての点で例示であって、制限的なものではないと考えられるべきである。本発明の範囲は、上述の実施形態ではなく、特許請求の範囲によって示される。さらに、本発明の範囲には、特許請求の範囲と均等の意味および範囲内でのすべての変更が含まれることが意図される。   In addition, it should be thought that description of the above-mentioned embodiment is an illustration in all the points, Comprising: It is not restrictive. The scope of the present invention is shown not by the above embodiments but by the claims. Furthermore, the scope of the present invention is intended to include all modifications within the meaning and scope equivalent to the scope of the claims.

本発明の実施形態である熱処理容器が用いられる熱処理装置の概略構成図である。It is a schematic block diagram of the heat processing apparatus with which the heat processing container which is embodiment of this invention is used. 上記熱処理装置の要部の断面図である。It is sectional drawing of the principal part of the said heat processing apparatus. 上記熱処理容器の外観図である。It is an external view of the said heat processing container.

符号の説明Explanation of symbols

１−炉体
２−石英プロセスチューブ（熱処理容器）
２１−凹部 1-furnace body 2-quartz process tube (heat treatment vessel)
21-recess

Claims (2)

底面に開口部を備える熱処理容器であって、前記開口部の周囲の全周にわたって固定用のフランジ部を備えた熱処理容器において、
前記フランジ部の外周面にのみ開口した複数対の凹部であって、それぞれに手指が挿入される複数対の凹部を備えた熱処理容器。 A heat treatment container having an opening on the bottom surface, the heat treatment container having a flange portion for fixing around the entire circumference of the opening,
A heat treatment container provided with a plurality of pairs of recesses that are opened only on the outer peripheral surface of the flange portion and into which fingers are inserted respectively. 前記複数対の凹部は、各対の中点が前記フランジ部の外周面に沿って等間隔となる位置に形成した熱処理容器。 The plurality of pairs of recesses are heat treatment containers formed at positions where the midpoints of each pair are equidistant along the outer peripheral surface of the flange portion.
JP2007092718A 2007-03-30 2007-03-30 Heat treatment container Expired - Fee Related JP4914270B2 (en)

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JP2007092718A JP4914270B2 (en) 2007-03-30 2007-03-30 Heat treatment container
KR1020070077917A KR101306761B1 (en) 2007-03-30 2007-08-02 Heat treatment receptacle

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TWI487030B (en) * 2012-09-10 2015-06-01 Koyo Thermo Sys Co Ltd Heat treatment device

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TWI487030B (en) * 2012-09-10 2015-06-01 Koyo Thermo Sys Co Ltd Heat treatment device

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