JP2008176090A - Manufacturing method and system of liquid crystal display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a liquid crystal display device enhancing space efficiency and to provide a manufacturing system of the liquid crystal display device. <P>SOLUTION: Main scanning of a counter substrate 15 is performed in a direction X to an ejection head H and an ink Ik for an alignment layer is ejected sequentially from an end part in the direction X of a counter electrode P2 to the whole counter electrode P2 to form an alignment layer OF2. Main scanning of the counter substrate 15 is performed in the direction X to a roller 46 and an alignment treatment of the direction X as a rubbing direction is performed sequentially from an end part in the direction X of the alignment layer OF2 to the whole alignment layer OF2. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a method for manufacturing a liquid crystal display device and a system for manufacturing a liquid crystal display device.

In order to regulate the alignment direction of liquid crystal molecules, the liquid crystal display device has an alignment film made of orientation-oriented molecules to which an alignment regulating force is applied on the inner surface of a substrate enclosing the liquid crystal molecules.
In the manufacturing process of a liquid crystal display device, in order to improve the productivity of the alignment film, a so-called liquid phase process is adopted in which a liquid material in which an alignment polymer is dispersed is applied on a substrate to form the alignment film. ing. Patent Document 1 proposes an ink jet method as one of the liquid phase processes.

The ink jet method is a method for ejecting a liquid material as fine droplets.
For example, an alignment film can be formed with higher accuracy than a flexo method, a spin coating method, or the like, and the amount of liquid used can be reduced. Further, in the ink jet method, in order to eject the liquid material from the nozzle, the viscosity of the liquid material is set to 10 mPa · s or less. Such a low-viscosity liquid improves flowability and leveling along the surface of the substrate, and improves the film thickness uniformity of the alignment film.

In the manufacturing process of the liquid crystal display device, various alignment treatments are performed on the alignment film formed on the substrate in order to give alignment regulating force to the surface of the alignment film. In Patent Document 2, a roller around which a cloth such as rayon is wound is used, and a rubbing process is performed in which the surface of the alignment film is rubbed with a rotating roller. According to this, the polymer main chain of the alignment polymer can be aligned with the rotation direction of the roller, and the alignment direction of the liquid crystal molecules can be defined in a predetermined direction.
JP 2005-121739 A Japanese Patent Laid-Open No. 2004-246092

However, in the above-described liquid crystal display device manufacturing system, as the substrate size increases, the size of the droplet discharge device that discharges the liquid and the size of the alignment processing device that performs the alignment process increase. The expansion of the space has caused a problem of significantly reducing the space efficiency.

The present invention has been made to solve the above problems, and an object of the present invention is to provide a liquid crystal display device manufacturing method and a liquid crystal display device manufacturing system with improved space efficiency.

In the method for manufacturing a liquid crystal display device of the present invention, the discharge head for discharging a liquid containing an alignment film material into droplets and discharging the liquid onto the substrate and the substrate are relatively scanned in one direction, and the one direction of the substrate is A step of drying the plurality of droplets that have landed along the surface to form an alignment film on the substrate; an alignment treatment means for applying an alignment regulating force for liquid crystal molecules to the surface of the alignment film; and the substrate. Scanning in the direction relative to each other, and providing an alignment regulating force along the one direction of the alignment film.

The manufacturing method of the liquid crystal display device of the present invention includes a relative scanning direction of the substrate with respect to the ejection head,
The relative scanning direction of the substrate with respect to the orientation processing means can be made the same direction. Therefore, in the manufacturing process of the liquid crystal display device, the substrate transport path can be formed in a straight line, and the transport path in the manufacturing system can be made simpler than when the scanning directions are crossed. it can. As a result, the space occupied by the manufacturing system can be reduced, and the space efficiency of the manufacturing system can be improved.

In this method of manufacturing a liquid crystal display device, the alignment processing unit is a roller having a rotation axis in a direction substantially orthogonal to the one direction, and the rotating roller and the substrate are relatively scanned in the one direction. The surface of the alignment film may be rubbed by the peripheral surface of the roller to give the alignment regulating force along the one direction of the alignment film.

In this method of manufacturing a liquid crystal display device, the relative scanning direction of the substrate with respect to the ejection head and the relative scanning direction of the substrate with respect to the roller can be made the same direction. Therefore,
In the manufacturing process of the liquid crystal display device, the substrate transport path can be formed in a straight line,
The space efficiency of the manufacturing system can be improved.

In this liquid crystal display manufacturing method, before the liquid droplets are ejected toward the substrate, surface treatment means for imparting lyophilicity to the liquid material to the surface of the substrate, and the substrate in the one direction. It may be configured to include a step of relatively scanning and imparting the lyophilic property along the one direction of the substrate.

In this method of manufacturing a liquid crystal display device, the relative scanning direction of the substrate with respect to the surface processing means can be made the same as the relative scanning direction with respect to the ejection head and the relative scanning direction with respect to the alignment processing means. Therefore, the space efficiency of the manufacturing system can be further improved.

The manufacturing system of the liquid crystal display device of the present invention includes a discharge head that discharges a liquid containing an alignment film material as droplets onto a substrate, and a first scan that relatively scans the discharge head and the substrate in one direction. A droplet discharge device having a means; a drying processing device that dries a liquid material that has landed on the substrate to form an alignment film on the substrate; and an alignment regulating force for liquid crystal molecules is applied to the surface of the alignment film. And an alignment processing apparatus including: an alignment processing unit; and a second scanning unit that relatively scans the alignment processing unit and the substrate in the one direction.

In the liquid crystal display manufacturing system of the present invention, the relative scanning direction of the substrate with respect to the ejection head and the relative scanning direction of the substrate with respect to the alignment processing means can be made the same direction. Therefore, the droplet discharge device and the alignment processing device can be arranged on the same straight line along the scanning direction of the substrate, respectively. A simpler configuration can be achieved. As a result, the space occupied by the manufacturing system can be reduced, and the space efficiency of the manufacturing system can be improved.

In this liquid crystal display device manufacturing system, the orientation processing unit is a roller having a rotation axis in a direction substantially orthogonal to the one direction, and the second scanning unit includes the rotating roller and the substrate. It may be configured to scan relatively in one direction.

The liquid crystal display manufacturing system includes a relative scanning direction of the substrate with respect to the ejection head,
The scanning direction of the substrate relative to the roller can be the same direction. Therefore, in the manufacturing process of the liquid crystal display device, the substrate transport path can be formed in a straight line, and the space efficiency of the manufacturing system can be improved.

The liquid crystal display manufacturing system includes surface treatment means for imparting lyophilicity to the liquid material to the surface of the substrate, and third scanning means for relatively scanning the surface treatment means and the substrate in the one direction. The structure which has these.

In this method of manufacturing a liquid crystal display device, the relative scanning direction of the substrate with respect to the surface processing means can be made the same as the relative scanning direction with respect to the ejection head and the relative scanning direction with respect to the alignment processing means. Therefore, the space efficiency of the manufacturing system can be further improved.

Hereinafter, an embodiment embodying the present invention will be described with reference to FIGS. First, the liquid crystal display device 10 will be described. FIG. 1 is a perspective view showing a liquid crystal display device 10.
In FIG. 1, the liquid crystal display device 10 includes a backlight 11 and a liquid crystal panel 12.
The backlight 11 irradiates the entire surface of the liquid crystal panel 12 with light emitted from a light source 13 such as an LED. The liquid crystal panel 12 has opposite transparent substrates (element substrate 14 and counter substrate 15). The element substrate 14 and the counter substrate 15 are bonded together by a rectangular frame-shaped sealing material 16, and a liquid crystal Ldc is interposed in the gap. Enclose.

An optical substrate 17 such as a polarizing plate or a retardation plate is bonded to the lower surface of the element substrate 14. The optical substrate 17 has a transmission axis in a predetermined direction, and transmits light from the backlight 11 to the liquid crystal Ldc.
To be transparent toward

On the upper surface of the element substrate 14 (hereinafter simply referred to as an element formation surface 14a), a plurality of scanning lines Lx extending in one direction are arranged. Each scanning line Lx is connected to a scanning line driving circuit 18 disposed on one side of the element substrate 14, and a scanning signal from the scanning line driving circuit 18 is input at a predetermined timing.

On the element formation surface 14a, a plurality of data lines Ly extending in a direction orthogonal to the scanning lines Lx are arranged. Each data line Ly is connected to a data line driving circuit 19 disposed on the other side of the element substrate 14, and a data signal based on display data from the data line driving circuit 19 is input at a predetermined timing.

On the element formation surface 14a of the element substrate 14, a plurality of element regions S1 partitioned by the scanning lines Lx and the data lines Ly are formed. Each element region S1 is provided with a switching element (not shown) made of a TFT, a light-transmissive pixel electrode P1, and the like.

On the upper side of each pixel electrode P1, an alignment film OF1 that has been subjected to a rubbing process is laminated. The alignment film OF1 is an alignment polymer (alignment film material) such as alignment polyimide.
And has an alignment regulating force for regulating the alignment direction of liquid crystal molecules on the surface thereof.
The alignment film OF1 is formed by discharging a liquid in which an alignment polymer is dispersed (hereinafter simply referred to as alignment film ink Ik) as droplets onto the entire surface of the element substrate 14 and drying the landed droplets. Is formed. The alignment film OF1 regulates the alignment state of the liquid crystal Ldc in the vicinity of the corresponding pixel electrode P1.

Here, the direction in which the scanning line Lx extends is referred to as the X direction, and the direction in which the data line Ly extends is referred to as the Y direction.
FIG. 2 is a perspective view showing the counter substrate 15 and shows a state in which the element substrate 14 side is faced up.

In FIG. 2, a polarizing plate 24 is disposed on the lower surface of the counter substrate 15 (upper surface in FIG. 1). The polarizing plate 24 has a transmission axis in a predetermined direction and allows light from the liquid crystal Ldc to pass therethrough. The upper surface of the counter substrate 15 (the lower surface in FIG. 1; hereinafter simply referred to as the filter forming surface 15a).
) Is formed with a partition wall 25. The partition wall 25 is a thin film formed of a light shielding material that blocks light emitted from the liquid crystal Ldc, and is formed in a lattice shape facing the scanning lines Lx and the data lines Ly.

The partition wall 25 is formed in a region of the filter forming surface 15a facing the element region S1 of the element substrate 14.
A filter region S2 surrounded by the partition walls 25 is defined. A color filter layer CF is formed in each of the plurality of filter regions S2. The color filter layer CF transmits light of a specific wavelength from the light emitted from the liquid crystal Ldc, and the backlight 11
Is converted into colored light (for example, red light, green light, blue light).

A common overcoat layer 26 and a counter electrode P2 are stacked above the partition walls 25 and the color filter layer CF. The overcoat layer 26 is a thin film formed of a light transmissive resin that transmits light emitted from the liquid crystal Ldc, and flattens the entire surface of the counter substrate 15. The counter electrode P2 is a light-transmitting conductive film made of a transparent electrode material (for example, indium tin oxide: ITO), and is connected to the scanning line driving circuit 18 to receive a predetermined common potential.

On the upper side of the counter electrode P2, an alignment film OF2 that has been subjected to a rubbing process is laminated. Like the alignment film OF1, the alignment film OF2 is a thin film made of an alignment polymer such as alignment polyimide, and has an alignment regulating force that restricts the alignment direction of liquid crystal molecules on the surface thereof. The alignment film OF2 is a droplet of the alignment film ink Ik that is discharged onto the entire surface of the element substrate 14;
It is formed by drying the landed droplets. The alignment film OF2 regulates the alignment state of the liquid crystal Ldc in the vicinity of the corresponding counter electrode P2.

The scanning line driving circuit 18 selects each scanning line Lx one by one based on line sequential scanning at a predetermined timing, and turns on the control elements in each element region S1 only during the selection period. The switching element in the on state receives a data signal based on the display data from the data line Ly,
A data signal is output to the corresponding pixel electrode P1. Each pixel electrode P1 is connected to each pixel electrode P1.
Based on the potential difference between 1 and the counter electrode P2, the alignment state of the corresponding liquid crystal Ldc is modulated,
The polarization state of light from the optical substrate 17 is modulated for each element region S1. The modulated light is converted into colored light through the corresponding color filter layer CF, and a full color image without display unevenness is displayed.

Next, a manufacturing system of the liquid crystal display device 10 will be described with reference to FIG. FIG. 3 is a configuration diagram schematically showing a manufacturing system of the liquid crystal display device 10.
The manufacturing system 30 of the liquid crystal display device 10 includes a stocker 3 that carries in and out the counter substrate 15.
1 and a counter substrate production line 32 for performing various processing steps on the counter substrate 15.

The stocker 31 stores a plurality of types of counter substrates 15 subjected to processing up to an arbitrary processing step in units of cassettes. The stocker 31 carries the counter substrate 15 to be stored into the counter substrate production line 32 in units of cassettes, and stores the counter substrate 15 unloaded from the counter substrate production line 32 in an empty cassette for storage.

The stocker 31 carries the element substrate 14 into an element substrate production line (not shown) for producing the element substrate 14, and stores the element substrate 14 carried out from the element substrate production line in an empty cassette. The stocker 31 encloses the liquid crystal Ldc between the element substrate 14 and the counter substrate 15 and carries the element substrate 14 and the counter substrate 15 into a panel manufacturing line (not shown) for manufacturing a liquid crystal panel to manufacture the panel. The liquid crystal panel 12 carried out from the line is stored.

The counter substrate manufacturing line 32 includes a partition forming line 33 that performs a forming process of the partition 25, a filter forming line 34 that performs a forming process of the color filter layer CF, and an overcoat layer forming line 35 that performs a forming process of the overcoat layer 26. . The counter substrate production line 32 is
The counter electrode forming line 36 that performs the process of forming the counter electrode P2 and the alignment film forming line 37 that performs the process of forming the alignment film OF2 are provided.

The partition forming line 33 has a transfer line 33L for carrying the counter substrate 15 in an unprocessed state from the stocker 31 and transferring it to various apparatuses. In the middle of the transfer line 33L, the partition wall forming line 33 is, for example, a cleaning device 33A for cleaning the surface of the counter substrate 15, and a coating device 33B for applying an acrylic photosensitive resin containing a light shielding material to the cleaned filter forming surface 15a. Have In addition, the partition wall forming line 33 is placed on the filter forming surface 15 in the middle of the transport line 33L.
It has an exposure device 33C and a development device 33D for exposing and developing the coating film formed on a, and a baking device 33E for drying the developed coating film.

The partition wall forming line 33 is provided with a cleaning device 3 for the counter substrate 15 carried in from the stocker 31.
A cleaning process using 3A and a coating process using the coating apparatus 33B are executed. Further, the partition forming line 33 executes an exposure process using the exposure device 33C, a developing process using the developing device 33D, and a drying process using the baking device 33E, and the partition 25 is formed on the filter forming surface 15a of the counter substrate 15. It is formed and carried out to the stocker 31.

The filter forming line 34 has a transfer line 34L for carrying the counter substrate 15 on which the partition walls 25 are formed from the stocker 31 and transferring them to various apparatuses. The filter forming line 34 is, for example, a cleaning device 34A that cleans the surface of the counter substrate 15 in the middle of the transport line 34L.
The coating device 34B applies a photosensitive resin in which an inorganic pigment or an organic pigment for each color is dispersed to the cleaned filter forming surface 15a. Further, the filter forming line 34 exposes and develops the coating film formed on the filter forming surface 15a in the middle of the transport line 34L, and the exposure device 34C and the developing device 34D, and the baking device 3 that dries the developed color filter layer CF.
4E.

The filter forming line 34 is carried in from the stocker 31 and has the partition wall 25.
5, a cleaning process using the cleaning device 34A and a coating process using the coating device 34B are executed. Further, the filter forming line 34 is an exposure process using the exposure device 34C, and a developing device 34.
The developing process using D and the drying process using the baking apparatus 34E are executed, and the color filter layer CF is formed on the filter forming surface 15a of the counter substrate 15 and carried out to the stocker 31.

The overcoat layer forming line 35 is provided on the counter substrate 15 on which the color filter layer CF is formed.
Is transported from the stocker 31 and transported to various devices. The overcoat layer forming line 35 includes, for example, a cleaning device 35A that cleans the surface of the counter substrate 15 in the middle of the transport line 35L, and a photosensitive resin in which a colorless and transparent resin material is dispersed in the cleaned color filter layer CF. A coating device 35B for coating is provided. In addition, the overcoat layer forming line 35 includes an exposure device 35C and a development device 35D that expose and develop the coating film formed on the color filter layer CF in the middle of the transport line 35L, and the developed overcoat layer 2.
6 has a baking device 35E for drying 6.

The overcoat layer forming line 35 is carried from the stocker 31 and is supplied with the color filter layer C.
A cleaning process using the cleaning device 35A and a coating process using the coating device 35B are performed on the counter substrate 15 having F. The overcoat layer forming line 35 executes an exposure process using the exposure apparatus 35C, a development process using the developing apparatus 35D, and a drying process using the baking apparatus 35E, and the overcoat layer is formed on the color filter layer CF. 26 to form a stocker 3
Carry out to 1.

The counter electrode forming line 36 has a transfer line 36L for carrying the counter substrate 15 on which the overcoat layer 26 is formed from the stocker 31 and transferring it to various apparatuses. The counter electrode forming line 36 includes, for example, a cleaning device 36A for cleaning the surface of the overcoat layer 26 and a film forming device 36B for forming the counter electrode P2 on the cleaned overcoat layer 26 in the middle of the transport line 36L. .

The counter electrode formation line 36 performs a cleaning process using the cleaning apparatus 36A and a film forming process using the film forming apparatus 36B on the counter substrate 15 carried in from the stocker 31 and having the overcoat layer 26. Then, the counter electrode P <b> 2 is stacked on the overcoat layer 26 and carried out to the stocker 31. In the case of patterning the counter electrode P2, in the subsequent stage of the film forming apparatus 36B,
A coating apparatus for forming a resist mask, an exposure apparatus, a developing apparatus, a baking apparatus, an etching apparatus for etching the counter electrode P2 using the resist mask as a mask, and a cleaning apparatus for removing the resist mask are arranged. Also good.

The alignment film forming line 37 has a transfer line 37L for carrying the counter substrate 15 on which the counter electrode P2 is formed from the stocker 31 and transferring it to various apparatuses. The alignment film forming line 37 includes a surface processing device 37A, a droplet discharge device 37B, a drying processing device 37C, and an alignment processing device 37D in the middle of the transport line 37L.

FIG. 4 is a diagram schematically illustrating the positions of various devices in the alignment film formation line 37.
In FIG. 4, the surface treatment apparatus 37A includes a rectangular parallelepiped first base La extending in one direction and a rectangular parallelepiped surface treatment stage Sa mounted on the upper side of the first base La and extending in one direction. It has been. In addition, the surface treatment apparatus 37A includes an irradiation unit 41 as a surface treatment unit above the surface treatment stage Sa. In the present embodiment, the surface treatment stage Sa constitutes a third scanning unit.

The surface treatment stage Sa is a stage on which the counter substrate 15 having the counter electrode P2 is placed, and the counter substrate 15 carried in from the stocker 31 is transferred by an inline transfer device (not shown). The surface treatment stage Sa positions and fixes the counter substrate 15 transferred from the stocker 31 with its filter forming surface 15a (counter electrode P2) facing upward. The surface treatment stage Sa is drivably coupled to an output shaft of an X-axis motor (not shown) provided in the first base La, and in the longitudinal direction of the first base La when the X-axis motor rotates forward or reverse. Move
The counter substrate 15 positioned and fixed is scanned (main scanning) along the same longitudinal direction.

Here, the longitudinal direction of the first base La, that is, the main scanning direction of the counter substrate 15 is X.
It is arranged to be in the direction.
The irradiation unit 41 generates oxygen-based atmospheric pressure plasma and supplies activated oxygen. When the counter substrate 15 passes directly below the irradiation unit 41, the irradiation unit 41 is activated toward the surface of the counter electrode P2. Supply oxygenated oxygen. The activated oxygen decomposes and removes organic substances adhering to the surface of the counter electrode P2, and cleans the surface of the counter electrode P2. Further, the activated oxygen is the alignment film ink I.
A lyophilic group for k (for example, a polar group such as a hydroxyl group) is imparted to the surface of the counter electrode P2, and lyophilicity for the alignment film ink Ik is imparted to the surface of the counter electrode P2. The lyophilicity in the present embodiment means that the droplet of the alignment film ink Ik that has landed on the counter electrode P2 is sufficiently wet and spread along the surface direction of the counter electrode P2, and has a uniform thickness over the entire surface of the counter electrode P2. This is the property of forming a liquid film. For example, the lyophilic property is a property in which the contact angle of the alignment film ink Ik with respect to the counter electrode P2 is set to 20 ° or less.

The irradiation unit 41 is formed to have a size that covers the entire width of the counter substrate 15 in the Y direction, and supplies activated oxygen over the entire width of the counter substrate 15 in the Y direction when the counter substrate 15 passes directly below the irradiation unit 41. When the surface treatment stage Sa performs main scanning on the counter substrate 15, the irradiation unit 41 supplies oxygen that has been activated over the entire counter substrate 15 in order from the end of the counter substrate 15 in the X direction.

That is, the surface treatment apparatus 37A causes the counter substrate 15 to perform main scanning in the X direction, and the counter substrate 15
The lyophilic property is imparted over the entire counter substrate 15 in order from the end in the X direction.
In FIG. 4, a droplet discharge device 37B is disposed in the X direction of the surface treatment device 37A. The droplet discharge device 37B includes a rectangular parallelepiped second base Lb extending in one direction, and a second base L
and a rectangular parallelepiped droplet discharge stage Sb mounted on the upper side of b and extending in one direction. The droplet discharge device 37B includes a carriage 42 above the droplet discharge stage Sb.
Is provided. In the present embodiment, the droplet discharge stage Sb constitutes a first scanning unit.

The droplet discharge stage Sb is a stage on which the counter substrate 15 subjected to the surface treatment is placed, and the counter substrate 15 placed on the surface treatment stage Sa is transferred by an inline transfer device (not shown). Is done. The droplet discharge stage Sb positions and fixes the counter substrate 15 transferred from the surface treatment stage Sa with the counter electrode P2 subjected to the surface treatment facing upward. The droplet discharge stage Sb is drivingly connected to an output shaft of an X-axis motor (not shown) installed in the second base Lb, and when the X-axis motor rotates forward or reverse, the longitudinal direction of the second base Lb The counter substrate 15 positioned and fixed is scanned (main scan) along the same longitudinal direction.

Here, like the surface treatment apparatus 37A, the second base Lb is arranged so that its longitudinal direction, that is, the main scanning direction of the counter substrate 15 is the X direction. Thus, the main scanning direction of the counter substrate 15 in the surface treatment apparatus 37A and the main scanning direction of the counter substrate 15 in the droplet discharge apparatus 37B are defined on the same straight line along the X direction.

An ink tank 43 and a plurality of ejection heads H are mounted on the upper side and the lower side of the carriage 42, respectively. The ink tank 43 is a tank that stores the alignment film ink Ik, and supplies the alignment film ink Ik adjusted to a predetermined pressure to each of the plurality of ejection heads H.
Each of the plurality of ejection heads H is arranged over substantially the entire width in the Y direction of the carriage 42, and faces the region of the counter substrate 15 that extends over the entire width in the Y direction when the counter substrate 15 passes directly below the irradiation unit 41.

FIG. 5 is a perspective view showing the ejection head H as viewed from the droplet ejection stage Sb.
In FIG. 5, a nozzle plate 44 is provided on the upper side (lower side in FIG. 4) of the ejection head H. On the upper surface of the nozzle plate 44, a nozzle forming surface 4 parallel to the counter substrate 15.
4a is formed, and a plurality of nozzles N penetrating in the normal direction of the nozzle forming surface 44a are arranged at equal intervals along the Y direction on the nozzle forming surface 44a. The plurality of ejection heads H are X
When viewed from the direction, a plurality of nozzles N are arranged at substantially equal intervals across the entire width of the carriage 42 in the Y direction, and when the counter substrate 15 passes directly below the irradiation unit 41, the region over the entire width of the counter substrate 15 in the Y direction and the nozzles N Facing each other.

The plurality of ejection heads H eject the alignment film ink Ik as droplets from each nozzle N when the counter substrate 15 passes immediately below the nozzle N, respectively. The discharged liquid droplet is the counter substrate 1.
It flies toward 5 and lands over the entire width in the Y direction of the surface of the counter electrode P2 subjected to the surface treatment. The droplets that land are wet and spread in the surface direction of the filter forming surface 15a, and form a liquid film LF that extends over the entire width of the counter electrode P2 in the Y direction, starting from the end of the counter substrate 15 in the X direction.

That is, the droplet discharge device 37B causes the counter substrate 15 to perform main scanning in the X direction, and the counter substrate 15
The liquid film LF is formed over the entire counter substrate 15 in order from the X-direction end.
In FIG. 4, a drying processing device 37C is disposed in the X direction of the droplet discharge device 37B. The drying apparatus 37C includes a chamber 45, a third base Lc having a rectangular parallelepiped shape provided in the inner space of the chamber 45 and extending in one direction, and a rectangular parallelepiped mounted on the upper side of the third base Lc and extending in one direction. And a drying stage Sc having a shape.

The drying processing stage Sc is a stage on which the counter substrate 15 having the liquid film LF is placed, and the counter substrate 15 placed on the droplet discharge stage Sb is transferred by an inline transfer device (not shown). . The drying processing stage Sc positions and fixes the counter substrate 15 transferred from the droplet discharge stage Sb with the liquid film LF facing upward. Chamber 45 is
When the drying processing stage Sc positions and fixes the counter substrate 15, the internal space is reduced to a predetermined pressure, and the liquid film LF is dried to form the alignment film OF2. The chamber 45 is a liquid film L
After drying F, the internal space is increased to a predetermined pressure so that the counter substrate 15 can be transferred.

That is, the drying processing apparatus 37C accommodates the counter substrate 15 having the liquid film LF, dries the liquid film LF, and forms the alignment film OF2 on the upper side of the counter electrode P2.
In FIG. 4, an alignment processing device 37D is disposed in the X direction of the drying processing device 37C. The alignment processing device 37D includes a rectangular parallelepiped fourth base Ld extending in one direction, and a fourth base L
A rectangular parallelepiped alignment processing stage Sd mounted on the upper side of d and extending in one direction, and a roller 46 as an alignment processing means disposed above the alignment processing stage Sd are provided. In the present embodiment, this surface treatment stage Sa constitutes the second scanning means.

The alignment processing stage Sd is a stage on which the counter substrate 15 having the alignment film OF2 is placed, and the counter substrate 15 mounted on the drying processing stage Sc is transferred by an inline transfer device (not shown). The alignment processing stage Sd positions and fixes the counter substrate 15 transferred from the drying processing stage Sc with the alignment film OF2 facing upward. The alignment processing stage Sd is drivingly connected to an output shaft of an X-axis motor (not shown) provided in the fourth base Ld, and in the longitudinal direction of the fourth base Ld when the X-axis motor rotates forward or reverse. The counter substrate 15 moved and fixed is scanned (main scan) along the same longitudinal direction.

Here, the fourth base Ld is the same as the surface treatment device 37A and the droplet discharge device 37B,
The longitudinal direction, that is, the main scanning direction of the counter substrate 15 is arranged in the X direction. Thereby, the main scanning direction of the counter substrate 15 in the alignment processing device 37D and the main scanning direction of the counter substrate 15 in the surface processing device 37A and the droplet discharge device 37B are defined on the same straight line along the X direction.

The roller 46 is a roller having a rotation axis A extending in the direction orthogonal to the main scanning direction of the counter substrate 15, that is, the Y direction, and a rubbing cloth 46 a is attached to the outer peripheral surface thereof.
The roller 46 is disposed at such a height that the outer peripheral surface of the rubbing cloth 46a is in sliding contact with the alignment film OF2 when the counter substrate 15 is scanned in the X direction.

When the counter substrate 15 is main-scanned in the X direction, the roller 46 receives the rotational force of the rotation axis A and rotates in a direction (counterclockwise when viewed from the Y direction) according to the moving direction of the counter substrate 15 that is in sliding contact. To do.
When the counter substrate 15 is scanned in the X direction, the rotating roller 46 rubs the surface of the alignment film OF2 with the outer peripheral surface of the rubbing cloth 46a and aligns the polymer main chain of the aligning polymer with the rotation direction of the roller 46. That is, the main chain direction of the oriented polymer is aligned with the X direction.

The roller 46 is formed to a size that covers the entire width of the counter substrate 15 in the Y direction. When the surface of the alignment film OF2 is rubbed by the rubbing cloth 46a, the main chain direction of the alignment polymer is changed to X over the entire width of the counter substrate 15 in the Y direction. Align in the direction. When the alignment processing stage Sd performs main scanning on the counter substrate 15, the roller 46 aligns the main chain direction of the alignment polymer in the X direction over the entire alignment film OF2 in order from the end in the X direction of the alignment film OF2.

That is, the alignment processing apparatus 37D causes the counter substrate 15 to perform main scanning in the X direction, and aligns the alignment film OF2.
The rubbing direction of the alignment film OF2 is defined in the X direction over the entire alignment film OF2 in order from the end in the X direction. Then, the alignment processing device 37D performs an alignment process on the entire alignment film OF2 of the counter substrate 15 and carries the counter substrate 15 to the stocker 31.

Accordingly, the scanning direction of the counter substrate 15 in the surface processing device 37A, the droplet discharge device 37B, and the alignment processing device 37D can be made the same direction. Then, the surface treatment device 37A, the droplet discharge device 37B, and the alignment treatment device 37D can be arranged on the same straight line along the conveying direction of the counter substrate 15, respectively.

Next, a method for manufacturing the liquid crystal display device 10 using the liquid crystal display device manufacturing system 30 will be described.
First, as shown in FIG. 3, the stocker 31 removes the untreated counter substrate 15 from the partition line 3.
3 to transport. The partition wall forming line 33 sequentially performs a cleaning process, a coating process, an exposure process, a developing device, and a drying process on the counter substrate 15, and the partition wall 2 is formed on the filter forming surface 15 a of the counter substrate 15.
5 is formed and carried out to the stocker 31.

Next, the stocker 31 conveys the counter substrate 15 having the partition 25 from the partition forming line 33 to the filter forming line 34. The filter forming line 34 sequentially performs a cleaning process, a coating process, an exposure process, a developing device, and a drying process on the counter substrate 15 having the partition walls 25, and applies the color filter layer CF to the filter forming surface 15 a of the counter substrate 15. Form.

The stocker 31 conveys the counter substrate 15 having the color filter layer CF from the filter formation line 34 to the overcoat layer formation line 35. Overcoat layer forming line 35
Performs a cleaning step, a coating step, an exposure step, a development step, and a drying step on the counter substrate 15 having the color filter layer CF, and stacks the overcoat layer 26 on the color filter layer CF to store the stocker 31. To be taken out.

The stocker 31 conveys the counter substrate 15 having the overcoat layer 26 from the overcoat layer forming line 35 to the counter electrode forming line 36. The counter electrode forming line 36 performs a cleaning process and a film forming process on the counter substrate 15 having the overcoat layer 26, and stacks the counter electrode P <b> 2 on the overcoat layer 26 and carries it out to the stocker 31.

The stocker 31 conveys the counter substrate 15 having the counter electrode P <b> 2 from the counter electrode formation line 36 to the alignment film formation line 37. The alignment film forming line 37 conveys the counter substrate 15 having the counter electrode P2 to the surface treatment apparatus 37A.

The surface treatment apparatus 37A positions and fixes the counter substrate 15 on the surface treatment stage Sa, performs main scanning in the X direction, and imparts lyophilicity over the entire counter electrode P2 in order from the end of the counter electrode P2 in the X direction (surface treatment). Run). When the surface treatment of the counter substrate 15 is completed, the alignment film forming line 37 transports the counter substrate 15 of the surface treatment stage Sa to the droplet discharge device 37B.

The droplet discharge device 37B positions and fixes the counter substrate 15 to the droplet discharge stage Sb, performs main scanning in the X direction, and forms the liquid film LF over the entire counter substrate 15 in order from the X direction end of the counter electrode P2. (Droplet discharge processing is executed). The alignment film forming line 37 is connected to the counter substrate 15.
When the liquid droplet ejection process is completed, the counter substrate 15 of the liquid droplet ejection stage Sb is removed from the drying processing device 37.
Transport to C.

The drying processing device 37C positions and fixes the counter substrate 15 to the drying processing stage Sc, and depressurizes the internal space to a predetermined pressure to dry the liquid film LF (executes the drying processing). When the drying process of the counter substrate 15 is completed, the alignment film forming line 37 transports the counter substrate 15 of the drying processing stage Sc to the alignment processing device 37D.

The alignment processing device 37D positions and fixes the counter substrate 15 on the alignment processing stage Sd, performs main scanning in the X direction, and executes alignment processing over the entire alignment film OF2 in order from the X direction end of the alignment film OF2. The alignment film forming line 37 carries the counter substrate 15 of the alignment processing stage Sd to the stocker 31 when the alignment processing of the counter substrate 15 is completed.

Thereafter, the stocker 31 carries the counter substrate 15 having the alignment film OF2 and the element substrate 14 carried out from the element substrate production line into the panel production line, and the element substrate 14 and the counter substrate 15 are loaded.
A liquid crystal panel 12 is manufactured by enclosing a liquid crystal Ldc therebetween.

Next, effects of the present embodiment configured as described above will be described below.
(1) According to the above-described embodiment, the counter substrate 15 is main-scanned in the X direction with respect to the ejection head H, and the alignment film ink Ik is applied to the entire counter electrode P2 in order from the X direction end of the counter electrode P2.
Was discharged to form an alignment film OF2. Then, the counter substrate 15 was main-scanned in the X direction with respect to the roller 46, and an alignment process was performed in which the X direction was the rubbing direction over the entire counter electrode P2 in order from the X direction end of the alignment film OF2.

Therefore, the scanning direction of the counter substrate 15 in the droplet discharge process and the scanning direction of the counter substrate 15 in the alignment process can be made the same direction. Therefore, the conveyance path of the counter substrate 15 can be formed in a straight line, and the conveyance path in the manufacturing system 30 can be made simpler than when the scanning directions are crossed. As a result, the occupied space of the manufacturing system 30 can be reduced, and the space efficiency of the manufacturing system 30 can be improved.

(2) According to the above embodiment, before the droplet discharge process is executed, the counter substrate 15 is main-scanned in the X direction with respect to the irradiation unit 41, and the counter electrode P <b> 2 is sequentially formed from the X direction end of the counter electrode P <b> 2. A lyophilic property was imparted throughout. Therefore, the scanning direction of the counter substrate 15 in the surface treatment can be made the same direction as the scanning direction of the counter substrate 15 in the droplet discharge processing and the alignment processing. As a result, the space efficiency of the manufacturing system 30 can be further improved.

In addition, you may change the said embodiment as follows.
In the above embodiment, the first scanning unit is embodied in the droplet discharge stage Sb, and the discharge head H
In contrast, the counter substrate 15 is configured to perform main scanning. Not limited to this, the first scanning unit may be embodied in the carriage 42 and the ejection head H may be scanned in the anti-X direction with respect to the counter substrate 15 that is stationary. That is, the first scanning unit is configured by using the droplet discharge stage Sb and the carriage 42.
Any configuration may be used as long as the discharge head H and the counter substrate 15 are relatively scanned in the X direction.

In the above embodiment, the second scanning unit is embodied in the alignment processing stage Sd, and the counter substrate 15 is main-scanned with respect to the roller 46. However, the second scanning means is not limited to this.
For example, a configuration may be adopted in which the rotating roller 46 is scanned in the anti-X direction with respect to the counter substrate 15 placed stationary. That is, the second scanning unit may be embodied in at least one of the alignment processing stage Sd and the roller 46, and may be configured to scan the roller 46 and the counter substrate 15 relatively in the X direction.

In the embodiment described above, the third scanning unit is embodied in the surface treatment stage Sa, and the counter substrate 15 is main-scanned with respect to the irradiation unit 41. Not only this but the 3rd scanning means is irradiation part 41.
In other words, the irradiation unit 41 may be scanned in the anti-X direction with respect to the counter substrate 15 placed stationary. That is, the third scanning unit may be embodied in at least one of the surface treatment stage Sa and the irradiation unit 41 and may be configured to scan the irradiation unit 41 and the counter substrate 15 relatively in the X direction.

In the above embodiment, the alignment film is embodied with respect to the alignment film OF2. For example, the alignment film may be embodied with respect to the alignment film OF1, or both the alignment film OF1 and the alignment film OF2.

In the above embodiment, the orientation processing means is embodied in the roller 46. For example, the alignment processing unit may be embodied as a light irradiation unit that emits polarized light. That is,
An alignment film is formed of an alignment polymer having a photo-alignment function, and polarized light emitted from the light irradiation means is aligned with one end of the alignment film OF2 with respect to the alignment film OF2 main-scanned in one direction. You may make it the structure which irradiates over the whole in order from. In other words, the alignment processing means only needs to apply an alignment regulating force to the counter substrate 15 that is main-scanned in the X direction.

In the above embodiment, the rotation axis A of the roller 46 is arranged along the Y direction.
For example, the rotation axis A of the roller 46 may be inclined with respect to the Y direction. That is, the rubbing direction of the alignment film OF2 may be defined not only in the X direction but also in a direction crossing the X direction, and in the direction of the alignment regulating force applied to the counter substrate 15 that is main-scanned in the X direction. I just need it.

In the above embodiment, the surface treatment means is embodied in the irradiation unit 41 that supplies activated oxygen. For example, the surface treatment means may be embodied as an irradiation unit that irradiates the surface of the counter electrode P2 with ultraviolet rays. That is, the surface treatment means cleans the surface of the counter electrode P2,
What is necessary is just to give lyophilicity with respect to a liquid.

In the above embodiment, the ejection head H has a single nozzle row. For example, the ejection head H may have two or more nozzle rows.

The perspective view which shows a liquid crystal display device. The perspective view which shows a counter substrate. The figure which shows the manufacturing system of a liquid crystal display device. The figure which shows the alignment film formation line. The perspective view which shows an ejection head.

Explanation of symbols

A ... Rotating shaft, H ... Discharge head, Ik ... Ink for alignment film as liquid, OF1, OF2 ...
Alignment film, Sa ... surface treatment stage constituting third scanning means, Sb ... droplet discharge stage constituting first scanning means, Sc ... alignment treatment stage constituting second scanning means, 10 ... liquid crystal display device, 15 ... counter substrate, 30 ... manufacturing system of liquid crystal display device, 37A ... surface treatment device, 3
7B ... Droplet discharge device, 37C ... Drying processing device, 37D ... Orientation processing device, 41 ... Irradiating part constituting surface processing means, 46 ... Roller as orientation processing means

Claims (6)

A plurality of liquid droplets that have landed along the one direction of the substrate are scanned relatively in one direction with a discharge head that discharges the liquid material containing the alignment film material as droplets onto the substrate, and the substrate. Drying to form an alignment film on the substrate;
An alignment treatment means for imparting an alignment regulating force to liquid crystal molecules on the surface of the alignment film; and a step of relatively scanning the substrate in the one direction and applying an alignment regulating force along the one direction of the alignment film; Having,
A method for manufacturing a liquid crystal display device. It is a manufacturing method of the liquid crystal display device according to claim 1,
The orientation processing means is a roller having a rotation axis in a direction substantially orthogonal to the one direction,
The rotating roller and the substrate are relatively scanned in the one direction, the surface of the alignment film is rubbed by the peripheral surface of the roller, and the alignment regulating force is applied along the one direction of the alignment film. ,
A method for manufacturing a liquid crystal display device. It is a manufacturing method of the liquid crystal display device according to claim 1 or 2,
Before discharging the liquid droplets toward the substrate, surface treatment means for imparting lyophilicity to the liquid material on the surface of the substrate and the substrate are relatively scanned in the one direction, and the substrate Providing the lyophilic property along the one direction;
A method for manufacturing a liquid crystal display device. A droplet discharge device comprising: a discharge head that discharges a liquid containing an alignment film material as droplets onto a substrate; and first scanning means that relatively scans the discharge head and the substrate in one direction. ,
A drying apparatus for drying the liquid material that has landed on the substrate to form an alignment film on the substrate;
An alignment processing apparatus comprising: an alignment processing unit that applies an alignment regulating force on liquid crystal molecules to the surface of the alignment film; and a second scanning unit that relatively scans the alignment processing unit and the substrate in the one direction. Having,
A system for manufacturing a liquid crystal display device. It is a manufacturing system of the liquid crystal display device according to claim 4,
The orientation processing means includes
A roller having a rotation axis in a direction substantially orthogonal to the one direction;
The second scanning means includes
Relatively scanning the rotating roller and the substrate in the one direction;
A system for manufacturing a liquid crystal display device. A manufacturing system of a liquid crystal display device according to claim 4 or 5,
A surface treatment apparatus comprising: surface treatment means for imparting lyophilicity to the liquid material to the surface of the substrate; and third scanning means for relatively scanning the surface treatment means and the substrate in the one direction. Prepared,
A method for manufacturing a liquid crystal display device.

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