JP2008153043A - Electroluminescent apparatus and electronic equipment - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an electroluminescent apparatus preventing air bubbles in a buffer layer or a gap in a protective film in the vicinity of a step part, etc., by reducing steps formed by an auxiliary electrode. <P>SOLUTION: The electroluminescent apparatus is provided with a plurality of first electrodes 14, a separating layer 16 sectioning a plurality of the first electrodes 14, a functioning layer 17 provided in a region sectioned by the separating layer 16, a second electrode 18 provided covering the functioning layer 17 and the separating layer 16, a protective film 19 provided on the second electrode 18, a groove part H2 provided on a top surface of the separating layer 18 and the auxiliary electrode 50 provided selectively to a recessed part formed in the groove part H2. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an electroluminescence device and an electronic apparatus.

  In recent years, development of electroluminescence devices using electroluminescence elements as pixels has been progressing. The electroluminescence element has a structure in which a functional layer including at least one layer including a light emitting layer is sandwiched between a pair of upper and lower electrodes. In an active matrix electroluminescence device, a plurality of first electrodes (pixel electrodes) arranged in a matrix are partitioned to form a lattice-shaped partition layer, and a functional layer is disposed in a region partitioned by the partition layer. The And a 2nd electrode (counter electrode) is formed covering a functional layer and a partition layer. Here, the second electrode is formed so as to cover the entire substrate, and functions as a common electrode common to the plurality of first electrodes. Hereinafter, “electroluminescence” is abbreviated as “EL”.

EL elements are classified into a bottom emission structure that extracts light from the substrate side and a top emission structure that extracts light from the opposite substrate side such as a sealing substrate and a color filter substrate, depending on the direction of light extraction from the light emitting layer. The In an EL device having a top emission structure, the second electrode is generally arranged on the side from which light is emitted. The second electrode is formed of a light-transmitting conductive material, for example, an ITO (indium tin oxide) film or an IZO (indium zinc oxide) film. However, since such a translucent conductive film has a higher resistance than a metal film such as Al, there is a possibility that voltage nonuniformity is caused in the second electrode and display quality is deteriorated. For this reason, in particular, in an EL device having a large top emission structure, it has been proposed to form an auxiliary electrode having a low resistance on the partition wall layer to prevent a voltage drop of the second electrode (see, for example, Patent Document 1). ).
JP 2003-123988 A

  FIG. 12 is a schematic configuration diagram of a conventional EL device. In the figure, the auxiliary electrode 50 is provided on the upper surface of the partition wall layer 16. A functional layer 17 is provided in the opening H of the partition wall layer 16, and a second electrode 18 is provided to cover the functional layer 17. The auxiliary electrode 50 is stacked on the second electrode 18. Here, the partition wall layer 16 has a thickness of about 1 μm, and the auxiliary electrode 50 has a thickness of about 0.5 μm to 1 μm. The auxiliary electrode 50 is provided so as to protrude from the upper surface of the partition wall layer 16, and the step of the partition including the auxiliary electrode 50 is about 2 μm.

  By the way, in the EL device, improvement in durability against oxygen and moisture is a problem. Therefore, a technique called thin film sealing that covers the surface of the EL element with a protective film 19 (gas barrier layer) excellent in gas barrier properties is used. In the thin film sealing, a protective film 19 made of silicon nitride, silicon oxide, ceramics or the like having excellent gas barrier properties is formed on the entire substrate by a high-density plasma film forming method, and this protective film 19 is the second electrode. The surface of 18 and the side surface of the partition wall layer 16 are covered to prevent entry of oxygen and moisture from the outside.

  However, since the protective film 19 is made of a highly dense and extremely hard inorganic film in order to exhibit moisture barrier properties, if there are irregularities or steep steps on the surface of the thin film, external stress concentrates and cracks occur. Or peeling. In order to prevent such cracks and peeling, a structure in which a buffer layer as a planarizing film is provided on the underlayer of the protective film has been proposed. However, since the buffer layer is formed by screen printing or the like, the surface of the substrate 10A If there is a large level difference, bubbles may be generated at the level difference and the display quality may be degraded. For example, when the squeegee is scanned in the direction of the arrow, a shadow of a stepped portion is generated in a portion indicated by reference numeral K1, and bubbles are easily generated in this portion. Further, when the squeegee is scanned, if there is a large step on the substrate 10A, the pressing force of the squeegee may be uneven, and a flat buffer layer may not be formed. Furthermore, since the pressing force of the squeegee increases at the top of the step, peeling may occur in the functional layer 17 near the step portion K2.

  The present invention has been made in view of such circumstances, and can reduce the level difference formed by the auxiliary electrode and prevent bubbles in the buffer layer, loss of the protective film near the level difference, and the like. An object is to provide an electroluminescence device. It is another object of the present invention to provide an electronic device with high reliability and excellent light emission characteristics by including such an electroluminescence device.

  In order to solve the above-described problems, an electroluminescence device of the present invention includes a plurality of first electrodes, a partition layer that partitions the plurality of first electrodes, and a functional layer provided in a region partitioned by the partition layer. A second electrode provided to cover the functional layer and the partition layer, a protective film provided on the second electrode, a groove provided on the upper surface of the partition layer, and the groove. And an auxiliary electrode selectively provided in the recess. According to this configuration, since the auxiliary electrode is embedded in the groove, the step on the partition wall layer is reduced, and an electroluminescence device that is less likely to cause cracking or peeling of the protective film can be provided.

  In the present invention, it is desirable that a buffer layer is provided on the protective film, and a second protective film is provided on the buffer layer. According to this configuration, since the surface of the electroluminescent element can be double protected by the protective film and the second protective film, it is possible to provide an electroluminescent device that is highly resistant to oxygen and moisture and excellent in reliability. . In addition, since the base of the second protective film can be planarized by the buffer layer, cracks and peeling due to a step on the substrate surface can be suppressed, and adhesion to the second protective film can also be improved. . The buffer layer is generally formed by screen printing or the like, and if the substrate has large unevenness, bubbles may be generated in the stepped portion. However, in the present invention, the step on the partition wall layer is reduced. Such a problem of bubbles is unlikely to occur, and an electroluminescence device having excellent display quality can be provided.

  In the present invention, the depth of the groove is preferably substantially equal to the thickness of the auxiliary electrode. According to this configuration, the step caused by the auxiliary electrode can be substantially flattened. As described above, if there is a large step on the surface of the partition wall layer, problems such as cracks in the protective film and bubbles in the buffer layer may occur, so the depth of the groove is too shallow or too deep. However, it is inappropriate in terms of eliminating the steps. Therefore, it is desirable to completely eliminate the level difference caused by the auxiliary electrode, and for this purpose, it is desirable that the thickness of the auxiliary electrode and the depth of the groove portion be completely the same. In the present invention, since such a step is almost completely eliminated, it is possible to provide an electroluminescence device capable of preventing the generation of bubbles and forming a flat and defect-free protective film.

  In the present invention, it is preferable that the groove has a tapered inclined surface having an opening area that increases from the bottom to the top of the groove. According to this configuration, disconnection or the like hardly occurs in the second electrode or the auxiliary electrode formed on the surface of the groove portion, and a highly reliable electroluminescence device can be provided.

  In the present invention, it is preferable that the second electrode is formed of a light-transmitting conductive material, and light emitted from the functional layer is transmitted through the second electrode and extracted to the outside. According to this configuration, it is possible to provide a top emission type electroluminescence device with high display quality and excellent reliability. In the top emission type electroluminescence device, since light is extracted from the second electrode side, the second electrode must be thinned in order to increase the light transmittance of the second electrode, but the resistance of the second electrode is the auxiliary electrode. This is because the resistance does not increase even if the second electrode is thinned.

  In the present invention, the auxiliary electrode is preferably made of a light-shielding or light-reflective conductive material and provided in a lattice shape so as to partition the plurality of first electrodes. According to this configuration, the auxiliary electrode can be used as a black matrix. In particular, since the auxiliary electrode constitutes a part of the partition layer and is formed in a wall shape around the first electrode, color mixing between adjacent dot regions is prevented, and high display quality can be realized. In addition, since the auxiliary electrode is provided in a lattice shape, the resistance of the second electrode can be reduced to the maximum, and an electroluminescence device excellent in display quality can be provided.

  An electronic apparatus according to the present invention includes the above-described electroluminescence device according to the present invention. According to this configuration, it is possible to provide an electronic device with high reliability and excellent light emission characteristics.

  Embodiments of the present invention will be described below with reference to the drawings. This embodiment shows one aspect of the present invention, and does not limit the present invention, and can be arbitrarily changed within the scope of the technical idea of the present invention. Moreover, in the following drawings, in order to make each structure easy to understand, an actual structure and a scale, a number, and the like in each structure are different.

[Configuration of organic EL device]
FIG. 1 is a schematic configuration diagram of an organic EL device 1 which is an embodiment of an EL device of the present invention. The organic EL device 1 includes a first substrate 10 and a second substrate 20 that face each other. The first substrate 10 and the second substrate 20 are bonded by an adhesive layer 43. A gap material (not shown) is provided between the first substrate 10 and the second substrate 20, and the gap between the first substrate 10 and the second substrate 20 is held at a constant interval by the gap material. .

  The first substrate 10 has a substrate body 10A made of glass, quartz, plastic or the like as a base. On the second substrate 20 side of the substrate body 10A, the circuit element portion 15, the pixel electrode (first electrode) 14, the partition layer 16, the functional layer 17, the counter electrode (second electrode) 18, the auxiliary electrode 50, and the first protection. A film 19, a buffer layer 40 and a second protective film 41 are provided. The circuit element unit 15 includes one or more layers including a thin film transistor (TFT) as a circuit element for driving the pixel electrode 14, and includes a scanning line 11, a signal line 12, a common power supply line 13, and a switching element. The TFT 31 is configured to include a driving TFT 32, a storage capacitor cap, and the like. In the present embodiment, the pixel electrode 14 is an anode and the counter electrode 18 is a cathode. However, the pixel electrode 14 may be a cathode and the counter electrode 18 may be an anode.

  On the substrate body 10A, a plurality of dot areas A as light emitting areas are arranged in a matrix. In each dot region A, a pixel electrode 14 is arranged, and in the vicinity of the pixel electrode 14, a scanning line 11, a signal line 12, and a common power supply line 13 are arranged. The pixel electrode 14 is provided in a rectangular shape in plan view, the scanning line 11 extends along one side of the short side of the pixel electrode 14, and the signal line 12 and the common power supply line 13 along two sides orthogonal to the scanning line 11. Are extended. The planar shape of the pixel electrode 14 can be any shape such as a circle or an oval other than the rectangle shown in the figure.

  In the dot region A, a switching TFT 31 in which a scanning signal is supplied to the gate electrode 31 g via the scanning line 11, a holding capacitor cap that holds an image signal supplied from the signal line 12 via the switching TFT 31, A driving TFT 32 in which an image signal held by the holding capacitor cap is supplied to the gate electrode 32g, and a pixel into which a driving current flows from the common feeding line 13 when electrically connected to the common feeding line 13 via the driving TFT 32 An electrode 14 and a functional layer 17 sandwiched between the pixel electrode 14 and the counter electrode 18 are provided.

  The functional layer 17 is provided so as to cover the pixel electrode 14 and the partition wall layer 16. The functional layer 17 includes at least one layer including a light emitting layer. As the light emitting layer, a known low molecular light emitting material capable of emitting white fluorescence or phosphorescence can be used. For example, anthracene, pyrene, 8-hydroxyquinoline aluminum, bisstyrylanthracene derivative, tetraphenylbutadiene derivative, A coumarin derivative, an oxadiazole derivative, a distyrylbenzene derivative, a pyrrolopyridine derivative, a perinone derivative, a cyclopentadiene derivative, a thiadiazolopyridine derivative, or a low molecular weight material such as rubrene, quinacridone derivative, phenoxazone derivative, DCM, DCJ, perinone , Perylene derivatives, coumarin derivatives, diazaindacene derivatives, and the like. In addition to the light emitting layer, the functional layer 17 includes layers such as a hole injection layer, a hole transport layer, an electron transport layer, and an electron injection layer as necessary.

  The partition layer 16 is made of an inorganic or organic insulating material, and is provided in a lattice shape in plan view so as to partition the pixel electrode 14 (dot region A). The partition layer 16 includes an opening H1 on the pixel electrode 14, and a part of the pixel electrode 14 is exposed on the bottom surface of the opening H1 of the partition layer 16. In the functional layer 17, the portion disposed on the pixel electrode 14 contributes to light emission, and the portion disposed on the partition wall layer 16 does not contribute to light emission. For this reason, a region (light emitting region) where light is emitted from the functional layer 17 is defined by the opening H <b> 1 of the partition wall layer 16.

  A groove H2 for the auxiliary electrode 50 is provided on the upper surface of the partition wall layer 16. The groove part H2 is provided in a stripe shape in plan view along the gap of the dot region A. The extending direction of the groove H2 is, for example, a direction parallel to the short side of the dot region A. The depth of the groove H2 is substantially the same as the thickness of the auxiliary electrode 50. The groove H2 has a tapered inclined surface with an opening area that increases from the bottom to the top of the groove H2 so that the counter electrode 18 and the auxiliary electrode 50 formed on the surface do not break.

  A functional layer 17 is provided on the surface of the partition layer 16 so as to cover the inner wall surfaces of the opening H1 and the groove H2. A counter electrode 18 is provided on the functional layer 17 so as to cover the surface of the recess formed by the opening H1 and the groove H2. The counter electrode 18 is formed of a material containing magnesium (Mg), lithium (Li), calcium (Ca) or the like. Preferably, a thin film translucent electrode made of MgAg is preferably employed, but other than this, an MgAgAl electrode, a LiAl electrode, a LiFAl electrode, or the like can also be used. A film in which these metal thin films and a light-transmitting conductive material such as ITO (Indium Tin Oxide) are laminated can be used as the counter electrode 18. The counter electrode 18 is provided on substantially the entire surface of the first substrate 10 so as to cover the dot regions A arranged in a matrix, and functions as a common electrode common to the pixel electrodes 14.

  On the surface of the counter electrode 18, an auxiliary electrode 50 having a stripe shape in plan view is provided along the gap of the dot region A. The auxiliary electrode 50 is selectively provided in the recess formed by the groove H2. The auxiliary electrode 50 is disposed so as to be embedded in the recess, and the unevenness of the upper surface portion of the partition wall layer formed by the recess is flattened. The auxiliary electrode 50 is formed of a metal material such as Al, Au, or Ag having excellent conductivity.

  A first protective film 19 is provided on the surface of the counter electrode 18 so as to cover the counter electrode 18 and the auxiliary electrode 50. The first protective film 19 is provided on substantially the entire surface of the first substrate 10 so as to cover the entire surface of the counter electrode 18, and functions to block the counter electrode 18 (organic EL element) from oxygen and moisture present in the atmosphere. have. The first protective film 19 is preferably formed of an inorganic compound such as silicon oxynitride in terms of transparency, adhesion, water resistance, and the like.

  A sealing layer 40 including a buffer layer 41 and a second protective film 42 is provided on the surface of the first protective film 19. The buffer layer 41 planarizes the base of the second protective film 42 and relieves stress generated by warping and volume expansion of the first substrate 10, thereby preventing the first protective film 19 from peeling from the counter electrode 18. It has the function to do. As the buffer layer 41, a translucent resin film such as acrylic is used. The second protective film 42 mainly functions as a gas barrier layer, and has a function of blocking the counter electrode 18 (organic EL element) from oxygen and moisture present in the atmosphere together with the first protective film 19. The second protective film 42 is preferably formed of a silicon compound containing nitrogen, such as silicon nitride, in consideration of transparency, gas barrier properties, and water resistance.

  A second substrate 20 is provided on the first substrate 10. The second substrate 20 has a substrate body 20A made of glass, quartz, plastic or the like as a base. A color filter 21 is provided on the first substrate 10 side of the substrate body 20A. The color filter 21 is formed by arranging three primary colors of R (red), G (green), and B (blue) in a predetermined pattern, for example, a stripe arrangement, a delta arrangement, and a mosaic arrangement. One color element of the color filter 21 is provided corresponding to one of the dot areas A that is the minimum unit for forming an image. Then, three color elements corresponding to R, G, and B form one unit to form one pixel.

  An adhesive layer 43 is provided between the first substrate 10 and the second substrate 20. As the adhesive layer 43, a thermosetting resin, an ultraviolet curable resin, or the like is used. In particular, an epoxy resin that is a kind of thermosetting resin is preferably used. The second substrate 20 is bonded to the first substrate 10 via the adhesive layer 43. The surface of the first substrate 10 on which the organic EL element is formed is sealed by the adhesive layer 43 and the second substrate 20, preventing water and oxygen from entering and preventing the organic EL element from being oxidized. Yes.

  In the organic EL device 1 having the above configuration, when the scanning line 11 is driven and the switching TFT 31 is turned on, the potential of the signal line 12 at that time is held in the holding capacitor cap and is driven according to the state of the holding capacitor cap. The conduction state of the TFT 32 for use is determined. Further, a current flows from the common power supply line 13 to the pixel electrode 14 through the channel of the driving TFT 32, and further a current flows to the counter electrode 18 through the functional layer 17. The functional layer 17 (light emitting layer) emits light according to the amount of current at this time. Light emitted from the functional layer 17 to the counter electrode 18 side is transmitted through the color filter 21 and the substrate body 20A and emitted to the outside, and light emitted from the functional layer 17 to the substrate body 10A side is emitted from the pixel electrode 14. Alternatively, the light is reflected by a reflection film (not shown) provided on the lower side of the pixel electrode 14, and the light passes through the color filter 21 and the substrate body 20A and is emitted to the outside (top emission type).

[Method for Manufacturing Organic EL Device]
Next, a method for manufacturing the organic EL device 1 will be described with reference to FIGS. 2 to 9, only the layers necessary for the explanation are shown, and the illustration of the incidental layers such as the circuit element unit 15 is omitted.

  First, as shown in FIG. 2, the partition layer 16 is formed on the base 10A on which the pixel electrode 14 is formed. The partition layer 16 is formed by forming an insulating material such as an acrylic resin or a polyimide resin on the base 10A, and using the photolithography technique, the opening H1 is formed on the pixel electrode 14 to form the pixel electrode 14 (dot region A). It is obtained by forming the groove H2 along the gap. The depth of the groove H2 is formed to an appropriate depth according to the thickness of the auxiliary electrode. It is desirable that the opening H1 and the groove H2 are simultaneously formed by a common process.

  Next, as shown in FIG. 3, a functional layer 17 is formed on the entire surface of the pixel electrode 14 and the partition layer 16. The functional layer 17 can be formed, for example, by sequentially forming a hole injection layer, a hole transport layer, a light emitting layer, an electron injection layer, and an electron transport layer. Known vapor deposition materials and vapor deposition methods can be used as vapor deposition materials and vapor deposition methods for the respective layers.

  Next, as shown in FIG. 4, the counter electrode 18 is formed on the entire surface of the functional layer 17. In the step of forming the counter electrode 18, a transparent ITO film is formed as the counter electrode 18 by a physical vapor deposition method such as an ion plating method in order to realize a top emission structure. Alternatively, the counter electrode 18 can be formed by forming a thin film of Al or a thin film of MgAg by vapor deposition, or by laminating an ITO film on this thin film. The counter electrode 18 is formed so as to cover the surface of the recess formed by the opening H1 and the groove H2.

  Next, as shown in FIG. 5, the auxiliary electrode 50 is formed in the recess formed by the groove H <b> 2. The auxiliary electrode 50 is selectively formed in the concave portion using a mask vapor deposition method, but the auxiliary electrode material is discharged into the groove portion H2 using an ink jet method, and this is dried and baked to form the auxiliary electrode. 50 can also be formed. The auxiliary electrode 50 has a thickness corresponding to the depth of the groove H2. As a result, the upper surface of the partition wall layer 16 is substantially flattened, and the unevenness of the substrate surface is minimized.

  Next, as shown in FIG. 6, a first protective film 19 is formed on the entire surface of the counter electrode 18 and the auxiliary electrode 50. The first protective film 19 is formed so as to cover the unevenness formed by the partition wall layer 16, but the upper surface of the partition wall layer 16 is flattened, so that cracks and peeling do not easily occur.

  Next, as shown in FIG. 7, a buffer layer 41 is formed on the entire surface of the first protective film 19. The buffer layer 41 can be formed by applying a light-transmitting resin film such as an epoxy resin by a screen printing method and heat-treating it. The squeegee is scanned, for example, in the direction of the arrow. However, since a steep step due to the auxiliary electrode 50 is not formed on the surface of the base body 10A, there is a problem that bubbles are generated by the shadow of the step portion. Does not occur. Further, although the squeegee is scanned while pressing the surface of the base body 10A, since a large step is not formed on the upper surface of the partition wall layer 16, there is a problem that the functional layer 17 is peeled near the upper surface of the partition wall layer 16. Does not occur.

  Next, as shown in FIG. 8, a second protective film 42 is formed on the entire surface of the buffer layer 41. Since the second protective film 42 is formed on the surface flattened by the buffer layer 41, problems such as cracks and peeling are unlikely to occur.

  When the first substrate 10 is completed as described above, the second substrate 20 is bonded onto the first substrate 10 through an adhesive layer as shown in FIG. The adhesive layer and the second substrate 20 function as a sealing unit that seals the organic EL element together with the first protective film 19, the buffer layer 41, and the second protective film 42. Thus, the organic EL device 1 is completed.

  As described above, according to the organic EL device 1 of the present embodiment, since the auxiliary electrode 50 is formed so as to be embedded in the groove H2, the first protective film 19 is not easily cracked, peeled off, and the like. A highly organic EL device can be provided. Moreover, when forming the 2nd protective film 42 via the buffer layer 41, a bubble becomes difficult to mix in the buffer layer 41, and the top emission type organic EL apparatus excellent in display quality can be provided.

  In the organic EL device 1 of the present embodiment, the groove H2 is provided in a stripe shape in plan view along the short side of the dot region A. However, the groove H2 has a long side and a short side of the dot region A as shown in FIG. It can also be provided in a lattice shape in plan view along the side. According to this configuration, for example, the auxiliary electrode 50 can be used as a black matrix by forming the auxiliary electrode 50 from a light-shielding or light-reflecting conductive material. In particular, since the auxiliary electrode 50 constitutes a part of the partition wall layer 16 and is formed in a wall shape around the pixel electrode 14, color mixing between adjacent dot regions is prevented, and high display quality can be realized. In addition, since the auxiliary electrode 50 is provided in a lattice shape, the resistance of the counter electrode 18 can be minimized, and an organic EL device having excellent display quality can be provided.

[Electronics]
Next, an embodiment of an electronic apparatus provided with the EL device of the present invention will be described with reference to FIG. FIG. 11 is a schematic configuration diagram of an example in which the organic EL device of FIG. 1 which is an example of the EL device of the present invention is applied to a display unit of a video monitor. A video monitor 1200 shown in the figure includes a display unit 1201 including the organic EL device of the previous embodiment, a housing 1202, a speaker 1203, and the like. The organic EL device of the embodiment is not limited to the video monitor, but is an electronic book, a projector, a personal computer, a digital still camera, a viewfinder type or a monitor direct-view type video tape recorder, a car navigation device, a pager, an electronic notebook, and a calculator. It can be suitably used as an image display means for a word processor, a workstation, a video phone, a POS terminal, a mobile phone, a device equipped with a touch panel, and the like. With such a structure, an electronic device with high reliability and excellent light emission characteristics can be provided.

It is a schematic block diagram of the organic EL apparatus which is one Embodiment of EL apparatus. It is process drawing explaining the manufacturing method of the organic EL apparatus. It is process drawing explaining the manufacturing method of the organic EL apparatus. It is process drawing explaining the manufacturing method of the organic EL apparatus. It is process drawing explaining the manufacturing method of the organic EL apparatus. It is process drawing explaining the manufacturing method of the organic EL apparatus. It is process drawing explaining the manufacturing method of the organic EL apparatus. It is process drawing explaining the manufacturing method of the organic EL apparatus. It is process drawing explaining the manufacturing method of the organic EL apparatus. It is a schematic diagram which shows the other structural example of an auxiliary electrode. It is a schematic block diagram of the video monitor which is an example of an electronic device. It is a schematic block diagram which shows the structure of the conventional auxiliary electrode.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Organic EL apparatus (electroluminescence apparatus), 14 ... Pixel electrode (1st electrode), 16 ... Partition wall layer, 17 ... Functional layer, 18 ... Counter electrode (2nd electrode), 19 ... 1st protective film, 41 ... Buffer layer, 42 ... second protective film, 50 ... auxiliary electrode, 1200 ... video monitor (electronic device), H1 ... opening (region partitioned by partition wall layer), H2 ... groove

Claims (7)

A plurality of first electrodes;
A partition layer partitioning the plurality of first electrodes;
A functional layer provided in a region partitioned by the partition layer;
A second electrode provided to cover the functional layer and the partition layer;
A protective film provided on the second electrode;
A groove provided on the upper surface of the partition layer;
And an auxiliary electrode selectively provided in a recess formed by the groove.   The electroluminescent device according to claim 1, wherein a buffer layer is provided on the protective film, and a second protective film is provided on the buffer layer.   The electroluminescent device according to claim 1, wherein a depth of the groove is substantially equal to a thickness of the auxiliary electrode.   The electroluminescent device according to claim 1, wherein the groove portion has a tapered slope whose opening area increases from a bottom portion to an upper portion of the groove portion.   The said 2nd electrode is formed with a translucent conductive material, The light inject | emitted from the said functional layer permeate | transmits the said 2nd electrode, and is taken out outside, The any one of Claims 1-4 characterized by the above-mentioned. The electroluminescent device according to item.   The electroluminescent device according to claim 5, wherein the auxiliary electrode is formed of a light-shielding or light-reflective conductive material, and is provided in a lattice shape so as to partition the plurality of first electrodes. .   An electronic apparatus comprising the electroluminescence device according to claim 1.

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