JP2008147263A5 - - Google Patents

Claims (10)

The charged particle beam source and generated by the charged particle beam shaping means, a multi-charged particle beam device having a constant unit measuring for measuring the relative position of the plurality of charged particle beams irradiated to the sample,
It said measurement means,
And marks for detecting the load electric particle beam,
It means for relatively moving the load electrostatic particle beam before symbols during,
A detector for detecting the charged particle beam through said marks,
Means for determining the detection result and the relative positions of the plurality of charged particle beams on the basis of the by the relative movement amount between the detector and the mark and the plurality of charged particle beams,
A multi-charged particle beam apparatus comprising: It said means for relatively moving the multi-charged particle beam device according to claim 1, characterized in that it comprises a deflector for scanning the previous SL plurality of charged particle beams. Means for moving the relative is a multi-charged particle beam device according to claim 1, characterized in Rukoto moving the mark. Has a correction means for correcting the position of the charged particle beam by using the results obtained by the previous SL measuring means, and the said compensation means further comprising means for interpolating the relative position obtained by said measuring means The multi-charged particle beam device according to any one of claims 1 to 3 . Has a blanking means turning on and off the individual charged particle beam, in the measurement of the phase versus position is by the blanking means, that only one of the charged particle beam to be irradiated prior symbols during The multi-charged particle beam device according to any one of claims 1 to 4 , wherein Before SL measuring means according to any one of claims 1 to 5, characterized in that determining the relative position by calculating the center position of the front Symbol detector individual charged particle beam from the output signal waveform Multi charged particle beam equipment. Before SL measuring means according to any one of claims 1 to 5, characterized in that determining the relative position by calculating the center of gravity of the previous SL individual charged particle beam from the output signal waveform of the detector Multi charged particle beam equipment. Before SL measuring means according to claim 1 to 5, characterized in that determining the relative positions determine the position of an individual charged particle beam by the output signal waveform before Symbol detector performs matching between the wave-shaped portion The multi-charged particle beam device according to any one of the above. Before SL measuring means, wherein, characterized in that seeking position of each of the charged particle beam by performing the matching process between the output signal waveform and the pre-stored template waveform before Symbol detector obtains the relative position Item 6. The multi-charged particle beam device according to any one of Items 1 to 5 . A step of exposing a substrate using a multi-charged particle beam device according to any one of claims 1 to 9, a device manufacturing method characterized by a step of developing the substrate exposed in said step .