JP2008137969A - Hydroxybenzene derivative and method for producing the same - Google Patents
Hydroxybenzene derivative and method for producing the same Download PDFInfo
- Publication number
- JP2008137969A JP2008137969A JP2006327145A JP2006327145A JP2008137969A JP 2008137969 A JP2008137969 A JP 2008137969A JP 2006327145 A JP2006327145 A JP 2006327145A JP 2006327145 A JP2006327145 A JP 2006327145A JP 2008137969 A JP2008137969 A JP 2008137969A
- Authority
- JP
- Japan
- Prior art keywords
- general formula
- hydroxyphenyl
- compound represented
- group
- benzenetricarboxylic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 3
- 150000005204 hydroxybenzenes Chemical class 0.000 title description 2
- 150000001875 compounds Chemical class 0.000 claims abstract description 60
- -1 hydroxy, carboxyl Chemical group 0.000 claims abstract description 16
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 7
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 7
- 125000003277 amino group Chemical group 0.000 claims description 9
- 239000000539 dimer Substances 0.000 claims description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- UJMDYLWCYJJYMO-UHFFFAOYSA-N benzenetricarboxylic Acid Natural products OC(=O)C1=CC=CC(C(O)=O)=C1C(O)=O UJMDYLWCYJJYMO-UHFFFAOYSA-N 0.000 claims description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 5
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 239000000203 mixture Substances 0.000 abstract description 33
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 abstract description 30
- 229960001755 resorcinol Drugs 0.000 abstract description 27
- 239000011347 resin Substances 0.000 abstract description 19
- 229920005989 resin Polymers 0.000 abstract description 19
- 238000002156 mixing Methods 0.000 abstract description 11
- KVBYPTUGEKVEIJ-UHFFFAOYSA-N benzene-1,3-diol;formaldehyde Chemical compound O=C.OC1=CC=CC(O)=C1 KVBYPTUGEKVEIJ-UHFFFAOYSA-N 0.000 abstract description 3
- 230000001747 exhibiting effect Effects 0.000 abstract description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 abstract 1
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 20
- QMKYBPDZANOJGF-UHFFFAOYSA-N benzene-1,3,5-tricarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=CC(C(O)=O)=C1 QMKYBPDZANOJGF-UHFFFAOYSA-N 0.000 description 18
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 10
- 239000007983 Tris buffer Substances 0.000 description 10
- 229910000831 Steel Inorganic materials 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 239000010959 steel Substances 0.000 description 8
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 7
- 150000002148 esters Chemical class 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000012779 reinforcing material Substances 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- DBMWNANFZQEHDV-UHFFFAOYSA-N 1-aminocyclohexa-2,4-dien-1-ol Chemical compound NC1(O)CC=CC=C1 DBMWNANFZQEHDV-UHFFFAOYSA-N 0.000 description 5
- 230000032683 aging Effects 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 229920000728 polyester Polymers 0.000 description 5
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000004073 vulcanization Methods 0.000 description 5
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- KNLAZJSOANNMIE-UHFFFAOYSA-N OC=1C=C(C=CC1)OC(=O)C1=CC(=CC(=C1)C(=O)OC1=CC(=CC=C1)O)C(=O)OC1=CC(=CC=C1)O Chemical compound OC=1C=C(C=CC1)OC(=O)C1=CC(=CC(=C1)C(=O)OC1=CC(=CC=C1)O)C(=O)OC1=CC(=CC=C1)O KNLAZJSOANNMIE-UHFFFAOYSA-N 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- UWCPYKQBIPYOLX-UHFFFAOYSA-N benzene-1,3,5-tricarbonyl chloride Chemical compound ClC(=O)C1=CC(C(Cl)=O)=CC(C(Cl)=O)=C1 UWCPYKQBIPYOLX-UHFFFAOYSA-N 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 238000013329 compounding Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 125000004208 3-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C([H])C(*)=C1[H] 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- YGOSKMORBKDQIG-UHFFFAOYSA-N C1=CC(=CC(=C1)OC(=O)C2=CC(=CC(=C2)C(=O)O)C(=O)OC3=CC=CC(=C3)O)O Chemical compound C1=CC(=CC(=C1)OC(=O)C2=CC(=CC(=C2)C(=O)O)C(=O)OC3=CC=CC(=C3)O)O YGOSKMORBKDQIG-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 125000003342 alkenyl group Chemical group 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 150000007530 organic bases Chemical class 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 2
- NTNUPCREDHXJEL-UHFFFAOYSA-N 2-methylbenzene-1,4-dicarbonyl chloride Chemical compound CC1=CC(C(Cl)=O)=CC=C1C(Cl)=O NTNUPCREDHXJEL-UHFFFAOYSA-N 0.000 description 2
- 229940018563 3-aminophenol Drugs 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 2
- HYCVWUSSIUWHCN-UHFFFAOYSA-N C1=CC(=CC(=C1)OC(=O)C2=CC(=C(C=C2)C(=O)OC3=CC=CC(=C3)O)C(=O)OC4=CC=CC(=C4)O)O Chemical compound C1=CC(=CC(=C1)OC(=O)C2=CC(=C(C=C2)C(=O)OC3=CC=CC(=C3)O)C(=O)OC4=CC=CC(=C4)O)O HYCVWUSSIUWHCN-UHFFFAOYSA-N 0.000 description 2
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- VLPHIXPPGBGUMN-UHFFFAOYSA-N CC1=C(C=CC(=C1)C(=O)OC2=CC=C(C=C2)O)C(=O)OC3=CC=C(C=C3)O Chemical compound CC1=C(C=CC(=C1)C(=O)OC2=CC=C(C=C2)O)C(=O)OC3=CC=C(C=C3)O VLPHIXPPGBGUMN-UHFFFAOYSA-N 0.000 description 2
- DCQHJLFELUJONE-UHFFFAOYSA-N CC1=C(C=CC(=C1)C(=O)OC2=CC=CC(=C2)O)C(=O)OC3=CC=CC(=C3)O Chemical compound CC1=C(C=CC(=C1)C(=O)OC2=CC=CC(=C2)O)C(=O)OC3=CC=CC(=C3)O DCQHJLFELUJONE-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- PUFUZWSKOZOYJV-UHFFFAOYSA-N OC=1C=C(C=CC1)OC(=O)C=1C(=CC(=CC1)C(=O)O)C(=O)OC1=CC(=CC=C1)O Chemical compound OC=1C=C(C=CC1)OC(=O)C=1C(=CC(=CC1)C(=O)O)C(=O)OC1=CC(=CC=C1)O PUFUZWSKOZOYJV-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 238000004128 high performance liquid chromatography Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 1
- XDQHPEOWQODWOZ-UHFFFAOYSA-N 4-methylbenzene-1,3-dicarbonyl chloride Chemical compound CC1=CC=C(C(Cl)=O)C=C1C(Cl)=O XDQHPEOWQODWOZ-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
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- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
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- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 229960003742 phenol Drugs 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- ZZPKZRHERLGEKA-UHFFFAOYSA-N resorcinol monoacetate Chemical compound CC(=O)OC1=CC=CC(O)=C1 ZZPKZRHERLGEKA-UHFFFAOYSA-N 0.000 description 1
- 238000010058 rubber compounding Methods 0.000 description 1
- 238000013040 rubber vulcanization Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000013112 stability test Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000006188 syrup Substances 0.000 description 1
- 235000020357 syrup Nutrition 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- JGDSSXLTURAAJM-UHFFFAOYSA-N tris(4-hydroxyphenyl) benzene-1,3,5-tricarboxylate Chemical compound Oc1ccc(OC(=O)c2cc(cc(c2)C(=O)Oc2ccc(O)cc2)C(=O)Oc2ccc(O)cc2)cc1 JGDSSXLTURAAJM-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Abstract
Description
本発明は、空気入りタイヤや工業用ベルト等のゴム物品に用いられるスチールコード等の金属補強材との接着耐久性を向上させる新規な組成物または化合物に関し、更に詳しくはゴムと配合した際のゴム組成物の加工性が良好であり、且つ該ゴム組成物の貯蔵期間に係らず金属補強材に対し安定して初期接着性及び耐湿熱接着性を発現させることができる、特定構造を有する化合物および該化合物を主成分とする組成物に関するものである。 The present invention relates to a novel composition or compound that improves adhesion durability with a metal reinforcing material such as a steel cord used for rubber articles such as pneumatic tires and industrial belts, and more particularly when blended with rubber. A compound having a specific structure, which has good processability of the rubber composition, and can stably exhibit initial adhesiveness and wet heat resistant adhesiveness to a metal reinforcing material regardless of the storage period of the rubber composition And a composition containing the compound as a main component.
自動車用タイヤ、コンベアベルト、ホース等、特に強度が要求されるゴム製品には、ゴムを補強し強度、耐久性を向上させる目的で、スチールコード等の金属補強材をゴム組成物で被覆した複合材料が用いられている。該ゴム−金属複合材料が高い補強効果を発揮し信頼性を得るためにはゴム−金属補強材間に混合、配合、貯蔵等の条件に左右されない安定した接着が必要である。かかる複合体を得るには、亜鉛、黄銅等でメッキされたスチールコード等の金属補強材を、硫黄を配合したゴム組成物に埋設し加熱加硫時に、ゴムの加硫と同時に接着させるいわゆる直接加硫接着が広く用いられており、これまで該直接加硫接着におけるゴム−金属補強材間の接着性、特に耐湿熱接着性向上のため様々な検討が行われている。 For rubber products that require particularly high strength, such as automobile tires, conveyor belts, hoses, etc., composites in which a metal reinforcing material such as a steel cord is coated with a rubber composition to reinforce the rubber and improve its strength and durability. Material is used. In order for the rubber-metal composite material to exhibit a high reinforcing effect and to obtain reliability, stable adhesion that is not affected by the conditions of mixing, blending, storage and the like is necessary between the rubber-metal reinforcing material. In order to obtain such a composite, a metal reinforcing material such as a steel cord plated with zinc, brass or the like is embedded in a rubber composition containing sulfur and bonded at the same time as rubber vulcanization at the time of heat vulcanization. Vulcanization bonding is widely used, and various studies have been made so far for improving adhesion between a rubber and a metal reinforcing material in the direct vulcanization bonding, in particular, wet heat resistance.
例えば、レゾルシン又は、レゾルシンとホルマリンを縮合して得られる、レゾルシン−ホルムアルデヒド樹脂(以下、「RF樹脂」と略記する。)を耐湿熱接着性向上の目的で配合したゴム組成物が報告されている(特許文献1)。RF樹脂を配合することでスチールコードとゴムの耐湿熱接着性は確かに飛躍的に向上する。 For example, there has been reported a rubber composition containing resorcin or resorcin-formaldehyde resin (hereinafter abbreviated as “RF resin”) obtained by condensing resorcin and formalin for the purpose of improving moisture and heat resistance. (Patent Document 1). By blending the RF resin, the moisture and heat resistance of the steel cord and rubber will certainly improve dramatically.
しかしながら、レゾルシンやRF樹脂は極性が非常に高いためゴムとの相溶性に乏しく、混合、配合、貯蔵等の条件によって、レゾルシンやRF樹脂が析出するいわゆるブルームが発生するため、ゴム物品の外観を損ねる恐れがある。また、ブルーム発生により、該ゴム組成物を配合してから加硫接着まで長期間貯蔵すると接着性が低下するといった問題が生じるため、レゾルシンやRF樹脂を配合したゴム組成物は速やかに加硫接着させる必要があり、ゴム物品の生産性を損ねかねない。 However, resorcin and RF resin have very high polarity, so they are poorly compatible with rubber. Depending on conditions such as mixing, blending, and storage, so-called blooms that precipitate resorcin and RF resin are generated. There is a risk of damage. In addition, due to the occurrence of bloom, there is a problem that the adhesiveness decreases when the rubber composition is compounded and then stored for a long time from vulcanization adhesion. Therefore, the rubber composition formulated with resorcin or RF resin is vulcanized and bonded quickly. This may impair the productivity of rubber articles.
また、重量平均分子量が3000〜45000のレゾルシン骨格を有する混合ポリエステルからなる、接着材料が報告されている(特許文献2)。しかしながら、分子量が大きな混合ポリエステルはRF樹脂と比較してゴムとの相溶性は改善されるものの、完全に満足できるものとはなっていない。さらに、高分子量の混合ポリエステルをゴムに配合すると、配合ゴムの粘度が上昇し、加工性が低下するといった問題があり、耐湿熱接着性も十分なものとはなっていない。 In addition, an adhesive material made of a mixed polyester having a resorcin skeleton having a weight average molecular weight of 3000 to 45000 has been reported (Patent Document 2). However, mixed polyester having a large molecular weight is not completely satisfactory, although the compatibility with rubber is improved as compared with RF resin. Furthermore, when a high molecular weight mixed polyester is blended with rubber, there is a problem that the viscosity of the blended rubber is increased and the processability is lowered, and the wet heat resistance is not sufficient.
本発明は、ゴムに配合した際のゴム組成物が加工性と高い耐湿熱接着性を維持しながら、レゾルシンやRF樹脂を配合した時に見られるブルームを極力抑制し、該ゴム組成物の貯蔵中の接着性低下を少なくでき、優れた接着安定性を発現させることができる、特定構造を有する化合物を提供する事を目的とする。 The present invention suppresses bloom as seen when compounding resorcinol and RF resin as much as possible while maintaining the processability and high heat-and-moisture resistance adhesion when the rubber composition is compounded with rubber. It is an object of the present invention to provide a compound having a specific structure that can reduce the decrease in adhesiveness and can exhibit excellent adhesion stability.
本発明者らは、前記課題を達成するため鋭意検討した結果、特定構造の化合物をゴムに配合することで、レゾルシンやRF樹脂と同等以上の耐湿熱接着性を維持しつつ、レゾルシンやRF樹脂の問題点であるゴムと配合して得られるゴム組成物の加工性を保持するとともに、ブルーム発生を抑制し、配合、貯蔵等の条件によらず優れた接着安定性を示すことを見出し、本発明を完成させるに至った。 As a result of intensive investigations to achieve the above-mentioned problems, the present inventors have blended a compound having a specific structure with rubber so that the heat and heat resistance equal to or higher than that of resorcin or RF resin is maintained, while resorcin or RF resin is maintained. While maintaining the processability of the rubber composition obtained by blending with rubber, which is a problem of the above, it has been found that it suppresses the occurrence of bloom and exhibits excellent adhesion stability regardless of the conditions of blending, storage, etc. The invention has been completed.
即ち、本発明のヒドロキシベンゼン誘導体は、下記一般式(1)で表される化合物である。
本発明の好適例においては、一般式(1)で表される化合物が下記一般式(2)で表される化合物である。
本発明によれば、ゴムと配合して得られるゴム組成物が加工性と高い耐湿熱接着性を維持しながら、レゾルシンやRF樹脂を配合した時に見られるブルームを極力抑制し、該ゴム組成物の貯蔵中の接着性低下が少なく安定した接着性を発現させる事ができる、化合物を提供することができる。 According to the present invention, the rubber composition obtained by blending with rubber maintains the workability and high moisture and heat resistance adhesion, while suppressing the bloom seen when blending resorcinol and RF resin as much as possible, and the rubber composition Thus, it is possible to provide a compound capable of exhibiting stable adhesiveness with little decrease in adhesiveness during storage.
以下に、本発明を詳細に説明する。本発明の化合物は、一般式(1)で表されることを特徴とする。一般式(1)中のRは炭素数1〜8の脂肪族基、アルコキシ基、水酸基、カルボキシル基、保護されていてもよいアミノ基を表し、Xは−CONH−あるいは−COO−を表す。nは2〜4の整数を、mは0〜4の整数を表す。但し、n+mは3〜6である。ここで、各Xは同一でも異なっていても良く、また、mが2以上の場合、各Rは同一でも異なっていても良い。尚、一般式(1)中のmは0である事が好ましく、この場合、一般式(1)で表される化合物は、上記一般式(2)で表される化合物となる。一般式(2)中のXは、一般式(1)中のXと同義である。また、一般式(2)中のnは3または4であるが、3である事が望ましい。 The present invention is described in detail below. The compound of the present invention is represented by the general formula (1). R in the general formula (1) represents an aliphatic group having 1 to 8 carbon atoms, an alkoxy group, a hydroxyl group, a carboxyl group, or an amino group that may be protected, and X represents —CONH— or —COO—. n represents an integer of 2 to 4, and m represents an integer of 0 to 4. However, n + m is 3-6. Here, each X may be the same or different, and when m is 2 or more, each R may be the same or different. In addition, it is preferable that m in General formula (1) is 0. In this case, the compound represented by General formula (1) turns into a compound represented by the said General formula (2). X in the general formula (2) has the same meaning as X in the general formula (1). Further, n in the general formula (2) is 3 or 4, but is preferably 3.
炭素数1〜8の脂肪族基としては、例えば、メチル基、エチル基、ブチル基、イソブチル基、オクチル基、2−エチルヘキシル基等の直鎖または分岐鎖のアルキル基、ビニル基、ブテニル基、オクテニル基等の直鎖または分岐鎖のアルケニル基、これらのアルキル基又はアルケニル基の水素原子がヒドロキシル基又はアミノ基等で置換されたアルキル基またはアルケニル基、シクロヘキシル基等の脂環式基が挙げられる。また、アルコキシ基としては、メトキシ基、エトキシ基が挙げられ、アミノ基の保護基としては、アセチル基、ホルミル基、Boc基、Z基等が挙げられる。 Examples of the aliphatic group having 1 to 8 carbon atoms include a linear or branched alkyl group such as a methyl group, an ethyl group, a butyl group, an isobutyl group, an octyl group, and a 2-ethylhexyl group, a vinyl group, a butenyl group, Examples thereof include linear or branched alkenyl groups such as octenyl group, alkyl groups or alkenyl groups in which hydrogen atoms of these alkyl groups or alkenyl groups are substituted with hydroxyl groups or amino groups, and alicyclic groups such as cyclohexyl groups. It is done. Examples of the alkoxy group include a methoxy group and an ethoxy group, and examples of the protective group for the amino group include an acetyl group, a formyl group, a Boc group, and a Z group.
一般式(1)で表される化合物の具体例としては、2−メチル−テレフタル酸ビス(3−ヒドロキシフェニル)エステル、2−メチル−テレフタル酸ビス(4−ヒドロキシフェニル)エステル、3-メチル−テレフタル酸ビス(3−ヒドロキシフェニル)エステル、3-メチル−テレフタル酸ビス(4−ヒドロキシフェニル)エステル、4−メチル−イソフタル酸ビス(3-ヒドロキシフェニル)エステル、4−メチル−イソフタル酸ビス(4-ヒドロキシフェニル)エステル、1,3,5−ベンゼントリカルボン酸トリス(3−ヒドロキシフェニル)エステル、1,3,5−ベンゼントリカルボン酸トリス(4−ヒドロキシフェニル)エステル、1,3,5−ベンゼントリカルボン酸トリス(1−ヒドロキシフェニル)エステル、1,3,5−ベンゼントリカルボン酸−1,3−ビス(3-ヒドロキシフェニル)エステル、1,3,5−ベンゼントリカルボン酸−1,3−ビス(4-ヒドロキシフェニル)エステル、1,3,5−ベンゼントリカルボン酸−1,3−ビス(1-ヒドロキシフェニル)エステル、1,3,5−ベンゼントリカルボン酸−1,5−ビス(3-ヒドロキシフェニル)エステル、1,3,5−ベンゼントリカルボン酸−1,5−ビス(4-ヒドロキシフェニル)エステル、1,3,5−ベンゼントリカルボン酸−1,5−ビス(1-ヒドロキシフェニル)エステル、1,2,4−ベンゼントリカルボン酸トリス(3-ヒドロキシフェニル)エステル、1,2,4−ベンゼントリカルボン酸トリス(4-ヒドロキシフェニル)エステル、1,2,4−ベンゼントリカルボン酸トリス(1-ヒドロキシフェニル)エステル、1,2,4−ベンゼントリカルボン酸−1,2−ビス(3-ヒドロキシフェニル)エステル、1,2,4−ベンゼントリカルボン酸−1,2−ビス(4-ヒドロキシフェニル)エステル、1,2,4−ベンゼントリカルボン酸−1,2−ビス(1-ヒドロキシフェニル)エステル、1,2,4−ベンゼントリカルボン酸−1,4−ビス(3-ヒドロキシフェニル)エステル、1,2,4−ベンゼントリカルボン酸−1,4−ビス(4-ヒドロキシフェニル)エステル、1,2,4−ベンゼントリカルボン酸−1,4−ビス(1-ヒドロキシフェニル)エステル、2−メチル−テレフタル酸ビス(3−ヒドロキシフェニル)アミド、2−メチル−テレフタル酸ビス(4−ヒドロキシフェニル)アミド、3-メチル−テレフタル酸ビス(3−ヒドロキシフェニル)アミド、3-メチル−テレフタル酸ビス(4−ヒドロキシフェニル)アミド、4−メチル−イソフタル酸ビス(3-ヒドロキシフェニル)アミド、4−メチル−イソフタル酸ビス(4-ヒドロキシフェニル)アミド、1,3,5−ベンゼントリカルボン酸トリス(3−ヒドロキシフェニル)アミド、1,3,5−ベンゼントリカルボン酸トリス(4−ヒドロキシフェニル)アミド、1,3,5−ベンゼントリカルボン酸トリス(1−ヒドロキシフェニル)アミド、1,3,5−ベンゼントリカルボン酸−1,3−ビス(3-ヒドロキシフェニル)アミド、1,3,5−ベンゼントリカルボン酸−1,3−ビス(4-ヒドロキシフェニル)アミド、1,3,5−ベンゼントリカルボン酸−1,3−ビス(1-ヒドロキシフェニル)アミド、1,2,4−ベンゼントリカルボン酸トリス(3-ヒドロキシフェニル)アミド、1,2,4−ベンゼントリカルボン酸トリス(4-ヒドロキシフェニル)アミド、1,2,4−ベンゼントリカルボン酸トリス(1-ヒドロキシフェニル)アミド、1,2,4−ベンゼントリカルボン酸−1,2−ビス(3-ヒドロキシフェニル)アミド、1,2,4−ベンゼントリカルボン酸−1,2−ビス(4-ヒドロキシフェニル)アミド、1,2,4−ベンゼントリカルボン酸−1,2−ビス(1-ヒドロキシフェニル)アミド、1,2,4−ベンゼントリカルボン酸−1,4−ビス(3-ヒドロキシフェニル)アミド、1,2,4−ベンゼントリカルボン酸−1,4−ビス(4-ヒドロキシフェニル)アミド、1,2,4−ベンゼントリカルボン酸−1,4−ビス(1-ヒドロキシフェニル)アミド等が挙げられる。これらの中でも、1,3,5−ベンゼントリカルボン酸トリス(3−ヒドロキシフェニル)エステル、1,3,5−ベンゼントリカルボン酸−1,3−ビス(3-ヒドロキシフェニル)エステル、1,2,4−ベンゼントリカルボン酸トリス(3-ヒドロキシフェニル)エステル、1,2,4−ベンゼントリカルボン酸−1,2−ビス(3-ヒドロキシフェニル)エステル、1,2,4−ベンゼントリカルボン酸−1,4−ビス(3-ヒドロキシフェニル)エステル等のレゾルシンエステル系、1,3,5−ベンゼントリカルボン酸トリス(3−ヒドロキシフェニル)アミド、1,3,5−ベンゼントリカルボン酸−1,3−ビス(3-ヒドロキシフェニル)アミド、1,2,4−ベンゼントリカルボン酸トリス(3-ヒドロキシフェニル)アミド、1,2,4−ベンゼントリカルボン酸−1,2−ビス(3-ヒドロキシフェニル)アミド、1,2,4−ベンゼントリカルボン酸−1,4−ビス(3-ヒドロキシフェニル)アミド、等のm−アミノフェノール系アミドが好ましく、特に1,3,5−ベンゼントリカルボン酸トリス(3−ヒドロキシフェニル)エステル、1,3,5−ベンゼントリカルボン酸−1,3−ビス(3-ヒドロキシフェニル)エステル、1,2,4−ベンゼントリカルボン酸トリス(3-ヒドロキシフェニル)エステル等のベンゼントリカルボン酸系トリエステルあるいはジエステルが好ましい。 Specific examples of the compound represented by the general formula (1) include 2-methyl-terephthalic acid bis (3-hydroxyphenyl) ester, 2-methyl-terephthalic acid bis (4-hydroxyphenyl) ester, 3-methyl- Terephthalic acid bis (3-hydroxyphenyl) ester, 3-methyl-terephthalic acid bis (4-hydroxyphenyl) ester, 4-methyl-isophthalic acid bis (3-hydroxyphenyl) ester, 4-methyl-isophthalic acid bis (4 -Hydroxyphenyl) ester, 1,3,5-benzenetricarboxylic acid tris (3-hydroxyphenyl) ester, 1,3,5-benzenetricarboxylic acid tris (4-hydroxyphenyl) ester, 1,3,5-benzenetricarboxylic acid Acid tris (1-hydroxyphenyl) ester, 1,3,5-benzene Zentricarboxylic acid-1,3-bis (3-hydroxyphenyl) ester, 1,3,5-benzenetricarboxylic acid-1,3-bis (4-hydroxyphenyl) ester, 1,3,5-benzenetricarboxylic acid- 1,3-bis (1-hydroxyphenyl) ester, 1,3,5-benzenetricarboxylic acid-1,5-bis (3-hydroxyphenyl) ester, 1,3,5-benzenetricarboxylic acid-1,5- Bis (4-hydroxyphenyl) ester, 1,3,5-benzenetricarboxylic acid-1,5-bis (1-hydroxyphenyl) ester, 1,2,4-benzenetricarboxylic acid tris (3-hydroxyphenyl) ester, 1,2,4-benzenetricarboxylic acid tris (4-hydroxyphenyl) ester, 1,2,4-benzenetricarboxylic acid Lis (1-hydroxyphenyl) ester, 1,2,4-benzenetricarboxylic acid-1,2-bis (3-hydroxyphenyl) ester, 1,2,4-benzenetricarboxylic acid-1,2-bis (4- Hydroxyphenyl) ester, 1,2,4-benzenetricarboxylic acid-1,2-bis (1-hydroxyphenyl) ester, 1,2,4-benzenetricarboxylic acid-1,4-bis (3-hydroxyphenyl) ester 1,2,4-benzenetricarboxylic acid-1,4-bis (4-hydroxyphenyl) ester, 1,2,4-benzenetricarboxylic acid-1,4-bis (1-hydroxyphenyl) ester, 2-methyl -Terephthalic acid bis (3-hydroxyphenyl) amide, 2-methyl-terephthalic acid bis (4-hydroxyphenyl) amide, 3-methyl -Terephthalic acid bis (3-hydroxyphenyl) amide, 3-methyl-terephthalic acid bis (4-hydroxyphenyl) amide, 4-methyl-isophthalic acid bis (3-hydroxyphenyl) amide, 4-methyl-isophthalic acid bis ( 4-hydroxyphenyl) amide, 1,3,5-benzenetricarboxylic acid tris (3-hydroxyphenyl) amide, 1,3,5-benzenetricarboxylic acid tris (4-hydroxyphenyl) amide, 1,3,5-benzene Tricarboxylic acid tris (1-hydroxyphenyl) amide, 1,3,5-benzenetricarboxylic acid-1,3-bis (3-hydroxyphenyl) amide, 1,3,5-benzenetricarboxylic acid-1,3-bis ( 4-hydroxyphenyl) amide, 1,3,5-benzenetricarboxylic acid-1,3-bis (1-hydroxyphenyl) amide, 1,2,4-benzenetricarboxylic acid tris (3-hydroxyphenyl) amide, 1,2,4-benzenetricarboxylic acid tris (4-hydroxyphenyl) amide, 1,2,4- Benzenetricarboxylic acid tris (1-hydroxyphenyl) amide, 1,2,4-benzenetricarboxylic acid-1,2-bis (3-hydroxyphenyl) amide, 1,2,4-benzenetricarboxylic acid-1,2-bis (4-hydroxyphenyl) amide, 1,2,4-benzenetricarboxylic acid-1,2-bis (1-hydroxyphenyl) amide, 1,2,4-benzenetricarboxylic acid-1,4-bis (3-hydroxy Phenyl) amide, 1,2,4-benzenetricarboxylic acid-1,4-bis (4-hydroxyphenyl) amide, 1,2,4- Emissions Zen tricarboxylic acid-1,4-bis (1-hydroxy-phenyl) amide. Among these, 1,3,5-benzenetricarboxylic acid tris (3-hydroxyphenyl) ester, 1,3,5-benzenetricarboxylic acid-1,3-bis (3-hydroxyphenyl) ester, 1,2,4 Benzenetricarboxylic acid tris (3-hydroxyphenyl) ester, 1,2,4-benzenetricarboxylic acid-1,2-bis (3-hydroxyphenyl) ester, 1,2,4-benzenetricarboxylic acid-1,4- Resorcinesters such as bis (3-hydroxyphenyl) ester, 1,3,5-benzenetricarboxylic acid tris (3-hydroxyphenyl) amide, 1,3,5-benzenetricarboxylic acid-1,3-bis (3- Hydroxyphenyl) amide, 1,2,4-benzenetricarboxylic acid tris (3-hydroxyphenyl) amide, M-amino such as 1,2,4-benzenetricarboxylic acid-1,2-bis (3-hydroxyphenyl) amide, 1,2,4-benzenetricarboxylic acid-1,4-bis (3-hydroxyphenyl) amide, etc. Phenol-based amides are preferred, especially 1,3,5-benzenetricarboxylic acid tris (3-hydroxyphenyl) ester, 1,3,5-benzenetricarboxylic acid-1,3-bis (3-hydroxyphenyl) ester, Benzenetricarboxylic acid triesters or diesters such as 2,4-benzenetricarboxylic acid tris (3-hydroxyphenyl) ester are preferred.
一般式(1)で表される化合物の製造法は特に限定されないが、例えば、下記一般式(3)で表される多価カルボン酸ハライドと、
下記一般式(4)で表される化合物
とを塩基の存在下または非存在下で反応させて製造される。
Although the manufacturing method of the compound represented by General formula (1) is not specifically limited, For example, the polyvalent carboxylic acid halide represented by following General formula (3),
Compound represented by the following general formula (4)
Is reacted in the presence or absence of a base.
一般式(3)中のRは前記一般式(1)中のRと同義であり、Yはハロゲン原子を表す。ハロゲン原子としては、塩素原子又は臭素原子が好ましい。 R in the general formula (3) has the same meaning as R in the general formula (1), and Y represents a halogen atom. As a halogen atom, a chlorine atom or a bromine atom is preferable.
一般式(3)で表される化合物としては、2−メチル−テレフタル酸ジクロライド、3-メチル−テレフタル酸ジクロライド、4−メチル−イソフタル酸ジクロライド、1,3,5−ベンゼントリカルボン酸トリクロライド、1,3,5−ベンゼントリカルボン酸ジクロライド、1,2,4−ベンゼントリカルボン酸トリクロライド、1,2,4−ベンゼントリカルボン酸ジクロライド等が挙げられる。これらの中でも、1,3,5−ベンゼントリカルボン酸トリクロライドが好ましい。 Examples of the compound represented by the general formula (3) include 2-methyl-terephthalic acid dichloride, 3-methyl-terephthalic acid dichloride, 4-methyl-isophthalic acid dichloride, 1,3,5-benzenetricarboxylic acid trichloride, 1 , 3,5-benzenetricarboxylic acid dichloride, 1,2,4-benzenetricarboxylic acid trichloride, 1,2,4-benzenetricarboxylic acid dichloride, and the like. Among these, 1,3,5-benzenetricarboxylic acid trichloride is preferable.
一般式(4)で表される化合物としては、カテコール、レゾルシン、ハイドロキノン、o−アミノフェノール、m−アミノフェノールおよびp−アミノフェノールが挙げられ、特にレゾルシンおよびm−アミノフェノールが好ましい。 Examples of the compound represented by the general formula (4) include catechol, resorcin, hydroquinone, o-aminophenol, m-aminophenol and p-aminophenol. Resorcin and m-aminophenol are particularly preferable.
一般式(3)で表される化合物と一般式(4)で表される化合物とを反応させる際に使用する塩基としては通常、ピリジン、β−ピコリン、N−メチルモルホリン、ジメチルアニリン、ジエチルアニリン、トリメチルアミン、トリエチルアミン、トリブチルアミン等の有機塩基が用いられる。 The base used for reacting the compound represented by the general formula (3) with the compound represented by the general formula (4) is usually pyridine, β-picoline, N-methylmorpholine, dimethylaniline, diethylaniline. Organic bases such as trimethylamine, triethylamine, and tributylamine are used.
一般式(3)で表される化合物と一般式(4)で表される化合物、特にカテコール、レゾルシンおよびハイドロキノンとを反応させる際は、通常、一般式(3)で表される化合物中のカルボン酸ハライド骨格に対し一般式(4)で表される化物を3〜20倍モルの比となるように反応させる。これより低いモル比では重合体の生成が懸念され好ましくない。一方、これより高いモル比にしても特に選択率の向上は観られず、容積効率を悪化させ、製品の単離に不利に働くため好ましくない。 When the compound represented by the general formula (3) and the compound represented by the general formula (4), particularly catechol, resorcin and hydroquinone are reacted, the carboxylic acid in the compound represented by the general formula (3) is usually used. The compound represented by the general formula (4) is reacted with respect to the acid halide skeleton so as to have a molar ratio of 3 to 20 times. If the molar ratio is lower than this, the formation of a polymer is concerned, which is not preferable. On the other hand, even if the molar ratio is higher than this, an improvement in selectivity is not particularly observed, and the volumetric efficiency is deteriorated, which is disadvantageous for product isolation.
一般式(3)で表される化合物と一般式(4)で表される化合物とを反応させる際、原料を溶解させること等を目的として溶媒を用いる事ができる。溶媒としては、上述の有機塩基をそのまま溶媒として使用しても良いし、反応を阻害しない他の有機溶媒を用いても構わない。このような溶媒としては、例えば、ジメチルエーテル、ジエチルエーテル、ジオキサン等のエーテル系溶媒が挙げられる。 When the compound represented by the general formula (3) is reacted with the compound represented by the general formula (4), a solvent can be used for the purpose of dissolving the raw materials. As the solvent, the above-described organic base may be used as it is, or another organic solvent that does not inhibit the reaction may be used. Examples of such a solvent include ether solvents such as dimethyl ether, diethyl ether, and dioxane.
一般式(3)で表される化合物と一般式(4)で表される化合物とを反応させる際の反応温度は、通常、−20℃〜120℃で行なわれる。 The reaction temperature for reacting the compound represented by the general formula (3) with the compound represented by the general formula (4) is usually -20 ° C to 120 ° C.
前記の反応により得られる一般式(1)で表される化合物は、公知の方法により反応混合物から単離することができる。即ち、減圧蒸留等の操作により、反応に用いた有機塩基および一般式(4)で表される化合物、反応に有機溶媒を使用した場合にはこの有機溶媒を留去し乾固させる方法、反応混合物に一般式(1)で表される化合物の貧溶媒を添加して再沈殿させる方法、反応混合液に水および水と混和しない有機溶媒を添加して有機層に抽出する方法等が挙げられる。また、場合によっては再結晶により精製しても良い。 The compound represented by the general formula (1) obtained by the above reaction can be isolated from the reaction mixture by a known method. That is, the organic base used in the reaction and the compound represented by the general formula (4) by an operation such as distillation under reduced pressure, and when an organic solvent is used in the reaction, the organic solvent is distilled off and dried. Examples include a method of reprecipitation by adding a poor solvent of the compound represented by the general formula (1) to the mixture, a method of adding water and an organic solvent immiscible with water to the reaction mixture, and extracting to the organic layer. . Moreover, you may refine | purify by recrystallization depending on the case.
前記の一般式(1)で表される化合物の貧溶媒としては通常、水が用いられる。また、上記水と混和しない有機溶媒としては、酢酸エチル、酢酸ブチル等のエステル類、メチルイソブチルケトン、ジイソブチルケトン等のケトン類が用いられる。 As a poor solvent for the compound represented by the general formula (1), water is usually used. Examples of the organic solvent immiscible with water include esters such as ethyl acetate and butyl acetate, and ketones such as methyl isobutyl ketone and diisobutyl ketone.
一般式(3)で表される化合物として1,3,5−ベンゼントリカルボン酸トリクロライドを用い、一般式(4)で表される化合物としてレゾルシンを用いた場合には、主成分として上記式(5)で表される化合物が得られる。この場合、下記式(6):
本発明の化合物はレゾルシンやRF樹脂に比べ、ゴム成分と混ざりやすいという特徴がある。そのため、本発明の化合物を配合したゴム組成物は、レゾルシンやRF樹脂を配合したゴム組成物よりもブルームしにくい傾向がある。これは本発明の化合物がレゾルシンやRF樹脂に比べて極性が低いためと推定される。また、本発明の化合物を配合したゴム組成物は貯蔵期間に関わらず接着安定性に優れている。そのため、本発明の化合物は接着向上剤として有用である。 The compound of the present invention is characterized by being easily mixed with a rubber component as compared with resorcin or RF resin. Therefore, the rubber composition containing the compound of the present invention tends to be less likely to bloom than the rubber composition containing resorcin or RF resin. This is presumably because the compound of the present invention has a lower polarity than resorcin or RF resin. Further, the rubber composition containing the compound of the present invention is excellent in adhesion stability regardless of the storage period. Therefore, the compound of the present invention is useful as an adhesion improver.
以下に、実施例、参考例、比較例を上げて本発明を更に詳しく説明するが、本発明は下記の実施例に何ら限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to Examples, Reference Examples, and Comparative Examples, but the present invention is not limited to the following Examples.
(実施例1)
1,3,5−ベンゼントリカルボン酸−トリレゾルシンエステルの製造
レゾルシン176.2g(1.60mol)をピリジン176.2gに溶解した液を10〜15℃に冷却し、同温度を保ちながら、融点以上に加熱して溶融させた1,3,5−ベンゼントリカルボン酸トリクロライド24.8g(0.0934mol)を1hrかけて滴下装入した。その後室温で2hr熟成した後に115℃〜120℃まで昇温して同温度で6hr熟成を行なった。得られたマスから減圧下、120℃でピリジン留去を行なった。最終的な減圧度は20torrまで達した。
(Example 1)
Preparation of 1,3,5-benzenetricarboxylic acid-triresorcin ester A solution of 176.2 g (1.60 mol) of resorcin in 176.2 g of pyridine is cooled to 10 to 15 ° C. Then, 24.8 g (0.0934 mol) of 1,3,5-benzenetricarboxylic acid trichloride, which was heated and melted, was added dropwise over 1 hr. Then, after aging at room temperature for 2 hr, the temperature was raised to 115 ° C. to 120 ° C. and aging was performed at the same temperature for 6 hr. From the obtained mass, pyridine was distilled off at 120 ° C. under reduced pressure. The final degree of vacuum reached 20 torr.
ピリジンを留去したマスに水200gを装入した後、塩酸でpH=3に調整し、さらに500gの水を追加した。その後、酢酸エチル100mlで4回抽出を行ない、酢酸エチル層を水洗、硫酸Mgで乾燥した後に濃縮して酢酸エチルを留去し、250gのシロップを得た。その後、水を添加し全体が白濁した時点で、今度は該溶液を水2kg中に排出し、得られた沈殿を濾過、水洗後、60℃で減圧乾燥して38.52gの粉体を得た。粗収率は1,3,5−ベンゼントリカルボン酸に対して85%であった。 After 200 g of water was charged into the mass from which pyridine had been distilled off, the pH was adjusted to 3 with hydrochloric acid, and an additional 500 g of water was added. Thereafter, extraction was performed 4 times with 100 ml of ethyl acetate, and the ethyl acetate layer was washed with water, dried over Mg sulfate and concentrated to distill off the ethyl acetate to obtain 250 g of syrup. Thereafter, when water was added and the whole became cloudy, this solution was discharged into 2 kg of water, and the resulting precipitate was filtered, washed with water, and dried under reduced pressure at 60 ° C. to obtain 38.52 g of powder. It was. The crude yield was 85% based on 1,3,5-benzenetricarboxylic acid.
得られた粉体をHPLCにて分析した結果、1,3,5−ベンゼントリカルボン酸−トリレゾルシンエステルが84.1面積%(85.3質量%)、二量体が11.0面積%(11.1質量%)およびレゾルシンが0.5質量%であった。 As a result of analyzing the obtained powder by HPLC, 84.1 area% (85.3 mass%) of 1,3,5-benzenetricarboxylic acid-triresorcin ester and 11.0 area% of dimer ( 11.1% by mass) and resorcin was 0.5% by mass.
尚、1,3,5−ベンゼントリカルボン酸−トリレゾルシンエステルおよび二量体の同定データは下記の通り。 The identification data of 1,3,5-benzenetricarboxylic acid-triresorcin ester and dimer are as follows.
<1,3,5−ベンゼントリカルボン酸トリレゾルシンエステルの同定データ>
MSスペクトルデータ
FAB(pos.) m/z=487 (M+H)+
IRスペクトルデータ
1745cm−1、1227cm−1および1136cm−1
NMRスペクトルデータを表1−1および表1−2に示した。
<Identification data of 1,3,5-benzenetricarboxylic acid triresorcin ester>
MS spectral data FAB (pos.) M / z = 487 (M + H) +
IR spectral data 1745 cm −1 , 1227 cm −1 and 1136 cm −1
The NMR spectrum data are shown in Table 1-1 and Table 1-2.
<二量体の同定データ>
NMRスペクトルデータを表2−1および表2−2に示した
<Identification data of dimer>
The NMR spectrum data are shown in Table 2-1 and Table 2-2.
また、HPLCの分析条件は下記の通り。
1,3,5−ベンゼントリカルボン酸−トリレゾルシンエステル、二量体およびレゾルシンの分析
カラム : YMC社 A−312 ODS
カラム温度: 40℃
溶離液 : メタノール/水=7/3(リン酸でpH=3に調整)
検出 : UV(254nm)
The HPLC analysis conditions are as follows.
Analysis of 1,3,5-benzenetricarboxylic acid-triresorcin ester, dimer and resorcin Column: YMC A-312 ODS
Column temperature: 40 ° C
Eluent: Methanol / water = 7/3 (adjusted to pH = 3 with phosphoric acid)
Detection: UV (254 nm)
(参考例1)
実施例1で製造した組成物を供試化合物として2200mLのバンバリーミキサーを使用して、表3に示すゴム配合処方で混練り混合して、未加硫のゴム組成物を調製し、以下の方法で耐ブルーム性、ムーニー粘度、配合直後の接着性及び、配合ゴム放置後の接着性を測定、評価した。結果を表3に示す。
(Reference Example 1)
Using the composition produced in Example 1 as a test compound, a 2200 mL Banbury mixer was kneaded and mixed with the rubber compounding formulation shown in Table 3 to prepare an unvulcanized rubber composition. The bloom resistance, Mooney viscosity, adhesiveness immediately after compounding, and adhesiveness after leaving the compounded rubber were measured and evaluated. The results are shown in Table 3.
<耐ブルーム性>
未加硫のゴム組成物を40℃で7日間貯蔵した後、配合剤がゴム表面に析出したか否かを目視で確認し、○、△、×で判定した。
○:表面に配合剤が析出していない。
△:一部に析出
×:全面に配合剤が析出
<Broom resistance>
After storing the unvulcanized rubber composition at 40 ° C. for 7 days, whether or not the compounding agent was deposited on the rubber surface was visually confirmed, and judged by ○, Δ, and ×.
○: No compounding agent is deposited on the surface.
Δ: Precipitated in part ×: Precipitating agent deposited on the entire surface
<ムーニー粘度>
未加硫のゴム組成物をJIS K6300-2001に準拠して、ML(1+4)130℃を測定した。結果は数値が低い程良好であることを示す。
<Mooney viscosity>
The unvulcanized rubber composition was measured for ML (1 + 4) 130 ° C. according to JIS K6300-2001. A result shows that it is so favorable that a numerical value is low.
<接着試験>
黄銅(Cu;63質量%、Zn;37質量%)メッキしたスチールコード(1×5構造、素線径0.25mm)を12.5mm間隔で平行に並べ、このスチールコードを上下両側から各ゴム組成物でコーティングして、これを直ちに160℃×15分の条件で加硫し、幅12.5mmのサンプルを作製した。下記の各接着性に対してASTM−D−2229に準拠して、各サンプルに対してスチールコードを引き抜き、ゴムの被覆状態を目視で観察し、0〜100%で表示、各接着性の指標とした。数値が大きい程良好であることを示す。初期接着性は前記加硫の直後に測定した。湿熱接着性は前記加硫後、70℃、湿度100%、4日の湿熱条件下で老化させた後に測定した。
<Adhesion test>
Steel cords (1x5 structure, strand diameter 0.25mm) plated with brass (Cu; 63% by mass, Zn: 37% by mass) are arranged in parallel at 12.5mm intervals. After coating with the composition, this was immediately vulcanized under conditions of 160 ° C. × 15 minutes to prepare a sample having a width of 12.5 mm. For each of the following adhesive properties, in accordance with ASTM-D-2229, the steel cord was pulled out from each sample, the rubber coating state was visually observed, displayed in 0 to 100%, and each adhesive index It was. It shows that it is so favorable that a numerical value is large. Initial adhesion was measured immediately after the vulcanization. The wet heat adhesiveness was measured after aging and after aging at 70 ° C., 100% humidity and 4 days of wet heat conditions.
<接着安定性試験>
前記未加硫状態のスチールコードを上下両側から各ゴム組成物でコーティングしたスチールコード−ゴム複合体を、40℃×80RH%の恒温恒湿槽に7日間放置後、160℃×15分間加硫して、初期接着性を測定し、接着安定性の指標とした。
<Adhesion stability test>
The steel cord-rubber composite obtained by coating the unvulcanized steel cord with each rubber composition from both the upper and lower sides is left in a constant temperature and humidity chamber of 40 ° C. × 80 RH% for 7 days, and then vulcanized at 160 ° C. for 15 minutes. Then, initial adhesiveness was measured and used as an index of adhesive stability.
(比較例1)
供試化合物として本発明の組成物を使用しない以外は参考例1と同様に配合してゴム組成物を調製し、評価した。結果を表3に示した。
(Comparative Example 1)
A rubber composition was prepared and evaluated in the same manner as in Reference Example 1 except that the composition of the present invention was not used as a test compound. The results are shown in Table 3.
(比較例2)
供試化合物としてレゾルシンをゴム基本配合に2質量部配合する以外は参考例1と同様に配合してゴム組成物を調製し、評価した。結果を表3に示した。
(Comparative Example 2)
A rubber composition was prepared and evaluated in the same manner as in Reference Example 1 except that 2 parts by mass of resorcin as a test compound was added to the basic rubber compound. The results are shown in Table 3.
(比較例3)
供試化合物としてRF樹脂をゴム基本配合に2質量部配合する以外は参考例1と同様に配合してゴム組成物を調製し、評価した。結果を表3に示した。なお、RF樹脂は下記の方法で製造した。
(Comparative Example 3)
A rubber composition was prepared and evaluated in the same manner as in Reference Example 1 except that 2 parts by mass of RF resin was added to the basic rubber compound as a test compound. The results are shown in Table 3. In addition, RF resin was manufactured with the following method.
まず、水1100g、レゾルシン1100g(10mol)、p−トルエンスルホン酸1.72g(10mmol)を冷却管、攪拌装置、温度計、滴下ロート、窒素導入管を備えた4つ口フラスコに仕込、70℃まで昇温した。37%ホルマリン溶液を477g(5.9mol)を2時間かけて滴下し、そのままの温度で5時間保持し、反応を完結させた。反応終了後、10%水酸化ナトリウム水溶液を4g加え中和した後、冷却器をディーンスターク型還流器に変え、水を留去しながら150℃まで昇温し、更に20mmHgの減圧下で1時間かけて水を除去し、RF樹脂を得た。得られたRF樹脂の軟化点は124℃、残存レゾルシン量は17%であった。 First, 1100 g of water, 1100 g (10 mol) of resorcin, and 1.72 g (10 mmol) of p-toluenesulfonic acid were charged into a four-necked flask equipped with a cooling tube, a stirrer, a thermometer, a dropping funnel, and a nitrogen introducing tube at 70 ° C. The temperature was raised to. 477 g (5.9 mol) of 37% formalin solution was added dropwise over 2 hours, and kept at the same temperature for 5 hours to complete the reaction. After the completion of the reaction, 4 g of 10% aqueous sodium hydroxide solution was added to neutralize, and then the condenser was changed to a Dean-Stark type refluxing device. The temperature was raised to 150 ° C. while distilling off water, and further under reduced pressure of 20 mmHg for 1 hour. Water was removed to obtain an RF resin. The obtained RF resin had a softening point of 124 ° C. and a residual resorcin content of 17%.
(比較例4)
供試化合物として特開平7−118621号広報(特許文献2)記載の混合ポリエステルをゴム基本配合に2質量部配合する以外は参考例1と同様に配合してゴム組成物を調製し、評価した。結果を表3に示した。尚、混合ポリエステルは上記特許記載の実施例1に準じて合成した。
(Comparative Example 4)
A rubber composition was prepared and evaluated in the same manner as in Reference Example 1 except that 2 parts by mass of the mixed polyester described in JP-A-7-118621 (Patent Document 2) was mixed as a test compound in the rubber basic compound. . The results are shown in Table 3. The mixed polyester was synthesized according to Example 1 described in the above patent.
還流冷却器および温度計を備えた300mlの4つ口フラスコに、レゾルシン108.9g(0.99mol)、アジピン酸131.4g(0.90mol)、無水酢酸222.0g(2.175mol)およびピリジン0.54g(レゾルシンに対して0.5重量%)を仕込み、窒素置換後、室温で15分攪拌し、その後100℃に昇温して同温度で2hrアセチル化を行なった。その後、副生する酢酸を系外に留去しながら昇温し140℃で1hr、さらに昇温し240℃で2hr熟成した。次いで、減圧下(50mmHg)240℃で熟成を続けた。反応混合物を磁性皿に排出し、黄土色のあめ状物195.6gを得た。ガラス棒で練る事で徐々に結晶化した。分析の結果レゾルシンを0.1重量%、レゾルシンモノアセテートを0.5重量%、レゾルシンジアセテートを0.8重量%含んでいた。また、GPCにて分子量を測定した結果、重量平均分子量は約30000(PS換算)であった。 A 300 ml four-necked flask equipped with a reflux condenser and a thermometer was charged with 108.9 g (0.99 mol) of resorcin, 131.4 g (0.90 mol) of adipic acid, 222.0 g (2.175 mol) of acetic anhydride and 0.54 g of pyridine. (0.5% by weight based on resorcin) was charged, and after substitution with nitrogen, the mixture was stirred at room temperature for 15 minutes, then heated to 100 ° C. and subjected to 2 hr acetylation at the same temperature. Thereafter, the temperature was raised while distilling acetic acid produced as a by-product out of the system, and the mixture was aged at 140 ° C. for 1 hour, further heated and aged at 240 ° C. for 2 hours. Next, aging was continued at 240 ° C. under reduced pressure (50 mmHg). The reaction mixture was discharged into a magnetic dish to obtain 195.6 g of an ocher candy. It gradually crystallized by kneading with a glass rod. As a result of the analysis, it contained 0.1% by weight of resorcin, 0.5% by weight of resorcin monoacetate, and 0.8% by weight of resorcin diacetate. Moreover, as a result of measuring molecular weight by GPC, the weight average molecular weight was about 30000 (PS conversion).
Claims (6)
下記一般式(4)
で表される化合物とを反応させる事を特徴とする一般式(1)で表される化合物の製造方法。 A polyvalent carboxylic acid halide represented by the following general formula (3):
The following general formula (4)
The manufacturing method of the compound represented by General formula (1) characterized by making the compound represented by these react.
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JP2008138119A (en) * | 2006-12-04 | 2008-06-19 | Bridgestone Corp | Rubber composition |
JP2008138117A (en) * | 2006-12-04 | 2008-06-19 | Bridgestone Corp | Pneumatic tire |
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JP2008138119A (en) * | 2006-12-04 | 2008-06-19 | Bridgestone Corp | Rubber composition |
JP2008138117A (en) * | 2006-12-04 | 2008-06-19 | Bridgestone Corp | Pneumatic tire |
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