JP2008065943A - Manufacturing method of two-layer optical recording medium - Google Patents

Manufacturing method of two-layer optical recording medium Download PDF

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JP2008065943A
JP2008065943A JP2006244797A JP2006244797A JP2008065943A JP 2008065943 A JP2008065943 A JP 2008065943A JP 2006244797 A JP2006244797 A JP 2006244797A JP 2006244797 A JP2006244797 A JP 2006244797A JP 2008065943 A JP2008065943 A JP 2008065943A
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optical recording
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Yuki Nakamura
有希 中村
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Ricoh Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a two-layer optical recording medium having a translucent reflection layer which is hardly corroded on an organic dye recording layer and having high reliability. <P>SOLUTION: (1) In the manufacturing method of the two-layer optical recording medium, the translucent reflection layer is formed on the organic dye recording layer formed on a substrate with a guide groove by sputtering using a target consisting essentially of Ag while applying periodical negative pulse voltage to the target, when a recording constitution body on this side viewed from a recording and reproducing light incident side of the optical recording medium (two-layer optical recording medium) having two layers of recording constitution bodies including the recording layer is layered. (2) In the manufacturing method of the two-layer optical recording medium mentioned in (1), the periodical negative pulse voltage has 1 to 100 kHz frequency. (3) In the manufacturing method of the two-layer optical recording medium mentioned in either of (1) and (2), the periodical negative pulse voltage is -300 V or lower. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、2層光記録媒体製造方法に関する。   The present invention relates to a method for producing a two-layer optical recording medium.

光記録媒体製造におけるスパッタリングプロセスでは、基板と対向配置したターゲットにDC又はRF電位を印加し、電離したArイオンの衝突によってターゲットから飛び出した材料を、ガラス基板又はポリカーボネート等のプラスチック基板上に堆積させることにより薄膜を形成している。
通常のライトワンス型光記録媒体を製造する場合には、基板上にシアニン系、フタロシアニン系、アゾ系等の有機色素からなる記録層を塗布形成し、その上に、銀、金、アルミニウム等の金属反射層を真空中でスパッタリングして形成している。
書き換え型光記録媒体、例えば相変化光記録媒体あるいは光磁気記録媒体の製造の場合には、基板上に、下部耐熱保護層、相変化記録層あるいは光磁気記録層、上部耐熱保護層、反射層、放熱層等を順次、真空中で連続してスパッタリングして形成している。
続いて、ライトワンス型光記録媒体、書き換え型光記録媒体の何れも、必要に応じて、樹脂保護層、印刷層を設けたり、接着剤により他の基板と貼り合わせて完成品を得る。
In a sputtering process in the production of optical recording media, a DC or RF potential is applied to a target disposed opposite to the substrate, and a material that has jumped out of the target by the collision of ionized Ar ions is deposited on a glass substrate or a plastic substrate such as polycarbonate. Thus, a thin film is formed.
When manufacturing a normal write-once type optical recording medium, a recording layer made of a cyanine-based, phthalocyanine-based, azo-based or other organic dye is applied and formed on a substrate, and silver, gold, aluminum, or the like is formed thereon. The metal reflection layer is formed by sputtering in vacuum.
In the case of manufacturing a rewritable optical recording medium, for example, a phase change optical recording medium or a magneto-optical recording medium, a lower heat-resistant protective layer, a phase change recording layer or a magneto-optical recording layer, an upper heat-resistant protective layer, a reflective layer are formed on the substrate. The heat dissipation layer and the like are sequentially sputtered in vacuum.
Subsequently, in both the write-once type optical recording medium and the rewritable type optical recording medium, a finished product is obtained by providing a resin protective layer and a printing layer, if necessary, and bonding them to another substrate with an adhesive.

近年、記録容量の増大に対する社会的ニーズが強くなり、ライトワンス型DVDの規格として広く知られているDVD+R、DVD−Rにおいて、厚さ50μm程度の中間層を挟んで記録層を2層形成し、容量を約2倍にするDVD+R DL(Double Layer)、DVD−R DLと呼ばれる2層光記録媒体が広まりつつある。
図1にその代表的構成を示す。
第1記録層と第1反射層(半透明反射層)からなる第1記録構成体(L0)を積層した第1基板と、第2反射層と第2記録層からなる第2記録構成体(L1)を積層した第2基板とを、中間層を介して接合した構成である。第1及び第2記録層には一般に有機色素が用いられる。また、通常の場合、中間層は接着層兼用とする。
記録再生光入射側から見て奥側の第2記録層に記録再生を行なうため、手前側の第1記録構成体(L0)は、記録再生波長において15〜30%の反射率を有し、40〜60%の透過率を有するように構成する。
半透明反射層は、通常、Au、Ag、Cuなどの金属を主成分とし、耐食性、耐候性改善のために0.1〜5重量%程度の添加元素を加える。中でも、Agを主成分とし、添加元素としてCu、Pd、Pt、Au、Nd、Bi、Ga、Inを用いることにより、最もスパッタ効率の良い直流スパッタリングを行なうのが一般的である。
公知文献としては、例えば特許文献1に、記録時に有機色素からなる2つの情報記録層に光情報媒体の片面から書き込みできるようにし、再生時にも2つの情報記録層に光情報媒体の片面から読み込みをする構成の発明が開示されている。しかし、本発明の特徴であるターゲットに周期的な負のパルス電圧を印加する点に関する記載は見当たらない。
In recent years, social needs for increasing recording capacity have increased, and in DVD + R and DVD-R widely known as write-once DVD standards, two recording layers are formed with an intermediate layer of about 50 μm in thickness. Two-layer optical recording media called DVD + R DL (Double Layer) and DVD-R DL, which double the capacity, are becoming widespread.
FIG. 1 shows a typical configuration thereof.
A first substrate on which a first recording structure (L0) composed of a first recording layer and a first reflective layer (semi-transparent reflective layer) is laminated, and a second recording structure composed of a second reflective layer and a second recording layer ( In this configuration, the second substrate laminated with L1) is joined via an intermediate layer. In general, organic dyes are used for the first and second recording layers. In the usual case, the intermediate layer is also used as an adhesive layer.
In order to perform recording / reproduction on the second recording layer on the back side as viewed from the recording / reproducing light incident side, the first recording structure (L0) on the near side has a reflectance of 15 to 30% at the recording / reproducing wavelength, It is configured to have a transmittance of 40 to 60%.
The translucent reflective layer is usually composed mainly of a metal such as Au, Ag, or Cu, and an additive element of about 0.1 to 5% by weight is added to improve corrosion resistance and weather resistance. In particular, it is common to perform direct current sputtering with the highest sputtering efficiency by using Ag as a main component and using Cu, Pd, Pt, Au, Nd, Bi, Ga, and In as additive elements.
As a known document, for example, in Patent Document 1, it is possible to write on two information recording layers made of organic dyes from one side of an optical information medium during recording, and read from one side of the optical information medium to two information recording layers also during reproduction. An invention having a configuration to perform the above is disclosed. However, there is no description relating to the application of a periodic negative pulse voltage to the target, which is a feature of the present invention.

11−066622号公報No. 11-066662

2層光記録媒体における有機色素記録層上に形成したAg合金からなる半透明反射層は、容易に腐食するため、その材料であるAg合金の選定、その上に隣接して形成される有機樹脂からなるオーバーコートや接着剤の選定などは大きな制約を受ける。
そこで、本発明は、有機色素記録層上に腐食しにくい半透明反射層を有する信頼性の高い2層光記録媒体製造方法の提供を目的とする。
Since the translucent reflective layer made of an Ag alloy formed on the organic dye recording layer in the two-layer optical recording medium is easily corroded, the selection of the Ag alloy as the material and the organic resin formed adjacent thereto The selection of overcoats and adhesives made of is greatly restricted.
SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a highly reliable method for producing a two-layer optical recording medium having a semi-transparent reflective layer that hardly corrodes on an organic dye recording layer.

上記課題は次の1)〜6)の発明(以下、本発明1〜6という)によって解決される。
1) 記録層を含む記録構成体を2層有する光記録媒体(2層光記録媒体)の記録再生光入射側から見て手前側の記録構成体を積層するに際し、案内溝付き基板上に形成した有機色素記録層上に、Agを主成分とするターゲットを用い、該ターゲットに周期的な負のパルス電圧を印加しつつ、スパッタリングにより半透明反射層を形成することを特徴とする2層光記録媒体製造方法。
2) 周期的な負のパルス電圧の周波数が、1〜100kHzであることを特徴とする1)記載の2層光記録媒体製造方法。
3) 周期的な負のパルス電圧が、−300V以下であることを特徴とする1)又は2)記載の光記録媒体製造方法。
4) 周期的な負のパルス電圧を印加しない時間の少なくとも一部に、正の電圧を印加することを特徴とする1)〜3)の何れかに記載の2層光記録媒体製造方法。
5) 周期的な負のパルス電圧を印加する時間が、正のパルス電圧又はゼロ電圧を印加する時間の3倍以上であることを特徴とする1)〜4)の何れかに記載の2層光記録媒体製造方法。
6) 有機色素がシアニン系色素を含むことを特徴とする1)〜5)の何れかに記載の2層光記録媒体製造方法。
The above problems are solved by the following inventions 1) to 6) (hereinafter referred to as the present inventions 1 to 6).
1) When a recording structure on the near side as viewed from the recording / reproducing light incident side of an optical recording medium (two-layer optical recording medium) having two recording structures including a recording layer is laminated on a substrate with a guide groove A two-layer light characterized in that a semi-transparent reflective layer is formed by sputtering while applying a periodic negative pulse voltage to the target on the organic dye recording layer. Recording medium manufacturing method.
2) The method for producing a two-layer optical recording medium according to 1), wherein the frequency of the periodic negative pulse voltage is 1 to 100 kHz.
3) The method for producing an optical recording medium according to 1) or 2), wherein the periodic negative pulse voltage is −300 V or less.
4) The method for producing a two-layer optical recording medium according to any one of 1) to 3), wherein a positive voltage is applied during at least a part of a time during which no periodic negative pulse voltage is applied.
5) The two layers according to any one of 1) to 4), wherein the time for applying the periodic negative pulse voltage is at least three times the time for applying the positive pulse voltage or the zero voltage. Optical recording medium manufacturing method.
6) The method for producing a two-layer optical recording medium according to any one of 1) to 5), wherein the organic dye contains a cyanine dye.

以下、上記本発明について詳しく説明する。
従来技術では、2層光記録媒体の製造に際し、第1記録構成体は、トラッキング用案内溝付きプラスチック基板上に有機色素記録層を塗布などで形成し、その上に、Ag合金からなる半透明反射層をスパッタリングにより形成するが、本発明では、その際に、周期的な負のパルス電圧をターゲットに印加してAgの組織を微細化し、高温高湿保存時及び経時での結晶成長を抑制する。
本発明で用いるAgを主成分とするターゲットは、通常用いられている溶融ターゲット等でよく、必要に応じて鍛造処理等を行って機械的強度を増すこともできる。ここで主成分とは、Agを95重量%以上、好ましくは98重量%以上含むことを意味する。
Hereinafter, the present invention will be described in detail.
In the prior art, when manufacturing a two-layer optical recording medium, the first recording structure is formed by coating an organic dye recording layer on a plastic substrate with a tracking guide groove, on which a translucent film made of an Ag alloy is formed. The reflective layer is formed by sputtering. In the present invention, a negative negative pulse voltage is applied to the target to refine the Ag structure to suppress crystal growth during storage at high temperature and high humidity and over time. To do.
The target mainly composed of Ag used in the present invention may be a commonly used melting target or the like, and may be subjected to forging treatment or the like as necessary to increase the mechanical strength. Here, the main component means that Ag is contained by 95% by weight or more, preferably 98% by weight or more.

反射層及び半透明反射層材料としては、レーザー光波長に対する反射率が高いものが好ましく、例えばAu、Ag、Cu、Al、Ti、V、Cr、Ni、Nd、Mg、Pd、Zr、Pt、Ta、W、Si、Znなどの金属及び半金属を挙げることができる。中でも、Au、Ag、Cu、Alの何れかを主成分とし、これら4元素とは異なるAu、Ag、Cu、Al、Ti、V、Cr、Ni、Nd、Mg、Pd、Zr、Pt、Ta、W、Si、Zn、Inの中から選ばれた少なくとも1種を0.5〜10重量%添加した合金が好ましい。0.5重量%以上添加することにより結晶粒が微細化し耐蝕性に優れた薄膜となる。しかし10重量%よりも多く添加すると反射率が低下するため好ましくない。
半透明反射層は、第2色素記録層に十分な光が到達するように、透過率30〜60%程度、反射率15〜30%程度となるようにする。また、その膜厚は5〜30nmの範囲が好ましい。
一方、反射層の膜厚は100〜200nmが好ましく130nm以上が更に好ましい。奥側の第2の記録構成体の放熱性を良くするためには厚い方が好ましいが、200nmを超えると、成膜に時間がかかり材料費も増えるため製造コストの観点から好ましくなく、しかも膜表面の微視的な平坦性も悪くなってしまう。
有機色素としては、シアニン系、フタロシアニン系、アゾ系等の公知の種々の色素を用いることができ、特に限定されない。
As the reflective layer and the translucent reflective layer material, those having a high reflectance with respect to the laser light wavelength are preferable. For example, Au, Ag, Cu, Al, Ti, V, Cr, Ni, Nd, Mg, Pd, Zr, Pt, Mention may be made of metals and metalloids such as Ta, W, Si, Zn. Among them, Au, Ag, Cu, or Al is the main component and is different from these four elements. Au, Ag, Cu, Al, Ti, V, Cr, Ni, Nd, Mg, Pd, Zr, Pt, Ta An alloy to which at least one selected from W, Si, Zn, and In is added in an amount of 0.5 to 10% by weight is preferable. By adding 0.5% by weight or more, the crystal grains become fine and a thin film having excellent corrosion resistance is obtained. However, addition of more than 10% by weight is not preferable because the reflectance decreases.
The translucent reflective layer has a transmittance of about 30 to 60% and a reflectance of about 15 to 30% so that sufficient light reaches the second dye recording layer. The film thickness is preferably in the range of 5 to 30 nm.
On the other hand, the thickness of the reflective layer is preferably 100 to 200 nm, and more preferably 130 nm or more. In order to improve the heat dissipation of the second recording structure on the back side, the thicker one is preferable. However, if the thickness exceeds 200 nm, the film formation takes time and the material cost increases, which is not preferable from the viewpoint of manufacturing cost. The microscopic flatness of the surface is also deteriorated.
As the organic dye, various known dyes such as cyanine-based, phthalocyanine-based, and azo-based dyes can be used, and are not particularly limited.

ターゲットには周期的に負のパルス電圧を印加する。負のパルス電圧の周波数は、1〜100kHzの範囲が好ましい。また、負のパルス電圧は、−300V以下とすることが好ましい。これらの条件を満たす場合には、膜厚均一性等の成膜品質を良好なものとする事ができ、結果的に信頼性の高い媒体を得ることが出来るので好ましい。
図2、図3に印加パルス電圧の一例を示すが、図2のように、負のパルス電圧V1を印加していない時間T2にパルス電圧をゼロにする場合には、T2の時間はスパッタリングが停止する。また、図3のように、負のパルス電圧V1を印加していない時間T2に正のパルス電圧V2を印加する場合には、質量の小さいプラズマ中の電子がAg合金ターゲットに引き込まれるため、パルス電圧をゼロとする場合よりも早い時間にアルゴンイオンが開放される。正のパルス電圧V2を印加する時間は、負のパルス電圧V1を印加していない時間の全部でも一部でもよいが(図3は全部の場合に相当する)、印加する時間が短くなれば、前述のアルゴンイオン開放促進効果が小さくなる。
また、周期的な負のパルス電圧を印加している時間T1は、正のパルス電圧又はゼロ電圧が印加されている時間T2の3倍以上であることが好ましい。T1の割合があまり小さくなると、負のパルス電圧を印加する効果が少なくなる。
A negative pulse voltage is periodically applied to the target. The frequency of the negative pulse voltage is preferably in the range of 1 to 100 kHz. The negative pulse voltage is preferably −300 V or less. When these conditions are satisfied, film forming quality such as film thickness uniformity can be improved, and as a result, a highly reliable medium can be obtained.
FIG. 2 and FIG. 3 show an example of the applied pulse voltage. As shown in FIG. 2, when the pulse voltage is set to zero at time T2 when the negative pulse voltage V1 is not applied, sputtering is performed during the time T2. Stop. Further, as shown in FIG. 3, when the positive pulse voltage V2 is applied at the time T2 when the negative pulse voltage V1 is not applied, electrons in the plasma having a small mass are attracted to the Ag alloy target. Argon ions are released earlier than when the voltage is zero. The time during which the positive pulse voltage V2 is applied may be all or part of the time during which the negative pulse voltage V1 is not applied (FIG. 3 corresponds to all cases). The above-described argon ion release promoting effect is reduced.
Moreover, it is preferable that time T1 which applies a periodic negative pulse voltage is 3 times or more of time T2 when a positive pulse voltage or a zero voltage is applied. When the ratio of T1 becomes too small, the effect of applying a negative pulse voltage is reduced.

図4は、本発明を実施するためのスパッタ装置の一例を示す図である。
スパッタ装置1は、搬入搬出機構2、メインチャンバー3、プロセスチャンバー4等を備えており、パルスDC電源に接続されている。プロセスチャンバー4は、半透明反射層を形成するためのスパッタ成膜室である。プロセスチャンバー4では、プロセスチャンバー4内を10−4Pa程度の高真空に引いた後、Arガスを10−3〜10−2Pa程度の圧力になるように導入した状態で、パルス電圧を印加してプラズマを発生させ、Ag合金ターゲット材料を、基板11上に塗布した有機色素記録層上にスパッタリングで成膜する。
操作としては、作製対象の有機色素記録層を塗布した基板11をメインチャンバー3に導入し、搬入搬出機構2によってプロセスチャンバー4に搬送し、半透明反射層を成膜する。
FIG. 4 is a view showing an example of a sputtering apparatus for carrying out the present invention.
The sputtering apparatus 1 includes a loading / unloading mechanism 2, a main chamber 3, a process chamber 4, and the like, and is connected to a pulsed DC power source. The process chamber 4 is a sputter film formation chamber for forming a translucent reflective layer. In the process chamber 4, after applying a high vacuum of about 10 −4 Pa to the inside of the process chamber 4, a pulse voltage is applied in a state where Ar gas is introduced so as to have a pressure of about 10 −3 to 10 −2 Pa. Then, plasma is generated, and an Ag alloy target material is formed on the organic dye recording layer coated on the substrate 11 by sputtering.
As an operation, the substrate 11 coated with the organic dye recording layer to be produced is introduced into the main chamber 3 and conveyed to the process chamber 4 by the loading / unloading mechanism 2 to form a translucent reflective layer.

本発明によれば、有機色素記録層上に腐食しにくい半透明反射層を有する信頼性の高い2層光記録媒体の製造方法を提供できる。   ADVANTAGE OF THE INVENTION According to this invention, the manufacturing method of a reliable 2 layer optical recording medium which has a translucent reflective layer which is hard to corrode on an organic dye recording layer can be provided.

以下、実施例及び比較例を示して本発明を更に具体的に説明するが、本発明はこれらの実施例により限定されるものではない。   EXAMPLES Hereinafter, although an Example and a comparative example are shown and this invention is demonstrated further more concretely, this invention is not limited by these Examples.

実施例1〜6、比較例1〜2
溝深さ160nm、溝幅0.35μm、トラックピッチ0.74μmの凹状グルーブを形成した板厚0.57mmのポリカーボネート製基板上に、〔化1〕のスクアリリウム色素化合物と〔化2〕のシアニン色素化合物を重量比50:50で混合し、2,2,3,3−テトラフルオルプロパノールに溶解した塗布液をスピンコートすることにより、膜厚約40nmの第1色素記録層を成膜した。
次に、第1色素記録層上に、表1に示すスパッタリング条件で、Ag99Cu0.5In0.5(重量%)合金を8nmの膜厚にスパッタリングして半透明反射層を成膜し、第1記録構成体を有する第1情報基板を得た。
一方、溝深さ34nm、溝幅0.3μm、トラックピッチ0.74μmの凸状グルーブを形成した板厚0.6mmのポリカーボネート製基板上に、スパッタリングでAg反射層を膜厚120nmに形成し、その上に、〔化1〕のスクアリリウム色素化合物と〔化2〕のシアニン色素化合物を重量比4:6で混合し、2,2,3,3−テトラフルオルプロパノールに溶解した塗布液をスピンコートすることにより、膜厚約60nmの第2色素記録層を成膜した。
次に、第2色素記録層上に、スパッタリングでZnS−SiO(80:20モル%)からなる膜厚15nmの無機保護層を成膜して、第2記録構成体を有する第2情報基板を得た。
続いて、上記第1、第2情報基板を、紫外線硬化型接着剤(日本化薬製KARAYAD DVD802)を用いて、中間層の厚さが50μmになるように貼り合わせて、実施例1〜6、比較例1〜2の各2層光記録媒体を得た。
Examples 1-6, Comparative Examples 1-2
A squarylium dye compound of [Chemical Formula 1] and a cyanine dye of [Chemical Formula 2] on a polycarbonate substrate having a plate thickness of 0.57 mm on which concave grooves having a groove depth of 160 nm, a groove width of 0.35 μm and a track pitch of 0.74 μm are formed. A compound was mixed at a weight ratio of 50:50, and a coating solution dissolved in 2,2,3,3-tetrafluoropropanol was spin coated to form a first dye recording layer having a thickness of about 40 nm.
Next, an Ag 99 Cu 0.5 In 0.5 (wt%) alloy is sputtered to a thickness of 8 nm on the first dye recording layer under the sputtering conditions shown in Table 1 to form a translucent reflective layer. Thus, a first information substrate having the first recording structure was obtained.
On the other hand, an Ag reflective layer is formed to a thickness of 120 nm by sputtering on a polycarbonate substrate having a plate thickness of 0.6 mm on which convex grooves having a groove depth of 34 nm, a groove width of 0.3 μm, and a track pitch of 0.74 μm are formed. Further, a squarylium dye compound of [Chemical Formula 1] and a cyanine dye compound of [Chemical Formula 2] are mixed at a weight ratio of 4: 6, and a coating solution dissolved in 2,2,3,3-tetrafluoropropanol is spun. By coating, a second dye recording layer having a thickness of about 60 nm was formed.
Next, a 15 nm-thick inorganic protective layer made of ZnS—SiO 2 (80:20 mol%) is formed on the second dye recording layer by sputtering, and the second information substrate having the second recording structure is formed. Got.
Subsequently, the first and second information substrates were bonded together using an ultraviolet curable adhesive (KARAYAD DVD802 manufactured by Nippon Kayaku Co., Ltd.) so that the thickness of the intermediate layer became 50 μm. Each of the two-layer optical recording media of Comparative Examples 1-2 was obtained.

上記2層光記録媒体の第1記録構成体に対して、パルステック工業社製ODU1000(波長657nm、NA:0.65)を用いて、線速度30.64m/s(8倍速記録)の条件でDVD(8−16)信号を記録した後、3.83m/sで再生評価を行ったところ、反射率19%、変調度I14/I14H65%が得られた。
上記2層光記録媒体の、記録後の初期のPIsum8は、Max10〜20であった。その後、80℃85%RHで保存した後にPIsum8を測定したところ、実施例1〜6では、400〜500時間後のPIsum8が規格値280以下であったが、比較例1、2では、50時間で規格値以上になり信頼性の低いものであった。
Conditions for a linear velocity of 30.64 m / s (8 × speed recording) using ODU1000 (wavelength 657 nm, NA: 0.65) manufactured by Pulstec Industrial Co., Ltd. for the first recording structure of the two-layer optical recording medium. When a DVD (8-16) signal was recorded by the above and reproduction evaluation was performed at 3.83 m / s, a reflectance of 19% and a modulation degree of I14 / I14H65% were obtained.
The initial PIsum8 after recording of the two-layer optical recording medium was Max 10 to 20. Thereafter, PIsum8 was measured after being stored at 80 ° C. and 85% RH. In Examples 1 to 6, PIsum8 after 400 to 500 hours was a standard value of 280 or less, but in Comparative Examples 1 and 2, it was 50 hours. It was above the standard value and the reliability was low.

Figure 2008065943
Figure 2008065943
Figure 2008065943
Figure 2008065943

Figure 2008065943
Figure 2008065943

2層光記録媒体の代表的構成を示す図。The figure which shows the typical structure of a two-layer optical recording medium. ターゲットに印加するパルス電圧の変化を示す図。The figure which shows the change of the pulse voltage applied to a target. ターゲットに印加するパルス電圧の変化を示す図。The figure which shows the change of the pulse voltage applied to a target. 本発明を実施するためのスパッタ装置の一例を示す図。The figure which shows an example of the sputtering device for implementing this invention.

符号の説明Explanation of symbols

V1 負のパルス電圧
V2 正のパルス電圧
T1 負のパルス電圧を印加する時間
T2 正のパルス電圧又はゼロ電圧を印加する時間
V1 Negative pulse voltage V2 Positive pulse voltage T1 Time to apply negative pulse voltage T2 Time to apply positive pulse voltage or zero voltage

Claims (6)

記録層を含む記録構成体を2層有する光記録媒体(2層光記録媒体)の記録再生光入射側から見て手前側の記録構成体を積層するに際し、案内溝付き基板上に形成した有機色素記録層上に、Agを主成分とするターゲットを用い、該ターゲットに周期的な負のパルス電圧を印加しつつ、スパッタリングにより半透明反射層を形成することを特徴とする2層光記録媒体製造方法。   An organic layer formed on a substrate with guide grooves when a recording structure on the near side as viewed from the recording / reproducing light incident side of an optical recording medium (two-layer optical recording medium) having two recording structures including a recording layer is stacked. A two-layer optical recording medium characterized in that a semi-transparent reflective layer is formed by sputtering while applying a periodic negative pulse voltage to the target on a dye recording layer using a target mainly composed of Ag Production method. 周期的な負のパルス電圧の周波数が、1〜100kHzであることを特徴とする請求項1記載の2層光記録媒体製造方法。   The method for producing a two-layer optical recording medium according to claim 1, wherein the frequency of the periodic negative pulse voltage is 1 to 100 kHz. 周期的な負のパルス電圧が、−300V以下であることを特徴とする請求項1又は2記載の2層光記録媒体製造方法。   3. The method for producing a two-layer optical recording medium according to claim 1, wherein the periodic negative pulse voltage is −300 V or less. 周期的な負のパルス電圧を印加しない時間の少なくとも一部に、正の電圧を印加することを特徴とする請求項1〜3の何れかに記載の2層光記録媒体製造方法。   4. The method for producing a two-layer optical recording medium according to claim 1, wherein a positive voltage is applied at least during a part of the time during which no periodic negative pulse voltage is applied. 周期的な負のパルス電圧を印加する時間が、正のパルス電圧又はゼロ電圧を印加する時間の3倍以上であることを特徴とする請求項1〜4の何れかに記載の2層光記録媒体製造方法。   5. The two-layer optical recording according to claim 1, wherein the period for applying the periodic negative pulse voltage is at least three times as long as the period for applying the positive pulse voltage or the zero voltage. Medium manufacturing method. 有機色素がシアニン系色素を含むことを特徴とする請求項1〜5の何れかに記載の2層光記録媒体製造方法。
6. The method for producing a two-layer optical recording medium according to claim 1, wherein the organic dye contains a cyanine dye.
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