JP2007293006A - Photosensitive resin transfer material, color filter and method for manufacturing the same, and image display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin transfer material which is uniform in film thickness and prevents chipping of image, by uniformly bonding a photosensitive resin layer and a cover film, as well as, with a constant strength. <P>SOLUTION: The photosensitive resin transfer material has a photosensitive resin layer, containing a colorant and a photosensitive resin and a cover film on a support, in this order. The photosensitive resin transfer material has an intermediate layer between the photosensitive resin layer and the cover film, and the bonding strength between the photosensitive resin layer and the cover film lies within the range of 1.5-8.0 g/10 cm. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a photosensitive resin transfer material used for forming a color filter suitably used in a large-screen image display device such as a car navigation monitor, a notebook computer, and a television monitor, and the photosensitive resin transfer material. The present invention relates to a formed color filter and an image display device using the color filter.

  A color liquid crystal display device is widely used as a flat panel display instead of a CRT (Cathode-Ray Tube) display, as a display unit of a television, a personal computer screen, a mobile phone, or other display devices. The color filter is an essential component for such a color image display device.

  The color filter usually forms a predetermined pixel pattern by forming a photosensitive resin layer on a transparent substrate, pattern-exposing the photosensitive resin layer, and then removing unnecessary portions by development. , Red (R), green (G), blue (B), etc.

For the production of the color filter, a photosensitive resin transfer material is widely used. For example, a photosensitive resin transfer material in which a photosensitive resin layer, a surface protective film (cover film) and the like are provided on a temporary support is known (see Patent Document 1).
JP-A-5-80503

  In recent years, as the photosensitive resin transfer material is made thinner and higher in concentration, the pigment concentration in the photosensitive resin layer is increased. However, if the pigment concentration is increased, the concentration of the binder component is inevitably lowered, so that the adhesion between the photosensitive resin layer and the cover film becomes insufficient. When the adhesion between the cover film and the photosensitive resin layer is insufficient, there are problems that workability is deteriorated and the protection of the photosensitive resin is insufficient. Furthermore, since an air layer is formed at the interface between the photosensitive resin layer and the cover film, reticulation occurs, and a part that adheres to the cover film and a part that does not adhere to the cover film are generated. . If there is a difference in flatness as described above, an image may be lost after patterning.

  Under such circumstances, an object of the present invention is to provide a photosensitive resin transfer material in which the film thickness is uniform and image loss is prevented by bonding the photosensitive resin layer and the cover film uniformly and at a constant strength. There is to do.

Means for achieving the above object are as follows.
[1] A photosensitive resin transfer material having a photosensitive resin layer containing a colorant and a photosensitive resin and a cover film in this order on a support,
The photosensitive resin transfer which has an intermediate | middle layer between the said photosensitive resin layer and a cover film, and the adhesive strength of the said photosensitive resin layer and a cover film is the range of 1.5-8.0g / 10cm. material.
[2] The photosensitive resin transfer material according to [1], wherein the intermediate layer contains a modified polyolefin resin.
[3] The photosensitive resin transfer material according to [2], wherein the modified polyolefin resin contains an ethylene-acrylic acid ester-maleic anhydride terpolymer.
[4] The photosensitive resin transfer material according to any one of [1] to [3], wherein the intermediate layer has a thickness in the range of 0.05 to 1.5 μm.
[5] The intermediate layer is a layer formed by applying an intermediate layer coating solution on the photosensitive resin layer and / or the cover film,
The photosensitive resin transfer material according to any one of [1] to [4], wherein the coating is performed such that the dry coating amount is in a range of 0.05 to 0.50 g / m ² .
[6] The photosensitive resin transfer material according to any one of [1] to [5], wherein the photosensitive resin layer contains a colorant in a range of 30 to 70% by mass.
[7] The photosensitive resin transfer material according to any one of [1] to [6], wherein the photosensitive resin layer has a thickness in the range of 0.3 to 3.0 μm.
[8] The photosensitive resin transfer material according to any one of [1] to [7], wherein the cover film is a biaxially stretched polypropylene film.
[9] The photosensitive resin transfer material according to any one of [1] to [8], wherein the support is a polyester film.
[10] The photosensitive resin transfer material according to any one of [1] to [9], wherein an adhesive strength between the support and the photosensitive resin layer is in a range of 10 to 30 g / 10 cm.
[11] The photosensitive resin transfer material according to any one of [1] to [10], further comprising a thermoplastic resin layer and / or an oxygen blocking layer between the support and the photosensitive resin layer.
[12] A method for producing a color filter having a pixel pattern and / or a black matrix on a substrate,
The pixel pattern and / or the black matrix is formed by forming a photosensitive resin layer on the substrate, exposing and developing the photosensitive resin layer,
The formation of the photosensitive resin layer is supported after the cover film is peeled from the photosensitive resin transfer material according to any one of [1] to [11], and the surface exposed by the peeling is brought into close contact with the substrate. The said manufacturing method performed by removing a body.
[13] A color filter produced by the method according to [12].
[14] An image display device having the color filter according to [13].

According to the present invention, it is possible to provide a photosensitive resin transfer material that has a uniform film thickness and prevents image loss after the transfer and patterning steps.
Furthermore, according to the present invention, a high-quality color filter and an image display device can be provided by using the photosensitive resin transfer material.

Hereinafter, the present invention will be described in more detail.

[Photosensitive resin transfer material]
The photosensitive resin transfer material of the present invention is a photosensitive resin transfer material having, on a support, a photosensitive resin layer containing a colorant and a photosensitive resin, and a cover film in this order, the photosensitive resin layer and the cover. An intermediate layer is provided between the film and the adhesive strength between the photosensitive resin layer and the cover film is in the range of 1.5 to 8.0 g / 10 cm.
Below, the detail of the said support body, the photosensitive resin layer, an intermediate | middle layer, and a cover film is demonstrated sequentially.

Intermediate layer The photosensitive resin transfer material of the present invention has an intermediate layer between the photosensitive resin layer and the cover film. The intermediate layer plays a role of increasing the adhesive force between the photosensitive resin layer and the cover film. However, if a part of the intermediate layer remains on the photosensitive resin after the cover film is peeled off, the developability may be lowered. Therefore, the intermediate layer is peeled off from the photosensitive resin layer together with the cover film when the cover film is peeled off. It is preferred that From the above points, in the present invention, an intermediate layer is provided between the photosensitive resin layer and the cover film, and the adhesive strength between the photosensitive resin layer and the cover film is controlled in the range of 1.5 to 8.0 g / 10 cm. To do. If the adhesive strength between the photosensitive resin layer and the cover film is less than 1.5 g / 10 cm, the adhesive between the photosensitive resin layer and the cover film is insufficient and air can be easily taken in at the time of lamination. Flatness may be impaired. On the other hand, when the adhesive strength between the photosensitive resin layer and the cover film exceeds 8.0 g / 10 cm, the peeling work efficiency is lowered, and a part of the intermediate layer remains on the photosensitive resin layer after the cover film is peeled off. Alternatively, part of the photosensitive resin layer may be peeled off together with the cover film, and the developability may be lowered. The adhesive strength between the photosensitive resin layer and the cover film is preferably in the range of 1.5 to 6.0 g / 10 cm.

The adhesive strength between the photosensitive resin layer and the cover film in the present invention refers to the adhesive strength (peel strength) measured by the following method using TENSILON RTM-100 manufactured by ORIENTEC CORPORATION as a measuring instrument.
(Measuring method)
Under the following measurement conditions, 180 ° peel strength measurement is performed as shown in FIG. The value at the time when the cover film and the photosensitive resin layer are completely peeled is read from the chart as shown in FIG. The obtained value is defined as the adhesive strength (g / 10 cm).
(i) Sample width 10 cm, sample length 5 cm or more
(ii) Peeling speed: 500 mm / min, peeling length: 5 cm or more

  The adhesive strength between the photosensitive resin layer and the cover film is as follows: (1) Type and / or combination of resins used in the intermediate layer, (2) Solid content concentration of the intermediate layer (dry coating amount), (3) Intermediate It can be controlled by the melting point, glass transition temperature (Tg) and / or melt viscosity of the resin used in the layer, (4) surface treatment of the cover film surface in contact with the intermediate layer, and the like. The details of the intermediate layer including the control method will be described below.

  The intermediate layer may be a layer formed from an adhesive resin. As such a resin, a resin comprising an emulsion or a solution can be used. Specifically, a polyolefin resin, a modified polyolefin resin, a polyvinyl alcohol, an ethylene-vinyl acetate copolymer resin, an ethylene-ethyl acrylate copolymer A coalesced resin, a styrene / ethylene / butylene copolymer resin, a urethane resin, a styrene-acrylic resin, an acrylic resin, or the like can be used.

  In the present invention, the adhesive force between the photosensitive resin layer and the cover film is controlled by providing an intermediate layer between the photosensitive resin layer and the cover film. Therefore, for the formation of the intermediate layer, it is preferable to use a resin having an appropriate adhesive strength so as to obtain a desired adhesive strength. Examples of the resin preferable from the above point include a modified polyolefin resin. In the present invention, the intermediate layer can be formed by combining two or more kinds of resins.

  The modified polyolefin resin is not particularly limited, and for example, modified polyolefin resins described in JP-A Nos. 2003-103734 and 2003-119328 can be used. Among them, in the present invention, in order to obtain appropriate adhesiveness as described above, an unsaturated carboxylic acid or an anhydride thereof (first component), an ethylene-based hydrocarbon (second component), and a (meth) acrylic ester. It is preferable to use a copolymer composed of (third component). In the present invention, “(meth) acrylic acid ester” includes methacrylic acid ester and acrylic acid ester.

  The unsaturated carboxylic acid or anhydride thereof constituting the copolymer is a compound having at least one carboxyl group or acid anhydride group in the molecule (in the monomer unit), specifically, acrylic acid, Examples include methacrylic acid, maleic acid, maleic anhydride, itaconic acid, itaconic anhydride, fumaric acid, crotonic acid and the like, as well as unsaturated dicarboxylic acid half esters and half amides. Of these, acrylic acid, methacrylic acid, maleic acid, and maleic anhydride are preferable, and maleic anhydride is particularly preferable. Moreover, the unsaturated carboxylic acid should just be copolymerized in polyolefin resin, The form is not limited, For example, random copolymerization, block copolymerization, graft copolymerization etc. are mentioned.

  Examples of the ethylene-based hydrocarbon constituting the copolymer include C2-C6 alkenes such as ethylene, propylene, isobutylene, 1-butene, 1-pentene, 1-hexene, and a mixture thereof. You can also. Among these, alkenes having 2 to 4 carbon atoms such as ethylene, propylene, isobutylene and 1-butene are more preferable, and ethylene is particularly preferable.

  Examples of the (meth) acrylic acid ester constituting the copolymer include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, and the like, and a mixture thereof is used. You can also. Among these, (meth) acrylic acid esters represented by the following formula (I) are more preferable, and methyl (meth) acrylate and ethyl (meth) acrylate are particularly preferable.

[式中、Ｒ¹¹は水素またはメチル基であり、Ｒ¹²は炭素数１０以下のアルキル基である。]

[Wherein R ¹¹ represents hydrogen or a methyl group, and R ¹² represents an alkyl group having 10 or less carbon atoms. ]

  As the modified polyolefin resin, ethylene-acrylic acid ester-maleic anhydride terpolymer is most preferably used. The modification rate of the modified polyolefin resin (ratio of monomers other than olefins replaced by olefins) is preferably 5 to 50%, and more preferably 5 to 35%. The higher the modification rate of the modified polyolefin resin is, the higher the adhesive force tends to be. Therefore, it is preferable to select a modified polyolefin resin having an appropriate modification rate so as to obtain a desired adhesive force. The mass ratio of each component in the modified polyolefin resin is preferably in the range described in JP-A Nos. 2003-103734 and 2003-119328. The above publications can also be referred to for details such as the method for producing the modified polyolefin resin.

  In general, an adhesive resin tends to have a stronger adhesive force as its melting point, glass transition temperature or melt viscosity is lower. In the present invention, in order to obtain a desired adhesive force, the melting point of the modified polyolefin resin is preferably 50 to 130 ° C, and preferably 60 to 120 ° C. In addition, a high melting point adhesive resin and a low melting point adhesive resin may be used in combination for adjusting the adhesive force. For example, in the present invention, an intermediate layer having a desired adhesive force is formed by using polyvinyl alcohol having a melting point of about 150 to 250 ° C. together with a modified polyolefin resin having a melting point in the above range as the intermediate layer resin. be able to.

  As described above, it is preferable that the intermediate layer adheres the photosensitive resin layer and the cover film well and is peeled off together with the cover film when the cover film is peeled off. From the above points, the thickness of the intermediate layer is preferably 0.05 to 1.5 μm, and more preferably 0.05 to 0.8 μm. The intermediate layer may have a laminated structure of two or more layers.

  The intermediate layer can be prepared by applying a coating solution for forming an intermediate layer obtained by dissolving an adhesive resin such as a modified polyolefin resin in a suitable solvent on a cover film or a photosensitive resin layer. . The method for preparing the coating liquid is not particularly limited. For example, the coating liquid can be prepared by forming an emulsion containing an adhesive resin and mixing the emulsion with a solvent. JP, 2003-103734, A and JP, 2003-119328, A can be referred to for details of the preparation method of the coating liquid.

  Examples of the solvent include methanol, ethanol, isopropanol, normal propanol, methyl ethyl ketone, ethyl acetate, toluene, ethylene glycol monoethyl ether acetate, and the like. These solvents may be used as a mixture of two or more.

For the intermediate layer, in order to obtain desired adhesiveness and coating film formability, the mass of the coating layer (intermediate layer) after drying is desirably in the range of 0.05 to 0.50 g / m ² . The higher the coating layer mass after drying, the stronger the adhesive force. If the coating layer mass after drying is 0.05 g / m ² or more, good adhesion can be obtained. Moreover, if the coating layer mass after drying is 0.50 m ² / g or less, good coating film formability (appropriate viscosity) can be obtained. The content of the resin having adhesiveness such as the modified polyolefin resin in the coating solution may be set as appropriate in consideration of the coating layer mass after drying, but there is a problem in the surface condition of the coating in consideration of the drying load and the like. It is preferable to make the concentration as high as possible within the range where there is no mist. The density | concentration of the said resin in an intermediate | middle layer coating liquid can be made into the range of 1.0-10.0 mass%, for example.

  In addition to the resin, the components usually used in the coating layer can be added to the intermediate layer coating solution. Examples of such components include antistatic agents, dyes, surfactants and the like.

  As the coating method of the intermediate layer coating solution, known film forming methods such as gravure roll coating, reverse roll coating, wire bar coating, lip coating, air knife coating, curtain flow coating, spray coating, dip coating, brush coating The law etc. can be used. After coating, if necessary, it can be set at around room temperature and then subjected to a drying treatment. Moreover, it can also apply | coat using a slit-shaped nozzle so that it may mention later.

Photosensitive resin layer The photosensitive resin layer is a layer containing a colorant and a photosensitive resin. A known photopolymerizable resin can be used as the resin. The “resin” includes a monomer or oligomer that is polymerized after exposure to become a resin.

The said photosensitive resin layer can be formed by apply | coating the photosensitive resin layer coating liquid (colored photosensitive resin composition) containing a coloring agent and photosensitive resin on a support body. The photosensitive resin layer coating solution can be obtained by dissolving a colorant and a photopolymerizable resin in an appropriate solvent. Components used in the coating solution include (1) alkali-soluble binder, (2) monomer or oligomer, (3) photopolymerization initiator or photopolymerization initiator system, (4) colorant, and (5) surfactant. Can be mentioned.
Below, the said components (1)-(5) are demonstrated sequentially.

(1) Alkali-soluble binder The alkali-soluble binder (hereinafter sometimes simply referred to as "binder") is preferably a polymer having a polar group such as a carboxylic acid group or a carboxylic acid group in the side chain. Examples thereof include JP-A-59-44615, JP-B-54-34327, JP-B-58-12577, JP-B-54-25957, JP-A-59-53836, and JP-A-57-36. A methacrylic acid copolymer, an acrylic acid copolymer, an itaconic acid copolymer, a crotonic acid copolymer, a maleic acid copolymer, a partially esterified maleic acid copolymer as described in JP-A-59-71048 Etc. Moreover, the cellulose derivative which has a carboxylic acid group in a side chain can also be mentioned, In addition to this, what added the cyclic acid anhydride to the polymer which has a hydroxyl group can also be used preferably. Further, as particularly preferred examples, copolymers of benzyl (meth) acrylate and (meth) acrylic acid described in US Pat. No. 4,139,391, benzyl (meth) acrylate, (meth) acrylic acid and other monomers And a multi-component copolymer. These binder polymers having a polar group may be used alone or in the state of a composition used in combination with a normal film-forming polymer. The content of the binder with respect to the total solid content of the colored photosensitive resin composition is generally 20 to 50% by mass, and preferably 25 to 45% by mass.

(2) Monomer or oligomer As the monomer or oligomer, it is preferable to use a monomer or oligomer that has two or more ethylenically unsaturated double bonds and undergoes addition polymerization upon irradiation with light. Examples of such monomers and oligomers include compounds having at least one addition-polymerizable ethylenically unsaturated group in the molecule and having a boiling point of 100 ° C. or higher at normal pressure. Examples include monofunctional acrylates and monofunctional methacrylates such as polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate and phenoxyethyl (meth) acrylate; polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) ) Acrylate, trimethylolethane triacrylate, trimethylolpropane tri (meth) acrylate, trimethylolpropane diacrylate, neopentyl glycol di (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol tri (meth) acrylate, di Pentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, hexa Diol di (meth) acrylate, trimethylolpropane tri (acryloyloxypropyl) ether, tri (acryloyloxyethyl) isocyanurate, tri (acryloyloxyethyl) cyanurate, glycerin tri (meth) acrylate; multifunctional such as trimethylolpropane and glycerin Polyfunctional acrylates and polyfunctional methacrylates such as those obtained by adding ethylene oxide or propylene oxide to alcohol and then (meth) acrylated can be mentioned.

Further, urethane acrylates described in JP-B-48-41708, JP-B-50-6034 and JP-A-51-37193; JP-A-48-64183, JP-B-49-43191 And polyester acrylates described in JP-B-52-30490; polyfunctional acrylates and methacrylates such as epoxy acrylates which are reaction products of epoxy resin and (meth) acrylic acid.
Among these, trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and dipentaerythritol penta (meth) acrylate are preferable.
In addition, “polymerizable compound B” described in JP-A-11-133600 can also be mentioned as a preferable example.

  In the present invention, the monomer preferably contains at least one monomer having a hydrophilic group. By containing such a hydrophilic monomer, development is accelerated and development time can be shortened. In particular, the effect can be exhibited even when the colorant concentration is 40% by mass or more. And as such a hydrophilic group, an ethylene oxide group or a propylene oxide group is preferable. Hereinafter, the monomer having a hydrophilic group will be described.

  The monomer having a hydrophilic group is preferably, for example, an unsaturated compound represented by the following general formula (1) or an unsaturated compound represented by the general formula (2).

  First, the unsaturated compound represented by the general formula (1) will be described.

General formula (1)
_{CH 2 = C (R) -CO} -O- (X-O) n -O-CO-C (R) = CH 2
In General Formula (1), R represents a hydrogen atom or a methyl group, X is -C ₃ H ₆ - or C ₂ H ₄ - represents, n is an integer in the range of 1-6. ]

  Examples of the unsaturated compound represented by the general formula (1) include 1,3-butanediol diacrylate, 1,4-butanediol diacrylate, diethylene glycol diacrylate, polyethylene glycol diacrylate, and tetraethylene glycol diacrylate. , Triethylene glycol diacrylate, polypropylene glycol diacrylate and the like.

  Next, the unsaturated compound represented by the general formula (2) will be described.

［一般式（２）において、Ｒ¹、Ｒ²は、各々独立に、水素原子またはメチル基を表す。複数のＹはエチレン基を表す。ｍおよびｎは、ｍ＋ｎ＝２〜４０になるような正の整数であることが好ましく、ｍ＋ｎ＝４〜３０であることがより好ましく、ｍ＋ｎ＝８〜２０であることが更に好ましく、８〜１５であることが特に好ましい。］

[In General Formula (2), R ¹ and R ² each independently represents a hydrogen atom or a methyl group. Several Y represents an ethylene group. m and n are preferably positive integers such that m + n = 2 to 40, more preferably m + n = 4 to 30, further preferably m + n = 8 to 20, and 8 to 15 It is particularly preferred that ]

  Examples of the unsaturated compound represented by the general formula (2) include 2,2-bis (4-((meth) acryloyloxyethoxy) phenyl) propane and 2,2-bis (4-((meth)). Acryloyloxydiethoxy) phenyl) propane, 2,2-bis (4-((meth) acryloyloxytriethoxy) phenyl) propane, 2,2-bis (4-((meth) acryloyloxytetraethoxy) phenyl) propane 2,2-bis (4-((meth) acryloyloxypentaethoxy) phenyl) propane, 2,2-bis (4-((meth) acryloyloxyhexaethoxy) phenyl) propane, 2,2-bis (4 -((Meth) acryloyloxyheptaethoxy) phenyl) propane, 2,2-bis (4-((meth) acryloyloxy) Taethoxy) phenyl) propane, 2,2-bis (4-((meth) acryloyloxynonaethoxy) phenyl) propane, 2,2-bis (4-((meth) acryloyloxydecaethoxy) phenyl) propane, 2, 2-bis (4-((meth) acryloyloxyundecaethoxy) phenyl) propane, 2,2-bis (4-((meth) acryloyloxidedecaethoxy) phenyl) propane, 2,2-bis (4- ( (Meth) acryloyloxytridecaethoxy) phenyl) propane, 2,2-bis (4-((meth) acryloyloxytetradecaethoxy) phenyl) propane, 2,2-bis (4-((meth) acryloyloxypenta) Decaethoxy) phenyl) propane, 2,2-bis (4-((meth) acryloyloxyhex) Dekaetokishi) phenyl) propane. 2,2-bis (4- (methacryloxypentaethoxy) phenyl) propane is commercially available under the product name BPE-500 (manufactured by Shin-Nakamura Chemical Co., Ltd.) and 2,2-bis (4- (methacrylic). Roxypentadecaethoxy) phenyl) propane is commercially available under the product name BPE-1300 (manufactured by Shin-Nakamura Chemical Co., Ltd.).

  These monomers or oligomers may be used alone or in admixture of two or more. The content of the colored photosensitive resin composition with respect to the total solid content is generally 1 to 30% by mass, and 5 to 20 % By mass is preferable, and 5 to 15% by mass is more preferable.

(3) Photopolymerization initiator or photopolymerization initiator system Examples of the photopolymerization initiator or photopolymerization initiator system include vicinal polyketaldonyl compounds disclosed in US Pat. No. 2,367,660, US Pat. The acyloin ether compounds described in US Pat. No. 2,448,828, the aromatic acyloin compounds substituted with α-hydrocarbons described in US Pat. No. 2,722,512, US Pat. Nos. 3,046,127 and 2,951,758 A polynuclear quinone compound described in US Pat. No. 3,549,367, a combination of a triarylimidazole dimer and a p-aminoketone described in US Pat. No. 3,549,367, a benzothiazole compound described in Japanese Patent Publication No. 51-48516, and trihalomethyl-s- Triazine compounds described in US Pat. No. 4,239,850 Halomethyl - triazine compound include a trihalomethyl oxadiazole compounds described in U.S. Pat. No. 4,212,976. In particular, trihalomethyl-s-triazine, trihalomethyloxadiazole, and triarylimidazole dimer are preferable.
In addition, “polymerization initiator C” described in JP-A-11-133600 can also be mentioned as a preferable example.
These photopolymerization initiators or photopolymerization initiator systems may be used singly or as a mixture of two or more, but it is particularly preferable to use two or more. When at least two kinds of photopolymerization initiators are used, display characteristics, particularly display unevenness, can be reduced.
The content of the photopolymerization initiator or the photopolymerization initiator system with respect to the total solid content of the colored photosensitive resin composition is generally 0.5 to 20% by mass, and preferably 1 to 15% by mass.

(4) Colorant Specific examples of the colorant used in the present invention include those having the color index (CI) numbers described in the following dyes and pigments.

  A known colorant (dye, pigment) can be used for the colored photosensitive resin composition. When using a pigment among the known colorants, it is preferable that the pigment is uniformly dispersed in the colored resin composition.

  The ratio of the colorant in the solid content of the colored photosensitive resin composition is preferably 30 to 70% by mass and more preferably 40 to 70% by mass from the viewpoint of sufficiently shortening the development time. More preferably, it is 50-70 mass%.

Examples of the known colorant include the following dyes or pigments;
Victoria Pure Blue BO (C.I. 42595), Auramin (C.I. 41000), Fat Black HB (C.I. 26150), C.I. I. Pigment yellow 1, C.I. I. Pigment yellow 3, C.I. I. Pigment yellow 12, C.I. I. Pigment yellow 13, C.I. I. Pigment yellow 14, C.I. I. Pigment yellow 5, C.I. I. Pigment yellow 16, C.I. I. Pigment yellow 17, C.I. I. Pigment yellow 20, C.I. I. Pigment yellow 24, C.I. I. Pigment yellow 31, C.I. I. Pigment yellow 55, C.I. I. Pigment yellow 60, C.I. I. Pigment yellow 61, C.I. I. Pigment yellow 65, C.I. I. Pigment yellow 71, C.I. I. Pigment yellow 73, C.I. I. Pigment yellow 74, C.I. I. Pigment yellow 81, C.I. I. Pigment yellow 83, C.I. I. Pigment yellow 93, C.I. I. Pigment yellow 95, C.I. I. Pigment yellow 97, C.I. I. Pigment yellow 98, C.I. I. Pigment yellow 100, C.I. I. Pigment yellow 101, C.I. I. Pigment yellow 104, C.I. I. Pigment yellow 106, C.I. I. Pigment yellow 108, C.I. I. Pigment yellow 109, C.I. I. Pigment yellow 110, C.I. I. Pigment yellow 113, C.I. I. Pigment yellow 114, C.I. I. Pigment yellow 116, C.I. I. Pigment yellow 117, C.I. I. Pigment yellow 119, C.I. I. Pigment yellow 120, C.I. I. Pigment yellow 126, C.I. I. Pigment yellow 127, C.I. I. Pigment yellow 128, C.I. I. Pigment yellow 129, C.I. I. Pigment yellow 138, C.I. I. Pigment yellow 139, C.I. I. Pigment yellow 150, C.I. I. Pigment yellow 151, C.I. I. Pigment yellow 152, C.I. I. Pigment yellow 153, C.I. I. Pigment yellow 154, C.I. I. Pigment yellow 155, C.I. I. Pigment yellow 156, C.I. I. Pigment yellow 166, C.I. I. Pigment yellow 168, C.I. I. Pigment yellow 175, C.I. I. Pigment yellow 180, C.I. I. Pigment yellow 185;

  C. I. Pigment orange 1, C.I. I. Pigment orange 5, C.I. I. Pigment orange 13, C.I. I. Pigment orange 14, C.I. I. Pigment orange 16, C.I. I. Pigment orange 17, C.I. I. Pigment orange 24, C.I. I. Pigment orange 34, C.I. I. Pigment orange 36, C.I. I. Pigment orange 38, C.I. I. Pigment orange 40, C.I. I. Pigment orange 43, C.I. I. Pigment orange 46, C.I. I. Pigment orange 49, C.I. I. Pigment orange 51, C.I. I. Pigment orange 61, C.I. I. Pigment orange 63, C.I. I. Pigment orange 64, C.I. I. Pigment orange 71, C.I. I. Pigment orange 73; C.I. I. Pigment violet 1, C.I. I. Pigment violet 19, C.I. I. Pigment violet 23, C.I. I. Pigment violet 29, C.I. I. Pigment violet 32, C.I. I. Pigment violet 36, C.I. I. Pigment violet 38;

  C. I. Pigment red 1, C.I. I. Pigment red 2, C.I. I. Pigment red 3, C.I. I. Pigment red 4, C.I. I. Pigment red 5, C.I. I. Pigment red 6, C.I. I. Pigment red 7, C.I. I. Pigment red 8, C.I. I. Pigment red 9, C.I. I. Pigment red 10, C.I. I. Pigment red 11, C.I. I. Pigment red 12, C.I. I. Pigment red 14, C.I. I. Pigment red 15, C.I. I. Pigment red 16, C.I. I. Pigment red 17, C.I. I. Pigment red 18, C.I. I. Pigment red 19, C.I. I. Pigment red 21, C.I. I. Pigment red 22, C.I. I. Pigment red 23, C.I. I. Pigment red 30, C.I. I. Pigment red 31, C.I. I. Pigment red 32, C.I. I. Pigment red 37, C.I. I. Pigment red 38, C.I. I. Pigment red 40, C.I. I. Pigment red 41, C.I. I. Pigment red 42, C.I. I. Pigment red 48: 1, C.I. I. Pigment red 48: 2, C.I. I. Pigment red 48: 3, C.I. I. Pigment red 48: 4, C.I. I. Pigment red 49: 1, C.I. I. Pigment red 49: 2, C.I. I. Pigment red 50: 1, C.I. I. Pigment red 52: 1, C.I. I. Pigment red 53: 1, C.I. I. Pigment red 57, C.I. I. Pigment red 57: 1, C.I. I. Pigment red 57: 2, C.I. I. Pigment red 58: 2, C.I. I. Pigment red 58: 4, C.I. I. Pigment red 60: 1, C.I. I. Pigment red 63: 1, C.I. I. Pigment red 63: 2, C.I. I. Pigment red 64: 1, C.I. I. Pigment red 81: 1, C.I. I. Pigment red 83, C.I. I. Pigment red 88, C.I. I. Pigment red 90: 1, C.I. I. Pigment red 97, C.I. I. Pigment red 101, C.I. I. Pigment red 102, C.I. I. Pigment red 104, C.I. I. Pigment red 105, C.I. I. Pigment red 106, C.I. I. Pigment red 108, C.I. I. Pigment red 112, C.I. I. Pigment red 113, C.I. I. Pigment red 114, C.I. I. Pigment red 122, C.I. I. Pigment red 123, C.I. I. Pigment red 144, C.I. I. Pigment red 146, C.I. I. Pigment red 149, C.I. I. Pigment red 150, C.I. I. Pigment red 151, C.I. I. Pigment red 166, C.I. I. Pigment red 168, C.I. I. Pigment red 170, C.I. I. Pigment red 171, C.I. I. Pigment red 172, C.I. I. Pigment red 174, C.I. I. Pigment red 175, C.I. I. Pigment red 176, C.I. I. Pigment red 177, C.I. I. Pigment red 178, C.I. I. Pigment red 179, C.I. I. Pigment red 180, C.I. I. Pigment red 185, C.I. I. Pigment red 187, C.I. I. Pigment red 188, C.I. I. Pigment red 190, C.I. I. Pigment red 193, C.I. I. Pigment red 194, C.I. I. Pigment red 202, C.I. I. Pigment red 206, C.I. I. Pigment red 207, C.I. I. Pigment red 208, C.I. I. Pigment red 209, C.I. I. Pigment red 215, C.I. I. Pigment red 216, C.I. I. Pigment red 220, C.I. I. Pigment red 224, C.I. I. Pigment red 226, C.I. I. Pigment red 242, C.I. I. Pigment red 243, C.I. I. Pigment red 245, C.I. I. Pigment red 254, C.I. I. Pigment red 255, C.I. I. Pigment red 264, C.I. I. Pigment red 265;

  C. I. Pigment blue 15, C.I. I. Pigment blue 15: 3, C.I. I. Pigment blue 15: 4, C.I. I. Pigment blue 15: 6, C.I. I. Pigment Blue 60C. I. Pigment green 7, C.I. I. Pigment Green 36C. I. Pigment brown 23, C.I. I. Pigment Brown 25C. I. Pigment black 1, C.I. I. Pigment Black 7 etc.

  Note that color filters used in full color liquid crystal displays, plasma dressing type liquid crystal displays, and the like are usually red (R), green (G), and blue (B) for the purpose of preventing light leakage and improving contrast. ), That is, a non-pixel portion on the transparent substrate is provided with a light shielding film called a black matrix. As this light-shielding film, a film using a sputtered film of metal such as chromium is also known. However, in recent years, a light-shielding photosensitive material combining a photosensitive resin and carbon black or the like for improving the yield and considering the environment. It has been proposed to form a black matrix using a functional composition. Also in the present invention, a black colorant can be used as a colorant in the photosensitive resin composition to form a black matrix. Specific examples of the black colorant include carbon black, titanium carbon, iron oxide, titanium oxide, graphite, and the like. Among these, carbon black is preferable.

  The pigment is desirably used as a dispersion. This dispersion can be prepared by adding and dispersing a composition obtained by previously mixing the pigment and the pigment dispersant in an organic solvent (or vehicle) described later. The vehicle refers to a portion of a medium in which the pigment is dispersed when the paint is in a liquid state. The portion is a liquid that binds to the pigment and hardens the coating film (binder), and a component that dissolves and dilutes the portion. (Organic solvent). The disperser used for dispersing the pigment is not particularly limited. For example, the kneader described in Kazuzo Asakura, “Encyclopedia of Pigments”, first edition, Asakura Shoten, 2000, 438, Known dispersing machines such as a roll mill, an atrider, a super mill, a dissolver, a homomixer, and a sand mill can be used. Further, fine grinding may be performed using frictional force by mechanical grinding described in Item 310 of the document.

  In the present invention, the pigment used as the colorant preferably has a number average particle size of 0.001 to 0.1 μm, more preferably 0.01 to 0.08 μm, from the viewpoint of dispersion stability. On the other hand, if the number average particle diameter of the pigment exceeds 0.1 μm, the polarization is canceled by the pigment, and the contrast is lowered. The “particle diameter” as used herein refers to the diameter when the electron micrograph image of the particle is a circle of the same area, and the “number average particle diameter” is the above-mentioned particle diameter for a number of particles, This 100 average value is said.

(5) Surfactant In the color filters that have been used in the past, the color of each pixel becomes dark in order to achieve high color purity, and the unevenness of the film thickness of the pixel is recognized as color unevenness as it is. there were. For this reason, it has been demanded to improve the film thickness variation during the formation (application) of the photosensitive resin layer that directly affects the film thickness of the pixel.
Therefore, in the present invention, it is possible to control to a uniform film thickness, and from the viewpoint of effectively preventing coating unevenness (color unevenness due to film thickness variation), an appropriate surfactant in the photosensitive resin layer coating liquid. It is preferable to contain.
Preferred examples of the surfactant include surfactants disclosed in JP-A Nos. 2003-337424 and 11-133600.
The ratio of the surfactant in the solid content of the colored photosensitive resin composition (photosensitive resin layer coating solution) is preferably 0.03 to 0.5% by mass, and 0.06 to 0.3% by mass. % Is more preferable, and 0.08 to 0.2% by mass is even more preferable.

(Other additives)
-Solvent-
In order to improve the applicability of the photosensitive resin layer coating solution, an organic solvent may be further used in addition to the above components. Examples of the organic solvent include methyl ethyl ketone, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, cyclohexanone, cyclohexanol, methyl isobutyl ketone, ethyl lactate, methyl lactate, caprolactam and the like.

-Thermal polymerization inhibitor-
The photosensitive resin layer coating solution used in the present invention preferably contains a thermal polymerization inhibitor. Examples of the thermal polymerization inhibitor include hydroquinone, hydroquinone monomethyl ether, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4′-thiobis (3-methyl). -6-t-butylphenol), 2,2'-methylenebis (4-methyl-6-t-butylphenol), 2-mercaptobenzimidazole, phenothiazine and the like.

-UV absorber-
The photosensitive resin layer coating solution used in the present invention may contain an ultraviolet absorber as necessary. Examples of the ultraviolet absorber include salicylate-based, benzophenone-based, benzotriazole-based, cyanoacrylate-based, nickel chelate-based, hindered amine-based compounds and the like in addition to the compounds described in JP-A-5-72724.
Specifically, phenyl salicylate, 4-t-butylphenyl salicylate, 2,4-di-t-butylphenyl-3 ′, 5′-di-t-4′-hydroxybenzoate, 4-t-butylphenyl salicylate 2,4-dihydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, 2-hydroxy-4-n-octoxybenzophenone, 2- (2′-hydroxy-5′-methylphenyl) benzotriazole, 2- (2 '-Hydroxy-3'-t-butyl-5'-methylphenyl) -5-chlorobenzotriazole, ethyl-2-cyano-3,3-diphenyl acrylate, 2,2'-hydroxy-4-methoxybenzophenone, nickel Dibutyldithiocarbamate, bis (2,2,6,6-tetramethyl-4-pyridine) -Sebakei 4-t-butylphenyl salicylate, phenyl salicylate, 4-hydroxy-2,2,6,6-tetramethylpiperidine condensate, succinic acid-bis (2,2,6,6-tetramethyl-4-piperidenyl ) -Ester, 2- [2-hydroxy-3,5-bis (α, α-dimethylbenzyl) phenyl] -2H-benzotriazole, 7-{[4-chloro-6- (diethylamino) -5-triazine- 2-yl] amino} -3-phenylcoumarin and the like.

  In addition, the photosensitive resin layer coating solution used in the present invention contains “adhesion aid” described in JP-A No. 11-133600, other additives and the like in addition to the above-mentioned additives. Can do.

The said photosensitive resin layer can be formed by apply | coating the above-mentioned photosensitive resin layer coating liquid on a support body by a well-known coating method, and drying. In the present invention, the photosensitive resin layer coating liquid is preferably applied by a slit-like nozzle having a slit-like hole at a portion where the liquid is discharged. Specifically, JP-A-2004-89851, JP-A-2004-17043, JP-A-2003-170098, JP-A-2003-164787, JP-A-2003-10767, JP-A-2002-79163. Slit nozzles and slit coaters described in Japanese Laid-Open Patent Publication No. 2001-310147 and the like are preferably used.
The thickness of the photosensitive resin layer is preferably 0.3 to 3.0 μm, more preferably 0.3 to 2.5 μm, and particularly preferably 0.3 to 1.5 μm. . In the photosensitive resin layer transfer material of the present invention, by providing an intermediate layer between the photosensitive resin layer and the cover film as described above, the layer is thinned, the concentration of the colorant is high, and the content of the binder component is high. The reduced photosensitive resin layer and the cover film can be favorably bonded.

Support The support in the photosensitive resin transfer material of the present invention is preferably flexible and does not cause significant deformation, shrinkage or elongation even under pressure or under pressure and heat. Examples of such a support include a polyester film such as a polyethylene terephthalate film, a cellulose triacetate film, a polystyrene film, a polycarbonate film, etc. Among them, the polyester film is excellent in thermal stability and mechanical properties. It is optimal as a coating support for photosensitive resin transfer materials. Moreover, the polyester film is preferable because it is stable in chemical characteristics, has excellent flatness in surface shape, and is excellent in the coated surface of the photosensitive resin layer.

  As will be described later, the photosensitive resin transfer material of the present invention can be used for forming a photosensitive resin layer on a substrate for producing a color filter. In this case, the formation of the photosensitive resin layer is performed by peeling the cover film from the photosensitive resin transfer material of the present invention, removing the support after bringing the surface exposed by the peeling into contact with the substrate. . Here, if the adhesive strength between the photosensitive resin layer and the cover film is greater than the adhesive strength between the photosensitive resin layer and the support, the cover film is peeled between the photosensitive resin layer and the support. May cause separation. Therefore, in the photosensitive resin transfer material of the present invention, the adhesive strength between the support and the photosensitive resin layer is preferably larger than the adhesive strength between the photosensitive resin layer and the cover film. However, if the adhesive strength between the support and the photosensitive resin layer is excessively large, it is difficult to peel and remove the support after laminating the photosensitive resin transfer material after peeling the cover film with the support. From the above points, the adhesive strength between the support and the photosensitive resin layer is preferably 10 to 30 g / 10 cm. More preferably, it is the range of 10-20 g / 10cm. The adhesive strength between the support and the photosensitive resin layer in the present invention is measured by performing the above-described peel strength test on the photosensitive resin transfer material after removing the cover film from the photosensitive resin layer side. Value. The adhesive strength between the support and the photosensitive resin layer can be controlled by the addition amount of the alkali-soluble binder in the photosensitive resin layer. It can also be adjusted by the pigment / alkali-soluble binder ratio, the amount and type of monomer or oligomer, the coating amount of the photosensitive resin layer, and the like.

Thermoplastic Resin Layer The photosensitive resin transfer material of the present invention can also have a thermoplastic resin layer between the support and the photosensitive resin layer. As the component used for the thermoplastic resin layer, organic polymer substances described in JP-A-5-72724 are preferable, and the polymer softening point according to the Viker Vicat method (specifically, the American Material Testing Method ASTM D1 ASTM D1235). It is particularly preferable that the softening point by the measurement method is selected from organic polymer substances having a temperature of about 80 ° C. or less. Specifically, polyolefins such as polyethylene and polypropylene, ethylene copolymers such as ethylene and vinyl acetate or saponified products thereof, ethylene and acrylic acid esters or saponified products thereof, polyvinyl chloride, vinyl chloride and vinyl acetate and saponified products thereof. Vinyl chloride copolymer such as fluoride, polyvinylidene chloride, vinylidene chloride copolymer, polystyrene, styrene copolymer such as styrene and (meth) acrylic acid ester or saponified product thereof, polyvinyl toluene, vinyl toluene and (meta ) Vinyl toluene copolymer such as acrylic ester or saponified product thereof, poly (meth) acrylic ester, (meth) acrylic ester copolymer such as butyl (meth) acrylate and vinyl acetate, vinyl acetate copolymer Combined nylon, copolymer nylon, N-alkoxy Chill nylon, and organic polymeric polyamide resins such as N- dimethylamino nylon.

Oxygen Barrier Layer In the photosensitive resin transfer material of the present invention, it is preferable to provide an oxygen barrier layer for the purpose of preventing mixing of components at the time of coating a plurality of coating layers and at the time of storage after coating. As the separation layer, it is preferable to use an oxygen-blocking membrane having an oxygen-blocking function described as “separation layer” in JP-A-5-72724. By providing such an oxygen barrier film, it is possible to improve the sensitivity at the time of exposure, reduce the time load of the exposure machine, and improve the productivity.
The oxygen barrier layer preferably exhibits low oxygen permeability and is dispersed or dissolved in water or an aqueous alkali solution, and can be appropriately selected from known ones. Among these, a combination of polyvinyl alcohol and polyvinyl pyrrolidone is particularly preferable.

Cover Film In the photosensitive resin transfer material of the present invention, a cover film is provided on the photosensitive resin layer via the intermediate layer in order to protect it from contamination and damage during storage. The cover film may be made of the same or similar material as the support described above. The cover film is preferably easily separated from the photosensitive resin layer by peeling when the photosensitive resin layer is transferred onto the substrate for producing a color filter. Moreover, in order not to leave a part of the intermediate layer on the photosensitive resin layer at the time of peeling, it is preferable that the adhesiveness with the intermediate layer is high. As a preferable material from the above points, specifically, silicone paper, polyolefin film, polytetrafluoroethylene film and the like are preferable, polyethylene film and polypropylene film are more preferable, polypropylene film, specifically biaxially stretched polypropylene film. Is particularly preferred. Furthermore, in order to improve adhesion, the surface in contact with the intermediate layer is preferably subjected to corona treatment. Corona treatment amount is preferably in the range of 0.5~4kw / m ^2, and still more preferably in the range of 0.7~3.0kw / m ^2. The corona treatment can be performed using a known apparatus.

Method for Producing Photosensitive Resin Transfer Material The photosensitive resin transfer material of the present invention comprises a support having the photosensitive resin layer formed thereon and a cover film having the intermediate layer in contact with the photosensitive resin layer and the intermediate layer. It can manufacture by sticking together. Moreover, it can also manufacture by forming the photosensitive resin layer and the intermediate | middle layer in order on a support body, and bonding this intermediate | middle layer and a cover film together. However, the former method is preferably used in order to improve the adhesion between the cover film and the intermediate layer. In addition, the said bonding can be performed using a well-known laminator. Although not particularly limited, the preferred thickness of each layer is as follows: the support is 15 to 100 μm, the thermoplastic resin layer is 2 to 30 μm, the oxygen barrier layer is 0.5 to 3.0 μm, and the cover film is 4-40 μm is generally preferred. The thicknesses of the intermediate layer and the photosensitive resin layer are as described above.

  The coating for forming each layer can be performed by a known coating apparatus or the like, but is preferably performed by a coating apparatus (slit coater) using the slit-shaped nozzle described above. Preferred specific examples of the slit coater are the same as described above. In addition, when forming several layers sequentially, it is preferable to use the solvent which does not melt | dissolve a lower layer as a solvent used for the coating liquid for upper layer formation.

[Production method of color filter]
The method for producing a color filter of the present invention is a method for producing a color filter having a pixel pattern and / or a black matrix on a substrate, and the pixel pattern and / or the black matrix has a photosensitive resin layer on the substrate. The photosensitive resin layer is formed by exposing and developing the photosensitive resin layer. The formation of the photosensitive resin layer is performed by peeling the cover film from the photosensitive resin transfer material of the present invention, This is done by removing the support after bringing the substrate into close contact.
Furthermore, this invention relates to the color filter manufactured by the said method.

Substrate As the substrate, for example, a transparent substrate is used. Examples of the transparent substrate include a soda glass plate having a silicon oxide film on the surface, a known glass plate such as a low expansion glass, a non-alkali glass, and a quartz glass plate, or a plastic film. Moreover, the said board | substrate can make close_contact | adherence with the photosensitive resin layer favorable by performing a coupling process previously. As the coupling treatment, a method described in JP 2000-39033 A is preferably used.

Formation of photosensitive resin layer In forming the photosensitive resin layer in the method for producing a color filter of the present invention, first, the cover film is peeled from the photosensitive resin transfer material of the present invention. Here, as described above, it is preferable to peel the intermediate layer together with the cover film by this peeling.

  Next, the surface exposed by the peeling, that is, the photosensitive resin layer surface, and the substrate are brought into close contact with each other. For example, the surface of the photosensitive resin layer and the substrate are adhered and bonded together under pressure or under pressure and heat. A known laminator, a vacuum laminator, or the like can be used for the bonding. An auto-cut laminator can also be used to increase productivity.

  After the bonding, the support is removed by peeling or the like. When providing the above-mentioned thermoplastic resin layer, it is preferable that the said support body peels in an interface with a thermoplastic resin layer.

Formation of Pixel Pattern and / or Black Matrix Next, a predetermined mask is disposed above the photosensitive resin layer transferred and formed on the substrate, and then exposed from above the mask through the mask, and then with a developer. Develop. A color filter can be obtained by repeating this process for the number of colors. Moreover, the color filter which has a black matrix (light-shielding film) can be obtained by using a black colorant as a colorant.

The light source for the exposure can be appropriately selected from those capable of irradiating light in a wavelength region that can cure the photosensitive resin layer (eg, 365 nm, 405 nm, etc.). Specifically, an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a metal halide lamp, etc. are mentioned. As an exposure amount, it is about 5-200 mJ / cm < ² > normally, Preferably it is about 10-100 mJ / cm < ² >.

The developer is not particularly limited, and a known developer such as that described in JP-A-5-72724 can be used. The developer preferably has a development type developing behavior of the photosensitive resin layer. For example, a developer containing a compound having a pKa of 7 to 13 at a concentration of 0.05 to 5 mol / L is preferable. A small amount of a miscible organic solvent may be added.
Examples of organic solvents miscible with water include methanol, ethanol, 2-propanol, 1-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-butyl ether, and benzyl alcohol. , Acetone, methyl ethyl ketone, cyclohexanone, ε-caprolactone, γ-butyrolactone, dimethylformamide, dimethylacetamide, hexamethylphosphoramide, ethyl lactate, methyl lactate, ε-caprolactam, N-methylpyrrolidone and the like. The concentration of the organic solvent is preferably 0.1 to 30% by mass.
Further, a known surfactant can be further added to the developer. The concentration of the surfactant is preferably 0.01 to 10% by mass.

As a development method, any of paddle development, shower development, shower & spin development, dip development and the like may be used.
Here, the shower development will be described. The uncured portion can be removed by spraying a developer onto the exposed photosensitive resin layer by shower. In addition, it is preferable to spray an alkaline liquid with low solubility of the photosensitive resin layer by a shower or the like before development to remove the thermoplastic resin layer, the intermediate layer, and the like. Further, after the development, it is preferable to remove the development residue while spraying a cleaning agent or the like with a shower and rubbing with a brush or the like.
The liquid temperature of the developer is preferably 20 ° C. to 40 ° C., and the pH of the developer is preferably 8 to 13.

Below, an example of the manufacturing method of a color filter is shown below. However, this invention is not limited to the aspect shown below.
(i) Substrate cleaning An alkali-free glass substrate is used, but cleaning is performed to remove surface contamination. For example, glass detergent solution (trade names: T-SD1, T-SD2, Fuji Photo Film Co., Ltd.) adjusted to 25 ° C. is washed with a rotating brush with nylon hair while spraying for 20 seconds in a shower, and then pure water Perform shower cleaning.

(Ii) Silane coupling treatment In order to increase the adhesion of the photosensitive resin layer by lamination, it is preferable to carry out a silane coupling treatment. As the silane coupling agent, those having a functional group that interacts with the photosensitive resin are preferable. For example, a silane coupling liquid (N-β (aminoethyl) γ-aminopropyltrimethoxysilane 0.3% by mass aqueous solution, trade name: KBM603, Shin-Etsu Chemical) is sprayed for 20 seconds by a shower, and pure water shower washing is performed. Thereafter, the reaction is carried out by heating.
Although a heating tank may be used, the reaction can be advanced by preheating the substrate in a laminator.
Usually, only the color to be laminated first is carried out, but if the adhesion after lamination is weak, it may be carried out with other colors as necessary.

(Iii) Laminate This substrate is heated with a substrate preheating device at 100 ° C. for 2 minutes and sent to the next laminator. Thereby, lamination can be performed uniformly.
After the cover film of the photosensitive resin transfer material is peeled off, the laminate is laminated on the substrate heated to 100 ° C. using a laminator at a rubber roller temperature of 130 ° C., a linear pressure of 100 N / cm, and a conveyance speed of 2.2 m / min. The temperature of the rubber roller is preferably 150 ° C. or lower in order to prevent wrinkles from entering the photosensitive resin transfer material, and is 100 ° C. or higher in order to improve the adhesion of the photosensitive resin layer. preferable.

(Iv) Exposure process After peeling a support body, it exposes with the proximity type exposure machine which has an ultrahigh pressure mercury lamp. When the substrate size is 50 centimeters or more, it is preferable to expose the substrate and the mask (quartz exposure mask having an image pattern) in a vertical state from the viewpoint of preventing the deflection of the mask. The shorter the distance between the exposure mask surface and the photosensitive resin layer is, the better the resolution is. The exposure amount is 10 to 80 mJ / cm ² . As a result, the pattern is exposed.

(V) Removal of thermoplastic resin layer and oxygen barrier layer Triethanolamine developer (containing 2.5% triethanolamine, nonionic surfactant, polypropylene antifoam, trade name: T-PD1, Remove the thermoplastic resin layer and oxygen barrier layer using Fuji Photo Film Co., Ltd. At this time, ideally, other conditions are set so that the photosensitive resin layer is not developed at all. For example, it is supplied in a shower at 30 ° C. for 50 seconds and a flat nozzle pressure of 0.04 MPa.

(Vi) Development of photosensitive resin layer Subsequently, the photosensitive resin layer is developed with an alkali to form an image. For example, Na carbonate developer (0.06 mol / liter sodium bicarbonate, sodium carbonate of the same concentration, 1% by weight of sodium dibutylnaphthalenesulfonate, anionic surfactant, antifoaming agent, stabilizer contained, trade name: T-CD1, Fuji Photo Film Co., Ltd.) is used.
As conditions, for example, shower development is performed at 35 ° C. for 35 seconds and a cone type nozzle pressure of 0.15 MPa. As a developing solution, KOH type or TMA type may be used.

(Vii) Residue removal Subsequently, detergent (phosphate, silicate, nonionic surfactant, antifoaming agent, stabilizer included, trade name: T-SD1, Fuji Photo Film Co., Ltd., or sodium carbonate, phenoxypolyoxyethylene System surfactant containing, trade name: T-SD2, Fuji Photo Film Co., Ltd.) and the like are used. The conditions are 33 ° C. for 20 seconds, cone-type nozzle pressure of 0.02 MPa, and the residue is removed by a rotating brush having a shower and nylon hair. Thereby, the remaining components of the photosensitive resin layer in the unexposed area are removed.

(Viii) Post exposure Subsequently, post exposure is performed on the substrate from the side of the photosensitive resin layer with an ultrahigh pressure mercury lamp at about 500 mJ / cm ² . You may implement from both surfaces, and you may select in the range of 100-800 mJ / cm < ² >. By performing post-exposure, the polymerization effect in subsequent baking is enhanced, and the cross-sectional shape of the pixel after baking can be adjusted by the amount of post-exposure.

(Ix) Bake Bake is performed to react the monomer or oligomer contained in the photosensitive resin layer into a hard film (baking step). Baking between colors can be performed at 200 to 240 ° C. for about 10 to 20 minutes. After forming all colors, it is preferable to further heat-treat at 200 to 240 ° C. for 30 to 180 minutes. These temperatures and times are preferably set at higher temperatures and shorter times so that yellowing does not occur due to baking and production tact is not lost.
A color filter can be manufactured by the above process.

[Image display device]
The present invention further relates to an image display apparatus having a color filter manufactured by the above method.
The image display device of the present invention refers to a display device such as a liquid crystal display device, a plasma display display device, an EL display device, or a CRT display device. The definition of the image display device and the explanation of each display device are, for example, “Electronic display device (Akio Sasaki, published by Industrial Research Institute 1990)”, “Display device (written by Junaki Ibuki, Industrial Books Co., Ltd.) Issue year)).

  The image display device of the present invention is particularly preferably a liquid crystal display device. The liquid crystal display device is described in, for example, “Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, published by Kogyo Kenkyukai 1994)”. The liquid crystal display device to which the present invention can be applied is not particularly limited, and can be applied to various types of liquid crystal display devices described in, for example, the “next generation liquid crystal display technology”. Among these, the present invention is particularly effective for a color TFT type liquid crystal display device. The color TFT liquid crystal display device is described in, for example, “Color TFT liquid crystal display (issued in 1996 by Kyoritsu Publishing Co., Ltd.)”. Furthermore, the present invention can be applied to a liquid crystal display device with a wide viewing angle such as a lateral electric field driving method such as IPS and a pixel division method such as MVA. These methods are described, for example, on page 43 of "EL, PDP, LCD display-latest technology and market trends-(issued in 2001 by Toray Research Center Research Division)".

  In addition to the color filter, the liquid crystal display device includes various members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle compensation film. The color filter of the present invention can be applied to a liquid crystal display device composed of these known members. For example, “'94 Liquid Crystal Display Peripheral Materials and Chemicals Market (Kentaro Shima, Ltd., CMC Co., Ltd., 1994)”, “2003 Current Status and Future Prospects of Liquid Crystal Related Markets (Volume 2)” (Table Yoshiyoshi) Fuji Chimera Research Institute published in 2003) ”.

  Hereinafter, the present invention will be described in more detail with reference to examples. However, the present invention is not limited to the embodiment shown in the examples. In the following, “%” and “part” represent “% by mass” and “part by mass”, respectively. The modification rate of the modified polyolefin shown below refers to the ratio of monomers (ethyl acrylate and maleic anhydride) other than olefins replaced by olefins (ethylene).

[Example 1]
(Intermediate layer coating solution 1)
Ion-exchanged water 4.64 parts Modified polyolefin emulsion 0.32 parts Ethylene-ethyl acrylate-maleic anhydride terpolymer (1) 25.2%
Isopropanol 20.0%
Polyvinyl alcohol 10% aqueous solution 0.20 part PVA205: manufactured by Kuraray Co., Ltd., partially saponified polyvinyl alcohol (saponification degree: about 88%), melting point: about 150 ° C.
Methanol 94.84 parts Antistatic agent (Semiyo Chemical Industries, Ltd. Chemistat 2500) 0.004 parts

  About the said intermediate | middle layer coating liquid, after fully mixing and stirring each component, the intermediate | middle layer coating liquid with a density | concentration of 0.1% was obtained by filtering with a 200 mesh filter. The aqueous polyvinyl alcohol solution was prepared by mixing PVA205 (manufactured by Kuraray Co., Ltd.) with water and dissolving with heating.

As the cover film, a film obtained by performing corona treatment (2.8 kw / m ² ) on one side of E-200 (biaxially stretched polypropylene, thickness 20 μm) manufactured by Oji Specialty Paper Co., Ltd. was used. A dry coating amount (solid content) is 0.15 g / m ^{2 on} the surface of the film that has been subjected to corona treatment using the slit-shaped nozzle with the above-described intermediate layer coating solution having a solid content concentration of 0.1%. An intermediate layer was formed by coating and drying.

  The following thermoplastic resin layer coating solution is applied onto a PET support using a slit nozzle, dried to form a 3.0 μm thick thermoplastic resin layer, and then the following oxygen barrier layer coating. The solution is applied and dried to form a 1.6 μm thick oxygen barrier layer, and then the following photosensitive resin layer coating solution is applied and dried to form a 1.2 μm thick photosensitive resin layer. Formed.

(Thermoplastic resin coating solution)
Methanol 11.1 parts Propylene glycol monomethyl ether 6.36 parts Methyl ethyl ketone 52.4 parts Methyl methacrylate / 2-ethylhexyl acrylate / benzyl methacrylate / methacrylic acid copolymer (copolymerization composition ratio (molar ratio) = 55 / 30/10/5, mass average molecular weight = 100,000, Tg≈70 ° C.) 5.83 parts styrene / acrylic acid copolymer (copolymerization composition ratio (molar ratio) = 65/35, mass average molecular weight = 10,000 , Tg≈100 ° C.) 13.6 parts. Compound obtained by dehydration condensation of 2 equivalents of bisphenol A and pentaethylene glycol monomethacrylate (BPE-500, Shin-Nakamura Chemical Co., Ltd.) 9.1 parts. Fluoropolymer (C _{6 F 13 CH 2 CH 2 OCOCH} = CH 2 40 parts of _{H (O (CH 3) CHCH} 2) 7 OCOCH = CH 2 5 Parts and _{H (OCHCH 2) 7 OCOCH =} CH 2 copolymer with 5 parts of weight average molecular weight 30,000, methyl isobutyl ketone 30% solution, manufactured by Dainippon Ink and Chemicals, Megafac F780F) 0.54 parts

(Oxygen barrier coating solution)
-PVA205 (polyvinyl alcohol, manufactured by Kuraray Co., Ltd., degree of saponification = 88%, degree of polymerization 550) 32.2 parts-polyvinylpyrrolidone (BASF K-30) 14.9 parts-distilled water 524 parts-methanol 429 Part

(Preparation of photosensitive resin layer coating solution)
First, K pigment dispersion 1 and propylene glycol monomethyl ether acetate in the amounts shown in Table 1 were weighed in this order, mixed at a temperature of 24 ° C. (± 2 ° C.), stirred at 150 RPM for 10 minutes, and then listed in Table 1. Methyl ethyl ketone, DPHA solution, 2.2-bis [4- (methacryloxy-pentaethoxy) phenyl] propane (trade name BPE-500 (manufactured by Shin-Nakamura Chemical Co., Ltd.)), Adeka PEG600 (Asahi Denka Kogyo Co., Ltd.) 2,4-bis (trichloromethyl) -6- [4- (N, N-diethoxycarbonylmethyl) -3-bromophenyl] -s-triazine, 7- [L-4-chloro-6- (Diethylamino) -s-triazinyl (2), 1-amino] -3-phenylcoumarin, TAZ-204 (2- (4′-methyl-4-biphenyl) ) -4,6-bis (trichloromethyl) -s-triazine (manufactured by Midori Chemical Co., Ltd.), phenothiazine and surfactant 1 were weighed out and added in this order at a temperature of 25 ° C. (± 2 ° C.), and a temperature of 40 ° C. The mixture was stirred at 150 RPM at (± 2 ° C.) for 30 minutes to obtain a photosensitive resin layer coating solution. Table 1 shows the carbon black concentration and the concentration of BPE500.

In Table 1, the composition of K pigment dispersion 1 is as follows.
・ Carbon black 13.1%
・ Dispersant 0.65%
-Polymer (Random copolymer of benzyl methacrylate / methacrylic acid = 72/28 molar ratio, weight average molecular weight 37,000) 6.72%
・ Propylene glycol monomethyl ether acetate balance

In Table 1, the composition of the DPHA solution is as follows.
・ Dipentaerythritol hexaacrylate (containing 500 ppm of polymerization inhibitor MEHQ, KAYARAD DPHA manufactured by Nippon Kayaku Co., Ltd.) 76%
・ Propylene glycol monomethyl ether 24%

In Table 1, the composition of the surfactant 1 is as follows.
・ The following structure 1 30%
・ Methyl isobutyl ketone 70%

  The cover film on which the intermediate layer was formed as described above and the support on which the photosensitive resin layer was formed were laminated so that the intermediate layer and the photosensitive resin layer faced to obtain a photosensitive resin transfer material.

[Example 2]
Using the following intermediate layer coating solution (concentration 1%), apply an intermediate layer coating solution having a solid content concentration of 2% on the cover film so that the dry coating amount (solid content) is 0.3 g / m ^2. A photosensitive resin transfer material was obtained in the same manner as in Example 1 except that the layer was formed.

(Intermediate layer coating solution 2)
Deionized water 1.41 parts Methanol 93.42 parts Modified polyolefin emulsion 3.17 parts Ethylene-ethyl acrylate-maleic anhydride terpolymer (1) 25.2%
Isopropanol 20.0%
Polyvinyl alcohol 10% aqueous solution 2.00 parts PVA205: Kuraray Co., Ltd., partially saponified polyvinyl alcohol (saponification degree: about 88%)
Antistatic agent (Sanyo Chemical Industries, Ltd. Chemistat 2500) 0.04 parts

[Example 3]
Using the following intermediate layer coating solution (concentration 2%), apply an intermediate layer coating solution having a solid content concentration of 2% on the cover film so that the dry coating amount (solid content) is 0.4 g / m ^2. A photosensitive resin transfer material was obtained in the same manner as in Example 1 except that a layer was formed and the carbon black concentration in the photosensitive resin layer was changed from 52 mass% to 50 mass%.

(Intermediate layer coating solution 3)
Deionized water 4.89 parts Methanol 82.35 parts Modified polyolefin emulsion 4.76 parts Ethylene-ethyl acrylate-maleic anhydride terpolymer (1) 25.2%
Isopropanol 20.0%
Polyvinyl alcohol 10% aqueous solution 8.00 parts PVA205: Kuraray Co., Ltd., partially saponified polyvinyl alcohol (saponification degree: about 88%)
Antistatic agent (Semiyo Kasei Kogyo Chemist 2500) 0.07 parts

[Example 4]
Use the following intermediate layer coating solution (concentration 0.5%), and cover the cover layer so that the dry coating amount (solid content) is 0.10 g / m ^2. Except that the thickness of the photosensitive resin layer was changed from 1.2 μm to 1.5 μm and the carbon black concentration in the photosensitive resin layer was changed from 52 mass% to 50 mass%. In the same manner as in Example 1, a photosensitive resin transfer material was obtained.

(Intermediate layer coating solution 4)
Ion-exchange water 4.98 parts Methanol 93.83 parts Modified polyolefin emulsion 2.50 parts Ethylene-ethyl acrylate-maleic anhydride terpolymer (3) 20.0%
Isopropanol 28.0%
Antistatic agent (Semiyo Chemical Industries, Ltd. Chemistat 2500) 0.02 part

[Example 5]
Use the following intermediate layer coating solution (concentration 0.05%) and cover the cover film so that the dry coating amount (solid content) is 0.05 g / m ^2. Except that the thickness of the photosensitive resin layer was changed from 1.2 μm to 1.5 μm and the carbon black concentration in the photosensitive resin layer was changed from 52 mass% to 50 mass%. In the same manner as in Example 1, a photosensitive resin transfer material was obtained.

(Intermediate layer coating solution 5)
Ion-exchanged water 4.91 parts Methanol 94.59 parts Modified polyolefin emulsion 0.50 parts Ethylene-ethyl acrylate-maleic anhydride terpolymer (2) 10.0%
Normal propanol 70.0%
Toluene 2.0%
Antistatic agent (Semiyo Chemical Industries, Ltd. Chemistat 2500) 0.02 parts

[Comparative Example 1]
Example except that Alfan E-501 (12 μm) manufactured by Oji Specialty Paper Co., Ltd. was used as the cover film, the intermediate layer was not provided, and the thickness of the photosensitive resin layer was changed from 1.2 μm to 1.0 μm. In the same manner as in Example 1, a photosensitive resin transfer material was obtained.

[Comparative Example 2]
Using the following intermediate layer coating solution (concentration 1%), apply an intermediate layer coating solution having a solid content concentration of 5% on the cover film so that the dry coating amount (solid content) is 0.82 g / m ^2. Example 1 except that a layer was formed, the thickness of the photosensitive resin layer was changed from 1.2 μm to 1.7 μm, and the carbon black concentration in the photosensitive resin layer was changed from 52 mass% to 45 mass%. In the same manner as above, a photosensitive resin transfer material was obtained.

(Intermediate layer coating solution 6)
Ion-exchanged water 40.00 parts Surfactant (Megafac F444, manufactured by Dainippon Ink & Chemicals, Inc.) Solid content concentration 1% 10.00 parts Polyvinyl alcohol 10% aqueous solution 50.00 parts PVA205: manufactured by Kuraray Co., Ltd. Partially saponified polyvinyl alcohol (saponification degree: about 88%)
0.175 part of antistatic agent (Semiyo Chemical Industries, Ltd. Chemistat 2500)

[Comparative Example 3]
Using the following intermediate layer coating solution (concentration 10%), apply an intermediate layer coating solution having a solid content concentration of 10% on the cover film so that the dry coating amount (solid content) is 2.2 g / m ^2. A photosensitive resin transfer material was obtained in the same manner as in Example 1 except that the layer was formed.

(Intermediate layer coating solution 7)
Deionized water 4.50 parts Methanol 13.5 parts Modified polyolefin emulsion 100 parts Ethylene-ethyl acrylate-maleic anhydride terpolymer (2) 10.0%
Normal propanol 70.0%
Toluene 2.0%
Antistatic agent (Semiyo Chemical Industries, Ltd. Chemist 2500) 4.50 parts

  The details of the ethylene-ethyl acrylate-maleic anhydride terpolymer used in Examples and Comparative Examples are shown in Table 2 below.

Fabrication of color filter A non-alkali glass substrate was washed with a rotating brush having nylon hair while spraying a glass detergent solution adjusted to 25 ° C. for 20 seconds with a shower. After washing with pure water, a silane coupling solution (N- β (aminoethyl) γ-aminopropyltrimethoxysilane 0.3% aqueous solution, trade name: KBM603 Shin-Etsu Chemical Co., Ltd.) was sprayed 20 with a shower and washed with pure water. This substrate was heated at 100 ° C. for 2 minutes with a substrate preheating device and sent to the next laminator.

For each of the photosensitive resin transfer materials of Examples and Comparative Examples, the cover film was peeled off, and a laminator was used to heat the substrate heated to 100 ° C. The rubber roller temperature was 130 ° C., the linear pressure was 100 N / cm, and the conveyance speed was 2. Laminated at 2 m / min. After peeling off the support on the photosensitive resin layer, the exposure mask surface with the substrate and mask (quartz exposure mask having a 16 μm mask pattern) standing upright with a proximity type exposure machine having an ultra-high pressure mercury lamp The distance between the photosensitive resin layer and the photosensitive resin layer was set to 200 μm, and pattern exposure was performed with an exposure amount of 50 mJ / cm ² .

  After spraying pure water with a shower nozzle to uniformly moisten the surface of the photosensitive resin layer, KOH developer (KOH, containing nonionic surfactant, trade name: CDK-1, Fuji Film Electronics Material) The product was shower-developed at 25 ° C. and a flat nozzle pressure of 0.04 MPa for 30 seconds. The resulting black image was subsequently heat treated at 220 ° C. for 30 minutes to obtain a color filter.

Evaluation method (1) Evaluation of developability (observation of surface shape)
As described above, the roughness of the surface of the fine line obtained using the 16 μm mask pattern was observed using an optical microscope and evaluated according to the following evaluation criteria. The results are shown in Table 3.
(Evaluation criteria)
○: Surface roughness is not observed ×: Surface roughness is clearly observed

(2) Reticulation About the photosensitive resin transfer material obtained in the examples and comparative examples, the whole was covered with light-shielding polyethylene in a roll form, and stored for 30 days in a safe light environment at a temperature and humidity of 23 ° C. and 50%. . Thereafter, the photosensitive resin transfer material was taken out from the storage environment, the cover film was removed, and the surface state of the surface of the photosensitive resin layer was visually confirmed. The results are shown in Table 3.

(3) Peelability of support after cover film and substrate lamination Table 3 shows the evaluation results of the peelability between the cover film and the photosensitive resin layer and the peelability of the support after laminating the substrate. In Table 3, “◯” indicates that separation was possible without any problem.
(4) Lifting and peeling of cover film Regarding the photosensitive resin transfer materials of Examples and Comparative Examples, it was visually observed whether the cover film was lifted or peeled off.

Evaluation result As shown in Table 3, the photosensitive resin of Examples 1-5 which provided the intermediate | middle layer and made the adhesive strength between a cover film and the photosensitive resin layer the range of 1.5-8.0g / 10cm. The transfer material did not float or peel off the cover film, and no reticulation was observed. Moreover, both the peelability of the cover film and the support were good. Furthermore, the developability of the color filter obtained using the photosensitive resin transfer material of these examples was good.
On the other hand, in the photosensitive resin transfer materials of Comparative Examples 1 and 2, since the adhesive force between the photosensitive resin layer and the cover film was insufficient, the cover film was lifted or peeled off, and reticulation was observed. . Further, in the photosensitive resin transfer material of Comparative Example 2, since the adhesion between the support and the photosensitive resin layer was strong, a part of the photosensitive resin layer was also peeled off when the support was peeled off. Therefore, the color filter obtained using the photosensitive resin transfer material of Comparative Example 2 was inferior in developability.
Further, in the photosensitive resin transfer material of Comparative Example 3, since the adhesion between the photosensitive resin layer and the cover film was strong, a part of the photosensitive resin layer was peeled off when the cover film was peeled off. Therefore, the color filter obtained using this photosensitive resin transfer material has poor developability.

  According to the present invention, it is possible to provide a high-quality color filter in which image loss is prevented.

It is explanatory drawing of the measuring method of adhesive strength. It is explanatory drawing of the measuring method of adhesive strength.

Claims (14)

A photosensitive resin transfer material having a photosensitive resin layer containing a colorant and a photosensitive resin and a cover film in this order on a support,
The photosensitive resin transfer which has an intermediate | middle layer between the said photosensitive resin layer and a cover film, and the adhesive strength of the said photosensitive resin layer and a cover film is the range of 1.5-8.0g / 10cm. material. The photosensitive resin transfer material according to claim 1, wherein the intermediate layer contains a modified polyolefin resin. The photosensitive resin transfer material according to claim 2, wherein the modified polyolefin resin contains an ethylene-acrylic acid ester-maleic anhydride terpolymer. The photosensitive resin transfer material according to claim 1, wherein the intermediate layer has a thickness in a range of 0.05 to 1.5 μm. The intermediate layer is a layer formed by applying an intermediate layer coating solution on the photosensitive resin layer and / or the cover film,
The photosensitive resin transfer material according to claim 1, wherein the coating is performed so that a dry coating amount is in a range of 0.05 to 0.50 g / m ² . The photosensitive resin transfer material according to claim 1, wherein the photosensitive resin layer contains a colorant in the range of 30 to 70% by mass. The photosensitive resin transfer material according to claim 1, wherein a thickness of the photosensitive resin layer is in a range of 0.3 to 3.0 μm. The photosensitive resin transfer material according to claim 1, wherein the cover film is a biaxially stretched polypropylene film. The photosensitive resin transfer material according to claim 1, wherein the support is a polyester film. The photosensitive resin transfer material according to any one of claims 1 to 9, wherein an adhesive strength between the support and the photosensitive resin layer is in a range of 10 to 30 g / 10 cm. The photosensitive resin transfer material according to claim 1, further comprising a thermoplastic resin layer and / or an oxygen blocking layer between the support and the photosensitive resin layer. A method for producing a color filter having a pixel pattern and / or a black matrix on a substrate,
The pixel pattern and / or the black matrix is formed by forming a photosensitive resin layer on the substrate, exposing and developing the photosensitive resin layer,
The formation of the photosensitive resin layer is supported after the cover film is peeled from the photosensitive resin transfer material according to any one of claims 1 to 11, and the surface exposed by the peeling is brought into close contact with the substrate. The said manufacturing method performed by removing a body. A color filter manufactured by the method according to claim 12. An image display device comprising the color filter according to claim 13.

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