JP2007270188A - Film forming equipment - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide film forming equipment which is used for the manufacturing of a magnetic disk, etc., wherein a manufacturing yield is improved by preventing a disk substrate as base material of film formation from falling or preventing a fixed position from being deviated while suppressing an increase in manufacturing cost of the equipment, and the magnetic disk having a satisfactory magnetic characteristic and electromagnetic conversion characteristic can be manufactured. <P>SOLUTION: In the film forming equipment, connection parts 2a, 2b, 2c between a plurality of film-forming chambers 1a, 1b, 1c and the plurality of film forming chambers 1a, 1b, 1c are worked and manufactured as one cell from one-body non-magnetic starting material (stainless (SUS) or aluminum (Al), etc.) in order to improve rigidity of the film forming equipment and prevent vibration of the film forming equipment. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a film forming apparatus used for manufacturing a magnetic disk mounted on, for example, a hard disk device.

  2. Description of the Related Art Conventionally, many home appliances are becoming so-called “digital home appliances”, and the demand for hard disk drives mounted as storage devices is increasing year by year. Therefore, it is required to stably supply a large amount of magnetic disks used for hard disk drives.

  A magnetic disk mounted on a hard disk drive is a magnetic recording medium in which a laminated film (multilayer film) including a magnetic thin film is formed on a nonmagnetic disk-shaped disk substrate. This laminated film is formed by sputtering, CVD, or the like after a disk substrate is placed in a film forming chamber of a film forming apparatus and evacuated.

  The supply amount of such a magnetic disk is generally determined by the operating rate and yield of the film forming apparatus. Therefore, in the film forming apparatus, as described in Patent Document 1, improvement of the surface treatment inside the film forming chamber, improvement of the support structure of the disk substrate, and the like are being studied.

JP 2006-9144 A

  By the way, in the film forming apparatus, in order to maintain a high degree of vacuum in the film forming chamber, the capacity of the exhaust pump for exhausting each film forming chamber and the adoption of a cryopump using the adiabatic compression method as the exhaust pump, In addition, it is essential to adopt a movable valve or the like for partitioning each film forming chamber. Since the cryopump has a larger vibration than the turbo molecular pump, there is a possibility that the entire film forming apparatus may be vibrated by increasing the capacity of the exhaust pump.

  Such vibration of the film forming apparatus is a factor that reduces the manufacturing yield of the magnetic disk. That is, in recent years, a high throughput and a high operating rate are required in the film forming apparatus, and the transfer speed of the disk substrate between the film forming chambers has been increased. For this reason, when the film forming apparatus vibrates, there is a possibility that the disk substrate being transported may drop or the position of the disk substrate fixed relative to the support mechanism may be displaced. When the disc substrate is displaced in the fixed position, the film thickness distribution of the laminated film to be formed varies, and the magnetic characteristics and electromagnetic conversion characteristics of the completed magnetic disk deteriorate, leading to a decrease in yield.

  It is conceivable to cope with such vibration of the film forming apparatus by improving the support structure of the disk substrate. However, in this case, the adjustment of the support structure is complicated, and the production yield of the magnetic disk may vary depending on the skill level of the adjustment operator.

  Therefore, it is necessary to make the entire film forming apparatus resistant to vibration. However, since the conventional film forming apparatus is configured by connecting a plurality of film forming chambers, each of which is individually manufactured, these components are formed. It has a structure in which vibration is likely to occur at the connecting portion between the membrane chambers. This is because the unit for connecting the film forming chambers has a small cross-sectional area and low rigidity with respect to the film forming chambers themselves. Further, since the unit of the connecting portion is fixed to the film forming chamber by screwing, the film forming chambers are connected only by the tightening torque of the fixing screw, and sufficient rigidity cannot be obtained. Vibration is not absorbed. Although it is conceivable to install a vibration absorbing member between the film forming chambers to absorb the vibration, it is difficult to optimize the selection of the material of the absorbing member, and it is difficult to obtain a sufficient effect.

  Further, in the conventional film forming apparatus, there is a possibility that a leak may occur at a connection portion between the film forming chambers. That is, various gas molecules (helium, oxygen, nitrogen, etc.) may be introduced into the film formation chamber, which may adversely affect the film quality of the stacked film to be formed. In particular, when oxygen is introduced, the magnetic properties of the magnetic thin film deteriorate.

  Furthermore, in the conventional film forming apparatus, the number of parts is large, the efficiency regarding maintenance and management is poor, and once the film forming chambers are connected to each other, it is difficult to take out only the connected portion and perform maintenance. It is.

  Therefore, the present invention has been proposed in view of the above-described circumstances, and its purpose is to form a film while suppressing an increase in the manufacturing cost of the apparatus in a film forming apparatus used for manufacturing a magnetic disk or the like. To prevent the fall of the disk substrate that is the base material of the base material and displacement of the fixed position, to improve the production yield, and to enable the production of a magnetic disk with good magnetic characteristics and electromagnetic conversion characteristics is there.

  In order to solve the above-described problems and achieve the above object, in the present invention, in order to improve the rigidity of the film forming apparatus and prevent the film forming apparatus from vibrating, an integral nonmagnetic base material (stainless steel (SUS) or A plurality of film formation chambers and a connection portion between the film formation chambers are processed as one cell from aluminum (Al) or the like.

  That is, the present invention has any one of the following configurations.

[Configuration 1]
The film forming apparatus according to the present invention includes a plurality of film forming chambers and a connecting portion that connects the film forming chambers, and each of the film forming chambers and the connecting portion is processed from an integral nonmagnetic base material. It is characterized by being manufactured.

[Configuration 2]
A film forming apparatus according to the present invention includes a plurality of film forming chambers, a connecting portion that connects the film forming chambers, and a transfer mechanism that transfers a film formation substrate between the plurality of film forming chambers, The transport mechanism has a guide rail that guides the transport of the deposition target substrate, and this guide rail is made of an integral member.

  In the film forming apparatus according to the present invention, by improving the rigidity of the film forming apparatus main body, it is possible to prevent the deposition target substrate from dropping and the fixed position from being displaced due to vibrations, and leakage at the connecting portion. Thus, it is possible to improve the manufacturing yield and manufacture a magnetic disk having good magnetic characteristics and electromagnetic conversion characteristics.

  Further, in this film forming apparatus, since the number of parts at the connecting portion between the film forming chambers is reduced, the efficiency of maintenance and management can be improved.

  In the film forming apparatus according to the present invention having the structure 1, the rigidity of the film forming apparatus main body is improved, the film formation substrate is prevented from dropping and the fixing position is not shifted due to vibration, and the leak is generated in the connecting portion. Therefore, it is possible to improve the manufacturing yield and manufacture a magnetic disk having good magnetic characteristics and electromagnetic conversion characteristics.

  Further, in this film forming apparatus, since the number of parts at the connecting portion between the film forming chambers is reduced, the efficiency of maintenance and management can be improved.

  In the film forming apparatus according to the present invention having the configuration 2, since the guide rail of the transfer mechanism for transferring the film formation substrate across a plurality of film formation chambers is seamless, the film formation substrate due to vibration during transfer Can be prevented from falling and the displacement of the fixed position can be prevented, so that the production yield can be improved and the magnetic disk having good magnetic characteristics and electromagnetic conversion characteristics can be manufactured.

  That is, the present invention provides a film forming apparatus used for manufacturing a magnetic disk and the like, while preventing an increase in the manufacturing cost of the apparatus and preventing a disk substrate serving as a film forming base material from dropping and a fixed position from being displaced. Thus, it is possible to improve the production yield and to manufacture a magnetic disk having good magnetic characteristics and electromagnetic conversion characteristics.

  The best mode for carrying out the present invention will be described below with reference to the drawings.

  FIG. 1 is a front view showing a configuration of a plurality of film forming chambers which are a main part of a film forming apparatus according to the present invention.

  As shown in FIG. 1, the film forming apparatus according to the present invention includes a plurality of film forming chambers 1a, 1b, 1c... And connecting portions 2a, 2b, 2c. It has. The film forming chambers 1a, 1b, 1c,... And the connecting portions 2a, 2b, 2c,... Are made of an integral nonmagnetic base material such as stainless steel (SUS) or aluminum (Al). The base material 101 is manufactured by cutting. That is, in this film forming apparatus, each film forming chamber is not individually unitized, but a plurality of film forming chambers and a connecting portion for connecting these film forming chambers are integrally configured. Realizes high rigidity.

  FIG. 2 is a front view showing the configuration of the film forming apparatus according to the present invention.

  As shown in FIG. 2, each of the plurality of film forming chambers 1a, 1b, 1c... And the connecting portions 2a, 2b, 2c. A port 4 for attaching a vacuum gauge and a process gas introduction port 5 are provided, and a port is provided so that an exhaust valve or a pump 6 can be attached. Further, a movable valve 7 is attached to the connecting portions 2a, 2b, 2c.

  As the surface treatment inside the film forming chambers 1a, 1b, 1c..., It is desirable to perform electrolytic polishing, chemical polishing, and nonmagnetic non-conductive film treatment. Also, in order to prevent machining errors and leaks, it is desirable to reduce the number of welds.

  As the leg portion 8 that supports the apparatus main body, it is desirable to employ a steel frame or gliting considering load resistance. In addition, in order to prevent the shear deformation, the leg portion 8 is preferably not a so-called harmonica type, but it is desirable to improve the rigidity of the apparatus by adding an oblique member.

  In addition, this film forming apparatus includes a transport mechanism 9 that transports a film formation substrate between a plurality of film forming chambers 1a, 1b, 1c.

  The deposition target substrate is supported and transported by the substrate holder 10. The substrate holder 10 supports the film formation substrate by touching only the side surface of the film formation substrate by a claw spring type or a coil spring type. In the substrate holder 10, it is desirable that a measure against dust generation is taken at the contact point with the film formation substrate.

  FIG. 3 is a cross-sectional view illustrating a configuration of a main part of the transport mechanism.

  The transport mechanism 9 has a guide rail 11 that supports the substrate holder 10 and guides the transport of the deposition target substrate. The guide rail 11 is made of a seamless and integral member over a region corresponding to the plurality of film forming chambers 1a, 1b, 1c..., As shown in FIG. A plurality of bearings 12 are disposed. The substrate holder 9 is movably supported by a plurality of bearings 12.

  The transport mechanism 9 has a linear motor constituted by a magnet 13 provided on the substrate holder 9 and a coil provided on the guide rail 11 side. The substrate holder 9 is conveyed along the guide rail 11 by this linear motor.

  Note that it is desirable that the deposition target substrate be vertical or horizontal with respect to the guide rail 11 when supported by the substrate holder 9.

  In this film forming apparatus, the rigidity of the entire apparatus is improved, the falling of the deposition target substrate and the displacement of the fixed position are prevented, the production yield is improved, and the film formation with a stable film thickness distribution is achieved. It can be carried out. Further, since no leakage occurs from the connecting portion between the film forming chambers, film formation with stable film quality can be performed.

  Further, in this film forming apparatus, a plurality of film forming chambers 1a, 1b, 1c... And connecting portions 2a, 2b, 2c. Cost can be reduced.

  This film forming apparatus uses a glass substrate such as amorphous glass, crystallized glass, or discrete glass, or an aluminum substrate coated with aluminum or NiP as a film forming substrate, and a nonmagnetic material is formed on the film forming substrate. Suitable as a film-forming device for manufacturing magnetic disks by forming a multilayer multilayer film consisting of an underlayer, soft magnetic layer, nonmagnetic layer, soft magnetic layer, nonmagnetic underlayer, nonmagnetic intermediate layer, recording layer, and protective layer It is. Note that it is desirable that the material between the soft magnetic layer and the recording layer can be selected according to the recording density required for the magnetic disk.

  As the film forming apparatus according to the present invention, a plurality of film forming chambers were manufactured from an integral nonmagnetic base material. In this example, four film forming chambers were manufactured as one cell. Then, to prevent leaks, each port was closed and a leak check was performed. In the leak check, the number of ions in the deposition chamber was detected using an ion mass filter.

  FIG. 4 is a graph showing the partial pressure of each gas in the film forming chamber in the example and the comparative example (conventional film forming apparatus).

  In the film forming apparatus in this example, as shown in FIG. 4, it was confirmed that the partial pressure of each gas in the film forming chamber was lower than that in the comparative example (conventional film forming apparatus). Note that a low partial pressure indicates that the number of ions in the deposition chamber is small.

  Note that (a) in FIG. 4 is a result of detecting the partial pressure of each gas in one film formation chamber by closing the variable valve. (B) in FIG. 4 is a result of detecting the partial pressure of each gas in all (four) film forming chambers by opening the variable valve.

  Thus, in the film forming apparatus according to the present invention, it was confirmed that there were few leaks compared to the conventional film forming apparatus, and it was confirmed that film formation with stable film quality could be performed.

It is a front view which shows the structure of the several film-forming chamber used as the principal part of the film-forming apparatus which concerns on this invention. It is a front view which shows the structure of the film-forming apparatus which concerns on this invention. It is sectional drawing which shows the structure of the principal part of the conveyance mechanism in the film-forming apparatus which concerns on this invention. It is a graph which shows the partial pressure of each gas in the film-forming chamber in the Example and comparative example (conventional film-forming apparatus) of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1a, 1b, 1c Deposition chamber 2a, 2b, 2c Connection part 3 Cathode attachment flange 4 Vacuum gauge attachment port 5 Process gas introduction port 6 Pump 7 Movable valve 8 Leg part 9 Transport mechanism 10 Substrate holder 11 Guide rail 12 Bearing 13 magnet

Claims (2)

A plurality of deposition chambers;
A connecting portion for connecting the film forming chambers,
Each of the film forming chambers and the connecting portion is manufactured by being processed from an integral nonmagnetic base material. A plurality of deposition chambers;
A connecting part for connecting the film forming chambers;
A transport mechanism for transporting the deposition target substrate between the plurality of deposition chambers,
The transport mechanism includes a guide rail that guides transport of the deposition target substrate, and the guide rail is made of an integral member.

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