JP2007248801A - Negative resist composition and patterning method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a negative resist composition for electron beams or X-rays for improving a dissolution rate with an alkali developer while keeping desired high sensitivity/high resolution and environmental stability of a resist film. <P>SOLUTION: The negative resist composition contains at least: a compound (A) which generates an acid by irradiation with electron beams or X-rays; an alkali soluble resin (B); a crosslinking agent (C) which produces a crosslinked structure with the generated acid; and a polycyclic aromatic derivative dissolution accelerator (D) which is soluble in a resist solvent, emits secondary electrons by irradiation with electron beams or X-rays and is easily ionized. The composition may further contain a nitrogen-containing basic compound (E). A patterning method is disclosed which includes steps of forming a resist film from the above negative resist composition and exposing and developing. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention provides both a high sensitivity and a rectangular profile, and further has a resist residue and a low etching resistance, an electron beam or X-ray negative chemically amplified resist composition, and a pattern forming method using the resist About.

  In recent years, various electron beam positive resist compositions have been proposed (see, for example, Patent Document 1). For example, a pattern formation process using an electron beam as a light source can achieve higher resolution than a process using radiation such as an I-line or excimer laser as a light source. Next generation 256 mega, 1 giga, 4 giga Its application is being studied for the production of ultra-highly integrated semiconductor devices such as the above.

However, pattern formation using an electron beam or X-ray differs in the exposure mechanism in pattern formation using a light source with an I-line or excimer laser. Moreover, most of the electron beam or X-ray to be exposed passes through the resist film and is not easily converted into energy that contributes to a chemical reaction required for pattern formation. In addition, in the electron beam or X-ray exposure, since the exposure is performed in vacuum, the stability of the resist composition film is required.
From the above, in the case of a chemically amplified positive resist, the desired performance is achieved by increasing the content of the photoacid generator and introducing a bulky structure into the acid-dissociable resin. .
JP 2002-254843 A

However, when the content of the photoacid generator is increased, the effect of inhibiting dissolution in an alkali developing solution works, and further, the structure of the acid dissociable resin becomes bulky, resulting in a problem that hydrophilicity is lowered. And the dissolution rate with respect to the alkaline developing solution of a resist composition film falls, the tolerance of a development process is lost, and the control of the pattern dimension which refines | miniaturizes becomes difficult.
Furthermore, if the etching resistance of the resist is improved, the process tolerance at the time of etching becomes wider, which is advantageous for future miniaturization.
From the above, in order to put the pattern forming process using electron beam or X-ray into practical use, it is essential to improve sensitivity and dissolution rate in alkaline developer, and improve etching resistance while maintaining the current performance. Met.

In general, in a chemically amplified resist, generation of an acid from an acid generator upon energy irradiation is important as a mechanism for achieving sensitivity and resolution.
For example, in the case of ultraviolet irradiation, an acid is generated by chemical decomposition due to ultraviolet absorption of the acid generator.
On the other hand, in the case of electron beam and X-ray irradiation, as reported in “Jpn. Appl. Phys., 31, 1992, 4301”, etc. The generator itself absorbs little, and the polymer compound contained in the resist emits secondary electrons and is ionized. And the acid generate | occur | produces because the ion contributes to an acid generator.
Therefore, in the chemically amplified resist for electron beams and X-rays, in order to achieve high sensitivity and high resolution, a compound that emits secondary electrons and is easily ionized is employed.

  On the other hand, in order to achieve high etching resistance, it has long been known to calculate molecular parameters of compounds by calculating Onishi parameters and ring parameters. From these parameters, an organic compound having a cyclic structure that does not contain a hetero atom is advantageous, and the resin and the like constituting the resist often adopt these structures.

  Accordingly, an object of the present invention is to provide an electron beam or X-ray negative resist composition capable of improving the dissolution rate in an alkaline developer while having the desired high sensitivity and high resolution and environmental stability of the resist film. It is to provide.

  The inventors of the present application have made extensive studies to solve the above-mentioned problems. As a result, the solubility of an electron beam or X-ray positive resist composition in an alkali developer is improved, and sensitivity, resolution, and etching resistance are further improved. It was found that high sensitivity, high resolution, high environmental stability, high pattern size control, and high etching resistance can be achieved by adding a dissolution accelerator. That is, the present invention includes the following configuration.

That is, the first invention of the present invention comprises a compound (A) that generates an acid upon irradiation with an electron beam or X-ray, a resin (B) that becomes alkali-soluble, and a crosslinking agent that causes a crosslinking reaction with the generated acid ( And C) and a polycyclic aromatic derivative dissolution accelerator (D) that is soluble in a resist solvent, emits secondary electrons when irradiated with an electron beam or X-ray, and is easily ionized. Features.
The second invention of the present invention is characterized by further containing a nitrogen-containing basic compound (E). Furthermore, the third invention of the present invention is characterized by further containing a surfactant (F).

According to a fourth aspect of the present invention, there is provided a pattern forming method comprising a step of forming a resist film from a negative resist composition, exposing and developing the resist film, and the negative resist composition comprises an electron beam Alternatively, the compound (A) that generates an acid upon irradiation with X-rays, the resin (B) that becomes alkali-soluble, the crosslinking agent (C) that causes a crosslinking reaction with the generated acid, and a solvent that is soluble in a resist solvent, It contains a polycyclic aromatic derivative dissolution accelerator (D) that emits secondary electrons when irradiated with X-rays or X-rays and is easily ionized.
The fifth invention of the present invention is characterized in that the negative resist composition further contains a nitrogen-containing basic compound (E). Furthermore, the sixth invention of the present invention is characterized in that the negative resist composition further contains a surfactant (F).

According to the negative resist composition and the pattern forming method of the present invention, high sensitivity is achieved by using a dissolution accelerator that easily emits secondary electrons upon irradiation with an electron beam or X-ray. Further, since the dissolution rate is remarkably improved, a high resolution pattern can be obtained, and the formation of substrate defects such as development defects can be prevented.
Such resist films are also excellent in dry etching resistance, heat resistance, and mechanical strength, and can be further thinned. Therefore, semiconductor devices and semiconductors that are expected to become increasingly finer in the future. It is extremely useful as a chemically amplified resist for manufacturing a photomask for devices.

Hereinafter, the compound used for the resist composition of the present invention will be described in detail.
(A) Compound that generates acid upon irradiation with electron beam or X-ray (A) (photoacid generator) As a photoacid generator used in this example, a photoinitiator for photocationic polymerization, a photoradical polymerization Known light (400-200 nm ultraviolet light, far ultraviolet light, particularly preferably g-line, h-line, I-line) used for photoinitiators, photodecolorants of dyes, photochromic agents, semiconductor resists, etc. , KrF excimer laser light), ArF excimer laser light, electron beam, X-ray, molecular beam or ion beam, and a mixture thereof and a mixture thereof can be appropriately selected and used.

  Other examples of photoacid generators used in this example include diazonium salts, ammonium salts, phosphonium salts, iodonium salts, sulfonium salts, selenonium salts, onium salts such as arsonium salts, organic halogen compounds, organic metals / organics. Listed are halides, photoacid generators having an O-nitrobenzyl-type protecting group, compounds that generate sulfonic acids by photolysis, such as iminosulfonates, disulfone compounds, diazoketosulfones, and diazodisulfone compounds. be able to. In addition, a group in which an acid is generated by light or a compound in which a compound is introduced into the main chain or side chain of a polymer can be used.

  Moreover, these can be used individually or in mixture of 2 or more types as needed. More specifically, compounds as shown in the following a1 to a7 can be exemplified as the photoacid generator.

a1. Iodonium salt compound Diphenyliodonium trifluoromethanesulfonate, 4-methoxyphenylphenyliodonium hexafluoroantimonate, 4-methoxyphenylphenyliodonium trifluoromethanesulfonate, bis (4-tert-butylphenyl) iodonium tetrafluoroborate, bis (4-tert- Butylphenyl) iodonium hexafluorophosphate bis (4-tert-butylphenyl) iodonium hexafluoroantimonate, bis (4-tert-butylphenyl) iodonium trifluoromethanesulfonate, bis (4-tert-butylphenyl) iodonium 10-camphorsulfonate Bis (4-tert-butylphenyl) iodonium p-toluenesulfonate and the like.

a2. Sulfonium salt compound Cyclohexylmethyl (2-oxocyclohexyl) sulfonium perfluorooctane sulfonate, methyl diphenylsulfonium perfluorooctane sulfonate, triphenylsulfonium hexafluorophosphate, triphenylsulfonium hexafluoroantimonate, triphenylsulfonium trifluoromethanesulfonate, 4-methoxy Phenyldiphenylsulfonium hexafluoroantimonate, 4-methoxyphenyldiphenylsulfonium trifluoromethanesulfonate, 4-methylphenyldiphenylsulfonium methanesulfonate, 4-methylphenyldiphenylsulfonium perfluorooctanesulfonate, 4-methylphenyldiphenylsulfonium trifluor Oromethanesulfonate, 2,4,6-trimethylphenyldiphenylsulfonium trifluoromethanesulfonate, 4-tert-butylphenyldiphenylsulfonium trifluoromethanesulfonate, 4-phenylthiophenyldiphenylsulfonium hexafluorophosphate, 4-phenylthiophenyldiphenylsulfonium hexafluoro Antimonate, 1- (2-naphthoylmethyl) thiolanium hexafluoroantimonate, 1- (2-naphthoylmethyl) thiolanium trifluoromethanesulfonate, 4-hydroxy-1-naphthyldimethylsulfonium hexafluoroantimonate, 4- Hydroxy-1-naphthyldimethylsulfonium trifluoromethanesulfonate and the like.

a3. Organic halogen compounds 2-methyl-4,6-bis (trichloromethyl) -1,3,5-triazine, 2,4,6-tris (trichloromethyl) -1,3,5-triazine, 2-phenyl-4 , 6-Bis (trichloromethyl) -1,3,5-triazine, 2- (4-chlorophenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-methoxyphenyl) ) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-methoxy-1-naphthyl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (Benzo [d] [1,3] dioxolan-5-yl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-methoxystyryl) -4,6- Bis (trichloromethyl) -1,3 , 5-triazine, 2- (3,4,5-trimethoxystyryl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (3,4-dimethoxystyryl) -4, 6-bis (trichloromethyl) -1,3,5-triazine, 2- (2,4-dimethoxystyryl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (2- Methoxystyryl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2- (4-butoxystyryl) -4,6-bis (trichloromethyl) -1,3,5-triazine, 2 -(4-pentyloxystyryl) -4,6-bis (trichloromethyl) -1,3,5-triazine and the like.

a4. Sulfonate compounds 1-benzoyl-1-phenylmethyl p-toluenesulfonate (common name benzoin tosylate), 2-benzoyl-2-hydroxy-2-phenylethyl p-toluenesulfonate (common name α-methylol benzoin tosylate), 1,2 , 3-Benzenetriyltrismethanesulfonate, 2,6-dinitrobenzyl p-toluenesulfonate, 2-nitrobenzyl p-toluenesulfonate, 4-nitrobenzyl p-toluenesulfonate, and the like.

a5. Disulfone compounds Diphenyl disulfone, di-p-tolyl disulfone and the like.

a6. Diazomethane compounds Bis (phenylsulfonyl) diazomethane, bis (4-chlorophenylsulfonyl) diazomethane, bis (p-tolylsulfonyl) diazomethane, bis (4-tert-butylphenylsulfonyl) diazomethane, bis (2,4-xylylsulfonyl) diazomethane , Bis (cyclohexylsulfonyl) diazomethane, bis (tert-butylsulfonyl) diazomethane, (benzoyl) (phenylsulfonyl) diazomethane, and the like.

a7. N-sulfonyloxyimide compound N- (ethylsulfonyloxy) succinimide, N- (isopropylsulfonyloxy) succinimide, N- (butylsulfonyloxy) succinimide, N- (10-camphorsulfonyloxy) succinimide, N- (phenylsulfonyloxy) ) Succinimide, N- (trifluoromethylsulfonyloxy) succinimide, N- (trifluoromethylsulfonyloxy) phthalimide, N- (trifluoromethylsulfonyloxy) -5-norbornene-2,3-dicarboximide, N- ( Trifluoromethylsulfonyloxy) naphthalimide, N- (10-camphorsulfonyloxy) naphthalimide, and the like.

  Among these, preferred acid generators in combination with the resin specified in the present invention include bis (4-tert-butylphenyl) iodonium 10-camphorsulfonate, bis (4-tert-butylphenyl) iodonium p-toluene. Sulfonate, cyclohexylmethyl (2-oxocyclohexyl) sulfonium perfluorooctane sulfonate, methyldiphenylsulfonium perfluorooctane sulfonate, 4-methylphenyldiphenylsulfonium methanesulfonate, 4-methylphenyldiphenylsulfonium trifluoromethanesulfonate, 4-methylphenyldiphenylsulfonium persulfate Fluorooctane sulfonate, bis (tert-butylsulfonyl) diazomethane, bis (cyclohexylsulfonyl) diazomethane, Such as scan (p- tolyl) diazomethane can be given.

  The added amount of these photoacid generators is usually used in the range of 0.001 to 40% by weight, preferably in the range of 5 to 30% by weight, based on the solid content in the composition. If the amount of photoacid generator added is less than 5% by weight, the sensitivity will be low, and if the amount added is more than 40% by weight, the dissolution inhibiting effect will work and the profile will deteriorate and the process (especially baking) margin will be narrowed. It is not preferable.

(B) About the alkali-soluble resin (B)
The resin that is alkali-soluble as the component (B) is not particularly limited, and any conventional electron beam or X-ray positive resist composition can be used. Examples of such alkali-soluble resins include novolak resins obtained by condensing phenols such as phenol, m-cresol, p-cresol, xylenol, and trimethylphenol with aldehydes such as formaldehyde in the presence of an acidic catalyst, Polyhydroxystyrene resins such as homopolymers of hydroxystyrene, copolymers of hydroxystyrene and other styrene monomers, copolymers of hydroxystyrene and acrylic acid or methacrylic acid or derivatives thereof, acrylic acid or Examples include an alkali-soluble resin such as acrylic acid or a methacrylic acid resin, which is a copolymer of methacrylic acid and a derivative thereof, in which a hydroxyl group or a part of a carboxylic acid group is protected with a substituent.

  Examples of the styrene monomer copolymerized with the above hydroxystyrene include styrene, α-methylstyrene, p-methylstyrene, o-methylstyrene, p-methoxystyrene, p-chlorostyrene, vinylnaphthalene, vinylfluorene, vinyl. Examples include phenanthrene and vinyl anthracene. Examples of the acrylic acid or methacrylic acid derivative include methyl acrylate, ethyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxylpropyl acrylate, acrylamide, acrylonitrile, and corresponding methacrylic acid derivatives. .

  The polystyrene-reduced weight molecular weight (hereinafter referred to as “Mw”) measured by gel permeation chromatography of the alkali-soluble resin is preferably 1,000 to 150,000, more preferably 3,000 to 100,000. The alkali-soluble resins can be used alone or in admixture of two or more.

(C) About the crosslinking agent (C)
The crosslinking agent (C) is not particularly limited as long as it can cure an alkali-soluble resin such as a novolak resin or polyvinylphenol by crosslinking, and specifically includes a hydroxymethyl group, an alkoxymethyl group, an acyloxymethyl group, or an alkoxymethyl group. Examples thereof include compounds having two or more ether groups or compounds having an epoxy group.

  More preferred are alkoxymethylated, acyloxymethylated melamine compounds, alkoxymethylated, acyloxymethylated urea compounds, hydroxymethylated, alkoxymethylated, acyloxymethylated phenol compounds, and alkoxymethyl etherified phenol compounds.

  As said melamine compound, a molecular weight is 1200 or less. Furthermore, hexamethylol melamine, pentamethylol melamine, tetramethylol melamine, hexamethoxymethyl melamine, pentamethoxymethyl melamine, tetramethoxymethyl melamine and the like are preferable.

As the phenol compound, those having a molecular weight of 1200 or less are preferable. Furthermore, the phenol derivative which contains 1 or more benzene rings in a molecule | numerator, and also has 2 or more hydroxymethyl groups or alkoxymethyl groups further can be mentioned.
Specific examples include 2,6-bis (hydroxymethyl) -4-methylphenol and 4-tert-butyl-2,6-bis (hydroxymethyl) phenol. These crosslinking agents may be used alone or in combination of two kinds.

  Examples of the epoxy compound include monomer, dimer, oligomer, and polymer epoxy compounds containing one or more epoxy groups. Examples thereof include a reaction product of bisphenol A and epichlorohydrin, a reaction product of a low molecular weight phenol-formaldehyde resin and epichlorohydrin, and the like.

  The crosslinking agent is generally used in an amount of 3 to 60% by weight, preferably 5 to 30% by weight, based on the total solid content of the resist composition. When the addition amount of the crosslinking agent is less than 3% by weight, the remaining film ratio of the resist film with respect to the alkaline developer is lowered. On the other hand, if it exceeds 30% by weight, the resolving power is lowered, and the storage stability of the resist solution is also lowered, which is not preferable.

(D) About dissolution promoting compound (D) Next, examples of the dissolution promoting agent of component (D) include compounds into which a phenolic hydroxyl group, a carboxyl group or the like is introduced. The dissolution accelerator is preferably a compound that has a structure that easily emits secondary electrons and is ionized when irradiated with an electron beam or X-ray, and further exhibits resistance to etching. Moreover, a low molecular compound or a high molecular compound may be sufficient. Examples of the compound that easily emits secondary electrons include polycyclic aromatic derivatives. These have an electron-rich structure, absorb the high energy of the irradiated electron beam or X-ray, and emit secondary electrons to ionize them, facilitating energy transfer to the acid generator. Those having these alkali-soluble groups in these skeletons are the dissolution promoting compounds in the present invention. Specific examples of the dissolution promoting compound include the following compounds.
As the dissolution accelerator, the polycyclic aromatic derivative soluble in the resist solvent is preferably a compound having a benzene ring or a cyclic unsaturated bond containing a hetero atom as a skeleton. For example, a carboxylic acid represented by the formula (1) or an alcohol represented by the formula (2) can be mentioned.

In the formulas (1) and (2), examples of the substituent R1 include the following. Phenyl, biphenyl, triphenylene, naphthalene, phenanthrene, anthracene, chrysene, pyrene, fluorene, 9,10-dihydroanthracene, phenazine, phenanthroline, phenanthridine, dibenzofuran, xanthene and the like are preferable. Examples of the substituent R2 include the following. Phenyl, phenyl ether, methylene and the like are preferred.
The number of R2 represented by m and n is preferably 2. When it becomes 0 or 1, it becomes insoluble in an organic solvent, or it becomes difficult to dissolve in an alkali developer, causing defects and the like. The number of carboxylic acid or alcohol groups represented by j and k is preferably 2 or more.

(E) Nitrogen-containing basic compound (E) (quencher) In general, in lithography using a chemically amplified resist composition, in order to proceed a chemical reaction in a chain using an acid generated by exposure as a catalyst. Although post-exposure baking (post-exposure baking) is performed, it is known that if the time from exposure to post-exposure baking becomes longer, performance deterioration is caused by acid deactivation.
Furthermore, when the generated acid diffuses more than necessary in the resist coating film, a chemical reaction spreads to the unexposed area, and the performance such as the pattern shape may deteriorate. In order to prevent performance degradation due to acid deactivation due to such post-exposure holding, or to control acid diffusion and suppress reactions in unexposed areas, basic compounds, particularly basic nitrogen-containing compounds It is known that it is effective to add a small amount of an organic compound such as an amine as a quencher. In the present invention, it is preferable to contain such a basic nitrogen-containing organic compound as a quencher.

  The nitrogen-containing organic compound used for the quencher can be a primary amine, a secondary amine, a tertiary amine, an unsaturated cyclic amine, a quaternary ammonium salt, and the like. More specifically, the following compounds are exemplified. Is done.

e1.1 primary amine hexylamine, heptylamine, octylamine, nonylamine, decylamine, aniline, 2-, 3- or 4-methylaniline, 4-nitroaniline, 1- or 2-naphthylamine, ethylenediamine, tetramethylenediamine, hexa Methylenediamine, 4,4'-diamino-1,2-diphenylethane, 4,4'-diamino-3,3'-dimethyldiphenylmethane, 4,4'-diamino-3,3'-diethyldiphenylmethane, and the like.

e2.2 secondary amine Dibutylamine, dipentylamine, dihexylamine, diheptylamine, dioctylamine, dinonylamine, didecylamine, N-methylaniline, piperidine, diphenylamine, N-benzylisopropylamine and the like.

e3.3 tertiary amine triethylamine, trimethylamine, tripropylamine, tributylamine, tripentylamine, trihexylamine, triheptylamine, trioctylamine, trinonylamine, tridecylamine, methyldibutylamine, methyldipentylamine, methyldihexyl Amine, methyldicyclohexylamine, methyldiheptylamine, methyldioctylamine, methyldinonylamine, methyldidecylamine, ethyldibutylamine, ethyldipentylamine, ethyldihexylamine, ethyldiheptylamine, ethyldioctylamine, ethyldinonylamine Ethyldidecylamine, tris [2- (2-methoxyethoxy) ethyl] amine, triisopropanolamine, N, N-dimethylaniline, N, N-diisopropylaniline and the like.

e4. Unsaturated cyclic amine Imidazole, pyridine, 4-methylpyridine, 4-methylimidazole, bipyridine, 2,2'-dipyridylamine, di-2-pyridyl ketone, 1,2-di (2-pyridyl) ethane, 1,2 -Di (4-pyridyl) ethane, 1,3-di (4-pyridyl) propane, 1,2-di (2-pyridyl) ethylene, 1,2-di (4-pyridyl) ethylene, 1,2-bis (4-pyridyloxy) ethane, 4,4'-dipyridyl sulfide, 4,4'-dipyridyl disulfide, 2,2'-dipicolylamine, 3,3'-dipicolylamine and the like.

e5.4 quaternary ammonium salt Tetramethylammonium hydroxide, tetraisopropylammonium hydroxide, tetrabutylammonium hydroxide and the like.

  Among these, secondary amine, tertiary amine, and quaternary ammonium are preferable, and N-benzylisopropylamine, tris [2- (2-methoxyethoxy) ethyl] amine, triisopropanolamine, N, N-dimethylaniline, N, N-diisopropylaniline and tetramethylammonium hydroxide are preferred. In addition, the basic nitrogen-containing organic compound used as a quencher is preferably one that hardly evaporates at the pre-baking temperature so that it remains in the resist film and exerts its effect even after pre-baking of the resist film formed on the substrate. Specifically, a compound having a boiling point of 150 ° C. or higher is preferable.

Other additives, etc. As the surfactant that can be used in the negative resist composition of the present invention for improving the wettability with the base substrate, fluorine-based and / or silicon-based surfactants are preferably used. Any one or more of surfactants, silicon surfactants, and surfactants containing both fluorine atoms and silicon atoms can be contained.

  The compounding amount of these surfactants is usually 0.001% to 2% by weight, preferably 0.01% to 1% by weight, based on the solid content in the composition of the present invention. These surfactants may be added alone or in some combination.

Resist Composition The resist composition of the present invention usually has a photoacid generator (A) of 5 to 20% by weight, an alkali-soluble resin (B) of 60 to 90% by weight, and a crosslinking agent (C) of 5 to 30%. % By weight, and a solubility promoter in the range of 5 to 20% by weight. In particular, it is preferable that the resin component is 70 to 80% by weight, the acid generator is 5 to 10% by weight, the crosslinking agent is 10 to 20% by weight, and the dissolution accelerator is 5 to 10%. In addition, when the quencher is contained, it is preferably used in the range of 0.01 to 1.0% by weight based on the total solid content of the resist composition. Moreover, the resist composition of this invention can also contain a small amount of various additives, such as a sensitizer, surfactant, a stabilizer, and dye, as needed.

  In general, the resist composition is mixed with a solvent to form a resist solution so that the total solid content concentration is 10 to 50% by weight, and is applied onto a silicon wafer or a mask quartz substrate. The solvent used here is not particularly limited as long as it dissolves each component and has an appropriate drying rate, and those commonly used in this field can be used. For example, ethyl cellosolve acetate, methyl cellosolve acetate, propylene glycol monomethyl ether acetate, glycol ether esters such as propylene glycol monoethyl ether acetate, ethyl cellosolve, methyl cellosolve, propylene glycol monomethyl ether, propylene glycol monoethyl ether, diethylene glycol dimethyl ether Glycol mono or diethers, ethyl lactate, butyl acetate, amyl acetate, ethyl pyruvate, esters such as γ-butyrolactone, ketones such as 2-heptanone, cyclohexanone, methyl isobutyl ketone, aroma such as xylene Group hydrocarbons and lactams such as N-methyl-2-pyrrolidone. These solvents can be used alone or in combination of two or more.

  The resist composition of the present invention can be used, for example, as follows. That is, a resist solution dissolved in a solvent as described above is applied onto a substrate by a conventional method such as spin coating, dried (prebaked), subjected to an exposure process for patterning, and then promotes a chemical reaction. After performing the heat treatment, a resist pattern can be formed by developing with an alkali developer. The alkali developer used here may be one commonly used in this field. Examples thereof include tetramethylammonium hydroxide and 1 to 10% by weight aqueous solution of (2-hydroxyethyl) trimethylammonium hydroxide. In addition, an appropriate amount of a water-soluble organic solvent such as methanol or ethanol, a certain surfactant, or the like can be added to these alkaline aqueous solutions.

Examples of the present invention will be described below.
In addition, the ratio of the following resist composition shows an example, Comprising: This invention is not limited to the following value, It can adjust with process conditions etc.

(Comparative Example 1)
Using a commercially available negative-type chemically amplified resist FEN-271 (Fuji Film Electronics Materials Co., Ltd.), a fine pattern was formed on the chromium film on the synthetic quartz substrate as follows.
First, as shown in FIG. 1A, a resist solution was spin-coated on the chromium film 1 formed on the synthetic quartz substrate 10 and baked to form a 300 nm resist film 2 on the chromium film 1. And as shown in FIG.1 (b), (c), the electron beam 3 was irradiated using the electron beam drawing apparatus of the acceleration voltage 50KV.
Subsequently, post-exposure baking was performed, and development was performed with a 2.38 wt% tetramethylammonium hydroxide aqueous solution with a development time of 90 seconds. Then, a 200 nm line & space pattern 4a was formed on the chromium film 1, and the sensitivity at which a 1: 1 pattern was obtained was determined as the optimum sensitivity.

  FEN-271 is a negative chemically amplified resist mainly composed of a photoacid generator (A), an alkali-soluble resin (B), and a crosslinking agent (C), and does not contain a dissolution accelerator (D). Since it is not, it was set as the comparative example.

Example 1
5 parts by mass of 9,9 ′-{di (4-hydroxyphenyl)} fluorene as a dissolution accelerator was dissolved in a resist solution containing 100 parts by mass of a solid content of a commercially available negative-type chemically amplified resist FEN-271. Then, in the same manner as in Comparative Example 1, a pattern was formed on the chromium film to obtain the optimum sensitivity.

(Example 2)
10 parts by mass of 9,9 ′-{di (4-hydroxyphenyl)} fluorene as a dissolution accelerator was dissolved in a resist solution containing 100 parts by mass of a solid content of a commercially available negative-type chemically amplified resist FEN-271. Then, in the same manner as in Comparative Example 1, a pattern was formed on the chromium film to obtain the optimum sensitivity.

(Example 3)
15 parts by mass of 9,9 ′-{di (4-hydroxyphenyl)} fluorene as a dissolution accelerator was dissolved in a resist solution containing 100 parts by mass of a solid content of a commercially available negative-type chemically amplified resist FEN-271. Then, in the same manner as in Comparative Example 1, a pattern was formed on the chromium film to obtain the optimum sensitivity.

  These results are shown in FIG. In the system to which the dissolution accelerator was added (Examples 1 to 3), the result of higher sensitivity than Comparative Example 1 was obtained.

(Comparative Example 2)
Using a commercially available negative chemically amplified resist FEN-271, the dissolution rate of the resist film was measured as follows.
First, the resist solution was spin-coated and baked on the substrate. Then, baking similar to the post-exposure baking was performed (that is, the unexposed portion), and the dissolution rate of the resist film in a 2.38 wt% tetramethylammonium hydroxide aqueous solution was measured. The dissolution rate was measured using a development rate measuring device QZ-R3A manufactured by RISOTEC JAPAN.

Example 4
From the resist solution prepared in Example 1, the dissolution rate was measured in the same manner as in Comparative Example 2.

(Example 5)
From the resist solution prepared in Example 2, the dissolution rate was measured in the same manner as in Comparative Example 3.

(Example 6)
From the resist solution prepared in Example 3, the dissolution rate was measured in the same manner as in Comparative Example 2.

  These results are shown in FIG. From this result, it became clear that the dissolution rate was improved several times by adding a dissolution accelerator, and the difference in dissolution rate between the exposed and unexposed areas was 4 times or more, and high contrast was achieved.

(Comparative Example 3)
Using a commercially available negative chemically amplified resist FEN-271, the etching resistance of the resist film was examined as follows.
The substrate on which the resist pattern was created in Comparative Example 1 was subjected to etching gas Cl ₂ , pressure 0.93 Pa, RIE power 6 W, ICP power 250 W, etching time using an electron cyclotron resonance plasma etching apparatus as shown in FIG. Etching 5 was performed on the chromium film on the synthetic quartz substrate 10 under conditions of 360 seconds. Then, the etching rate per hour of the resist film was calculated.

(Example 7)
The etching rate was determined from the substrate prepared in Example 1 by the same method as in Comparative Example 3.

(Example 8)
The etching rate was determined from the substrate prepared in Example 2 by the same method as in Comparative Example 3.

Example 9
The etching rate was determined from the substrate prepared in Example 3 by the same method as in Comparative Example 3.

  The result of calculating the etching rate is shown in FIG. In the system in which the dissolution inhibitor is introduced, the etching resistance is improved by up to 11%, and it has been revealed that the dissolution inhibitor improves the dry etching resistance.

  It can be suitably used as an electron beam or X-ray chemically amplified resist used in the manufacture of an ultra-highly integrated semiconductor element or a photomask used in the manufacture.

It is a figure explaining an example of the fine pattern formation process using the resist composition of this invention. It is a table | surface which shows the measurement result of the optimal sensitivity of Examples 1-3 of this invention and the comparative example 1. FIG. It is a table | surface which shows the measurement result of the dissolution rate of Examples 4-6 of this invention, and the comparative example 2. FIG. It is a table | surface which shows the measurement result of the etching characteristic of Examples 7-9 and Comparative Example 3 of this invention.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Chrome film, 2 ... Resist film, 3 ... Electron beam, 4a ... Line & space pattern, 5 ... Etching process, 10 ... Synthetic quartz substrate.

Claims (6)

  It is soluble in the compound (A) that generates an acid upon irradiation with an electron beam or X-ray, a resin (B) that becomes alkali-soluble, a crosslinking agent (C) that causes a crosslinking reaction with the generated acid, and a resist solvent. A negative resist composition comprising a polycyclic aromatic derivative dissolution accelerator (D) that emits secondary electrons when irradiated with an electron beam or X-ray and is easily ionized.   The negative resist composition according to claim 1, further comprising a nitrogen-containing basic compound (E).   Furthermore, surfactant (F) is contained, The negative resist composition of Claim 1 or 2 characterized by the above-mentioned. A pattern forming method comprising a step of forming a resist film with a negative resist composition, exposing and developing the resist film,
The negative resist composition includes a compound (A) that generates an acid upon irradiation with an electron beam or X-ray, a resin (B) that becomes alkali-soluble, and a crosslinking agent (C) that causes a crosslinking reaction with the generated acid. And a polycyclic aromatic derivative dissolution accelerator (D) that is soluble in a resist solvent, emits secondary electrons when irradiated with an electron beam or X-ray, and is easily ionized. Pattern forming method.   The pattern forming method according to claim 4, wherein the negative resist composition further contains a nitrogen-containing basic compound (E).   The pattern forming method according to claim 4, wherein the negative resist composition further contains a surfactant (F).

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