JP2007211346A5

JP2007211346A5 -

Info

Publication number: JP2007211346A5
Application number: JP2007031015A
Authority: JP
Filing date: 2007-02-09
Publication date: 2010-04-02
Anticipated expiration: 2027-02-09

Claims

A replaceable membrane precursor support assembly for use in a membrane precursor evaporation system having a container having an outer container wall and bottom and a lid configured to sealingly couple to the container ,
The lid has an outlet configured to hermetically couple to a processing chamber configured to place a thin film on the substrate;
The replaceable membrane precursor support assembly is:
In the membrane precursor evaporation system, comprising a replaceable tray configured to support the membrane precursor and be laminated with one or more additional stackable trays;
Tray of the replaceable, in order to support a bottom support surface which is defined between the inner end and outer end, the one or more additional stackable trays, stretch upwards from the inner end And a stackable inner wall terminating at the upper support end , and an outer wall shorter than the stackable inner wall and extending upward from the outer end of the bottom support surface,
The film precursor is between the stackable inner wall and the outer wall on the bottom support surface;
The stackable inner wall forms a central flow channel in the container and the outer wall, the bottom support surface and the stackable inner wall form a tray space;
The interchangeable tray has one or more tray openings on the stackable inner wall,
The one or more tray openings are configured such that carrier gas from a carrier gas supply system flows from the central flow channel through the one or more tray openings;
A carrier gas is discharged from the stackable inner wall together with the film precursor vapor from above the film precursor and the outer wall and through the outlet of the lid. Body support assembly.

further,
The exchangeable membrane precursor of claim 1, comprising a membrane precursor supported between the stackable inner wall and the outer wall on the bottom support surface in the exchangeable tray. Support assembly.

The exchangeable membrane precursor support assembly according to claim 2, wherein the membrane precursor is a solid metal precursor supported on the exchangeable tray.

The exchangeable membrane precursor support assembly according to claim 3, wherein the membrane precursor is in the form of a solid powder or a solid tablet.

5. The exchangeable membrane precursor support assembly according to claim 3 or 4, wherein the membrane precursor is a carbonyl metal precursor supported on the exchangeable tray.

The carbonyl metal precursor includes W (CO) ₆ , Mo (CO) ₆ , Co ₂ (CO) ₈ , Rh ₄ (CO) ₁₂ , Re ₂ (CO) ₁₀ , Cr (CO) ₆ , Ru ₃ (CO 6. A replaceable membrane precursor support assembly according to claim 5 comprising ₁₂ or Os (CO) ₁₂ .

The film _{_{_{precursor, TaF 5, TaCl 5, TaBr}}} 5, TaI 5, Ta (CO) 5, Ta [N (C 2 H 5 CH 3)] 5 (PEMAT), Ta [N (CH 3) 2] ₅ (PDMAT), Ta [N (C ₂ H ₅ ) ₂ ] ₅ (PDEAT), Ta (NC (CH ₃ ) ₃ ) (N (C ₂ H ₅ ) ₂ ) ₃ (TBTDET), Ta (NC ₂ H _{_{_{_{5) (N (C 2 H}}}} 5) 2) 3, Ta (NC (CH 3) 2 C 2 H 5) (N (CH 3) 2) 3, Ta (NC (CH 3) 3) (N (CH ₃ ) ₂ ) ₃ , Ta (EtCp) ₂ (CO) H, TiF ₄ , TiCl ₄ , TiBr ₄ , TiI ₄ , Ti [N (C ₂ H ₅ CH ₃ )] ₄ (TEMAT), Ti [N (CH _{_{_{3) 2] 4 (TDMAT)}}} , Ti [N (C 2 H 5) 2 _{_{_{_{4 (TDEAT), Ru (C}}}} 5 H 5) 2, Ru (C 2 H 5 C 5 H 4) 2, Ru (C 3 H 7 C 5 H 4) 2, Ru (CH 3 C 5 H 4) 2 _{_{_{_{, Ru 3 (CO) 12,}}}} C 5 H 4 Ru (CO) 3, RuC l 3, Ru (C 11 H 19 O 2) 3, Ru (C 8 H 13 O 2) 3 or Ru _(C 5 _{H 7} The replaceable membrane precursor support assembly according to claim 3 or 4, comprising one or more of O) ₃ , or a combination of two or more of these.

A film precursor evaporation system configured to be coupled to a thin film deposition system comprising:
  A container having an outer container wall, a container bottom, and a removable container lid hermetically coupled to the outer container wall, the lid being hermetically coupled to an inlet of the thin film deposition system;
  A plurality of replaceable trays according to claim 1 stacked in said container;
  A film precursor evaporation system.

A thin film deposition system for forming a thin film on a substrate,
  A film precursor evaporation system according to claim 8,
  further,
  A processing chamber having a substrate holder configured to support and heat the substrate;
  A vapor distribution system configured to introduce a film precursor vapor above the substrate;
  An exhaust system configured to depressurize the processing chamber;
  Have
  The outlet of the container is connected to the vapor distribution system.

A film precursor evaporation system configured to be coupled to a thin film deposition system comprising:
  A container having an outer container wall and a bottom and coupled to a heater and configured to be heated;
  A lid configured to be hermetically coupled to the container, the lid having an outlet configured to be hermetically coupled to the thin film deposition system;
  A stack of trays,
    A base tray supported on the bottom of the container, having a base support end for supporting one or more additional stackable trays, and a stackable inner wall than the stackable inner wall A base tray having a short outer wall, the outer wall and the stackable inner wall configured to hold a film precursor therebetween.
    One or more upper trays including a first upper tray supported by the base support end, wherein each of the one or more upper trays includes:
      An upper stackable inner wall having an upper support end that supports one or more additional upper trays configured to be disposed on one of the first upper tray or one of the lower additional upper trays When,
      An upper outer wall shorter than the inner wall capable of being laminated;
    The upper outer wall and the upper stackable inner wall of each of the one or more upper trays are configured to hold the film precursor therebetween, and the stackable of the base tray An inner wall and the upper stackable inner wall of the one or more upper trays form one or more upper trays forming a central flow channel in the container;
  A stack of trays having;
  An annular space between the outer wall and the outer container wall of the stack of trays, the annular space configured to couple with the thin film deposition system;
  One or more openings disposed in the stackable inner wall of the base tray and coupled to the central flow channel, wherein a first portion of carrier gas is routed from the central flow channel into the base tray 1 is configured to flow toward the annular space above the film precursor and through the base tray, and to exhaust the carrier gas together with the film precursor vapor through the outlet of the lid. Or two or more openings;
  One or more upper openings disposed in the upper stackable inner wall of each of the one or more upper trays and coupled to the central flow channel;
  Have
  The one or more upper openings in the one or more upper trays may cause a second portion of carrier gas to pass from the central flow channel through the first upper tray and the first upper tray. The outer wall of the first upper tray and the film precursor in the first upper tray, flowing toward the annular space, and together with the film precursor vapor, through the outlet of the lid, the carrier Configured to exhaust gas,
  In the base tray and the first upper tray, the first portion of carrier gas does not flow through either the one or more upper trays, and the second portion of carrier gas is the first portion. Alternatively, the film precursor evaporation system is configured not to flow through another of two or more upper trays or the base tray.

A thin film deposition system comprising the film precursor evaporation system according to claim 10,
  further,
  A heater coupled to the container and configured to heat and heat the container;
  A deposition chamber having an inlet coupled to the outlet of the container;
  A thin film deposition system.

A film forming system for forming a thin film on a substrate, comprising the film precursor evaporation system according to claim 10,
  further,
  A processing chamber, a substrate holder configured to support the substrate and to heat the substrate; a vapor distribution system configured to introduce film precursor vapor on top of the substrate; and the processing A processing chamber having an exhaust system configured to depressurize the chamber;
  A steam supply system having a first end hermetically coupled to the outlet of the vessel and a second end hermetically coupled to an inlet of the steam distribution system of the processing chamber;
  A film forming system.