JP2007161904A - Fluorescent material, fluorescent paste, fluorescent film and plasma display panel - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a fluorescent material, a fluorescent paste, and a fluorescent film capable of providing a plasma display panel (PDP) with a low discharge voltage; and a PDP formed by them. <P>SOLUTION: The fluorescent material for use in PDP contains a phosphor, and a substance which generates or discharges H<SB>2</SB>O under the circumstance where the PDP is driven. The substance is boehmite and/or gibbsite which generates or discharges H<SB>2</SB>O after the substance is baked to form a fluorescent film. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

The present invention relates to a phosphor material, a phosphor paste, a phosphor film, and a plasma display panel.
More specifically, the present invention relates to a phosphor material, a phosphor paste, a phosphor film, and a plasma display panel formed by these, which can provide a plasma display panel with a low discharge voltage.

  In recent years, plasma display panels (hereinafter may be abbreviated as “PDP”) have been in the limelight due to their excellent characteristics such as a large-screen thin shape, high image quality and a wide viewing angle. In the PDP, a gas medium is enclosed in a hermetically sealed discharge cell, and an image is formed by generating a discharge in the gas medium.

  PDPs have become widespread as large thin flat displays especially for high-definition video, but in order to further spread in the future, in addition to higher brightness and higher luminous efficiency, power consumption is reduced and discharge voltage is reduced. In order to achieve stabilization, it is required to lower the discharge voltage. As a method for reducing the discharge voltage, it has been proposed to introduce water vapor into the PDP discharge cell or to form a diamond-containing layer with an insulating material containing diamond.

  Patent Document 1 proposes that a gas medium containing at least water vapor is introduced into a discharge cell of a PDP at the time of sealing a panel, which is one of the manufacturing processes of the PDP (sealing process). Has been. According to this, it is disclosed that it is important to introduce a gas medium containing water vapor at the end of the sealing step in order to prevent deterioration of the phosphor (particularly blue phosphor).

  Further, in Patent Document 2, in order to provide a plasma display that generates an address discharge with a low address discharge start voltage, a portion in which an address discharge is generated between one display electrode and an address electrode in a discharge cell, It has been proposed to form a diamond-containing layer with an insulating material containing diamond.

JP 2001-222957 A JP 2004-200040 A

However, those described in Patent Document 1 and Patent Document 2 have the following problems.
First, the thing of patent document 1 introduce | transduces the gas medium containing water vapor | steam in the discharge cell at the time of the process of sealing a panel as mentioned above. Therefore, the gas medium is uniformly introduced to the entire panel, and it is difficult to preferentially introduce water vapor only to specific cells among the three cells of RGB. Since the red, green, and blue phosphors applied to the RGB cells have different discharge voltages depending on their types, a technique that can selectively reduce the discharge voltage for each cell is preferable.

  Moreover, since the process of forming a diamond content layer in a cell increases separately in the thing of patent document 2, a manufacturing process becomes complicated and it is thought that manufacturing cost becomes high. Further, since diamond is used, the material cost is increased.

(Object of the present invention)
Accordingly, an object of the present invention is to provide a phosphor material, a phosphor paste, a phosphor film, and a plasma display panel formed by these, which can provide a plasma display panel having a low discharge voltage.

  Another object of the present invention is to form a phosphor material, a phosphor paste, a phosphor film, and a phosphor material capable of providing a plasma display panel in which a discharge voltage is selectively lowered for each RGB cell. It is to provide a plasma display panel.

  Furthermore, another object of the present invention is to provide a phosphor material and a phosphor paste capable of providing a plasma display panel having a reduced discharge voltage without separately forming a new film layer other than the phosphor film in the cell. , A phosphor film, and a plasma display panel formed by these films.

Means taken by the present invention to achieve the above object are as follows.
A phosphor material for a plasma display panel according to the present invention contains a phosphor and a substance that generates or releases H ₂ O in an environment during driving of the plasma display panel. It is.

A phosphor material according to the present invention is a phosphor material used for forming the phosphor film of a plasma display panel having a discharge cell in which an electrode, a phosphor film, and a gas medium are sealed between a pair of substrates. And a phosphor and a substance that generates or releases H ₂ O in the discharge cell.

The substance that generates or releases of H _{2 O} is preferably a substance capable of generating or releasing of H _{2 O} after firing for forming at least a phosphor film.

The phosphor material for a plasma display panel according to the present invention is characterized by containing a phosphor and boehmite or / and gibbsite.
The term “boehmite or / and gibbsite” in the present specification and claims may include either boehmite or gibbsite, or may include both boehmite and gibbsite.

  Moreover, it is preferable to contain 5 parts by weight or less of boehmite per 100 parts by weight of the total of the phosphor and boehmite for the reason described later.

  The phosphor paste according to the present invention contains the phosphor material, a solvent, and a binder.

  The phosphor film according to the present invention is obtained by molding and baking the phosphor material or the phosphor paste.

  The plasma display panel according to the present invention is characterized in that the phosphor film is formed on an inner surface of a discharge cell between ribs on a substrate.

A method of manufacturing a plasma display panel according to the present invention is a method of manufacturing a plasma display panel having a discharge cell in which an electrode, a phosphor film, and a gas medium are sealed between a pair of substrates, the phosphor material, Alternatively, the phosphor film is formed using the phosphor paste, and the amount of the substance that generates or releases H ₂ O contained in the phosphor film is adjusted for each RGB cell of the plasma display panel. A phosphor film forming step.

A method of manufacturing a plasma display panel according to the present invention is a method of manufacturing a plasma display panel having a discharge cell in which an electrode, a phosphor film, and a gas medium are sealed between a pair of substrates, and the discharge cell includes the discharge cell. Forming a phosphor film capable of generating or releasing H ₂ O, the phosphor film having an amount of generating or releasing H ₂ O for each of RGB cells of the plasma display panel. It is characterized by being adjusted.

The present invention has the above-described configuration and has the following effects.
(A) If the phosphor material according to the present invention is used as a phosphor of a plasma display panel, the discharge voltage of the plasma display panel can be lowered.

(B) According to the present invention, unlike the prior art in which a gas medium containing water vapor is introduced into a discharge cell, H ₂ O contained in the phosphor material is contained in each of the RGB cells of the plasma display panel. By adjusting the amount of the substance to be generated or released, the discharge voltage can be selectively reduced for each cell.

(C) According to the present invention, it is possible to generate or release H ₂ O from a phosphor film of a plasma display panel formed using a phosphor material. Therefore, unlike the prior art in which a diamond-containing layer needs to be newly formed in the cell, it is not necessary to separately form a new film layer other than the phosphor film in the present invention. Absent. Thus, according to the present invention, the discharge voltage can be reduced without separately forming a new film layer other than the phosphor film in the cell.

The phosphor material according to the present invention contains a phosphor and a substance that generates or releases H ₂ O. Then, if a PDP is manufactured with a phosphor film formed using this phosphor material, and H ₂ O is generated or released from the phosphor film in an environment when the PDP is driven, for example, a discharge cell H ₂ O can be contained therein. Thereby, a plasma display panel having a low discharge voltage can be provided.

The state of the generated or released H ₂ O may be a gaseous water vapor, liquid water, or a mixed state of water vapor and water (hereinafter, sometimes referred to as “water vapor or the like”). In the case of water vapor, the amount of the substance that generates or releases H ₂ O can be adjusted so that the gas medium in the discharge cell contains water vapor of, for example, 0.01 volume% or more and 1 volume% or less.

  The plasma display panel manufacturing process differs somewhat depending on the PDP manufacturer, but usually includes a phosphor paste firing process, a sealing process, and an exhaust process in this order. Furthermore, although the heating temperature in each process differs somewhat depending on the manufacturer, for example, the phosphor paste firing process is about 500 ° C., the sealing process is about 450 ° C., and the exhaust process is about 350 ° C. . The general structure of the PDP and details of the manufacturing method are described in Patent Document 1 described above.

  Further, it is considered that plasma energy is high when the manufactured PDP is driven (during discharge), and has an energy of 500 ° C. or higher in the environment when the PDP is driven.

The phosphor material is formed as a phosphor film in a phosphor paste baking process which is one of the manufacturing processes described above. Specifically, for example, a phosphor paste is prepared by using a phosphor material according to the present invention and other materials such as a solvent and a binder, and the phosphor paste is formed into a film shape and fired. Layer) can be formed.
Then, H ₂ O can be contained in the discharge cell by generating or releasing H ₂ O from the phosphor film in the discharge cell.

However, if all the H ₂ O is completely generated or released from the phosphor material (substance that generates or releases H ₂ O contained in the phosphor material) by the above-described phosphor paste firing step, There is a possibility that H ₂ O is not generated or released from the obtained phosphor film.
Therefore, in order to generate or release H ₂ O from the phosphor film into the discharge cell, at least a substance that generates or releases H ₂ O is fired to form the phosphor film (after the phosphor paste firing step). ) Is preferably a substance capable of generating or releasing H ₂ O.

Accordingly, the substance that generates or releases H ₂ O contained in the phosphor material is preferably a substance that can generate or release H ₂ O at a temperature higher than the heating temperature in the phosphor paste firing step.
That is, for example, fluorescent paste firing step is assumed to be 500 ° C., substance that generates or releases of H 2 _O is to be a substance capable of generating or releasing of H _{2 O} at a temperature higher than 500 ° C. preferable.

Moreover, as all the H _{2 O} from a material that generates or releases of H 2 _O is not completely generated or released, it is preferable to carry out the phosphor paste firing step in a short time or low heating temperature.

On the other hand, in the sealing step, which is a subsequent step of the phosphor paste firing step, it is effective to make the atmosphere at the time of sealing dry to prevent deterioration of the phosphor (especially blue phosphor). It is said. Therefore, the substance to H 2 _O generation or release, or not occur of H _{2 O,} such as water vapor in the environment of the sealing step, or those that do not essentially occur is preferred.

That is, above-described phosphor paste firing step, considering the sealing step, as a substance that generates or releases of H 2 _O, or in an environment of a plasma display panel sealing process does not generate or release of H _{2 O} or essentially does not generate or release of H _{2 O,} substance that generates or releases of H _{2 O} in an environment at the time of driving at least the plasma display panel is more preferable.

In view of this, material that generates or releases of H 2 _O after phosphor paste firing step in (after firing to form a phosphor film), generating of H _{2 O} at a heating temperature above the sealing step Alternatively, a substance that can be released is preferable.
The substance that generates or releases of H _{2 O} after phosphor paste firing step in (after firing to form a phosphor film), the heating temperature at the time of peak occurrence or release of H 2 _O is in the sealing step It is considered preferable that the substance has a temperature higher than the heating temperature.

That is, for example, fluorescent paste firing step 500 ° C., the sealing step is assumed to be 450 ° C., substance that generates or releases of H 2 _O is to generate or release of H _{2 O} at a temperature higher than 500 ° C. It is preferable that the substance be capable of
If this condition is satisfied, there is no possibility that H _{2 O} has been completely generated or released of H _{2 O} from occurring substance or to release the phosphor paste firing step, also generate or release of H _{2 O} in the sealing step In addition, it is possible to generate or release H ₂ O in an environment during driving of a PDP that is considered to have energy of 500 ° C. or higher.

Examples of the substance that generates or releases H ₂ O include boehmite (Al ₂ O ₃ .H ₂ O or AlO (OH)) and gibbsite (Al ₂ O ₃ .3H ₂ O). Boehmite and gibbsite can be used alone or in combination (including mixtures). Boehmite and gibbsite can generate or release H ₂ O at a heating temperature of 500 ° C. or higher.

  Examples of the solvent contained in the phosphor paste include water, an organic solvent, or a mixture of water and an organic solvent. Any known organic solvent can be used as appropriate. As the binder (binder resin), known ones can be appropriately adopted, and one kind or a combination of two or more kinds can be used.

  From the results of experimental examples of the examples described later, the boehmite content is preferably 5 parts by weight or less per 100 parts by weight of the total of the phosphor and boehmite. Exceeding 5 parts by weight is not preferable because the content of boehmite in the phosphor material increases and the emission intensity tends to decrease greatly.

  EXAMPLES Hereinafter, although an Example demonstrates this invention, this invention is not limited to these.

[Example 1]
A phosphor material was obtained by mixing 5 parts by weight of boehmite with 95 parts by weight of the blue phosphor so that the content of boehmite in the phosphor material was 5% by weight. BaMgAl ₁₀ O ₁₇ : Eu was used as the blue phosphor (phosphor powder). This phosphor material was designated as Example 1. The boehmite used in this example is a transparent or white powder of 2 to 3 μm.

In contrast, the same blue phosphor (BaMgAl ₁₀ O ₁₇ : Eu) used in Example 1 was used as it was without mixing boehmite, and this was used as Comparative Example 1.

(Generated gas analysis of each fired product obtained from Example 1 and Comparative Example 1—H ₂ O generation amount)
A phosphor paste was obtained by mixing 100 parts by weight of the phosphor material of Example 1 and 60 parts by weight of a solvent and a binder (amount obtained by combining the solvent and the binder). This phosphor paste was applied to a glass holder, dried, and then fired (500 ° C., 5 min) to obtain a fired product of the phosphor paste (hereinafter referred to as “phosphor paste fired product”). The solvent used was ethyl acetate and the binder was ethyl cellulose. In addition, the same solvent and binder were used also about the Example mentioned later.

  The phosphor material of Comparative Example 1 was treated in the same manner to obtain a phosphor paste fired product (phosphor paste fired body).

Each phosphor paste fired product was analyzed for evolved gas by TPD-MS (Temperature Programmed Desorption-Mass Spectroscopy) method. Among decomposition components generated during heating, a component having a mass number of 18 (H ₂ O) was detected by a mass spectrometer. The result is shown in FIG.

  In addition, GC / MSQP5050A (6) of Shimadzu Corporation was used for the MS device constituting the TPD-MS device, and TRC special heating furnace SSMALL-5 was used for the heating device. As a temperature condition at the time of TPD-MS measurement, a condition of heating to 1000 ° C. at a temperature rising rate of 20 ° C./min was used.

As is clear from the results of FIG. 1, each phosphor paste fired product of Example 1 containing boehmite showed about 45 times the strength of the phosphor paste fired product of Comparative Example 1 not containing boehmite. . That is, by containing boehmite, it can be confirmed that a large amount of H ₂ O is generated from the fired phosphor paste product.

From this result, it can be seen that even after baking at 500 ° C. for forming the phosphor film, H ₂ O is surely generated from the phosphor paste fired product, and boehmite is a substance that generates or releases H ₂ O. It turns out that it is suitable.

Further, from the result of FIG. 1, the temperature of the main peak of water desorption from the phosphor paste fired product of Example 1 is about 570 ° C. (in the range of about 500 to 700 ° C.), and under the heating temperature up to 700 ° C. It was confirmed that 90% or more of moisture (H ₂ O) was desorbed.

(Thermogravimetric / differential thermal analysis of boehmite)
Thermogravimetric / differential thermal analysis (TG-DTA) was performed on the boehmite used in this example, and the weight change of the sample was measured while changing the temperature. The result is shown in FIG. As can be seen from FIG. 2, there is a weight loss of about 2% (1.98%) from about 400 ° C. to about 515 ° C. (398.9 to 514.8 ° C.), and further about 515 ° C. to about 594 ° C. (514 It was confirmed that a weight loss of about 13% (12.88%) occurred from 0.8 to 593.7 ° C.).

In addition to the generated gas analysis result of the phosphor paste fired product described above, from the results of the thermogravimetric / differential thermal analysis results of this boehmite, a large amount of H ₂ O generated from the phosphor paste fired product is not obtained from the blue phosphor. It can be seen that it is generated from boehmite that has undergone a thermal decomposition reaction (dehydration reaction).

[Examples 2 and 3]
Unlike Example 1 in which the content of boehmite in the phosphor material is 5% by weight, in Examples 2 and 3, the content of boehmite was adjusted to 1% by weight and 10% by weight, respectively.
That is, each phosphor material was obtained by mixing 1 part by weight of boehmite with 99 parts by weight of the blue phosphor or 10 parts by weight of boehmite with 90 parts by weight of the blue phosphor. These were designated as Example 2 (containing 1 part by weight of boehmite) and Example 3 (containing 10 parts by weight of boehmite), respectively. Other manufacturing procedures are the same as those in the first embodiment.

(Measurement of luminescence characteristics of each phosphor paste fired product obtained from Examples 1 to 3 and Comparative Example 1—effect of boehmite content)
Also in Example 2 and Example 3, a phosphor paste fired product was obtained by firing treatment in the same manner as in Example 1 described above.

  Each phosphor paste fired product obtained from Examples 1 to 3 and Comparative Example 1 was irradiated with vacuum ultraviolet rays to determine the emission intensity of each, and the influence of the emission characteristics due to the boehmite content was confirmed. The result is shown in FIG. That is, the emission intensity of each phosphor paste fired product was 94.9% in Example 2 (containing 1 part by weight of boehmite) and 100% in Example 1 (5 wt. Boehmite), compared to 100% in Comparative Example 1 (not containing boehmite). Part) was 85.7%, and Example 3 (containing 10 parts by weight of boehmite) was 73.5%.

  From the results shown in FIG. 3, it was confirmed that when the boehmite was 5 parts by weight or less per 100 parts by weight of the total of the blue phosphor and boehmite, an emission intensity of 80% or more was obtained.

(Life characteristics of each phosphor paste fired product of Examples 1 to 3 and Comparative Example 1-Influence of boehmite content)
The phosphor paste fired products of Examples 1 to 3 and Comparative Example 1 were irradiated with vacuum ultraviolet rays for 30 hours, and a temporal deterioration test of the emission intensity was performed. The results are shown in Table 1 and FIG. FIG. 4 shows the result of calculating the relative light emission intensity of each phosphor material when the light emission intensity of Comparative Example 1 is 100%.

As is clear from FIG. 4, the deterioration characteristics of the respective phosphor materials due to the difference in boehmite content were not changed. In other words, although there is a report such as deterioration when H ₂ O is present in the conductive layer of the blue phosphor, the phosphor is not accelerated and deteriorated by introducing boehmite, and there is no problem in the lifetime of the phosphor. I understood.

[Examples 4 to 6]
1 part by weight of boehmite was mixed with 99 parts by weight of the green phosphor so that the content of boehmite in the phosphor material was 1% by weight to obtain a phosphor material. As the green phosphor (phosphor powder), Zn ₂ SiO ₄ : Mn was used. This phosphor material was referred to as Example 4.

  In addition, 5 parts by weight of boehmite is mixed with 95 parts by weight of green phosphor, or 10 parts by weight of boehmite with respect to 90 parts by weight of green phosphor so that the content of boehmite becomes 5% by weight and 10% by weight, respectively. Each phosphor material was obtained in the same procedure as in Example 4 except that. These were designated as Example 5 (containing 5 parts by weight of boehmite) and Example 6 (containing 10 parts by weight of boehmite), respectively.

For these, the same green phosphor (Zn ₂ SiO ₄ : Mn) used in Examples 4 to 6 was used as it was without mixing boehmite, and this was used as Comparative Example 2.

(Measurement of luminous characteristics of each phosphor paste fired product obtained from Examples 4 to 6 and Comparative Example 2-influence of boehmite content)
A phosphor paste was obtained by mixing 100 parts by weight of the phosphor material of Example 4 and 60 parts by weight of a solvent and a binder (a total amount of the solvent and the binder). Subsequently, a phosphor paste fired product was obtained by firing treatment in the same manner as in Example 1 described above. In addition, the phosphor materials of Examples 5 and 6 and Comparative Example 2 were treated in the same manner to obtain a phosphor paste fired product.

  Each phosphor paste fired product obtained from Examples 4 to 6 and Comparative Example 2 was irradiated with vacuum ultraviolet rays to determine the emission intensity of each, and the influence of the emission characteristics due to the boehmite content was confirmed. The result is shown in FIG. That is, the emission intensity of each phosphor paste fired product was 94.2% in Example 4 (containing 1 part by weight of boehmite) and 100% in Comparative Example 2 (containing no boehmite), and Example 5 (5 wt. Boehmite). Part) was 80.7%, and Example 6 (containing 10 parts by weight of boehmite) was 68.7%.

  From the results of FIG. 5, it was confirmed that when the boehmite was 5 parts by weight or less per 100 parts by weight of the total of the green phosphor and boehmite, the emission intensity of 80% or more was obtained.

[Examples 7 to 9]
A phosphor material was obtained by mixing 1 part by weight of boehmite with 99 parts by weight of the red phosphor so that the content of boehmite in the phosphor material was 1% by weight. As the red phosphor (phosphor powder), (Y, Gd) BO ₃ : Eu was used. This phosphor material was designated as Example 7.

  In addition, 5 parts by weight of boehmite is mixed with 95 parts by weight of the red phosphor or 10 parts by weight of boehmite with respect to 90 parts by weight of the red phosphor so that the content of boehmite becomes 5% by weight and 10% by weight, respectively. Each phosphor material was obtained in the same procedure as in Example 7 except that. These were designated as Example 8 (containing 5 parts by weight of boehmite) and Example 9 (containing 10 parts by weight of boehmite), respectively.

On the other hand, the same red phosphor ((Y, Gd) BO ₃ : Eu) used in Examples 7 to 9 was used as it was without mixing boehmite as Comparative Example 3.

(Measurement of luminous characteristics of each phosphor paste fired product obtained from Examples 7 to 9 and Comparative Example 3-Influence of boehmite content)
A phosphor paste was obtained by mixing 100 parts by weight of the phosphor material of Example 7 and 60 parts by weight of a solvent and a binder (a total amount of the solvent and the binder). Subsequently, a phosphor paste fired product was obtained by firing treatment in the same manner as in Example 1 described above. Further, the phosphor materials of Examples 8 and 9 and Comparative Example 3 were treated in the same manner to obtain a phosphor paste fired product.

  Each phosphor paste fired product obtained from Examples 7 to 9 and Comparative Example 3 was irradiated with vacuum ultraviolet rays to determine the emission intensity of each, and the influence of the emission characteristics due to the boehmite content was confirmed. The result is shown in FIG. That is, the emission intensity of each phosphor paste fired product was 87.4% in Example 7 (containing 1 part by weight of boehmite) and 100% in Comparative Example 3 (containing no boehmite), and Example 8 (5 wt. Boehmite). Part) was 70.0%, and Example 9 (containing 10 parts by weight of boehmite) was 46.0%.

  From the results of FIG. 6, it was confirmed that when the boehmite was 5 parts by weight or less per 100 parts by weight of the total of the red phosphor and boehmite, a light emission intensity of 70% or more was obtained.

  Note that the terms and expressions used in this specification are merely explanatory and are not restrictive, and do not exclude terms and expressions equivalent to the above terms and expressions.

Graph generating gas analysis results (H 2 _O emissions) for each phosphor paste baked products of Example 1 and Comparative Example 1. The graph which shows the thermogravimetric / differential thermal analysis result of boehmite. The graph which shows the relationship between the luminescent property about each phosphor paste baking goods of Examples 1-3 and Comparative Example 1, and boehmite content. The graph which shows the relationship between the lifetime special characteristic about each fluorescent substance paste baking goods of Examples 1-3 and the comparative example 1, and boehmite content. The graph which shows the relationship between the luminescent property and boehmite content about each fluorescent substance paste baking goods of Examples 4-6 and Comparative Example 2. FIG. The graph which shows the relationship between the luminescent property and boehmite content about each fluorescent substance paste baking goods of Examples 7-9 and Comparative Example 3. FIG.

Claims (11)

A phosphor material for a plasma display panel,
A phosphor,
A substance that generates or releases H ₂ O in an environment during driving of the plasma display panel;
It is characterized by containing,
Phosphor material. A phosphor material used for forming the phosphor film of a plasma display panel having a discharge cell in which an electrode, a phosphor film, and a gas medium are sealed between a pair of substrates,
Containing a phosphor and a substance that generates or releases H ₂ O in the discharge cell,
Phosphor material. Substance that generates or releases of H 2 _O is characterized by a substance capable of generating or releasing of H _{2 O} after firing for forming at least a phosphor layer,
The phosphor material according to claim 1 or 2. The substance that generates or releases H ₂ O is boehmite or / and gibbsite,
The phosphor material according to any one of claims 1 to 3. A phosphor material for a plasma display panel,
Containing phosphor and boehmite or / and gibbsite,
Phosphor material. It contains 5 parts by weight or less of boehmite per 100 parts by weight of the total of phosphor and boehmite,
The phosphor material according to claim 4 or 5. It contains the phosphor material according to any one of claims 1 to 6, a solvent, and a binder,
Phosphor paste. The phosphor material according to any one of claims 1 to 6 or the phosphor paste according to claim 7 is molded and fired,
Phosphor film. The phosphor film according to claim 8 is formed on an inner surface of a discharge cell between ribs on a substrate,
Plasma display panel. A method of manufacturing a plasma display panel having a discharge cell in which an electrode, a phosphor film, and a gas medium are sealed between a pair of substrates,
The phosphor material according to any one of claims 1 to 6 or the phosphor paste according to claim 7 is used to form the phosphor film, and to generate or release H ₂ O contained in the phosphor film. Characterized in that it has a phosphor film forming step in which the amount is adjusted for each RGB cell of the plasma display panel,
A method for manufacturing a plasma display panel. A method of manufacturing a plasma display panel having a discharge cell in which an electrode, a phosphor film, and a gas medium are sealed between a pair of substrates,
Forming a phosphor film capable of generating or releasing H ₂ O in the discharge cell, and the phosphor film generates H ₂ O for each RGB cell of the plasma display panel. Or the amount to be released is adjusted,
A method for manufacturing a plasma display panel.

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