JP2007141924A - Mask storage container opening apparatus and aligner - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a mask storage container opening apparatus, or the like for surely disengaging the upper and the lower lids in a mask storage device. <P>SOLUTION: Pieces of mask storage container opening apparatus 18, 30 separate a mask storage container that stores a mask and moves in the atmospheric environment and vacuum environment, into a base member 2b for placing the mask and a lid member 2a for covering the mask in the vacuum environment. The pieces of mask storage container opening apparatus 18, 30 comprise a mask conveyance for placing and conveying the mask storage container; a lid material engaging part 18b for engaging and placing the lid member; and a base member pressor 33a for pressing a base member 2b toward a mask-carrying device, thus making the lid member latch by the lid member material engaging part 18b, lowering the base member 2b from the mask conveyance, and making the base member 2b separated from the lid member 2a. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a mask storage container opening device that stores a reticle and opens a mask storage container that moves between an atmospheric environment and a vacuum environment, and an exposure apparatus including the mask storage container opening device.

  In recent years, along with miniaturization of semiconductor integrated circuits, a projection lidography apparatus using an EUV (Extreme Ultra Violet) with a shorter wavelength has been developed in order to improve the resolving power of an optical system limited by the light diffraction limit. . This technique is expected as a technique for obtaining a resolving power with a line width of 70 nm or less. Since EUV light is also absorbed by air, it is necessary to maintain a high degree of vacuum in the lens barrel, and a special device is required for the mask (reticle) transport system. The reticle used in the EUV exposure apparatus is a reflection type, but unlike a mask in an exposure apparatus using ordinary ultraviolet rays, a pellicle film cannot be used, so that the pattern surface is exposed. Therefore, it is necessary to protect the pattern surface from foreign matter or dust during mask transport and storage.

For this reason, a mask storage container called a clean filter pot (CFP) is used for mask conveyance. The mask storage container includes an upper cover and a lower cover made of aluminum, and the mask is stored in the mask storage container by covering the upper cover with the lower cover while the mask is placed on the lower cover.
The clean filter pod accommodates a mask, moves back and forth between the atmospheric environment and the vacuum environment, and takes out the mask accommodated therein in the vacuum environment, thereby preventing foreign matter or dust from being attached during conveyance.
JP-A-11-074182

  However, since the clean filter pod goes back and forth between a vacuum state and the atmosphere, a force is applied to the upper lid and the lower lid due to a pressure difference, and an adsorption force may be generated between the upper lid and the lower lid. For this reason, the upper lid and the lower lid may not be removed and the mask may not be taken out. The process of removing the upper and lower lids and taking out the mask is performed in a vacuum state, so if an error that prevents the mask from being removed occurs, the error must be cleared once at atmospheric pressure, and manufacturing is performed for a long time. There was a fear that the line had to be stopped.

  The present invention has been made in view of the above-described circumstances, and an object of the present invention is to provide a mask storage container opening device or the like that allows an upper lid and a lower lid to be surely removed in a mask storage device.

In order to solve the above problems, the following means are employed in the mask container opening device and the exposure apparatus according to the present invention.
In order to solve the above-described problem, the first invention will be described with reference to a drawing showing an embodiment. The first invention stores a mask storage container (2,) that stores the mask (1) and moves between an atmospheric environment and a vacuum environment. 52) is a mask container opening device (18, 30, 60) for separating the base member (2b, 52b) on which the mask is placed and the lid member (2a, 52a) covering the mask in a vacuum environment. The mask transporting part (16) for mounting and transporting the mask storage container, the lid member locking part (18b) for locking the lid member and mounting the lid member, and the base member to the mask transporting device And a base member pressing portion (33a, 62k) that presses toward the base member, the lid member is locked to the lid member locking portion, and the base member is lowered by the mask transporting portion, so that the base member and the lid member are I was allowed to separate
With this configuration, since the base member and the lid member are reliably separated, there is no trouble that the mask cannot be taken out, and the production line can be operated smoothly.

Moreover, in what is provided with the cover member press part (33b, 62j) which presses a cover member (2a, 52a) toward a cover member latching | locking part (18b), it can prevent that a cover member jumps up.
In addition, in the case where the base member pressing portion (33a, 62k) and the lid member pressing portion (33b, 62j) are moved up and down by the same vertical drive portion (40, 61), the mask storage container can be mounted with a simple device. Can be separated.
Further, in the case where the first elastic portion (32b, 62g) that can be deformed in the vertical direction is provided between the lid member pressing portion (33b, 62j) and the vertical drive portion (40, 61), the base is driven by the vertical drive portion. When the power in the downward direction is transmitted to the member pressing portion and the lid member pressing portion, the first elastic portion is deformed, so that the lid member pressing portion can be stopped at the same position.
Moreover, in the thing provided with the 2nd elastic part (32a, 62h) which can deform | transform in an up-down direction between a base member press part (33a, 62k) and an up-down drive part (40, 61), a base member press part and The base member can be clamped with an appropriate force by the mask transfer unit.

In the second invention, the exposure apparatus (19) is provided with the mask container opening device of the first invention on the mask transport path (15).
According to the present invention, the reliability of a production line for semiconductor elements and the like can be increased.

  In addition, in order to explain this description in an easy-to-understand manner, the description has been made in association with the drawings showing one embodiment, but it goes without saying that the present invention is not limited to the embodiment.

According to the present invention, the following effects can be obtained.
In a vacuum environment, a mask storage container opening device that separates a base member and a lid member includes a mask transport section, a lid member locking section, and a base member pressing section, and the lid member is engaged with the lid member locking section. Since the base member and the lid member are separated by stopping and lowering the base member by the mask transport unit, the base member can be satisfactorily used even when the base member and the lid member are adsorbed. And the lid member can be separated. Thereby, a manufacturing line can be operated smoothly.
Therefore, the operating rate of a production line for semiconductor elements can be improved.

Embodiments of a mask container opening device and an exposure apparatus according to the present invention will be described below with reference to the drawings.
FIG. 1 is a schematic diagram showing the relationship between a reticle 1, a clean filter pot 2 that is a reticle holding device, and a reticle carrier 3. FIG. 2 is an assembly diagram (cover 3b is drawn transparently) showing a state in which the reticle 1 is stored in the clean filter pot 2 and further stored in the reticle carrier 3. FIG.
The reticle 1 (mask) is stored and protected in a clean filter pot 2 (CFP) having an upper lid 2a and a lower lid 2b so as to be sandwiched between the upper lid 2a and the lower lid 2b. Further, the clean filter pot 2 is housed in a reticle carrier 3 (reticle sifter pod: also referred to as RSP) having a base 3a and a cover 3b.
The upper lid 2a is provided with two protrusions 2e on the left and right in the drawing. This is for separating the upper lid 2a and the lower lid 2b by hooking and holding this portion on the holding member and lowering the lower lid 2b downward.
Note that a plurality of clean filter pots may be stored in the reticle carrier 3, but in the following description of the embodiment, an example in which one clean filter pot is stored will be described.

FIG. 3 is a schematic diagram showing an outline of the reticle transport apparatus and the exposure apparatus.
The reticle 1 transported from the outside is stored in an atmospheric reticle stocker 11. Or it is carried in the state accommodated in the atmospheric reticle stocker 11. Then, the atmospheric robot 12 carries it into the reticle carrier opener 13 and takes out the clean filter pot from the reticle carrier 3 into the cleaning atmosphere in the reticle carrier opener 13. Thereafter, the clean filter pot is taken out by the atmospheric robot 14 and carried into the load lock chamber 15. The passages such as the load lock chamber 15 including the atmospheric robot 14 and the reticle carrier opener 13 are in a cleaning atmosphere.

Two doors 15 a and 15 b are attached to the load lock chamber 15. Vacuuming is performed in the load lock chamber 15, and the load lock chamber 15 and the clean filter pot 2 are evacuated. After the evacuation is completed, the clean filter pot 2 is taken out from the load lock chamber 15 by the vacuum robot 16.
Specifically, when the load lock chamber 15 is open to the atmosphere, the door 15 b is closed, the door 15 a is opened, and the clean filter pot 2 is carried from the reticle carrier opener 13 by the atmospheric robot 14. Thereafter, the door 15a is closed and evacuation is performed. After the evacuation is completed, the door 15b is opened, and the vacuum robot 16 takes out the clean filter pot 2 into the vacuum region.

The clean filter pot 2 carried into the vacuum region is carried into the vacuum reticle library 17 where it is temporarily stored. Actually, when the reticle 1 is used in the exposure apparatus 19, the clean filter pot 2 containing the reticle 1 is taken out from the vacuum reticle library 17 by the vacuum robot 16 and carried into the CFP opener 18. The CFP opener 18 separates the upper cover 2a from the clean filter pot 2 from the reticle 1 and the lower cover 2b.
Thereafter, the reticle 1 is transported to the reticle stage 19a of the exposure apparatus 19 by the vacuum robot 16 while being placed on the lower lid 2b. Then, it is chucked by the electrostatic chuck of the reticle stage 19a, separated from the lower lid 2b, and used for exposure. After being separated, the lower lid 2 b is returned to the CFP opener 18 by the vacuum robot 16, and waits until the exposure using the reticle 1 is completed while being held by the vacuum robot 16.

  When the exposure using the reticle 1 is completed, the vacuum robot 16 conveys the lower lid 2b to the reticle stage 19a. When the chucking of the electrostatic chuck is released while stopped at a predetermined position, the reticle 1 is placed on the lower lid 2b. In this state, the vacuum robot 16 transports the lower lid 2b to the CFP opener 18, and covers the lower lid 2b with the upper lid 2a previously separated in the CFP opener 18. Thereafter, the vacuum robot 16 returns the clean filter pot 2 to the vacuum reticle library 17 for storage.

When the clean filter pot 2 is taken out from the vacuum region, the vacuum filter 16 puts the clean filter pot 2 in the vacuum reticle library 17 into the load lock chamber 15 where the load lock chamber 15 is set to atmospheric pressure. After the atmospheric pressure is reached, the clean filter pot 2 is returned to the reticle carrier opener 13 by the atmospheric robot 14 and stored in the reticle carrier 3. Then, the reticle carrier 3 is stored in the atmospheric reticle stocker 11. An operator or a robot conveys a desired reticle carrier 3 stored in the atmospheric reticle stocker 11 to the outside.
In FIG. 3, the reticle carrier ID reader 20a that reads the identification code of the reticle carrier 3, the reticle ID reader 20b that reads the identification codes of the reticle 1 and the clean filter pot 2, and the temperature drop that occurs when the reticle 1 is evacuated. In order to compensate for this, a temperature compensation lamp 21 for adjusting the temperature of the reticle 1 is provided. Using the reticle carrier ID reader 20a and the reticle ID reader 20b, the information of the reticle 1, the clean filter pot 2 and the reticle carrier 3 is read, and the target reticle 1 is supplied to the exposure device 19 or taken out from the exposure device 19. The reticle 1 is stored in a predetermined clean filter pot 2 and reticle carrier 3.

FIG. 4 is a diagram showing an outline of the structure of the vacuum reticle library 17.
The vacuum reticle library 17 is a rack composed of a standing plate 17a and a horizontal plate 17b (the other standing plate 17a is not shown for easy understanding), and the reticle 1 is placed on each horizontal plate 17b. A clean filter pot 2 is placed. The reason why the cross section of each horizontal plate 17b is L-shaped is that the corner of the clean filter pot 2 is in a floating state, and the tip of the vacuum robot arm 16a is inserted into the lower portion of the lower lid 2b. This is because it is possible to easily scoop up 2b.

FIG. 5 is a schematic view showing the structure of the CFP opener 18 and the CFP forced separation mechanism 30. The upper cover 2a and the lower cover 2b of the clean filter pot 2 are separated by the CFP opener 18 and the CFP forced separation mechanism 30.
The CFP opener 18 is a one-stage rack including a standing plate 18a and a horizontal plate 18b (the standing plate 18a on the right side of the drawing is not shown for easy understanding). The protrusion 2e of the upper lid 2a is caught on the horizontal plate 18b so that the upper lid 2a can be hung down. The CFP opener 18 is provided with an alignment stage 22. As shown in the drawing, the alignment stage 22 can move in the X direction, the Y direction orthogonal to the X direction, and rotate (θ) about the Z direction perpendicular to these two directions.
The CFP forced separation mechanism 30 includes a support 31 and a flexure tip 33 a as a lower lid pressing portion, and the flexure tip 33 a is fixed to the support 31. The column 31 itself is connected to the vertical movement drive motor 40 and can move up and down. Note that the column 31 on the right side of the drawing is not shown for easy understanding.

FIG. 6 is a schematic view showing a state in which the reticle 1 is taken out in a state of being placed on the lower lid 2b in the CFP opener 18. As shown in FIG.
The clean filter pot 2 is lowered from above the horizontal plate 18b with the lower surface of the lower lid 2b supported by the tip of the vacuum robot arm 16a. Then, the protrusion 2e of the upper lid 2a is caught by the horizontal plate 18b. When the position of the vacuum robot arm 16a is further lowered, the lower lid 2b and the reticle 1 placed thereon are lowered as they are. Since the protrusion 2e is caught by the horizontal plate 18b, the upper lid 2a remains held on the horizontal plate 18b. Thereby, normally, separation of the upper lid 2a and the lower lid 2b on which the reticle 1 is placed is completed.
However, the upper lid 2a and the lower lid 2b, the clean filter pod 2 goes back and forth between the vacuum state and the atmosphere, so that there is a pressure difference between the upper lid 2a and the lower lid 2b, and the upper lid 2a and the lower lid 2b are stuck together. When a packing member such as an O-ring is provided between the upper lid 2a and the lower lid 2b so that dust does not enter the pod 2, the upper lid 2a and the lower lid 2b are adhered to each other due to the adhesive force of the O-ring. To do.
Thus, the flexure tip 33a of the CFP forced separation mechanism 30 is lowered downward, forcing the lower lid 2b downward and separating the upper lid 2a and the lower lid 2b. Thereafter, the lower lid 2b on which the reticle 1 is placed can be taken out by pulling the vacuum robot arm 16a in the direction of the arrow.

FIG. 7 is a diagram showing the process of separating the upper lid 2a and the lower lid 2b in more detail.
An opening 18 c is formed in the standing plate 18 a of the CFP opener 18. A flexure arm 32a of the CFP forced separation mechanism 30 extends through the opening 18c, and a flexure tip portion 33a is provided at the tip of the flexure arm 32a. Four flexure arms 32a and flexure tip portions 33a are provided so as to hold the lower lid 2b at four locations. The column 31 is connected to the vertical movement drive motor 40, and the column 31 itself moves up and down. The flexure arm 32a, the lecture front end portion 33a, and the support column 31 are made of a metal such as stainless steel. The shape, thickness, and width of the flexure arm 32a are appropriately determined so that the flexure arm 32a is easily elastically deformed to give a pressing force.

First, as shown in FIG. 7A, the CFP opener 18 is inserted into the clean filter pod 2 from the lateral direction (from the back to the front in the drawing) by the vacuum robot arm 16a.
When the clean filter pod 2 is inserted into the CFP opener 18, the lecture arm 32a and the flexure tip 33a are positioned at the upper end. In this state, in the vacuum robot arm 16a, the lower surface of the protrusion 2e of the upper lid 2a is above the upper surface of the horizontal plate 18b, and the upper surface of the lower lid 2b is lower than the lower surface of the flexure tip portion 33a. In this way, the clean filter pod 2 is inserted from the side.

Next, as shown in FIG. 7B, the vacuum robot arm 16a moves downward as indicated by an arrow. Thereby, the lower surface of the protrusion 2e of the upper lid 2a and the upper surface of the horizontal plate 18b come into contact with each other, and the upper lid 2a is locked.
Originally, the vacuum robot arm 16a moves further downward by a predetermined distance, so that the lower lid 2b separates itself from the upper lid 2a and the lower lid 2b, and the reticle 1 is placed on the vacuum robot arm 16a. Only the lower lid 2b should be placed.
However, there is a pressure difference between the upper lid 2a and the lower lid 2b and the upper lid 2a and the lower lid 2b are stuck together, or the upper lid 2a and the lower lid 2b are stuck together due to the adhesive force of the O-ring. Some of the upper lid 2a and the lower lid 2b are adsorbed by a magnetic force or the like.
In such a clean filter pod 2, the upper lid 2 a and the lower lid 2 b are not separated by the weight of the lower lid 2 b, so it is necessary to forcibly separate them using the CFP forced separation mechanism 30.

Therefore, as shown in FIG. 7C, the CFP forced separation mechanism 30 is moved downward as indicated by an arrow. As a result, the lower surface of the flexure tip portion 33a comes into contact with the upper surface of the lower lid 2b, and the lower lid 2b is sandwiched between the flexure tip portion 33a and the vacuum robot arm 16a.
Furthermore, as shown in FIG. 7 (D), the upper end 2a in a state of being stuck or attracted by a magnetic force by moving the flexure tip 33a and the vacuum robot arm 16a downward by a predetermined distance. And the lower lid 2b can be separated.
Further, by lowering only the vacuum robot arm 16a, the separation of the upper lid 2a and the lower lid 2b on which the reticle 1 is placed is completed (see FIG. 6).

FIG. 8 is a modification of the CFP forced separation mechanism 30.
An opening 18 c and an opening 18 d are formed in the standing plate 18 a of the CFP opener 18. A flexure arm 32a that presses the lower lid 2b extends to the opening 18c, and a flexure arm 32b that presses the protrusion 2e of the upper lid 2a extends to the opening 18d. A flexure tip portion 33b is provided at the tip of the flexure arm 32b. Four flexure arms 32b and flexure tip portions 33a are provided so as to hold the projection 2e at four locations. Similarly to the flexure arm 32a, the flexure arm 32b is also formed on the support 31 and is moved up and down by the up-and-down drive motor 40.
The reason why the protrusion 2e is pressed by the flexure arm 32b is that when the upper lid 2a and the lower lid 2b that are stuck or attracted by the magnetic force are separated by the flexure arm 32a, the upper lid 2a jumps up due to the impact of the separation. There is. This is for suppressing sound, dust, and the like generated by the upper lid 2a jumping up. Considering that the upper lid 2a jumps up, the shape, thickness, and width of the flexure arm 32b are appropriately determined so as to be easily elastically deformed to give a pressing force. Since the flexure arm 32b only prevents the upper lid 2a from jumping up, it is preferable that the flexure arm 32b bends better (easily elastically deformed) than the lecture arm 32a that separates the upper lid 2a and the lower lid 2b.

Next, a second embodiment of the CFP forced separation mechanism will be described.
FIG. 9 is a diagram illustrating a schematic configuration of the clean filter pot 52. FIG. 10 is a diagram showing the CFP forced separation mechanism 60.
The upper cover 52a of the clean filter pot 52 is provided with four protrusions 52f, and the protrusion 52f engages with the horizontal plate 18b of the CFP opener 18 described above so that the upper cover 52a can be lowered. Yes.
Further, when the upper lid 52a and the lower lid 52b are separated, a pressing region 52g is formed in the upper lid 52a in order to prevent the upper lid 52a from jumping up.
Further, the upper lid 2a is formed with a notch 52i so that the pressing area 52h of the lower lid 52b can be pressed from above.
In the four corners of the upper cover 52a of the clean filter pot 52, four magnetic members 42 are provided, on which the upper cover 52a and the lower cover 52b are attracted with a predetermined force by a magnetic force, and foreign matter such as dust does not adhere to the reticle 1 from the outside. As described above, a packing material 44 made of rubber, silicon rubber or the like is provided so as to surround the reticle 1.

The CFP forced separation mechanism 60 fixes four guides 60a for guiding the flat plate 60d, a ball screw 60b for moving the flat plate 60d up and down, and a drive motor 61 for driving the ball screw 60b to move the flat plate 60d up and down. It is provided on the substrate 10e.
Connected to the lower surface of the flat plate 60d are four arm portions 60f for pressing the pressing region 52g of the upper lid 52a and two arm portions 60g for pressing the pressing region 52h of the lower lid 52b. Yes. A coil spring 62g that is elastically deformed is attached to the tips of the four arm portions 60f, and a pressing member 62j that contacts the upper lid 52a is attached to the coil spring 62g. A coil spring 62h that is elastically deformed is attached to the tips of the two arm portions 60g, and a pressing member 62k that contacts the lower lid 52b is attached to the coil spring 62h.
The shapes and spring thicknesses of the coil springs 62g and 62h are appropriately determined so that the coil springs 62g and 62h are easily elastically deformed to give a pressing force. The coil spring 62g has a longer stroke (deformation length) than the coil spring 62h.

Next, the operation of the CFP forced separation mechanism 60 will be described.
First, in the vacuum robot arm 16a, the lower surface of the protrusion 52f of the upper lid 52a is higher than the upper surface of the horizontal plate 18b, and the upper surface of the lower lid 52b is lower than the lower surface of the flexure tip portion 33a. The clean filter pod 2 is inserted from the side.
When the vacuum robot arm 16a moves downward, the lower surface of the protrusion 52f of the upper lid 52a and the upper surface of the horizontal plate 18b come into contact with each other, and the upper lid 52a is locked.
Next, the CFP forced separation mechanism 60 is driven to lower the flat plate 60d. Thereby, the pressing member 62j provided at the tip of the four arm portions 60f is brought into contact with the pressing region 52g of the upper lid 52a. At the same time, the pressing member 62k provided at the tip of the two arm portions 60g is brought into contact with the pressing area 52h of the lower lid 52b.
Further, the vacuum robot arm 16a and the flat plate 60d of the CFP forced separation mechanism 60 are lowered in synchronization. As a result, the lower lid 52b moves downward while being sandwiched between the vacuum robot arm 16a and the pressing member 62k. On the other hand, since the upper lid 52a is locked while being sandwiched between the horizontal plate 18b and the pressing member 62j, the upper lid 52a and the lower lid 52b are separated.
Thus, the upper lid 52a and the lower lid 52b in a state of being adsorbed by magnetic force or the like can be satisfactorily separated. Further, the upper lid 52a can be prevented from jumping up when the upper lid 52a and the lower lid 52b are separated.

An outline of the EUV exposure apparatus 19 is shown in FIG.
The EUV light emitted from the EUV light source S forms an illumination area on an elongated arc on the reticle R via the illumination optical systems D, IR1, IR2, IR3, and IR4. Light from the illuminated pattern of the reticle R is transmitted through projection optical systems PR1, PR2, PR3, and PR4 including a plurality of reflecting mirrors. A reticle pattern image is formed on the wafer W. The reticle R is held on the reticle stage and the wafer W is held on the wafer stage. The entire pattern image of the reticle R is transferred to the wafer W by scanning the reticle stage and the wafer stage. Here, illustration of the reticle stage and the wafer stage is omitted.

  Although the embodiment of the present invention has been described above, the operation procedure shown in the above-described embodiment, or the shapes and combinations of the constituent members are examples, and the process is within the scope not departing from the gist of the present invention. Various changes can be made based on conditions and design requirements.

It is the schematic which shows the relationship between a reticle, a clean filter pot, and a reticle carrier. FIG. 5 is an assembly diagram illustrating a state in which a reticle is stored in a clean filter pot and further stored in a mask carrier. It is a schematic diagram which shows the outline | summary of a reticle conveyance apparatus and exposure apparatus. It is a figure which shows the outline | summary of the structure of a vacuum mask library. It is a figure which shows the outline of a CFP opener and a CFP forced separation mechanism. It is a figure which shows the operation | movement which takes out a reticle on a CFP opener. It is the figure which showed the process which isolate | separates an upper cover and a lower cover. It is a modification of a CFP forced separation mechanism. It is a figure which shows other embodiment of a clean filter pot. It is a figure which shows other embodiment of a CFP forced separation mechanism. It is a schematic block diagram of an EUV exposure apparatus.

Explanation of symbols

1 ... reticle (mask)
2. Clean filter pot (mask storage container)
2a ... Upper lid (lid member)
2b ... Lower lid (base member)
15 ... Load lock chamber (mask transfer route)
16 ... Vacuum robot (mask transfer part)
18 ... Opener (mask storage container opening device)
18b ... Horizontal plate (lid member locking part)
19 ... Exposure device 30 Forced separation mechanism (mask storage container opening device)
32a ... Flexure arm (second elastic part)
32b ... Flexure arm (first elastic part)
33a ... Flexure tip (base member pressing part)
33b ... Flexure tip (lid member pressing part)
40. Vertical motion drive motor (vertical drive unit)
52 ... Clean filter pot (mask storage container)
52a ... Upper lid (lid member)
52b ... Lower lid (base member)
60 ... Forced separation mechanism (mask container opening device)
61 ... Drive motor (vertical drive unit)
62g ... Coil spring (first elastic part)
62h ... Coil spring (second elastic part)
62j ... Pressing member (lid member pressing portion)
62k ... pressing member (base member pressing portion)

Claims (6)

A mask container opening device that separates a mask container that houses a mask and moves between an atmospheric environment and a vacuum environment into a base member on which the mask is placed and a lid member that covers the mask in a vacuum environment. ,
A mask transport section for placing and transporting the mask container; and
A lid member latching portion for latching the lid member and placing the lid member;
A base member pressing portion that presses the base member toward the mask transfer device;
With
A mask container opening device characterized in that the lid member is locked to the lid member locking portion, and the base member is lowered by the mask transport portion to separate the base member and the lid member. .   The mask container opening device according to claim 1, further comprising a lid member pressing portion that presses the lid member toward the lid member locking portion.   The mask container opening device according to claim 2, wherein the base member pressing portion and the lid member pressing portion are moved up and down by the same vertical driving portion.   4. The mask container opening device according to claim 3, further comprising a first elastic portion that is deformable in a vertical direction between the lid member pressing portion and the vertical drive portion.   The mask container opening device according to claim 4, further comprising a second elastic portion that is deformable in a vertical direction between the base member pressing portion and the vertical drive portion. An exposure apparatus comprising the mask container opening device according to claim 1 on a mask transport path.

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