JP2007101130A - Gas humidity controller - Google Patents

Gas humidity controller Download PDF

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JP2007101130A
JP2007101130A JP2005294241A JP2005294241A JP2007101130A JP 2007101130 A JP2007101130 A JP 2007101130A JP 2005294241 A JP2005294241 A JP 2005294241A JP 2005294241 A JP2005294241 A JP 2005294241A JP 2007101130 A JP2007101130 A JP 2007101130A
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gas
temperature
water
humidity
predetermined temperature
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JP4656647B2 (en
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Masaaki Ishikawa
正昭 石川
Daisuke Kato
大介 加藤
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Shinshu University NUC
Kotohira Kogyo KK
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Shinshu University NUC
Kotohira Kogyo KK
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a humidity controller of high accuracy and high speed response in micro flow because of needing humidity control gas of micro flow with no problem such as surface damage and blowoff of a surface material particularly in cultural properties and cell culture in view of a strong demand for gas of constant temperature and constant humidity in the fields of testing, manufacturing and storage. <P>SOLUTION: Dry gas is allowed to pass through a constant temperature part 20 to obtain dry gas of predetermined temperature. A part of the dry gas of predetermined temperature is allowed to pass through a humidifying part 22 using the water surface of water in the constant temperature part 20 to obtain saturated gas of predetermined temperature. The dry gas of predetermined temperature and the saturated gas of predetermined temperature are mixed to obtain target gas of predetermined temperature and predetermined humidity. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、恒温恒湿のガスを発生させる装置に関するものであり、特に流量が少ないガスを高精度に制御する装置に関わるものである。   The present invention relates to a device that generates a constant temperature and humidity gas, and particularly relates to a device that controls a gas having a low flow rate with high accuracy.

気体の湿度を制御する装置(以後「ガス調湿装置」という)は、環境試験装置や住宅をはじめ、決められた一定の湿度の気体が必要な局面で利用されている。   A device for controlling the humidity of gas (hereinafter referred to as “gas humidity control device”) is used in situations where a gas with a certain fixed humidity is required, such as an environmental test device and a house.

気体を調湿する方法は、分流法と二温法が従来から知られている。図4には、分流法の概要を示す。乾燥気体発生装置100で作った乾燥気体150を2つにわけ、一方152を飽和気体発生器110へ導入する。湿度飽和状態となった気体154を、乾燥気体150と混合し、目標湿度発生器120へ導入する。目標湿度発生器120では、気体を所定の温度にして、所定湿度の気体160を得る。湿度の調整は、飽和気体発生器110の温度を調整し、気体中の水蒸気の絶対量を調整することで行う。   As a method for adjusting the humidity of a gas, a shunt method and a two-temperature method are conventionally known. FIG. 4 shows an outline of the diversion method. The dry gas 150 made by the dry gas generator 100 is divided into two, while 152 is introduced into the saturated gas generator 110. The gas 154 that has become saturated with humidity is mixed with the dry gas 150 and introduced into the target humidity generator 120. In the target humidity generator 120, the gas is set to a predetermined temperature to obtain a gas 160 having a predetermined humidity. The humidity is adjusted by adjusting the temperature of the saturated gas generator 110 and adjusting the absolute amount of water vapor in the gas.

図5には二温法の概要図を示す。二温法では、乾燥気体発生装置100で作った乾燥気体150を全部飽和気体発生器110へ導入する。そして、湿度飽和状態の気体154を目標湿度発生器120へ導入する。目標湿度発生器120では、飽和気体154を所定温度にすることで所定湿度の気体160を得る。湿度の調節は飽和気体発生器110の温度で行う点は分流法と同じである。   FIG. 5 shows a schematic diagram of the two-temperature method. In the two-temperature method, all the dry gas 150 produced by the dry gas generator 100 is introduced into the saturated gas generator 110. Then, the saturated gas 154 is introduced into the target humidity generator 120. The target humidity generator 120 obtains a gas 160 having a predetermined humidity by setting the saturated gas 154 to a predetermined temperature. The humidity is adjusted at the temperature of the saturated gas generator 110 in the same manner as the shunt method.

また、分流法と二温法を組み合わせてより精度の高い調湿装置を得るものもある(特許文献1参照)。   Moreover, there exists what obtains a humidity control apparatus with higher precision by combining a diversion method and a two-temperature method (refer patent document 1).

特開平5−071776号公報JP-A-5-071776

これまで開示されてきた調湿装置のほとんどが、数百リットル/分程度の比較的大きな流量を得る調湿装置がほとんどである。しかし、精密機器や電子部品、材料の環境試験や、顕微生物。材料の精密測定器、文化財や光学装置、食品などの保管庫などの用途には、数十リットル/分程度の少ない流量ではあるものの、非常に精度よく調湿された気体を必要とする用途がある。   Most of the humidity control devices disclosed so far are mostly humidity control devices that obtain a relatively large flow rate of about several hundred liters / minute. However, environmental testing of precision instruments, electronic components and materials, and microbiology. For applications such as precision measuring instruments for materials, cultural assets and optical devices, food storage, etc., although the flow rate is as low as several tens of liters per minute, it requires a highly conditioned gas. There is.

特に文化財の保存や、細胞を培養するインキュベーターなどでは、大きな流量によって生じる強い風は、文化財の表面に物理的なダメージを与えたり、小さな細胞を吹き飛ばしてしまうなどの弊害がある。従って、このような分野では、むしろ少ない流量の調湿された気体の供給は望まれている。   Particularly in the preservation of cultural properties and incubators that culture cells, the strong wind generated by a large flow rate has the detrimental effect of causing physical damage to the surface of the cultural properties and blowing off small cells. Therefore, in such a field, it is desired to supply a conditioned gas with a rather small flow rate.

また、このような用途では、多種類の物のために、それぞれ異なる環境を用意する必要がある。つまり、大きな装置で集中的に一定の調湿気体を配給するのではなく、多くの小型の調湿装置の提供が必要である。   In such applications, it is necessary to prepare different environments for various types of objects. In other words, it is necessary to provide a large number of small humidity control devices instead of intensively distributing a constant humidity control gas with a large device.

この観点からは、従来の装置は提供できる流量規模が大きすぎ、したがって装置自体も大きすぎるという課題がある。   From this viewpoint, the conventional apparatus has a problem that the flow rate scale that can be provided is too large, and therefore the apparatus itself is too large.

調湿方法という観点からの課題としては次のような点があげられる。まず分流法では湿度調整の応答は速いものの、調湿の精度が悪いという課題がある。二温法は精度は高いものの、湿度の応答反応が遅いという課題がある。また、従来の分流法や二温法では、飽和気体発生器と目標湿度発生器の2箇所で温度を制御する必要があり、所定温度・所定湿度の気体を得るには複雑な制御を行わなければならなかったという課題があった。   The following points can be cited as problems from the viewpoint of the humidity control method. First, the shunt method has a problem that the humidity adjustment accuracy is poor, although the response of humidity adjustment is fast. Although the two-temperature method has high accuracy, there is a problem that the response of humidity is slow. In addition, in the conventional diversion method and the two-temperature method, it is necessary to control the temperature at two locations of the saturated gas generator and the target humidity generator, and complicated control must be performed to obtain a gas having a predetermined temperature and a predetermined humidity. There was a problem that had to be done.

本発明は、かかる課題を解決するために発想されたもので、小型で調湿の精度が高く、また調湿の応答速度も速い調湿装置を提供するものである。   The present invention has been conceived to solve such problems, and provides a humidity control apparatus that is small in size, has high humidity control accuracy, and has a high response speed of humidity control.

本発明は、1つの水温制御器で水温を制御し、その水温とほぼ同じ温度になるように制御された乾燥気体と湿潤気体を所定の比率で混合することで所定の湿度の気体を得る。   In the present invention, a water temperature is controlled by a single water temperature controller, and a gas having a predetermined humidity is obtained by mixing a dry gas and a wet gas, which are controlled to be substantially the same as the water temperature, at a predetermined ratio.

より具体的には以下の通りである。まず乾燥気体を所定温度の恒温槽の液体中に配したパイプを通過させ、所定温度の乾燥気体にする。   More specifically, it is as follows. First, a dry gas is passed through a pipe arranged in a constant temperature bath at a predetermined temperature to obtain a dry gas at a predetermined temperature.

次にこの乾燥気体の一部を前記恒温槽に貯めた水の液面に触れさせる。このようにすることで、所定温度の乾燥気体はその温度の飽和気体にすることができる。   Next, a part of the dry gas is brought into contact with the liquid level of the water stored in the thermostat. By doing in this way, the dry gas of predetermined temperature can be made into the saturated gas of the temperature.

最後に、この所定温度の飽和気体と所定温度の乾燥気体を所定の比率で混合することで、所定温度で所定湿度の気体を得る事ができる。   Finally, a gas having a predetermined humidity can be obtained at a predetermined temperature by mixing the saturated gas having the predetermined temperature and the dry gas having a predetermined temperature at a predetermined ratio.

本発明の特徴は、乾燥気体を所定温度にするために用いる恒温槽と、所定温度になった乾燥気体の一部に水分を与える恒温槽を兼用すなわち一体とする点にある。このような構成にすることにより、同一温度の乾燥気体と湿潤気体を小型の装置で得る事がでる。また、1の温度制御で乾燥気体と湿潤気体の両方の温度を制御することができるので、温度制御が非常に簡単になる。   A feature of the present invention resides in that a thermostatic bath used to bring the dry gas to a predetermined temperature and a thermostatic bath that gives moisture to a part of the dry gas that has reached the predetermined temperature are combined. By adopting such a configuration, it is possible to obtain dry gas and wet gas at the same temperature with a small apparatus. Further, since the temperature of both the dry gas and the wet gas can be controlled by the temperature control of 1, the temperature control becomes very simple.

そして同一温度の乾燥気体と湿潤気体であるので、調湿制御は2つの気体の混合比だけを制御すればよく、簡単で精度・応答速度に優れた調湿装置を提供することができる。   And since it is the dry gas and wet gas of the same temperature, humidity control should just control only the mixing ratio of two gas, and can provide the humidity control apparatus which was simple and excellent in the precision and the response speed.

(実施の形態)
図1に本発明の調湿装置の構成を示す。本発明の調湿装置は、冷却部10、容器14、ポンプ16、加熱制御装置18とこれらの間を配管されている気体通路(黒太線で示した)からなる。
(Embodiment)
FIG. 1 shows the configuration of the humidity control apparatus of the present invention. The humidity control apparatus of the present invention includes a cooling unit 10, a container 14, a pump 16, a heating control device 18, and a gas passage (shown by a thick black line) piped between them.

各部および気体通路の配管状態を気体の流れに沿って説明する。未調湿気体1は、気体通路入り口から気体通路内に導かれる。そして、冷却部10を通り冷却される。冷却部10はペルチェ素子もしくは低温氷等を用いることができる。低温氷は気体中の水分が徐々に氷となって表面に蓄積し、連続的な除湿は困難であるが、ペルチェ素子であれば着霜を間欠的若しくは連続的に除去できればいつまでも除湿が可能である。冷却された未調湿気体1はここで低温飽和気体2となる。   The piping state of each part and the gas passage will be described along the gas flow. The unconditioned moisture gas 1 is introduced into the gas passage from the gas passage entrance. And it cools through the cooling unit 10. The cooling unit 10 can use a Peltier element or low-temperature ice. In low-temperature ice, moisture in the gas gradually becomes ice and accumulates on the surface, and continuous dehumidification is difficult. However, if Peltier elements can remove frost intermittently or continuously, dehumidification is possible forever. is there. The cooled unconditioned gas 1 becomes a low-temperature saturated gas 2 here.

なお、化学的な水分吸着による除湿器で乾燥気体を得てもよい。すなわち、冷却部10の部分を化学的に水分を吸着させる手段で置き換える。具体的には、水素化カルシウム、過塩素酸マグネシウム、酸化アルミニウム、五酸化リン、シリカゲルまたはモレキュラーシーブ等の乾燥剤を単独、もしくは組み合わせて詰めたパイプやU字管を用いることができる。この場合は得られる乾燥気体は低温とは限らない。冷却部と化学吸着による除湿器を組み合わせて用いてもよい。以後の説明では冷却部10で得られた低温飽和気体で説明を続ける。   In addition, you may obtain dry gas with the dehumidifier by chemical moisture adsorption. That is, the cooling unit 10 is replaced by means for chemically adsorbing moisture. Specifically, a pipe or U-shaped tube filled with a desiccant such as calcium hydride, magnesium perchlorate, aluminum oxide, phosphorus pentoxide, silica gel, or molecular sieves alone or in combination can be used. In this case, the dry gas obtained is not necessarily low temperature. A cooling unit and a dehumidifier by chemical adsorption may be used in combination. In the following description, the description is continued with the low-temperature saturated gas obtained in the cooling unit 10.

容器14は、吸気口13と排気口15を有しており、中に水を貯めることができる。この水は温度を制御されており、中を通る気体通路と水とで恒温部20を形成する。また、水面と容器14の空間で加湿部22を形成する。   The container 14 has an intake port 13 and an exhaust port 15 and can store water therein. The temperature of this water is controlled, and the constant temperature portion 20 is formed by the gas passage passing through the water and the water. Further, the humidifying part 22 is formed by the water surface and the space of the container 14.

低温飽和気体2は、気体通路を通って、恒温部20へ入る。恒温部20は、水の中に気体通路が浸かっている。この水は、所望する所定温度になっている水である。この部分の気体通路は必要に応じて、ループ形状を有する事で、気体通路長を長くする事ができ、恒温部20の水と同じ温度にすることができる。また、恒温部20の水の中を通る気体通路は、ループ形状だけでなく、複数本の通路に分岐し、分岐された気体通路中の気体の流速を遅くする事で、所定の温度にしてもよい。分岐された気体通路は恒温部20を出る際に再び1本の気体通路にする。この温度は低温飽和気体2の温度より高いため、ここを流れる間に、高温乾燥気体3になる。   The low temperature saturated gas 2 enters the constant temperature part 20 through the gas passage. The thermostat 20 has a gas passage immersed in water. This water is water having a desired predetermined temperature. If necessary, the gas passage in this portion has a loop shape, so that the length of the gas passage can be increased, and the temperature can be the same as that of the water in the thermostat 20. In addition, the gas passage that passes through the water of the constant temperature portion 20 is not only in a loop shape, but is branched into a plurality of passages, and the gas flow rate in the branched gas passage is reduced to a predetermined temperature. Also good. The branched gas passage is made into one gas passage again when leaving the thermostat 20. Since this temperature is higher than the temperature of the low-temperature saturated gas 2, it becomes a high-temperature dry gas 3 while flowing therethrough.

この高温乾燥気体3は三方バルブ12によって分流し、一部は加湿部22へ(図中4参照)、残りはそのまま気体通路を進む(図中5参照)。   This high-temperature dry gas 3 is diverted by the three-way valve 12, a part thereof goes to the humidifying section 22 (see 4 in the figure), and the rest advances through the gas passage as it is (see 5 in the figure).

加湿部22は、容器14と恒温部20の水による水面によってできている。この閉空間内では、水の温度における飽和水蒸気状態になっている。高温乾燥気体3は三方バルブ12から分流して加湿部22にはいる。そして、この加湿部22内で、水の温度の飽和気体(高温飽和気体と呼ぶ)となる。   The humidification part 22 is made of the water surface of the container 14 and the constant temperature part 20 with water. In this closed space, it is in a saturated water vapor state at the temperature of water. The high-temperature dry gas 3 is diverted from the three-way valve 12 and enters the humidifying unit 22. And in this humidification part 22, it becomes the saturated gas (it calls high temperature saturated gas) of the temperature of water.

通常は高温飽和気体を得るには、水中に気体を吹き込む方法が取られるが、気体流量が少ない場合は静水圧が抵抗となり安定なガス流量が得られない。一方本発明は所定温度の飽和水蒸気雰囲気の中に恒温乾燥気体を吹き込むので、安定な気体流量を得る事ができる。   Usually, in order to obtain a high-temperature saturated gas, a method of blowing a gas into water is taken, but when the gas flow rate is small, the hydrostatic pressure becomes resistance and a stable gas flow rate cannot be obtained. On the other hand, since the constant temperature dry gas is blown into a saturated steam atmosphere at a predetermined temperature, the present invention can obtain a stable gas flow rate.

三方バルブ12で分流しなかった高温乾燥気体5は、気体通路を通る。気体通路は、再び加湿部22に入る。ここでは、高温乾燥気体は、気体通路中を通るので、温度は一定に保たれるが、湿度は変化しない。   The high-temperature dry gas 5 that has not been diverted by the three-way valve 12 passes through the gas passage. The gas passage enters the humidification unit 22 again. Here, since the high-temperature dry gas passes through the gas passage, the temperature is kept constant, but the humidity does not change.

加湿部22を出た高温飽和気体6と、三方バルブ12で分流しなかった高温乾燥気体7は合流し、一緒になることで目標の所望気体8となり、気体通路の出口から排出される。得られる所望気体8の湿度の調整は、三方バルブ12を調整し、加湿部22へ流れる高温乾燥気体4の量を調整することで行う。   The high-temperature saturated gas 6 that has exited the humidifying section 22 and the high-temperature dry gas 7 that has not been split by the three-way valve 12 merge together to become the target desired gas 8 and are discharged from the outlet of the gas passage. The humidity of the desired gas 8 to be obtained is adjusted by adjusting the three-way valve 12 and adjusting the amount of the high-temperature dry gas 4 flowing to the humidifying unit 22.

恒温部20の水の温度調整は、まずポンプ16で、恒温槽内の水を外部に導き、それを冷却装置17で冷やす。本実施の形態では冷却部10を経由させる。このように冷却部10と水の冷却装置17を兼ねることで、調湿装置全体の小型化が可能となる。   To adjust the temperature of the water in the constant temperature unit 20, first, the water in the constant temperature bath is guided to the outside by the pump 16, and is cooled by the cooling device 17. In this embodiment, the cooling unit 10 is used. Thus, the cooling unit 10 and the water cooling device 17 can be combined to reduce the size of the entire humidity control device.

冷却装置17で冷やされた水を加熱制御装置18で加熱し、所望の温度にする。このように一度冷やした水を温めることで、水の温度を上げることも下げることも可能になる。加熱制御装置18は、恒温部20の水の温度をモニターしており、その水温に基づいて加熱量を調整する。もちろんペルチェ素子の投入電力を調整してもよい。また、ポンプ16の流量も制御してもよい。つまり、加熱制御装置18は、恒温部20の水の温度調整を司っており、加熱、冷却、流速の1つあるいは、複数を制御することで、水の温度を一定に保つ1の温度制御装置である。   The water cooled by the cooling device 17 is heated by the heating control device 18 to a desired temperature. By warming the water once cooled in this way, it becomes possible to raise or lower the temperature of the water. The heating control device 18 monitors the temperature of the water in the constant temperature unit 20 and adjusts the heating amount based on the water temperature. Of course, the input power of the Peltier element may be adjusted. The flow rate of the pump 16 may also be controlled. In other words, the heating control device 18 controls the temperature of the water in the constant temperature unit 20, and is one temperature control that keeps the temperature of the water constant by controlling one or more of heating, cooling, and flow velocity. Device.

加熱制御装置18で所定温度にした水を加湿用シャワー24で恒温部20の水面に散布(26)する。ここで、水面への散布はまさに加湿部22において行われるので、加湿部内の湿度は所定温度における飽和水蒸気状態となる。また、恒温槽の温度を変化させた場合にもすばやく湿度を追従させることができる。   Water heated to a predetermined temperature by the heating control device 18 is sprayed (26) on the water surface of the constant temperature unit 20 by the humidifying shower 24. Here, since spraying on the water surface is just performed in the humidification part 22, the humidity in the humidification part becomes a saturated water vapor state at a predetermined temperature. Further, the humidity can be quickly followed even when the temperature of the thermostatic chamber is changed.

図では省略したが、本調湿装置は、適当な断熱材によって外側を被い、熱の流出・流入を遮断することで、より精度の高い温度制御をすることが可能になる。また、内部の水は湿潤気体として排出されるので、外から供給してやる必要がある。そのための水位センサと水分供給用パイプを容器内部に設ければ、水の補給の際に容器14を開封する必要もない。同様に、内部の水を交換するたの、排水口と排水パイプを容器14に設けておけば、保守も容易にできる。   Although not shown in the figure, the humidity control apparatus can be controlled with higher accuracy by covering the outside with an appropriate heat insulating material and blocking outflow / inflow of heat. Also, since the water inside is discharged as a wet gas, it is necessary to supply it from the outside. If a water level sensor and a water supply pipe for this purpose are provided inside the container, it is not necessary to open the container 14 when replenishing water. Similarly, if the container 14 is provided with a drain outlet and a drain pipe for exchanging the internal water, maintenance can be facilitated.

この調湿装置の使い方は、以下のようになる。容器14に水20を適量入れる。水は純水が好ましいが、必要に応じて水に添加物を加えてもよい。加熱制御装置18に所定温度をセットし、恒温部20の水を所定温度にする。   The usage of this humidity control device is as follows. An appropriate amount of water 20 is placed in the container 14. The water is preferably pure water, but an additive may be added to the water as necessary. A predetermined temperature is set in the heating control device 18 and the water in the constant temperature unit 20 is set to a predetermined temperature.

その後、未処理の気体を気体通路へ導入する。三方バルブ12を操作し、すべての気体を加湿部22に流す。そして、気体通路の出口で所定温度の飽和気体が得られる事を確認する。   Thereafter, untreated gas is introduced into the gas passage. The three-way valve 12 is operated so that all the gas flows through the humidifying unit 22. And it confirms that saturated gas of predetermined temperature is obtained at the exit of a gas passage.

次に、三方バルブ12を操作して、すべての気体を加湿部22を通さずにそのまま流す(図の5のルート)。気体通路出口近辺の管内には水分がついているので、暫らくそのまま流して出口付近の水分を乾燥させる。そして、気体で口で所定温度の乾燥気体が得られることを確認する。なお、ここで、加湿部22からの気体(図中6の気体)を、乾燥気体7との合流の前に取り出せる口30を気体通路に設けることで、気体通路出口近辺を乾燥させる手間が省ける。また、この取り出し口30は、加湿部22の内部温度を上げた際の圧力調節弁としても使う事ができる。   Next, the three-way valve 12 is operated to flow all the gas as it is without passing through the humidifying part 22 (route 5 in the figure). Since moisture is present in the tube near the gas passage outlet, it is allowed to flow for a while to dry the moisture near the outlet. And it confirms that the dry gas of predetermined temperature is obtained with a gas at the mouth. Here, by providing the gas passage with a port 30 through which the gas from the humidifying section 22 (6 gas in the figure) can be taken out before joining with the dry gas 7, it is possible to save the trouble of drying the vicinity of the gas passage outlet. . Further, the take-out port 30 can also be used as a pressure control valve when the internal temperature of the humidifying unit 22 is raised.

それから再度三方バルブ12を操作して所望の湿度の気体が得られるまで、乾燥気体の一部を加湿部22へ流す。この際、気体通路の出口に湿度計をつけて得られる気体の湿度をモニタしながら行えば容易に所定温度所定湿度の気体を得る事ができる。   Then, the three-way valve 12 is operated again to allow a part of the dry gas to flow to the humidifying unit 22 until a gas having a desired humidity is obtained. At this time, a gas having a predetermined temperature and a predetermined humidity can be easily obtained by monitoring the humidity of the gas obtained by attaching a hygrometer to the outlet of the gas passage.

従って、気体通路から得た気体の温度と湿度をモニタしながら、三方バルブ12と加熱制御装置18を制御することで、常時所定温度と所定湿度の気体を得る事ができるような制御系を本発明に付加するのは容易なことである。   Therefore, this control system is capable of constantly obtaining a gas having a predetermined temperature and a predetermined humidity by controlling the three-way valve 12 and the heating control device 18 while monitoring the temperature and humidity of the gas obtained from the gas passage. It is easy to add to the invention.

本発明の特徴は、加湿部22の水面と恒温部20の水が同一で、しかも一つの容器14内にある点である。このようにすることで、恒温部20と加湿部22の温度を調整する制御が1系統でできるので、簡単で信頼精度の高い調湿装置を得る事ができる。   The feature of the present invention is that the water surface of the humidifying part 22 and the water of the constant temperature part 20 are the same and are in one container 14. By doing in this way, since the control which adjusts the temperature of the constant temperature part 20 and the humidification part 22 can be performed by 1 system | strain, a simple and highly reliable humidity control apparatus can be obtained.

また、同一温度の飽和気体と乾燥気体を混合するので、三方バルブを動かしたときの応答速度が速い。従って、所望気体8の湿度をフィードバックする必要が無い。   In addition, since saturated gas and dry gas at the same temperature are mixed, the response speed when the three-way valve is moved is high. Therefore, there is no need to feed back the humidity of the desired gas 8.

本発明での設定可能範囲は1気圧において温度0℃から100℃で、相対湿度は除湿限界能力から100%までで可能ある。
(実施の形態2)
The settable range in the present invention is a temperature from 0 ° C. to 100 ° C. at 1 atm, and the relative humidity can be from the dehumidifying limit ability to 100%.
(Embodiment 2)

図2に本発明の他の実施の形態を示す。図1と比較すると、本実施の形態では、三方バルブ12がなくなっており、高温乾燥気体7と高温飽和気体6を一定の比率で混合する混合部13を含む。すなわち、実施の形態1と比較すると、加湿部22に高温乾燥気体を入れる際に流量を制限するのか、加湿部22を出てから高温乾燥気体と混合するかの違いがある。   FIG. 2 shows another embodiment of the present invention. Compared with FIG. 1, in this Embodiment, the three-way valve | bulb 12 is lose | eliminated and the mixing part 13 which mixes the high temperature dry gas 7 and the high temperature saturated gas 6 by a fixed ratio is included. That is, compared with Embodiment 1, there is a difference between whether the flow rate is limited when the high-temperature dry gas is introduced into the humidifying unit 22 or mixing with the high-temperature dry gas after leaving the humidifying unit 22.

本実施の形態では、乾燥気体を加湿部22へ流量制御なしで導入するので、逆流が無いように加湿部22への入り口に背圧弁などを設けた方がよい。例えば、温度が高くなった際には、加湿部22内での水の蒸発によって圧力が高くなり、気体通路に逆流する虞があるからである。
(実施の形態3)
In the present embodiment, since the dry gas is introduced into the humidifying unit 22 without controlling the flow rate, it is better to provide a back pressure valve or the like at the entrance to the humidifying unit 22 so that there is no backflow. For example, when the temperature rises, the pressure increases due to the evaporation of water in the humidifying unit 22, and there is a possibility that the gas flows back into the gas passage.
(Embodiment 3)

図3に本発明の他の実施の形態を示す。本実施の形態では、加湿用シャワー24は水の温度調整とは無関係に恒温部20の水を循環するだけである。すなわち、恒温部20の水をポンプ19によって循環させる。   FIG. 3 shows another embodiment of the present invention. In the present embodiment, the humidifying shower 24 only circulates the water in the constant temperature unit 20 regardless of the temperature adjustment of the water. That is, the water in the constant temperature unit 20 is circulated by the pump 19.

なお、図では、実施の形態2で説明した混合部13を含む構成で説明をしたが、実施の形態1や2のシャワー24を図3のようにして構わないことは言うまでもない。   In the figure, the configuration including the mixing unit 13 described in the second embodiment has been described. Needless to say, the shower 24 in the first and second embodiments may be configured as shown in FIG.

また、実施の形態1から3を通じて、加湿部22中に加湿用シャワー24を設置し、説明を行ったが、加湿部22で注入された乾燥気体と水分を与える事ができれば、特に限定されるものではない。すなわち、加湿用シャワー24は無くてもよいし、加湿用シャワー24以外の手段によって乾燥気体と水分の接触面積大きくする手段を使ってもよい。   In addition, through the first to third embodiments, the humidifying shower 24 is installed in the humidifying unit 22, and the description has been made. However, if the dry gas and water injected by the humidifying unit 22 can be given, the present invention is particularly limited. It is not a thing. That is, the humidifying shower 24 may not be provided, or a means for increasing the contact area between the dry gas and moisture by means other than the humidifying shower 24 may be used.

例えば、金網を加湿部22内に配置しその金網に水を伝わせる、加湿部22内に水分をスプレー状にして放出する、加湿部22内に超音波振動子を用いて微小水滴を発生させる、等の方法を利用できる。   For example, a wire mesh is disposed in the humidifying unit 22 to transmit water to the wire mesh, water is sprayed and discharged into the humidifying unit 22, and minute water droplets are generated in the humidifying unit 22 using an ultrasonic vibrator. , Etc. can be used.

本発明の調湿装置は、比較的流量の少ない範囲で高精度の湿度調整が可能である。また装置を小型にすることができる。したがって各種の試験・実験装置や保管庫、その他環境産業として注目されている厚生ゴミや堆肥処理などに利用する事ができる。   The humidity control apparatus of the present invention can perform highly accurate humidity adjustment within a relatively small flow rate range. Further, the apparatus can be reduced in size. Therefore, it can be used for various test / experimental devices, storages, and other welfare garbage and compost processing that are attracting attention as an environmental industry.

本発明の実施の形態の構成を示す図The figure which shows the structure of embodiment of this invention 本発明の他の実施の形態の構成を示す図The figure which shows the structure of other embodiment of this invention. 本発明の他の実施の形態の構成を示す図The figure which shows the structure of other embodiment of this invention. 従来の二分法の概略を説明する図Diagram explaining the outline of the conventional bisection method 従来の二温法の概略を説明する図Diagram explaining the outline of the conventional two-temperature method

符号の説明Explanation of symbols

10 冷却部
12 三方バルブ
14 容器
16 ポンプ
18 加熱装置
20 恒温部
22 加湿部
24 加湿用シャワー
26 シャワー
DESCRIPTION OF SYMBOLS 10 Cooling part 12 Three-way valve 14 Container 16 Pump 18 Heating device 20 Constant temperature part 22 Humidification part 24 Humidification shower 26 Shower

Claims (5)

1の水温制御器で温度を制御された乾燥気体と湿潤気体を所定の比率で混合するガス調湿装置。   A gas humidity control apparatus that mixes a dry gas and a wet gas, the temperature of which is controlled by a water temperature controller, at a predetermined ratio. 排気口を有し、内部に水を貯める容器と、
気体の入口と出口を有し、前記容器の外側から内部の水の中を通り再び前記容器の外部にでる気体通路と、
前記水の温度を制御する水温制御器と
前記気体通路を通る前記気体の一部を前記容器の中に放出する分流器と
前記排気口からの気体と前記出口からの気体を1つにまとめて排出する合流器とからなるガス調湿装置。
A container having an exhaust port and storing water therein;
A gas passage having an inlet and an outlet for gas, passing from the outside of the container through the internal water to the outside of the container, and
A water temperature controller for controlling the temperature of the water, a shunt for discharging a part of the gas passing through the gas passage into the container, a gas from the exhaust port, and a gas from the outlet are combined into one. A gas humidity control device consisting of a confluence device for discharging.
前記入口の前に前記気体の前処理部を有する請求項1または2のいずれかに記載のガス調湿装置。   The gas humidity control apparatus according to claim 1, further comprising a pretreatment unit for the gas before the inlet. 前記前処理部は気体の冷却器である請求項3に記載のガス調湿装置。   The gas humidity control apparatus according to claim 3, wherein the pretreatment unit is a gas cooler. 前記前処理部は気体の除湿器である請求項3に記載のガス調湿装置。
The gas humidity control apparatus according to claim 3, wherein the pretreatment unit is a gas dehumidifier.
JP2005294241A 2005-10-07 2005-10-07 Gas humidity controller Expired - Fee Related JP4656647B2 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010137159A (en) * 2008-12-11 2010-06-24 Seiko Epson Corp Ultraviolet treatment device
JP2011256433A (en) * 2010-06-09 2011-12-22 Toyota Motor Corp Ozone gas treatment process and treatment apparatus thereof

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5588143U (en) * 1978-12-13 1980-06-18
JPH0220932U (en) * 1988-07-25 1990-02-13
JPH0571776A (en) * 1991-09-10 1993-03-23 Tabai Espec Corp Humidity generating device
JPH08136017A (en) * 1994-11-01 1996-05-31 Matsushita Refrig Co Ltd Air conditioner
JP2001311540A (en) * 2000-04-28 2001-11-09 Smc Corp Arbitrary humidity generating device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5588143U (en) * 1978-12-13 1980-06-18
JPH0220932U (en) * 1988-07-25 1990-02-13
JPH0571776A (en) * 1991-09-10 1993-03-23 Tabai Espec Corp Humidity generating device
JPH08136017A (en) * 1994-11-01 1996-05-31 Matsushita Refrig Co Ltd Air conditioner
JP2001311540A (en) * 2000-04-28 2001-11-09 Smc Corp Arbitrary humidity generating device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010137159A (en) * 2008-12-11 2010-06-24 Seiko Epson Corp Ultraviolet treatment device
JP2011256433A (en) * 2010-06-09 2011-12-22 Toyota Motor Corp Ozone gas treatment process and treatment apparatus thereof

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