JP2007075919A - Method for adjusting retention time in retention time control type polishing machine - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for adjusting a retention time in a retention time control type polishing machine with an added function to visually and easily recognize retention time different for every polishing position, the reference retention time, amount to be adjusted or adjusting amount, etc. <P>SOLUTION: In this method, polishing is performed, while controlling relative moving speed of a surface to be polished of a workpiece and a polishing member as the retention time by mutually rotating the surface to be polished and polishing member and relatively moving the surface and member in the radial direction. The method includes a stage for displaying the retention times of a polishing tool at a plurality of positions in the radial direction of the surface to be polished by making the retention times into a prescribed graph, a stage for converting all the retention times at the plurality of positions into the same value on the graph, and a stage for displaying the graph of the value converted into the same value. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a dwell time adjusting method in a dwell time control type polishing machine suitable for polishing aspheric surfaces such as aspheric lenses and aspheric molds.

  Conventionally, uniform polishing or correction polishing of a circular workpiece in a dwell time control type polishing machine is performed by bringing a rotating tool having a small diameter into contact with a surface to be polished of a rotating circular workpiece, and further bringing the polishing tool in the radial direction of the non-polishing surface To scan. At this time, the amount of polishing at each point in the diameter direction of the surface to be polished of the workpiece is adjusted by controlling the residence time of the polishing tool. The dwell time is an amount determined by the relative speed between the surface to be polished of the circular workpiece and the polishing tool. The rotation speed of the circular workpiece, the scanning speed of the polishing tool, and the rotation speed of the polishing tool when the polishing tool is rotated. It depends on.

  Conventionally, the residence time is controlled by a control device such as a personal computer, and the set residence time for each of a plurality of polishing positions is displayed on the display as a line graph. At this time, the reference residence time was displayed as 100 percent. Then, the operator adjusts the polishing amount by adjusting the residence time while viewing the position of each point of the line graph in the vertical axis direction based on the 100% line graph displayed on the display. It was. In the case of uniform polishing, this graph is uniform in design. In the line graph shown in FIG. 5, the vertical axis represents the residence time, and the horizontal axis represents the distance from the center of the diameter direction of the polishing tool.

  When uniform polishing is performed by the above-described conventional polishing method, the positions (vertical axis directions) of the points on the line graph indicating the magnitude of the residence time are designed to be equal at all points. Theoretically, it is evenly ground at that setting, but in reality, depending on the workpiece shape, it may be difficult for the motor to follow the theoretical value, the roughness of the pre-processed shape is uneven, In many cases, the shape of the non-polished surface slightly collapses from the designed shape because the method of application slightly changes depending on the polishing location of the workpiece. In such a case, the operator can finely adjust the position of the line graph (residence time) on the display so as to change the position in the vertical axis direction in advance. The unevenness | corrugation from which the position of the vertical direction of each point differs will be produced (FIG. 6). Further, if the designed curved surface shape is not obtained even after polishing in this fine adjustment state, correction polishing will be performed, but adjustment while looking at the uneven graph shown in FIG. However, there was a problem that setting the adjustment amount was very difficult.

  The present invention has been made in view of such conventional problems, and adds a function that makes it easy to visually understand a residence time that differs for each polishing position, a residence time that serves as a reference, an amount to be adjusted, or an adjustment amount. It is an object of the present invention to provide a method for adjusting a residence time in a residence time control type polishing machine.

  The present invention that achieves this object is to control the relative moving speed of the surface to be polished and the polishing member as the residence time by rotating the surface to be polished and the polishing member relative to each other and moving them relatively in the radial direction. A method for adjusting a residence time in a residence time control type polishing machine that polishes while polishing, wherein the residence time of the polishing tool at a plurality of positions in the radial direction of the surface to be polished is displayed in a predetermined graph, and at the plurality of positions It is characterized by including the step of converting all the residence times into the same value on the graph and the step of displaying the graph of the value converted into the same value.

  In a preferred embodiment, the conversion step converts to a percentage value with the residence time during conversion being 100 percent. The conversion step may be converted into a percentage display value where the design value of the residence time at each position is 100%.

More practically, further, the stage of changing the residence time at the plurality of positions, and when the residence time is changed by the change stage, the residence time after the change is based on the value of 100%. The method includes a step of converting to a percentage display value and a step of displaying the converted percentage display value in a graph.
The step of changing the dwell time includes a step of inputting the dwell time as a numerical value, and the converting step is preferably different from converting the inputted numerical value into the value in percentage display.

  In the graph, the residence time at each position is preferably represented by the position in the vertical axis direction of each point of the line graph.

  As described above, according to the method for adjusting the residence time in the residence time control type polishing machine of the present invention, the residence time for each polishing position can be displayed in a graph showing the same value. Is easy to understand and easy to adjust.

  Embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a side view showing an embodiment of a horizontal aspherical polishing apparatus as a residence time control type polishing machine to which the present invention is applied.

  The aspherical polishing apparatus includes a work unit 10 and a polisher (polishing) unit 20 that face each other. The work unit 10 includes a work spindle motor unit 11 that holds and rotates the work 40, the polisher unit 20 includes a polisher spindle motor unit 21 that holds and rotates the polisher 50, and the polisher unit 20 holds the polisher 50. A polisher spindle 22 to be rotated and a polisher spindle motor unit 21 are provided, and the units 10 and 20 are arranged in the horizontal direction with their tip portions facing each other.

  The work spindle motor unit 11 includes a work spindle 12 projecting from a surface facing the polisher spindle motor unit 21, and a work chuck 13 is attached to the tip of the work spindle 12. The work chuck 13 has a known configuration in which the work 40 is detachably fitted and held in a state where the work 40 is aligned. The workpiece spindle motor unit 11 and the workpiece chuck 13 constitute a workpiece holding unit. The work spindle 12 is rotationally driven by a spindle motor M1 (see FIG. 3) built in the work spindle motor unit 11.

  The work unit 10 is fixed on the slide table 14. The slide table 14 is supported by the slide guide 15 so as to be movable in parallel with the axis O1 of the work spindle 12. The slide table 14 and the slide guide 15 constitute a slide guide mechanism. The slide table 14 is set so that the axis O1 of the work spindle 12 is horizontal and the linear movement direction is parallel to and intersects with the axis O2 of the polisher spindle 22 in the initial state.

  The slide guide 15 is fixed on the workpiece swing table 16. The work rocking table 16 is pivotally supported by the work motor unit 17 via a rocking shaft (not shown) installed in the vertical direction orthogonal to the axis O1 in the vicinity of the end on the polisher unit 20 side. Has been. The rear end portion of the workpiece swing table 16 is slidably supported by an arc roller 18 centering on the swing axis A of the swing shaft. Although not shown, a swing motor that swings and drives the workpiece swing table 16 is built in the work motor unit 17. Thus, the work motor unit 17 and the arc roller 18 are fixed on the base 30.

  The polisher spindle motor unit 21 includes a polisher spindle 22 that protrudes from an end surface facing the work spindle motor unit 11, and a polisher 50 is axially aligned with a tip portion of the polisher spindle 22 via a shaft portion 51. It is detachably mounted in the state. The polisher 50 has a known configuration in which a spherical portion is fixed to the tip of a shaft portion, and the spherical portion is wrapped with an abrasive cloth.

  This polisher spindle motor unit 21 is mounted on a polisher slide table 23 so as to be movable in parallel with the direction of the axis O2 of the polisher spindle 22, and further, the polisher slide table 23 is attached to a slide guide 24 with a swing axis A and an axis O2. Is supported so as to be movable in a direction perpendicular to the axis. That is, the polisher spindle motor unit 21 is supported so as to be movable in a direction parallel to and perpendicular to the axis O2. Thus, the slide guide 24 is fixed to the base 30 via the polisher base 25 so that the axis O2 is horizontal and the polisher spindle motor unit 21 moves in a direction perpendicular to the axis O2 and in the horizontal direction. The polisher spindle motor unit 21 incorporates a spindle motor M3 having a polisher spindle 22.

  Although not shown, the polisher unit 20 is always urged by a predetermined urging force in a direction approaching the work spindle motor unit 11 to move forward and backward, and is in a free state in the horizontal and lateral directions.

  The work unit 10 and the polisher spindle unit 20 are opposed to each other with their axes O1 and O2 aligned. Then, the polisher 50 is moved and urged toward the aspherical surface 41 by the urging means, and always contacts the aspherical surface 41 with a constant pressure.

  In this state, the personal computer 60 drives and controls the spindle motors M1 and M2 to rotate the workpiece 40 and the polisher 50 in accordance with a polishing program stored in advance, and further drives the swing motor M3 built in the workpiece table 17. Then, the polisher 50 is scanned in the radial direction on the polished surface 41 of the workpiece 40, and each position of the polished surface 41 is polished for a predetermined residence time. Due to the relative rotation of the workpiece 40 and the polisher 50 and the combined movement of the workpiece 40 in the horizontal direction by the swing motor M3, the polisher 50 moves on the aspherical surface 41 along a predetermined locus and is polished.

  FIG. 3 shows the configuration of the control system of this aspherical polishing apparatus. The motors M1, M2, and M3 are controlled by a control device such as a personal computer 60 that incorporates a microcomputer via drivers 61, 62, and 63, respectively. As is well known, the personal computer 60 has a function of reading a preset aspherical polishing program and drivingly controlling the motors M1, M2, and M3 via the drivers 61, 62, and 63.

  The display 64 connected to the personal computer 60 displays predetermined information according to the aspheric polishing program. A display example is shown in FIG. This is an example in the case of polishing uniformly by giving a predetermined residence time at each point. In this embodiment, the design residence time is set to be the same at each point, each residence time is shown as a line graph with a reference value of 100 percent, and the coordinate value, residence time (percent), Buttons relating to reset, end, etc. are displayed. Data, buttons, etc. displayed on these screens are operated by the operator via the input means 65. The input means 65 includes, for example, a keyboard and a mouse.

  However, as shown in FIG. 6, when the design residence time is different at each point, or when further polishing is required as a result of polishing with each residence time being constant, irregularities appear in the graph. The embodiment of the present invention is a control method and a control apparatus that solve the problem in the case where irregularities appear in the graph as described above. The present embodiment will be further described with reference to the flowchart shown in FIG. 4 and FIGS. 7 to 9.

  The residence time adjusting method of the present embodiment is executed under the control of the personal computer 60 by a program installed in the personal computer 60. First, the dwell time at each position is input (S11). The input is set as data in advance, and the data stored in the storage medium is read or input by the operator using the input means 65.

  The inputted residence time at each position is converted into a percentage display value that makes the reference value 100 percent (S12), and the converted percentage display value is displayed on the display 62 (S13). Here, it is assumed that it is displayed as a line graph with unevenness as shown in FIG.

  The user gives a conversion instruction to the personal computer 60. In this embodiment, the user presses the initialization button displayed on the display 62 using the input means 65. Upon receiving this selection operation, the personal computer 60 displays a message “Do you want to flatten the residence time?” On the display 62 with a selection button (FIG. 7). Then, when the user selects and operates the “Yes” selection button displayed on the display 62 via the input means 65, it is determined that there is a conversion instruction (S14; YES).

  The personal computer 60 converts the dwell time at each current position into a display value of 100 percent (S15), and displays the converted display value of 100 percent on the display 64 (S16, FIG. 8).

  In FIG. 9, the shape error of the aspherical surface is shown by a line graph. In the graph, the horizontal axis indicates the distance from the center, and the vertical axis indicates the error amount from the design value. The line graph is flat in design, that is, the error is constant regardless of the distance from the center, but as shown in FIG. 9, the error amount may differ depending on the distance from the center. In such a case, if the dwell time is made flat according to the embodiment of the present invention, the dwell time at each position can be easily set based on the error line graph (FIG. 10).

  In this way, all the points on the line graph related to the residence time set so that uniform polishing can be performed can be converted to a uniform position (vertical axis direction), so when performing correction polishing, the uniform, flat line graph is used as a reference. It becomes possible to think. Therefore, the operator looks at the current error graph, and simply moves the position of the graph point upward in the portion where the polishing amount is insufficient, and the portion where the polishing amount decreases reduces the position of the graph point. By moving downward, it is possible to easily approximate the design shape.

  In the embodiment of the present invention, the residence time is shown as a line graph, but the present invention is not limited to this, and it is preferable to show a change graph such as a bar graph that is easy to visually recognize. The residence time control type polishing machine to which the present invention can be applied is not limited to the illustrated aspherical polishing apparatus, and can be applied to a known residence time control type polishing machine.

1 is a side view of an aspheric polishing apparatus to which an embodiment of the present invention is applied. It is a top view which shows the operation state of the aspherical surface polishing apparatus. It is a figure which shows the outline of the principal part of the control system of the aspherical surface polishing apparatus with a block. It is a figure which shows the operation | movement outline | summary of the embodiment with a flowchart. It is a figure which shows an example of the display mode which made the line graph the relationship between residence time and a grinding | polishing position in the process of the embodiment. It is a figure which shows an example of the display mode which made the line graph the relationship between residence time and a grinding | polishing position in the process of the embodiment. It is a figure which shows an example of the display mode which made the line graph the relationship between residence time and a grinding | polishing position in the process of the embodiment. It is a figure which shows an example of the display mode which made the line graph the relationship between residence time and a grinding | polishing position in the process of the embodiment. It is a figure which shows the error of a to-be-polished surface in a line graph. It is a figure which shows an example of the display mode which made the line time the dwell time set by the operator in the case of carrying out correction polishing of the to-be-polished surface.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Work unit 11 Work spindle motor part 12 Work spindle 13 Work chuck 14 Slide table 14a Micrometer 14b Handle 15 Slide guide 16 Work swing table 17 Work table 20 Polisher unit 21 Polisher spindle motor part 22 Polisher spindle 23 Polisher slide table 24 Slide Guide 25 Polisher base 30 Base 40 Work 41 Aspherical surface 50 Polisher 60 Personal computer 64 Display 65 Input means

Claims (6)

A dwell time control type polishing machine that performs polishing while rotating the surface to be polished and the polishing member relative to each other and moving them in the radial direction, and controlling the relative moving speed of the surface to be polished and the polishing member as the dwell time. A method for adjusting the residence time in
A step of displaying a predetermined graph of the residence time of the polishing tool at a plurality of positions in the radial direction of the surface to be polished;
Converting all the residence times at the plurality of positions to the same value on the graph;
A method for adjusting a residence time in a residence time control type polishing machine, comprising a step of displaying a graph of values converted into the same value. The method for adjusting a residence time in a residence time control type polishing machine according to claim 1, wherein the conversion step converts the residence time at the time of conversion into a value expressed as a percentage with 100 percent. 2. The method for adjusting a residence time in a residence time control type polishing machine according to claim 1, wherein the conversion step converts the design value of the residence time at each position to a value expressed as a percentage with 100%. Furthermore, when the residence time is changed at the plurality of positions and when the residence time is changed by the change step, the residence time after the change is converted into a percentage display value based on the value of 100 percent. 4. The method for adjusting a residence time in a residence time control type polishing machine according to claim 2, further comprising a step of displaying the converted percentage display value in a graph. The said graph is the adjustment method of the residence time in the residence time control type | mold polishing machine as described in any one of Claims 1 thru | or 4 which represents the residence time in each position with a line graph. 5. The dwell time control type polishing according to claim 4, wherein the step of changing the dwell time includes a step of inputting a dwell time as a numerical value, and the step of converting converts the inputted numerical value into the value of the percentage display. Of adjusting the residence time in the machine.

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